201024439 九、發明說明： 【發明所屬之技術領域】 本發明涉及光學鍍膜領域，尤其涉及一種光學鏡膜裝 置。 *【先前技術】 IW者光學產品之發展，光學鏡片之應用範圍越來越 廣。相應地’業界採用各種方法來製造光學鏡片以適應市 場對不同規格光學鏡片之需求（請參閱“Fabrication of 〇 Diffractive Optical Lens for Beam splitting Using LIGA Process’’，Jauh Jung Yang ;Mechatronics and Automation, Proceedings of the 2006 IEEE International Conference on， pp.1242-1247，2006.06)。同時，為降低成本及提高效率， 進行批量生產以滿足對光學鏡片之需求，通常來說’製造 出之光學鏡片需經過後續處理以獲得適於應用之良好性 能。 鍍膜工序為後續處理中之重要步驟之一。鍍膜係指以 ®物理或化學方法於光學元件表面鍍上單層或多層薄膜，利 用入射、反射及透射光線在薄膜介面產生之干涉作用實現 聚焦、準直、濾光、反射及折射等效果。光學元件之鍍膜 製程為：首先，將光學元件安裝於待鍍元件承載架上，待 鍍元件承載架設置於一鍍膜腔室中；其次，密閉鍍膜腔室 並對其抽真空；然後，以蒸鍍或濺鍍等方法在光學元件需 要鍍膜之部位進行鍍膜；最後，將經過鍍膜之元件從待鍍 元件承載架拆卸下來。然，在鍍膜源與待鍍元件承載架之 6 201024439201024439 IX. Description of the Invention: [Technical Field] The present invention relates to the field of optical coating, and more particularly to an optical mirror device. * [Prior Art] The development of optical products for IW, the application range of optical lenses is becoming wider and wider. Accordingly, the industry has adopted various methods to manufacture optical lenses to meet the market demand for optical lenses of different specifications (see "Fabrication of 〇Diffractive Optical Lens for Beam splitting Using LIGA Process", Jauh Jung Yang; Mechatronics and Automation, Proceedings of The 2006 IEEE International Conference on, pp. 1242-1247, 2006.06). At the same time, in order to reduce costs and improve efficiency, mass production is carried out to meet the demand for optical lenses. Generally, the manufactured optical lenses are subject to subsequent processing. Obtaining good performance for the application. The coating process is one of the important steps in the subsequent processing. Coating refers to the physical or chemical method of plating a single or multi-layer film on the surface of the optical component, using the incident, reflective and transmitted light in the film. The interference generated by the interface achieves the effects of focusing, collimation, filtering, reflection, and refraction. The coating process of the optical component is: first, the optical component is mounted on the component carrier to be plated, and the component carrier to be plated is disposed on a coating film. In the chamber; secondly, sealing the coating chamber and The vacuum is applied; then, the coating of the optical component is required to be coated by evaporation or sputtering; finally, the coated component is removed from the component carrier to be plated. However, the coating source and the component to be plated are carried. Frame 6 201024439
間在一定办卩卩 4- -V 卫句，即使蒸鍍或濺鍍源關閉，空間中仍合有 =餘鍍膜材料或巧染物鏡附於基板上，影響 潔淨度。 《卞丨土久 【發明内容】 有鑑於此，提供一種可提高膜厚控制精準度，並降低 雜質污染待鍍元件之可处从,θ ^ 牛之了此性、k尚鍍膜品質之光學鍍膜裝 置貫為必要。 -種光學鍍臈裝置，其包括真空鍍膜室、待鍍元件承 •架，鍍膜源’該待鍍元件承載架及鏟膜源設置於該真空 錢f室内’該光學鍍膜裝置還包括-鍍膜擋板，該鍍膜擋 板汉置於該待錢元件承載架與該鏡膜源之間，該鑛膜擒板 包括-第-擋板及一第二擋板，該第一撐板可將該真空鑛 膜室分隔成兩個空間，該第一擔板具有一通孔，該通孔對 應。亥待鍍元件承載架與鏡膜源設置以使該鐘膜源產生之 鍵膜材料氣體通過該通孔到達置於待鍍元件承載架之待鑛 ❹兀件上，該第二擋板可相對該第一擋板移動並分別遮擋或 暴露該通孔。 相較於先前技術，本發明所提供之光學鍍膜裝置，由 於該鍍膜擋板可將真空鍍膜室分隔為兩個空間且可利用鍍 膜擋板之開啟及關閉控制鍍膜材料是否進入待鍍元件承載 架所在空間，從而可精確控制鍍膜厚度，並提高鍍膜品質。 【實施方式】 下面將結合附圖，對本發明實施例作進一步之詳細說 明。 7 201024439 请參閱圖！，本發明第一實施例提供了—種光學鑛 置·。該光學錢膜裝置·包括真空鑛膜t 1〇、待心 件承載架20、鑛膜源3〇及鍍膜擒板4〇。該待鑛元件承 架20、鍍臈源30及鍍膜擋板4〇設置於真空鍍膜室仞 該光學錢膜裝置⑽可以為蒸㈣缝裝置，本實施例以 蒸鍍裝置為例。 該待鍍元件承載架2〇通過一轉動軸21安裝在該直* • 之頂部11 ’該待鍍元件承载架20與該轉動轴 疋連接，且忒待鍍π件承載架20可繞該轉動軸轉動' 本實施例巾㈣螺絲將該待鍍元件承載架2G連接於 軸2!上。該待鍍元件承載架20上包括多塊基板二該： 板60載有待錄元件7〇。本實施例中，該待鑛元件承^ 2甘0為傘形。當然’該待鍍元件承載架2〇不限於這種形狀： 其亦可以為平板狀。 办狀 該鑛膜源30較在該真空鍍膜室1()之底部12 •膜源30為一蒸鍍源’其通常採用一坩堝31，將鍍膜材‘ 32裝置於㈣31中，再使用—電子搶33擊打料31中之 鍍膜材料32一至其蒸發，從而向上衝擊至待錢元件承 20,在待鍍元件7〇相應之表面上鍍膜。 ’、 30之^鍍Γ擋板4〇設置在該待鍍元件承載架2〇與鍍膜源 間’接近待鍍元件承載架20而不接觸到待鍍元件 2 20 ’且遠離該鍍膜源3〇而設置。本實施例中’該鑛膜擔 板40位於該待鍍元件承載架20之正下方。 田 凊一併參閱圖2及圖3,該鍍膜擋板4〇包括一第一栲 8 201024439 擒板42。該第一播板41中央具有一通孔 應鱗鑛元件承載架如與_源_ 411到達置^%產生之鍍膜材料％蒸氣通過該通孔 i達置於相％件承載架3()之待鑛元件 搶板41固定於該真空錢膜室Μ内壁13上。在本實施例令， 该真空制室H)内壁13上設置有環繞該 該内壁13上直接加工出-個凹槽。該凹θ Φ !二::：待鑛元件承載架2 〇與鑛膜源3 〇之間，且 2近待鑛几件承载架1〇。本實施例中，該真空鑛膜室10 為圓柱形，該第一擋板41之报 、 截面形狀相同且略小於該直★膜二二工鍍臈室10之橫 迻樣，兮第… 〇之橫截面之直徑。 第―擒板41即可固定於該凹槽14中，且將该真 =膜室1〇分割為上下兩個空間即第一空間Μ及第;空 間16 〇 參 可以理解’該第一播板41可以採用其他方式固定，該 凹槽14亦非必需。例如，丌尨 #黛-純μ 對稱設置之支樓柱豎 在第一_ 41之下謂第i板^固定於真空鍵臈室 ίο中，支錄固定在真空鍍膜室1G之底部12上。這種情 況下真空鍍膜室10之内壁13上即可不必設置凹槽Μ。 該第二擋板42可活動地固定於該第一擋板41上，且 可通過-驅動件（圖未示）來使該第二擔板42分別遮住該 通孔4η或使該通孔411暴露出來。在本實施例中，該第 二擂板42通過一旋轉軸421固定於該第一擋板上，且 二擔板42可繞旋轉轴421旋轉一定角度。當該第二播板^ 201024439 向适離通孔411之方向旋轉並使通孔411完全暴露出來 時’該鍍膜擋板40即處於開啟狀態，這時，可以進行鑛膜。 •當§亥第二擔板42旋轉至當該第二擋板42遮擔住通孔411 .時，該鍍膜擋板40即處於關閉狀態，這時，鍍膜材料％ 便被擋在第二空間16内。 可以理解，該鑛膜擋板40之形狀可根據實際需要而設 置。該鍍膜擋板40之第一擋板41應選擇與該真空鍍膜室 1〇之橫截面形狀相配合之形狀，以使第一擋板41可以完全 將第一空間15與第二空間16分隔開。另外，該通孔411 之幵^狀亦可以根據實際需要而設置，例如，設置為方形或 菱形等。在本實施例中，該第二擋板42之大小應不小於通 孔411之大小，以可以遮住通孔411為準。 該光學鍍膜裝置可包括一遮蓋5〇，該遮蓋5〇固定於鍍 膜源30正上方，鍍膜時，該遮蓋5()可關閉或開啟以阻稽 或使該鐘膜源30之鍵膜材料32蒸發出來。該遮蓋5〇用於 ，制鑛膜厚度，而本發明所提供之鍍膜擋板4()可辅助該遮 盍50,使鍍膜結束後’ g閉鍍膜擋板4〇，即可將位於遮蓋 上方而處於待鍍兀件承載架2〇下方之鍍膜材料％ p且隔 待鍍7L件承載架2〇之外，從而使鑛膜厚度得到精確控制 且避免其他污染物污染待鍍元件。 請參閱圓4及圖5,本發明第二實施例提 圖未示）與第-實施例提供之光學嫂膜裝置；；^ 撞板⑽例之光學錄膜裝置所採用之鐘膜 6細例中之鍍臈擋板40結構不同，其主要 201024439 區別在於：該鍍膜擋板240之第二擋板242由多個子擋板 2421組成，該多個子擋板2421形狀相同。在本實施例中， _該多個子擋板2421為扇葉形。各個子擋板2421分別通過 一旋轉軸2422固定於第一擋板241上，且各個子擋板2421 可繞旋轉軸2422旋轉一定角度。通過一驅動件（圖未示） 可以驅動該子擋板2421旋轉以使該鍍膜擋板240分別處於 開啟及關閉狀態。當該子擋板2421全部向遠離通孔2411 之方向旋轉並使通孔2411完全暴露出來時，該鍍膜擋板240 ❹即處於開啟狀態，這時，可以進行鍍膜。當該子擋板2421 旋轉至遮擋住通孔2411時，該鍍膜擋板240即處於關閉狀 態，這時，鍍膜材料被擋在鍍膜擋板240下方而無法進入 待鍍元件承載架所在空間内。由此，即可防止鍍膜材料污 染待鍍元件，從而可增加膜厚控制之精確度及潔淨度，從 而改善鍍膜品質。 综上所述，本發明確已符合發明專利之要件，遂依法 _提出專利申請。惟，以上所述者僅為本發明之較佳實施方 式，自不能以此限制本案之申請專利範圍。舉凡熟悉本案 技藝之人士援依本發明之精神所作之等效修飾或變化，皆 應涵蓋於以下申請專利範圍内。 【圖式簡單說明】 圖1係本發明第一實施例提供之光學鍍膜裝置之示意圖。 圖2係圖1中光學鍍膜裝置之鍍膜擋板在開啟狀態時之示 意圖。 圖3係圖1中光學鍍膜裝置之鍍膜擋板在關閉狀態時之示 11 201024439In the case of 4--V Guardian, even if the evaporation or sputtering source is turned off, the space is still combined with the remaining coating material or the mirror is attached to the substrate, which affects the cleanliness. In view of the above, an optical coating device capable of improving the film thickness control accuracy and reducing impurities contaminating the components to be plated is provided, and the optical coating device of the θ ^ 牛As necessary. An optical rhodium plating device, comprising a vacuum coating chamber, a component holder to be plated, a coating source, the component to be plated and a shovel source are disposed in the vacuum chamber, the optical coating device further comprises a coating block a plate, the coated baffle is disposed between the waiting component carrier and the mirror source, the beryllium plate includes a -th baffle and a second baffle, the first brace can be the vacuum The film chamber is divided into two spaces, and the first plate has a through hole corresponding to the through hole. The plated component carrier and the mirror film source are disposed such that the film material gas generated by the clock source passes through the through hole to the to-be-casting member placed on the component carrier to be plated, and the second baffle can be opposite The first baffle moves and obscures or exposes the through hole, respectively. Compared with the prior art, the optical coating device provided by the present invention can separate the vacuum coating chamber into two spaces by using the coating baffle, and can control whether the coating material enters the component carrier to be plated by using the opening and closing of the coating baffle. The space is in place to precisely control the thickness of the coating and improve the quality of the coating. [Embodiment] Hereinafter, embodiments of the present invention will be further described in detail with reference to the accompanying drawings. 7 201024439 Please see the picture! The first embodiment of the present invention provides an optical mineral. The optical money film device includes a vacuum film t 1 , a core carrier 20 , a mineral film source 3 , and a coated plate 4 . The to-be-stained component carrier 20, the rhodium-plating source 30, and the coating baffle plate 4 are disposed in the vacuum coating chamber. The optical money film device (10) may be a steaming (four) slitting device. In this embodiment, the vapor deposition device is taken as an example. The component carrier 2 to be plated is mounted on the top 11 of the straight through a rotating shaft 21, and the component carrier 20 to be plated is connected to the rotating shaft ,, and the π-piece carrier 20 is rotatable therewith. The shaft rotation 'this embodiment's towel (4) screw connects the component carrier 2G to be plated to the shaft 2!. The component to be plated 20 to be mounted includes a plurality of substrates. The plate 60 carries the component to be recorded. In this embodiment, the component to be mined is an umbrella shape. Of course, the component carrier 2 to be plated is not limited to this shape: it may also be in the form of a flat plate. The film source 30 is located at the bottom of the vacuum coating chamber 1 () 12 • the film source 30 is a vapor deposition source 'which usually uses a crucible 31, and the coating material '32 is placed in (4) 31, and then used - electron The coating material 32 of the 33 hitting material 31 is grabbed to evaporate, thereby impacting upward to the component 20 to be coated, and coating the corresponding surface of the component 7 to be plated. ', 30 Γ Γ Γ Γ 〇 〇 〇 〇 〇 〇 〇 元件 元件 元件 元件 元件 元件 元件 元件 元件 元件 元件 元件 元件 元件 元件 元件 元件 元件 元件 元件 元件 元件 元件 元件 元件 元件 元件 元件 元件 元件 元件 元件 元件 元件 元件 元件 元件And set. In this embodiment, the film supporting plate 40 is located directly below the component carrier 20 to be plated. Referring to Figures 2 and 3 together, the coated baffle 4 includes a first 栲 8 201024439 擒 42. The first broadcast plate 41 has a through hole in the center of the scale element carrier, such as the plate material which is generated by the source_411, and the vapor is passed through the through hole i to the phase component carrier 3 (). The mining element grabbing plate 41 is fixed to the inner wall 13 of the vacuum film chamber. In the present embodiment, the inner wall 13 of the vacuum chamber H) is provided with a groove directly formed around the inner wall 13. The concave θ Φ ! 2::: between the ore-bearing component carrier 2 矿 and the mineral film source 3 ,, and 2 near the mine several pieces of carrier. In this embodiment, the vacuum film chamber 10 is cylindrical, and the first baffle 41 has the same shape and cross-sectional shape and is slightly smaller than the horizontal shift of the straight film 2 chamber. The diameter of the cross section. The first 擒 41 can be fixed in the groove 14 , and the true 膜 membrane chamber 1 〇 is divided into two upper and lower spaces, that is, the first space Μ and the first; the space 16 〇 可以 can understand 'the first broadcast board The 41 can be fixed in other ways, and the groove 14 is also unnecessary. For example, the 丌尨 #黛-pure μ symmetrical setting of the slab column is vertical. Under the first _41, the i-th board is fixed in the vacuum key chamber ίο, and the recording is fixed on the bottom 12 of the vacuum coating chamber 1G. In this case, it is not necessary to provide a groove 上 on the inner wall 13 of the vacuum coating chamber 10. The second baffle 42 is movably fixed to the first baffle 41, and the second baffle 42 can be respectively covered by the through hole 4n or the through hole by a driving member (not shown). 411 was exposed. In this embodiment, the second jaw 42 is fixed to the first baffle by a rotating shaft 421, and the second plate 42 is rotatable about the rotating shaft 421 by a certain angle. When the second board ^201024439 is rotated in the direction of the proper exit hole 411 and the through hole 411 is completely exposed, the coating shutter 40 is in an open state, and at this time, the mineral film can be performed. • When the second plate 42 is rotated until the second baffle 42 covers the through hole 411, the coating baffle 40 is in a closed state, at which time, the coating material % is blocked in the second space 16 Inside. It can be understood that the shape of the film capsule 40 can be set according to actual needs. The first baffle 41 of the coating baffle 40 should be selected to match the cross-sectional shape of the vacuum coating chamber 1 , so that the first baffle 41 can completely separate the first space 15 from the second space 16. open. In addition, the shape of the through hole 411 may be set according to actual needs, for example, a square shape or a rhombus shape. In this embodiment, the size of the second baffle 42 is not less than the size of the through hole 411 so as to cover the through hole 411. The optical coating device may include a cover 5〇 fixed to the directly above the coating source 30. When the film is coated, the cover 5() may be closed or opened to block or make the key film material 32 of the clock source 30. Evaporate. The cover 5〇 is used for the thickness of the ore film, and the coated baffle 4() provided by the present invention can assist the concealer 50, so that after the end of the coating, the g-coating baffle is closed, so that it will be located above the cover. The coating material % p under the crucible carrier 2 且 and the 7 L piece carrier 2 待 are to be plated, so that the thickness of the film is accurately controlled and other contaminants are prevented from contaminating the components to be plated. Please refer to the circle 4 and FIG. 5, the second embodiment of the present invention is not shown) and the optical film device provided by the first embodiment; the film case 6 used in the optical film recording device of the collision plate (10) The structure of the rhodium-plated baffle 40 is different, and the main difference of 201024439 is that the second baffle 242 of the coating baffle 240 is composed of a plurality of sub-baffles 2421, and the plurality of sub-baffles 2421 are identical in shape. In this embodiment, the plurality of sub baffles 2421 are in the shape of a fan blade. Each of the sub baffles 2421 is fixed to the first baffle 241 via a rotating shaft 2422, and each of the sub baffles 2421 is rotatable about the rotating shaft 2422 by a certain angle. The sub-baffle 2421 can be driven to rotate by a driving member (not shown) to open and close the coating baffle 240, respectively. When the sub-baffle 2421 is completely rotated away from the through hole 2411 and the through hole 2411 is completely exposed, the coating baffle 240 is opened, and at this time, coating can be performed. When the sub-baffle 2421 is rotated to block the through hole 2411, the coating baffle 240 is in a closed state. At this time, the coating material is blocked under the coating baffle 240 and cannot enter the space where the component carrier to be plated is located. Thereby, the coating material can be prevented from contaminating the component to be plated, thereby increasing the precision and cleanliness of the film thickness control, thereby improving the coating quality. In summary, the present invention has indeed met the requirements of the invention patent, and has filed a patent application according to law. However, the above description is only a preferred embodiment of the present invention, and it is not possible to limit the scope of the patent application of the present invention. Equivalent modifications or variations made by persons skilled in the art in light of the present invention are intended to be included within the scope of the following claims. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic view showing an optical coating apparatus according to a first embodiment of the present invention. Figure 2 is a schematic illustration of the coated baffle of the optical coating apparatus of Figure 1 in an open state. Figure 3 is a diagram showing the coating baffle of the optical coating device of Figure 1 in a closed state 11 201024439
意圖。 圖4係本發明第二實施例提供 在開啟狀態時之示意圖。 圖5係圖4中之鍍膜擋板在關 【主要元件符號說明】 光學鍍膜裝置 真空鍍膜室 頂部 底部 · 内壁 凹槽 第一空間 第二空間 待鍍元件承載架 轉動轴 鍍膜源 掛禍 鍍膜材料 電子槍 鍍膜擋板 遮蓋 基板 待鍵元件 第一擋板 之光學鍍膜裝置之鍍膜擋板 閉狀態時之示意圖。 100 10 11 12 13 14 15 16 20 21 30 31 32 33 40 ， 240 50 60 70 41 ， 241 12 242 201024439 第二播板 42， 通孑L 411， 旋轉轴 421， 子擋板 2421 2411 2422intention. Fig. 4 is a schematic view showing the second embodiment of the present invention in an open state. Figure 5 is the coating baffle in Figure 4 in the [main component symbol description] optical coating device vacuum coating chamber top bottom · inner wall groove first space second space to be plated component carrier rotating shaft coating source hanging coating material electron gun The coating baffle covers the substrate when the substrate of the first baffle of the substrate is to be closed. 100 10 11 12 13 14 15 16 20 21 30 31 32 33 40 , 240 50 60 70 41 , 241 12 242 201024439 Second board 42, overnight L 411, rotary shaft 421, sub-baffle 2421 2411 2422
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