TW201024336A - Water soluble photo-sensitive polyimide polymer, process for preparing the same, and photoresist composition containing the same - Google Patents
Water soluble photo-sensitive polyimide polymer, process for preparing the same, and photoresist composition containing the same Download PDFInfo
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201024336 六、發明說明: 【發明所屬之技術領域】 本發明有關一種水溶性感光聚醯亞胺聚合物以及其製法。詳 言之:係有關一種對有機溶劑及鹼性水溶液具有良好溶解度、於 成臈後具有優異耐熱性、撓性以及電絕緣特性之水溶性咸 亞胺聚合物,而可廣泛應用於電子產業。 心眾 【先前技術】 於半導體製程中,有利用光微影蝕刻技術於基板上進行線路 繪製,於賴f彡侧技财必制賴感絲雛,藉性 =脂對輻射狀感光性,而可在透過具有所需_之光罩曝光 後,利用鹼溶液等洗除曝光部份或未曝光部 需圖案之印刷電路板。 所201024336 VI. Description of the Invention: [Technical Field of the Invention] The present invention relates to a water-soluble photosensitive polyimide pigment polymer and a process for the preparation thereof. In detail, it is a water-soluble salty imide polymer which has good solubility in organic solvents and alkaline aqueous solutions, and has excellent heat resistance, flexibility and electrical insulating properties after being formed into a crucible, and can be widely used in the electronics industry. In the semiconductor process, in the semiconductor process, there is the use of photolithography etching technology to draw lines on the substrate, and the technology on the side of the 赖 彡 必 必 必 , , , , , , , , 脂 脂 脂 脂 脂 脂 脂 脂 脂The exposed printed circuit board or the unexposed portion of the printed circuit board may be removed by an alkali solution or the like after being exposed through the reticle having the desired ray. Place
其中R為氫原子或曱基。 反應Wherein R is a hydrogen atom or a fluorenyl group. reaction
’再與四酸二酐單體反 4 201024336 應’得到上述式(l)之聚醯亞胺前驅物。 單位f ίϋ6025113則揭示具有以下述式⑶及式(4)表 早位之聚醯亞胺前驅物: 示之重複 —RJ—CONH—R2_ (°°〇的2 lFurther, the polydiimine precursor of the above formula (1) is obtained by reacting with the tetrabasic dianhydride monomer 4 201024336. The unit f ίϋ6025113 discloses a polyimine precursor having an early position in the following formulas (3) and (4): repeating - RJ-CONH-R2_ (2 l of °°〇)
⑶ (4) 參 ^T,%ZZ7Z%^ : 為具荬式種水溶性感光聚醯亞胺聚合物,其特徵(3) (4) 参^T,%ZZ7Z%^ : is a water-soluble photosensitive polyimine polymer with hydrazine type, its characteristics
N 2 ^/r M 6 II -O—C—R——CIO N H OA Vo ^ , IRf V_J OA Yo R3IAV - N ΟΛ^ΥΟ OA Yo ¾ 3N 2 ^/r M 6 II -O—C—R——CIO N H OA Vo ^ , IRf V_J OA Yo R3IAV - N ΟΛ^ΥΟ OA Yo 3⁄4 3
R4 T N o A VMO R OA Yo N a o H3.iH3 c—sIc Η3/^ν H3 cIsIc 5 201024336 r9 R6= -CRf=CR8-R4 T N o A VMO R OA Yo N a o H3.iH3 c-sIc Η3/^ν H3 cIsIc 5 201024336 r9 R6= -CRf=CR8-
r9 或R9 or
i古m含有4 _上碳原子之四財機基%為3價或4 價有機基,其_L可補狀料絲;&表 ,示OH或C00H基’· &及R5可相同亦可^同至^表機矛基為 3 1至6個碳原子之伸烷基、含6至2〇個碳原子之伸 、ς ί烷ί音伸基:烷基;仏及R8可相同或不同且獨t選自 基、含1_2G個碳之直鏈或環綠基、含㈣個碳 ❹ 鲁 f ίίϊί、,基及芳烧基;R9表示氫原子或含有1至6個礙 原子之烧基;X表示1或2之整數;y表示〇、丨或2之整 b及η表示大於或等於丨之整數;m及k表示大於〇之整’ 上述各重複單位可為喪段聚合亦可為隨機聚合。 , 本水溶性感光聚酿亞胺聚合物之藉由凝谬滲透層析 法(GPC)轉換成聚苯乙烯計之重量平均分子量_約 10,000-300,000 , 2〇,〇〇〇^15〇,〇〇〇 , ίi ^料Μ㈣.85,且其5%細貞失溫度(Td A) 低於350 C,較好低於340°C。 ” 取人ί發明中,上述特性黏度係將聚合物濃度配製為O.Sg/dL之 ί 溶液,以N•甲基D比咯侧_")作為溶劑,以毛細管黏度 ^(Ubbdohode V1Scometer)測定,再以下述公式計算其固有黏度之 值: V inh=ln(t/t0)/0.5(g/dl) 其中t0-;谷劑通過黏度計上下兩刻度的空白組時間(秒) 聚合物溶液通過黏度計上下兩刻度的時間(秒)。 L上述5%熱分解溫度(Td(95%))係使用熱重分析儀 (TGA)測定之樹脂5%熱分解時之溫度。 本發月之水; 谷性感光性聚醯亞胺聚合物驗性水溶液中之溶 、、^優異’於塗佈成膜(膜厚10〜25μιη)時,將膜片(尺寸:9*5.5cm2) 浴於1000毫升之碳酸納水溶液中之溶解時間少於2分 6 201024336 鐘’顯示具有良好的鹼水溶液溶解度。 本發明又有關一種製備具有下式(1)之重 光聚醯亞胺聚合物之方法: 單位之水/奋性感 Οi ancient m contains 4 _ upper carbon atom% of the machine base is a trivalent or tetravalent organic group, its _L can be filled with filament; & table, showing OH or C00H base '· & and R5 can be the same ^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^ Or different and uniquely selected from the group consisting of a straight chain or a ring green group containing 1_2G carbons, containing (four) carbon ❹ f f f , , , ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; X represents an integer of 1 or 2; y represents the whole b and η of 〇, 丨 or 2 represents an integer greater than or equal to 丨; m and k represent an integer greater than 〇 ' The above repeating units may be a stagnation polymerization Can be a random aggregation. The weight average molecular weight of the water-soluble photosensitive polyamidene polymer converted to polystyrene by gel permeation chromatography (GPC) _ about 10,000-300,000, 2 〇, 〇〇〇^15 〇, 〇 〇〇, ίi Μ (4).85, and its 5% fine temperature loss (Td A) is lower than 350 C, preferably lower than 340 ° C. In the invention, the above-mentioned intrinsic viscosity is prepared by formulating the polymer concentration as a solution of O.Sg/dL, using N•methyl D to the side of the _" as a solvent, and using a capillary viscosity^(Ubbdohode V1Scometer) Determination, and then calculate the value of its intrinsic viscosity by the following formula: V inh = ln (t / t0) / 0.5 (g / dl) where t0 -; the amount of the grain through the viscosity meter up and down two sets of blank time (seconds) The time (seconds) in which the solution passes through the upper and lower scales of the viscometer. The above 5% thermal decomposition temperature (Td (95%)) is the temperature at which the resin is thermally decomposed by 5% using a thermogravimetric analyzer (TGA). Water; the solution of the valley photosensitive photopolymerizable polyimide in an aqueous solution, and excellent in the film formation (film thickness: 10 to 25 μm), the film (size: 9*5.5 cm2) The dissolution time in a 1000 ml aqueous solution of sodium carbonate is less than 2 minutes 6 201024336 'shows good solubility in aqueous alkali solution. The invention further relates to a method for preparing a heavy-weight polyimine polymer having the following formula (1): Unit of water / fucking sexy
OA VMO R OA Yo N N Elc rh 2OA VMO R OA Yo N N Elc rh 2
J >lcIRIcIo OA vno R OA Yo 4 f ΟΛ ΫΠΟ R onMU^ ΥΠΟ οη3ιη3 chI-siIc a ?Η3ίιίJ >lcIRIcIo OA vno R OA Yo 4 f ΟΛ ΫΠΟ R onMU^ ΥΠΟ οη3ιη3 chI-siIc a ?Η3ίιί
R r9 (I) -CRt=CR8-R r9 (I) -CRt=CR8-
r9 或R9 or
ί/舰1 i t有^上碳原子之四價有機基;化為3價或 Γΐϋ可視情況又帶有絲%表示2價至4價有機基 鲁 基;心及心可相同亦可不同,分別表利 基R含6至20個碳原子之伸芳基、' 料氧基伸絲;R8可烟或刊簡立為選g ,、鹵,、縣、含1-20個碳之直鏈或環狀烷基、含6_2〇個爷 ^子之芳基、絲基及芳絲;R9表示氫原子或含^至6個专 原子之燒f ; X表示1或2之整數;y表示〇、丨或2之整數,· a b及η表;^大於或等於〗之整數;m&k表示大於〇之整數]•肩 中各重複單為可為嵌段聚合或無規聚合; 該方法包括下列步驟: 應 幾酸二酐與具有幾基及/或幾基官能基之二胺進行及 ,獲得主鏈上具有羧基及/或羥基官能基之聚醯胺酸前 中贈酸二轉二胺之莫耳#量比為喊酸二酐:^二其 0.8-1 : 1.2 〇 2)使上述(a)所得之主鏈上具有羧基及/或羥基官能基之聚醯胺 酸前驅物進行加熱環化,獲得主鏈上具有羧基及/或羥基官能基之 201024336 聚醯亞胺;及 ΛR6 p Ο (Π) R9 ❹ί/ship 1 it has a tetravalent organic group on the carbon atom; it is converted to a trivalent or Γΐϋ, and a silky % means a 2 to 4 organic ruthenium; the heart and the heart can be the same or different, Do not look at the niche R with 6 to 20 carbon atoms of the extended aryl group, 'oxyl extension wire; R8 can be smoked or published as a choice g, halogen, county, 1-20 carbon linear or ring An alkyl group, an aryl group containing 6_2〇, a silk group and an aromatic yarn; R9 represents a hydrogen atom or a burning atom containing 6 to 6 specific atoms; X represents an integer of 1 or 2; y represents 〇, 丨Or an integer of 2, · ab and η; ^ is greater than or equal to the integer; m & k means an integer greater than ]] • each repeat in the shoulder may be block polymerization or random polymerization; the method includes the following steps : The acid dianhydride is reacted with a diamine having a plurality of groups and/or a plurality of functional groups to obtain a poly-diamine which has a carboxyl group and/or a hydroxyl group in the main chain. The amount of the ear # is an acid dianhydride: ^2 0.8-1 : 1.2 〇 2) heating and cyclizing the polyproline precursor having a carboxyl group and/or a hydroxyl group in the main chain obtained in the above (a) , get the main 201024336 polyimine having a carboxyl group and/or a hydroxyl functional group in the chain; and ΛR6 p Ο (Π) R9 ❹
Rg (式中,R6= -CRt=CR8 相或不同且獨立為選自氣、齒素、^基、含wo個 ίίίϊ含㈣個碳原子之芳基、烧芳基及芳烧 暴,%表不氫原子或含有Ϊ至6個碳原子之烷基); 狀财^複單狀线从有研酸基之聚 月法中,上述步驟⑻中所用之具有縣及/或經基 可使用僅具錢基官能基之二胺、僅具有經基官 _具赫基及絲之官祕之二胺。於僅使用 作為起始二胺時’可獲得上述通式(1)中Α僅 / it聚合單位;且藉由控制二酸酐(11)之含量可控制m之值, =如二酸酐(Π)當量與羥基當量相等時,m成為G,於縫當量大 Ϊ(Π)當量時,m成為大於G。於使用_具極基及叛基 之二胺時’可獲得上述通式①中A表示0H及CO〇H - &位/且藉由控制二酸酐(II)之含量可控制m之值,例如 二^肝⑻當量與經基當量相等時’ m成為G,於錄當量大於含 一酸酐(II)當量時,瓜成為大於0 ^ 〜t發明之方法中’上述步驟⑻中所用之具有絲及/或經基 吕月fa 土之一胺亦可部份經具有梦氧燒官能基之二胺所置換。 本發明中具有矽氧燒官能基之二胺為下列之二胺:Rg (wherein R6=-CRt=CR8 phase or different and independently selected from the group consisting of gas, dentate, ^ base, aryl group containing γ ίίίϊ (four) carbon atoms, aryl group and aromatic burning, % table a non-hydrogen atom or an alkyl group containing ruthenium to 6 carbon atoms; a polyvalent single-line from the polyacid method of the acid group, the use of the county and/or the base used in the above step (8) can be used only A diamine having a hydroxyl group functional group, and having only a diamine having a basic character of the base group. When only the starting diamine is used, 'only the / it polymerization unit in the above formula (1) can be obtained; and the value of m can be controlled by controlling the content of the dianhydride (11), such as dianhydride (Π) When the equivalent is equal to the hydroxyl equivalent, m becomes G, and when the slit equivalent is larger than Ϊ (Π), m becomes greater than G. When using a diamine having a polar group and a thiol group, 'A' in the above formula 1 can be used to represent 0H and CO〇H - & / and the value of m can be controlled by controlling the content of the dianhydride (II), For example, when the (2) equivalent of the liver is equal to the base equivalent, 'm becomes G, and when the equivalent is greater than the equivalent of the monobasic anhydride (II), the melon becomes greater than 0^~t. In the method of the invention, the silk used in the above step (8) And/or one of the amines of the Kiru fa soil may also be partially replaced by a diamine having a dream oxygenating functional group. The diamine having an oxime-oxygen functional group in the present invention is the following diamine:
S 201024336S 201024336
H2N—(CH2)3~Si-〇—Si—(CH2)3—ΝΗα, CHj CH3H2N—(CH2)3~Si-〇—Si—(CH2)3—ΝΗα, CHj CH3
(2) CHa 013 H2N—(CH2)4—Si-0~Si-(CHa)4-NH2, ch3 ch3 ch3 ch3 HjN—(CH^h—Si—O—Si—(CH2)3—NH2, (3)(2) CHa 013 H2N—(CH2)4-—Si-0~Si-(CHa)4-NH2, ch3 ch3 ch3 ch3 HjN—(CH^h—Si—O—Si—(CH2)3-NH2, ( 3)
ch3 ch3 -Sh-O—Si—C CH3 ch3 ⑹ ch3 ❹ 本發明之方法中’上述步驟⑻中所用⑺ 有叛基及/紐基冑能基之二舰具切 外’在不損及本發明最終聚醯亞胺樹脂所 併用製造聚酿亞胺樹脂中常用之二胺。1之_内又了 至方述步驟⑻之縮合反應係在常麼下於室溫 度二r)之環化反應係在 本發明之方法中,上述步驟⑻中, 經料嫩嶋==換= 夕莖i告旦t例並無特別限制,只要四羧酸二酐對二胺總量 、耳虽!比例在上述範圍内即可,但較好該具有石夕氧炫官能基 201024336 二敎5〜6G莫耳%,更料1G〜4G料%,最好為 劑塗f f ί物可朗作為光_,且於作為光阻 為感=r;S:4 主 (A)且關一種可溶性感光聚酿亞胺樹脂組成物,其包括 甲之重複單狀水溶_光㈣亞雌合物;⑻Ch3 ch3 -Sh-O-Si-C CH3 ch3 (6) ch3 ❹ In the method of the present invention, (7) used in the above step (8), the second ship having the rebel base and//new base energy base is cut off, without damaging the present invention. The final polyimine resin is used in combination to produce a diamine commonly used in the polyamidene resin. In the method of the present invention, the condensation reaction of the step (8) is carried out in the method of the present invention. In the above step (8), the material is tender ==== There is no particular limitation on the case of the stalk i, but as long as the total amount of the dicarboxylic acid dianhydride to the diamine, the ear! The ratio may be within the above range, but it is preferred to have the diarrhea functional group 201024336 敎 5~6G 摩尔%, more 1G 〜4G%, preferably the agent ff ί 可 朗 can be used as light _ And as a photoresist for the sense = r; S: 4 main (A) and a soluble photosensitive polyimide resin composition, which comprises a repeating monomorphic water-soluble (tetra) sub-estiate; (8)
ίϋ ^早騎翻;以及(〇光起_。其巾齡(Α):成 刀之重罝比例為100 : 1〇〜2〇〇,較好為1〇〇 : 4〇〜1〇〇。成分 ,始f ’以成分⑷為100重量〇/°時,其所含比例為0.1〜15.0 重篁%,較好為1.0〜5.0重量%。 【實施方式】 本發明中用以製備聚醯亞胺之方法步驟(&)中所用之四羧酸 二野實例可舉例如(但*限於)2,2,_雙(3,4_二幾基苯基)六氟丙燒 二酐(6FDA)、苯均四酸二酐(pmda)、4,4,_氧基二酞酸酐 (ODPA)、3,3’,4,4、聯苯四羧酸二酐(bPDA)、3,3,,4,4,_二苯甲酮四 羧酸二酐(BTDA)、伸乙基四羧酸二酐、丁烷四羧酸二酐、環戊 燒四叛酸二酐、2,2’,3,3’-二苯曱酮四羧酸二酐、2,2,,3,3,-聯苯四 ,酸二酐、2,2-雙(3,4-二羧基苯基)丙烷二酐、2,2-雙(2,3-二羧基 苯基)丙烧二酐、雙(3,4-二羧基苯基)醚二酐、雙(3,4-二羧基苯基) 礙二針、1,1_雙(2,3_二羧基苯基)乙烷二酐、雙(2,3_二羧基苯基) 曱烧二野 '雙(3,4-二羧基苯基)曱烷二酐、4,4,·(對苯二氧基)二酞 酸二酐、4,4’-(間-苯二氧基)二酞酸二酐、2,3,6,7_萘四羧酸二酐、 1,4,5,8-萘四羧酸二酐、ι,2,5,6·萘四羧酸二酐、1,2,3,4-苯四羧酸二 Sf ' 3,4,9,10-一萘嵌苯四缓酸二if、2,3,6,7-蒽四叛酸二酐及 1,2,7,8-菲四羧酸二酐等。該等二酸酐可單獨使用一種或以多種之 混合物使用。其中較好為 本發明中製備聚醯亞胺之方法步驟(a)中所使用之具有羧基 及/或羥基官能基之二胺實例可舉例如(但不限於)例如3,5-二胺基 201024336 苯甲酸(0沾2)、3,3,_二羥基_44, 本發明帽備驗雜之方等。 燒官能基之二胺可舉例為例如丨3Hi中所使用之具有發氧 二魏烧(DSI)、1,3_雙(4_胺基義-胺基丙基)_U,3,3-四曱基 雙(3-胺基丙基)-13_二甲其一"^1山3,3_四甲基二矽氧烷、1,3-基>U,3,3-四甲基二:夕氧烧、基二^、U-雙(3-胺基苯 ❹ ❹ 本發明之製備聚酿亞胺之方法步 基及/或誠魏紅1及具了 魏 胺,可舉例相终二胺二 本氧基)本(APB)、4,4,-雙(4-胺基苯氧基 l =B)、雙[4·(3_胺基苯氧基)苯基]甲燒、 ίί其乙二1广雙[4_(3猶苯氧基)苯基]乙垸、2:2郁_(上基 雙㈣3嫌苯氧基)苯基]丁烧、以雙 L、Li基本氧基本基㈠山^^氟丙貌^’-雙斤胺基苯氧 二Ί雙[4·(3_胺严氧,)苯基询、雙[4-(3-胺基苯氧基)苯基] 二-雙[4_(3·胺基苯氧基)苯基]亞颯、雙[4_(3_胺基苯氧基)苯 、:雙[4_(3·胺基苯氧基;)苯基;I趟等。上述雙胺可單獨使用一種或 以夕種混合使用。 本發明之製備聚酿亞胺之方法步驟(a)中,該二酸酐與二胺之 反應可在非質子極性溶劑中進行,非質子極性溶劑之種ϋ無特 別限制,只要不與反應物及產物反應即可。具體實例可舉例如 Ν,Ν-二甲基乙醯胺(DMAc)、Ν-甲基吡咯院酮(νμρ)、Ν,Ν_二甲 基甲酿胺(DMF)、四氫吱喃(THF)、二噁貌、氯仿(qjc13)、二氯 甲烷等。其中較好使用N-甲基吡咯烷酮(NMP)及N,N-二甲基乙 醯胺(DMAc)。 ^ 本發明之製傷聚醯亞胺之方法步驟(a)中,該二酸軒與二胺之 201024336 反應一般在室溫至90°c,較好30至75V夕巾 本發明之製備聚醯亞胺之方法中,於步内進行。 可舉例為馬來酸酐、經取代之馬來酸酐 t中一酸酐(Π) 苯二甲酸酐等。 酸酐經取代之甲撐鄰 本發明之可溶性感光聚醯亞胺樹脂組成 ^_單___為稀_之功能 含有乙烯官能基,故亦有助於組成物照光後之硬化 鬌 醇三甲基丙稀_旨等。李戊—甲基㈣_、二季戊四 劑 ^發明之聚酿亞麟脂於調料光_時, 光、之物/朗的絲始縣在受到可^ 尤緊外7b遠紫外光、電子束以及乂射 卞構會?生裂解產生如游離基、陽離子或陰離;活點 =實及丙稀酸醋單體進行聚合反應者。 肆Ϊ類如以银氯苯基)·4,4,,5,^ 肆(4-乙 |Γα ^ 米哇、2,2’_雙(2_溴苯基)-4,4,,5,5,- 卿,,5,5’-四笨基-U’4 咪::2:2、雙二 及 2,2’-雙(2,4“笨基 八舉例如三苯基膦氧化物(τρ〇 ’可購自basf △司),如雙(2,4,6-三甲基苯曱酿基)苯基麟氧化物㈣顏8i9 12 201024336 (IR819) ’靖自Ciba Geigy公司);烧基苯基網類,例如ι_經基環 己基苯基酮[如以Irgacure 184 (IR184)購自Ciba Geigy公司]、2-曱基曱基σ塞吩基)-2-嗎琳-1-丙-1-酮[如以Irgacure 907 (IR907) 講自Ciba Geigy公司]等。 光起始劑實例又可舉例如苯偶因(Benzoin)類光起始劑例如 苯偶因、苯偶因甲基醚、苯偶因乙基醚、苯偶因異丙基醚、苯偶 因異丁基醚、曱基-2-苯曱醯基苯甲酸酯等以及其類似衍生物。 ^光起始劑實例又可舉例如苯乙酮類結構例如2,2_二曱氧基 -2-苯基苯乙酮[如以!rgacure 65i (IR651)購自aba Gdgy公司]、 參 ❹ 2-羥基-2-ψ基-1-苯基丙小嗣、μ(4_異丙基苯基)_2_經基_2_甲基丙 小酮、4-(2-經基乙氧基)苯基_(2_經基:丙基)酮、以工曱氧基苯 乙酮、2,2-二乙氧基苯乙酮、2_节基_2_二曱胺基小(4_嗎啉基苯基) 丁-1-酮、2,2 -二甲氧基·ι,2·二苯基乙_ι_輞、4_疊氮基苯乙酮、4_ 疊氮基亞>基苯乙酮等以及類似衍生物。 光起始劑實例又可舉例如二苯曱酮類如二苯甲酮、4,4,_雙(二 甲胺基)二苯甲酮、4,4’-雙(二乙胺基)二苯甲酮、3,3’_二甲基_4_ 甲氧基二苯甲酮等及其類似衍生物。 一光起始劑實例又可舉例如具有α-二酮結構之光起始劑,例如 酿基甲酸醋、二苯曱酿基甲酸醋、曱基苯甲醢基甲酸醋等以 及類似衍生物; 具有多核酿結構之光起始劑如該、2乙基蒽親、2_第三丁 如、1,4·蔡藏等及類似街生物’·咕铜類(xanthone)結構之光 類‘衍酮、噻噸酮、2,4_二乙基噻噸酮、2_氯噻噸酮等及 «^具ΐΐ氣結構之光起始劑如4-重氮二苯基胺、4·重氮_4,_曱 4_魏基氧基二苯驗等以及_衍生物; 2:(4, ϋ ‘ -一曱氧基苯乙烯基M,6-雙(三氯甲基)-S-三嘻、 某基,卜雙(三氯甲基>三嗓、2-(2,_漠·4,一曱基苯 ,-雙(二氯甲基)令三嗪、2_(2,_嗟吩基亞乙基)4,6_雙(三氯甲 13 201024336 基)-S-三嗪等以及類似衍生物。 該等光起始劑可單獨使用亦可混合兩種以上使用。相對於成 分(A)為100重量%計時,該光起始劑(C)之使用量為0.1〜15.0重 量%,較好為1.0〜5.0重量%。 本發明將以下列合成例以及實施例更進一步詳細說明,惟該 等合成例以及實施例目的僅用以說明本發明而非用以限制本‘ 明之範圍。 合成例1 將41.〇5克(0.1莫耳)之2,2,·雙_[4-(4·胺基苯氧基)苯基]丙烷 (BAPP)及9.14克(0.06莫耳)之3,5_二胺基苯甲酸(DABZ)及350 ® 克N-甲基吼洛唆酮(NMP)置入1升玻璃反應瓶中’在室溫下激烈 攪拌。加入88.48克(0.2莫耳)之2,2,-雙(3,4·二羧基苯基)六氟丙 烷二酸酐(6FDA)於反應瓶中攪拌1小時後,再加入8.43克(0.039 莫耳)3,3’-二羥基-4,4’-二胺基聯苯(HAP),於室溫攪拌3小時。接 著加入50克甲苯,溫度增高至150〇C反應24小時進行醯亞胺化 (環化)反應,獲得帶有OH基之聚醯亞胺,接著加入3.92克(0.04 莫耳)之馬來酿亞胺(MA) ’於室溫下繼續反應3小時。然後將該 樹脂倒入大量曱醇中析出,可獲得136.2克聚醯亞胺聚合物 (PI-1)(產率:90.01%,IV 為 0.81,Td(95%): 340。〇。 〇 合成例2 • 15.215克(0.1莫耳)的3,5-二胺基苯甲酸(DABZ)和200克的ϋ ϋ ^ Early riding; and (〇光起_. Its towel age (Α): The ratio of the weight of the knife is 100: 1〇~2〇〇, preferably 1〇〇: 4〇~1〇〇. When the component (4) is 100 parts by weight/°, the ratio is 0.1 to 15.0% by weight, preferably 1.0 to 5.0% by weight. [Embodiment] The present invention is used for preparing a poly Examples of the tetracarboxylic acid di-field used in the amine method step (&) may, for example, be (but are limited to) 2,2,-bis(3,4-diphenyl)hexafluoropropane dianhydride (6FDA) ), pyromellitic dianhydride (pmda), 4,4, oxy phthalic anhydride (ODPA), 3,3', 4, 4, biphenyltetracarboxylic dianhydride (bPDA), 3, 3, , 4,4,_benzophenone tetracarboxylic dianhydride (BTDA), ethyltetracarboxylic dianhydride, butane tetracarboxylic dianhydride, cyclopentane tetrareic acid dianhydride, 2, 2', 3,3'-dibenzophenone tetracarboxylic dianhydride, 2,2,3,3,-biphenyltetra, acid dianhydride, 2,2-bis(3,4-dicarboxyphenyl)propane II Anhydride, 2,2-bis(2,3-dicarboxyphenyl)propane dianhydride, bis(3,4-dicarboxyphenyl)ether dianhydride, bis(3,4-dicarboxyphenyl) Needle, 1,1_bis(2,3-dicarboxyphenyl)ethane dianhydride, double (2,3_two Base phenyl) 曱 二 二 ' 'bis (3,4-dicarboxyphenyl) decane dianhydride, 4,4, · (p-phenylenedioxy) dicarboxylic acid dianhydride, 4, 4 '- (between - phenyldioxy)dicarboxylic acid dianhydride, 2,3,6,7-naphthalenetetracarboxylic dianhydride, 1,4,5,8-naphthalenetetracarboxylic dianhydride, ι, 2, 5, 6· Naphthalene tetracarboxylic dianhydride, 1,2,3,4-benzenetetracarboxylic acid di Sf ' 3,4,9,10-naphthalene tetrazoic acid II,2,3,6,7-蒽4 a bismuth dianhydride and a 1,2,7,8-phenanthrenetetracarboxylic dianhydride, etc. The dianhydrides may be used singly or in a mixture of a plurality of them. Among them, a method for preparing a polyimine in the present invention is preferred. Examples of the diamine having a carboxyl group and/or a hydroxyl functional group used in the step (a) include, but are not limited to, for example, 3,5-diamino group 201024336 benzoic acid (0 dip 2), 3, 3, _ Dihydroxy-44, the cap of the present invention is prepared, etc. The diamine of the functional group can be exemplified by, for example, oxime 3Hi having oxydicarbone (DSI) and 1,3 bis (4-amine). Sense-aminopropyl)_U,3,3-tetradecylbis(3-aminopropyl)-13_dimethyl methacrylate <^1 mountain 3,3_tetramethyldioxane, 1 ,3-based>U,3,3-tetramethyldi:oxime, ketone, U-bis(3-amino ❹ ❹ The method for preparing the poly-imine of the present invention is based on the step group and/or Cheng Weihong 1 and has a sulphamine, and can be exemplified by a terminal diamine di- oxy) (APB), 4, 4, - bis ( 4-aminophenoxyl l = B), bis[4·(3_aminophenoxy)phenyl]methyl, ίί, 乙二1广双[4_(3-hexenyloxy)phenyl] Acetyl, 2:2 _ _ (上基双 (4) 3 phenoxy) phenyl] butyl, with double L, Li basic oxy group (a) mountain ^ ^ fluoropropyl appearance ^ '- shuangji amine phenoxy Bismuth [4·(3_amine), phenyl, bis[4-(3-aminophenoxy)phenyl]di-bis[4_(3·aminophenoxy)phenyl] Amidene, bis[4_(3-aminophenoxy)benzene, bis[4-(3.aminophenoxy)phenyl; The above diamines may be used singly or in combination. In the step (a) of the method for preparing a poly-imine of the present invention, the reaction of the dianhydride with the diamine can be carried out in an aprotic polar solvent, and the species of the aprotic polar solvent is not particularly limited as long as it is not reacted with the reactants and The product can be reacted. Specific examples include hydrazine, hydrazine-dimethylacetamide (DMAc), hydrazine-methylpyrrolidone (νμρ), hydrazine, hydrazine-dimethyl ketoamine (DMF), tetrahydrofuran (THF). ), dioxins, chloroform (qjc13), dichloromethane, etc. Among them, N-methylpyrrolidone (NMP) and N,N-dimethylacetamide (DMAc) are preferably used. ^ In the method step (a) of the invention for the production of polyimine, the reaction of the diacid and diamine 201024336 is generally carried out at room temperature to 90 ° C, preferably 30 to 75 V. In the method of imine, it is carried out in steps. For example, maleic anhydride, substituted maleic anhydride t monoanhydride (phthalic acid) phthalic anhydride or the like can be exemplified. The anhydride-substituted methylene is adjacent to the soluble photosensitive polyimide resin of the present invention. The composition of the simple ___ is a dilute _ function containing an ethylene functional group, so it also contributes to the hardening of the sterol trimethyl group after the composition is illuminated. Acrylic _ purpose and so on. Li Wu - methyl (four) _, two quarters of the four doses ^ invented the fragrant Yalin fat in the seasoning light _, light, the object / Lang's Sishou County is in the heat of the 7b far ultraviolet light, electron beam and The 卞 卞 会 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生Anthraquinones such as silver chlorophenyl)·4,4,,5,^ 肆(4-B|Γα ^Miwa, 2,2'_bis(2_bromophenyl)-4,4,,5 ,5,- 卿,,5,5'-four stupid-U'4 Mic::2:2, double two and 2,2'-double (2,4" stupid eight, such as triphenylphosphine oxide (τρ〇' can be purchased from basf △ Division), such as bis (2,4,6-trimethylphenyl fluorene) phenyl lanthanum oxide (four) Yan 8i9 12 201024336 (IR819) 'Jing from Ciba Geigy Company An alkylene network such as i-cyclohexyl phenyl ketone [as purchased from Ciba Geigy, Inc., Irgacure 184 (IR184), 2-mercaptodecyl σ-septenyl)-2- holly- 1-propan-1-one [for example, Irgacure 907 (IR907) from Ciba Geigy Co., Ltd.], etc. Examples of the photoinitiator are, for example, Benzoin-based photoinitiators such as benzoin and benzophenone. In view of methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, mercapto-2-phenylmercaptobenzoate, and the like. Further, examples of the initiator include, for example, an acetophenone-based structure such as 2,2-dimethoxy-2-phenylacetophenone [e.g., from aba Gdgy Co., Ltd. with !rgacure 65i (IR651)], ginseng 2- Hydroxy-2-indenyl-1 -Phenylpropanoid, μ(4_isopropylphenyl)_2_transyl-2-methylpropanone, 4-(2-carbylethoxy)phenyl-(2_base: Propyl)ketone, fluorenyloxyacetophenone, 2,2-diethoxyacetophenone, 2-mercapto-2-diamine, small (4-morpholinylphenyl)butane-1 -ketone, 2,2-dimethoxy·ι,2·diphenylethyl_ι_辋, 4_azidoacetophenone, 4_azidoylide> acetophenone, and the like Examples of photoinitiators include, for example, benzophenones such as benzophenone, 4,4, bis(dimethylamino)benzophenone, and 4,4'-bis(diethylamino). Benzophenone, 3,3'-dimethyl-4_methoxybenzophenone, and the like and the like. Examples of a photoinitiator include, for example, a photoinitiator having an α-diketone structure. , for example, glycerin vinegar, diphenyl sulfonate carboxylic acid vinegar, mercapto benzhydryl carboxylic acid vinegar, and the like; and a photoinitiator having a polynuclear brewing structure, such as 2, ethyl hydrazine, 2 _ San Dingru, 1,4·Cai Zang, etc. and similar street organisms, 'xanthone' structure, light class, ketone, thioxanthone, 2,4_diethylthioxanthone, 2-chlorothiazide Tons of ketones and the like Structured photoinitiators such as 4-diazodiphenylamine, 4·diazo-4,_曱4_weilkoxydiphenyl, and _derivatives; 2:(4, ϋ ' - 曱Oxystyryl M,6-bis(trichloromethyl)-S-triterpene, a certain group, bis (trichloromethyl), triterpenoid, 2-(2, _ _ 4, fluorenyl Benzene, -bis(dichloromethyl)-triazine, 2-(2,-nonylphenylene) 4,6-bis(trichloromethyl 13 201024336)-S-triazine, and the like, and similar derivatives. These photoinitiators may be used singly or in combination of two or more. The photoinitiator (C) is used in an amount of 0.1 to 15.0% by weight, preferably 1.0 to 5.0% by weight, based on 100 parts by weight of the component (A). The present invention will be further illustrated in the following examples and examples, which are intended to be illustrative only and not to limit the scope of the invention. Synthesis Example 1 41. 5 g (0.1 mol) of 2,2,·bis-[4-(4·aminophenoxy)phenyl]propane (BAPP) and 9.14 g (0.06 mol) 3,5-Diaminobenzoic acid (DABZ) and 350 ® grams of N-methyl fluorenone (NMP) were placed in a 1 liter glass reaction flask 'with vigorous stirring at room temperature. After adding 88.48 g (0.2 mol) of 2,2,-bis(3,4.dicarboxyphenyl)hexafluoropropane dianhydride (6FDA) in a reaction flask for 1 hour, then 8.43 g (0.039 mol) was added. 3,3'-Dihydroxy-4,4'-diaminobiphenyl (HAP), stirred at room temperature for 3 hours. Then, 50 g of toluene was added, and the temperature was increased to 150 ° C for 24 hours to carry out a hydrazine imidization (cyclization) reaction to obtain a polyimine with an OH group, followed by the addition of 3.92 g (0.04 mol) of malt. The imine (MA) ' continued to react at room temperature for 3 hours. Then, the resin was poured into a large amount of decyl alcohol to precipitate, and 136.2 g of a polyimine polymer (PI-1) was obtained (yield: 90.01%, IV was 0.81, Td (95%): 340. 〇. 〇 Synthesis Example 2 • 15.215 g (0.1 mol) of 3,5-diaminobenzoic acid (DABZ) and 200 g
置入1L的玻璃反應斧中,在室溫下劇烈攪拌。加入44.42 克(0.1莫耳)的2,2’-雙(3,4-二羧基苯基)_六氟丙烷二酸酐(6FDA) 和32.22克(0.1莫耳)的3,3,4,4-二苯曱酮四羧酸二酐(BTDA),於 反應中攪拌1小時後,再加入21.19克(0.098莫耳)的3,3,-二羥基 二胺基聯苯於室溫中攪拌3小時。然後加入3〇克的甲苯, 提高溫度至150°C反應24小時進行醯亞胺化(環化)反應,可得到 一個帶有OH基的聚醯亞胺,然後再加入5 88克(〇 〇6莫耳)的馬 來酸酐於室溫中繼續反應3小時。然後將該樹脂倒入大量甲醇中 析出’即可得到112.7g的聚醯亞胺聚合物奶_2)(產率:94 8%,IV 14 201024336 為 0.76,Td: 336°C)。 合成例3 15.215克(0.1莫耳)的3,5-二胺基苯甲酸和3.847克(0.02莫耳) 之1,3-雙(3-胺基丙基)_U,3,3-四曱基二矽氧烷(DSI)及460克的 NMP置入1L的玻璃反應斧中,在室溫下劇烈攪拌。加入32.22 * 克(0.1莫耳)的3,3,4,4-二苯甲_四竣酸二肝(BTDA)和31.02克(〇.1 莫耳)的3,3,4,4-二苯基醚四羧酸二酐(〇DPA)於反應中攪拌1小時 後,再加入29.3克(0.08莫耳)的2,2-雙(3-胺基-4-羥基笨基)六氣 丙烷(BAFA)於室溫中攪拌3小時。然後加入90克的甲苯,提高 溫度至150°C反應24小時進行醯亞胺化(環化)反應,可得到帶有 _ OH基的聚醯亞胺’然後再加入5.88克(0.06莫耳)的馬來酸酐於 室溫中繼續反應3小時。然後將該樹脂倒入大量甲醇中析出,即 可得到111.3g的聚醯亞胺聚合物(ρι_3)(產率32.3%,IV為0.67, Td: 335°C)。 比較合成例1 41.〇5克(0.1莫耳)的2,2,·雙胺基苯氧基]苯基)丙烷 (BAPP)和9.14克(0.06莫耳)的3,5_二胺基苯甲酸(DABZ)和350 克的NMP置入1L的玻璃反應斧中,在室溫下劇烈攪拌。加入 88.84克(0.2莫耳)的2,2,-雙(3,4-二羧基苯基)六氟丙烷二酸酐 ❹ (6FDA)於反應中擾拌1小時後,再加入8.43克(0.039莫耳)的3,3,- • 二經基_4,4’-二胺基-聯苯(HAP)於室溫中攪拌3小時。然後加入 50克胃的甲苯,提高溫度至150°C反應24小時,然後將該樹脂倒 入大量甲醇中析出,即可得到137.3克的聚醯亞胺聚合物 (產率:93.1%,iv 為 ο.”,Td: 343。〇。Place in a 1 L glass reaction axe and stir vigorously at room temperature. Add 44.42 g (0.1 mol) of 2,2'-bis(3,4-dicarboxyphenyl)-hexafluoropropane dianhydride (6FDA) and 32.22 g (0.1 mol) of 3,3,4,4 - Diphenyl fluorenone tetracarboxylic dianhydride (BTDA), after stirring for 1 hour in the reaction, adding 21.19 g (0.098 mol) of 3,3,-dihydroxydiaminobiphenyl at room temperature for stirring 3 hour. Then, 3 g of toluene was added, and the temperature was raised to 150 ° C for 24 hours to carry out a hydrazine imidization (cyclization) reaction, and a polyimine with an OH group was obtained, and then 5 88 g (〇〇) was added. The maleic anhydride of 6 moles was allowed to react for 3 hours at room temperature. Then, the resin was poured into a large amount of methanol to precipitate' to obtain 112.7 g of polyamidene polymer milk 2) (yield: 94 8%, IV 14 201024336 was 0.76, Td: 336 ° C). Synthesis Example 3 15.215 g (0.1 mol) of 3,5-diaminobenzoic acid and 3.847 g (0.02 mol) of 1,3-bis(3-aminopropyl)_U,3,3-tetraindole Dioxazane (DSI) and 460 g of NMP were placed in a 1 L glass reaction axe and stirred vigorously at room temperature. Add 3,3,4,4-two of 32.22 * g (0.1 mol) of 3,3,4,4-dibenzoyltetradecanoic acid (BTDA) and 31.02 g (〇.1 mol) After phenyl ether tetracarboxylic dianhydride (〇DPA) was stirred for 1 hour in the reaction, 29.3 g (0.08 mol) of 2,2-bis(3-amino-4-hydroxyphenyl)hexapropane was added. (BAFA) was stirred at room temperature for 3 hours. Then, 90 g of toluene was added, and the temperature was raised to 150 ° C for 24 hours to carry out a hydrazine imidization (cyclization) reaction, and a polyimine with an OH group was obtained, and then 5.88 g (0.06 mol) was added. The maleic anhydride was allowed to react for 3 hours at room temperature. Then, the resin was poured into a large amount of methanol to obtain 111.3 g of a polyimine polymer (ρι_3) (yield 32.3%, IV: 0.67, Td: 335 ° C). Comparative Synthesis Example 1 41. 5 g (0.1 mol) of 2,2,-diaminophenoxy]phenyl)propane (BAPP) and 9.14 g (0.06 mol) of 3,5-diamino group Benzoic acid (DABZ) and 350 grams of NMP were placed in a 1 L glass reaction axe and stirred vigorously at room temperature. After adding 88.84 g (0.2 mol) of 2,2,-bis(3,4-dicarboxyphenyl)hexafluoropropane dianhydride oxime (6FDA) in the reaction for 1 hour, add 8.43 g (0.039 mol). 3,3,- • Di-based 4,4'-diamino-biphenyl (HAP) of the ear) was stirred at room temperature for 3 hours. Then, 50 g of stomach toluene was added, and the temperature was raised to 150 ° C for 24 hours, and then the resin was poured into a large amount of methanol to precipitate, thereby obtaining 137.3 g of a polyimine polymer (yield: 93.1%, iv was ο.”, Td: 343. Hey.
上述合成例及比較例之反應物、其量及其物理數據概述於下 合成例1 (PI-1)The reactants, amounts thereof and physical data of the above synthesis examples and comparative examples are summarized in the following Synthesis Example 1 (PI-1)
BAPP(莫耳)(U 合成例2 合成例3 比較合成例 (ΡΙ-2) (ΡΙ-3) 1(ΡΙ-〇 15 201024336 DABZ(莫耳) 0.06 0.1 0.1 0.06 ΗΑΡ (莫耳) 0.039 0.098 0.039 BAFA(莫耳) 0.08 6FDA(莫耳) 0.2 0.1 0.2 BTDA(莫耳) 0.1 0.1 ODPA(莫耳) 0.1 ΜΑ(莫耳) 0.04 0.098 0.06 DSI 0.02 IV(特性黏度) 0.81 0.76 0.67 0.79 Td(95%)C°〇 340 336 335 343 製造例1感光光阻保護膜(Coverlay)之製作 20克的PI4、0.8克的IR651(光聚合起始劑)、7.2克的乙二 醇二丙烯酸酯(M-1)和2.8克的三羥乙基丙烷三甲基丙烯酸酯 (M-2) ’溶解於i24g的NMP ’並於室溫擾拌3小時後,即可得 到感光Η膠(V-1)。 使用刮板塗佈(間隙=100μτη)將ΡΙ膠塗佈在聚苯二曱酸乙二 酯(PET)上,並以9(TC/13分鐘烘烤。將其烘烤後的Η膜在轉印 機上以120 C、壓力1 kgfcm與銅落壓合。將此積層物具有所需 ® 圖案之透過光罩以紫外線曝光裝置(型號ORC-OB-IOOO,〇rc • MANUFACTRUING CO.製造)進行曝光(500mJ/cm2),並用 1 wt%BAPP (Mole) (U Synthesis Example 2 Synthesis Example 3 Comparative Synthesis Example (ΡΙ-2) (ΡΙ-3) 1(ΡΙ-〇15 201024336 DABZ(莫耳) 0.06 0.1 0.1 0.06 ΗΑΡ (mole) 0.039 0.098 0.039 BAFA (mole) 0.08 6FDA (mole) 0.2 0.1 0.2 BTDA (mole) 0.1 0.1 ODPA (mole) 0.1 ΜΑ (mole) 0.04 0.098 0.06 DSI 0.02 IV (intrinsic viscosity) 0.81 0.76 0.67 0.79 Td (95% C°〇340 336 335 343 Production Example 1 Photolithographic Protective Film (Coverlay) 20 g of PI4, 0.8 g of IR651 (photopolymerization initiator), and 7.2 g of ethylene glycol diacrylate (M- 1) and 2.8 g of trishydroxyethylpropane trimethacrylate (M-2) 'dissolved in i24 g of NMP' and spoiled at room temperature for 3 hours to obtain a photosensitive gel (V-1). The silicone was coated on polyethylene terephthalate (PET) using a squeegee coating (gap = 100 μτη) and baked at 9 (TC/13 minutes. The enamel film after baking was turned The press is pressed with a copper drop at 120 C and a pressure of 1 kgfcm. This laminate has a desired mask with a UV-exposure device (model ORC-OB-IOOO, 〇rc • MANUFACTRUING) CO. Manufacturing) Exposure (500mJ/cm2) with 1 wt%
NafO3水溶液進行顯影2分鐘,再浸泡於純水中洗淨。接著在 100°C/1 小時,150°C/1 小時,200°C/1 小時,250。(:/2 小時供烤。 藉由放大鏡及電子掃描顯微鏡觀察所得光阻圖案,可得到解析/ 密著為100/1〇〇叫的線路圖。 溶解度試驗: 將所得聚醯亞胺洗鑄成膜,取尺寸9*5.5cm2溶解於1〇〇〇毫 升之lwt% NasCO3水溶液中,於2分鐘内完全溶解者,表示為溶 解度”佳”,若超過2分鐘仍留有未溶解物,則表示為溶解度„= 佳” 〇 16 201024336 製造例2感光光阻保護膜之製作 20克的PI-2、0.75克的IR907(汽巴嘉基特用化學品公 品名,2_甲基-l-[4_(甲硫基)苯基])_2_嗎啉基-丙卞嗣)、〇15 ITX(2-異丙基嘆嘴闕)、6克的乙二醇二丙烯酸酯⑽丨)和3的 三經乙基丙炫三甲基丙烯酸醋(M-2),2.5g的季戊四醇二内= 酯(M-3)溶解於130g的NMP,並於室溫搜掉3 *時後 .蠶=ΓΓΓ)。保護膜之製作及Na2C〇3水溶液溶解度試= 製造例3感光光阻保護膜之製作 20克的M-3、0.53克的IR907、0.2克的ITX、3.5克的乙_ ® 醇二丙烯酸酯⑽·1)和3.4克的季戊四醇二丙稀酸g旨(Μ·3)和 克的異氰尿酸三(乙燒丙烯酸酯)以_4)溶解於119克的ΝΜΡ,並 於室溫授拌3小時後,即可得到感光性ΡΙ膠(γ_3)。保護膜之製 作及Na2C〇3水溶液溶解度試驗與製造例1相同。 比較製造例1感光光阻保護膜之製作 20克=PI-C、0.8克的瓜651(2,2-二甲氧基么苯基苯乙酮)、 7.2克的乙二醇二丙烯酸酯和28克的三羥乙基丙烷三甲基 丙烯,Ss(M-2) ’溶解於124克的NMP ’並於室溫攪拌3小時後’ 即可得到感光Η膠(V-C)。保護膜之製作及Na2C03水溶液溶解 ❹ 度試驗與製造例1相同。 • 感光光阻保護臈之調配比例以及溶解度試驗結果示於下表 2 ° 表2 成分(克) 製造例1 製造例2 製造例3 比較製造例 樹脂_ IR651 IR907 (V-1) --乂---- -^±(100) 4.0 —---_ 懸_ PI-2 (100) 3.75 (V-3) PI-3 (100) 2.65 1CV-C) PI-C (100) 4.0 ITX 0.75 1.0 M-1 36.0 -—- 30.0 17.5 36.0 17 201024336 M-2 14.0 17.5 14.0 M-3 12.5 17.0 M-4 10.5 解析度 100/100μπι 80/100μπι 100/100μπι 200/250um 膜厚縮減率 (%) 「約 11% 約7% 約 80/〇 約10% Na2C03水溶 液中之溶解 A__ 佳 佳 佳 不佳The NafO3 aqueous solution was developed for 2 minutes, and then immersed in pure water to wash. Then at 100 ° C / 1 hour, 150 ° C / 1 hour, 200 ° C / 1 hour, 250. (: /2 hours for baking. The pattern of the resolved/closed 100/1 squeak can be obtained by observing the obtained resist pattern by a magnifying glass and an electron scanning microscope. Solubility test: The obtained polyimine is washed and cast into Membrane, the size of 9 * 5.5cm2 dissolved in 1 ml of lwt% NasCO3 aqueous solution, completely dissolved in 2 minutes, expressed as "good" solubility, if more than 2 minutes still left undissolved, it means For the solubility „= 佳” 〇16 201024336 Manufacture of the photosensitive resist film of the production example 2 20 g of PI-2, 0.75 g of IR907 (Ciba Kaki special chemical name, 2_methyl-l-[ 4_(methylthio)phenyl])_2_morpholinyl-propionium), 〇15 ITX (2-isopropyl sputum), 6 g of ethylene glycol diacrylate (10) 丨) and 3 Ethyl ethyl propyl trimethacrylate (M-2), 2.5 g of pentaerythritol diester = ester (M-3) dissolved in 130 g of NMP, and found at room temperature after 3 *. Silkworm = ΓΓΓ ). Preparation of protective film and solubility test of Na2C〇3 aqueous solution = Preparation of photosensitive resist film of Production Example 3 20 g of M-3, 0.53 g of IR907, 0.2 g of ITX, and 3.5 g of B-alcohol diacrylate (10) 1) and 3.4 g of pentaerythritol diacrylic acid g (Μ·3) and gram of isocyanuric acid tris(ethene acrylate) dissolved in 119 g of hydrazine in _4) and mixed at room temperature 3 After a few hours, a photosensitive silicone (γ_3) is obtained. The production of the protective film and the solubility test of the aqueous solution of Na2C〇3 were the same as in Production Example 1. Comparative Production Example 1 Photoresist Protective Film Manufactured 20 g = PI-C, 0.8 g of melon 651 (2,2-dimethoxy phenyl acetophenone), 7.2 g of ethylene glycol diacrylate and 28 g of trishydroxyethylpropane trimethyl propylene, Ss(M-2)' was dissolved in 124 g of NMP' and stirred at room temperature for 3 hours to obtain a photosensitive gel (VC). The production of the protective film and the dissolution of the Na2C03 aqueous solution were the same as in Production Example 1. • The ratio of the photosensitive resist protection 以及 and the solubility test results are shown in the following table 2 ° Table 2 Composition (g) Manufacturing Example 1 Manufacturing Example 2 Manufacturing Example 3 Comparative Manufacturing Resin _ IR651 IR907 (V-1) --乂- --- -^±(100) 4.0 —---_ Suspension _ PI-2 (100) 3.75 (V-3) PI-3 (100) 2.65 1CV-C) PI-C (100) 4.0 ITX 0.75 1.0 M-1 36.0 --- 30.0 17.5 36.0 17 201024336 M-2 14.0 17.5 14.0 M-3 12.5 17.0 M-4 10.5 Resolution 100/100μπι 80/100μπι 100/100μπι 200/250um Film thickness reduction rate (%) "Approx. 11% about 7% about 80/〇 about 10% dissolution in Na2C03 aqueous solution A__ Jiajiajia is not good
聽I 上帶有感光性官能基’且具有酸基故對於驗水溶液具有優異溶解 度。此外,因該感光性官能基直接連接在聚合物主鏈上,&具有 較高Td ’於曝光顯影後’也不會因烘烤導致膜 、 【圖式簡單說明】 【主要元件符號說明】 % 18It has a photosensitive functional group on the listener I and has an acid group, so it has excellent solubility for an aqueous solution. In addition, since the photosensitive functional group is directly bonded to the polymer main chain, & has a higher Td 'after exposure and development, and does not cause film due to baking, [simplified description of the drawing] [Major component symbol description] % 18
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