TW200917339A - Method of wafer level transient sensing, threshold comparison and arc flag generation/deactivation - Google Patents

Abstract

A method for processing a semiconductor wafer in a plasma reactor comprises sensing transient voltages or currents on a conductor coupled to the wafer and providing a first comparator for comparing the transient voltages or currents with a threshold level stored in the comparator. The method further includes transmitting from the comparator an arc flag signal whenever a transient voltage or current is sensed that exceeds the threshold level, and deactivating the power generator in response to the arc flag signal.

Description

200917339 IX. INSTRUCTIONS: [Technical jaw region to which the invention pertains] The present invention relates to a plasma reactor for processing semiconductor workpieces, and to an electric fox in the reactor. [Prior Art] During semiconductor workpiece or wafer processing, the arc generated in the plasma reactor can cause damage to the workpiece or prevent it from functioning properly, or adversely affect the reactor chamber. Therefore, the arc is detected to prevent the paddle reactor from processing the other wafers necessary to avoid damage to a series of wafers. In a physical vapor deposit on (PVD) plasma reactor, the arc detection is directed to detecting an arc at the sputter target at the top of the reactor. Such arc detection is accomplished by monitoring the output of a high voltage D.C. power supply coupled to the top of the reactor sputtering target. Instantaneous voltage or current can react to arcing. This detection method provides a reliable way to clearly indicate the arc phenomenon at or near the sputter target at the top of the reactor, and this detection method cannot reliably detect the arc phenomenon at the wafer. (Wafer-level arcing.) Detecting wafer-level arcing can be particularly difficult because of the rf-noise # relationship caused by the RF power supplied to the Ba-round supporting pedestal around the wafer. In the middle, the RF noise may also be caused by the RF 1 rate of the conductive coil t to the sidewall. The other 'challenge is the instantaneous voltage and current or the large dynamic range of the noise system. This phenomenon is, for example, a program scheme. This is caused by the RF generator conversion required. This transient due to the conversion must now differ from the transient caused by wafer-level arcing. 200917339. Components generally in the reactor chamber of the plasma reactor Damage or functional degradation due to contact with the plasma. In a PVD reactor, the "damaged consumables may include the bell wall of the reactor top, the inner sidewall ring, and the program ring around the wafer support pedestal Kit, which contains an electrostatic chuck (ESC). When such a consumable function degrades physically, 'these consumables become more susceptible to arcing. So how to determine when to replace consumables in the arc The completion of the replacement before the phenomenon occurs is a problem to be solved. SUMMARY OF THE INVENTION The present invention provides a method for processing a half-body wafer in a plasma reactor, the type of plasma reactor including an RF or An electric power generator and an electrostatic chuck having at least a suction cup electrode. The package senses an instantaneous voltage or current coupled to a conductor of the wafer, and is supplied by a comparator for sensing The instantaneous voltage or current is compared with a stored value of π in the device. The method further includes: transmitting the comparison when the instantaneous voltage or current exceeds the threshold value. The flag signal, and the arc flag signal is echoed and the rate generator is turned off.

The first diagram illustrates a PVD reactor having a system with a salty Ή 1 S 4 rigid round arc. The reactor includes a chamber 100, which is connected to a line of electricity or 〇, that is, a force-guide method for storing the device.

200917339 A cylindrical side wall 110 defines a reactor top 1 〇 4 and provides a dry material 11 内部 inside the chamber 100, which is placed on the top RF coil 112, which is placed at the side wall 1 〇 2; A crystal 114' extends upward from the bottom 106. A vacuum exhaust pump An exhaust pump 埠 118 at the bottom 106 evacuates the chamber 1〇〇. The supplier 119, which supplies the program gas and introduces the gas into the cavity. In an embodiment, the wafer support base 4 can include a seat (ESC) 122 for supporting the half workpiece 120 ° ESC 122 on the upper surface of the base 114 An insulating layer 124 can be included on the location 126. In the embodiment illustrated in Figure 1A, the ESC 122 is shown with a second electrode i 2 8 , 13 in the insulating layer 1 24 4 the center pin 132' which contacts the back side of the wafer 120. A housing 134 provides a reversed but identically sized DC voltage between the center pins 1 28 and 1 30. Figure 1B illustrates a variation of the embodiment of the embodiment wherein the ESC 122 is a single pole having a single electrode 128 having a diameter that is generally the diameter of the wafer 128. It may not be present in the specific embodiment of Figure 1 b. In addition to these differences, Figures 1A and 1B contain the same structural features. The following description of Figure 1A is also used to illustrate the embodiment of Figure 1B. The brevity will not be repeated. Referring again to Figure 1A, D. c. power is supplied from a high voltage 136 to the sputtering target u. The low frequency rf power {rate generator 140 is provided to the one-shot 卩 matching impedance 138

A bottom 1 0 6 . a portion 104; a circular support base 116, which passes through a program gas chamber 100 ° _ an electrostatic suction conductor wafer or a conductive seat is a bipolar type 1, and a conductive. voltage supply 13 2 and the electrode, which is the 1A, the suction seat, which has the same features as the embodiment of the workpiece or the central pin 133, so that the DC power coil is used for the DC power system 112. The RF 200917339 power generator 140 is coupled to one of the RF inputs of the matched impedance 138. In an embodiment, the RF matching impedance 1 3 8 may have a low power D.C. input (not shown) in addition to the RF input. In a specific embodiment of FIG. 1A, RF bias power having a suitable frequency (eg, low frequency and/or high frequency) is transmitted through a bias matching impedance 1 42 and a blocking capacitor 1 44, 146 by an RF power generator. Provided to the ESC electrodes 128, 130» - the RF blocking filter 150 is coupled between the ESC electrodes, the center pins 128, 130, 132 and the DC sink voltage supply 134, which blocks the sink voltage supply 134 from the RF power. In the specific embodiment of FIG. 1B, RF bias power having a suitable frequency (eg, low frequency and/or high frequency) is provided by rf bias power generator 148 through bias matching impedance 142 and blocking capacitor 144. To a single ESC electrode 128. Referring again to Figure 1A, a reactor controller 丨52 is used to control the operation of all active components in the reactor. Specifically, FIG. 1A shows that the ΟΝ/OFF command is transmitted from the controller 152 to each of the power generators 136, 140, and 148, to the gas supplier 119, to the vacuum exhaust fruit 116, and to the ESC suction. Seat voltage supply 134. Although the illustration in Figure 1A does not show 'although other active elements in the reactor are likewise controlled by controller 152', other active components include, for example, coolant pumps, lid interlocks, lift pin actuation , pedestal ascending actuator, gas valve opening, wafer handling robot, etc. Wafer-level lightning detection: 4 It is difficult to measure the electric arc at the BB circle because of rf 200917339 noise and harmonics, and due to non-arc phenomenon (power generator conversion) and arc phenomenon The instantaneous voltage or current varies widely. This problem can be solved by detecting a change in current or voltage at the RF bias power input of the ESC 1 22. An RF sensor 1 5 4 is disposed (or connected) to an RF conductor 155 (eg, a 50 ohm coaxial internal conductor) RF sensor 1 54 is generated in RF bias 148 and RF bias match impedance 142 operate. In one embodiment, RF sensor 154 is included within matching impedance 142 and is disposed at an internal coaxial output connector (not shown) that connects coaxial cable 155. The R F sensor 1 5 4 can measure the R F current or the R F voltage and generate a voltage signal that is proportional to the detected current (or the detected voltage). The voltage signal is processed by a signal conditioner 1 5 6 to generate an output signal which is subjected to filtering processing and peak detection and is scaled to conform to a predetermined range. An arc detection comparator 1 5 8 compares the magnitude of the output signal with a predetermined threshold. If the output signal size exceeds the threshold value, the arc detection comparator will output an arc flag to the reactor controller 1 52. Reactor controller 1 52 responds to this arc flag to turn off active components in the reactor, such as power generators 136, 140, and 148. Referring now to Figure 2, the sensor 丨 54 can be an rf current sensor. In this embodiment, the 'sensor 丨5 4 includes a ferrous salt ring 160 that surrounds the RF conductor 155; and a conductive (eg, copper) coil 162 that surrounds a portion of the ferrous salt ring 160. . One end 162a of coil M2 can tolerate electrical floating' while the other end 162b is the output terminal of sensor 154. One of the advantages of the ferrous salt ring 1 60 and the coil 1 62 structure is that the current through the coil 2009 62 is weakly coupled to the RF current through the RF power type conductor 155. The induced voltage generated by the loop 162 is attenuated, and the instantaneous change or peak value through the conductor flow will be limited to a small dynamic range-related characteristic, ie weak coupling will limit the sensor 丨5 4 from the conductor power location The amount of power or current that can be drawn. Therefore, the load effect caused by the RF current of the conductor 155 is not shown in the third diagram. The different operation number adjuster 156 of the signal conditioner 156 includes a peak detector i64; an rf is used to remove the miscellaneous And providing a clean signal; a size adjustment circuit to provide a predetermined range; and a high-impedance converter 170, using the number 'small size, while providing a high impedance between the output of the signal conditioner 156 and the sense isolation. One of the signal conditioners 156 is shown in Fig. 2. In the specific embodiment of FIG. 2, the peak 164 includes a diode rectifier ah and a capacitor in the illustrated embodiment. In another embodiment, the peak detector may include other circuits & indicating the output of the true peak. quasi. The RF filter 166 is comprised of a pair of parallel capacitors 166a, 166b and sense 166c. The size adjustment circuit 168 is shown in Fig. 2 as a pair of resistors 168a, 168b whose output voltage is reduced by the sum of the resistance values of the resistors 168a and 168b. Converter 170 is shown in Fig. 2 to include a 171' which provides an output signal within a range whose range gain is determined (e.g., 0-10V). The gain can be determined by a return-to-power grant coupled to the input and output terminals and 172. Zoom in, therefore, within line 1 55. The RF* detector with U5 is 1 5 4 L. the way. The signal is 1 6 6, 168 > used to control the signal detector 154 body embodiment value detector. 164b ° in the component, shown in the figure is a series of voltage divider, resistor 168a ratio to adjust the amplifier by Amplifier Amplifier Transmitter 171 provides a high input impedance that isolates the signal conditioner 156 from the load at the output of the signal conditioner. Figure 4 illustrates an embodiment of sensor 154 for detecting the RF voltage on RF conductor 155. The sensor 154 includes a resistor separation circuit 154a, 154b' which is directly connected between the conductor 155 and the ground potential. The series resistance of the resistor separation circuits 154a, 154b is relatively high (million ohms level). This avoids high power conversion to ground. The resistance 1 5 4 a is less than the resistance 1 5 4 b by 10 - 1 0 0 ' so that the voltage detected by the peak detector 164 is very small relative to the voltage on the RF conductor 155. It provides a sensor 154 - high input impedance ' thereby avoiding large currents from the rf conductor 155. The signal conditioner 156 described above with reference to Figs. 2 and 3 can also be used to adjust the output signal of the RF voltage sensor 154 of Fig. 4. Figure 5A illustrates a variation of the embodiment of Figure 1A in which the arc detection is performed on the ESC electrodes 128,130. The RF dust power generator 148 and the RF bias matching impedance 142 of FIG. 1A are not shown in the legend of FIG. 5A, however, when RF bias power is supplied to the ESC electrodes 128, 130, rf bias power is required. Generator 148 and RF bias match impedance 142. Alternatively, RF bias power is not provided to the ESC electrodes 128, 130. The sensor 154 of Figure 1A is replaced by a voltage sensor 174 in Figure 5A. Voltage sensor 174 is connected across ESC center pin 132 (which connects the semiconductor workpiece or wafer 120) and a reference point. The reference point can be a ground point or one of the ESC electrodes 128 or 130. Voltage sensor 174 is a differential amplifier having two inputs coupled to central lock 132 and reference point 200917339 (e.g., ground point). The instantaneous voltage on the wafer 120 appears to form a large differential signal between the two inputs of the differential amplifier 1 74. The output signal of the amplifier is proportional to the differential signal, and the output signal is provided to the signal conditioner 1 5 6 . The output signal of the signal conditioner 156 is compared with a predetermined threshold by the arc detection comparator 158, as in the specific embodiment of FIG. Figure 5B illustrates a similar variant for Figure 1B, in which sensor 1 54 of Figure 1B is replaced by differential amplifier 1 74 in Figure 5. In the embodiment of Figure 5B, the two input terminals of the differential amplifier 174 are coupled to a single ESC electrode 128 and an appropriate reference voltage (e.g., a pick-up location). The RF bias power generator 148 and the RF bias matching impedance 142 of FIG. 1B are not shown in the legend of FIG. 5B, but when the RF bias power is supplied to the ESC electrode 128, an RF bias power generator is required. 148 and RF bias match impedance 142. Alternatively, no RF bias power is provided to the ESC electrode 128. The instantaneous voltage on the voltage wafer 120 appears to form a large differential signal between the two inputs of the differential amplifier 174. The output signal of the amplifier is proportional to the differential signal and the output signal is supplied to the signal conditioner 1 5 6 . The output signal of the signal conditioner 156 is compared with a predetermined threshold by the arc detection comparator 158, as in the specific embodiment of FIG. Figure 6A illustrates a variation of the embodiment of Figure 5A in which current sensor 1 76 replaces voltage sensor 1 74. The current sensor 1 76 includes a ferrous salt ring 178 surrounding the central conductor 132 and a conductive coil 180 surrounding the ring 178. One end of the coil 180 is 1 8 0 a is the output of the current sensor 1 7 6 200917339 and is connected to the input of the signal conditioner 156. Figure 6B illustrates a variant of the embodiment of Figure 5B in which the electrical influenza detector 1 7 6' replaces the voltage sensor 1 7 4 . The current sensor 176 includes a ferrous salt ring 178 that surrounds the conductor connected to the single ESC electrode 128 and a conductive coil 180 that surrounds the ring 178. One end 180a' of coil 180' is the output of current sensor 176' and is coupled to the output of signal conditioner 156.

Referring again to FIG. 1A, a second RF sensor 184 is coupled to an RF power type conductor 185 that is coupled between the RF generator 140 and the RF matching impedance 13 8 for sidewalls. Coil 1 12. The second RF sensor 1 84 can be an RF current sensor (as in Figure 2) or an RF voltage sensor (as in Figure 4). The output of the second RF sensor 128 is provided to a second signal conditioner 186, which may be of the same type as the signal conditioner 156 of Figures 2 and 3. A second arc detection comparator 18 8 compares the output signal of the signal conditioner with a particular threshold to determine if an arc is generated. If an arc is generated, comparator 18 8 will generate an arc flag to controller 1 52. A third sensor 190 is coupled to the output of the D. C. power generator 136. The output of the third sensor 190 can be provided to a third signal conditioner 192. The third arc detection comparator 1 94 compares the output signal of the signal conditioner 192 with a specific threshold to determine if an arc is generated. Its output an arc flag is sent to the program controller 1 52. The controller 1 52 may include a memory 1 52a for storing a sequence of instructions and a microprocessor 152b for executing the instructions. These instructions represent 13 200917339. A program can be downloaded to the controller memory port 52a for operation. The arc flag is received at any of the comparators in response to one of the characteristics of the arc detection comparator 丨5 8 , 1 8 8 or 1 94, and the program will instruct the controller 152 to turn off the power generators 136, 14 and M8. This program will be further explained in the back part of this manual. Operation of the ammonia sequence controller The program flow of the program controller 1 of FIG. 1 is shown in the flowcharts of FIGS. 7A and 7B, and the program scheme can be downloaded and stored in the controller memory 152a (section 7A and Block 300 of the Figure 300) The history of the beta reactor assembly, e.g., the number of used hours per consumable in the reactor, can also be downloaded to the controller memory l52a (block 3〇2). The controller then starts the program in the reactor (block 3 04). In the current procedure step, controller ι 52 performs the RF power settings required by the program scheme (i.e., provides RF power to ESC 122 and rF power to coil 112). Based on these power settings, the controller 1 52 predicts the level of RF noise that each of the sensors 丨5 4, 丨8 4, and 丨9 〇 will encounter. For each sensor, controller 152 determines to assign an appropriate arc detection comparison threshold to each of comparators 158, 188, and 194 based on the level of noise (blocks 7 and 6 of Figures 7 and 78). ). For a particular sensor, if a detected voltage (or current) level exceeds the assigned threshold, then an arcing phenomenon is considered, and the controller 152 may also define a warning level value. Below the arc detection threshold. After each of the sensors 154, 184, and 19 has been set, the value of each value is corrected based on the associated used time of the consumable component of the reactor 14 200917339 (block 308). The correction can be made based on historical data representing the general useful life of each consumable component in the reactor. For example, the sensor 154 detects the arc phenomenon closest to the wafer 120, at which point the state of the consumable component closest to the wafer will have the greatest impact 'eg, a program loop kit surrounding the ESC (not shown in Figure 1A) Out). Therefore, the arc detection comparison physiology of the sensor 154 is corrected according to the number of used hours of the program ring kit. The same 'sensor 1 84 detects the arcing phenomenon at the side wall coil 丨 2 . Therefore, the value assigned to the sensor 1 8 4 will be corrected based on, for example, the number of used turns of the coil 丨丨2. In general, it will be repaired as the consumables have been used. 'Because when the consumables wear out during exposure to the plasma and the surface becomes a reversal #, it is easy to suffer or cause more RF noise and harmonics. turbidity. Correcting the arc detection threshold based on the number of hours the consumables have been used can be achieved based on empirical data from a history of a large number of consumable component samples. In a specific embodiment, the next step will determine if the value of the up-trim is at or too close to the expected voltage or current level of a true arc phenomenon (block 31〇). If this is the case ("Yes" branch of block 3), a flag is output (block 311) to the user and/or to the program controller 1 5 2 in a particular embodiment 'this flag Program controller 1 $2 can be turned off the reactor. Thus, it can be identified that the threshold value has exceeded the corresponding sensor's position and the reactor consumables closest to the reactor can be identified, thereby informing the user that the consumables have been replaced for replacement. If the modified value is not too high ("No" branch of block 3 1 0), then the modified 槛 value is transmitted to the arc detection comparator 1 5 8 '1 8 8 and 194 ' for the current In the program step (block 312). According to the program scheme, 15 200917339 controller 1 5 2 can recognize the instantaneous power of program control (block 3 14) occurring at a specific moment, for example, when starting or stopping the rf power generator. During execution of the ongoing program step, controller 152 monitors whether each arc detection comparator 158, 188, and 194 transmits an arc flag (block 3 16). In the current step, each of the comparators 158, 188, and 194 continuously compares the output signals of the signal conditioning 156, 186, and 192 with the 槛 value = line received from the controller 152. Whenever the output signal value of the signal conditioner exceeds the threshold used, the comparator will transmit an arc flag to the controller 1 52. For example, controller 1 52 can sample the comparator output signal at a rate of 30 MHz. For each sample of comparators 158, 188, and 194, a determination is made as to whether a singular flag has been issued (block 3, 8). If no flag is detected ("No" branch of block 3 1 8), then controller 52 determines if the current program step has been completed (block 320) 9 if the determination is incomplete ("No" in block 32 Branch), then controller 1 52 returns to the monitoring step of block 3丨6. Otherwise, ("YES" branch of block 320) controller 152 branches to a program step below block (block 322) and returns to block 306. If an arc flag is detected ("Yes" branch of block 318), it is determined that the detected instantaneous voltage or current system only exceeds the warning level threshold or has exceeded the arc threshold level (block 324). ). This determination is made based on the content of the flag issued by the particular comparator. If only the warning level is exceeded ("YES" branch of block 324), controller 152 records this phenomenon and establishes a connection relationship with the current wafer (block 3 26). Controller 1 52 then determines if the number of warnings for the current wafer is too high (block 328). If the number of warnings for the wafer exceeds a predetermined number ("YES" branch of block 328), then a flag is sent 16 200917339 (block 3 3 0) and the controller 丨 52 can shut down the reactor. Otherwise ("no" branch of block 328), the controller returns to step 316. The right arc flag indicates that the full arc phenomenon, i.e., the arc implant value has been exceeded ("no" branch of block 3 24 4), determines if it coincides with the power conversion time identified in the step of block 3丨4. If it is consistent ("Yes" branch of block 3 3 2) then the flag is treated as an error indication and ignored (block 3 3 4)' while the controller returns to the monitoring step of block 3丨6. Otherwise ("No" branch of Box 3 3 2), the arc flag is treated as a correct message. The controller 1 5 2 uses the contents of the arc flag to identify the position of the sensor that detected the arc phenomenon and record it in the body (block 3 3 8). The controller sends "OFF" to each of the power generators 136, 14 and 148 (block 34).

The device 1 52 determines the arc flag to identify the device that sends the arc flag. The information is output to the user interface by the controller 1 52, and the connection relationship between the sensor position and the consumable component can be established (block The feature allows the user to better identify the materials and components in the reactor chamber. For example, if the controller is singularly singular, it identifies the side wall that is closest to the monitor. Coil 11 2. For a consumable assembly that is closest to the comparator 1 58 ', surrounds the ring set of wafers, and controller 15 2 will, for example, establish a coupling relationship between the ring sets. For the arc flag In the specific embodiment where the relevant component is between the top arc flag and the top target, the controller 1 52 can provide different possible candidate replacement consumables for the different arc flag of 17 200917339. The program of one embodiment shown in FIG. 7B includes a dynamic adjustment arc detection comparison threshold in a plasma program step. The threshold value is adjusted according to the used time of the consumable component. Frequently updating the values of each of the comparators 158, 188, and 194 by such dynamic adjustments, the threshold value can be found to find the minimum threshold for a particular wafer step, thereby optimizing each of the comparators 158, 188 and Sensitivity. When the noise condition (for example) is improved, it can be repaired and repaired when the level of noise increases, for example, when the level of noise increases. The increase in threshold can avoid miscellaneous The illuminator is in close proximity to the erroneous arc indication produced by the arc detection level. In one embodiment, the ί and Β diagram procedures further include the step of performing a step of identifying the arc position to identify a corresponding consumable component of the associated arc phenomenon. Control 1 5 2 communicates such information to the user to facilitate efficient management of the consumables to properly select the consumables to be replaced. In one embodiment, the programs of Figures 7 and 7 are implemented in a soft order, and the software instructions are After being downloaded into the controller memory 1 52a, in this embodiment, all intelligent actions are performed by the controller, and the electric orphan detection comparator performs only the comparison function. However, In the embodiment, the arc detection comparators 158, 188, and 194 can have their own internal processors and memory to allow them to perform certain functions in the I and 7B diagrams.

It is clear that each line is 152. By means of the program 194 value, the depreciation of the value of 7A and the controller and more refers to the middle of the 152 in addition to I 7A 18 200917339 renovation improvement control and;: 7A and 7B Tu Xi · Zhao Peigan procedures and The controller 丨5 2 compares frequent bidirectional communication between €3 158, 188 & 194 with each arc detection. The controller 152 periodically communicates the updated comparison threshold to a particular number of comparators in the comparators "8, (8), and 194". The different values are downloaded to different comparators. Each time an arc is detected, the comparator丨5 8, i 8 8 and ! 94 is the transmission of 5 melon flag t 纟 flag 襟 including | send the electric solitary flag of the % comparator Γ 别 控制器 控制器 控制器 控制器 控制器 控制器 控制器 控制器 控制器 控制器 控制器 控制器 控制器5 8. 丨8 8 and 149 are the correct arc flag transmitted by the brake device, and further transmit the close (ΟΝ/OFF) command to the power generators 136, 14〇 and 148. The arc detection characteristics of Figure A (as implemented in Figures 7A and 7B) are added to the plasma reactor that has been operated in the ~an anvil &&

In the reactor in this zone, heat I installs a customized communication network on the mother-reactor to meet the aforementioned communication requirements of each of the offices. This would make the cost too high. in order to

Reduce costs' will be communicated using the communication system already existing on Wu L Han Ying 15. In some embodiments, communication systems that are already in place can meet and promote all of the communication requirements of the arc detection capabilities of Figures 1 and 7. In some reaction tests, ^ ^ ° is used for a local area network (LAN), and the controller communicates with the active and active devices on the anti- and long-term devices through the regional network. Figure 8 illustrates the regional network structure of the reactor type shown in Figure λ. An interface installation & 揭 揭 揭 揭 揭 揭 揭 揭 揭 揭 揭 揭 揭 揭 揭 揭 揭 揭 揭 揭 揭 揭 揭 揭The interface unit converts the received digital command into an action to turn off the active device. You 丨] As in Figure 8, interface devices 355, 357, and 359 are connected to power generators 136, 140, and 148, respectively. The device responds to the received digital commands and can turn off the generators. Provide a regional network (LAN) 360. This area network is a multi-conductor transmission channel or cable' which has a plurality of I/O ports 361, 362, 363, 364, 3 65, 3 66 and 3 67 ' and which can be implemented as a multi-conductor connector. Each device communicating over regional network 360 has a memory and limited processing capabilities to allow it to store and transmit a unique address on regional network 360. Thus, each of the control interfaces 355, 357, 359 and each of the comparators 158, 188, 194 has a conventional processing circuit ' in response to the regional network protocol and stores its own device address. Each device 158, 188, 194, 3 55, 3 57 and 3 59 on the local area network only responds to the received message destined for its device address. In addition, each device attaches its own address to its transmission data on the local area network. Each device 158, 188, 194, 355, 357, and 359 passes through its own multi-conductor cable 371, 3 72, 373, 3 74, 375, 376, and 377, respectively, 埠 361, 362, 363, 364, 365, 366 and 367 are coupled to the area network 360. Comparators 158, 188, and 1 94 may not be provided on the reactor disposed in the region having such a regional network. Therefore, the communication characteristics of the arc detection system of FIG. 1A can be implemented in the reactor by recognizing the remaining (unused) 现有 on the existing area network 360 (for example, 埠363, 365 and 366), and the comparators 158, 188, and 194 are connected to the above-described ports in the manner shown in FIG. 8. When the area network 360 is activated, the device addresses of all devices on the area network 360 (ie, the comparator 158, 188, 194 and control interfaces 355, 357, 359) can be intelligently assigned by controller 1 52 using conventional techniques. In the system of Fig. 8, the controller 1 52 sends a message to a 20 200917339 comparator, for example, which instructs it to download a particular threshold to implement the procedures of Figures 7A and 7B. Each comparator responds to an arc phenomenon by transmitting a message containing the address of the comparator device to the controller 1 5 2 and transmitting a message indicating the occurrence of an arc. The controller 1 52 can respond to a correct arcing phenomenon and transmit a message to each power generator control interface 3 5 5, 3 5 7 , 3 5 9, which contains a command to request that the corresponding generator be turned off. The position of the sensor that sent the flag is estimated by the controller 1 5 2 based on the device address of the corresponding arc detection comparator. The controller 1 52 can provide this information to the user at the user interface 153 of the controller 152. In other reactors, a local area network is not provided or available, and a custom communication digital input/output (DI/0) network is provided, as shown in Figure 9. In the DI/0 network of Figure 9, each device communicates with the controller 152 via the device-specific transmission channel (and vice versa). The DI/0 network on the existing reactor is individually communicated with the controller 1 52 using DI/0 relays 401, 402, 404, 406, respectively, and individual security points are monitored. Specifically, for example, the DI/0 relay 401 transmits a signal every time the cover 101 of the chamber 100 is turned on, and the DI/0 relay 402 sends a signal whenever the RF power cable is disconnected from the side wall coil, and the DI/0 relay 404 The signal is sent whenever the RF bias power cable is disconnected, and the DI/0 relay 406 sends a signal whenever the DC power cable is disconnected from the top target. The inputs A, B, D and F of the controller 1 5 2 receive the signals transmitted by these relays, as shown in the legend of Figure 9. The controller 1 5 2 transmits a close (ΟΝ/OFF) command to each of the power generators 136, 148, and 140 via the dedicated transmission channels J, K, and L, as shown in FIG. 21 200917339 The communication characteristics of Figure 1A can be implemented in the DI/O network of Figure 9, with three additional DI/0 relays that can interact with the arc detection comparators 158, 188 and 194. In the example shown in Figure 9, the existing DI/0 relays 403, 405, and 407 are coupled to the outputs of the arc detection comparators 18, 158, and 194, respectively. Each time one of the arc detection comparators 158, 188 or 194 sends an arc flag, the DI/0 relay connected to the comparator will send a signal to inform the controller 1 52. The controller 152 derives the identifier of the arc detection comparator that sent the arc flag based on the position of the cable or channel carrying the signal. This information can be communicated to the controller user interface 1 5 3 to manage the replacement of consumables. Early reactors currently installed in an area may not have a regional network or a DI/0 network. In such a reactor, the arc detection system of Figure 1A can be implemented in a basic form that utilizes a 24 volt safety interrupt circuit provided in such a reactor to implement the detection system. This circuit ensures that the power generator is turned off immediately whenever the chamber cover is open or whenever the power cable connected to the chamber is interrupted. Referring to Fig. 10, power generator 136 has an interlocking device 501, power generator 148 has a interlocking device 502, and power generator 140 has a chaining device 503. Each power generator 136, 148, and 140 can only operate when its interlocking device continuously detects a 24 volt DC potential on a circuit conductor 504. The circuit conductor 504 connects all interlocks 501, 502, 503 in series to a 24 volt DC supply 506. The series circuit conductor 504 is disconnected by a number of simple switching relays 510, 512, 514, 516, 518, 520 and 522. Therefore, each relay itself can interrupt the generator interlocks 501, 502, 22

200917339 503 is connected in series with the 24 volt supply 506. The relay 5 10 opens whenever the chamber cover 1 〇 1 is turned on. The relay 5 1 2 opens its connection whenever the RF power cable is disconnected from the side wall. When the connection between the relays 516 and the I ESC 122 is interrupted, the connection between the connected RF power cable and the top target is interrupted. (4) The chamber 1 is automatically turned off in response to the three arc detections and any of the comparators of the 1 94. The arc detection is in series with each other along the circuit conductors 504, and the output signals of 158, 188 and 194 can be used. Figure 10 shows that relays 514, 518, and 520) can be connected separately! ; 194 output. Each time the comparators 188, 158 go to a voltage (or current) that exceeds their predetermined threshold value, the arc flag is used to cause the respective relay to turn on its connection, respectively. Thus, the interlocking conductors 504, 502, 503 of the conductors 504, 503, 503 and 503 are turned off, respectively. The RF matching impedance 138 shown in Figure 1A is an RF input and a single RF output. However, the RF matching impedance 1 3 8 may additionally have a low: ^ is shown in the figure). In this embodiment, the aforementioned type and threshold comparator can be coupled to a low power D.C. input, not shown. The reactor junction of Figure 1A or 1B has been described above to open the connection when the reaction is turned off. Circle 1 1 2 in the connection between the RF power rate cable and . Relay 522 opens its connection whenever F is reached. The cavity measurement comparator 1 5 8 , 1 8 8 three additional relays are respectively received by the comparators, the three relays (ie, the h comparators 1 8 8 , 1 5 8 and 1 94 detect, which will A voltage 514, 518 or 520 volt path is transmitted, resulting in a power output 136 for the div., the specific embodiment having a single DC input at another embodiment (not one of the additional arc sensing RF matching impedances 138) The determination of arc detection arc detection according to a single sensor of various sensors 23 200917339 1 5 4, 1 8 4, 1 90, etc. may also be based on several of the sensors (or may I. For example, it has been explained that the specific embodiment of the first, eighth or ninth embodiment is passed through the comparators 1 5 8 , 1 8 6 or 1 9 4 , respectively, and in the 154, 184 or 190 The output signal of either one is in response to the electrical signal. In one embodiment, the control of the first, eighth or ninth embodiment is programmed to combine at least two (or more) threshold comparators 18. The determination is based on the combined signal. The output signal 1 52 is based on a linear, polynomial or more complex mathematical function. In this embodiment, the controller 125 is programmed to respond to the signal to determine if an arc is detected or whether to turn off the reaction. In another embodiment, the sensor 1 54 , 1 84 , 1 The signals of 90 can be combined first and then processed by a threshold comparator. The individual output signals of at least two of 1 54, 1 84, and 1 90 can be combined according to polynomial or more complex mathematical functions. The sign is then provided to a single comparator (e.g., comparator 186), and the output signal of the comparator is provided to controller 15.2. The foregoing is directed to a particular embodiment of the invention, however, the invention relates or further The specific embodiments can also be obtained without departing from the scope of the present invention. The scope of the present invention is defined by the following application. [Simplified description of the drawings] In the method provided by the present invention, the method embodiment can be曰>, however, & all) control according to the sensing phenomenon. 152 158 ' Combined by processing. Combine the device. In the output of the sensor linear, combined with the single unit than he and Ben Ming basic range The description of the paragraphs is obtained and understood, and the specific description of the present invention, which is briefly summarized in the "Summary of the Invention", is described with reference to the accompanying drawings. However, it is noted that the accompanying drawings are merely illustrative of the invention. The general embodiments, and therefore should not be taken as limiting the scope of the invention, and other equivalent embodiments are also included in the scope of the invention. Figures 1A and 1 B illustrate a plasma reactor having Bipolar and monopolar electrostatic chucks with specific wafer level arc detection and auto-shutdown features. Fig. 2 is a schematic view showing an RF current sensor circuit of the reactor in Fig. 1A. Figure 3 is a block diagram illustrating the signal conditioner of the reactor of Figure 1A. Fig. 4 is a schematic view showing an RF voltage sensor circuit of the reactor in Fig. 1A. 5A and 5B respectively illustrate a modified schematic view of a specific embodiment of Figs. 1A and 1B, in which a wafer level arc detecting circuit is provided on the electrostatic chuck, and a voltage sensor is used.

Figs. 6A and 6B respectively illustrate a modified schematic view of a specific embodiment of Figs. 1A and 1B, in which a wafer level arc detecting circuit is provided on the electrostatic chuck, and a current sensor is used. Figures 7A and 7B collectively establish a complete flow chart illustrating the operational flow of the reactor controller of any of the foregoing specific embodiments. Figure 8 illustrates the application of the arc sensing and communication characteristics of Figure 1A to a reactor having a regional network. 25 200917339 Figure 9 illustrates the application of the arc sensing and communication features of Figure 1A to a reactor with a digital input/output network. Figure 10 illustrates the application of the arc sensing and communication features of Figure 1A to a reactor having a D.C. safety interlocking loop. In order to facilitate the understanding of the present invention, the same reference numerals are used to refer to the same elements in the drawings, and the drawings are not to scale. [Main component symbol description]

翻翻翻翻〇100 chamber 101 chamber cover 102 side wall 104 top 106 bottom 110 target 112 RF coil 114 pedestal 116 vacuum exhaust pump 118 exhaust pump 埠 119 gas supply 120 workpiece 122 electrostatic suction Block 124 Insulation 126 Conductor 128, 130 Electrode 132 Conductive Center Pin 134 Voltage Supply 136 DC Power Generator 138 ' 142 Matched Impedance 140 ' 148 RF Power Generator 144 Capacitor 146 Capacitor 150 RF Blocking Concentrator 152 Controller 152a Memory 152b Microprocessor 153 User Interface 154 RF Sensor 154a, 1 5 4 b Resistor 26 200917339 Γ c 155 RF Conductor 156 Signal Conditioner _ 158 Arc Comparator 160 Ferrous Salt Ring 160a '160b Coil End 1 62 Coil 164 Peak Detector 164a Diode Rectifier 164b Capacitor 166 RF Filter, Wave 166a, 166b Capacitor 166c Inductor 168 Size Adjustment Circuit 168a, 1 6 8 b Resistor 170 Converter 171 Amplifier 172 Feedback Resistor 174 Voltage Sense 176 , 176, current sensor 178, 17 8' ferrous salt ring 180, 180 ^ conductive coil 180a > 180a1, coil end 184 RF sensor 185 RF power type conductor 186 signal conditioner 188 '194 arc comparator 190 sensor 192 signal conditioner 3 5 5 > 3 57 ' 3 59 control interface 360 network 36 1 -367 I/O 埠 371~ 377 Multiconductor cable 401, 402 DI/0 relay 404 > 406 DI/0 relay 501, 502, 503 interlock 504 circuit conductor 506 24 volt DC supply 510, 5 12' 514 switching relay 516, 518 switching relay 520, 522 switching relay 27

Claims (1)

200917339 X. Patent Application Range: 1. A method for detecting an arc in a plasma reactor, the plasma reaction comprising an RF or electric power generator for processing a semiconductor workpiece or crystal carried by a workpiece support base Round, the susceptor having at least one electrical method includes the steps of: sensing a first instantaneous voltage current on a semiconductor coupled to the wafer; providing a first comparator for the instantaneous voltage or current Comparing a threshold value in the comparator for comparison; transmitting an arc flag signal sent by the comparator when one of the sensed instantaneous voltages or currents exceeds the value; and echoing the arc flag Signal, and turn off the power generator. 2. If you apply for a patent scope! The method described in the above, further comprising: downloading a program scheme, which is executed by the reactor; in each program step of the program scheme, determining the comparator according to the RF power level of each step The value level, which exceeds the expected noise level of one of the program steps; at the beginning of each of the program steps, the original value of the comparator is replaced by one of the threshold values determined for each current program. The planting level 3' is as described in claim 2 of the patent application, and further includes the following steps for each process step 'according to the upper pole of the reactor and the wafer level, or the electrical and storage level Step: Refer to the threshold value step: Arc 28 200917339 Related consumables usage history, adjust the threshold value determined in the procedure step. 4. The method of claim 3, further comprising the steps of: after adjusting the threshold value, determining whether a threshold value is generated which is equal to or exceeds an expected instantaneous voltage or current level of an arc phenomenon Standard and send this information to a user interface. 5. The method of claim 1, further comprising the steps of: sensing a second instantaneous voltage or current associated with an RF source power generator at a selected location in the reactor; providing a second comparison Comparing the second instantaneous voltage or current with a threshold value stored in the second comparator; transmitting whenever a second instantaneous voltage or current sensed exceeds the threshold value An arc flag signal sent by the second comparator; Retrieving the arc flag signal sent by the second comparator, and turning off the source power generator; and notifying a user interface to send the identifier of the comparator of the arc flag, or sending the arc flag The identifier of the reactor consumable component associated with the comparator. 6) The method of claim 5, further comprising the steps of: downloading a program scheme, which is executed by the reactor; 29 200917339 determining, for each power level in the comparators, each step of the program One of the program steps in the program protocol is a comparator, according to one of the Rf comparators specified in each step, the threshold value exceeds the expected noise level; The current procedure steps are compared to the original threshold value of the device. At the beginning of each program step, one of the determined threshold levels is substituted for the method described in item 6 of the range of ..., for each program step and per-comparator, (4) The value of the threshold value of the comparator-related consumables usage history·^. The method described in item 7 of the patent application has been determined. The method includes the following: after adjusting the level of the value of the value of the value of the value of the value of the value of the value of the value of the value of the value of The expected instantaneous voltage or current level of the phenomenon is the user interface of the identifier of the comparator or consumable. Phase 9. - A method of monitoring the arc in one of the chambers of the electrolysis reactor, the chamber comprising the chamber, the chamber having a plurality of , 廄 从 从 应用 应用 应用 应用 应用 应用 应用 应用 应用 应用a plurality of power generators, one having a workpiece supporting surface workpiece supporting base supporting surface, the method comprising the following steps. According to the program program, a plasma processing bucket is installed, and the program program includes - The string is controlled by the program controller 30 200917339 to monitor the voltage or current by being coupled to the power applications and the individual sensors coupled to the workpiece support pedestals; Each of the sensors determines an arc detection threshold whose value is higher than a noise level; and the individual sensor detects the output signal of the individual sensor by the individual arc detection comparator Comparing the threshold determined by the detector, and if the output signal exceeds the threshold, transmitting an arc detection flag; widely determining the position of the corresponding sensor that causes an arc detection flag, and displaying the Position in one The method of claim 9, wherein the reactor further comprises a regional network having a plurality of turns, the control The processor is linked to one of the plurality of devices, the generators comprising a plurality of interfaces that are linked to the individual complexes of the plurality of frames and identified by individual device addresses, the method further comprising the steps of: C...: 'Link each of the comparators to other individual complexes in the array and assign a unique device address to each of the comparators. 1 1 · As described in claim 10, The method further includes the following steps: programming the controller to download the thresholds used in the series of program steps to the individual complex comparators of the comparators through the local area network. 31 200917339 1 2. If the patent application scope is 1 The method of claim 1, further comprising the steps of: programming the controller to receive the arc flag sent by the comparators, and performing the shutdown of the generators through the regional network. The method of claim 12, further comprising the steps of: programming the controller to be based on a device address included in an arc flag received through the area network; 14. The method of claim 9, wherein the reactor further comprises a digital input/output (DIΟ) network having dedicated to individual DIO sensor relays The individual complex channels for transmission between the controllers, and the individual complex channels dedicated for transmission between the controllers and the individual power generators of the reactor, the method further comprising the steps of: The outputs of the individual complex comparators of the comparators are coupled to individual complex relays of the plurality of sensor relays. 15. The method of claim 13, further comprising the steps of: establishing a relationship between the arc flag positions and corresponding consumable components of the reactor, and identifying the consumables corresponding to each arc flag The components are provided to a user interface. 32