TW200946553A - Epoxy resin containing phosphorus, epoxy resin composition containing phosphorus and method for preparation thereof, and curing resin composition using said resin and said resin composition and cured product - Google Patents

Epoxy resin containing phosphorus, epoxy resin composition containing phosphorus and method for preparation thereof, and curing resin composition using said resin and said resin composition and cured product Download PDF

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TW200946553A
TW200946553A TW98101457A TW98101457A TW200946553A TW 200946553 A TW200946553 A TW 200946553A TW 98101457 A TW98101457 A TW 98101457A TW 98101457 A TW98101457 A TW 98101457A TW 200946553 A TW200946553 A TW 200946553A
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epoxy resin
phosphorus
weight
formula
resin composition
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TW98101457A
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Chinese (zh)
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TWI491637B (en
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Tetsuya Nakanishi
Kazuo Ishihara
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Toto Kasei Kk
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
    • H05K1/032Organic insulating material consisting of one material
    • H05K1/0326Organic insulating material consisting of one material containing O
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14Polycondensates modified by chemical after-treatment
    • C08G59/1405Polycondensates modified by chemical after-treatment with inorganic compounds
    • C08G59/1422Polycondensates modified by chemical after-treatment with inorganic compounds containing phosphorus
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/4007Curing agents not provided for by the groups C08G59/42 - C08G59/66
    • C08G59/4014Nitrogen containing compounds
    • C08G59/4021Ureas; Thioureas; Guanidines; Dicyandiamides

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Epoxy Resins (AREA)

Abstract

Disclosed is a method for producing a phosphorus-containing epoxy resin, wherein a phosphorus-containing epoxy resin is obtained by reacting a compound represented by general formula (1) with an epoxy resin. The method is characterized in that the value obtained by dividing the content (wt%) of a compound represented by general formula (2) in the system before reaction by the phosphorus content (wt%) in the phosphorus-containing epoxy resin obtained by reaction is not more than 0.3.

Description

200946553 六、發明說明: 【發明所屬之技術領域】 本發明係關於一種用以製造電子電路基板所使用之銅 張積層板、膜材、附有樹脂之㈣等的環氧樹脂組成物、 以及有用於做為電子零件所使用之密封材料、成形材洗 鋒材料 '接著劑、電氣絕緣塗裝材料等之切環氧樹脂以 及含碟環氧樹脂組成物、其之製造方法與使用有該樹脂之 硬化性樹脂組成物及硬化物。 【先前技術】 環氧樹脂因接著性、耐熱性、成形性優異,故廣泛使 用於電子零件、電氣機n、汽車零件、FRp⑽⑽inf〇rced pi_cs’纖維強化塑勝)、運動用品等。其中因為電子零件、 電氣機器所使用之銅張積層板、密封材料被強烈要求防止 火災、延緩火災等安全性,故到目前為止係使用有具有該 等特性之漠化環氧樹脂等。雖具有比重大之問冑,但藉由 於環,樹脂導人Μ,尤其是導人漠,則可賦予難燃性, 且環氧基具有高反應性且可獲得優異之硬化性,故漠化環 氧樹月曰類-直被定位為__種有用之電子、電氣材料。 然而最近之電子機器方面,將所謂輕薄短小視為最重 :之傾向逐漸變強。此種社會要求中,由最近之輕量化傾 ::點來看’ t匕重大之鹵素化物為較佳之材料又,經過 :恤且長期使用的情況時,會發生鹵素化物之解離,因而 發生配線腐食之虞。再者,使用結束的電子零件、電氣 200946553 質,由環境安全之 ,因而逐漸研究起 機器在燃燒時會發生画素化物等有害物 觀點來看,鹵素之利用逐漸被視為問題 取代其之材料。 關於申請專利範圍記載之通式⑴所表示之化合物之公 文獻方面’ 4利文獻!係揭示了 hca·叫(三光股份有限 公司製之10-(2,5二經基苯基)_9,1〇二氣_9氧基間雜菲 10 氧化物)(l0_(2,5_dlhydr〇xyphenyi)9,i〇 ^ydr〇_9 〇xa-BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a copper laminate, a film, an epoxy resin composition (4), and the like, which are used for manufacturing an electronic circuit board, and useful A sealing epoxy material used as an electronic component, a sealing material for a molding material, an adhesive, an electrical insulating coating material, a cut epoxy resin, and a dish-containing epoxy resin composition, a method for producing the same, and a resin used therefor A curable resin composition and a cured product. [Prior Art] Since epoxy resin is excellent in adhesion, heat resistance, and moldability, it is widely used in electronic parts, electric machines, automobile parts, FRp (10) (10) inf〇rced pi_cs' fiber reinforced plastics, sports products, and the like. Among them, since the copper-clad laminates and sealing materials used in electronic parts and electrical equipment are strongly required to prevent fires and delay fires, it has been used so far that desertified epoxy resins having such characteristics are used. Although it has a significant problem, it can impart flame retardancy by virtue of the ring, and the resin is particularly attractive, and the epoxy group has high reactivity and excellent hardenability. Epoxy tree scorpion - straightly positioned as a useful electronic and electrical material. However, in recent electronic machines, the so-called light and short is considered to be the heaviest: the tendency is getting stronger. In this kind of social demand, from the recent light weight:: The point of view is that the important halogen is the better material. When the shirt is used and used for a long time, the dissociation of the halide occurs, and wiring occurs. The rot of the rot. Furthermore, the use of electronic components and electrical products that have been completed is environmentally safe. Therefore, it has been gradually studied that the use of halogens is considered a problem instead of harmful substances such as photographic elements. Regarding the public literature aspect of the compound represented by the general formula (1) described in the patent application scope, the 4 literatures! The system reveals that hca is called (10-(2,5-di-diphenyl)_9,1〇2 gas _9-oxyl phenanthrene 10 oxide manufactured by Sanguang Co., Ltd.) (l0_(2,5_dlhydr〇xyphenyi) 9,i〇^ydr〇_9 〇xa-

10-ph〇SphaPhenanthrene_10_〇xide)與環氧樹脂類以既定比 例之莫耳比進行反應所得之熱硬化性樹脂。$利文獻2係 揭示一種由具有至少2個以上環氧基之環氧化合物與二苯 基氧膦基對苯二酚反應而成之含磷環氧樹脂之製造方法。 專利文獻3係揭示一種難燃性環氧樹脂之製造方法,其特 徵在於使環氧樹脂、磷原子上具有芳香族基之膦化合物及 苯醌(quinone)化合物在有機溶劑存在下進行反應。專利文 獻4係揭示通式(2)所表示之含磷多價苯酚化合物與環氧樹 脂反應所得之含磷環氧樹脂,含磷難燃性環氧樹脂組成 物。專利文獻5係揭示一種含麟難燃性雙盼型環氧樹脂之 製造方法’其係進行步驟1與步驟2,步驟1係使9,〗〇_二 氫-9-氧基-10-磷雜菲_1〇_氧化物與丨,4_苯醌及/或丨,4_萘醌 (l,4-naphthoquinone)以將反應系内總水分量控制成相對於 反應所使用之9,10-二氫-9-氧基-10·磷雜菲-10-氧化物總量 為0.3重量%以下的方式進行反應獲得反應組成物;步驟2 係不將步驟1所得之反應組成物精製,而使之與雙盼A型 環氧樹脂及/或雙酚F型環氧樹脂反應。 5 200946553 專利文獻1 專利文獻2 專利文獻3 專利文獻4 專利文獻5 然而任一專 載 •曰本專利特開平04-1 1662號公報 •曰本專利特開平05-214070號公報 •曰本專利特開2000-309624號公報 :曰本專利特開2002-265562號公報 :曰本專利特開2006-342217號公報 利文獻中皆未有關於硬化劑與硬化性之記 專利文獻6中有含通式(2)所表示之化合物即結構式3 之一官能性之有機磷化合物類的記載,其中記載:「因為 與環氧樹脂基反應,而於樹脂中形成所謂懸掛(pendant),故 環氧樹脂類之交聯密度減少而硬化速度遲緩、耐熱性降低 或機械強度降低等弊害變大,而難以使用能充分展現難燃 性程度之量。」,其中亦記載了若使用能充分展現難燃性 程度之量(一般約十幾重量%〜數十重量%)的一官能性之有 機填化合物類作為反應型之有機磷化合物,則交聯密度會 減少且有硬化速度遲延等間題。 專利文獻6:日本專利特開2000454234號公報 【發明内容】 本發明人針對與各種含磷環氧樹脂之硬化劑之反應性 進行探討之結果’發現因所得之含磷環氧樹脂而反應性有 顯著差異。當環氧樹脂之反應性的指標即凝膠時間長時, 則會發生例如積層壓接時硬化時樹脂會過度流動,所得之 積層板因樹脂成分不足而產生接著力降低,發生遷移 200946553 (mlgratl〇n)、焊接浸潰時的膨服等不良情況。又,藉由增加 ㉖化觸媒之配合量來調整凝勝時間的情況時,會有預浸材 料之儲藏安定性變差,無法長期保存等間題。 本發月人為了解決前述問題,反覆努力研究之結果, 發現通式(1)所表不之化合物與環氧樹脂類反應戶斤得之含鱗 %氧樹月日中’反應前之系統中之通式⑺所表示之化合物的 含有率(重量%)除以反應所得之含罐環氣樹脂之含填率(重 ❹量^所得之値超過〇.3 _,環氧樹脂之硬化反應性會顯著地 又損而凡成本發明之含磷環氧樹脂,用以解決前述問題 之方法係如申請專利範圍所記載之如下内容。 (1)一種含磷環氧樹脂之製造方法,其特徵在於,通式 (1)所表示之化合物與環氧樹脂類反應所得之含磷環氧樹脂 中,反應前系統中通式(2)所表示之化合物之含有率(重量%) 除以反應所得之含磷環氧樹脂之含磷率(重量%)所得之値 為0.3以下。 Ο (R 1 ) (R2)- ⑴ (Ο) η — Ρ = 〇 I Η 0-( Β—Ο Η10-ph〇SphaPhenanthrene_10_〇xide) A thermosetting resin obtained by reacting an epoxy resin with a molar ratio of a predetermined ratio. The invention discloses a method for producing a phosphorus-containing epoxy resin obtained by reacting an epoxy compound having at least two epoxy groups with diphenylphosphinyl hydroquinone. Patent Document 3 discloses a method for producing a flame-retardant epoxy resin, which comprises reacting an epoxy resin, a phosphine compound having an aromatic group on a phosphorus atom, and a quinone compound in the presence of an organic solvent. Patent Document 4 discloses a phosphorus-containing epoxy resin obtained by reacting a phosphorus-containing polyvalent phenol compound represented by the formula (2) with an epoxy resin, and a phosphorus-containing flame-retardant epoxy resin composition. Patent Document 5 discloses a method for producing a lining flame-retardant double-presence type epoxy resin, which is carried out in steps 1 and 2, and step 1 is a method for making 9, 〇_dihydro-9-oxy-10-phosphorus杂 〇 〇 氧化物 氧化物 氧化物 氧化物 氧化物 氧化物 氧化物 氧化物 氧化物 氧化物 氧化物 氧化物 氧化物 氧化物 氧化物 氧化物 氧化物 氧化物 氧化物 氧化物 氧化物 氧化物 氧化物 氧化物 氧化物 氧化物 氧化物 氧化物 氧化物 氧化物 氧化物 氧化物 氧化物 氧化物 氧化物 氧化物 氧化物 氧化物 氧化物 氧化物 氧化物 氧化物 氧化物 氧化物 氧化物 氧化物 氧化物 氧化物 氧化物 氧化物The reaction product is obtained by reacting a total amount of dihydro-9-oxy-10·phosphaphenanthrene-10-oxide in an amount of 0.3% by weight or less; and Step 2 is not refining the reaction composition obtained in Step 1. It is reacted with a double-presence A type epoxy resin and/or a bisphenol F type epoxy resin. 5 200946553 Patent Document 1 Patent Document 2 Patent Document 3 Patent Document 4 Patent Document 5 However, any of the special patents, Japanese Patent Laid-Open No. Hei 04-1, 1662, and the Japanese Patent Laid-Open No. Hei 05-214070 JP-A-2002-265562, JP-A-2006-342217, JP-A-2006-342217, No. JP-A-2006-342217, the disclosure of which is incorporated herein by reference. (2) The description of the compound represented by the organophosphorus compound of one of the structural formula 3, wherein "the epoxy resin is formed by reacting with the epoxy resin group to form a so-called pendant in the resin. The crosslink density of the class is reduced, the hardening rate is slow, the heat resistance is lowered, or the mechanical strength is lowered, and the disadvantages are increased, and it is difficult to use an amount that sufficiently exhibits the degree of flame retardancy." It is also described that the use can sufficiently exhibit flame retardancy. A degree of the amount (generally about 10% by weight to tens of % by weight) of a monofunctional organic compound compound as a reactive organic phosphorus compound, the crosslinking density is reduced and the hardening speed is delayed. Room and other problems. Patent Document 6: JP-A-2000454234 SUMMARY OF THE INVENTION The present inventors have investigated the reactivity with various hardeners of phosphorus-containing epoxy resins, and found that the reactivity of the obtained phosphorus-containing epoxy resin is Significant difference. When the gelation time of the epoxy resin is long, the resin may excessively flow when hardened by lamination, and the resulting laminate may have a decrease in adhesion due to insufficient resin component, and migration may occur. 200946553 (mlgratl 〇n), such as swelling during welding and impregnation. Further, when the amount of turbidity is adjusted by increasing the amount of the catalyst, the storage stability of the prepreg material is deteriorated, and the problem cannot be stored for a long period of time. In order to solve the above problems, this month's people repeatedly tried hard to study the results, and found that the compound represented by the general formula (1) and the epoxy resin reacted to the scaly % oxygen tree in the month before the reaction. The content (% by weight) of the compound represented by the formula (7) is divided by the filling ratio of the gas containing resin obtained by the reaction (the amount of the ruthenium obtained by the reaction is more than 〇.3 _, the hardening reactivity of the epoxy resin) The method for solving the above problems is as follows. The method for manufacturing the phosphorus-containing epoxy resin is characterized in that the method for producing the phosphorus-containing epoxy resin is as follows. In the phosphorus-containing epoxy resin obtained by reacting the compound represented by the formula (1) with an epoxy resin, the content (% by weight) of the compound represented by the formula (2) in the system before the reaction is divided by the reaction. The phosphorus content (% by weight) of the phosphorus-containing epoxy resin is 0.3 or less. Ο (R 1 ) (R2) - (1) (Ο) η - Ρ = 〇I Η 0-( Β - Ο Η

η — Ρ = Ο ⑵ Ο - (Β)-〇Η 式(1)以及式(2)中,R1,R2表示氫或烴基,且各自可為 相異或相同,可為直鏈狀、支鏈狀、環狀。又,亦可ΚΙ與 R2鍵結形成環狀結構,B表示苯、聯笨、萘、荩、 心 非从及 7 200946553 該等之烴取代物之任一者。η為0或1。 (2) —種含磷環氧樹脂,其係由前述(1)之方法所得者 (3) —種含磷乙烯基酯樹脂,其係使用有前述(2)之人 環氧樹脂。 (4) 一種含碌環氧樹脂組成物,其係以前述(2)之含碟王 氧樹脂作為必須成分,並配合硬化劑而成者。 (5) —種自由基聚合性樹脂組成物,其係以前述(3)之含 碟乙烯基酯樹脂作為必須成分,並配合自由基聚合起始劑 及/或硬化劑而成者。 (6) —種電子電路基板用材料,其係使用前述(4)之含磷 環氧樹脂組成物所得者。 (7) —種密封材料,其係使用前述(4)之含碟環氧樹脂組 成物所得者。 (8) —種澆鑄材料,其係使用前述(4)之含磷環氧樹脂組 成物所得者。 (9) 一種硬化物,其係將前述(4)至(8)之任一者之含磷環 氧樹知組成物、自由基聚合性樹脂組成物、電子電路基板 用材料、密封材料 '澆鑄材料硬化所成者。 【實施方式】 本發明之含碟環氧樹脂係由環氧樹脂類與通式(1)所表 不之化合物反應所得’反應前系統中之通式(2)所表示之化 〇物之含有率(重量%)除以反應所得之含磷環氧樹脂之含 磷率(重量%)所得之値為〇 3以下,較佳為〇15以下,更佳 200946553 為〇·〇5以下。通式(1)及通式(2)所表示之化合物會與環氧樹 脂類反應而結構發生變化,且其進一步含右 7 3有磷疋素,故預 先將反應前之系統中之通式(2)所表示之化合物之含有率 (重量%)除以反應後之含磷環氧樹脂之含磷率(重量叫所得 之、含磷環氧樹脂所含有之通式(2)所表示之化合物之含有 比例規定作為反應前之含有率,藉此可用做為用以控制含 磷環氧樹脂之硬化反應性之指標。再者通式(1)所表示之含 〇 磷化合物以外,併用其他含磷化合物(例如環笨氧基磷嗪 (cyclophenoxyphosphazene)等)之至少1種的情況時也是藉 由預先規定通式(2)所表示之化合物占含磷化合物全體之含 有率’可有用地做為作為用以控制含磷環氡樹脂之硬化反 應性之指標使用。 本發明中所用之通式(1)所表示之化合物可由例如非專 利文獻1、俄羅斯· 一般雜遠、之非專利文獻2、專利文獻7、 專利文獻8、專利文獻9、專利文獻10所示之方法所得。 ❹ 專利文獻7、專利文獻8、專利文獻9中係記載了在相對於 苯醒·化合物’ HCA(9,10-二氫-9-氧基-10-鱗雜菲_ι〇氧化物) 常存在當量以上之狀態下進行反應’且記載了反應後係使 用反應溶劑作為洗淨溶劑。此目的在於除去使用過剩之填 化合物。 非專利文獻 1 : I.G.M· Campbell and I.D.R. Stevens, Chemidal Communications,第 505-506 頁(1966 年) 非專利文獻 2 : (Zh. Obshch. Khim.),42(ll),第 2415-2418 頁(1972) 200946553η — Ρ = Ο (2) Ο - (Β)-〇Η In the formula (1) and formula (2), R1 and R2 represent hydrogen or a hydrocarbon group, and each may be different or the same, and may be linear or branched. Shape, ring. Further, it may be bonded to R2 to form a cyclic structure, and B may be any of benzene, phenyl, naphthalene, anthracene, ruthenium, and 7 200946553. η is 0 or 1. (2) A phosphorus-containing epoxy resin obtained by the method of the above (1), (3) a phosphorus-containing vinyl ester resin using the epoxy resin of the above (2). (4) A composition comprising an epoxy resin comprising the above-mentioned (2) containing a king epoxy resin as an essential component and blending a curing agent. (5) A radical polymerizable resin composition comprising the above-mentioned (3) disc-containing vinyl ester resin as an essential component, and a radical polymerization initiator and/or a curing agent. (6) A material for an electronic circuit board obtained by using the phosphorus-containing epoxy resin composition of the above (4). (7) A sealing material obtained by using the disc-containing epoxy resin composition of the above (4). (8) A casting material obtained by using the phosphorus-containing epoxy resin composition of the above (4). (9) A cured product of the phosphorus-containing epoxy resin composition, the radical polymerizable resin composition, the electronic circuit board material, and the sealing material of any one of the above (4) to (8) The material is hardened. [Embodiment] The epoxy resin containing the epoxy resin of the present invention is obtained by reacting an epoxy resin with a compound represented by the formula (1) to obtain a chemical composition represented by the general formula (2) in the system before the reaction. The ratio (% by weight) divided by the phosphorus content (% by weight) of the phosphorus-containing epoxy resin obtained by the reaction is 〇3 or less, preferably 〇15 or less, and more preferably 200946553 is 〇·〇5 or less. The compound represented by the general formula (1) and the general formula (2) reacts with the epoxy resin to change its structure, and further contains the phosphonium in the right side, so the general formula in the system before the reaction is previously performed. (2) The content ratio (% by weight) of the compound expressed is divided by the phosphorus content of the phosphorus-containing epoxy resin after the reaction (the weight is represented by the formula (2) contained in the obtained phosphorus-containing epoxy resin) The content ratio of the compound is defined as the content ratio before the reaction, and can be used as an index for controlling the hardening reactivity of the phosphorus-containing epoxy resin. Further, in addition to the cerium-containing phosphorus compound represented by the general formula (1), other In the case of at least one of a phosphorus-containing compound (for example, cyclophenoxyphosphazene), it is also possible to use a compound represented by the formula (2) in advance as a percentage of the total content of the phosphorus-containing compound. It is used as an index for controlling the hardening reactivity of the phosphorus-containing cyclic oxime resin. The compound represented by the formula (1) used in the present invention can be, for example, non-patent document 1, Russian, general, and non-patent document 2 Patent 7. Patent Document 8, Patent Document 9, and Patent Document 10 are obtained. 专利 Patent Document 7, Patent Document 8, and Patent Document 9 describe the compound 'HCA (9,10-II) in relation to benzene. Hydrogen-9-oxy-10-fluorene phenanthrene oxide) The reaction is carried out in a state in which the equivalent amount or more is often present. The reaction solvent is used as a washing solvent after the reaction is described. The purpose is to remove the excess used. Non-Patent Document 1: IGM· Campbell and IDR Stevens, Chemidal Communications, pp. 505-506 (1966) Non-Patent Document 2: (Zh. Obshch. Khim.), 42(ll), pp. 2415-2418 (1972) 200946553

專利文獻7 :日本專刺姓BB 寻和特開昭60-126293號公報 專利文獻8 :曰未真刹杜bb 不寻利特開昭01-236787號公報 專利文獻9 ·日本真刹姓pg τ _ 不寻利特開平5-331 179號公報 專利文獻ίο:日本專利特開平〇5·39345號公報 又’通式⑴所表示之化合物已知有由非專利文獻卜 非專利文獻2、專利讀7〜1G所揭示之方法所製造,並經 洗淨、再結晶等精製手段之製造花費上昇、純纟99%以上 者。此時通式(2)所表示之化合物會與其他之雜質一同副生 成。其之反應示於反應式丨。反應式i可舉出例如通式⑴ 所表示之化合物與通式(2)所表示之化合物之生成,為反應 式1中所表示之通式(3)之化合物會殘存之例。 反應式 !2) — (〇) n—P*s〇 +Patent Document 7: Japanese Patent No. BB 寻 特 特 60 60 60 60 60 60 60 60 60 60 60 60 60 60 60 60 bb bb bb bb bb bb bb bb bb bb bb bb bb bb bb bb bb bb bb bb bb bb bb bb bb 01 01 01 01 01 _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ It is manufactured by the method disclosed in 7 to 1G, and the manufacturing cost of the purification means such as washing and recrystallization is increased, and the purity is 99% or more. At this time, the compound represented by the formula (2) is produced in association with other impurities. The reaction is shown in the reaction formula. In the reaction formula i, for example, a compound represented by the formula (1) and a compound represented by the formula (2) are produced, and the compound of the formula (3) represented by the reaction formula 1 remains. Reaction formula !2) — (〇) n—P*s〇 +

I Η ⑶ ⑴ 12) - (Ο) η-Ρ = 0 -f i ηο-<β^-οηI Η (3) (1) 12) - (Ο) η-Ρ = 0 -f i ηο-<β^-οη

⑶ CR2) - <〇)(3) CR2) - <〇)

Ο- (Β>-〇Η ⑵ 式中,IU、R2表示氫或烴基’且各相異或相同,可為 直鏈狀、支鏈狀、環狀。又,亦可R1與R2鍵結形成環狀 結構。B表示苯、聯苯、萘、菲及該等之烴取代物之任一者。 η為〇或1。 本發明人發現:使用以雜質成分形式含有通式(2)所表 200946553 示之化合物之通式⑴所表示之化合 使通式⑺所表示之化合物 之衰氧樹脂,即 *之量而是非常少量,反應速 成本發明,並了解到以往之單官能苯盼=期=完 :,:::費精製通式⑴所表示之化合物成為高純度以Ο- (Β>-〇Η (2) wherein IU and R2 represent hydrogen or a hydrocarbyl group, and each of the phases is the same or the same, and may be linear, branched or cyclic. Further, R1 may be bonded to R2. A cyclic structure. B represents any one of benzene, biphenyl, naphthalene, phenanthrene, and the like, and η is hydrazine or 1. The present inventors have found that the use of the formula (2) in the form of an impurity component is used. 200946553 The compound represented by the formula (1) shows that the compound represented by the formula (7) has a very small amount of the oxygen-reducing resin, that is, *, and the reaction rate is invented, and the conventional monofunctional benzene is expected to be in the future. = End:,:::: The compound represented by the general formula (1) is purified to be of high purity.

電子電路ιγ)所密表不之化合物成分之管理亦可解決使用於 土板、密封材料、澆鑄材料等情況時之不良情況。 八特徵在於反應前之系統中之通式(2)所表示之化合物之 3有率(重量%)除以反應所得之含磷環氧樹脂之含磷率(重 量❶/。)所得之値為0.3以下,所得之含碟環氧樹脂對與硬化劑 之反應性造成的影響少。亦即,通式⑺所表示之化合物之 含有率(重量%)除以含磷率(重量%)所得之値定為以The management of the compound components of the electronic circuit ιγ) can also solve the problems when used in earth plates, sealing materials, casting materials, and the like. The eighth characteristic is that the yield (% by weight) of the compound represented by the formula (2) in the system before the reaction is divided by the phosphorus content (weight ❶/.) of the phosphorus-containing epoxy resin obtained by the reaction. Below 0.3, the resulting disc-containing epoxy resin has little effect on the reactivity with the hardener. That is, the content (% by weight) of the compound represented by the formula (7) is divided by the phosphorus content (% by weight) to obtain

下,較佳為(Μ5以下,更佳為μ以下,期望是在〇 〇5以 下進行反應獲得環氧樹脂。含有通式⑺所表示之化合物其 之含有率(重量%)除以含磷率(重量%)所得之値超過〇 3之 環氧樹脂類與硬化劑之反應性顯著地延遲,故實用性差。 本發明中所用之通式(1)所表示之化合物可藉由非專利 文獻1〜2、專利文獻7~10所揭示之方法來製造,藉由製造 後之萃取、洗淨、再結晶、蒸餾等精製操作等可見減少通 式(2)所表示之化合物。又’亦可不經由該等之方法而是藉 由通式(1)所表示之化合物之反應條件來減少通式(2)所表示 之化合物。 通式(1)所表示之化合物之具體例可舉出結構式1所表 11 200946553 示之HCA-HQ(三光股份有限公司製之ι〇_ (2,5-二經基苯 基)-10-二氫-9-氧基-10-破雜菲-10-氧化物)、結構式2所表 示之HCA-NQ (10-(2,7-二經基萘基)_ι〇_二氫冬氧基_1〇_鱗 雜菲-10-氧化物)、PPQ (北興化學工業股份有限公司二苯基 氧膦基對苯二酚)、二苯基氧膦基萘醌、CPHO-HQ(曰本化 學工業股份有限公司製伸環辛基氧膦基-14_苯二酚)、伸環 辛基氧膦基-1,4-萘二酚、曰本專利特開2002-265562所揭示 之含磷苯酚化合物等,亦可併用2種以上。 結構式1Next, it is preferably (5 or less, more preferably μ or less, and it is desirable to carry out a reaction under 〇〇5 or less to obtain an epoxy resin. The content (% by weight) of the compound represented by the general formula (7) is divided by the phosphorus content. (% by weight) The reactivity of the epoxy resin having a enthalpy of more than 〇3 and the curing agent is remarkably delayed, so that the practicability is poor. The compound represented by the formula (1) used in the present invention can be used by Non-Patent Document 1 ~2, and the methods disclosed in Patent Documents 7 to 10 are produced, and the compound represented by the formula (2) can be reduced by a purification operation such as extraction, washing, recrystallization, distillation, etc. after production. In the above-mentioned methods, the compound represented by the formula (2) is reduced by the reaction conditions of the compound represented by the formula (1). Specific examples of the compound represented by the formula (1) include the structural formula 1. Table 11 200946553 shows HCA-HQ (manufactured by Sanko Co., Ltd. (2,5-di-phenyl)-10-dihydro-9-oxy-10-pyrene-10-oxidation HCA-NQ (10-(2,7-di-p-naphthyl)_ι〇_ dihydrofuryloxyl 〇 鳞 scale represented by Structural Formula 2 Phenanthrene-10-oxide), PPQ (Beixing Chemical Industry Co., Ltd. diphenylphosphinyl hydroquinone), diphenylphosphinyl naphthoquinone, CPHO-HQ (Sakamoto Chemical Industry Co., Ltd. Cyclooctylphosphinyl-14-benzenediol), cyclooctylphosphinyl-1,4-naphthalenediol, phosphorus-containing phenol compound disclosed in JP-A-2002-265562, etc. 2 or more. Structure 1

結構式2Structural formula 2

和通式(1)所表示之化合物進行反應之環氧樹脂類較佳 為帶有縮水甘油醚基者。具鱧而言可舉出:Ep〇t〇ht〇 YDC-13 12、ZX-1027(東都化成股份有限公司製之苯二酚型 環氧樹脂)、ZX-125 1(東都化成股份有限公司製之雙酚型環 200946553 氧樹脂)、Epotohto YD-127、Epotohto YD-128、Epotohto YD-8125、Epotohto YD-825GS、Epotohto YD-011、 Epotohto YD-900、Epotohto YD-901(東都化成股份有限公司 製之 BPA 型環氧樹脂)、Epotohto YDF-170、Epotohto YDF-8170、Epotohto YDF-870GS、Epotohto YDF-2001(東都 化成股份有限公司製之BPF型環氧樹脂)、Epotohto YDP N-638(東都化成股份有限公司製之苯酚酚醛清漆型環氡樹 脂)、Epotohto YDCN-701(東都化成股份有限公司製之甲酚 ❹ 酚醛清漆型環氧樹脂)、ZX-1201(東都化成股份有限公司製 之雙酚芴型環氧樹脂)、NC-3000(曰本化藥股份有限公司製 之聯苯芳烷基苯酚型環氧樹脂)、EPPN-501H、EPPN-5〇2H(曰 本化藥股份有限公司製之多官能環氧樹脂)ZX-1355(東都化 成股份有限公司製之萘二醇型環氧樹脂)、ESN-155、 ESN-1 85 V、ESN-175(東都化成股份有限公司製之泠-萘酚芳 烷基型環氧樹脂)、ESN-355、ESN-375(東都化成股份有限 Λ 公司製之二萘酚芳烷基型環氧樹脂)、ESN-475V、 9 ESN-485(東都化成股份有限公司製之α萘酚芳烷基型環氧 樹脂)等多價酚樹脂等苯酚化合物與環氧函丙烷 (epihalohydrin)所製造而成之環氧樹脂、Epotohto ΥΗ-434、 Epotohto YH-434GS(東都化成股份有限公司製之二胺基二 苯基甲烷四縮水甘油醚)等胺化合物與環氧_丙烷所製造而 成之環氧樹脂、YD-171(東都化成股份有限公司製之二聚酸 型環氧樹脂)等羧酸類與環氧齒丙烷所製造而成之環氧樹脂 等,但不限定於該等,亦可併用2種以上。但其中,必須 13 200946553 2反應前之系統中之通式(2)所表示之化合物之含有率(重 篁%)除以反應所得之含磷環氧樹脂之含磷率(重量%)所得 之値為0.3以下,較佳為〇·ΐ5以下,更佳為〇1以下,期望 為0.05以下之方式填入。 合成方法係與通常之多官能苯酚類與環氧樹脂類之反 應相同,填入通式(1)所表示之化合物與環氧樹脂類,進行 加熱熔融進行反應。其中,必須以反應前之系統中之通式(2) 所表示之化合物之含有率(重量%)除以反應所得之含磷環 氧樹脂之含磷率(重量%)所得之値為〇 3以下,較佳為〇 b 以下,更佳為0.1以下,期望為〇.05以下之方式填入。反 應溫度為1〇〇。(:〜200。(:,更佳為i2〇°c〜180°C攪拌下進行反 應。當此反應速度慢時,視需要可使用觸媒以謀求生產性 之改善。具艚之觸媒可使用:苄基二甲基胺等3級胺類、 四甲基氣化敍等4級銨鹽類、三苯基膦、三(2,6_二甲氧展 本基)膦等膦類、乙基三苯基演化鱗等鱗鹽類、2_甲基味啥 2-乙基-4-曱基咪唑等咪唑類等各種觸媒。又,依反應時 黏度亦可使用反應溶劑。具趙而言,可舉出:笨、甲— 二甲苯、環戊酮、環己酮等,但並不限定於該等,亦可併 用2種以上使用。 視需要亦可併用各種環氧樹脂變性劑。其中,必須p 反應刚之系統中之通式(2)所表不之化合物之含有率(重量 除以反應所得之含磷環氧樹脂之含磷率(重量%) β /〇) 吓传之値 為0.3以下’較佳為0.15以下,更佳為〇丨以下期望 0.05以下的方式填入。變性劑可舉出:雙酚a、雙盼F、雙 200946553 紛AD、四丁基雙紛a、苯二紛(hydroquinone)、甲基苯二紛、 二甲基苯二酚、二丁基苯二酚、間苯二酚(resorcin)、甲基 間苯二酚、雙酚、四甲基雙酚、二羥基萘、二羥基二苯基 醚、二羥基二苯乙烯類、苯酚酚醛清漆樹脂、甲酚酚醛清 漆樹脂、雙酚A酚醛清漆樹脂、二環戊二烯酚樹脂、苯酚 芳烷基樹脂、萘酚酚醛清漆樹脂、萜烯酚樹脂、重質油變 性酚樹脂、溴化苯酚酚醛清漆樹脂等各種苯酚類、各種苯 紛類與經基苯甲搭、丁稀搭、二苯乙二搭(diphenylglyoxal) 等各種醛類之縮合反應所得之多價酚樹脂、苯胺、苯二胺 (phenylenediamine)、曱苯胺(toluidine)、二甲苯胺(xylidine)、 二乙基曱苯二胺、二胺基二苯基甲烷、二胺基二苯基乙烷、 二胺基二苯基丙烷、二胺基二苯基酮、二胺基二苯基硫醚 (diaminnodiphenyl sulfide)、二氧基苯域(diaminodiphenyl sulfone)、雙(胺基苯基)芴、二胺基二乙基二甲基二苯基甲 烷、二胺基二笨基醚、二胺基苯醯替笨胺、二胺基聯苯、 二甲基二胺基聯苯、聯苯四胺、雙胺基苯基葱、雙胺基苯 氧苯、雙胺基苯氧基苯基謎、雙胺基苯氧基雙酚 (bisaminophenoxyphenyl)、雙胺基苯氧基苯礙、雙胺基苯氧 基苯基丙烧、二胺基萘等胺化合物。 本發明中所用之含磷環氧樹脂之含磷量較佳為0.3~4 重量%,更佳為0.5〜3.6重量%,再更佳為1.0〜3.1重量%, 含有含磷環氧樹脂而成之含磷環氧樹脂組成物中之有機成 分中的磷含量較佳為0.2〜4重量%,更佳為0.4〜3.5重量%, 再更佳為0.6〜3重量%。含磷環氧樹脂組成物中之有機成分 15 200946553 、—。3量右為0.2重量%以下,則難以確保難燃性,若為 5重量%以上’則對耐熱性有不良影響,故較佳係調整為0.2 重量%至4重量〇/〇。 又本發明中所用之含磷環氧樹脂之環氧當量較佳為 1500g/eq’更佳為 25〇〜1〇〇〇g/eq,再更佳為 3〇〇〜 環氧虽量未滿200g/eq時,接著性會變差若超過15〇〇g/eq, 則對耐熱性會有不良影響,故較佳係調整為 200〜1500g/eq 〇 本發明之含磷環氧樹脂組成物之硬化劑可使用各種酚 樹月曰類、酸肝類、胺類、醯肼類、酸性聚醋類等通常所使 用之環氧樹脂用硬化劑,且該等之硬化劑可僅丨種亦可使 用2種以上使用。 本發明之含磷環氧樹脂組成物中視需要亦可配合3級 胺、4級銨鹽、膦類、咪唑類等硬化促進劑。 本發明之含鱗環氧樹脂組成物亦可用有機溶劑作為黏 度調整用。可用之有機溶劑可舉出N,N_二甲基甲醯胺等醯 胺類、乙一醇單曱基醚等醚類、網、甲乙嗣等嗣類、甲醇、 乙醇等醇類、苯、曱苯等芳香族烴類等,可僅使用該等溶 劑中之1種亦可使用2種以上使用,環氧樹脂濃度可配合 30〜80重量。/〇之範圍。 本發明之含磷環氧樹脂組成物中所用之填料可舉出氮 氡化鋁、氫氧化鎂、滑石、燒成滑石、黏土、高嶺土、氧 化鈦、玻璃粉末、微粉末二氧化矽、熔融二氧化妙、結晶 二氧化矽、二氧化矽球(silica balloon)等無機填料,亦可配 合顏料等。使用一般無機充填材之理由例如提高耐衝擊性。 200946553 又,使用氫氧化銘、氫氧化鎮等金屬氫氧化物時,係作為 難燃助劑作用,gp #人a , 即使含磷量少亦可確保難燃性。尤其若配 。量非1 〇 /〇以上,則耐衝擊性之效果少。然而,若配合量 超過150 /。則作為積層板用途必要之項目即接著性會降低。 又亦可於上述樹脂組成物中含有二氧化矽、玻璃纖維、 紙漿纖維(pulp flber)、合成纖維、陶H維等纖維質充填 材、微粒子橡膠、熱可塑性彈性體等有機充填材。 參以上述之含磷環氧樹脂組成物所得之電子電路基板用 材料可舉出樹脂片、附有樹脂之金屬箱、預浸材料、積層 板。製造樹脂片之方法並無特別限定,例如於聚酯膜、聚 醯胺膜等不會溶解於環氧樹脂組成物之載體膜、塗佈上述 之含磷環氧樹脂組成物較佳為5〜1〇〇〆m之厚度後,以 100〜200°c加熱乾燥1〜40分鐘成型成片狀。一般以稱為澆 鑄法之方法來形成樹脂片。此時若於塗佈含磷環氧樹脂組 成物之片預先以離型劑施以表面處理,則可容易地將所成 φ 型出之樹脂片剝離。此處樹脂片之厚度較佳係形成為5〜80 /X m ° 接著’說明以上述之含磷環氧樹脂組成物所得之附有 樹脂之金屬箔。金屬箔可使用銅、鋁、黃銅、鎳等單獨、 合金、複合之金屬箔。較佳係使用厚度9〜7〇 μ m之金屬箔。 由含有含磷環氧樹脂而成之難燃性樹脂組成物以及金屬箔 來製造附有樹脂之金屬箔之方法並無特別限定,例如於上 述金屬箔之一面用輥塗機塗佈將上述含磷環氧樹脂組成物 以溶劑進行黏度調整後之樹脂清漆後,進行加熱乾燥將樹 17 200946553 脂成分半硬化(B階段化)以形成樹脂層所得者。將樹脂成分 半硬化時,例如可以100〜20(rc加熱乾燥丨〜仂分鐘。此處, 附有樹脂之金屬猪之樹脂部分的厚度為形成為5〜110 較佳。 接著,㈣使用上述之含鱗環氧樹脂組成物所得之預 浸材料。片狀基材可使用玻璃等無機纖維、聚酯等、聚胺、 聚丙婦酸、聚醯亞胺、克維拉纖維(Kevlar fiber)等有機質纖 維之織布或不織布’但並不限定於此。由含碟環氧樹脂组 成物以及基材來製造預浸材料之方法並無特別限定,例如 將上述基材浸潰並含浸於將上述環氧樹脂組成物以溶劑進 行黏度調整後之樹脂清漆中後,進行加熱㈣將樹脂成分 半硬化(B階段化)所得者,例如可以1〇〇〜2〇〇它加埶乾燥 1〜4〇分鐘。此處,預浸材料中之樹脂量訂為樹脂成分3〇〜8〇 重量%較佳。 接著,說明使用上述之樹脂片、附有樹脂之金屬箱、 預浸材料等來製造積層板之方法。使用預浸材料來形成積 層板的情況時,係積層一片或數片預浸材料,並於單側或 兩側配置金屬猪以構成積層物,將此積層物加熱、加壓以 使其積層-體化。此處,金屬箱可使用銅、鋁、黃銅、鎳 等單獨、合金、複合之金屬荡。將積層物加熱加壓之條件 來說’可在環氧樹脂組成物會硬化之條件下適當調整進行 加熱加壓,若加麼壓力相當低時,所得之積層板的内部會 殘留氣泡’有時電氣特性會降,故較佳為在滿足成形性之 條件下進行加壓。例如可分別設定溫度為16〇〜2赃、壓力 18 200946553 為49.0〜490.3N/cm2(5〜50kgf/cm2)、加熱加壓時間為4〇〜24〇 分鐘。可進一步將如此所得之單層積層板作為内層材製作 多層板。此情況時,首先係於積層板以增加法(addiHve)、 減去法(subtractive)等施以電路形成,將所形成之電路表面 以酸溶液進行處理以施以黑化處理’獲得内層材。於此内 層材之單側或兩側之電路形成面以樹脂片、附有樹脂之金 屬V#、或預浸材料形成絶緣層’同時於絶緣層之表面形成 β 導體層’以形成多層板。以樹脂片形成絶緣層的情況時, 係於複數片内層材的電路形成面配置樹脂片材來形成積層 物。或者於内層材之電路形成面與金屬箔之間配置樹脂片 以形成積層物。然後將此積層物加熱加壓以使其__體成 形’藉此形成樹脂片之硬化物作為絶緣層,同時形成内層 材之多層化。又或者於内層材料與作為導鱧層之金屬箔之 間將樹脂片材之硬化物形成為絕緣層。此處,金屬箱可使 用與用作為内層材之積層板所使用者為相同者。且加熱加 ❹ 麼成形可以在與内層材之形成相同之條件下進行。於積層 板塗佈樹脂以形成絶緣層的情況時,將含有構之環氧樹脂 組成物或者包含有含有磷之環氧樹脂而成之阻燃性環氧樹 脂組成物塗佈成較佳為5〜100 em之厚度,作為内層材料 之最外層之電路形成面樹脂’然後,以1 〇〇〜2〇〇它加熱乾燥 1〜90分鐘成形成片狀。一般係以稱為澆鑄法之方法來形成。 乾燥後之厚度較佳係形成為5〜80/zm。可於如此所形成之 多層積層板的表面再以增加法(additive)、減去法 (subtractive)施以通孔形成、電路形成,以形成印刷配線板。 19 200946553 且藉由再將此印刷配線板作為内層材重複施以上述工法, 可再形成多層之多層板。又,以附有樹脂之金屬箔形成絶 緣層的情況時’將附有樹脂之金屬箔以附有樹脂之金屬箔 的樹脂層和内層材之電路形成面相對向之方式重疊配置於 於内層材之電路形成面’以形成積層物。然後藉由將此積 層物加熱加壓一體成形,形成附有樹脂之金屬箔之樹脂層 的硬化物作為絶緣層’同時形成其外側之金屬箔作為導體 層。此處加熱加壓成形可以在與内層材的形成相同的條件 下進行。且以預浸材料形成絶緣層的情況時,係將預浸材 ® 料片或複數片積層而成之物配置於内層材的電路形成 面,再於其外側配置金屬箔以形成積層物。然後藉由將此 積層物加熱加壓一體成形,來形成預浸材料之硬化物作為 絶緣層,同時形成其外側之金屬箔作為導體層。此處,金 屬箔可使用與用作為内層板之積層板所使用者為相同者。 且加熱加壓成形可以在與内層材的形成相同的條件下進 行。可於如此所形成之多層積層板的表面再以增加法❹ (additive)、減去法(subtractive)施以通孔形成、電路形成, 以形成印刷配線板。且藉由再將此印刷配線板作為内層材 重複施以上述工法,可再形成多層之多層板。 對使用本發明之含磷環氧樹脂與該組成物所得之積層 板之特性進行評估之結果’通式(2)所表示之化合物之含有 率為·5 ί量/。以下之通式⑴所表示之化合物與環氧樹脂 類反應所得之含碟環氧樹脂,係與硬化劑之反應性高;且 硬化時之樹脂的流動性與硬化性的平衡良好之預浸材料、 20 200946553 以及將該預浸材料加熱硬化所得之積層板係不含_素化物 而具有難燃性,且焊接耐熱性優異之樹脂組成物。 實施例 舉出實施例以及比較例具體說明本發明,但本發明並 不限定於該等。通式(1)所表示之化合物所含有之通式(2)所 表示之化合物之含有率係使用HPLC來測定。使用Hewlett • Packerd 公司製 Agilentl 10〇series 之裝置,並使用 Imtakt 公 司製Cadenza CD-C1 8之CD006之管柱。溶離液係使用水與 甲醇’以60%之曱醇開始樣品測定,且於16分鐘進行梯度 至曱醇100%。流速定為0 5ml/分鐘,用uv檢測器以波長 266nm進行測定。又’難燃性係依據uL(UnderwriterThe epoxy resin which reacts with the compound represented by the formula (1) is preferably a glycidyl ether group. For example, Ep〇t〇ht〇YDC-13 12, ZX-1027 (dihydroxybenzene type epoxy resin manufactured by Dongdu Chemical Co., Ltd.), ZX-125 1 (manufactured by Dongdu Chemical Co., Ltd.) Bisphenol ring 200946553 Oxygen resin), Epotohto YD-127, Epotohto YD-128, Epotohto YD-8125, Epotohto YD-825GS, Epotohto YD-011, Epotohto YD-900, Epotohto YD-901 (Dongdu Chemical Co., Ltd.) BPA type epoxy resin), Epotohto YDF-170, Epotohto YDF-8170, Epotohto YDF-870GS, Epotohto YDF-2001 (BPF type epoxy resin manufactured by Dongdu Chemical Co., Ltd.), Epotohto YDP N-638 (East Phenol novolak type bismuth resin manufactured by Huacheng Co., Ltd.), Epotohto YDCN-701 (cresol phenolic phenol lacquer epoxy resin manufactured by Dongdu Chemical Co., Ltd.), ZX-1201 (double made by Dongdu Chemical Co., Ltd.) Phenolphthalein type epoxy resin), NC-3000 (biphenyl aralkyl phenol type epoxy resin manufactured by Sakamoto Chemical Co., Ltd.), EPPN-501H, EPPN-5〇2H (Sakamoto Chemical Co., Ltd.) Multifunctional epoxy resin) ZX-1355 (Dongdu Huacheng Naphthalenediol type epoxy resin manufactured by Co., Ltd.), ESN-155, ESN-1 85 V, ESN-175 (泠-naphthol aralkyl type epoxy resin manufactured by Dongdu Chemical Co., Ltd.), ESN- 355, ESN-375 (Ninadu Chemical Co., Ltd. bisphthol aralkyl epoxy resin), ESN-475V, 9 ESN-485 (Anaphthol aralkyl ring made by Dongdu Chemical Co., Ltd.) Epoxy resin such as phenolic compound such as polyvalent phenol resin and epoxy resin manufactured by epoxidized propane (epiohto ΥΗ-434, Epotohto YH-434GS (diaminobiphenyl manufactured by Dongdu Chemical Co., Ltd.) Ethylene compound such as methyl methane tetraglycidyl ether) and epoxy resin produced by epoxy-propane, YD-171 (dimer acid type epoxy resin manufactured by Tohto Kasei Co., Ltd.) and other carboxylic acids and epoxy teeth An epoxy resin or the like produced by propane is not limited thereto, and two or more kinds thereof may be used in combination. However, it is necessary to divide the content (% by weight) of the compound represented by the formula (2) in the system before the reaction in 2009, and to obtain the phosphorus content (% by weight) of the phosphorus-containing epoxy resin obtained by the reaction. The enthalpy is 0.3 or less, preferably 〇·ΐ5 or less, more preferably 〇1 or less, and it is desirable to fill in the form of 0.05 or less. The synthesis method is the same as the reaction of the usual polyfunctional phenols and epoxy resins, and the compound represented by the formula (1) and the epoxy resin are filled and heated and melted to carry out a reaction. In addition, it is necessary to divide the content (% by weight) of the compound represented by the formula (2) in the system before the reaction by the phosphorus content (% by weight) of the phosphorus-containing epoxy resin obtained by the reaction, and to obtain 〇3. Hereinafter, it is preferably 〇b or less, more preferably 0.1 or less, and is desirably filled in such a manner as 〇.05 or less. The reaction temperature is 1〇〇. (:~200. (:, more preferably i2〇°c~180°C, the reaction is carried out under stirring. When the reaction rate is slow, the catalyst can be used as needed to improve the productivity. Use: a third-grade amine such as benzyldimethylamine, a tetra-ammonium salt such as tetramethyl gasification, a phosphine such as triphenylphosphine or a tris(2,6-dimethoxy-extension) phosphine, Various catalysts such as ethyltriphenyl evolution scale scale salts, imidazoles such as 2-methyl miso 2-ethyl-4-mercaptoimidazole, etc. Further, depending on the viscosity during the reaction, a reaction solvent can also be used. In addition, it is not limited to these, but it is also possible to use two or more types together, and various epoxy resin denaturation agents can also be used together, if necessary. The content of the compound represented by the formula (2) in the system of p-reaction (the weight divided by the phosphorus content of the phosphorus-containing epoxy resin obtained by the reaction (% by weight) β /〇) must be scared. It is preferably 0.3 or less, preferably 0.15 or less, more preferably 0.05 or less, and the denaturing agent is bisphenol a, double-prepared F, and double 200946553. Tetrabutyl double a, hydroquinone, methyl benzene, dimethyl benzene, dibutyl benzene, resorcin, methyl resorcinol, double Phenol, tetramethylbisphenol, dihydroxynaphthalene, dihydroxydiphenyl ether, dihydroxystilbene, phenol novolac resin, cresol novolac resin, bisphenol A novolac resin, dicyclopentadiene phenol Resin, phenol aralkyl resin, naphthol novolac resin, terpene phenol resin, heavy oil modified phenol resin, brominated phenol novolac resin and other phenols, various benzenes and benzophenones, butadiene Polyvalent phenolic resin, aniline, phenylenediamine, toluidine, xylidine, diethyl hydrazine obtained by condensation reaction of various aldehydes such as diphenylglyoxal Phenylenediamine, diaminodiphenylmethane, diaminodiphenylethane, diaminodiphenylpropane, diaminodiphenyl ketone, diaminodiphenyl sulfide, diaminodiphenyl sulfide Diaminodiphenyl sulfone, bis(aminophenyl)anthracene Diaminodiethyldimethylmethane, diaminodiphenyl ether, diaminophenylhydrazine, diamine biphenyl, dimethyldiamine biphenyl, biphenyltetramine , bisaminophenyl onion, bisaminophenoxybenzene, bisaminophenoxyphenyl mystery, bisaminophenoxyphenyl, bisaminophenoxybenzene, bisaminobenzene An amine compound such as oxyphenylpropene or diaminonaphthalene. The phosphorus content of the phosphorus-containing epoxy resin used in the present invention is preferably from 0.3 to 4% by weight, more preferably from 0.5 to 3.6% by weight, still more preferably. The content of phosphorus in the organic component of the phosphorus-containing epoxy resin composition containing the phosphorus-containing epoxy resin is preferably from 1.0 to 4% by weight, more preferably from 0.4 to 3.5% by weight, based on 1.0 to 3.1% by weight. More preferably, it is 0.6 to 3% by weight. Organic component in phosphorus-containing epoxy resin composition 15 200946553 ,. When the amount of the right amount is 0.2% by weight or less, it is difficult to ensure flame retardancy, and if it is 5% by weight or more, the heat resistance is adversely affected. Therefore, it is preferably adjusted to 0.2% by weight to 4% by weight. Further, the epoxy equivalent of the phosphorus-containing epoxy resin used in the present invention is preferably 1,500 g/eq', more preferably 25 Å to 1 〇〇〇 g/eq, still more preferably 3 Å. At 200 g/eq, if the adhesion deteriorates by more than 15 〇〇g/eq, the heat resistance may be adversely affected. Therefore, it is preferably adjusted to 200 to 1500 g/eq. The phosphorus-containing epoxy resin composition of the present invention As the hardener, various hardeners for epoxy resins which are generally used, such as phenolic laurels, acid livers, amines, hydrazines, and acid vinegars, can be used, and the hardeners can be used only for the sclerosing agent. Two or more types can be used. The phosphorus-containing epoxy resin composition of the present invention may be blended with a hardening accelerator such as a tertiary amine, a tertiary ammonium salt, a phosphine or an imidazole, as needed. The scaly epoxy resin composition of the present invention can also be used as an adjustment for viscosity by using an organic solvent. Examples of the usable organic solvent include ethers such as guanamines such as N,N-dimethylformamide and ethers such as ethyl ketone monodecyl ether, oximes such as nets and methyl hydrazine, alcohols such as methanol and ethanol, and benzene and hydrazine. An aromatic hydrocarbon such as benzene may be used alone or in combination of two or more kinds, and the epoxy resin concentration may be 30 to 80 parts by weight. / Range of 〇. The filler used in the phosphorus-containing epoxy resin composition of the present invention may, for example, be aluminum arsenide, magnesium hydroxide, talc, calcined talc, clay, kaolin, titanium oxide, glass powder, finely divided cerium oxide, or fused silica. An inorganic filler such as oxidized, crystalline cerium oxide or silica balloon may be blended with a pigment or the like. Reasons for using a general inorganic filler are, for example, improved impact resistance. 200946553 When using a metal hydroxide such as Hydrazine or Hydrogen, it acts as a flame retardant, and gp #人a can ensure flame retardancy even when the amount of phosphorus is small. Especially if it is equipped. When the amount is not more than 1 〇 /〇, the effect of impact resistance is small. However, if the compounding amount exceeds 150 /. Then, as a necessary item for the use of the laminate, the adhesion will be lowered. Further, the resin composition may contain an organic filler such as cerium oxide, glass fiber, pulp fleur, synthetic fiber, or fibrous H-dimensional filler, microparticle rubber or thermoplastic elastomer. The material for the electronic circuit board obtained by the above-mentioned phosphorus-containing epoxy resin composition may be a resin sheet, a resin-attached metal case, a prepreg or a laminate. The method for producing the resin sheet is not particularly limited. For example, a carrier film which is not dissolved in the epoxy resin composition such as a polyester film or a polyamide film, and the above-mentioned phosphorus-containing epoxy resin composition is preferably 5~ After the thickness of 1 〇〇〆m, it is heated and dried at 100 to 200 ° C for 1 to 40 minutes to form a sheet. The resin sheet is generally formed by a method called casting. At this time, if the sheet coated with the phosphorus-containing epoxy resin composition is subjected to surface treatment with a release agent in advance, the resin sheet formed into the φ type can be easily peeled off. Here, the thickness of the resin sheet is preferably set to 5 to 80 / X m °. Next, the resin-attached metal foil obtained by using the above phosphorus-containing epoxy resin composition will be described. As the metal foil, a single, alloy, or composite metal foil such as copper, aluminum, brass, or nickel can be used. It is preferable to use a metal foil having a thickness of 9 to 7 μm. The method of producing a resin-attached metal foil from a flame-retardant resin composition containing a phosphorus-containing epoxy resin and a metal foil is not particularly limited, and for example, coating the surface of the metal foil with a roll coater After the resin varnish having the viscosity-adjusted viscosity of the phosphorus epoxy resin composition, the resin is subjected to heat drying to semi-harden (B-stage) the fat component of the tree 17 200946553 to form a resin layer. When the resin component is semi-hardened, for example, it may be heated at 100 to 20 (rc heating 丨~仂 minutes. Here, the thickness of the resin portion of the metal pig to which the resin is attached is preferably 5 to 110. Next, (4) using the above A prepreg obtained by a scaly epoxy resin composition. The sheet-like substrate may be an inorganic material such as glass, a polyester, or the like, a polyamine, a polyacrylamide, a polyimine, or a Kevlar fiber. The woven fabric or the non-woven fabric of the fiber is not limited thereto. The method for producing the prepreg from the epoxy resin composition and the substrate is not particularly limited, and for example, the substrate is impregnated and impregnated into the ring. After the oxygen resin composition is subjected to a resin varnish whose viscosity has been adjusted by a solvent, it is heated (4). The resin component is semi-cured (B-staged), for example, it can be dried for 1 to 4 minutes. Here, the amount of the resin in the prepreg is preferably from 3 to 8 % by weight based on the resin component. Next, a resin sheet, a metal case with a resin, a prepreg or the like may be used to produce a laminate. Method In the case of prepreg to form a laminate, one or several sheets of prepreg are laminated, and metal pigs are arranged on one side or both sides to form a laminate, and the laminate is heated and pressurized to be laminated. Here, the metal box can be made of copper, aluminum, brass, nickel, etc. alone, alloy, composite metal. The condition of heating and pressurizing the laminate can be 'under the condition that the epoxy resin composition will harden. If the pressure is relatively low, the pressure is likely to remain in the interior of the obtained laminate. The electrical characteristics may be lowered. Therefore, it is preferable to pressurize under the condition that the formability is satisfied. The set temperature is 16〇~2赃, the pressure 18 200946553 is 49.0~490.3N/cm2 (5~50kgf/cm2), and the heating and pressing time is 4〇~24〇 minutes. The single-layer laminated board thus obtained can be further used as The inner layer is made of a multi-layered board. In this case, first, the laminated board is subjected to circuit formation by an addiction method, a subtractive method, or the like, and the formed circuit surface is treated with an acid solution to impart blackening. Processing 'acquired a layer. The circuit forming surface on one side or both sides of the inner layer is formed of a resin sheet, a resin-attached metal V#, or a prepreg to form an insulating layer ' while forming a β conductor layer on the surface of the insulating layer to form a layer. In the case of forming an insulating layer from a resin sheet, a resin sheet is disposed on a circuit forming surface of a plurality of inner sheets to form a laminate. Alternatively, a resin sheet is disposed between the circuit forming surface of the inner layer and the metal foil to form a laminate. The laminate is then heated and pressurized to form a body of the resin sheet, thereby forming a cured product of the resin sheet as an insulating layer, and at the same time forming a multilayer of the inner layer material, or an inner layer material and a layer as a guide layer. The cured product of the resin sheet is formed as an insulating layer between the metal foils. Here, the metal case can be the same as that used for the laminated board used as the inner layer. And heating and shaping can be carried out under the same conditions as the formation of the inner layer. When the resin is coated on the laminate to form an insulating layer, the epoxy resin composition containing the composition or the flame retardant epoxy resin composition containing the epoxy resin containing phosphorus is applied to preferably 5 The thickness of the ~100 em is used as the outermost layer of the inner layer material to form the surface resin'. Then, it is dried by heating for 1 to 90 minutes to form a sheet. It is generally formed by a method called casting. The thickness after drying is preferably formed to be 5 to 80/zm. Through-hole formation and circuit formation may be applied to the surface of the multilayered laminate thus formed by addition and subtraction to form a printed wiring board. 19 200946553 Further, by repeating the above-described method by using this printed wiring board as an inner layer material, a multilayered multilayer board can be further formed. In the case where the insulating layer is formed of a metal foil with a resin, the metal foil with the resin is placed on the inner layer so that the resin layer of the metal foil with the resin and the circuit forming surface of the inner layer are opposed to each other. The circuit forms a face' to form a laminate. Then, the laminate is formed by heat and pressure, and a cured product of a resin layer of a resin-attached metal foil is formed as an insulating layer' while forming a metal foil on the outer side thereof as a conductor layer. Here, the heat press molding can be carried out under the same conditions as the formation of the inner layer. In the case where the insulating layer is formed of a prepreg, the prepreg ® sheet or a plurality of layers are placed on the circuit forming surface of the inner layer, and the metal foil is placed on the outer side to form a laminate. Then, the laminate is heated and pressed into a single body to form a cured product of the prepreg as an insulating layer, and a metal foil on the outer side thereof is formed as a conductor layer. Here, the metal foil can be used in the same manner as the user who uses the laminate as the inner layer. Further, the heat and pressure forming can be carried out under the same conditions as the formation of the inner layer. A through-hole formation and circuit formation may be applied to the surface of the multilayered laminate thus formed by an additive method, a subtractive method, and a printed wiring board. Further, by repeating the above-described method by using the printed wiring board as an inner layer material, a plurality of layers of the multilayer board can be formed. As a result of evaluating the properties of the laminate obtained by using the phosphorus-containing epoxy resin of the present invention and the composition, the content of the compound represented by the formula (2) was 5.5% by weight. The dish-containing epoxy resin obtained by reacting the compound represented by the following formula (1) with an epoxy resin is highly reactive with a curing agent; and the prepreg having a good balance between fluidity and hardenability of the resin during curing. 20 200946553 The laminate obtained by heat-hardening the prepreg is a resin composition which does not contain a sinter compound and has flame retardancy and is excellent in solder heat resistance. EXAMPLES The present invention will be specifically described by way of Examples and Comparative Examples, but the present invention is not limited thereto. The content of the compound represented by the formula (2) contained in the compound represented by the formula (1) is measured by HPLC. A device of Agilentl 10 〇series made by Hewlett • Packerd was used, and a column of CD006 of Cadenza CD-C1 8 made by Imtakt was used. The eluate was measured using water and methanol' starting with 60% sterol and gradient to sterol 100% at 16 minutes. The flow rate was set to 0 5 ml/min, and the measurement was carried out at a wavelength of 266 nm using a uv detector. Also 'flame retardance is based on uL (Underwriter

Laboratories)規格進行測定。清漆凝膠時間係以16〇〇c進行 測定。銅箔剝離強度係依據jIS C 648 1 5·7,層間接著力係 依據JIS C 6481 5.7於預浸材料i片與剩下的3片之間進行 Q 剝離來測定。焊接耐熱性係依據JIS C 6481 5.5於280°C實 施,以目視觀察有無膨脹或剝離,無膨脹或剝離者記為〇, 有者記為X。又,硬化物之玻璃轉移溫度、硬化發熱量係以 精工儀器股份有限公司製之Exster 6000進行測定。硬化發 熱量保持率,係將剛做成後之預浸材料的總硬化發熱量訂 為100°/❶時,將保存於60。(: 72小時後之預浸材料的總硬化 發熱量以百分率求出,故數字越小表示儲藏安定性越差。 (通式(2)所示之化合物的結構確認) 通式(1)之化合物方面,係測定結構式1所表示之 21 200946553 HCA-HQ之HPLC。且將其分取,將硬化反應之延遲成分取Laboratories) specifications were measured. The varnish gel time was measured at 16 °c. The copper foil peeling strength was measured in accordance with JIS C 648 1 5·7, and the interlayer adhesion force was measured by Q peeling between the prepreg i sheet and the remaining three sheets in accordance with JIS C 6481 5.7. The solder heat resistance was carried out at 280 ° C according to JIS C 6481 5.5, and the presence or absence of swelling or peeling was visually observed, and those without swelling or peeling were referred to as 〇, and others were designated as X. Further, the glass transition temperature and the hardening calorific value of the cured product were measured by Exster 6000 manufactured by Seiko Instruments Co., Ltd. The hardening heat retention rate is stored at 60 when the total hardening heat of the prepreg immediately after the finishing is set to 100 ° / ❶. (: The total hardening heat of the prepreg after 72 hours is obtained as a percentage, so the smaller the number, the worse the storage stability. (Structure confirmation of the compound represented by the general formula (2)) For the compound, the HPLC of 21 200946553 HCA-HQ represented by Structural Formula 1 is determined, and the delayed component of the hardening reaction is taken.

出’以FD-MASS、FTIR、質子NMR進行測定。由MASSThe measurement was carried out by FD-MASS, FTIR, and proton NMR. By MASS

之測定結果得知分子量為324,將FTIR之結果與hCA-HQ 做比較’確認到酚性羥基的減少、苯三取代物的減少、苯 二取代物的增加。由質子NMR的結果確認到對來自苯二盼 之羥基於p位鍵結有HC A。由以上可確認13.6分鐘之峰值 係結構式3。通式(1)之化合物方面,1〇_(2,7·二經基蔡基) 二氫-9-氧基-10-麟雜菲-1〇_氧化物亦進行相同八 、J刀析,確细 到結構式4之成分。 $ % 結構式 結構式4 〇As a result of the measurement, it was found that the molecular weight was 324, and the result of FTIR was compared with hCA-HQ. It was confirmed that the phenolic hydroxyl group was decreased, the benzene trisubstituted product was decreased, and the benzene disubstituted product was increased. From the results of proton NMR, it was confirmed that HC A was bonded to the hydroxyl group derived from benzophenone at the p site. From the above, it was confirmed that the peak value of 13.6 minutes was the structural formula 3. In the case of the compound of the formula (1), 1〇_(2,7·di-based zeoyl)dihydro-9-oxy-10-linofan-1〇-oxide is also subjected to the same eight It is fine to the composition of Structure 4. $ % structured structure 4 〇

〇 Η 合成例1 於具備攪拌裝置、溫度計、冷卻營、 口玻璃製可分離式燒瓶填入作為 導入裝置之4 mi)所表示之扎入 之化合物之 22 200946553 HCA HQ 31.72重量份、YDF l7〇 68 28重量份,於氣環境 下,進行加熱至12Gt。添加作為觸媒之三苯基膦⑶重 於崎反應4小時。通式⑴所表示之化合物之純 99.5重量%。反應系統所含之通式⑺所表示之化合 具體而言即結構式3所表示之化合物之含量為0 〇〇3重 量二,之環氧樹脂之環氧當量為做含構 3.0重量%。 ❹ ❹ 合成例2 除了使用含有通式(2)所表示之化合物,具體而言即結 式3所表示之化合物〇17重量%之通式⑴所表示之化合 物HC_A HQ之外,係進行與合成例i相同之操作。通式 所表示之化合物之純度為…重量%。反應系統所含之通 =所表示之化合物之含量為〇〇5重量所得之環氧樹 知之環氧虽量為484.lg/eq,含填率為3〇重量%。 合成例3 除了使用含有通式(2)所表示之化合物,具體而言即結 構式3所表示之化合物〇33重量%之通式⑴所表示之化合 物HCA-HQ之外’係進行與合成例i相同之操作。通式 所表示之化合物之純度為991重量%。反應系統所含之通 式(2)所表示之化合物之含晋主壬專。/ 為〇·10重量%。所得之環氧樹 月曰之環氧當篁為488.4g/eq,含磷率為3 〇重量%。 合成例4 除了使用3有通式⑺所表示之化合物’具體而言即結 式3所表示之化合物G.65重量%之通式⑴所表示之化合 23 200946553 物HCA-HQ之外,係進行與合成例i相同之操作。通式 所表示之化合物之純度為98 7重量%。反應系統所含之通 式(2)所表示之化合物之含量為〇21重量% ^所得之環氧樹 脂之環氧當量為488.3g/eq,含麟率為3.0重量0/〇。 合成例5 除了使用含有通式(2)所表示之化合物,具體而言即結 構式3所表示之化合物〇95重量%之通式(1)所表示之化合 物HCA-HQ之外,係進行與合成例i相同之操作。通式 所表示之化合物之純度為98.2重量%。反應系統所含之通 〇 式(2)所表示之化合物之含量為〇 3〇重量。/(^所得之環氧樹 脂之環氧當量為487.7g/eq ’含碟率為3.0重量%。 合成例6 除了使用含有通式(2)所表示之化合物,具體而言即結 構式3所表示之化合物12〇重量%之通式所表示之化合 物HCA-HQ之外,係進行與合成例i相同之操作。通式 所表示之化合物之純度為97.9重量%。反應系統所含之通 ❹ 式(2)所表示之化合物之含量為〇.38重量所得之環氧樹 脂之環氧當量為486.3g/eq,含磷率為3.0重量%。 合成例7 於與合成例1相同之裝置填入HCA杳21 15重量份與 甲苯50重量份’於氮環境下,進行加溫至75<t,並溶解之。 於此以分鐘每次少量地填入對苯醌 (parabenz〇qUin〇ne)10.47重量份,以85t保持3〇分鐘後昇 溫,以還流溫度進行反應3小時。所生成之通式所表示 24 200946553 之化合物HCA-HQ所含之通式(2)所表示之化合物,具體而 言即結構式3所表示之化合物之含有率為2.40重量°/^又, 通式(1)所表示之化合物之純度為95 〇重量%。於此填入 68.39重量份之YDF_17〇,加溫至,將甲苯還流除去。 反應系統所含之通式(2)所表示之化合物之含量為〇.76重量〇Η Synthesis Example 1 In a detachable flask equipped with a stirring device, a thermometer, a cooling slab, or a mouth glass, the compound shown in 4 mi) as an introduction device was filled in. 200946553 HCA HQ 31.72 parts by weight, YDF l7〇 68 28 parts by weight, heated to 12 Gt in an atmosphere. Triphenylphosphine (3) as a catalyst was added to react for 4 hours. The purity of the compound represented by the formula (1) was 99.5% by weight. The compound represented by the formula (7) contained in the reaction system is specifically that the content of the compound represented by the structural formula 3 is 0 〇〇 3 by weight 2, and the epoxy equivalent of the epoxy resin is 3.0% by weight. ❹ ❹ Synthesis Example 2 Except for the compound HC1A HQ represented by the formula (1), which is a compound represented by the formula (2), specifically, 17% by weight of the compound represented by the formula 3, Example i the same operation. The purity of the compound represented by the formula is ...% by weight. The amount of the compound represented by the reaction system is 4845 by weight, and the amount of the epoxy compound is 484.lg/eq, and the filling ratio is 3% by weight. Synthesis Example 3 In addition to the use of the compound represented by the formula (2), specifically, the compound represented by the formula 3, 33% by weight of the compound represented by the formula (1), HCA-HQ i the same operation. The compound represented by the formula has a purity of 991% by weight. The compound represented by the general formula (2) contained in the reaction system contains the main ingredient. / is 〇·10% by weight. The epoxy of the obtained epoxy tree was 958.4 g/eq, and the phosphorus content was 3 〇% by weight. Synthesis Example 4 Except that the compound represented by the formula (7) is used, specifically, the compound represented by the formula (3) represented by the formula 3, G.65% by weight, represented by the formula (1), the compound 23, 200946553, HCA-HQ, is carried out. The same operation as in Synthesis Example i. The compound represented by the formula has a purity of 98% by weight. The content of the compound represented by the formula (2) contained in the reaction system was 〇21% by weight. The epoxy equivalent of the obtained epoxy resin was 488.3 g/eq, and the lining rate was 3.0% by weight. Synthesis Example 5 In addition to the compound HCA-HQ represented by the formula (1), which is a compound represented by the formula (2), specifically, 95% by weight of the compound represented by the structural formula 3, The same operation as in Synthesis Example i. The purity of the compound represented by the formula was 98.2% by weight. The content of the compound represented by the formula (2) contained in the reaction system is 〇 3 〇 by weight. The epoxy equivalent of the epoxy resin obtained by the method was 487.7 g/eq', and the disc content was 3.0% by weight. Synthesis Example 6 In addition to the compound represented by the formula (2), specifically, the formula 3 was used. The same procedure as in the synthesis example i was carried out except for the compound HCA-HQ represented by the formula of 12% by weight of the compound. The purity of the compound represented by the formula was 97.9% by weight. The reaction system contained the wanted The epoxy resin equivalent weight of the epoxy resin obtained by the compound represented by the formula (2) was 486.3 g/eq, and the phosphorus content was 3.0% by weight. Synthesis Example 7 The same apparatus as in Synthesis Example 1 was used. 15 parts by weight of HCA 杳 21 and 50 parts by weight of toluene were heated to 75 lt. t under nitrogen atmosphere, and dissolved therein. In this case, a small amount of parabenz〇qUin〇ne was filled in minutes. 10.47 parts by weight, the temperature was raised at 85 t for 3 minutes, and the reaction was carried out for 3 hours at a reflux temperature. The compound represented by the formula (2) contained in the compound HCA-HQ of 24 200946553, represented by the formula, was specifically That is, the content of the compound represented by Structural Formula 3 is 2.40% by weight / ^ Further, the purity of the compound represented by the formula (1) is 95% by weight, and 68.39 parts by weight of YDF_17〇 is filled therein, and the mixture is heated to remove the toluene. The reaction system contains the formula (2). The content of the compound expressed is 〇.76 weight

%°添加三苯基砜(triphenylsulf〇ne)0.32重量份,於160°C%° added triphenylsulfone (0.32 parts by weight) at 160 ° C

反應4小時。所得之環氧樹脂之環氧當量為470.2g/eq,含 麟率為3.0重量%。 合成例8 於與合成例1相同之裝置填入3 1.09重量份之通式(2) 所表示之化合物HCA-HQ(通式(2)所表示之化合物具體而言 即結構式3所表示之化合物之含有率為〇 〇1重量%)、〇 63 重量份之HCA、68.28重量份之YDF_17〇,並進行與合成例 1相同之操作。相對於所填入之HCA與HC AHQ之合計, 通式(1)所表示之化合物之純度為97_3重量%。反應系統所 含之通式(2)所表示之化合物之含量為〇 〇〇3重量% "斤得之 裒氧樹知之環氧當量為480.3g/eq,含碟率為3 〇重量〇/〇。 合成例9 除了使用26.86重量份之通式(2)所表示之化合物(具體 而言即結構式4所表示之化合物)之含量為〇15重量%之通 式(1)所表示之化合物(具體而言即結構式2所表示之化合 物)、73.14重量份之YDF_817G之外,係進行與合成例ι相 同之操作。通式⑴所表示之化合物所表示之化合物之純度 為9〇·1重量%。反應系統所含之通式(2)所表示之化合物之 25 200946553 含量為0.04重量%。所得之環氧樹脂之環氧當量為 321.8g/eq,含磷率為2.2重量%。 合成例10 除了使用含有通式(2)所表示之化合物,具體而言即結 構式3所表示之化合物3.10重量%之通式(1)所表示之化合 物HCA-HQ之外,係進行與合成例1相同之操作。通式(1) 所表示之化合物之純度為93.0重量%。反應系統所含之通 式(2)所表示之化合物之含量為0.98重量%。所得之樹脂之 環氧當量為471.1g/eq,含磷率為3.0重量%。 ® 合成例11 於與合成例1相同之裝置填入21.15重量份之HCA與 4〇重量份之甲苯,於氮環境下,加溫至75〇c,並溶解之。 填入69.13重量份之YDF-170並溶解之,並且以2小時每 次少量地添加對苯醌9.73重量份。添加結束後,於還流溫 度保持3小時後’將曱苯還流除去,添加〇 32重量份之三 笨基膦並於160反應4小時。通式(1)所表示之化合物 HCA-HQ所含之通式(2)所表示之化合物之含有率為3 5〇重 量%。通式(1)所表示之化合物之純度為69.4重量%。反應 系統所含之通式(2)所表示之化合物之含量為1〇8重量%。 所得之環氧樹脂之環氧當量為444.4g/eq,含磷率為3 〇重 量%。 合成例1 2 除了使用含有通式(2)所表示之化合物,具體而言即結 構式4所表示之化合物26〇重量%之通式⑴所表示之化合 26 200946553 物,具體而言即結構式2所表示之化合物之外’係進行與 合成例9相同之操作。通式(1)所表示之化合物之純度為77.0 重量%。反應系統所含之通式(2)所表示之化合物之含量為 〇·7〇重量%»所得之環氧樹脂之環氧當量為321.4g/eq,含 碟率為2.2重量%。 依據表1及表2所示之配合處方,配合各合成例所得 之環氧樹脂 、二氰二胺(dicyandiamide)硬化劑、咪唑硬化促 ❾ 進劑,並溶解於溶劑以進行積層板評估。將實施例1〜9、比 較例1〜3之結果整理於表1及表2。依據表3所示之配合處 方’配合苯酚酚醛清漆樹脂硬化劑、咪唑硬化促進劑,並 '谷解於溶劑’進行依凝膠時間之反應性評估。將實施例 10〜12、比較例4之結果整理於表;^表4中係將實施例13 與比較例5中調整觸媒量將凝膠時間配合成同程度時之儲 藏安疋性評估係整理成硬化發熱量保持率。Reaction for 4 hours. The epoxy resin obtained had an epoxy equivalent of 470.2 g/eq and a lining rate of 3.0% by weight. Synthesis Example 8 In the same apparatus as in Synthesis Example 1, 3.09 parts by weight of the compound represented by the formula (2) HCA-HQ was filled in (the compound represented by the formula (2) is specifically represented by the structural formula 3 The content of the compound was 〇〇1% by weight, 〇63 parts by weight of HCA, and 68.28 parts by weight of YDF_17〇, and the same operation as in Synthesis Example 1 was carried out. The purity of the compound represented by the formula (1) is 97 to 3% by weight based on the total of the HCA and HC AHQ to be filled. The content of the compound represented by the formula (2) contained in the reaction system is 〇〇〇3 wt% " The epoxy equivalent of the oxime tree is 480.3 g/eq, and the disc content is 3 〇 weight 〇/ Hey. Synthesis Example 9 A compound represented by the formula (1) in which the content of the compound represented by the formula (2) (specifically, the compound represented by the structural formula 4) was 〇15% by weight, using 26.86 parts by weight. The same operation as in Synthesis Example 1 was carried out except that 73.14 parts by weight of YDF_817G was used as the compound represented by Structural Formula 2. The compound represented by the formula (1) has a purity of 9 〇·1% by weight. The content of the compound represented by the formula (2) contained in the reaction system of 25 200946553 was 0.04% by weight. The epoxy resin obtained had an epoxy equivalent of 321.8 g/eq and a phosphorus content of 2.2% by weight. Synthesis Example 10 Except for the compound HCA-HQ represented by the formula (1), which is a compound represented by the formula (2), specifically, 3.10% by weight of the compound represented by the formula 3, Example 1 is the same operation. The purity of the compound represented by the formula (1) was 93.0% by weight. The content of the compound represented by the general formula (2) contained in the reaction system was 0.98% by weight. The obtained resin had an epoxy equivalent of 471.1 g/eq and a phosphorus content of 3.0% by weight. ® Synthesis Example 11 Into the same apparatus as in Synthesis Example 1, 21.15 parts by weight of HCA and 4 parts by weight of toluene were charged, and the mixture was heated to 75 ° C under a nitrogen atmosphere, and dissolved. 69.13 parts by weight of YDF-170 was filled in and dissolved, and 9.73 parts by weight of p-benzoquinone was added in small portions every 2 hours. After the end of the addition, the benzene was further removed after the reflux temperature was maintained for 3 hours, and 32 parts by weight of hydrazine was added and reacted at 160 for 4 hours. The content of the compound represented by the formula (2) contained in the compound represented by the formula (1) HCA-HQ is 35 wt%. The purity of the compound represented by the formula (1) was 69.4% by weight. The content of the compound represented by the formula (2) contained in the reaction system is 1 8% by weight. The epoxy resin obtained had an epoxy equivalent of 444.4 g/eq and a phosphorus content of 3 〇 by weight. Synthesis Example 1 2 In addition to the compound represented by the formula (2), specifically, the compound represented by the formula 4, 26% by weight of the compound represented by the formula (1), the compound 26 200946553, specifically, the structural formula The procedure other than the compound represented by 2 was carried out in the same manner as in Synthesis Example 9. The purity of the compound represented by the formula (1) was 77.0% by weight. The content of the compound represented by the formula (2) contained in the reaction system was 〇·7 〇% by weight. The obtained epoxy resin had an epoxy equivalent of 321.4 g/eq and a disk content of 2.2% by weight. According to the formulation shown in Tables 1 and 2, an epoxy resin, a dicyandiamide hardener, an imidazole hardening accelerator obtained in each synthesis example, and dissolved in a solvent were used for evaluation of a laminate. The results of Examples 1 to 9 and Comparative Examples 1 to 3 were summarized in Tables 1 and 2. According to the compounding position shown in Table 3, the phenol novolac resin hardener, the imidazole hardening accelerator, and the 'gluten solution in the solvent' were evaluated for reactivity according to the gel time. The results of Examples 10 to 12 and Comparative Example 4 are summarized in the table; in Table 4, the storage ampoules evaluation system in the case where the catalyst amount is adjusted to the same degree in Example 13 and Comparative Example 5 is used. Finished into a hardening heat retention rate.

27 200946553 表1 實施例1 實施例2 實施例3 實施例4 實施例5 所使用之樹脂 合成例1 合成例2 合成例3 合成例4 合成例5 通式1之化合物的種類 HCA-HQ HCA-HQ HCA-HQ HCA-HQ HCA-HQ 通式1之化合物 重量份 31.72 31.72 31.72 31.72 31.72 通式1之化合物之純度 重量% 99.5 99.4 99.1 98.7 98.2 YDF-170 重量份 68.28 68.28 68.28 68.28 68.28 反應系統中所含之通式 2化合物的比例 重量% 0.003 0.05 0.10 0.21 0.30 反應系統中所含之通式 2化合物的比例(重量%) 除以磷含有率(重量%) - 0.001 0.02 0.03 0.07 0.10 環氧當量 g/eq 480.0 484.1 488.4 488.3 487.7 磷含量 重量% 3 3 3 3 3 合成例所得之環氧樹脂 重量份 100.0 100.0 100.0 100.0 100.0 DICY 重量份 2.19 2.17 2.15 2.15 2.15 2E4MZ 重量份 0.05 0.05 0.05 0.05 0.05 清漆凝膠時間 秒 458 453 556 625 716 玻璃轉移溫度(TMA) "C 117.8 115.7 116.0 114.7 113.8 銅箔剝離強度 kgf^cm 1.98 1.94 1.85 1.81 1.75 層間接著力 kg^cm 2.43 2.31 2.61 2.69 2.25 焊接耐熱性 外觀 〇 〇 〇 〇 〇 難燃性 UL-94 V-0 V-0 V-0 V-0 V-0 實施例6 實施例7 實施例8 比較例1 比較例2 所使用之樹脂 合成例6 合成例7 合成例8 合成例10 合成例11 通式1之化合物的種類 HCA-HQ HCA-HQ HCA-HQ HCA-HQ HCA-HQ 通式1之化合物 重量份 31.72 31.62* 31.09 31.72 30.88* 通式1之化合物之純度 重量% 97.9 95.0 97.3 93.0 69.4 YDF-170 重量份 68.28 68.39 68.28 68.28 69.13 反應系統中所含之通式 2化合物的比例 重量% 0.38 0.76 0.003 0.98 1.08 反應系統中所含之通式 2化合物的比例(重量%) 除以磷含有率(重量%) - 0.13 0.25 0.001 0.33 0.36 環氧當量 g/eq 486.3 470.2 480.3 471.1 444.4 磷含量 重量% 3 3 3 3 3 合成例所得之環氧樹脂 重量份 100.00 100.00 100.00 100.00 100.00 DICY 重量份 2.16 2.23 2.19 2.23 2.37 2E4MZ 重量份 0.50 0.50 0.50 0.50 0.50 清漆凝膠時間 秒 802 891 540 1160 1520 玻璃轉移溫度(TMA) °C 105.5 103.8 111.2 101.3 99.2 銅箔剝離強度 kgf7cm 1.86 1.82 1.72 1.61 1.54 層間接著力 kgf/cm 2.14 2.59 2.03 2.02 1.77 焊接耐熱性 外觀 〇 〇 〇 X X 難燃性 UL-94 V-0 V-0 V-0 ν·ο V-027 200946553 Table 1 Example 1 Example 2 Example 3 Example 4 Example 5 Resin Synthesis Example 1 Synthesis Example 2 Synthesis Example 3 Synthesis Example 4 Synthesis Example 5 Type of Compound of Formula 1 HCA-HQ HCA- HQ HCA-HQ HCA-HQ HCA-HQ Compound of formula 1 parts by weight 31.72 31.72 31.72 31.72 31.72 Purity of compound of formula 1 wt% 99.5 99.4 99.1 98.7 98.2 YDF-170 parts by weight 68.28 68.28 68.28 68.28 68.28 In the reaction system Proportion by weight of the compound of the formula 2: 0.003 0.05 0.10 0.21 0.30 Ratio of the compound of the formula 2 contained in the reaction system (% by weight) divided by the phosphorus content (% by weight) - 0.001 0.02 0.03 0.07 0.10 Epoxy equivalent g /eq 480.0 484.1 488.4 488.3 487.7 Phosphorus content Weight % 3 3 3 3 3 Epoxy resin parts obtained by synthesis Example 100.0 100.0 100.0 100.0 100.0 DICY Parts by weight 2.19 2.17 2.15 2.15 2.15 2E4MZ Parts by weight 0.05 0.05 0.05 0.05 0.05 Varnish gel time Second 458 453 556 625 716 Glass Transfer Temperature (TMA) "C 117.8 115.7 116.0 114.7 113.8 Copper foil peel strength kgf^cm 1.98 1.94 1.85 1.81 1.75 Interlayer Then force kg^cm 2.43 2.31 2.61 2.69 2.25 Soldering heat resistance Appearance 〇〇〇〇〇 Flame retardancy UL-94 V-0 V-0 V-0 V-0 V-0 Example 6 Example 7 Example 8 Comparison Example 1 Comparative Example 2 Resin Synthesis Example 6 Synthesis Example 7 Synthesis Example 8 Synthesis Example 10 Synthesis Example 11 Kind of Compound of Formula 1 HCA-HQ HCA-HQ HCA-HQ HCA-HQ HCA-HQ Formula 1 Compound parts by weight 31.72 31.62* 31.09 31.72 30.88* Purity of compound of formula 1 wt% 97.9 95.0 97.3 93.0 69.4 YDF-170 parts by weight 68.28 68.39 68.28 68.28 69.13 proportion by weight of compound of formula 2 contained in the reaction system 0.38 0.76 0.003 0.98 1.08 Ratio of the compound of the formula 2 contained in the reaction system (% by weight) divided by the phosphorus content (% by weight) - 0.13 0.25 0.001 0.33 0.36 Epoxy equivalent g/eq 486.3 470.2 480.3 471.1 444.4 Phosphorus content Weight % 3 3 3 3 3 Epoxy resin parts obtained by the synthesis example 100.00 100.00 100.00 100.00 100.00 DICY parts by weight 2.16 2.23 2.19 2.23 2.37 2E4MZ parts by weight 0.50 0.50 0.50 0.50 0.50 varnish gel time seconds 802 891 540 1160 1520 glass Transfer temperature (TMA) °C 105.5 103.8 111.2 101.3 99.2 Copper foil peel strength kgf7cm 1.86 1.82 1.72 1.61 1.54 Interlayer adhesion force kgf/cm 2.14 2.59 2.03 2.02 1.77 Soldering heat resistance appearance 〇〇〇 XX Flame retardant UL-94 V-0 V-0 V-0 ν·ο V-0

胺 二媒 量氟觸 重二唑 計之咪 合製之 之司製 份公司 量限公 重有限 醗份有 苯股份 對de股 與bi成 份car化 量國 重本四 A日Z c YM HC4 I E *D2I 28 200946553 表2 實施例9 比較例3 所使用之樹脂 合成例9 合成例12 通式1之化合物的種類 HCA-NQ HCA-NQ 通式1之化合物 重量份 26.86 26.86 通式1之化合物之純度 重量% 90.1 77 YDF-8170 重量份 73.14 73.14 反應系統中所含之通式2化合物 的比例 重量% 0.04 0.70 反應系統中所含之通式2化合物 的比例(重量%)除以鱗含有率(重 量%) 0.02 0.32 環氧當量 g/eq 321.8 321.4 磷含量 重量% 2.2 2.2 合成例所得之環氧樹脂 重量份 100.00 ιαο.οο DICY 重量份 3.26 3.27 2E4MZ 重量份 0.5 0.5 清漆凝膠時間 秒 345 907 玻璃轉移溫度(TMA) °C 120.2 107.9 銅箔剝離強度 kgf/cm 1.66 1.44 層間接著力 kgj^cm 1.85 1.61 焊接耐熱性 外觀 〇 X 難燃性 UL-94 V-0 V-0 O DICY日本carbide股份有限公司製之二氰二胺 2E4MZ四國化成股份有限公司製之_ 口坐觸媒 29 200946553 表3 實施例10 實施例11 實施例12 比較例4 所使用之樹脂 合成例1 合成例4 合成例8 合成例10 通式1之化合物的種類 HCA-HQ HCA-HQ HCA-HQ HCA-HQ 通式1之化合物 重量份 31.72 31.72 31.72 31.72 通式1之化合物之純度 重量% 99.5 98.7 97.3 93.0 YDF-170 重量份 68.28 68.28 68.28 68.28 反應系統中所含之通式 2化合物的比例 重量% 0.003 0.21 0.003 0.98 反應系統中所含之通式 2化合物的比例(重量 %)除以磷含有率(重量 %) - 0.001 0.07 0.001 0.33 環氧當量 g/eq 480.0 488.3 480.3 471.1 破含量 重量% 3 3 3 3 合成例所得之環氧樹脂 重量份 100.00 100.00 100.00 100.00 BRG-557 重量份 21.67 21.30 21.65 22.08 2E4MZ 重量份 0.10 0.10 0.10 0.10 清漆凝膠時間 秒 311 528 368 945 DICY日本carbide股份有限公司製之二氱二胺 2E4MZ四國彳b成股份有限公司製之咪唑觸媒 30 200946553 表4 實施例13 比較例5 所使用之樹脂 合成例1 合成例10 通式1之化合物的種類 HCA-HQ HCA-HQ 通式1之化合物 重量份 31.72 31.72 通式1之化合物之純度 重量% 99.5 93.0 YDF-170 重量份 68.28 68.28 反應系統中所含之通式2化合物 的比例 重量% 0.003 0.98 反應系統中所含之通式2化合物 的比例(重量%)除以磷含有率(重 量%) - 0.001 0.33 環氧當量 g/eq 480.0 471.1 填含量 重量% 3 3 合成例所得之環氧樹脂 重量份 100.00 100.00 DICY 重量份 2.19 2.23 BRG-557 重量份 0.00 0.00 2E4MZ 重量份 0.50 1.20 清漆凝膠時間 秒 458 471 硬化發熱量保持率 % 70.8 51.1 DICY日本carbide股份有限公司製之二氰二胺 2E4MZ四國化成股份有限公司製之咪唑觸媒 由表1、2、3所記載之物性可明瞭,通式(2)所表示之 化合物之含有率若變高,則凝膠時間會顯著地變慢,對硬 化反應性造成影響。表1、表2中係以二氰二胺硬化劑進行 評估,表3中雖以苯酚酚醛清漆樹脂硬化劑進行評估,但 以任一之硬化劑進行,若通式(2)所表示之化合物之含有率 變高,則凝膠時間就會顯著地變慢,故不論硬化劑之種類 為何,皆會造成影響。此例如作成積層板的情況時,因樹 脂成分不足而發生接著力降低、遷移的發生、焊接浸潰時 31 200946553 之膨脹、破裂等不良 μ #丨 清况。又,因將凝膠時間調整成表4 ,,故増加硬化觸媒配合量的情況時,硬化發埶伴 持率會變小,而女M 叹赞”,、保 期保存等問題 預浸材料之儲藏安定性變差,而無法長 (產業利用性) ❹ 本發明藉由使用特徵為通式⑴所表示之化合物與環氧 ,脂類反應所得之料環氧樹脂中,反應前之系統中之通 :(2)所表不之化合物之含有率(重量%)除卩反應所得之含 環氧樹脂之切率(重量%)所得之値為G.3以下之含磷環 乳樹脂’而可提供-種不會延遲凝膠時間且接著力、耐遷 移、耐焊接浸潰性 '預浸材料之儲藏安定性優異之含填環 氧樹脂及電子電路基板用材。 明 說 單 簡 式 圖 t 無 ο 【主要元件符號說明】 無 32Amine two-volume FCA heavy diazole meter Mimi system company limited company weight limit 醗 shares benzene shares on de shares and bi components carization volume national weight this four A day Z c YM HC4 IE *D2I 28 200946553 Table 2 Example 9 Comparative Example 3 Resin Synthetic Example 9 Synthetic Example 12 Species of the compound of Formula 1 HCA-NQ HCA-NQ Compound of Formula 1 Part by weight 26.86 26.86 Compound of Formula 1 Purity wt% 90.1 77 YDF-8170 parts by weight 73.14 73.14 Proportion by weight of the compound of the formula 2 contained in the reaction system % by weight 0.04 0.70 The proportion (% by weight) of the compound of the formula 2 contained in the reaction system divided by the scale content ( % by weight 0.02 0.32 Epoxy equivalent g/eq 321.8 321.4 Phosphorus content Weight % 2.2 2.2 Epoxy resin parts obtained by synthesis Example 100.00 ιαο.οο DICY Parts by weight 3.26 3.27 2E4MZ Parts by weight 0.5 0.5 Varnish gel time seconds 345 907 Glass Transfer temperature (TMA) °C 120.2 107.9 Copper foil peel strength kgf/cm 1.66 1.44 Interlayer adhesion kgj^cm 1.85 1.61 Soldering heat resistance appearance 〇X Flame retardant UL-94 V-0 V-0 O DICY Japan carbi Made from dextran diamine 2E4MZ manufactured by Teko Co., Ltd. _ mouth catalyst 29 200946553 Table 3 Example 10 Example 11 Example 12 Comparative Example 4 Resin Synthesis Example 1 Synthesis Example 4 Synthesis Example 8 Synthesis Example 10 Kind of Compound of Formula 1 HCA-HQ HCA-HQ HCA-HQ HCA-HQ Compound of Formula 1 Parts by Weight 31.72 31.72 31.72 31.72 Purity of Compound of Formula 1 Weight % 99.5 98.7 97.3 93.0 YDF -170 parts by weight 68.28 68.28 68.28 68.28 Proportion by weight of the compound of the formula 2 contained in the reaction system % by weight 0.003 0.21 0.003 0.98 Ratio (% by weight) of the compound of the formula 2 contained in the reaction system divided by the phosphorus content (% by weight ) - 0.001 0.07 0.001 0.33 Epoxy equivalent g/eq 480.0 488.3 480.3 471.1 Broken content% by weight 3 3 3 3 Epoxy resin parts obtained by the synthesis example 100.00 100.00 100.00 100.00 BRG-557 parts by weight 21.67 21.30 21.65 22.08 2E4MZ parts by weight 0.10 0.10 0.10 0.10 varnish gel time seconds 311 528 368 945 DICY Japan Carbide Co., Ltd. dinoniamine 2E4MZ Shikoku 彳b into a company limited by Imidazole Catalyst 30 200946553 Table 4 Example 13 Comparative Example 5 Resin Synthetic Example 1 Synthetic Example 10 Type of Compound of Formula 1 HCA-HQ HCA-HQ Compound of Formula 1 Part by Weight 31.72 31.72 Formula 1 Purity of the compound Weight % 99.5 93.0 YDF-170 Parts by weight 68.28 68.28 Proportion by weight of the compound of the formula 2 contained in the reaction system % by weight 0.003 0.98 Ratio (% by weight) of the compound of the formula 2 contained in the reaction system divided by phosphorus Rate (% by weight) - 0.001 0.33 Epoxy equivalent g/eq 480.0 471.1 Filling content % by weight 3 3 Epoxy resin parts obtained by the synthesis Example 100.00 100.00 DICY Parts by weight 2.19 2.23 BRG-557 Parts by weight 0.00 0.00 2E4MZ Parts by weight 0.50 1.20 Varnish gel time 458 471 Hardening heat retention rate 70.8 51.1 DICY Japan Carbide Co., Ltd. dicyandiamide 2E4MZ Siguo Chemical Co., Ltd. The imidazole catalyst is described in Tables 1, 2, and 3. It is understood that when the content of the compound represented by the formula (2) is increased, the gel time is remarkably slowed, which affects the curing reactivity. Tables 1 and 2 are evaluated by dicyandiamide hardener, and in Table 3, although it is evaluated by a phenol novolak resin hardener, it is carried out by any hardener, and the compound represented by the formula (2) When the content rate is high, the gel time is remarkably slowed, so that it affects regardless of the type of the hardener. For example, in the case of a laminate, the adhesion of the adhesive is reduced due to insufficient resin component, and the occurrence of migration and the occurrence of defects such as expansion and cracking during the weld impregnation. In addition, since the gel time is adjusted to Table 4, when the amount of the curing catalyst is added, the compensatory ratio of the hardened hair strand becomes small, and the female M sighs, and the prepreg is preserved during the warranty period. The storage stability is deteriorated and cannot be long (industrial use). The present invention is used in a system before the reaction by using an epoxy resin obtained by reacting a compound represented by the general formula (1) with an epoxy or a lipid. (2) The content of the compound (% by weight) of the compound represented by the oxime reaction is obtained by the reaction rate (% by weight) of the epoxy resin obtained by the reaction. It is possible to provide a filled epoxy resin and an electronic circuit board material which are excellent in storage stability of the prepreg, which does not delay the gel time, and which has the same force, migration resistance, and solder dipping resistance. ο [Main component symbol description] No 32

Claims (1)

200946553 七、申請專利範圍·· 1. 一種含磷環氧樹脂之製造方法,其係用以製造通式(1) 所表示之化合物與環氧樹脂類反應所得之含磷環氧樹脂, 其特徵在於,反應前系統中之通式(2)所表示之化合物之含 有率(重量%)除以反應所得之含磷環氧樹脂之含磷率(重 %)所得之値為0.3以下: (R 1 ) (R2) - (ο) n_p = 〇 ⑴ I Η Ο—(B-hO Η (R 1 ) iR2) - (〇) n_p = 〇 ⑵ I O- (BJ-OH 式(1)以及式(2)中,R1,R2表示氫或烴基,且各自可為 相異或相同,可為直鏈狀、支鏈狀、環狀;又亦可R1 ^ 鍵結形成環狀結構;B表示苯、聯苯萘、蒽菲以及 該等之烴取代物之任一者;η為〇或i。 2. —種含磷環氧樹脂,其係由申請專利範圍第i 法所得者。 方 3. —種含磷乙稀基酯樹脂,其係使用有申請專利範圍 2項之含磷環氧樹脂。 4. 一種含磷環氧樹脂組成物,其係以申請專利範圍第2 項之含磷環氧樹脂作為必須成分,並配合硬化劑而成者。 5. —種自由基聚合性樹脂組成物,其係以申請專利範固 第3項之含磷乙烯基酯樹脂作為必須成分並配合自由基 聚合起始劑及/或硬化劑而成者。 33 200946553 6. 一種電子電路基板用材料,其係使用_請專利範圍第 4項之含磷環氧樹脂組成物所得者。 7. -種密封材料,其係使料請專利範圍第*項之含碟 環氧樹脂組成物所得者。 8. -種繞鑄材料,其係使用申請專利範圍第4項之含磷 環氧樹脂組成物所得者。 9. 一種硬化物,其係將申請專利範圍第4至8項中任_ 項之含磷環氧樹脂組成物、自由基聚合性樹脂組成物、電 子電路基板用材料、密封材料、澆鑄材料硬化所成者。 八、圖式: 無200946553 VII. Patent Application Range·· 1. A method for producing a phosphorus-containing epoxy resin, which is used for producing a phosphorus-containing epoxy resin obtained by reacting a compound represented by the general formula (1) with an epoxy resin, and characterized by The content (% by weight) of the compound represented by the formula (2) in the system before the reaction is divided by the phosphorus content (% by weight) of the phosphorus-containing epoxy resin obtained by the reaction, and the enthalpy is 0.3 or less: (R) 1) (R2) - (ο) n_p = 〇(1) I Η Ο—(B-hO Η (R 1 ) iR2) - (〇) n_p = 〇(2) I O- (BJ-OH formula (1) and formula ( 2), R1, R2 represents hydrogen or a hydrocarbon group, and each may be different or the same, may be linear, branched, or cyclic; or R1^ bond to form a cyclic structure; B represents benzene, Benzene naphthalene, fluorene, and any of the hydrocarbon substitutes; η is 〇 or i. 2. A phosphorus-containing epoxy resin obtained by the method of claim i. A phosphorus-containing ethyl ester resin using a phosphorus-containing epoxy resin having a patent application scope of 2. 2. A phosphorus-containing epoxy resin composition, which is based on the patent application scope 2 The phosphorus-containing epoxy resin is an essential component and is compounded with a hardener. 5. A radical polymerizable resin composition which is required to apply the phosphorus-containing vinyl ester resin of the third application of the patent. The composition is blended with a radical polymerization initiator and/or a hardener. 33 200946553 6. A material for an electronic circuit board, which is obtained by using a phosphorus-containing epoxy resin composition of the fourth aspect of the patent. 7. - A kind of sealing material, which is obtained from the material containing the epoxy resin composition in the scope of the patent. 8. - A kind of wound casting material, which uses the phosphorus-containing epoxy of the fourth application patent scope The resin composition is obtained by the use of the phosphorus-containing epoxy resin composition, the radically polymerizable resin composition, the electronic circuit board material, and the material of the electronic circuit board according to any one of claims 4 to 8. The sealing material and the casting material are hardened. VIII. Schema: None 3434
TW098101457A 2008-02-01 2009-01-16 Epoxy resin containing phosphorus, epoxy resin composition containing phosphorus and method for preparation thereof, and curing resin composition using said resin and said resin composition and cured product TWI491637B (en)

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KR100587483B1 (en) * 2005-03-11 2006-06-09 국도화학 주식회사 Non-halogen flame retardant and high heat resistant phosphorous-modified epoxy resin

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