TW201006297A - Flat lamp structure and application thereof - Google Patents
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201006297 九、發明說明： 【發明所屬之技術領域】 本發明係有關於一種平面燈結構及其應用，特別是有 關於可提升發光均勻性的平面燈結構及其在顯示裝置上的 應用。 【先前技術】 由於液晶電視的需求日增’各家廠商紛紛投入研究開 發新型背光源，例如發光二極體（Light Emitting Diode; LED) 與無水平面燈（Flat Fiuorescent Lamp ; FFL)等背光源。 以無汞平面燈為例’由於無汞平面燈是平面光源，當 無汞平面燈在被組裝成為背光模組時，其所配合使用的光 學膜的穿透率可以較傳統者為高，因而對背光模組的光學 效能的提升上會有很大的幫助。因此，相對於也同樣具有 無汞特色的LED背光源而言，無汞平面燈可具有較佳的發 展空間。 近年來液晶顯示器或電視已大量取代傳統映像管顯示 器或電視（Cathode-Ray Tube ; CRT)，但相較於映像管顯示 器，液晶顯示器具有動態畫面模糊（M〇ti〇n Blur)的缺點，其 原因係由於背光源一直呈開啟狀態且維持相同亮度，因而 合易產生殘影現象。為改善此缺點，可使背光採用掃描式 (Scanning)驅動，藉以改善畫面品質，並增加對比。然而， 一般液晶顯示器或電視之背光源，為數支圓管式冷陰極燈 管（Cold Cathode Fluoresecnt lamp ; CCFL)，因為燈管具有 5 201006297 360度全面發光的特性，而容易產生發光重疊的現象 以冷陰極燈管做為掃描式背光源（Seanning = 果有限。而平面光源則有發光向上的特性，故其掃描：背 光源的效果最佳且影像品質亦最接近傳統映像管顯示 或電視。201006297 IX. Description of the Invention: [Technical Field] The present invention relates to a planar lamp structure and its application, and more particularly to a planar lamp structure capable of improving uniformity of illumination and its use in a display device. [Prior Art] Due to the increasing demand for LCD TVs, various manufacturers have invested in research and development of new backlights, such as backlights such as Light Emitting Diodes (LEDs) and Flat Fiuorescent Lamps (FFLs). Taking a mercury-free flat lamp as an example, since a mercury-free flat lamp is a planar light source, when a mercury-free flat lamp is assembled into a backlight module, the transmittance of the optical film used in combination can be higher than that of the conventional one. It will be of great help to improve the optical performance of the backlight module. Therefore, mercury-free flat lamps can have a better development space than LED backlights which also have mercury-free characteristics. In recent years, liquid crystal displays or televisions have largely replaced traditional image tube displays or televisions (Cathode-Ray Tubes; CRTs), but liquid crystal displays have the disadvantage of dynamic picture blur (M〇ti〇n Blur) compared to image tube displays. The reason is that since the backlight is always on and maintains the same brightness, the image sticking phenomenon occurs. To improve this disadvantage, the backlight can be driven by a Scanning driver to improve picture quality and increase contrast. However, in general, the backlight of a liquid crystal display or a television is a plurality of cold cathode fluorescent lamps (CCFLs), because the lamps have the characteristics of full illumination of 5 201006297 360 degrees, and the phenomenon of illuminating overlap is easy to occur. The cold cathode lamp is used as a scanning backlight (Seanning = limited. The planar light source has the characteristics of light up, so its scanning: the backlight is the best and the image quality is closest to the traditional image tube display or TV.
所謂的掃插式背光，即係使平面燈源進行分區連續式 點燈。相較於全區_次點燈，為了使平面燈源可進行掃描 式點燈+面燈源需具有分區電極結構。然而，當平面燈 進行刀區連續式點燈時，在相鄰^區電極之間，由於其電 極放電能力較弱’因而形成明顯之暗線，導致平面燈 發光均勻度不佳與暗線問題。 ' 【發明内容】 因此，本發明之一方面係在於提供一種平面燈結構及 其應用，藉以改善習知在此些放電電極區之間的發光效率 不佳問題，因而提升平面燈的發光均勻性 根據本發明之實施例，此平面燈結構至少包含第一基 板、第二基板、框體、複數個放電電極區及螢光體層。第 一基板係相對於第一基板，框體係設置於第一基板和第二 基板之間，用以形成密閉腔室，其中密閉腔室内具有放電 氣體。放電電極區係形成於密閉腔室的内壁表面或外壁表 面，其中每一此些放電電極區設有複數個電極，此些電極 具有至少一不均等電極結構，不均等電極結構係形成於每 相鄰二此些放電電極區之間，用以提升放電電流。螢光體 201006297 層係形成於密閉腔室的内壁表面上。 又’根據本發明之實施例’此平面燈結構至少包含第 一基板、第二基板、框體、複數個放電電極區、複數個立 體圖案化結構及螢光體層。第二基板係相對於第一基板， 框體係設置於第一基板和第二基板之間，用以形成密閉腔 室，其中密閉腔室内具有放電氣體。放電電極區係形成於 希閉腔至的内壁表面或外壁表面，其中每一此些放電電極 φ 區設有複數個電極。立體圖案化結構係設置於密閉腔室 中，其中此些立體圖案化結構具有複數個不均等立體圖案 化結構，不均等立體圖案化結構係位於每相鄰二此些放電 電極區之間，並相較於其他此些立體圖案化結構具有較大 的表面積。螢光體層係形成於密閉腔室的内壁表面上。 又’根據本發明之實施例’上述平面燈結構可設置於 液晶顯示模組的下方’藉以形成一液晶顯示裝置。 因此，本發明之平面燈結構及其應用可對應補償在放 藝電電極區之間的發光效率不佳情形，以提升平面燈的發光 均勻性。 【實施方式】 請參照第1A圖至第ic圖，其繪示依照本發明之第一 實施例之平面燈的剖面示意圖。本實施例之平面燈1〇〇可 作為背光源，其設置於一液晶顯示模組（未繪示）的下方，藉 以形成一液晶顯示裝置（Liquid Crystal Display ; LCD) »本 實施例之平面燈100包含有第一基板11〇、第二基板12〇、 201006297 框體130、複數個放電電極區140、放電氣體150、支撐柱 160、螢光體層170及密閉腔室180。第一基板110和第二 基板120係設置於框體130的兩侧，藉以形成此密閉腔室 180 ,密閉腔室180内係先形成真空狀態，再置入放電氣體 150，例如：氙（Xe)、氖（Ne)或氬（Ar)等惰性氣體，亦可為 含汞氣體，藉以產生激化反應，而產生紫外光。The so-called sweep-in backlight, that is, the planar light source is divided into continuous lighting. Compared with the whole area _ times lighting, in order to make the planar light source can be scanned, the lighting + surface light source needs to have a partition electrode structure. However, when the flat lamp is continuously lit in the knife zone, a significant dark line is formed between the adjacent electrodes due to its weaker electrode discharge capability, resulting in poor uniformity of the planar lamp and dark line problems. SUMMARY OF THE INVENTION Accordingly, it is an aspect of the present invention to provide a planar lamp structure and an application thereof for improving the problem of poor luminous efficiency between such discharge electrode regions, thereby improving the uniformity of illumination of a planar lamp. According to an embodiment of the invention, the planar lamp structure comprises at least a first substrate, a second substrate, a frame, a plurality of discharge electrode regions and a phosphor layer. The first substrate is disposed relative to the first substrate, and the frame system is disposed between the first substrate and the second substrate to form a sealed chamber, wherein the sealed chamber has a discharge gas. The discharge electrode region is formed on the inner wall surface or the outer wall surface of the sealed chamber, wherein each of the discharge electrode regions is provided with a plurality of electrodes, the electrodes having at least one unequal electrode structure, and the unequal electrode structure is formed in each phase The two adjacent discharge electrode regions are used to increase the discharge current. Phosphor 201006297 The layer is formed on the inner wall surface of the closed chamber. Further, according to an embodiment of the present invention, the planar lamp structure includes at least a first substrate, a second substrate, a frame, a plurality of discharge electrode regions, a plurality of vertical patterning structures, and a phosphor layer. The second substrate is disposed relative to the first substrate, and the frame system is disposed between the first substrate and the second substrate to form a sealed chamber, wherein the sealed chamber has a discharge gas. The discharge electrode region is formed on the inner wall surface or the outer wall surface to the closed chamber, and each of the discharge electrode φ regions is provided with a plurality of electrodes. The three-dimensionally patterned structure is disposed in the closed chamber, wherein the three-dimensional patterned structure has a plurality of unequal three-dimensional patterned structures, and the unequal three-dimensional patterned structure is located between each adjacent one of the discharge electrode regions, and Compared to other such three-dimensional patterned structures, it has a large surface area. A phosphor layer is formed on the inner wall surface of the sealed chamber. Further, according to an embodiment of the present invention, the planar light structure may be disposed under the liquid crystal display module to form a liquid crystal display device. Therefore, the planar lamp structure of the present invention and its application can compensate for the poor luminous efficiency between the electrophotographic electrode regions to improve the uniformity of illumination of the planar lamp. [Embodiment] Referring to Figs. 1A to 1c, there are shown schematic cross-sectional views of a planar lamp in accordance with a first embodiment of the present invention. The flat lamp 1 本 of the embodiment can be used as a backlight, and is disposed under a liquid crystal display module (not shown) to form a liquid crystal display device (LCD). 100 includes a first substrate 11A, a second substrate 12A, a 201006297 frame 130, a plurality of discharge electrode regions 140, a discharge gas 150, a support column 160, a phosphor layer 170, and a sealed chamber 180. The first substrate 110 and the second substrate 120 are disposed on both sides of the frame 130 to form the sealed chamber 180. The sealed chamber 180 is first formed into a vacuum state, and then the discharge gas 150 is placed, for example: Xe An inert gas such as argon (Ne) or argon (Ar) may also be a mercury-containing gas to generate an intensifying reaction to generate ultraviolet light.
值得注意的是，本實施例之平面燈1〇〇可為含汞的平 面燈（例如冷陰極燈），意即平面燈1〇〇的密閉腔室18〇内含 有汞成份。本實施例之平面燈10〇亦可為無汞平面燈，或 其任何運用本實施例之電極結構的平面燈。 如第1A圖所示，第一基板11〇係由透明介電材質製 成，例如玻璃，用以使平面燈1〇〇的發光可由第一基板11〇 發出，第二基板120係由介電材質製成（例如玻璃），第二基 板120的表面上可形成反射層121，以反射發光，使發光可 集中由第-基板11〇發出。框體13〇係由介電材質製成(例 如玻璃）’以支擇平㈣1〇〇的整體結構。支雜16〇係設 置於密閉腔室180内’用以支樓於第-基板11G和第二^ 之間以增加結構的穩定性，並確保當密閉腔室j 8 時帛基板11Q和第二基板120不會被外界大氣肩 :擠堡破裂。螢光體層17〇係形成於密閉腔室18〇的户 用以在文到紫外光激發後可發出可見光。 區140开目至第1C圖所示’本實施例之此些放電電相 極£ 140例如係形成於密閉腔室ι8〇的内 201006297 部電極形式）’並可利用介電材料形成的誘電 過度釋放Γ包覆放電電極區14G的電極’以防止放電電流 m =情形，並避免放電電極區14G的電極受到放電 值得注意的是，本實施例的此些放電電極區 '極可形成於密閉腔室180的内壁表面（如第1A圖所 示的内部電極形式）或外壁表面（即如第則所示的外部電 極形式），且此些放電電極區14〇的電極可成對地分別形成 於兩垂直相對的平面上，而形成垂直放電形式（如第⑴圖 所不）’亦可形成於同-平面上，而形成水平放電形 1A圖和第1B圖所示）。 第It should be noted that the flat lamp 1 of this embodiment may be a mercury-containing flat lamp (e.g., a cold cathode lamp), that is, the sealed chamber 18 of the flat lamp has a mercury component. The flat lamp 10 of the present embodiment may also be a mercury-free flat lamp, or any of the flat lamps using the electrode structure of the embodiment. As shown in FIG. 1A, the first substrate 11 is made of a transparent dielectric material, such as glass, for illuminating the flat lamp 1 可由 from the first substrate 11 and the second substrate 120 is dielectric. The material is made of (for example, glass), and a reflective layer 121 can be formed on the surface of the second substrate 120 to reflect the light emission so that the light can be concentrated from the first substrate 11 . The frame 13 is made of a dielectric material (e.g., glass) to support a flat (four) 1 inch overall structure. The branch 16 is disposed in the sealed chamber 180 to support the structure between the first substrate 11G and the second portion to increase the stability of the structure, and to ensure the substrate 11Q and the second when the chamber j 8 is sealed The substrate 120 is not ruptured by the outer atmosphere shoulder: the squeeze. The phosphor layer 17 is formed in the closed chamber 18 用以 to emit visible light after being excited by ultraviolet light. The region 140 is open to the first embodiment shown in FIG. 1C, and the discharge electric phase of the present embodiment is, for example, formed in the inner cavity of the closed chamber 20108〇 201006297 electrode form) and can be overexposed by the dielectric material. The electrode 'which covers the discharge electrode region 14G is released to prevent the discharge current m = the situation, and the electrode of the discharge electrode region 14G is prevented from being discharged. It is noted that the discharge electrode regions of the present embodiment can be formed in the closed cavity. An inner wall surface of the chamber 180 (in the form of an internal electrode as shown in FIG. 1A) or an outer wall surface (ie, in the form of an external electrode as shown in the figure), and electrodes of the discharge electrode regions 14A may be formed in pairs, respectively. The two vertically opposite planes, and the form of the vertical discharge (as shown in the figure (1)) can also be formed on the same plane, forming a horizontal discharge pattern 1A and a 1B diagram). First
、，請參照第2圖和第3圖，第2圖係緣示依照本發明之 平面燈之第一實施例之放電電極區的俯視示意圖，第3圖 係緣示依照本發明ϋ施例之平面燈之放電電極區的 局部示意圖》本實施例之此些放電電極區14〇可各別地進 行放電，以激發光線，因而可進行分區連續式點燈，並可 作為掃描式背光源（Scanning Backlight)。放電電極區14〇 的電極至少包含電極主線141、電極副主線142及放電電極 143。電極副主線142係形成於電極主線141上，且為成對 地排列。放電電極143係形成於電極副主線142上，其中 每相鄰二電極副主線142上的放電電極143之間具有一放 電距離a，藉以相互感應放電。在本實施例中，在靠近於每 相鄰二此些放電電極區140之間之部分電極主線Ula、電 極副主線142a或放電電極143a的線寬可大於其他部分的 電極主線141、電極副主線142或放電電極143的線寬，因 9 201006297 而形成不均等電極結構，由此部分電極主線1413具有較大 的線寬，因而在此些放電電極區14G之_區域可提升放 電電流，以增加輝度來避免習知的暗線問題。 值得注意的是，在此些放電電極區14〇之間的不均等 電極結構係用以對應補償在此些放電電極區⑽之間的發 光效率不佳情形，故不均等電極結構的設計可預先根據例2, and 3, which are schematic top views of the discharge electrode region of the first embodiment of the planar lamp according to the present invention, and FIG. 3 is a diagram showing the embodiment according to the present invention. Partial Schematic Diagram of the Discharge Electrode Region of the Planar Lamp. The discharge electrode regions 14 of the present embodiment can be separately discharged to excite light, thereby enabling zoned continuous lighting and as a scanning backlight (Scanning) Backlight). The electrode of the discharge electrode region 14A includes at least an electrode main line 141, an electrode sub main line 142, and a discharge electrode 143. The electrode sub main lines 142 are formed on the electrode main lines 141 and arranged in pairs. The discharge electrode 143 is formed on the electrode sub-main line 142, wherein a discharge distance a is formed between the discharge electrodes 143 on each adjacent two-electrode sub-main line 142, thereby mutually inducing discharge. In this embodiment, the line widths of the partial electrode main line U1a, the electrode sub main line 142a or the discharge electrode 143a between each adjacent two discharge electrode regions 140 may be larger than the electrode main lines 141 and the electrode sub main lines of other portions. 142 or the line width of the discharge electrode 143, the uneven electrode structure is formed due to 9 201006297, whereby the partial electrode main line 1413 has a larger line width, so that the discharge current can be increased in the region of the discharge electrode region 14G to increase Brightness to avoid the hidden dark line problem. It should be noted that the uneven electrode structure between the discharge electrode regions 14 系 is used to compensate for the poor luminous efficiency between the discharge electrode regions (10), so the design of the unequal electrode structure can be advanced. According to the example
如光學分析或光學模擬方式來決定’以均勾化平面燈ι〇〇 的整體發光。 再者，本實施例之放電電極區中的電極結構僅為本發 明的-種實施方式，然不限於此，熟悉該項技術領域者應 可藉由各财同形狀或形式的電極結構來達絲同功效。 因此，本實施例的平面燈⑽結構可藉由形成於此些 放電電㈣14G之間的不均等電極結構來改善習知在此些 放電電極區之間的發光效率不佳問題，以提升平面燈100 的發光均勻性。 請參照第4圖和第5圖，第4圖係緣示依照本發明之 第一實施例之平面燈之第二基板的局部剖面示意圖，第5 '、會丁依照本發明之第二實施例之平面燈之立體圖案化 結構和Μ等立體圖案化結構的俯衫意圖。相較於第- ，施例帛一實施例之平面燈⑽更設有複數個立體圖案 匕-構190，此些立體圖案化結構19〇係設置⑽如凸設或 於密閉腔室180中，例如設置於第一基板m或第二 120±〇第4圖所W。此時’螢光體層17G係覆蓋於 些立體圖案化結構190的立體表面上，因而可大幅地增 201006297 加螢光體層m所覆蓋的表面積。此時，此政立體圖案化 結構_包括有複數個不均等立體圖案化結構隱，此些 不均等立體圖案化結構隱係位於每相鄰二此些放電電極 區140之間，並相較於其他立體圖案化結構⑽具有較大 的表面積，亦即相較於其他立體圖案化結構19〇具有較大 的螢光體層170覆蓋表面積。不均等立體圖案化結構職 可具較小的體積和較密集的排列，以形成較大的表面積。 ❿ 目此’第二實施例之平面燈1〇〇可藉由在此些放電電極區 140之間設置不均等立體圖案化結構㈣b來提升在此些放 電電極區U0之間的輝度，以對應補償在此些放電電極區 140之間的發光效率不佳情形。 值得注意的是，本實施例的不均等立體圖案化結構係 用以增加螢光體層170的覆蓋面積，因而增加輝度，然不 均等立體圖案化結構―並^僅限於上述說明，熟悉該項技術 領域者亦可藉由其他方式來增加不均等立體圖案化結構的 0 表面積。 請參照第6圖，其繪示依照本發明之第三實施例之平 面燈之放電電極區的局部剖面示意圖。相較於第一實施 例，第三實施例之平面燈1〇〇在靠近於每相鄰二此些放電 電極區140之間的放電距離b、電極副主線線距d(亦即此 些電極副主線142之間的距離）或放電電極線距f(亦即此些 放電電極143在電極副主線M2上的相隔距離）可不同於其 他部分的放電距離a、電極副主線線距c或放電電極線距 e，藉以形成不均等電極結構，並提升放電電流，以對應補 11 201006297 償在此些放電電極區14G之間的發光效率不佳情形。此時， 在此些放電電極區140之間的放電距離1>、電極副主線線距 d或放電電極線距f例如係小於其他部分的放電距離&''、 極副主線線距e或放電電極線距6，藉以形成㈣集的 方式，來提升放電電流。The optical illumination or optical simulation method is used to determine the overall illumination of the planar light 〇〇. Furthermore, the electrode structure in the discharge electrode region of the present embodiment is only an embodiment of the present invention, but is not limited thereto, and those skilled in the art should be able to achieve the same by the shape or form of the electrode structure. Silk has the same effect. Therefore, the structure of the planar lamp (10) of the present embodiment can improve the problem of poor luminous efficiency between the discharge electrode regions by forming an uneven electrode structure between the discharge electrodes (4) 14G to enhance the planar lamp. 100 uniformity of illumination. Referring to FIG. 4 and FIG. 5, FIG. 4 is a partial cross-sectional view showing a second substrate of a planar lamp according to a first embodiment of the present invention, and FIG. 5 is a second embodiment according to the present invention. The three-dimensional patterned structure of the flat lamp and the intent of the three-dimensional patterned structure of the enamel. Compared with the first embodiment, the planar lamp (10) of the embodiment is further provided with a plurality of three-dimensional pattern structures 190, and the three-dimensional patterning structures 19 are arranged (10), such as protruding or in the sealed chamber 180. For example, it is disposed on the first substrate m or the second 120±〇4. At this time, the phosphor layer 17G covers the three-dimensional surface of the three-dimensional patterned structure 190, so that the surface area covered by the phosphor layer m can be greatly increased by 201006297. At this time, the three-dimensional patterned structure includes a plurality of unequal three-dimensional patterned structures, and the unequal three-dimensional patterned structures are hidden between each adjacent one of the discharge electrode regions 140, and compared with The other three-dimensionally patterned structure (10) has a larger surface area, that is, a larger surface area of the phosphor layer 170 than that of the other three-dimensionally patterned structures 19A. The unequal three-dimensional patterning structure has a smaller volume and a denser arrangement to form a larger surface area. The planar lamp 1 of the second embodiment can enhance the luminance between the discharge electrode regions U0 by providing an unequal three-dimensional patterned structure (four) b between the discharge electrode regions 140 to correspond to The case where the luminous efficiency between the discharge electrode regions 140 is poor is compensated. It should be noted that the unequal three-dimensional patterning structure of the present embodiment is used to increase the coverage area of the phosphor layer 170, thereby increasing the luminance, and the unequal three-dimensional patterning structure is limited to the above description, and is familiar with the technology. The field may also increase the 0 surface area of the unequal three-dimensional patterned structure by other means. Referring to Figure 6, there is shown a partial cross-sectional view of a discharge electrode region of a flat lamp in accordance with a third embodiment of the present invention. Compared with the first embodiment, the planar lamp 1 of the third embodiment has a discharge distance b between each adjacent discharge electrode region 140 and an electrode sub-main line pitch d (that is, such electrodes) The distance between the sub-main lines 142) or the discharge electrode line distance f (that is, the distance between the discharge electrodes 143 on the electrode sub-main line M2) may be different from the discharge distance a of the other portions, the electrode main line line distance c or the discharge. The electrode line distance e is formed to form an unequal electrode structure, and the discharge current is increased to compensate for the poor luminous efficiency between the discharge electrode regions 14G. At this time, the discharge distance 1 between the discharge electrode regions 140, the electrode sub-main line pitch d, or the discharge electrode line distance f is, for example, smaller than the discharge distance of the other portions & '', the main pole line distance e or The discharge electrode line spacing is 6, thereby forming a (four) set to increase the discharge current.
值得注意的是，本實.施例的不均等電極結構係用以提 升放電電流，然不均等電極結構並不他於上述說明，熟 悉該項技術領域者亦可藉由例如增加電極的長度或數量’、，’、 以增加放電電流的電流強度，並增加輝度。 請參照第7圖，其繪示依照本發明之第四實施例之平 面燈的局部俯視示意圖。相較於第—實施例，第四實施例 之平面S 100彳進-步在發光效率不佳的區域形成不均等 電極結構或不均等立體圖案化結構，以對應補償發光效率 不佳情形’因而提升平面燈刚的發先均勻性。例如在每 -放電電極區140的周圍區域g來形成不均等電極結構或 不均等立體圖案化結構，以對應補強此區域g的發光效率， 因而均勻化平面燈100的整體發光。 由上述本發明的實施例可知，本發明之平面燈結構及 其應用可對應補償在此些放電電極區之間的發光效率不佳 障形’以提升平面燈的發光均勻性。 、雖然本發明已以一較佳實施例揭露如上，然其並非用 u限定本發明，任何熟習此技藝者，在不脫離本發明之精 砷=範圍内，當可作各種之更動與潤飾，因此本發明之保 護範圍當視後附之申請專利範圍所界定者為準。 12 201006297 ι圑式間单說明】 ^為讓本發明之上述和其他目的、特徵、優點與實施例 能更明顯易懂’所附圖式之詳細說明如下： 第1A圖至第lc圖係♦示依照本發明之第—實施例之 平面燈的剖面示意圖。 ❹ 第2圖係綠示依照本發明之第一實施例之平面燈之放 電電極區的俯視示意圖。 第3圖係緣示依照本發明 弟實施例之平面燈之放 電電極區的局部示意圖。 係繪示依照本發明之第二實施例之平面燈之第 一基板的局部剖面示意圖。 第5圖係繪示依照本發 mm 心罘一實細•例之平面燈之立 體圖案化結構和不均等立體圖宰 固系化結構的俯視示意圖。 第6圖係繪示依照本發 t <弟一實施例之平面燈之放 电€極&的局部剖面示意圖。 第7圖係繪示依照本發明 部俯視示意圖。 帛四實細例之平面燈的局 e、f :放電電極線距 110 :第一基板 【主要元件符號說明】 a、b :放電距離 c、d :電極副主線線距 g .周圍區域 100 :平面燈 13 201006297 參 120 ： 第二基板 121 :反射層 130 ： 框體 140 ： 放電電極區 141、141a:電極主線 142、 142a :電極副_主線 143、143a :放電電極 150 : 放電氣體 160 :支撐柱 170 ： 螢光體層 180 :密閉腔室 181 : 誘電體層 190:立體圖案化結構 190b :不均等立體圖案化結構 14It is worth noting that the unequal electrode structure of the present embodiment is used to increase the discharge current, but the unequal electrode structure is not described above. Those skilled in the art can also increase the length of the electrode or The quantity ',,' to increase the current intensity of the discharge current and increase the brightness. Referring to Figure 7, a partial top plan view of a flat lamp in accordance with a fourth embodiment of the present invention is shown. Compared with the first embodiment, the plane S 100 of the fourth embodiment forms an uneven electrode structure or an unequal three-dimensional patterning structure in a region where the luminous efficiency is poor, so as to compensate for the poor luminous efficiency. Improve the uniformity of the flat light just before. For example, an uneven electrode structure or an unequal three-dimensional patterning structure is formed in the peripheral region g of each of the discharge electrode regions 140 to correspondingly enhance the luminous efficiency of the region g, thereby uniformizing the overall light emission of the planar lamp 100. It can be seen from the above embodiments of the present invention that the planar lamp structure of the present invention and its application can compensate for the poor luminous efficiency between the discharge electrode regions to improve the uniformity of illumination of the planar lamp. Although the present invention has been disclosed above in a preferred embodiment, it is not intended to limit the invention, and any skilled person skilled in the art can make various modifications and retouchings without departing from the scope of the invention. Therefore, the scope of the invention is defined by the scope of the appended claims. 12 201006297 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 A schematic cross-sectional view of a planar lamp in accordance with a first embodiment of the present invention. ❹ Figure 2 is a schematic plan view showing the discharge electrode region of the planar lamp in accordance with the first embodiment of the present invention. Figure 3 is a partial schematic view showing the discharge electrode region of a planar lamp in accordance with an embodiment of the present invention. A partial cross-sectional view showing a first substrate of a planar lamp in accordance with a second embodiment of the present invention. Fig. 5 is a top plan view showing the vertical patterning structure and the unequal perspective solidification structure of the flat lamp according to the present invention. Figure 6 is a partial cross-sectional view showing the discharge of a flat lamp according to an embodiment of the present invention. Figure 7 is a schematic plan view of a portion in accordance with the present invention. In the case of the flat lamp of the fourth example, e: f: discharge electrode line distance 110: first substrate [main element symbol description] a, b: discharge distance c, d: electrode sub main line line distance g. surrounding area 100: Flat lamp 13 201006297 Reference 120: Second substrate 121: Reflective layer 130: Frame 140: Discharge electrode regions 141, 141a: Electrode main lines 142, 142a: Electrode sub-main line 143, 143a: Discharge electrode 150: Discharge gas 160: Support Column 170: phosphor layer 180: sealed chamber 181: electric conductor layer 190: three-dimensional patterned structure 190b: unequal three-dimensional patterned structure 14
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| TW97128164A TW201006297A (en) | 2008-07-24 | 2008-07-24 | Flat lamp structure and application thereof |
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