TW200911922A - Resin composition, and film-forming material comprising the same - Google Patents

Resin composition, and film-forming material comprising the same Download PDF

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TW200911922A
TW200911922A TW097118135A TW97118135A TW200911922A TW 200911922 A TW200911922 A TW 200911922A TW 097118135 A TW097118135 A TW 097118135A TW 97118135 A TW97118135 A TW 97118135A TW 200911922 A TW200911922 A TW 200911922A
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resin
component
resin composition
group
film
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TW097118135A
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Chinese (zh)
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TWI468466B (en
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Satoshi Uehara
Tomohiro Hirata
Susumu Kaneko
Munemaru Sakayori
Osamu Matsuzaka
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Hitachi Chemical Co Ltd
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings
    • H05K3/285Permanent coating compositions
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08L79/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/02Polyamines
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D179/00Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09D161/00 - C09D177/00
    • C09D179/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C09D179/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives
    • C09D7/60Additives non-macromolecular
    • C09D7/61Additives non-macromolecular inorganic
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/18Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/24Acids; Salts thereof
    • C08K3/26Carbonates; Bicarbonates

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Polymers & Plastics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Inorganic Chemistry (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Epoxy Resins (AREA)

Abstract

Disclosed is a resin composition comprising: a component (A) which is a resin having an acid anhydride group and/or a carboxyl group; a component (B) which is an epoxy resin; and a component (C) which is a filler comprising hydrotalcite. The component (A) preferably has a polycarbonate skeleton, more preferably has a constituent unit represented by the general formula (1). (1) wherein multiple R's independently represent an alkylene group having 1 to 18 carbon atoms; multiple X's independently represent an alkylene having 1 to 18 carbon atoms or an arylene group; and m and n independently represent an integer of 1 to 20. The resin composition can be used suitably in screen printing, has reduced adhesion to a polyimide film which is a cured coating film, and enables to reduce the occurrence of black blister in an electrode upon applying current under high-temperature and high-humidity conditions. Also disclosed is a film-forming material comprising the resin composition.

Description

之被膜形成材料 、旋轉塗佈機等 之樹脂組成物及 化、薄型化、高 亞胺樹脂、聚醯 及耐濕性優異之 脂之樹脂構造爲 大爲翹曲、硬化 ,而提出有樹脂 亞胺樹脂(參考 3 )。該等樹脂 或有機塡充劑等 樹脂或塡充劑與 或表面處理劑等 200911922 九、發明說明 【發明所屬之技術領域】 本發明係關於一種樹脂組成物及含其 ’尤其是關於適用於網版印刷機、佈膠機 塗佈方法中之具有觸變性(thixotropy ) 含其之被膜形成材料。 【先前技術】 近年來,電子零件領域中對應於小型 速化’而使用有聚醯亞胺樹脂、聚醯胺醯 胺樹脂取代環氧樹脂作爲耐熱性、電特性 被膜形成用材料用之樹脂。然而,該等樹 剛性’使用薄膜基材時,硬化後之基材有 膜欠缺柔軟性、彎曲性劣化之問題。 因此’爲了改善上述翹曲性、柔軟性 經改性之可撓化及低彈性率化之聚醯胺醯 例如專利文獻1、專利文獻2及專利文獻 爲改善印刷性及作業性,而將無機塡充劑 分散於樹脂溶液中。又,爲了提高基材與 樹脂彼此間之密著性,而使用各種交聯劑 之添加劑。 [專利文獻1 ]特開昭6 2 - 1 0 6 9 6 0號公報 [專利文獻2]特開平8- 1 27 63號公報 [專利文獻3]特開平7-196798號公報 200911922 【發明內容】 然而,在聚醯亞胺薄膜之單面上施加有銅配線之撓性 配線板之銅配線側的表面上,網版印刷上述之被膜形成材 料,隨後經硬化者在捲取之際,撓性配線板之未施加銅配 線之該側表面上貼附由被膜形成材料所構成之硬化被膜有 其問題,實務上以往係在聚醯亞胺薄膜與硬化被膜間設有 間隔層。 又,上述專利文獻1〜3中揭示之使用被膜形成材料形 成硬化被膜之配線板在高溫高濕下通電之情況下,有電極 發生黑色隆起而爲電特性降低之一原因之顧慮。 本發明係鑑於上述以往缺點所進行者,其課題在於提 供一種硬化後之被膜與聚醯亞胺薄膜之貼附性得以減低且 於高溫高濕下通電時電極之黑色隆起得以減輕之樹脂組成 物以及含該樹脂組成物之被膜形成材料。 [爲解決課題之手段] 爲解決上述課題,本發明中之樹脂組成物之特徵爲包 括(A)成分:具有酸酐基及/或羧基之樹脂,(B)成分 :環氧樹脂’及(C )成分:包含水滑石之塡充劑。 上述構成之樹脂組成物中,上述(A )成分較好具有 聚碳酸酯骨架。 而且,上述(A)成分較好含有以下述通式(1)表 示之構造單位: 200911922 【化1】 0 0 0The resin composition such as the film forming material, the spin coater, and the like, and the resin composition of the resin, which is excellent in thickness, high imide resin, polyfluorene, and moisture resistance, are greatly warped and hardened, and a resin is proposed. Amine resin (Ref. 3). Resins such as such resins or organic chelating agents, or chelating agents and surface treating agents, etc. 200911922 IX. Field of the Invention [Technical Fields of the Invention] The present invention relates to a resin composition and the inclusion thereof, especially regarding the application to the net A thixotropy film-forming material containing a thixotropy in a coating machine or a cloth coating method. [Prior Art] In recent years, in the field of electronic components, a resin which is a material for heat-resistant and electrical property film formation has been used in place of an epoxy resin in place of a small-sized polyimide resin or a polyamide resin. However, when these thinner substrates are used, the substrate after curing has a problem that the film lacks flexibility and the flexibility is deteriorated. Therefore, in order to improve the warpage property, the flexibility of the flexibility, and the low elastic modulus of the polyimide, for example, Patent Document 1, Patent Document 2, and the patent document improve the printability and workability, and inorganic The chelating agent is dispersed in the resin solution. Further, in order to improve the adhesion between the substrate and the resin, additives of various crosslinking agents are used. [Patent Document 1] Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. However, on the surface of the copper wiring side of the flexible wiring board to which the copper wiring is applied on one side of the polyimide film, the above-mentioned film forming material is screen-printed, and then the flexible person is wound, and the flexibility is obtained. There is a problem in that a cured film composed of a film forming material is attached to the side surface of the wiring board on which the copper wiring is not applied. Conventionally, a spacer layer has been conventionally provided between the polyimide film and the cured film. Further, in the case where the wiring board in which the film forming material is formed into a hardened film by the film forming material is energized under high temperature and high humidity, there is a concern that the electrode has a black bulge and the electrical characteristics are lowered. The present invention has been made in view of the above-described conventional disadvantages, and an object of the present invention is to provide a resin composition in which the adhesion between the cured film and the polyimide film is reduced, and the black bulge of the electrode is reduced when the electrode is energized under high temperature and high humidity. And a film forming material containing the resin composition. [Means for Solving the Problems] In order to solve the above problems, the resin composition of the present invention is characterized by comprising (A) a component: a resin having an acid anhydride group and/or a carboxyl group, and (B) a component: an epoxy resin' and (C) ) Ingredients: A hydrazine containing hydrotalcite. In the resin composition having the above composition, the component (A) preferably has a polycarbonate skeleton. Further, the above component (A) preferably contains a structural unit represented by the following formula (1): 200911922 [Chemical 1] 0 0 0

II II II X-N-C-0-(R-0-C-0)^R-0-C-N- Η ΗII II II X-N-C-0-(R-0-C-0)^R-0-C-N- Η Η

(式(1)中,複數個R各獨立表示碳數1〜18之伸 烷基,複數個X各獨立表示碳數1〜18之伸烷基或伸芳基 ,111及11各獨立表示1〜20之整數)。 再者,(A)成分較好爲使選自具有聚碳酸酯骨架之 聚醯亞胺樹脂、聚醯胺醯亞胺樹脂、聚醯胺樹脂之至少一 種樹脂之異氰酸酯殘基與具有酸酐基之3價以上聚碳酸或 其衍生物反應所得之樹脂。 又,上述構成之樹脂組成物中,(C)成分之含量, 相對於上述(A)成分100重量份,較好爲10〜50質量% ,上述(C)成分中所佔之水滑石含量較好爲1〇~50質量 %。 又,本發明之樹脂組成物係適用於作爲在聚醯亞胺基 材上層合有銅箱之撓性印刷電路板基板之保護膜。 本發明之被膜形成材料之特徵爲包含上述本發明之樹 脂組成物。 [發明效果] 本發明之樹脂組成物可降低硬化後之被膜與聚_亞月安 薄膜之貼附性,且可減輕在高溫高濕下通電時電極之黑色 隆起,因此可適用於撓性配線板等之電子零件,而發揮獲 得信賴性高之電子零件之效果。 -8- 200911922 【實施方式】 本發明之樹脂組成物,如上述’係包括(A )成分: 具有酸酐基及/或羧基之樹脂、(B)成分:環氧樹脂、及 (C )成分:包含水滑石之塡充劑作爲必要成分。以下詳 細的說明各必要成分。 [(A)成分:具有酸酐基及/或羧基之樹脂] (Α)成分之「具有酸酐基及/或羧基之樹脂」舉例有 於具有丁二烯構造或矽氧構造之環氧樹脂、酚樹脂、丙烯 酸樹脂、聚胺基甲酸酯、聚丁二烯、氫化聚丁二烯、聚酯 、聚碳酸酯、聚醚、聚楓、聚四氟樹脂、聚矽氧、三聚氰 胺樹脂、聚醯胺、聚醯胺醯亞胺、聚醯亞胺等樹脂之主鏈 及/或側鏈上導入酸酐基及/或羧基者。該等可單獨使用或 組合兩種以上使用。又,亦可倂用具有酸酐基及/或羧基 之樹脂與不具有酸酐基及/或羧基之樹脂。 至於導入上述羧基之方法係在具有丁二烯構造或矽氧 構造之環氧樹脂、酚樹脂、丙烯酸樹脂、聚胺基甲酸酯、 聚丁二烯、氫化聚丁二烯、聚酯、聚碳酸酯、聚醚、聚颯 、聚四氟樹脂、聚矽氧、三聚氰胺樹脂、聚醯胺、聚醯胺 醯亞胺、聚醯亞胺樹脂等之合成過程中,使用可進行游離 基聚合、聚縮合或離子聚合之具有羧基之化合物而獲得。 又’導入上述酸酐基之方法可使源自具有丁二烯構造 或矽氧構造之環氧樹脂、酚樹脂、丙烯酸樹脂、聚胺基甲 -9- 200911922 酸酯、聚丁二烯、氫化聚丁二烯、聚酯、聚碳酸酯、聚醚 、聚砸、聚四氟樹脂、聚矽氧、三聚氰胺樹脂、聚醯胺、 聚醯胺醯亞胺、聚醯亞胺樹脂等之環氧殘基、異氰酸酯殘 基、羥基殘基及羧基等與以下述通式(2)及/或通式(3 )表示之化合物反應而獲得。 【化2】 0(In the formula (1), a plurality of R each independently represent an alkylene group having 1 to 18 carbon atoms, and a plurality of X each independently represent an alkylene group or an extended aryl group having 1 to 18 carbon atoms, and 111 and 11 each independently represent 1 An integer of ~20). Further, the component (A) is preferably an isocyanate residue of at least one resin selected from the group consisting of a polyimine resin having a polycarbonate skeleton, a polyamidoximine resin, and a polyamide resin, and an acid anhydride group. A resin obtained by reacting a trivalent or higher polycarbonate or a derivative thereof. Further, in the resin composition having the above-mentioned composition, the content of the component (C) is preferably from 10 to 50% by mass based on 100 parts by weight of the component (A), and the hydrotalcite content in the component (C) is higher. Good is 1〇~50% by mass. Further, the resin composition of the present invention is suitably used as a protective film for a flexible printed circuit board substrate in which a copper box is laminated on a polyimide substrate. The film forming material of the present invention is characterized by comprising the above-described resin composition of the present invention. [Effect of the Invention] The resin composition of the present invention can reduce the adhesion of the film after hardening to the poly-yttrium film, and can reduce the black bulging of the electrode when the electrode is energized under high temperature and high humidity, and thus can be applied to the flexible wiring. The electronic parts such as boards are used to achieve the effect of obtaining electronic parts with high reliability. -8-200911922 [Embodiment] The resin composition of the present invention includes the component (A): a resin having an acid anhydride group and/or a carboxyl group, and (B) a component: an epoxy resin, and a component (C): A hydrazine containing hydrotalcite is an essential component. The necessary ingredients are explained in detail below. [(A) component: resin having an acid anhydride group and/or a carboxyl group] "Resin having an acid anhydride group and/or a carboxyl group" as an example of an epoxy resin or a phenol having a butadiene structure or a oxime structure Resin, acrylic resin, polyurethane, polybutadiene, hydrogenated polybutadiene, polyester, polycarbonate, polyether, poly maple, polytetrafluoroethylene resin, polyfluorene oxide, melamine resin, polyfluorene An acid anhydride group and/or a carboxyl group are introduced into a main chain and/or a side chain of a resin such as an amine, a polyamidimide or a polyimine. These may be used singly or in combination of two or more. Further, a resin having an acid anhydride group and/or a carboxyl group and a resin having no acid anhydride group and/or carboxyl group may be used. The method of introducing the above carboxyl group is an epoxy resin having a butadiene structure or a xenon structure, a phenol resin, an acrylic resin, a polyurethane, a polybutadiene, a hydrogenated polybutadiene, a polyester, and a poly In the synthesis of carbonate, polyether, polyfluorene, polytetrafluoroethylene, polyfluorene oxide, melamine resin, polyamine, polyamidimide, polyimine resin, etc., free radical polymerization can be used. Obtained by polycondensation or ionic polymerization of a compound having a carboxyl group. Further, the method of introducing the above acid anhydride group can be derived from an epoxy resin having a butadiene structure or a xenon structure, a phenol resin, an acrylic resin, a polyaminomethyl-9-200911922 acid ester, a polybutadiene, and a hydrogenation polymerization. Epoxy residues of butadiene, polyester, polycarbonate, polyether, polyfluorene, polytetrafluoroethylene, polyfluorene oxide, melamine resin, polyamide, polyamidimide, polyimine resin, etc. The group, the isocyanate residue, the hydroxyl residue, the carboxyl group and the like are obtained by reacting with a compound represented by the following formula (2) and/or formula (3). [化2] 0

II W——Z1 cII W——Z1 c

II (2 ) 0 (式(2)中,Ζ1表示有機基,w表示羥基、異氰酸 酯基、羧基、環氧基、縮水甘油基)。 【化3】II (2 ) 0 (In the formula (2), Ζ1 represents an organic group, and w represents a hydroxyl group, an isocyanate group, a carboxyl group, an epoxy group, or a glycidyl group). [化3]

(式(3)中’ Z表示有機基,w表示羥基、異氰酸 酯基、羧基、環氧基、縮水甘油基)。 藉由在樹脂之末端及/或側鏈上導入酸酐基及/或竣基 ,由於其與後述(B)成分之環氧樹脂之反應性變高,故 可提高與間隔層與阻焊劑之貼合性。 又’本發明(A)成分之樹脂爲了對應於主要之撓性 基板’因此較好爲可捷性及低彈性率者。用以使成 分之樹脂成爲可撓性及低彈性率,可舉例有在樹|旨之主鍵 -10 _ 200911922 上導入可提高可撓性之成分,該等成分較好爲例如聚丁二 烯骨架'矽氧樹脂骨架及/或聚碳酸酯骨架。 又,爲了提高硬化被膜之耐熱性、電特性、耐濕性、 耐溶劑性及耐藥品性,舉例有在樹脂之主鏈中導入可提高 耐熱性之成分,該等成分較好爲例如聚醯亞胺、聚醯胺醯 亞胺或聚醯胺或該等之骨架。其中,就可撓化、低彈性率 化及高耐熱性化之觀點而言,以聚碳酸酯骨架及醯亞胺骨 架較佳。 本發明中’可使用作爲(A)成分之「具有酸酐基及/ 或羧基之樹脂」通常係使1,6-己烷二醇系聚碳酸酯二醇等 與具有羧基之化合物、具有酸酐之化合物及/或具有異氰 酸酯基之化合物反應而獲得。 又,本發明中可使用作爲(A)成分之「具有酸酐基 及/或殘基之樹脂」係使例如選自(a)成分:具有酸野基 之3價多元羧酸及其衍生物,以及具有酸酐基之4價多元 殘酸之一種以上之化合物與(b)成分:異氰酸酯化合物 或胺化合物反應而獲得。 上述(a)成分之「具有酸酐基之3價多元殘酸及其 衍生物」並無特別限制,可使用例如以下式(4 )及(5 ) 所示之化合物: 【化4】(In the formula (3), "Z represents an organic group, and w represents a hydroxyl group, an isocyanate group, a carboxyl group, an epoxy group, or a glycidyl group). By introducing an acid anhydride group and/or a mercapto group at the terminal and/or the side chain of the resin, the reactivity with the epoxy resin of the component (B) described later becomes high, so that the adhesion to the spacer layer and the solder resist can be improved. Synergy. Further, the resin of the component (A) of the present invention is preferably inconvenient and low in modulus in order to correspond to the main flexible substrate. The resin for making the component is flexible and has a low modulus of elasticity. For example, a component capable of improving flexibility can be introduced on the main bond of the tree, which is preferably a polybutadiene skeleton. 'Oxygen resin skeleton and / or polycarbonate skeleton. Further, in order to improve heat resistance, electrical properties, moisture resistance, solvent resistance, and chemical resistance of the cured film, for example, a component capable of improving heat resistance is introduced into the main chain of the resin, and these components are preferably, for example, polyfluorene. Imine, polyamidamine or polyamine or such a skeleton. Among them, a polycarbonate skeleton and a ruthenium imide skeleton are preferable from the viewpoints of flexibility, low elastic modulus, and high heat resistance. In the present invention, the "resin having an acid anhydride group and/or a carboxyl group" as the component (A) is usually a compound having a carboxyl group, such as a 1,6-hexanediol-based polycarbonate diol, and an acid anhydride. It is obtained by reacting a compound and/or a compound having an isocyanate group. Further, in the present invention, the "resin having an acid anhydride group and/or a residue" as the component (A) may be, for example, a component selected from the group consisting of (a) component: a trivalent polycarboxylic acid having an acid field group, and a derivative thereof. And one or more compounds having a tetravalent polybasic acid having an acid anhydride group are obtained by reacting the component (b): an isocyanate compound or an amine compound. The "trivalent polyvalent residual acid having an acid anhydride group and the derivative thereof" of the component (a) is not particularly limited, and for example, a compound represented by the following formulas (4) and (5) can be used:

-11 - 0 200911922 【化5】 FTOOC- (5 ) (式(4)及(5)中,R’表示氫、碳數1〜10之烷基 或苯基,Y1 表示-CH2-、-CO-、-S02-、或-0-)。 至於上述(a)成分之「具有酸酐基之3價多元羧酸 」由耐熱性、成本面等考量,以均苯三甲酸酐爲最佳。 至於其他之「具有酸酐基之4價多元狻酸」並無特別 式 下 以 q 如 OHC' 例 用 使 可 J0.’ 6 ’ 化 制 I 限 o=c. 'Y2 酸 羧 四 之 示 表-11 - 0 200911922 [Chemical 5] FTOOC- (5) (In the formulas (4) and (5), R' represents hydrogen, an alkyl group having 1 to 10 carbon atoms or a phenyl group, and Y1 represents -CH2-, -CO -, -S02-, or -0-). The "trivalent polycarboxylic acid having an acid anhydride group" of the above component (a) is preferably a pyromellitic anhydride from the viewpoints of heat resistance and cost. As for the other "tetravalent polybasic acid having an acid anhydride group", there is no special formula such as OHC', which can be used to make J0.' 6 '. I limit o = c. 'Y2 acid carboxylic acid four

bMObMO

bMO 式 下 以 白 選 爲 2 Y 中 式 基 之 基 個 數 複 之 示 表 -12- 200911922In the bMO formula, the number of bases selected by white is 2 Y is the number of bases. -12- 200911922

)。該等基可單獨使用或組合兩種以上使用。 又,除此等之外亦可依據需要倂用作爲酸成分之脂肪 族二羧酸(琥珀酸、戊二酸、己二酸、庚二酸、辛二酸、 壬二酸、癸二酸、十二烷二酸、二聚酸等)、芳香族二羧 酸(間苯二甲酸、對苯二甲酸、苯二甲酸、萘二羧酸、氧 -13- 200911922 基二苯甲酸等)。該情況下,分子鏈中亦會形成醯胺鍵。 作爲上述(b)成分使用之異氰酸酯化合物可使用例 如以下式(8)表示之二異氰酸酯類(以下,亦有稱爲化 合物(b-1 )之情況): 【化8). These groups may be used singly or in combination of two or more. Further, in addition to these, an aliphatic dicarboxylic acid (succinic acid, glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, sebacic acid, or the like) may be used as an acid component. Aromatic dicarboxylic acid (isophthalic acid, terephthalic acid, phthalic acid, naphthalene dicarboxylic acid, oxygen-13-200911922 bisdibenzoic acid, etc.). In this case, a guanamine bond is also formed in the molecular chain. As the isocyanate compound to be used as the component (b), a diisocyanate represented by the following formula (8) (hereinafter also referred to as a compound (b-1)) can be used:

0 II0 II

0 II 0 0CN-[x-NC-04R-0-C-0-^R-0CN^X-NC0 η Η Π0 II 0 0CN-[x-NC-04R-0-C-0-^R-0CN^X-NC0 η Η Π

(式(8)中’複數個R各獨立爲碳數之伸烷 基’ X爲二價有機基,m及η各獨立爲1〜2〇之整數)。 以上述式(8 )表示之化合物(b_丨)係藉由以下式( 9)表示之碳酸酯二醇類: 【化9】 r π ί(In the formula (8), a plurality of R groups each independently represent a carbon number of a stretch alkyl group 'X is a divalent organic group, and m and η are each independently an integer of 1 to 2 Å). The compound (b_丨) represented by the above formula (8) is a carbonate diol represented by the following formula (9): [Chemical 9] r π ί

H0--R-0-C"0 --R-OH v- m (9 ) (式(9)中,複數個R各獨立爲碳數卜18之伸烷 基,m爲卜2〇之整數),與以下述式(1〇)表示之二異 氰酸酯類反應而獲得: OCN —X—NCO (1〇) (式中,X爲二價有機基)^ 上述式(10)中以X表示之二價有機基舉例爲例如 碳數1〜20之伸烷基、或未經取代或經甲基等之碳數1~5 之低碳院基取代之伸苯基等之伸芳基。上述伸烷基之碳數 更好爲卜18。亦較好可舉例爲二苯基甲院_4,4,_二基、二 -14- 200911922 苯基颯-4,4’-二基等之具有2個芳香族環之基。 以上述式(9)表示之碳酸酯二醇類可舉例爲例如 α,ω-聚(六亞甲基碳酸酯)二醇、α,ω-聚(3-甲基-五亞甲 基碳酸酯)二醇等,市售者舉例爲Diacell化學(股)製 之商品名「PLACCEL CD-205、205PL、205HL、210、 210PL > 210HL、220、220PL、220HL」等。該等可單獨 使用或組合兩種以上使用。 又,以上述式(10)表示之二異氰酸酯類可舉例爲例 如二苯基甲烷-2,4’-二異氰酸酯;3,2’-、3,3’-、4,2’-、 4,3’-、5,2’-、5,3’-、6,2’ -或 6,3’-二甲基二苯基甲烷-2,4’-二異氰酸酯;3,2,-、 3,3,-、 4,2,-、 4,3,-、 5,2,-、 5,3’-、6,2’_或6,3’-二乙基二苯基甲烷-2,4’-二異氰酸酯; 3,2’-、 3,3,_、 4,2,-、 4,3,-、 5,2,-、 5,3’-、 6,2’-或 6,3,-二 甲氧基二苯基甲烷-2,4,-二異氰酸酯;二苯基甲烷-4,4,-二 異氰酸酯;二苯基甲烷_3,3,_二異氰酸酯;二苯基甲烷― 3,4’-二異氰酸酯;二苯基醚_4,4,_二異氰酸酯;二苯甲酮-4,4’-二異氡酸酯;二苯基硼_4,4,_二異氰酸酯;甲苯-2,4_ 二異氨酸賴;甲苯_2,6_二異氰酸酯;間-二甲苯二異氰酸 醋;對-二甲苯二異氰酸酯;萘_2,6_二異氰酸酯;4,4,_ [2,2_雙(4、苯氧基苯基)丙烷]二異氰酸酯等。該等二異 氨1酸醋類中,較好使用式(8)中之X係具有芳香族環之 方香族氰酸酯。該等可單獨使用或組合兩種以上使用 〇 X ^式(10)表示之二異氰酸酯類在本發明之目的 -15- 200911922 範圍內可使用六亞甲基二異氰酸酯、2,2,4-三甲基六亞甲 基二異氰酸酯、異彿爾酮二異氰酸酯、4,4’·二環己基甲烷 二異氰酸酯、反式環己烷-1,4-二異氰酸酯、氫化間-二甲 苯二異氰酸酯、離胺酸二異氰酸酯等之脂肪族或脂環式異 氰酸酯,或者三官能以上之聚異氰酸酯。 以上述式(10)表示之二異氰酸醋類,爲了避免經時 變化,亦可使用以必要之封阻劑安定化者。封阻劑爲醇類 、酚類、肟等,但並無特別限制。 以上述式(9)表示之碳酸酯二醇類與以上述式(10 )表示之二異氰酸酯類之調配比例,以羥基數與異氰酸酯 基數之比率計,爲異氰酸酯基/羥基=1. 〇 1以上爲較佳。 以上述式(9)表示之碳酸酯二醇與以上述式(10) 表示之二異氰酸酯類之反應可在無溶劑或在有機溶劑存在 下進行。反應溫度以60〜2〇〇°C爲較佳’更好爲80~180°c 。反應時間可依批次之規模、採用之反應條件等作適當的 選擇。例如,在1〜5L (升)之燒瓶規模中可爲2〜5小時 〇 如此獲得之化合物(b-1 )(異氰酸酯化合物)之數 平均分子量以500~1 0,000爲較佳,以1,000~9,500更好, 以1,50 0〜9,000爲最佳。若數平均分子量未達500,則會 有翹曲性惡化之傾向,若超過1〇,〇〇〇,則異氰酸酯化合物 之反應性下降,有難以聚醯亞胺樹脂化之傾向。 再者,本說明書中之數平均分子量係以凝膠滲透層析 (GPC )測定,且使用標準聚苯乙烯之校正線換算之値。 -16- 200911922 另外,本發明之數平均分子量及分散度定義如下: a) 數平均分子量(Μη) Μ„ = Σ ( NjMj ) /Ni^ZXjMj (X, =分子量Mi之分子莫耳分率ζΝι/ΣΚ) b) 重量平均分子量 MW = I ( N,Mj2) /ΣΝ1Μί = ΣΨ1Μί (Wi =分子量Mi之分子重量分率^ΝίΜ,/ΣΝίΜί) c) 分子量分布(分散度) 分散度=MW/Mn 上述(b)成分之異氰酸酯化合物可使用除化合物( b-1 )以外之化合物(以下稱爲化合物(b-2 ))。至於化 合物(b-2 )只要爲化合物(b-Ι )以外之異氰酸酯化合物 ,則無特別限制,舉例爲例如,以上述式(9 )表示之二 異氰酸酯類、三價以上之聚異氰酸酯類等。該等可單獨使 用或組合兩種以上使用。化合物(b-2 )之異氰酸酯化合 物之數平均分子量之較佳範圍係與上述化合物(b-1 )相 同。 尤其就耐熱性之觀點而言,以化合物(b-1 )與化合 物(b-2 )倂用爲較佳。而且,分別單獨使用化合物(b-1 )及化合物(b-2 )之情況下,就作爲撓性配線板用之保 護膜之柔軟性、翹曲性之改善等觀點而言,以使用化合物 (b -1 )較佳。 至於化合物(b - 2 ),以其總量之5 0〜1 0 0重量%爲芳 香族聚異氰酸酯爲較佳,且考慮到耐熱性、溶解性、機械 -17- 200911922 特性、成本面等之均衡,以4,4,-二苯基甲烷二異氰酸酯 爲最佳。 倂用化合物(b-Ι )與化合物(b-2 )時,化合物(b-1)/化合物(1>-2)之當量比較好爲〇.1/〇.9〜0.9/0.1,更好 爲0.2/0.8〜0.8/0.2,且最好爲0.3/0.7〜0.7/0.3。若當量比 在該範圍內,則可同時獲得良好之低翹曲性、密著性與良 好之耐熱性等之膜特性。 上述(b)成分中之胺化合物可舉例爲將上述(b)成 分之異氰酸酯化合物中之異氰酸酯基轉化成胺基之化合物 。異氰酸酯基轉化成胺基可藉由習知方法進行。胺化合物 之數平均分子量之較佳範圍與上述化合物(b-Ι)相同。 又’ (a)成分之「具有酸酐基之三價聚羧酸或其衍 生物及/或具有酸酐基之四價聚羧酸」之調配比例爲(a ) 成分中之羧基與酸酐基之總數對於(b)成分中之異氰酸 酯基之總數之比例,較好爲0.6〜1.4,更好爲0.7〜1 . 3,且 最好爲0.8〜1.2。若該比例未達0.6或超過1.4,則有包含 聚醯亞胺鍵之樹脂之分子量難以變高之傾向。 再者,使用上述式(2)表示之化合物作爲(a)成分 ,使用化合物(b-1 )作爲(b )成分之情況,可獲得具有 以下式(11)表示之重複單位之聚醯胺醯亞胺樹脂: 【化1 0】H0--R-0-C"0 --R-OH v- m (9 ) (In the formula (9), a plurality of R are each independently a carbon number of the alkyl group, and m is an integer of 2 It is obtained by reacting with a diisocyanate represented by the following formula (1〇): OCN—X—NCO (1〇) (wherein X is a divalent organic group) ^ is represented by X in the above formula (10) The divalent organic group is exemplified by, for example, an alkylene group having 1 to 20 carbon atoms or an extended aryl group such as a phenyl group which is unsubstituted or substituted with a low carbon group having a carbon number of 1 to 5 such as a methyl group. The carbon number of the above alkyl group is more preferably 18. Further preferably, it is a group having two aromatic rings such as diphenylmethyl _4,4,-diyl, bis-14-200911922 phenylfluorene-4,4'-diyl. The carbonate diol represented by the above formula (9) can be exemplified by, for example, α,ω-poly(hexamethylene carbonate) diol, α,ω-poly(3-methyl-pentamethylene carbonate). The diol or the like is exemplified by the trade name "PLACCEL CD-205, 205PL, 205HL, 210, 210PL > 210HL, 220, 220PL, 220HL" manufactured by Diacell Chemical Co., Ltd., and the like. These may be used singly or in combination of two or more. Further, the diisocyanate represented by the above formula (10) can be exemplified by, for example, diphenylmethane-2,4'-diisocyanate; 3,2'-, 3,3'-, 4,2'-, 4, 3'-, 5,2'-, 5,3'-, 6,2'- or 6,3'-dimethyldiphenylmethane-2,4'-diisocyanate; 3,2,-,3 ,3,-, 4,2,-, 4,3,-, 5,2,-, 5,3'-, 6,2'- or 6,3'-diethyldiphenylmethane-2, 4'-diisocyanate; 3,2'-, 3,3,_, 4,2,-, 4,3,-, 5,2,-, 5,3'-, 6,2'- or 6, 3,-dimethoxydiphenylmethane-2,4,-diisocyanate; diphenylmethane-4,4,-diisocyanate; diphenylmethane_3,3,-diisocyanate; diphenylmethane ― 3,4′-diisocyanate; diphenyl ether _4,4,-diisocyanate; benzophenone-4,4′-diisodecanoate; diphenylboron-4,4,diisocyanate ; toluene-2,4_ diisine lys; toluene 2,6-diisocyanate; m-xylene diisocyanate; p-xylene diisocyanate; naphthalene 2,6-diisocyanate; 4,4 , _ [2,2_bis(4,phenoxyphenyl)propane] diisocyanate, and the like. Among these diisammonic acid vinegars, it is preferred to use the X-type aromatic sulfonate of the formula (8). These may be used singly or in combination of two or more kinds of diisocyanates represented by 〇X^ (10). In the range of -15-200911922 of the present invention, hexamethylene diisocyanate, 2,2,4-tri can be used. Methylhexamethylene diisocyanate, isophorone diisocyanate, 4,4'-dicyclohexylmethane diisocyanate, trans cyclohexane-1,4-diisocyanate, hydrogen-m-xylene diisocyanate, leaving An aliphatic or alicyclic isocyanate such as an amino acid diisocyanate or a trifunctional or higher polyisocyanate. The diisocyanate represented by the above formula (10) may be stabilized with a necessary blocking agent in order to avoid a change with time. The blocking agent is an alcohol, a phenol, a hydrazine or the like, but is not particularly limited. The ratio of the number of hydroxyl groups to the number of isocyanate groups is the ratio of the number of hydroxyl groups to the number of isocyanate groups, and the ratio of the number of hydroxyl groups to the number of isocyanate groups is from the ratio of the number of hydroxyl groups to the number of isocyanate groups. It is better. The reaction of the carbonate diol represented by the above formula (9) with the diisocyanate represented by the above formula (10) can be carried out in the absence of a solvent or in the presence of an organic solvent. The reaction temperature is preferably 60 to 2 ° C, more preferably 80 to 180 ° C. The reaction time can be appropriately selected depending on the size of the batch, the reaction conditions employed, and the like. For example, it may be 2 to 5 hours in a flask scale of 1 to 5 L (liter), and the number average molecular weight of the compound (b-1) (isocyanate compound) thus obtained is preferably 500 to 10,000, and is 1,000. ~9,500 is better, with 1,50 0~9,000 as the best. When the number average molecular weight is less than 500, the warpage property tends to be deteriorated. When the amount exceeds 1 Torr, the reactivity of the isocyanate compound is lowered, and it is difficult to resinize the polyimide. Further, the number average molecular weight in the present specification is measured by gel permeation chromatography (GPC) and converted using a calibration line of standard polystyrene. Further, the number average molecular weight and the degree of dispersion of the present invention are defined as follows: a) number average molecular weight (Μη) Μ„ = Σ ( NjMj ) /Ni^ZXjMj (X, = molecular mole fraction of molecular weight Mi ζΝι /ΣΚ) b) Weight average molecular weight MW = I ( N,Mj2) /ΣΝ1Μί = ΣΨ1Μί (Wi = molecular weight fraction of molecular weight Mi ^ΝίΜ, /ΣΝίΜί) c) Molecular weight distribution (dispersion) Dispersion = MW / Mn As the isocyanate compound of the above component (b), a compound other than the compound (b-1) (hereinafter referred to as the compound (b-2)) can be used. The compound (b-2) is an isocyanate other than the compound (b-oxime). The compound is not particularly limited, and examples thereof include a diisocyanate represented by the above formula (9), a trivalent or higher polyisocyanate, etc. These may be used singly or in combination of two or more. Compound (b-2) The preferred range of the number average molecular weight of the isocyanate compound is the same as that of the above compound (b-1). Especially in terms of heat resistance, it is preferred to use the compound (b-1) and the compound (b-2). And, separately, using the combination In the case of (b-1) and the compound (b-2), it is preferred to use the compound (b-1) from the viewpoints of improvement in flexibility and warpage of the protective film for a flexible wiring board. As the compound (b - 2 ), an aromatic polyisocyanate is preferably used in an amount of from 50 to 100% by weight based on the total amount, and heat resistance, solubility, mechanical properties, mechanical properties, and the like are considered. The equilibrium is preferably 4,4,-diphenylmethane diisocyanate. When compound (b-Ι) and compound (b-2) are used, compound (b-1)/compound (1>-2) The equivalent is preferably 〇.1/〇.9 to 0.9/0.1, more preferably 0.2/0.8 to 0.8/0.2, and most preferably 0.3/0.7 to 0.7/0.3. If the equivalent ratio is within the range, At the same time, good film properties such as low warpage, adhesion, and good heat resistance are obtained. The amine compound in the above component (b) can be exemplified by converting an isocyanate group in the isocyanate compound of the above component (b) into an amine. a compound of a group. The conversion of an isocyanate group to an amine group can be carried out by a conventional method. The preferred range of the number average molecular weight of the amine compound is The compound (b-oxime) is the same. The blending ratio of the "trivalent polycarboxylic acid having an acid anhydride group or a derivative thereof and/or a tetravalent polycarboxylic acid having an acid anhydride group" of the component (a) is (a) component The ratio of the total number of carboxyl groups and acid anhydride groups to the total number of isocyanate groups in the component (b) is preferably from 0.6 to 1.4, more preferably from 0.7 to 1.3, and most preferably from 0.8 to 1.2. If the ratio is less than 0.6 or exceeds 1.4, the molecular weight of the resin containing the polyimine bond tends to be difficult to increase. In addition, when the compound represented by the above formula (2) is used as the component (a) and the compound (b-1) is used as the component (b), a polyamidamine having a repeating unit represented by the following formula (11) can be obtained. Imine resin: 【化1 0】

ο ο ο 〇 P fr II II II , II η -{X-NC-O-fR-O-C-O^-R-OCN^X-N-C N— Η Η Η 1 -18- 200911922 (式(11)中,複數個R各獨立爲碳數1〜18之伸烷 基,X爲二價有機基’ m及η各獨立爲1~20之整數)。 又,使用以上述式(5)表示之化合物作爲(a)成分 ,且使用以化合物(b -1 )作爲(b )成分時,可獲得具有 以下式(12)表示之重複單位之聚酸胺醯亞胺樹脂: 【化1 1】ο ο ο 〇P fr II II II , II η -{X-NC-O-fR-OCO^-R-OCN^XNC N— Η Η Η 1 -18- 200911922 (in equation (11), plural R Each is independently an alkylene group having a carbon number of 1 to 18, and X is a divalent organic group 'm and η are each independently an integer of 1 to 20). Further, when the compound represented by the above formula (5) is used as the component (a) and the compound (b-1) is used as the component (b), a polyamine having a repeating unit represented by the following formula (12) can be obtained.醯 imine resin: 【化1 1】

12)12)

〇 〇〇〇 r II it II ^ II〇 〇〇〇 r II it II ^ II

-fX-N C-0-(-R_0-C-0-^R_0 CN^-X-N-C Η Η Η (式(12)中,複數個R各獨立爲碳數1〜18之伸烷 基,X爲二價有機基,m及η各獨立爲1〜20之整數,γΐ 爲-CH2-、-CO-、-so2-或-0-)。 又,使用以上述式(6)表示之化合物作爲(a)成分 ,且使用以化合物(b-1 )作爲(b )成分時,可獲得具有 以下式(1 3 )表示之重複單位之聚醯亞胺樹脂:-fX-N C-0-(-R_0-C-0-^R_0 CN^-XNC Η Η Η (In the formula (12), a plurality of R are each independently an alkylene group having a carbon number of 1 to 18, and X is The divalent organic group, m and η are each independently an integer of from 1 to 20, and γΐ is -CH2-, -CO-, -so2- or -0-). Further, a compound represented by the above formula (6) is used as ( When the component (a) is used as the component (b), a polyimine resin having a repeating unit represented by the following formula (1 3 ) can be obtained:

【化1 2 I[1 1 I

0 00 0

0 〇 〇 C C -{X-NC-0-(-R-0-C-0^;R-0CN-^X-N Y2 NJ_0 〇 〇 C C -{X-NC-0-(-R-0-C-0^; R-0CN-^X-N Y2 NJ_

Η H C CΗ H C C

II II (式(13)中,複數個R各獨立爲碳數1〜18之伸烷 基,X爲二價有機基,m及η各獨立爲1〜20之整數,Y2 係選自以上述式(7)表示之複數個基之基)。 本發明中,作爲成分(Α)所使用之「具有酸酐基及/ -19- 200911922 或羧基之樹脂」之製造方法中,使(a)成分··選自具有 酸酐基之三價聚羧酸及其衍生物及具有酸酐基之四價聚羧 酸之一種以上之化合物,與(b)成分:異氰酸酯化合物 或胺化合物之反應,係在有機溶劑,較好在非含氮系極性 溶劑存在下,藉由自反應系統去除游離產生之碳酸氣體之 下予以加熱縮合而進行。 上述非含氮系極性溶劑舉例有二乙二醇二甲基醚、二 乙二醇二乙基醚、三乙二醇二甲基醚、三乙二醇二乙基醚 等醚系溶劑;二甲基亞楓、二乙基亞硼、二甲基颯、環丁 碼等含硫系溶劑;γ-丁內酯、乙酸溶纖素等酯系溶劑;環 己酮、甲基乙基酮等酮系溶劑;甲苯、二甲苯等芳香族烴 系溶劑等。該等可單獨使用或組合兩種以上使用。 較好選擇使用使自上述溶劑內產生之樹脂溶解之溶劑 。合成後,較好就此使用適合作爲糊料溶劑者。爲了以高 揮發性、可賦予低溫硬化性且可以效率良好地均一系進行 反應,亦最好爲γ -丁內酯。 又,溶劑之使用量較好爲含有所生成之醯亞胺鍵之樹 脂之0.8〜5.0倍(重量比)。若未達〇.8倍,則合成時之 黏度過高,由於無法攪拌而有難以合成之傾向’若超過 5 · 〇倍,則有反應速度降低之傾向。 反應溫度以8 0〜210 °C較佳’以1〇〇~190 °C更好’且以 120〜180。(:最佳。未達80°C則反應時間過長,若超過210°C 則反應中易產生三次元反應而容易造成膠凝。反應時間可 視批次之規模、採用之反應條件做適當的選擇。 -20- 200911922 又’依據需要,亦可在三級胺類、鹼金屬、鹼土類金 屬、錫、鋅、鈦、鈷等金屬或半金屬化合物等觸媒存在下 進行反應。 如上述獲得之聚醯胺樹脂、聚醯胺醯亞胺樹脂及聚醯 亞胺樹脂爲具有異氰酸酯殘基者,且上述異氰酸酯殘基可 藉由與上述通式(2)及/或上述通式(3)之化合物反應 ,而獲得具有酸酐基之樹脂,可提高與後述(B)成分之 環氧樹脂之反應性,且可降低對聚醯亞胺基材之貼附性。 又,除上述通式(2)及/或上述通式(3)之化合物 以外,在不損及本發明效果之程度下亦可併用醇類、內醯 胺類、肟類等封阻劑。 上述通式(2)及/或上述通式(3)之化合物較好爲 以下述式(14)表示之四羧酸二酐(均苯四酸酐)。II II (In the formula (13), the plurality of R are each independently an alkylene group having 1 to 18 carbon atoms, X is a divalent organic group, m and η are each independently an integer of 1 to 20, and Y2 is selected from the above The formula (7) represents the basis of a plurality of bases). In the production method of the "resin having an acid anhydride group and/or -19-200911922 or a carboxyl group" used in the present invention, the component (a) is selected from a trivalent polycarboxylic acid having an acid anhydride group. And a derivative thereof and one or more compounds of a tetravalent polycarboxylic acid having an acid anhydride group, and the component (b): an isocyanate compound or an amine compound are reacted in an organic solvent, preferably in the presence of a non-nitrogen-containing polar solvent. It is carried out by heating and condensing under the removal of freely generated carbonic acid gas from the reaction system. Examples of the non-nitrogen-containing polar solvent include ether solvents such as diethylene glycol dimethyl ether, diethylene glycol diethyl ether, triethylene glycol dimethyl ether, and triethylene glycol diethyl ether; a sulfur-containing solvent such as methyl sulfoxide, diethyl boron, dimethyl hydrazine or cyclobutyl ketone; an ester solvent such as γ-butyrolactone or fibrin acetate; cyclohexanone, methyl ethyl ketone, etc. A ketone solvent; an aromatic hydrocarbon solvent such as toluene or xylene. These may be used alone or in combination of two or more. It is preferred to use a solvent which dissolves the resin generated in the above solvent. After the synthesis, it is preferred to use a solvent suitable as a paste. In order to carry out the reaction with high volatility, low-temperature curability, and efficient and uniform, it is also preferable to use γ-butyrolactone. Further, the solvent is preferably used in an amount of from 0.8 to 5.0 times by weight (by weight) based on the resin containing the produced quinone bond. If it is less than 8 times, the viscosity at the time of the synthesis is too high, and it is difficult to synthesize because it cannot be stirred. If it exceeds 5 · 〇, the reaction rate tends to decrease. The reaction temperature is preferably from 80 °C to 210 °C, preferably from 1 Torr to 190 °C, and from 120 ° to 180 °C. (:The best. If the temperature is less than 80 °C, the reaction time is too long. If it exceeds 210 °C, the reaction will be easy to cause gelation. The reaction time can be made according to the batch size and the reaction conditions. -20- 200911922 Also, 'Reaction can be carried out in the presence of a catalyst such as a tertiary amine, an alkali metal, an alkaline earth metal, tin, zinc, titanium, cobalt or a metal or a semimetal compound, as required. The polyamine resin, the polyamidimide resin, and the polyimine resin are those having an isocyanate residue, and the above isocyanate residue can be obtained by the above formula (2) and/or the above formula (3) By reacting the compound to obtain a resin having an acid anhydride group, the reactivity with the epoxy resin of the component (B) described later can be improved, and the adhesion to the polyimide substrate can be lowered. 2) and/or the compound of the above formula (3), a blocking agent such as an alcohol, an indoleamine or an anthracene may be used in combination to the extent that the effects of the present invention are not impaired. / or the compound of the above formula (3) is preferably represented by the following formula (14) The tetracarboxylic dianhydride (pyromellitic anhydride).

上述均苯四酸酐之添加量,相對於全部異氰酸酯之量 ,係在1〇〜20%之範圍內。若添加量在20%以上’則難以 控制黏度,且作業性降低。又,未達1 〇%時’硬化後容易 產生與聚醯亞胺薄膜之貼附。 另外,本發明中,可作爲(A)成分使用之具有酸酐 基及/或羧基之樹脂之其他成分,可例如使通式(9 )、通 式(10)及下述通式(15)混合,在與合成上述(b-1) -21 - 200911922 時相同之條件下反應而獲得。如此獲得之樹脂爲具有以下 列通式(16)表示之重複構造之含有羧基之胺基甲酸酯樹 脂,可提高與後述(B )成分之環氧樹脂之反應性’且降 低與聚醯亞胺基材之貼附性。 如上述獲得之具有羧基之胺基甲酸酯樹脂於具有異氰 酸酯殘基之情況下,亦可使用通式(2 )、通式(3 )、醇 類、內醯胺類、肟類等與上述異氰酸酯殘基進行反應。 以通式(1 5 )表示之化合物舉例有例如二羥甲基丙酸 、二羥甲基丁酸等。 【化1 4】 R1The amount of the above pyromellitic anhydride added is in the range of 1 Torr to 20% based on the total amount of the isocyanate. If the amount is more than 20%, it is difficult to control the viscosity and the workability is lowered. Further, when it is less than 1%, it tends to adhere to the polyimide film after hardening. Further, in the present invention, other components of the resin having an acid anhydride group and/or a carboxyl group which can be used as the component (A) can be, for example, a mixture of the general formula (9), the general formula (10) and the following general formula (15). It is obtained by the reaction under the same conditions as in the synthesis of the above (b-1) - 21 - 200911922. The resin thus obtained is a carboxyl group-containing urethane resin having a repetitive structure represented by the following formula (16), which can improve the reactivity with the epoxy resin of the component (B) described later and reduce Adhesion of the amine substrate. When the urethane resin having a carboxyl group obtained as described above has an isocyanate residue, the formula (2), the formula (3), an alcohol, an indoleamine, an anthracene or the like may be used as described above. The isocyanate residue is reacted. The compound represented by the formula (15) is exemplified by, for example, dimethylolpropionic acid, dimethylolbutanoic acid or the like. [1 1] R1

HOH,C-C-CH,OH 1 I 2 COOH , (式(15)中,R1表示氫原子、碳數1〜3之烷基) 【化1 5】 Ο Ο Ο Ί Ο II II II II X-N-C-0-(-R-〇-C-〇-)-R-〇-C-N- -X-N-C-0-H.C-C-CH-0-C- Ν I m II 2 ι 2 ΗHOH, CC-CH, OH 1 I 2 COOH , (in the formula (15), R1 represents a hydrogen atom, an alkyl group having 1 to 3 carbon atoms) [Chemical Formula 1 5] Ο Ο Ο Ί Ο II II II II XNC-0 -(-R-〇-C-〇-)-R-〇-CN- -XNC-0-HC-C-CH-0-C- Ν I m II 2 ι 2 Η

ο II I Η I Ηο II I Η I Η

COOH (16) (式(16)中,複數個R各獨立爲碳數1〜18之伸烷 基’ R1爲氫原子、碳數1〜3之烷基,X爲二價有機基,m 及η各獨立爲1~20之整數)。 如此獲得之樹脂之數平均分子量較好爲15,000〜50, 〇〇〇 ,更好爲20,000-45,000,且以25,000〜40,000最佳,此時 之分散度以1.5~3_5較佳,以2_0〜3.0更好。若數平均分 子量未達15,000,則有硬化被膜易與聚醯亞胺薄膜產生貼 -22- 200911922 附之傾向’若數平均分子量超過50,000,則樹脂之黏性變 高’而有無機塡充劑及/或有機塡充劑之混合性及網版印 刷等作業性降低之傾向,因此較不好。 ((B)成分:環氧樹脂) 本發明之樹脂組成物中,可添加各種環氧樹脂以改善 熱硬化性。作爲硬化劑之環氧樹脂舉例爲例如雙酚a型 環氧樹脂(油化蜆殼環氧(股)製造之商品名「EPICOTE 82 8」等)、雙酚F型環氧樹脂(東都化成(股)製之商 品名「YDF-170」等)、酚醛清漆型環氧樹脂(油化蜆殼 環氧(股)製之商品名「EPICOTE 152、154」;日本化 藥(股)製之商品名「EPPN-201」;道化學公司製之商 品名「DEN-43 8」等)、鄰-甲酚清漆型環氧樹脂(日本 化藥(股)製之商品名「EOCN-125S、103S、104S」等) 、多官能環氧樹脂(油化蜆殼環氧(股)製之商品名「 Ep〇nl031S」;汽巴特用化學品(股)製造之商品名「 ARALDITE 〇 1 63」;Nagase化成(股)製之商品名「 DENACOL EX-6 1 1、EX-6 1 4、EX-6 1 4B、EX-622、EX-5 1 2 、EX-521、EX-421、EX-411、EX-321」等)、胺型環氧 樹脂(油化蜆殼環氧(股)製之商品名「EPICOTE 604」 :東都化成(股)製之商品名「YH43 4」;三菱氣體化學 (股)製之商品名「TETRAD-X」、「TERRAD-C」;日 本化藥(股)智之商品名「GAN」:住友化學(股)製之 商品名「ELM-120」等)、含雜環之環氧樹脂(汽巴特用 -23- 200911922 化學品(股)製造之商品名「ARALDITE PT810」等)、 脂環式環氧樹脂(UCC公司製造之「ERL4234、4299、 4221、4206」等),該等可單獨使用或組合兩種以上使用 。該等環氧樹脂中,每1分子中含有3個以上環氧基之胺 型環氧樹脂就耐溶劑性、耐藥品性、耐濕性改善之觀點而 言爲最佳。 該等環氧樹脂亦包含每一分子中含有1個環氧基之環 氧化合物。該等環氧化合物,相對於(A)成分之「含有 醯胺鍵之樹脂」總量,以在〇〜20重量%之範圍內使用較 佳。該等環氧化合物爲正丁基縮水甘油醚、苯基縮水甘油 醚、二溴苯基縮水甘油醚、二溴甘油基縮水甘油醚等。另 外,可使用3,4 -環氧基環己基、甲基(3,4·環氧基環己院 )羧酸酯等脂環式環氧化合物。 該等環氧樹脂之使用量,相對於作爲(A )成分使用 之「具有酸酐基及/或羧基之樹脂」100重量份’較好爲 1〜50重量份’更好爲2〜45重量份’又更好爲3~40重量 份。環氧樹脂之調配量未達1重量份時’樹脂組成物之硬 化性、耐溶劑性、耐藥品性、耐濕性有降低之傾向’當超 過50重量份時,耐熱性及黏度安定性有降低之傾向。 上述環氧樹脂之添加方法可將添加之環氧樹脂溶解於 使作爲(A)成分使用之「具有酸酐基及/或羧基之樹脂」 溶解之有機溶劑相同之有機溶劑中之後添加’另外’亦可 直接添加。 -24- 200911922 [(C)成分:包含水滑石之塡充劑] 本發明中作爲(C)成分使用之塡充劑爲 者。本發明之樹脂組成物中所用之(C )成分 石作爲必要成分之塡充劑。該塡充劑之含量, (A)成分 100重量份,以1〜25 0重量份 30〜200重量份好,且以50〜100重量份爲最仓 成分之含有量比上述少時,樹脂組成物之糊料 性係數低,糊料之牽絲會增加造成印刷後之糊 ’樹脂組成物之膜厚亦有薄膜化之傾向,且硬 特性有劣化之傾向。另外,當(C )成分之含 時,樹脂組成物糊料之黏度及觸變性係數變高 對基材之轉印性降低同時有使印刷膜中之孔隙 之傾向。 ((c )成分之粒徑) 本發明之樹脂組成物中所用之(C )成分 好使用平均粒徑在5〇μηι以下,且最大粒徑在 之粒徑。若平均粒徑超過5 〇 μηι,則難以獲得 係數爲1 · 1以上之樹脂組成物糊料,若最 ΙΟΟμιη,則有樹脂組成物之塗膜外觀、密著性 。該(C )成分之平均粒徑更好爲3〇μιη以下 ΙΟμηα以下,且最好爲1μιη以下。另外,該 最大粒徑更好爲8〇μΐη以下,又更好爲6〇μπι 好爲40μηι以下。 包含水滑石 爲含有水滑 相對於上述 爲較佳,以 I。該(c) 黏度及觸變 料流出變大 化被膜之電 量比上述多 ,因此糊料 及針孔增加 :塡充劑較 1 〇 0 μ m以下 後述觸變性 &粒徑超過 不足之傾向 ’又更好爲 c )成分之 以下,且最 -25- 200911922 (水滑石) 水滑石(hydrotalcite)爲以下列通式(17)表示之 復水氧化物。 M1g.xM2x(0H)i6C03 * nH20 ( 17) (式(17 )中,Μ1 表示 Mg2+、Fe2+、Zn2+、Ca2+、 Li2+、Ni2+、Co2+、Cu2+,M2 表示 Al3+、Fe3+、Mn3+。x 表示2〜5之整數,n表示正整數)。 該等中,以下列化學組成式表示之鎂與鋁化合物爲最 佳,且可以HT-P (堺化學股份有限公司製,商品名)自 商業獲得。COOH (16) (In the formula (16), the plurality of R are each independently an alkylene group having 1 to 18 carbon atoms. R1 is a hydrogen atom, an alkyl group having 1 to 3 carbon atoms, and X is a divalent organic group, m and η is independently an integer from 1 to 20). The number average molecular weight of the resin thus obtained is preferably from 15,000 to 50, more preferably from 20,000 to 45,000, and most preferably from 25,000 to 40,000, and the dispersion at this time is preferably from 1.5 to 3 to 5, and from 2 to 3.0. better. If the number average molecular weight is less than 15,000, the hardened film is liable to be attached to the polyimide film. -22-200911922 The tendency is 'If the average molecular weight exceeds 50,000, the viscosity of the resin becomes high' and the inorganic chelating agent And the compatibility of the organic chelating agent and the tendency to reduce the workability such as screen printing are not preferable. (Component (B): Epoxy resin) Various epoxy resins can be added to the resin composition of the present invention to improve thermosetting properties. The epoxy resin as the curing agent is exemplified by, for example, a bisphenol a-type epoxy resin (trade name "EPICOTE 82 8" manufactured by the oil-coated clamshell epoxy resin), and a bisphenol F-type epoxy resin (Dongdu Huacheng (share) "The product name "YDF-170", etc.), the novolac type epoxy resin (the product name "EPICOTE 152, 154" made by the oily clamshell epoxy (share); the product name of the Nippon Chemical Co., Ltd." EPPN-201"; trade name "DEN-43 8" manufactured by Dow Chemical Co., Ltd.), o-cresol varnish type epoxy resin (trade name "EOCN-125S, 103S, 104S" manufactured by Nippon Kayaku Co., Ltd. Etc.), multi-functional epoxy resin (trade name "Ep〇nl031S" made by oily clamshell epoxy (shares); trade name "ARALDITE 〇1 63" made by steam batter chemicals (shares); Nagase chemical conversion (shares) The product name "DENACOL EX-6 1 1 , EX-6 1 4, EX-6 1 4B, EX-622, EX-5 1 2, EX-521, EX-421, EX-411, EX-321" "Equivalent Epoxy Resin" (EPICOTE 604, manufactured by Oyster Chemical Co., Ltd.): The product name "YH43 4" manufactured by Tohto Kasei Co., Ltd.; Mitsubishi Gas The trade name "TETRAD-X" and "TERRAD-C" of the chemical (share) system; the trade name "GAN" of the Japanese chemical company (share): the product name "ELM-120" by Sumitomo Chemical Co., Ltd., etc. Epoxy resin containing a heterocyclic ring (trade name "ARALDITE PT810" manufactured by 234-200911922 Chemicals Co., Ltd.), and alicyclic epoxy resin ("ERL4234, 4299, 4221, 4206" manufactured by UCC Corporation ", etc.), these may be used alone or in combination of two or more. Among these epoxy resins, an amine type epoxy resin containing three or more epoxy groups per molecule is preferable from the viewpoint of improving solvent resistance, chemical resistance, and moisture resistance. These epoxy resins also contain an epoxy compound containing one epoxy group per molecule. The epoxy compound is preferably used in an amount of from 〇 to 20% by weight based on the total amount of the "melamine bond-containing resin" of the component (A). These epoxy compounds are n-butyl glycidyl ether, phenyl glycidyl ether, dibromophenyl glycidyl ether, dibromoglyceryl glycidyl ether and the like. Further, an alicyclic epoxy compound such as a 3,4-epoxycyclohexyl group or a methyl (3,4·epoxycyclohexanyl) carboxylate can be used. The amount of the epoxy resin used is preferably from 1 to 50 parts by weight, more preferably from 2 to 45 parts by weight, per 100 parts by weight of the "resin having an acid anhydride group and/or a carboxyl group" used as the component (A). 'It is better for 3 to 40 parts by weight. When the amount of the epoxy resin is less than 1 part by weight, the curability, solvent resistance, chemical resistance, and moisture resistance of the resin composition tend to decrease. When it exceeds 50 parts by weight, heat resistance and viscosity stability are improved. Reduce the tendency. The method of adding the epoxy resin may be carried out by dissolving the added epoxy resin in an organic solvent having the same organic solvent as the "resin having an acid anhydride group and/or a carboxyl group" used as the component (A), and then adding 'additional' Can be added directly. -24- 200911922 [(C) component: hydrazine containing hydrotalcite] The hydrazine used as the component (C) in the present invention. The component (C) used in the resin composition of the present invention is a chelating agent as an essential component. The content of the chelating agent is preferably from 100 to 200 parts by weight, based on 100 parts by weight of the component (A), and from 30 to 200 parts by weight, and from 50 to 100 parts by weight, less than the above, the resin composition The paste coefficient of the material is low, and the draw of the paste increases the film thickness of the resin composition after printing, which tends to be thinned, and the hard characteristics tend to deteriorate. Further, when the component (C) is contained, the viscosity and the thixotropic coefficient of the resin composition paste become high, and the transfer property to the substrate is lowered and the porosity in the printed film tends to be lowered. (Particle size of component (c)) The component (C) used in the resin composition of the present invention preferably has an average particle diameter of 5 Å or less and a maximum particle diameter of the particle size. When the average particle diameter exceeds 5 〇 μηι, it is difficult to obtain a resin composition paste having a coefficient of 1.1 or more, and if it is the most ΙΟΟμη, there is a coating film appearance and adhesion of the resin composition. The average particle diameter of the component (C) is more preferably 3 〇μηη or less ΙΟμηα or less, and is preferably 1 μm or less. Further, the maximum particle diameter is preferably 8 〇 μΐη or less, and more preferably 6 〇 μπι is preferably 40 μηι or less. Containing hydrotalcite is preferred to contain water slippery relative to the above. The (c) viscosity and the thixotropic material flow out of the film are larger than the above, so the paste and pinhole increase: the thixotropy is less than 1 〇 0 μ m, and then the thixotropy & particle size exceeds the tendency of insufficient More preferably, it is below c), and most -25-200911922 (hydrotalcite) Hydrotalcite is a rehydrated oxide represented by the following general formula (17). M1g.xM2x(0H)i6C03 * nH20 (17) (In the formula (17), Μ1 represents Mg2+, Fe2+, Zn2+, Ca2+, Li2+, Ni2+, Co2+, Cu2+, and M2 represents Al3+, Fe3+, Mn3+. x represents 2~5 An integer, n is a positive integer). Among these, magnesium and aluminum compounds represented by the following chemical composition formula are preferred, and are commercially available from HT-P (trade name, manufactured by Seiko Chemical Co., Ltd.).

Mg6Al2(0H)16C03 · 4H20 本發明之樹脂組成物中添加之作爲塡充劑成分之水滑 石爲具有制酸劑之作用,且有可減輕包含具有酸酐基及/ 或羧基之樹脂之樹脂組成物增黏之效果。又,水滑石係使 碳酸基解離產生碳酸離子(co?_),該碳酸離子具有與 樹脂組成物中所含氯化物離子(cr )及/或硫酸離子( so,)置換之作用。若氯化物離子(cr )及/或硫酸離子 (sor )存在於硬化被膜中,則對於絕緣信賴性有不良影 響,藉由與上述碳酸離子之置換作用可提高絕緣信賴性。 然而,調配量過多則會導致印刷外觀不良,因此不佳。而 且,藉由在本發明之樹脂組成物中調配水滑石’亦可使以 本發明之樹脂組成物之硬化被膜保護之配線板在通電後之 電極之黑色隆起獲得減輕之效果。另外,水滑石可獲得良 -26- 200911922 好難燃性之效果。 該水滑石之含量’相對於(A)成分100重 1〜50重量份較佳’以5~40重量份更佳,且以11 份最佳。若水滑石之含量未達1重量份,則樹月曰 增黏減輕效果不足’且有電極黑色隆起發生之傾 5 0重量份以上,則有樹脂組成物之印刷外觀不 影響之傾向。 另外,水滑石在(C)成分中之含量以10丨 質量%較佳,以1 0 ~ 3 0質量。/。更佳’且以1 5〜2 5 最佳。若(C)成分中之水滑石含量未達10質量 脂組成物之增黏減輕效果不足’若超過5 0質量 樹脂組成物之印刷外觀不良之不良影響。 本發明中所用(C )成分中除水滑石以外之 分,可使用無機塡充劑及/或有機塡充劑。首先 機塡充劑。 水滑石爲如上述無機塡充劑之一種,但除了 以外之無機塡充劑可使用例如氧化矽(Si〇2 )、 Al2〇3 )、氧化鈦(Ti02 )、氧化钽(Ta205 )、 Zr02 )、氮化矽(Si3N4 )、鈦酸鋇(BaO . Ti02 鋇(B a C ◦ 3 )、鈦酸鉛(p b 〇 · T i Ο 2 )、鉻酸鈦酵 )、鍩酸鈦酸鑭鉛(PLZT)、氧化鎵(Ga203) (MgO · Al2〇3 )、莫來石(3Al203.2Si02)、 2MgO · 2Al203/5Si〇2 )、滑石(3MgO · 4Si02 . 欽酸鋁(Ti02-Al203 )、含有氧化釔之氧化鐘 量份,以 〕〜3 0重量 組成物之 向,若爲 良等不良 質量% ~ 5 0 質量%爲 :%,則樹 :%,則有 塡充劑成 ,說明無 該水滑石 氧化鋁( 氧化銷( )、碳酸 i 鉛(PZT 、尖晶石 堇青石( H2〇 )、 f ( Y 2 ο 3 -27- 200911922Mg6Al2(0H)16C03 · 4H20 The hydrotalcite added as a hydrazine component in the resin composition of the present invention has an action as an antacid, and has a resin composition capable of alleviating a resin containing an acid anhydride group and/or a carboxyl group. The effect of thickening. Further, the hydrotalcite dissociates the carbonic acid group to produce carbonate ions (co?) which have a function of replacing the chloride ions (cr) and/or sulfate ions (so) contained in the resin composition. If chloride ions (cr) and/or sulfate ions (sor) are present in the cured film, the insulating reliability is adversely affected, and the insulating reliability can be improved by the replacement with the above carbonate ions. However, too much blending will result in poor print appearance and is therefore not good. Further, by blending the hydrotalcite in the resin composition of the present invention, the black ridge of the electrode after the electrification of the wiring board protected by the hardened film of the resin composition of the present invention can be alleviated. In addition, the hydrotalcite can obtain good flammability effects from -26 to 200911922. The content of the hydrotalcite is preferably 1 to 50 parts by weight with respect to 100 parts of the component (A), more preferably 5 to 40 parts by weight, and most preferably 11 parts by weight. When the content of the hydrotalcite is less than 1 part by weight, the effect of reducing the viscosity of the tree sap is insufficient, and when the electrode black ridge is inclined to 50 parts by weight or more, the printed appearance of the resin composition does not tend to be affected. Further, the content of the hydrotalcite in the component (C) is preferably 10% by mass, and is 10 to 30% by mass. /. Better' and 1 5~2 5 is the best. If the hydrotalcite content in the component (C) is less than 10%, the viscosity-reducing effect of the fat composition is insufficient. If it exceeds 50%, the adverse effect of the printed appearance of the resin composition is poor. In the component (C) used in the present invention, an inorganic chelating agent and/or an organic hydrazine agent may be used in addition to the hydrotalcite. First, the machine is filled with sputum. The hydrotalcite is one of the above inorganic chelating agents, but other inorganic ceraming agents other than the inorganic cerium can be used, for example, cerium oxide (Si〇2), Al2〇3), titanium oxide (Ti02), cerium oxide (Ta205), Zr02) , tantalum nitride (Si3N4), barium titanate (BaO. Ti02 钡 (B a C ◦ 3 ), lead titanate (pb 〇 · T i Ο 2 ), titanium dichromate), bismuth titanate titanate ( PLZT), gallium oxide (Ga203) (MgO · Al2〇3), mullite (3Al203.2SiO2), 2MgO · 2Al203/5Si〇2), talc (3MgO · 4Si02. Alginate (Ti02-Al203), containing The oxidation amount of cerium oxide is in the range of ~~30 weight composition, and if it is good quality % to 50% by mass: %, then tree: %, there is a chelating agent, indicating that there is no such Hydrotalcite alumina (oxidized pin ( ), carbonic acid i lead (PZT, spinel cordierite (H2〇), f (Y 2 ο 3 -27- 200911922

Zr02)、矽酸鋇(Ba0.8Si02)、氮化硼(bn) '碳酸 鈣(CaC03)、硫酸鈣(CaS04)、氧化鋅(ZnO)、鈦酸 鎂(Mg0.Ti02)、硫酸鋇(BaS〇4)、有機膨潤土、碳 (C)等。可使用該等之一種或兩種以上。 該等無機塡充劑中,尤其就電特性(絕緣信賴性等) 亦良好之觀點而言’以使用硫酸鋇、滑石爲較佳。另外, 由印刷性、操作性之觀點而言以使用硫酸鋇較佳。 另一方面之有機塡充劑以具有醯胺鍵、醯亞胺鍵、酯 鍵或醚鍵之耐熱性樹脂之微粒子較佳。該等耐熱性樹脂由 耐熱性與機械特性之觀點而言,較好係使用聚醯亞胺樹脂 或其前驅物、聚醯胺醯亞胺樹脂或其前驅物,或聚醯胺樹 脂之微粒子。 作爲上述有機塡充劑使用之耐熱性樹脂可如下列般製 造。 首先’可使(C )芳香族四羧酸二酐與(d )芳香族二 胺化合物反應可獲得上述耐熱性樹脂之一之聚醯亞胺樹脂 〇 (C )芳香族四羧酸二酐舉例有例如均苯四甲酸酐、 3,3’,4,4’-聯苯四羧酸二酐、2,2’,3,3’-雙苯基四羧酸二酐 、2,2’,3,3’-聯苯四羧酸二酐、2,3,3’,4-聯苯四羧酸二酐、 2,2-雙(3,4-二羧基苯基)丙烷二酐、ι,ι_雙(3,4_二羧基 苯基)乙烷二酐、雙(2,3-二羧基苯基)甲烷二酐、雙( 3,4-二羧基苯基)甲烷二酐、雙(3,4-二羧基苯基)颯二 酐、3,4,9,10-茈四羧酸二酐、雙(3,4-二羧基苯基)醚二 -28- 200911922 酐、苯-1,2,3,4-四羧酸二酐、3,4,3’,4’-二苯甲酮四羧酸二 酐、2,3,2’,3’-二苯甲酮四羧酸二酐、2,3,3’,4’-二苯甲酮 四羧酸二酐、1,2,5,6-萘四羧酸二酐、2,3,6,7-萘四羧酸二 酐、1,2,4,5-萘四羧酸二酐、1,4,5,8-萘四羧酸二酐、2,6-二氯萘-1,4,5,8-四羧酸二酐、2,7-二氯萘-1,4,5,8-四羧酸 二酐、2,3,6,7-四氯萘-1,4,5,8-四羧酸二酐、菲-1,8,9,10-四羧酸二酐、雙(3,4-二羧基苯基)二甲基矽烷二酐、雙 (3,4-二羧基苯基)甲基苯基矽烷二酐、雙(3,4-二羧基 苯基)二苯基矽烷二酐、1,4-雙(3,4-二羧基苯基二甲基 矽烷基)苯二酐、1,3 -雙(3,4 -二羧基苯基)-1,1,3 ,3 -四 甲基二環己烷二酐、對-伸苯基雙(偏苯三甲酸單酯酸酐 )、2,2-雙(3,4-二羧基苯基)六氟丙烷二酐、2,2-雙{4-(3,4-二羧基苯氧基)苯基}六氟丙烷二酐、2,2-雙{4-( 3,4-二羧基苯氧基)苯基}丙烷二酐、4,4-雙(3,4-二羧基 苯氧基)二苯基硫醚二酐、1,4-雙(2-羥基六氟異丙基) 苯雙(偏苯三甲酸酐)、:l,3-雙(2-羥基六氟異丙基)苯 雙(偏苯三甲酸酐)、1,2-(伸乙基)雙(偏苯三甲酸酐 )、1,3-(三亞甲基)雙(偏苯三甲酸酐)、1,4-(四亞 甲基)雙(偏苯三甲酸酐)、1,5-(五亞甲基)雙(偏苯 三甲酸酐)、1,6-(六亞甲基)雙(偏苯三甲酸酐)、 1,7-(七亞甲基)雙(偏苯三甲酸酐)、1,8-(八亞甲基 )雙(偏苯三甲酸酐)、1,9-(九亞甲基)雙(偏苯三甲 酸酐)、1,10-(十亞甲基)雙(偏苯三甲酸酐)、1,12-(十二亞甲基)雙(偏苯三甲酸酐)、1,16-(十六亞甲 -29- 200911922 基)雙(偏苯三甲酸酐)、118-(十八亞甲基)雙(偏 苯三酸酐)等,該等亦可混用。 上述(c)芳香族四羧酸二酐可依據目的,在不超過 芳香族四羧酸二酐之50莫耳%範圍內可使用芳香族四羧 酸二酐以外之四羧酸二酐。該等四羧酸二酐舉例爲例如伸 乙基四羧酸二酐' 1,2,3,4- 丁烷四羧酸二酐、哌啶_ 2.3.5.6- 四羧酸二酐、噻吩-2,3,4,5-四羧酸二酐、十氫萘-1,4,5,8·四羧酸二酐、4,8-二甲基-1,2,3,5,6,7-六氫萘- 1.2.5.6- 四羧酸二酐、環戊烷-1,2,3,4-四羧酸二酐、吡咯 啶-2,3,4,5-四羧酸二酐、1,2,3,4-環丁烷四羧酸二酐、雙{ 外(6乂〇)-雙環[2,2,1]庚烷-2,3-二羧酸二酐}颯、雙環-( 2,2,2)-辛烷(7)-烯-2,3,5,6-四羧酸二酐、5-(2,5-二氧 代四氫呋喃基)-3-甲基-3-環己烷-1,2-二羧酸酐、四氫呋 喃-2,3,4,5-四羧酸二酐等。 接著,上述(d )芳香族二胺化合物舉例爲例如鄰-苯 二胺、間-苯二胺、對-苯二胺、3,3 ’ -二胺基二苯基醚、 4,4’-二胺基二苯基醚、3,4,-二胺基二苯基醚、3,3’-二胺 基二苯基甲烷、3,4’-二胺基二苯基甲烷、4,4’_二胺基二 苯基甲烷、3,3、二胺基二苯基二氟甲烷、4,4’-二胺基二 苯基二氟甲烷、3,3,-二胺基二苯基楓、3,4’_二胺基二苯 基楓、4,4’ -二胺基二苯基颯、3,3’-二胺基二苯基硫醚、 3,3’-二胺基二苯基酮、3,4,-二胺基二苯基酮、4,4’-二胺 基二苯基酮、2,2-雙(3-胺基苯基)丙烷、2,2-雙(3,4’_ 二胺基苯基)丙烷、2,2-雙(4-胺基苯基)丙烷、2,2-雙 -30- 200911922 (3 -胺基苯基)六氟丙烷、2,2-雙(3,4, _二胺基苯基)六 赢丙院、2,2_雙(4_胺基苯基)六氟丙燒、丨,3_雙(3 -胺 基苯基)苯、1,4-雙(4-胺基苯基)苯、伸苯基 雙(丨_甲基亞乙基)]雙苯胺' 3,4,_[1,4_伸苯基雙(丨_甲 基亞乙基)]雙苯胺、4,4’-[1,4 -伸苯基雙(卜甲基亞乙基 )]雙苯胺、2,2-雙[4- ( 3-胺基苯氧基)苯基]丙烷、2,2_ 雙[4- (4 -胺基苯氧基)苯基]丙烷、2,2 -雙[4- (3 -胺基苯 氧基)本基]/、氟丙院' 2,2-雙[4- (4-胺基苯氧基)苯基] 六氟丙院、雙[4- (3 -胺基苯氧基)苯基]硫酸、雙[4_(4_ 胺基苯氧基)苯基]硫醚、雙[4- (3 -胺基苯氧基)苯基]颯 、雙[4- ( 4-胺基苯氧基)苯基]碾等,該等亦可混合使用 〇 上述(d )芳香族二胺化合物可依據目的,在不超過 芳香族二胺化合物之5 0莫耳%範圍內使用芳香族二胺化 合物以外之二胺化合物。該等二胺化合物舉例爲例如1,2 _ —胺基乙燒、1,3 - 一胺基丙院、1,4 -二胺基丁院、1,5 -二 胺基戊烷、1,6 -二胺基己烷、1,7 -二胺基庚烷、丨,8 ·二胺 基辛烷、1,9-二胺基壬院、1,1〇 -二胺基癸烷、i,u_二胺 基十一烷、U3-雙(3-胺基丙基)四甲基二矽氧烷' 〗,3_ 雙(3_胺基丙基)四甲基聚矽氧烷等。 上述(c)芳香族四殘酸二酐與上述(d)芳香族二胺 化合物就樹脂組成物之膜特性之觀點而言,較好以等莫耳 反應。 (C)芳香S矣四殘酸二g干與(d)芳香族二胺化合物之 -31 - 200911922 反應係在有機溶劑中進行。該情況下之有機溶劑係使用例 如N -甲基-2-吡咯啶酮、二甲基乙醯胺、二甲基甲醯胺、 1,3-二甲基-3,4,5,6-四氫_2(11^)-喃陡酮、1,3-二甲基-2-咪 哩陡酮等含氮化合物;環丁碼、一甲基亞碾等硫化合物; γ-丁內酯、γ-戊內酯、γ -己內酯、庚內酯、α·乙醯基_γ_ 丁內酯、ε·己內酯等內酯類;二噁烷、丨,2-二甲氧基乙烷 、二乙二醇二甲基(或二乙基、二丙基、二丁基)醚、三 乙二醇二甲基(或二乙基、二丙基、二丁基)醚、四乙二 醇二甲基(或二乙基、二丙基、二丁基)醚等醚類;甲基 乙基酮、甲基異丁基酮、環己酮、苯乙酮等酮類;丁醇、 辛醇、乙二醇、甘油、二乙二醇單甲基(或單乙基)醚、 三乙二醇單甲基(或單乙基)醚、四乙二醇單甲基(或單 乙基)醚等醇類;酚、甲酚、二甲酚等酚類;乙酸乙酯、 乙酸丁酯、乙基溶纖素乙酸酯、丁基溶纖素乙酸酯等酯類 ;甲苯、二甲苯、二乙基苯、環己烷等烴類;三氯乙烷、 四氯乙烷、單氯苯等鹵化烴類等。該等有機溶劑可單獨使 用或混合使用。考量到溶解性、低吸濕性、低溫硬化性、 環境安全性等,以使用內酯類、醚類、酮類等較佳。 反應溫度係在80°C以下較好在0~50°C下進行。反應 進行期間反應溶液之黏度會緩慢的增加。該情況下,會生 成聚醯亞胺樹脂前驅物之聚醯胺酸。該聚醯胺酸亦可部份 經醯亞胺化’該等亦包含於聚醯亞胺樹脂之前驅物中。 上述聚醯亞胺樹脂係使上述反應物(聚醯胺酸)經脫 水閉環獲得。脫水閉環可藉以1 2 0 °c ~ 2 5 下熱處理之方 -32- 200911922 法(熱醯亞胺化)或以使用脫水劑進行之方法(化學醯亞 胺化)進行。對於在12CTC〜25 0 °C下熱處理之方法,較好 一邊將脫水反應產生之水排除在系統外一邊進行。此時, 亦可使用苯、甲苯、二甲苯等共沸除去水。 使用脫水劑進行脫水閉環之方法較好使用乙酸酐、丙 酸酐、苯甲酸酐等酸酐,二環己基碳二醯亞胺等碳二醯亞 胺化合物等作爲脫水劑。此時亦可視情況使用吡啶、異喹 啉、三甲基胺、胺基吡啶咪唑等脫水觸媒。脫水劑或脫水 觸媒相對於芳香族四羧酸二酐1莫耳,以各在1〜8莫耳範 圍內使用較佳。 上述聚醯胺醯亞胺樹脂或前驅物可在上述聚醯亞胺樹 脂或其前驅物之製造中,使用偏苯三酸酐或偏苯三酸酐衍 生物(偏苯二酸肝之氣化物等)二價三殘酸肝或其衍生物 替代芳香族四羧酸二酐而製造。又,替代芳香族二胺化合 物及其他二胺化合物,胺基以外之殘基亦可代之使用對應 於其二胺化合物之二異氰酸酯化合物而製造。可使用之二 異氰酸酯化合物爲使上述芳香族二胺化合物或其他二胺化 合物與碳醯氯或亞硫醯氯反應獲得者。 上述聚醯胺樹脂可藉由使對苯二甲酸、間苯二甲酸、 苯二甲酸等芳香族二羧酸、該等之二氯化物、酸酐等衍生 物與上述芳香族二胺化合物或其他二胺化合物反應而製造 〇 具有上述酯鍵之耐熱性樹脂舉例爲例如聚酯樹脂,至 於聚酯樹脂爲使上述對苯二甲酸、間苯二甲酸、苯二甲酸 -33- 200911922 等芳香族二羧酸、該等之二氯化物、酸酐等衍生物與丨,4_ 二羥基苯、雙酚F、雙酚A、4,4’-二羥基聯苯等芳香族二 醇化合物反應而獲得者。 另外,上述聚醯胺醯亞胺樹脂較好使用使芳香族四殘 酸二酐與含有間苯二甲酸二醯肼作爲必要成分之芳香族二 胺化合物反應獲得之聚醯胺醯亞胺樹脂。芳香族四羧酸二 酐及芳香族二胺化合物亦可使用上述者。間苯二甲酸二醯 肼之芳香族二胺化合物中之莫耳比以1~100莫耳%較佳。 若未達1莫耳%,則有對於經改性聚醯胺醯亞胺樹脂之耐 溶解性降低之傾向,若間苯二甲酸二醯肼之含量較多時, 因本發明之樹脂組成物之濁度使所形成之層之耐濕性有降 低之傾向,因此以使用1 0〜8 0莫耳。/〇更好,以2 0〜7 0莫耳 %最好。該聚醯胺醯亞胺樹脂爲芳香族四羧酸二酐與芳香 族二胺化合物之調配比可如上述聚醯亞胺樹脂之合成般依 據使用有機溶劑、合成方法等獲得。 使偏苯三酸酐及視需要之二羧酸與聚異氰酸酯反應獲 得之聚醯胺醯亞胺樹脂係可使用藉由在加熱於有機溶劑中 成爲不溶性之由該聚醯胺醯亞胺樹脂構成之有機微粒子。 該聚醯胺醯亞胺樹脂之製造方法可如上述聚醯胺醯亞胺樹 脂製造方法同樣製造。 爲使用作爲(C)成分:塡充劑而使上述樹脂微粒子 化之方法爲例如非水分散聚合法(例如,參照特公昭60_ 4853 1號公報’特開昭59-23 00 1 8號公報)、沉澱聚合法 (例如’參照特開昭59_108〇3〇號公報,特開昭60- -34- 200911922 22 1 425號公報)、使自樹脂溶液修飾之粉末予以機械粉 碎之方法;將樹脂溶液添加於弱溶劑中一邊在高剪剪下微 粒子化之方法;使樹脂溶液之噴霧溶液乾燥獲得微粒子之 方法;在洗劑或樹脂溶液中使對於溶劑之溶解性與溫度具 有依存性之樹脂析出且微粒子化之方法。 如上述’本發明中所用(C )成分:塡充劑(含有水 滑石之無機微粒子及/或有機微粒子)較好使用具有平均 粒徑5 0 μιη以下,最大粒徑1 〇 〇 μηι以下之粒徑者。若平均 粒徑超過5 0 μηι,則難以獲得後述之觸變性係數1 . i以上 之糊料,若最大粒徑超過ΙΟΟμηι,則有樹脂組成物之塗膜 外觀、密著性不足之傾向。該平均粒徑更好爲3 0μηα以下 ,又更好爲ΙΟμηι以下’且最好爲1μιη以下。最大粒徑更 好爲80μιη以下,又更好爲60μιη以下,且最好爲40μιη 以下。 [樹脂組成物] 本發明之樹脂組成物可使(Α)成分之樹脂溶解於有 機溶劑中成爲樹脂溶液,使(C )成分之「含有水滑石之 無機微粒子及/或有機微粒子」分散於其中,接著添加混 合(Β)成分之環氧樹脂而製造。 本發明之樹脂組成物中,作爲(C )成分使用之「含 有水滑石之無機微粒子及/或有機微粒子」之含量係如上 述般,相對於(A )成分100重量份,較好爲卜250重量 份,以30〜200重量份更佳’且以50〜1〇〇重量份最佳。當 -35- 200911922 (C)成分之含量少於上述時,樹脂組成物糊料黏度及觸 變性係數下降,該糊料之牽絲會增加造成印刷後該糊料之 流出變大,亦有使樹脂組成物之膜厚薄膜化之傾向,以及 電特性劣化之傾向。當(C)成分之含量多於上述時,樹 脂組成物糊料之黏度及觸變性係數變高,使得糊料對基材 之轉印性降低且使印刷膜中之孔隙及針孔有增加之傾向。 使(A )成分之樹脂溶解之有機溶劑係如上述般,舉 例爲非含氮系極性溶劑,爲二乙二醇二甲基醚、二乙二醇 二乙基醚、三乙二醇二甲基醚、三乙二醇二乙基醚等醚系 溶劑;二甲基亞楓、二乙基亞颯、二甲基颯、颯等含硫系 溶劑;γ-丁內酯、乙酸溶纖素等酯系溶劑;環己酮、甲基 乙基酮等酮系溶劑;甲苯、二甲苯等芳香族烴系溶劑等。 該等溶劑可單獨使用或組合兩種以上使用。由於隨著產生 之樹脂而溶解性不同,因此選擇使用可溶解樹脂之溶劑。 於熱硬化性樹脂((A )成分)之溶液中分散(C ) 成分:含有水滑石之無機及/或有機微粒子分散之方法可 適宜使用通常在塗料領域中進行之輥混練、混練機混合等 ’且較好爲充分進行分散之方法。 本發明之樹脂組成物爲了提高塗佈時之操作性及被膜 形成前後之膜特性,因此可添加消泡劑、平流劑等之界面 活性劑類、染料或顏料等著色劑類、熱安定劑、抗氧化劑 、難燃劑、潤滑劑。 本發明之樹脂組成物以旋轉型黏度計測量之黏度在 25°C下較好爲20pa.s〜8〇 pa.s,尤其較好爲30-50 pa.s -36- 200911922 。另外’觸變性係數以1 . 1以上爲較佳。若黏度未達2 0 pa · s ’則印刷後糊料之流出變大且有膜厚薄膜化之傾向 ’若黏度超過80 pa · s,則糊料對基材之轉印性降低且有 使印刷膜中之孔隙及針孔增加之傾向。另外若觸變性係數 未達1 · 1 ’則糊料之牽絲會增加且使印刷後糊料之流出變 大,亦有膜厚薄膜化之傾向。 此處’樹脂組成物之黏度係表示爲使用E型黏度劑( 東機產業公司製造,RE80U型),在試料量0.2ml或 0.5ml下測定旋轉數i〇rpnl之黏度。又糊料之觸變性係數 (TI値)係使用 E型黏度劑(東機產業公司製造, RE80U型),對試料量〇.2ml或OJrnl下測定旋轉數 lrpm與lOrpm之糊料之表觀黏度,且以ηΐ與η1〇之比 η 1 /η 1 0 表示。 又’本發明之上述樹脂組成物於撓性配線板上以網版 印刷成配線圖案後,經熱硬化形成硬化膜,可較好使用於 撓性配線板上作爲保護膜。尤其適用於配線圖案部係經鍍 錫處理之撓性配線板表面之保護膜用途。熱硬化條件,就 防止鍍錫層擴散且獲得作爲保護膜之適當低翹曲性、柔軟 性之觀點觀之,較好爲80°C〜130°C,尤其較好爲90°C〜120°C ,但不限定於上述範圍,例如,50 °C〜200 °C,其中在 5 0°C〜140°C之範圍亦可硬化。又,加熱時間,就防止鍍錫 層擴散且獲得作爲保護膜之適當低翹曲性、柔軟性之觀點 觀之,較好爲60~150分鐘,更好爲80〜120分鐘,但不限 定於上述範圍,可爲1〜1,〇〇〇分鐘,例如5〜3 00分鐘,其 -37- 200911922 中,10〜15〇分鐘亦可硬化。 [被膜形成材料] 本發明之被膜形成材料係含有上述樹脂組 做爲各種電氣製品及電子零件之被膜形成材料 版印刷、佈膠器、旋轉塗佈器等之塗佈方法。 於網版印刷。 依據本發明之被膜形成材料適宜使用作爲 元件、印刷基板領域等之電子零件上塗層材料 材、層間絕緣膜、表面保護膜、阻焊劑層、接 又,亦可使用作爲琺瑯線用清漆、電絕緣用含 入型清漆、與雲母、玻璃布等基材組合之片 MCL層合板用清漆、摩擦材料用清漆等。又 被膜難以自電路基板等剝離,基材與樹脂彼此 以及印刷作業性良好,故可獲得信賴性高之電 [實施例] 以下藉實施例詳細說明本發明,但本發明 實施例之限制。 (合成例1 :高分子樹脂之合成) 於裝置有攪拌機、油份分離機附加冷卻管 管及溫度計之3升四頸瓶中饋入61.72 g之 74.64g(0.37莫耳)之1,6 -己二醇系聚碳g 成物,而可 而適用於網 尤其較適用 例如半導體 、液狀封裝 著劑層等。 浸清漆、注 材用清漆、 ,由於樹脂 間之密著性 子零件。 並不受該等 、氮氣導入 γ · 丁內醋、 I酯二醇( -38- 200911922Zr02), barium strontium silicate (Ba0.8Si02), boron nitride (bn) 'calcium carbonate (CaC03), calcium sulfate (CaS04), zinc oxide (ZnO), magnesium titanate (Mg0.Ti02), barium sulfate (BaS 〇 4), organic bentonite, carbon (C), and the like. One or more of these may be used. Among these inorganic chelating agents, in particular, from the viewpoint of good electrical properties (insulation reliability, etc.), it is preferred to use barium sulfate or talc. Further, it is preferable to use barium sulfate from the viewpoint of printability and workability. On the other hand, the organic chelating agent is preferably a fine particle having a heat resistant resin having a guanamine bond, an oxime bond, an ester bond or an ether bond. From the viewpoint of heat resistance and mechanical properties, the heat resistant resin is preferably a polyimine resin or a precursor thereof, a polyamidoximine resin or a precursor thereof, or a fine particle of a polyamide resin. The heat resistant resin used as the above organic chelating agent can be produced as follows. First, the (C) aromatic tetracarboxylic dianhydride and (d) aromatic diamine compound can be reacted to obtain one of the above heat resistant resins, and the poly(imine) resin 〇(C) aromatic tetracarboxylic dianhydride is exemplified. For example, pyromellitic anhydride, 3,3',4,4'-biphenyltetracarboxylic dianhydride, 2,2',3,3'-bisphenyltetracarboxylic dianhydride, 2,2', 3,3'-biphenyltetracarboxylic dianhydride, 2,3,3',4-biphenyltetracarboxylic dianhydride, 2,2-bis(3,4-dicarboxyphenyl)propane dianhydride, ι , ι_bis(3,4-dicarboxyphenyl)ethane dianhydride, bis(2,3-dicarboxyphenyl)methane dianhydride, bis(3,4-dicarboxyphenyl)methane dianhydride, double (3,4-dicarboxyphenyl)ruthenic anhydride, 3,4,9,10-decanetetracarboxylic dianhydride, bis(3,4-dicarboxyphenyl)ether di-28- 200911922 anhydride, benzene- 1,2,3,4-tetracarboxylic dianhydride, 3,4,3',4'-benzophenonetetracarboxylic dianhydride, 2,3,2',3'-benzophenone tetracarboxylate Acid dianhydride, 2,3,3',4'-benzophenone tetracarboxylic dianhydride, 1,2,5,6-naphthalenetetracarboxylic dianhydride, 2,3,6,7-naphthalene tetracarboxylate Acid dianhydride, 1,2,4,5-naphthalenetetracarboxylic dianhydride, 1,4,5,8-naphthalenetetracarboxylic dianhydride, 2,6-dichloronaphthalene-1,4,5,8- Tetracarboxylic dianhydride, 2,7-dichloronaphthalene-1,4,5,8-tetracarboxylic dianhydride, 2,3,6,7-tetrachloronaphthalene-1,4,5,8-tetracarboxylate Acid dianhydride, phenanthrene-1,8,9,10-tetracarboxylic dianhydride, bis(3,4-dicarboxyphenyl)dimethyl phthalane dianhydride, bis(3,4-dicarboxyphenyl) Phenyl decane dianhydride, bis(3,4-dicarboxyphenyl)diphenyl phthalane dianhydride, 1,4-bis(3,4-dicarboxyphenyldimethyl decyl) phthalic anhydride, 1 ,3-bis(3,4-dicarboxyphenyl)-1,1,3,3-tetramethyldicyclohexane dianhydride, p-phenylene bis(trimellitic acid monoester anhydride), 2 , 2-bis(3,4-dicarboxyphenyl)hexafluoropropane dianhydride, 2,2-bis{4-(3,4-dicarboxyphenoxy)phenyl}hexafluoropropane dianhydride, 2, 2-bis{4-(3,4-dicarboxyphenoxy)phenyl}propane dianhydride, 4,4-bis(3,4-dicarboxyphenoxy)diphenyl sulfide dianhydride, 1, 4-bis(2-hydroxyhexafluoroisopropyl) benzene bis(trimellitic anhydride), :1,3-bis(2-hydroxyhexafluoroisopropyl)benzene bis(trimellitic anhydride), 1,2 -(Extended ethyl) bis(trimellitic anhydride), 1,3-(trimethylene) bis(trimellitic anhydride), 1,4-(tetramethylene) bis (bias) Tricarboxylic anhydride), 1,5-(pentamethylene)bis(trimellitic anhydride), 1,6-(hexamethylene)bis(trimellitic anhydride), 1,7-(heptamethylene) Bis(trimellitic anhydride), 1,8-(octamethylene)bis(trimellitic anhydride), 1,9-(nonamethylene)bis(trimellitic anhydride), 1,10-(ten Methylene) bis(trimellitic anhydride), 1,12-(dodecyl)bis(trimellitic anhydride), 1,16-(hexamethylene-29-200911922) bis(phenylene) Tricarboxylic anhydride), 118-(octamethylidene)bis (trimellitic anhydride), etc., may also be used in combination. The above (c) aromatic tetracarboxylic dianhydride may be a tetracarboxylic dianhydride other than the aromatic tetracarboxylic dianhydride in an amount not exceeding 50 mol% of the aromatic tetracarboxylic dianhydride depending on the purpose. The tetracarboxylic dianhydrides are exemplified by, for example, ethyltetracarboxylic dianhydride 1, 1,2,3,4-butanetetracarboxylic dianhydride, piperidine _ 2.3.5.6-tetracarboxylic dianhydride, thiophene- 2,3,4,5-tetracarboxylic dianhydride, decalin-1,4,5,8·tetracarboxylic dianhydride, 4,8-dimethyl-1,2,3,5,6, 7-hexahydronaphthalene - 1.2.5.6- tetracarboxylic dianhydride, cyclopentane-1,2,3,4-tetracarboxylic dianhydride, pyrrolidine-2,3,4,5-tetracarboxylic dianhydride 1,2,3,4-cyclobutanetetracarboxylic dianhydride, double {exo(6乂〇)-bicyclo[2,2,1]heptane-2,3-dicarboxylic dianhydride}, Bicyclo-(2,2,2)-octane (7)-ene-2,3,5,6-tetracarboxylic dianhydride, 5-(2,5-dioxotetrahydrofuranyl)-3-methyl 3-cyclohexane-1,2-dicarboxylic anhydride, tetrahydrofuran-2,3,4,5-tetracarboxylic dianhydride, and the like. Next, the above (d) aromatic diamine compound is exemplified by, for example, o-phenylenediamine, m-phenylenediamine, p-phenylenediamine, 3,3 '-diaminodiphenyl ether, 4,4'- Diaminodiphenyl ether, 3,4,-diaminodiphenyl ether, 3,3'-diaminodiphenylmethane, 3,4'-diaminodiphenylmethane, 4,4 '_Diaminodiphenylmethane, 3,3,diaminodiphenyldifluoromethane, 4,4'-diaminodiphenyldifluoromethane, 3,3,-diaminodiphenyl Maple, 3,4'-diaminodiphenyl maple, 4,4'-diaminodiphenylanthracene, 3,3'-diaminodiphenyl sulfide, 3,3'-diamine Diphenyl ketone, 3,4,-diaminodiphenyl ketone, 4,4'-diaminodiphenyl ketone, 2,2-bis(3-aminophenyl)propane, 2,2- Bis(3,4'-diaminophenyl)propane, 2,2-bis(4-aminophenyl)propane, 2,2-bis-30- 200911922 (3-aminophenyl)hexafluoropropane , 2,2-bis(3,4,-diaminophenyl)hexa-propyl, 2,2-bis(4-aminophenyl)hexafluoropropanone, hydrazine, 3_bis (3-amine Phenyl, phenyl, 1,4-bis(4-aminophenyl)benzene, phenyl bis(indole-methylethylidene)] Amine ' 3,4,_[1,4_phenylene bis(indenyl)ethylidene)]diphenylamine, 4,4'-[1,4-phenylphenylbis(methylethylidene)] Diphenylamine, 2,2-bis[4-(3-aminophenoxy)phenyl]propane, 2,2-bis[4-(4-aminophenoxy)phenyl]propane, 2,2- Bis[4-(3-aminophenoxy)benzyl]/, fluoropropylin 2,2-bis[4-(4-aminophenoxy)phenyl]hexafluoropropane, double [4 - (3-Aminophenoxy)phenyl]sulfate, bis[4-(4-aminophenoxy)phenyl] sulfide, bis[4-(3-aminophenoxy)phenyl]anthracene, Bis[4-(4-aminophenoxy)phenyl], etc., may also be used in combination with the above (d) aromatic diamine compound, depending on the purpose, not exceeding 50 of the aromatic diamine compound. A diamine compound other than the aromatic diamine compound is used in the range of % by mole. Such diamine compounds are exemplified by, for example, 1,2 _-aminoethyl acetoin, 1,3 -aminopropyl propylene, 1,4 -diaminobutyl butyl, 1,5-diaminopentane, 1, 6-Diaminohexane, 1,7-diaminoheptane, hydrazine, 8 · diaminooctane, 1,9-diamino broth, 1,1 〇-diamino decane, i , u-diaminoundecane, U3-bis(3-aminopropyl)tetramethyldioxane', 3_bis(3-aminopropyl)tetramethylpolyoxane, and the like. The above (c) aromatic tetra-residual dianhydride and the above (d) aromatic diamine compound are preferably in a molar reaction from the viewpoint of the film properties of the resin composition. (C) Aromatic S 矣 tetraresidic acid di dry and (d) aromatic diamine compound -31 - 200911922 The reaction is carried out in an organic solvent. The organic solvent in this case is, for example, N-methyl-2-pyrrolidone, dimethylacetamide, dimethylformamide, 1,3-dimethyl-3,4,5,6- Nitrogen-containing compounds such as tetrahydro-2(11^)-furanone, 1,3-dimethyl-2-imidazophenone; sulfur compounds such as cyclobutyl, monomethyl arsenate; γ-butyrolactone , γ-valerolactone, γ-caprolactone, heptanolactone, α·ethionyl γ-butyrolactone, ε·caprolactone and other lactones; dioxane, hydrazine, 2-dimethoxy Ethane, diethylene glycol dimethyl (or diethyl, dipropyl, dibutyl) ether, triethylene glycol dimethyl (or diethyl, dipropyl, dibutyl) ether, four An ether such as ethylene glycol dimethyl (or diethyl, dipropyl or dibutyl) ether; a ketone such as methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone or acetophenone; Alcohol, octanol, ethylene glycol, glycerin, diethylene glycol monomethyl (or monoethyl) ether, triethylene glycol monomethyl (or monoethyl) ether, tetraethylene glycol monomethyl (or Alcohols such as monoethyl ether; phenols such as phenol, cresol, xylenol; ethyl acetate, butyl acetate, ethyl cellosolve acetate, butyl Su acetate esters; toluene, xylene, diethylbenzene, hydrocarbons such as cyclohexane; trichloroethane, tetrachloroethane, halogenated hydrocarbons such as monochlorobenzene and the like. These organic solvents may be used singly or in combination. In view of solubility, low hygroscopicity, low-temperature hardenability, environmental safety, and the like, it is preferred to use lactones, ethers, ketones, and the like. The reaction temperature is preferably 80 ° C or lower, preferably 0 to 50 ° C. The viscosity of the reaction solution increases slowly during the reaction. In this case, poly-proline which is a precursor of a polyimide resin is produced. The polyamic acid may also be partially imidized by the oxime. These are also included in the precursor of the polyimide. The above polyimine resin is obtained by subjecting the above reactant (polyglycine) to dehydration ring closure. The dehydration ring closure can be carried out by a method of heat treatment at -120 ° C ~ 2 5 -32 - 200911922 (thermal imidization) or by a method using a dehydrating agent (chemical hydrazide). For the heat treatment at 12 CTC to 25 ° C, it is preferred to carry out the water produced by the dehydration reaction while being excluded from the system. At this time, water may be azeotropically removed using benzene, toluene, xylene or the like. The dehydration ring closure method using a dehydrating agent is preferably a dehydrating agent such as an acid anhydride such as acetic anhydride, propionic anhydride or benzoic anhydride, or a carbodiimide compound such as dicyclohexylcarbodiimide. In this case, a dehydration catalyst such as pyridine, isoquinoline, trimethylamine or aminopyridazole may also be used as the case may be. The dehydrating agent or dehydrating catalyst is preferably used in an amount of from 1 to 8 mol per mol of the aromatic tetracarboxylic dianhydride. The polyamidoximine resin or precursor may be used in the manufacture of the above polyimine resin or a precursor thereof, using trimellitic anhydride or a trimellitic anhydride derivative (a gasification of a meta-benzoic acid liver, etc.) of a divalent three-residual acid liver. Or a derivative thereof is produced in place of an aromatic tetracarboxylic dianhydride. Further, in place of the aromatic diamine compound and other diamine compounds, a residue other than the amine group may be produced by using a diisocyanate compound corresponding to the diamine compound instead. The diisocyanate compound which can be used is obtained by reacting the above aromatic diamine compound or other diamine compound with carbon ruthenium chloride or sulfinium chloride. The polyamine resin may be an aromatic dicarboxylic acid such as terephthalic acid, isophthalic acid or phthalic acid, a derivative such as a dichloride or an acid anhydride, and the above aromatic diamine compound or the like. The heat resistant resin having the above ester bond by reacting an amine compound is exemplified by, for example, a polyester resin, and the polyester resin is an aromatic dicarboxylic acid such as the above terephthalic acid, isophthalic acid or phthalic acid-33-200911922. A derivative such as an acid, such a dichloride or an acid anhydride is obtained by reacting an aromatic diol compound such as hydrazine, 4-dihydroxybenzene, bisphenol F, bisphenol A or 4,4'-dihydroxybiphenyl. Further, as the polyamidoximine resin, a polyamidoximine resin obtained by reacting an aromatic tetra-resin dianhydride with an aromatic diamine compound containing diterpenoid isophthalate as an essential component is preferably used. The above may also be used for the aromatic tetracarboxylic dianhydride and the aromatic diamine compound. The molar ratio of the aromatic diamine compound of dioxonium isophthalate is preferably from 1 to 100 mol%. If it is less than 1 mol%, there is a tendency that the solubility resistance of the modified polyamidoximine resin is lowered, and if the content of diterpene isophthalate is large, the resin composition of the present invention The turbidity tends to lower the moisture resistance of the formed layer, so that 10 to 80 moles are used. /〇 Better, take 2 0~7 0 Mo %% best. The polyamidoximine resin is a compounding ratio of the aromatic tetracarboxylic dianhydride to the aromatic diamine compound, and can be obtained by using an organic solvent, a synthesis method, or the like, as in the synthesis of the above polyimine resin. The polyamidoquinone imine resin obtained by reacting trimellitic anhydride and, if necessary, a dicarboxylic acid with a polyisocyanate, may be an organic fine particle composed of the polyamidoximine resin which is insoluble by heating in an organic solvent. The method for producing the polyamidoximine resin can be produced in the same manner as the above-described method for producing a polyamidamine resin. In the method of using the (C) component: the chelating agent, the method of dispersing the above-mentioned resin is, for example, a non-aqueous dispersion polymerization method (for example, refer to Japanese Patent Publication No. Sho 60-23 00 1 pp. And a precipitation polymerization method (for example, a method of mechanically pulverizing a powder modified from a resin solution); a resin solution; a method of adding microparticles under high shear in a weak solvent; a method of drying a spray solution of a resin solution to obtain fine particles; and precipitating a resin having solubility dependence on a solvent in a detergent or a resin solution and The method of microparticles. As described above, the component (C) used in the present invention: a chelating agent (inorganic fine particles containing hydrotalcite and/or organic fine particles) is preferably one having an average particle diameter of 50 μm or less and a maximum particle diameter of 1 〇〇μηι or less. Path. When the average particle size exceeds 50 μm, it is difficult to obtain a paste having a thixotropic coefficient of 1. i or more, which is described later. When the maximum particle diameter exceeds ΙΟΟμηι, the appearance and adhesion of the coating film of the resin composition tend to be insufficient. The average particle diameter is more preferably 3 0 μηα or less, and still more preferably ΙΟμηι or less and preferably 1 μηη or less. The maximum particle diameter is preferably 80 μm or less, more preferably 60 μm or less, and most preferably 40 μm or less. [Resin composition] The resin composition of the present invention can dissolve the resin of the (Α) component in an organic solvent to form a resin solution, and disperse the "hydrotalcite-containing inorganic fine particles and/or organic fine particles" of the component (C) therein. Then, it is produced by adding an epoxy resin of a mixed (Β) component. In the resin composition of the present invention, the content of the "hydrotalcite-containing inorganic fine particles and/or organic fine particles" used as the component (C) is as described above, and is preferably 250 based on 100 parts by weight of the component (A). The parts by weight are more preferably 30 to 200 parts by weight and most preferably 50 to 1 part by weight. When the content of the component (c) of -35-200911922 is less than the above, the viscosity and the thixotropic coefficient of the resin composition paste are decreased, and the threading of the paste is increased to cause the outflow of the paste to become large after printing, and The tendency of the film thickness of the resin composition to be thinned and the tendency of electrical characteristics to deteriorate. When the content of the component (C) is more than the above, the viscosity and the thixotropic coefficient of the resin composition paste become high, so that the transfer property of the paste to the substrate is lowered and the pores and pinholes in the printed film are increased. tendency. The organic solvent in which the resin of the component (A) is dissolved is as described above, and is a non-nitrogen-containing polar solvent, and is diethylene glycol dimethyl ether, diethylene glycol diethyl ether, and triethylene glycol dimethyl glycol. An ether solvent such as an ether or a triethylene glycol diethyl ether; a sulfur-containing solvent such as dimethyl sulfoxide, diethyl hydrazine, dimethyl hydrazine or hydrazine; γ-butyrolactone and fibrin acetate An ester solvent; a ketone solvent such as cyclohexanone or methyl ethyl ketone; an aromatic hydrocarbon solvent such as toluene or xylene; and the like. These solvents may be used singly or in combination of two or more. Since the solubility differs depending on the resin produced, a solvent which can dissolve the resin is selected. Dispersion in a solution of a thermosetting resin (component (A)) (C) Component: a method of dispersing inorganic and/or organic fine particles containing hydrotalcite, and it is possible to suitably use a roll kneading, a kneading machine, or the like which is usually carried out in the field of coating materials. 'It is preferably a method of sufficiently performing dispersion. In order to improve the handleability at the time of coating and the film characteristics before and after the film formation, the resin composition of the present invention may be added with a surfactant such as an antifoaming agent or a flow agent, a coloring agent such as a dye or a pigment, or a thermal stabilizer. Antioxidants, flame retardants, lubricants. The viscosity of the resin composition of the present invention measured by a rotary viscometer is preferably 20 Pa.s to 8 Å pa.s at 25 ° C, particularly preferably 30-50 pa.s -36 to 200911922. Further, the thixotropic coefficient is preferably 1.1 or more. If the viscosity is less than 20 Pa · s ', the flow of the paste becomes large after printing and the film thickness tends to be thinned. If the viscosity exceeds 80 pa · s, the transfer property of the paste to the substrate is lowered and there is The tendency of the pores and pinholes in the printed film to increase. Further, if the thixotropic coefficient is less than 1 · 1 ', the draw of the paste is increased and the flow of the paste after printing is increased, and the film thickness tends to be thin. Here, the viscosity of the resin composition is expressed by using an E-type viscosity agent (manufactured by Toki Sangyo Co., Ltd., RE80U type), and the viscosity of the rotation number i〇rpnl is measured at a sample amount of 0.2 ml or 0.5 ml. The thixotropy coefficient (TI値) of the paste was measured using an E-type viscosity agent (manufactured by Toki Sangyo Co., Ltd., RE80U type), and the apparent viscosity of the paste of the rotation number of 1 rpm and 10 rpm was measured under the sample amount of ml2 ml or OJrnl. And expressed by the ratio η 1 /η 1 0 of ηΐ and η1〇. Further, the resin composition of the present invention is printed on a flexible wiring board by a screen printing pattern and then cured by heat to form a cured film, which is preferably used as a protective film on a flexible wiring board. It is especially suitable for protective film applications where the wiring pattern portion is tinned on the surface of a flexible wiring board. The thermosetting condition is preferably from 80 ° C to 130 ° C, particularly preferably from 90 ° C to 120 °, in order to prevent diffusion of the tin-plated layer and obtain appropriate low warpage and flexibility as a protective film. C, but is not limited to the above range, for example, 50 ° C to 200 ° C, wherein it can be hardened in the range of 50 ° C to 140 ° C. Further, the heating time prevents the tin-plated layer from diffusing and obtains a viewpoint of appropriate low warpage and flexibility as a protective film, and is preferably 60 to 150 minutes, more preferably 80 to 120 minutes, but is not limited thereto. The above range may be 1 to 1, 〇〇〇 minutes, for example, 5 to 3 00 minutes, and in -37 to 200911922, it may be hardened for 10 to 15 minutes. [Film forming material] The film forming material of the present invention contains the above resin group as a coating method for a film forming material plate printing, a cloth applicator, a spin coater or the like of various electric products and electronic parts. Printed on the screen. The film forming material according to the present invention can be suitably used as an overcoat material for an electronic component such as an element or a printed circuit board, an interlayer insulating film, a surface protective film, a solder resist layer, and a varnish for electric enamel and electricity. A varnish for a MCL laminate, a varnish for a friction material, or the like, which is combined with a varnish for insulation and a substrate such as mica or glass cloth. Further, since the film is difficult to be peeled off from the circuit board or the like, and the substrate and the resin are excellent in printing workability, electric power with high reliability can be obtained. [Embodiment] Hereinafter, the present invention will be described in detail by way of examples, but the invention is limited. (Synthesis Example 1: Synthesis of Polymer Resin) In a 3 liter four-necked flask equipped with a mixer, an oil separator, a cooling tube, and a thermometer, a feed of 61.72 g of 74.72 g (0.37 mol) of 1,6 g was fed. The hexanediol-based polycarbohydrate is suitable for use in a mesh, and is particularly suitable for, for example, a semiconductor, a liquid encapsulating layer, or the like. A varnish for immersion varnish, varnish for injection, and a sub-component for adhesion between resins. Not subject to such nitrogen, γ · butyl vinegar, I ester diol ( -38- 200911922

Diacell化學工業股份有限公司製’商品名「PLACCEL CD-220」)、125.14g(〇.46 莫耳)之 4,4’-一 本基甲 ί兀一 異氰酸酯及58.4g(0.34莫耳)之甲苯二異氰酸酯’升溫 至1 5 0。(:,且在1 5 0。(:下反應4小時。 接著,將88_4g( 0.46莫耳)之偏苯二酸肝饋入上述 反應物中,且在701下反應3小時。接著再饋入6· 76g ( 0.027莫耳)之4,4,-二苯基甲烷二異氰酸酯、0.0034§( 0.00002莫耳)之甲苯二異氰酸酯’在120 °C下反應1小 時,且在1 8 〇 °C下反應3小時。反應後’饋入3 4 1 . 6 g之丁 基卡必醇乙酸酯並經冷卻,進而饋入0.02g(0_0001莫耳 )之均苯四甲酸酐,在120 °C下反應3小時’獲得數平均 分子量3 8,0 0 0之樹脂(聚碳酸酯改性之聚醯胺醯亞胺樹 脂:本發明之(A)成分)。數平均分子量可在每反應時 間採取少量反應溶液,以Gardner製之氣泡型黏度劑觀察 黏度變化率並藉此調整。以丁基卡必醇乙酸酯稀釋所得樹 脂,獲得不揮發份5 0重量%之聚碳酸酯改性之聚醯胺醯 亞胺樹脂溶液。 (實施例1 ) 於上述(合成例1)中獲得之數平均分子量38,000之 聚碳酸酯改性聚醯胺醯亞胺樹脂溶液中,相對於該樹脂溶 液之樹脂份1 0 〇重量份,調配1重量份之溶劑處理液、 0.3重量份消泡劑(BYK Chemie公司製,商品名「BYK-051」)、〇_75重量份平流劑(BYK Chemie公司製,商 -39- 200911922 品名「ΒΥΚ-3 54」),在20°C下攪拌1〇分鐘。接著’調 配預先以珠粒硏磨機分散之含66·5重量份硫酸鋇(堺化 學工業股份有限公司製,商品名「B — 31」)、I3.5重量份 滑石(日本滑石股份有限公司製’商品名「ST-2000」) 及1 〇重量份水滑石(堺化學股份有限公司製,商品名「 HT-P」)者(本發明之(C )成分),且視需要添加γ-丁 內酯等溶劑,並在50°C下攪拌1小時,進而,添加10重 量份之作爲本發明(B)成分之胺型環氧樹脂(東都化成 股份有限公司製,商品名「YH-434L」),且在20°C下攪 拌1小時,獲得聚碳酸酯改性聚醯胺醯亞胺樹脂組成物。 (實施例2) 依據實施例1,除水滑石成爲2 0重量份以外,進行 如實施例1般完全相同之操作,獲得聚碳酸酯改性聚醯胺 醯亞胺樹脂組成物。 (實施例3 ) 依據實施例1,除水滑石成爲3 0重量份以外,進行 如實施例1般完全相同之操作,獲得聚碳酸酯改性聚醯胺 醯亞胺樹脂組成物。 (實施例4 ) 依據實施例1 ’除水滑石成爲5 0重量份以外,進行 如實施例1般完全相同之操作,獲得聚碳酸酯改性聚醯胺 -40- 200911922 醯亞胺樹脂組成物。 (比較例1 ) 於合成例1中’除了所調配之樹脂並非樹脂末端異氰 酸酯以均苯四甲酸酐反應者,而使用以肟反應者(不具有 酸酐基及/或羧基之樹脂)以外,進行如實施例1般完全 相同之操作,獲得聚碳酸酯改性聚醯胺醯亞胺樹脂組成物 (比較例2) 依據實施例1,除未調配水滑石以外,進行如實施例 1般完全相同之操作,獲得聚碳酸酯改性聚醯胺醯亞胺樹 脂組成物。 以下列方法測定上述實施例及比較例中所得各種聚碳 酸酯改性聚醯胺醯亞胺樹脂組成物及該等聚醯胺醯亞胺樹 脂組成物之硬化被膜對於聚醯亞胺薄膜之貼附特性、印刷 外觀、以及黑色隆起之減低性,結果列於(表1)。 (保存安定性) 以旋轉型黏度計測定所製作之聚碳酸酯改性聚醯胺酸 亞胺樹脂組成物之黏度,4 8小時後同樣測定黏度’計算 自製作時起之增黏率。數値越小則儲存安定性越優異。 (印刷外觀) -41 - 200911922 藉由印刷機(New Long股份有限公司製,商品名「 LS-34GX」)與網版(MURAKAMI股份有限公司製,150 網目),印刷速度1 〇〇mm/sec,將所得之聚碳酸酯改性聚 醯胺醯亞胺樹脂組成物以3 0mm邊長印刷在3 5 μιη之銅箔 上,以1 00倍率之光學顯微鏡觀察印刷後之外觀(泡跡、 凝聚物等)。 完全未發現泡跡、凝聚物等缺陷者評價爲〇,觀察到 印刷部份之一部份有泡跡、凝聚物等缺陷者評價爲△,觀 察到印刷部份全部均有泡跡、凝聚物等缺陷者評價爲X。 (通電後之電極黑色隆起之有無) 於聚醯亞胺基材上,以線寬15μπι、間隔寬15μπι,被 覆梳型狀之鍍錫銅電極,使用印刷機(N e w L ο n g股份有 限公司製,商品名:LS-34GX )與網版(MURAKAMI股 份有限公司製,150網目),以印刷速度lOOmm/sec印刷 所得之聚碳酸酯改性之聚醯胺醯亞胺樹脂組成物,在空氣 氛圍下,在120°C加熱硬化60分鐘,獲得被覆有聚碳酸酯 改性之聚醯胺醯亞胺樹脂之硬化被膜之聚醯亞胺基材梳型 電極。所得之被覆有聚碳酸酯改性之聚醯胺醯亞胺樹脂之 硬化被膜之聚醯亞胺基材梳型電極,使用連續電阻測定機 (IMV股份有限公司製,商品名「Ion Migration Tester MIG-8600」)與不飽和型 Pressure cooker (股份有限公 司平山製作所製,商品名「HSAT PC-422R8D」),以溫 度120°C、溼度85%、施加電壓60V、施加時間1〇〇小時 -42- 200911922 之條件下通電,以1 Ο 0倍率光學顯微鏡觀察通電後電極有 無黑色隆起。 無黑色隆起者評價爲〇,發生少許黑色隆起者評價爲 △,觀察到大量黑色隆起者評價爲X。 (貼附性) 印刷後之聚碳酸酯改性之聚醯胺醯亞胺樹脂組成物在 空氣環境下,在120 °c硬化60分鐘後之試驗片與聚醯亞胺 薄膜以及進而與銅板重疊,在2公斤砝碼之荷重下,在加 熱板上於90〜120t加熱30秒後測定試驗片與聚醯亞胺薄 膜之貼附性。由開始產生貼附之溫度加以評價。 開始產生貼附的溫度越高越好。 (表1)Diacell Chemical Industry Co., Ltd. 'trade name "PLACCEL CD-220"), 125.14g (〇.46 Moer) 4,4'-a base of an isocyanate and 58.4g (0.34 mole) The toluene diisocyanate was heated to 150. (:, and at 1 50. (: 4 hours of reaction. Next, 88_4 g (0.46 mol) of phthalic acid liver was fed into the above reaction, and reacted at 701 for 3 hours. Then fed again. 6·76g (0.027 mol) of 4,4,-diphenylmethane diisocyanate, 0.0034 § (0.00002 mol) of toluene diisocyanate was reacted at 120 ° C for 1 hour, and at 18 ° C The reaction was carried out for 3 hours. After the reaction, 3 4 1.6 g of butyl carbitol acetate was fed and cooled, and then 0.02 g (0-0001 mol) of pyromellitic anhydride was fed at 120 ° C. Resin for 3 hours' to obtain a resin having a number average molecular weight of 380 (polycarbonate-modified polyamidoximine resin: component (A) of the present invention). The number average molecular weight can be taken in a small amount per reaction time. The reaction solution was observed by a bubble type viscosity agent manufactured by Gardner, and the viscosity change rate was observed and adjusted. The obtained resin was diluted with butyl carbitol acetate to obtain a polycarbonate modified polyfluorene having a nonvolatile content of 50% by weight. Amine imine resin solution (Example 1) Polycarbonate having an average molecular weight of 38,000 obtained in the above (Synthesis Example 1) In the modified polyamidoximine resin solution, 1 part by weight of the solvent treatment liquid and 0.3 part by weight of the antifoaming agent (manufactured by BYK Chemie Co., Ltd., "product name" are prepared with respect to 10 parts by weight of the resin portion of the resin solution. BYK-051"), 〇_75 parts by weight of advection agent (BYK Chemie, s-39-200911922, product name "ΒΥΚ-3 54"), stirred at 20 ° C for 1 。 minutes. Then 'prepended with beads in advance The honing machine contains 66.5% by weight of barium sulfate (manufactured by Daimlersei Chemical Co., Ltd., trade name "B-31"), and I3.5 parts by weight of talc (trade name "ST-made by Japan Talc Co., Ltd." 2000) and 1 part by weight of hydrotalcite (product name "HT-P" manufactured by Seiko Chemical Co., Ltd.) (component (C) of the present invention), and a solvent such as γ-butyrolactone is added as needed, and The mixture was stirred at 50 ° C for 1 hour, and further, 10 parts by weight of an amine-type epoxy resin (manufactured by Tohto Kasei Co., Ltd., trade name "YH-434L") as a component of the present invention (B) was added, and at 20 °. The mixture was stirred for 1 hour at C to obtain a polycarbonate modified polyamidoximine resin composition. (Example 2) According to Example 1, except that the hydrotalcite was 20 parts by weight, the same operation as in Example 1 was carried out to obtain a polycarbonate-modified polyamidoximine resin composition. 3) According to Example 1, except that the hydrotalcite was changed to 30 parts by weight, the same operation as in Example 1 was carried out to obtain a polycarbonate-modified polyamidoximine resin composition. (Example 4) Example 1 The operation was carried out in exactly the same manner as in Example 1 except that the hydrotalcite was changed to 50 parts by weight to obtain a polycarbonate-modified polyamine-40-200911922 quinone imine resin composition. (Comparative Example 1) In the synthesis example 1, except that the resin to be blended is not a resin terminal isocyanate which is reacted with pyromellitic anhydride, but a ruthenium reactant (resin having no acid anhydride group and/or carboxyl group) is used. A polycarbonate-modified polyamidolimine resin composition was obtained by the same operation as in Example 1 (Comparative Example 2) According to Example 1, except that the hydrotalcite was not formulated, the same procedure as in Example 1 was carried out. In operation, a polycarbonate modified polyamidoximine resin composition is obtained. The various polycarbonate modified polyamidoximine resin compositions obtained in the above examples and comparative examples and the hardened coatings of the polyamidoximine resin compositions were tested for the polyimide film by the following method. The characteristics, printed appearance, and reduction of black bulge are shown in Table 1). (Storage stability) The viscosity of the polycarbonate-modified polyamidoimine resin composition produced was measured by a rotary viscometer, and the viscosity was measured in the same manner after 48 hours' calculation. The smaller the number, the better the storage stability. (Printed Appearance) -41 - 200911922 Printing speed 1 〇〇mm/sec by a printing machine (trade name "LS-34GX", manufactured by New Long Co., Ltd.) and screen (MURAKAMI Co., Ltd., 150 mesh) The obtained polycarbonate modified polyamidoximine resin composition was printed on a copper foil of 35 μm on a side length of 30 mm, and the appearance after printing was observed by an optical microscope at a magnification of 100 (bubble, condensation) Things, etc.). None of the defects such as bubbles and aggregates were found to be 〇. It was observed that one of the printed parts had defects such as bubbles and condensates, and was evaluated as △. It was observed that all the printed parts had blistering and condensate. The defect is evaluated as X. (The presence or absence of the black bulge of the electrode after energization) On a polyimide substrate, a tin-plated copper electrode coated with a comb shape with a line width of 15 μm and a width of 15 μm is used, and a printing machine (N ew L ο ng Co., Ltd.) is used. System, trade name: LS-34GX) and screen (MURAKAMI Co., Ltd., 150 mesh), polycarbonate modified polyamidoximine resin composition obtained by printing at a printing speed of lOOmm/sec, in air The film was heat-hardened at 120 ° C for 60 minutes in an atmosphere to obtain a polyimine substrate comb-shaped electrode coated with a hardened film of a polycarbonate-modified polyamidoximine resin. The obtained polyimide electrode coated with a polycarbonate-modified polyamidoximine resin hardened film was subjected to a continuous resistance measuring machine (manufactured by IMV Co., Ltd., trade name "Ion Migration Tester MIG" -8600") and the unsaturated type Cooker (trade name "HSAT PC-422R8D", manufactured by Hirayama Seisakusho Co., Ltd.), with a temperature of 120 ° C, a humidity of 85%, an applied voltage of 60 V, and an application time of 1 hour - 42 - Power was supplied under the conditions of 200911922, and the electrode was observed to have a black bulge after energization at a magnification of 1 Ο 0. Those without black ridges were evaluated as 〇, those with a few black ridges were evaluated as △, and those with a large number of black ridges were evaluated as X. (Adhesiveness) The polycarbonate-modified polyamidoximine resin composition after printing is cured in an air environment at 120 ° C for 60 minutes, and the test piece overlaps with the polyimide film and further with the copper plate. The adhesion of the test piece to the polyimide film was measured after heating at 90 to 120 t on a hot plate for 30 seconds under a load of 2 kg. It is evaluated by the temperature at which the attachment is initiated. The higher the temperature at which the attachment begins to occur, the better. (Table 1)

項目 實施例1 實施例2 實施例3 實施例4 比較例1 比較例2 保存安定性 1.41 1.21 1.18 1.15 1.01 1.50 印刷外觀 〇 〇 Δ X 〇 〇 電極黑色隆起之有無 Δ 〇 〇 〇 〇 X 貼附性 120°C 120°C 120。。 120°C 90°C 120°C 由以上結果可確認下列。 亦即,由比較例1與其他例之比較,可明瞭末端異氰 酸酯以均苯四甲酸酐修飾時,促進了與胺型環氧樹脂之反 應,可減輕硬化後與聚醯亞胺薄膜之貼附性。 又’於實施例2~4及比較例2,水滑石之調配量增加 則增黏得以減輕。再者,藉由調配水滑石,可減輕通電後 -43- 200911922 之電極黑色隆起。因此,過多的調配量將產生印生外觀上 之不良。 [產業上之利用可用性] 如以上說明,本發明之此種樹脂組成物以及被膜形成 材料可作爲各種電氣製品及電子零件之被膜形成材料,而 適用於網版印刷、佈膠器、旋轉塗佈等之塗佈方法。又, 由於硬化後與聚醯亞胺薄膜之貼附性難以產生貼附,故可 排除聚醯亞胺薄膜與硬化膜間之間隔層等之作業性,有利 於成本方面。 -44-Item Example 1 Example 2 Example 3 Example 4 Comparative Example 1 Comparative Example 2 Storage stability 1.41 1.21 1.18 1.15 1.01 1.50 Printing appearance 〇〇Δ X 〇〇 Electrode black bulge with or without Δ 〇〇〇〇X Attachment 120 ° C 120 ° C 120. . 120 ° C 90 ° C 120 ° C From the above results, the following can be confirmed. That is, from the comparison of Comparative Example 1 with other examples, it is understood that when the terminal isocyanate is modified with pyromellitic anhydride, the reaction with the amine type epoxy resin is promoted, and the adhesion to the polyimide film after hardening can be alleviated. Sex. Further, in Examples 2 to 4 and Comparative Example 2, when the amount of hydrotalcite was increased, the viscosity was reduced. Furthermore, by blending hydrotalcite, the black bulge of the electrode -43-200911922 after power-on can be reduced. Therefore, an excessive amount of blending will result in poor print appearance. [Industrial Applicability] As described above, the resin composition and the film forming material of the present invention can be used as a film forming material for various electrical products and electronic parts, and are suitable for screen printing, cloth coating, and spin coating. Etching method. Further, since the adhesion to the polyimide film after hardening is less likely to cause adhesion, workability such as a spacer layer between the polyimide film and the cured film can be eliminated, which is advantageous in terms of cost. -44-

Claims (1)

200911922 十、申請專利範圍 1.一種樹脂組成物,其特徵爲含有:(A)成分:具 有酸酐基及/或羧基之樹脂、(B)成分:環氧樹脂、及( C)成分:包含水滑石之塡充劑。 2 ·如申請專利範圍第1項之樹脂組成物,其中上述( A)成分具有聚碳酸酯骨架。 3 ·如申請專利範圍第1項之樹脂組成物,其中(A ) 表示之構造單位 成分含有以下述通式( 【化1】 〇 0 0 II , II II X-N-C-O-(R-〇-C-0)^; R-0-C-N Η Η (式(1)中,複數個R各獨立表示碳數1~18之伸 烷基,複數個X各獨立表示碳數1〜18之伸烷基或伸芳基 ,111及11各獨立表示1〜20之整數)。 4.如申請專利範圍第1項之樹脂組成物,其中(A ) 成分爲使選自具有聚碳酸酯骨架之聚醯亞胺樹脂、聚醯胺 醯亞胺樹脂、聚醯胺樹脂之至少一種樹脂之異氰酸酯殘基 與具有酸酐基之3價以上聚碳酸或其衍生物反應所得之樹 脂。 5 _如申g靑專利範圍第1項之樹脂組成物,其中上述( C)成分之含量’相對於上述(a)成分100重量份,爲 10~50重量份’上述(c)成分中所佔之水滑石含量爲1〇 質量%〜5 0質量%。 6_如申請專利範圍第1至5項中任一項之樹脂組成物 -45- 200911922 ,其係用於在聚醯亞胺基材上層合銅箔之可撓性印刷電路 板基板之保護膜。 7. —種被膜形成材料,其特徵爲含有申請專利範圍第 1至5項中任一項之樹脂組成物。 -46 - 200911922 無 明 說 單 無簡..韻 為符 圖件 表元 代之 定圖 :指表 圖案代 表本本 定一二 指 /IV 七 八、本案若有化學式時,請揭示最能顯示發明特徵的化學 式:無200911922 X. Patent Application No. 1. A resin composition comprising: (A) component: a resin having an acid anhydride group and/or a carboxyl group, (B) a component: an epoxy resin, and (C) component: containing water A talc filling agent. 2. The resin composition of claim 1, wherein the component (A) has a polycarbonate skeleton. 3. The resin composition of claim 1, wherein the structural unit component represented by (A) has the following general formula (Chemical Formula 1) 〇0 0 II , II II XNCO-(R-〇-C-0 R^-CN Η Η (In the formula (1), a plurality of R independently represent an alkylene group having 1 to 18 carbon atoms, and a plurality of X independently represent an alkylene group or a stretch of 1 to 18 carbon atoms. The aryl group, 111 and 11 each independently represent an integer of from 1 to 20). 4. The resin composition of claim 1, wherein the component (A) is selected from the group consisting of a polyimide resin having a polycarbonate skeleton. a resin obtained by reacting an isocyanate residue of at least one resin of a polyamidoximine resin or a polyamide resin with a trivalent or higher polycarbonate or a derivative thereof having an acid anhydride group. The resin composition of the present invention, wherein the content of the component (C) is 10 to 50 parts by weight based on 100 parts by weight of the component (a), and the hydrotalcite content in the component (c) is 1% by mass. ~50质量质量。 6_ The resin composition of any one of claims 1 to 5 is -45-200911922, which is used for A protective film for a flexible printed circuit board substrate on which a copper foil is laminated on a polyimide substrate. 7. A film forming material characterized by containing the resin composition according to any one of claims 1 to 5. -46 - 200911922 无明说单无简.. rhyme is the map of the map element on behalf of the map: the table pattern represents the book one or two fingers / IV seven eight, if the case has a chemical formula, please reveal the best display invention Chemical formula of the feature: none
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JP2003138015A (en) * 2001-11-07 2003-05-14 Hitachi Chem Co Ltd Polyamideimide resin paste and coating material comprising the same
JP4240885B2 (en) * 2001-12-28 2009-03-18 日立化成工業株式会社 Method for forming protective film of flexible wiring board
JP2003213083A (en) * 2002-01-24 2003-07-30 Nippon Kayaku Co Ltd Epoxy resin composition and flexible printed wiring board material using the same
JP2004137370A (en) * 2002-10-17 2004-05-13 Hitachi Chem Co Ltd Polyamide-imide resin paste and coating film-forming material comprising the same
JP2005036126A (en) * 2003-07-16 2005-02-10 Nippon Kayaku Co Ltd Epoxy resin composition and material for flexible printed wiring board using the same
JP2008133418A (en) * 2006-10-24 2008-06-12 Hitachi Chem Co Ltd Resin composition and flexible wiring board using the same

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KR101140937B1 (en) 2012-05-03
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