200945411 九、發明說明： 【發明所屬之技術領域】 本發明係與真空濺鍍設備有關，特別是指一種用於連 續式真空濺鍍設備中旋轉被鍍物之非接觸式旋轉裝置。 5【先前技術】 在濺鍍(sputtering)相關技術中，目前業界所使用的鍵膜 設備大多為連續式(In-Line)多腔體(multi-chambers)的作業 流程，與傳統批次式(batch type)或晶圓式(wafer type)生產 方式比較，可大幅降低設備成本及廢房空間，極具量產經 ίο濟價值及產業競爭性。第一圖顯示一種習知連續式三腔體 的濺鍍設備的示意圖，其中包含有一入料腔體60、一減鑛 腔體62以及一出料腔體64等三個腔體，被鍍物66放置於 載具68内，而載具68則透過一動力輸出組7〇在這三個腔 體間移動。該濺鍍腔體62為進行濺鍍作業的區域。 I5 第一圖為一般滅鑛原理的不意圖，其中利用磁控賤鑛 陰極 72(magnetron sputtering cathode)將靶材 74 表面的鍍材 分子76轟擊出後，並進而沉積在被鍍物78表面上。由於 鍍材分子76被轟擊後是以直線路線前進，故只能對於被鑛 物單一正面進行鍍膜，因此一般常見被鍍物78表面是平面 2〇的。然，當被鍵物78的表面為不規則的曲面或多面向時(如 第二圖所示）’存在一些死角或面向是鑛材分子76無法轟擊 沉積的。 為解決鈿述問題，發明人曾提出一發明（本國發明專利 申請案號第096126031號申請案），其主要是在濺鍍腔體中 4 200945411 =置齒條’而在載具上的轉動桿—端^製齒輪，其上是供 °又置被錄物。當載具藉由動力輸出組驅動在賴腔體中移 動時’齒輪會㈣條齡，進而造成轉動桿，以及其上之 被鑛物同時旋轉，可提供可多面向鑛膜 ，如此被鑛物上之 5所有土面均可被鑛材分子轟擊沉積。 3 ^刚述之發明之優點在於未提供額外的動力源驅動轉動 ® 桿旋轉而疋巧妙地運用了原本用於驅動載具移動的動 力人使其連帶轉動轉動桿。然，我們發現到當齒輪與齒條 嗤α時會有磨耗發生，並產生一些粉塵微粒，這對於腔體 10内需要保持高度潔淨的漱锻作業是有影響的。 【發明内容】 本發明之主要目的在於提供一種連續式真空濺鍍設備 之非接觸式旋轉裝置，其可旋轉被鑛物而達到多 面向鑛 ❹15膜’且旋轉的過程t不會有粉塵微粒的產生。 . ，達成則述之發明目的，本發明所提供之連續式真空 雜設備之非接觸式旋轉裝置，主要是在腔體中設置一沿200945411 IX. DESCRIPTION OF THE INVENTION: TECHNICAL FIELD The present invention relates to a vacuum sputtering apparatus, and more particularly to a non-contact type rotating apparatus for rotating a substrate to be plated in a continuous vacuum sputtering apparatus. 5 [Prior Art] In the sputtering related technology, most of the key film devices currently used in the industry are continuous-type (In-Line) multi-chambers, and traditional batch ( Batch type) or wafer type production methods can significantly reduce equipment costs and waste space, and are highly productive and competitive. The first figure shows a schematic diagram of a conventional continuous three-cavity sputtering apparatus, which comprises a three-cavity such as an inlet cavity 60, a reduction cavity 62 and an discharge cavity 64. 66 is placed in the carrier 68, and the carrier 68 is moved between the three chambers through a power take-off group 7〇. The sputtering chamber 62 is a region where a sputtering operation is performed. I5 The first figure is a schematic diagram of the general principle of mine destruction, in which the plated material molecules 76 on the surface of the target 74 are bombarded by a magnetron sputtering cathode 72, and then deposited on the surface of the object to be plated 78. . Since the plating material molecules 76 are advanced by a straight line after being bombarded, it is only possible to coat the single front surface of the mineral. Therefore, it is generally common for the surface of the object 78 to be flat. However, when the surface of the object 78 is irregularly curved or multi-faceted (as shown in the second figure), there are some dead angles or faces that the mineral molecules 76 cannot be bombarded and deposited. In order to solve the problem, the inventor has proposed an invention (Application No. 096126031 of the National Invention Patent Application No. 096126031), which is mainly in the sputtering chamber 4 200945411 = racking rod and rotating rod on the carrier - The end of the gear, on which is placed for the object. When the carrier is driven by the power output group to move in the cavity, the gear will be (four) years old, which causes the rotating rod and the minerals on it to rotate at the same time, which can provide more mineral film, so that it is mineralized. 5 All soil surfaces can be deposited by mineral bombardment. 3 ^The advantage of the invention just described is that no additional power source is provided to drive the rotation of the rod. The lever is used skillfully to use the power man who is used to drive the movement of the vehicle to rotate the rod. However, we have found that when the gear and the rack 嗤α, there is wear and some dust particles are generated, which has an effect on the upsetting operation in the cavity 10 which needs to be kept highly clean. SUMMARY OF THE INVENTION The main object of the present invention is to provide a non-contact rotary device for a continuous vacuum sputtering apparatus, which can be rotated by a mineral to reach a multi-faceted mine 15 membrane and the process of rotation does not generate dust particles. . The non-contact rotary device of the continuous vacuum miscellaneous device provided by the present invention is mainly provided with an edge in the cavity.
載具移動方向延伸的固定磁性件；該固定磁性件具有N 極、S極交錯排列的磁區。而在載具上的每一轉動桿上設置 20冗磁，輪，該磁性輪也極、s極交錯排列之磁區； f此’當該載具移動時，該雜輪會越過該gj定磁性件， t不與該in定磁性件接觸’並受其交錯磁場作用影響而帶 動該轉動桿轉動。 5 200945411 【實施方式】 為了詳細說明本發明之構造及特點所在，兹舉 較佳實施例並配合圖式說明如后： 、 請參閱第三圖與第四圖所示， 真空賴設備之非接觸錢轉裝置主要纽置於 ❹ 15 ❹ 體1G中。在_鑛腔體ω中設置有—賤心 置(未顯不)以及-動力輸出組12。一載具Μ 輸出組12驅動而在該減鑛腔體10中移動。9 δχ力 ί夫顯該1G的前後兩端各有-開口16,並有-閘門 該賤:腔L。::錢14由入料腔體(未顯示)進入 而送到__顯峨行送出 10設有二導轨18 程在料錢腔體 出組12。 ❿細二導軌18之間設置有該動力輸 2〇 2〇 ? 側，並可自由轉:。座該等傳 接’在透過-釉糾26之丨3=4相互連 貼靠在該等滾輪二滾輪28 ’載具14的底側 Μ移動。輪28上，令傳動轴20的轉動可帶動該^ 該載八14具有一盒體3〇以及若干轉動桿3 陰=示)是設置於上方，故轉動桿32是士:磁控 ^ ^體3G的相對二侧上分別設置有兩兩相平狀 t之轴 π 20 200945411 承座34，該等轉動桿32分別設置於轴承座34上，使其可 自由轉動。該等轉動桿32上設置或吊掛被鑛物(未顯示、）， 以在該賴腔體1G巾進行多面向雜作業。 ^上所述之％件與—般_設針的相關元件相同， 5容不詳述其詳細結構。而本發明的特徵在於： 閱第五圖’在該導軌18上設置一由N極、 ❹麟狀長條㈣定磁性件36。顧定雜件36是沿該 具14之移動方向延伸，其磁力作用面是朝向垂直方向Γ而 該載具14之轉動桿32的-端伸出該載具14，且在伸出端a fixed magnetic member extending in a moving direction of the carrier; the fixed magnetic member has a magnetic region in which N poles and S poles are staggered. And each of the rotating rods on the vehicle is provided with 20 redundant magnetic wheels, and the magnetic wheels are also magnetic regions with poles and s poles staggered; f this 'when the carrier moves, the miscellaneous wheels will pass the gj The magnetic member, t does not contact the in-magnetic member and is driven by the staggered magnetic field to drive the rotating rod to rotate. 5 200945411 [Embodiment] In order to explain the structure and features of the present invention in detail, the preferred embodiment will be described with reference to the following figures: Please refer to the third and fourth figures, the non-contact of the vacuum device The money transfer device is mainly placed in the ❹ 15 ❹ body 1G. In the _mine cavity ω, a 贱 heart (not shown) and a power output group 12 are provided. A carrier Μ output group 12 is driven to move within the smelting chamber 10. 9 δ χ ί ί 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该:: Money 14 is entered by the feeding chamber (not shown) and sent to the __ 显峨行出出10. There are two guide rails 18 in the money chamber out of group 12. The power transmission 2 〇 2 〇 ? side is disposed between the two fine guide rails 18, and can be freely rotated: The relays are moved to the bottom side of the carrier wheel 14 of the roller two rollers 28' after the transmission-glaze correction 26===4. On the wheel 28, the rotation of the transmission shaft 20 can drive the carrier 8 to have a box 3 〇 and a plurality of rotating rods 3 (shown) are disposed above, so the rotating rod 32 is a magnet: magnetron The opposite sides of the 3G are respectively provided with two parallel shafts t π 20 200945411 sockets 34, which are respectively disposed on the bearing housing 34 so as to be freely rotatable. Minerals (not shown) are disposed or suspended on the rotating rods 32 to perform multi-faceted operations on the linings 1G. The % component described above is the same as the related component of the general-purpose pin, and the detailed structure of the pin is not detailed. The present invention is characterized in that: in the fifth figure, an N-pole, unicorn-shaped strip (four) magnetizing member 36 is disposed on the guide rail 18. The Guding miscellaneous member 36 extends in the moving direction of the tool 14, and the magnetic acting surface thereof is oriented in the vertical direction, and the end of the rotating rod 32 of the carrier 14 projects out of the carrier 14, and is at the protruding end.
1〇，置有N極、S極交錯排列之磁性輪38。當該載具M 受該動力輸出組12之帶動而在該濺渡腔體10内移動時， 該等磁性輪38會自該固定磁性件36的上方越過但二者 間保持-預定距離而不會接觸。而當該等磁性輪％越過該 固定磁性件36時，該等磁性輪38即會受到㈣磁性件％ 15的交錯磁場侧而被驅動旋轉，進而帶動該等轉動桿^及 其上之被鍍物（未顯示）同時旋轉。關於磁性輪38盘固定磁 性件36之磁力仙料，詳細可參閱本國 1267596號專利案。 寸π乐 本發明之特點在於：與糾人先前的發明（自灣發明專 2〇利第咖以咖號申請案)相同，無需用到額外的動力源驅 動该等轉動桿旋轉，而是巧妙地利用原先驅動載具移動的 動力’進而轉換為轉動該等轉動桿的動力。除此之外，本 發明更利用了固定磁性件與磁性輪，以非接觸的方式進行 傳動’如此更解決了先前發明之可能因齒條與齒輪間的接 7 200945411 觸磨耗而造成污染腔體的問題。如此任何形狀之被鍵物均 可利用本發明所提供的裝置進行多面向且無死角的濺鍍作 業，使被鑛物的表面能夠得到均勻且良好的鑛膜品質。 本發明所使用的磁性輪38，其結構與第1267596號發 明專利案之相對應元件相同，而固定磁性件36可為第五圖 所不之一體成型長條狀N極、S極交錯排列的元件；或是 ❹ 如第六圖所示之由複數個單獨磁鐵N極、S極交錯並排一 起所組合而成的固定磁性件36,。 1〇曰前述實施例所揭露的是一種水平式濺鍍設備，其轉動 才于32疋呈水平狀。第七圖則是顯示顯示一種立式賤鑛設 備，因磁控錢鑛陰極是設置於兩侧，故轉動桿是呈垂直 狀设置。立式濺鍍設備同樣可應用本發明之旋轉裝置。 请參閱第七圖與第八圖所示，在立式濺鍍設備之濺鍍 1腔體42底面設置有—支架44，其上設置有_固定磁性件 ❹15 46。同樣的該固定磁性件46具有N極、§極交錯排列的磁 區，並沿載具48的移動方向延伸。與前之差異在於，用於 立式濺鍍設備的固定磁性件46的磁力作用面是朝向水平方 向。載具48的底面上設置有若干可轉動之轉動桿4〇，其上 可設置被鑛物5〇。該等轉動桿*的底端伸出載具佔的底 面’並在伸出端上設置有N極、s極交錯排列的磁性輪52， 與該固定磁性件46對應，但保持一預定距離。同樣地，當 栽具48受到動力輸出組54之帶動而在該麟腔體A中移 動時，該等磁性輪52會越過該固定磁性件46，並受其交錯 磁場作用影響而轉動，進而帶動轉動桿4G旋轉，使其上之 8 200945411 被鍍物50在旋轉的狀態下，進行 本發明的優點在於：可在無需額^幾鑛作業。 驅動被鍍物旋轉；而且’我們;採用；2 =情況下’ 驅動的，因此在被鍍物旋轉的過程中，裝置疋非接觸式 5耗而產生粉塵微粒的問題 =會有因接觸式磨 .，再者，本發明所提供:==== β 程區域都保持旋轉，而是可選== ^讓破㈣產生旋轉，如此應用的彈性更大。換言^的 發明之S置並設置在 針 1〇 =旋轉作用的區域’只要其内部再設置該非接 裝置，即可再讓被鑛物旋轉。 轉 ❹ 9 200945411 【圖式簡單說明】 第一圖為習知濺鍍設備之示意圖； 第二圖為濺鍍原理之示意圖； 第三圖為本發明第一較佳實施例之立體圖； 第四圖為本發明第一較佳實施例之前視圖； 第五圖為固定磁性件與磁性輪之示意圖； 第六圖為另一種固定磁性件與磁性輪之示意圖； 第七圖為為本發明第二較佳實施例之前視圖；以及 第八圖為為本發明第二較佳實施例之底視圖。 【主要元件符號說明】 10濺鍍腔體 12動力輸出組 14載具 16開口 18導執 20傳動軸 22輪軸固定座 24鏈條 26傳動馬達 15 ❿ 28滾輪 30盒體 32轉動桿 34軸承座 36, 36’固定磁性件38磁性輪 40轉動桿 42濺鍍腔體 44支架 46固定磁性件 48載具 50被鍍物 52磁性輪 54動力輸出組 20 60入料腔體 62濺鍍腔體 64出料腔體 66被鍍物 68載具 70動力輸出组 72磁控濺鍍陰極 74靶材 76鍍材分子 78被鍍物1〇, a magnetic wheel 38 in which N poles and S poles are alternately arranged is disposed. When the carrier M is moved by the power take-off group 12 to move within the splash chamber 10, the magnetic wheels 38 will pass over the fixed magnetic member 36 but remain at a predetermined distance therebetween. Will be in contact. When the magnetic wheel % passes over the fixed magnetic member 36, the magnetic wheels 38 are driven to rotate by the staggered magnetic field side of the (4) magnetic member 15 to drive the rotating rods and the plated thereon. The object (not shown) rotates at the same time. Regarding the magnetic material of the magnetic wheel 38 of the magnetic disk 38, reference is made to the domestic patent No. 1267596. The characteristic of the invention is that it is the same as the previous invention of the singularity (the application for the singularity of the singularity of the singularity), without the use of an additional power source to drive the rotation of the rotating rods, but ingeniously The ground power is converted into the power to rotate the rotating rods by using the power that originally drives the vehicle to move. In addition, the present invention further utilizes the fixed magnetic member and the magnetic wheel to be driven in a non-contact manner. This further solves the problem that the prior invention may cause contamination of the cavity due to the contact between the rack and the gear. The problem. Such a key of any shape can be used in the multi-faceted and non-deadline sputtering operation by the apparatus provided by the present invention, so that a uniform and good film quality can be obtained on the surface of the mineral. The magnetic wheel 38 used in the present invention has the same structure as the corresponding element of the invention patent No. 1267596, and the fixed magnetic member 36 can be formed by the long-shaped N-pole and S-pole staggered in the fifth figure. Or a magnetic member 36 which is a combination of a plurality of individual magnets N and S poles which are alternately arranged side by side as shown in FIG. 1. The foregoing embodiment discloses a horizontal sputtering apparatus in which the rotation is horizontal at 32 。. The seventh picture shows the display of a vertical antimony ore equipment. Since the magnetron of the magnetron is placed on both sides, the rotating rod is arranged vertically. The vertical sputtering apparatus can also apply the rotating apparatus of the present invention. Referring to Figures 7 and 8, the bottom surface of the sputtering chamber 1 of the vertical sputtering apparatus is provided with a holder 44 on which a _ fixed magnetic member ❹ 15 46 is disposed. Similarly, the fixed magnetic member 46 has magnetic regions of N poles and θ poles staggered and extends in the moving direction of the carrier 48. The difference from the former is that the magnetic acting surface of the fixed magnetic member 46 for the vertical sputtering apparatus is oriented in the horizontal direction. The bottom surface of the carrier 48 is provided with a plurality of rotatable rotating rods 4, on which the minerals 5 can be disposed. The bottom end of the rotating rods * protrudes from the bottom surface of the carrier and is provided on the projecting end with magnetic poles 52 of N poles and s poles staggered, corresponding to the fixed magnetic members 46, but maintained at a predetermined distance. Similarly, when the device 48 is moved by the power output group 54 to move in the lining cavity A, the magnetic wheel 52 will pass over the fixed magnetic member 46 and be rotated by the influence of the staggered magnetic field, thereby driving When the rotating lever 4G is rotated so that the upper plate of the 200945411 object 50 is rotated, the advantage of the present invention is that it can be operated without a few minutes. Driving the object to be rotated; and 'we; use; 2 = case' driven, so in the process of rotating the object, the device 疋 non-contact type 5 consumes dust particles = there will be contact grinding Furthermore, the present invention provides that: ==== The β-path region remains rotated, but optional == ^ allows the break (four) to produce a rotation, so that the flexibility of the application is greater. In other words, the S of the invention is placed in the area where the needle 1 〇 = rotation is moved as long as the non-connecting device is provided inside, and then the mineral is rotated. Turning 9 200945411 [Simplified Schematic] The first figure is a schematic diagram of a conventional sputtering apparatus; the second figure is a schematic diagram of a sputtering principle; the third drawing is a perspective view of the first preferred embodiment of the present invention; The front view of the first preferred embodiment of the present invention; the fifth figure is a schematic view of the fixed magnetic member and the magnetic wheel; the sixth figure is another schematic diagram of the fixed magnetic member and the magnetic wheel; A front view of a preferred embodiment; and an eighth view is a bottom view of a second preferred embodiment of the present invention. [Main component symbol description] 10 sputter chamber 12 power output group 14 carrier 16 opening 18 guide 20 drive shaft 22 axle mount 24 chain 26 drive motor 15 ❿ 28 roller 30 box 32 rotating rod 34 bearing seat 36, 36' fixed magnetic member 38 magnetic wheel 40 rotating rod 42 sputtering chamber 44 bracket 46 fixed magnetic member 48 carrier 50 substrate 52 magnetic wheel 54 power output group 20 60 inlet chamber 62 sputtering chamber 64 discharge Cavity 66 is plated 68 carrier 70 power output group 72 magnetron sputtering cathode 74 target 76 plating material 78 is plated