TW201005885A - Chip stacked package structure with cavity in substrate and package method thereof - Google Patents

Chip stacked package structure with cavity in substrate and package method thereof Download PDF

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Publication number
TW201005885A
TW201005885A TW097128056A TW97128056A TW201005885A TW 201005885 A TW201005885 A TW 201005885A TW 097128056 A TW097128056 A TW 097128056A TW 97128056 A TW97128056 A TW 97128056A TW 201005885 A TW201005885 A TW 201005885A
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TW
Taiwan
Prior art keywords
die
substrate
conductive
adhesive layer
wires
Prior art date
Application number
TW097128056A
Other languages
Chinese (zh)
Inventor
Hung-Tsun Lin
Cheng-Ting Wu
Original Assignee
Chipmos Technologies Inc
Chipmos Technologies Bermuda
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chipmos Technologies Inc, Chipmos Technologies Bermuda filed Critical Chipmos Technologies Inc
Priority to TW097128056A priority Critical patent/TW201005885A/en
Publication of TW201005885A publication Critical patent/TW201005885A/en

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/03Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
    • H01L25/10Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices having separate containers
    • H01L25/105Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices having separate containers the devices being of a type provided for in group H01L27/00
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32135Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/32145Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/73Means for bonding being of different types provided for in two or more of groups H01L24/10, H01L24/18, H01L24/26, H01L24/34, H01L24/42, H01L24/50, H01L24/63, H01L24/71
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/03Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
    • H01L25/04Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
    • H01L25/065Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L27/00
    • H01L25/0657Stacked arrangements of devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1531Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15311Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1532Connection portion the connection portion being formed on the die mounting surface of the substrate
    • H01L2924/1533Connection portion the connection portion being formed on the die mounting surface of the substrate the connection portion being formed both on the die mounting surface of the substrate and outside the die mounting surface of the substrate
    • H01L2924/15331Connection portion the connection portion being formed on the die mounting surface of the substrate the connection portion being formed both on the die mounting surface of the substrate and outside the die mounting surface of the substrate being a ball array, e.g. BGA

Abstract

A chip stacked structure includes a substrate having a front side and a reverse side, in which a cavity within the front side, and a plurality of through holes within the two sides of the substrate; a conductive layer is full within the through holes to form a plurality of conductive post; a first chip having an active surface and a reverse side, and the reverse side of the first chip is attached on the cavity of the substrate by a first adhesive layer; a first conductive wires is electrically connected the first chip and the substrate; a second adhesive layer is encapsulated the first conductive wires and the first chip; second chip having an active surface and a reverse side, in which the reverse side of second chip is attached on the second adhesive layer and the second adhesive layer is covered the portion of first conductive wire; a second conductive wires is electrically connected the second chip and the cavity; an encapsulated body is covered the first chip, second chip, first conductive wire, second conductive wire, and the portion front side of the substrate; and the conductive component is provided on the exposed surface of the conductive post.

Description

201005885 九、發明說明: 【發明所屬之技術領域】 本發明係有關於-種封裝結構及其方法’特別是有關於—種將多個晶 粒堆疊在凹槽之基板内之封装結構及其封裝方法。 【先前技術】 在各種應用中,將多個晶粒封裝在單一一個積體電路結構内是值得需 Φ $考量的—種封裝結構。此種封裝結構會關元件在兩個晶粒上的完整 性。此種晶粒料關係由電子元件是否能夠封裝成單——個封裝結^所 引起。此外,此種晶粒堆#的關也會造舰子元倾封裝結構不相容性 提高Μ物’在兩個不同尺寸大小之晶粒上狀件可齡產生不同電壓的 須求。 另外’將兩個尺寸大小相同的晶粒封裝在一個封裝結構且兩個晶粒經 由共用的設置與外界連接…般來說,晶粒之上表面包含複數個連接端點 用以與外部凡件電性連接。當複數個晶粒封裝成一個封裝結構時,每一個 自粒可以只接觸到晶粒的—面,因此將多個錄封裝在—個封裝結構令是 _ 一項很重要的課題。 【發明内容】 蓉於以上的_,轉_主要目的在於_具有凹槽之基板進行多 晶粒之堆疊藉以縮小封裝結構之尺寸。 本發明之另—目的在於個基油之導電柱做為m連接元件,用以 電性連接多數個封裝結構,以形成一多重堆叠結構。 一根據上述^目的’本發關露—種半導體堆疊結構包括基板,具 及#面且具有一凹槽設置在基板之正面内及複數個貫孔在基板 201005885 之兩側;一導電層,設置在複數個貫孔内以形成複數個導電柱;一第一晶 粒’具有-主動面及-背面,且將主動面朝上並藉由第—黏著層將第一晶 粒之背面固接在基板之凹槽之一表面上;複數條第一導線,係用以電性連 接第-晶粒及基板之凹槽之表面;一第二黏著層,係包覆駿第一導線及 第一晶粒;第二晶粒,具有一主動面及一背面,且將主動面朝上並藉由第 二黏著層與第一晶粒連接,且第二黏著層係包覆部份第一導線;複數條第 二導線,用以電性連接第二晶粒及基板之凹槽之表面;一封裝體,用以包 覆第一晶粒、第二晶粒、複數條第一導線、複數條第二導線及基板之部份 Φ 正面;及複數個導電元件,係設置在曝露於基板之正面之複數個導電柱之 一表面上。 根據上述之半導體堆疊結構,本發明還揭露一種形成半導體堆疊結構 之方法,其包括:提供一基板,具有一正面及一背面且於正面上具有一凹槽 及於基板之兩側内具有複數個貫孔;形成一導電層在複數個貫孔内以形成 複數個導電柱;貼附一第一晶粒在基板之凹槽内,係將第一晶粒之主動面 朝上,且藉由第一黏著層固接在凹槽之部份表面上;形成複數個第一導線, 係電性連接第一晶粒之主動面及基板之凹槽之表面;貼附一第二晶粒,係 藝將第二晶粒之主動面朝上且藉由第二黏著層與第一晶粒固接,其中第二黏 著層用以包覆部份第一導線及第一晶粒之主動面;形成複數條第二導線, 係電性連接第二晶粒之主動面及基板之凹槽之表面;形成一封裝體,係用 以包覆第一晶粒、第二晶粒、複數條第一導線、複數條第二導線及基板之 部份正面;及形成複數個導電元件在基板之正面之已曝露之複數個導電柱 之一表面上。 本發明另外揭露一種多重堆疊結構,其包括:一基板,具有一正面及一 背面且於正面上具有一凹槽及複數個貫孔在基板之兩側内;一導電層,設 置在複數個貫孔内以形成複個導電柱;一第一晶粒,具有一主動面及一背 面,且將主動面朝上並藉由第一黏著層將第一晶粒之背面固接在基板之凹 7 201005885 槽之-表面上;複數條第一導線,係用以電性連接第一晶粒及基板之凹槽 •之表面;-第二黏著層’係包覆部份H線及第—晶粒;第二晶粒,具 有-主動面及-背面,且將主動面朝上並藉由第二黏著層與第一晶粒連 接,且第二黏著層聽覆部份第一導線;複數條第二導線,制以電性連 接第二晶粒及基板之該凹槽之表面;—封裝體,用以包覆第—晶粒、第二 晶粒、複祕第-導線、複數條第二導線及基板之部份正面;複數個導電 元件,係設置在曝露於基板之正面之複數個導電柱之一表面上以形成一第 -半導趙封裝結構;及-堆叠結構,係將與第—晶粒堆疊結構具有相同一 〇 、结構之一第二晶粒堆墨結構之複數個導電元件電性連接至第-晶粒堆曼結 構之複數個導電柱之一導電端點上。 根據上述之彡重堆叠結構,本發明另揭露—郷成彡重堆要結構之方 法,其包括:提供一基板’具有一正面及一背面,且於正面上具有一凹槽及 在基板之兩側具有複數個貫孔;形成一導電層在複數個貫孔内以形成複數 個導電柱,貼附-第-晶粒在基板之凹槽内,係將第一晶粒之一主動面朝 上且藉由-第-黏著層固接在凹槽之部份表面上;形成複數條第一導線, 係電性連接第-晶粒之主動面及基板之凹槽之表面;貼附一第二晶粒係 將第二晶粒之-主動面朝上且藉由一第二黏著層與第一晶粒固接,其中第 二黏著利吨覆部份複數條第-導線及第—晶粒之絲面;形成複數條 第二導線’係電性連接第二晶粒之主動面及基板之凹槽之表面;形成一封 裝體,係用以包覆第-晶粒、第二晶粒、複數條[導線、複數條第二導 線及基板之雜正面;形毅數料電树在基板之正蚊㈣露之複數 個導電柱之-表面上’以形成-第一晶粒堆叠結構;及堆叠與第一封裝結 構具有相同結構之-第二晶粒堆叠結構,係將第二晶粒堆叠結構之複數個 導電元件電性連接至第一晶粒堆疊結構之複數個導電柱之一導電端點上。 有關本發_賴與實作,賊合圖轉最佳實細詳細說明如下。 (為使對本發_目的、構造、特徵、及其功能有進—步的瞭解,兹配合 8 201005885 實施例詳細說明如下。) 【實施方式】 ,本發明在此雌討的方向為—種雖賴及其封裝方法 ,將多數個晶 粒形成在基板之-凹槽以降低封裝結構之尺寸大小,然後進行封裝的方 法為了月b徹底地瞭解本發明’將在下列的描述中提出詳盡的步驟及其組 成=二也本發明的施行並未限定晶粒封褒的方式之技藝者所熟習的特 殊細節。另-方面’眾所周知的晶粒形成方式以及晶粒薄化等後段製程之 參系細步驟並未描述於細節中,以避免造成本發明不必要之限制。然而,對 於本發明峨佳實則會詳細描述如下,然而除了這些詳細描述之外, 本發明還心廣魏贿在無的實關巾,且本發_侧不受限定, 其以之後的專利範圍為準。 第1圖至第7圖係根據本發明所揭露之技術,表示形成晶粒堆叠之封 裝結構之各步驟示意圖。首先,請參考第1圖,係提供具有一凹槽Η之一 基板10 ’其中凹槽12的形成方法係顧__般半導體製程,其包括先提供 具有-正面(未在圖中表示)及一背面(未在圖中表示)之基板ι〇 ;接著,形成 ❷—圖案化之光阻層(未在圖中表示);織,執行-顯影及_步驟,係移除 部份基板ίο ’使得在基板10之鄰近於中央部份形成一凹槽12。在此,基 板10之材料可以是已經酉己置好線路佈局之PCB電路板或是金屬基ai foil)。 接著,再將另-圖案化之光阻層(未在圖中表示)形成在具有凹槽i2之 基板10上;然後進行顯影及餘刻,使得在基板10之具有凹槽12之兩側形 成複數個貫穿孔102,如第2圖所示;緊接著,在剝除圖案化之光阻層之後, 在每-貫穿孔1G2内’選擇適當的導電材料_成導電柱2(),其導電柱π 形成的方法包括將導電材料,以電鍍(plating)的方式填充入複數個貫穿孔 102内,並使每-導電柱20之上、下表面裸露於封裝體上、下表面的兩端, 9 201005885 分別形成第-導電端點2〇2及第三導電端點2〇4,如第3圖所示。 _ 接著請參考第4圖,絲示將一第一晶粒形成在基板之凹槽上之示意 圖。在第4圖t ’係提供—第―晶粒4(),其具有—主動面及—背面,且在 主動面上有複數個焊塾402 ;接著,將第一晶粒4〇之主動面朝上並藉由形 成在基板ίο之凹槽12表面上之第一黏著層%,將第一晶粒3〇之背面固著 在基板10之凹槽12之表面上。在另一實施例中,第一黏著層3〇可先形成 在第曰曰粒40之背面,然後再貼附至基板1〇之凹槽之表面上使得第 明粒4〇藉由第_黏著層%固著在基板1()上。在此實施例中第一黏著 層30的材料係為二階段熱固卵,φ然後,利用打線接合㈣_㈣ 的方式,將複數條第-導線5〇的—端形成在第—晶粒⑽的主動面之複數 個;墊402上其複數條第一導線5〇之另一端係形成在基板之凹槽η 之表面上,用以電性連接基板10與第一晶粒40。 緊接著’請參考第5 ®,係表示將第二晶粒堆叠在第一晶粒上之示意 圖。在第5圖中,係先提供—第二晶粒42,其具有一主動面及一背面且 於主動面上具有複數個焊塾似2 ;接著,第二晶粒幻之主動面朝上,並藉 由第一黏著層32貼附在第一晶粒*上,以形成一晶粒堆要結構,在此 參 第二黏著層32同時包與第-晶粒40電性連接之部份複數條第一導線 50以及覆蓋住第一晶粒4〇之主動面。在此,第二黏著層32之材料可以是 FOW。同樣繼續參考第5圖,係打線接合的方式將複數條第二導線 52之端形成在第二晶粒42之主動面之複數個谭塾上以及另一端係形 成在基板1G之具有凹槽12之表面上,且與軸在基板10之凹槽12表面 f之複數條第-導線4G電性分離。在此實施例中,其第—晶粒奶與第二 晶粒42可叹具有相同尺寸及魏之晶粒’或者是具有不同尺寸及功能之 晶粒。 緊接著’參考第6圖’係表示形成一封裝體以包覆晶粒堆疊結構之示 意圖。在第6圖中,係將一高分子材料(未在圖中表示)注入至基板1〇之凹 201005885 槽12内。接著’對高分子材料進行一烘烤程序(bake p叫使高分子材 料固化以形成-封裝體60叫覆住第—黏著層3q、第—晶粒⑽、第二黏 著層32、第二晶粒42、複數條第一導線5〇以及複數條第二導線52,且覆 蓋在部份的基板H)之正面r在此實施射,高分子娜可以是轉、環 氧樹脂、丙稀酸(acrylic)、及苯環丁烯(BCB)等材料。201005885 IX. Description of the Invention: [Technical Field] The present invention relates to a package structure and a method thereof, and more particularly to a package structure and package for stacking a plurality of crystal grains in a substrate of a groove method. [Prior Art] In various applications, it is worthwhile to package a plurality of dies in a single integrated circuit structure. This package structure will shut down the integrity of the component on both dies. This kind of grain material relationship is caused by whether the electronic component can be packaged into a single package. In addition, the closeness of such a grain stack # also creates a ship's sub-package structure incompatibility, which increases the requirement for different voltages in the two different sizes of the die. In addition, 'two sizes of the same size die are packaged in one package structure and the two crystal grains are connected to the outside through a common arrangement... Generally, the upper surface of the die includes a plurality of connection terminals for external parts. Electrical connection. When a plurality of dies are packaged into a package structure, each self-grain can only contact the face-to-face of the die, so packaging a plurality of packages in a package structure is an important issue. SUMMARY OF THE INVENTION The above-mentioned _, _ _ main purpose is to _ grooved substrate for multi-die stack to reduce the size of the package structure. Another object of the present invention is to provide a conductive member of a base oil as an m-connecting member for electrically connecting a plurality of package structures to form a multi-stack structure. According to the above-mentioned object, the semiconductor stack structure comprises a substrate having a #-plane and a recess disposed in the front surface of the substrate and a plurality of through-holes on both sides of the substrate 201005885; a conductive layer disposed Forming a plurality of conductive pillars in a plurality of through holes; a first die 'having an active face and a back face, and bringing the active face up and fixing the back surface of the first die by the first adhesive layer a surface of one of the grooves of the substrate; a plurality of first wires for electrically connecting the surfaces of the first die and the groove of the substrate; and a second adhesive layer covering the first wire and the first crystal a second die having an active surface and a back surface, and having an active surface facing upward and connected to the first die by a second adhesive layer, and the second adhesive layer coating a portion of the first wire; a second wire for electrically connecting the surface of the second die and the groove of the substrate; a package for covering the first die, the second die, the plurality of first wires, and the plurality of second a portion of the wire and the substrate Φ front side; and a plurality of conductive elements are disposed on the exposed One of a plurality of conductive columns on the front side of the substrate. According to the above semiconductor stack structure, the present invention also discloses a method of forming a semiconductor stacked structure, comprising: providing a substrate having a front surface and a back surface and having a recess on the front surface and having a plurality of sides on the substrate a through hole; forming a conductive layer in the plurality of through holes to form a plurality of conductive columns; attaching a first die in the groove of the substrate, the active face of the first die facing upward, and by An adhesive layer is fixed on a part of the surface of the groove; a plurality of first wires are electrically connected to the active surface of the first die and the surface of the groove of the substrate; and a second die is attached The active surface of the second die is facing upward and is fixed to the first die by the second adhesive layer, wherein the second adhesive layer is used to cover a portion of the first wire and the active surface of the first die; a second wire electrically connecting the active surface of the second die and the surface of the groove of the substrate; forming a package for covering the first die, the second die, the plurality of first wires, a plurality of second wires and a portion of the front surface of the substrate; and forming a complex Conductive elements of the front board has a plurality of exposed surfaces on one of the conductive posts. The present invention further discloses a multi-stack structure comprising: a substrate having a front surface and a back surface and having a recess and a plurality of through holes on the front side of the substrate; a conductive layer disposed in the plurality of layers Forming a plurality of conductive pillars in the hole; a first die having an active surface and a back surface, and having the active surface facing upward and fixing the back surface of the first die to the recess of the substrate by the first adhesive layer 201005885 The groove-surface; a plurality of first wires are used to electrically connect the first die and the surface of the substrate; the second adhesive layer is a portion of the H-line and the first die a second die having an active surface and a back surface, and having an active surface facing upward and connected to the first die by a second adhesive layer, and the second adhesive layer audibly covering a portion of the first wire; a second wire electrically connected to the surface of the second die and the groove of the substrate; the package body for covering the first die, the second die, the secretive first wire, and the plurality of second wires And a portion of the front surface of the substrate; the plurality of conductive elements are disposed on the front side of the substrate a plurality of conductive pillars on a surface thereof to form a first-semiconductor package structure; and a stack structure having the same structure as the first-grain stack structure and a second crystal grain stacking structure The conductive elements are electrically connected to one of the plurality of conductive pillars of the first-grain stack structure. According to the above-described stacking structure, the present invention further discloses a method for constructing a structure, comprising: providing a substrate having a front surface and a back surface, and having a recess on the front surface and two on the substrate The side has a plurality of through holes; forming a conductive layer in the plurality of through holes to form a plurality of conductive columns, and attaching the -first grains in the grooves of the substrate, the active side of the first die facing upward And fixing a plurality of first wires by the first-adhesive layer; forming a plurality of first wires electrically connected to the active surface of the first die and the surface of the groove of the substrate; attaching a second The die attaches the active surface of the second die upward and is fixed to the first die by a second adhesive layer, wherein the second adhesive portion covers a plurality of the first wire and the first die a plurality of second wires are electrically connected to the active surface of the second die and a surface of the groove of the substrate; forming a package for coating the first die, the second die, and the plurality Strips [wires, multiple strips of wires and the front side of the substrate; the shape of the electric tree on the substrate of the positive mosquito (four) dew a plurality of conductive pillars on the surface to form a first die stack structure; and stacking a second die stack structure having the same structure as the first package structure, which is a plurality of second die stack structures The conductive element is electrically connected to one of the plurality of conductive pillars of the first die stack structure. Regarding the hair _ Lai and the implementation, the thief map is best described in detail below. (In order to make the understanding of the purpose, structure, features, and functions of the present invention, the following is a detailed description of the embodiment of the present invention.) [Embodiment] The present invention is in the direction of the female Lay and its packaging method, a plurality of grains are formed on the substrate-groove to reduce the size of the package structure, and then the method of packaging is thoroughly understood for the month b. Detailed steps will be presented in the following description. And its composition = two also the specific details of the practice of the present invention that are not familiar to those skilled in the art of grain sealing. The details of the well-known methods of grain formation and the subsequent steps of the grain thinning process are not described in detail to avoid unnecessarily limiting the invention. However, the present invention will be described in detail below, but in addition to these detailed descriptions, the present invention is also in the interest of a solid cover towel, and the present invention is not limited, and its subsequent patent scope Prevail. Figures 1 through 7 are schematic views showing the steps of forming a package structure for a die stack in accordance with the teachings of the present invention. First, please refer to FIG. 1 , which provides a substrate 10 ′ having a recess 其中 wherein the method of forming the recess 12 is a semiconductor process, which includes providing a front surface (not shown) and a backside (not shown) substrate ι; subsequently, a germanium-patterned photoresist layer (not shown); woven, perform-develop and _steps, removing portions of the substrate ίο ' A groove 12 is formed adjacent to the central portion of the substrate 10. Here, the material of the substrate 10 may be a PCB circuit board or a metal-based ai foil which has been placed in a circuit layout. Next, a further patterned photoresist layer (not shown) is formed on the substrate 10 having the recess i2; then development and engraving are performed so as to form on both sides of the substrate 10 having the recesses 12. a plurality of through holes 102, as shown in FIG. 2; next, after stripping the patterned photoresist layer, 'selecting a suitable conductive material _ into a conductive pillar 2 () in each of the through holes 1G2, which is electrically conductive The method of forming the pillar π includes filling a conductive material into a plurality of through holes 102 by plating, and exposing the upper and lower surfaces of each of the conductive pillars 20 to the upper and lower surfaces of the package. 9 201005885 Form the first conductive terminal 2〇2 and the third conductive terminal 2〇4, respectively, as shown in FIG. _ Next, please refer to Fig. 4, which shows a schematic diagram of forming a first die on the groove of the substrate. In Fig. 4, t' is provided - a first die 4 () having an active face and a back face, and having a plurality of solder fillets 402 on the active face; and then, the active face of the first die 4 The back surface of the first die 3 is fixed on the surface of the recess 12 of the substrate 10 by the first adhesive layer % formed on the surface of the recess 12 of the substrate. In another embodiment, the first adhesive layer 3 can be formed on the back surface of the second particle 40 and then attached to the surface of the groove of the substrate 1 such that the first particle is adhered to by the first adhesive. The layer % is fixed on the substrate 1 (). In this embodiment, the material of the first adhesive layer 30 is a two-stage thermosetting egg, and then φ, by means of wire bonding (4)_(4), the end of the plurality of first-wire 5 turns is formed on the first die (10). The other ends of the plurality of first wires 5 are formed on the surface of the recess η of the substrate to electrically connect the substrate 10 and the first die 40. Next, please refer to Section 5 for a schematic diagram of stacking the second die on the first die. In FIG. 5, a second die 42 is provided, which has an active surface and a back surface and has a plurality of solder bumps on the active surface like 2; then, the second die has an active face up, And attaching to the first die* by the first adhesive layer 32 to form a die stack structure, where the second adhesive layer 32 is simultaneously electrically connected to the first die 40. The first wire 50 and the active surface covering the first die 4〇. Here, the material of the second adhesive layer 32 may be FOW. Similarly, referring to FIG. 5, the ends of the plurality of second wires 52 are formed on a plurality of tantalums of the active surface of the second die 42 and the other end is formed on the substrate 1G having the recesses 12 in a wire bonding manner. On the surface, and electrically separated from the plurality of first-wires 4G whose axes are on the surface f of the recess 12 of the substrate 10. In this embodiment, the first grain of the grain and the second grain 42 are sighed by the same size and grain of the grain or by grains having different sizes and functions. Immediately after reference to Fig. 6, there is shown the intention of forming a package to cover the die stack structure. In Fig. 6, a polymer material (not shown) is injected into the recess 1210 of the substrate 1〇. Then, a baking process is performed on the polymer material (bake p is called to cure the polymer material to form - the package 60 is covered with the first adhesive layer 3q, the first die (10), the second adhesive layer 32, and the second crystal The particle 42, the plurality of first wires 5〇, and the plurality of second wires 52, and the front surface r of the portion of the substrate H) is irradiated thereon, and the polymer nano may be a rotating epoxy resin or an acrylic acid ( Acrylic), and benzocyclobutene (BCB) and other materials.

接著’參考第7圖’係表示將複數個導電元件形成在導電柱之一端點 上以完成-縣結構之示意圖在曝露之複數解電柱2q之上表面之第一 端點2〇2以陣列排列方式形成複數個導電元件?〇,例如金屬凸塊㈣^ b㈣) 或是錫球(solder ball),即完成晶粒堆疊之封裝結構。 此外’於另-實施例中,係、可以將複數個晶粒堆叠之封裝結構彼此堆 叠’如第8圖所示。在第8时,係將與第—晶粒堆叠結構具有相同結構 之第二晶_疊職堆# ’使得第二晶粒堆疊結構之複數料電元件冗與 第-晶粒堆叠結構之導電柱2〇之第二導電端點2〇4電性連接,在此,在導 電柱20之第二導電端.點2〇4與第二晶粒堆疊結構之複數個導電元件^之 間更包含複數轉墊8G ’藉此可職__多重堆疊結構。 雖然本發伽前狀健實施_絲上,财輕㈣限定本發 明’任何熟習相像技藝者,在不脫離本發明之精神和範圍内,當可作些許 之更動與潤飾’因此本發明之專利保護範圍須視本說明書所附之^利 範圍所界定者為準。 【圖式簡單說明】 第1圖至帛7關姆本發麵财之赫’表神成晶轉疊之封 裝結構之各步驟示意圖;及 第8圖係根據本發明所揭露之技術,表示形成多重堆疊結構之示意圖。 201005885 【主要元件符號說明】 - 10基板 102貫孔 12凹槽 20 導電柱 202第一導電端點 204第二導電端點 30第一黏著層 32第二黏著層 40 第一晶粒 402焊墊 ❹ 42第二晶粒 422焊墊 50 第一導線 52 第二導線 60封裝體 70導電元件 80焊墊Next, 'refer to FIG. 7' shows a schematic diagram of forming a plurality of conductive elements on one end of the conductive post to complete the - county structure. The first end point 2〇2 of the surface above the exposed complex electric column 2q is arranged in an array. How do you form a plurality of conductive elements? For example, a metal bump (four) ^ b (four)) or a solder ball, that is, a package structure for completing a die stack. Further, in another embodiment, a plurality of die-stacked package structures may be stacked on each other as shown in Fig. 8. At the 8th, the second crystal _ stack is the same structure as the first-grain stack structure, so that the plurality of electrical components of the second die stack structure are redundant with the conductive pillars of the first-die stack structure. The second conductive terminal 2〇4 is electrically connected, and here, the second conductive end of the conductive pillar 20, the point 2〇4 and the plurality of conductive elements of the second die stack structure further comprise a plurality Rotary pad 8G 'by this __ multi-stack structure. Although the present invention has been implemented on the basis of the present invention, it is possible to make some modifications and refinements when the invention is not limited to the spirit and scope of the present invention. The scope of protection shall be subject to the definition of the scope of the benefits attached to this manual. [Simplified Schematic Description] Fig. 1 to Fig. 7 are schematic diagrams showing the steps of the package structure of the body of the invention; and Fig. 8 shows the formation according to the technique disclosed in the present invention. Schematic diagram of multiple stacking structures. 201005885 [Main component symbol description] - 10 substrate 102 through hole 12 recess 20 conductive post 202 first conductive end 204 second conductive end point 30 first adhesive layer 32 second adhesive layer 40 first die 402 pad ❹ 42 second die 422 pad 50 first wire 52 second wire 60 package 70 conductive element 80 pad

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Claims (1)

201005885 十、申請專利範圍: 1. 一種半導體堆疊結構,包括: 基板’具有-正面及-背面且具有—凹槽設置在該基板之該正面内及複數 個貫孔在該基板之兩側; 一導電材料,設置在該些貫孔内以形成複數個導電柱; 一第-晶粒’具有-主動面及—背面’且將該主動面朝上並藉由—第一黏著 層將該第一晶粒之該背面固接在該基板之該凹槽之一表面上; β複數條第-導線,係用以電性連接該第一晶粒及該基板之該凹槽之該表面 上; 一第二黏著層,係包覆部份該些第-導線及該第-晶粒; -^-晶粒’具有-絲面及—背面,且將該主動面朝上及該背面與該第二 黏著層連接’且該第二黏著層係包覆部份該些第一導線; 複數條第二導線,用以電性連接該第二晶粒及該基板之該凹槽之該表面上; -封裝體’用以包覆該第-晶粒、該第二晶粒、該些第—導線、該些第二導 〇 線及該基板之部份該正面;及 複數個導電元件,係設置在曝露於該基板之該正面之該些導電柱之一表面 上0 2. 如申請專利細第i項所述之半導體堆疊結構,其中該基板選自於電路板及 金屬薄板所組成之族群中。 3. 如申請專利範@第丨項所述之半導體堆φ結構,其中該第—晶粒與該第二晶 粒之尺寸大小相同。 4. 如申請專利範圍第丨項所述之半導體堆疊結構,其中該第一晶粒與該第二晶 粒之尺寸大小不同。 Μ 13 201005885 5.如申請專利範圍第1項所述之半導體堆疊結構,其中該第一黏著層為二階段 • 熱固膠(B-stage)。 6. 如申請專利範圍第i項所述之半導體堆疊結構,其中該第二黏著層為請 (film over wire) 〇 7. 如申請專利範圍第i項所述之半導體堆叠結構,其中該些導電元件為錫球 (solder ball)。 8. 如申請專利範圍第丨項所述之半導體料結構,其中該些導電元件為凸塊 ❹ (bump) 〇 9. 一種形成半導體堆疊結構之方法,包括: 提供-基板,具有-正面及-背面且於該正面上具有—凹槽及於該基板之兩 側内具有複數個貫孔; 形成一導電層在該些貫孔内以形成複數個導電柱; 貼附-第-晶粒在該基板之該凹槽内’係將該第—晶粒之—主動面朝上且藉 由一第一黏著層固接在該凹槽之部份表面上; ® 形成複數個第一導線’係電性連接該第一晶粒之該主動面及該基板之該凹槽 之該表面; 貼附第一晶粒’係將該第二晶粒之一主動面朝上及該背面與一第二黏著層 固接其巾該第二黏著層用吨覆部份該些第__導線及該第—晶粒之該主動 面; 形成複數條第二導線,係電性連接該第二晶粒之該主動面及該基板之該凹槽 之該表面; 形成封裝體,係用以包覆該第一晶粒、該第二晶粒、該些第一導線、該些 第二導線及該基板之部份該正面;及 201005885 ‘ 形紐數辦電元件在板之該正面之已曝露之触導電柱之—表面上。 10.如申請專利範圍第9項所述之方法,其中該基板選自於電路板及金屬薄板 所組成之族群中。 U.如申請專利範圍第9項所述之方法,其中形成該凹槽之方法包括: 形成一圖案化之光阻層在該基板上; 姓刻以移除部份該基板;及 ❹ 雜該圖案化之光阻層’以形成該凹槽在該基板之該正面上。 12. 如申請專利範圍第9項所述之方法,其中形成該些貫孔之方法係為姓刻。 13. 如申請專利範圍第9項所述之方法,其中該第一晶粒及該第二晶粒之尺寸 大小相同。 14. 如申請專利範圍第9項所述之方法,其中該第—晶粒及該第二晶粒之尺寸 大小不同。 15. 如中請專利範圍第9項所述之方法’其中該第—黏著層係為二階段熱固型 膠(B-stage) 〇 % 16. 如申请專利範圍第9項所述之方法,其中該第二黏著層係為奶% (咖仍过 wire)。 R如申請專利範圍第9項所述之方法,其中該些導電元件為錫球⑽加祕)。 认如申請專利範圍第9項所述之方法,其中該些導電元件為凸塊(bump)。 19· 一種多重堆疊結構,包括: 基板’具有-正面及-背面且於該正面上具有一凹槽及複數個貫孔在該 基板之兩側内; 一導電層’設置在該些貫孔内以形成複數個導電柱·, 15 201005885 一第一晶粒,具有一主動面及一背面,且將該主動面朝上並藉由一第—黏 著層將該第一晶粒之該背面固接在該基板之該凹槽之一表面上; 複數條第一導線,係用以電性連接該第一晶粒及該基板之該凹槽之該表面; 一第二黏著層,係包覆部份該些第一導線及該第一晶粒; -第二晶粒,具有-主動面及-背面,且職主動面朝上以及該背面與一 第一黏著層固接,且該第二黏著層係包覆部份該些第一導線; 複數條第二導線’個以電性連接該第二及該基板之該凹槽之該 上; -封裝體,用以包覆該第-晶粒、該第二晶粒、該些第—導線該些第二 導線及該基板之部份該正面; 複數個導電元件’餘置在曝該基板之該正面之該些導妹之一表面 上以形成一第一晶粒堆疊結構;及 -多重堆#結構,健與該第—晶粒堆疊結構具有_—結構之一第二曰 粒堆昼結構之複數個導電元件電性連接至該第一晶粒堆叠 = 柱之一導電端點上。 二导冤201005885 X. Patent application scope: 1. A semiconductor stack structure comprising: a substrate having a front surface and a back surface and having a recess disposed in the front surface of the substrate and a plurality of through holes on opposite sides of the substrate; a conductive material disposed in the through holes to form a plurality of conductive pillars; a first-grain 'having an active surface and a back surface' with the active surface facing up and by the first adhesive layer The back surface of the die is fixed on a surface of the groove of the substrate; the β plurality of first wires are electrically connected to the surface of the first die and the groove of the substrate; a second adhesive layer covering a portion of the first-wire and the first-grain; -^-the grain 'having a silk surface and a back surface, and the active surface facing up and the back surface and the second surface Adhesive layer connection 'and the second adhesive layer covers part of the first wires; a plurality of second wires for electrically connecting the second die and the surface of the groove of the substrate; a package body 'for covering the first die, the second die, the first leads, the first a guide wire and a portion of the front surface of the substrate; and a plurality of conductive elements disposed on a surface of the conductive pillars exposed on the front surface of the substrate 0 2. As described in the patent item i A semiconductor stacked structure, wherein the substrate is selected from the group consisting of a circuit board and a metal thin plate. 3. The semiconductor stack φ structure as claimed in claim 5, wherein the first grain and the second grain are the same size. 4. The semiconductor stack structure of claim 2, wherein the first die and the second die are different in size. 5. The semiconductor stack structure of claim 1, wherein the first adhesive layer is a two-stage • B-stage. 6. The semiconductor stack structure of claim i, wherein the second adhesive layer is a film over wire. The semiconductor stack structure according to claim i, wherein the conductive layers are electrically conductive. The component is a solder ball. 8. The semiconductor material structure of claim 2, wherein the conductive elements are bumps 〇 9. A method of forming a semiconductor stacked structure, comprising: providing a substrate, having a front side and - a back surface and having a groove on the front surface and a plurality of through holes in the two sides of the substrate; forming a conductive layer in the through holes to form a plurality of conductive columns; attaching - the first die The groove in the substrate is configured to face the active surface of the first die and is fixed to a portion of the surface of the groove by a first adhesive layer; ® forming a plurality of first wires Bonding the active surface of the first die and the surface of the recess of the substrate; attaching the first die to the active side of the second die and the second bond to the back The second adhesive layer is covered with a portion of the first __ wire and the active surface of the first die; forming a plurality of second wires electrically connected to the second die The active surface and the surface of the recess of the substrate; forming a package for coating the surface The front surface of the first die, the second die, the first wires, the second wires, and the substrate; and the exposed contact of the front surface of the board in 201005885 On the surface of the conductive column. 10. The method of claim 9, wherein the substrate is selected from the group consisting of a circuit board and a metal sheet. The method of claim 9, wherein the method of forming the recess comprises: forming a patterned photoresist layer on the substrate; surname to remove a portion of the substrate; A patterned photoresist layer 'to form the recess on the front side of the substrate. 12. The method of claim 9, wherein the method of forming the through holes is a surname. 13. The method of claim 9, wherein the first die and the second die are the same size. 14. The method of claim 9, wherein the first die and the second die are different in size. 15. The method of claim 9, wherein the first adhesive layer is a two-stage thermosetting adhesive (B-stage) 16.%. 16. The method of claim 9, The second adhesive layer is milk% (the coffee is still over wire). R. The method of claim 9, wherein the conductive elements are solder balls (10). The method of claim 9, wherein the conductive elements are bumps. A multi-stack structure comprising: a substrate having a front surface and a back surface and having a recess and a plurality of through holes on the front side of the substrate; a conductive layer disposed in the through holes To form a plurality of conductive pillars, 15 201005885 a first die having an active surface and a back surface, and the active surface facing up and fixing the back surface of the first die by a first adhesive layer On a surface of one of the grooves of the substrate; a plurality of first wires for electrically connecting the first die and the surface of the groove of the substrate; a second adhesive layer, a covering portion And the first die and the first die; the second die has an active surface and a back surface, and the active surface faces upward and the back surface is fixed to a first adhesive layer, and the second adhesive layer The layer is coated with a portion of the first wires; a plurality of second wires are electrically connected to the second and the grooves of the substrate; and a package is used to coat the first die The second die, the second wires of the first wire and the portion of the substrate are front faces; a conductive element 'remaining on a surface of one of the guides exposing the front side of the substrate to form a first die stack structure; and - a multi-stack # structure, and the first-die stack structure has _ - a plurality of conductive elements of the second stack of structures are electrically connected to the first die stack = one of the conductive terminals of the post. Second guide ’其中該基板選自於電路板及 其中該第一晶粒與該第二晶 20. 如申請專利範圍第19項所述之多重堆疊結構 金屬薄板所組成之族群中。 21. 如申請專利範圍第19項所述之多重堆疊結構 粒之尺寸大小相同。 22. 如申請專利範圍第19項所述之多重堆疊結構, 熱固膠(B-stage)。 其中該第一黏著層為二階段 其中該第二黏著層為F〇W 如申請專利範圍第19項所述之多重堆疊結構 (film over wire) 〇 23. 201005885 24. 如申請專利範圍第19項所述之多重堆養結構,其中該些導電元件為錫球 • (solder ball)。 25. 如申請專圍第19項所述之多重堆叠結構,其中該些導電元件為凸塊 (bump) 〇 26. 如申請專利範圍第19項所述之彡重堆昼結構,更包含複數個連接焊塾在該 第一晶粒上之該些導電端點與該第二晶粒之該些導電元件之間。 27. —種形成多重堆疊結構之方法,包括: 參提供一基板,具有一正面及-背面且於該正面上具有-凹槽及在該基板之 兩側内具有複數個貫孔; 形成一導電層在該些貫孔内以形成複數個導電柱; 貼附一第一晶粒在該基板之該凹槽内,係將該第一晶粒之一主動面朝上且 藉由一第一黏著層固接在該凹槽之部份表面上; 形成複數㈣-導線,係電性連接謂-g粒之該线面及該基板之該凹 槽之該表面; φ 貼附一第二晶粒,係將該第二晶粒之一主動面朝上及該背面與該一第二黏 著層固接,其中該第二黏著層用以包覆部份該些第一導線及該第一晶粒之 該主動面; 形成複數條第二導線,係電性連接該第二晶粒之該主動面及該基板之該凹 槽之該表面; 形成一封裝體,係用以包覆該第一晶粒、該第二晶粒、該些第一導線、該 些第二導線及該基板之部份該正面; 形成複數個導電元件在該基板之該正面之已曝露之該些導電柱之一表面 上,以形成一第一晶粒堆疊結構;及 17 201005885 堆疊與該第-晶粒堆疊結構具有相同結構之一第二晶粒堆叠結構,係將該 • 帛二錄料賴之魏縛電元件紐連接綠第-晶轉疊結構之該 些導電柱之一導電端點上,以形成該多重堆疊結構。 汍如申請專利範圍第27項所述之方法,其中該基板選自於電路板及金屬薄板 所組成之族群中。 29.如申請專利範圍第27所述之方法,其中形成該凹槽之方法包括: 形成一圖案化之光阻層在該基板上; 〇 姓刻以移除部份該基板;及 移除該圖案化之光阻層,以形成該凹槽在該基板之該正面上。 3〇.如申請專利範圍第27所述之方法,其中形成該些貫孔之方法係為_。 31·如申請專利範圍第27所述之方法,其中該第一晶粒及該第二晶粒之尺寸大 小相同。 32.如申4專利範圍第27所述之方法,其中該第一晶粒及該第二晶粒之尺寸大 小不同。 鲁33.如申請專利範圍第27所述之方法,其中該第一黏著層係為二階段熱固型膠 (B-stage) 〇 34. 如申凊專利範圍第27所述之方法,其中該第二黏著層係為顯^恤 wire) 〇 35. 如申3月專利範圍第27所述之方法,其中該些導電元件為錫球(s—U)。 36. 如申請專利範圍第27所述之方法其中該些導電元件為凸塊㈣^。 37·如巾料概圍|^7述之方法更包含複數個連接烊郷成在該第一晶粒 上之該些導電端點與該第二晶粒之該些導電元件之間。 18Wherein the substrate is selected from the group consisting of a circuit board and a plurality of stacked metal sheets of the first crystal grain and the second crystal, as described in claim 19. 21. The multi-stack structure as described in claim 19 of the patent application has the same size. 22. A multi-stack structure as described in claim 19, a B-stage. Wherein the first adhesive layer is in two stages, wherein the second adhesive layer is F〇W, as described in claim 19, the film over wire is 〇23. 201005885 24. The multiple stacking structure, wherein the conductive elements are solder balls. 25. The multi-stack structure as described in claim 19, wherein the conductive elements are bumps 〇 26. The 昼 heavy stacking structure described in claim 19, further comprising a plurality of Connecting the solder pads between the conductive terminals on the first die and the conductive elements of the second die. 27. A method of forming a multi-stack structure, comprising: providing a substrate having a front side and a back side and having a recess on the front side and having a plurality of through holes in both sides of the substrate; forming a conductive Layers are formed in the through holes to form a plurality of conductive pillars; attaching a first die in the recess of the substrate, the active side of the first die is facing upward and by a first bond The layer is fixed on a part of the surface of the groove; forming a plurality of (four)-wires electrically connected to the line surface of the grain and the surface of the groove of the substrate; φ attaching a second grain And contacting the active side of the second die with the second adhesive layer, wherein the second adhesive layer is used to cover a portion of the first wires and the first die Forming a plurality of second wires electrically connecting the active surface of the second die and the surface of the recess of the substrate; forming a package for coating the first crystal The front surface of the grain, the second die, the first wires, the second wires and a portion of the substrate; Forming a plurality of conductive elements on a surface of one of the exposed conductive pillars of the front surface of the substrate to form a first die stack structure; and 17 201005885 stacking has the same structure as the first die-stack stack structure A second die stack structure is formed on the conductive end of one of the conductive pillars of the green first-crystal turn stack structure to form the multiple stacked structure. The method of claim 27, wherein the substrate is selected from the group consisting of a circuit board and a metal sheet. 29. The method of claim 27, wherein the method of forming the recess comprises: forming a patterned photoresist layer on the substrate; removing a portion of the substrate; and removing the A patterned photoresist layer is formed to form the recess on the front side of the substrate. The method of claim 27, wherein the method of forming the through holes is _. The method of claim 27, wherein the first die and the second die have the same size. The method of claim 27, wherein the first die and the second die have different sizes. The method of claim 27, wherein the first adhesive layer is a two-stage thermosetting adhesive (B-stage), wherein the method of claim 27, wherein The second adhesive layer is a wire. The method of claim 27, wherein the conductive elements are solder balls (s-U). The method of claim 27, wherein the conductive elements are bumps (four). 37. The method of claim 7, wherein the method further comprises a plurality of connections between the conductive terminals on the first die and the conductive elements of the second die. 18
TW097128056A 2008-07-24 2008-07-24 Chip stacked package structure with cavity in substrate and package method thereof TW201005885A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111554672A (en) * 2020-05-14 2020-08-18 甬矽电子(宁波)股份有限公司 Chip stacking structure and chip stacking method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111554672A (en) * 2020-05-14 2020-08-18 甬矽电子(宁波)股份有限公司 Chip stacking structure and chip stacking method
CN111554672B (en) * 2020-05-14 2022-09-27 甬矽电子(宁波)股份有限公司 Chip stacking structure and chip stacking method

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