TW201009307A - Optical characteristic measuring device and optical characteristic measuring method - Google Patents
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- G—PHYSICS
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- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
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Abstract
Description
.201009307 » 六、發明說明: 【發明所屬之技術領域】 、本發明係有關於光學特性測定裝置及光學特性測定方 法特別有關於測定待測對象於光照射後之反射光,用以 測定待測對I光學特性之光學特性測定裝i,及使用該裝 置之光學特性測定方法。 【先前技術】.201009307 » VI. Description of the invention: [Technical field to which the invention pertains] The present invention relates to an optical characteristic measuring device and an optical characteristic measuring method, particularly relating to measuring reflected light of an object to be measured after light irradiation, for determining a test to be measured The optical characteristics of the I optical characteristics were measured, and the optical characteristics of the device were measured. [Prior Art]
s知之光學特性測定裝置’係於待測物被光照射後, 對其反射光進行分光測定,據以測定該待測物之光學特 性。舉例來說’此-光學特性測定裝置,係揭露於日本專 利特開平11-316186號公報(專利文獻〇及特開平 11-230829號公報(專利文獻2)中。 · 專利文獻1所揭露之光學特性測定裝置(分光光度計) 係包括上部遮光部,可用以對放置待測物之取樣集合 (sample set)面進行開關控制。 除此之外,專利文獻2所揭露之光學特性測定裝置(顯 微分光裝置)係包括照明光學系統及成像光學系統。照明 光學系統將從光源射出之照明光,透過半反射鏡(half mirror),被導向至放置於桌上之待測定樣品中,而成像 光學系…统則將待測定樣品之反射光導向繞射光拇及監測 (monitor)用光學系統中。接著’於待測定樣品上,繞射 光拇對來自於測定區域之觀察光進行分光,用以將分光光 譜(spectrum)成像於線感測器(line sens〇r)上。然後, 根據線感測器所測定之分光光譜,用以計算光學特性。另 3 201009307 一方面’藉由繼光鏡片(relay lens),監測用光學系統將 待測定樣品之放大影像成像於二維之電荷麵合 (charge-coupled-device,CCD)相機上。其次,根據電 荷耦合相機所拍攝之待測定樣品之放大影像,係用以碟認 測定位置及粗略對焦。 於一般之光學特性測定裝置中’如專利文獻2所揭露 之顯微分光裝置,係將從光源射出之照明光,同時用來進 行分光光譜之測定及對焦。 於專利文獻1及2所揭露之光學特性測定裝置中,需 =待測物對向之接物鏡(Qbjective lens)進行對焦及測 疋。卩位之指定。就此而言,於專利文獻2所揭露之光學特 !·生測定裝置中,利用所設之電荷耦合相機(丨6 ),可進行 對焦及取得測定部位之特性。然@,如上所述,由於 源射出之照明光同時被用來進行分光光譜之敎及對焦 所以必須使用半反射鏡(⑴,且需將觀察❹_ = 分光測定光之光學路徑上。因 問題。 U此,會有測定光光量損失之 【發明内容】 有鑑於此,本發明之日& ,The optical characteristic measuring device s is configured to measure the reflected light of the object to be tested after being irradiated with light, and to measure the optical characteristics of the object to be tested. For example, the present invention is disclosed in Japanese Laid-Open Patent Publication No. Hei 11-316186 (Patent Document No. 11-230829 (Patent Document 2). The characteristic measuring device (spectrophotometer) includes an upper light shielding portion that can be used for switching control of a sample set surface on which the object to be tested is placed. In addition, the optical characteristic measuring device disclosed in Patent Document 2 The differential optical device includes an illumination optical system and an imaging optical system. The illumination optical system transmits the illumination light emitted from the light source through a half mirror to the sample to be measured placed on the table, and the imaging optics The system directs the reflected light of the sample to be measured to the optical system for diffracting the light and the monitor. Then, on the sample to be measured, the diffracted light is used to split the observation light from the measurement area. The spectroscopic spectrum is imaged on a line sensor (line sens〇r), and then used to calculate the optical characteristic according to the spectroscopic spectrum measured by the line sensor. Another 3 201009307 On the one hand, by using a relay lens, the monitoring optical system images an enlarged image of the sample to be measured on a two-dimensional charge-coupled-device (CCD) camera. According to the magnified image of the sample to be measured taken by the charge-coupled camera, the position is determined and the focus is roughly focused. In the general optical characteristic measuring device, the microscopic spectroscopic device disclosed in Patent Document 2 is a light source. The illumination light emitted is used for the measurement and focusing of the spectroscopic spectrum. In the optical characteristic measuring apparatus disclosed in Patent Documents 1 and 2, it is necessary to focus and measure the Qbjective lens of the object to be tested. In this case, in the optical special-purpose measuring device disclosed in Patent Document 2, the charge-coupled camera (丨6) is provided, and the characteristics of the measurement site can be focused and acquired. As described above, since the illumination light emitted from the source is simultaneously used to perform the spectroscopy and focusing of the spectroscopic spectrum, it is necessary to use a half mirror ((1), and the observation ❹ _ = spectrometry is required) . On the optical path of the U because of a problem of this, there will be a loss of light quantity measured SUMMARY OF THE INVENTION In view of this, the date of the present invention &,
署见1 ^ ’在於提供光學特性測U 置及光學特性測定方法,用 疋裝 电用以控制測定光量之減少, 可以進行接物鏡之焦點調整及測定部位H , 本發明之光學特性測定裝置包括:測定部份, 自於待測物之測定光來測定# 來 设置於待測物及測定部份 鏡’ …Ρ伤之間的光學路徑上;及光注入部 201009307 份,於測定部份及接物鏡間之光學路徑的既定位置上,從 光學路徑外注入具有待測物反射波長之觀察光,其特徵在 於,具有將m察光注入光學路徑之第一模式,&未將觀察 光注入光學路徑而由測定部份進行測定之第二模式。 根據上述之架構,將具有待測物反射波長之觀察光注 入待測物及測定部份之間的光學路徑上時,可用以進行接 物鏡之焦點調整及測定部位之指定,就此而言,在未=入 觀察光之狀態下,係利用測定部份進行測定,i能夠於: 行測定時開啟該光學路徑。因此’根據本發明之光學特性 測定裝置,能夠控制敎光量之減少,同時進行接物鏡之 焦點調整及測定部位之指定。推一丰丄 疋進步,由於能夠控制測定 先進入測定光學系統,而能夠於測定中控制雜散光之產生。 更好地,該光學特性測定裝置更包括快門, 學路徑之既定位置上’其中’於光學路徑關閉時,伊門ΐ 第一狀態’並將觀察光向著接物鏡,而於光學路經開啟時: 快門為第二狀態’且其中,當快 时 田陕門成為第一狀態時, 第一模式,而當快門成為第-壯能& 你馬 狀態時,係為第二模式。 如上所述’利用所設之快門,能夠切換光學路經之關 閉/開啟,以簡單之架構實現 二之關 現該第—模式及第二模式。 更好地,該光學特性測定裝置更包括反射 置於接物鏡及快門之間,用以s ^ 乃 ^ 對來自於反射鏡部份之反射光::測定光;及取像部份, 如上所述,當設置取像tr:之反射影像進行取像。 份之反射光所得之反射影像進用u對來自於反射鏡部 像進仃取像時,便能夠根據取像 201009307 部份所取得之影 k 指定。 來進行接物鏡之焦點調整及測定部位之 本發月之光學特性測定方法, 之測定光來測定待 ]用來自於待測物 括·笛牛趣 光學特性之光學特性㈣方法,々 括.第一步驟,於測定光之光學路徑上方法,包 且位於待測物相對 :相對於接物鏡 待測物反射波長之勘 卜左入具有 學路徑,且用測定光進行測定。 察先不注入光 根據上述方法,於 長之觀察光注入待測物,’將具有待測物反射波 可用以,物定部份之間的光學路徑上時, ]用以進灯接物鏡 “、'點調整及測定部位之指定。進一 步於第一步驟中,右去、、 定部份進行測定,且能夠於、^之狀態下’係利用測 因此,根據本發明之光::疋時開啟該光學路徑。 I 2 4 寺性測定方法,能夠控制測定光 〜同時進行接物鏡之焦點調整及測定部位之指 处進#由於能夠控制測定光進入測定光學系統’而 月匕夠於測定中控制雜散光之產生。 更好地,該光學特性測定方法,更包括:由設置於光 路技上之反射鏡部份來反射測定光,以及對來自於反射 兄部份之反射光所得之反射f彡像進行取像。 如上所述,對設置於光學路徑上之反射鏡部份之反射 所取得之反射影像進行取像時,便能夠根據該反射影像 來進行接物鏡之焦點調整及測定部位之指定。 依據本發月⑯夠於測定光學特性時控制測定光量 201009307 之減少’同時可以進行接物鏡之隹 定。 ,、、、點調整及測定部位之指 為使本發明之上述目的、牲 η" 優點能更明顯易懂, 下文特舉一較佳實施例,並配合 所附圖式,作詳細說明如 下。 【實施方式】 下文係配合圖示說明本發明之較佳實施方式。此外, 於下文之圖示中,相同或類似之元件係以相同或類似之符 號表示之,並省略重複之說明。 進一步,於以下說明之實施例中,所提及之個數、數 量等,除了特別加以說明之情況外,該個數、數量等並非 用以限定本發明之範圍。加之, ^於以下之實施例中,除了 特別加以說明之情況外,每一电志 可姐·成7G件對本發明而言並非 為必須的。除此之外,於以下複數之實施例中,除了特別 加以說明之情況外,係於一開始安排各實施例架構之適當 組合。 -般而’本f施例之光學特性測定裝i,係用於色 不均測定、亮度測定、膜厚不均測定及多點(point) 分光測定之用途,但亦可適用於其它用途。 第1圖係顯示依據本發明實施例之光學特性測定裝置 之使用狀態說明示意圖。參考第J圖,於此實施例中,作 為光學特性測定裝置之分光器i,係用以測定待測物之樣 品2A之光學特性。如第i圖所示,分光器i可進行線狀區 域換句話說’分光器i將直線光展開於平面上來 201009307 ::分光,據以解析樣品2A之光學特性。以此平面擴展之 方式,此夠於較短時間内進行待測物光學特性之測定。 於第1圖之實施例中,脾具 DR2A之方“ ”中將長方形之樣品2A沿著箭頭 之方向h行移動,並利用沿著樣品 置之複數(例如3個)之分光器A寬度方向所配 樣品心光學特性。來細敎,據以測定 ,對此,作為分光器之使用狀態,亦可考慮第2圖之變 形例於第2圖之例子中’將圓形之樣品2b沿著箭頭㈣b 之旋轉,同時利用分光器1來進行測定,據以測定樣品⑼ 之光學特性。 《分光器1之架構》 接著,利用第3圖來說明分光器!之架構。參考第3 圖’分光器1包括測定部份10、接物㈣、發光二極體(led) 3一〇、缝隙反射鏡(slit mirr〇r) 4〇、快門(遍⑻5〇、 -透鏡(triplet lens) 60及80、繞射光柵70、反射 鏡90、及1〇〇、透鏡丨1〇、取像部份及框體HQ。 測定。P伤1 G包括受光部份i i。當利用分光器丄測定 待測物2之光學特性時,將來自於測定用光源(未圖示) 之光照射於待測物2上,透過繞射光栅70,將待測物2之 反射光導向測定部份10之受光部份u。 接物鏡20設置於待測物2之對向。來自於未圖示測定 用光源之光,透過接物鏡2〇,到達待測物2,而待測物2 所反射之反射光(測定光),透過接物鏡2 〇,到達測定部 份1 〇 〇 .201009307 發光二極體30係為射出光線(觀察光)之光界 對待測物2進行對隹,开 ’、用以 '、、、#曰定待測物2之測定對象位置。 發光一極體3〇向著恤 银時,將藤水 、1 5〇照射觀察光。快門50於關閉狀 …、t一極體30之光向著接物鏡20反射。由於哕 反射光成像於待測物2 由於該 隹 之表面,因此調整對物鏡20來對 …、使對物鏡2 0能夠進行隹 “、、點調整。另外,成像於待測物 2表面之先線位置,亦可用以指定測定部位。 縫隙反射鏡40為具有細長狀開口部份之(缝隙)反射 / & P1 50於開啟狀態時’通過縫隙反射鏡⑽之直The device sees 1 ^ 'in the provision of optical characteristics measurement U and optical characteristics measurement method, using armored electricity to control the reduction of the measured light amount, the focus adjustment of the objective lens and the measurement site H can be performed, and the optical characteristic measuring device of the present invention includes : the measurement portion is determined from the measurement light of the test object to be placed on the optical path between the object to be tested and the measurement portion of the mirror; and the light injection portion is 201009307, in the measurement portion and At a predetermined position of the optical path between the objective lenses, the observation light having the reflection wavelength of the object to be detected is injected from outside the optical path, and is characterized in that it has a first mode of injecting the light into the optical path, and the observation light is not injected. The second mode in which the optical path is measured by the measurement portion. According to the above structure, when the observation light having the reflection wavelength of the object to be tested is injected into the optical path between the object to be tested and the measurement portion, the focus adjustment of the objective lens and the measurement portion can be designated, in this case, In the state where the light is not observed, the measurement is performed by the measurement portion, and i can be turned on when the measurement is performed. Therefore, according to the optical characteristic measuring apparatus of the present invention, it is possible to control the reduction of the amount of illumination and to perform focus adjustment of the objective lens and designation of the measurement site. Pushing a feng 丄 疋 progress, because it can control the measurement first into the measuring optical system, and can control the generation of stray light in the measurement. More preferably, the optical characteristic measuring device further comprises a shutter, wherein the predetermined position of the learning path is 'where' when the optical path is closed, the first state of the Igman' and the observation light is directed toward the objective lens, and when the optical path is opened : The shutter is in the second state' and wherein the first mode is when the fast time Tianshan Gate becomes the first state, and the second mode is when the shutter becomes the first-strong & your horse state. As described above, by using the shutter provided, the optical path can be switched off/on, and the first mode and the second mode can be realized by a simple architecture. Preferably, the optical characteristic measuring device further comprises a reflection disposed between the objective lens and the shutter for s ^ ^ 反射 反射 反射 : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : 测定As described, when the image of the image tr: is set, the image is taken. The reflected image obtained by the reflected light is used to capture the image from the mirror image, and can be specified according to the image k obtained in the image of 201009307. To adjust the focus of the objective lens and measure the optical characteristics of the measurement site, and measure the light to determine the optical characteristics (4) from the optical properties of the object to be tested. In one step, the method for measuring the optical path of the light is located on the opposite side of the object to be tested: the left-handed learning path with respect to the reflection wavelength of the object to be tested, and the measurement is performed by the measurement light. According to the above method, the light is injected into the object to be tested, and 'there will be a reflected wave of the object to be measured, when the optical path between the parts is used, for the light to be connected to the objective lens. , 'Point adjustment and designation of the measurement site. Further, in the first step, the measurement is performed on the right and the fixed portion, and the measurement can be performed in the state of "," and therefore, according to the present invention, the light according to the present invention: The optical path is turned on. I 2 4 The method of measuring the temple can control the measurement light to simultaneously adjust the focus of the objective lens and the finger of the measurement site. #The control light can be controlled to enter the measurement optical system. Controlling the generation of stray light. Preferably, the optical characteristic measuring method further comprises: reflecting the measuring light by a portion of the mirror disposed on the optical path, and reflecting the reflected light from the reflecting portion of the reflecting portion. As described above, when the reflected image obtained by the reflection of the mirror portion provided on the optical path is imaged, the focus of the objective lens can be performed based on the reflected image. Adjustment and measurement site designation. According to this month's 16th, it is sufficient to control the decrease of the measured light quantity 201009307 when measuring the optical characteristics. At the same time, the objective lens can be adjusted. The points of the adjustment, measurement and measurement are made to the present invention. The above-mentioned objects, advantages and advantages can be more clearly understood. The following is a detailed description of the preferred embodiments and the accompanying drawings, which are described below in detail. In the following, the same or similar elements are denoted by the same or similar symbols, and the repeated description is omitted. Further, in the embodiments described below, the number and quantity mentioned In addition, the number, the number, and the like are not intended to limit the scope of the present invention. In addition, in the following embodiments, except for the case where it is specifically described, The 7G piece is not essential to the present invention. In addition, in the following embodiments, except for the case where it is specifically described, it is The appropriate combination of the embodiments is arranged. - The optical characteristic measuring device i of the present embodiment is used for color unevenness measurement, brightness measurement, film thickness unevenness measurement, and multi-point spectroscopic measurement. However, it is also applicable to other uses. Fig. 1 is a schematic view showing the state of use of the optical characteristic measuring apparatus according to the embodiment of the present invention. Referring to Fig. J, in this embodiment, the optical splitter i as an optical characteristic measuring apparatus Is used to determine the optical characteristics of the sample 2A of the test object. As shown in Fig. i, the beam splitter i can perform a linear region. In other words, the beam splitter i expands the linear light onto the plane to 201009307:: In order to analyze the optical characteristics of the sample 2A, it is sufficient to measure the optical properties of the object to be tested in a short time. In the embodiment of Fig. 1, the square of the spleen DR2A is rectangular. The sample 2A is moved in the direction of the arrow h, and the optical properties of the sample core are arranged in the width direction of the beam splitter A along the plural (for example, three) of the sample. In order to measure the state of the spectroscope, it is also possible to use the modification of Fig. 2 in the example of Fig. 2 to rotate the circular sample 2b along the arrow (four) b. The spectrometer 1 performs measurement to determine the optical characteristics of the sample (9). "Architecture of Splitter 1" Next, use the third diagram to illustrate the splitter! The architecture. Referring to Fig. 3, the beam splitter 1 includes a measuring portion 10, a receiving member (four), a light emitting diode (led) 3, a slit mirror (slit mirr〇r) 4, a shutter (a repeating (8) 5 〇, a lens ( Triplet lens) 60 and 80, diffraction grating 70, mirror 90, and 1〇〇, lens 丨1〇, image capturing portion, and frame HQ. Measurement P damage 1 G includes light receiving portion ii. When measuring the optical characteristics of the test object 2, the light from the measurement light source (not shown) is irradiated onto the object to be tested 2, and the diffraction grating 70 is transmitted through the diffraction grating 70 to guide the reflected light of the object 2 to be measured. The light receiving portion 10 of the portion 10. The objective lens 20 is disposed opposite to the object to be tested 2. The light from the light source for measurement is not transmitted through the objective lens 2, and reaches the object to be tested 2, and the object to be tested 2 The reflected light (measured light) of the reflection passes through the objective lens 2 〇 and reaches the measurement part 1 〇〇.201009307 The light-emitting diode 30 is the light-emitting area of the emitted light (observation light), and the object 2 is turned on, Use ', ,, # to determine the position of the object to be measured 2. When the light is in the direction of the silver, the vine will be 1 〇 The observation light is emitted. The shutter 50 is closed, and the light of the t-pole body 30 is reflected toward the objective lens 20. Since the reflected light is imaged on the object to be tested 2 due to the surface of the crucible, the objective lens 20 is adjusted to The objective lens 20 can perform 隹", dot adjustment. In addition, the image is placed on the surface of the surface of the object to be tested 2, and can also be used to specify the measurement site. The slot mirror 40 is a (slit) reflection having an elongated opening portion. / & P1 50 in the open state 'through the slit mirror (10) straight
:光’透過三合透鏡60、繞射光柵7〇及三合透鏡8〇,被 導向測定部份1G之受光㈣丨卜另—方面,缝隙反射鏡 斤反射之光線,透過反射鏡9Q、_及透鏡⑴,被導 ^取像部fm如此—來’能夠由取像部份取得縫 隙反射鏡4 〇之反射部份所映出的待測部位周邊影像。於取 像4伤12G中’僅有縫隙反射鏡4Q之縫隙部份,係以黑色 表示之影像能_取得。因此,取像部份m所取得之影 像中’黑色所形成之縫隙部份即為測定部份。換言之,可 >考取像部伤12 G所取得之影像來指定測定部位。除此之 外’調整對物鏡20來對焦缝隙反射鏡4〇所映出之影像, 使對物鏡2 0能夠進行焦點調整。 人再者,發光二極體30、縫隙反射鏡4〇、快門5〇、三 合透鏡6。及80、繞射光栅7。、反射鏡9〇及1〇〇、及透鏡 110 ’係全部置於單一框體i3〇之内部。將測定部份】。、 接物鏡20及取像部份120設置於該框體13〇中,用以組成 9 201009307 分光器1。控制裝置3係連接於分光器丨之測定部份ι〇。 控制裝Ϊ 3根據分光器i之檢測結果’用以計算待測物2 之光學特性。關於該光學特性之計算方法,係以一實施例 說明如下。 《分光器1之光學特性測定過程》 接著,利用第4圖說明分光器丨之光學特性測定過程^ 參考第4 «’分光器i之光學特性測定方法係、包括:從發 光二極體30注入觀察光之步驟(第4圖之si〇)、及不從 發光二極體3。注入觀察光,而是利用測定用光源(未圖示) 之測定光來進行測定之步驟(第4圖之s2〇 )。 於训巾,快門50為『關閉狀態』。於此狀態下,將 發光二極體30之光線向著待測物2,使其反射。以此方式, 調整對物鏡20來對焦待測物2表The light 'transmits through the triplet 60, the diffraction grating 7〇 and the triplet 8〇, is guided to the light receiving part of the measuring part 1G (4), and the light reflected by the slit mirror is transmitted through the mirror 9Q, _ And the lens (1) is guided by the image portion fm such that the image of the portion of the portion to be tested reflected by the reflection portion of the slit mirror 4 is obtained from the image capturing portion. In the image 4 damage 12G, only the slit portion of the slit mirror 4Q is obtained by displaying the image in black. Therefore, the portion of the gap formed by the black portion of the image obtained by the image portion m is the measurement portion. In other words, it is possible to select the image obtained by the image damage of 12 G to specify the measurement site. In addition to this, the objective lens 20 is adjusted to focus on the image reflected by the slit mirror 4, so that the objective lens 20 can be adjusted in focus. Further, the light-emitting diode 30, the slit mirror 4A, the shutter 5〇, and the triplet lens 6. And 80, the diffraction grating 7. The mirrors 9〇 and 1〇〇, and the lens 110' are all placed inside the single frame i3〇. Will measure part]. The objective lens 20 and the image capturing portion 120 are disposed in the frame 13A to form a 9201009307 optical splitter 1. The control device 3 is connected to the measuring portion ι of the beam splitter. The control device 3 is used to calculate the optical characteristics of the object to be tested 2 based on the detection result of the beam splitter i. The calculation method of this optical characteristic will be described below by way of an embodiment. <<Optical characteristic measurement process of the spectroscope 1>> Next, the optical characteristic measurement process of the spectroscope 丨 will be described with reference to Fig. 4, referring to the optical characteristic measurement method of the fourth optical beam i, including: injection from the light-emitting diode 30 The step of observing light (si〇 in Fig. 4) and not from the light emitting diode 3. The observation light is injected, and the measurement is performed by the measurement light of the measurement light source (not shown) (s2〇 of Fig. 4). In the training towel, the shutter 50 is "closed state". In this state, the light of the light-emitting diode 30 is directed toward the object 2 to be reflected. In this way, adjusting the objective lens 20 to focus on the object to be tested 2
Jz衣面之成像,使對物鏡2〇 能夠進行焦點調整。除此之外,忐 r于此心外,成像於待測物2表面之光 線位置,可用以指定測定部位。 另一方面,由取像部份120取得待測物2之反射光影 像。可參考取像部份12〇所取# " |外付^影像來指定測定部位。 除此之外’調整對物鏡2〇來 术對焦縫隙反射鏡40所映出之 影像,使對物鏡20能夠進行焦點調整。 於S1 0之後’ s 2 0係利用士日思 ,, 用相異於發光二極體30之光源 (測定用光源),來進行待、.丨 原 仃侍測物2之光學特性測定。 中’關閉發光二極體30。 ^20The imaging of the Jz face makes it possible to adjust the focus of the objective lens 2〇. In addition to this, the position of the light line imaged on the surface of the object to be tested 2 can be used to specify the measurement site. On the other hand, the reflected light image of the object 2 is obtained by the image capturing portion 120. You can refer to the image taken in the image capture section 12 to specify the measurement site. In addition to this, the image reflected by the objective lens 2 is adjusted to focus the focus mirror 40 so that the objective lens 20 can be adjusted in focus. After S1 0, the s 2 0 system uses the light source (light source for measurement) different from the light-emitting diode 30 to measure the optical characteristics of the sample to be tested. The light-emitting diode 30 is turned off. ^20
Qn 此來,能夠控制發光二極體 30之光線進入測定光學系 體 宁、統進而於測定中控制雜散光 產生。 ^ .201009307 《基於分光器1檢測結果之光學特性計算方法》 接著,說明基於分光器1檢測結果之光學特性計算方 法。如第3圖所示,控制裝置3係連接於分光器工之測定 部份10。基於分光器丨之測定值,控制裝置3計算待測= 2之明亮度及色度等光學特性。舉例來講,控制裝置3所 計算出之光學特性包括三刺激值、色度座標、主波長 (dominant )、刺激純度(pUrj β )、相關色溫與偏差值 籲 (duv )、演色性評價值等。主要是根據XYZ表色系來規定 這些測定項目。 XYZ表色系所使用之三刺激值(X,γ,z),係根據下 列算式產生: 780 X = k H汾⑷元(又 380 , 780 Y = kYjSt(X)y(zy^ ? • 380 780 Z = k^St(X)z(Ayjl 5 380 其中,对⑷ :發光體於A义間隔内之分光分佈值’ 无(又)、7(^0、^又):xyz表色系之等色關數; ΔΑ :用以計算三刺激值之波長間隔; 允:常數。 於上式中,計算三刺激值(X,Y,Z)需測定值(分光 11 201009307 刀佈值),而控制裝置3,將可視域(38〇奈米〜78〇奈米) 中各波長分量之強度所對應之等色關數值相乘後再進行累 加。此二刺激值(X,γ,z)計算方法,即JIS z 8724所 規定之F顏色的測定方法—光源色』。 第5圖係顯示國際照明委員會(CIE)所規定之等色關 數。參考第5圖,等色關數對應於人眼所表現的分光感度。Qn In this way, it is possible to control the light of the light-emitting diode 30 to enter the measuring optical system, and to control the generation of stray light during the measurement. ^ .201009307 "Method for calculating optical characteristics based on the detection result of the spectroscope 1" Next, a method of calculating the optical characteristics based on the detection result of the spectroscope 1 will be described. As shown in Fig. 3, the control unit 3 is connected to the measuring portion 10 of the spectroscope. Based on the measured value of the splitter ,, the control device 3 calculates optical characteristics such as brightness and chromaticity of the test to be measured = 2. For example, the optical characteristics calculated by the control device 3 include a tristimulus value, a chromaticity coordinate, a dominant wavelength, a stimulus purity (pUrj β ), a correlated color temperature and a deviation value (duv), a color rendering evaluation value, and the like. . These measurement items are mainly specified in accordance with the XYZ color system. The tristimulus values (X, γ, z) used in the XYZ color system are generated according to the following formula: 780 X = k H汾(4) elements (again 380, 780 Y = kYjSt(X)y(zy^ ? • 380 780 Z = k^St(X)z(Ayjl 5 380 where, for (4): the spectral distribution value of the illuminant in the interval of A, no (again), 7 (^0, ^ again): xyz color system Equivalent color number; ΔΑ : used to calculate the wavelength interval of the tristimulus value; allow: constant. In the above formula, calculate the tristimulus value (X, Y, Z) to be measured (split 11 201009307 knife cloth value), and The control device 3 multiplies the equal-color off values corresponding to the intensities of the respective wavelength components in the visible field (38 〇 nanometer to 78 〇 nanometer), and then accumulates the second stimulus values (X, γ, z). The method is the method for measuring the F color specified by JIS z 8724 - the color of the light source. Figure 5 shows the number of equal color levels specified by the International Commission on Illumination (CIE). Referring to Figure 5, the number of equal colors corresponds to the person. The spectral sensitivity of the eye.
於二刺激值(X’ Y,Z )中,刺激值γ之值對應於待測 物2之明亮度。此外,於上式中,常數灸之值,係參考受 光部份330等之檢測增益比(gain),且預先設定其值, 用以使『Y』之值對應於實際測定明亮度之絕對值。 進一步,於三刺激值(X,γ,z)中,係利用刺激值χ 及刺激值Υ之值來計算色度座標。色度座標(χ,y),係 根據下列算式產生:In the second stimulus value (X' Y, Z ), the value of the stimulus value γ corresponds to the brightness of the object 2 to be tested. Further, in the above formula, the value of the constant moxibustion refers to the detection gain ratio (gain) of the light receiving portion 330 and the like, and the value is set in advance so that the value of "Y" corresponds to the absolute value of the actual measured brightness. . Further, in the tristimulus value (X, γ, z), the chromaticity coordinates are calculated using the values of the stimulus value χ and the stimulus value Υ. The chromaticity coordinates (χ, y) are generated according to the following formula:
X χ =—-- X-hY+Z 1X χ =—-- X-hY+Z 1
Y y =---Y y =---
χ+γ+ζ 0 色度座標C X,y) ’用以表示於χΥΖ表色系中,橫轴 方向之值與縱轴方向之值。此色度座標(χ,y)計算方法, 即J IS Z 8724所規定之『色的測定方法_光源色』。可以 根據CIE 1960 UCS及CIE 1 976 UCS來規定其它的計算方 法’用以作為色度座標(X,y )之計算方法,或亦可使用 這些計算方法。 以此方式,控制裝置3基於分光器300所檢剛之測定 12 201009307 值’用以計算出三刺激值(X,γ,z),並據以算出測定對 象,即待測物2之明亮度(kY )及色度座標(x,y )至少 其中之一。再者,控制裝置3預存上述之等色關數及常數 k 〇 於xyz表色系規定之色度圖中’主波長與色度座標(X y )之y座標值所對應之波長一致,用以表示待測物2之色 差。刺激純度’係對應於原點座標及色度座標(X,y )間 籲 之距離’用以表示待測物2之飽和度。該主波長與刺激純 度之計算方法’即JISZ8701所規定之『顏色的表示方法 一 XYZ表色系及χιογιοζίο表色系』。 相關色溫與偏差值(duv ),係分別表示與待測物2顏 色最接近之黑體溫度、以及相對於黑體溫度之偏差值,且 規定於JIS Z 8725之『光源分佈溫度與色溫、相關色溫之 測定方法』中。 /貝色性評價值,用以表示對待測物2之演色性加以評 _ 價,係規定於JIS Z 8726之『光源之演色性評價值方法』 中。 《上述架構之變形例》 舉例來講,可以下述之方式作為上述架構之變形例。 換s之,於此變形例中,去除第3圖之透鏡11〇及取像部 份120,使該等光軸之中心一致,及設置其它發光二極體。 於此情況下,來自於其它發光二極體之光(觀察光)被缝 隙反射鏡40反射,到達待測物2之表面。就此而言,為了 於待測物2上對焦,係調整接物鏡20,因此便能夠進行待 201009307 測物2之對隹。w ,' *此之外,形成於待測物2表面之影像 縫隙部份所對應之位置,即為測定位置。 象中’ 《總結》 故:上述之相關内容彙整如T。也就是說,於本實施 \ ’ 4『光學特性測定裝置』之分光器1包括:測定 來自於待測物2之測定光來測定待測物2之 先學特性,接物鏡20,設置於待測物2及測定部份 間的光學路輕卜.*5; Α 之 ,作為『光注入部份』之發光二極體χ+γ+ζ 0 The chromaticity coordinate C X,y) ' is used to indicate the value of the horizontal axis direction and the vertical axis direction in the χΥΖ χΥΖ color system. The calculation method of the chromaticity coordinate (χ, y) is the "color measurement method _ light source color" prescribed by J IS Z 8724. Other calculation methods can be specified according to CIE 1960 UCS and CIE 1 976 UCS as calculation methods for chromaticity coordinates (X, y), or these calculation methods can also be used. In this way, the control device 3 calculates the tristimulus value (X, γ, z) based on the measured value 12 201009307 of the spectroscope 300, and calculates the brightness of the object to be tested, that is, the brightness of the object 2 ( kY) and at least one of the chromaticity coordinates (x, y). Furthermore, the control device 3 prestores the above-described chromaticity number and constant k 〇 in the chromaticity diagram defined by the xyz color system, and the wavelengths corresponding to the y coordinate values of the main wavelength and the chromaticity coordinate (X y ) are the same. To indicate the color difference of the object 2 to be tested. The stimulus purity ' corresponds to the origin coordinate and the distance between the chromaticity coordinates (X, y)' to indicate the saturation of the object 2 to be tested. The calculation method of the dominant wavelength and the stimulation purity is the "color representation" of the XYZ color system and the χιογιοζίο color system as defined by JIS Z8701. The correlated color temperature and the deviation value (duv) respectively indicate the black body temperature closest to the color of the object to be tested 2 and the deviation value from the black body temperature, and are specified in JIS Z 8725 "Light source distribution temperature and color temperature, correlated color temperature" In the measurement method. The evaluation value of the colorimetric property of the object to be measured 2 is used to evaluate the color rendering property of the object to be tested 2, which is defined in JIS Z 8726, "Method for evaluating the color rendering property of a light source". <<Modification of the above structure>> For example, a modification of the above configuration can be made as follows. In other words, in this modification, the lens 11'' and the image taking portion 120 of Fig. 3 are removed, the centers of the optical axes are aligned, and other light-emitting diodes are provided. In this case, light (observation light) from the other light-emitting diodes is reflected by the slit mirror 40 to reach the surface of the object 2 to be tested. In this regard, in order to focus on the object to be tested 2, the objective lens 20 is adjusted, so that it is possible to perform the confrontation of the object 2 of 201009307. w , ' * In addition, the position corresponding to the gap portion of the image formed on the surface of the object 2 to be tested is the measurement position. In the case of “Summary”, the above related content is summarized as T. In other words, the spectroscope 1 of the present embodiment of the present invention includes: measuring the measurement light from the object 2 to measure the pre-test characteristics of the object to be tested 2, and the objective lens 20 is set to be The optical path between the measuring object 2 and the measuring portion is lighter. *5; Α, as the light-emitting diode of the "light-injecting portion"
於測定部份10 »社& dU % 10及接物鏡20 Fb1之光學路徑的既定位 從光學路徑外注人具有待測物2反射波長之觀察光。 =具有將觀察紐人光學路徑之第—模式(第 ㈣),及不將觀察光注人光學路徑q由測定 行測定之第二模式(第4圖之⑽)。 違 更具體地,分朵1 先益1更包括快門50,設置於光學路 之既定位置上。於光學路徑關閉時,快門5〇為第—狀能二 並將觀察光向著接物鏡2G,而於光學路徑開啟時,快門 % :第::態,其中,當快門50成為第-狀態(關閉狀態) 時,係為上述第一模式r 、弋S1 〇 ),而當快門50成為第二狀 態(開啟狀態)時’係為第二模式(S20)。 狀 另外’分光器1更包括作為『反射鏡部份』之縫 射鏡40,設置於接物鏡2 兄20及快門50之間,用以反射測定 二及取像Qp伤120 ’對來自於縫隙反射鏡4。之反射光所 得之反射影像進行取像。 根據此貝施例之分光器丄,將具有待測物2反射波長 14 201009307 / 之觀察光注入待測物2及測中 ^ ^ 測疋部份10之間的光學路徑上 時,可用以進行接物鏡之隹 甲峪仫上 ,、、、點調整及測定部位之指定。就 此而言,在未注入觀察光之狀 ’ ,, &下’係利用測定部份丨0進 行測疋,且能夠於進行測定時 A、, 双及九學路徑。因此,根 據分光器1,即能夠控制測定 之減少,同時 鏡20之焦點調整及測定部位之指定。 #進订接物 進一步,於分光器1中,剎 利用所没之快門50,能夠切 換光學路徑之關閉/開啟,以餘™ ^ • U間早之架構實現上述之第 一模式(S10)及第二模式(S20)。 進步於刀光益1中,當設置取像部份120,用以 =測定光之反射㈣得之反射影像進行取像時,便能夠根 據取像部份120所取得之影傻來推 &务像來進仃接物鏡20之焦點調整 及測定部位之指定。The positioning of the optical path of the measuring portion 10 <>&dU<d>> and the objective lens 20 Fb1 is positioned from the optical path to the observation light having the reflected wavelength of the object to be tested 2. = has a first mode (fourth) that will observe the optical path of the newman, and a second mode that does not measure the optical path q of the observed light from the measurement line (Fig. 4 (10)). Specifically, the split 1 first includes a shutter 50 which is disposed at a predetermined position of the optical path. When the optical path is closed, the shutter 5 is the first shape and the observation light is directed toward the objective lens 2G, and when the optical path is opened, the shutter %: the :: state, wherein when the shutter 50 becomes the first state (closed) The state is the first mode r, 弋S1 〇), and when the shutter 50 is in the second state (on state), it is in the second mode (S20). In addition, the 'beam splitter 1' further includes a mirror mirror 40 as a "mirror portion", which is disposed between the objective lens 2 brother 20 and the shutter 50 for reflection measurement and image pickup Qp injury 120 'pair from the gap Mirror 4. The reflected image obtained by the reflected light is imaged. According to the spectroscope 贝 of the embodiment of the present invention, when the observation light having the reflection wavelength 14 201009307 / of the object to be tested 2 is injected into the optical path between the object to be tested 2 and the measurement portion 10, it can be used. On the armor of the objective lens, the adjustment of the point, the point and the location of the measurement. In this regard, in the case where the observation light is not injected, the &> is measured by the measurement portion 丨0, and the A, the double and the ninth path can be measured. Therefore, according to the spectroscope 1, it is possible to control the decrease of the measurement, and at the same time, the focus adjustment of the mirror 20 and the designation of the measurement site. #订接接 Further, in the beam splitter 1, the shutter 50 can be used to switch the optical path to be turned off/on, and the first mode (S10) and the earlier architecture of the TM ^ U are implemented. The second mode (S20). Progressing in the knife light 1, when the image capturing portion 120 is provided for the reflection image of the reflection (4) of the light, the image taken by the image capturing portion 120 can be used to push & The image is adjusted to the focus adjustment of the objective lens 20 and the designation of the measurement site.
此實施例之光學特性測定古、土 放A 行庄劂疋方法,係為利用來自於待測 物2之測定光來測定待測物2光學特性之光學特性測定方 _法’包括:第-步驟(S1〇),於測定光之光學路徑上,在 2對於接物鏡20且位於待測物2相對之既定位置上,從光 學路徑外注入具有待測物2反射波長之觀察光;及第二步 騍(S20),觀察光不注入光學路徑,且用測定光進行測定。 再者,由《X置於光學路徑上之缝隙反射鏡4〇來反射測定 光,並對來自於縫隙反射鏡40之反射光所得之反射影像進 行取像。 本發明已如上詳細說明,但上述說明僅為範例,且本 螫明也不限於此,因此本發明之保護範圍當視後附之申請 15 201009307 專利範圍所界定者為準。 【圖式簡單說明】 第1圖係顯示依據本發明實施例之光學特性測定裝置 之使用狀態示意圖。 第2圖係顯示依據本發明實施例之光學特性測定裝置 之另一使用狀態示意圖。 第3圖係顯示依據本發明實施例之光學特性測定裝置 之架構示意圖。 第4圖係顯示依據本發明實施例之光學特性測定方法 流程圖。 第5圖係顯示國際照明委員會(CIE)所規定之等色關 數。 【主要元件符號說明】 1〜分光器; 2A、2B〜樣品; 11〜受光部份; 30〜發光二極體 50〜快門; 7 〇 ~繞射光柵; 110〜透鏡; 130〜框體; 2〜待測物; 1 〇〜測定部份; 2〇~接物鏡; 縫隙反射鏡; 60、80〜三合透鏡; 90、100〜反射鏡; 120〜取像部份; 3〜控制裝置。The method for measuring the optical characteristics of the present embodiment is to determine the optical characteristics of the optical properties of the test object 2 by using the measurement light from the test object 2, and the method includes: Step (S1〇), in the optical path of the measuring light, in the opposite direction of the objective lens 20 and at a predetermined position opposite to the object to be tested 2, the observation light having the reflection wavelength of the object to be tested 2 is injected from the outside of the optical path; In the second step (S20), the observation light is not injected into the optical path, and the measurement is performed using the measurement light. Further, the measurement light is reflected by the slit mirror 4 of the X on the optical path, and the reflected image obtained by the reflected light from the slit mirror 40 is imaged. The present invention has been described in detail above, but the above description is only an example, and the present invention is not limited thereto, and the scope of the present invention is defined by the scope of the appended claims 15 201009307. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a view showing a state of use of an optical characteristic measuring apparatus according to an embodiment of the present invention. Fig. 2 is a view showing another state of use of the optical characteristic measuring apparatus according to the embodiment of the present invention. Fig. 3 is a schematic view showing the structure of an optical characteristic measuring apparatus according to an embodiment of the present invention. Fig. 4 is a flow chart showing a method of measuring optical characteristics according to an embodiment of the present invention. Figure 5 shows the isochromatic levels specified by the International Commission on Illumination (CIE). [Main component symbol description] 1~ splitter; 2A, 2B~ sample; 11~ light receiving part; 30~ light emitting diode 50~shutter; 7 〇~ diffraction grating; 110~ lens; 130~ frame; ~ Test object; 1 〇 ~ measurement part; 2 〇 ~ connected objective lens; slit mirror; 60, 80 ~ triplet lens; 90, 100 ~ mirror; 120 ~ image capture part; 3 ~ control device.
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