TW200946949A - Anti-reflective film with excellent scratch resistance and surface slip property - Google Patents

Anti-reflective film with excellent scratch resistance and surface slip property Download PDF

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Publication number
TW200946949A
TW200946949A TW097133215A TW97133215A TW200946949A TW 200946949 A TW200946949 A TW 200946949A TW 097133215 A TW097133215 A TW 097133215A TW 97133215 A TW97133215 A TW 97133215A TW 200946949 A TW200946949 A TW 200946949A
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Taiwan
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group
film
refractive index
layer
index layer
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TW097133215A
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Chinese (zh)
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TWI400476B (en
Inventor
Kwang-Hui Choi
Young-Ho Cho
Sang-Yeol Um
Moon-Bok Lee
Jeong-Tae Seo
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Toray Saehan Inc
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Publication of TW200946949A publication Critical patent/TW200946949A/en
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Publication of TWI400476B publication Critical patent/TWI400476B/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/02Physical, chemical or physicochemical properties
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/06Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B27/08Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/18Layered products comprising a layer of synthetic resin characterised by the use of special additives
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/40Properties of the layers or laminate having particular optical properties
    • B32B2307/418Refractive
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/50Properties of the layers or laminate having particular mechanical properties
    • B32B2307/584Scratch resistance
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/70Other properties
    • B32B2307/746Slipping, anti-blocking, low friction
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00Electrical equipment
    • B32B2457/20Displays, e.g. liquid crystal displays, plasma displays

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  • Laminated Bodies (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

The invention relates to an anti-reflective film with excellent scratch resistance and surface slip property, and more particularly, to an anti-reflective film with excellent scratch resistance and surface slip property, in which the surface friction coefficient is so lowered that the scratch resistance is enhanced and the surface slip property is excellent, thereby preventing a creaking sound when the position of the display is moved to adjust a view angle or the like and effectively preventing light reflection from a surface of a display device and lowering production costs. For the purpose of the invention, the invention is characterized in an anti-reflective film with excellent scratch resistance and surface slip property, in which a hard coating layer 110 containing a (meta)acrylate compound, a high refractive layer 120 containing a binder resin and a conductive particle, and a low refractive layer 130 containing a fluorine compound are stacked in sequence on at least one side of a base film 100, wherein the surface of the low refractive layer 130 is finely rugged, and a static friction coefficient is equal or less than 0.5 and a kinetic friction coefficient is equal or less than 0.7 on the low refractive layer 130 side.

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200946949 九、發明說明: 【發明所屬技術領域】 5 e 10 15 Φ 20 本發明係與一種具有優異之刮擦抗性與表面滑動性 貝之抗反射薄膜有關,且更明確地係與一種其中該表面摩 擦係數係被降低,並提高刮擦抗性以使得該表面滑動性質 更優異,藉此避免在該顯示器的位置移動以調整視角時之 -輾軋聲或類似聲音,並有效地避免來卜顯示裝置表面 的光反射,同時降低生產成本之具有的卿抗性與表面滑 動性質之抗反射薄膜有關。 【先前技術3 大體而言,一例如電聚顯示面板(pDp)、一陰極射線 官(CRT)、-液晶顯示裝置(LCD)等等之顯示器,面對了自 外部而入射之光會反射,而使的所顯示㈣像難以被看見 的問題。特別是在最近的平面顯示器已經變得更大時,解 決前述之問題就變得更重要。 為了解決前述之問題,一抗反射或是防眩光處理迄今 已經被應用於各種不同的顯示裝置上。藉由—具體例的方 式’抗反射薄膜係被應用至各種不同的顯示裝置上。第^ 圖例示說明一種抗反射薄骐之原理。 此-抗反射薄膜已經藉著將—低折射率之材料(MgF2) 塗覆成在-基礎薄膜上的薄膜之方法,或是藉著將一具有 高折射率之材料[_有錫之氧化銦(岡、摻雜有錫之氧化 銻(ΑΤΟ)、ZnO、Ti〇2,等等]與一具有低折射率之材料 (MgF2、Si〇2,等等)’經由例如沈積、滅散或類似得乾式 5 200946949 塗敷製程來父互地堆疊於—基礎薄膜之方法來加以製造。 然而,該乾式塗敷製程過於昂貴而無法將該抗反射薄膜加 以商業地製造並行銷。 為了要解決剛述之缺點,最近濕式塗敷製程已經針對 5 s亥抗反射薄膜的製造’以及其之實際的商業用途進行嘗 試。然而,以該濕式塗敷製程來製造之反射薄膜比起以乾 式塗敷製程所製造者的刮擦抗性將會惡化。 s亥抗反射薄膜係被提供在例如該pDp、該CRT、該 LCD等等之該顯示裝置的最外部位置中,並且具有避免影 10像品質由於反射來自外部的光而變差之抗反射性、避免外 部污染物質之抗污染性、抵抗由於外部的機械摩擦作用所 造成的刮擦現象,等等之主要特性。 除了該等主要特性之外,表面滑動性質最近已經變得 重要。如果該表面滑動性質很差,在該顯示裝置被清理或 15是被移動以調整一視角的時候,就會因為在該架框與抗反 射薄膜之間的摩擦而產生輾軋聲,因而使用者就可能會抱 怨。 因此,除了前述之主要特性之外該抗反射薄膜必須有 具良好的表面滑動性質,而因此將需要又一抗反射薄膜。 20 【發明内容】 發明簡要說明 本發明係被構思以解決上述之問題,而本發明之一目 的係要提供一具有優異之刮擦抗性以及表面滑動性質之抗 反射薄膜,其所具有之優異之刮擦抗性以及表面滑動性質 200946949 可以有效地避免來自一顯示襞置表面的光反射並同時降低 生產成本。 5 10 15 20 本發明的上述與進一步之目的和優點,將可在閱讀下 列的參照該等圖式之例示說明本發明的較佳具體例之描述 内容下,而變得更為明顯。 前述目的係藉著提供一具有優異之刮擦抗性與表面 滑動性質之抗反射薄膜來達成,其中一包含有一(甲基)丙烯 酸酯化合物之硬質塗層110、一包含有一黏合劑樹脂與一導 電性顆粒之高折射率層120,以及一包含氟化合物之低折射 率層130係被依序堆疊在一基礎薄膜100的至少一側邊 上’其中該低折射率層13〇的表面係具有細微的不平整, 並且在該低折射率層13〇側邊上之靜磨擦係數係等於或少 於0.5而一動磨擦係數係等於或少於〇 7。 在此’該低折射率層130相對於100份之重量的黏合 劑樹脂係包含有15至25份之重量的二氧化石夕。 較佳地’本發明之特徵在於該反射薄膜中之霧度值係 少於3.0%。 較佳地’本發明之特徵在於該抗反射薄膜在380nm 的波長範圍中,具有一少於5%之透光度。 較佳地’本發明之特徵在於該硬質塗層110的厚度係 介於Ιμπι與5〇μιη之間。 較佳地’本發明之特徵在於該高折射率層⑶的厚度 厚度係介於〇.()_與L(Vm之間,而該低折射率層13〇的 厚度厚度係介於ο.〇1μιΙ^1()μιη^。 7 200946949 較佳地,本發明之特徵在於該高折射率層120中之導 電性顆粒係為金屬氧化物顆粒。 較佳地’本發明之特徵在於該高折射率層120中之嗦 黏合劑樹脂與該導電性顆粒的重量比率係介於廳〇 Z 5 30/70。 較佳地’本發明之特徵在於該低折射率^ 的氣化 合物係包含有在該主鏈中具有乙稀醚結構之氣共聚物。 較佳地,本發明之特徵在於該低折射率層係包含 有顆粒尺寸為G.GG_至〇.2μιη的二氧化㈣粒。 [〇 較佳地’本發明之特徵在於該二氧化矽顆粒具有一係 為一或更多顆粒尺寸之成分類型。 較佳地,本發明之特徵在於該低折射率層13〇進一步 含有以下列的化學式1來表示之石夕烧連接劑或是其之水解 物或其之反應物: 15 [化學式1] R(l)aR(2)bSiX4-(a+b), 其中’ R(l)或R(2)係分別地為一具有烷基、烯基、烯 丙基或是函素基之烴基基團、環氧基、胺基、氫硫基、曱 基丙烯醯氧基,或是氰基;X係為一選自於由烷氧基、烷 20氧-烷氧基、函素基或是醯氧基之可以被水解之取代基;a 與b係分別地為〇、1或2 ;而且(a+ b)係為1、2或3。 同時,較佳地,本發明之特徵在於該低折射率層中 U0的該氟化物,係進一步包含有以下列的化學式2來表示 之具有夕烧氧基的I樹脂或是其等之水解物: 200946949 [化學式2] R(3)cR(4)dSiX4-(C+d), 其中’R(3)或R(4)係分別地為一具有氟化院基、稀 基、烯丙基、甲基丙烯酿氧基,或是(甲基)丙烯驢基^煙基 5 基團;X係為一選自於由烧氧基、燒氧-燒氧其 、 〜_素基或 是醯氧基之可以被水解之取代基;c與d係分別地為〇 ^ 2或3 ;並且(c + d)係為1、2或3。 Ο 圖式簡要說明 本發明的特徵與優點可以由下列之彔^ 炙翏照该等隨附的 1〇圖式,來加以詳細說明之本發明的較佳具體例而變得明 顯,其中: 十 第1圖顯示一抗反射薄膜之原理; 第2圖係為概要地顯示依據本發明之該抗反射薄膜 的堆疊結構之薄膜的剖面圖。 > 、 15 【實施方式】 ❹ 較佳具體例之詳細描述 在下文中,本發明將參照該等具體例以及該等隨附的 圖式來加以詳細描述。對習於此藝者而言,那些呈體例顯 20 然僅是用於更詳細地例示說明本發明,而本發明的範園並 未侷限於該等具體例。 依據本發日㈣-具體例之具有優異之刮擦抗性和表 面滑動性質之抗反射薄膜’該表面的摩擦係數係因此被降 低以增進刮擦抗性,而該表面的滑動性質係為優異的藉以 避免在該顯示裝置的位置被移動以調整一檢視角度或類似 9 200946949 動作時之-輾軋聲’並降低該生產成本。 因此依據本發日月的_具體例之該具有優異之到擦抗 性和表面滑動性質之抗反射薄膜,係被施加至使用一例如 電黎顯示面板、-液晶顯示器等等的大尺寸電視之前側表 5 面上。 第2圖係為概要地顯示該抗反射薄膜的堆疊結構之 -抗反射薄膜的剖面圖。如在該圖式中所顯示的,—硬質 塗層110、回折射率層(以下也稱為”導電性層ιυο以及 一低折射率層(以下也稱為"樹脂層")13〇係被依序堆疊在該 ❹ 10基材薄膜1〇〇上(在下文中100+110+120+130也被稱為,,堆 疊薄膜")。同時,一保護性薄膜14〇以及在基材薄膜1〇〇 的另一側邊上之一黏附層15〇以及一個釋放薄膜16〇都可 以被加以堆疊。 依據本發明的一具體例,該低折射率層的表面滑動性 15質係被降低,以使得該抗反射薄膜在一反射性外觀上係為 優異的,其中在該視角被加以調整時,該刮擦抗性可以被 改善而摩擦雜音可以被抑制。同時,該反射薄膜在反射性 〇 外觀上係為優異的,並且係具有低表面反射率以及中性色 彩。 2〇 為了要達成此一目的,本案發明人一再地進行研究並 發現了一種其中硬質塗層110、高折射率層(以下也稱為” 導電性層”)120以及低折射率層(以下也稱為"樹脂層”)130 係被依序堆疊在該基礎薄膜100的至少一側邊上之該抗反 射薄膜,其中在該在低折射率層130的表面摩擦係數中, 10 200946949 靜磨擦係數係為0.5或更少而動磨擦係數係為〇 7或更少。 同時,本發明也想要藉著將上述抗反射薄膜黏結至一 影像顯不侧邊或是一前側面板的該表面而將一顯示裝置加 以覆蓋。 5 依據本發明的一具體例,包含有該甲基丙婦酸化合物 之該硬質塗層110、包含有導電性無機顆粒之該高折射率層 - 120,以及包含有該氟化合物及/或該中空二氧化矽顆粒之 低折射率層130’係被堆疊以在該基礎薄膜上形成一經堆疊 〇 的薄膜,並且該經堆疊的薄膜之表面係具有係為0.7或更 10少之動摩擦係數(μΐί),以及係為0.5或更少之靜摩擦係數 (μ s ),藉以形成可以改良該表面滑動性質與該刮擦抗性以及 良好的機械性之抗反射薄膜。此外’該摩擦係數係被降低 以改善該滑動性質,因而在該顯示裝置被移動以調整該視 角時摩擦雜音可以被抑制。舉例來說,該抗反射薄膜係被 15 應用於一例如電漿顯示面板、一液晶顯示器等等之平面面 板的大尺寸電視之前側表面上。 ® 該用於依據本發明之具有優異之刮擦抗性與表面滑 動性質之該抗反射薄膜的基材薄膜100’係較佳地具有__高 透光度與低霧度值,以將該基材薄膜100用來作為—顯示 20 裝置的元件(在下文中係被稱為'顯示元件')。舉例來說,在 400-800nm的波長範圍内之該透光度係較佳地為4〇0/。戍更 多’更佳地為60%或更多。同時’該霧度值係較佳地為5% 或更少量,更佳地為3%或更少。在上述條件中之一或二者 未被滿足時,所產生之用來作為顯示元件的薄膜就易於缺 11 200946949 乏影像銳利度。同時,為了要達成滿足銳利度之效果,該 可生產之範圍的透光度上限係大約為99 5%而該霧度值之 下限中則大約為0.1%。 該基材薄膜100並未侷限於特定之類型。其可以適去 . 5地選自於用於已知的塑膠基材薄膜的樹脂材料。 用於基材薄膜100之典型的樹脂材料係為具有以下 單元之聚合物或共聚物,該單元係選自於一由酯類、乙烯、 丙烯、二乙酸'三乙酸、苯乙烯、碳酸鹽、甲基戊烯、砜 類、乙醚乙基綱、醯亞胺、氟、尼龍、丙稀酸、脂肪環狀 10 烯烴等等所構成之群組。 較佳地,在前述的樹脂中需要具有以下單元之聚合物 或共聚物,該等單元係選自於由例如聚對苯二甲二乙酯之 S曰類、例如二醋酸纖維素之乙酸酯類、例如聚甲基丙烯酸 甲醋之丙稀酸酿類等等所構成之群組。其等係為較佳的理 15由在於其等具有非常均勻之透光性、強度與厚度。尤其是, 該基材薄膜100係較佳地依據透光性、霧度值以及機械性 質,而以具有酯類的單元之聚合物所製成。 此等聚酯樹脂的具體例包括有聚對苯二甲二乙酯、聚 乙稀_2’6_萘二甲酸、聚對苯二甲酸丁二S旨,聚乙稀-α,β-雙 20 (2氣盼基)乙烧_4,4,_二竣酸,等等。同時,只要該等成分未 超過20莫耳%,該等二瘦酸成分或是二醇成分就可以與此 等聚S曰共聚合。在其等之中,聚對苯二甲二乙醋通常在品 質經濟效率性等等上係為特別較佳的。 其僅能使用此等組成樹脂成分之一種類型或是二或 12 200946949 更多類型之組合。 同時,用於依據本發明之具有優異之刮擦抗性與表面 '月動14質之該抗反射薄膜的該基材薄膜100的厚度,並未 被侷限於—特定之數值。然而,基於透光度、霧度值與機 5械14質,該厚度通常係落在5與800μηι之間,較佳地為落 在10與250μηι之間。同時,該基材薄膜1〇〇可以藉由已 知的方式來將二或更多片之薄膜連結而加以生產。 同時,在形成該硬質塗層11〇之前該基材薄膜1〇〇可 以經過表面處理(舉例來說,藉由電晕放電、輝光放電、燃 10燒作用、餘刻作用、或粗輪化作用,等等)。同時,為了增 強黏附作用,該硬質塗層11〇可以在該施加一作為初始層 之塗層(舉例來說,具有聚氨基甲酸醋、聚醋、聚醋丙稀酸 酯、聚氨基甲酸丙烯酸酯、聚環氧丙烯酸酯,鈦酸化合物, 等等之塗層)之後被形成於該基材薄膜的表面上。特別是, 15藉由施加一作為初始層之組成物可以提高黏附性,以及例 如耐熱性、防水性等等之耐久性也可以被提高,該組成物 包含有以一丙烯化合物來接枝至具有一親水性基團之該聚 酯樹脂以及交聯劑的共聚物,以將所產生之薄膜用來作為 一基材薄膜100。 20 在依據本發明之具有優異之刮擦抗性與表面滑動性 質之該抗反射薄膜中的該硬質塗層110,係產生在該基材薄 膜100上。該層次110基本上應包含有一(甲基)丙烯酸酯化 合物。該丙烯酸酯化合物係藉著以活化射線來加以照射而 進行自由基聚合作用,並藉此改善所產生之薄膜的耐溶劑 13 200946949 性或是硬度。明確地說’該曱基丙稀酸醋化合物之一具體 例係為一單官能基丙稀酸酯化合物,例如曱基(曱基)丙稀酸 酯、正-丁基(甲基)丙烯酸酯、聚酯(甲基)丙烯酸酯、月桂基 (曱基)丙稀酸酯、經乙基(曱基)丙烯酸酯、經丙基(甲基)丙 5稀酸酯等等。同時,因為該多官能基丙稀酸酯化合物在一 · 個分子中具有二或更多個可以改善耐溶劑性的(甲基)烯丙 醯基,其等係特別地適合於本發明。該多官能基丙稀酸酯 化合物之一特殊具體例係為異戊四醇三(甲基)丙稀酸醋、異 戊四醇四(甲基)丙烯酸酯、二異戊四醇三(甲基)丙烯酸酯、 ❹ 10二異戊四醇四(甲基)丙烯酸酯、二異戊四醇五(曱基)丙烯酸 S曰、一異戍四醇六(甲基)丙稀酸s旨、三經曱基丙院三(甲基) 丙烯酸醋等等。其僅能使用此等單體之一種類型或是二或 更多類型之組合。 該用於形成本發明中之該硬質塗層110的構成樹脂 15成分,可以包含有例如烷基矽酸鹽與其之水解物、膠體二 氧化矽、乾燥二氧化矽、濕潤二氧化矽、或是三氧化鈦等 等,以及被分散於膠體中之二氧化矽顆粒的無機顆粒,以 4 改善該硬質塗層110的硬度。 該硬質塗層110的厚度係適當地依據其之用途來選 20定=,但典型地係為1叫1至5〇μηι,較佳地為 如果該硬質塗層1Η)的厚度係少於—μιη,該層次11〇 的表面硬度將會不足,所以層次11〇可能會易於被損害而 因此並非是較佳的。同時’如果該層次u〇的厚度是係超 過50哗’透光度將會減低而導致霧度值的增加。^經固化 14 200946949 的薄膜也會是脆弱的’而會在該硬質塗層110被彎曲時發 生斷解。因此,该少於1 μηι或超過5〇μηι之厚度並非是較 佳的。 在依據本發明之具有優異之刮擦抗性與表面滑動性 5質之該抗反射薄膜中的該導電性層120’係被形成於該硬質 塗層120上。該導電性層120係基本上包含有導電性顆粒 - 與黏合劑成分。本發明的導電性顆粒包括有金屬顆粒或金 屬氧化物顆粒。在其等之中,金屬氧化物顆粒因為其等之 © 冑透光㈣係為較佳地。職較佳的金屬氧化物顆粒係為 10氧化錄錫(ΑΤΟ)顆粒、氧化錄鋅顆粒、氧化鋼錫(ιτ〇)顆粒、 氧化辞/氧化鋁顆粒以及氧化銻顆粒。更佳地為氧化銦錫 (ΙΤΟ)顆粒與氧化銻錫(ΑΤ〇)顆粒。 較佳地’所使用之上述的導電性顆粒之平均主要顆粒 尺寸係不超過〇·5μΓη (以ΒΕΤ方法所測量之球體相對直 徑)c疋更佳地係介於0001和〇3叫^之間又更佳地係 _ 〃於G.GG5和0.2μη1之間。如果該平均主要顆粒尺寸比上 述尺寸大,該等顆粒將會減低所產生之薄膜(導電性層120) 的透光性。如果其係比上述尺寸小,該顆粒將可能會易於 濃縮所以所產生之薄膜(導電*層⑶)的霧度值將會增 加。其因此在任一情況中都難以得到所需之霧度值。 在*亥導電性層12G中所包含之黏合劑成分係為丙烯 酸知化合物。該(甲基)丙烯酸化合物係可以藉由照射活性射 線之方式而以自由基聚合並且係為較佳的,因為其可以有 利地改良該所產生的薄膜之耐溶劑性或硬度。該在一分子 15 200946949200946949 IX. Description of the invention: [Technical field of the invention] 5 e 10 15 Φ 20 The present invention relates to an antireflection film having excellent scratch resistance and surface slidability, and more specifically to The surface friction coefficient is lowered, and the scratch resistance is improved to make the surface sliding property superior, thereby avoiding the movement of the display to adjust the viewing angle - the rolling sound or the like, and effectively avoiding the occurrence The antireflection film which exhibits light reflection on the surface of the device while reducing the production cost has an anti-reflection film with a surface-sliding property. [Prior Art 3 In general, a display such as an electro-convex display panel (pDp), a cathode ray officer (CRT), a liquid crystal display device (LCD), etc., faces an externally incident light that reflects. And the problem that the displayed (four) is difficult to see. Especially when the recent flat panel display has become larger, it becomes more important to solve the aforementioned problems. In order to solve the aforementioned problems, an anti-reflection or anti-glare treatment has hitherto been applied to various display devices. The antireflection film is applied to various display devices by the method of the specific example. The figure exemplifies the principle of an anti-reflective thin crucible. This antireflection film has been coated with a low refractive index material (MgF2) as a film on a base film, or by a material having a high refractive index [_indium oxide with tin] (Oka, tin-doped yttrium oxide (ΑΤΟ), ZnO, Ti〇2, etc.] and a material having a low refractive index (MgF2, Si〇2, etc.) via, for example, deposition, extinction or the like Dry-type 5 200946949 The coating process is manufactured by stacking the father-in-one layers on the base film. However, the dry coating process is too expensive to commercially manufacture the anti-reflective film in parallel. Disadvantages, the recent wet coating process has been attempted for the manufacture of 5 s anti-reflective film and its practical commercial use. However, the reflective film produced by the wet coating process is dry coated. The scratch resistance of the manufacturer of the process will be deteriorated. The anti-reflection film is provided in the outermost position of the display device such as the pDp, the CRT, the LCD, etc., and has the image quality avoided. Since the reflection comes from outside The main characteristics of the light, the poor anti-reflection, the anti-pollution of external pollutants, the scratching caused by external mechanical friction, etc. In addition to these main characteristics, the surface sliding properties Recently, it has become important. If the surface sliding property is poor, when the display device is cleaned or 15 is moved to adjust a viewing angle, it is caused by friction between the frame and the antireflection film. The sound is rolled, so the user may complain. Therefore, in addition to the above-mentioned main characteristics, the antireflection film must have good surface sliding properties, and thus a further antireflection film will be required. 20 [Summary of the Invention] The present invention has been conceived to solve the above problems, and it is an object of the present invention to provide an antireflection film having excellent scratch resistance and surface sliding properties, which has excellent scratch resistance and surface. Sliding property 200946949 can effectively avoid light reflection from a display surface and reduce production costs. 5 10 15 20 The above and further objects and advantages of the present invention will become more apparent from the following description of the preferred embodiments of the invention. An antireflection film having excellent scratch resistance and surface sliding properties is achieved, wherein a hard coating layer 110 comprising a (meth) acrylate compound, a high refractive index comprising a binder resin and a conductive particle The layer 120, and a low refractive index layer 130 containing a fluorine compound are sequentially stacked on at least one side of the base film 100, wherein the surface of the low refractive index layer 13 has fine unevenness, and The static friction coefficient on the side of the low refractive index layer 13 is equal to or less than 0.5 and the dynamic friction coefficient is equal to or less than 〇7. Here, the low refractive index layer 130 contains 15 to 25 parts by weight of the dioxide dioxide with respect to 100 parts by weight of the binder resin. Preferably, the present invention is characterized in that the haze value in the reflective film is less than 3.0%. Preferably, the present invention is characterized in that the antireflection film has a transmittance of less than 5% in the wavelength range of 380 nm. Preferably, the present invention is characterized in that the thickness of the hard coat layer 110 is between Ιμπι and 5〇μιη. Preferably, the present invention is characterized in that the thickness of the high refractive index layer (3) is between 〇.()_ and L(Vm, and the thickness of the low refractive index layer 13〇 is between ο.〇 Preferably, the present invention is characterized in that the conductive particles in the high refractive index layer 120 are metal oxide particles. Preferably, the present invention is characterized by the high refractive index. The weight ratio of the ruthenium binder resin to the conductive particles in the layer 120 is in the chamber Z 5 30/70. Preferably, the present invention is characterized in that the low refractive index gas compound is contained in the main A gas copolymer having a ether ether structure in the chain. Preferably, the present invention is characterized in that the low refractive index layer comprises a (four) particle having a particle size of G.GG_ to 2.2μηη. The present invention is characterized in that the cerium oxide particles have a component type which is one or more particle sizes. Preferably, the present invention is characterized in that the low refractive index layer 13 further contains the following chemical formula 1 Representing the Shixia Burning Agent or its hydrolyzate or its reactants : 15 [Chemical Formula 1] R(l)aR(2)bSiX4-(a+b), wherein 'R(l) or R(2) are respectively an alkyl group, an alkenyl group, an allyl group or a hydrocarbyl group, an epoxy group, an amine group, a thiol group, a decyl propylene methoxy group, or a cyano group; the X system is selected from the group consisting of an alkoxy group, an alkane 20 oxy-alkoxy group. a functional group which may be hydrolyzed by a hydroxyl group or a methoxy group; a and b are respectively 〇, 1 or 2; and (a+ b) is 1, 2 or 3. Meanwhile, preferably, The invention is characterized in that the fluoride of U0 in the low refractive index layer further contains an I resin having an oxime alkoxy group represented by the following Chemical Formula 2 or a hydrolyzate thereof: 200946949 [Chemical Formula 2] R (3) cR(4)dSiX4-(C+d), wherein 'R(3) or R(4) are respectively a fluorinated, divalent, allyl, methacryloxy group Or a (meth) acryloyl fluorenyl group; the X system is one selected from the group consisting of an alkoxy group, a oxy-oxygen-oxygen group, a methoxy group, or a decyloxy group. a substituent; c and d are respectively 〇^ 2 or 3; and (c + d) is 1, 2 or 3. 简要 Brief description The features and advantages of the invention are apparent from the following detailed description of the preferred embodiments of the invention, wherein: FIG. The principle of a reflective film; Fig. 2 is a cross-sectional view schematically showing a film of a stacked structure of the antireflection film according to the present invention. > 15 [Embodiment] 详细 Detailed Description of Preferred Embodiments Hereinafter, The invention will be described in detail with reference to the specific examples and the accompanying drawings, which are intended to be illustrative only, Fan Park is not limited to these specific examples. The anti-reflection film of the surface having excellent scratch resistance and surface sliding properties according to the present invention (4) - the specific example is thus reduced in friction coefficient to improve scratch resistance, and the sliding property of the surface is excellent The borrowing is avoided to adjust the position of the display device to adjust a viewing angle or similar to the 2009 200949 action and reduce the production cost. Therefore, the antireflection film having excellent resistance to rubbing resistance and surface sliding property according to the specific example of the present day is applied to a large-sized television using, for example, an electric display panel, a liquid crystal display or the like. Side surface 5 faces. Fig. 2 is a cross-sectional view showing an antireflection film which schematically shows a stacked structure of the antireflection film. As shown in the drawing, the hard coat layer 110, the refractive index layer (hereinafter also referred to as "the conductive layer ιυο and a low refractive index layer (hereinafter also referred to as "resin layer") 13〇 The substrates are sequentially stacked on the ❹ 10 substrate film 1 (hereinafter, 100+110+120+130 is also referred to as, stacked film "). At the same time, a protective film 14 〇 and on the substrate One of the adhesion layers 15A and the release film 16A on the other side of the film 1 can be stacked. According to a specific example of the present invention, the surface slidability of the low refractive index layer is reduced by 15 In order to make the antireflection film excellent in a reflective appearance, the scratch resistance can be improved and the rubbing noise can be suppressed when the viewing angle is adjusted. Meanwhile, the reflective film is reflective The 〇 is excellent in appearance and has low surface reflectance and neutral color. 2 In order to achieve this goal, the inventors of the present invention have repeatedly conducted research and found a hard coating layer 110 and a high refractive index layer. (hereinafter also referred to as "" The electrical layer ") and the low refractive index layer (hereinafter also referred to as "resin layer") 130 are sequentially stacked on the at least one side of the base film 100 of the antireflection film, wherein at the low Among the surface friction coefficients of the refractive index layer 130, 10 200946949 has a static friction coefficient of 0.5 or less and a dynamic friction coefficient of 〇7 or less. Meanwhile, the present invention also intends to bond the above-mentioned antireflection film to one. The display device is covered by the side surface of the image or a front side panel. 5 According to a specific example of the present invention, the hard coating layer 110 containing the methacrylic acid compound includes conductivity. The high refractive index layer 120 of inorganic particles, and the low refractive index layer 130' containing the fluorine compound and/or the hollow ceria particles are stacked to form a stacked tantalum film on the base film, and The surface of the stacked film has a coefficient of dynamic friction (μΐ) of 0.7 or less, and a coefficient of static friction (μs) of 0.5 or less, whereby formation of the surface sliding property and the scratch can be improved. Resistance And a good mechanical anti-reflection film. Further, the coefficient of friction is lowered to improve the sliding property, so that the friction noise can be suppressed when the display device is moved to adjust the viewing angle. For example, the anti-reflection film It is applied to the front side surface of a large-sized television such as a flat panel of a plasma display panel, a liquid crystal display, etc. ® This is used for the excellent scratch resistance and surface sliding property according to the present invention. The base film 100' of the antireflection film preferably has a high transmittance and a low haze value to use the base film 100 as an element of the display 20 device (hereinafter referred to as ' Display element '). For example, the transmittance in the wavelength range of 400-800 nm is preferably 4 〇 0 /.戍 More ‘more preferably 60% or more. At the same time, the haze value is preferably 5% or less, more preferably 3% or less. When one or both of the above conditions are not satisfied, the resulting film used as a display element is liable to be lacking image sharpness. Meanwhile, in order to achieve the effect of satisfying the sharpness, the upper limit of the transmittance of the produceable range is about 99 5% and the lower limit of the haze value is about 0.1%. The base film 100 is not limited to a specific type. It can be suitably selected from the resin material used for the known plastic substrate film. A typical resin material for the substrate film 100 is a polymer or copolymer having the following units selected from the group consisting of esters, ethylene, propylene, diacetic acid 'triacetic acid, styrene, carbonate, A group consisting of methylpentene, sulfone, ethyl ether, quinone, fluorine, nylon, acrylic acid, aliphatic cyclic 10 olefin, and the like. Preferably, a polymer or copolymer having the following units is selected from the above-mentioned resins, and the units are selected from the group consisting of, for example, polyethylene terephthalate, such as cellulose acetate diacetate. A group consisting of, for example, polyacrylic acid methyl vinegar, acrylic acid, and the like. They are preferred because they have a very uniform light transmission, strength and thickness. In particular, the base film 100 is preferably made of a polymer having a unit of an ester, depending on light transmittance, haze value, and mechanical properties. Specific examples of such polyester resins include polyethylene terephthalate, polyethylene-2'6-naphthalene dicarboxylic acid, polybutylene terephthalate, and polyethylene-α,β-double 20 (2 gas base) Ethylene burning _4, 4, _ dinonanoic acid, and so on. Meanwhile, as long as the components do not exceed 20 mol%, the di- ortho-acid components or the diol components may be copolymerized with the poly-S. Among them, polyethylene terephthalate is generally particularly preferable in terms of quality economic efficiency and the like. It can only use one type of these constituent resin components or a combination of two or more 200946949 types. Meanwhile, the thickness of the base film 100 used for the antireflection film having excellent scratch resistance and surface 'moon 14 quality according to the present invention is not limited to a specific value. However, based on the transmittance, haze value and mechanical properties, the thickness generally falls between 5 and 800 μm, preferably between 10 and 250 μm. At the same time, the base film 1 can be produced by joining two or more films by a known method. Meanwhile, the base film 1 〇〇 may be subjected to surface treatment before forming the hard coat layer 11 (for example, by corona discharge, glow discharge, combustion 10, residual action, or coarse rotation) ,and many more). Meanwhile, in order to enhance the adhesion, the hard coat layer 11 can be applied with a coating as an initial layer (for example, polyurethane, polyester, polyester acetate, polyurethane acrylate). A coating of a polyepoxy acrylate, a titanate compound, or the like) is then formed on the surface of the substrate film. In particular, 15 can improve adhesion by applying a composition as an initial layer, and durability such as heat resistance, water repellency, and the like can be improved, and the composition contains grafted with a propylene compound to have A copolymer of the polyester resin and a crosslinking agent of a hydrophilic group to use the resulting film as a substrate film 100. The hard coat layer 110 in the antireflection film having excellent scratch resistance and surface slidability according to the present invention is produced on the base film 100. This level 110 should essentially comprise a (meth) acrylate compound. The acrylate compound is subjected to radical polymerization by irradiation with an actinic ray, and thereby the solvent resistance of the resulting film is improved or hardness. Specifically, one specific example of the mercapto acrylate compound is a monofunctional acrylate compound such as mercapto (mercapto) acrylate, n-butyl (meth) acrylate. , polyester (meth) acrylate, lauryl (mercapto) acrylate, ethyl (mercapto) acrylate, propyl (methyl) propane 5 dibasic acid ester and the like. Meanwhile, since the polyfunctional acrylate compound has two or more (meth)allyl groups which can improve solvent resistance in one molecule, it is particularly suitable for the present invention. A specific specific example of the polyfunctional acrylate compound is pentaerythritol tris(meth)acrylic acid vinegar, pentaerythritol tetra(meth)acrylate, diisopentaerythritol tris (a) Acrylate, ❹ 10 diisopentyl alcohol tetra (meth) acrylate, diisopentaerythritol penta (indenyl) acrylate S 曰, monoisodecyl hexa(hexa) acrylate, Three 曱 曱 丙 院 三 三 三 (meth) Acrylic vinegar and so on. It can only use one type of these monomers or a combination of two or more types. The constituent resin 15 for forming the hard coat layer 110 of the present invention may contain, for example, an alkyl phthalate and a hydrolyzate thereof, colloidal cerium oxide, dry cerium oxide, wet cerium oxide, or The titanium oxide or the like, and the inorganic particles of the cerium oxide particles dispersed in the colloid, improve the hardness of the hard coat layer 110 by 4. The thickness of the hard coat layer 110 is appropriately determined according to the use thereof, but is typically 1 to 5 〇μηι, preferably if the thickness of the hard coat layer is less than - Μιη, the surface hardness of this layer 11〇 will be insufficient, so the layer 11〇 may be easily damaged and therefore is not preferred. At the same time, if the thickness of the layer u 是 is more than 50 哗, the transmittance will be reduced to cause an increase in the haze value. ^The cured film 14 200946949 film will also be fragile' and will break when the hard coat layer 110 is bent. Therefore, the thickness of less than 1 μm or more than 5 〇μη is not preferable. The conductive layer 120' in the antireflection film having excellent scratch resistance and surface slidability according to the present invention is formed on the hard coat layer 120. The conductive layer 120 basically contains conductive particles - and a binder component. The electroconductive particles of the present invention include metal particles or metal oxide particles. Among them, metal oxide particles are preferred because of their © light transmission (four). Preferred metal oxide particles are 10 oxide tin (ruthenium) particles, zinc oxide particles, oxidized steel tin (yttrium) particles, oxidized/alumina particles, and cerium oxide particles. More preferably, it is indium tin oxide (yttrium) particles and antimony tin oxide (yttrium) particles. Preferably, the average primary particle size of the above-mentioned conductive particles used is not more than 〇·5 μΓη (the relative diameter of the sphere measured by the ΒΕΤ method) c 疋 more preferably between 0001 and 〇3 More preferably, it is between G.GG5 and 0.2μη1. If the average primary particle size is larger than the above size, the particles will reduce the light transmittance of the resulting film (conductive layer 120). If the size is smaller than the above size, the particles may be easily concentrated, so that the haze value of the resulting film (conductive * layer (3)) will increase. It is therefore difficult in any case to obtain the desired haze value. The binder component contained in the *H conductive layer 12G is an acrylic compound. The (meth)acrylic compound can be radically polymerized by irradiation of an active ray and is preferred because it can advantageously improve the solvent resistance or hardness of the resulting film. The one in the molecule 15 200946949

中具有二或更多(甲基)烯丙醯基之多官能基(甲基)丙烯酸 化合物,可以改良耐溶劑性而因此在本發明中係為特別較 佳的。該化合物之一具體例係為包括有異戊四醇三(甲基) 丙烯酸s旨、二經曱基丙炫三(甲基)丙稀酸醋、甘油三(甲基) 5 丙烯酸酯、經修飾的乙烯三羥曱基丙烷三(甲基)丙烯酸酯、 三-(2-經乙基)-異氰酸酯三(甲基)丙稀酸酯等等之三官能基 (甲基)丙稀酸自曰,以及包括有異戊四醇四(甲基)丙稀酸醋、 二異戊四醇五(甲基)丙稀酸酯、二異戊四醇六(曱基)丙烯酸 酯等等的四-或更多官能基之(甲基)丙烯酸酯。 10 包含在該導電層120中之該黏合劑成分,可以是具有A polyfunctional (meth)acrylic compound having two or more (meth)allyl groups can improve solvent resistance and is therefore particularly preferred in the present invention. A specific example of the compound includes isopentaerythritol tris(meth)acrylic acid s, dipyridyl propyl tris(methyl) acrylate vinegar, glycerol tris(meth) acrylate, Modified tris(meth)acrylate, tris-(2-ethyl)-isocyanate tri(methyl) acrylate, etc.曰, and four including isopentaerythritol tetra(methyl) acrylate vinegar, diisopentaerythritol penta (meth) acrylate, diisopentaerythritol hexa(meth) acrylate, and the like - or more functional (meth) acrylate. 10 the binder component contained in the conductive layer 120 may have

例如羧酸基、磷酸鹽、硫酸基等等之一酸性官能基,以改 善该等顆粒之可分散性。明確地說,該具有該酸性官能基 之單體的-具體例係為例如丙稀酸、甲基丙稀酸、巴豆酸、 2-曱基稀丙醯氧乙基琥#酸以及2曱基烯丙醯氧乙基苯二 15甲酸、例如單(2_稀丙酿氧乙基)酸式填酸鹽與二苯基甲 )稀丙醯氧乙基y酸鹽和硫自旨(甲基)丙稀酸自旨之構酸 (甲土)丙稀酸g日等等。此外’其可以使用—帶有極性化學鍵 ~(甲基)丙稀酸酿化合物,例如一酿胺鍵結、胺基甲酸醋 鍵結、鍵鍵妹,莖哲 、、° 等。同時,例如胺基曱酸酯(甲基)丙烯酸 的日之該具有_胺基甲酸賴之樹脂係特別為較佳 分散性ί其具有—較高的極性並且可以導致良好的顆粒可 候,可以i成本發明的硬f塗層110與導電性層120的時 起始劑以進—步促進該所施加的黏合劑成 16 200946949 分之固化作用。該起始劑係被用來藉由自 β 目由基反應、陽離 子反應、陰離子反應、等等方式’起始或促進所施加之黏 合劑成分之聚合作用及/或交聯作用,並B * /=fe 亚且其可以是任何傳 統上已知的光聚合作用起始劑。 • 5 明確地說,該起始劑可以是例如甲| ^ ^ T基二硫代胺基甲酸 鈉硫化物、單硫化苯基苯、單硫化二笨并噻唑,等等之硫 - 化物;例如噻吨酮(thi〇Xanth〇ne)、2_乙基噻吨酮、2_氣基噻 吨酮以及2,4.二乙基㈣社嗟相彳m例如膝與偶 〇 氮雙異丁腈等等之偶氮化合物;例如重氡苯鹽等等之重說 10化合物;例如安息香、安息香甲醚、安息香乙醚、二苯甲 酮'二甲基胺基二苯曱酮、四甲基二胺基二笨曱酮、蒽醌、 t-丁基蒽醌、2-甲基蒽醌、2·乙基蒽醌、2_胺基蒽醌、2-氣 基蒽醌等等之芳香族羰基化合物;例如?_二甲基胺基甲基 苯甲酸酿、p-—甲基胺基乙基苯甲酸酯、D_二曱基胺基丁 15基苯曱酸酯、p-二乙基胺基異丙基苯甲酸酯等等之二烷基 胺基本甲酸S曰,例如一苯甲醯過氧化物、二_t_ 丁基的過氧 ® 化物、二異丙苯過氧化物、異丙苯基氫基過氧化物等等之 過氧化物;例如9_苯基吖啶、9-p-甲基氧苯基吖啶、9_乙醯 基胺基吖啶、苯并吖啶、等等之吖啶衍生物;例如91〇_二 20甲基苯并啡、9-甲基苯并啡、以及10-甲基氧基笨并啡 等等之啡衍生物;例如6,4,,4,’-三曱基氧基-2,3-二苯基 啥啉等等之喹啉衍生物;2,4,5-三苯基咪唑基之二聚 物、2-硝基第芴、2,4,6-三苯基氧鑌4氟化硼鹽 (2,4,6-triphenylpyryliumafluorinatedboronsalt)、2,4,6-2 17 200946949 (三氣基甲基Η,#三氮、3,3,_幾基雙香豆素、硫代_四甲 基一胺基一本甲酮(此〇-]\^(:11161>’8 1{^〇116)、2,4,6-三甲基苯 甲醯基二苯基氧化膦、寡聚_(2_羥基_2_甲基_1(4·(1_甲基乙 烯基)苯基丙酮、2_苯基-2-二甲基胺基-1-(4-嗎福啉基苯基)_ 5 丁酮等等。 同時,在形成本發明的硬質塗層U0與導電性層12〇 的時候,胺化合物可以被添加至該光聚合作用起始劑,以 藉由氧之抑制作用而避免敏感度降低。此個胺化合物之具 體例可以包括有,但不侷限於,任何的脂肪族胺化合物或 1〇芳香族胺化合物中之任何一者,只要其係為非揮發性的。 該胺化合物之一適當的具體例係為三乙醇胺、甲基二乙酵 胺以及其等之類似物。 在本發明中,有關於該導電性層12〇的成分之混合比 率,該黏合劑成分相對於該等顆粒所需之比率,基於重量 15 係為10/90至30/70 ’較佳地為15/85至25/75。 如果使用低於上述特定數值之較少顆粒的話,所產生 之薄膜將可以具有足夠的透光性但是卻會具較差的導電係 數。相對地,如果使用超過上述特定數值之較少顆粒的話, 所產生之薄膜將會不利地具有較差的物理與化學強度。相 '°對於100份之重量的該黏合劑成分,該所添加之光聚合作 用起始劑的含量,通常係為0.1至20份的重量,較佳地為 1.0至15.0份的重量。如果該含數量係少於〇1份之重量的 話,該光聚合作用過程將會是緩慢而需要長時間光照,以 滿足所需之硬度和抗磨蝕性,而該所產生之薄犋有時仍會 200946949 維持未固化。在另—方面,如果該所添加之含量係為超過 20伤的重量’就會減低該薄膜的導電係數、抗磨耗性、抗 天候性等等。 在依據本發明之具有優異之刮擦抗性與表面滑動性 ’ 5 f之該抗反射薄膜中的該導電性層120的基本成分,係為 黏合接劑成分、導電性顆粒以及光聚合作用起始劑。如果 有需要的居,可以添加例如聚合作用抑制劑、固化作用催 化劑氧化作用抑制劑、分散劑、勻塗劑、石夕烧連接劑等 〇 等之添加劑。 10 在本發明中,該導電性層120可以進一步包含有例如 聚啦洛和聚笨胺,等等之導電性聚合物,以及例如金屬嵌 合(alcolate)和螫合物等等之有機金屬化合物,以為該導電 性層120之成分提供導電性。同時,該導電性層12〇可以 進一步包含有例如烷基矽酸鹽與其之水解物、膠態二氧化 15矽、乾燥一氧化矽、濕潤二氧化矽或是三氧化鈦等等、分 散於勝質中之二氧化矽顆粒等等之無機顆粒,以改良表面 ® 硬度。 為了要以導電性層丨2〇之方式刺提供所需程度之抗 靜電能力’其係在該導電性層120上之表面電阻係較佳地 20為lxl〇U〇hm/sq或更少’更較佳地為lxlO'hm/sq或更少。 在本發明之該導電性層120的總通透度,在銳利度和 透光性的方面係較佳地有40%或更多,更佳地為60%或更 多。 同時’在依據本發明之具有優異之刮擦抗性與表面滑 200946949 動性質之該抗反射薄膜的樹脂層130,係被提供在該導電性 層120上並且係基本上包含有氟化物。 在本發明中所使用之氟化物係較佳地為那些以熱能 或游離輻射來交聯者。該經交聯氟化物可以是具有一交聯 - 5基團或是一帶有未飽和基團之氟單體的氟聚合物,或是具 . 有用以提供氟單趙與-交聯基團之單體單元的氟聚合物。 明確地說,該氣化物係較佳地由在該主鏈具有—乙 構的氟聚合物所組成。較佳地,該氟聚合物具有一氣稀煙 鏈,其中該氟含量係為重量的3〇%或更多,該 I。稀換算之數目平均分子一或更多,較佳地為1。 〇 或更多。此等氟聚合物係藉著將具有氟-化合物與乙稀謎化 合物之固化組成物進行聚合而獲得,較佳地係藉由將該包 含有氟-婦烴化合物、可以與該氟_烯烴化合物共聚合的乙烯 醚化合物的固化成分,以及在有需要下之欲被混合的反應 改乳化劑進行聚合而獲得。該固化組成物係較佳地用來形 成該3有作為一成分之反應性乳化劑的氟聚合物。藉著使 。〇反應乳化劑,在該塗料液體中所包含的該氣聚合物 〇 °、被充/7地;^加並平坦地施加。該反應性乳化劑之一較 扣佳具體例係特別地為一非離子反應性乳化劑。 針對於在轉脂層η()巾所包含㈣聚合物該源自 ^稀Μ匕合物成分之單元係為2〇至7〇莫耳%,較佳地 為25至65莫耳%,更佳地為30-60莫耳%。 小如果該源自於氟烯烴化合物成分之該單元的比率係 夕於20莫耳% ’在該所獲得的最終敦共聚物内之該氣含量 20 200946949 °會太v。因此,該樹脂層13〇的折射率接著將會變得 不夠低。:κ . ⑽一 —方面,如果該源自於氟烯烴化合物成分之該 單-的比率係大於7Q莫耳%,在該塗料液體中的均句度將 j也變差’因而其係不易形成_均勻的塗覆薄膜。同 時其在不易達到所需透光性與黏附於肖基材上方面也是 不利的S於該氟聚合物而言,該源自於含有該乙稀醚结 構的化。物之該單元係為10 i 70莫耳%,較佳地為I5至 :莫耳/〇,更佳地為3〇至6〇莫耳%。如果該源自於含有 S婦鍵、’、°構的化合物之該單元係少於10莫耳%,在該塗 10料液體中之均勻度將會變差,因而其係不易形成-均勻的 塗覆薄媒。以比率超過70莫耳%之塗料液體所獲得的該樹 脂層130’並不會具有所需之透光性和抗反射性之光學性 質。 對於包含有此一乙烯醚結構的該化合物成分而言,其 15係較佳地使用一包含一例如氫氧基或環氧基之反應性官能 基的單體,因而在該所產生的固化樹脂組成物被用來作為 塗料液體時’可以改善該經固化薄膜的強度。該等整個單 體與該包含該氫氧基或環氧基之單體的比率係為0_20莫耳 %,較佳地為1-20莫耳%,且更佳地為3_15莫耳%。如果 20該比率係超過20莫耳%,該所產生之樹脂層會具有較 差的光學性質,並且該經固化的薄膜將會變得較弱。對於 包含有反應性乳化劑之敗共聚物而言,該源自於該反應性 乳化劑成分之该單元的比率通常係為〇至丨〇莫耳%,較佳 地為0.1至5莫耳%。如果該比率係超過1〇莫耳%,該所 21 200946949 產生的樹脂層130係具有膠黏性,因而其係難以處理該層 次130’並且因為該塗料液體之抗濕性會降低而不會是—較 佳的樹脂層。 同時,該低折射率層130包含有相對於為ι〇〇份的重 - 5量之黏合劑樹脂,係為15-25份之重量的中空二氧化矽。 如果該中空二氧化矽顆粒含量係少於15份之重量的話,該 折射率就會因此增加而使得抗反射性惡化,也就是說反射 率將會增加。另一方面,如果該中空二氧化矽顆粒含量係 超過25份之重量的話,該表面的粗糙度就會因此增加而減 ❿ 10低該表面滑動性質,而該昂貴的中空二氧化矽也會導致生 產成本的增加。 除了該氟聚合物之外,其係較佳地將一交聯化合物混 合以產生依據本發明之該樹脂層130。這是因為其可以有效 地提供一些固化能力藉以改善固化性質。 15 舉例來說’上述之交聯化合物的一具體例係為胺基化 合物’或是例如異戊四醇、多酚、二醇、烧基石夕酸易以及 其等之水解物等等之含有氫氧基的化合物。該被用來作為 ❹ 一交聯化合物之胺基化合物,可以總共包含有二或更多個 可以與存在於該氟化合物中之該氫氧基或環氧基(舉例來 2〇 說’在該羥基烷基胺基以及該烷氧基烷基胺基中之任何一 或二者)反應的胺基。其之一具體例係為三聚氰胺化合物、 尿素化合物、苯代三聚氰胺化合物、甘脲化合物等等。該 三聚氰胺化合物已知係為一種通常具有一其中氮原子係被 鍵結至一三氮雜苯環的骨架之化合物,並且其之一具體例 22 200946949 係為三聚氰胺、烷基三聚氰胺、羥甲基三聚氰胺、烷氧基 甲基三聚氰胺,等等。然而,一個分子總共具有二或更多 之以下的羥甲基與烷氧基甲基中之任何一者或兩者的基團 者係為較佳。特別地,藉著在一鹼性條件下將三聚氰胺與 5甲醛反應而獲得之羥甲基三聚氰胺、烷氧基甲基三聚氰胺 或是其等之衍生物係為較佳的。烧氧基甲基三聚氛胺由於 在該固化樹脂成分中所得到之良好的保存穩定性與所得到 之良好的可反應性,而係為特別較佳的。An acidic functional group such as a carboxylic acid group, a phosphate group, a sulfate group or the like is used to improve the dispersibility of the particles. Specifically, the specific example of the monomer having the acidic functional group is, for example, acrylic acid, methyl acrylic acid, crotonic acid, 2-mercapto acetophenoxyethyl succinate, and 2-mercapto Allyl oxyethyl benzene di 15 carboxylic acid, for example, mono (2-dipropyl oxyethyl) acid sulphate and diphenylmethyl) sulphide oxyethyl y acid salt and sulphur Acetic acid from the purpose of acid (soil) acrylic acid g day and so on. In addition, it can be used - with a polar chemical bond ~ (meth) acrylic acid brewing compound, such as a chiral amine bond, a urethane bond, a bond, a stem, a °, and the like. At the same time, for example, the amino phthalate (meth) acrylate has a lysine-based resin which is particularly preferably dispersible, has a high polarity and can cause good granules, i. The hard f coating 110 of the invention and the time initiator of the conductive layer 120 further promote the curing of the applied adhesive to 16 200946949. The initiator is used to initiate or promote polymerization and/or crosslinking of the applied binder component by means of a beta group reaction, a cationic reaction, an anion reaction, etc., and B* /=fe and it may be any conventionally known photopolymerization initiator. • 5 In particular, the initiator may be, for example, methyl sulfide, sodium thiophenylsulfonate, phenylbenzene monosulfide, dithiocarbamate monosulfide, etc.; Tons of ketone (thi〇Xanth〇ne), 2_ethylthioxanthone, 2_glycosylthioxanthone, and 2,4. diethyl (tetra) 嗟 phase 彳 m such as knee and azo nitrogen diisobutyronitrile An azo compound; for example, a heavy benzene salt or the like; a compound of 10; for example, benzoin, benzoin methyl ether, benzoin ethyl ether, benzophenone 'dimethylaminodibenzophenone, tetramethyldiamine An aromatic carbonyl compound of dioxin, hydrazine, t-butyl hydrazine, 2-methyl hydrazine, 2-ethyl hydrazine, 2-amino hydrazine, 2-methyl hydrazine or the like; E.g? _Dimethylaminomethylbenzoic acid, p-methylaminoethyl benzoate, D-didecylaminobutyl 15-phenylbenzoate, p-diethylaminoisopropyl A dialkylamine such as a benzoic acid ester or the like is substantially a formic acid S?, such as a benzamidine peroxide, a bis-butyl peroxy compound, dicumyl peroxide, cumene hydrogen a peroxide of a base peroxide or the like; for example, 9-phenyl acridine, 9-p-methyloxyphenyl acridine, 9-acetamido acridine, benzoacridine, etc. a pyridine derivative; a morphine derivative such as 91 〇 _ bis 20 methyl benzophenone, 9-methyl benzophenone, and 10-methyloxy benzophenone; for example, 6, 4, 4, ' a quinoline derivative of tridecyloxy-2,3-diphenylporphyrin or the like; a dimer of 2,4,5-triphenylimidazolyl, 2-nitrodiazepine, 2,4 ,6-triphenylphosphonium bromide (2,4,6-triphenylpyryliumafluorinatedboronsalt), 2,4,6-2 17 200946949 (trimethylmethylhydrazine, #三氮,3,3,_几Bis-coumarin, thio-tetramethyl-amine-one ketone (this 〇-]\^(:11161>'8 1{^〇116), 2,4,6-trimethylbenzene Mercapto-diphenyl Phosphine oxide, oligomeric_(2-hydroxy-2-methyl-1(4.(1-methylvinyl)phenylacetone, 2-phenyl-2-dimethylamino-1-(4-) At the same time, in forming the hard coat layer U0 of the present invention and the conductive layer 12, an amine compound may be added to the photopolymerization initiator to lend The sensitivity is reduced by the inhibition of oxygen. Specific examples of the amine compound may include, but are not limited to, any one of an aliphatic amine compound or a monovalent aromatic amine compound, as long as it is A specific specific example of one of the amine compounds is triethanolamine, methyldiethylamine, and the like. In the present invention, the mixing ratio of the components of the conductive layer 12〇 The ratio of the binder component to the particles required is from 10/90 to 30/70', preferably from 15/85 to 25/75, based on the weight of 15%. If less than the above specific value is used, In the case of particles, the resulting film will have sufficient light transmission but will have a poor conductivity. When less particles than the above specified values are used, the resulting film will disadvantageously have poor physical and chemical strength. Phase '° for 100 parts by weight of the binder component, the added photopolymerization initiation The content of the agent is usually from 0.1 to 20 parts by weight, preferably from 1.0 to 15.0 parts by weight. If the amount is less than 1 part by weight, the photopolymerization process will be slow and need Long-term illumination to meet the required hardness and abrasion resistance, and the resulting thin enamel sometimes remains uncured in 200946949. On the other hand, if the added content is more than 20% by weight, the conductivity, abrasion resistance, weather resistance and the like of the film are reduced. The basic composition of the conductive layer 120 in the antireflection film having excellent scratch resistance and surface slidability '5 f according to the present invention is an adhesive component, conductive particles, and photopolymerization Starting agent. If necessary, additives such as a polymerization inhibitor, a curing catalyst oxidation inhibitor, a dispersing agent, a leveling agent, and a cerium oxide coupling agent may be added. In the present invention, the conductive layer 120 may further contain a conductive polymer such as poly-lalo and poly-amine, and the like, and an organometallic compound such as a metal complex and a chelate. The composition of the conductive layer 120 is provided with conductivity. Meanwhile, the conductive layer 12〇 may further comprise, for example, an alkyl citrate and a hydrolyzate thereof, a colloidal ruthenium oxide, a dry ruthenium oxide, a wet ruthenium dioxide or a titanium oxide, etc. Inorganic particles such as cerium oxide particles in the medium to improve surface hardness. In order to provide a desired degree of antistatic ability in the manner of a conductive layer, the surface resistance of the conductive layer 120 is preferably 20 x 1 〇 U 〇 hm / sq or less. More preferably, it is lxlO'hm/sq or less. The total transparency of the electroconductive layer 120 of the present invention is preferably 40% or more, more preferably 60% or more in terms of sharpness and light transmittance. Meanwhile, the resin layer 130 of the antireflection film having excellent scratch resistance and surface slip according to the present invention is provided on the conductive layer 120 and substantially contains fluoride. The fluorides used in the present invention are preferably those which are crosslinked by thermal energy or free radiation. The crosslinked fluoride may be a fluoropolymer having a crosslinked-5 group or a fluorine monomer having an unsaturated group, or a fluoromonomer and a crosslinking group. Fluoropolymer of monomer units. Specifically, the vapor compound is preferably composed of a fluoropolymer having a - structure in the main chain. Preferably, the fluoropolymer has a gas smouldering chain wherein the fluorine content is 3% by weight or more, i. The number of dilute conversions is one or more average molecules, preferably one. 〇 or more. These fluoropolymers are obtained by polymerizing a cured composition having a fluorine-compound and a sulphur compound, preferably by including the fluoro-glycol compound, and the fluoroolefin compound. The cured component of the copolymerized vinyl ether compound and the reaction-modified emulsifier to be mixed if necessary are obtained by polymerization. The cured composition is preferably used to form the fluoropolymer having 3 as a reactive emulsifier. By making it. The hydrazine reaction emulsifier is applied to the gas polymer contained in the coating liquid, and is applied in a flat manner. One of the reactive emulsifiers is particularly preferred as a nonionic reactive emulsifier. The unit derived from the dilute composition component of the (4) polymer in the transesterified layer η() towel is from 2〇 to 7〇 mol%, preferably from 25 to 65 mol%, more The good land is 30-60 mol%. If the ratio of the unit derived from the fluoroolefin compound component is 20 mol%, the gas content 20 200946949 ° in the obtained final copolymer will be too v. Therefore, the refractive index of the resin layer 13〇 will then become insufficient. (10) In one aspect, if the ratio of the single-derived from the fluoroolefin compound component is greater than 7Q mol%, the uniformity in the coating liquid will also deteriorate j, and thus the system is less likely to form. _ Uniform coated film. At the same time, it is also disadvantageous in that it is difficult to achieve the desired light transmittance and adhesion to the shawl substrate. In the fluoropolymer, it is derived from the formation of the ether ether structure. The unit of the substance is 10 i 70 mol %, preferably I5 to : mol / 〇, more preferably 3 〇 to 6 〇 mol %. If the unit derived from the compound containing the S-key, ', and the structure is less than 10 mol%, the uniformity in the liquid of the coating 10 will be deteriorated, so that it is not easily formed - uniform Coating the thin medium. The resin layer 130' obtained with a coating liquid having a ratio of more than 70 mol% does not have the optical properties of the desired light transmittance and antireflection. For the component of the compound containing the monovinyl ether structure, the 15 system preferably uses a monomer containing a reactive functional group such as a hydroxyl group or an epoxy group, and thus the resulting cured resin When the composition is used as a coating liquid, the strength of the cured film can be improved. The ratio of the entire monomer to the monomer comprising the hydroxyl or epoxy group is from 0 to 20 mol%, preferably from 1 to 20 mol%, and more preferably from 3 to 15 mol%. If the ratio is more than 20 mol%, the resulting resin layer will have poor optical properties, and the cured film will become weak. For a copolymer containing a reactive emulsifier, the ratio of the unit derived from the reactive emulsifier component is usually from 〇 to 丨〇 mol%, preferably from 0.1 to 5 mol%. . If the ratio is more than 1% by mole, the resin layer 130 produced by the 21 200946949 is adhesive, so it is difficult to handle the layer 130' and because the moisture resistance of the coating liquid is lowered, it will not be - a preferred resin layer. Meanwhile, the low refractive index layer 130 contains a binder resin in an amount of from 5 to 5 parts by weight based on the weight of the binder resin, and is 15 to 25 parts by weight of hollow cerium oxide. If the hollow cerium oxide particle content is less than 15 parts by weight, the refractive index is thereby increased to deteriorate the antireflection property, that is, the reflectance will increase. On the other hand, if the hollow cerium oxide particle content is more than 25 parts by weight, the roughness of the surface is thus increased to reduce the surface sliding property, and the expensive hollow cerium oxide is also caused. Increase in production costs. In addition to the fluoropolymer, it is preferred to mix a crosslinking compound to produce the resin layer 130 according to the present invention. This is because it can effectively provide some curing ability to improve the curing properties. 15 For example, 'a specific example of the above cross-linking compound is an amine-based compound' or a hydrogen-containing compound such as isopenic tetraol, polyphenol, diol, alkyl sulphuric acid, and the like A compound of an oxy group. The amine-based compound used as the hydrazine-crosslinking compound may contain a total of two or more hydroxyl groups or epoxy groups which may be present in the fluorine compound (for example, An amine group reacted with a hydroxyalkylamine group and either or both of the alkoxyalkylamine groups. One specific example thereof is a melamine compound, a urea compound, a benzoguanamine compound, a glycoluril compound, or the like. The melamine compound is known as a compound which usually has a skeleton in which a nitrogen atom is bonded to a triazabenzene ring, and one of the specific examples 22 200946949 is melamine, alkyl melamine, methylol melamine. , alkoxymethyl melamine, and the like. However, a group in which one molecule has a total of two or less of any one or both of a methylol group and an alkoxymethyl group is preferred. Particularly, methylol melamine, alkoxymethyl melamine or the like obtained by reacting melamine with 5 formaldehyde under an alkaline condition is preferable. The oxymethylmelamine is particularly preferred because of its good storage stability and good reactivity which is obtained in the cured resin component.

三聚氰胺和烧氧基甲基三聚氰胺都沒有特別之限 H)制,兩者均被用來作為一交聯化合物之㈣基。舉例來說, 由該方法所獲得之所有的樹脂形式都可以被使用,該方法 係被描述在標題為,PLASTIC Material… MEL雇腦廳N,的文獻中(由卿灿〇〇1 15 20Both melamine and alkoxymethyl melamine are not particularly limited to H), and both are used as the (tetra) group of a cross-linking compound. For example, all of the resin forms obtained by this method can be used, and the method is described in the literature titled PLASTIC Material... MEL Employed N, (by Cong Chan 〇〇 1 15 20

Ne— Publishing H所發行)。除了尿权外,該尿 素化合物可以W甲基尿素、係為其之衍生㈣燒氧基 Γ基尿素、曱基化域—从具有-烏龍(_)環之烧 ,基甲基烏龍―料。針對例如尿素衍生物之化合物, 在上述的文獻中所描述之所有的樹脂形式都可以被使用。 相對於議份的重量之氟共聚物此等所使用之交聯 含量係為7〇份或更少之重量,較佳地為3至5。 m匕入物r更佳地為5至3G份之重量。如果該所使用之交 聯化合物係少於3份的重| ^ 用性與固化作用就可能會不足由該塗料所職之薄膜的对 如果其係超過70 伤之重量的話’其就難以在與氟聚 23 200946949 合物之反應中避免凝膠化現象。同時,在 ==:一’_一二: 二:旨層⑽錄佳地包含具有二氧切顆粒及/或 2連接劑’及/或―錄基魏基之氟樹㈣達成抗磨姓 10Ne- Publishing H issued). In addition to the right to the urine, the urea compound can be derived from the methyl urea, which is derived from it. (iv) the alkoxypurine urea, the thiol domain - from the gas with the - oolong (_) ring, the methyl oolong - material. For the compound such as a urea derivative, all of the resin forms described in the above documents can be used. The cross-linking content used for the fluorocopolymer of the weight of the fraction is 7 parts by weight or less, preferably 3 to 5. The m intrusion r is more preferably 5 to 3 parts by weight. If the cross-linking compound used is less than 3 parts by weight | ^ The use and curing effect may be insufficient for the film of the coating, if the system is more than 70% of the weight of the wound, then it is difficult to In the reaction of fluoropolymer 23 200946949, the gelation phenomenon is avoided. At the same time, in the ==: one '_ two two: two: the key layer (10) recorded a good place containing dioxin particles and / or 2 linker ' and / or "recording of the base of the fluoride tree (four) reached the anti-wear name 10

该等二氧化矽顆粒係較佳地包含有乾燥二氧化矽、、; 满二氧切、分散在膠體中之二氧切顆粒等等。該等: 氧化石夕顆粒的驗尺寸通f在平均主要難尺寸 對直徑:BET方法)上係為0 001 0 2帅較佳地』 0·005·0·Ι5μπι 〇 如果該平均顆粒尺寸係落在上述之特定範圍裡面,該 所產生的薄膜(樹脂層)之透光性將不會減低並且在改善表 面硬度方面也不會有困難。同時,該等二氧化梦顆粒:形 μ狀係較佳地為球狀的或中空的。其可以❹二或更多_The cerium oxide particles preferably comprise dry cerium oxide, diced dioxate, dioxo cleavage particles dispersed in a colloid, and the like. These: The size of the oxidized stone granules is on the average main difficulty size versus diameter: BET method) is 0 001 0 2 handsomely better 』 0·005·0·Ι5μπι 〇 If the average particle size is Within the above specific range, the light transmittance of the resulting film (resin layer) will not be lowered and there will be no difficulty in improving the surface hardness. At the same time, the dioxide dioxide particles are preferably spherical or hollow. It can be two or more_

之二氧化㈣粒’每種類型都分別地具有不同的顆粒尺 寸。該等二氧化妙顆粒可以在進行表面處理作用之後加以 使用針對於該表面處理作用,其可以使用例如電浆放電 作用、電暈放電、以及運用連接劑之化學表面處理作用。 20然而,化學表面處理作用係為較佳的。魏連接劑係較佳 地被用來作為用在化學表面處理作用的連接劑。在該成分 的固趙中來自二氧化石夕顆粒的比率係為5至5〇%,較佳地 為5至4〇/〇 ’更較佳地為5至3〇%。落在上述之特定範圍 裡面的該成分固體中來自二氧化碎顆粒之比率將會得到 24 200946949 所產生之樹脂層所需的表面硬度,以及例如透光性與低反 射率之良好的光學性質。 該矽烷連接劑的成分係為被表示於下之一化合物或 是其之水解物。 5 ❹ 10 15 e [化學式1] R ⑴ aR(2)bSiX4-(a+b), 其中,R(l)或R(2)係分別地為一具有烷基、烯基、烯 丙基或是鹵素基之烴基基團、環氧基、胺基、氫硫基、甲 基丙烯醯氧基,或是氰基;X係為一選自於由烷氧基、烷 氧-烷氧基、函素基與醯氧基之可以被水解之取代基。在上 述的化學式1中,&與1)係分別地為〇、1或2 ;而且(a + b) 係為1、2或3。較佳地,來自該石夕炫連接劑之該成分相對 於固體之比率係為5至70%,較佳地為15至65%,更佳地 為20至60%。係落在上述之特定範圍裡面之該成分來自該 矽烷連接劑的比率,可以得到該所產生之樹脂層的所需之 表面硬度’並進一步得到所需之例如透光性與低反射率類 似的良好光學性質。 該具有一烧氧基矽烷基之氟樹脂係為被表示於下之 一化合物或是其之水解物。 [化學式2] R(3)cR(4)dSiX4.(c+d)j 其中’ R(3)或R(4)係分別地為一具有氣化烧基、稀 基、烯丙基、曱基丙烯醯氧基,或是(曱基)丙烯酿基之煙基 25 20 200946949 基團^並且X係為-選自於由烧氧基、烧氧_炫氧基、鹵素 基或是酿氧基之可以被水解之取代基。在上述的化學式2 中c與d係分別地為0、J、2或3 ;並且(c + d)係為i ' 2 或3 〇 5 該來自於具有—烷氧基矽烷基之氟樹脂的成分係較 ㈣相對於該固體的比率為20 i 90%,較佳地為25至 80/。更佳地為3〇至7〇%。如果來自該具有一烷氧基矽烷 基之氟樹脂的成分之比率係落在上述之特定較佳範圍裡 面,該所產生的樹脂層將可以具有足夠的表面硬度,而此 10外也可以滿足其所需之例如透光性與低反射率以及類似的 光學性質。 其可以使用固化催化劑以在形成本發明之該樹脂層 130時,促使該塗料液體固化。該固化催化劑係較佳地可以 促使該矽烷連接劑的縮合反應。該較佳的固化催化劑之一 具體例係為酸性化合物。在其等之中,路易斯酸係為最佳 的。該路易斯酸的一具體例係為金屬烷氧化物或金屬螫合 物,舉例來說,例如像乙醯乙酸基鋁化物等等。 該固化催化劑的含量可以依據需要來適切地決定,而 舉例來說係典型地相對於1〇〇份的矽烷連接劑之重量為H 20 至10份的重量。 在形成樹脂層U0時或是如果在本發明巾有需求時 都可以添加例如聚合作用抑制劑、氣化抑制劑、分散劑、 勻塗劑等等之任何的添加劑。 為了要使所產生依據本發明之具有優異之刮擦抗性 26 200946949 f表面滑動性質之該抗反射薄膜具有高度透明度,在該堆 疊薄膜中之霧度值係被建議為少於3()%,較佳地為少於 2.7%。如果該霧度值係等於或大於3戲,該透錢可能會 不足。 5 Ο 10 15 ❹· 20 為了要達成在本發明中之該樹脂層13〇的該表面之 良好的抗純性,該樹脂層的表面需要具有細微的不平 整。藉由該不平整,在該表面的不平整與和抗磨敍性之間 的關係,係被認為是會導致下列的作用機制。那是指當 鋼毛滑過該粗糙表面的時候,在該細微不平整的表面上, 該鋼毛僅會與面的凸㈣份制,所以麟脂層的表 面之該接觸區域將可以如其所需的減顺少,藉此係特別 地可以改良該抗磨蝕性。 在該樹脂層130的表面上之該算術平均不平整度(Ra) 值,係基本上較佳地落在0.003μιη與〇 〇25μιη之間,更佳 地為0.004μπι與〇·〇22μϊη之間,又更佳地在〇〇〇4μιη與 〇.〇20μιη之間。如果在該不平整表面上之該算術平均不平 整度(Ra)值,係超過上述之特定較佳範圍,在該樹脂層中 之霧度值將會比所需要的更高而因此透光性將會減低。如 果在該不平整表面上之該算術平均不平整度_值,係低 於上述之特定較佳賴,其將難以改善誠磨錄。為了 要在該樹脂層上形成細微不平整的表面,該樹脂層係較佳 地包含有例如膠質二氧切、乾燥二氧化々、賴二氧化 石夕、三氧化鈦、玻璃粉、氧化㉝、碳化⑦、氮切、等等, 或疋被分散於膠體中之二氧化石夕顆粒之無機的顆粒。較佳 27 200946949 地其係包含有被分散於膠體中之二氧切顆粒。 明確地說’二或更多插夕-备 乳化矽顆粒類型係較佳地 ’ 具有—不同的顆粒尺寸分 佈。舉例來說,細微的不平紐可以藉著將__型之平 均顆粒尺寸係介於〇顧與⑽ 平均顆粒尺寸齡於_和G.2卿之㈣二氧切顆粒混 合而加以實施。 為了要使得在本發财的職脂層13G側邊上之該Each of the two types of oxidized (tetra) particles has a different particle size. These oxidized particles may be used after the surface treatment for the surface treatment, and may use, for example, a plasma discharge action, a corona discharge, and a chemical surface treatment using a linker. 20 However, chemical surface treatment is preferred. The linker is preferably used as a linker for chemical surface treatment. The ratio of the particles derived from the cerium oxide in the solid phase of the component is 5 to 5 %, preferably 5 to 4 Å / Torr, more preferably 5 to 3%. The ratio of the particles from the oxidized particles in the solids of the composition falling within the above specific range will give the desired surface hardness of the resin layer produced by 24, 2009, 469, and good optical properties such as light transmittance and low reflectance. The component of the decane coupling agent is represented by the next compound or a hydrolyzate thereof. 5 ❹ 10 15 e [Chemical Formula 1] R (1) aR(2)bSiX4-(a+b), wherein R(1) or R(2) is an alkyl group, an alkenyl group, an allyl group or Is a halogen-based hydrocarbyl group, an epoxy group, an amine group, a thiol group, a methacryloxy group, or a cyano group; the X system is one selected from the group consisting of an alkoxy group, an alkoxy-alkoxy group, A substituent which can be hydrolyzed by a hydroxyl group and a decyloxy group. In the above Chemical Formula 1, & and 1) are respectively 〇, 1 or 2; and (a + b) is 1, 2 or 3. Preferably, the ratio of the component to the solids from the Shi Xi Hyun coupling agent is from 5 to 70%, preferably from 15 to 65%, more preferably from 20 to 60%. The ratio of the component falling within the specific range described above from the decane linking agent can be obtained to obtain the desired surface hardness of the resulting resin layer and further obtaining a desired ratio such as light transmittance and low reflectance. Good optical properties. The fluororesin having an alkoxyalkyl group is represented by the following compound or a hydrolyzate thereof. R(3)cR(4)dSiX4.(c+d)j wherein 'R(3) or R(4) are respectively a gasified alkyl group, a dilute group, an allyl group, an anthracene A propylene oxy group, or a thiol group of a (mercapto) propylene aryl group 25 20 200946949 A group ^ and a system of X is selected from the group consisting of an alkoxy group, a oxy-oxyl group, a halogen group or a brewing oxygen a substituent which can be hydrolyzed. In the above formula 2, c and d are respectively 0, J, 2 or 3; and (c + d) is i ' 2 or 3 〇 5 which is derived from a fluororesin having an alkoxyalkyl group The ratio of the component to (4) relative to the solid is 20 i 90%, preferably 25 to 80/. More preferably, it is from 3〇 to 7〇%. If the ratio of the component derived from the fluororesin having an alkoxyalkylalkyl group falls within the above specific preferred range, the resulting resin layer may have sufficient surface hardness, and the outer layer may satisfy the same What is required is, for example, light transmission and low reflectivity as well as similar optical properties. It may use a curing catalyst to cause the coating liquid to solidify when the resin layer 130 of the present invention is formed. The curing catalyst preferably promotes the condensation reaction of the decane linking agent. One of the preferred curing catalysts is specifically an acidic compound. Among them, the Lewis acid system is the best. A specific example of the Lewis acid is a metal alkoxide or a metal ruthenium such as, for example, an acetonitrile acetate aluminide or the like. The content of the curing catalyst can be appropriately determined as needed, and is, for example, typically from 20 to 10 parts by weight based on 1 part by weight of the decane coupling agent. Any additive such as a polymerization inhibitor, a gasification inhibitor, a dispersant, a leveling agent or the like may be added at the time of forming the resin layer U0 or if it is required in the invention. In order to impart high transparency to the antireflection film produced according to the present invention having excellent scratch resistance 26 200946949 f surface sliding properties, the haze value in the stacked film is recommended to be less than 3 ()% Preferably, it is less than 2.7%. If the haze value is equal to or greater than 3, the money may be insufficient. 5 Ο 10 15 ❹· 20 In order to achieve good purity resistance of the surface of the resin layer 13〇 in the present invention, the surface of the resin layer needs to have fine unevenness. By this unevenness, the relationship between the unevenness of the surface and the anti-satellite property is considered to result in the following mechanism of action. That means that when the steel wool slides over the rough surface, on the fine uneven surface, the steel wool will only be formed with the convex portion of the surface, so the contact area of the surface of the linoleum layer can be as The reduction required is less, whereby the abrasion resistance can be particularly improved. The arithmetic mean unevenness (Ra) value on the surface of the resin layer 130 is substantially preferably between 0.003 μm and 〇〇25 μm, more preferably between 0.004 μm and 〇·〇22 μϊη. More preferably between 〇〇〇4μιη and 〇.〇20μιη. If the arithmetic mean unevenness (Ra) value on the uneven surface exceeds the above-mentioned specific preferred range, the haze value in the resin layer will be higher than required and thus the light transmittance Will be reduced. If the arithmetic mean unevenness value on the uneven surface is lower than the specific preferred one described above, it will be difficult to improve the record. In order to form a fine uneven surface on the resin layer, the resin layer preferably comprises, for example, colloidal dioxotomy, dry cerium oxide, lanthanum dioxide, titanium oxide, glass frit, oxidation 33, Carbonized 7, nitrogen cut, etc., or inorganic particles of the cerium dioxide particles dispersed in the colloid. Preferably 27 200946949 The system comprises dioxobic particles dispersed in a colloid. Specifically, the 'two or more ceremonial-prepared emulsified cerium particle types are preferably' having a different particle size distribution. For example, subtle unequal nucleus can be implemented by mixing the average granule size of the __ type with the (10) average particle size of the age of _ and G.2. In order to make it on the side of the 13G side of the fat layer of the present wealth

堆叠溥膜的該表面具有-較低之反射能力,該堆疊薄膜之 1〇最大反射能力就必需要少於4%,而其之該最小反射能力需 為超過0.2%。 如果該反射力超過上述之特定較佳範圍,環境光源就 可以輕易地照亮而無法在該堆疊薄臈的表面上達成低反射 能力。The surface of the stacked ruthenium film has a lower reflectivity, and the maximum reflectance of the stacked film must be less than 4%, and the minimum reflectance of the stacked film needs to be more than 0.2%. If the reflected force exceeds the specific preferred range described above, the ambient light source can be easily illuminated to achieve low reflectivity on the surface of the stack of thin webs.

為了要在該堆疊薄膜之本發明的該樹脂層13〇側邊 之表面上達成一較低之反射效果,該導電性層12〇與該樹 脂層130之折射率以及厚度的乘積,係分別較佳地為目標 光線(通常為可見光)之波長的1/4。因此,就該導電性層 與該樹脂層130而言,每個層次之厚度與折射率(n)的乘積 20之四倍所得到的數值,係較佳地落於380與780nm之間。 那是指’該導電性層120與該樹脂層130之該折射率(n)和 該厚度(d)之間的關係,係較佳地分別地符合下列的等式i : [等式1] η·ά = λ/4 28 200946949 (其中,λ代表可見光線之波長益 ,〇Λ 长靶圍,典型地係為 380nmAs780nm)。 5 ❹ 10 15 ❹ 20 △為了要在本發明的該堆㈣膜上達成—較低的反射 能力,該導電性層12〇之厚度較佳地為〇 〇丨至1叫爪, 佳地為0.06至〇·12μηι。該樹脂層13〇的厚度較係佳:^ 至,更較佳地0.07至〇场m。同時如果該導電性 層120和樹脂層130之厚度不在該範圍裡面的話,其就不 會符合等式1,而在該樹脂層130側邊的堆疊薄膜之表面上 就無法達成較低的反射能力。 為了要在本發明之該樹脂層13〇側邊的堆疊薄膜之 該表面上達成一較低的反射能力,該樹脂層13〇的折射率 係較佳地小於該導電性層120。那是指,樹脂層13〇的折射 率與對導電性層120的折射率之比率,係較佳地少於丨〇, 更佳地為0.6至〇·95。同時,該樹脂層丨3〇的折射率係較 佳地至多為1.47 ’更佳地為1.35至1.45。習知技藝係難以 开>成一具有小於1.35之折射率的一樹脂。如果該樹脂層的 折射率係高於1.47的話,所產生之薄膜具有一較高的反射 能力。 在下文中,將會描述用於生產依據本發明之具有優異 之刮擦抗性與表面滑動性質之抗反射薄膜的方法。 依據本發明之具有優異之刮擦抗性與表面滑動性質 之該抗反射薄膜,可以藉著在該基材薄膜100的至少—側 邊上,將一包含有(甲基)丙烯酸酯化合物之硬質塗層110、 —包含有導電性顆粒之導電性層120以及一包含有氟化合 29 200946949 5 10 15 20 物之樹脂層130加以依序堆疊而生產。 在本發明中之該導電性層12〇與該樹脂層13〇可以藉 由調配較佳地具有分散於溶射之成分的塗料液體、將^ 塗料液體施加至該基材薄膜上,然、後將該塗層_並固化: 用於形成本發㈣導電性層12Q之該溶劑係被混 合’以改善本發明的組成物之塗覆或印刷可加工性,並同 時改善顆粒之可分散性。任何已知的傳統溶劑都可以被使 用,只要其可以溶解該黏合劑成分。特別是在本發明中, 在該組成物之減财性與賴料上,魏劑之一較佳 類型係為具有彿點為6G至⑽。c之有機溶劑,—較佳的類 型係為具有氧原子之有機溶劑,因為其與金屬顆粒具有良 好之相容性。此等有機溶劑之較佳具體㈣特別為甲醇、 乙醇、異丙醇、正-丁醇、第三丁醇、乙二醇單甲基醚、卜 甲氧基-2-丙醇、丙二醇單甲基驗、環己酮、乙酸丁醋、異 丙基丙酮、甲基乙基酮、甲基異丁基酮、二乙酿丙7乙 醯基丙酮’等等。上述之較佳溶劑都可以被獨立地使用, 或者其也可以使用其等之二或更多類型之混合物。 同時,該有機溶劑的含量可以被決定以使得其可以被 用生來產-組成物,該組成物具有可以產生—依據該塗覆 方式與印刷方紅良好料加讀之㈣。⑼其所需 之固體含量係適當為不超過重量的6G%,較佳地為观。 通常,-適當的方法係包含有將顆粒⑻添加轉由將該黏 接劑溶解於該有機溶劑中而得到的該溶液中;將所產生的 混合物以—例如塗料搖擺器、球磨機、沙磨機、3_滾轴混In order to achieve a lower reflection effect on the surface of the side of the resin layer 13 of the present invention, the product of the refractive index and the thickness of the conductive layer 12 and the resin layer 130 are respectively compared. Preferably, the ground is 1/4 of the wavelength of the target light (usually visible light). Therefore, the value obtained by the conductive layer and the resin layer 130, which is four times the product of the thickness of each layer and the refractive index (n), preferably falls between 380 and 780 nm. That is to say that the relationship between the refractive index (n) and the thickness (d) of the conductive layer 120 and the resin layer 130 preferably satisfies the following equation i: [Equation 1] η·ά = λ/4 28 200946949 (where λ represents the wavelength of visible light, and the target length is 380 nm As780 nm). 5 ❹ 10 15 ❹ 20 Δ In order to achieve a lower reflection capability on the stack (four) film of the present invention, the thickness of the conductive layer 12 is preferably from 〇〇丨 to 1 and preferably 0.06. To 〇·12μηι. The thickness of the resin layer 13 is preferably better than:, more preferably, 0.07 to the field m. Meanwhile, if the thickness of the conductive layer 120 and the resin layer 130 is not within the range, it does not conform to Equation 1, and a lower reflection ability cannot be achieved on the surface of the stacked film on the side of the resin layer 130. . In order to achieve a lower reflection ability on the surface of the stacked film on the side of the resin layer 13 of the present invention, the refractive index of the resin layer 13 is preferably smaller than that of the conductive layer 120. That is, the ratio of the refractive index of the resin layer 13〇 to the refractive index of the conductive layer 120 is preferably less than 丨〇, more preferably 0.6 to 〇·95. Meanwhile, the refractive index of the resin layer 较3〇 is preferably at most 1.47 Å, more preferably from 1.35 to 1.45. The prior art is difficult to open into a resin having a refractive index of less than 1.35. If the refractive index of the resin layer is higher than 1.47, the resulting film has a higher reflectivity. Hereinafter, a method for producing an antireflection film having excellent scratch resistance and surface sliding properties according to the present invention will be described. According to the antireflection film of the present invention having excellent scratch resistance and surface sliding properties, a hard substance containing a (meth) acrylate compound can be formed on at least a side of the base film 100. A coating layer 110, a conductive layer 120 containing conductive particles, and a resin layer 130 containing a fluorinated compound 29 200946949 5 10 15 20 are sequentially stacked for production. In the present invention, the conductive layer 12 and the resin layer 13 can be applied to the substrate film by disposing a coating liquid which preferably has a component dispersed in the solvent, and then The coating _ and cured: the solvent used to form the conductive layer 12Q of the present invention is mixed to improve the coating or print processability of the composition of the present invention while improving the dispersibility of the particles. Any known conventional solvent can be used as long as it can dissolve the binder component. Particularly in the present invention, one of the preferred types of the prosthetic agent has a Buddha's point of 6G to (10) in terms of the wealth reduction property of the composition and the material. The organic solvent of c, which is preferably an organic solvent having an oxygen atom, because of its good compatibility with metal particles. The preferred specific (4) of these organic solvents are, in particular, methanol, ethanol, isopropanol, n-butanol, tert-butanol, ethylene glycol monomethyl ether, b-methoxy-2-propanol, propylene glycol monomethyl Basic test, cyclohexanone, butyl acetate, isopropylacetone, methyl ethyl ketone, methyl isobutyl ketone, diethyl propyl 7 acetoacetate ', and the like. The above preferred solvents may be used independently, or they may be used as a mixture of two or more types thereof. At the same time, the content of the organic solvent can be determined such that it can be used to produce a composition which can be produced - in accordance with the coating method and the printing of the red material (4). (9) The solid content required is suitably not more than 6 G% by weight, preferably viewed. In general, a suitable method comprises the step of adding particles (8) to the solution obtained by dissolving the binder in the organic solvent; the resulting mixture is, for example, a paint shaker, a ball mill, a sander , 3_roller mix

30 200946949 合器、手工(artwriter)混合器、均質混合器等等之分散機器30 200946949 Dispersing machines for combiners, artwriter mixers, homomixers, etc.

來加以分散;而接下來加入光聚合作用起始劑並接著將該 混合物均勻地溶解。 QIt was dispersed; then a photopolymerization initiator was added and then the mixture was uniformly dissolved. Q

同時’該樹脂層130係較佳地將該液體進行施加、乾 5燥並固化的步驟而形成,該液體係藉著將該由氟化合物所 L 構成之固化組成物分散於至少一類型之溶劑中而產生,= 溶劑係選自於由甲醇、乙醇、異丙醇、正-丁醇、第三丁醇μ 乙二醇單子基醚、甲氧基_2_丙醇、兩二醇單甲基醚、環 己酮、乙酸丁酯、異丙基丙酮、甲基乙基酮、甲基異丁爲 0酮一乙酿丙嗣與乙醯基丙酮所構成之群組。 在此-情況中,所使用的溶劑之含量可以依據該組成 物^枯度'該欲取得之經固化薄膜的厚度、乾燥溫度條件 等等,而適當地控制。 在基材薄膜100的至少一側邊上之依據本發明的該 Η堆叠薄膜之層次結構,係依序為一包含有(甲基)丙烤酸醋化 合物之硬質塗層110、一包含有導電性顆粒之導電性層 120 ’以及包含有I化合物之樹脂層。該層次結構之另 ”體例係藉著在該基材薄膜则的兩個側邊上形成導電 I·生層12G而製備’但是在此__情況中,其係較佳地在該等 兩個導電性層120之的導電性層12〇的至少任何一側邊上 形成樹月曰層130。同時,如果數個導電性層12〇係被形成在 該基材薄膜1〇〇的一側邊上,其係較佳地形成數個樹脂層 130以使得樹脂層130可以被設置於該基材賴卿的同一 側邊上之最外侧表面上。對於該基材薄膜而言,一初 31 200946949 始層或是-透明導電層可以被形成於該硬質塗層ιι〇之相 對侧邊上。在該樹脂層的表面上也可以形成-抗濕層或是 一保護層。該抗濕層與保護層的厚度係較佳地為不超過 20nm以不影響該所需之抗反射性。 - 5 $用來顯示景彡像之本發明的赫裝置的該薄膜,係藉 著在該樹脂層130上形成一個膝黏或黏性層,並接著將一 - 保護薄膜黏結在該膠黏或黏性層上而加以生產。該膠黏或 黏性層並未被侷限於一特定之類型,只要該層次可以藉由 黏結或黏附作用來達成黏接效果。該用於形成該黏性或膠 0 10黏層之黏結劑或膠黏劑,可以是以橡膠為基礎的、以乙烯 聚合作用為基礎的、以縮合聚合作用為基礎的,以熱固化 樹脂為基礎的或是以矽為基礎的等等。在前述的具體例之 中,典型的以橡膠為基礎之黏合劑或膠黏劑係為以丁二烯_ 苯乙烯共聚物(SBR)為基礎的、以丁二烯_丙烯晴共聚物 15 (NBR)為基礎的、以氣丁二烯聚合物為基礎的、以異丁烯-異戊二烯共聚物為基礎的(丁基橡膠)等等。典型的以乙烯聚 合作用為基礎之黏附劑或膠黏劑,係為以丙烯樹脂為基礎 〇 的、以苯乙烯樹脂為基礎的、以乙酸乙烯酯-乙烯共聚物為 基礎的或是以氣乙烯-乙酸乙烯酯共聚物為基礎的,等等。 2〇 典型的以縮合聚合作用為基礎的黏附劑或膠黏劑係為以聚 酯樹脂為基礎的。典型的以熱固樹脂為基礎之膠黏劑係為 以環氧樹脂為基礎的,以胺基曱酸酯樹脂為基礎的、以福 馬林樹脂為基礎的,等等。這些類型之樹脂都可以被獨立 地或是將其等之二或更多類型加以混合來使用。 32 200946949 5 ❹ 10 15 馨' 20 該黏附劑或膠黏劍可以是溶劑類型或非溶劑類型中 之任何一種。該黏性層或膠黏層可以例如塗敷作用等等之 一般已知的方法,而以上述之黏附劑或膠黏劑來形成。同 時,該黏性層或膠黏層可以包含有染色劑。其可以輕易地 藉著將含有例如染料和色素之染色材料的染色劑與黏性劑 或耀黏劑加以混合而獲得。在含有染色劑的情況中,在 550nm下之該堆疊薄膜的透光度係較佳地落在4〇至8〇%裡 面。同時,如果該薄膜係被用於一電漿顯示器,該透光度 範圍可以藉由使用一包含有染色材料之黏性層或膠黏劑層 而獲得,由於該所傳輸的光必需是中性灰或是藍灰色,而 在該顯示器中所發出之光的色純度與對比將可以被改善。 該包含有該保護性薄膜之樹脂材料並未被侷限於任 何特疋之類型,並且可以適當地選擇用於已知的塑膠基材 薄膜之樹脂材料。典型之用於此一保護性薄膜材料的聚合 物之樹脂材料係為具有單元之聚合物或共聚物,該單元係 為一選自於由醋類、乙稀、丙烯、二乙酸、三乙酸、苯乙 稀、破酸醋、甲基戊稀、石風類、乙醚乙基嗣、尼龍、丙稀 酸醋、以肪環族烯烴為基礎的樹脂,等等所構成之群組者。 就該樹脂㈣而言,其係較佳地使料有單元之聚人物 該單元係為-選自於由例如聚乙烯或聚丙稀之以乙二或两 烯為基礎的樹脂,或是例如聚對苯二f酸乙^旨之以賴 基礎的樹脂,等等所構成之群組者。特別是,在透光性與 韻性質的方面,其係較佳地使用一包含具有以 磔 之樹脂的聚合物之單元的基材薄膜。 為基礎 33 200946949 用於一依據本發明之顯示裝置的該薄膜係藉著將一 黏性層或膠黏層夾置於一顯示裝置的該薄膜上,並將其黏 結於一 LCD、電漿顯示面板(PDP)、電致發光顯示裝置 (ELD)、CRT,或是行動數位助理等等之前側面板的顯示器 5 表面及/或表面上。 其可以藉著將一黏性層或膠黏層夾置於一顯示裝置 · 的該薄膜上,並將其黏結於一例如LCD、電漿顯示面板 (PDP)、電致發光顯示裝置(ELD)、CRT,或是行動數位助 理等等之該顯示裝置的該顯示側邊上,而得到一顯示裝置 © 10 螢幕。 層合該在該顯示側邊上及/或該顯示裝置之前側面板 的表面上之堆疊薄膜的該方法並未侷限於一特定的類型, 但是舉例來說,該用於一顯示裝置或是一顯示器之包含有 該堆疊薄膜之薄膜,可以藉由將一黏性層或者膠黏層施加 15 於該顯示器元件或是基材薄膜100上、將該膠黏層以一壓 軋滚筒施加至該薄膜100而使得該堆疊薄膜中之該樹脂層 130可以是該表面層,並藉此將該顯示元件在夾合了黏性或 〇 膠黏層下與該基材薄膜1〇〇黏結。 以下將參照該等圖式來描述一電漿顯示面板之前側 20 保護板(PDP前側面板)的具體例,其中其可以使用依據本發 明之具有優異之刮擦抗性與表面滑動性質之該抗反射薄 膜,但是應該要注意的是本發明不應該被侷限於該具體 例。依據本發明之具有優異之刮擦抗性與表面滑動性質之 該抗反射薄膜,係被層合於一玻璃層、丙烯酸層、聚碳酸 34 200946949 醋層等等的兩個側邊上,而將1性層或膠黏層爽合於該 基材薄膜1 〇〇得側邊上。在該PDP <、 r別剛面板之保護薄膜的 透明基材與該膠黏層150之間,可w B丄 Μ具有一電磁波屏蔽層、 一近紅外光屏蔽層、一紫外線屏蔽層等等。 5 ❹ 10 15 Ο 20 同時,本發明也需要藉著將上迷的抗反射薄膜黏結至 -影像顯不裝置側邊或是-前側面板的表面上,而將一顯 示裝置加以覆蓋。 在下文中,本發明將以該等具體例與比較具體例來更 詳細地描述。 [具體例1] 形成一個硬質塗層(110) 該包含有多g旎基之以丙烯為基礎的樹脂塗層材料 (50%的固體)(KZ7528,其可以自JSR公司取得),係使用一 個微塑凹版塗覆器而以係為ΙΟΟμιη的厚度,來施加於包含 有聚酯薄膜(Lumirror,其可以自Dorey公司取得)之該基材 薄膜100之該表面上。在於8(TC下將該塗層乾燥5分鐘之 後,能量為l.OJ/cm2的紫外線係照射至其上以固化該塗層, 並因而形成一具有大約為ΙΟ.Ομιη之厚度的硬質塗層11〇。 形成一高折射率層(120) 該包含有銦氧化亞錫(ΙΤΟ)之塗層材料(其具有1〇%之 固體)(HRA-196 ’其可以自japan Chemical公司取得)係被 溶解在異丙醇中。該混合物係被攪拌以產生塗料液體。該 所產生之塗料液體然後使用一個微型凹版塗覆器來施加於 該硬質塗層110的表面上,而該塗層係於8〇。(:下乾燥5分 35 200946949 鐘,並接著以能量為l.〇J/cm2的紫外線來照射以固化該塗 層,並產生厚度為大約為0.1 μιη之高折射率層120,而而 其之一折射率係為(η)=1.62。 形成一個低折射率層(130) 5 該包含有氟共聚物(氟基烯烴/乙烯醚共聚物)之塗層 — 材料(其具有10%之固體,相對於100份之的重量之黏合劑 、 樹脂(LR-S3020,其可以自TORAY公司取得),中空二氧化 矽係為15份的重量)係被溶解在異丙醇中。該所產生之混 合物係被攪拌以產生塗料液體,其然後使用一個微型凹版 © 10 塗覆器來施加於該高折射率層120的表面上,以產生一厚 度大約為112至116nm的層次,而該塗層係於80°C下乾燥 5分鐘,並接著以能量為l.OJ/cm2的紫外線來照射以固化該 塗層,並形成大約為Ο.ίμιη之厚度的低折射率層130,而 其之一折射率係為(η)=1·39。 15 [具體例2] 一基材薄膜100、一硬質塗層110,以及一高折射率 層120,係在與具體例1中之相同的條件與相同的方法下形 © 成。接著,該包含有氟共聚物(氟基烯烴/乙烯醚共聚物)之 塗層材料(其具有10%之固體,相對於1〇〇份之的重量之黏 20 合劑樹脂(TU-2207,其可以自JSR公司取得),中空二氧化 矽係為20份的重量)係被溶解在異丙醇中。該所產生之混 合物係被攪拌以產生塗料液體,其接著使用一個微型凹版 塗覆器來施加於該高折射率層120上,以產生一厚度大約 為106至llOnm的層次。該塗層係於80°C下乾燥5分鐘並 36 200946949 以能量為1.0J/cm2的紫外線來照射以固化該塗唐,並形成 厚度大約為Ο.ΐμπι之低折射率層13〇,而其之一折射率係 為(η)=1·39。 [比較具體例1] 5 對於一堆疊薄膜而言,進行與具體例丨相同的方法來 形成一基材薄膜100、一硬質塗層11〇,以及一高折射率層 • 120。接著,該包含有氟共聚物(氟基烯烴/乙烯醚共聚物) 之塗層材料(其具有10%之固體,相對於份之的重量之 © 黏合劑樹脂(LR-S3〇〇〇,其可以自TORAY公司取得),中空 10二氧化矽係為40份的重量)係被溶解在異丙醇中。該所產 生之混合物係被攪拌以產生塗料液體,其接著使用一個微 型凹版塗覆器來施加於該高折射率層12〇上,以產生一厚 度大約為112至116nm的層次。該塗層係於8〇°c下乾燥5 分鐘並以能量為l.〇J/cm2的紫外線來照射以固化該塗層, 15並形成厚度大約為ο.ίμιη之低折射率層13〇,而其之一折 射率係為(η)=1.37。 具體例1 表面電阻 ohm/sq 108 ~~1 最小反 射力% 鋼毛 硬度 霧度值 (%) 靜磨榛 係數 動磨擦 係數 0.24 5 0.98 "^37^ 0.27 具體例2 108 0.28 5 0.89 0.31 0.18 比較具體例1 108 0.18 3〜4 1.2 1.05 在該等具體例1和2中之低折射率層13〇的折射率係 為1.39’而在該比較具體例中之低折射率層13〇的折射率 20係為丨.37,其之原因在相較於傳統的塗層材料(LR-S3000, 其可以自TORAY公司取得)所使用者,該經改良的塗層材 37 200946949 料係具有較低含量之中空二氧化矽(lr_S3020, TU-2207) ° 因為在s亥經改良的塗層材料中之中空二氧化石夕的含量,比 起傳統塗層材料之中空二氧化矽含量已經減少大約5〇%所 以表面粗糙度將會降低,其可以提高表面滑動性質並增加 . 5 刮擦抗性。 在以下内容,將詳細地描述在本發明中之一評估與測 - 置方法。 [實驗1 :鋼毛硬度之評估] 在鋼毛#0000以250gf/cm2的負載來回移動十次之 ® 10後,计算刮痕之數目。依據該刮痕的數量,將硬度區分為 下列的5個層級(層級5 :沒有刮痕,層級4 : ! _5條刮痕, 層級3 : 5-10條刮痕’層級2 :超過10條刮痕,層級i : 在整個表面上都是刮痕)。 [實驗2 :霧度值的測定] 15 霧度值係以自Sgasikenki公司取得之直接讀數霧度 值電腦來進行測量。 [實驗3 :表面電阻之評估(抗靜電能力)] Ο 表面電阻係以自Mitsubishi Uka公司取得之 HIRESTA來進行測量。 20 [實驗4 :反射能力之測定] 反射能力係以自Hitachi Keisoku公司取得之分光光 度計U-3410來進行測量。刮痕係以32〇至4〇〇號的防水砂 紙來均勻地形成於該樣本薄膜之另一側邊上,而黑色塗層 材料係被施加於其上以完全地排除來自於另一侧反射現 38 200946949 象。針對於該樹脂層表面,其之測量係、在㈣度之入射光 進行。在此,所側得之標準的反射能力係代表在 380nm$Xs780nm的波長範圍内之最小值。 [實驗5 :摩擦係數之測定] 5 在此係使用TOYOSEIKI公司的TR型號之摩擦測量 器’而且日本DENSHIKAGAKU公司的單一編碼器u-228 係被用來進行測量。該測量係以美國材料試驗學會D刪 的標準為基礎。-欲進行測量的薄膜係被差置於該上端與 下端板件之間,而且其之靜態與動態摩擦係數係在2〇〇±5g 1〇的重量以及M2士30毫米的測定速度之條件下加以測量。 由前述說明可知,習於此藝者將可以瞭解各種不同的 修改和變化,可以在不背離本發明之真實精神與範圍下完 成。應該要了解的是前述說明僅係用於例示說明,而不是 要用來偈限由該申請專利範圍所界定之本發明的範圍。 15 C圖式簡单說明】At the same time, the resin layer 130 is preferably formed by a step of applying the liquid, drying and drying, and dissolving the cured composition composed of the fluorine compound L in at least one type of solvent. Produced, = solvent selected from methanol, ethanol, isopropanol, n-butanol, tert-butanol, ethylene glycol monoterpene ether, methoxy-2-propanol, di-diol monomethyl The group consisting of ketone, cyclohexanone, butyl acetate, isopropyl acetone, methyl ethyl ketone, and methyl isobutyl is a group consisting of ketone-ethyl ketone and acetonitrile. In this case, the content of the solvent to be used may be appropriately controlled depending on the composition, the thickness of the cured film to be obtained, the drying temperature conditions, and the like. The layered structure of the tantalum stacked film according to the present invention on at least one side of the substrate film 100 is sequentially a hard coating layer 110 containing a (meth) acrylic acid vinegar compound, and one containing a conductive layer. The conductive layer 120' of the particles and the resin layer containing the I compound. The other embodiment of the hierarchy is prepared by forming a conductive I. green layer 12G on both sides of the substrate film. However, in this case, it is preferably in the two The dendrite layer 130 is formed on at least one side of the conductive layer 12 of the conductive layer 120. Meanwhile, if a plurality of conductive layers 12 are formed on one side of the substrate film 1 Preferably, a plurality of resin layers 130 are formed such that the resin layer 130 can be disposed on the outermost surface on the same side of the substrate. For the substrate film, an initial 31 200946949 The initial layer or the transparent conductive layer may be formed on the opposite side of the hard coating layer. A moisture-resistant layer or a protective layer may also be formed on the surface of the resin layer. The thickness of the layer is preferably not more than 20 nm so as not to affect the desired antireflection property. - 5 $ is used to display the film of the device of the present invention, which is used to display the image on the resin layer 130. Forming a knee adhesive or adhesive layer and then bonding a protective film to the adhesive or adhesive layer The adhesive or adhesive layer is not limited to a specific type, as long as the layer can be bonded by adhesion or adhesion to form the adhesive or adhesive layer. The binder or adhesive may be based on rubber, based on ethylene polymerization, based on condensation polymerization, based on thermosetting resin or based on hydrazine. Among the foregoing specific examples, a typical rubber-based adhesive or adhesive is a butadiene-acrylonitrile copolymer (SBR) based on butadiene-styrene copolymer (SBR). Based on a gas-butadiene-based polymer based on isobutylene-isoprene copolymer (butyl rubber), etc. Typical adhesion or adhesion based on ethylene polymerization The agent is based on propylene resin, based on styrene resin, based on vinyl acetate-ethylene copolymer or based on ethylene ethylene-vinyl acetate copolymer, etc. 2 〇Typical based on condensation polymerization Adhesives or adhesives based on polyester resins. Typical thermoset resin-based adhesives are based on epoxy resins based on amine phthalate resins. Based on formalin resin, etc. These types of resins can be used independently or in combination of two or more types. 32 200946949 5 ❹ 10 15 馨' 20 The adhesive or glue The viscose may be any of a solvent type or a non-solvent type. The adhesive layer or the adhesive layer may be formed by a commonly known method such as coating action or the like, and the above-mentioned adhesive or adhesive. Meanwhile, the adhesive layer or the adhesive layer may contain a coloring agent, which can be easily obtained by mixing a coloring agent containing a dyeing material such as a dye and a pigment with an adhesive or a viscous agent. In the case of containing a coloring agent, the transmittance of the stacked film at 550 nm preferably falls within the range of 4 Å to 8 〇%. Meanwhile, if the film is used in a plasma display, the transmittance range can be obtained by using a viscous layer or an adhesive layer containing a dyeing material, since the transmitted light must be neutral. Gray or blue-gray, and the color purity and contrast of the light emitted in the display can be improved. The resin material containing the protective film is not limited to any type of the resin, and a resin material for a known plastic substrate film can be appropriately selected. A typical resin material for the polymer of the protective film material is a polymer or copolymer having a unit selected from the group consisting of vinegar, ethylene, propylene, diacetic acid, triacetic acid, A group consisting of styrene, acid vinegar, methyl pentane, stone wind, ether ethyl hydrazine, nylon, acrylic acid acrylate, resin based on aliphatic cycloolefin, and the like. In the case of the resin (4), it is preferred that the unit is a unit of a unit which is selected from a resin selected from, for example, polyethylene or polypropylene, based on ethylene or polypropylene, or, for example, a poly A group consisting of a resin based on benzoic acid, and the like. In particular, in terms of light transmittance and rhyme properties, it is preferred to use a substrate film comprising a unit of a polymer having a resin of ruthenium. Based on 33 200946949, the film for use in a display device according to the present invention is formed by sandwiching an adhesive layer or an adhesive layer on the film of a display device and bonding it to an LCD, plasma display. A panel (PDP), an electroluminescent display device (ELD), a CRT, or a mobile digital assistant or the like, on the surface and/or surface of the display 5 of the front side panel. It can be adhered to the film of a display device by bonding an adhesive layer or an adhesive layer to a film such as an LCD, a plasma display panel (PDP), or an electroluminescent display device (ELD). , the CRT, or the mobile digital assistant, etc., on the display side of the display device, to obtain a display device © 10 screen. The method of laminating the stacked film on the display side and/or on the surface of the front side panel of the display device is not limited to a particular type, but for example, for a display device or a The display comprises a film of the stacked film, which can be applied to the display element or the substrate film 100 by applying a adhesive layer or an adhesive layer, and the adhesive layer is applied to the film by a nip roll. The resin layer 130 in the stacked film may be the surface layer, and thereby the display element is bonded to the substrate film 1 under the adhesive or adhesive layer. A specific example of a front side 20 protective sheet (PDP front side panel) of a plasma display panel will be described below with reference to the drawings, wherein the anti-scratch resistance and surface sliding property according to the present invention can be used. Reflective film, but it should be noted that the present invention should not be limited to this specific example. The antireflection film according to the present invention having excellent scratch resistance and surface sliding properties is laminated on both sides of a glass layer, an acrylic layer, a polycarbonate layer 34 200946949 vinegar layer, etc. The 1st layer or the adhesive layer is satisfactorily bonded to the side of the base film 1 . Between the transparent substrate of the protective film of the PDP and the front panel and the adhesive layer 150, an electromagnetic wave shielding layer, a near-infrared light shielding layer, an ultraviolet shielding layer, etc. may be provided. . 5 ❹ 10 15 Ο 20 At the same time, the present invention also requires a display device to be covered by adhering the above anti-reflective film to the side of the image display device or the front side panel. Hereinafter, the present invention will be described in more detail with the specific examples and comparative examples. [Specific Example 1] Forming a hard coat layer (110) The propylene-based resin coating material (50% solids) containing a plurality of g groups (KZ7528, which can be obtained from JSR Corporation), uses a The microplastic gravure coater is applied to the surface of the base film 100 containing a polyester film (Lumirror, available from Dorey Corporation) at a thickness of ΙΟΟμηη. After drying the coating for 5 minutes at TC, an ultraviolet ray having an energy of 1.0 J/cm 2 was irradiated thereon to cure the coating, and thus a hard coat having a thickness of about ΙΟ.Ομηη was formed. 11〇. Forming a high refractive index layer (120) The coating material containing indium tin oxide (yttrium) (which has 1% solids) (HRA-196 'which can be obtained from Japan Chemical Co., Ltd.) Dissolved in isopropyl alcohol. The mixture is agitated to produce a coating liquid. The resulting coating liquid is then applied to the surface of the hard coating 110 using a micro gravure applicator, and the coating is attached to :. (: Drying 5 minutes 35 200946949 clocks, and then irradiating with ultraviolet rays having an energy of 1. J/cm 2 to cure the coating, and producing a high refractive index layer 120 having a thickness of about 0.1 μm, and One of the refractive indices is (η) = 1.62. Forming a low refractive index layer (130) 5 The coating containing the fluorocopolymer (fluoroolefin/vinyl ether copolymer) - material (which has 10% Solid, relative to 100 parts by weight of binder, resin (LR-S3020, The hollow cerium oxide is obtained in isopropyl alcohol in a weight fraction of 15 parts from TORAY. The resulting mixture is stirred to produce a coating liquid which is then coated with a micro gravure © 10 The device is applied to the surface of the high refractive index layer 120 to produce a layer having a thickness of about 112 to 116 nm, and the coating is dried at 80 ° C for 5 minutes, and then the energy is 1.0 J/cm 2 . The ultraviolet ray is irradiated to cure the coating layer, and a low refractive index layer 130 having a thickness of about ί. ίμιη is formed, and one of the refractive indices is (η)=1·39. 15 [Specific Example 2] One basis The material film 100, a hard coat layer 110, and a high refractive index layer 120 are formed under the same conditions and in the same manner as in the specific example 1. Then, the fluorine-containing copolymer (fluoroolefin) is contained. /vinyl ether copolymer) coating material (having 10% solids, relative to 1 part by weight of the adhesive 20-dose resin (TU-2207, available from JSR)), hollow cerium oxide system 20 parts by weight) is dissolved in isopropyl alcohol. The resulting mixture is Stirring to produce a coating liquid which is then applied to the high refractive index layer 120 using a micro-gravure applicator to produce a layer having a thickness of about 106 to 11 nm. The coating is dried at 80 ° C for 5 minutes. And 36 200946949 is irradiated with ultraviolet rays having an energy of 1.0 J/cm 2 to cure the coating, and a low refractive index layer 13 厚度 having a thickness of about Ο.ΐμπι is formed, and one of the refractive indices is (η)=1· 39. [Comparative Example 1] 5 For a stacked film, a substrate film 100, a hard coat layer 11 and a high refractive index layer 120 were formed in the same manner as in the specific example. Next, the coating material comprising a fluorocopolymer (fluoroolefin/vinyl ether copolymer) having 10% solids, relative to the weight of the component, is a binder resin (LR-S3, which It can be obtained from TORAY Corporation, and the hollow 10 cerium oxide is 40 parts by weight) dissolved in isopropyl alcohol. The resulting mixture is agitated to produce a coating liquid which is then applied to the high refractive index layer 12 using a micro gravure coater to produce a layer having a thickness of about 112 to 116 nm. The coating was dried at 8 ° C for 5 minutes and irradiated with ultraviolet rays having an energy of 1. J/cm 2 to cure the coating, and 15 was formed to have a low refractive index layer 13 of thickness ο. ίμιη, One of the refractive indices is (η) = 1.37. Specific Example 1 Surface resistance ohm/sq 108 ~~1 Minimum reflection force % Steel hardness haze value (%) Static friction coefficient Dynamic friction coefficient 0.24 5 0.98 "^37^ 0.27 Specific example 2 108 0.28 5 0.89 0.31 0.18 Comparison Specific Example 1 108 0.18 3 to 4 1.2 1.05 The refractive index of the low refractive index layer 13 in the specific examples 1 and 2 is 1.39' and the refractive index of the low refractive index layer 13 in the comparative example The 20 series is 丨.37, for the reason that the improved coating material 37 200946949 has a lower content than the conventional coating material (LR-S3000, which can be obtained from TORAY). Hollow cerium oxide (lr_S3020, TU-2207) ° Because of the content of hollow cerium oxide in the modified coating material of s-Hai, the hollow cerium oxide content of the conventional coating material has been reduced by about 5 〇. % so the surface roughness will be reduced, which can improve the surface sliding properties and increase. 5 Scratch resistance. In the following, one of the evaluation and measurement methods in the present invention will be described in detail. [Experiment 1: Evaluation of steel wool hardness] After the steel wool #0000 was moved back and forth ten times of the load of 250 gf/cm2 for 10 times, the number of scratches was counted. According to the number of scratches, the hardness is divided into the following five levels (level 5: no scratches, level 4: ! _5 scratches, level 3: 5-10 scratches) level 2: more than 10 scrapes Trace, level i: scratches on the entire surface). [Experiment 2: Measurement of haze value] 15 The haze value was measured by a direct reading haze value computer obtained from Sgasikenki. [Experiment 3: Evaluation of surface resistance (antistatic ability)] Ο Surface resistance was measured by HIRESTA obtained from Mitsubishi Uka Corporation. 20 [Experiment 4: Measurement of reflectance] The reflectance was measured by a spectrophotometer U-3410 obtained from Hitachi Keisoku Co., Ltd. The scratch is uniformly formed on the other side of the sample film with a waterproof sandpaper of 32 〇 to 4 ,, and a black coating material is applied thereto to completely exclude reflection from the other side. Now 38 200946949 Elephant. For the surface of the resin layer, the measurement is performed at (four) degrees of incident light. Here, the standard reflectivity of the side is representative of the minimum value in the wavelength range of 380 nm $ Xs 780 nm. [Experiment 5: Measurement of friction coefficient] 5 Here, a TR type friction gauge of TOYOSEIKI Co., Ltd. was used, and a single encoder u-228 of Japan DENSHIKAGAKU Co., Ltd. was used for measurement. This measurement is based on the standards of the American Society for Testing and Materials D. - the film to be measured is placed between the upper and lower plates, and the static and dynamic coefficients of friction are between 2 〇〇 ± 5 g 1 重量 and M 2 ± 30 mm. Take measurements. It will be apparent to those skilled in the art that various modifications and changes can be made without departing from the true spirit and scope of the invention. It is to be understood that the foregoing description is for illustrative purposes only and is not intended to limit the scope of the invention. 15 C schema simple description]

第1圖顯示一抗反射薄膜之原理; 第2圖係為概要地顯示依據本發明之該抗反射薄膜 的堆疊結構之薄膜的剖面圖。 【主要元件符號說明】 100基礎薄膜 110硬質塗層 120高折射率層 130低折射率層 140保護性薄膜 150黏附層 160釋放薄膜 39Fig. 1 shows the principle of an antireflection film; Fig. 2 is a cross-sectional view schematically showing a film of a stacked structure of the antireflection film according to the present invention. [Main component symbol description] 100 base film 110 hard coat 120 high refractive index layer 130 low refractive index layer 140 protective film 150 adhesive layer 160 release film 39

Claims (1)

200946949 十、申請專利範圍: 1·種具有優異之刮擦抗性及表面滑動性質的抗反射薄 其中3有(曱基)丙稀酸酿化合物之硬質塗層、一 3有一黏合劑樹脂與導電性顆粒之高折射率層,以及一 · 5 含有氟化合物之低折射率層係被依序堆疊在一基礎薄 - 膜的至J -側上’其中該低折射率層之表面係具有細微 . 的不平整’且在該崎射率層側上之-靜磨擦魏料 於或少於0.5,而-動磨擦係數係等於或少於〇 7。 2.如申請專利範圍第μ的薄膜,其中該低折射率層包含 ❹ 10 有相對於份的重量之該黏合劑樹脂係、為15至25份 的重量之中空二氧化矽(silica)。 3·如申凊專利範圍第i項的薄膜,其中在該抗反射薄膜中 之霧度值係少於3.0%。 4.如申4專利制第1項的薄膜,其中該抗反射薄膜在 15 38〇nm的波長範圍中係具有一少於5%之透光度。 5·如申請專利範圍第】項的薄膜,其中該硬質塗層之厚度 係介於Ιμηι與50μιη之間。 6. 如申請專利範圍第!項的薄膜,其中該高折射率層的厚 度係介於Ο.ΟΙμιη與l~m之間’而且該樹脂層的厚度 20 係介於Ο.ΟΙμηι與Ι.Ομηι之間。 7. 如申請專利範圍第!項的薄膜,其中該高折射率層之該 等導電性顆粒係為金屬氧化物顆粒。 Λ 8. 如申請專利範圍第i項的薄膜,其中在該高折射率層中 之該黏合劑樹脂與該等導電性顆粒之重量比率係為 40 200946949 10/90 至 30/70 〇 9·如申請專利範圍第1項的薄膜,其中該低折射率層的該 氟化合物係為在主鏈中具有乙烯醚結構之含氟共聚物。 5 e 10 15 ❹ 10.如申請專利範圍第1項的薄膜,其中該低折射率層包含 有顆粒尺寸係為Ο.ΟΟΙμη!至〇 2pm之二氧化石夕顆粒。 11·如申請專利範圍第10項的薄膜,其中該等二氧化矽顆粒 具有係為二或更多種類型的成分之顆粒尺寸分佈。 12·如申請專利範圍第1項的薄膜,其中該低折射率層係進 一步含有以下列的化學式1來表示的矽烷連接劑或其之 水解物或是其之反應物: [化學式1] R ⑴ aR(2)bSiX4_(a+b), 其中,R(l)或R(2)係為一具有烷基、烯基、烯丙基 或是函素基之烴基基團、環氧基、胺基、氫硫基、曱基 丙豨醯氧基,或是氰基;X係為一選自於由院氧基、烧 氧-烧氧基、_素基或是醯氧基之可以被水解之取代基; 而a與b係分別地為〇、1或2 ;並且(a+b)係為1、2 或3。 13.如申請專利範圍第1項的薄膜,其中在該低折射率層中 之氟化物係進一步含有以下列的化學式2來表示的具有 一烷氧基矽烷基之氟樹脂或是其之水解物: [化學式2] R(3)cR(4)dSiX4.(c+d), 41 20 200946949 其中,R(3)或R(4)係為一具有氟化烷基、烯基、烯 丙基、曱基丙烯醯氧基,或是(曱基)丙烯醯基之烴基基 團;X係為一選自於由烷氧基、烷氧-烷氧基、鹵素基或 是醯氧基之可以被水解之取代基;而c與d係分別地為 5 0、1、2或3 ;並且(c + d)係為1、2或3。200946949 X. Patent application scope: 1. Anti-reflective thin film with excellent scratch resistance and surface sliding properties. Among them, 3 has a hard coating of (fluorenyl) acrylic acid brewing compound, a 3 has a binder resin and conductive The high refractive index layer of the particles, and a low refractive index layer containing a fluorine compound are sequentially stacked on a J-side of the base thin film - wherein the surface of the low refractive index layer has a fineness. The unevenness is - and the static friction is on or less than 0.5 on the side of the saturation layer, and the coefficient of dynamic friction is equal to or less than 〇7. 2. A film according to the patent application range of μ, wherein the low refractive index layer comprises ❹10 having a weight of 15 to 25 parts by weight of hollow silica relative to the weight of the binder resin. 3. The film of claim i, wherein the haze value in the antireflective film is less than 3.0%. 4. The film of claim 1, wherein the antireflective film has a transmittance of less than 5% in a wavelength range of 15 38 Å. 5. The film of claim 5, wherein the hard coating has a thickness between Ιμηι and 50 μιη. 6. If you apply for a patent scope! The film of the item, wherein the thickness of the high refractive index layer is between Ο.ΟΙμιη and l~m' and the thickness of the resin layer 20 is between Ο.ΟΙμηι and Ι.Ομηι. 7. If you apply for a patent scope! The film of the item, wherein the conductive particles of the high refractive index layer are metal oxide particles. Λ 8. The film of claim i, wherein the weight ratio of the binder resin to the conductive particles in the high refractive index layer is 40 200946949 10/90 to 30/70 〇9· The film of claim 1, wherein the fluorine compound of the low refractive index layer is a fluorine-containing copolymer having a vinyl ether structure in a main chain. 5 e 10 15 ❹ 10. The film of claim 1, wherein the low refractive index layer comprises a cerium oxide particle having a particle size of from Ο.ΟΟΙμη! to 〇 2pm. 11. The film of claim 10, wherein the cerium oxide particles have a particle size distribution of two or more types of components. 12. The film of claim 1, wherein the low refractive index layer further contains a decane linking agent represented by the following Chemical Formula 1 or a hydrolyzate thereof or a reactant thereof: [Chemical Formula 1] R (1) aR(2)bSiX4_(a+b), wherein R(l) or R(2) is a hydrocarbyl group having an alkyl group, an alkenyl group, an allyl group or a functional group, an epoxy group, an amine a thiol group, a thiol propyl group, or a cyano group; the X system is one selected from the group consisting of an alkoxy group, an alkoxy group, an alkoxy group, an yl group or a decyloxy group. Substituents; and a and b are respectively 〇, 1 or 2; and (a+b) is 1, 2 or 3. 13. The film according to claim 1, wherein the fluoride in the low refractive index layer further contains a fluororesin having an alkoxyalkylalkyl group represented by the following Chemical Formula 2 or a hydrolyzate thereof R(3)cR(4)dSiX4.(c+d), 41 20 200946949 wherein R(3) or R(4) is a fluorinated alkyl group, alkenyl group, allyl group a mercapto acryloxy group or a hydrocarbyl group of a (fluorenyl) acrylonitrile group; the X system is one selected from the group consisting of an alkoxy group, an alkoxy-alkoxy group, a halogen group or a decyloxy group. a hydrolyzed substituent; and c and d are respectively 50, 1, 2 or 3; and (c + d) is 1, 2 or 3. 4242
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI472567B (en) * 2012-07-25 2015-02-11 Ind Tech Res Inst Masterbatch, method for fabricating the same and a film formed from the masterbatch

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101079195B1 (en) 2009-12-03 2011-11-03 (주)토바옵텍 Hybrid emi-heater filter and method for manufacturing thereof
JP5771967B2 (en) * 2010-02-17 2015-09-02 日油株式会社 Antireflection film
KR101332510B1 (en) * 2010-09-30 2013-11-22 코오롱인더스트리 주식회사 Condensing type optical sheet
DE102010048088A1 (en) * 2010-10-01 2012-04-05 Carl Zeiss Vision Gmbh Optical lens with scratch-resistant anti-reflection coating
KR101283452B1 (en) * 2010-10-29 2013-07-15 도레이첨단소재 주식회사 Anti-reflection Film, Anti-Oxidation Film and Touch Screen Panel Using the Same
CN102207597B (en) * 2011-05-27 2012-12-19 宁波永新光学股份有限公司 Optical window device with high hardness and low friction coefficient
KR101523821B1 (en) 2012-10-30 2015-05-28 (주)엘지하우시스 Anti-reflection coating composition containing siloxane compound, anti-reflection film having controlled surface energy using the same
CN102991056B (en) * 2012-11-01 2016-04-20 合肥乐凯科技产业有限公司 A kind of antistatic transparent hardened film
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KR101323058B1 (en) * 2012-11-22 2013-10-29 코오롱인더스트리 주식회사 Prism sheet
KR20140094939A (en) * 2013-01-23 2014-07-31 (주)엘지하우시스 Coating composition for low refractive layer and method of manufacturing the same
KR101578914B1 (en) * 2013-03-15 2015-12-18 주식회사 엘지화학 Plastic film
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KR101686644B1 (en) * 2013-11-19 2016-12-14 주식회사 엘지화학 Plastic film laminate
CN105313384A (en) * 2014-06-16 2016-02-10 黄瑜贞 Light-guiding decorative composite sheet material and part thereof
KR101951863B1 (en) 2016-03-14 2019-02-25 주식회사 엘지화학 Anti-reflective film and display device
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CN115508920A (en) * 2022-10-20 2022-12-23 宁波甬安光科新材料科技有限公司 Anti-glare anti-reflective film for displays

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0383524A (en) * 1989-08-25 1991-04-09 Iseki & Co Ltd Covered bed soil seedling in paper pot for transplantation machine
JP2002062401A (en) * 2000-08-14 2002-02-28 Fuji Photo Film Co Ltd Antireflection transparent and electrically conductive laminated film
TWI274662B (en) * 2002-03-29 2007-03-01 Toray Industries Laminated film, filter for display and display
WO2006022427A1 (en) * 2004-08-27 2006-03-02 Fujifilm Corporation Anti-reflection film and polarizing plate and image display comprising same
JP2006119772A (en) * 2004-10-19 2006-05-11 Nof Corp Surface material for pen input device
JP4678635B2 (en) * 2005-02-10 2011-04-27 東レフィルム加工株式会社 Optical film
US20060181774A1 (en) * 2005-02-16 2006-08-17 Konica Minolta Opto, Inc. Antireflection film, production method of the same, polarizing plate and display
JP5167812B2 (en) * 2005-07-15 2013-03-21 コニカミノルタアドバンストレイヤー株式会社 Optical film processing method, optical film processing apparatus, and optical film manufacturing method
JP4866074B2 (en) * 2005-12-13 2012-02-01 積水化学工業株式会社 Anti-reflection coating agent and anti-reflection film
JP4765651B2 (en) * 2006-02-10 2011-09-07 東レ株式会社 Laminated film
JP2007229999A (en) * 2006-02-28 2007-09-13 Jsr Corp Antireflection laminate

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI472567B (en) * 2012-07-25 2015-02-11 Ind Tech Res Inst Masterbatch, method for fabricating the same and a film formed from the masterbatch
US10053572B2 (en) 2012-07-25 2018-08-21 Industrial Technology Research Institute Masterbatch, method for fabricating the same, and a film fabricated from the masterbatch

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KR20090118724A (en) 2009-11-18
CN101581801A (en) 2009-11-18
TWI400476B (en) 2013-07-01

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