TW200942643A - Surface treatment material for semiconductor manufacturing system and method for producing same - Google Patents

Surface treatment material for semiconductor manufacturing system and method for producing same

Info

Publication number
TW200942643A
TW200942643A TW097148769A TW97148769A TW200942643A TW 200942643 A TW200942643 A TW 200942643A TW 097148769 A TW097148769 A TW 097148769A TW 97148769 A TW97148769 A TW 97148769A TW 200942643 A TW200942643 A TW 200942643A
Authority
TW
Taiwan
Prior art keywords
fluorine
anodic oxidation
oxidation coating
treatment material
semiconductor manufacturing
Prior art date
Application number
TW097148769A
Other languages
Chinese (zh)
Inventor
Takayuki Tsubota
Jun Hisamoto
Koji Wada
Mamoru Hosokawa
Original Assignee
Kobe Steel Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kobe Steel Ltd filed Critical Kobe Steel Ltd
Publication of TW200942643A publication Critical patent/TW200942643A/en

Links

Classifications

    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47J—KITCHEN EQUIPMENT; COFFEE MILLS; SPICE MILLS; APPARATUS FOR MAKING BEVERAGES
    • A47J27/00—Cooking-vessels
    • A47J27/04—Cooking-vessels for cooking food in steam; Devices for extracting fruit juice by means of steam ; Vacuum cooking vessels
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/18—After-treatment, e.g. pore-sealing
    • C25D11/24—Chemical after-treatment
    • C25D11/246—Chemical after-treatment for sealing layers
    • A—HUMAN NECESSITIES
    • A23—FOODS OR FOODSTUFFS; TREATMENT THEREOF, NOT COVERED BY OTHER CLASSES
    • A23L—FOODS, FOODSTUFFS, OR NON-ALCOHOLIC BEVERAGES, NOT COVERED BY SUBCLASSES A21D OR A23B-A23J; THEIR PREPARATION OR TREATMENT, e.g. COOKING, MODIFICATION OF NUTRITIVE QUALITIES, PHYSICAL TREATMENT; PRESERVATION OF FOODS OR FOODSTUFFS, IN GENERAL
    • A23L5/00—Preparation or treatment of foods or foodstuffs, in general; Food or foodstuffs obtained thereby; Materials therefor
    • A23L5/10—General methods of cooking foods, e.g. by roasting or frying
    • A23L5/13—General methods of cooking foods, e.g. by roasting or frying using water or steam
    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47J—KITCHEN EQUIPMENT; COFFEE MILLS; SPICE MILLS; APPARATUS FOR MAKING BEVERAGES
    • A47J27/00—Cooking-vessels
    • A47J27/14—Cooking-vessels for use in hotels, restaurants, or canteens
    • A47J27/16—Cooking-vessels for use in hotels, restaurants, or canteens heated by steam
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24—HEATING; RANGES; VENTILATING
    • F24C—DOMESTIC STOVES OR RANGES ; DETAILS OF DOMESTIC STOVES OR RANGES, OF GENERAL APPLICATION
    • F24C15/00—Details
    • F24C15/32—Arrangements of ducts for hot gases, e.g. in or around baking ovens
    • F24C15/322—Arrangements of ducts for hot gases, e.g. in or around baking ovens with forced circulation
    • F24C15/327—Arrangements of ducts for hot gases, e.g. in or around baking ovens with forced circulation with air moisturising

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Food Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Nutrition Science (AREA)
  • Combustion & Propulsion (AREA)
  • Polymers & Plastics (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Drying Of Semiconductors (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)

Abstract

Disclosed are a surface-treatment material of a semiconductor manufacturing system and a method thereof. The surface-treatment material includes a substrate made of aluminum, or aluminum alloy, an anodic oxidation coating formed over the surface of the substrate, with sealing applied thereto, and a fluorine-enriched layer formed over the surface of the anodic oxidation coating, wherein fluorine concentration in the fluorine-enriched layer is not less than 1 mass. The method includes an anodic oxidation coating forming step for forming an anodic oxidation coating over the surface of a substrate made of aluminum, or aluminum alloy, a sealing step for applying sealing to the anodic oxidation coating, and a fluorine-enriched layer forming step for forming a fluorine-enriched layer with fluorine enriched to a fluorine concentration not less than 1 mass% over the surface of the anodic oxidation coating with the sealing applied thereto.
TW097148769A 2008-02-26 2008-12-15 Surface treatment material for semiconductor manufacturing system and method for producing same TW200942643A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008044144 2008-02-26

Publications (1)

Publication Number Publication Date
TW200942643A true TW200942643A (en) 2009-10-16

Family

ID=40911493

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097148769A TW200942643A (en) 2008-02-26 2008-12-15 Surface treatment material for semiconductor manufacturing system and method for producing same

Country Status (6)

Country Link
JP (1) JP5452034B2 (en)
KR (1) KR20090092228A (en)
CN (1) CN101521145A (en)
DE (1) DE102009004402A1 (en)
SG (1) SG155111A1 (en)
TW (1) TW200942643A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI741320B (en) * 2018-07-18 2021-10-01 日商日本發條股份有限公司 Components for plasma processing equipment
JP6585863B1 (en) * 2019-01-23 2019-10-02 株式会社Uacj Aluminum member and manufacturing method thereof
CN115449777A (en) * 2022-09-28 2022-12-09 上海积塔半导体有限公司 Semiconductor reaction member and method for producing same

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5069938A (en) 1990-06-07 1991-12-03 Applied Materials, Inc. Method of forming a corrosion-resistant protective coating on aluminum substrate
US5192610A (en) 1990-06-07 1993-03-09 Applied Materials, Inc. Corrosion-resistant protective coating on aluminum substrate and method of forming same
JPH07273053A (en) 1994-03-31 1995-10-20 Tokyo Electron Ltd Treatment device and coating of aluminum-based member
US5756222A (en) 1994-08-15 1998-05-26 Applied Materials, Inc. Corrosion-resistant aluminum article for semiconductor processing equipment
JP3608707B2 (en) 1997-06-09 2005-01-12 株式会社神戸製鋼所 Vacuum chamber member and manufacturing method thereof
WO1999002759A1 (en) * 1997-07-11 1999-01-21 Magnesium Technology Limited Sealing procedures for metal and/or anodised metal substrates
JP3094000B2 (en) 1997-09-12 2000-10-03 昭和電工株式会社 Metal material or metal film having fluorinated surface layer and fluoridation method
JPH11229185A (en) * 1998-02-13 1999-08-24 Kobe Steel Ltd Aluminum material excellent in resistance to heat cracking and corrosion
JP3891815B2 (en) 2001-10-12 2007-03-14 昭和電工株式会社 Aluminum alloy for film formation treatment, aluminum alloy material excellent in corrosion resistance and method for producing the same
JP3871544B2 (en) 2001-10-12 2007-01-24 昭和電工株式会社 Aluminum alloy for film formation treatment, aluminum alloy material excellent in corrosion resistance and method for producing the same
JP4744099B2 (en) * 2004-06-15 2011-08-10 株式会社アルバック Surface treatment method of aluminum material for inner wall of vacuum vessel

Also Published As

Publication number Publication date
JP2009228132A (en) 2009-10-08
DE102009004402A1 (en) 2009-09-03
CN101521145A (en) 2009-09-02
SG155111A1 (en) 2009-09-30
KR20090092228A (en) 2009-08-31
JP5452034B2 (en) 2014-03-26

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