TW200916852A - Photosensitive resin composition for forming partition of color filter and partition of color filter formed by using the same as well as color filter and manufacturing method for color filter - Google Patents

Abstract

Provided is a photosensitive resin composition capable of maintaining surface ink-repellent properties even subjecting normal cleaning process and after passage of time, and capable of forming partitions having excellent adhesiveness with respect to support substrate. The photosensitive resin composition for forming light-shielding partition of color filter of the present invention includes the followings as necessary components: (A) alkali developable oligomer having acid group and two or more ethylene double bonds in one molecular, (B) ink-repellent (methy) acrylic polymer having a polymer unit having a main chain with carbon number of 4 to 6, in which at least seven hydrogen atoms are substituted by fluorine atoms, (D) photo polymerization initiator, (E) light-shielding dispersing pigment containing at least one selected from black organic pigment, mined color organic pigment and light-shielding material.

Description

200916852 IX. Description of the Invention: [Technical Field of the Invention] The present invention relates to a color filter spacer wall shape #田成止α from the use of the resin composition to form a light-proof sensitive resin composition. a color filter partition wall, and a method for producing a color filter and a color filter, in particular, a photosensitive resin composition for forming a color filter spacer suitable for producing a color filter by an inkjet printing method, and a use composition A light-shielding color filter spacer and a color filter are formed. [Prior Art] A color caster usually forms a Mack matrix on the surface of a transparent substrate such as a glass or a plastic slab, and then three or more different hue of red, green, and blue are sequentially formed into a strap. Or inlaid Jane and other cases. The size of the pattern size is used for the purpose of the color and the color of the two colors is 5 to 7 〇 0 #111. In addition, the positional accuracy of the overlap is several # melons tens/m, which is manufactured by a fine processing technique of dimensional accuracy. Representative production methods of the color filter are a dyeing method, a printing method, a pigment dispersion method, and an electrophoresis method. Among these methods, in particular, a pigment dispersion method in which a photopolymerizable composition containing a color material is coated on a transparent substrate, subjected to pattern exposure, development, and a color filter pattern is formed by child hardening as needed, The color filter has high precision in position and film thickness, and is excellent in durability such as light resistance and the like, and has few defects such as pinholes, and is widely used. On the other hand, the black matrix is usually arranged in a grid, a strip, or a mosaic in the red:, green, and blue color patterns, and the contrast is improved due to the color mixture suppression between the colors, or the malfunction due to light leakage. The prevention of 320324 5 200916852 'The effect is therefore that the black matrix is required to be highly opaque. A metal film such as chromium is formed by engraving or formed by a lithography method using a general resin containing a matrix. However, since the above-described method is used to form a color pattern of six colors to perform irradiation and development of radiation or the like, / (thus, it is proposed to provide a color filter at a low cost. In the middle, only the red, green, and two methods are: the pixels that are formed by hardening the pixels from the necessary pixels, and the spacers are first formed by the lithography step, and the pixel portion = method. However, in this method The color mixture of each color region is generated. Therefore, the material constituting the partition wall: the region: or the second, (ink) diffuses toward the outside of the colored region. Example: The above I::: Yes: The ink and the surface of the partition wall are static 4 = to 55 months, effectively avoiding the color mixture. On the other hand, at the heart tentacles, it is considered that the ink advancing angle of the ink and the partition wall surface is in addition to the 'ink nozzle When the ink that is ejected is to be covered on the partition wall at the same time, the space between t is set in the pixel

τ Self-healing effect returned to the pixel with the ink of the ink field on the surface of the 丨田璧. In particular, in the high-definition requirement of "fineness", the frequency from the dripping of the drip to the black matrix is also high: the liquid ejected by Besuo ^" is not the same as the shape of the black, and to complement In the long period of time, it is reviewed (see Patent Document 7). In the case of printing in the second place, it is recommended that the ink slide angle should be small when the film is covered in the partition wall and returned to the pixel. ^ 320324 6 200916852 As a photoresist composition for partition walls which impart such a purpose, a fluorine- or lanthanide-based compound is mixed as a component for imparting ink-repellent properties. Patent Document 1 discloses a photoresist composition comprising a perfluoroalkyl group-containing (meth) acrylate monomer and a silicone chain-containing ethylenically unsaturated monomer. However, the above copolymer is added in an amount of from 0.001 to 0.05% by weight based on the solid content of the photoresist composition, and the ink repellent in such a low content is insufficient. Patent Document 2 exemplifies a composition of an alkali-developable copolymer of hexafluoropropylene and an unsaturated carboxylic acid and/or an unsaturated carboxylic anhydride and a fluoroorganic compound. However, the polymer to obtain hexafluoropropylene cannot be deficient in polymerization under high pressure, and its molecular weight is as small as 2,000 or less. Further, the fluoroorganic compound which assists the compound is also a surfactant system, and its ink repellency continues to cause problems. In Patent Document 3, a resist composition is exemplified, which comprises: =H2=CH(Ri)C00XRi (Rf represents a carbon number* to 6 perfluoroalkyl group) as a monomer, and a fluorine atom content ratio is 7 Up to 35% by weight of the fluorine-containing resin. In this case, the R1 group is defined as Η, CH3, or CF3. In Patent Document 4, a negative photosensitive resin composition is described, which is a dye having a solubility of three or more ethylene double bonds in a self-complexing group and a molecule (4); A polymer obtained by copolymerizing a polymerized unit having at least one hydrogen atom having 20 or less carbon atoms substituted with a fluorine atom and a polymer unit having an ethylenic double bond as a printing ink. The fluorine-containing polymerization unit of the ink repellent f is equivalent to the above-mentioned Patent Reading 3. In any 惝 shape, if the proportion of the fluorine-containing compound in the photoresist is increased, the adhesion of J to the support substrate is lowered and the surface smoothness is deteriorated. Patent Document 5 describes a method for producing a surface-repellent ink black matrix. The method uses a resin containing a black matrix to contain a ruthenium having a low affinity and/or a fluorine atom, and after development, The resist ink was moved to the surface and the contact angle with the colored ink was controlled to be 3 〇 to 6 以 in such a manner that the black matrix was calcined at 230 °C. . In the above, a specific example of the refractory agent is exemplified by a copolymerization of a fluorine-containing monomer such as a vinylidene fluoride or the like in a main chain or a branched chain; . However, the phase-containing oligomer and the fluorine-based oligomer of the surfactant and the like have a problem that the ink repellent property is lowered with subsequent cleaning or elapse of time even after being burned to the surface after the calcination. On the other hand, the dynamic contact angle caused by the molecular chain length of the fluorine-containing branch of the acrylate polymer is described in (10), (4) s, 38 (2005), 5,699 (non-patent literature) When the carbon number of the fluorine-containing molecular bond is more than 6, the receding angle becomes larger due to the crystallization of the branch, and the EPAC economic partnership agreement is said to be 20+ years. Since the production of a fluorine-containing (Rf)-based fluorine compound (long-chain) is reduced by 95%, it is desirable to have a carbon-repellent gas-containing compound having a small slip angle of 6 or less. Further, in the case of a photoresist which is suitable for forming a light-shielding resin matrix, in the literature 6, the composition of the film is formed by the composition of the film, and the composition of the film is coated with a bovine & A 3 L sigma compound obtained by reacting a reaction with (meth)acrylic acid with a polybasic carboxylic acid or a ruthenium thereof as a main component of the resin, has a high light-shielding ratio and is easy to be 320324 8 200916852 The fine pattern is formed by the lithography method, and the stability, heat resistance, adhesion, and storage stability at room temperature are true. The literature 6 does not mention the ink-repellent characteristics, and there is no mention of compatibility. The patent is another aspect. The "white point" is mainly due to the inability of the ink to be sufficient in the area surrounded by the partition walls, and the earth magnetism, which is produced by the combination of the singularity of the singularity and the expansion of the moon, may become a display of color unevenness or contrast reduction. When the partition walls are formed, it is generally used for the long-term, eight & I stipulations contained in the thief resisting agent using the black resisting agent due to the adhesion of the contaminant to the supporting substrate 1 due to the upper and lower barriers. In particular, it is oriented towards the deployment by the partition walls. In addition, in the use of the above-mentioned inclusions:: on the surface of the support substrate, it becomes a hindrance to the development of the ink toward the corners; and further, the ink-repellent ink on the side of the partition wall and the support of the ancients, Ie? The surface of the board is extremely:: Technique: The side of the partition wall is rejected, and the color of the portion where the partition wall is in contact with the ink is lightened. 'Based on the situation as described above', in order to selectively reject only the top surface of the partition wall, and the side surface of the partition wall is not heavily inked, it is proposed that the following two shunt partition walls themselves produce such a property layer. The method of the two materials, (1) coating the portion other than the partition wall with a resist, and only rejecting the top surface t of the partition wall by the ink-jet treatment; ii, forming on the support substrate = performing the ink-repellent treatment a method of forming a patterned barrier by "shaping" a barrier layer by a lithography step; iv) in Patent Document 8, a support substrate exposed in a region formed by a partition wall The method of chemical treatment, and the method of illuminating the energy line. In this case, 320324 200916852 y, the prescription for rejecting the ink on the top surface of the partition wall is not used for forming the partition wall on the branch plate. The photosensitive coating is a method in which the photosensitive resin is patterned by a lithography step after the entire printing ink is removed, and the photosensitive resin is patterned by the ray-shaping step. (4) Surface _ ground, or selective However, in these methods, the partition walls must be multi-layered, and it is necessary to support the chrome on the top surface of the partition wall by 拒μ卢^> The surface of the substrate, the ink-jet treatment, and the difference in the ink-repellent action of the filling blade on the side surface and the top surface of the partition wall are difficult. Further, in Patent Document 9, the carrier is placed so that the partition wall is inverted. A conical manner is used to control the ink repellency of the side and top surfaces of the virgin plasma. However, in this method, the plasma treatment is basically performed twice. [Patent Document 1] Japanese Patent Laid-Open No. 9_54432 [Patent Document 2] Japanese Patent Laid-Open Publication No. Hei. No. 2005-315984 (Patent Document 4) No. WO-A No. 4-42474 (Patent Document 5) Japanese Patent Laid-Open Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. Japanese Patent Publication No. 2-62422 [Non-Patent Document 1] Macr Giniolecules, 38 (2005) 56 SUMMARY OF THE INVENTION [Abstract] 320324 10 200916852 (Problem to be solved by the present invention) Therefore, the object of the present invention is to solve the problem of providing a photosensitive resin composition for feeding a 诂π Α τ surface to prevent ink from being printed as described above. , the general cleaning or the time of the /, the outside '斟*拎甘』, the knife J, the surface of the quasi-symbol ink, this '# ^ plate is also excellent in the adhesion of the partition wall. Provided is a color filter partition formed by using the photosensitive resin composition, and a person's niche is excellent in rejecting ink in the color filter interval of the newspaper & 柘a+ hunting, and For the support substrate, two! Further, another object of the present invention is to provide a color filter which is formed by using the color filter partition. ^ (Means for Solving the Problem) Fruits, ^, etc. In order to solve the above problems, we are trying to review the results of the {{bisphenol-derived aromatic epoxy compound and (meth)acrylic acid. The unsaturated soil obtained by the reaction of an acid or its anhydride is used as a center and a predetermined amount of the ink-repellent (meth)acrylic polymer is used in combination, and the VT 卽 VT VT VT „ The compatibility of the ink-repellent ink in the photosensitive resin composition for forming the partition wall is also excellent, and the surface appearance after film formation is good in green in the form of a pattern, and not only the surface is excellent in ink resistance, but also: The invention also achieves the invention by the fact that the surface of the film is also ink-repellent, and the photosensitive substrate is excellent in adhesion to the transparent substrate, and the photosensitive resin composition for forming the spacer spacer is excellent. j·生; photosensitive resin composition for coloring spacer formation' contains Tit (Pepper (8) component as a must: 320324 11 200916852 (A) The knife has an acidic group and two or more ethylene #. Developability oligomerization The test of the ethylenic double bond a compound consisting of a main chain of 4 to 6 in the inverse of the stone and at least 7 of which are replaced by a fluorine atom; a poly(D) light of poly(Z) early 70-rejected ink (meth)acrylic acid The polymerization initiator (Ε) includes a black organic pigment, a color mixed organic pigment, and a light-shielding material, and a light-shielding dispersion pigment, which is one of the light-shielding filters described in (1) above. The photosensitive spacer is formed by sensitizing: the erecting product 'in which' is compounded with the following components in the photosensitive tree sap composition for forming the smear spacer: (C) at least three or more ethylene in the knives (3) The use of the light-emitting color filter partition wall described in the above (1) or (7): light, resin composition The color filter partition wall is formed by the following: ί· raw (10) composition in the '(A)_ molecule. The test-developing oligomer having an acidic group and two or more women's double bonds is used to make the double Derived from the class 2, the reaction of the epoxy compound of the oxypropyl group with the (meth)acrylic acid and the reaction of the 7L carboxylic acid or its anhydride (4) The photosensitive resin composition for forming a light-blocking color filter spacer according to the above (1) or (2), wherein the filter is formed by the above-mentioned filter. 'Color spacer formation feeling 320324 12 200916852 In the optical resin composition, (A) alkali-developing oligomerization of a dilute double bond: having an acidic group and two double powders derived from two = = is an epoxy compound having the following: (4): 〇hs~ch-ciis, 〆^

^OCH^CH~Cl!2〇 Rs OH

(In the formula, Ri and R2 represent a hydrogen atom, a carbon number! or an atom of an atom, an alkyl group of χ, „. 句七◦-, -S〇2-, -Si(CH3)2- ' -CH2- ' -C(CH 'ln 3)2_, 苐 base, 9 所 9 9, 9, _ 0⁄4 or absent, η is an integer from 0 to )) (5) as above (1) or (2) The photosensitive resin composition for forming a partition of a light-shielding color filter according to the above aspect, wherein the color filter 4 has a carbon number of 4 to a sensitizing wax composition for forming a color filter partition wall. An ink-repellent (meth)acrylic polymer having a main chain of 6 and at least 7 of which are replaced by a fluorine atom, and having a monomer represented by the following formula (2) The fluorine-containing resin of the monomer unit, cH2=C(Rii)-COO-Y.Rf (2) (Formula t, Rn represents a gas or an organic group having a carbon number of 2 or more, and γ represents a carbon 320324 13 200916852 number 1 to 6 The divalent organic group which does not contain a fluorine atom, and Rf represents the carbon resin of 4 to 6 of the above-mentioned (1) or (7). In the above-mentioned color filter partition wall formation feeling In the resin composition, the component (B) is formulated in an amount of 0.05 to 1 part by weight based on 100 parts by weight of the total solid content of the composition. The sheet is also a light-shielding color filter partition wall according to the above (1) or (2). For forming: a precursor resin composition, wherein the filter and photoresin composition I is formulated with respect to the solid portion 1. The yt parts by weight and the (6) component are respectively 2 to 1. parts by weight and 25 to, light = (1) The method for forming a light-shielding (four) color spacer according to (7), wherein the light-shielding dispersion surface is a carbon black dispersion (9), a light-shielding color filter partition wall, and a light-shielding color filter partition wall shape... At (a) or (7), on the substrate, the composition of the sensitizing tree gambling is applied to the transparent eve, and it is necessary to carry out (a) the ultraviolet exposure device to 3 μm. a film thickness of 1.5 〇〇) is a color filter formed by an inkjet printing method as described above. A port 4 optical filter 〇Ό a method of manufacturing a color filter, having a plurality of pixels At least a method is created on the target substrate between adjacent pixels, and the method has: ', 曰, 日网The color filter of the wall is 320324 ] 4 200916852 (1) a step of forming a fluorine-containing light-shielding partition wall comprising a base resin containing a resin on the support substrate; and (10) cleaning the 水溶液U (four) aqueous solution In the treatment, the halo discharge treatment is selected, and the oxygen barrier wall is removed. The step of cleaning the gas-containing light-shielding support substrate is performed, and the region surrounded by the fluorine-containing light-shielding partition wall is sprayed. a step of imparting ink to the ink to form a pixel; , . . . , ί , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , · 3 ^ ι〇-% ^ The fluorine-containing light-shielding partition wall before and after the pure water washing step is at the top surface, and the reduction ratio of the hydrophobic contact angle is 10% or less. (12) The method for producing a tear and a color device according to the above (1), wherein, in the case of t, a tree-containing fluorene is a copolymer of fluorine-containing (meth)acrylic acid vinegar. In the coloring device of the above (11) or (the effect of the invention), the ink-repellent property of the ink-repellent ink is excellent, and the film is made out of the surface and the pattern shape is good. Not only the surface is rejected, but also after the general cleaning or the passage of time, the surface rejection is maintained. The composition of the partition wall is composed of: == In the method of manufacturing the color cleaner by the process, It is possible to achieve a low cost by locally disposing of the surface-removed ink processing apparatus, and locally provide a material which contributes to an increase in throughput. 320324 15 200916852 [Embodiment] Hereinafter, the present invention will be described in detail. The bisphenol-derived oligomer having two rings == „reactant and ternary=3 雒, 伃3 has a hinge-developable unsaturated group, and the desired one has two rings. In the epoxy compound of the oxypropyl ether group, the epoxy compound represented by the following formula (1) can be mentioned as a parent. " n R, 〇

"OCH2-CH~CH2 - ^ V (1) (However, R and R2 in the formula represent hydrogen hydrazine,

Ri chyle, an alkyl group having an inverse number of 1 to 5, or a dentate atom, X is rri cr, equine-CO-, _s〇2-, -c(cf3)2_, -Si(CH3 ) 2-, -CH2-, -C(CH3)2-, _〇, 丁, +, ^ 3; 2 υ The following 9, 9, base, . , 03⁄4 or non-existent, η An integer of 0 to 1 Ό. 〃 In the epoxy compound having two epoxypropyl thio groups derived from the above-mentioned double genus, (meth)acrylic acid (this is "glycolic acid and/or The meaning of "methacrylic acid" is carried out as 'the epoxy (meth) acrylic acid acid adduct obtained by reacting a polybasic acid or its anhydride in the obtained compound having a trans group as the present invention The (Α)-containing alkali-developable unsaturated-based oligomer is used in 320324 16 200916852. Since the alkali-developable oligomer of the component (A) obtained in this manner has both an ethylenically unsaturated double bond and a carboxyl group, it imparts excellent photocurability to the photosensitive resin composition for forming a color filter partition wall. Excellent developability and patterning characteristics, and the object characteristics of the light-shielding partition walls are improved. As described above, the testable oligomer of the component (A) is preferably derived from an epoxy compound represented by the above formula (1), that is, the epoxy compound is derived from a bisphenol. Therefore, since the alkali-developing unsaturated group-containing oligomer can be understood by explaining the bisphenol type, a preferred specific example will be described by the bisphenol. The bisphenol which can give a preferred alkali-developable unsaturated group-containing oligomer is as follows. Containing bis(4-hydroxyphenyl)ketone, bis(4-hydroxy-3,5-dimercaptophenyl)one, bis(4-hydroxy-3,5-dichlorophenyl)one, bis(4- Hydroxyphenyl), bis(4-hydroxy-3,5-dimethylphenyl)anthracene, bis(4-hydroxy-3,5-dichlorophenyl)sulfone, bis(4-hydroxyphenyl)hexa Fluoropropane, bis(4-hydroxy-3,5-dimercaptophenyl)hexafluoropropane, bis(4-hydroxy-3,5-dichlorophenyl)hexafluoropropane, bis(4-hydroxyphenyl) Dimethyl decane, bis(4-hydroxy-3,5-dimercaptophenyl)dimethyl decane, bis(4-hydroxy-3,5-dichlorophenyl)dimethyl decane, bis (4- Hydroxyphenyl)decane, bis(4-hydroxy-3,5-dichlorophenyl)decane, bis(4-hydroxy-3,5-dibromophenyl)decane, 2,2-dual (4 -hydroxyphenyl)propane, 2,2-bis(4-hydroxy-3,5-dimethylphenyl)propane, 2,2-bis(4-hydroxy-3,5-dichlorophenyl)propane, 2,2-bis(4-hydroxy-3-methylphenyl)propane, 2,2-bis(4-hydroxy-3-chlorophenyl)propane, bis(4-hydroxyphenyl)ether, bis (4 a compound such as -hydroxy-3,5-dimercaptophenyl)ether or bis(4-hydroxy-3,5-dichlorophenyl)ether; or formula (1) X in the above 9,9-fluorenyl 9,9-bis(4-hydroxyphenyl)anthracene, 9,9-bis(4-hydroxy-3-indolylphenyl)g, 9,9-double (4-hydroxy-3-chlorophenyl)indole, 9,9-bis 17 320324 200916852 (4-hydroxy-3-bromophenyl)indole, 9,9-bis(4-hydroxy-3-fluorophenyl)苐, 9,9-bis-(4-hydroxy-3-indolylphenyl), 9,9-bis(4-hydroxy-3,5-dimethylphenyl) • 苐, 9,9- Bis(4-hydroxy-3,5-dichlorophenyl)anthracene, 9,9-bis(4-hydroxy-3,5-dibromophenyl)anthracene, etc.; or further, 4,4'- Compounds such as bisphenol and 3,3'-bisphenol. The developable oligomer of the component (A) can be obtained from an epoxy compound derived as described above, but in addition to such an epoxy compound, as long as a phenol novolac type epoxy compound is observed, or A cresol novolac type epoxy compound or the like which effectively contains a compound having two epoxypropyl ether groups can be used. Further, when the bisphenol is subjected to epoxypropyl etherification, the oligomer monomer may be mixed, but the average value of η in the general formula (1) is 0 to 1 Torr (preferably 0 to In the range of 2), the performance of the present resin composition is not a problem. Further, as the polyvalent carboxylic acid or an anhydride thereof obtained by reacting a hydroxyl group in an epoxy (fluorenyl) acrylate molecule obtained by reacting such an epoxy compound with (hydrazino)acrylic acid, for example, for example, , maleic acid, succinic acid, 'iconic acid, phthalic acid, tetrahydrophthalic acid, hexaphthalic acid, methyl endomethylene tetrahydrophthalic acid, chlorine Chlorendic acid, mercaptotetrahydrophthalic acid, trimellitic acid, pyromellitic acid, etc. or an anhydride thereof; further examples are benzophenone tetracarboxylic acid An aromatic polycarboxylic acid such as biphenyltetracarboxylic acid or diphenyl ether tetracarboxylic acid or a dianhydride thereof. Then, regarding the use ratio of the acid anhydride or the acid dianhydride, a ratio suitable for forming a fine pattern by exposure, alkali development operation may be selected, and further, a ring obtained by reacting an epoxy compound such as 18 320324 200916852 with (meth)acrylic acid The oxygen (mercapto) acrylate may be used singly or in combination of two or more kinds, and may also be reacted with a polyvalent carboxylic acid or an anhydride thereof to obtain a copolymer. The test-developing oligomer of the component (A) may be used alone or in combination of two or more. Further, in the reaction of the epoxy compound with (mercapto)acrylic acid, the reaction of the epoxy (fluorenyl) acrylate obtained by the reaction with a polybasic acid or an anhydride thereof can be carried out by the known method of the above-mentioned Patent Document 6 'but not Specially qualified. Further, in other methods for obtaining the component (A), the ethylenically unsaturated monomer having one or more slow groups is swallowed, and 2) the unsaturated group may be introduced after the branch has polymerization. a monomer mixture of a vinyl group, an acid anhydride group, an epoxy group, and the like, and a monomer mixture of other ethylenically unsaturated monomers, which are free radicals in a solvent in which a peroxide and a chain transfer agent coexist. The copolymer obtained by f-polymerization can be further added to the branched-chain addition of the unsaturated compound of 2) to form a binder resin, and becomes an alkali-developable oligomer having an ethylenic double bond. . • The ethylenic unsaturated monomer having two or more carboxyl groups which can be used as the above monomer mixture, for example, acrylic acid, methyl propyl: acid m «·chloro (tetra) acid, ethenic acid, Cinnamonic acid and other unsaturated;: Γί, maleic anhydride, fumaric acid, itaconic acid, itaconic anhydride, ^ Kang Yuwen, citracose _, mesaconic acid, etc. and the second acid (five) class above the price of unsaturated Dicarboxylic acid (anhydride) and the like. Among them, propylene is beautiful:::: to: such _ _ _ women's unsaturated monomer, can be single; or 320324 19 200916852 another component of the Jingyou monomer mixture 3) other ethylenic unsaturated single • The body may, for example, be an aromatic vinyl compound such as styrene, α-methylstyrene, vinyl anthracene, gas styrene or methoxystyrene; decyl acrylate or bismuth methacrylate; Ester, ethyl acrylate, ethyl methacrylate, propyl acrylate, propyl methacrylate, butyl acetoate, butyl methacrylate, butyl acrylate, 2-hydroxyethyl acrylate, methacrylic acid 2_ Hydroxyethyl ester, phenyl hydrazine acrylate, benzyl methacrylate, methyl acrylate laurel, tetradecyl methacrylate, hexadecyl methacrylate, stearyl methacrylate, methyl, Unsaturated acid esters such as octadecyl ester, methacrylic acid twenty-two vinegar, methacrylic acid twenty vinegar; acetoacetate, mercapto acetoacetate, acetoacetic acid, methyl acrylate Amine propyl vinegar, etc., unsaturated sulphuric acid amine sputum, propylene glycol propylene glycol, methyl acrylate acid propylene vinegar, etc. Saturated (iv) glycidyl esters; vinyl acetate, vinyl propionate, vinyl butyrate, benzoic acid, vinyl vinegar, etc.; ethical methyl bond, ethyl ether ethyl ether, olefin Unsaturated conversions such as propylepoxypropyl ether and methacryloxypropyl propyl ether: cyanoethylene compounds such as acrylonitrile, methyl acrylonitrile, α chloro acrylonitrile, and diacetyl cyanide; Amine, methacrylamide, chloropropenylamine, hydrazine-hydroxyethyl propyl sulfonamide, hydrazine-hydroxyethyl methacrylamide, maleic imine, etc. Class; 1,3-butadiene, isoprene, gas, pentane, sulphur, sulphate, alkene, etc. Among them, methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, benzyl acrylate, methyl propyl methacrylate The 酉 text is better. These other unsaturated monomers may be used alone or in combination of two or more. 320324 20 200916852 In addition, the acid value of the component (A) is determined by the number of mg of KOH necessary to neutralize the sulfhydryl group in the resin. The image is formed at the time of image formation at two times, pattern shape, or hardening. From the viewpoint of the adhesion of the film, Kawasaki 150 (KOH mg/g) is preferred. If it is less than 7 Å, the pattern formation cannot be performed by the developer. Further, when the crosslinking agent is used, the crosslinking with the resin as the crosslinking agent becomes insufficient, and the (four) property is lowered and the organic solvent is dissolved. Bad adhesion, etc. Then, if the acid value exceeds 15 (), the surface roughness during development, the poor development density of the fine pattern, and the hardening: the moisture resistance may become a problem. The ink-repellent (meth)acrylic polymer (8) of the present invention is a black-rejecting agent, and is a polymerization having at least 7 (preferably 9) hydrogen atoms taken by a gas atom = ^ carbon number 4 to 6. The unit has a fluorine-containing (meth) acid compound which refuses to print ink. In addition, a monomer unit having a monomer represented by the following formula (7) can be exemplified. ', CH2=C(Rn)-CO〇-Y-Rf (7) (wherein Rn represents chlorine or a carbon number of 2 or more organic groups, and 丫 represents a carbon number to 6 of a fluorine-free atom-free divalent organic group, A monomer represented by the formula (2), which is a monomer represented by the formula (2), which is a polymer backbone having a "substituent (4)" by acting as a spacer. The right-handed gas base (Rf) has a carbon number of more than 6, although the compatibility of the surface of the ink-repellent ink-repellent product is reduced, and the surface of the gap coating is: ~, and on the other hand, if Rf The carbon number is less than 4 320324 21 200916852, but it is not good because the ink resistance is reduced. . . . > On the other hand, if the "substituent Rn is equivalent to the smaller volume of hydrogen or methyl group, then it is relative to the black matrix. In the calcination, the branched crystallinity of the total gas-burning group having a carbon number of 6 or less is destroyed, and the ink-repellent ink property is lowered after calcination, and the mobility of the main chain is restricted so as to be an organic group having 2 or more carbon atoms. And the maintenance of the ink resistance caused by the branch is caused. At this time, if the Y group of the spacer is 6 or less carbon atoms, the surface of the main chain to the branched perfluorinated base is clear. The ink repellent property after washing or hardening is also maintained. '" As a specific example of the disordered monomer unit to which such an ink-repellent (meth)acrylic polymer can be imparted, there are mentioned: The Rn group is _cH2CH3, CH(CH3)2, -ch2c6h5, -coo-Rm, _CH2C00_Rm (Rm represents an organic group such as an alkyl group, a phenyl group or an alkoxy group, and may also contain oxygen, hydrazine, and fluorine); Rf is -C4F9, -C5Fn, c6Fl3; γ group is _CH2cH2_, _cH2CH2〇_, -ch2ch(oh)ch2o-, etc. Further, the formula of such a fluorine-containing monomer and a non-fluorine-containing monomer is copolymerized. Adjusted to reject the ink (meth)acrylic polymer (B) component. For such a non-fluorinated monomer, general vinegar vinegar, methyl acetonate, styrene derivative And maleic anhydride vinegar, etc. It is preferable to copolymerize with methyl acetoacetate from the viewpoint of compatibility with the testable resin and maintaining ink repellency, and the branched alcohol residue is benzoic acid. The molecular weight, the sulfhydryl group, the adamantyl group and the like are preferably larger, and the ratio of the fluorine-containing monomer unit used for the ink-repellent (meth)acrylic polymer (B) is reduced to 30 m. % (preferably 50 mol% or more) is preferable. If it is less than 30 mol%, sufficient ink repellency cannot be exhibited, and further, at the time of formation of the black matrix and until the application of the inkjet ink Pot 320324 22 200916852 Rejection of ink will disappear. • The weight average molecular weight of the alpha-receptive (mercapto) acrylic polymer, the polystyrene obtained by gel chromatography B = the weight "two sub-set (Mw) must be in the range of 4000 to 20_. If the molecular weight is 400 kn. 00 or less, the ink repellency of the partition forming process is lowered, and the continuation of the refusal becomes difficult. The upper limit of the molecular weight will be delayed; the dissolution of the liquid is not good. Pr The ink-repellent (meth) propylene-polymer (8) is added for the purpose of imparting ink repellency to the surface at intervals, and must be in a range that does not impair the composition of the present invention and other properties of the octa cured product. The component (B) is used in a range of from _ to 2 parts by weight, preferably in parts by weight to 2 parts by weight, based on 100 parts by weight of the total solid content in the resin composition. When the proportion of the composition is less than 0.05 parts by weight, sufficient surface rejection blackening energy cannot be expressed. Conversely, if the weight is 1G by weight, the recording property will be affected. ^ = unevenness: the flatness of (4) is not good. The opposite side is resistant to moisture, and I don't have a good shirt. Further, there is a possibility that the surface roughness of the coating film is increased to deteriorate the surface smoothness. Further, the total solid content of the photosensitive resin composition is shown as the total amount of the component remaining as a solid component after hardening. In the case of a ruthenium monomer having at least three or more ethylene double bonds in one molecule of the component (C), for example, triethylene glycol di(methyl) propyl bismuth dioxime, Tetraethyl alcohol di(methyl) propyl acetoacetate, butane diol di(methyl) propyl benzoate- hydrazine, di-residue propyl tris(methyl) propyl acetonate, tris-methyl ethene tris ( Methyl propionate, pentaerythritol di W) acrylate, pentaerythritol tris (methacrylic acid vinegar, pentaerythritol tetrakis(meth) acrylate vinegar, dipentaerythritol 320324 23 200916852 ketone) propylene i^S9, dipentaerythritol (Meth) acrylate, glycerin = women's IS day, etc.) acetoacetate. These compounds may be used in combination of two or more. A single system which is only a single hard and hard m must be added in a range that does not impair the properties of the composition of the present invention and the substance, preferably a total of 100 weights relative to the components (8), (8), and (C). For the portion, use the component (C) in 15 to 5 parts by weight of the garden. The proportion of the component (c) is less than 15%. Since the proportion of the photoreactive uterine energy group contained in the tree wax is small, the pattern formed by the light is thinner than the target line width, and it is easy to cause =:# m in When the amount exceeds 5 G by weight, the development speed is too fast to reproduce the original line width with respect to the mask. Further, since the developability is deteriorated, there is a concern that the pattern edge becomes uneven and the sharpness cannot be sharpened. The photosensitive resin composition for forming a color filter partition of the present invention is a photopolymerizable compound containing the component (A) or the component (C), and contains photopolymerization as the component (D) in order to harden the ruthenium. The component of the first kd) is irradiated with ultraviolet light (especially 300 to 45 Å) to generate a radical group, and is added to the photopolymerizable compound to initiate radical polymerization to harden the resin composition. Examples of the photopolymerization initiator of the component (D) include diphenyl ketone, Michler's ketone, and n,N-tetradecyl-4,4,diaminodiphenyl ketone. , 4-methyl _4, _didecylamino dipyrylene g, M, _ dioxin ethyl urethane diphenyl ketone, 2 _ ethyl 蒽, phenanthrene, etc.; Benzoin ethers such as methyl ether, benzoin ethyl ether, benzoin phenyl ether; benzoin such as methyl benzoin, ethyl benzoin; 2·(〇·chlorophenyl)_4,5_styl (tetra) dimer, 320324 24 200916852 2-(o-Chlorophenyl)-4,5-di(m-methoxyphenyl)imidazole dimer, 2_(〇-fluorophenyl)-4,5-diphenylimidazole dimer , 2_(〇_foxyphenyl)_4,5-diphenylimidazole dimer, 2,4,5-triarylimidazole dimer, 2-benzyl-2_dimethylamino- 1-(4-morpholinylphenyl)-butanone, 2-trichloromethyl-5-styryl-1,3,4-oxadiazole, 2-trichloroindolyl-5-(p -N-cyanostyryl-3,4-oxadiazole, 2-trichloromethyl-5-(anthracene-methoxystyryl)oxadiazole and other southern methylthiazole compounds; 2,4,6 - ginseng (trichloromethyl) 4,3,5-three tillage, 2_methyl_4, heart/double ( Chloroindyl)-1,3,5-three tillage, 2-phenyl-4,6-bis(trichloromethyl)-1,3,5_ 'three tillage, 2_(4-chlorophenyl)_4, 6·Bis(trichloroindenyl; M,3,5-three tillage, 2-(4-methyloxyphenyl)-4,6-bis(trichloroindenyl)-ns triterpenoid, 2_(4 _Methoxynaphthyl)-4,6-bis(trichloromethylbu), triterpenoid, 2-(4-methoxyphenyl)-4,6-bis(trichloromethyltrimethylene, 2_(3,4,5-trimethoxyphenylethyl)-4,6-bis(dichloroindenyl)_ι,3,5·三u well, 2-(4-methylthiostyryl) -4,6-bis(dichloroindenyl)_1,3,5-trimorphine, etc. Halomethyl_5_三0 well compound, 2,2-dimethoxyl_1,2_diphenyl Burning 4-ketone, 2_fluorenyl.-[Role (methylthiol)phenyl]-2-morpholinylacetone, 2-benzyl-2_2-didecylamino-helium morpholino Photopolymerization initiator such as phenyl]-butanone-1,1-hydroxy-cyclohexyl-phenyl ketone. In addition, it is suitable to use OZME ESTER light from Ciba Specialty Chemicals. Starting agents (〇χΕ01 and 〇χΕ〇2). These photopolymerization initiators may be used alone or in combination of two or more. A compound which functions as a photopolymerization initiator or a sensitizer, but which can increase the ability of a photopolymerization initiator or a sensitizer, in combination with the above compound, may be mentioned, for example, as such a compound. A tertiary amine such as triethanolamine 320324 25 200916852 which is effective in combination with diphenyl ketone. The photopolymerization initiator φ 旱 旱 曰 曰 曰 使用 使用 使用 使用 使用 使用 适合 适合 适合 适合 适合 适合 适合 适合 适合 适合 适合 适合 适合 适合 适合 适合 适合 适合 适合 适合 适合 适合 适合 适合 适合 适合 适合 适合 适合 适合 适合 适合 适合 适合 适合 适合, the speed of the silk will change | · and the degree of damage is reduced 'other - aspect, when more than 2G parts by weight, sensitivity

Too strong, the line width of the pattern is relatively thick relative to the figure. The solid cover is too thick, so the following problems may arise: it is impossible to see the original line and the unevenness of the edge of the pattern with respect to the mask. Can't be sharp. In particular, it is preferable that the light-blocking pigment such as a black organic pigment, a color mixed organic pigment or a light-shielding material of the component (8) is excellent in heat resistance, light resistance, and solvent resistance. Here, as for the black organic (four), for example, peryIene black, phthalocyanine black (C can be (4) = °, mixed color organic pigment, it will be exemplified by red, blue , green, purple, : color, cyan, magenta Wmagenta). Select at least two kinds of pigments for this kind of mouth and black. Examples of the light-shielding material include carbon, oxidized iron oxide, titanium black, aniline black, and phthalocyanine black. Although it can be used in two or more types, it is particularly suitable for carbon black in light-shielding and surface. Smoothness: It is preferable from the viewpoint of good dispersion stability and compatibility with a resin. I or more of the above-mentioned light-shielding pigments may be selected, and if necessary, the dispersion ratio and the dispersing aid may be dispersed in an organic solvent to form a blending ratio of the (E) component of the light-shielding component, relative to the photosensitive layer. The total solid content of the resin composition is 100 parts by weight, which is preferably 25$ lanes (the ratio of Liche "to 60 replacement parts. If less than 25 parts by weight, the light-shielding property will become insufficient. In the case of 320324 26 200916852, the damage of the photosensitive resin which is originally a binder is reduced, and the film formation performance is deteriorated while the development characteristics are impaired. In the composition, a solvent can be used in addition to the above components (A) to (E). Examples of the solvent include alcohols such as methanol, ethanol, n-propanol, isopropanol, ethylene glycol, and propylene glycol. 'α - or stone 'terpine 〇 (terpine 〇 1) and other hydrazines; acetone, methyl ketone, cyclohexanone, N-methyl 2 _ b-pyrrolidone and other ketones; toluene, xylene ^ four Aromatic hydrocarbons such as benzene; cellosolve (4) losoWe), methyl cellosolve Ethyl cellosolve, carbitol (carbit〇1), methyl carbitol, ethyl carbitol, butyl carbitol, propylene glycol monomethyl ether, propylene glycol monomethyl shunt, two Propylene glycol monoethyl alcohol monoglyceride: B-transfer early ethyl test, etc.; acetic acid B, acetic acid butyl vinegar, cellosolve acetate, ethyl cellosolve acetate, butyl cellosolve Acetate, carbitol acetate vinegar, ethyl carbitol acetic acid _, carbamide alcohol acetate vinegar, propylene: monomethyl ether acetate, propylene glycol monoethyl ether acetate vinegar and other acetic acid,. By using such a compound to dissolve and mix, it is a uniform solution-like composition. Further, in the photosensitive composition for forming a color filter partition wall of the present invention, a coupling agent, a hardening accelerator, and heat can be prepared as needed. Additives such as polymerization inhibition, = tree, solvent, leveling agent, antifoaming agent, etc. The coupling agent is suitable for use in the heat-resistant and dense substrate of the substrate and the transparent substrate. a methacrylic fluorenyl group or an isocyanate group, which has an alkoxy group compound. And ancient,,:

Ό 口 J 320324 27 200916852 f f Benzene bismuth, benzodiazepine monomethyl sulphate, 焦 梧 〇 〇 〇 〇 11〇 1), • ▲, and butyl phenol, phenothiazine (phenothiazine) Examples of the plasticizer include dibutyl phthalate, dioctyl phthalate, and triterpene I Sg. Examples of the filler include glass fiber and Shi Xi. Stone, 'mica, oxidized Shao and so on. Further, examples of the antifoaming agent and the leveling agent include a compound of the genus, a fluorine-based, and a propylene-based compound. ^In particular, when adding a leveling agent, an antifoaming agent, etc., which has an improved surface property, and a material having a surface activity, it must be added to the extent that the surface of the surface after the hardening is not damaged. Preferably, it is added in a concentration relative to the total solid content of the composition less than the content of the ink to be rejected. The photosensitive resin composition for forming a filter and a separator of the present invention is a component of the above (4) to (8) or a component and a solvent as a main component. In 2, the solid content of the solvent is removed (the solid part comprises a solid form after hardening; the second part is more preferably 9 〇 Wt% or more. The amount of the solvent varies depending on the formula and depends on the target viscosity, but is expected to be In the range of 9 〇wt%. π Mainly, the color filter spacer of the present invention is formed by using the above-described 遽== 树脂 resin composition of the present invention and by lithography: First, the photosensitive resin group: the surface of the substrate is cured by drying the solvent ((four) baking), and then the light mask is placed on the surface of the substrate, and the ultraviolet light is irradiated to expose the film to the unexposed portion by using the H-liquid. For baking, it is formed as a post-dried tan. 320324 28 200916852 For the substrate coated with the solution of the photosensitive resin composition, it can be used in a glass-cut, transparent film (for example, polycarbonate, polyethylene terephthalate). , such as polyethersulfone, etc., vapor-deposited or patterned transparent electrodes such as IT 〇, gold, etc. - 曰 曰 将该 将该 将该 涂布 涂布 涂布 涂布 涂布 涂布 涂布 涂布 涂布 涂布 涂布 溶液 溶液 溶液 溶液 溶液 溶液 溶液 溶液 溶液 溶液 溶液 溶液 溶液 溶液 溶液In addition to the spray method, you can also use the ❹(4) machine: Knife Coating Machine Any method, such as land coater), or a method of rotating the machine. According to the method (4), the thickness of (4) is removed by (4) (pre-supplied by the way 'to make it clear. View the grilled n by oven, heating plate, etc. The heating temperature and heating time of prebaking are appropriately selected according to the use of Lobe, for example, from 8〇 to 12〇1:

minute. q i芏1U ^ Exposure after prebaking is performed by an exposure machine, and only a portion of the resist corresponding to the pattern is exposed by masking the exposure first. The exposure machine and the exposure conditions thereof are appropriately selected, and exposure is performed using ultra-high pressure mercury, high-pressure water wire, metal-gas lamp, and long-distance source light source to photoharden the resin composition for black resist in the coating film. The alkali _ after exposure is for the purpose of removing the unexposed portion of the seeker: the second broad form forms a desired pattern by the development. It is suitable for the alkali development Γ: for example, a metal or a soil-measuring metal dihydrate liquid, a metal hydroxide hydroxide, etc., but especially using sodium carbonate, acid Carbonate such as potassium or lithium carbonate is 0.05 to 3% by weight of the aqueous solution of the test solution. Precision formation of fine 320324 29 200916852 by a developing machine or ultrasonic cleaning machine sold by a surface, after being developed in this manner, heat treatment is performed at a temperature of 160 to 250 ° C and for 2 Torr to 1 Torr ( After baking). This post-baking is carried out for the purpose of improving the adhesion between the patterned light-shielding film and the substrate. This is the same as prebaking, and is carried out by heating in an oven, a hot plate or the like. The patterned light-shielding film of the present invention is formed by various steps of the photographic method. The pre-baking and the exposure step of the partition wall forming step of the above, and the fluorochemical resin are shrunk by the interface activity of the partition wall on the top surface of the partition wall. In the support substrate of the partition wall formed as described above, for example, the pure water contact angle of the support substrate I = face 1 &amp; other than the portion where the partition wall 2 is formed is almost 30 degrees, and the atmosphere is further Medium == causes the water contact angle to increase with time, as a result of which: for the ink jet device, the ink is dripped, and in the present invention, the cleaning step of the K. washing process, (4) the β cleaning step, due to the inter-table Support substrate for the next wall. The fluororesin is printed on the substrate 1 other than the portion of the surface containing the partition surface/: and the side surface 2b of the partition wall which forms a partition wall, and at the same time, the intermediate p and a are ordered. Hydrophilic or ink-repellent treatment. On the other hand, / side ® 2b is hydrophilized or pro-labeled fluoropolymer, and can be: the top surface 2a of the partition wall, because it contains the same as in the t, +, and the main artificial inhibition of pure water contact angle Reduced. In the above π washing step, the contact angle of the pure water of the main top surface h. Heart, the n 1 / of the partition wall before the washing step, the top of the partition wall after the washing step 320324 30 200916852 2a pure water contact angle angle reduction rate [(αι~α) two..., so that cleaning The pixel formation step (3) formed by the connection method before and after the step = to the top surface of the partition wall, and the black mark can be made into a good pixel. ‘The earth is indeed! The specific example of the method of returning to the pixel can be exemplified by the treatment of the aqueous solution washing, the excimer laser cleaning, the corona discharge gas, and the plasma processing. One or more types of processing are configured to be 'but a strong magnetic field is applied to the discharge portion, and it is also possible to generate a ^. In the case of the introduction gas at this time, if it is necessary to remove the gas such as gas, ammonia, or nitrogen by the surface #2 H, it is possible to control the top of the partition wall to lower a and the ink resistance of the mutual print, and give better results. Further, in terms of the electric method, low-frequency discharge, high-frequency discharge, and microwave discharge can be used. Further, conditions such as pressure, gas flow = electric frequency, and processing time at the time of plasma treatment can be arbitrarily set. For example, under pressure! When she left the squat, she achieved good results by the oxygen flow rate of electricity 1 曙 2 2 = gas / pulp treatment. In addition, under atmospheric pressure, the oxygen plasma is continuously treated by 80ccm in the oxygen machine, the helium flow rate 101/min, the electric power 300W, the substrate distance lmm, the transfer speed of the sub-plate, or by the gas. The same result can be obtained by continuous treatment of A plasma with a flow rate of ^OOccm, a helium gas flow rate of 1 〇 1 min, and a support substrate transport speed. It is very effective from the viewpoint that the atmospheric water % water is vacuumed in the treatment chamber and can be easily achieved by the same 320324 31 200916852 surface modification. In the other side, the cleaning solution of the aqueous solution can be exemplified by using a G.G4% to 〇, a 1% aqueous solution of hydrogen hydroxide or an aqueous solution of sodium hydroxide, etc., so that the support substrate having the partition walls is formed. Dip or spray. Although the processing time varies depending on the processing conditions, for example, in the case of WOH, it can be carried out for about 3 to 8 seconds, and in addition, for the UV cleaning treatment, for example, it can be exemplified as used in front of the substrate. The treatment of the cleaned ultraviolet rays is irradiated to form a support substrate having two spacers. As long as the uv cleaning treatment is performed for about 50 〇s 2000 mJ, it is possible to maintain the ink repellent property only on the top surface 2 a of the partition wall, the surface U of the support substrate other than the portion where the partition walls are formed, and the side of the spacer 2 2b is subjected to hydrophilization or photo-inking treatment. Further, in the case of the quasi-molecular laser cleaning treatment or the corona discharge treatment, the treatment can be performed in a short period of time. However, it is less likely to suppress the decrease in the blackness of the partition wall top portion than the UV cleaning. ^ The cleaning treatment as described above is for removing the surface of the support substrate other than the partition wall/the burr from the support substrate 1 having the partition wall 2 formed of the black resist containing the fluorine resin. And the treatment of the ink repellency of the π of the partition wall, whereby only the ink surface of the top surface 2 & 2 of the partition wall is left and the ink is applied to the pixel forming step by the ink jet method. In the area surrounded by the partition wall 2 in (), the ink applied to the top of the partition wall returns to the self-repairing function in the area (inside the pixel), and the full-fledged function 'further' in the area It can be fully and evenly dispersed to prevent phenomena such as "white spots". 320324 32 200916852 w After the cleaning step (2), the ink is applied to the ink by the θ helium printing method (inkjet method) surrounded by the fluorine-containing light-shielding partition walls. There is no particular limitation on the ink jet method to be used at this time. It can be used in a filter or a general use method. The ink jet head is preferably made of dust (8) (XAAR or SPECTRA) in terms of durability against the organic solvent and the accuracy of the discharge amount, and is filled in the ink in the pixel surrounded by the partition wall, It is preferable that the film thickness after drying is almost the same as the thickness of the partition wall. That is, for example, from the viewpoint of the ink solid content of 10 to 33% ^, if the thickness of the partition wall is 2 _, the amount of ink to be filled is required. Further, the color filter 11 of the present invention is composed of a photosensitive wax for forming a partition wall. For example, if the light-shielding color filter partition wall is formed by the above-described method or the like, the various means 4 form a predetermined color pattern by the pixel, thereby obtaining 遽. In particular, the filter partition formed by using the photosensitive resin composition of the present invention is excellent in adhesion to the substrate and excellent in ink repellent at the same time. Therefore, it is suitable to borrow from the obtained light-shielding color filter partition wall. A color filter is obtained by forming a pixel by an inkjet printing method. (Embodiment) Hereinafter, embodiments of the present invention will be described based on examples and comparative examples. The formulation components used in the production of the black resists of the examples and the comparative examples are as follows. (Adjustment of developable oligomer) &lt;Synthesis Example 1 &gt; Epoxy compound (epoxy equivalent will be derived from 9,9-bis(4-hydroxyphenyl)fluorene 320324 33 200916852 258) and 1.01 equivalent The acrylic acid and the amount of catalyst (〇〇5 equivalents) of tetraethylammonium bromide were heated together at 120 C for 12 hours, and then diluted with propylene glycol monomethyl ether acetate to obtain an epoxy acrylate compound solution (solid concentration = 5 〇 weight%). Adding biphenyl_3,3,4,4,4-tetracarboxylic acid* dianhydride U.lg, tetrahydroxy phthalic anhydride 5.76g, and then adding propylene glycol monomethyl ether oxime relative to 100 g of the solution The solid content concentration was 56 5%, and the mixture was heated for 4 hours to obtain an alkali-developable unsaturated group-containing oligomer solution (A-1, acid value: 55.0 mgK〇H/g). <Synthesis Example 2> In addition to the epoxy compound used in Synthesis Example 1 and having an epoxy equivalent of 288 or more, a solution containing an anthracene-based unsaturated group was obtained in the same manner as in Synthesis Example 1 (IV). The concentration of 5 is acid value of 56 mgKOH/g). Shell <Synthesis Example 3> In Synthesis Example 4, except that biphenyl _3, 3, 4, 4, _4 was W and tetra-terephthalic anhydride was 6.9 g, And the silk (4) has an acid value of 55.5 mg K 〇 H / g).嶋 度 S S S S S S S S S S S S S S S S Equivalent epoxide (epoxide each (_3,3,4,4,-tetradecanoic acid_hepatic main) to make biphenyl; hard open-anhydride is 1〇·7 four others Same as the synthesis example, soil, a formaldehyde anhydride 5.5g unsaturated oligopolymer dissolved, night (A work, 仃 synthesis 'obtained with alkali-developed' liquid (Α-4, solid concentration concentration 5%, acid The price is 53m 320324 34 200916852 KOH/g). _ The epoxy compound (ring 'oxygen equivalent 258) having 9,9-bis(4-hydroxyphenyl)fluorene in the skeleton, and 2,2-double in the skeleton ( The epoxy compound of 4-hydroxyphenyl)propane (epoxy equivalent weight 240) is mixed in a ratio of 3 to 1 by weight, and biphenyl-3,3',4,4'-tetracarboxylic dianhydride is 12.0 g and 6.2 g of tetrahydroxyphthalic anhydride were carried out in the same manner as in Synthesis Example 1 to obtain a solution containing an alkali-developable unsaturated group oligomer (A-5, a solid concentration of 56.5%, an acid value of 57.2 mg KOH). /g) / (Adjustment of Repellent Ink (Meth) Propylene Polymer) &lt;Synthesis Example 6&gt; Repellent Ink B-1 In a reactor equipped with a 5 liter internal volume of a stirrer, 2MCA-bCF4 (352g), IBMA (43.4g), GMA (14.2g), MMA (8.6g), and a polymerization initiator V-70 (8.8g) were placed. The chain transfer agent 2-ME (4.4 g) was added to PGMEA in such a manner that the solid content concentration became 40 wt%, and the mixture was stirred under a nitrogen atmosphere while being polymerized at 40 ° C for 18 hours. After cooling, the solid content was t. The concentration of the coating was 20 wt% in the PGMEA dilution, and the ink-repellent ink B-1 solution was obtained. The weight average molecular weight of the ink-repellent ink B-1 was 7,300. However, the weight average molecular weight was obtained by using THF as a developing solvent. <Comparative Example 7 to 13 &gt; In the synthesis of the ink-repellent ink B-1, the amount of the raw material was changed in the same manner as in Table 1, and the same manner was obtained. The inks B-2 to B-6 and the resin solution b-Ι (solid content concentration: 20% by weight) were rejected. Further, the unit of the numerical value of each component shown in Table 35 320324 200916852 1 was "g". (Adjustment of (meth) propylene polymer for comparison) 'Synthesis Examples 14 to 15> Synthesis of methacrylic acid by the same synthesis method as used in Synthesis Example 6. The acid isodecyl ester copolymer solution 'obtained a-Ι and a-2 (solid content concentration 36.7 wt%) ° The raw materials were formulated together and shown in Table 1. Here, the abbreviations of the compounds mentioned above and Table 1 Displayed under I.

2MCA-bCF4 : CH2=C-CH2C00-CH2CH2CF2CF2CF2CF3 I C00-CH2CH2CF2CF2CF2CF3

2MCA-bCF6: CH2=C-CH2COO-CH2CH2CF2CF2CF2CF2CF2CF2CF3 I

C00-CH2CH2CF2CF2CF2CF2CF2CF3 2NICA-HbF4 · CH2-C—CH^COOH

I, coo-ch2ch2cf2cf2cf2cf3 2MGI-EtCF4: CH2=C-Cl G 1 coo-gh2ch2cf2cf2cf2cf3 2MCI~EtCF6: CH2=C-Cl

I coo-ch 2ch 2 cf 2 cf 2 cf 2 2 2 2 -HEMA: Methylpropionic acid 2-Ethyl acetate 320324 36 200916852 GMA : Glycidyl methacrylate MMA · Methyl methacrylate

BzMA: phenyl decyl methacrylate V-70 : 2,2-azobis(4-methoxy-2,4-dimercapto valeronitrile) 2-ME : 2-indole ethanol Table 1 ί a~2 1 o 108.51 17.21 :35.2] 00 CO i 7000] (ΰ oi 86.8; : 14.2 丨L 25.8: L. .35.3⁄4 CO 00 : 8300: -Q : 213 : L 43.4; : 17.2: i 35.2: 00 CX ) — : 6000: B-6 i : 272 : ί—— : 24.2: CO CO CO 00 inch: 7500 B—5 : CM cv. i 43.4; : 24.2: to CO 00 σό tJ* : 6500; B—4 : 158 ! L ———— Office: : 17.2: 00 CO — : 6300 B—3 : 226 : : 65.1; : 14.2: 00 CO : 6000; :B-2 ; ; 493 i L . 43.4; : 14.2: &lt;〇CO CO 00 inch: 110001 t—CO CM in CO I_______43-4: ί__________14,2' CO CO CO CO inch 7300 i2MCA~bCF4 !2MCA-bOF6 | £ &工&lt; O CM &lt; I u_ _Ci- CF4 I I2MCI-CF6 I jCFnMA | liBMA | 12-HEMA | SGMA | SMMA I [BzMA | JV-70 52-ME 屮&lt;R Bl· _ w 37 320324 200916852 (Photosensitive resin group for partition wall formation for color filters) &lt;Examples 1 to 19 and Comparative Examples 1 to 4&gt; 'First, components (B) to (E) other than the component (A) were mixed at a ratio (parts by weight) shown in Table 2, and decane was added. To the coupling agent s_51 (manufactured by Shin-Etsu Chemical Co., Ltd.), 0.23 parts by weight (component F) was added together with propylene glycol monomethyl ether acetate so that the solid content concentration was 20% by weight. Next, the component (A) was added in the weight part shown in Table 2, and the Moon Liquid' was further added with 5% by weight of the Nightmare Surfactant 557 (manufactured by Kao) (G-2 component) (only in Comparative Example 4) As an ingredient). Subsequently, a 2 μm η polypropylene film filter was used under pressure filtration at 2 kg/cm 2 to prepare a photosensitive resin composition for forming a color filter partition. In Table 2, in (A) component and () component (), the s weekly ratio with respect to the total solid injury is shown in wt%. The blending ratio for the component (E) is shown in other barriers relative to the full solids (pigment/full solids) wt〇/0. 320324 38 200916852表2 m cn 14.3 ,2.00 ! 2.02 1 1.21 CO CO 1 0.23 1 0.005 CO CO 〇〇〇〇〇C0 esi S to CO s CO m CO 14.3 1.00 2.02 1.21 to CO i 0.23 ! 0.005 w CO 0 0 〇〇〇CO 103 eg ΙΓ5 100 wr* 14.3 , 2.00 I 1 2.02 I n CO [0.23 | | 0.005 I nn 〇〇〇〇〇CO ci 丨一丄〇—2—” lf5 tn S CO in to 14.3 L. 1^0 1 ί 2.02 IL Ui I CO CO 1 0.23 1 1 0005 I ro CO 〇〇〇〇〇05 eg o &lt;N in L_ loo.. sm σ) 〇d 丨[00__I L.1.26...I Ι__1·26_ | O l〇1 0.23 1 [0.005 | O in 〇〇〇〇〇CO CO 1 100 s I 100 wear inch 10.8 I i 1.00 1 L 1,53 . | L_1^g__ 1 Fen 023 1 1 0.005 i 〇〇〇〇〇cn dos &lt;n cn ol〇CO 14.3 I 1 4.00 | 1 2.02 1 丨1.26 | CO nt 0.23 1 Γ 0.005 i fO CO 〇〇〇〇0 &lt;M cj s CVJ in Oi 〇5 II 14.3 | L-200 I 1 2.02 1 I 1-26 | n ¢0 | 0.23 1 Γ 0.005 l CO C5 〇〇〇 〇〇eo 〇io C\J tr&gt; os ο 15.3 | lL〇〇" 1 2.16 I U-_26 1 1 0.23 1 1 0.005 i &lt;-5 CO 〇〇〇〇〇CO g CM kO I 102 s σ&gt; 15.3 | , 1.00 IL New Zealand.1 Γ.1.261 Another 1 0.231 1 0.005 1 〇〇〇〇〇cn csi o σ&gt; Oi 骂09 13.4 I 1.00 I 1 2.53 1 2 C5 CO 丨023 j 1 0.005 | CO c〇 〇〇〇〇〇« csi s CM msr*-&gt; 13.4 | 1.00 I ί 2.53 J l_Ui" CO CO 1 0.23 1 1 0.005 1 CO CO 〇〇〇〇〇CO 04 o 呑σ&gt;&lt;n&lt;〇 CD 13.4 I , 1.00 I r_2, 53 1 丨丄 2丄J o C9 f 0.23 | Γ0.005 1 CO CO 〇〇〇〇〇CO csl CO σ&gt; to to m 13.4 | too I 1 2·53_..1 ί 1-21 1 eo ¢0 Γ0.23Π 1 0.005 ! CO Λ 〇〇〇〇〇oi o CM lO I 100 s 14.3 | LAPP" I 2.02 1 L 1.21 I CO ro 1 0.23 1 1 0.005 1 CO CO 〇〇 〇〇〇n (N CO Oi capacity (£&gt; CD wins CO 14.3 1 1.00 I Γ 2.02 1 I J--21 J CO CO I 0.23 ! 1 0. 005 1 CO c〇〇〇〇〇〇CO c\io I 100 s CM 14^1 1.00 I ΓΤ.02Ί I 1.21 I CO 1 0.23 1 1 0.005 1 CO CO 〇〇〇〇〇eo s lO lO S fO in Ϊ 14.3 I r·» &lt;d CO l 1,00 I ! 2.02 1 I 1.21 fO CO I 0.23 ! I 0.005 : o CO 〇〇〇〇〇CO c-ί 丨水,100 |3CA | 52 O ? in Cd in &lt; S in to 1ft N &lt; ? LO &lt;d lO CO in &lt;d lO &lt; ? in to \a LD a-2(36.7%) | B-1 (20%) I B-2 (20%) | ? o CNJ ? CD B-4 (20%) | B-5 (20°/〇) 1 B-6 (20%) i § Ja 5 lC-2_ CO 1 〇[D-1 I ID-2 1 I ___J [Gr2___I ί letter \ 实瑶* IBCA | A component B component C component D component &lt;R constant UJ chain ll. G component ti residual m Μ 4 electric silver hides tearing silver! 3 C. EQ 〇 Contact a contact Shaw (after 1 week).伥·r#%lslg()w “衾染囫如\实埯”,令嘀 (5,令哒(V):坊39 320324 200916852 (is inch m CO τ—· CD &lt;N CO c〇CO o Τ Ο CO o 〇〇〇〇〇&lt;N oi O) CD o CO m CO σϊ τ— ο ovi CO ο CO co CNj r— CO ΓΟ CO CM OL〇oo CO CO XXXXX cvj s T—in in or ·^· S Μ Μ CO σ&gt; ο q 00 ο CO τ-· C^J CO CO CO CM dgoo CO ◦ 〇 XX 〇X CNJ cvi σ&gt;&lt;〇〇口Ϊ±ί CO σ&gt; r- · ο CO ο CO c\[ r * CO ro CO C4 d to od CO CO 0 XX 〇CM cvi c〇00 CO c〇CO T-* Here, the manufacturing facilities of the photosensitive resin compositions of the examples and the comparative examples The compounding ingredients used are as follows: A-6: propylene glycol monomethyl ether acetate solution of acid needle polycondensate of acrylic acid epoxy ester having a burial skeleton (resin solid concentration = 56.1% by weight, Nippon Steel Chemical Co., Ltd.) Company-made, trade name V259ME). A-7··weight average molecular weight 30000, acid value N-ethyl maleimide/mercaptoacrylic acid/mercapto acrylic acid benzoquinone Copolymer of propanol monodecyl ether acetate solution (resin solids concentration = 36.7 wt%) (N-ethyl maleimide · methyl methacrylate: benzyl methacrylate 2 29 : 20 : 5 lmol%) (Μ : a mixture of dipentaerythritol hexaacrylate and dipentaerythritol pentaacrylate (manufactured by Sakamoto Chemical Co., Ltd., trade name DPHA). C-2: dipentaerythritol tetrapropyl acrylate ( Co-Rong Chemical Co., Ltd. (commodity name ΤΜΡ-Α). C-3: Trihydromethane propane tridecyl acrylate (Kyoei Chemical Co., Ltd. 40 320324 200916852, trade name PE-4A). Dl: OXE-01 (manufactured by Ciba Specialty Chemicals) D-2: OXE-02 (manufactured by Ciba Specialty Chemicals) E-1: carbon black concentration: 20% by weight, polymer dispersant concentration: 5% by weight of propylene glycol monodecyl group Ether acetate dispersion (solids 25%). F-1 : decane coupling agent S-510 (manufactured by Shin-Etsu Chemical Co., Ltd.). G-1: fluorine-based surfactant MEGAFAC F-470 (manufactured by Otsuka Ink Printing Co., Ltd.). G-2: lanthanide surfactant SH3557 (manufactured by Kao) The film thickness of the photosensitive resin composition for forming a color filter partition obtained in the above Examples and Comparative Examples was changed to 2.1 after baking with a spin coater. The film was applied to an i25 mm x 25 mm glass substrate and prebaked at 80 ° C for 1 minute. Thereafter, on a dry coating film having an exposure gap adjusted to 80 μm, a negative mask of iine Space = 2 〇 pm / 20 pm was covered and irradiated with an ultrahigh pressure mercury lamp having an I illuminance of 30 mW/cm 2 at 100 mj/ The ultraviolet light of cm2 is used for the photohardening reaction of the photosensitive portion. Then, the exposed plate is subjected to a pressure-exposure of IKgf/cm2 for 30 seconds or 8 seconds at 23 C for 30 seconds or 8 seconds, and a spray of water of 5 kgf/cm 2 is applied, and the unexposed portion of the coating film is applied. The pixel pattern was formed on the glass substrate by removal, and then subjected to hot post-baking at 23 ° C for 30 minutes using a hot air dryer. The black moment estimation items and methods of the examples and comparative examples are as follows. The film thickness of the spoon is: using a probe type film thickness meter (Tokyo Precision Co., Ltd., trade name Surfc developability, and observing the developed pixel pattern with a microscope, the peeling of the substrate or the edge portion of the pattern cannot be confirmed. The disability is not recommended. 320324 41 200916852 is 〇&lt;good&gt;, it is confirmed that the above phenomenon is evaluated as bad>. Surface roughness of the coating: development, surface roughness of the coating after thermal calcination (Ra The value of less than 150 A is evaluated as 〇 &lt; good &gt;, and it is estimated to be 乂 &;; bad > above 15〇a. Pattern adhesion: It is not possible to confirm the peel of the 20μπι pattern in the peeling test as 〇&lt;; Good &gt;, confirmed that the peeler was evaluated as χ &lt;Bad&gt;. pct Adhesiveness: The pattern was formed by post-baking, and was carried out under conditions of 121 〇, 100% RH, 2 atm, 24 hours. After the PCT (Pressure Cooker Test), a transparent tape was attached to the 2〇μιη pattern portion to perform a peeling test to evaluate the pattern adhesion. OD measurement. After the baking, the coating film of 2·1 μm was used, and the large-sized electron was used. OD § ten determination 'and remember The value of 〇d is 1 μηη. Contact angle measurement Π 由 The same method is used to form a black square 10mmxl 〇mmx2 1μηι on the glass substrate after development. On the black coating film The static contact angle was measured by carbitol acetate vinegar (BCA). Further, the black coating film was placed at 23 ° C under 5 G% humidity for a week, and then statically connected. The above results were performed in either of the examples. It satisfies the characteristics of the partition wall as a light-shielding color reader, and the static contact angle is in water, butyl carbitol: acid S is in the middle of 'the other thing, even if it is OK _, Tian L&lt;&quot; *, put 1 Zhou has hardly observed any situation that has caused you to drop. On the other hand, in Comparative Examples 1 and 2 using a 妒 取 , , , , , , , , 比较 4 4 4 比较 比较 比较 比较 比较 比较 比较 比较 比较 比较 比较 比较 比较 比较 比较 比较 比较 比较 比较 比较 比较 比较 比较 比较 比较 比较Magnetic v. v. Even if the ink-repellent ink is added, the compatibility is insufficient to make it into the deterioration of the developability, the change of the surface roughness, or the plate making in the comparative example 320324 42 200916852 _ the length of the branch length There is a problem with the characteristics. In comparison, in Example 4, the degree of surfactant is not A sufficient ink repellent property was obtained, and a tendency to decrease was observed after being left for one week. <Example 20> - Using the resin composition obtained in Example 1, the opening portion %〇Mmx10 (^m and BM line 3) was formed. 〇μιη, a matrix of film thickness 2. After that, after treatment in an oxygen atmosphere piezoelectric slurry for 3 seconds, it was treated in CF4 atmospheric piezoelectric slurry for 3 seconds. Water or butyl carbitol acetic acid was used on the black coating film. Vinegar (BCA), when measuring static contact angle, shows 1GG. 50. . The viscosity was injected into the black matrix using an East TEC inkjet head. 9^尔, solid red, blue, and green ink with a concentration of 2〇%, and baked at 23〇c, forming a filter and a color filter. The resulting filter and color filter have no ink color mixing in adjacent areas and are good color filters. (Production of color filter) &lt;Preparation Example 1&gt; Black Resistant BKd A1 of 1 part by weight of A1 (solid content concentration of 5 5 Å / small 4 2 parts by weight = A-7 (solid content concentration: 36 7%), 2 parts by weight of u by weight X and 33 parts by weight of El (carbon concentration: 20%), and then adding propylene glycol alone with the sho singer s_51 〇 (Shin-Etsu Chemical•I 0.23 parts by weight in such a way as to become 20% Mercaptoether acetate vinegar, then added/added to the fluororesin Β·1 solution obtained above (solid content concentration 20%) 1 part by weight surfactant SH3557 (Kao) made by weight. The polypropylene film made by the liquid is filtered at a pressure of 2 kg/cm2 to modulate the black resist BK-1. 320324 43 200916852 • <For example 2> Black resist ΒΚ-2 In addition to the fluororesin B —丨 Solution $. Example 1 is carried out in the same way, and it is prepared to modulate her, &quot;&gt; black resistance 2: black resist 2. - In addition to fluororesin Β·1 滋:,, worry, day 4 cases 1 were carried out in the same manner, except for the amount of II, and the modulation &lt;modulation example Μ色二;: black resist 孤3. Γ ^^^^^^^^^^^^^^^^^^^^^^^^^^^^ The dressing is performed in the same manner as J1, and 骅&lt;modulation example 5&gt; black resist melon 5 is again ~ and the sword is seen 4. The same is the case: liquid addition °, 1 part by weight, and megafac卜. 2 parts by weight, in place of 3557 (Kinghua) 0 005 -βΚ.6 〇, in the same manner as in Example 1, to obtain a black resist [Example 21] The black matrix obtained in Example 1 BK], after coating with a spin coater on a glass plate, 2.1 μΠ1, coated on a 125-125 surface, and C was pre-baked for 1 minute. Thereafter, the exposure was adjusted to 150 μm. On the coating film, a negative mask with a m line width of μπι and an opening of 70x210_ is used, and an ultraviolet light of 3 〇 m2 is used to illuminate the ultraviolet light of the ah/coffee 2 ς 320324 200916852 Photohardening of the photosensitive portion Next, the exposed coated plate is subjected to a pressure shower development of lkgf/cm2 for 60 seconds or 80 seconds at 60 C or a pressure of 5 kgf/cm 2 under a pressure of 0.05% potassium hydroxide aqueous solution, and the coating film is not exposed. Partial removal to form a pixel pattern on a glass substrate, after which a hot air dryer is used in Mo C After 30 minutes of hot post-baking, a partition wall having a film thickness of 21 μm was formed. The pure water contact angle of the top surface 2b of the light-shielding partition wall at this time, and the pure water contact of the surface u of the glass substrate forming the partition wall were measured. In addition, the measurement of the film thickness was performed using a probe type film thickness meter (manufactured by Tokyo Seimi Co., Ltd., product ^^urfcom). Further, the contact angle was measured by measuring the static contact angle of the glass water on the partition wall forming substrate having a width of 2 and the 1 mm wide (10) thick black frame formed on the same substrate and around the partition pattern. Next, the supporting substrate on which the partition wall is formed is subjected to various conditions of oxygen pressure of 8 Pa V for 3 seconds, and the parallel plate type plasma processing beam is subjected to a plasma i-side cleaning treatment (cleaning step). As shown in Table 3, there is a decrease in the pure water contact angle bath of the top surface of the light-shielding partition wall after the lowering (the L06%). On the other hand, in clear: the pure water contact angle of the surface U of the glass substrate is not reached. In addition, 'the use of Toshiba TEC made black enamel, the rear of the support substrate is surrounded by f σ in the above-mentioned cleaning step &quot; surrounded by the area (in pixels), ❹ 9mPa.sec, solid concentration, red, ambition ) He entered the viscosity. (10) Post-row baking to form a color filter. This; whether the interface between the partition wall and the ink produces a color drop = color and the use of a microscope before use, to observe 320324 45 200916852 light transmission, 50 times magnification (〇: good, bad), as shown in the table, No color mixing or white spots were observed. When the cross-sectional observation was further enlarged, it was confirmed that the ink was adhered to the side surface of the partition wall in a flat shape. [Examples 22 to 24] ^ A partition wall was formed on the support substrate in the same manner as in the above-described embodiment j except that the black resists bk_2 to 4 modulated in the above-mentioned adjustment examples 2 to 4 were used (Example 2) BK-2, Example 1 bk_3, and Example 4: BK-4), after which an oxygen plasma surface treatment was applied to evaluate the pure water contact shaw of the predetermined portion. Further, a color filter was formed in the same manner as in Example 1 for each of the support substrates for the washing step, and the color mixture and the white spots were evaluated. The results are shown in Table 3. [Comparative Examples 5 to 6] A partition wall was formed on the support substrate in the same manner as in the above-described Example except that the black resists BK_5 to 6 modulated in the above-described adjustment examples 5 to 6 were used (Comparative Example 5: BK-5, Comparative Example 6: Βκ_6), after which an oxygen plasma surface treatment was applied to evaluate the pure water contact angle of the predetermined portion. In addition, each support substrate ’ after the cleaning step is the same as the embodiment! The enamel and color are formed in the same manner, and the color mixture and the white point are evaluated. The results are shown in Table 3. It can be seen that the pure water contact angle of the top surface 2a of the light-shielding partition wall is remarkably lowered as compared with the results of the examples by either of the oxygen plasma treatment. 320324 46 200916852 Table 3

[Comparative Examples 7 to 9] In Examples 21 and 22 and Comparative Example 6, the support substrate on which the partition walls were formed was not subjected to the oxygen plasma treatment, but the ink was poured by the ink jet apparatus. At this time, the spreadability of the ink in any of the regions (inside the pixels) surrounded by the partition walls is poor, and in particular, white spots are observed in the corners of the pixels. Further, when the cross section is enlarged, the thickness of the ink near the side surface of the partition wall is made thin, and it is not sufficiently adhered to the partition wall. [Examples 25 to 28 and Comparative Examples 1 to i η (UV cleaning) Instead of the oxygen table cleaning performed in the respective Examples 21 to 24 and Comparative Examples 5 to 6, the UV of the ultrahigh pressure mercury lamp was performed for 30 seconds ( UV) cleaning, and &quot;evaluate the pure water contact angle at the intended location. Further, a color filter was formed in the same manner as in the example using each of the substrate substrates after the cleaning step, and color mixing and white spots were evaluated. The results are shown in Table 4. 47 320324 200916852 Table 4 Pure water contact angle DUV treatment Example 25 1% Example 26 2% Example 27 4% Example 28 0.3% Comparative Example 10 0.1% Comparative Example Π 0% Front wall top 94 100 102 92 91 93 After 89 95 98 89 81 70 Glass substrate surface front 30 35 40 30 34 27 Rear 17 20 20 17 15 22 IJ coating (after plasma treatment) Color mixing 〇〇〇〇 XX white point 〇〇〇〇〇 [Examples 29] (corona cleaning) For the cleaning treatment of the floor substrate of the partition wall, in addition to the corona discharge treatment instead of the oxygen plasma treatment, the pure water at the predetermined portion was evaluated in the same manner as in the first embodiment. Contact angle. Further, a color filter was formed in the same manner as in Example 1 using the support substrate after the cleaning step, and color mixing and white spots were evaluated. The results are shown in Table 5. [Example 30] (Alkali cleaning) The cleaning treatment for the support substrate on which the partition walls were formed was carried out except that the sodium hydroxide solution was cleaned (hunted, 1 minute shower clearing treatment was carried out in the same manner as in Example 1, The evaluation is in the pre-, water contact angle. In addition, the support A after the cleaning step is used, and the substrate U is shown in Table 5, and the color is displayed in Table 5, and the color mixture and white point are evaluated. Heart 320324 48 200916852 Table 5

BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a cross-sectional explanatory view showing a state in which a partition wall is formed on a support substrate. [Description of main component symbols] Support substrate 1 a Surface (surface other than the part forming the partition wall) 2a Top surface of the partition wall Side of the partition wall 320324 49

Claims (1)

200916852 X. Patent application scope: 1. A photosensitive resin composition for forming a partition of a light-shielding color filter, comprising the following components (A) to (E) as essential components: ', (A) - having a molecule An acidic group and two or more ethylenic double bond alkali-developing oligomers; having an ink-repellent ink (methyl-7 acid polymer; (D) light having a polymer unit having a carbon number substituted by a fluorine atom; The polymerization initiator (8) contains at least one kind of light-shielding dispersible pigment selected from the group consisting of a black organic pigment, a color mixed organic pigment, and a light-shielding material. 2. 2 For the light-shielding filter and color filter partition wall of the first aspect of the patent range 4 In the photoreceptor composition, the photosensitive resin composition for forming a color filter partition wall is compounded with the following components: photopolymerization 3' having at least three or more ethylene double bonds in the single Z molecule. For example, the light-shielding color filter partition wall 7 of the patent application range 1 or the shape of the 忐田 β } member is made of a photosensitive resin composition, and the photosensitive resin composition is formed in the above-mentioned color filter partition wall/formation. Sergeant with more than 2 vinyl doubles The bond of the bond has two epoxy propyl '5s derived from the acidic group, which is the reaction between the bisphenol ruthenium acid and the poly(oxygen) and the (meth) test. An unsaturated group-containing oligomer. The ruthenium or its anhydride is obtained by the reaction. 4. The light-shielding color filter spacer 320324 50 200916852 for forming a photosensitive resin composition, dragon φ / 1. In the photosensitive resin composition for forming a spacer of the color filter, "a, 八··· 丄〇 has an acidic group and two or more wei wei a polymer having an epoxy compound having two epoxypropyl groups derived from a double lysate of the formula: (In the formula, I and r2 represent a hydrogen atom, an alkyl group having a carbon number of j to 5, or a halogen atom, and Xg_c〇..._s〇2_, _c(cf^_, Si(CH3)2·, _CH2_, {Yangshi, _〇_, 9,9-fluorenyl, 0^0 or absent as shown by the following formula, η is an integer from 〇 to 10) 5. As in the first or second item of the patent application The photosensitive resin composition for forming a partition of a color-blocking color filter, wherein the photosensitive resin composition for forming a color filter partition has a carbon number of 4 to 6, a main chain and hydrogen. An ink-repellent (meth)acrylic polymer having at least seven polymer units in which an atom is substituted by a fluorine atom is a fluorine-containing monomer having a monomer unit formed of a monomer represented by the following formula (2) Resin, 51 320324 200916852 ' - , ' 丄上{ZJ (wherein, Rn represents chlorine or a carbon number of 2 or more organic groups, and 丫 represents a carbon number of 1 to 6 of a fluorine-free atom of 2 organic groups, a perfluoroalkyl group having a carbon number of 4 to 6.) 6. A light-shielding color filter spacer according to the scope of the application or the second item = a photosensitive resin composition, which is in the above-mentioned color filter For the formation of the partition wall, the photo-remaining material f is 1 part by weight relative to the total solid content of the composition, and the component (B) is formulated to be 5 to 1 part by weight. 7.: = ? The light-shielding color cleaner partition wall-shaped raw resin composition of item 1 or item 2, wherein 'in the above-mentioned filter color spacer partition 1 light-tree composition, relative to the solid weight 1 〇〇 weight knife, (9) Component and (8) component are respectively formulated to an amount of 25 to 60 parts by weight. Liliche and the light-shielding color filter spacer carbon resin composition as in the patent application scope] ^ m ^ or 2 'The light-shielding disperse pigment is 9 partitions' is the longest application of the patented range 1 or the photosensitive resin composition applied to the transparent substrate. 2) Development by an aqueous solution, (4) ... The film thickness of the ν} wall obtained in each step is L5 to 3/zm:. The spacer spacer 'this interval> is formed by an inkjet printing method in the partition wall of the fourth section of the patent application. Gamma/consultation 320324 52 0 200916852 .11. The method of manufacturing a color filter is a method of a color filter having at least one pixel and a partition wall between adjacent pixels on a support substrate. : ° (1) A step of forming a If-containing partition wall containing a black resist containing a (iv) grease on a support substrate; (7) followed by a cleaning treatment with an aqueous solution, a UV cleaning treatment, and a quasi-preparation One or more processes selected for the molecular laser cleaning treatment, the corona discharge treatment, and the oxygen plasma treatment, and the step of cleaning the support substrate on which the fluorine-containing light-shielding partition is formed and (3) a step of forming a pixel by an inkjet method by applying an ink to a region surrounded by a fluorine-based light-shielding partition; wherein, the content of the fluorine-containing resin in the black resist forming the fluorine-containing light-shielding partition is black In the solid content of the resist, the reduction ratio of the pure water contact angle of the top surface of the fluorine-containing light-shielding partition wall before and after the cleaning step (2) is 1% or less. (12) The method for producing a color filter according to claim 11, wherein the fluorine-containing resin is a copolymer of fluorine-containing (meth)acrylate. U. A color filter is used in the patent application scope. The method of manufacturing the color filter of Item 11 or Item 12. 320324 53