TW200932847A - Coating liquid for forming silica-based coating film, method of preparing the same and silica-based insulation film obtained from the coating liquid - Google Patents

Coating liquid for forming silica-based coating film, method of preparing the same and silica-based insulation film obtained from the coating liquid Download PDF

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TW200932847A
TW200932847A TW097135560A TW97135560A TW200932847A TW 200932847 A TW200932847 A TW 200932847A TW 097135560 A TW097135560 A TW 097135560A TW 97135560 A TW97135560 A TW 97135560A TW 200932847 A TW200932847 A TW 200932847A
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cerium oxide
fine particles
catalyst component
coating liquid
film
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TW097135560A
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Chinese (zh)
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TWI433897B (en
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Miki Egami
Yuichi Hamasaki
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Jgc Catalysts & Chemicals Ltd
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/113Silicon oxides; Hydrates thereof
    • C01B33/12Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4644Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • H05K3/4664Adding a circuit layer by thick film methods, e.g. printing techniques or by other techniques for making conductive patterns by using pastes, inks or powders

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Inorganic Chemistry (AREA)
  • Paints Or Removers (AREA)
  • Catalysts (AREA)
  • Silicon Compounds (AREA)

Abstract

To provide an application liquid for forming a silica-based coating film, which has high film strength, a relatively low dielectric constant, and excellent surface smoothness and crack resistance, and to provide a preparation method for the application liquid and a silica-based coating film obtained from the application liquid. The application liquid for forming the silica-based coating film comprises a silicon compound, which is obtained by heating a dispersion liquid containing a specific organosilicon compound and silica-based particles containing a basic catalyst component, and at least, performing partial hydrolysis and/or hydrolysis of the organosilicon compound by the basic catalyst component released from the silica-based particles.

Description

200932847 九、發明說明 【發明所屬之技術領域】 本發明係關於形成具有高被膜強度和較低的比 ,且表面平坦性和耐裂性等優良之氧化矽系被膜用 、其調製方法及自該塗佈液所得氧化矽系被膜。 【先前技術】 0 近年來,於半導體裝置、液晶裝置、感應器裝 示裝置等之製造業界中,多於半導體基板上、多層 造之配線層間、元件表面及/或設置PN接合部所成 上和液晶基板上,形成作爲絕緣膜的氧化矽系被膜 〇 作爲形成此類氧化矽系被膜的塗佈液,例如, 含一般式RnSi(OR’)4_n(式中,R、R’爲表示碳數] 烷基、芳基或乙烯基,η爲0〜3之整數)所示之烷 _ 烷進行水解縮聚所得之氧化矽溶液、與前述烷氧基 部分水解物之反應物的形成被膜用塗佈液(記載於 獻1)、和b)含有氧化矽微粒子、及一般式XnSi 4-n(式中,X爲表示H、F或碳數1〜8之烷基、芳 烯基,R爲表示Η或碳數1〜8之烷基、芳基或乙大 爲0〜3之整數)所示之烷氧基矽烷及/或一般式 (式中,X爲表示H、F或碳數1〜8之烷基、芳基 基’X’爲表示圍原子,η爲0〜3之整數)所示之 院或其水解物之反應物爲其特徵之形成低介電率氧 介電率 塗佈液 置、顯 配線構 之基板 供使用 a )包 〜8之 氧基矽 矽烷之 專利文 (OR) 基或乙 I基,η SiX,4-n 或乙烯 鹵化砂 化矽系 -5- 200932847 被膜用塗佈液(記載於專利文獻2)等。 但是’本發明者等人使用此些塗佈液和先前公知之形 成被膜方法(旋塗法和其他之塗佈法)構成各種裝置的基 板和其他接合面,重複進行形成氧化矽系被膜之試驗時, 雖取得具備前述特性的被膜,但於被膜中一部分偏頗存在 前述氧化矽微粒子、或者前述氧化矽微粒子與烷氧基矽烷 之部分水解物及/或水解物的反應不夠充分的情形中,於 q 膜全體不一定可取得均勻且具有安定強度(壓縮強度及拉 伸強度)的被膜,且根據情況於被膜上發生針孔和裂痕。 於是,本發明者等人以解決此類問題爲目的,繼續致 力硏究時,發現若使用如下示之形成氧化矽系被膜用塗佈 液即可,且完成達到本發明。 [專利文獻1 ]專利第3 1 6 3 5 7 9號 [專利文獻2 ]專利第3 8 1 3 2 6 8號 Q 【發明內容】 (發明所欲解決之課題) 本發明爲欲解決如上述之問題點,以提供楊氏彈性率 爲3.OGPa以上,更詳言之,具有5.0 GP a以上之高被膜強 度和較低比介電率,且表面平坦性和耐裂性等優良之氧化 矽系被膜用之塗佈液,其調製方法及自該塗佈液所得之氧 化矽系被膜,特別爲氧化矽系絕緣膜爲目的。 (解決課題之手段) -6- 200932847 本發明之形成氧化矽系被膜用塗佈液,其特徵爲含有 將含有下述一般式(I)所示之烷氧基矽烷、下述一 般式(II)所示之鹵化矽烷及其部分水解物所選出之至少 一種有機矽化合物、與含有鹼性觸媒成分之氧化矽系微粒 子的分散液加熱,至少經由前述氧化矽系微粒子所放出之 前述鹼性觸媒成分將前述有機矽化合物予以部分水解及/ 或水解所得的矽化合物。 ❹ RnSi(OR,)4-n .........(I)200932847 IX. The present invention relates to the formation of a cerium oxide-based film having a high film strength and a low ratio, and having excellent surface flatness and crack resistance, a preparation method thereof, and a self-coating method. The cerium oxide film obtained from the cloth solution. [Prior Art] 0 In recent years, in the manufacturing industry of semiconductor devices, liquid crystal devices, and sensor display devices, more than a semiconductor substrate, a plurality of wiring layers, a component surface, and/or a PN junction portion are formed. On the liquid crystal substrate, a cerium oxide-based coating film as an insulating film is formed as a coating liquid for forming such a cerium oxide-based coating film, for example, containing a general formula of RnSi(OR')4_n (wherein R, R' represent carbon a cerium oxide solution obtained by hydrolyzing polycondensation of an alkyl group represented by an alkyl group, an aryl group or a vinyl group, and having an alkyl group, an aryl group or a vinyl group, and an alkane represented by an integer of 0 to 3, and a reaction product of the alkoxy partial hydrolyzate The cloth liquid (described in 1) and b) contain cerium oxide microparticles and a general formula XnSi 4-n (wherein X is an alkyl group or an aryl group which represents H, F or a carbon number of 1 to 8, and R is An alkoxy decane represented by hydrazine or an alkyl group having 1 to 8 carbon atoms, an aryl group or an integer of 0 to 3, and/or a general formula (wherein X represents H, F or a carbon number of 1) a reactant of a hospital having a base of ~8, an alkyl group of the aryl group 'X', which represents an atom and η is an integer of 0 to 3, or a hydrolyzate thereof The characteristic is that the low dielectric constant oxygen dielectric rate coating liquid is disposed, and the substrate of the display wiring is used for a) the patent (OR) base or the acetylene group of the oxy decane of -8 η, η SiX, 4 -n or ethylene halogenated lanthanide -5 - 200932847 coating liquid for film (described in Patent Document 2). However, the inventors of the present invention repeatedly used the coating liquid and the previously known film forming method (spin coating method and other coating methods) to form substrates and other joint faces of various devices, and repeated tests for forming a ruthenium oxide film. In the case where the film having the above-described characteristics is obtained, in some cases, the cerium oxide fine particles are partially deviated, or the reaction between the cerium oxide fine particles and the partial hydrolyzate and/or the hydrolyzate of the alkoxy decane is insufficient. q The film is not necessarily uniform and has a film having a stable strength (compressive strength and tensile strength), and pinholes and cracks occur on the film depending on the case. Then, the inventors of the present invention have continued to make efforts to solve such problems, and have found that the coating liquid for forming a cerium oxide-based coating film as shown below can be used, and the present invention has been completed. [Patent Document 1] Patent No. 3 1 3 3 5 7 9 [Patent Document 2] Patent No. 3 8 1 3 2 6 8 Q [Explanation] The problem to be solved by the present invention is to solve the above The problem is to provide a Young's modulus of elasticity of 3.OGPa or more, and more specifically, a high-yellow film strength of 5.0 GP a or more and a low specific dielectric ratio, and excellent surface roughness and crack resistance. A coating liquid for a film, a preparation method thereof, and a cerium oxide-based film obtained from the coating liquid, in particular, a cerium oxide-based insulating film. (Means for Solving the Problem) -6-200932847 The coating liquid for forming a cerium oxide-based film of the present invention is characterized by containing an alkoxy decane represented by the following general formula (I), and the following general formula (II) And heating the dispersion of the at least one organic hydrazine compound selected from the halogenated decane and the partial hydrolyzate thereof and the cerium oxide-based fine particles containing the basic catalyst component, at least the aforementioned alkaline liberated by the cerium oxide-based fine particles The catalyst component is a hydrazine compound obtained by partially hydrolyzing and/or hydrolyzing the above organic hydrazine compound. ❹ RnSi(OR,)4-n .........(I)

RnSiX4.„ .........(II) (式中’ R爲表示氫原子、氟原子、或碳數1〜8之烷基 、經氟取代之烷基、芳基、乙烯基或苯基,R’爲表示氫原 子、或碳數1〜8之烷基、芳基、乙烯基或苯基,X爲表 示鹵原子。又,η爲0〜3之整數)。 於上述之形成氧化矽系被膜用塗佈液中的前述分散液 ’以含有水和醇的水一醇系分散液爲佳。 Q 又’於前述分散液中,再含有鹼性觸媒成分及/或酸 性觸媒成分爲佳。 更且’前述鹼性觸媒成分爲由氨、氫氧化銨、四級銨 化合物、有機胺及胺系偶合劑中選出至少一種爲佳。 又,前述酸觸媒成分爲由硝酸、鹽酸、醋酸及硫酸中 選出至少一種爲佳。 前述二氧化矽系微粒子爲令下述一般式(I)所示之 烷氧基矽烷,於前述鹼性觸媒成分存在下水解.縮聚所得 的氧化矽系微粒子’且調整該氧化矽系微粒子中所含之前 200932847 述鹼性觸媒成分的份量爲佳。RnSiX4.„.........(II) (wherein R is a hydrogen atom, a fluorine atom, or an alkyl group having 1 to 8 carbon atoms, an alkyl group substituted by fluorine, an aryl group, or a vinyl group. Or a phenyl group, R' is a hydrogen atom, or an alkyl group having 1 to 8 carbon atoms, an aryl group, a vinyl group or a phenyl group, and X is a halogen atom. Further, η is an integer of 0 to 3). It is preferable that the dispersion liquid in the coating liquid for a cerium oxide-based coating film contains a water-alcohol-based dispersion containing water and an alcohol. Q further includes a basic catalyst component and/or an acid in the dispersion liquid. Further, it is preferred that the above-mentioned basic catalyst component is at least one selected from the group consisting of ammonia, ammonium hydroxide, a quaternary ammonium compound, an organic amine, and an amine coupling agent. Further, the acid catalyst component is It is preferable to select at least one of nitric acid, hydrochloric acid, acetic acid, and sulfuric acid. The cerium oxide-based fine particles are an alkoxy decane represented by the following general formula (I), which is hydrolyzed in the presence of the above-mentioned basic catalyst component. The obtained cerium oxide-based fine particles 'and the parts of the basic catalyst component of the previous 200932847 contained in the cerium oxide-based fine particles are adjusted. Better.

RnSi(〇R’)4 —n .........(I) (式中’ R爲表示氫原子、氟原子、或碩 、經氟取代之烷基、芳基、乙烯基或苯3 子、或碳數1〜8之烷基、芳基、乙烯基i 0〜3之整數)。 更且,前述二氧化矽系微粒子爲含有 ppm軔圍之則述驗性觸媒成分爲佳。 前述矽化合物爲含有至少經由前述氧 放出之前述鹼性觸媒成分,將前述有機砂 及/或水解的反應物和前述氧化矽系微粒 物的至少一部分爲結合至前述氧化矽系微 及其細孔內表面爲佳。 更且,前述矽化合物爲含有經由前述 前述鹼性觸媒成分及/或酸性觸媒成分與 粒子所放出之前述鹼性觸媒成分,將前述 分水解及/或水解的反應物和前述氧化矽 述反應物的至少一部分爲結合至前述氧化 部表面及其細孔內表面爲佳。 又,前述矽化合物爲以換算聚苯乙烯 〜5000之數平均分子量爲佳。 更且,前述塗佈液中所含之離子濃度 以下爲佳。 本發明之形成氧化矽系被膜用塗佈液 丨數1〜8之烷基 ;,R’爲表示氫原 突苯基。又,η爲 200〜1 1 〇〇重量 化矽系微粒子所 化合物部分水解 子,且前述反應 粒子的外部表面 分散液中所含之 前述氧化矽系微 有機矽化合物部 系微粒子,且前 矽系微粒子的外 基準,具有5 0 〇 爲i·0毫莫耳/升 之調製方法,係 -8 - 200932847 爲製造含有根據下列步驟所得之矽化合物之形成氧化矽系 被膜用塗佈液的方法。 (a) 將下述一般式(I)所示之烷氧基矽烷於鹼性觸 媒成分存在下水解•縮聚所得之氧化矽系微粒子的水一醇 系分散液加至超過濾裝置,調整前述鹼性觸媒成分之含量 之調製氧化矽系微粒子之水一醇系分散液的步驟。 (b) 於前述含有氧化矽系微粒子的水一醇分散液中 ,混合含有下述一般式(I)所示之烷氧基矽烷,下述一 般式(Π)所示之鹵化矽烷及其部分水解物中選出至少一 種之有機矽化合物之水分散液的步驟、 (c )將前述混合液於3 0〜8 0 °C之溫度中加熱,至少 經由前述氧化矽系微粒子所放出的前述鹼性觸媒成分,將 前述有機矽化合物部分水解及/或水解的步驟 R„Si(OR,)4.n .........(I)RnSi(〇R')4—n (1) (wherein R is a hydrogen atom, a fluorine atom, or a fluorine-substituted alkyl group, an aryl group, a vinyl group or Benzene 3, or an alkyl group having 1 to 8 carbon atoms, an aryl group, and an integer of vinyl i 0 to 3). Further, it is preferable that the cerium oxide-based fine particles are those having a ppm enthalpy. The ruthenium compound is a base catalyst component containing at least the oxygen-releasing agent, and at least a part of the organic sand and/or the hydrolyzed reactant and the cerium oxide-based fine particle are bonded to the cerium oxide micro-fine and fine The inner surface of the hole is preferred. Further, the ruthenium compound is a reaction product containing the above-mentioned basic catalyst component released from the alkaline catalyst component and/or the acidic catalyst component and the particles, and hydrolyzing and/or hydrolyzing the fraction and the cerium oxide. At least a part of the reactant is preferably bonded to the surface of the oxidized portion and the inner surface of the pore. Further, the ruthenium compound is preferably an average molecular weight of from 10,000 to 5,000. Further, the ion concentration contained in the coating liquid is preferably at most the following. The coating liquid for forming a cerium oxide-based film of the present invention has an alkyl group having a number of from 1 to 8, and R' is a hydrogen phenylene group. Further, η is a partial hydrolyzate of the compound of the ruthenium-based fine particles of 200 to 1 1 ,, and the cerium oxide-based microorganoanthoquinone compound-based fine particles contained in the external surface dispersion of the reaction particles, and the front lanthanide The external standard of the microparticles has a method of preparing a cerium oxide-based coating film containing the cerium compound obtained according to the following procedure. (a) The water-alcohol-based dispersion of the cerium oxide-based fine particles obtained by hydrolyzing and polycondensing the alkoxydecane represented by the following general formula (I) in the presence of a basic catalyst component is added to an ultrafiltration device, and the above-mentioned adjustment is carried out. A step of preparing a water-alcohol-based dispersion of cerium oxide-based fine particles in an amount of a basic catalyst component. (b) In the water-alcohol dispersion containing the cerium oxide-based fine particles, the alkoxy decane represented by the following general formula (I), a halogenated decane represented by the following general formula (Π), and a part thereof are mixed and mixed. a step of selecting at least one aqueous dispersion of the organic cerium compound in the hydrolyzate, and (c) heating the mixed liquid at a temperature of 30 to 80 ° C, at least the aforementioned alkaline liberated by the cerium oxide-based fine particles a catalyst component, a step of partially hydrolyzing and/or hydrolyzing the aforementioned organic hydrazine compound R„Si(OR,)4.n (...)

RnSiX4-„ .........(II) (式中,R爲表示氫原子、氟原子、或碳數1〜8之烷基 、經氟取代之烷基、芳基、乙烯基或苯基,R’爲表示氫原 子、或碳數1〜8之烷基、芳基、乙烯基或苯基,X爲表 示鹵原子。又,η爲0〜3之整數)。 前述步驟(a )所得之前述氧化矽系微粒子中所含之 驗性觸媒成分的含量,爲200〜1100重量ppm之範圍爲佳 〇 又,前述步驟(b)所調製之前述分散液中,再含有 鹼性觸媒成分及/或酸性觸媒成分爲佳。 -9 - 200932847 更且,前述鹼性觸媒成分爲由氨、氫氧化銨、四級銨 化合物、有機胺及胺系偶合劑中選出至少一種爲佳。 又,前述酸性觸媒成分爲由硝酸、鹽酸、醋酸及硫酸 中選出至少一種爲佳。 本發明之氧化矽系被膜爲於基板上塗佈上述之形成被 膜用塗佈液並且乾燥、熘燒所得、具有高被膜強度和較低 的比介電率,且表面平坦性和耐裂性優良之氧化矽系被膜 Λ 爲其特徵。 Ο 前述氧化矽系被膜爲含有將前述有機矽化合物部分水 解及/或水解所得之反應物的至少一部分爲結合至前述氧 化矽系微粒子之外部表面及其細孔內表面而成之矽化合物 的縮聚物爲佳。 又,前述氧化矽系被膜爲具有楊氏彈性率3.0GPa以 上之被膜強度爲佳。更且,前述氧化矽系被膜爲其表面粗 度(Rms)爲5.Onm以下之具有平滑表面的氧化矽系被膜爲 φ 佳。 又’前述氧化矽系被膜可適合使用作爲氧化矽系絕緣 膜。 (發明之效果) 右根據本發明之形成氧化砍系被膜用塗佈液,則可形 成楊氏彈性率爲3.OGPa以上’更詳言之爲5.0以上之具 有高被膜強度和較低的比介電率,且表面平坦性和耐裂性 等優良之氧化砂系被膜、特別爲氧化砂系絕緣膜。 -10- 200932847 又’若根據本發明之前述塗佈液,則即使於被膜表面 未施以硏磨處理等,亦可於基板上形成其表面粗度(Rms) 爲5.Onm以下之具有平滑表面的氧化矽系被膜,特別爲氧 化矽系絕緣膜。更且’於所得之氧化矽系被膜表面,亦不 會出現針孔等。 又,使用本發明之前述塗佈液所得的氧化矽系被膜, 除了上述之性狀以外’具備與半導體基板等之形成被膜面 的密合性和耐鹼性等耐藥品性優良,且耐氧電漿性和蝕刻 加工性等之步驟適合性亦優良的特性。 【實施方式】 以下,具體說明關於本發明之形成氧化矽系被膜用塗 佈液、其調製方法及將該塗佈液於基板上塗佈所得的氧化 矽系被膜。 [形成被膜用塗佈液] 本發明之形成氧化矽系被膜用塗佈液爲含有 將含有下述一般式(I)所示之烷氧基矽烷,下述一般式 (II )所示之鹵化矽烷及其部分水解物所選出之至少一種 有機矽化合物、與含有鹼性觸媒成分之氧化矽系微粒子的 分散液加熱,至少經由前述氧化矽系微粒子所放出之前述 鹼性觸媒成分將前述有機矽化合物予以部分水解及/或水 解所得的矽化合物。RnSiX4-„ (4) (wherein R is a hydrogen atom, a fluorine atom, or an alkyl group having 1 to 8 carbon atoms, an alkyl group substituted by fluorine, an aryl group, or a vinyl group. Or a phenyl group, R' is a hydrogen atom, or an alkyl group having an alkyl group of 1 to 8, an aryl group, a vinyl group or a phenyl group, and X is a halogen atom. Further, η is an integer of 0 to 3). a) The content of the inert catalyst component contained in the obtained cerium oxide-based fine particles is preferably in the range of 200 to 1100 ppm by weight, and the alkali liquid prepared in the above step (b) further contains a base. Preferably, the alkaline catalyst component is selected from ammonia, ammonium hydroxide, a quaternary ammonium compound, an organic amine, and an amine coupling agent. -9 - 200932847 Further, the alkaline catalyst component is selected from the group consisting of ammonia, ammonium hydroxide, a quaternary ammonium compound, an organic amine, and an amine coupling agent. In addition, it is preferable that the acid catalyst component is at least one selected from the group consisting of nitric acid, hydrochloric acid, acetic acid, and sulfuric acid. The cerium oxide-based coating of the present invention is coated on the substrate to form a coating liquid for coating film and dried. , obtained by calcination, with high film strength and low specific dielectric ratio, and excellent surface flatness and crack resistance The cerium oxide-based coating film is characterized in that: the cerium oxide-based coating film contains at least a part of the reactant obtained by partially hydrolyzing and/or hydrolyzing the organic cerium compound to be bonded to the outer surface of the cerium oxide-based fine particle and fine Further, the cerium oxide-based coating film is preferably a film having a Young's modulus of 3.0 GPa or more, and the cerium oxide-based film is a surface roughness thereof. The yttrium oxide-based film having a smooth surface of 5.Onm or less is preferably φ. Further, the yttrium oxide-based film can be suitably used as a yttrium oxide-based insulating film. (Effect of the Invention) Right oxidized dicing according to the present invention When the coating liquid for a film is used, it is possible to form a Young's modulus of 3.OGPa or more, and more specifically 5.0 or more, which has a high film strength and a low specific dielectric ratio, and is excellent in surface flatness and crack resistance. The oxidized sand-based coating film, in particular, the oxidized sand-based insulating film. -10-200932847 In addition, according to the coating liquid of the present invention, even if the surface of the coating film is not subjected to honing treatment or the like, A cerium oxide-based film having a smooth surface (Rms) of 5. Onm or less having a smooth surface is formed on the substrate, particularly a yttrium oxide-based insulating film, and the surface of the obtained yttrium oxide film does not appear on the surface. In addition to the above-described properties, the cerium oxide-based coating film obtained by using the coating liquid of the present invention has excellent adhesion to a film surface formed on a semiconductor substrate or the like, and is excellent in chemical resistance such as alkali resistance. In addition, the coating liquid for forming a cerium oxide-based coating film of the present invention, a preparation method thereof, and the coating method will be specifically described below. The cerium oxide-based coating film is applied to the substrate. The coating liquid for forming a cerium oxide-based coating film of the present invention contains an alkoxy group having the following general formula (I). a decane, at least one organic hydrazine compound selected from the following halogenated decane represented by the general formula (II) and a partial hydrolyzate thereof, and a dispersion of cerium oxide-based fine particles containing a basic catalyst component, at least The ruthenium compound obtained by partially hydrolyzing and/or hydrolyzing the above organic ruthenium compound from the above-mentioned basic catalyst component released from the yttrium oxide-based fine particles.

RnSi(OR,)4_n .........(I) -11 - 200932847RnSi(OR,)4_n .........(I) -11 - 200932847

RnSiX4-n .........(Π) (式中,R爲表示氫原子、氟原子、或碳數1〜8之院基 、經氟取代之烷基、芳基、乙烯基或苯基’ R’爲表示氫原 子、或碳數1〜8之烷基、芳基、乙嫌基或苯基’X爲表 示鹵原子。又,η爲0〜3之整數)° 此處,前述烷氧基矽烷可列舉例如甲基三甲氧基砂院 、甲基三乙氧基矽烷、甲基三異丙氧基矽烷、乙基三甲氧 基矽烷、乙基三乙氧基矽烷、乙基三異丙氧基矽烷、辛基 三甲氧基矽烷、辛基三乙氧基矽烷、乙嫌基三甲氧基矽院 、乙烯基三乙氧基矽烷、苯基三甲氧基矽烷、苯基三乙氧 基矽烷、三甲氧基矽烷、三乙氧基矽烷、三異丙氧基矽烷 、氟基三甲氧基矽烷、氟基三乙氧基矽烷、二甲基二甲氧 基矽烷、二甲基二乙氧基矽烷、二乙基二甲氧基矽烷、二 乙基二乙氧基矽烷、二甲氧基矽烷、二乙氧基矽烷、二氟 基二甲氧基矽烷、二氟基二乙氧基矽烷、三氟甲基三甲氧 基矽烷、三氟甲基三乙氧基矽烷等。其中,亦以使用甲基 三甲氧基矽烷、甲基三乙氧基矽烷或其混合物爲佳。 前述鹵化矽烷可列舉例如,四氯矽烷 '三氯矽烷、甲 基三氯矽烷、甲基二氯矽烷、乙烯基三氯矽烷、乙基三氯 矽烷、二甲基二氯矽烷、二甲基氯基矽烷、3,3,3-三氟丙 基三氯矽烷、甲基乙烯基二氯矽烷、正丙基三氯砂院、三 甲基氯基砍院、甲基-3,3,3 -三氟丙基二氯砂院、二甲基乙 嫌基氯基砍院、甲基丙基一氯砂院、苯基三氯砂院、第三 丁基二甲基氯基砍院、甲基苯基二氯基砂院、十七氧基癸 -12- 200932847 基二氯砂院、二苯基一氯砂院等。其中,亦以使用三氯砍 烷、甲基三氯矽烷或其混合物爲佳。 前述分散液以含有水和醇的水一醇系分散液爲佳。此 處所使用之醇可列舉例如甲醇、乙醇、丙醇、異丙醇、正 丁醇等。其中,亦以使用甲醇、乙醇或其混合物爲佳。 又,於前述分散液中,再含有鹼性觸媒成分及/或酸 性觸媒成分爲佳。其中,亦期望使用含有前述酸性觸媒成 分者。其係因若在初期階段於酸性觸媒成分存在下令前述 有機矽化合物部分水解及/或水解後,使用含有進一步經 由鹼性觸媒成分(由前述氧化矽系微粒子所放出的鹼性觸 媒成分等)之作用效果予以部分水解及/或水解所得之矽 化合物的塗佈液形成被膜,則可取得緻密的氧化矽系被膜 前述驗性觸媒成分可列舉氨、氫氧化錢、四級錢化合 物、有機胺及胺系偶合劑等。其中,亦以使用氨、氫氧化 銨或四級銨化合物爲佳。 又,前述酸性觸媒成分可列舉硝酸、鹽酸、醋酸及硫 酸等。其中,亦以使用硝酸或鹽酸爲佳。 更且,前述氧化矽系微粒子中所含之前述鹼性觸媒成 分爲與上述之情形相同,可列舉氨、氫氧化銨、四級銨化 合物、有機胺及胺系偶合劑等。其中,亦以前述氧化矽系 微粒子中,含有氨或氫氧化銨爲佳。其係因若將含有前述 烷氧基矽烷和前述氧化矽系微粒子之分散液加熱,則此等 鹼性觸媒成分易由前述氧化矽系微粒子中放出。 -13- 200932847 另外,前述氧化矽系微粒子中所含之鹼性觸媒成分和 前述分散液中所含之鹼性觸媒成分,可爲相同或相異,但 期望儘可能使用相同者。 前述氧化矽系微粒子爲令下述一般式(I)所示之烷 氧基矽烷於前述鹼性觸媒成分存在下水解•縮聚所得的氧 化矽系微粒子,且調整該氧化矽系微粒子中所含之前述鹼 性觸媒成分的份量爲佳。 Q RnSi(OR,)4-n .........(I) (式中,R爲表示氫原子、氟原子、或碳數1〜8之烷基 、經氟取代之烷基、芳基、乙烯基或苯基,R’爲表示氫原 子、或碳數1〜8之烷基、芳基、乙烯基或苯基。又,η爲 〇〜3之整數)。 此時,前述氧化矽系微粒子中所含之前述鹼性觸媒成 分的含量,調整至200〜1100重量ppm、較佳爲400〜8〇〇 重量ppm之範圍爲佳。此處,若前述含量未達200重量 φ PPm,則於前述氧化矽系微粒子之外部表面附近和細孔內 表面附近,無法充分進行前述有機矽化合物的部分水解反 應和水解反應(即,反應量少),故使用如此處理所得之 塗佈液形成氧化矽系被膜時,無法取得充分的被膜強度, 若前述含量爲超過1100重量ppm,則無法進行前述的部 分水解反應和水解反應,且所得塗佈液的保存安定性變差 ,故爲不佳。 又’前述之調整爲將含有前述烷氧基矽烷之水解•縮 聚物所構成之氧化矽系微粒子的水一醇系分散液加至超過 -14- 200932847 濾裝置,並以下列詳述之方法進行爲佳。 更且,前述氧化砂系微粒子爲平均粒徑爲5〜500nm 之軺圍爲佳。此處’右目U述平均粒徑未達5nm,則無法充 分發揮作爲塡充劑的效果,故在提高被膜強度方面有問題 ,若前述平均粒徑爲超過500nm,則難以均勻的分散液狀 態保存,故爲不佳。 更且,前述有機矽化合物爲令烷氧基矽烷及/或鹵化 矽烷預先部分水解後,與含有前述鹼性觸媒成分之前述氧 化砂系微粒子的水一醇系分散液混合,進一步水解亦可。 此時’前述烷氧基矽烷及/或鹵化矽烷的部分水解爲 於前述酸性觸媒成分之存在下進行爲佳。其與上述之情形 相同’預先令前述有機矽化合物於酸性觸媒成分之存在下 部分水解後’使用含有進一步經由鹼性觸媒成分(由前述 氧化矽系微粒子所放出的鹼性觸媒成分等)之作用效果予 以水解所得之矽化合物的塗佈液形成被膜,則可取得緻密 的氧化矽系被膜。 前述氧化矽系微粒子與前述有機矽化合物的含有比例 ’於前述氧化矽系微粒子之重量以A表示,前述矽化合物 之重量(換算Si〇2基準)以B表示時,其重量比(A/B ) 爲1/9〜9/1、較佳爲4/6〜6/4之範圍。此處,若前述重量 it A達1 /9 ’則最終所得被膜的耐裂性變差,若前述重量 比爲超過9/1,則前述被膜的比介電率上升,故爲不佳。 如I此處理所得之前述矽化合物,係含有至少經由前述 氧化砂系微粒子所放出的前述鹼性觸媒成分,將前述有機 -15- 200932847 砂化合物予以部分水解及/或水解的反應物和前述氧化矽 系微粒子’且前述反應物的至少一部分爲結合至前述氧化 砂系微粒子的外部表面及其細孔內表面。其係因前述氧化 砂系微粒子所放出的前述鹼性觸媒成分,爲於該氧化矽系 微粒子的外部表面和其細孔內表面附近,令前述有機矽化 合物部分水解及/或水解,故前述反應物與前述氧化矽系 微粒子的結合爲充分進行。 使用前述分散液中含有鹼性觸媒成分及/或酸性觸媒 成分者之情形中,取得含有前述分散液中所含之前述鹼性 觸媒成分及/或前述酸性觸媒成分、和經由前述氧化矽系 微粒子所放出之前述鹼性觸媒成分,將前述有機矽化合物 部分水解及/或水解之反應物和前述氧化矽系微粒子,且 前述反應物的至少一部分爲結合至前述氧化矽系微粒子之 外部表面及其細孔內表面的矽化合物。 又,如此處理所得之前述矽化合物爲以換算聚苯乙烯 基準,具有500〜5000,較佳爲800〜3000的數平均分子 量爲佳。此數平均分子量若爲上述之範圍,則可提供顯示 優良之經時安定性和良好之塗佈性的形成氧化矽系被膜用 塗佈液。 更且,含有如此處理所得之前述矽化合物的水一醇分 散液,可就其原樣之狀態下使用作爲形成氧化砂系被膜用 塗佈液,但將該分散液中所含之水分和醇成分’使用先前 公知之方法,例如以旋轉蒸發器之蒸餾法等’與丙二醇單 丙醚、丙二醇單甲醚、丙二醇單乙醚醋酸酯等所選出之至 -16- 200932847 少一種有機溶劑進行溶劑更換供使用爲佳。 經由進行此溶劑更換,則可令前述水一醇分散液中所 含之水和醇,進一步將前述烷氧基矽烷等之水解所副生成 的醇類等予以分離、除去。另外,若使用旋轉蒸發器進行 上述操作,則亦可大約完全進行前述的溶劑更換,但於本 發明,並非必要令其完全進行。 如此處理所得之塗佈液中所含之矽化合物份量,亦根 據其使用用途而異,此矽化合物以Si〇2表示時,相對於 該塗佈液之重量,期望調整至2〜50重量%、較佳爲10〜 40重量%之範圍。此處,其含量若超過50重量%,則前述 塗佈液的經時安定性變差,若未達2重量%,則難於基板 上形成均勻的被膜。 又,於本發明中,於前述液狀組成物中亦可添加作爲 勻塗劑的界面活性劑和聚矽氧樹脂等。前述界面活性劑可 列舉聚氧伸烷基二甲基聚矽氧烷等之聚矽氧系界面活性劑 和全氟烷基羧酸鹽、全氟烷基環氧乙烷加成物等之氟系界 面活性劑等,又,前述聚矽氧樹脂可列舉聚醚改性之聚矽 氧樹脂、胺基改性之聚矽氧樹脂、環氧改性之聚矽氧樹脂 、烷氧基改性樹脂等。其中,亦以使用聚矽氧樹脂爲佳。 更且,前述形成氧化矽系被膜用塗佈液中所含之離子 濃度期望爲1.0毫莫耳/公升以下、較佳爲0.6毫莫耳/公 升以下。此處,若離子濃度爲超過1.0毫莫耳/公升,則使 用前述塗佈液形成被膜時,起因於該塗佈液中所含之離子 ,於被膜中發生空隙和針孔等,故爲不佳。 -17- 200932847 [形成被膜用塗佈液之調製方法] 其次,若敘述本發明之形成氧化矽系被膜用塗佈液之 調整方法,則如下。 本發明之塗佈液的調製方法爲製造含有根據下列步驟 所得之矽化合物之形成氧化矽系被膜用塗佈液的方法。 (a) 將下述一般式(I)所示之烷氧基矽烷於鹼性觸 媒成分存在下水解•縮聚所得之氧化矽系微粒子的水一醇 系分散液加至超過濾裝置,調整前述鹼性觸媒成分之含量 之g周製氧化砂系微粒子之水一醇系分散液的步驟。 (b) 於含有前述氧化矽系微粒子的水一醇系分散液 中’混合含有下述一般式(I)所示之烷氧基矽烷,下述 一般式(11 )所示之鹵化矽烷及其部分水解物中選出至少 一種之有機矽化合物之水分散液的步驟、 (c )將前述混合液於3 0〜8 (TC之溫度中加熱,至少 Q 經由前述氧化矽系微粒子所放出的前述鹼性觸媒成分,將 前述有機矽化合物部分水解及/或水解的步驟RnSiX4-n (...) (wherein R is a hydrogen atom, a fluorine atom, or a hydrocarbon group having a carbon number of 1 to 8, a fluorine-substituted alkyl group, an aryl group, or a vinyl group. Or phenyl 'R' is a hydrogen atom, or an alkyl group having 1 to 8 carbon atoms, an aryl group, an ethyl group or a phenyl group 'X is a halogen atom. Further, η is an integer of 0 to 3) ° The alkoxydecane may, for example, be methyltrimethoxy sand, methyltriethoxysilane, methyltriisopropoxydecane, ethyltrimethoxydecane, ethyltriethoxydecane, or B. Triisopropoxy decane, octyl trimethoxy decane, octyl triethoxy decane, ethyl trimethoxy fluorene, vinyl triethoxy decane, phenyl trimethoxy decane, phenyl tri Ethoxy decane, trimethoxy decane, triethoxy decane, triisopropoxy decane, fluorotrimethoxy decane, fluorotriethoxy decane, dimethyl dimethoxy decane, dimethyl Diethoxydecane, diethyldimethoxydecane, diethyldiethoxydecane, dimethoxydecane, diethoxydecane, difluorodimethoxydecane, difluorodiyl Silane group, trifluoromethyl trimethoxy Silane, trifluoromethyl triethoxy silane-like. Among them, methyltrimethoxydecane, methyltriethoxysilane or a mixture thereof is preferably used. The halogenated decane may, for example, be tetrachlorodecane 'trichlorodecane, methyl trichlorodecane, methyl dichlorodecane, vinyl trichlorodecane, ethyl trichlorodecane, dimethyl dichlorodecane or dimethyl chloride. Baseline, 3,3,3-trifluoropropyltrichloromethane, methylvinyldichlorodecane, n-propyltrichlorosilane, trimethylchlorocholine, methyl-3,3,3 - Trifluoropropyl dichloride sand yard, dimethyl ketone chlorinated base, methyl propyl chlorinated sand, phenyl trichloride sand, third butyl dimethyl chloride based, methyl Phenyl dichloride based sand, heptadecyl fluorene-12- 200932847 based dichlorinated sand yard, diphenyl chlorinated sand yard, etc. Among them, chlorocraceane, methyltrichlorodecane or a mixture thereof is preferably used. The dispersion liquid is preferably a water-alcohol-based dispersion containing water and an alcohol. The alcohol to be used herein may, for example, be methanol, ethanol, propanol, isopropanol or n-butanol. Among them, methanol, ethanol or a mixture thereof is preferably used. Further, it is preferable to further contain a basic catalyst component and/or an acid catalyst component in the dispersion liquid. Among them, it is also desirable to use a component containing the aforementioned acidic catalyst. When the organic ruthenium compound is partially hydrolyzed and/or hydrolyzed in the presence of an acidic catalyst component in the initial stage, the basic catalyst component (the alkaline catalyst component released from the cerium oxide-based fine particles) is further contained. Effect of the effect, etc. The coating liquid of the hydrazine compound obtained by partial hydrolysis and/or hydrolysis forms a film, and a dense cerium oxide-based film can be obtained. The above-mentioned test catalyst component can be exemplified by ammonia, hydrogen peroxide, and quaternary compound. , organic amines and amine coupling agents. Among them, it is preferred to use ammonia, ammonium hydroxide or a quaternary ammonium compound. Further, examples of the acidic catalyst component include nitric acid, hydrochloric acid, acetic acid, sulfuric acid and the like. Among them, nitric acid or hydrochloric acid is preferably used. Further, the basic catalyst component contained in the cerium oxide-based fine particles is the same as the above, and examples thereof include ammonia, ammonium hydroxide, a quaternary ammonium compound, an organic amine, and an amine coupling agent. Among them, it is preferable that the cerium oxide-based fine particles contain ammonia or ammonium hydroxide. When the dispersion containing the alkoxysilane and the cerium oxide-based fine particles is heated, these alkaline catalyst components are easily released from the cerium oxide-based fine particles. Further, the alkaline catalyst component contained in the cerium oxide-based fine particles and the basic catalyst component contained in the dispersion liquid may be the same or different, but it is desirable to use the same as much as possible. The cerium oxide-based fine particles are cerium oxide-based fine particles obtained by hydrolyzing and polycondensing the alkoxy decane represented by the following general formula (I) in the presence of the basic catalytic component, and adjusting the cerium oxide-based fine particles. The amount of the aforementioned basic catalyst component is preferably. Q RnSi(OR,)4-n (I) (wherein R is a hydrogen atom, a fluorine atom, or an alkyl group having 1 to 8 carbon atoms, a fluorine-substituted alkyl group And an aryl group, a vinyl group or a phenyl group, and R' is a hydrogen atom or an alkyl group having an alkyl group of 1 to 8, an aryl group, a vinyl group or a phenyl group. Further, η is an integer of 〇3 to 3). In this case, the content of the basic catalyst component contained in the cerium oxide-based fine particles is preferably in the range of 200 to 1100 ppm by weight, preferably 400 to 8 Å by weight ppm. When the content is less than 200 φ PPm, the partial hydrolysis reaction and the hydrolysis reaction of the organic hydrazine compound (that is, the reaction amount) cannot be sufficiently performed in the vicinity of the outer surface of the cerium oxide-based fine particles and in the vicinity of the inner surface of the pores. When the cerium oxide-based coating film is formed by using the coating liquid obtained by the above treatment, sufficient film strength cannot be obtained. When the content is more than 1,100 ppm by weight, the above partial hydrolysis reaction and hydrolysis reaction cannot be performed, and the resulting coating is carried out. The storage stability of the cloth liquid deteriorates, so it is not good. Further, the above-mentioned adjustment is carried out by adding a water-alcohol-based dispersion containing cerium oxide-based fine particles composed of the hydrolyzate/polycondensate of the alkoxydecane to a filtration apparatus exceeding -14 to 200932847, and performing the method as detailed below. It is better. Further, the oxidized sand-based fine particles are preferably a crumb circumference having an average particle diameter of 5 to 500 nm. When the average particle diameter of the right side is less than 5 nm, the effect as a chelating agent cannot be sufficiently exhibited. Therefore, there is a problem in that the film strength is increased. When the average particle diameter exceeds 500 nm, it is difficult to maintain a uniform dispersion state. Therefore, it is not good. Further, the organic hydrazine compound is obtained by partially hydrolyzing alkoxy decane and/or a halogenated decane, and then mixing with the water-alcohol-based dispersion containing the oxidized sand-based fine particles of the basic catalyst component, and further hydrolyzing. . In this case, it is preferred that the partial hydrolysis of the alkoxydecane and/or the halogenated decane is carried out in the presence of the acidic catalyst component. In the same manner as described above, the above-mentioned organic hydrazine compound is partially hydrolyzed in the presence of an acidic catalyst component, and the use further contains a basic catalyst component (a basic catalyst component released from the cerium oxide-based fine particles, etc.). Effect of the Invention The coating liquid of the hydrazine compound obtained by hydrolysis is formed into a film, and a dense cerium oxide-based film can be obtained. The ratio of the content of the cerium oxide-based fine particles to the organic cerium compound is represented by A in the weight of the cerium oxide-based fine particles, and the weight ratio (A/B) when the weight of the cerium compound (based on Si 〇 2 basis) is represented by B. It is a range of 1/9 to 9/1, preferably 4/6 to 6/4. Here, when the weight it A is 1 / 9 ', the crack resistance of the film finally obtained is deteriorated, and when the weight ratio is more than 9 / 1, the specific dielectric constant of the film is increased, which is not preferable. The ruthenium compound obtained by the treatment of the above-mentioned ruthenium compound containing at least the above-mentioned basic catalyst component released from the oxidized sand-based fine particles, and the above-mentioned organic -15-200932847 sand compound are partially hydrolyzed and/or hydrolyzed, and the aforementioned The cerium oxide-based fine particles 'and at least a part of the reactants are bonded to the outer surface of the oxidized sand-based fine particles and the inner surface of the pores thereof. The alkaline catalyst component emitted from the oxidized sand-based fine particles is such that the organic cerium compound is partially hydrolyzed and/or hydrolyzed in the vicinity of the outer surface of the cerium oxide-based fine particles and the inner surface of the pores. The combination of the reactant and the cerium oxide-based fine particles is sufficiently performed. In the case where the alkaline catalyst component and/or the acidic catalyst component are contained in the dispersion liquid, the alkaline catalyst component and/or the acid catalyst component contained in the dispersion liquid are obtained, and a basic catalyst component emitted from the cerium oxide-based fine particles, a reactant partially hydrolyzed and/or hydrolyzed by the organic cerium compound, and the cerium oxide-based fine particles, and at least a part of the reactant is bonded to the cerium oxide-based fine particles The outer surface and the ruthenium compound on the inner surface of the pores. Further, the ruthenium compound thus obtained is preferably a number average molecular weight of from 500 to 5,000, preferably from 800 to 3,000, based on the converted polystyrene. When the average molecular weight of the number is within the above range, it is possible to provide a coating liquid for forming a cerium oxide-based coating which exhibits excellent stability over time and good coatability. Further, the water-alcohol dispersion containing the ruthenium compound thus obtained can be used as a coating liquid for forming an oxidized sand-based film as it is, but the moisture and the alcohol component contained in the dispersion are contained. 'Use a previously known method, such as distillation in a rotary evaporator, etc.' with propylene glycol monopropyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether acetate, etc., selected from -16-200932847, one organic solvent for solvent exchange Use is better. By the solvent exchange, the water and the alcohol contained in the water-alcohol dispersion can be further separated and removed by the alcohol produced by the hydrolysis of the alkoxysilane or the like. Further, if the above operation is carried out using a rotary evaporator, the above-described solvent replacement may be performed almost completely, but in the present invention, it is not necessary to completely perform the above. The amount of the ruthenium compound contained in the coating liquid obtained by the treatment is also different depending on the intended use, and when the ruthenium compound is represented by Si 〇 2, it is desirably adjusted to 2 to 50% by weight based on the weight of the coating liquid. Preferably, it is in the range of 10 to 40% by weight. When the content exceeds 50% by weight, the stability of the coating liquid is deteriorated, and if it is less than 2% by weight, it is difficult to form a uniform film on the substrate. Further, in the present invention, a surfactant, a polyoxyxylene resin or the like as a leveling agent may be added to the liquid composition. Examples of the surfactant include a polyfluorene-based surfactant such as polyoxyalkylene dimethyl polyoxyalkylene, and a fluorine such as a perfluoroalkyl carboxylate or a perfluoroalkyl oxirane adduct. It is a surfactant, etc., and the polyfluorene oxide resin may be a polyether-modified polyanthracene resin, an amine-modified polyanthracene resin, an epoxy-modified polyoxyl resin, or an alkoxy group. Resin, etc. Among them, polyoxyxylene resin is also preferred. Further, the ion concentration contained in the coating liquid for forming a cerium oxide-based coating film is desirably 1.0 mmol/liter or less, preferably 0.6 mmol/liter or less. When the ion concentration is more than 1.0 millimol/liter, when the coating liquid is formed by using the coating liquid, voids, pinholes, and the like are formed in the coating film due to ions contained in the coating liquid. good. -17-200932847 [Preparation method of forming coating liquid for coating film] Next, the method of adjusting the coating liquid for forming a cerium oxide-based coating film of the present invention will be described below. The preparation method of the coating liquid of the present invention is a method for producing a coating liquid for forming a cerium oxide-based coating containing the cerium compound obtained by the following procedure. (a) The water-alcohol-based dispersion of the cerium oxide-based fine particles obtained by hydrolyzing and polycondensing the alkoxydecane represented by the following general formula (I) in the presence of a basic catalyst component is added to an ultrafiltration device, and the above-mentioned adjustment is carried out. The step of preparing the water-alcohol-based dispersion of the oxidized sand-based fine particles by the content of the basic catalyst component. (b) in the water-alcohol-based dispersion containing the cerium oxide-based fine particles, 'mixes and contains the alkoxy decane represented by the following general formula (I), the halogenated decane represented by the following general formula (11) and a step of selecting at least one aqueous dispersion of the organic cerium compound in the partial hydrolyzate, and (c) heating the mixed liquid at a temperature of 30 to 8 (TC), at least Q, the alkali which is released by the cerium oxide-based fine particles a step of partially hydrolyzing and/or hydrolyzing the aforementioned organoquinone compound

RnSi(〇R,)4.n .........⑴ R&quot;SiX4.n .........(II) (式中’R爲表示氫原子、氟原子、或碳數1〜8之烷基 、經氟取代之烷基、芳基、乙烯基或苯基,R,爲表示氫原 子、或碳數1〜8之烷基、芳基、乙烯基或苯基,X爲表 示_原子。又,η爲〇〜3之整數)。 若具體敘述上述之各步驟,則如下。 -18- 200932847 步驟(a ) lit &amp;驟中’將前述烷氧基矽烷於前述鹼性觸媒成分之 存在下水解•縮聚調製前述氧化矽系微粒子的水一醇系分 散液’關於其調製方法可採用先前公知的方法。即,1) 於含有前述院氧基矽烷之水一醇分散液中添加鹼性觸媒成 分(例如’氨)之水溶液後,令所得之水解•縮合物熟化 的方法。和2)將前述1 )所得之氧化矽系微粒子,再於 壓熱鍋等之壓力容器中予以熱水處理且令其熟化的方法等 。但’前述氧化矽系微粒子的平均粒徑爲5〜500nm之範 圍爲佳。 但’於本發明方法中,必須調整前述氧化矽系微粒子 中所含之前述鹼性觸媒成分的含量。若具體敘述關於此方 法’則如下。但,本發明方法並非限定於此處所記載的方 法。 (1)首先預先,將含有上述方法所得之氧化矽系微 粒子的水一醇系分散液加至超過濾裝置,將其容量由約 1/2濃縮至約1/5,除去該分散液中所含之前述烷氧基矽烷 的未反應物和中間反應物等。此時,將前述分散液中所含 之水、醇及鹼性觸媒成分(例如,氨)的一部分除去。 (2 )其次,於前述(1 )所得之水一醇系分散液中加 入約1〜3倍容量之純水(使用溫度爲5〜2 5 °C者,以下相 同)且攪拌後,加至超過濾裝置將其含量濃縮至約1 /2爲 止,除去該分散液中所含之一部分的鹼性觸媒成分。更且 -19- 200932847 視需要,加入與所得之水一醇系分散液相同容量的純水且 攪拌後,加至超過濾裝置並且重複進行同樣的操作。經由 重複進行此操作,則可由前述氧化矽系微粒子中慢慢將鹼 性觸媒成分放出至前述分散液中,故可調整前述氧化矽系 微粒子中所含之鹼性觸媒成分的含量。此處所進行之前述 操作的次數係根據前述氧化矽系微粒子中所含之鹼性觸媒 成分和其含量,以及該氧化矽系微粒子的性狀等而異,但 以進行2〜5次爲佳。 (3 )其次,於前述(1 )或(2 )所得之水一醇系分 散液(醇濃度低)中,加入相同容量之醇(使用溫度爲5 〜25 °C者,以下相同)並攪拌後,加至超過濾裝置將其容 量濃縮至約1/2爲止,令該分散液中所含之水與醇進行溶 劑更換。更且視需要,加入與所得之水一醇系分散液相同 容量的醇且攪拌後,加至超過濾裝置並且重複進行同樣的 操作。經由重複進行此操作2〜4次左右,則可將前述 水一醇分散液中所含之醇濃度調整至約60〜90重量%。如 此,取得適合與前述有機矽化合物之水分散液混合的水一 醇分散液。又,此水一醇分散液中所含之前述氧化矽系微 粒子的濃度期望調整至約5〜20重量%。 如此,取得含有前述鹼性觸媒成分之含量調整至200 〜1100重量ppm範圍之氧化砍系微粒子的水—醇系分散 液。 但,前述鹼性觸媒成分的必要量爲根據後述步驟(b )所使用之有機矽化合物的種類和使用量、或混合彼等所 -20- 200932847 得之分散液中所含之觸媒成分的種類和其含量等而異,故 期望考慮此些條件將前述氧化矽系微粒子中所含之鹼性觸 媒成分的含量以前述範圍調整。 另外,於此水一醇系分散液中,含有前述水解•縮聚 反應所使用的鹼性觸媒成分。即,於前述分散液中,含有 上述之超過濾操作所未除去的鹼性觸媒成分,和前述操作 終了後由前述氧化矽系微粒子所放出之一部分的鹼性觸媒 成分,因爲可利用於後段步驟(b)中所進行的部分水解 及/或水解反應,故亦可就其原樣含有。 關於此步驟所使用的前述烷氧基矽烷,若可取得前述 氧化矽系微粒子者則無特別限制可使用,但以使用矽酸乙 酯和矽酸甲酯等爲佳。 又,前述鹼性觸媒成分可使用由氨、氫氧化銨、四級 銨化合物、有機胺及胺系偶合劑中選出至少一種,其中亦 以使用氨或氫氧化銨爲佳。 更且,前述醇可使用由甲醇、乙醇、丙醇、異丙醇、 正丁醇中選出至少一種,其中亦以使用甲醇或乙醇爲佳。 步驟(b ) 此步驟中,將含有前述步驟(a )所得之前述氧化矽 系微粒子的水一醇分散液,與含有下述一般式(I)所示 之烷氧基矽烷、下述一般式(Π)所示之鹵化矽烷及其部 分水解物中選出至少一種之有機矽化合物的水分散液混合 。如此,取得含有前述氧化矽系微粒子、前述有機矽化合 -21 - 200932847 物等的水一醇分散液。 此處,前述烷氧基矽烷及/或鹵化矽烷爲如上述所述 般,例如於酸性觸媒成分之存在下預先部分水解後混合亦 可 0 前述氧化矽系微粒子與前述有機矽化合物的混合比例 ,於前述氧化矽系微粒子之重量以A表示,且前述矽化合 物之重量(換算Si02基準)以B表示時,其重量比(A/B )爲1/9〜9/1、較佳爲4/6〜6/4之範圍爲佳。其理由如上 述。 又,此步驟中,於前述分散液中,可再含有鹼性觸媒 成分及/或酸性觸媒成分。 如先前所述般,於前述步驟(a )所得之水一醇系分 散液中,多含有鹼性觸媒成分。但,前述步驟(a )所得 之氧化矽系微粒子中所含之鹼性觸媒成分的份量少於所欲 値時,於前述分散液中,亦可由外部添加前述鹼性觸媒成 分。此類情形有如下之案例。 (1 )使用含有將前述烷氧基矽烷予以水解·縮聚的 氧化矽系微粒子,進一步於壓熱鍋等之壓力容器中予以熱 水處理且令其熟化之氧化矽系微粒子的水一醇系分散液之 情形,於此案例中,所得之氧化矽系微粒子因呈較緻密的 構造,故該氧化矽系微粒子中所含之鹼性觸媒成分有幾分 變少。 (2)將含有前述烷氧基矽烷予以水解•縮聚的氧化 矽系微粒子,或將其進一步於壓熱鍋等之壓力容器中予以 -22- 200932847 熱水處理且令其熟化之氧化矽系微粒子的水一醇系分散液 進行超過濾時,進行不同之操作(例如,過度的操作次數 等)等,將所得之氧化矽系微粒子和水一醇分散液中所含 之鹼性觸媒成分的含量比所欲値更爲降低之情形,於此案 例中,必須由外部補充前述鹼性觸媒成分。 又,爲了形成具有高被膜強度的氧化矽系被膜,如上 述般,期望於前述水一醇系分散液中添加酸性觸媒成分。 _ 其係因若在初期階段令前述有機矽化合物於酸性觸媒成分 Ό 之存在下部分水解及/或水解後,使用含有進一步經由鹼 性觸媒成分(由前述氧化矽系微粒子所放出的鹼性觸媒成 分等)之作用效果予以部分水解及/或水解所得之矽化合 物的塗佈液形成被膜,則可取得緻密的氧化矽系被膜。 另外,前述鹼性觸媒成分及前述酸性觸媒成分可由上 述物質中選擇使用。 ❾ 步驟(C ) 此步驟中,將前述步驟(b)所得之混合液,即水一 醇分散液於30〜80°C之溫度中加熱,至少經由前述氧化矽 系微粒子所放出之前述鹼性觸媒成分,將前述有機矽化合 物部分水解及/或水解。 前述水一醇分散液所構成的混合液,亦根據前述氧化 矽系微粒子中所含之鹼性觸媒成分而異,但期望於30〜80 °C、較佳爲40〜70°C之溫度中加熱。此處,前述溫度若未 達3 0 °C,則前述氧化矽系微粒子中所含之鹼性觸媒成分的 -23- 200932847 放出速度慢,故令前述有機矽化合物部分水解及/或水解 的時間變長,前述溫度若超過80°C,則前述氧化矽系微粒 子中所含之鹼性觸媒成分的擴散爲急速或急劇發生,故前 述分散液的安定性變差,爲不佳。 如此,經由加熱前述混合液,則前述氧化矽系微粒子 中所含之前述鹼性觸媒成分,由前述氧化矽系微粒子中慢 慢放出,但視情況亦可分階段進行前述的加熱操作。 藉此,經由前述氧化矽系微粒子所放出的前述鹼性觸 媒成分,將前述有機砍化合物於前述氧化砍系微粒子的外 部表面和其細孔內表面附近進行部分水解及/或水解,故 可取得與前述氧化矽系微粒子充分結合的矽化合物。此時 ,前述有機矽化合物,經由前述混合液中所含之前述鹼性 觸媒成分而被部分水解及/或水解,但於本發明方法中, 重要爲至少經由前述氧化矽系微粒子所放出之前述鹼性觸 媒成分而被部分水解及/或水解。 如此處理所得之水一醇分散液爲使用先前公知之方法 ,例如以旋轉蒸發器之蒸餾法等,令該分散液中所含之水 分與醇成分,與丙二醇單丙醚、丙二醇單甲醚、丙二醇單 甲醚醋酸酯等中選出至少一種之有機溶劑進行溶劑更換。 若示出其具體例(更換溶劑用之有機溶劑使用丙二醇 單丙醚(PGP )的事例),爲如下。但,本發明並非限定 於此處所述之方法。 (i)將上述所得之水一醇分散液,放入旋轉蒸發器 的燒瓶中,再將丙二醇單丙醚加入燒瓶中。 -24- 200932847 (ii)其次,驅動旋轉蒸發器,於50〜90 °C ’較佳爲 60〜80。(:之溫度條件下,於-0.05〜_〇.1MPa、較佳爲.Ο.08 〜-O.IMPa之減壓條件下’令前述燒瓶以30〜120rPm、較 佳爲60〜90r pm之速度迴轉。若如此處理’則前述水一醇 分散液中所含之水和醇蒸發,故將其冷卻排出系統外。 (iii )經由繼續進行必要時間之前述操作(ϋ ) ’則 可取得前述水及醇與丙二醇單丙醚溶劑更換的形成氧化矽 系被膜用塗佈液。 更且,如此,令前述形成氧化矽系被膜用塗佈液中所 含的矽化合物份量,可調整至上述之所欲範圍。此處’前 述矽化合物的含量亦根據其使用用途而異,將此矽化合物 以Si02表示時,相對於該塗佈液之重量調整至2〜50重 量%、較佳爲1 〇〜40重量%之範圍爲佳。 [氧化矽系被膜之形成方法] 於本發明,使用前述形成氧化矽系被膜用塗佈液形成 氧化矽系被膜上’可採用先前公知的方法。又,此先前公 知的方法爲如下。 (1) 前述形成氧化矽系被膜用塗佈液於基板上塗佈 後’將該基板於80〜350 °C之溫度下加熱處理,再以高於 前述加熱溫度之340〜4 50°C溫度下煅燒之方法。 (2) 前述形成氧化矽系被膜用塗佈液於基板上塗佈 後’將該基板於80〜3 50°C之溫度下加熱處理,並且進一 步照射電子束、紫外線或微波進行熟化之方法。 -25- 200932847 即,於本發明中,期望根據前述形成氧化矽系被膜用 塗佈液之性狀和其使用用途’由先前公知之方法中適當選 擇。 以下,以前述(1 )之方法爲例’具體說明此被膜形 成方法,但本發明不被其所限定。 塗佈步驟 一般,於基板上塗佈形成被膜用塗佈液上,採用旋塗 法、浸塗法、輥塗法、狹縫塗敷法、轉印法等塗佈方法, 於本發明中,亦可使用此類先前公知之方法塗佈前述形成 氧化矽系被膜用塗佈液。其中,於半導體基板上塗佈形成 被膜用塗佈液之情形中,以旋塗法爲合適,於塗佈膜厚之 均勻性和低發塵性等優良。因此,於本發明中,期望採用 以此旋塗法的塗佈法,但塗佈於大口徑之半導體基板上之 情形中,採用轉印法等亦可。另外,於本發明中,「於基 板上塗佈以塗佈液」之意義,不僅包含將前述塗佈液於矽 晶圓等之基板上直接塗佈,且亦包含於該基板上所形成之 半導體加工用保護膜和其他被膜上方進行塗佈者。 加熱步驟 如此處理於基板上塗佈的被膜,於80〜35(rc之溫度 中進行加熱處理。此處,此加熱處理若以超過35〇 之溫 度下進行’則上述塗佈被膜中所含的有機溶劑爲急劇蒸發 ’亦有於被膜中形成較大口徑的細孔和空隙,故其被膜強 -26- 200932847 度降低。因此,此加熱處理期望視需要將其溫度以8 0〜 3 5 0 °C之範圍階段性提高。例如,於1 5 〇 t之溫度中以1分 鐘、於250 °C之溫度中以1分鐘、再於350。(:之溫度中以1 分鐘等之階段性溫度進行加熱處理的方法等。又,此加熱 處理若於未達80 °C之溫度下進行,則上述塗佈被膜中所含 的有機溶劑幾乎完全未蒸發,就其原樣殘留於被膜中,結 果不僅無法達成此加熱處理之目的,並且於所形成的被膜 膜厚上發生不均勻。 又,此加熱處理亦根據被膜的膜厚等而異,期望進行 1〜10分鐘、較佳爲2〜5分鐘。 更且’此加熱處理可於惰性氣體之氮氣氛圍氣下或空 氣氛圍氣下進行。其係因此處理可在3 5 0 °C以下之較低溫 度條件下短時間進行,故即使於含有較多量氧之空氣氛圍 氣下加熱處理,亦不會對於半導體基板上所配設之金屬配 線等因金屬氧化而造成損傷。又,因爲被膜中攝入微量氧 的可能性提高,故於後段之煅燒處理步驟之處理過程中, 生成進行Si-0-Si鍵交聯的氧化矽系被膜,且易形成具有 耐吸濕性(拒水性)和高被膜強度的氧化矽系被膜。 若如此處理施以加熱處理,則上述塗佈被膜中所含之 有機溶劑等蒸發、脫離,且另一方面進行固形成分之形成 氧化矽系被膜成分的聚合且硬化之同時,於加熱過程中聚 合物的熔融黏度降低且被膜的迴流性增大,結果提高所得 被膜的平坦性。另外,此加熱處理爲將前述塗佈步驟所得 之基板於枚葉式的熱板上載置進行爲佳。 -27- 200932847 煅燒步驟 其次,將施以前述加熱處理的被膜於惰性氣體之氛圍 氣下,以高於前述加熱溫度之340〜450 °C溫度中煅燒處理 〇 前述惰性氣體期望使用氮氣,且視需要,於其中加入 氧氣或空氣,且使用含有少量氧(例如,500〜10000容量 ppm左右之氧)的惰性氣體亦可。(記載於國際申請公開 WO 0 1 /48 8 06 A1 公報等)。 前述煅燒溫度亦根據上述塗佈液中所含之矽化合物( 即,形成氧化矽系被膜成分)之性狀等而異,於取得具有 耐吸濕性(拒水性)和高被膜強度之氧化矽系被膜上,期 望由340〜450 °C之溫度範圍中選擇。 此處,煅燒處理的溫度若未達3 40 °C,則因前述形成 氧化矽系被膜成分之前體難進行交聯,故無法取得具有充 分之被膜強度的被膜,又,此煅燒處理的溫度若超過450 °C,例如,構成半導體基板之鋁配線和銅配線等被氧化, 或者被熔融,對該配線層造成致命的損傷。 又,此煅燒處理亦可根據形成被膜用塗佈液之種類和 被膜之膜厚等而異,期望進行5〜90分鐘、較佳爲10〜60 分鐘。 更且,此煅燒處理爲與前述加熱步驟之情形同樣地, 於枚葉式之熱板上載置基板進行爲佳。 如此處理所得之氧化矽系被膜的膜厚,亦根據形成被 -28- 200932847 膜之基板和其使用用途等而異’例如’於半導體裝置中之 矽基板(砂晶圓)上通常爲100〜600nm’於多層配線之 配線層間通常爲100〜10〇0nm。 [氧化矽系被膜] 本發明之氧化矽系被膜’可使用上述之形成氧化矽系 被膜用塗佈液而輕易形成’具有楊氏彈性率爲3. OGPa以 上,更詳細爲5.0GPa以上之高被膜強度和較低之比介電 率,且表面平坦性和耐裂痕性等優良。 又,於本發明中,調製前述形成被膜用塗佈液時所使 用的氧化矽系微粒子,若使用於壓熱鍋等之壓力容器中水 熱處理且熟化之氧化矽系微粒子,則可形成具有楊氏彈性 率爲6.0GPa以上、更詳細爲7.0GPa以上之高被膜強度的 氧化矽系被膜。 更且,本發明之氧化矽系被膜因拉伸強度亦強,故即 使增厚被膜的膜厚,亦不會於此被膜發生裂痕。認爲其係 於前述形成被膜用塗佈液之調整步驟中,經由前述氧化矽 系微粒子所放出的鹼性觸媒成分,令部分水解及/或水解 之前述有機矽化合物的反應物與前述氧化矽系微粒子的外 部表面和其細孔內表面強力結合。如此,於形成前述被膜 時’即使此被膜收縮,亦不會僅分離出前述氧化矽系微粒 子’故可形成耐裂性強的氧化矽系被膜。 又,若根據本發明之前述塗佈液,則可輕易形成被膜 之表面粗度(Rms)爲5.Onm以下之具有平滑表面的氧化砂 -29- 200932847 系被膜。(此表面粗度爲以原子間力顯微鏡AFΜ所測定 値的自乘平均粗度)如此,不必施行令基板上所形成之被 膜表面平坦化之煩雜的硏磨處理等。又,於被膜表面亦不 會發生針孔等。 加上,前述氧化矽系被膜本身爲拒水性(耐吸濕性) 優良的被膜,故即使放置於含有飽和水蒸氣的空氣氛圍氣 下,亦不會導致比介電率的惡化(即,比介電率的增加) 〇 ❹ 更且,前述氧化矽系被膜爲與半導體基板等之形成被 膜面的密合性、耐鹼性等之耐藥品性優良,且於耐氧電漿 性和蝕刻加工性等之步驟適合性中亦具備優良之特性。 可形成此類氧化矽系被膜之本發明的前述塗佈液,被 使用於半導體基板上,於設置多層配線構造之配線層間、 元件表面及/或ΡΝ接合部的基板上,或者於該基板上所設 置之多層配線層間’形成氧化矽系被膜,特別爲氧化矽系 Q 絕緣膜。其中,本發明之塗佈液適合使用於形成具有1〜 5 μιη左右膜厚之絕緣膜的用途。 [測定方法] 其次’若具體敘述本發明實施例所採用的測定方法, 則如下。 (1) 氧化矽系微粒子的平均粒徑 將水一醇分散液(試料)中所含之氧化矽系微粒子之 -30- 200932847 10萬倍放大影像,以穿透型電子顯微鏡(ΤΕΜ )(曰本 則1“11公司製11-800)攝影的丁丑14照片,以1^26\自動影 像處理解析裝置(Nicole公司製LUZEX-AP)解析,再使 用所附之解析軟體算出前述氧化矽微粒子的平均粒徑。 (2) 氧化矽系微粒子中所含之鹼性觸媒成分的含量 (a )爲了測定含有鹼性觸媒成分之氧化矽系微粒子 所分散之水一醇分散液(試料)中所含的鹼性觸媒成分的 全量(例如,氮量),乃添加氫氧化鈉水溶液將前述氧化 矽系微粒子溶解後,令加熱所發生的鹼性氣體被含有稀硫 酸(H2S04: 0.05莫耳/升)之水溶液吸收。其次,於其中 滴下2〜3滴甲基紅溶液,並以氫氧化鈉水溶液(NaO Η : 0· 1莫耳/升)滴定,且測定該分散液中所含之鹼性觸媒成 分的全量(Q 1 )。 (b)其次,將前述水一醇分散液(試料)以 3000rpm之迴轉速度離心分離(離心濃縮器:Azuwan公 司製 VS200 1 、離心機·· KUBOTA 公司製 KUBOTA693 0 ) ,將該分散液中所含之氧化矽系微粒子分離。其次,將所 得分散介質中所含之鹼性觸媒成分的份量(例如,氨量) ’以前述(a )同樣之方法,測定該分散介質中所含之鹼 性觸媒成分的全量(Q2 )。 (c )由則述(a )所測定之驗性觸媒成分量(Q1 )減 去前述(b )所測定之鹼性觸媒成分量(Q2 ),算出前述 氧化矽系微粒子中所含之鹼性觸媒成分的份量(Q)。 -31 - 200932847 (3) 形成被膜用塗佈液的黏度測定 將作爲試料的塗佈液1毫升移至黏度計(東機產業( 股)製,VISCONIC ED型)的托盤,令該試料接觸旋轉 子,測定以已知之迴轉數令旋轉子迴轉時的力矩値。其次 ,由前述迴轉數和測定之力矩値算出黏度。 (4 ) 矽化合物的數平均分子量測定 使用分子量測定裝置(東梭公司製:GPC 8020 ),根 據 GPC ( Gel Phase Chromatography)法測定。即,將作 爲試料的塗佈液1毫升放置於溶離液,並通入膠柱(將東 梭公司製:TSKgel、東梭公司製:G5000Hxl、TSKgel G3 0 00Hxl連結),根據流體力等的體積大小分離出該試 料中的分子成分,根據各時間的參考折射率差,測定分子 量分佈。其次,將測定之分子量分佈,與具有預先測定之 已知分子量的聚苯乙烯分佈比較並換算,算出換算成聚苯 乙烯的數平均分子量。 (5 ) 形成被膜用塗佈液的離子濃度測定 將作爲試料的塗佈液1 0毫升與精製純水90毫升混合 ’於室溫下攪拌1小時後,將此混合液過濾,再於過濾後 之濾材中通入100毫升的精製純水並回收濾液。其次,以 原子吸光法測定此回收濾液中所含之金屬離子等之陽離子 濃度’並以離子層析法測定鹼性觸媒成分等之陰離子濃度 -32- 200932847 (6) 氧化矽系被膜的比介電率 將作爲試料的塗佈液於矽晶圓上以旋塗法,以 4000rPm之迴轉速度塗佈,並以120°C之溫度乾燥5分鐘 後,於氮氣氛圍氣下以350 °C之溫度锻燒30分鐘,形成塗 佈膜(氧化矽系被膜)。其次,根據汞探針法(Solid State Measurements 製 SSM495、周波數 1MHz)測定。即 ,令汞電極接觸前述塗佈膜,改變電壓並測定該塗佈膜的 電容量,並由所得之電容量和膜厚算出塗佈膜的比介電率 (7 ) 氧化矽系被膜的被膜強度 將作爲試料的塗佈液於矽晶圓上以旋塗法,以 4000rpm之迴轉速度塗佈,並以12(TC之溫度乾燥5分鐘 後,於氮氣氛圍氣下以3 5 0 °C之溫度煅燒3 0分鐘,形成塗 佈膜(氧化矽系被膜)。其次,根據奈米壓頭法(MTS Sysbtms Corp 製 Nanoindenter XP )測定楊氏彈性率( Young’s Modulus)。即,將金剛石製之壓子押壓至前述 塗佈膜’測定該壓子與塗佈膜的接觸面積及押壓強度,算 出楊氏彈性率。 (8 ) 氧化矽系被膜的裂痕耐性界限膜厚 將作爲試料的塗佈液於矽晶圓上以旋塗法,以3 0 0〜 -33- 200932847 700rpm之迴轉速度塗佈,並以120°C之溫度乾 ,於氮氛圍氣下以350 °C之溫度煅燒30分鐘, (氧化矽系被膜)。其次,將所得之塗佈膜以 率:50倍)觀察,確認有無裂痕。更且,根據 膜厚測定法(ACCRETECH公司製 SURFCOM 測定不發生裂痕的界限膜厚。 ^ ( 9 ) 氧化矽系被膜的表面粗度 將作爲試料的塗佈液於矽晶圓上以想 40〇〇rpm之迴轉速度塗佈,並以12(TC之溫度i 後,於氮氛圍氣下以3 5 0 °C之溫度煅燒3 0分鐘 膜(氧化矽系被膜)。其次,令前述塗佈膜以 的附探針 Kanchi Labor (日本 Bico (股)製 掃描,並由探針與塗佈膜之分子間力觀察表面 表面粗度(Rms)。 0 [實施例] 以下,根據實施例詳細說明本發明,但本 些實施例所限定。 氧化矽系微粒子的調製 [調合例1 ] 調製99.9重量%濃度之甲醇(關東化學 5〇8克和純水760克所構成的基質水1268克 燥5分鐘後 形成塗佈膜 顯微鏡(倍 接觸式段差 1 400D ), E塗法,以 迄燥5分鐘 ,形成塗佈 賦予導電性 NCH-10V ) 形狀,算出 發明不被此 (股)製) 。加入9 9.9 -34- 200932847 重量%濃度之甲醇16048克和矽酸乙酯(多摩化學工業( 股)製)8452克並攪拌調製矽酸乙酯溶液245 00克。 其次,將前述基質水1268克於65 °C之溫度中加熱保 持,並於其中將前述矽酸乙酯溶液24500克及1.9重量% 濃度之氨水9490克同時歷5小時於攪拌下添加。添加終 了後,再保持於前述溫度並且進行3小時熟化操作’取得 含有7.4重量%之氧化矽微粒子的水一甲醇分散液(以下 ,稱爲「水一甲醇分散液」)35258克。 其次,將所得之水一甲醇分散液冷卻至室溫’並於該 水一甲醇分散液中之31860克中,加入純水2034〇克且攪 拌後,於25 °C之溫度條件下使用超過濾濾紙(旭化成(股 )製、ACP-2013),將其重量濃縮至18711克。如此,取 得除去該水一甲醇分散液中所含之前述矽酸乙酯未反應物 和中間反應物等的水一甲醇分散液(以下,稱爲「水一甲 醇精製液」)1871 1克。 其次,於上述所得之水一甲醇精製液中之10395克中 ,加入99.5重量%濃度之乙醇(和光純藥工業(股)製) 1 3 860克且攪拌後,於25 t之溫度條件下使用前述超過濾 濾紙,將其重量濃縮至10395克。更且,於所得之分散液 中加入乙醇1 3860克且攪拌後,再度,使用前述超過濾濾 紙,將其重量濃縮至10395克。如此,取得令前述水一甲 醇精製液中所含之水與甲醇進行溶劑更換,含有氧化矽微 粒子之水一乙醇分散液(以下,稱爲「水一乙醇分散液」 )1 03 95 克。 -35 - 200932847 於此水一乙醇分散液中加入乙醇2 703克並將該分散 液中所含之氧化矽系微粒子濃度調整至1 〇重量%,再使用 旋轉蒸發器(柴田科學(股)製RE20EU )予以濃縮,取 得含有19.4重量%氧化矽微粒子之水一乙醇分散液的試料 1A 675 2 克。 測定如此處理所得之試料1 A中所含之氧化矽系微粒 子的平均粒徑時,大約爲20nm。 更且,以上述方法測定前述試料1A中所含之氨的全 含量及前述氧化矽系微粒子中所含之氨含量時,如表1所 不。 [調合例2] 以調合例1同樣之方法,調製水一甲醇精製液1 8 7 1 1 克。 其次,取出前述調製之水一甲醇精製液10150克,加 入29重量%濃度之氨水47克且攪拌後,加入壓熱鍋(耐 壓玻璃工業(股)製、TAS-13型),並以150°C之溫度處 理1 5小時,進行該水一甲醇精製液中所含之氧化矽微粒 子的熟化。 其次,取出冷卻至室溫所得之水一甲醇精製液(熟化 液)10045克,並加入純水13020克且攪拌後,於25 °C之 溫度條件下使用超過濾濾紙,將其重量濃縮至9998克。 再加入純水13 020克並攪拌後,再度,使用前述超過濾濾 紙,重複2次將其重量濃縮至9998克的作業。如此,取 -36- 200932847 得除去前述氧化矽系微粒子中所含之一部分氨的水一甲醇 精製液9998克。 其次,於上述所得之水一甲醇精製液9 99 8克中,加 入乙醇(和光純藥工業(股)製)1 3 3 3 1克並攪拌後,於 2 5 °C之溫度條件下使用超過濾濾紙過濾,將其重量濃縮至 9998克。更且,加入乙醇13331克並攪拌後,再度,使用 前述超過濾濾紙,將其重量濃縮至999 8克。如此,取得 前述水一甲醇分散液中所含之水與甲醇進行溶劑更換的 水一乙醇分散液9998克。 於此水一乙醇分散液中加入乙醇2600克並將該分散 液中所含之氧化矽系微粒子濃度調整至1 〇重量%,再使用 旋轉蒸發器(柴田科學(股)製RE2 0EU)予以濃縮,取 得含有19.4重量%氧化矽微粒子之水一乙醇分散液的試料 2A 6494 克 ° 測定如此處理所得之前述試料2A中所含之氧化矽系 微粒子的平均粒徑時,大約爲2 5nm。 更且,與調合例1之情形同樣’以上述方法測定前述 試料2A中所含之氨的全含量及前述氧化矽系微粒子中所 含之氨含量時,如表1所示。 [實施例1] 將調合例1所調製之前述試料1 A及調合例2所調製 之前述試料2A(均含有19_4重量%氧化矽微粒子的水一 乙醇分散液)分別取出6050克’並於其中混合甲基三甲 -37- 200932847 氧基矽烷(MTMS、信越化學工業(股)製) 0.44重量%濃度之硝酸(關東化學(股)製 1409克,並由室溫慢慢加熱至50°C之溫度爲 保持於此溫度(50°C )且以200rpm之速度一發 時,一邊進行前述甲基三甲氧基矽烷的部分7」 解。 測定此時混合液的pH時,使用前述試料 初(加熱前),於加入作爲酸性觸媒成分之硝 ’爲ρΗ2·1’但隨著溫度上升,變成PH7.8, 下安定化。又,使用前述試料2A者,最初( 於加入作爲酸性觸媒成分之硝酸的影響下,爲 隨著溫度上升,變成PH8.0,並於此狀態下安 可知由前述試料中所含之氧化矽系微粒子中放 觸媒成分的氨,並且有助於前述甲基三甲氧基 水解反應及/或水解反應。 其次’將所得之水一乙醇分散液供至旋轉 田科學(股)製RE20EU ),將該分散液中所 醇等與丙二醇單丙醚(PGP、日本乳化劑(股 溶劑更換。更且,將此溶劑更換之PGP溶液中 合物含量,以Si〇2基準調整至25重量%,取 矽系被膜用塗佈液3A(使用前述試料1A所調 ’稱爲試料3A),及4A(使用前述試料2A 以下,稱爲試料4 A )。 將如此處理所得之試料於室溫放置150日 1778克和 )的水溶液 止。更且, J攪拌1 5小 k解及/或水 1A者,最 酸的影響下 並於此狀態 加熱前), ρΗ2·4,但 定化。即, 出作爲鹼性 矽烷的部分 蒸發器(柴 含之水和乙 )製)進行 所含的矽化 得形成氧化 製者,以下 所調製者’ ,並以黏度 -38- 200932847 變化確認塗佈液的保存安定性時,可知無變化。 所得之形成氧化矽系被膜用塗佈液的性狀示於表2 [實施例2] 將調合例1所調製之前述試料1A及調合例2所調 之前述試料2A (均爲水一乙醇分散液)分別取出6050 ,並於其中混合甲基三甲氧基矽烷(MTMS、信越化學 業(股)製)2668克和0.44重量%濃度之硝酸(關東 ❹ 學(股)製)1691克,並由室溫慢慢加熱至5〇°C之溫 爲止。更且,保持於此溫度(50°C )且以200rpm之速 一邊攪拌15小時,一邊進行前述甲基三甲氧基矽烷的 分水解及/或水解。 測定此時混合液的pH時,最初(加熱前),於加 作爲酸性觸媒成分之硝酸的影響下,爲PH2.3,但隨著 度上升,變成PH7.5,並於此狀態下安定化。即,可知 ^ 前述試料中所含之氧化矽系微粒子中放出作爲鹼性觸媒 分的氨,並且有助於前述甲基三甲氧基矽烷的部分水解 應及/或水解反應。 其次,將所得之水一乙醇分散液供至旋轉蒸發器( 田科學(股)製RE20EU ),將該分散液中所含之水和 醇等與丙二醇單丙醚(PGP、日本乳化劑(股)製)進 溶劑更換。更且,將此溶劑更換之PGP溶液中所含的矽 合物含量,以Si02基準調整至25重量%,取得形成氧 矽系被膜用塗佈液5A(使用前述試料1A所調製者,以 製 克 工 化 度 度 部 入 溫 由 成 反 柴 乙 行 化 化 下 -39- 200932847 ’稱爲試料5A ) ’及6A (使用前述試料2A所調製者, 以下,稱爲試料6A )。 將如此處理所得之試料於室溫放置150日,並以黏度 變化確認塗佈液的保存安定時,可知無變化。 所得之形成氧化矽系被膜用塗佈液的性狀示於表2。 [實施例3] 除了分別使用調合例2所調製之前述試料2A、和苯 基三甲氧基矽烷(PhTMS、信越化學工業(股)製)和苯 基三氯矽烷(PhTCS、信越化學工業(股)製)代替甲基 三甲氧基矽烷以外’以實施例1之情形同樣之方法,取得 以S i Ο 2基準含有2 5重量%反應物之矽化合物的形成氧化 欣系被膜用塗佈液7A(使用前述試料2A和苯基三甲氧基 矽烷所調製者’以下’稱爲試料7A )及8A (使用前述試 料2A和苯基三氯乙烷所調製者,以下,稱爲試料8a)。 將如此處理所得之試料於室溫放置〗5 〇日,並以黏度 變化確認塗佈液的保存安定性時,可知無變化。 所得之形成氧化矽系被膜用塗佈液的性狀示於表2。 [比較例1] 直到取得水一甲醇精製液爲止,以調合例1同樣之方 法,取得水一甲醇精製液9998克。 其次,爲了減低氨濃度,再度,於水一甲醇精製液 9 9 9 8克中加入純水1 3 3 3 1克並攪拌後,於2 5 °C之溫度條 -40- 200932847 件下使用超過濾濾紙,將其重量濃縮至9998克。其次, 加入乙醇(和光純藥工業(股)製)1 33 3 1克並攪拌後, 於25 °C之溫度條件下使用超過濾濾紙,將其重量濃縮至 9998克。更且,加入乙醇13331克並攪拌後,再度,使用 前述超過濾濾紙,將其重量濃縮至9998克。如此,取得 前述水一甲醇精製液中所含之水與甲醇進行溶劑更換的 水一乙醇分散液9998克。 於此水一乙醇分散液中加入乙醇2 5 60克,將該分散 液中所含之氧化矽系微粒子濃度調整至1 〇重量%,再使用 旋轉蒸發器(柴田科學(股)製RE20EU )濃縮,取得含 有19.4重量%氧化矽微粒子的水一乙醇分散液試料9A 6494 克 ° 測定如此處理所得之試料9A中所含之氧化矽系微粒 子的平均粒徑時,大約爲25nm。 更且,與調合例1之情形同樣’以上述方法測定前述 試料9A中所含之氨的全含量及前述氧化矽系微粒子中所 含之氨含量時,如表1所示。 除了使用前述試料9A以外’以實施例1之情形同樣 之方法,進行前述甲基三甲氧基矽烷的部分水解及/或水 解。 測定使用前述試料9A時之混合液的PH時’最初( 加熱前),於加入作爲酸性觸媒成分之硝酸的影響下,爲 PH2.2,但隨著溫度上升而慢慢增力Π,變成ρΗ4· 1。即,可 知由氧化矽系微粒子中以鹼性觸媒成分型式所放出的氨量 -41 - 200932847 不足,有助於前述甲基三甲氧基矽烷之部分水解反應及/ 或水解反應的鹼性觸媒少。 其次,將所得之水一乙醇分散液供至旋轉蒸發器(柴 田科學(股)製RE20EU ),將該分散液中所含之水和乙 醇等與丙二醇單丙醚(PGP、日本乳化劑(股)製)進行 溶劑更換。更且,將此溶劑更換之PGP溶液中所含的矽化 合物含量,以Si02基準調整至25重量%,取得形成氧化 矽系被膜用塗佈液1 〇 A (使用前述試料9 A所調製者,以 下,稱爲試料1 OA )。 將如此處理所得之試料於室溫放置150日,並以黏度 變化確認塗佈液的保存安定性時,可知無變化。 所得之形成氧化矽系被膜用塗佈液的性狀示於表2。 [比較例2 ] 直到取得水一甲醇精製液爲止,以調合例1同樣之方 Q 法,調製水一甲醇精製液的試料18711克。 其次’於前述水一甲醇精製液中取出10150克,爲了 增加該試料中的氨濃度,於前述水一甲醇精製液中加入29 重量%濃度之氨水1 90克並攪拌後,加入壓熱鍋(耐壓玻 璃工業(股)製、TAS-13型),並以150。(:之溫度處理 15小時,進行該水一甲醇精製液中所含之氧化矽微粒子的 熟化。 其次’於冷卻至室溫所得之水一甲醇精製液(熟化液 )10340克中取出10〇45克,並加入純水丨3〇2()克且攪拌 -42- 200932847 後,於2 5 °C之溫度條件下使用超過濾濾紙,將其重量濃縮 至9861克。再加入純水13020克並攪拌後,再度,使用 前述超過濾濾紙,重複2次將其重量濃縮至9861克的作 業。如此,取得除去前述氧化矽系微粒子中所含之一部分 氨的水一甲醇精製液9861克。 其次,於上述所得之水一甲醇精製液9861克中,加 入乙醇(和光純藥工業(股)製)13147克並攪拌後,於 2 5 °C之溫度條件下使用超過濾濾紙過濾,將其重量濃縮至 9 86 1克。更且,加入乙醇13147克並攪拌後,再度,使用 則述超過滤爐紙,將其重量濃縮至9 8 6 1克。如此,分別 取得前述水一甲醇分散液中所含之水與甲醇進行溶劑更換 的水一乙醇分散液986 1克。 於此水一乙醇分散液中加入乙醇2564克,將該分散 液中所含之氧化矽系微粒子濃度調整至1 0重量%,再使用 旋轉蒸發器(柴田科學(股)製RE20EU )濃縮,取得含 有19.4重量%氧化矽微粒子之水一乙醇分散液的試料11A 6404 克。 測定如此處理所得之試料1 1 A中所含之氧化矽系微粒 子的平均粒徑時,大約爲25nm。 更且,與調合例1之情形同樣,以上述方法測定前述 試料11A中所含之氨的全含量及前述氧化矽系微粒子中所 含之氨含量時,如表1所示。 除了使用前述試料1 1 A以外,以實施例1之情形同樣 之方法,進行前述甲基三甲氧基矽烷的部分水解及/或水 -43- 200932847 測定使用前述試料11A時之混合液的PH,最初(加 熱前),PH8.3 ’隨著溫度上升且少許增加成pH8.5。如此 ’儘管將作爲酸性觸媒的硝酸同量混合,最初之pH値高 ,且此値幾乎完全無變化的理由,係因前述試料11A之 水一乙醇分散液中所含之氨量不多,於氧化矽系微粒子中 亦大量存在作爲鹼性觸媒成分的氨。如此,可預測前述甲 基二甲氧基矽烷的水解反應,經由過剩的氨(鹼性觸媒成 分)而過度進行。 其次’將所得之水一乙醇分散液供至旋轉蒸發器(柴 田科學(股)製RE20EU ),將該分散液中所含之水和乙 醇等與丙二醇單丙醚(PGP、日本乳化劑(股)製)進行 溶劑更換。更且,將此溶劑更換之P GP溶液中所含的矽化 合物含量,以Si〇2基準調整至25重量%,取得形成氧化 矽系被膜用塗佈液1 2 A (使用前述試料1 1 A所調製者,以 下,稱爲試料1 2A )。 將如此處理所得之試料於室溫放置1 5 0日,觀察塗佈 液的保存安定性時,可知膠化狀態有變化。如此,可知使 用氨含量超過llOOppm之含有氧化矽系微粒子的水一乙醇 分散液,令烷氧基矽烷等部分水解及/或水解所調製的塗 佈液,其保存安定性有問題。 所得之形成氧化矽系被膜用塗佈液的性狀示於表2。 [比較例3 ] -44 - 200932847 除了使用調合例2所調製之前述試料2Α和甲基三甲 氧基矽烷(MTMS、信越化學工業(股)Μ),且前述加 熱溫度分別爲20°C (室溫),及9『c (由室溫加熱至9〇 。(:爲止)以外,以實施伊&quot;之情形同樣之方法,取得含有 以Si〇2基準25重量%之形成氧化矽系被膜用塗佈液i3a (以加熱溫度20°C所調製者,以下,稱爲試料i3A)、及 14A (以加熱溫度9〇°C所調製者,以下,稱爲試料i4A)RnSi(〇R,) 4. n . . . . . . . . . (1) R&quot;SiX4. n . . . . . . . . . (II) wherein R is a hydrogen atom, a fluorine atom, or an alkyl group having 1 to 8 carbon atoms, a fluorine-substituted alkyl group, an aryl group, a vinyl group or a phenyl group, and R is a hydrogen atom or An alkyl group, an aryl group, a vinyl group or a phenyl group having 1 to 8 carbon atoms, and X represents an atom. Further, η is an integer of 〇3 to 3). The details of each of the above steps are as follows. -18- 200932847 Step (a) lit &amp; </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> <RTIgt; The method can employ a previously known method. That is, 1) a method in which an aqueous solution of a basic catalyst component (for example, 'ammonia) is added to a water-alcohol dispersion containing the above-mentioned oxoxane, and the obtained hydrolysis/condensation product is aged. And 2) a method in which the cerium oxide-based fine particles obtained in the above 1) are subjected to hot water treatment in a pressure vessel such as a autoclave and matured. However, the average particle diameter of the above cerium oxide-based fine particles is preferably from 5 to 500 nm. However, in the method of the present invention, it is necessary to adjust the content of the aforementioned basic catalyst component contained in the above cerium oxide-based fine particles. If the specific description about this method is as follows. However, the method of the present invention is not limited to the method described herein. (1) First, a water-alcohol-based dispersion containing cerium oxide-based fine particles obtained by the above method is added to an ultrafiltration device, and its capacity is concentrated from about 1/2 to about 1/5 to remove the dispersion. An unreacted product, an intermediate reactant, and the like of the aforementioned alkoxydecane. At this time, a part of water, an alcohol, and a basic catalyst component (for example, ammonia) contained in the dispersion liquid are removed. (2) Next, adding about 1 to 3 times the volume of pure water (using a temperature of 5 to 25 ° C, the same applies hereinafter) to the water-alcohol-based dispersion obtained in the above (1), stirring, and then adding The ultrafiltration device concentrates the content to about 1 /2 to remove a portion of the alkaline catalyst component contained in the dispersion. Further, -19- 200932847, if necessary, the pure water having the same capacity as the obtained water-alcohol-based dispersion is added and stirred, and then added to the ultrafiltration device and the same operation is repeated. By repeating this operation, the alkali catalyst component can be gradually released into the dispersion liquid from the cerium oxide-based fine particles, so that the content of the basic catalyst component contained in the cerium oxide-based fine particles can be adjusted. The number of times of the above-described operation is different depending on the basic catalyst component contained in the cerium oxide-based fine particles and the content thereof, and the properties of the cerium oxide-based fine particles, but it is preferably carried out 2 to 5 times. (3) Next, in the water-alcohol-based dispersion (low alcohol concentration) obtained in the above (1) or (2), an alcohol of the same capacity (using a temperature of 5 to 25 ° C, the same below) is added and stirred. Thereafter, it is added to the ultrafiltration device to concentrate its capacity to about 1/2, and the water contained in the dispersion is exchanged with the alcohol. Further, if necessary, an alcohol having the same capacity as the obtained water-alcohol-based dispersion is added and stirred, and then added to the ultrafiltration device and the same operation is repeated. By repeating this operation for about 2 to 4 times, the concentration of the alcohol contained in the water-alcohol dispersion can be adjusted to about 60 to 90% by weight. Thus, a water-alcohol dispersion suitable for mixing with the aqueous dispersion of the above organic hydrazine compound is obtained. Further, the concentration of the cerium oxide-based fine particles contained in the water-alcohol dispersion is desirably adjusted to about 5 to 20% by weight. In this manner, a water-alcohol-based dispersion containing oxidized chopped fine particles having a content of the above-mentioned basic catalyst component adjusted to a range of from 200 to 1100 ppm by weight is obtained. However, the necessary amount of the above-mentioned basic catalyst component is the type and amount of the organic ruthenium compound used in the step (b) to be described later, or the catalyst component contained in the dispersion obtained by mixing them in -20-200932847. The type and the content thereof vary, and it is desirable to adjust the content of the basic catalyst component contained in the cerium oxide-based fine particles in the above range in consideration of such conditions. Further, the water-alcohol-based dispersion contains the alkaline catalyst component used in the hydrolysis/polycondensation reaction. In other words, the alkaline catalyst component which is not removed by the above-described ultrafiltration operation and the alkaline catalyst component which is released from the cerium oxide-based fine particles after the completion of the operation are used in the dispersion liquid. The partial hydrolysis and/or hydrolysis reaction carried out in the latter step (b) may be contained as it is. The alkoxysilane to be used in the above step is not particularly limited as long as the cerium oxide-based fine particles can be obtained. However, ethyl decanoate or methyl decanoate is preferably used. Further, as the basic catalyst component, at least one selected from the group consisting of ammonia, ammonium hydroxide, a quaternary ammonium compound, an organic amine and an amine-based coupling agent may be used, and ammonia or ammonium hydroxide is also preferably used. Further, the alcohol may be at least one selected from the group consisting of methanol, ethanol, propanol, isopropanol and n-butanol, and methanol or ethanol is also preferably used. Step (b) In this step, the water-alcohol dispersion containing the cerium oxide-based fine particles obtained in the above step (a) and the alkoxy decane having the following general formula (I), the following general formula An aqueous dispersion of at least one organic hydrazine compound selected from (Π) a halogenated decane and a partial hydrolyzate thereof is mixed. In this manner, a water-alcohol dispersion liquid containing the cerium oxide-based fine particles, the organic hydrazine compound -21 - 200932847 or the like is obtained. Here, the alkoxydecane and/or the halogenated decane are mixed as described above, for example, in the presence of an acidic catalyst component, and may be mixed in advance, and the mixing ratio of the cerium oxide-based fine particles to the organic cerium compound may be 0. The weight of the cerium oxide-based fine particles is represented by A, and the weight of the cerium compound (in terms of SiO 2 basis) is represented by B, and the weight ratio (A/B) thereof is 1/9 to 9/1, preferably 4 The range of /6~6/4 is better. The reason is as described above. Further, in this step, the alkaline catalyst component and/or the acidic catalyst component may be further contained in the dispersion liquid. As described above, the water-alcohol-based dispersion obtained in the above step (a) contains a basic catalyst component. However, when the amount of the basic catalyst component contained in the cerium oxide-based fine particles obtained in the above step (a) is less than the desired amount, the alkaline catalyst component may be externally added to the dispersion. Such cases have the following cases. (1) Water-alcohol-based dispersion of cerium oxide-based fine particles which are subjected to hot water treatment in a pressure vessel such as a autoclave and which is subjected to hydrolysis and polycondensation of the alkoxysilane, and which are aged in a pressure vessel such as a autoclave In the case of the liquid, in this case, since the obtained cerium oxide-based fine particles have a dense structure, the basic catalytic component contained in the cerium oxide-based fine particles is somewhat reduced. (2) cerium oxide-based fine particles obtained by hydrolyzing or polycondensing the alkoxy decane, or further oxidizing and oxidizing the cerium-based fine particles in a pressure vessel such as a autoclave for -22-200932847 When the water-alcohol-based dispersion is subjected to ultrafiltration, different operations (for example, excessive number of operations, etc.) are performed, and the obtained cerium oxide-based fine particles and the alkaline catalyst component contained in the water-alcohol dispersion are used. In the case where the content is more lowered than desired, in this case, the aforementioned alkaline catalyst component must be externally supplemented. Further, in order to form a cerium oxide-based coating having a high film strength, it is desirable to add an acidic catalyst component to the water-alcohol-based dispersion as described above. _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ Effect of the action of the sensory component, etc. The coating liquid of the ruthenium compound obtained by partial hydrolysis and/or hydrolysis forms a film, and a dense yttrium oxide-based film can be obtained. Further, the basic catalyst component and the acidic catalyst component may be selected from the above materials. ❾ Step (C) In this step, the mixed liquid obtained in the above step (b), that is, the water-alcohol dispersion is heated at a temperature of 30 to 80 ° C, at least the aforementioned alkalinity released by the cerium oxide-based fine particles. The organic hydrazine compound is partially hydrolyzed and/or hydrolyzed by a catalyst component. The mixed liquid of the water-alcohol dispersion liquid varies depending on the basic catalyst component contained in the cerium oxide-based fine particles, but is preferably at a temperature of 30 to 80 ° C, preferably 40 to 70 ° C. Heated in. Here, if the temperature is less than 30 ° C, the release rate of the basic catalyst component contained in the cerium oxide-based fine particles is slow, so that the organic hydrazine compound is partially hydrolyzed and/or hydrolyzed. When the temperature is longer than 80 ° C, the diffusion of the basic catalyst component contained in the cerium oxide-based fine particles is rapidly or rapidly generated, so that the stability of the dispersion liquid is deteriorated, which is not preferable. When the mixed liquid is heated, the alkaline catalyst component contained in the cerium oxide-based fine particles is gradually released from the cerium oxide-based fine particles, but the heating operation may be carried out in stages as occasion demands. Thereby, the organic chopping compound is partially hydrolyzed and/or hydrolyzed on the outer surface of the oxidized chopped fine particles and the inner surface of the pores via the alkaline catalyst component released from the cerium oxide microparticles. An antimony compound which is sufficiently bonded to the above-mentioned cerium oxide-based fine particles is obtained. In this case, the organic hydrazine compound is partially hydrolyzed and/or hydrolyzed via the basic catalyst component contained in the mixed solution. However, in the method of the present invention, it is important that at least the cerium oxide-based fine particles are released. The alkaline catalyst component is partially hydrolyzed and/or hydrolyzed. The water-alcohol dispersion obtained by the treatment is a method known from the prior art, for example, a distillation method using a rotary evaporator, etc., so that the water and the alcohol component contained in the dispersion, and propylene glycol monopropyl ether, propylene glycol monomethyl ether, At least one organic solvent selected from propylene glycol monomethyl ether acetate or the like is subjected to solvent replacement. A specific example (an example of using propylene glycol monopropyl ether (PGP) as an organic solvent for solvent replacement) is shown below. However, the invention is not limited to the methods described herein. (i) The water-alcohol dispersion obtained above was placed in a flask of a rotary evaporator, and propylene glycol monopropyl ether was added to the flask. -24- 200932847 (ii) Next, the rotary evaporator is driven at 50 to 90 ° C', preferably 60 to 80. (: Under temperature conditions, at -0. 05~_〇. 1 MPa, preferably. Hey. 08 ~-O. Under the reduced pressure conditions of IMPa, the flask is rotated at a speed of 30 to 120 rPm, preferably 60 to 90 rpm. If so treated, the water and alcohol contained in the water-alcohol dispersion are evaporated, so that they are cooled and discharged outside the system. (iii) The coating liquid for forming a cerium oxide coating film in which the water and the alcohol are replaced with the propylene glycol monopropyl ether solvent can be obtained by the above operation (ϋ) of continuing the necessary time. In addition, the amount of the ruthenium compound contained in the coating liquid for forming a cerium oxide-based coating film can be adjusted to the above-mentioned desired range. Here, the content of the above-mentioned oxime compound varies depending on the intended use, and when the ruthenium compound is represented by SiO 2 , it is adjusted to 2 to 50% by weight, preferably 1 to 40% by weight based on the weight of the coating liquid. The range is good. [Method of Forming Cerium Oxide Film] In the present invention, the above-described method for forming a cerium oxide-based film by using the coating liquid for forming a cerium oxide-based film can be employed. Again, this previously known method is as follows. (1) After the coating liquid for forming a cerium oxide-based coating film is coated on a substrate, the substrate is heat-treated at a temperature of 80 to 350 ° C, and then at a temperature higher than the aforementioned heating temperature of 340 to 4 50 ° C. The method of calcination. (2) After the coating liquid for forming a cerium oxide-based coating film is applied onto a substrate, the substrate is heat-treated at a temperature of 80 to 350 ° C, and further irradiated with an electron beam, ultraviolet light or microwave to be aged. In the present invention, it is desirable that the properties of the coating liquid for forming a cerium oxide-based coating film and the use thereof are appropriately selected from the previously known methods. Hereinafter, the film forming method will be specifically described by taking the method of the above (1) as an example, but the present invention is not limited thereto. The coating step is generally applied to a coating liquid for forming a coating on a substrate, and a coating method such as a spin coating method, a dip coating method, a roll coating method, a slit coating method, or a transfer method is used. In the present invention, The above-described coating liquid for forming a cerium oxide-based coating film can also be applied by such a conventionally known method. In the case where the coating liquid for coating a film is applied onto a semiconductor substrate, the spin coating method is suitable, and the film thickness is uniform and the dust generation property is excellent. Therefore, in the present invention, a coating method by the spin coating method is preferably used, but in the case of being applied to a semiconductor substrate having a large diameter, a transfer method or the like may be employed. Further, in the present invention, the term "application of a coating liquid on a substrate" includes not only directly coating the coating liquid on a substrate such as a tantalum wafer, but also including the coating liquid. The film is applied over the protective film for semiconductor processing and other films. The heating step is performed on the film coated on the substrate in this manner, and is heat-treated at a temperature of 80 to 35 (at a temperature of rc. Here, if the heat treatment is performed at a temperature exceeding 35 Å, the coating film contains the film The organic solvent is rapidly evaporated, and pores and voids having a larger diameter are formed in the film, so that the film strength is lowered by -26-200932847 degrees. Therefore, the heat treatment is desirably set to a temperature of 80 to 3 50 as needed. The range of °C is increased stepwise. For example, at a temperature of 1 5 〇t for 1 minute, at a temperature of 250 °C for 1 minute, and then for 350. (: a temperature of 1 minute, etc.) When the heat treatment is carried out at a temperature of less than 80 ° C, the organic solvent contained in the coating film is almost completely evaporated, and remains in the film as it is. The heat treatment may not be achieved, and unevenness may occur in the film thickness of the formed film. The heat treatment also varies depending on the film thickness of the film, and is preferably 1 to 10 minutes, preferably 2 to 5 minutes. More and 'this plus The treatment can be carried out under a nitrogen atmosphere of an inert gas or under an air atmosphere, so that the treatment can be carried out for a short period of time at a lower temperature of 350 ° C or lower, so that even in an air atmosphere containing a large amount of oxygen The heat treatment does not cause damage to the metal wiring or the like disposed on the semiconductor substrate due to metal oxidation. Moreover, since the possibility of ingesting a trace amount of oxygen in the film is increased, the processing of the calcination step in the subsequent stage is performed. A cerium oxide-based coating film which is crosslinked by a Si-0-Si bond is formed, and a cerium oxide-based coating film having hygroscopicity (water repellency) and high film strength is easily formed. If the heat treatment is applied as described above, the coating is performed. The organic solvent or the like contained in the film is evaporated and detached, and on the other hand, the yttrium oxide-based film component is polymerized and hardened, and the melt viscosity of the polymer is lowered and the reflow property of the film is increased during heating. As a result, the flatness of the obtained film is improved. Further, it is preferable that the heat treatment is performed by placing the substrate obtained in the coating step on a leaf-type hot plate. -27- 200932847 Calcination step Next, the heat-treated film is subjected to an atmosphere of an inert gas, and calcined at a temperature higher than the aforementioned heating temperature of 340 to 450 ° C. The inert gas is desirably used, and it is desired to use nitrogen gas. It is necessary to add oxygen or air to it, and to use an inert gas containing a small amount of oxygen (for example, about 500 to 10,000 ppm by volume of oxygen) (described in International Publication WO 0 1 /48 8 06 A1, etc.). The calcination temperature is also obtained depending on the properties of the ruthenium compound (that is, the ruthenium oxide-based film component) contained in the coating liquid, and the cerium oxide film having moisture absorption resistance (water repellency) and high film strength is obtained. On, it is expected to be selected from a temperature range of 340 to 450 °C. When the temperature of the calcination treatment is less than 3 to 40 ° C, the formation of the cerium oxide-based coating component is difficult to crosslink before the formation of the cerium oxide-based coating component, so that the coating film having sufficient film strength cannot be obtained, and if the temperature of the calcination treatment is When the temperature exceeds 450 ° C, for example, the aluminum wiring and the copper wiring constituting the semiconductor substrate are oxidized or melted to cause fatal damage to the wiring layer. In addition, the calcination treatment may be carried out depending on the type of the coating liquid for forming a coating film and the film thickness of the coating film, and it is preferably 5 to 90 minutes, preferably 10 to 60 minutes. Further, in the same manner as in the case of the above heating step, the calcination treatment is preferably carried out on a hot plate of a leaf type type. The film thickness of the obtained cerium oxide-based film thus treated is also different depending on the substrate on which the film of -28-200932847 is formed and the use thereof, for example, the substrate (sand wafer) in the semiconductor device is usually 100~ 600 nm' is usually 100 to 10 〇 0 nm between the wiring layers of the multilayer wiring. [The cerium oxide-based coating film] The cerium oxide-based coating film of the present invention can be easily formed by using the above-described coating liquid for forming a cerium oxide-based coating film having a Young's modulus of 3.  Above OGPa, in more detail 5. A high film strength of 0 GPa or more and a low specific dielectric ratio, and excellent surface flatness and crack resistance. Further, in the present invention, the cerium oxide-based fine particles used in the formation of the coating liquid for forming a coating film can be formed into a yang by using a cerium oxide-based fine particle which is hydrothermally treated and cured in a pressure vessel such as a hot pot. The modulus of elasticity is 6. 0GPa or more, more detailed 7. A cerium oxide film having a high film strength of 0 GPa or more. Further, since the cerium oxide-based coating of the present invention is also strong in tensile strength, even if the film thickness of the film is increased, cracking of the film does not occur. In the adjustment step of forming the coating liquid for forming a coating film, the reactant of the organic cerium compound partially hydrolyzed and/or hydrolyzed and the oxidizing agent are partially oxidized by the alkaline catalyst component released from the cerium oxide-based fine particles. The outer surface of the lanthanide microparticles is strongly bonded to the inner surface of the pores. When the film is formed as described above, even if the film is shrunk, the yttrium oxide-based fine particles are not separated, so that a ruthenium-based film having high crack resistance can be formed. Further, according to the coating liquid of the present invention, the surface roughness (Rms) of the film can be easily formed to be 5. Oxide sand with a smooth surface below Onm -29- 200932847 is a film. (The surface roughness is a self-sufficient average roughness of 値 measured by an atomic force microscope AF )), and it is not necessary to perform an honing treatment such as flattening the surface of the film formed on the substrate. Further, pinholes and the like do not occur on the surface of the film. In addition, since the cerium oxide-based coating itself is a coating film having excellent water repellency (hygroscopicity), even if it is placed in an air atmosphere containing saturated steam, the specific dielectric constant is not deteriorated (that is, Further, the yttrium oxide-based coating film is excellent in adhesion to a film surface formed on a semiconductor substrate or the like, and is excellent in chemical resistance such as alkali resistance, and is resistant to oxygen plasma resistance and etching processability. It also has excellent characteristics in the suitability of steps. The coating liquid of the present invention which can form such a cerium oxide-based coating film is used on a semiconductor substrate, on a substrate in which a wiring layer of a multilayer wiring structure, a surface of an element, and/or a bonding portion of a layer are provided, or on the substrate. The yttrium oxide-based film is formed between the plurality of wiring layers provided, and is particularly a yttrium oxide-based Q insulating film. Among them, the coating liquid of the present invention is suitably used for the purpose of forming an insulating film having a film thickness of about 1 to 5 μm. [Measurement Method] Next, the measurement method used in the examples of the present invention will be specifically described below. (1) The average particle size of the cerium oxide-based fine particles is a magnified image of yttrium oxide-based fine particles contained in the water-alcohol dispersion (sample) -30-200932847, with a transmission electron microscope (ΤΕΜ) (曰This photograph of Ding Chou 14 photographed by 1"11 company 11-800) was analyzed by 1^26\automatic image processing analyzer (LUZEX-AP manufactured by Nicole Co., Ltd.), and the yttrium oxide microparticles were calculated using the attached analysis software. (2) The content of the basic catalyst component contained in the cerium oxide-based fine particles (a) In order to measure the water-alcohol dispersion (sample) in which the cerium oxide-based fine particles containing the basic catalytic component are dispersed The total amount of the basic catalyst component (for example, the amount of nitrogen) is added by adding an aqueous sodium hydroxide solution to dissolve the cerium oxide-based fine particles, and the alkaline gas generated by the heating is contained with dilute sulfuric acid (H2S04: 0. 05 Mohr / liter) aqueous solution absorption. Next, 2 to 3 drops of methyl red solution were dropped therefrom, and titrated with an aqueous sodium hydroxide solution (NaO Η: 0·1 mol/liter), and the total amount of the alkaline catalyst component contained in the dispersion was measured. (Q 1 ). (b) Next, the water-alcohol dispersion (sample) was centrifuged at a rotation speed of 3000 rpm (centrifugal concentrator: VS200 1 manufactured by Azuwan Co., Ltd., centrifuge KUBOTA 693 0 manufactured by KUBOTA Co., Ltd.), and the dispersion was placed therein. The cerium oxide-containing fine particles are separated. Next, the amount of the basic catalyst component (for example, the amount of ammonia) contained in the obtained dispersion medium is measured in the same manner as in the above (a), and the total amount of the alkaline catalyst component contained in the dispersion medium is measured (Q2). ). (c) The amount of the alkaline catalyst component (Q2) measured in the above (b) is subtracted from the amount of the organic catalyst component (Q1) measured in (a), and the content of the cerium oxide-based fine particles is calculated. The amount of the basic catalyst component (Q). -31 - 200932847 (3) Measurement of the viscosity of the coating liquid for coating film. Transfer 1 ml of the coating liquid as a sample to a tray of a viscometer (made by Toki Sangyo Co., Ltd., VISCONIC ED type), and let the sample touch the rotation. For the child, measure the torque 値 when the rotator is rotated by the known number of revolutions. Next, the viscosity is calculated from the number of revolutions and the measured moment 値. (4) Measurement of the number average molecular weight of the ruthenium compound The measurement was carried out according to the GPC (Gelph Phase Chromatography) method using a molecular weight measuring device (manufactured by Tosoh Corp.: GPC 8020). In other words, 1 ml of the coating liquid as a sample was placed in a solution and passed through a rubber column (manufactured by Tosoh Corporation: TSKgel, manufactured by Tosoh Corporation: G5000Hxl, TSKgel G3 0 00Hxl), according to the volume of fluid force or the like. The molecular component in the sample was separated in size, and the molecular weight distribution was measured based on the reference refractive index difference at each time. Next, the measured molecular weight distribution was compared with a polystyrene distribution having a known molecular weight measured in advance, and the number average molecular weight converted to polystyrene was calculated. (5) Measurement of ion concentration of the coating liquid for forming a coating film: 10 ml of a coating liquid as a sample and 90 ml of purified pure water were mixed', and the mixture was stirred at room temperature for 1 hour, and then the mixture was filtered and filtered. 100 ml of purified pure water was passed through the filter medium and the filtrate was recovered. Next, the cation concentration of metal ions and the like contained in the recovered filtrate is measured by atomic absorption method, and the anion concentration of the basic catalyst component or the like is measured by ion chromatography-32-200932847 (6) Ratio of cerium oxide-based coating film The dielectric constant is applied as a coating liquid on a crucible wafer by spin coating at a rotational speed of 4000 rPm, and dried at a temperature of 120 ° C for 5 minutes, and then at 350 ° C under a nitrogen atmosphere. The film was calcined at a temperature for 30 minutes to form a coating film (yttrium oxide-based film). Next, it was measured by a mercury probe method (SSM495, manufactured by Solid State Measurements, and a frequency of 1 MHz). In other words, the mercury electrode is brought into contact with the coating film, the voltage is changed, and the capacitance of the coating film is measured, and the specific dielectric constant of the coating film is calculated from the obtained capacitance and film thickness (7) The coating of the cerium oxide-based coating film. The coating liquid as the sample was applied by spin coating on a crucible wafer at a rotational speed of 4000 rpm, and dried at a temperature of 12 (TC for 5 minutes, and then at a temperature of 350 ° C under a nitrogen atmosphere). The film was calcined at a temperature for 30 minutes to form a coating film (yttrium oxide-based film). Secondly, the Young's Modulus was measured according to the nanoindenter method (Nanoindenter XP manufactured by MTS Sysbtms Corp.), that is, the pressure of diamond was pressed. The contact area of the pressure applied to the coating film and the pressing strength are measured, and the Young's modulus is calculated. (8) The crack resistance of the cerium oxide-based coating is limited to the thickness of the coating. The solution was applied by spin coating on a crucible wafer at a rotational speed of 300 to -33 to 200932847 700 rpm, and dried at a temperature of 120 ° C, and calcined at a temperature of 350 ° C for 30 minutes under a nitrogen atmosphere. , (yttrium oxide film). Secondly, the obtained coating film is : 50-fold) was observed, confirming whether the cracks. In addition, according to the film thickness measurement method (SURFCOM manufactured by ACCRETECH Co., Ltd., the thickness of the film which does not cause cracks is measured. ^ (9) The surface roughness of the yttrium oxide-based film is applied to the enamel wafer as a sample. The coating was applied at a rpm of rpm and calcined at a temperature of 305 ° C for 30 minutes (a cerium oxide coating film) under a nitrogen atmosphere at a temperature of 12 TC. Next, the coating film was applied. The probe was scanned by Kanchi Labor (manufactured by Bico, Japan), and the surface roughness (Rms) was observed by the intermolecular force between the probe and the coating film. [Examples] Hereinafter, the present invention will be described in detail based on examples. Invention, but limited by the embodiments. Modulation of cerium oxide microparticles [blending example 1] Modulation 99. 9wt% concentration of methanol (Kantong Chemical 5〇8g and pure water 760g of matrix water 1268g dry for 5 minutes to form a coating film microscope (double contact type difference 1 400D), E coating method, to dry The shape of the coating imparting conductivity NCH-10V was formed for 5 minutes, and the invention was calculated not to be made by this product. Join 9 9. 9 -34- 200932847 1604 g of methanol in weight% concentration and 8452 g of ethyl decanoate (manufactured by Tama Chemical Co., Ltd.) and stirred to prepare 245 g of ethyl citrate solution. Next, 1268 g of the above-mentioned matrix water was heated and maintained at a temperature of 65 ° C, and the aforementioned ethyl citrate solution was used in an amount of 24,500 g and 1. A 99% by weight aqueous ammonia solution of 9490 g was added over 5 hours with stirring. After the end of the addition, the temperature was maintained at the above temperature and the aging operation was carried out for 3 hours. A water-methanol dispersion (hereinafter referred to as "water-methanol dispersion") of 4% by weight of cerium oxide microparticles was 35,258 g. Next, the obtained water-methanol dispersion is cooled to room temperature' and added to a water-methanol dispersion of 31,860 g, 2034 g of pure water is added and stirred, and ultrafiltration is used at a temperature of 25 ° C. Filter paper (Asahi Kasei Co., Ltd., ACP-2013), and its weight was concentrated to 18,711 g. In this manner, 1871 g of a water-methanol dispersion (hereinafter referred to as "water monomethyl alcohol refining liquid") containing the ethyl decanoate unreacted product and the intermediate reactant contained in the water-methanol dispersion was removed. Next, in 10395 g of the water-methanol refining liquid obtained above, 99. After 5% by weight of ethanol (manufactured by Wako Pure Chemical Industries, Ltd.), 1 3 860 g, and stirring, the above ultrafiltration filter paper was used under a temperature of 25 t, and the weight was concentrated to 10,395 g. Further, 1 3860 g of ethanol was added to the obtained dispersion and stirred, and the weight was again concentrated to 10,395 g using the above-mentioned ultrafiltration filter paper. In this way, the water-methanol dispersion (hereinafter referred to as "water-ethanol dispersion") containing cerium oxide microparticles was replaced by a solvent to replace the water contained in the water-methanol refinement liquid with methanol. -35 - 200932847 2,703 g of ethanol was added to the water-ethanol dispersion, and the concentration of cerium oxide-based fine particles contained in the dispersion was adjusted to 1% by weight, and then a rotary evaporator (Shibata Scientific Co., Ltd.) was used. RE20EU) is concentrated to obtain 19. A sample of 4% by weight of cerium oxide microparticles in water-ethanol dispersion 1A 675 2 g. When the average particle diameter of the cerium oxide-based fine particles contained in the sample 1 A thus obtained was measured, it was about 20 nm. Further, when the total content of ammonia contained in the sample 1A and the ammonia content contained in the cerium oxide-based fine particles were measured by the above method, the results are shown in Table 1. [Combination Example 2] In the same manner as in the mixing example 1, a water-methanol refining solution of 1 8 7 1 1 g was prepared. Next, 10150 g of the water-methanol refining solution prepared above was taken out, 47 g of a 29% by weight aqueous ammonia solution was added thereto, and the mixture was stirred, and then added to a calender (manufactured by a pressure-resistant glass industry, TAS-13 type), and 150 The temperature of °C was treated for 15 hours, and the cerium oxide microparticles contained in the water-methanol refining liquid were aged. Next, 10045 g of a water-methanol refining solution (aging liquid) obtained by cooling to room temperature was taken out, and 13020 g of pure water was added thereto, and after stirring, an ultrafiltration filter paper was used at a temperature of 25 ° C to concentrate the weight to 9998. Gram. Further, 13 020 g of pure water was added and stirred, and again, the above-mentioned ultrafiltration filter paper was used, and the weight was concentrated to 9998 g twice. Thus, from -36 to 200932847, 9998 g of a water-methanol refining liquid containing a part of ammonia contained in the cerium oxide-based fine particles was removed. Next, in the 99.99 g of the water-methanol refining liquid obtained above, 1 3 3 3 1 g of ethanol (manufactured by Wako Pure Chemical Industries, Ltd.) was added and stirred, and then used at a temperature of 25 ° C. The filter paper was filtered and concentrated to a weight of 9998 g. Further, after adding 13331 g of ethanol and stirring, the weight was again concentrated to 999 8 g using the above-mentioned ultrafiltration filter paper. Thus, 9998 g of a water-ethanol dispersion in which water and methanol contained in the water-methanol dispersion were subjected to solvent exchange was obtained. 2600 g of ethanol was added to the water-ethanol dispersion, and the concentration of the cerium oxide-based fine particles contained in the dispersion was adjusted to 1% by weight, and then concentrated using a rotary evaporator (RE2 0EU manufactured by Shibata Scientific Co., Ltd.). , obtained containing 19. A sample of a water-ethanol dispersion of 4% by weight of cerium oxide microparticles 2A 6494 g. When the average particle diameter of the cerium oxide-based fine particles contained in the sample 2A thus obtained was measured, it was about 25 nm. Further, in the same manner as in the case of the mixing example 1, the total content of ammonia contained in the sample 2A and the ammonia content contained in the cerium oxide-based fine particles were measured by the above-described method, as shown in Table 1. [Example 1] The sample 1A prepared in the mixing example 1 and the sample 2A prepared in the mixing example 2 (water-ethanol dispersion containing 19 to 4% by weight of cerium oxide microparticles) were respectively taken out and 6050 g were taken out. Mixed methyltrimethyl-37- 200932847 Oxydecane (MTMS, Shin-Etsu Chemical Co., Ltd.) 0. 449% by weight of nitric acid (1409 g manufactured by Kanto Chemical Co., Ltd.) and slowly heated from room temperature to 50 ° C while maintaining the temperature (50 ° C) and at a speed of 200 rpm The portion of the methyltrimethoxydecane is 7". When the pH of the mixture is measured at this time, the first sample (before heating) is used, and the nitrate which is an acidic catalyst component is added as ρΗ2·1' but with temperature. Rise and become PH7. 8, under the stability. Further, in the case of using the sample 2A described above, initially (under the influence of the addition of nitric acid as an acidic catalyst component, it becomes PH8 as the temperature rises. In this state, ammonia which is a catalyst component contained in the cerium oxide-based fine particles contained in the above-mentioned sample is known, and contributes to the aforementioned methyltrimethoxy hydrolysis reaction and/or hydrolysis reaction. Next, 'the obtained water-ethanol dispersion is supplied to Rotary Science Co., Ltd. to make RE20EU), and the alcohol and the like in the dispersion are mixed with propylene glycol monopropyl ether (PGP, Japanese emulsifier (stock solvent replacement). The content of the compound in the solvent-replaced PGP solution was adjusted to 25% by weight on the basis of Si〇2, and the coating liquid for spray coating 3A (referred to as sample 3A using the sample 1A) and 4A (using the aforementioned Sample 2A or less is referred to as sample 4 A). The sample thus obtained is placed at room temperature for 1 day and 1778 g of the aqueous solution at 150 ° C. Further, J is stirred for 1 5 k and/or 1 A of water, the most acidic. Under the influence of this state before heating), ρΗ2·4, but the definition. In other words, a partial evaporator (made of water containing wood and B) which is a basic decane is used to form a oxidized product, and the following is prepared, and the coating liquid is confirmed by a viscosity of -38 to 200932847. When the preservation stability is maintained, it is known that there is no change. The properties of the obtained coating liquid for forming a cerium oxide-based coating film are shown in Table 2 [Example 2] The sample 1A prepared in the mixing example 1 and the sample 2A adjusted in the mixing example 2 (all water-ethanol dispersions) The 6050 was taken out separately, and 2,668 g of methyltrimethoxydecane (manufactured by Shin-Etsu Chemical Co., Ltd.) and 0. 1691 g of nitric acid (manufactured by Kanto Kasei Co., Ltd.) at a concentration of 44% by weight was slowly heated from room temperature to a temperature of 5 °C. Further, the hydrolysis and/or hydrolysis of the methyltrimethoxydecane was carried out while maintaining the temperature at 50 ° C and stirring at a speed of 200 rpm for 15 hours. When the pH of the mixed solution was measured at this time, it was initially (before heating), and under the influence of nitric acid added as an acidic catalyst component, it was PH2. 3, but as the degree rises, it becomes PH7. 5, and stabilized in this state. In other words, it is known that ammonia which is an alkaline catalyst component is released from the cerium oxide-based fine particles contained in the sample, and contributes to partial hydrolysis and/or hydrolysis reaction of the methyltrimethoxydecane. Next, the obtained water-ethanol dispersion is supplied to a rotary evaporator (RE20EU, manufactured by Tian Science Co., Ltd.), and water and alcohol contained in the dispersion are mixed with propylene glycol monopropyl ether (PGP, Japanese emulsifier). ))) Into the solvent replacement. Furthermore, the content of the chelating agent contained in the PGP solution in which the solvent was replaced was adjusted to 25% by weight on the basis of SiO 2 to obtain a coating liquid 5A for forming an oxon-based coating film (manufactured by using the above-mentioned sample 1A). The temperature of the chemical processing unit is determined by the anti-Chai-Bai-39-200932847 'referred to as sample 5A' and 6A (the sample prepared by using the sample 2A, hereinafter referred to as sample 6A). The sample thus obtained was allowed to stand at room temperature for 150 days, and the storage stability of the coating liquid was confirmed by the viscosity change, and it was found that there was no change. The properties of the obtained coating liquid for forming a cerium oxide-based coating film are shown in Table 2. [Example 3] The sample 2A prepared in Preparation Example 2, and phenyltrimethoxydecane (PhTMS, manufactured by Shin-Etsu Chemical Co., Ltd.) and phenyltrichloromethane (PhTCS, Shin-Etsu Chemical Industry Co., Ltd.) were used. In addition to the methyltrimethoxy decane, the coating liquid 7A for forming an oxidized coating film containing a ruthenium compound containing 25 wt% of a reactant based on S i Ο 2 was obtained in the same manner as in the case of Example 1. (The sample prepared by the above-mentioned sample 2A and phenyltrimethoxydecane is hereinafter referred to as sample 7A) and 8A (manufactured by using the sample 2A and phenyltrichloroethane, hereinafter referred to as sample 8a). When the sample thus obtained was allowed to stand at room temperature for 5 days, and the storage stability of the coating liquid was confirmed by the change in viscosity, it was found that there was no change. The properties of the obtained coating liquid for forming a cerium oxide-based coating film are shown in Table 2. [Comparative Example 1] A water-methanol purified liquid of 9988 g was obtained in the same manner as in the mixing example 1 until the water-methanol purified liquid was obtained. Secondly, in order to reduce the ammonia concentration, once again, add 1 3 3 3 1 g of pure water to the water-methanol refining solution of 9 9 9 g and stir it, then use it at a temperature of 25 ° C -40-200932847 The filter paper was filtered and the weight was concentrated to 9998 g. Next, 1 33 3 1 g of ethanol (manufactured by Wako Pure Chemical Industries, Ltd.) was added and stirred, and the weight was concentrated to 9998 g using an ultrafiltration filter paper at a temperature of 25 °C. Further, after adding 13331 g of ethanol and stirring, the weight was again concentrated to 9998 g using the above-mentioned ultrafiltration filter paper. Thus, 9998 g of a water-ethanol dispersion in which water and methanol contained in the water-methanol refining liquid were replaced with a solvent was obtained. To the water-ethanol dispersion, 2,500 g of ethanol was added, and the concentration of the cerium oxide-based fine particles contained in the dispersion was adjusted to 1% by weight, and then concentrated using a rotary evaporator (RE20EU manufactured by Shibata Scientific Co., Ltd.). , obtained containing 19. Water-ethanol dispersion sample of 4% by weight of cerium oxide microparticles 9A 6494 g ° The average particle diameter of the cerium oxide-based fine particles contained in the sample 9A thus obtained was measured to be about 25 nm. Further, in the same manner as in the case of the mixing example 1, the total content of ammonia contained in the sample 9A and the ammonia content contained in the cerium oxide-based fine particles were measured by the above-described method, as shown in Table 1. The partial hydrolysis and/or hydrolysis of the above methyltrimethoxydecane was carried out in the same manner as in the case of Example 1 except that the above sample 9A was used. The pH of the mixed solution when the sample 9A was used was measured as 'first (before heating), and under the influence of the addition of nitric acid as an acidic catalyst component, it was PH2. 2, but as the temperature rises, the force is gradually increased and becomes ρΗ4·1. That is, it is understood that the amount of ammonia released from the cerium oxide-based fine particles by the basic catalyst component type is insufficient to contribute to the partial hydrolysis of the methyltrimethoxydecane and/or the alkaline contact of the hydrolysis reaction. Less media. Next, the obtained water-ethanol dispersion is supplied to a rotary evaporator (RE20EU manufactured by Shibata Scientific Co., Ltd.), and water and ethanol contained in the dispersion are mixed with propylene glycol monopropyl ether (PGP, Japanese emulsifier). ))) Solvent replacement. Furthermore, the content of the ruthenium compound contained in the PGP solution in which the solvent was replaced was adjusted to 25% by weight on the basis of SiO 2 to obtain a coating liquid for forming a cerium oxide-based film 1 〇A (using the sample 9 A described above) Hereinafter, it is referred to as sample 1 OA ). When the sample thus obtained was allowed to stand at room temperature for 150 days, and the storage stability of the coating liquid was confirmed by the change in viscosity, it was found that there was no change. The properties of the obtained coating liquid for forming a cerium oxide-based coating film are shown in Table 2. [Comparative Example 2] A sample of 18,711 g of a water-methanol purified solution was prepared by the same method as in the mixing example 1 except that the water-methanol refining solution was obtained. Next, 10150 g of the water-methanol refining liquid was taken out. In order to increase the ammonia concentration in the sample, 1 90 g of a 29 wt% aqueous ammonia solution was added to the water-methanol refining solution and stirred, and then added to a hot pot ( Pressure glass industry (stock), TAS-13 type), and 150. (: The temperature was treated for 15 hours, and the cerium oxide microparticles contained in the water-methanol refining liquid were aged. Next, '10-45 g of the water-methanol refining solution (aging liquid) obtained by cooling to room temperature was taken out. Gram, and add pure water 丨3〇2 () grams and stir -42- 200932847, use ultrafiltration filter paper at 25 ° C, the weight is concentrated to 9861 grams. Add 13020 grams of pure water and After stirring, the above-mentioned ultrafiltration filter paper was used, and the weight was concentrated to 9861 g twice by repeating the operation. Thus, 9861 g of a water-methanol refining liquid containing a part of ammonia contained in the cerium oxide-based fine particles was obtained. After adding 13147 g of ethanol (Wako Pure Chemical Industries, Ltd.) to the obtained 9861 g of the water-methanol refining solution obtained above, the mixture was stirred, and then filtered at a temperature of 25 ° C using an ultrafiltration filter paper to concentrate the weight thereof. Up to 9 86 1 g. Further, after adding 13147 g of ethanol and stirring, the ultra-filter paper was used again, and the weight thereof was concentrated to 9 86 1 g. Thus, the water-methanol dispersion was obtained in the above-mentioned manner. Containing water and armor 980 g of a water-ethanol dispersion in which the alcohol was subjected to solvent replacement. 2,654 g of ethanol was added to the water-ethanol dispersion, and the concentration of the cerium oxide-based fine particles contained in the dispersion was adjusted to 10% by weight, and then rotated. The evaporator (RE20EU made by Shibata Science Co., Ltd.) was concentrated to obtain 19. A sample of 4% by weight of cerium oxide microparticles in water-ethanol dispersion 11A 6404 g. When the average particle diameter of the cerium oxide-based fine particles contained in the sample 1 1 A thus obtained was measured, it was about 25 nm. Further, in the same manner as in the case of the blending example 1, the total content of ammonia contained in the sample 11A and the ammonia content contained in the cerium oxide-based fine particles were measured by the above-described method, as shown in Table 1. The partial hydrolysis of the methyltrimethoxydecane and/or the determination of the pH of the mixed solution using the sample 11A in the same manner as in the case of Example 1 were carried out in the same manner as in the case of the above-mentioned sample 1 1 A. Initially (before heating), PH8. 3 ' As the temperature rises and increases slightly to pH 8. 5. Thus, although the same amount of nitric acid as the acidic catalyst is mixed, the initial pH is high, and the reason why the enthalpy is almost completely unchanged is because the amount of ammonia contained in the water-ethanol dispersion of the sample 11A is small. Ammonia is also present as a basic catalyst component in the cerium oxide-based fine particles. Thus, the hydrolysis reaction of the above-mentioned methyldimethoxydecane can be predicted to be excessively carried out via excess ammonia (basic catalyst component). Next, 'the obtained water-ethanol dispersion is supplied to a rotary evaporator (RE20EU, manufactured by Shibata Scientific Co., Ltd.), and the water and ethanol contained in the dispersion are mixed with propylene glycol monopropyl ether (PGP, Japanese emulsifier). ))) Solvent replacement. Furthermore, the content of the ruthenium compound contained in the P GP solution in which the solvent was replaced was adjusted to 25% by weight on the basis of Si 〇 2 to obtain a coating liquid for forming a cerium oxide-based film 1 2 A (using the aforementioned sample 1 1 A) The person to be modulated is hereinafter referred to as sample 1 2A). The sample thus obtained was allowed to stand at room temperature for 150 days, and when the storage stability of the coating liquid was observed, it was found that the gelation state was changed. Thus, it has been found that a water-ethanol dispersion containing cerium oxide-based fine particles having an ammonia content of more than llOOppm and a coating liquid prepared by partially hydrolyzing and/or hydrolyzing alkoxysilane or the like have problems in storage stability. The properties of the obtained coating liquid for forming a cerium oxide-based coating film are shown in Table 2. [Comparative Example 3] -44 - 200932847 The above-mentioned sample 2Α and methyltrimethoxydecane (MTMS, Shin-Etsu Chemical Co., Ltd.) prepared by the mixing example 2 were used, and the aforementioned heating temperatures were 20 ° C (room For the formation of a yttrium oxide-based film containing 25% by weight based on Si〇2, in the same manner as in the case of carrying out the method of "I". Coating liquid i3a (modulated at a heating temperature of 20 ° C, hereinafter referred to as sample i3A) and 14 A (manufactured at a heating temperature of 9 〇 ° C, hereinafter referred to as sample i4A)

Ο 將如此處理所得之試料於室溫放置日,並以黏度 變化確認塗佈液的保存安定性時,可知於塗佈液13A無變 化。但是’可知於塗佈液14A變化成膠化狀態。如此,可 知採用90°C之加熱溫度的情形中,因爲氧化矽系微粒子中 所含的氨(鹼性觸媒成分)於短時間放出至粒子外,且急 劇引起院氧基砂焼等的水解反應,故損害塗佈液的保存安 定性。 所得之形成氧化矽系被膜用塗佈液的性狀示於表2。 [實施例4及比較例4] 將實施例1〜3及比較例1、3所調製之前述試料3 A 、4A、5A、6A、7A、8A、10A 及 13A 各 5 毫升,使用先 前公知的旋塗法(MIKASA公司製:1H-3 60 S)於6吋大 小的矽晶圓基板上滴下,並以4000rpm的速度進行20秒 鐘塗佈處理。重複進行此類操作,取得施以塗佈處理的基 板 3B、4B、5B、6B、7B、8B、10B 及 13B。其次將此些 -45 - 200932847 基板載置於熱板(IUCHI公司製:EC-1200)上並於大氣 氛圍氣下以120 °C施以加熱處理5分鐘。於此加熱處理步 驟中,因爲被膜中所含的有機溶劑(PGP )等蒸發,故將 其排出系統外。 更且,依舊將此些基板載置於熱板上,且其處理環境 由大氣氛圍氣下變更成氮氣氛圍氣下,並於350 °C中施以 煅燒處理3 0分鐘。其次,將此些基板冷卻至接近室溫之 溫度後,除去系統外。 如此處理於所得之基板上所形成之氧化矽系被膜的膜 厚爲約500nm。 其次,以上述方法測定基板上所形成之氧化矽系被膜 的比介電率、被膜強度(楊氏彈性率)及表面粗度。其測 定結果示於表3。 [實施例5及比較例5] 將實施例1〜3及比較例1、3所調製之前述試料3 A 、4A、5A、6A、7A、8A、10A 及 13A 各 5 毫升,使用先 前公知的旋塗法(MIKASA公司製:1H-360S)於6吋大 小的矽晶圓基板上滴下,並以3 00rpm〜700rpm的速度進 行2 0秒鐘塗佈處理。重複進行此類操作,取得施以塗佈 處理的基板 3C、4C、5C、6C、7C、8C、10C 及 13C。 其次將此些基板載置於熱板(IUCHI公司製:EC-1200) 上 並於空 氣氛圍 氣下以 120 °C 施以加 熱處理 5 分鐘 。於此加熱處理步驟中’因爲被膜中所含的有機溶劑( -46- 200932847 PGP)等蒸發,故將其排出系統外。 更且,依舊將此些基板載置於枚葉式的熱板上,且其 處理環境由空氣氛圍氣下變更成氮氣氛圍氣下,並於350 °C中施以煅燒處理30分鐘。其次,將此些基板冷卻至接 近室溫之溫度後,除去系統外。 以上述方法測定如此處理煅燒所得之氧化矽系被膜不 會發生裂痕的臨界膜厚。其測定結果示於表4» 由上述結果(表3及表4 )所闡明般,使用實施例iΟ When the sample thus obtained was allowed to stand at room temperature for a day and the storage stability of the coating liquid was confirmed by the change in viscosity, it was found that the coating liquid 13A did not change. However, it can be seen that the coating liquid 14A changes to a gel state. In the case where the heating temperature of 90 ° C is used, the ammonia (basic catalyst component) contained in the cerium oxide-based fine particles is released to the outside of the particles in a short period of time, and the hydrolysis of the oxalate or the like is rapidly caused. The reaction is such that the preservation stability of the coating liquid is impaired. The properties of the obtained coating liquid for forming a cerium oxide-based coating film are shown in Table 2. [Example 4 and Comparative Example 4] 5 ml of each of the samples 3 A, 4A, 5A, 6A, 7A, 8A, 10A, and 13A prepared in Examples 1 to 3 and Comparative Examples 1 and 3 was used, and previously known. A spin coating method (manufactured by MIKASA Co., Ltd.: 1H-3 60 S) was dropped on a 6-inch ruthenium wafer substrate, and subjected to coating treatment at 4000 rpm for 20 seconds. This operation is repeated to obtain the substrates 3B, 4B, 5B, 6B, 7B, 8B, 10B, and 13B to which the coating treatment is applied. Next, these -45 - 200932847 substrates were placed on a hot plate (EC-1200, manufactured by IUCHI Co., Ltd.) and heat-treated at 120 ° C for 5 minutes under atmospheric atmosphere. In this heat treatment step, since the organic solvent (PGP) or the like contained in the film evaporates, it is discharged outside the system. Further, the substrates were placed on a hot plate, and the treatment environment was changed from a gaseous atmosphere to a nitrogen atmosphere, and calcination was carried out at 350 ° C for 30 minutes. Next, the substrates are cooled to a temperature close to room temperature and then removed from the system. The film thickness of the cerium oxide-based film formed on the obtained substrate was about 500 nm. Next, the specific dielectric constant, the film strength (Young's modulus) and the surface roughness of the cerium oxide-based coating formed on the substrate were measured by the above method. The results of the measurements are shown in Table 3. [Example 5 and Comparative Example 5] 5 ml of each of the samples 3 A, 4A, 5A, 6A, 7A, 8A, 10A, and 13A prepared in Examples 1 to 3 and Comparative Examples 1 and 3 was used, and previously known. A spin coating method (manufactured by MIKASA Co., Ltd.: 1H-360S) was dropped on a 6-inch ruthenium wafer substrate, and subjected to a coating treatment at 200 rpm to 700 rpm for 20 seconds. This operation is repeated to obtain substrates 3C, 4C, 5C, 6C, 7C, 8C, 10C, and 13C to which coating treatment is applied. Next, the substrates were placed on a hot plate (EC-1200, manufactured by IUCHI Co., Ltd.) and heat-treated at 120 °C for 5 minutes in an air atmosphere. In this heat treatment step, the organic solvent (-46-200932847 PGP) contained in the film is evaporated, so that it is discharged outside the system. Further, the substrates were placed on a leaf-type hot plate, and the treatment environment was changed to a nitrogen atmosphere under an air atmosphere, and calcination was carried out at 350 ° C for 30 minutes. Next, the substrates are cooled to a temperature close to room temperature and removed from the system. The critical film thickness at which the cerium oxide-based coating obtained by the calcination was not subjected to cracking was measured by the above method. The measurement results are shown in Table 4» Using the above results (Table 3 and Table 4), using Example i

D 〜3所調製之前述塗佈液試料3 A、4A、5 A、6A、7A及 8A時,可取得楊氏彈性率爲6. OGP a以上之具有高被膜強 度和較低比介電率,且表面平坦性、裂痕臨界膜厚等優良 的氧化矽系被膜。 另一方面’使用比較例1所調製之塗佈液試料10A之 情形中,裂痕臨界膜厚爲顯著降低,且被膜強度亦呈降低 之結果。其係因調製塗佈液試料10A中所用之前述水一乙 0 醇分散液試料9A中之氧化矽系微粒子所含之前述鹼性觸 媒成分份量少,故有助於前述甲基三甲氧基矽烷之部分水 解反應及/或水解反應之鹼性觸媒的氧化矽系微粒子放出 少,經由前述有機矽化合物之部分水解及/或水解與前述 氧化矽系微粒子的結合不夠充分。 又,使用比較例3所調製之塗佈液試料1 3 A之情形中 ,可知裂痕臨界膜厚顯著降低,且被膜強度亦降低。其係 因加熱溫度爲低至2(TC,故調製塗佈液試料13A所用之 前述水一乙醇分散液試料2A中之氧化矽系微粒子中所含 -47- 200932847 之前述鹼性觸媒成分的氧化矽系微粒子放出不夠充分,經 由前述有機矽化合物之部分水解及/或水解與前述氧化矽 系微粒子的結合不夠充分。 [表1] 水-乙醇分散液 試料編號 試料中所含之氨全量 (重量ppm) 氧化矽系微粒子中所 含之氮量(重量ppm) 調合例1 1A 420 400 調合例2 2A 700 670 比較例1 9A 100 90 比較例2 11A 1400 1200 [表2] 塗佈液 試料編號 所使用之 水-乙醇分散液 調製後之黏度 (mPa · s) 150日後之黏度 (mPa · s) SX十Η λι J里 實施例1 3A 1A 2450 7.2 7.3 4A 2A 2730 7.4 7.4 實施例2 5A 1A 2520 7.5 7.6 6A 2A 2810 7.3 7.3 實施例3 7A 2A 2940 7.7 7.8 8A 2A 2980 7.8 7.9 比較例1 10A 9A 2010 4.5 4.5 比較例2 12A 11A 6200 10.2 測定不可能 比較例3 13A 2A 2240 4.4 4.4 14A 2A 5920 9.8 測定不可能 -48- 200932847 [表3] 塗佈液試料編號 基板試料編號 比介電率 被膜強度(GPa) 表面精度(nm) 實施例4 3Α 3Β 3.9 6.9 4.3 4Α 4Β 3.7 7.8 4.5 5Α 5Β 3.7 6.7 4.1 6Α 6Β 3.5 7.0 4.1 7Α 7Β 3.7 7.3 4.5 8Α 8Β 3.7 7.2 4.4 比較例4 10Α 10Β 3.8 5.8 4.2 13Α 13Β 3.8 5.9 4.3 Ο [表4] 塗佈液試料編號 基板試料編號 裂痕臨界膜厚(μ m) 實施例5 3A 3C 3.5 4A 4C 4.0 5A 5C 3.2 6A 6C 3.3 7A 7C 4.2 8A 8C 4.3 比較例5 10A 10C 2.4 13A 13C 2.5 ❹ -49-When the coating liquid samples 3A, 4A, 5A, 6A, 7A, and 8A prepared by D to 3 are obtained, the Young's modulus of elasticity is 6. OGP a or more with high film strength and low specific dielectric ratio. And an excellent yttrium oxide-based film such as surface flatness or crack critical film thickness. On the other hand, in the case of using the coating liquid sample 10A prepared in Comparative Example 1, the critical film thickness of the crack was remarkably lowered, and the film strength was also lowered. The amount of the above-mentioned basic catalyst component contained in the cerium oxide-based fine particles in the water-oxygen alcohol dispersion sample 9A used in the preparation of the coating liquid sample 10A is small, and thus contributes to the aforementioned methyltrimethoxy group. The cerium oxide-based fine particles of the basic catalyst of the partial hydrolysis reaction and/or the hydrolysis reaction of decane are less released, and the partial hydrolysis and/or hydrolysis by the organic hydrazine compound is insufficiently combined with the cerium oxide-based fine particles. Further, in the case of using the coating liquid sample 1 3 A prepared in Comparative Example 3, it was found that the critical film thickness of the crack was remarkably lowered, and the film strength was also lowered. Since the heating temperature is as low as 2 (TC), the alkaline catalyst component contained in the cerium oxide-based fine particles in the water-ethanol dispersion sample 2A used in the coating liquid sample 13A is prepared as described in -47-200932847. The cerium oxide-based fine particles are not sufficiently released, and the partial hydrolysis and/or hydrolysis of the organic cerium compound is insufficiently combined with the cerium oxide-based fine particles. [Table 1] The total amount of ammonia contained in the water-ethanol dispersion sample number sample ( Weight ppm) Amount of nitrogen contained in cerium oxide-based fine particles (ppm by weight) Blending Example 1 1A 420 400 Blending Example 2 2A 700 670 Comparative Example 1 9A 100 90 Comparative Example 2 11A 1400 1200 [Table 2] Coating liquid sample number Viscosity after preparation of water-ethanol dispersion (mPa · s) Viscosity after 150 days (mPa · s) SX Η λι J Example 1 3A 1A 2450 7.2 7.3 4A 2A 2730 7.4 7.4 Example 2 5A 1A 2520 7.5 7.6 6A 2A 2810 7.3 7.3 Example 3 7A 2A 2940 7.7 7.8 8A 2A 2980 7.8 7.9 Comparative Example 1 10A 9A 2010 4.5 4.5 Comparative Example 2 12A 11A 6200 10.2 Measurement Impossible Comparative Example 3 13A 2A 2240 4.4 4.4 14A 2A 5920 9.8 It is impossible -48- 200932847 [Table 3] Coating liquid sample number substrate sample number ratio dielectric ratio film strength (GPa) surface accuracy (nm) Example 4 3Α 3Β 3.9 6.9 4.3 4Α 4Β 3.7 7.8 4.5 5Α 5Β 3.7 6.7 4.1 6Α 6Β 3.5 7.0 4.1 7Α 7Β 3.7 7.3 4.5 8Α 8Β 3.7 7.2 4.4 Comparative Example 4 10Α 10Β 3.8 5.8 4.2 13Α 13Β 3.8 5.9 4.3 Ο [Table 4] Coating liquid sample number Substrate sample number Crack critical film thickness (μ m) Example 5 3A 3C 3.5 4A 4C 4.0 5A 5C 3.2 6A 6C 3.3 7A 7C 4.2 8A 8C 4.3 Comparative Example 5 10A 10C 2.4 13A 13C 2.5 ❹ -49-

Claims (1)

200932847 十、申請專利範圍 Ο 1. 一種形成氧化矽系被膜用塗佈液,其特徵爲含有 將含有下述一般式(I)所示之烷氧基矽烷,下述一 般式(II)所示之鹵化矽烷及其部分水解物所選出之至少 一種有機矽化合物、與含有鹼性觸媒成分之氧化矽系微粒 子的分散液加熱,至少經由前述氧化矽系微粒子所放出之 前述鹼性觸媒成分將前述有機矽化合物予以部分水解及/ 或水解所得的矽化合物, RnSi(OR,)4-n .........(I) RnSiX4.n .........(II) (式中’ R爲表不氫原子、氟原子、或碳數1〜8之院基 、經氟取代之烷基、芳基、乙烯基或苯基,R,爲表示氫原 子、或碳數1〜8之烷基、芳基、乙烯基或苯基,X爲表 示鹵原子;又,η爲0〜3之整數)。 2.如申請專利範圍第1項之形成氧化矽系被膜用塗 佈液’其中前述分散液爲含有水和醇的水一醇系分散液。 3 ·如申請專利範圍第〗項〜第2項中任一項之形成 氧化矽系被膜用塗佈液,其中前述分散液中,進一步含有 鹼性觸媒成分及/或酸性觸媒成分。 4.如申請專利範圍第1項〜第3項中任一項之形成 氧化矽系被膜用塗佈液,其中前述鹼性觸媒成分爲由氨、 氫氧化銨、四級銨化合物、有機胺及胺系偶合劑中選出至 少一•禪° 5 .如申請專利範圍第3項之形成氧化矽系被膜用塗 -50- ❹ 200932847 佈'液’其中前述酸性觸媒成分爲由硝酸、鹽酸、 酸中選出至少一種。 6 ·如申請專利範圍第1項〜第5項中任一 氧化砂系被膜用塗佈液,其中前述氧化矽系微粒 述一般式(I)所示之烷氧基矽烷,於前述鹼性 存在下水解.縮聚所得的氧化矽系微粒子,且調 ί^系微粒子中所含之鹼性觸媒成分的份量者, RnSi(〇R,)4.n .........⑴ (式中’R爲表示氫原子、氟原子、或碳數!〜 '經氟取代之烷基、芳基、乙烯基或苯基,R,爲 子、或碳數1〜8之烷基、芳基、乙烯基或苯基; 〇〜3之整數)。 7 ·如申請專利範圍第1項〜第6項中任一 氧化矽系被膜用塗佈液,其中前述氧化矽系微粒 200〜11〇〇重量ppm範圍之前述鹼性觸媒成分。 8.如申請專利範圍第1項〜第7項中任一 氧化矽系被膜用塗佈液,其中前述矽化合物爲含 由前述氧化矽系微粒子所放出之前述鹼性觸媒成 述有機矽化合物部分水解及/或水解的反應物和 矽系微粒子,且前述反應物的至少一部分爲結合 化矽系微粒子的外部表面及其細孔內表面。 9.如申請專利範圍第3項〜第7項中任一 氧化矽系被膜用塗佈液,其中前述矽化合物爲含 述分散液中所含之前述鹼性觸媒成分及/或前述 醋酸及硫 項之形成 子爲令下 觸媒成分 整該氧化 8之烷基 表示氫原 又,η爲 項之形成 子爲含有 項之形成 有至少經 分,將前 前述氧化 至前述氧 項之形成 有經由前 駿性觸媒 -51 - 200932847 述 刖 成 苯 形 子 其 觸 醇 量 中 少 將 成分與前述氧化矽系微粒子所放出之前述鹼性觸媒成分 將前述有機矽化合物部分水解及/或水解的反應物和前 氧化矽系微粒子,且前述反應物的至少一部分爲結合至 述氧化矽系微粒子的外部表面及其細孔內表面。 10. 如申I靑專利範圍第1項〜第9項中任一項之形 氧化矽系被膜用塗佈液,其中前述矽化合物爲以換算聚 乙烯基準,具有500〜5000之數平均分子量。 11. 如申請專利範圍第1項〜第1 〇項中任一項之 成氧化矽系被膜用塗佈液,其中前述塗佈液中所含之離 濃度爲1.0毫莫耳/升以下。 1 2 ·—種形成氧化矽系被膜用塗佈液之調製方法, 特徵爲含有: (a) 將下述一般式(I)所示之烷氧基矽烷於鹼性 媒成分存在下水解·縮聚所得之氧化矽系微粒子的水一 系分散液加至超過濾裝置,調整前述鹼性觸媒成分之含 之調製氧化矽系微粒子之水一醇系分散液的步驟、 (b) 於前述含有氧化矽系微粒子的水一醇分散液 ,混合含有下述一般式(I)所示之烷氧基矽烷,下述 般式(II)所示之鹵化矽烷及其部分水解物中選出至少 種之有機矽化合物之水分散液的步驟、 (c) 將前述混合液於30〜80 t:之溫度中加熱,至 經由前述氧化砂系微粒子所放出的前述驗性觸媒成分, 前述有機砍化合物部分水解及/或水解.的歩驟 RnSi(OR’)4-n .........(I) -52- 200932847 RnSiX4_n .........(II) (式中’ R爲表不氫原子、氟原子、或碳數丨〜8 、經氟取代之烷基、芳基、乙烯基或苯基,R,爲表 子、或碳數1〜8之烷基 '芳基 '乙烯基或苯基, 7K鹵原子;又,η爲0〜3之整數) 處理所得之矽化合物。 1 3 .如申請專利範圍第丨2項之形成氧化矽系 塗佈液之調製方法’其中前述步驟(a)所得之前 矽系微粒子中所含之鹼性觸媒成分的含量爲200〜1 量ppm之範圍。 1 4 ·如申請專利範圍第! 2項〜第1 3項中任一 成氧化矽系被膜用塗佈液之調製方法,其中前述与 )所調製之前述分散液中,進一步含有鹼性觸媒天 或酸性觸媒成分。 1 5 ·如申請專利範圍第1 2項〜第1 4項中任一 成氧化矽系被膜用塗佈液之調製方法,其中前述鹼 成分爲由氨 '氫氧化銨、四級銨化合物、有機胺及 合劑中選出至少一種。 1 6 ·如申請專利範圍第1 4項之形成氧化矽系 塗佈液之調製方法,其中前述酸性觸媒成分爲由硝 酸、醋酸及硫酸中選出至少一種。 17· —種氧化矽系被膜,其特徵爲於基板上塗 請專利範圍第1項〜第1 1項中任一項之形成被膜 液並且乾燥、煅燒所得之具有高被膜強度和較低的 之烷基 示氫原 X爲表 被膜用 述氧化 100重 項之形 &gt;驟(b ζ分及/ 項之形 性觸媒 胺系偶 被膜用 酸、鹽 佈如申 用塗佈 比介電 -53- 200932847 率’且表面平坦性和耐裂性優良。 18·如申請專利範圍第1 7項之氧化矽系被膜,其中 前述氧化矽系被膜爲含有將前述有機矽化合物部分水解及 /或水解所得之反應物的至少一部分爲結合至前述氧化矽 系微粒子之外部表面及其細孔內表面而成之矽化合物的縮 聚物。 1 9.如申請專利範圍第1 7項〜第1 8項中任一項之氧 I 化矽系被膜,其中前述氧化矽系被膜爲具有楊氏彈性率 〇 3.0GPa以上之被膜強度。 20. 如申請專利範圍第1 7項〜第1 9項中任一項之氧 化矽系被膜,其中前述氧化矽系被膜爲其表面粗度(Rms) 爲5.0 nm以下之具有平滑表面的氧化矽系被膜。 21. 如申請專利範圍第17項〜第20項中任一項之氧化 矽系被膜,其中前述氧化矽系被膜爲氧化矽系絕緣膜。 Ο -54 - 200932847 七、指定代表圖: (一) 、本案指定代表圖為:無 (二) 、本代表圖之元件代表符號簡單說明:無200932847 X. Patent application scope Ο 1. A coating liquid for forming a cerium oxide-based coating film, which comprises an alkoxy decane represented by the following general formula (I), which is represented by the following general formula (II) Heating at least one organic hydrazine compound selected from the halogenated decane and a partial hydrolyzate thereof, and a dispersion of cerium oxide-based fine particles containing a basic catalyst component, and at least the aforementioned alkaline catalyst component released from the cerium oxide-based fine particles The hydrazine compound obtained by partially hydrolyzing and/or hydrolyzing the above organic hydrazine compound, RnSi(OR,)4-n (...) RnSiX4.n (... II) (wherein R is a hydrogen atom, a fluorine atom, or a carbon number of 1 to 8, a fluorine-substituted alkyl group, an aryl group, a vinyl group or a phenyl group, and R is a hydrogen atom, or An alkyl group, an aryl group, a vinyl group or a phenyl group having 1 to 8 carbon atoms, and X is a halogen atom; and η is an integer of 0 to 3). 2. The coating liquid for forming a cerium oxide-based coating film according to the first aspect of the invention, wherein the dispersion liquid is a water-alcohol-based dispersion liquid containing water and an alcohol. The coating liquid for forming a cerium oxide-based coating film according to any one of the above-mentioned claims, wherein the dispersion liquid further contains a basic catalyst component and/or an acidic catalyst component. 4. The coating liquid for forming a cerium oxide-based coating film according to any one of the items 1 to 3, wherein the alkaline catalyst component is ammonia, ammonium hydroxide, a quaternary ammonium compound, or an organic amine. And at least one of the amine coupling agents is selected. 5. The coating of the cerium oxide-based coating film according to the third application of the patent scope is -50- ❹ 200932847 cloth 'liquid' wherein the aforementioned acidic catalyst component is made of nitric acid, hydrochloric acid, Select at least one of the acids. 6. The coating liquid for an oxidized sand-based coating film according to any one of the first to fifth aspects of the present invention, wherein the alkoxy decane represented by the general formula (I) is present in the alkalinity. Hydrolysis. Polycondensation of the obtained cerium oxide microparticles, and adjusting the amount of the basic catalyst component contained in the microparticles, RnSi(〇R,)4.n (...) (1) Wherein 'R is a hydrogen atom, a fluorine atom, or a carbon number!~' A fluorine-substituted alkyl group, an aryl group, a vinyl group or a phenyl group, R, a group, or an alkyl group having 1 to 8 carbon atoms, Base, vinyl or phenyl; 〇~3 integer). The coating liquid for a cerium oxide-based coating film according to any one of the first to sixth aspects of the invention, wherein the cerium oxide-based fine particles are in an amount of from 200 to 11 parts by weight in terms of the basic catalyst component. 8. The coating liquid for a cerium oxide-based coating film according to any one of the above-mentioned items, wherein the cerium compound is an organic cerium compound containing the basic catalyst released from the cerium oxide-based fine particles. Partially hydrolyzed and/or hydrolyzed reactants and lanthanide microparticles, and at least a portion of the foregoing reactants are the outer surface of the bound lanthanide microparticles and the inner surface of the pores. 9. The coating liquid for a cerium oxide-based coating film according to any one of the above-mentioned claims, wherein the cerium compound is the basic catalyst component contained in the dispersion liquid and/or the acetic acid and The formation of the sulfur term is such that the lower catalyst component oxidizes the alkyl group of 8 to represent the hydrogen atom, and the η is formed by the formation of the inclusion term having at least a portion, and the former oxidation to the formation of the oxygen term is By hydrolyzing and/or hydrolyzing the above-mentioned organic hydrazine compound, the above-mentioned basic catalyzed component of the above-mentioned cerium-containing fine particles and the aforementioned cerium-based fine particles are exemplified by the precursor catalyst-51 - 200932847 The reactants and the pre-cerium oxide-based fine particles, and at least a part of the reactants are bonded to the outer surface of the cerium oxide-based fine particles and the inner surface of the pores. The coating liquid for a cerium oxide-based coating film according to any one of the preceding claims, wherein the cerium compound has a number average molecular weight of from 500 to 5,000 on the basis of the converted polyethylene. The coating liquid for a cerium oxide-based coating film according to any one of the preceding claims, wherein the coating liquid contains an ion concentration of 1.0 mmol/L or less. 1 2 - a method for preparing a coating liquid for forming a cerium oxide-based film, comprising: (a) hydrolyzing and polycondensing an alkoxy decane represented by the following general formula (I) in the presence of an alkaline medium component The water-based dispersion of the obtained cerium oxide-based fine particles is added to an ultrafiltration device, and the water-alcohol-based dispersion containing the cerium oxide-based fine particles contained in the alkaline catalyst component is adjusted, and (b) the oxidation is contained in the foregoing The water-alcohol dispersion of the cerium-based fine particles is mixed with the alkoxy decane represented by the following general formula (I), and the halogenated decane represented by the following formula (II) and a partial hydrolyzate thereof are selected to have at least one organic substance. a step of dispersing the aqueous dispersion of the compound, (c) heating the mixture at a temperature of 30 to 80 t: to the above-mentioned organic catalyst compound, which is partially hydrolyzed by the aforementioned oxidized sand microparticles And/or hydrolysis. Step RnSi(OR')4-n .........(I) -52- 200932847 RnSiX4_n ... (II) (wherein 'R Is a hydrogen atom, a fluorine atom, or a carbon number of 88, a fluorine-substituted alkyl group, an aryl group, a vinyl group or a phenyl group. , R, is a table, or an alkyl group having a carbon number of 1 to 8 'aryl 'vinyl or phenyl, 7K halogen atom; further, η is an integer of 0 to 3) The obtained hydrazine compound is treated. 1 3. A method for preparing a cerium oxide-based coating liquid according to the second aspect of the patent application, wherein the content of the basic catalyst component contained in the cerium microparticles before the step (a) is 200 to 1 The range of ppm. 1 4 · If you apply for a patent range! The method for preparing a coating liquid for a cerium oxide-based coating film according to any one of the items 2 to 3, wherein the dispersion liquid prepared by the above-mentioned and the above further contains a basic catalyst or an acidic catalyst component. The method for preparing a coating liquid for a cerium oxide-based coating according to any one of the first to fourth aspects of the invention, wherein the alkali component is ammonia ammonium hydroxide, a quaternary ammonium compound, or an organic At least one of the amine and the mixture is selected. The method for preparing a cerium oxide-based coating liquid according to the invention of claim 14, wherein the acidic catalyst component is at least one selected from the group consisting of nitric acid, acetic acid and sulfuric acid. 17. A cerium oxide-based coating film, which is characterized in that the film forming liquid is coated on the substrate, and the film forming liquid is dried and calcined to have a high film strength and a lower alkane. The hydrogen group X is a shape of the surface of the film which is oxidized by 100 weights&gt; (b ζ 及 / / / 形 形 形 形 形 形 形 形 53 53 53 53 53 53 53 53 53 53 53 53 53 53 - 200932847 rate ' is excellent in surface flatness and crack resistance. 18. The cerium oxide-based coating according to claim 17, wherein the cerium oxide-based coating contains a partial hydrolysis and/or hydrolysis of the organic cerium compound. At least a part of the reactant is a polycondensate of a ruthenium compound which is bonded to the outer surface of the ruthenium oxide-based fine particles and the inner surface of the pores thereof. 1 9. As in any one of the claims 17 to 18 The oxidized cerium-based coating film, wherein the cerium oxide-based coating film has a film strength of Young's modulus 〇 3.0 GPa or more. 20. Oxidation according to any one of claims 17 to 99 Lanthanide film, wherein the aforementioned A cerium oxide-based coating having a smooth surface (Rms) of 5.0 nm or less having a smooth surface. The cerium oxide-based coating according to any one of claims 17 to 20, wherein The yttrium oxide-based coating film is a yttrium oxide-based insulating film. Ο -54 - 200932847 VII. Designation of representative drawings: (1) The representative representative figure of this case is: None (2), the representative symbol of the representative figure is a simple description: None 八、本案若有化學式時,請揭示最能顯示發明特徵的化學 式:無8. If there is a chemical formula in this case, please reveal the chemical formula that best shows the characteristics of the invention: none -4--4-
TW097135560A 2007-09-20 2008-09-17 Coating liquid for forming silica-based coating film, method of preparing the same and silica-based insulation film obtained from the coating liquid TWI433897B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
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JP2008159860A JP5695290B2 (en) 2007-09-20 2008-06-19 Method for preparing a coating solution for forming a silica-based film

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JP5761890B2 (en) * 2008-06-27 2015-08-12 日揮触媒化成株式会社 Method for preparing silica-based coating film forming coating solution
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US10655018B2 (en) 2014-04-03 2020-05-19 Lg Chem, Ltd. Silica sol composition having excellent dispersibility in cyanate-based resin and method for preparing same

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