200931027 九、發明說明： 【發明所屬之技術領域】 本發明係關於一種製作微針頭陣列的方法，特別是關於 一種利用凸型魚眼光罩以微影製程製作數種不同幾何結構 之微針頭陣列的方法。 【先前技術】 近年來隨奈米科技的蓬勃發展，在各種高科技產業中， 無論是在半導體、光電或生醫等領域中’元件尺寸微小化之 應用已成為各高科技產業所努力邁進的方向之一。如光電產 業中的場發射器顯示器，可以利用微陣列探針作為場發射器 中發射電子的元件。若微陣列探針之積集度越高，越可得到 更精緻之晝質與較低的耗電量。 而在生醫領域的應用方面，微針頭陣列係可應用於生物 晶片方面，以作為一探針結構，將微針頭陣列之複數個微針 ^ 頭之突出部分與待測物質接觸後，吸附於微針頭上，再接觸 生物晶片之各個突起結構，使其與生物晶片之檢測層發生反 應，可在短時間内處理、分析大量的生物資訊。理論上若能 製作尺寸更小之探針結構，越能採集更多量之樣本，且對採 樣對象之侵入性規模越小，所造成之傷害及影響也越小。此 外，為因應廣泛之生物種類分析多樣性需求，需要不同形狀 、尖銳度之探針結構，以在配合生物晶片分析時更為有效。 如中華民國專利第1225660號，其係一種微陣列奈米探 5 200931027 針之母模形成方法，利用矽膠類材料製造，使微陣列奈米探 針具有生物相容性之優點。包括下列步驟，首先提供一基底 並於該基底上形成一遮蔽層，於該遮蔽層上形成複數個開口 ，對該遮蔽層上開口處進行蝕刻，以在開口處形成複數個錐 形溝槽，去除該遮蔽層以形成微陣列奈米探針之母模。 【發明内容】 本發明所欲解決之技術問題： 〇 然而，如前案所述之微針頭陣列製作方法，其主要是以 蝕刻的方式形成特定之凹部結構陣列作為一母模，以進行微 針頭陣列之製作。但在進行蝕刻製程時，由於選用之蝕刻藥 劑的不同，以及需要準確控制蝕刻製程之時間長短的關係， 往往在形成母模之凹部結構陣列時，各個凹部結構陣列之形 狀大小不一，難以精確地受到控制。 再者，在微針頭陣列之應用方面，為因應各種不同之需 ^ 求，故需製作各種不同形狀、結構或尖銳度之微針頭。但若 欲以蝕刻製程製作不同幾何結構之微針頭陣列，需要配合以 繁複之製程步驟，以及精密的硬體設備，無法在製程上以單 一方式製作多種不同結構之微針頭陣列，且亦較耗費人力及 物力。 緣此，本發明之主要目的即是提供一種可精準地製作微 針頭陣列的方法，即利用凸型魚眼光罩進行微影製程以形成 微針頭陣列的母模之凹部結構陣列，利用控制光學聚焦的深 6 200931027 度，可精確地控制曝光的區域及深度。 本發明之另一目的是提供一種利用簡便製程，製作多種 不同幾何結構之微針頭陣列的方法，利用調整凸型魚眼光罩 與標的物光阻層之間的間距大小，以製作例如錐形、截錐形 或二段式斜面錐形等不同幾何結構之微針頭陣列。 本發明解決問題之技術手段： 本發明為解決習知技術之問題所採用之技術手段係利 〇 用在微影製程時，將一凸型魚眼光罩置於一基材表面之光阻 層上，再投射以一光源，並藉由調整凸型魚眼光罩與基材表 面之光阻層所保持之預定間距，以控制光源聚焦於光阻層之 預定深度大小，以控制在曝光時形成母模表面之凹面結構之 深度，配合以正型或負型光阻之應用，可製作不同幾何結構 形狀之微針頭陣列。 本發明對照先前技術之功效： ® 經由本發明所採用之技術手段，利用凸型魚眼光罩進行 微影製程製作母模，再以該母模進行成型及剝膜製程，以此 方式和習知技術中利用蝕刻方式相比之下，大大提高了在形 成凹部結構時之精確度。主要由於習知的蝕刻方式係經由調 整蝕刻製程時間以控制所形成之凹部結構深淺，此種做法不 但變因較多且也不夠精確，而藉由本發明之方法調整光學聚 焦之深度，可有效精確地調整曝光深度以及曝光區域，以簡 便有效之製程快速地進行微針頭陣列的製作。 7 200931027 之凹知的方式無法以單—製賴刻形成不同形狀 =凹1構，而以本發明之方法製作Μ幾何結構之微針頭 =，只需以單—製程並配合調整不同之聚焦 即 構形狀之微針頭陣列，省去了繁複之製程 用之層更廣的硬體成本，不但節省成本且可應 ❹ ❹ 呈圖m所=^^實_，將藉以下之實施例及附 【實施方式】 来置：：閱第1圖至第6圖’其係顯示本發明之以凸型备眼 實施例;基材1之材基材具有-表面1()，本 層2係為一正型2度之光阻層2 (步称1〇1)，該光阻 如第2圖所示，將一凸型魚眼光罩3配 之表面10,並與該其奴丨七* 且牡/巷材！ 驟102)。其中該凸型备罩阻層2保持一預定間距dI (步 在該透明基材30之表面31 =係包括有—透明基材3〇, 各個凹曲面3Π)對應結合凹曲面’並在該 …、眼透鏡陣列伽各個凸型魚眼透鏡32之間分別形成^ 200931027 遮蔽層33,其材質可以為鉻或其他具有遮蔽效果之材質，故 具有遮蔽光源通過之功能。在遮蔽層33上形成有一保護層 34 ’具有保護凸型魚眼透鏡32之作用。200931027 IX. DESCRIPTION OF THE INVENTION: FIELD OF THE INVENTION The present invention relates to a method of fabricating a microneedle array, and more particularly to a microneedle array using a convex fisheye reticle to fabricate several different geometries in a lithographic process. method. [Prior Art] In recent years, with the rapid development of nanotechnology, in various high-tech industries, the application of miniaturization of component sizes in the fields of semiconductor, optoelectronics or biomedical has become a step forward for various high-tech industries. One of the directions. For field emitter displays in the photovoltaic industry, microarray probes can be utilized as components that emit electrons in field emitters. If the integration of the microarray probe is higher, the more refined quality and lower power consumption can be obtained. In the field of biomedical applications, the microneedle array can be applied to the biochip as a probe structure, and the protruding portions of the plurality of microneedles of the microneedle array are contacted with the substance to be tested, and then adsorbed on On the microneedle, the various protruding structures of the biochip are contacted to react with the detection layer of the biochip, and a large amount of biological information can be processed and analyzed in a short time. In theory, if a smaller probe structure can be made, the more samples can be collected, and the smaller the invasive scale of the sample, the less damage and impact it will have. In addition, probe structures of different shapes and sharpness are required to analyze diversity requirements in response to a wide range of biological species to be more effective in cooperating with biochip analysis. For example, the Republic of China Patent No. 1225660, which is a mastering method for forming a microarray nanometer 5 200931027 needle, is made of a silicone-based material, and the microarray nano probe has the advantages of biocompatibility. The method includes the following steps: firstly providing a substrate and forming a shielding layer on the substrate, forming a plurality of openings on the shielding layer, and etching the opening on the shielding layer to form a plurality of tapered trenches at the opening, The masking layer is removed to form a master of the microarray nanoprobe. SUMMARY OF THE INVENTION The technical problem to be solved by the present invention is: However, the microneedle array manufacturing method according to the foregoing method mainly forms an array of specific concave structures as a master mold for etching to perform micro needles. Array production. However, in the etching process, due to the difference in the etching agent selected and the need to accurately control the length of the etching process, the shape of each of the concave structure arrays is different in size when forming the array of the concave structure of the master mold, which is difficult to be precise. The ground is under control. Moreover, in the application of the microneedle array, in order to meet various needs, it is necessary to produce micro needles of various shapes, structures or sharpness. However, if an array of micro-needle arrays with different geometries is to be fabricated by an etching process, it is necessary to cooperate with complicated process steps and precise hardware equipment, and it is impossible to fabricate a plurality of micro-needle arrays of different structures in a single manner in the process, and it is also costly. Human and material resources. Accordingly, the main object of the present invention is to provide a method for accurately fabricating a microneedle array by using a convex fisheye mask to perform a lithography process to form an array of concave structures of a master of a microneedle array, using controlled optical focusing. The depth of 6 200931027 degrees allows precise control of the area and depth of exposure. Another object of the present invention is to provide a method for fabricating a plurality of micro-needle arrays of different geometries using a simple process, by adjusting the spacing between the convex fisheye mask and the target photoresist layer to produce, for example, a tapered shape. A microneedle array of different geometries such as a truncated cone or a two-section beveled cone. The technical means for solving the problem of the present invention: The technical means adopted by the present invention to solve the problems of the prior art is to use a convex fisheye mask on the photoresist layer on the surface of a substrate when used in the lithography process. And projecting a light source, and controlling a predetermined depth of the light source to focus on the photoresist layer by adjusting a predetermined distance between the convex fisheye mask and the photoresist layer on the surface of the substrate to control the formation of the mother during exposure The depth of the concave structure of the mold surface, combined with the application of positive or negative photoresist, can produce microneedle arrays of different geometric shapes. The present invention compares the effects of the prior art: ® through the technical means adopted by the present invention, using a convex fisheye mask to perform a lithography process to produce a master mold, and then forming and stripping the master mold, in this manner and conventionally In contrast to the etching method in the art, the accuracy in forming the recess structure is greatly improved. It is mainly because the conventional etching method adjusts the etching process time to control the depth of the formed concave structure, which is not only more variable but also less precise, and the depth of the optical focusing can be adjusted accurately by the method of the present invention. The depth of exposure and the exposure area are adjusted to quickly and efficiently make the microneedle array. 7 200931027 The method of concealing can not form different shapes = concave 1 structure by single-making, and the micro-needle of Μ geometry is made by the method of the invention=, only need to adjust the different focus by single-process The shape of the micro-needle array eliminates the need for a wider hardware cost for the complicated process, which not only saves cost but also can be applied to the figure m = ^^ _, will be borrowed from the following examples and attached [ EMBODIMENT: The following drawings: Fig. 1 to Fig. 6 show the embodiment of the present invention. The base material of the substrate 1 has a surface 1 (), and the second layer is a a positive 2 degree photoresist layer 2 (step 1〇1), the photoresist is as shown in Fig. 2, a convex fisheye mask 3 is matched with the surface 10, and the slave is seven* and / Lane material! Step 102). The convex mask layer 2 is maintained at a predetermined pitch dI (steps on the surface 31 of the transparent substrate 30 include a transparent substrate 3〇, each concave curved surface 3Π) corresponding to the concave curved surface and ... Between the eye lens array and the convex fisheye lens 32, a shielding layer 33 is formed between the respective convex fisheye lenses 32, and the material thereof may be chrome or other material having a shielding effect, so that the function of shielding the light source is passed. A protective layer 34' is formed on the shielding layer 33 to protect the convex fisheye lens 32.
❹ 0弟圖所示，以一光源L·入射通過凸型魚眼光罩3 至該基材1表面之光阻層2，經由該凸型魚眼光罩3之各個 凸型魚眼透鏡32之折射作用，使該㈣L聚焦於該基材ι 上之光阻層2之—狀深度们（步驟_，域狀深度们 =光阻層2中且未超出該光阻層2之底部，以對該各個凸 眼透鏡32下方對應之光阻層2之選定曝絲域進行曝 间厂/丨不’以顯 並形成 個：構41，成具有一凹部結構陣列42之:有:數 如第5圖所示，可 甘暝4 同方法，形成1針頭材緯等不 構’該微針_5並在母二 == 一預定厚度（步驟】〇5)。 〈衣面40形成 ㈣= 頭材料層5從該母模4之表面 之表面60上具有複數=6 (步驟⑽)。微針頭陣列6 錐形射冓^ 相61，且該各個微針頭6】係為 其係顯示本發明之第二實施 ί3圖，其係本發明之第二實 請參閱第8圖至第12圖, 例剖面示意圖，請同時參閱第 施例之流程圖。 9 200931027 A i先提供一基材1(步驟201)，其組成與步驟與第一實 =例相^ ’如第1圖所示，故不在此贅述。接著如第8圖所 不將一具有凸型魚眼透鏡陣歹丨】32〇之凸型 =:一並與該基材丨之光阻層2保;： Γ驟其中該凸型魚眼光罩3與第-實施例 甲相问，亦不再贅述。 ❹ 至，I:二圖所示’以一光源[入射通過凸型魚眼光罩3 凸之光阻層2,經由該凸型魚眼光罩3之各個 光阻；;t 折射作用’使光源L聚焦於基材1上之 層2之—預定深度们’（步驟203)，其中 超出光阻層2之底 甲/預疋冰度d2, 之光阻層2之、個凸型魚眼透鏡32下方對應 層2之衫曝絲域it行料。 曝光2、10圖至第11圖所示（步驟204至步驟205)，1中 ❹ 同，二:及模製程之步驟方法皆與第-實施例相 :-由於先a聚焦於基材〗上之光阻層2 : 係超出光阻層2之底部， 預疋冰度 複數個凹部結構-係為截錐形^a之表㈣形成之 42a。 以構成一凹部結構陣列 如第12圖所示，最終微針頭材料層 4〇剝離後，形成一微針頭陣列^ (步驟2母^广之表面 陣列如之表面60上具有複數個微針頭61，亥微針頭 6】a係為截錐形結構。 a，且各個微針頭 例J二：圖至第19圖，其係顯示本發明之第， 1面“ 4同時參閱第2。圖，其係本發明 200931027 施例之流程圖。 如第u圖所示，首先提供一基材 阻層21與一第- 儿文怖一第一光 、第一先阻層22於基材i之表面ι〇, 光阻層21係位於該基材】之表面1〇 二μ第一 =位於該第—光阻層21上。各個光阻層具;第不—同先二層^ 數，且其中第一光阻層21之折射係數传小 、、 之折射係I f數係小於第二光阻層22 如第15圖所示，將—凸型魚眼光罩3配置在 :面1〇 ’並與該基材！之光阻層2保持 驟302)。 ⑽cu (步 製程圖及第17圖所示’在本實施例中曝光以及顯影 I矛白一月'J述貫施例相似。在曝光時由於第一光阻層21與 f二光阻層22之折射係數不同，在通過兩光阻層之θ間時再 次產生折射作用，使該光源L聚焦於該基材1上之第一光阻 層U之—預定深度d2’，。在顯影後在母模仆之表面4〇形 ©成硬數個具有二段式斜面錐形之凹部結構41b，以構成_凹 部結構陣列42b 〇 如第19圖所示，將微針頭材料層5從母模4b之表面 4〇剝離後’形成一微針頭陣列6b (步•驟306)，其中該微針頭 陳歹，ί + ^ 表面60上具有複數個微針頭$ 1 b，且各個微針頭 6lb係為具有二段式斜面之錐形結構。 由以上之貫施例可知，本發明所提供之以凸型魚眼光罩 製作微針頭陣列的方法確具產業上之利用價值’故本發明業 已符合於專利之要件。惟以上之敘述僅為本發明之較佳實施 11 200931027 例說明’凡精於此項技藝者當可依據上述之說明而作其它種 種之改良，惟這些改變仍屬於本發明之發明精神及以下所界 定之專利範圍中。 【圖式簡單說明】As shown in FIG. 0, the light-shielding layer 2 incident on the surface of the substrate 1 by a light source L· is incident through the refraction of each convex fisheye lens 32 of the convex fisheye mask 3. Acting to focus the (4) L on the depth of the photoresist layer 2 on the substrate ι (step _, domain depth = photoresist layer 2 and not beyond the bottom of the photoresist layer 2 to The selected exposure fields of the corresponding photoresist layer 2 under each of the lenticular lenses 32 are subjected to an exposure process to form a structure 41 having an array of recessed structures 42: there are: As shown, the same method can be used to form a 1-needle head latitude, etc., which does not constitute 'the micro-needle_5 and is in the mother's second == a predetermined thickness (step 〇5). <Form 40 forming (4) = head material layer 5 having a complex number = 6 from the surface 60 of the surface of the master mold 4 (step (10)). The microneedle array 6 is tapered to form a phase 61, and the respective microneedles 6 are shown as the second embodiment of the present invention. Figure 3 is a second embodiment of the present invention. Please refer to Fig. 8 to Fig. 12 for a cross-sectional view. Please refer to the flowchart of the first embodiment. 9 200931027 A i provides a first The substrate 1 (step 201), the composition and the steps are the same as the first real example. As shown in Fig. 1, it will not be described here. Next, as shown in Fig. 8, a convex fisheye lens array is not provided.丨] 32〇 convex type =: together with the substrate 丨 photoresist layer 2;: The convex fisheye reticle 3 is in contact with the first embodiment, and will not be described again. , I: shown in the second figure 'with a light source [incident through the convex fisheye mask 3 convex photoresist layer 2, through the various photoresists of the convex fisheye mask 3; t refraction" to focus the light source L a predetermined depth of the layer 2 on the substrate 1 (step 203), wherein the underside of the photoresist layer 2/pre-ice degree d2, the photoresist layer 2 of the photoresist layer 2 corresponds to a convex fisheye lens 32 The layer 2 is exposed to the wire field. The exposure is shown in Fig. 2, Fig. 10 to Fig. 11 (step 204 to step 205), and the steps of the first and second molding processes are the same as those of the first embodiment. :- Since the photoresist layer 2 on the substrate is first focused on the bottom of the photoresist layer 2, the pre-ice degree is a plurality of recess structures - the 42a formed by the table (4) of the truncated cone ^a. Forming an array of recessed structures such as As shown in Fig. 12, after the final microneedle material layer 4 is peeled off, a microneedle array is formed (the surface array of step 2 has a plurality of microneedles 61 on the surface 60, and the microneedle 6] is A truncated cone structure. a, and each microneedle example J 2: Fig. 19 to Fig. 19, which shows the first aspect of the present invention, 1 side "4 while referring to Fig. 2, which is a flow chart of the embodiment of the present invention 200931027 As shown in FIG. u, a substrate resist layer 21 and a first light-first layer and a first first resist layer 22 are provided on the surface of the substrate i, and the photoresist layer 21 is disposed. The surface of the substrate is 1 〇 2 μ first = located on the first photoresist layer 21. Each of the photoresist layers has a first and second layers, and wherein the refractive index of the first photoresist layer 21 is small, and the number of refractive systems I f is smaller than that of the second photoresist layer 22, as shown in FIG. It is shown that the convex-eye fisheye mask 3 is disposed on the surface 1〇' and the substrate! The photoresist layer 2 is maintained at step 302). (10) cu (step process diagram and FIG. 17 are similar in the embodiment of the exposure and development I spear white January' J. The first photoresist layer 21 and the f photoresist layer 22 are exposed during exposure. The refractive index is different, and the refraction is again generated when passing between θ of the two photoresist layers, so that the light source L is focused on the first photoresist layer U on the substrate 1 to a predetermined depth d2'. The surface of the master mold is formed into a plurality of recessed structures 41b having a two-section beveled tapered shape to form an array of recessed structure 42b. As shown in Fig. 19, the microneedle material layer 5 is removed from the master mold 4b. After the surface 4 〇 is peeled off, a microneedle array 6b is formed (step 306), wherein the microneedle 歹, ί + ^ surface 60 has a plurality of microneedles $ 1 b, and each microneedle 6 lb has The tapered structure of the two-stage bevel. It can be seen from the above examples that the method for manufacturing the microneedle array by the convex fisheye mask has the industrial value of use. Therefore, the invention has been in compliance with the patent. The above description is only a preferred embodiment of the present invention. 11 200931027 Example ' Those skilled in the art will be able to make various other modifications based on the above description, but these changes are still within the scope of the invention and the scope of the patents defined below. [Simplified illustration]
第1 第7 第8 圊 圖 圖 至第6圖，其係顯示本發明之第—實施例剖面示意圖； 係本發明之第一實施例之流程圖； 至第12圖，其係、顯示本發明之第二實施例剖面示意 第13圖係本發明之第二實施例之流程圖 第Η圖至第19圖，其係顯示本發明之第 圖； 三實施例剖面示意 第20圖係本發明之第三實施例之流程圖 【主要元件符號說明】 〇 基材 10、31、40、60 表面 2 21 22 3 30 光阻層 第一光阻層 第一光阻層 凸型魚眼光罩 透明基材 凹曲面 12 310 200931027 32 凸型魚眼透鏡 320 凸型魚眼透鏡陣列 33 遮蔽層 34 保護層 4、4a、4b 母模 41、41a、41b 凹部結構 42、42a、42b 凹部結構陣列 5、5a、5b ® 6、6a、6b 微針頭材料層 微針頭陣列 61、61a、61b 微針頭 dl 、 dl’ 、 dl，， 預定間距 d2、d2’、d2” 預定深度 L 光源 〇 131st, 7th, 8th, and 6th, which is a cross-sectional view showing a first embodiment of the present invention; a flow chart of a first embodiment of the present invention; and a 12th drawing showing the present invention BRIEF DESCRIPTION OF THE DRAWINGS FIG. 13 is a flow chart of a second embodiment of the present invention. FIG. 19 to FIG. 19 are diagrams showing a first embodiment of the present invention; Flowchart of the third embodiment [Description of main component symbols] 〇 Substrate 10, 31, 40, 60 Surface 2 21 22 3 30 Photoresist layer First photoresist layer First photoresist layer convex fisheye mask Transparent substrate Concave curved surface 12 310 200931027 32 convex fisheye lens 320 convex fisheye lens array 33 shielding layer 34 protective layer 4, 4a, 4b female mold 41, 41a, 41b concave structure 42, 42a, 42b concave structure array 5, 5a, 5b ® 6, 6a, 6b microneedle material layer microneedle array 61, 61a, 61b microneedles dl, dl', dl, predetermined spacing d2, d2', d2" predetermined depth L source 〇 13