TW201009495A - Colored photosensitive resin composition - Google Patents

Colored photosensitive resin composition Download PDF

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TW201009495A
TW201009495A TW098118383A TW98118383A TW201009495A TW 201009495 A TW201009495 A TW 201009495A TW 098118383 A TW098118383 A TW 098118383A TW 98118383 A TW98118383 A TW 98118383A TW 201009495 A TW201009495 A TW 201009495A
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Taiwan
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compound
photosensitive resin
resin composition
monomer
acid
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TW098118383A
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Chinese (zh)
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TWI519890B (en
Inventor
Isao Tateno
Masaru Shida
Mitsuru Kondo
Dai Shiota
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Tokyo Ohka Kogyo Co Ltd
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10Esters
    • C08F20/12Esters of monohydric alcohols or phenols
    • C08F20/16Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133512Light shielding layers, e.g. black matrix
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0046Photosensitive materials with perfluoro compounds, e.g. for dry lithography

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Mathematical Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Optical Filters (AREA)

Abstract

The present invention provides a colored photosensitive resin composition having improved ink repellency. The colored photosensitive resin composition contains: a photopolymerizable compound (A), an ink repellent compound (B), a photopolymerization initiator (C) and a coloring agent (D). The ink repellent compound (B) is a copolymer prepared by copolymerizing at least a monomer (b1) having ethylenic unsaturated group and fluorine atoms with acrylic acid (b2). The content of a unit induced from the monomer (b1) having the ethylenic unsaturated group and fluorine atoms in the ink repellent compound (B) is 30-80 mass%, and the content of a unit induced from the acrylic acid (b2) is 0.1-20 mass%.

Description

201009495 六、發明說明: 【發明所屬之技術領域】 本發明係關於一種著色感光性樹脂組成物,特別係關 於一種在形成彩色濾光片之黑色矩陣時適合使用之著色感 光性樹脂組成物。 【先前技術】 液晶顯示器等顯示體係形成為以下結構:在相互對向 而形成有成對電極的2片基板間夾入液晶層。並且,在一 片基板之内側形成具有包括紅色、綠色藍色(B) 等各色之像素區域的彩色濾光片。該彩色濾光片通常為了 提高對比度及防止漏光等,而形成配置成矩陣狀之黑色矩 陣,以劃分R、G、B各色之像素區域。 通常,彩色濾光片係藉由下述而製造:利用光微影法 形成黑色矩陣,再對於藉由該黑色矩陣所劃分之各區域, 對每種R、G、B各色感光性樹脂組成物反覆進行塗佈、曝 光、顯影,藉此在規定位置上形成各色圖案。然而,為了 提高彩色渡光片之生產性,而正探討著利用喷墨方式來製 造彩色濾光片之方法。於此噴墨方式中,係將r、g、b& 色之墨水自噴墨嘴喷出至由已形成之黑色矩陣所劃分之各 區域中’利用熱或光使所蓄積之墨水硬化,藉此而製造彩 色濾光片。 然而,於此喷墨方式φ , ^ 干為防止鄰接之像素區域間之 201009495 墨水發生混色等,而要求用於形成黑色矩陣之感光性樹脂 組成物具有對水或二甲苯等墨水溶劑之抗溶劑性,即所謂 之斥墨性。 作為如上所述之具有斥墨性之著色感光性樹脂組成 物例如於專利文獻i _揭示有含有斥墨劑之負型感光性 ㈣組錢’該彳墨劑係由具有以下單元之聚合物所形 成,即,具有氫原子中之至少!個經敗原子取代的碳數為 © 20以下之烷基(其中,上述烷基包括具有醚性氧原子者) 的聚合單元、以及具有乙稀性雙鍵之聚合單元。該負型感 光性樹脂組成物由斥墨劑之氟烷基而獲得斥墨性。又斥 墨劑含有具有乙烯性雙鍵之聚合單元,因此可利用光照射 而硬化,且斥墨性得到維持。 [專利文獻1]國際公開第2004/042474號小冊子 【發明内容】BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a colored photosensitive resin composition, and more particularly to a colored photosensitive resin composition suitable for use in forming a black matrix of a color filter. [Prior Art] A display system such as a liquid crystal display has a structure in which a liquid crystal layer is sandwiched between two substrates in which a pair of electrodes are formed to face each other. Further, a color filter having pixel regions of respective colors such as red, green blue (B) and the like is formed inside the substrate. In order to improve contrast and prevent light leakage, the color filter is usually formed in a matrix of black matrices to divide pixel regions of R, G, and B colors. In general, a color filter is manufactured by forming a black matrix by photolithography, and for each of the R, G, and B color photosensitive resin compositions for each region divided by the black matrix. Coating, exposure, and development are repeated, thereby forming patterns of the respective colors at predetermined positions. However, in order to improve the productivity of a color light-emitting sheet, a method of manufacturing a color filter by an ink-jet method is being explored. In this ink jet method, inks of r, g, b&amp color are ejected from the ink ejecting nozzle to the respective regions divided by the formed black matrix, and the ink accumulated by the heat or light is hardened. This produces a color filter. However, the ink jet method φ , ^ is dry to prevent color mixing of the 201009495 ink between adjacent pixel regions, and the photosensitive resin composition for forming a black matrix has an anti-solvent for an ink solvent such as water or xylene. Sex, the so-called repellency. The coloring photosensitive resin composition having ink repellency as described above is disclosed, for example, in Patent Document i_, which discloses a negative photosensitive property containing an ink repellent (4). The ink is obtained from a polymer having the following units. Formed, ie, has at least one of the hydrogen atoms! The number of carbon atoms substituted by a single atom is a polymer unit having an alkyl group of 20 or less (wherein the above alkyl group includes an etheric oxygen atom), and a polymer unit having a vinyl double bond. This negative photosensitive resin composition is obtained by the fluoroalkyl group of the ink repellent to obtain ink repellency. Further, since the ink repellent contains a polymer unit having an ethylenic double bond, it can be cured by light irradiation, and ink repellency is maintained. [Patent Document 1] International Publication No. 2004/042474 Booklet [Summary of the Invention]

II

[發明所欲解決之問題] 然而,此專利文獻1所述之負型感光性樹脂組成物雖 然能維持斥墨性,但斥墨性本身卻尚無法滿足,故期望能 更加提升斥墨性。特別是藉由喷墨方式來製造中、小型用 液晶顯不器等顯示體時,為了因應畫素尺寸的微小化,而 必須進一步提升斥墨性。 本發明係鑒於以上課題而·完成者.,目的在於.提供一種 斥墨性進一步提升之之著色感光性樹脂組成物。 201009495 [解決問題之技術手段] 本發明者等人發現,藉由使著色感光性樹脂組成物中 3有特定之斥墨性化合物而可解決上述課題,從而完成本 發明。具體而言,本發明提供如下者。 本發明之著色感光性樹脂組成物係含有光聚合性化合 物(A )、斥墨性化合物(B )、光聚合起始劑(c )以及著 色劑(D)者,其特徵在於:前述斥墨性化合物(B)係至 ❹ 少使具有乙烯性不飽和基及氟原子之單體(bl)、與丙烯酸 (b2)進行共聚合而成的共聚物。 [功效] 根據本發明,可提供一種斥墨性進一步提升之著色感 光性樹脂組成物。該著色感光性樹脂組成物例如適合在形 成彩色濾光片之黑色矩陣時使用。 【實施方式】 $ [實施發明的較佳形態] 以下’對本發明之實施形態加以說明。 本發明之著色感光性樹脂組成物含有光聚合性化合物 (A)、斥墨性化合物(B)、光聚合起始劑(c)以及著色 劑(D)。以下對各成分加以說明、 [光聚合性化合物( A) ] 光聚合性化合物(A)係受到紫外線等光之照射而聚 合、硬化之物質。光聚合性化合物(A )較佳為具有乙稀性 201009495 不餘和基之樹脂或者單體,更佳為將該等進行組合。藉由 將具有乙烯性不飽和基之樹脂與具有乙烯性不餘和基之單 體進行組合’可提高硬化性,容易形成圖案。再者,本說 明書中’在具有乙烯性不飽和基之化合物中,將質量平均 分子量為1000以上者稱為「具有乙烯性不飽和基之樹 月旨」,將質量平均分子量小於1000者稱為「具有乙稀性不 飽和基之單體」。 《具有乙稀性不飽和基之樹脂》 ❷ 作為具有乙烯性不飽和基之樹脂,可列舉:(子基)丙 烯酸、反丁烯二酸、順丁烯二酸、反丁烯二酸單甲酯、反 丁烯二酸單乙酯、(甲基)丙烯酸2-羥乙酯、乙二醇單甲醚(甲 基)丙烯酸酯、乙二醇單乙醚(甲基)丙烯酸酯、(甲基)丙烯 酸甘油酯、(甲基)丙烯醯胺、丙烯腈、曱基丙烯腈、(曱基) 丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸異丁酯、(甲 基)丙烯酸2-乙基己酯、(曱基)丙烯酸苄酯、乙二醇二(甲基) 丙稀酸醋、三乙二帛二丙稀酸醋、2乙二醇二(甲基)丙稀 酸醋、四己二醇二(甲基)丙稀酸醋、丁二醇二甲基丙烯酸 酿、丙二醇二(曱基)丙烯酸醋、三羥甲基丙烷三(甲基)丙烯 酸酯、四羥曱基丙烷四(曱基)丙烯酸醋、季戊四醇三(曱基) 丙烯酸酯、季戊四醇四(甲基)丙烯酸酯、二季戊四醇五(甲 基)丙烯酸醋、二季戊四醇六(甲基)丙烯酸酯、|,6_己二醇 二(甲基)丙烯酸醋、咔β朵環氧二丙烯酸醋(card〇 ΙΟ” di—)等進行聚合而獲得之寡聚物類;使(甲基)丙稀 酸與將多元醇類與-元酸或多元酸進行縮合而獲得之聚酿 201009495 預聚物進行反應而獲得之聚酯(曱基)丙烯酸酯、使多元醇 與具有2個異氰酸酯基之化合物反應後再與(曱基)丙烯酸 進行反應而獲得之聚(甲基)丙烯酸胺基曱酸酯;使雙酚A 型環氧樹脂、雙酚F型環氧樹脂、雙酚S型環氧樹脂、苯 酚或者甲酚酚醛清漆型環氧樹脂、可溶酚醛型環氧樹月旨 (resol epoxy resin)、三苯酚甲烷型環氧樹脂、聚羧酸聚縮 水甘油酯、多元醇聚縮水甘油酯、脂肪族或者脂環式環氧 φ 樹脂、胺環氧樹脂、二羥基苯型環氧樹脂等環氧樹脂與(甲 基)丙烯酸反應而獲得之環氧(甲基)丙烯酸酯樹脂等。此 外,可使用使多元酸酐與環氧(曱基)丙烯酸酯樹脂反應而 獲得之樹脂。 又’具有乙烤性不飽和基之樹腊可較佳地使用:藉由 使環氣化合物(al)與含乙烯性不飽和基之羧酸化合物(a2) 的反應物’進一步與多元酸酐(a3)反應而獲得之樹脂。 〈環_氧化合物(a 1 )〉 作為環氧化合物(al ),可列舉:縮水甘油醚型、縮水 甘油酯型、縮水甘油胺型、脂環型、雙酚A型、雙酚F型、 雙盼S型、聯本型、萘型、薙型、苯盼紛搭清漆型、鄰甲 酚型環氧樹脂等。其中,較佳為聯苯型環氧樹脂。聯苯型 環氧樹脂係於主鏈上具# !個以上的由下述式(aii)所 表示之聯苯骨架,並且具有」個以上之環氧基。又,作為 環氧化合物(al)’較佺為具有2個以上之環氧基者。該環 氧化σ物(al )可單獨使用或者將2種以上組合而使用。 201009495 [化學式1][Problems to be Solved by the Invention] However, although the negative-type photosensitive resin composition described in Patent Document 1 can maintain ink repellent properties, the ink repellent property itself is not satisfactory, and it is desired to further improve the ink repellent property. In particular, when a display body such as a liquid crystal display for medium or small size is manufactured by an ink jet method, it is necessary to further improve the ink repellency in order to reduce the size of the pixel. The present invention has been made in view of the above problems, and an object of the invention is to provide a colored photosensitive resin composition which is further improved in ink repellency. [Technical means for solving the problem] The inventors of the present invention have found that the above problem can be solved by providing a specific ink repellent compound in the colored photosensitive resin composition 3, and the present invention has been completed. Specifically, the present invention provides the following. The colored photosensitive resin composition of the present invention contains a photopolymerizable compound (A), an ink repellent compound (B), a photopolymerization initiator (c), and a color former (D), and is characterized in that the above-mentioned ink repellent The compound (B) is a copolymer obtained by copolymerizing a monomer (b1) having an ethylenically unsaturated group and a fluorine atom with acrylic acid (b2). [Effect] According to the present invention, it is possible to provide a colored photosensitive resin composition which is further improved in ink repellency. The colored photosensitive resin composition is suitable, for example, for use in forming a black matrix of a color filter. [Embodiment] $ [Better Mode for Carrying Out the Invention] Hereinafter, embodiments of the present invention will be described. The colored photosensitive resin composition of the present invention contains a photopolymerizable compound (A), an ink repellent compound (B), a photopolymerization initiator (c), and a color former (D). In the following, each component is described. [Photopolymerizable Compound (A)] The photopolymerizable compound (A) is a compound which is polymerized and cured by irradiation with light such as ultraviolet rays. The photopolymerizable compound (A) is preferably a resin or a monomer having a vinyl group of 201009495, and more preferably these are combined. By combining a resin having an ethylenically unsaturated group with a monomer having an ethylenic group and a group, the hardenability can be improved and a pattern can be easily formed. In the present invention, the compound having an ethylenically unsaturated group is referred to as "a tree having an ethylenically unsaturated group", and the mass average molecular weight is less than 1,000. "Monomers with ethylenically unsaturated groups". "Resin having a ethylenically unsaturated group" ❷ As the resin having an ethylenically unsaturated group, (sub-based) acrylic acid, fumaric acid, maleic acid, and fumaric acid monomethyl Ester, monoethyl fumarate, 2-hydroxyethyl (meth)acrylate, ethylene glycol monomethyl ether (meth) acrylate, ethylene glycol monoethyl ether (meth) acrylate, (methyl ) glyceryl acrylate, (meth) acrylamide, acrylonitrile, mercapto acrylonitrile, methyl (meth) acrylate, ethyl (meth) acrylate, isobutyl (meth) acrylate, (methyl) 2-ethylhexyl acrylate, benzyl (meth) acrylate, ethylene glycol di(meth) acrylate vinegar, triethylenediacetic acid vinegar, 2 ethylene glycol di(meth) propylene Sour vinegar, tetrahexanediol di(meth)acrylic acid vinegar, butanediol dimethacrylic acid brewing, propylene glycol bis(indenyl)acrylic acid vinegar, trimethylolpropane tri(meth)acrylate, tetrahydroxyl Mercaptopropane tetrakis(meth)acrylic acid vinegar, pentaerythritol tris(decyl) acrylate, pentaerythritol tetra(meth)acrylic acid , dipentaerythritol penta (meth) acrylate vinegar, dipentaerythritol hexa (meth) acrylate, |, 6-hexanediol di(meth) acrylate vinegar, 咔β flower epoxy diacrylate vinegar (card〇ΙΟ) di -) an oligomer obtained by polymerization, etc.; a polycondensate obtained by reacting (meth)acrylic acid with a polymerized 201009495 prepolymer obtained by condensing a polyol with a -acid or a polybasic acid An ester (mercapto) acrylate, a poly(meth)acrylic acid amino phthalate obtained by reacting a polyol with a compound having two isocyanate groups and then reacting with (mercapto)acrylic acid; Epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, phenol or cresol novolac type epoxy resin, resol epoxy resin, trisphenol methane type Epoxy resin, polycarboxylate polyglycidyl ester, polyol polyglycidyl ester, aliphatic or alicyclic epoxy φ resin, amine epoxy resin, dihydroxy benzene epoxy resin and other epoxy resins Epoxy (methyl) obtained by acrylic acid reaction An acrylate resin, etc. Further, a resin obtained by reacting a polybasic acid anhydride with an epoxy (fluorenyl) acrylate resin can be used. Further, a tree wax having an ethylenically unsaturated group can be preferably used: by making a ring a resin obtained by reacting a gas compound (al) with a carboxylic acid compound (a2) containing an ethylenically unsaturated group (a2) to obtain a resin which is further reacted with a polybasic acid anhydride (a3). <Cyclo_oxy compound (a 1 )> as an epoxy compound (al), examples thereof include glycidyl ether type, glycidyl ester type, glycidylamine type, alicyclic type, bisphenol A type, bisphenol F type, double expectation type S, combination type, naphthalene type, anthraquinone type Benzene is a varnish type, o-cresol type epoxy resin, etc. Among them, a biphenyl type epoxy resin is preferred. A biphenyl type epoxy resin is used in the main chain with more than #! (aii) The biphenyl skeleton represented and having "more than one epoxy group." Further, the epoxy compound (al)' is preferably one having two or more epoxy groups. The epoxidized sigma (al) may be used singly or in combination of two or more. 201009495 [Chemical Formula 1]

Rlai (a 1 - 1 ) 式(al-1)中,多個Ru分別獨立 网衣不氫原子、碳數j 1〜12之烷基、南原子、或 故系 次了具有取代基之苯基,1表示 〜4之整數。 於聯苯型環氧樹脂中,較佳為推田山 视住為使用由下述式(al-2) 所表示之環氧樹脂,特佳為使用 ^ ^ ^ 用田下述式(al-3)所表示 之環氧樹脂。藉由使用式(al_3)之環氧樹腊可獲得良 好地平衡了靈敏度及溶解性’並且像素邊緣㈣㈨之 (sharp)性、密著性優異 莫 有扭傻兵之著色感先性樹脂組成物》 [化學式2] .Rlai (a 1 - 1 ) In the formula (al-1), a plurality of Ru are independently a net-free hydrogen atom, an alkyl group having a carbon number of j 1 to 12, a south atom, or a phenyl group having a substituent. , 1 represents an integer of ~4. In the biphenyl type epoxy resin, it is preferred to use the epoxy resin represented by the following formula (al-2) for the use of the etatian mountain, and it is particularly preferable to use the following formula (al-3). ) The epoxy resin indicated. By using the epoxy wax of the formula (al_3), it is possible to achieve a good balance of sensitivity and solubility' and the edge of the pixel (4) (9) is excellent in sharpness and adhesion, and the color-sensitive precursor resin composition of the twisted soldier is excellent. 》 [Chemical Formula 2].

式(al-2)、(al-3)巾,多個R2a分別獨立表示氫原子 碳數為1〜12之烧基、齒原?、或可具有取代基之苯基, 表示1〜4之整數。平均值,表示〇〜1〇之數,較佳. 201009495 又,於聯笨型環氧樹脂中,亦較佳為使用由下述式 (al-4 )所表示之環氧樹脂。藉由使用式(ai_4 )之環氧樹 脂,可獲得良好地平衡了靈敏度及溶解性,並且像:邊: 之清晰性、密著性優異之著色感光性樹脂組成物。 、 [化學式3]Formula (al-2), (al-3) towel, and a plurality of R2a independently represent a hydrogen atom, a carbon atom having a carbon number of 1 to 12, and a tooth. Or a phenyl group which may have a substituent, and represents an integer of 1 to 4. The average value indicates the number of 〇~1〇, preferably. 201009495 Further, in the conjugated epoxy resin, an epoxy resin represented by the following formula (al-4) is preferably used. By using the epoxy resin of the formula (ai_4), it is possible to obtain a color-sensitive photosensitive resin composition which is excellent in balance between sensitivity and solubility, and which is excellent in clarity and adhesion. , [Chemical Formula 3]

))

式(al-4)中,多個R&amp;分別獨立表示氫原子、碳數為 1〜12之烷基、鹵原子、或可具有取代基之苯基er為平均 值,表示0〜10之數,較佳為小於i。 〈含乙烯性不飽和基之羧酸化合物(a2)〉 作為含乙烯性不飽和基之羧酸化合物(a2)’較佳為在 分子中含有丙烯基或甲基丙烯基等反應性乙烯性雙鍵之單 羧酸化合物。作為此種含乙烯性不飽和基之羧酸化合物, 可列舉:丙烯酸、曱基丙烯酸、y?-苯乙烯基丙烯酸、沒-糠基丙烯酸、α-氰基肉桂酸、肉桂酸等。該含乙烯性不飽 和基之叛酸化合物( a2)可單獨使用或者將2種以上組合 而使用〇 ... . . ... · . . 作為使環氧化合物(a 1 )與含乙.稀性不.飽和基之叛酸 化合物(a2 )反應之方法,可使用公知之方法。例如可列 201009495 舉以下方法:以三乙胺、卞基乙胺等三級胺;氣化十二貌 基三甲基銨、氯化四甲基錢、氣化四乙基錢、氯化苄基三 乙基銨等四級銨鹽,·吡啶,·三苯基膦等為觸媒’在有機溶 劑中,於5 0 °C〜15 〇 °C之反應溫度’使環氧化合物(a 1 ) 與含乙烯性不飽和基之羧酸化合物(a2)反應數小時〜數 十小時。 環氧化合物(al)與含乙烯性不飽和基之幾酸化合物 (a2)的反應中之使用量比率,以環氧化合物(al )之環 氧當量與含乙烯性不飽和基之叛酸化合物(a2)的幾酸當 量之比計,通常為1:0.5〜1:2,較佳為1:〇8〜1:125, 更佳為1. 1。藉由設為上述範圍’而有提高交聯效率之傾 向,故較佳。 《多元酸酐(a3)&gt; 且包括具有::、&amp;3)係具有2個以上綾基之羧酸的酸酐 ⑼,例如可;】個笨環之化合物。作為此種多 骨架之酸軒、&amp; •如下述式(a3·1)所表示的具有聯 機基而鍵結之缺 a3-2 )所表示的2個笨環經由In the formula (al-4), a plurality of R&amp; each independently represent a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, a halogen atom, or a phenyl er which may have a substituent, and represents an average value of 0 to 10 Preferably, it is less than i. <The carboxylic acid compound (a2) containing an ethylenically unsaturated group> The carboxylic acid compound (a2) containing an ethylenically unsaturated group is preferably a reactive ethylenic group such as a propylene group or a methacryl group in the molecule. A monocarboxylic acid compound of a bond. Examples of such a carboxylic acid compound containing an ethylenically unsaturated group include acrylic acid, mercaptoacrylic acid, y?-styrylacrylic acid, non-mercaptoacrylic acid, α-cyanocinnamic acid, and cinnamic acid. The oleic acid-containing compound (a2) containing an ethylenically unsaturated group may be used singly or in combination of two or more kinds of oxime... as an epoxy compound (a 1 ) and a compound B. A method of reacting a rare acid-saturated compound (a2) with a saturated group can be carried out by a known method. For example, it can be listed as 201009495 by the following methods: tertiary amine such as triethylamine or mercaptoethylamine; gasification of triammonium trimethylammonium chloride, tetramethylammonium chloride, gasified tetraethylamine, benzyl chloride A quaternary ammonium salt such as ethylammonium, pyridine, triphenylphosphine or the like is a catalyst 'in the organic solvent at a reaction temperature of 50 ° C to 15 ° C to make the epoxy compound (a 1 ) The carboxylic acid compound (a2) containing an ethylenically unsaturated group is reacted for several hours to several tens of hours. The ratio of the amount of the epoxy compound (al) to the acid compound (a2) containing an ethylenically unsaturated group, the epoxy equivalent of the epoxy compound (al) and the tickate compound containing an ethylenically unsaturated group The ratio of the acid equivalent of (a2) is usually from 1:0.5 to 1:2, preferably from 1:8 to 1:125, more preferably 1.1. It is preferable to set the above range to improve the crosslinking efficiency. The polybasic acid anhydride (a3)&gt; includes an acid anhydride (9) having a carboxylic acid having two or more mercapto groups of::, &amp; 3), for example, a compound of a stupid ring. As such a multi-skeleton, the two stupid rings represented by the following equation (a3·1) having an interlocking base and the lack of bonding (a3-2)

Sf· ο [化學式4] 201009495 ο ο ο (a 3 — ι )Sf· ο [Chemical Formula 4] 201009495 ο ο ο (a 3 — ι )

-Ο—R4«一 3-2)-Ο—R4«一 3-2)

II 式U3-2)中,R“表示碳數為1〜1〇的可具有取代基 之伸烷基》 、 、藉由使用上述具有2個以上羧基之緩酸的酸酐,可在 光聚合性化合物(A)中導人至少2個苯環。 多元酸酐(a3)除了上述具有至少2個苯環之酸 野以外’可包括其他多·肝。作為其他多元㈣,例如 :列舉:順丁烯二酸酐、丁二酸酐、亞甲基丁二酸酐、鄰 苯::酸酐、四氫鄰笨二甲酸針、六氫鄰苯二甲酸酐、甲 基六虱鄰苯二甲酸酐、甲基四氫鄰苯二曱酸酐、偏苯三甲 均苯四曱酸肝、二苯曱鋼四曱酸二酐、3 -甲基六愈 鄰苯二甲酸酐、&quot;基六氫鄰笨二曱酸酐、3·乙基六氳鄰 苯一甲酸酐、4-乙基六氫鄰苯二甲酸酐、四氫鄰苯二曱酸 酐3甲基四氫鄰苯二甲酸酐、4_甲基四氫鄰苯二甲酸酐 乙基四氫鄰笨二曱酸酐、4_乙基四氫鄰苯二甲酸酐。篇 等多元蟑酐可單獨使用或者將2種以上組合而使用。 作為使環氧化合物(al)與含乙烯性不飽和基之羧餘 11 201009495 .化合物(a2)反應後,進一步與多元酸酐(a3)反應之方 法’可使用公知之方法。又,使用量比率,以環氧化合物 (al)與含乙稀性不飽和基之叛酸化合物(a2)的反應物 中之OH基之莫耳數、與多元酸酐(a3)之酸酐基的當量 比計,通常為1 : 1〜1 : ,較佳為1 : 〇 8〜1 : 0.2。藉 由設為上述範圍,而有對顯影液之溶解性變得適度之傾 向,故較好。 ❹ 藉由使環氧化合物(al)與含乙烯性不飽和基之羧酸 化合物(a2)的反應物進一步與多元酸酐(a3)反應而獲 得之樹脂的酸價,以樹脂固體成分計,較佳為1〇 mgK:〇H/g 〜150 mgKOH/g,更佳為 70 mgKOH/g〜110 mgKOH/g。藉 由將樹脂之酸價設為10 mgK〇H/g以上,可獲得對顯影液 之充分溶解性’又,藉由設為150 mgK〇H/g以下,可獲得 充分之硬化性,並且可使表面性良好。 又’樹脂之質量平均分子量較佳為1〇〇〇〜40000,更 參 佳為2000〜3〇〇〇〇。藉由將質量平均分子量設為1〇〇〇以 上’可提高耐熱性、膜強度’又,藉由設為40000以下, _ 可獲得對顯影液之免分溶解性。 又’作為具有乙烯性不飽和基之樹脂,可較好地使用 在分子内具有咔哚結構之樹脂。具有咔哚結構之樹脂的耐 熱性及耐化學藥品性高’因此可藉由用於光聚合性化合物 (A )而提尚著色感光性樹脂組成物之耐熱性及耐化學藥品 性。例如,可較佳地使用由下述式(a3_3)所表示之樹脂。 12 201009495 [化學式5].In the formula U3-2), R "is an alkylene group which may have a substituent having 1 to 1 carbon atom", and is photopolymerizable by using the above-mentioned acid anhydride having two or more carboxyl groups. In the compound (A), at least two benzene rings are introduced. The polybasic acid anhydride (a3) may include other polyhepatic acids other than the above-mentioned acid field having at least two benzene rings. As other plural (four), for example, exemplified: Diacid anhydride, succinic anhydride, methylene succinic anhydride, o-benzene::anhydride, tetrahydro-o-dicarboxylic acid needle, hexahydrophthalic anhydride, methylhexaphthalic anhydride, methyltetrahydrogen O-phthalic anhydride, trimellitic pyromellitic acid liver, diphenyl sulfonium tetraphthalic acid dianhydride, 3-methylhexaphthalic anhydride, &quot; hexahydro-pyrrolidine anhydride, 3 Ethyl hexamethylene phthalate, 4-ethylhexahydrophthalic anhydride, tetrahydrophthalic anhydride 3 methyltetrahydrophthalic anhydride, 4-methyltetrahydrophthalic acid Ethyl tetrahydro phthalic anhydride of acetic anhydride, 4-ethyltetrahydrophthalic anhydride, and polyvalent phthalic anhydride, etc., may be used singly or in combination of two or more. The oxygen compound (al) and the ethylenic unsaturated group-containing carboxyl group 11 201009495. After the reaction of the compound (a2), the method of further reacting with the polybasic acid anhydride (a3) can be carried out by using a known method. The molar ratio of the molar number of the OH group in the reactant of the oxygen compound (al) to the acid-reducing compound (a2) containing the ethylenically unsaturated group and the acid anhydride group of the polybasic acid anhydride (a3) is usually 1: 1 to 1 : , preferably 1 : 〇 8 to 1 : 0.2. The solubility in the developing solution tends to be moderate in the above range, so that it is preferable to use an epoxy compound ( Al) The acid value of the resin obtained by further reacting the reaction product of the ethylenically unsaturated group-containing carboxylic acid compound (a2) with the polybasic acid anhydride (a3), preferably 1 〇 mgK: 〇H, based on the solid content of the resin /g ~150 mgKOH/g, more preferably 70 mgKOH/g to 110 mgKOH/g. By setting the acid value of the resin to 10 mgK〇H/g or more, sufficient solubility to the developer can be obtained' By setting it to 150 mgK〇H/g or less, sufficient hardenability can be obtained, and surface properties can be improved. The amount average molecular weight is preferably from 1 〇〇〇 to 40,000, and more preferably from 2000 to 3 Å. By setting the mass average molecular weight to 1 〇〇〇 or more, heat resistance and film strength can be improved. When it is set to 40,000 or less, _ can be used to obtain a solvent-free solubility. Further, as a resin having an ethylenically unsaturated group, a resin having a fluorene structure in a molecule can be preferably used. Since the resin has high heat resistance and chemical resistance, the heat resistance and chemical resistance of the colored photosensitive resin composition can be improved by the use of the photopolymerizable compound (A). For example, a resin represented by the following formula (a3_3) can be preferably used. 12 201009495 [Chemical Formula 5].

COOH HOOC-Y—C0-0COOH HOOC-Y—C0-0

X-O- CO-Y-COOH x-o- co-z-co-oX-O- CO-Y-COOH x-o- co-z-co-o

COOH (a 3 — 3 ) 式(a3-3 )中,X係由下述式(a3-4)所表示之基。 [化學式6]COOH (a 3 - 3 ) In the formula (a3-3), X is a group represented by the following formula (a3-4). [Chemical Formula 6]

(a 3 - 4 ) 又,式(a3-3 )中,Y係自順丁烯二酸酐、丁二酸酐、 亞曱基丁二酸酐、鄰苯二甲酸酐、四氫鄰苯二甲酸酐、六 氫鄰苯二甲酸酐、甲基内亞甲基四氫鄰苯二曱酸酐、氯橋 參 酸酐、曱基四氫鄰苯二甲酸酐、戊二酸酐等二羧酸酐中除 去羧酸酐基(-C0-0-C0-)而得之殘基。 又,式(a3-3 ) t,Z係自均苯四甲酸酐、二苯甲酮四 曱酸二酐、聯苯四甲酸二酐、聯苯醚四曱酸二酐等四羧酸 二酐中除去2個羧酸酐基而得之殘基。 又,式(a3-3)中,s為0〜20之整數。 《具有乙烯性不飽和基之單體》 具有乙烯性不飽和基之單體中,有單官能單體以及多 官能單體。 13 201009495 作為單官能單體,可列舉:(甲基)丙烯酿胺、經甲基(甲 基)丙烯醯胺、甲氧基甲基(甲基)丙烯醯胺、乙氧基甲基(甲 基)丙烯醯胺、丙氧基曱基(甲基)丙烯醯胺、丁氧基甲氧基 曱基(曱基)丙烯醯胺、N-羥曱基(甲基)丙烯醯胺、N_羥基甲 基(甲基)丙烯醢胺、(曱基)丙烯酸、反丁烯二酸、順丁稀二 酸、順丁烯二酸酐、亞甲基丁二酸、亞甲基丁二酸肝、甲 基順丁烯二酸、甲基順丁烯二酸酐、丁烯酸、2-丙烯酿胺 φ -2-曱基丙磺酸、第三丁基丙烯醯胺磺酸、(甲基)丙烯酸甲 酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸 2_乙基己酯、(曱基)丙烯酸環己酯、(甲基)丙烯酸2-羥乙 醋、(曱基)丙烯酸2·羥丙酯、(甲基)丙烯酸2-羥丁酯、(甲 基)丙烯酸2-苯氧基_2-羥丙酯、鄰苯二曱酸2-(曱基)丙烯醯 氧基-2-經丙酯、單(甲基)丙烯酸甘油酯、(甲基)丙烯酸四 氮糖酿、(曱基)丙烯酸二甲胺酯、(甲基)丙烯酸縮水甘油 酉曰 ' (甲基〇丙烯酸2,2,2·三氟乙醋、(甲基)丙烯酸2,2,3,3_ 四氣丙S旨、她货· 耶笨二甲酸衍生物之(曱基)丙烯酸半酯等。該 等單官能單體可單獨使用或者將2種以上組合而使用》 ^ 方面’作為多官能單體,可列舉:乙二醇二(甲基) 丙烯酸酯、-7 _ 丙烯酸酯、 丙烯酸酯、 二醇二(甲基)丙烯酸酯、四乙二醇二(甲基) 丙二醇二(甲基)丙烯酸酯、聚丙二醇二(甲基) 丙烯酸(a 3 - 4 ) Further, in the formula (a3-3), Y is derived from maleic anhydride, succinic anhydride, decylene succinic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, Removal of a carboxylic anhydride group from a dicarboxylic anhydride such as hexahydrophthalic anhydride, methyl endomethylene tetrahydrophthalic anhydride, chloroheptaic anhydride, mercaptotetrahydrophthalic anhydride or glutaric anhydride ( -C0-0-C0-) derived residue. Further, the formula (a3-3) t, Z is a tetracarboxylic dianhydride such as pyromellitic anhydride, benzophenone tetraphthalic acid dianhydride, biphenyltetracarboxylic dianhydride, or diphenyl ether tetraphthalic acid dianhydride. The residue obtained by removing two carboxylic anhydride groups is obtained. Further, in the formula (a3-3), s is an integer of 0 to 20. <<Monomer having an ethylenically unsaturated group>> Among the monomers having an ethylenically unsaturated group, there are a monofunctional monomer and a polyfunctional monomer. 13 201009495 As the monofunctional monomer, (meth)acrylamide, methyl (meth) acrylamide, methoxymethyl (meth) acrylamide, ethoxymethyl (A) Base acrylamide, propoxy decyl (meth) acrylamide, butoxy methoxy fluorenyl (decyl) acrylamide, N-hydroxydecyl (meth) acrylamide, N_ Hydroxymethyl (meth) acrylamide, (mercapto) acrylic acid, fumaric acid, cis-butyl diacid, maleic anhydride, methylene succinic acid, methylene succinate, Methyl maleic acid, methyl maleic anhydride, crotonic acid, 2-acrylic amine φ-2-mercaptopropane sulfonic acid, t-butyl acrylamide sulfonic acid, (meth)acrylic acid Methyl ester, ethyl (meth)acrylate, butyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, cyclohexyl (meth)acrylate, 2-hydroxyethyl methacrylate , (mercapto) 2, hydroxypropyl acrylate, 2-hydroxybutyl (meth) acrylate, 2-phenoxy 2 - hydroxypropyl (meth) acrylate, 2-(fluorenyl) phthalate Acetyleneoxy-2- Propyl ester, glycerol mono(meth)acrylate, nitro sugar (meth) acrylate, dimethylamine (meth) acrylate, glycidyl methacrylate (methyl acrylate 2, 2 , 2 · trifluoroacetic acid, (meth)acrylic acid 2, 2, 3, 3_ four gas C, S, her goods, yoke dicarboxylic acid derivatives (mercapto) acrylate half ester, etc. The body may be used singly or in combination of two or more kinds. The term "^" as a polyfunctional monomer may, for example, be ethylene glycol di(meth)acrylate, -7 _ acrylate, acrylate or diol di(a) Acrylate, tetraethylene glycol di(meth) propylene glycol di(meth) acrylate, polypropylene glycol di(meth) acrylate

(曱基” 酸_、 ^醇二(甲基)丙烯酸酯、新戊二醇二(甲基) 己二醇二(曱基)丙烯酸酯、三羥甲基丙烷三 ~~(甲基)丙婦酸甘油S旨.、季戍四醇三丙稀 醇四内埽酸酯、二季戊四醇五丙烯酸酯、二 201009495 季戊四醇六丙烯酸酯、季戊四醇二(甲基)丙烯酸酯、季戊 四醇三(甲基)丙烯酸酯、季戊四醇四(曱基)丙烯酸酯、二季 戊四醇五(甲基)丙烯酸酯、二季戊四醇六(曱基)丙烯酸酯、 2,2-雙(4-(甲基)丙烯醢氧基二乙氧基苯基)丙烷、2,2-雙 (4-(甲基)丙烯醯氧基聚乙氧基苯基)丙烷、(甲基)丙烯酸2-羥基-3-(曱基)丙烯醯氧基丙酯、乙二醇二縮水甘油醚二(甲 基)丙烯酸酯、二乙二醇二縮水甘油醚二(甲基)丙烯酸酯、 ❹ 鄰苯二甲酸·一縮水甘油醋二(曱基)丙.稀酸醋、三丙稀酸甘 油酯、甘油聚縮水甘油醚聚(甲基)丙烯酸酯、(甲基)丙烯酸 胺基曱酸酯(即,甲苯二異氰酸酯)、三甲基六亞甲基二異 氱酸酯及六亞甲基二異氰酸酯等與(甲基)丙烯酸2-羥乙酯 的反應物、亞甲基雙(曱基)丙烯醯胺、(甲基)丙烯醯胺亞甲 鍵、多元醇與N-羥甲基(甲基)丙烯醢胺之縮合物等多官能 單體、或三丙烯基縮甲路等。該等多官能單體可單獨使用 或者將2種以上組合而使用。 ® 相對於著色感光性樹脂組成物之固體成分,該具有乙 烯性不飽和基之單體的含量較佳為5〜5〇質量%,更佳為 10〜40質量%之範圍。藉由設為上述範圍,而有容易取得 靈敏度、顯影性、解析性之平衡的傾向,故較好。 相對於著色感光性樹脂組成物之固體成分,光聚合性 化σ物(A)之含量較佳為5〜5〇質量%,更佳為ι〇〜4〇 質S%之fe圍。藉由設為上述範圍,而有容易取得靈敏度、 顯影性、解析性之平衡的傾向,故較好。 [斥墨性化合物(B )] 15 201009495 斥墨性化合物(B )係至少使具有乙烯性不飽和基及氟 原子之單體(bl)、與丙烯酸(b2)進行共聚合而成的共聚 物。藉由使用此種斥墨性化合物(B ),可獲得具有高斥墨 性之著色感光性樹腊組成物。 〈具有乙烯性不飽和基及氟原子之單體(bl )〉 作為具有乙稀性不飽和基及氣原子的單體(以下又稱 「單體bl」)’只要具有乙稀性不飽和基及氟原子則無特別 ❹ 限定。作為此種單體(bl),可列舉如下述式(bl_〇所表 示的化合物等。該等單體(bl )可單獨使用或者將2種以 上組合而使用。 [化學式7] cx1x2= cxHcx4x5^{ ^ 〇^-Rf (b 1 — 1 ) 式(bl-ι)中,又〗及X2分別獨立表示氫原子或者氟原 ❹子/ X3表示氫原子、氟原子、甲基、或者全氟甲基,X4及 X5表示氫原子、氟原子、或者全氟甲基,Rf表示碳數為ι 〜4〇之含氟烷基或者碳數為2〜丨⑼之具有醚鍵之含氟烷 基,a表示0〜3之整數,b &amp; c分別獨立表示〇或】。 #對於斥墨性化合物(B),由氣系單體(Μ)衍生而 ^之單元的含量較佳為30〜8〇質量%,更佳為40〜60質 量%之範圍。藉由設為上述範圍,而有斥墨性以及與著色 感光性樹脂組成物中其他成分之互溶性變得良好之傾向, 故較好。 16 201009495 又,於氟系單體(bl )中,較佳為具有由_(CF2)tF ( t =1〜10)所表示之基的單體et更佳為i〜8,進而較佳為 2〜6。藉由具有上述基,而有斥墨性以及與著色感光性樹 脂組成物中其他成分之互溶性變得良好之傾向,故較好。 〈丙烯酸(b2)&gt; 為了調整酸價並提高顯影性,斥墨性化合物(B)必須 使具有緩基之單體進行共聚合。作為具有叛基之單體,可 〇列舉如(曱基)丙稀酸等各種單趙。其中又以丙稀酸較 甲基丙烯酸更佳。相較於甲基丙烯酸,藉由使丙烯酸。” 共聚合,可提升對於溶劑之接觸角,而更加提升斥墨性。 相對於斥墨性化合物⑻,由丙烯酸(b2)衍生而來 之單元的含量較佳為〇1〜2〇質量%。藉由設為上述範圍, 而有斥墨性以及顯影性變得適度之傾向,故較佳。 〈其他單體〉 斥墨性化合物⑻可視需要而與其他單體進行共聚 合。作為此種其他單體,可列舉以下所記述之各種單體。 〈具有乙烯性不飽和基及環氧基之單體(b3)〉 斥墨性化合物⑻較佳為進—步使具有乙稀性不飽和 基及環氧基之單體(以下又稱「單體⑽」)進行共聚合 而,的共聚物。#由使單體(b3)進行共聚合可進—步 提高斥墨性。. . 作為單趙(b3),可列舉:(甲基)丙烯酸縮水甘油醋、 由下述式…])〜(b3_3)所表示之脂環式環氧化合物、 使(甲基)丙稀酸之缓基與二官能以上之環氧化合物的環氧 17 201009495 基進行反應而獴得之單體、使侧鏈上具有羥基或羧基之丙 烯酸系單體之羥基或者緩基與二官能以上之環氧化合物之 環氧基進行反應而獲得的單體等。其中,較佳為(曱基)丙 烯酸縮水甘油酯。該等單體(b3 )可單獨使用或者將2種 以上組合而使用。 ch3 [化學式8] CH3 CH2= C—C 一 O一 CH2— C 一PH2(mercapto) acid _, ^ alcohol di (meth) acrylate, neopentyl glycol di (methyl) hexanediol bis (indenyl) acrylate, trimethylolpropane tris ~ ~ (methyl) propyl Glycerol glycerin S., quaternary tetraol tripropylene glycol tetradecanoate, dipentaerythritol pentaacrylate, two 201009495 pentaerythritol hexaacrylate, pentaerythritol di(meth) acrylate, pentaerythritol tris (meth) acrylate Ester, pentaerythritol tetrakis(meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa(meth) acrylate, 2,2-bis(4-(methyl) propylene oxime oxyethylene Phenyl)propane, 2,2-bis(4-(methyl)propenyloxypolyethoxyphenyl)propane, 2-hydroxy-3-(indenyl)propenyloxy (meth)acrylate Propyl ester, ethylene glycol diglycidyl ether di(meth) acrylate, diethylene glycol diglycidyl ether di(meth) acrylate, phthalic acid · monoglycidyl acetonate Dilute vinegar, triglyceride, glycerol polyglycidyl ether poly(meth) acrylate, (meth) propylene Reaction of amino phthalate (ie, toluene diisocyanate), trimethylhexamethylene diisonate, and hexamethylene diisocyanate with 2-hydroxyethyl (meth)acrylate, methylene a polyfunctional monomer such as a bis (indenyl) acrylamide, a (meth) acrylamide propylene bond, a condensate of a polyol and N-methylol (meth) acrylamide, or a tripropylene condensate A. The polyfunctional monomer may be used singly or in combination of two or more kinds. The content of the monomer having an ethylenically unsaturated group is preferably a content of the solid component of the colored photosensitive resin composition. 5 to 5 % by mass, and more preferably in the range of 10 to 40% by mass. By setting it as the above range, it is easy to obtain a balance between sensitivity, developability, and analytical property, and therefore it is preferable. The solid content of the resin composition, the content of the photopolymerizable σ content (A) is preferably 5 to 5 % by mass, more preferably ι 〇 4 to 4 〇 S%. However, there is a tendency to easily obtain a balance between sensitivity, developability, and resolution, which is preferable. Ink-removing compound (B)] 15 201009495 The ink-repellent compound (B) is a copolymer obtained by copolymerizing at least a monomer (b1) having an ethylenically unsaturated group and a fluorine atom with acrylic acid (b2). By using such an ink repellent compound (B), a color-sensitive photosensitive wax composition having high ink repellency can be obtained. <Monomer having an ethylenically unsaturated group and a fluorine atom (bl )> As having ethylene The monomer having an unsaturated group and a gas atom (hereinafter also referred to as "monomer bl")' is not particularly limited as long as it has an ethylenically unsaturated group and a fluorine atom. Examples of such a monomer (bl) include the following a compound represented by the formula (bl_〇), etc. These monomers (bl) may be used singly or in combination of two or more kinds. [Chemical Formula 7] cx1x2 = cxHcx4x5^{^ 〇^-Rf (b 1 - 1 ) In the formula (bl-ι), further, and X2 each independently represent a hydrogen atom or a fluorogenic scorpion/X3 represents a hydrogen atom, a fluorine atom, a methyl group, or a perfluoromethyl group, and X4 and X5 represent a hydrogen atom, a fluorine atom, Or a perfluoromethyl group, Rf represents a fluorine-containing alkyl group having a carbon number of 1 to 4 Å or a carbon number of 2 to 丨 (9) A fluorine-containing alkyl group having an ether bond, a represents an integer of 0 to 3, and b &amp; c respectively represents ruthenium or ruthenium. # For the ink repellent compound (B), the content of the unit derived from the gas monomer (Μ) is preferably from 30 to 8 % by mass, more preferably from 40 to 60 % by mass. When it is in the above range, the ink repellency and the mutual solubility with other components in the colored photosensitive resin composition tend to be good, which is preferable. Further, in the fluorine-based monomer (b1), it is preferable that the monomer et having a group represented by _(CF2)tF (t = 1 to 10) is preferably i to 8, more preferably 2 to 6. By having the above-mentioned group, the ink repellency and the mutual solubility with other components in the colored photosensitive resin composition tend to be good, which is preferable. <Acrylic acid (b2)&gt; In order to adjust the acid value and improve the developability, the ink repellent compound (B) must be copolymerized with a monomer having a slow group. As a monomer having a rebellious base, various single Zhaos such as (mercapto)acrylic acid can be cited. Among them, acrylic acid is better than methacrylic acid. By making acrylic acid compared to methacrylic acid. The copolymerization can increase the contact angle with respect to the solvent and further enhance the ink repellency. The content of the unit derived from the acrylic acid (b2) is preferably 〇1 to 2% by mass based on the ink repellent compound (8). In the above range, ink repellency and developability tend to be moderate, and it is preferable. <Other monomers> The ink repellent compound (8) may be copolymerized with other monomers as needed. Examples of the monomer include various monomers described below. <The monomer having an ethylenically unsaturated group and an epoxy group (b3)> The ink repellent compound (8) is preferably further substituted with an ethylenically unsaturated group. And a copolymer in which an epoxy group monomer (hereinafter also referred to as "monomer (10)") is copolymerized. # From the copolymerization of the monomer (b3), the ink repellency can be improved. As a single (b3), (meth)acrylic acid glycidic vinegar, an alicyclic epoxy compound represented by the following formula:])~(b3_3), (meth)acrylic acid a monomer which is reacted with an epoxy group of a difunctional or higher epoxy compound, and a hydroxyl group having a hydroxyl group or a carboxyl group in a side chain, or a ring of a difunctional or higher group A monomer obtained by reacting an epoxy group of an oxygen compound or the like. Among them, glycidyl (meth) acrylate is preferred. These monomers (b3) may be used singly or in combination of two or more. Ch3 [Chemical Formula 8] CH3 CH2= C—C—O—CH2-—C—PH2

赢 ii V φ ο ο (b 3 - 1 ) R1b CH2=C-C-(&gt;4cH2^&lt;^^ ο 0 (b 3 — 2 ) R1b P-CH,Win ii V φ ο ο (b 3 - 1 ) R1b CH2=C-C-(&gt;4cH2^&lt;^^ ο 0 (b 3 — 2 ) R1b P-CH,

OO

CHjss C—C II o (b 3 一 3 ) 式(b3-2)、( b3-3)中,RU表示氫原子或者甲基,。 表不1〜10之整數,v &amp; w分別獨立表示i — 3之整數❶ 相對於斥墨性化合物(B),由單體(b3)衍生而來之 單元的含量較佳為i〜40質量%,更佳為5〜丨5質量%之範 圍藉由設為上述範圍,而有斥墨性提高之傾向,故較好。 〈具有由式(b4-l)表示之結構之單體(b4)〉 *斥墨性化合物(B )較佳為進一步使具有乙烯性不 下述式(b4-1 )所表示之結構之單體(以下又稱「單 18 201009495 體(b4)」)進行共聚合而成的共聚物《藉由使單體(b4) 進行共聚合,可進一步提高顯影性及與著色感光性樹脂組 成物中其他成分之互溶性。 [化學式9] (b 4 - 1 ) 此單體(b4)更佳為具有乙烯性不飽和基及由下述式 Φ (b4_2)所表示之結構者。 [化學式10] R2fe—0-^—- R3b (b 4 - 2 ) 式(b4-l )、( b4-2 )中,R2b表示碳數為!〜5之伸烷 基’可為直鏈狀亦可為支鏈狀。其中,較佳為碳數為丨〜3 之伸炫基,最佳為伸乙基。r3&gt;&gt;表示氫原子、經基、或者可 參 具有取代基的碳數為1〜20之烷基,可為直鏈狀亦可為支 鏈狀。其令,較佳為碳數為1〜3之烷基,最佳為甲基。作 為上述取代基,可列舉:羧基、羥基、碳數為5之烷氧 基等。X表示1以上之整數,較佳為1〜6〇之整數,更佳 為1〜12之整數。 作為此種單體(b4) ’可列舉由下述式( b4_3)所表示 之化合物等。該等單體(b4 )可單獨使用或者將2種以上 組合而使_用。.CHjss C-C II o (b 3 - 3 ) In the formulae (b3-2) and (b3-3), RU represents a hydrogen atom or a methyl group. The integers of 1 to 10 are not shown, and v &amp; w independently represent an integer of i 3 respectively. The content of the unit derived from the monomer (b3) is preferably i to 40 with respect to the ink repellent compound (B). The range of the mass %, more preferably 5 to 5% by mass, is preferably in the above range, and the ink repellency tends to be improved. <The monomer (b4) having a structure represented by the formula (b4-1)> The ink repellent compound (B) is preferably a monomer having a structure other than the structure represented by the following formula (b4-1). (hereinafter also referred to as "single 18 201009495 body (b4)") copolymer copolymerized "by copolymerizing the monomer (b4), the developability and the coloring photosensitive resin composition can be further improved. The mutual solubility of the ingredients. (b 4 - 1 ) The monomer (b4) is more preferably an ethylenically unsaturated group and a structure represented by the following formula Φ (b4_2). R2fe—0-^—- R3b (b 4 - 2 ) In the formulas (b4-l) and (b4-2), R2b represents the carbon number! The ~5 alkylene group ' may be linear or branched. Among them, a stretching group having a carbon number of 丨~3 is preferred, and an ethyl group is preferred. R3&gt;&gt; represents a hydrogen atom, a trans group, or an alkyl group having 1 to 20 carbon atoms which may have a substituent, and may be linear or branched. It is preferably an alkyl group having a carbon number of 1 to 3, most preferably a methyl group. Examples of the substituent include a carboxyl group, a hydroxyl group, and an alkoxy group having a carbon number of 5. X represents an integer of 1 or more, preferably an integer of 1 to 6 Å, more preferably an integer of 1 to 12. Examples of such a monomer (b4)' include a compound represented by the following formula (b4_3). These monomers (b4) may be used singly or in combination of two or more. .

[化學式11] 19 201009495 R4b CH2=C~C-〇-^R2^0-^R3b o (b 4 - 3) 式(b4-3)中’ R4b表示氫原子或者甲基。R2b、R3b、χ 之含義與上述式(b4-l)、(b4-2)相同。 相對於斥墨性化合物(B),由單體(b4)衍生而來之 單元的含量較佳為1〜40質量%,更佳為5〜15質量%之範 ® 圍。藉由設為上述範圍,而有顯影性以及與著色感光性樹 脂組成物中其他成分之互溶性變得良好之傾向,故較好。 〈具有矽原子之單趙(b5)〉 斥墨性化合物(B)較佳為進一步使具有矽原子之單體 (以下又稱「單體(b5)」)進行共聚合而成的共聚物。單 體(b5)只要具有乙烯性不飽和基及鍵結於氟原子之至少 1個烷氧基,則無特別限定。藉由使此單體(b5)進行丘 » Μ,可進 一步提高斥墨性》此可能係因為:由著色感光 性樹腊組成物所構成之塗膜在顯影時,烷氧基藉由顯影液 所含之水的作用而脫離並生成矽醇,矽醇藉由之後的後焕 烤(post-bake )而與其他有機成分聚合,藉此使膜表面變 得堅固。 作為此種單體(b5 ),可列舉如以下述式(b5_丨)所表 示之化合物等。該等單體(b5)可單獨使甩或者將2種以 上組合而使用。 [化學式12] 20 20119 201009495 R4b CH2=C~C-〇-^R2^0-^R3b o (b 4 - 3) In the formula (b4-3), 'R4b' represents a hydrogen atom or a methyl group. The meanings of R2b, R3b, and χ are the same as those of the above formulae (b4-l) and (b4-2). The content of the unit derived from the monomer (b4) is preferably from 1 to 40% by mass, more preferably from 5 to 15% by mass, based on the ink repellent compound (B). When it is in the above range, the developability and the mutual solubility with other components in the colored photosensitive resin composition tend to be good, which is preferable. <Single Zhao (b5) having a ruthenium atom> The ink repellent compound (B) is preferably a copolymer obtained by further copolymerizing a monomer having a ruthenium atom (hereinafter also referred to as "monomer (b5)"). The monomer (b5) is not particularly limited as long as it has an ethylenically unsaturated group and at least one alkoxy group bonded to a fluorine atom. By subjecting the monomer (b5) to the mound, the ink repellency can be further improved. This may be because the alkoxy group is developed by the coating film composed of the colored photosensitive wax composition during development. The contained water is detached and sterol is formed, and the sterol is polymerized with other organic components by post-bake, thereby making the surface of the film firm. Examples of such a monomer (b5) include a compound represented by the following formula (b5_丨). These monomers (b5) may be used singly or in combination of two or more. [Chemical Formula 12] 20 201

式(b5-l) t,R〜表示氫原子或碳數為丄〜丨❶之烷基, 較佳為氫原子或曱基eR6b表示碳數為卜2()之伸燒基或伸 苯基,較佳為碳數為丨〜⑺之伸烷基。R7b、R8b分別獨立 表示碳數為1〜10之烷基或苯基,較佳為碳數為〗〜3之烷 基。多個R7b鍵結於si時,該多個可相同亦可不同。 多個(⑽卟)鍵結於Si時’該多個(〇R8b)可相同亦可不 同。m表示〇或較佳為lcn表示i〜3之整數,較佳 為n= 2、3,更佳為n= 3。 相對於斥墨性化合物(B),由單體(b5)衍生而來之 單70的含量較佳為20質量%以下,更佳為.1()質量%以下之 範圍藉由設為上述範圍,而有斥墨性以及與著色感光性 樹月曰組成物中其他成分之互溶性變得良好之傾向故較好。 作為此其他單體,可列舉如上述之具有乙烯性不飽和 基之單體。其中較佳為丙烯酸系單體。作為此種丙烯酸系 單體之杯丨- 不’可列舉:甲基丙烯酸2-羥乙酯(HEMA )、N-經曱美咕 土内締酿胺(N_MAA)、甲基丙烯酸甲酯(Maa)、甲 基丙缔酸環已輯(CHMA)、甲基丙烯酸異冰片酯(IBMA) 相對於斥墨性化合物(B ),由其他單體衍生而來之單 體之含量較佳為0〜20質量%。 作為使單體(bl )及(b2 )以及視需要而與其他單體 21 201009495 進行反應而獲得共聚物的方法’可使用公知之方法, 斥墨性化合物(B )之質量平均分子量較佳為 2000 〜 50000,更佳為5〇〇〇〜20000。藉由將質量平均分子量設為 2000以上’可提高耐熱性、膜強度,又,藉由設為5〇〇〇〇 以下,則可提高顯影性。 又’斥墨性化合物(B)之含量較佳為光聚合性化合物 (A)與斥墨性化合物(b)之質量比為99 9 : 〇丨〜7〇 : 。 φ 藉由設為上述範圍,而有容易取得靈敏度、顯影性、解析 性、斥墨性之平衡的傾向,故較好。 [光聚合起始劑(C)] 作為光聚合起始劑(c),可列舉:1-羥基環己基苯基 酮、2-經基-2 -曱基-1-苯基丙烧-1-嗣、ι_[4-(2-經乙氧基)苯 基]-2-羥基-2-甲基-1-丙烷-1-酮、1-(4-異丙基苯基)_2_羥基 -2·甲基丙烷-1-酮、1-(4-十二烷基苯基)-2-羥基_2_甲基丙烷 -1-酮、2,2-二甲氧基-1,2-二苯基乙烷-i_酮、雙(4-二曱胺基 ® 苯基)酮、2_甲基-l-[4-(甲硫基)苯基]_2_嗎啉基丙烷-i_酮 (2-methyl-l-[4-(methylthio)phenyl]-2-morpholinopropane-l •one)、2-苄基-2-二甲胺基-1-(4-嗎啉基苯基)-丁烷_:ι_酮、 乙嗣-l-[9-乙基-6-(2-曱基苯甲醯基)_9H-味》坐基-3-基]-1-(鄰乙醯肟)、2,4,6-三甲基苯甲醯基二苯基氧化膦、 4-苯甲醯基-4'-甲基二曱硫醚、4-二甲胺基苯甲酸、4·二甲 胺基苯甲酿曱酯、4-二曱胺基笨甲酸乙酯、4-二甲胺基笨 甲酸丁酯、4-二甲胺基-2-乙基己基苯甲酸、4-二甲胺基_2-異戊基苯甲酸、苄基-β-曱氧基乙基縮醛、节基二甲基縮 22 201009495 網、1-苯基-1,2_丙二_·2(鄰乙氧基羰基)將、鄰苯f鱗基 苯甲酸甲醋、2,4-二乙基噻噸酮、2_氣噻噸酮、2,4-&gt;中基 噻噸酮、1-氣-4-丙氧基嗔噸酮、噻噸、2_氣噻噸、2,4-〆6 基噻噸、2-甲基噻噸、2_異丙基噻噸、2_乙基蒽醌、,、f基 葱酿、1,2_笨并蒽酿、2,3_二苯基蒽酿、偶氮雙異丫賸、遇 氧化苯曱醯、過氧化異丙苯、2-巯基苯并咪唑、2-赋基笨 并0惡唾(2-mercaptobenzoxazole)、2_疏基苯并嘆&quot;坐、鄰氣 ^ 2- φ 苯基)-4,5-二(間甲氧基苯基)_咪唑基二聚物、二苯肀納 氣二苯甲嗣、p,p,_雙二甲胺基二苯甲酮、4,4,-雙二6胺基 〆笨 二苯甲鲷、4,4,-二氣二笨甲酮、3,3-二甲基-4-甲氧蜃〆 甲明、苯偶酿、安息香、安息香甲醚、安息香乙鰱、安 香異丙醚、安息香正丁醚、安息香異丁醚、安息香丁 苯乙酮、2,2-二乙氧基苯乙酮、對二曱基苯乙酮、對二甲胺 基苯丙酮、二氣苯乙鲷、三氯苯乙酮、對第三丁基苯乙酮、 對二曱胺基苯乙酮、對第三丁基三氣苯乙網、對第三丁基 ® 二氣苯乙酮、α,α-二氟-4-苯氧基笨乙酮、噻噸綱、2-甲基 噻噸酮、2-異丙基噻鳴納、二苯并環庚酮、4_二甲胺基苯 甲酸戊酯、9-苯基吖啶、丨,7-雙-(9-吖啶基)庚烷、1,5-雙-(9_ 吖啶基)戊貌、1,3-雙-(9-吖啶基)丙烷、對曱氧基三嗓 (p-methoxytriazine)、—.(一乳甲基)-均二0秦、2-甲基 _4,6-雙(三氯曱基&gt;均彡4、2-[2-(5_曱基呋喃-2-基)乙烯 基]-4,6-雙(三氣甲基&gt;均二嗪、2-[2-(呋喃一2-基)乙烯 基]-4,6-雙(三氯曱基)-均彡嗪、2-[2-(4_二乙胺基-2-甲基苯 基)乙烯基]-4,6-雙(三氟中基)_均三嗪、2-[2_(3,4-二曱氧基 23 201009495 苯基)乙烯基]-4,6_雙(三氣甲基)·均三嗪、2-(4-曱氧基苯 基)-4,6-雙(三氣甲基)_均三嗪、2 (‘乙氧基苯乙烯基)_4,6_ 雙(二氯甲基)-均三唤、2_(4_正丁氧基苯基)46雙(三氯甲 基)-均二嗪、2,4-雙-三氣曱基_6_(3_溴_4·甲氧基)苯基_均三 秦2’4&quot;*雙-二氣甲基-6-(2-溴-4·甲氧基)苯基·均三嗪、2,4- 雙·三氣甲基-6-(3-溴-4-甲氧基)苯乙烯基苯基_均三嗪、2,4· 雙-三氣甲基-6-(2-溴-4-甲氧基)苯乙烯基苯基_均三嗪等。 ®其中,就靈敏度方面而言,特佳為使用肟系光聚合起始劑。 該等光聚合起始劑可單獨使用或者將2種以上組合而使 用〇 相對於者色感光性樹脂組成物之固體成分,光聚合起 始劑(C)之含量較佳為〇 5〜3〇質量%,更佳為卜2〇質 量%之範圍。藉由設為上述範圍,可獲得充分之对熱性、 耐化學藥品性,又,可提高成膜性,並且可抑制光硬化不 良》Formula (b5-1) t, R~ represents a hydrogen atom or an alkyl group having a carbon number of 丄~丨❶, preferably a hydrogen atom or a fluorenyl group eR6b represents a stretching group or a phenyl group having a carbon number of 2 () Preferably, the alkyl group having a carbon number of 丨~(7). R7b and R8b each independently represent an alkyl group having 1 to 10 carbon atoms or a phenyl group, preferably an alkyl group having a carbon number of 〜3. When a plurality of R7bs are bonded to si, the plurality may be the same or different. When a plurality of ((10) 卟) are bonded to Si, the plurality (〇R8b) may be the same or different. m represents 〇 or preferably lcn represents an integer of i to 3, preferably n = 2, 3, more preferably n = 3. The content of the unit 70 derived from the monomer (b5) is preferably 20% by mass or less, more preferably 1% by mass or less, based on the ink repellent compound (B). Further, it is preferable that the ink repellency and the mutual solubility with other components in the color-sensitive photosensitive tree composition are good. As such another monomer, a monomer having an ethylenically unsaturated group as described above can be mentioned. Among them, an acrylic monomer is preferred. As a cup of such an acrylic monomer, it is exemplified by 2-hydroxyethyl methacrylate (HEMA), N-based phthalocyanine (N_MAA), and methyl methacrylate (Maa). ), methyl propylene hexanoic acid ring (CHMA), isobornyl methacrylate (IBMA) relative to the ink repellent compound (B), the monomer derived from other monomers is preferably 0~ 20% by mass. As a method of obtaining a copolymer by reacting the monomers (b1 and (b2) and, if necessary, with the other monomer 21 201009495, a known method can be used, and the mass average molecular weight of the ink repellent compound (B) is preferably 2000 ~ 50000, more preferably 5〇〇〇~20000. By setting the mass average molecular weight to 2,000 or more, heat resistance and film strength can be improved, and when it is 5 Å or less, developability can be improved. Further, the content of the ink repellent compound (B) is preferably such that the mass ratio of the photopolymerizable compound (A) to the ink repellent compound (b) is 99 9 : 〇丨 7 7 : . φ is preferably in the above range, and it is easy to obtain a balance between sensitivity, developability, analytic property, and ink repellent property. [Photopolymerization initiator (C)] As the photopolymerization initiator (c), 1-hydroxycyclohexyl phenyl ketone, 2-cyano-2-indenyl-1-phenylpropanone-1 -嗣, ι_[4-(2-ethoxy)phenyl]-2-hydroxy-2-methyl-1-propan-1-one, 1-(4-isopropylphenyl)_2-hydroxyl -2·methylpropan-1-one, 1-(4-dodecylphenyl)-2-hydroxy-2-methylpropan-1-one, 2,2-dimethoxy-1,2 -diphenylethane-i-ketone, bis(4-diguanylamino)phenyl), 2-methyl-l-[4-(methylthio)phenyl]_2-morpholinopropane- I-ketone (2-methyl-l-[4-(methylthio)phenyl]-2-morpholinopropane-l •one), 2-benzyl-2-dimethylamino-1-(4-morpholinylphenyl) )-butane _:ι_ketone, acetamidine-l-[9-ethyl-6-(2-mercaptobenzylidene)_9H-flavored sityl-3-yl]-1-(o-B醯肟), 2,4,6-trimethylbenzimidyldiphenylphosphine oxide, 4-benzylidene-4'-methyldisulfide sulfide, 4-dimethylaminobenzoic acid, 4 · dimethylaminobenzoic acid oxime ester, 4-diguanylamino benzoic acid ethyl ester, 4-dimethylamino benzoic acid butyl ester, 4-dimethylamino-2-ethylhexyl benzoic acid, 4- Dimethylamino 2 - isoamylbenzoic acid, benzyl-β- Oxyethyl acetal, benzyl dimethyl condensed 22 201009495 net, 1-phenyl-1,2-propylene- 2 (o-ethoxycarbonyl), o-phenyl f-fluorenyl benzoic acid, 2,4-Diethylthioxanthone, 2-pipe thioxanthone, 2,4-&gt; meso-thioxanthone, 1-aluminum-4-propoxyxanthone, thioxanthene, 2-nitroxene Tons, 2,4-〆6-based thioxanthene, 2-methylthioxanthene, 2-isopropylthioxanthene, 2-ethylidene, and f-based onion, 1,2_stupid and brewed, 2,3_diphenyl oxime, azobisisoindole, benzoquinone oxide, cumene peroxide, 2-mercaptobenzimidazole, 2-mercaptobenzoxazole , 2_基基苯和叹; sit, neighboring gas ^ 2- φ phenyl)-4,5-di(m-methoxyphenyl)-imidazolyl dimer, diphenyl fluorene dibenzoate嗣, p, p, _ bis dimethylamino benzophenone, 4, 4, - bis bis 6 yl hydrazide benzophenone, 4, 4, - digas dibenzophenone, 3, 3- Dimethyl-4-methoxyindole, benzoic acid, benzoin, benzoin methyl ether, benzoin acetophenone, isopropyl ether, benzoin n-butyl ether, benzoin isobutyl ether, benzoin acetophenone, 2 2-diethoxyacetophenone p-Dimercaptoacetophenone, p-dimethylaminopropiophenone, dioxophenidin, trichloroacetophenone, p-tert-butylacetophenone, p-diamylacetophenone, p-butadiene Base three gas benzene net, p-tert-butyl® diacetophenone, α,α-difluoro-4-phenoxy acetophenone, thioxanthene, 2-methylthioxanthone, 2-iso Propyl thiophene, dibenzocycloheptanone, amyl 4-dimethylaminobenzoate, 9-phenyl acridine, anthracene, 7-bis-(9-acridinyl) heptane, 1,5 - bis-(9- aridinyl) pentamidine, 1,3-bis-(9-acridinyl)propane, p-methoxytriazine, (.-milk methyl)-- 0 Qin, 2-methyl-4,6-bis(trichloroindenyl)&lt;4,2-[2-(5-decylfuran-2-yl)vinyl]-4,6-bis ( Trimethylmethyl&gt;soxadiazine, 2-[2-(furyl-2-yl)vinyl]-4,6-bis(trichloroindenyl)-homoazine, 2-[2-(4_ Diethylamino-2-methylphenyl)vinyl]-4,6-bis(trifluoroindolyl)-s-triazine, 2-[2_(3,4-dimethoxyl 23 201009495 phenyl) Vinyl]-4,6_bis(trismethyl)·s-triazine, 2-(4-decyloxyphenyl)-4,6-bis(trismethyl)-s-triazine 2 ('Ethoxystyryl)_4,6_bis(dichloromethyl)-homox, 2_(4_n-butoxyphenyl)46 bis(trichloromethyl)-s-diazine, 2 ,4-bis-tris-sulfonyl _6_(3_bromo-4.methoxy)phenyl_-tris-methyl 2'4&quot;*bis-dimethylmethyl-6-(2-bromo-4. Oxy)phenyl-s-triazine, 2,4-bis-tris-methyl-6-(3-bromo-4-methoxy)styrylphenyl-s-triazine, 2,4·bis- Tris-methylmethyl-6-(2-bromo-4-methoxy)styrylphenyl-s-triazine or the like. ® Among them, in terms of sensitivity, it is particularly preferable to use a lanthanide photopolymerization initiator. These photopolymerization initiators may be used singly or in combination of two or more kinds thereof with respect to the solid content of the photosensitive resin composition. The content of the photopolymerization initiator (C) is preferably 〇5 to 3 〇. % by mass, more preferably in the range of 2% by mass. By setting it as the said range, it can obtain sufficient heat- and chemical-resistance, and can improve film-forming property, and can suppress the photo-hardening|

II

[著色劑(D)] 作為著色劑(D),可列舉碳黑或鈦黑等遮光劑。又, 亦可使用 CU、Fe、Mn、Cr、c〇、Ni、v、Zn、SeMg、[Colorant (D)] Examples of the colorant (D) include a light-shielding agent such as carbon black or titanium black. Also, CU, Fe, Mn, Cr, c〇, Ni, v, Zn, SeMg,

Sr Ba Pd、Ag、Cd、In、Sn、Sb、Hg、Pb、Bi、Si 及A1等各種金屬氧化物、複合氧化物、金屬硫化物、金屬 硫酸鹽、或者金屬碳酸鹽等無機顏料。 碳黑可使用槽黑、爐黑、熱碳黑、燈黑等公知之碳黑, 特別是槽黑因遮光性優異而可較好地使用。又,亦可使用 經樹脂包覆之碳黑。具體可列舉:將碳黑以及與存在於碳 24 201009495 =表面线基、經基、祕具有反魏之樹脂混合於5〇 c〜_c進打加熱而獲得的經樹脂包覆之碳黑;或者將乙 烯性單體分散於水-有機溶劑混合細 戈韦' 艰_界面活性劑混 合系中,於聚合起始劑之存在下進行自由基聚合或者自由 基共聚合而獲得的經樹脂包覆之碳黑等。與未經樹脂包覆 之碳黑㈣’該經樹脂包覆之碳黑的導電性低,因此在用 ❹Inorganic pigments such as various metal oxides, composite oxides, metal sulfides, metal sulfates, or metal carbonates such as Sr Ba Pd, Ag, Cd, In, Sn, Sb, Hg, Pb, Bi, Si, and A1. As the carbon black, a known carbon black such as black, furnace black, hot carbon black or lamp black can be used, and in particular, the groove black can be preferably used because it has excellent light-shielding properties. Further, a carbon black coated with a resin can also be used. Specifically, a carbon black and a resin-coated carbon black obtained by mixing carbon black and a resin present in the carbon 24 201009495 = surface line base, a base group, and a secret anti-wei resin in 5〇c~_c; or Dispersing the ethylenic monomer in a water-organic solvent mixed with a fine-digestive surfactant mixture, and performing resin radical coating obtained by radical polymerization or radical copolymerization in the presence of a polymerization initiator Carbon black and so on. The carbon black (4) which is not coated with the resin is low in electrical conductivity of the resin-coated carbon black, so it is used in ❹

作液晶顧示器等之彩色渡光片時,可形成漏電少、可靠性 高之低耗電顯示器。 作為著色劑’可在上述無機顏料中添加有機顏料來作 為輔助顏料。有機顏料藉由適當選擇添加呈現無機顏料之 補色的有機顏料而獲得如下效果。例如,碳黑里現略帶紅 色之黑色。因此,藉由在碳黑中添加呈現紅色之補色即藍 色的有機顏料來作為輔助顏料,可消除碳黑之紅色,從而 整體上呈現出更好之黑色。相對於無機顏料與有機顏料之 合計,有機顏料之使用量較佳為10〜80質量%之範圍,更 佳為20〜60質量°/〇之範圍,特佳為為20〜40質量%之範圍。 作為上述無機顏料及有機顏料,可使用利用分散劑以 適當漢度分散顏料而得之溶液。例如,作為無機顏料,可 列舉:御國色素公司製造之碳分散液CF Black (含有濃度 為20%之碳)、御國色素公司製造之碳分散液CF Black (含 24%之高電阻碳)、御國色素公司製造之鈦黑分散液CF Black (含20%之黑鈦顏料)。又,作為有機顏料,例如可 列舉:御國色素公司製造之藍色顏料分散液CF Blue(含有 20%之藍色顏料)、御國色素公司製造之紫色顏料分散液 25 201009495 (含有1 〇%之紫色顏料)等。又,作為分散劑,較佳為使 用:聚乙烯亞胺系、胺基甲酸酯樹脂系、丙烯酸系樹脂系 高分子分散劑。 相對於著色感光性樹脂組成物之固體成分,著色劑之 含量較佳為10〜70質量%。藉由將含量設為7〇質量%以 下,可抑制光硬化不良,又,藉由將含量設為1〇質量%以When it is used as a color light-emitting sheet such as a liquid crystal display device, it is possible to form a low-power consumption display with less leakage and high reliability. As the coloring agent, an organic pigment may be added to the above inorganic pigment as an auxiliary pigment. The organic pigment obtains the following effects by appropriately selecting and adding an organic pigment which exhibits a complementary color of the inorganic pigment. For example, carbon black is slightly reddish black. Therefore, by adding an organic pigment which exhibits a red complementary color, that is, blue, to the carbon black as an auxiliary pigment, the red color of the carbon black can be eliminated, thereby exhibiting a better black overall. The amount of the organic pigment to be used is preferably in the range of 10 to 80% by mass, more preferably in the range of 20 to 60% by mass, particularly preferably in the range of 20 to 40% by mass, based on the total of the inorganic pigment and the organic pigment. . As the inorganic pigment and the organic pigment, a solution obtained by dispersing a pigment in an appropriate degree by a dispersing agent can be used. For example, as the inorganic pigment, CF Black (containing carbon having a concentration of 20%) manufactured by Yuki Co., Ltd., and CF Black (including 24% of high-resistance carbon) manufactured by Yuki Co., Ltd. , Titanium black dispersion CF Black (containing 20% black titanium pigment) manufactured by Yuguo Pigment Co., Ltd. In addition, as the organic pigment, for example, a blue pigment dispersion liquid CF Blue (containing 20% of a blue pigment) manufactured by Yuki Co., Ltd., and a purple pigment dispersion liquid manufactured by Yuki Co., Ltd. 25 201009495 (including 1% by weight) Purple pigment) and so on. Further, as the dispersing agent, a polyethyleneimine resin, a urethane resin or an acrylic resin polymer dispersant is preferably used. The content of the colorant is preferably from 10 to 70% by mass based on the solid content of the colored photosensitive resin composition. By setting the content to 7% by mass or less, it is possible to suppress photohardening failure and to set the content to 1% by mass.

參 上’可獲得充分之遮光性。又,在以後述方式使用本發明 之著色感光性樹脂組成物來成膜為黑色矩陣時,著色劑之 濃度較佳為調整成每…膜厚之叫Optical Density, 光學密度)值成為1.5以上。若备丨,# β ,,1V L 右每1 Mm膜厚之〇D值為 1 M上,則用於液晶顯 對比度。 顯不^之黑色矩陣時,可獲得充分之 本發明之著色感光性樹脂組 之溶劑。作為每々細, 攻物較佳為含有用以 醇單乙醚、乙_ 乙一醇單甲醚、 單甲越、二乙一醇單正丙越、乙二醇單正丁喊、二乙 單正丁鍵、醇單乙趟、二乙二醇單正丙鱗、二乙 甲-、丙二醇二單乙二:單甲^三乙二醇單―二 -醇%乙越、丙二醇單正丙鍵、 -而一醇單甲峻、二丙二醇單乙鍵、二丙-正Ί 一丙二醇嚴—丙一醇單正丙 蟬皁正丁醚、三丙二 平土內 (聚)燒二醇單燒基·;乙::::三丙二醇單乙 乙醚乙酸_、-乙-薛、田麵乙酸酿、乙二 釀1,二醇單甲鍵乙酸輯、两-乙二醇單乙 醇單乙醚乙酸酯考 201009495 烷二醇單烷基醚乙酸酯類;二乙二醇二曱醚、二乙二醇甲 基乙醚、二乙二醇二乙醚、四氫呋喃等其他醚類;曱基乙 基酮、環己酮、2-庚酮、3-庚酮等鲷類;2-羥基丙酸甲醋、 2-羥基丙酸乙酯等乳酸烷基酯類;2-羥基-2-曱基丙酸乙 酯、3-甲氧基丙酸甲酯、3-曱氧基丙酸乙酯、3_乙氧基丙酸 甲酯、3-乙氧基丙酸乙酯、乙氧基乙酸乙酯、羥基乙酸乙 酯、2-羥基-3-曱基丁酸甲酯、乙酸3·曱氧基丁酯、乙酸3_ φ 甲基甲氧基丁酯、丙酸甲基-3-甲氧基丁 _、乙酸乙 酯、乙睃正丙酯、乙酸異丙酯、乙酸正丁酯、乙峻異丁酯、 曱酸正戊酯、乙酸異戊酯、丙酸正丁酯、丁酸乙酯、丁酸 正丙酯、丁酸異丙酯、丁酸正丁酯、丙酮酸甲酯、丙酮酸 乙酯、丙酮酸正丙酯、乙醢乙酸甲酯、乙醢乙酸乙酯、 氧代丁酸乙酯等其他酯類;甲笨、二甲苯等芳香族烴類; N·曱基吡咯烷酮、N,N•二甲基甲醯胺、N,N•二甲基乙酿胺 等醯胺類等。該等溶劑可單獨使用或者將2種以上组合而 ❹使用。 相對於著色感光性樹脂組成物之固體成分100質量 份,溶劑之含量較佳為5〇〜5〇〇質量份。 [其他成分] 本發月之著色感光性樹脂組成物中,可視需要而含有 添加劑。作為添加劑,可列舉:熱聚合抑制劑、消泡劑、 界面活性劑、敏化劑、硬化促進劑、光交聯劑、光敏劑、 刀散劑、分散助劑、填充劑、密著促進劑、抗氡化劑、紫 外線吸收劑、抗凝聚劑等。 27 201009495 [著色感光性樹脂組成物之製備方法] 本發明之著色感光性樹脂組成物可藉由將上述各成分 全部以授拌機進行混合而獲得。再者,為了使所獲得之混 合物變得均勻,可使用過濾器進行過滤。 [彩色濾光片之製造方法] 首先’使用輥塗機(roll coater )、反向塗佈機(reverse coater )、刮棒塗佈機(bar coater )等接觸轉印型塗佈裝置, φ 或者旋轉器(spinner )(旋轉式塗佈裝置)、淋幕式平面塗 裝機(curtain flow coater )等非接觸型塗佈裝置,將本發 明之著色感光性樹脂組成物塗佈於基板上。基板係使用具 有透光性之基板。 繼而,使所塗佈之著色感光性樹脂組成物乾燥而形成 塗膜。乾燥方法並無特別限定,例如可使用以下方法中之 任一種方法:(1)利用加熱板(hot plate )於80 °C〜120 °C、較佳為於90°C〜10(TC之溫度乾燥60〜120秒之方法, (2)在室溫放置數小時〜數曰之方法’(3)在溫風加熱器 或紅外線加熱器中放置數十分鐘〜數小時而除去溶劑之方 法。 繼而,經由負像光罩(negative mask ),對該塗膜照射 紫外線、準分子雷射光等活性能量線而進行部分曝光。所 照射之能量線量根據著色感光性樹脂組成物之組成而有所 不同’例如較佳為30〜2000 mJ/cm2左右。 繼而,利用顯影液對曝光後之臈進行顯影而形成所需 形狀之圖案。顯影方法並無特別限定,例如可使用浸潰法、 28 201009495 喷霧法等。作為顯影液,可列舉:單乙醇胺、二乙醇胺、 二乙_醇胺等有機系顯影液或者氮氧化納、風氧化卸、碳 酸鈉、氨、四級錄鹽等之水溶液。 繼而,於200°C左右之溫度對顯影後之圖案進行後烘 烤。此時,較佳為對所形成之圖案進行全面曝光。藉由以 上操作可形成具有規定圖案形狀之黑色矩陣。 繼而’將R、G、B各色墨水自喷墨嘴喷出至由黑色矩 % 陣所劃分之各區域内,利用熱或光使所蓄積之墨水硬化。 藉此可製造彩色濾光片。 [實施例] 〈實施例1 &gt; 光聚合性化合物(A )係使用下述樹脂(A-1 )、以及 作為單趙(A·3 )之季戊四醇四丙稀酸酯。 [樹脂(A_l)之合成] _ 樹脂(A-1)之合成方法如下所述。 一面以25 ml/分鐘之速度吹入空氣,一面於90°C〜100 C對235 g雙酚苐型環氧樹脂(環氧當量為235 )、110 mg 氣化四曱基銨、1〇〇 mg之2,6-二第三丁基-4-曱基苯酚、及 72.〇g丙烯酸進行加熱而使之溶解後,緩慢升溫至12〇°C。 其間’測定酸價,連續加熱攪拌約12小時直至酸價小於 mgKOH/g為止。繼而冷卻至室溫,獲得無色透明且固 體狀之雙酚薙型環氧丙烯酸酯。 繼而,在307.0 g所獲得之上述雙酚葬型環氧丙烯酸酯 中加入350 g丙二醇單曱醚乙酸酯(pgmEA)使之溶解後, 29 201009495 將80.5 g二苯甲酮四甲酸二酐及1 g溴化四乙基銨進行混 合,於110°C〜115°C反應4小時。確認酸酐基消失後,混 合3 8.0 g之1,2,3,6-四氫鄰苯二甲酸酐,並於90°C反應6 小時而獲得樹脂(A-1 )。再者,酸酐基之消失係藉由紅外 (IR )光譜而確認。所獲得之樹脂(A-1)以凝膠渗透層析 法(gel permeation chromatograph,GPC )而測定之質量平 均分子量為5000,酸價為80 mgKOH/g。該樹脂(A-1 )係 ❹ 利用乙酸-3-曱氧基丁酯而調整成固體成分濃度為55質量 % 〇 斥墨性化合物(B )係使用下述化合物(B-1 )。 [化合物(B-1 )之合成] ^ 化合物(B-1)之合成方法如下所述。 將 100 g 氟系單體(ch2=c(ch3)cooch2ch2(c F2)4F )、8 g甲基丙稀酸縮水甘油酯、25 g丙烯酸、32 g甲 氧基二乙二醇甲基丙烯酸酯、7 g鏈轉移劑正十二烷基硫 醇、2 g之2,2’-偶氮雙(4-曱氧基-2,4-二甲基戊腈)溶解於 3 84 g之乙酸3-甲氧基丁酯中,於氮氣環境下、在60°C — 面攪拌一面使之聚合而獲得共聚物。所獲得之化合物(B-1 ) 以GPC測定之質量平均分子量為8000。再者,該化合物 (B-1 )係利用乙酸_3_甲氧基丁酯而調整成固體成分濃度 為30質量% 〇 光聚合起始劑(C)係使用化合物CGI242 (汽巴精化 ( Ciba Specialty Chemicals)公司)。 著色劑(D)係使用黑色顏料(御國色素公司製造, 30 201009495 CF Black :碳黑為25質量。/。,溶劑:乙酸3_曱氧基丁酯)β 將上述各成分與溶劑(乙酸3_甲氧基丁酯:環己酮= 60 : 40 )進行調配,以攪拌機混合2小時後,以5〆瓜膜 濾器(membrane fiiter )進行過濾,製備著色感光性樹脂組 成物。 〈比較例1 &gt; 除了以甲基丙烯酸代替丙烯酸之外,以與實施例1相 Φ 同之方式製備著色感光性樹脂組成物。 〈評價〉 將上述實施例1及比較例1中所製備之著色感光性樹 脂組成物塗佈於玻璃基板上後,於90〇c乾燥2分鐘而獲得 具有約2 ym膜厚之感光層。繼而,經由負像光罩以2〇〇 mJ/cm2之曝光量對該感光層選擇性照射紫外線,使用 N-a3K (東京應化工業公司製造广純水=1:25之溶液作 為顯影液,於25°C噴霧顯影60秒,藉此形成圖案。然後, ❹於22G C對所形成之圖案實施3()分鐘的後烘烤,藉此形成 線寬為20私m之格子狀黑色矩陣圖案。然後對於丙二 醇單甲醚(PM)、1,3_丁二醇二乙酸醋(13 bgda)、二乙 二醇單丁醚乙酸酯(BDGAC )、二乙二醇單乙醚乙酸酯 (EDGAC )、及純水在圖查μ 任圖案上之溶劑接觸角進行測定。結 果示於表1中。 31 201009495 [表i] 接觸角 (PM) 接觸角 (1,3-BGDA) 接觸角 (BDGAC) 接觸角 (EDGAC) 接觸角 (純水) 實施例1 45度 55.2 度 56.3 度 57.0 度 100度 比較例1 40度 54.3 度 55.0 度 55.8 度 102.3 度 PM :丙二醇單甲_ BGDA: 1,3-丁二醇二乙酸酯 BDGAC :二乙二醇單丁謎乙酸酯 EDGAC :二乙二醇單乙謎乙酸酯 由表1可知,藉由使用丙烯酸(實施例1)來代替甲 基丙婦酸(比較例1),對於有機溶劑之接觸角會變大。由 此可知’相較於習知者,本案發明之著色感光性樹脂組成 物的斥墨性受到提升。再者,比較丙烯酸與甲基丙烯酸時, 甲棊丙烯酸由於碳數較多,而被認為通常會親油性較高、 親水性較低’但在本發明之著色感光性樹脂組成物中則令 人驚異地發現其具有相反的效果。 【圖式簡單說明】 無 【主要元件符號說明】 75¾¾ 32Refer to ' to get adequate shading. Further, when a coloring photosensitive resin composition of the present invention is used as a black matrix in a later embodiment, the concentration of the coloring agent is preferably adjusted to an optical Density of a film thickness of 1.5 or more. If it is prepared, #β ,,1V L and the right 每D value of 1 Mm film thickness is 1 M, it is used for liquid crystal display contrast. When the black matrix is not displayed, a solvent sufficient for the colored photosensitive resin group of the present invention can be obtained. As each fine, the attacker preferably contains alcohol monoethyl ether, ethyl ethoxylate monomethyl ether, monomethyl acetonide, diethyl succinyl alcohol, single positive propylene, ethylene glycol single positive butyl singer, and diethylene singly Key, alcohol monoethyl hydrazine, diethylene glycol mono-n-propyl squama, di-methyl-, propylene glycol, two-single-ethylene: monomethyltriethylene glycol mono-di-ol%, propylene glycol, propylene glycol mono-n-propyl bond, - And monool monomethyl, dipropylene glycol monoethyl bond, dipropyl-n-n-propane-propylene glycol, n-propanol, mono-n-propyl sulfonate, n-butylene, tripropylene bismuth (poly), diol, monoalkyl ; B:::: Tripropylene glycol monoethyl ether acetate _, - B - Xue, Tata acetic acid brewing, Ethylene brewing 1, diol monomethyl acetate series, two - ethylene glycol monoethanol monoethyl ether acetate test 201009495 Alkanediol monoalkyl ether acetate; diethylene glycol dioxime ether, diethylene glycol methyl ether, diethylene glycol diethyl ether, tetrahydrofuran and other ethers; mercapto ethyl ketone, cyclohexanone , anthracene such as 2-heptanone or 3-heptanone; alkyl lactate such as methyl 2-hydroxypropionate or ethyl 2-hydroxypropionate; ethyl 2-hydroxy-2-mercaptopropionate, 3 -methyl methoxypropionate, 3-methoxypropane Ethyl ester, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl ethoxyacetate, ethyl hydroxyacetate, methyl 2-hydroxy-3-mercaptobutyrate, acetic acid 3 · 曱oxybutyl ester, acetic acid 3_ φ methyl methoxybutyl ester, propionate methyl-3-methoxybutyl _, ethyl acetate, acetamidine propyl ester, isopropyl acetate, n-butyl acetate , Ethyl isobutyl ester, n-amyl phthalate, isoamyl acetate, n-butyl propionate, ethyl butyrate, n-propyl butyrate, isopropyl butyrate, n-butyl butyrate, acetone Other esters such as ester, ethyl pyruvate, n-propyl pyruvate, methyl acetate, ethyl acetate, ethyl oxobutanoate; aromatic hydrocarbons such as methyl bromide and xylene; N·曱Amidoxime such as pyrrolidone, N,N-dimethylformamide or N,N-dimethylethenamine. These solvents may be used singly or in combination of two or more. The content of the solvent is preferably 5 Å to 5 Å by mass based on 100 parts by mass of the solid content of the colored photosensitive resin composition. [Other Ingredients] The coloring photosensitive resin composition of this month may contain an additive as needed. Examples of the additive include a thermal polymerization inhibitor, an antifoaming agent, a surfactant, a sensitizer, a hardening accelerator, a photocrosslinking agent, a photosensitizer, a knife powder, a dispersing aid, a filler, and a adhesion promoter. Anti-cracking agent, ultraviolet absorber, anti-agglomerating agent, etc. 27 201009495 [Preparation method of coloring photosensitive resin composition] The colored photosensitive resin composition of the present invention can be obtained by mixing all of the above components with a mixer. Further, in order to make the obtained mixture uniform, a filter can be used for filtration. [Manufacturing Method of Color Filter] First, a contact transfer type coating device such as a roll coater, a reverse coater, or a bar coater is used, φ or A non-contact type coating device such as a spinner (rotary coating device) or a curtain flow coater is applied to the substrate on the colored photosensitive resin composition of the present invention. As the substrate, a substrate having light transmissivity is used. Then, the applied colored photosensitive resin composition is dried to form a coating film. The drying method is not particularly limited. For example, any of the following methods may be used: (1) using a hot plate at 80 ° C to 120 ° C, preferably at 90 ° C to 10 (TC temperature) Method of drying for 60 to 120 seconds, (2) Method of placing at room temperature for several hours to several 曰 '(3) A method of removing the solvent by placing it in a warm air heater or an infrared heater for several tens of minutes to several hours. The coating film is partially exposed by irradiation with an active energy ray such as ultraviolet light or excimer laser light through a negative mask. The amount of energy ray to be irradiated differs depending on the composition of the colored photosensitive resin composition. For example, it is preferably about 30 to 2000 mJ/cm2. Then, the developed enamel is developed by a developing solution to form a pattern having a desired shape. The development method is not particularly limited, and for example, a dipping method, 28 201009495 spray can be used. The developing solution may, for example, be an organic developing solution such as monoethanolamine, diethanolamine or diethanolamine or an aqueous solution of sodium oxynitride, aerobic oxidation, sodium carbonate, ammonia or a quaternary salt. At 2 The developed pattern is post-baked at a temperature of about 00 ° C. At this time, it is preferable to perform overall exposure on the formed pattern. By the above operation, a black matrix having a predetermined pattern shape can be formed. Each of the G and B inks is ejected from the ink ejecting nozzle into each of the regions divided by the black matrix, and the accumulated ink is hardened by heat or light. Thereby, a color filter can be manufactured. [Embodiment] Example 1 &gt; The photopolymerizable compound (A) was obtained by using the following resin (A-1) and pentaerythritol tetrapropyl acrylate as a single (A·3). [Synthesis of Resin (A-1)] _ Resin ( The synthesis method of A-1) is as follows. Air is blown at a rate of 25 ml/min, and 235 g of bisphenol quinone type epoxy resin (epoxy equivalent 235), 110 at 90 ° C to 100 C Mg gasified tetradecyl ammonium, 1 〇〇mg of 2,6-di-t-butyl-4-nonyl phenol, and 72. 〇g of acrylic acid are heated and dissolved, and slowly heated to 12 ° C During the measurement of the acid value, continuous heating and stirring for about 12 hours until the acid value is less than mgKOH / g. Then cooled to room temperature, to obtain colorless a transparent and solid bisphenol oxime type epoxy acrylate. Then, after adding 350 g of propylene glycol monoterpene ether acetate (pgmEA) to 30 8.0 g of the above bisphenol borne epoxy acrylate, 29 201009495 80.5 g of benzophenone tetracarboxylic dianhydride and 1 g of tetraethylammonium bromide were mixed and reacted at 110 ° C to 115 ° C for 4 hours. After confirming that the anhydride group disappeared, 3 8.0 g of 1 was mixed. 2,3,6-tetrahydrophthalic anhydride was reacted at 90 ° C for 6 hours to obtain a resin (A-1 ). Further, the disappearance of the acid anhydride group was confirmed by infrared (IR) spectroscopy. The obtained resin (A-1) had a mass average molecular weight of 5,000 and an acid value of 80 mgKOH/g as measured by gel permeation chromatograph (GPC). The resin (A-1) was adjusted to have a solid content concentration of 55 mass% by using -3-butyloxybutyl acetate. 〇 The ink repellent compound (B) was the following compound (B-1). [Synthesis of Compound (B-1)] ^ The synthesis method of Compound (B-1) is as follows. 100 g of fluorine-based monomer (ch2=c(ch3)cooch2ch2(c F2)4F), 8 g of glycidyl methacrylate, 25 g of acrylic acid, 32 g of methoxydiethylene glycol methacrylate , 7 g chain transfer agent n-dodecyl mercaptan, 2 g of 2,2'-azobis(4-decyloxy-2,4-dimethylvaleronitrile) dissolved in 3 84 g of acetic acid 3 In the -methoxybutyl ester, the copolymer was polymerized by stirring at 60 ° C under a nitrogen atmosphere to obtain a copolymer. The obtained compound (B-1) had a mass average molecular weight of 8,000 as measured by GPC. Further, the compound (B-1) was adjusted to have a solid content concentration of 30% by mass using acetic acid_3_methoxybutyl ester. The photopolymerization initiator (C) was a compound CGI242 (Ciba quinone ( Ciba Specialty Chemicals)). The coloring agent (D) is a black pigment (manufactured by Royal Jelly Co., Ltd., 30 201009495 CF Black: carbon black is 25 mass%, solvent: 3: methoxybutyl acetate) β, the above components and solvent (acetic acid 3_Methoxybutyl ester: cyclohexanone = 60: 40) The mixture was mixed and mixed with a stirrer for 2 hours, and then filtered through a 5 〆 membrane filter to prepare a colored photosensitive resin composition. <Comparative Example 1 &gt; A colored photosensitive resin composition was prepared in the same manner as in Example 1 except that methacrylic acid was used instead of acrylic acid. <Evaluation> The colored photosensitive resin compositions prepared in the above Example 1 and Comparative Example 1 were applied onto a glass substrate, and then dried at 90 ° C for 2 minutes to obtain a photosensitive layer having a film thickness of about 2 μm. Then, the photosensitive layer is selectively irradiated with ultraviolet light by an exposure amount of 2 〇〇mJ/cm 2 through a negative image mask, and a solution of N-a3K (a wide purity water of 1:20 manufactured by Tokyo Ohka Kogyo Co., Ltd.) is used as a developing solution. The pattern was formed by spray development at 25 ° C for 60 seconds, and then the pattern was formed by post-baking at 22 G C for 3 () minutes, thereby forming a lattice-like black matrix pattern having a line width of 20 m. Then for propylene glycol monomethyl ether (PM), 1,3-butanediol diacetate vinegar (13 bgda), diethylene glycol monobutyl ether acetate (BDGAC), diethylene glycol monoethyl ether acetate ( EDGAC), and pure water were measured at the solvent contact angle on the pattern of the pattern. The results are shown in Table 1. 31 201009495 [Table i] Contact angle (PM) Contact angle (1,3-BGDA) Contact angle ( BDGAC) Contact Angle (EDGAC) Contact Angle (Pure Water) Example 1 45 degrees 55.2 degrees 56.3 degrees 57.0 degrees 100 degrees Comparative Example 1 40 degrees 54.3 degrees 55.0 degrees 55.8 degrees 102.3 degrees PM: Propylene glycol monomethyl _ BGDA: 1,3 - Butanediol diacetate BDGAC: Diethylene glycol monobutyl acetate EDGAC: Diethylene glycol mono-acetic acid acetate is known from Table 1, by When acrylic acid (Example 1) was used instead of methyl acetoacetic acid (Comparative Example 1), the contact angle with respect to the organic solvent became large. Thus, it was found that the colored photosensitive resin composition of the present invention is different from the conventional one. In addition, when acrylic acid and methacrylic acid are compared, formazan acrylic acid is considered to have high lipophilicity and low hydrophilicity due to the large carbon number, but in the coloring sensitivity of the present invention. It is surprisingly found in the resin composition that it has the opposite effect. [Simple description of the drawing] No [Main component symbol description] 753⁄43⁄4 32

Claims (1)

201009495 七、申請專利範圍: 1. 一種著色感光性樹脂組成物,其係含有光聚合性化合 物(A )、斥墨性化合物(B )、光聚合起始劑(c )以及著 色劑(D )之著色感光性樹脂組成物,其特徵在於: 前述斥墨性化合物(B)是至少使具有乙烯性不飽和基 及氟原子之單體(bl)、與丙烯酸(b2)進行共聚合而成的 共聚物。 2 ·如申請專利範圍第1項所述之著色感光性樹脂組成 物’其中前述斥墨性化合物(B)中之由前述具有乙稀性不 飽和基及氟原子之單體(bl)衍生而來之單元的含量是3〇 〜80質量%,由丙烯酸(b2)衍生而來之單元的含量是〇1 〜20質量%。 3. 如申請專利範圍第1項所述之著色感光性樹脂組成 ® 物,其中前述斥墨性化合物(Β)是進一步使具有乙婦性不 飽和基及環氧基之單體(b3)進行共聚合而成的共聚物。 4. 如申請專利範圍第3項所述之著色感光性樹脂組成 物’其中前述斥墨性化合物(B )令之由前述具有乙婦性不 飽和基及環氧基之單體(b3)衍生而來之單元的含量是2 〜40質量% 〇 33 201009495 5. 物 如申請專利範圍第1項所述之 ,其中前、+、 .著色感光性樹脂組成 其中前述斥墨性化合物(B)之質 5〇〇〇〇。 重十均刀子量為20〇〇 6物,二請專利範㈣1項所述之著色感光性樹腊組成 、前述光聚合性化合物(A)與前述斥墨性化合物(B ) 之含有質量比為99.9 : 0.1〜70 : 30 〇201009495 VII. Patent application scope: 1. A colored photosensitive resin composition containing a photopolymerizable compound (A), an ink repellent compound (B), a photopolymerization initiator (c), and a color former (D) The coloring photosensitive resin composition is characterized in that the ink repellent compound (B) is obtained by copolymerizing at least a monomer (b1) having an ethylenically unsaturated group and a fluorine atom with acrylic acid (b2). Copolymer. 2. The colored photosensitive resin composition as described in claim 1, wherein the ink repellent compound (B) is derived from the monomer (bl) having an ethylenically unsaturated group and a fluorine atom. The content of the unit is from 3 to 80% by mass, and the content of the unit derived from acrylic acid (b2) is from 〇1 to 20% by mass. 3. The colored photosensitive resin composition according to claim 1, wherein the ink repellent compound (Β) is further subjected to a monomer (b3) having an ethylenically unsaturated group and an epoxy group. Copolymerized copolymer. 4. The colored photosensitive resin composition as described in claim 3, wherein the aforementioned ink repellent compound (B) is derived from the aforementioned monomer (b3) having an ethylenically unsaturated group and an epoxy group. The content of the unit is 2 to 40% by mass. 〇33 201009495 5. The material is as described in claim 1, wherein the pre-, +, coloring photosensitive resin is composed of the above-mentioned ink repellent compound (B). Quality 5〇〇〇〇. The weight ratio of the photopolymerizable compound (A) to the ink repellent compound (B) is 99.9 : 0.1~70 : 30 〇 7 λ . .如申請專利範圍第1項所述之著色感光性樹脂組成 、中别述光聚合性化合物(A )包含:藉由使環氧化合 ^7 ( ^al)與含乙烯性不飽和基之羧酸化合物(a2)的反應 物’進一步與多元酸酐(a3)反應而獲得之樹脂。 8.如申請專利範圍第1項所述之著色感光性樹脂組成 物’其中前述著色劑(D)是遮光劑。 34 201009495 四、指定代表圖: (一) 本案指定代表圖為:無。 (二) 本代表圖之元件符號簡單說明:無。 五、本案若有化學式時,請揭示最能顯示發明特徵的化學式:7 λ . . The coloring photosensitive resin composition according to the first aspect of the invention, wherein the photopolymerizable compound (A) comprises: by epoxidizing ^7 (^al) with ethylenically unsaturated The reactant of the carboxylic acid compound (a2) is further reacted with a polybasic acid anhydride (a3) to obtain a resin. 8. The colored photosensitive resin composition as described in claim 1, wherein the coloring agent (D) is an opacifier. 34 201009495 IV. Designated representative map: (1) The representative representative of the case is: None. (2) A brief description of the symbol of the representative figure: None. 5. If there is a chemical formula in this case, please disclose the chemical formula that best shows the characteristics of the invention:
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JP6009774B2 (en) * 2011-02-22 2016-10-19 東京応化工業株式会社 Photosensitive resin composition, and color filter and display device using the same
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* Cited by examiner, † Cited by third party
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