200940363 九、發明說明： 【發明所屬之技術領域】 本發明是有魏版結構及鄕造綠，且制是有關 於一種質輕、成本低廉且具金屬質感的銘版結構及其製造方法。 【先前技術】 目前的銘版可分為塑膠銘版與金屬銘版兩種，其中在金屬銘 版的製程中，多是在金屬材料上關械加王__方式製作出 ❹極具立_的圖文，加上金屬材料本身具有表面光亮的特性，故 金屬銘版具有較為美觀的優點。然而，金屬銘版通常成本高且製 程費時，又不料刷’且-般的金屬銘版厚重且撓性差，以致於 具有不便貼附於輕薄物品或是弧形物品的缺f卜此外，塑膠銘版 雖然具有輕且4 ’並^便貼附於各種物品上之優點，但其卻僅能 顯現出平面式_文’又不具金屬_，外觀上較金屬銘版單調 無變化·。 目此，需使肢歸料及触來製倾财能使翻時兼且 ❿金屬銘版與歸銘㈣優點，實為糊產業亟欲探討與研發財 向之一。 【發明内容】 有鑒於先前技術所製成的金屬銘版與塑膠銘版分別存在有高 成本、製程耗時'厚重、撓性差、不易印刷及不具立體感及金屬 質感的問題，本發明遂揭露一種銘版結構及其製造方法，以提供 兼具成本低廉、容易印刷、具可撓性易貼附輕且薄以及有金 屬質感與立體感之優點的銘版。 200940363 本發明提供一種銘版的製造方法’其實行步驟包括：提供具 有第一表面與第二表面的透光基板’其中透光基板的第一表面具 有至少一組圖案；在該透光基板之該第一表面上形成至少一色 層；於該色層上形成至少一共形反射層；以及於該共形反射層上 形成至少一第一保護層。200940363 IX. INSTRUCTIONS: [Technical Field to Be Invented by the Invention] The present invention has a Wei-type structure and a green-made structure, and the system is related to a light-weight, low-cost, metal-like structure and a manufacturing method thereof. [Prior Art] The current inscription can be divided into two types: plastic inscriptions and metal inscriptions. Among them, in the process of metal inscriptions, most of them are on the metal materials, and the king is __ way to make a bungee. The graphic and the metal material itself have the characteristics of bright surface, so the metal nameplate has a more beautiful appearance. However, the metal nameplate is usually costly and time-consuming, and it is unexpected that the metal-type version is thick and flexible, so that it is inconvenient to attach to light or thin items or curved items. Although the version has the advantages of being light and 4' and attaching it to various items, it can only show the flat type _ text 'and no metal _, and the appearance is monotonous and unchanged from the metal name plate. In view of this, it is necessary to make the limbs return and touch the system to make money, which can turn over the time and the advantages of the metal Ming edition and the Gui Ming (four). SUMMARY OF THE INVENTION In view of the problems of high cost and time-consuming 'thickness, poor flexibility, difficult to print, and no three-dimensional and metallic textures, respectively, the metal nameplate and the plastic nameplate made by the prior art, the present invention discloses A nameplate structure and a manufacturing method thereof are provided to provide a name plate which is low in cost, easy to print, flexible and easy to attach light and thin, and has the advantages of metal texture and three-dimensional feeling. 200940363 The present invention provides a method for manufacturing a nameplate, the method comprising: providing a light transmissive substrate having a first surface and a second surface, wherein the first surface of the light transmissive substrate has at least one set of patterns; Forming at least one color layer on the first surface; forming at least one conformal reflective layer on the color layer; and forming at least one first protective layer on the conformal reflective layer.
本發明提供一種銘版的製造方法，其實行步驟包括：提供具 有第一表面與第二表面的透光基板，其中透光基板的第一表面具 有夕組圖案，在該透光基板之該第一表面上形成至少一色層；於 該色層上形成至少一共形反射層；於該共形反射層上形成至少一 第一保護層，其中該透光基板、該些色層、該共形反射層以及該 第一保護層是構成一銘板母基板；以及將該銘板母基板切割為多 片銘版，其中各銘版分別具有至少一組圖案。 本發明提供一種銘版結構，包括透光基板、至少一色層、至 少-共形反射層以及至少—第—保護層。其中，透光基板具有第 -表面及第二表面，且第—表面具有至少—組圖案；色層是配置 於透光基板的第-表面上，共形反射層是配置於色層上第一保 護層則是配置於共形反射層上。 本發明所賊之銘版結構及鄕造綠如上，與先前技術之 間的差異在於本發明是先在光阻層上形成奈米等級的圖案，接著 之嶋細模上，並利用此 n 以將奈米等級的圖案複製於塑膠基板上，使 Z基板具有奈料級_案。後續再於_基板上形成 射層，以顯現出岐線在這些_間產生繞射而造成的炫彩效 200940363 果。透過上述手段，本發明可以製程時間短、容易印刷、具可撓 性易貼附、輕且薄及成本低廉的塑膠材質，製作出具有金屬質感 及立體感圖案的銘版。 【實施方式】 以下將配合圖式及實施例來詳細說明本發明之實施方式，藉 此對本發明如何應用技術手段來解決技術問題並達成技術功效的 實現過程能充分理解並據以實施。 ❹ 「第1A圖」至「第1c圖」繪示為本發明之銘版在第一實施 例中的製造流程剖面示意圖。請參照「第1A圖」，首先提供透光 基板Π0 ’其中透光基板110的第一表面η〕是具有圖案η〗，而 圖案113可以包括文字（如廠商名或產品名）、數字、符號及圖像 (如商標）至少其中之一。構成透光基板的材質例如是透光 性佳的聚合物材料’如聚苯乙烯(p〇lyStyrene，PS)、環稀烴共聚物 (cyclic olefin copolymer，mCOC)或聚碳酸酯(p〇lycarb〇nate，pc) 等。而且，透光基板110例如是透過射出成型製程所形成。以下 Ο 將舉實施例詳述形成透光基板11〇的流程。 「第2A圖」至「第2E圖」繪示為本發明之透光基板在一實 施例中的製造流程剖面示意圖。請參照「第2A圖」，首先在底板 101上形成具有第一圖案l〇2a的圖案化光阻層1〇2,其中底板1〇1 例如是一玻璃板，而形成圖案化光阻層102的方法例如是先在底 板101上形成一層光阻層（未螬'示），然後再對此光阻層進行曝光 及顯影製程’即可形成圖案化光阻層102。其中，此光阻層的曝光 製程中所使用之光源例如是波長介於0.7微米至〇75微米之間的 200940363 雷射光，以便於在光阻層上蝕刻出奈米等級的第一圖案l〇2a。具 體來說’本實施例在曝光製程中所使用的光源是波長為0.74微米 的雷射光，而圖案化光阻層102的第一圖案l〇2a之高度h例如是 介於60微米至11〇微米之間。 請參照「第2B圖」，在完成圖案化光阻層1〇2後，接著即是 在圖案化光阻層102上形成金屬層1〇3。在本實施例中，金屬層 103可以透過蒸鍍(evaporating)製程、錢鍍(sputtering)製程或電鍍 ❹ （electroPlating)製程來完成。之後，將金屬層1〇3從底板1〇1上剝 離’如「第2C圖」所示。此時’金屬層1〇3上是轉印有與圖案化 光阻層102之第一圖案i〇2a相反的圖案。 值得注意的是，在從底板1〇1上將金屬層1〇3剝離下來後， 還可以再次以雷射光束或其他光源對金屬層1〇3進行微影及蝕刻 製程，以便於在金屬層1〇3上再次形成其他圖案。後續再利用金 屬層103作為母模’並將透光塑料1〇4填入射出成型機（未繪示）， 由噴嘴105將透光塑料104射出成型，如「第2D圖」所示。之後 © 成型於母膜（金屬層1〇3)上的即為「第1A圖」之透光基板讓， 如「第2E圖」所示。其中，透光基板11〇之第一表面112所具有 的圖案113即是從金屬層1〇3上的圖案轉印而來。也就是說，圖 案113可以包括圖案化光阻層1〇2上的第一圖案職，也可以包 括有在將金屬層103從底板1〇1上剝離後所進行之微影及姓刻製 生成的圖案。 請繼續參照「第1A圖」，形成色層12〇的方法例如是網版印 刷㈣k SC__ting)或彩版印刷幽㈣。值得注意的是， 200940363 雖然圖中僅繪示出單—色層120,但其並非用赚定本發明，熟習 此技藝者可自行依照實際所需來決定色層12〇的層數。而且，在 具有多層色層120的實施例中，可以是一併透過網版印刷製稃或 彩版印刷製程來形成所有色層12〇,也可以是分別以不同的印刷製 程來形成不同的色層120。 明參照「第1B圖」’在透光基板的第一表面丨12上形成 色層120後’接著在色層12〇上形成共形反射層13〇，其中形成共 〇 形反射層丨30的方法例如是將金屬材料透過蒸鍍製程或濺鍍製程 形成於色層120上，而共形反射層13〇的材質可以是紹、銅、金、 銀、鎳或其他合金金屬，但並不限定於此。值得一提的是，由於 共形反射層13G是依照透絲板11G之第—表面112的圖案ιΐ3 而共形地形成於透光基板110之第一表面112上方，因此能夠將 光線在第-表面112之圖案113間的繞射效果顯現出來，進而使 這些圖案113較具立體感。 凊參照「第1C圖」’在共形反射層130形成至少一層第一保 ® 護層14〇a，此時即完成銘版100的製作。其中，形成第-保護層 140a的方法例如是將硬化膠塗佈於共形反射層13〇上。在本實^ 例中，第一保護層140a例如是共形地配置於共形反射層13〇上， 且為了使銘版100的表面平順光滑，還可以在第一保護層l4〇a上 形成-層平坦層15〇。其中，平坦層150例如是透過油墨喷麗製程 所形成的油墨層，以藉由顆粒較大的油墨分子來填平第一保護層 140a的凹凸表面。 除了在共形反射層130上形成第一保護層14〇a之外，本實施 9 200940363 例亦可以W形成至少—第二保護層！儀在透光基板⑽的第二 表面114上。其中，第二保護層14〇b的製程與材質例如是與第一 「健層140M目同。由此可知，第一保護層M〇a除了可以保護共 形反㈣⑽以外，亦可以與第二練層鳩騎銘版· 的表面硬度，以防止銘版100表面遭外力刮傷而受損。 々以「第1C圖」的銘版100來說，外界光線是從透光基板11〇 的第-表面114入射至銘版1〇〇内，並在透光基板⑽的圖案⑴ ❿ 之間產生繞射後’再由共形反射層130將其從透光基板11〇的第 二表面1M反射出，進而使觀看者能夠觀看到具立體感的圖案⑴。 特別的是，在本發_其他實施射，更可關赌有播質 的材料來形成具有特殊紋路或圖案的第二保護層屬。如此一 來’觀看者會在從第二保護層14%上方觀看銘版1〇〇之圖案的同 時’看到第二保護層14〇b内的特殊紋路或圖案，而此特殊紋路或 圖案即可用以作為銘版100防偽的判斷依據。 U下將說明本發明之銘版結構。請參照「第1C圖」，銘版100 © 包括透光基板110、至少一色層120、至少-共形反射層B0、至 少-第-保護層14〇a以及至少—第二保護層勵。其中，透絲 板110具有第一表面112與第二表面114，且其第-表面112具有 至少-組圖案113。色層120是配置於透光基板11〇的第一表面 112上，且其可以是網版印刷層或是彩版印刷層。在其他實施例 中，銘版100可以包括多層色層12〇，且這些色層可以是透過相同 印刷製程所形成，也可以是透過不同的_製程所形成 ，本發明 並未對其加以限制。 200940363 承上述，共形反射層130是共形地配置於色層12〇上，以便 於將光線在透光基板110之第一表面112的圖案113間之繞射效 果顯現出來。其中，共形反射層130的厚度例如是55奈米。第一 保護層140a是共形地配置於共形反射層13〇上，用以保護共形反 射層130’並同時與透光基板110之第二表面114上的第二保護層 140b增加銘版1〇〇的表面硬度。其中，第一保護層14加與第二保 護層140b的材質例如是硬化膠》 〇 在本實施例中，在第一保護層140a上更配置有平坦層15〇， 以使銘版100的表面平順光滑。其中，平坦層15〇例如是透過油 墨喷灑製程所製成的油墨層。 為了方便將本發明之銘版貼附在各式各樣的產品上，本發明 在第二實施例中還可以在完成「第1C圖」所示之銘版1〇〇後，於 第一保護層140a上形成背膠160,如「第3圖」所示。另一方面， 本發明於第三實施例中亦可在第二保護層14〇b上形成一透明膜 170 (如「第4圖」所示）’以便於更進一步保護銘版11〇。 ❹ 雖然前文係舉單一銘版的製程為例做說明，但其並非用以限 定本發明。本發明所揭露的方法亦適用於批量生產銘版的製程 中’以下將舉實施例說明之。 「第5圖」繪示為本發明在第四實施例中的銘版母基板之刮 面示意圖。請同時參照「第1C圖」與「第5圖」，本實施例與前 述實施例的相異處在於前述實施例所使用的透光基板n〇尺寸與 形狀即為銘版100之尺寸與形狀，而本實施例所使用的透光基板 510尺寸則是可以同時容納多片銘版1〇〇的大小，以便於在透光基 11 200940363 板上510利用上述製程製作至少一色層12〇、至少一共形反射層 130、至少一第一保護層14〇a以及至少一第二保護層14此，因而 形成「第5圖」所示之銘版母基板5〇1後，將其切成多片如「第 1C圖」所不之銘版10〇。其中，透光基板51〇的第一表面η]是 具有多組可由文字及圖像至少其中之一所組成的圖案113,且這些 組圖案113可以是相同的圖案，也可以是不同的圖案。在切割銘 版母基板501的過程中，即是依據各組圖案113的所在位置及所 ❹ 欲製成的銘版形狀來進行切割’以使切割出來的每片銘版卿均 具有一組圖案113。 值付一提的是’如欲以批量製程生產具有背膠的銘版（如「第 3圖」所示）或具有透明膜的銘版（如「第4圖」所示），則需先 在第-保護層14Ga上形成背膠16〇(如「第6圖」所示），或是在 第二保護層14Gb上形成透明膜17〇 (如「第7圖」所示），之後再 對銘版母基板501進行切割，即可製成與「第3圖」及「第*圖」 所示相同之銘版。 ’、’丁上所it可知本發明與先前技術之間的差異在於本發明是 先在光阻層上軸奈料_圖案，接祕關案轉印至銘版製 程中所需之射出成型的母模上，再_此母模進行㈣成型，以 將奈米等級賴織製於歸紐上，使歸基板具有奈米等級 的圖案。後續再於歸基板上形成絲反射層，以顯現出因光線 在这些@案巾產生繞㈣造朗炫彩效果。透過上述手段，本發 明不但可以縮短銘版製程所需花#的時間，更可以容易印刷、具 可撓性易_、輕且薄及成本低廉_膠材f，製作出具有金屬 12 200940363 質感及立體感圖案的銘版。 雖然本發騎揭露之實施村如上，惟⑽之内容並非用以 「 JL接限定本發明之專·護範I任何本發日骑屬技術領域中具 有通常知識者’在;f麟本發騎揭叙精朴細的前提下， 可以在實施的形式上及細節上作些許之更動。本發明之專利保護 範圍，仍須以所附之申請專利範圍所界定者為準。 【圖式簡單說明】 ❹ 第1A圖至第1C圖繪示為本發明之銘版在第一實施例中的製 造流程剖面示意圖。 ,第2A圖至第2E圖繪示為本發明之透光基板在一實施例中的 製造流程剖面示意圖。 第3圖繪示為本發明之銘版在第二實施例中的剖面示意圖。 第4圖繪示為本發明之銘版在第三實施例中的剖面示意圖。 第5圖繪示為本發明之銘版母基板在第四實施例中的剖面示 意圖。 九 圖繪示為本發明之銘版母基板在第二實施例中的剖面示 。 圖綠示為本發明之銘版母基板在第三實施例中的剖面示 思、圖。 【主要元件符號說明】 100銘版 1〇1底板 1〇2 ^ 圖案化光阻層 13 200940363 第一圖案 金屬層 透光塑料 喷嘴 透光基板 第一表面 圖案 第二表面 色層 h 共形反射層 第一保護層 第二保護層 平坦層 背膠 透明膜 銘版母基板 透光基板 第一表面 第二表面 高度The present invention provides a method for manufacturing a nameplate, the method comprising the steps of: providing a light transmissive substrate having a first surface and a second surface, wherein the first surface of the light transmissive substrate has a matte pattern, wherein the transparent substrate Forming at least one color layer on the first surface; forming at least one conformal reflective layer on the color layer; forming at least one first protective layer on the conformal reflective layer, wherein the transparent substrate, the color layers, the conformal layer The reflective layer and the first protective layer constitute a mother board; and the mother board of the nameplate is cut into a plurality of plates, wherein each of the patterns has at least one set of patterns. The present invention provides a crystal plate structure comprising a light transmissive substrate, at least one color layer, at least a conformal reflective layer, and at least a first protective layer. The transparent substrate has a first surface and a second surface, and the first surface has at least a group pattern; the color layer is disposed on the first surface of the transparent substrate, and the conformal reflective layer is disposed on the color layer. A protective layer is disposed on the conformal reflective layer. The nickname structure and the green color of the thief of the present invention are as above, and the difference from the prior art is that the present invention first forms a nano-scale pattern on the photoresist layer, and then on the fine mold, and uses the n The nanoscale pattern is reproduced on the plastic substrate so that the Z substrate has a neat grade. Subsequent formation of a layer on the _ substrate to show the dazzling effect of the ray line between these ray. Through the above means, the present invention can produce a plastic plate having a metallic texture and a three-dimensional pattern by a plastic material having a short processing time, easy printing, flexible and easy to attach, light, thin and low cost. [Embodiment] Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings and embodiments, and thus the implementation of the present invention to solve the technical problems and achieve the technical effects can be fully understood and implemented. 「 "1A" to "1c" are schematic cross-sectional views showing the manufacturing process of the inscription of the present invention in the first embodiment. Referring to FIG. 1A, firstly, a transparent substrate Π0 'where the first surface η of the transparent substrate 110 is provided has a pattern η〗, and the pattern 113 may include characters (such as a manufacturer name or a product name), numbers, and symbols. And at least one of images (such as trademarks). The material constituting the light-transmitting substrate is, for example, a polymer material having good light transmittance such as polystyrene (PS), cyclic olefin copolymer (mCOC) or polycarbonate (p〇lycarb〇). Nate, pc) and so on. Further, the light-transmitting substrate 110 is formed, for example, by an injection molding process. Hereinafter, the flow of forming the light-transmitting substrate 11A will be described in detail in the embodiment. Fig. 2A to Fig. 2E are schematic cross-sectional views showing the manufacturing process of the light-transmitting substrate of the present invention in an embodiment. Referring to FIG. 2A, a patterned photoresist layer 1〇2 having a first pattern 10a2a is formed on the substrate 101, wherein the substrate 1〇1 is, for example, a glass plate, and the patterned photoresist layer 102 is formed. For example, a photoresist layer (not shown) is formed on the substrate 101, and then the photoresist layer is exposed and developed to form a patterned photoresist layer 102. Wherein, the light source used in the exposure process of the photoresist layer is, for example, 200940363 laser light having a wavelength between 0.7 micrometers and 〇75 micrometers, so as to etch a nanometer-scale first pattern on the photoresist layer. 2a. Specifically, the light source used in the exposure process of the present embodiment is laser light having a wavelength of 0.74 μm, and the height h of the first pattern 10 2a of the patterned photoresist layer 102 is, for example, between 60 μm and 11 μm. Between microns. Referring to Fig. 2B, after the patterned photoresist layer 1〇2 is completed, the metal layer 1〇3 is formed on the patterned photoresist layer 102. In the present embodiment, the metal layer 103 can be completed by an evaporation process, a sputtering process, or an electroplating process. Thereafter, the metal layer 1〇3 is peeled off from the substrate 1〇1 as shown in Fig. 2C. At this time, the metal layer 1〇3 is transferred with a pattern opposite to the first pattern i〇2a of the patterned photoresist layer 102. It is worth noting that after the metal layer 1〇3 is peeled off from the bottom plate 1〇1, the metal layer 1〇3 may be lithographically and etched again by a laser beam or other light source to facilitate the metal layer. Another pattern is formed again on 1〇3. Subsequently, the metal layer 103 is reused as a master mold, and the light-transmissive plastic 1〇4 is filled into a molding machine (not shown), and the light-transmitting plastic 104 is injection-molded by the nozzle 105 as shown in Fig. 2D. Then, the light-transmissive substrate which is formed on the mother film (metal layer 1〇3) is “1A”, as shown in “2E”. The pattern 113 of the first surface 112 of the transparent substrate 11 is transferred from the pattern on the metal layer 1〇3. That is, the pattern 113 may include the first pattern on the patterned photoresist layer 1〇2, and may also include lithography and surname generation after stripping the metal layer 103 from the substrate 1〇1. picture of. Please continue to refer to "Picture 1A", and the method of forming the color layer 12〇 is, for example, screen printing (4) k SC__ting) or color printing (4). It should be noted that 200940363, although only the single-color layer 120 is shown in the figure, it is not intended to earn the invention, and those skilled in the art can determine the number of layers of the color layer 12〇 according to actual needs. Moreover, in the embodiment having the multi-layer color layer 120, all the color layers 12 may be formed by a screen printing or color printing process, or different colors may be formed by different printing processes. Layer 120. Referring to FIG. 1B, 'after forming the color layer 120 on the first surface 丨12 of the transparent substrate', a conformal reflective layer 13〇 is formed on the color layer 12〇, wherein the conjugated reflective layer 30 is formed. The method is, for example, forming a metal material on the color layer 120 through an evaporation process or a sputtering process, and the material of the conformal reflection layer 13 可以 may be sho, copper, gold, silver, nickel or other alloy metal, but is not limited thereto. herein. It is worth mentioning that since the conformal reflective layer 13G is conformally formed on the first surface 112 of the transparent substrate 110 according to the pattern ι 3 of the first surface 112 of the transparent plate 11G, it is possible to The diffractive effect between the patterns 113 of the surface 112 is revealed, thereby making the patterns 113 more stereoscopic. Referring to the "1C figure", at least one layer of the first protective layer 14a is formed on the conformal reflective layer 130, and the production of the nameplate 100 is completed. Among them, the method of forming the first protective layer 140a is, for example, applying a hardening adhesive onto the conformal reflective layer 13A. In the present embodiment, the first protective layer 140a is, for example, conformally disposed on the conformal reflective layer 13A, and may be formed on the first protective layer 14a in order to smooth the surface of the crystal 100. - Layer flat layer 15 〇. The flat layer 150 is, for example, an ink layer formed by an ink jet process to fill the uneven surface of the first protective layer 140a by the larger ink molecules. In addition to forming the first protective layer 14A on the conformal reflective layer 130, the present embodiment 9 200940363 can also form at least a second protective layer! The meter is on the second surface 114 of the light transmissive substrate (10). The process and material of the second protective layer 14〇b are, for example, the same as the first “layer 140M.” It can be seen that the first protective layer M〇a can also protect the conformal inverse (four) (10), and can also be second. The surface hardness of the layered version of the 鸠 铭 铭 , , 以 以 以 以 铭 铭 铭 铭 铭 铭 铭 铭 铭 铭 铭 铭 铭 铭 铭 铭 铭 铭 铭 铭 铭 铭 铭 铭 铭 铭 铭 铭 铭 铭 铭 铭 铭 铭 铭 铭 铭- the surface 114 is incident on the inside of the nameplate 1 and is diffracted between the patterns (1) of the transparent substrate (10), and is then reflected by the conformal reflective layer 130 from the second surface 1M of the transparent substrate 11A. Then, the viewer can view the three-dimensional pattern (1). In particular, in the present invention, other materials can be used to form a second protective layer having a special texture or pattern. In this way, the viewer will see the special texture or pattern in the second protective layer 14〇b while viewing the pattern of the first edition from above the 14% of the second protective layer, and the special texture or pattern is Can be used as the basis for judging the anti-counterfeiting of the 100. The structure of the inscription of the present invention will be explained below. Referring to "1C", the nameplate 100 includes a light-transmitting substrate 110, at least one color layer 120, at least a conformal reflective layer B0, at least a first-protective layer 14A, and at least a second protective layer. Wherein, the permeable plate 110 has a first surface 112 and a second surface 114, and its first surface 112 has at least a group pattern 113. The color layer 120 is disposed on the first surface 112 of the light-transmissive substrate 11A, and may be a screen printing layer or a color printing layer. In other embodiments, the nameplate 100 may include a plurality of color layers 12, and these color layers may be formed by the same printing process or may be formed by different processes, which are not limited by the present invention. In the above, the conformal reflective layer 130 is conformally disposed on the color layer 12A to facilitate the diffracting effect of light between the patterns 113 of the first surface 112 of the transparent substrate 110. The thickness of the conformal reflective layer 130 is, for example, 55 nm. The first protective layer 140a is conformally disposed on the conformal reflective layer 13A to protect the conformal reflective layer 130' and simultaneously add a nameplate to the second protective layer 140b on the second surface 114 of the transparent substrate 110. 1 〇〇 surface hardness. The material of the first protective layer 14 and the second protective layer 140b is, for example, a hardened adhesive. In this embodiment, a flat layer 15 is further disposed on the first protective layer 140a to make the surface of the crystal 100. Smooth and smooth. Among them, the flat layer 15 is, for example, an ink layer formed by an ink spray process. In order to facilitate the attachment of the nameplate of the present invention to a wide variety of products, the present invention can also be used in the first embodiment after completing the "1C" shown in the first embodiment. A backing 160 is formed on the layer 140a as shown in "Fig. 3". On the other hand, in the third embodiment, a transparent film 170 (shown in Fig. 4) can be formed on the second protective layer 14b to facilitate further protection of the nameplate 11〇. ❹ Although the previous process of exemplifying a single nameplate is taken as an example, it is not intended to limit the invention. The method disclosed in the present invention is also applicable to the process of mass production of the name plate. The following description will be made by way of examples. Fig. 5 is a schematic view showing the scraping surface of the mother substrate of the nameplate in the fourth embodiment of the present invention. Please refer to "1C" and "5th" at the same time. The difference between this embodiment and the foregoing embodiment is that the size and shape of the transparent substrate used in the foregoing embodiment is the size and shape of the nameplate 100. The size of the transparent substrate 510 used in the embodiment is such that the size of the plurality of the first plate can be accommodated at the same time, so that at least one color layer 12 is formed on the transparent substrate 11 200940363 plate 510 by using the above process. a conformal reflective layer 130, at least one first protective layer 14A, and at least one second protective layer 14 are formed. Thus, after forming the mother substrate 5〇1 shown in FIG. 5, it is cut into a plurality of pieces. For example, "1C Figure" does not have the inscription 10〇. The first surface η] of the transparent substrate 51 is a plurality of patterns 113 which may be composed of at least one of characters and images, and the group patterns 113 may be the same pattern or different patterns. . In the process of cutting the mother substrate 501 of the original plate, the cutting is performed according to the position of each set of the pattern 113 and the shape of the original plate to be made so that each piece of the cut plate has a set of drawings. Case 113. It is worth mentioning that 'If you want to produce a vinyl version with a backing (as shown in Figure 3) or a transparent film with a transparent film (as shown in Figure 4), you need to A backing 16 形成 is formed on the first protective layer 14Ga (as shown in FIG. 6), or a transparent film 17 形成 is formed on the second protective layer 14Gb (as shown in FIG. 7), and then By cutting the mother substrate 501 of the original plate, the same name plate as that shown in "Fig. 3" and "Fig. ', '丁上所it know that the difference between the present invention and the prior art is that the present invention is first on the photoresist layer on the axis of the _ pattern, the secret transfer to the printing process required for the injection molding process On the master mold, the master mold is then (4) shaped to woven the nanoscale on the hinge, so that the substrate has a nanoscale pattern. Subsequently, a silk reflective layer is formed on the substrate to show that the light is produced in these @ cases. Through the above means, the invention can not only shorten the time required for the printing process, but also can be easily printed, flexible, easy to use, light and thin, and low in cost _ glue f, produced with metal 12 200940363 texture and The inscription of the three-dimensional pattern. Although the implementation of this is not the case, the content of (10) is not intended to be used by JL to limit the scope of the invention. In the form of a simple and detailed description, some modifications may be made in the form and details of the implementation. The scope of patent protection of the present invention shall still be defined by the scope of the appended patent application. FIG. 1A to FIG. 1C are schematic cross-sectional views showing the manufacturing process of the inscription of the present invention in the first embodiment. FIGS. 2A to 2E are diagrams showing an embodiment of the transparent substrate of the present invention. FIG. 3 is a cross-sectional view showing the inscription of the present invention in the second embodiment. FIG. 4 is a cross-sectional view showing the inscription of the present invention in the third embodiment. 5 is a cross-sectional view showing the mother substrate of the invention in the fourth embodiment of the present invention. FIG. 9 is a cross-sectional view showing the mother substrate of the invention in the second embodiment of the present invention. The section of the mother substrate in the third embodiment Thinking, diagram. [Main component symbol description] 100 Ming 1〇1 bottom plate 1〇2 ^ Patterned photoresist layer 13 200940363 First pattern metal layer transparent plastic nozzle transparent substrate first surface pattern second surface color layer h Conformal reflective layer first protective layer second protective layer flat layer adhesive transparent film inscription mother substrate transparent substrate first surface second surface height