200909065 九、發明說明： 【發明所屬之技術領域】 本發明係關於一種喷嘴裝置之設計，特別是關於— 霧化器噴嘴結構。 '—種 【先前技術】 +匕目前業界所提供之喷嘴裝置之設計，大部份都是針斜 噴嘴之改良結構設計，使得液體源於噴嘴噴出处· ^ 、了，月b更具 務化之效果，如在霧化器之噴嘴裝置中改良其震盪薄板妗 構、改良噴嘴裝置之結構形狀等。 ‘ 在中華民國發明專利號第268179號中，係揭露一種 霧化器喷嘴改良結構，包括一噴孔片、一震盪元件、—包 覆構件、一固定構件快速拆卸結構，噴孔片具有多數個： 小賀孔，在噴孔片之週圍環繞設置震盪元件，且與噴孔片 週圍接觸使之能驅動該喷孔片產生震動，並以包覆構件包 覆=該震盪元件之外側，藉由以上Tt件組合，該喷孔片可 又辰盪？件驅動而產生震動，進而壓縮流體，使流體從喷 -片之貝孔以U小顆粒狀贺出，且該包覆構件可隔離震盡 凡件與流體，並且可避免干擾震盈元件與噴孔片的震動， 以減少能量耗損’並提高霧化效率。 【發明内容】 本發明所欲解決之技術問題 而傳統之贺嘴裝置係直接以電鑄之製程製作而 200909065 成，其噴孔之内部並不具有可產生旋流之渦旋流場，當噴 嘴裝置施加一壓力噴出霧化之液滴時，所噴出之液滴並不 完全達到霧化之效果，易產生較大液滴水滴。 緣此，本發明之主要目的即是提供一種霧化器噴嘴結 構，係利用噴嘴裝置内部直接形成一渦旋流體導入區域， 以使得引入之液體源產生旋流之作用。 本發明之另一目的是提供一種具渦旋流場通道之霧化 器噴嘴結構，係設置於渦旋流體導入區域，且連通於噴嘴 基體頂面之液滴喷孔，形成一渦旋流體。 本發明之另一目的是提供一種具漸擴開口之霧化器噴 嘴結構，其係於電鑄製程中，以電鑄層覆蓋光阻圖案之中 央凸柱頂面，形成一呈漸擴開口之液滴喷孔。 本發明解決問題之技術手段 本發明為解決習知技術之問題所採用之技術手段係由 喷嘴基體頂面之液滴喷孔，以及形成在噴嘴基體底面之渦 旋流體導入區域，以及連通於液滴噴孔及渦旋流體導入區 域之間之渦旋流場區段，及設置於噴嘴基體底面且連通於 渴旋流體導入區域之液體入口所組成，且液滴喷孔並在噴 嘴基體之頂面形成一漸擴開口，更以渦旋流體導入區域之 切線方向配置一導流管道’當液體入口引入一液體源，由 導流管道流入渦旋流體導入區域、渦旋流場區段形成一渦 旋流體’再由液滴噴孔產生霧化液滴，並藉由漸擴開口之 設置’使喷出之範圍得以再增加，產生較大之噴出效果， 200909065 • α達到較佳之霧化效果。 本發明對照先前技術之功效 、、二Γ本發明所採用之技術手段，可以使得液體入口引 液Τ源日守，經由渦旋流體導入區域使得引入之液體源 產生疑机之作用力，並經渦旋流場區段由喷嘴基體頂面之 液滴噴孔貝出形成霧化液滴，再藉由漸擴開口之液滴喷孔 6又置’使得旋流嘴出之霧化液滴噴出之範圍變大，而產生 較佳之喷出效果。 本發明所採用的具體實施例，將藉由以下之實施例及 附呈圖式作進一步之說明。 【實施方式】 參閱第1圖及第2圖所示，係顯示本發明霧化器噴嘴 結構之斷面圖及底視圖。包括有一噴嘴基體1、一液滴噴 孔2、至少一渦旋流體導入區域3、至少一渦旋流場區段4、 以及至少一液體入口 5所組成。 液滴喷孔2係形成在鄰近於噴嘴基體1之頂面11，並 在喷嘴基體1之頂面11形成一漸擴開口 21。而噴嘴基體1 之底面12對應於液滴喷孔2係形成一渦旋流體導入區域 3，渦旋流場區段4係連通於喷嘴基體1頂面11之液滴噴 孔2及噴嘴基體1底面12之渦旋流體導入區域3之間’且 噴嘴基體1之底面12設置液體入口 5 ’並連通於渦旋流體 導入區域3，用以引入一液體源W，經由渦旋流體導入區 200909065 域3、渦旋流場區段4形成一渦旋流體W’，再由漸擴開口 21之液滴噴孔2產生霧化液滴W”。 再者，渦旋流體導入區域3係呈一圓形區域，而液滴 喷孔2之孔徑dl小於渦旋流場區段4連通於渦旋流體導入 區域3之孔徑d2。液體入口 5更以一導流管道6連接於渦 旋流體導入區域3，且導流管道6係以渴旋流體導入£域3 之切線方向配置，以產生渦旋流體W’ 。 請同時參閱第3圖及第4圖所示，係顯示本發明霧化 器喷嘴結構之動作示意圖及導流板之底視圖。喷嘴基體1 之底面12相對於液體入口 5處，係設置有一導流板13 ’ 包括有對應於液體入口 5之導流入口 131。 當液體入口 5引入液體源W時，經由導流管道6導 入滿旋流體導入區域3，藉由满旋流體導入區域3產生之 旋流作用，將液體源W旋流導入渦旋流場區段4中，再藉 由液滴喷孔2之孔徑dl小於渦旋流體導入區域3之孔徑 d2，使旋流之渦旋流體w’噴出至液滴噴孔2產生霧化液滴 W”，以達到較佳之霧化效果。 本發明之較佳實施例中，噴嘴基體1之底面12係設 置有三個液體入口 5a、5b、5c，對應於各個液體入口 5a、 5b、5c係配置有一導流管道6a、6b、6c，當各個液體入口 5a、5b、5c引入一液體源W時，經由各個導流管道6a、6b、 6c導入渦旋流體導入區域3，藉由以渦旋流體導入區域3 之切線方向配置之各個導流管道6a、6b、6c，以及連通於 渦旋流體導入區域3之渦旋流場區段4，使得引入渦旋流 200909065 料入區域3之液體源^產生旋流之作用力， 區段4由喷嘴基體！頂面n之 、 滴W”，1 & β 1孔2噴出形成霧化液 二、Λ?肅體1之頂面11形成-漸擴開口 21， 吏化液滴w”，喷出之噴出範圍得以再辦 加，產生較大之噴出效果。 曰 參閱弟5圖至第9圓所示，传海+士 & 係4不本發明霧化器噴嘴 圖，並請同時參閱第1〇圖所示 ^月務化^嘴結構之流㈣。如第5圖所^本發明伟 先㈣-基材本體7(步驟1〇1)，在基材本體7之表面上再 以育光微影製程形成具有m形之光阻圖案8，如第$ 圖所示，光阻圖案8之預定圖形包括有-凸出平台81、一 中央凸柱82、及複數個連通於凸出平台81之液體入口 5 凸部83(步驟102)。以光阻圖案8作為電禱模板進行電鑄 製程，在基材本體7之表面形成一電缚層9(步驟1〇3)，以 電鑄層9覆蓋光阻圖案8之凸出平台81表面，但在中央凸 才之頂面开y成呈漸擴開口 21之液滴噴孔2(步驟104)， 且液滴貝孔2之孔徑dl小於中央凸柱82之孔徑们，在形 成具有-預定圖形之電缚層9後，進行脫模之程序將電轉 層9與基材本體7分離（步驟1〇5)，脫模後之電鑄層9之底 面在對應於光阻圖案8之凸出平台81處係形成一渦旋流體 導入區域3 ’對應於光阻圖案8之液體入口 5凸部83處係 形成一液體入口 5 ’且液體入口 5與渦旋流體導入區域3 之間以導流官運6a、6b、6c予以連通，而對應於光阻圖案 8之中央凸柱82處係形成一渦旋流場區段4(步驟1〇6)，最 200909065 後進行外形切割，得到一具有光阻圖案8之噴嘴結構（步驟 107)。 如第11圖所示，係顯示本發明霧化器喷嘴結構第二 實施例之平面示意圖。本實施例之結構係由前述實施例所 構成’其差異在於包括有複數個液滴喷孔2a、2b、2c、2d 等距佈設於噴嘴基體la之頂面丨〗，且同時包括有對應之 複數個液體入口 5、以及一渦旋流體導入區域3所組成。 各個液滴噴孔2a、2b、2c、2d及對應之各液體入口 5 之間係設置一渦旋流體導入區域3，液體入口 5、並以—導 流管道6連接於渦旋流體導入區域3，且導流管道6係以 渦旋流體導入區域3之切線方向配置，以產生渦旋流 W’ 。 各個液滴噴孔2a、2b、2c、2d及對應之渦旋流體導 入區域3間係連通有一渦旋流場區段4,當各個液滴噴孔 2a、2b、2c、2d之對應導流管道6引入液體源w時，液體 源W經由渦旋流體導入區域3、渦旋流場區段4形成一渦 旋流體W’ ，再由各個液滴噴孔2a、2b、2c、2d產生霧化 液、滴，且經由噴嘴基體la之頂面u形成之漸擴開口 2ι， 使得旋流喷出之霧化液滴W”噴出之噴出範圍得以再增 加’產生較大之嗔出效果。 由以上之實施例可知，本發明所提供之霧化器噴嘴結 構確具產業上之利用價值，故本發明業已符合於專利之要 件。惟以上之敘述僅為本發明之較佳實施例說明，凡精於 此項技蟄者t可依據上述之說明而作其它種種之改良，惟 200909065 下所界定之專利範 這些改變仍屬於本發明之發明精神及以 圍中。 【圖式簡單說明】 第1圖係顯示本發明霧化器噴嘴結構之斷面圖. 第2圖係顯示本發明霧化器噴嘴結構之底視^ · 第3圖係顯示本發明霧化器嘴嘴結構之動作示意圖. 第4圖係顯示本發明霧化器嘴嘴結構導流板之底視圖. 第5圖^第9圖係顯示本發明霧化器噴嘴結構之結構示意 第10圖係顯示本發明霧化器噴嘴結構之流程圖； 第11圖係顯示本發明霧化器喷嘴結構第二實施例之平面示 棄圖。 ’ 【主要元件符號說明】 1 喷嘴基體 la 噴嘴基體 11 頂面 12 底面 13 導流板 131 導流入口 2 液滴噴孔 2a 、 2b 、 2c 、 2d 液滴噴孔 21 漸擴開口 11 200909065 3 渦旋流體導入區域 4 渦旋流場區段 5 液體入口 5a、5b、5c 液體入口 6 導流管道 6a、6b、6c 導流管道 7 基材本體 8 光阻圖案 81 凸出平台 82 中央凸柱 83 液體入口凸部 9 電鑄層 dl 孔徑 d2 孔徑 W 液體源 W, 渦旋流體 w” 霧化液滴 12200909065 IX. DESCRIPTION OF THE INVENTION: TECHNICAL FIELD OF THE INVENTION The present invention relates to the design of a nozzle device, and more particularly to an atomizer nozzle structure. '--[Previous technology] +匕The design of the nozzle device currently provided by the industry, most of which are the improved structural design of the needle-inclined nozzle, so that the liquid originates from the nozzle discharge point ^ ^, and the monthly b is more The effect is to improve the structure of the oscillating thin plate in the nozzle device of the atomizer, to improve the structural shape of the nozzle device, and the like. In the Republic of China Invention Patent No. 268179, an improved structure of an atomizer nozzle is disclosed, which comprises a spray orifice, an oscillating member, a covering member, a quick disassembly structure of a fixing member, and a plurality of orifice sheets. : Xiaohe hole, around which the oscillating member is arranged around the orifice sheet, and is in contact with the periphery of the orifice sheet to drive the orifice sheet to generate vibration, and is covered with the covering member = the outer side of the oscillating member, by With the above Tt combination, the orifice can be swayed again? The device is driven to generate vibration, thereby compressing the fluid, so that the fluid is ejected from the shell hole of the spray-chip in a small U shape, and the covering member can isolate the vibration of the workpiece and the fluid, and can avoid interference with the shock component and the spray Vibration of the orifice to reduce energy loss' and improve atomization efficiency. SUMMARY OF THE INVENTION The technical problem to be solved by the present invention is that the conventional mouthpiece device is directly fabricated by electroforming process and is manufactured by 200909065. The inside of the nozzle hole does not have a swirling flow field which can generate a swirling flow. When the device applies a pressure to spray the atomized droplets, the droplets ejected do not completely achieve the effect of atomization, and are likely to generate large droplets of water droplets. Accordingly, it is a primary object of the present invention to provide an atomizer nozzle structure in which a swirl fluid introduction region is directly formed inside the nozzle device to cause a swirling flow to be generated by the introduced liquid source. Another object of the present invention is to provide an atomizer nozzle structure having a vortex flow field passage disposed in a swirl fluid introduction region and communicating with a droplet orifice of a top surface of the nozzle base to form a swirl fluid. Another object of the present invention is to provide a nebulizer nozzle structure having a diverging opening, which is in an electroforming process, and an electroformed layer covers the top surface of the central stud of the photoresist pattern to form a divergent opening. Droplet orifice. Technical Solution for Solving the Problems of the Invention The technical means adopted by the present invention to solve the problems of the prior art are the droplet ejection holes from the top surface of the nozzle base, the vortex fluid introduction region formed on the bottom surface of the nozzle base body, and the liquid communication. a vortex flow field section between the drip orifice and the vortex fluid introduction zone, and a liquid inlet disposed on the bottom surface of the nozzle base and communicating with the thirsty fluid introduction zone, and the droplet orifice is at the top of the nozzle base The surface forms a divergent opening, and a diversion conduit is disposed in a tangential direction of the vortex fluid introduction region. When the liquid inlet introduces a liquid source, the diversion conduit flows into the vortex fluid introduction region, and the vortex flow field portion forms a The vortex fluid 'reproduces the atomized droplets from the droplet orifices, and by the setting of the divergent opening', the range of the ejection is further increased, resulting in a larger ejection effect, 200909065 • α achieves better atomization effect . The invention compares the efficacy of the prior art, and the technical means adopted by the invention, can make the liquid inlet liquid lead source keep the source, and the introduced liquid source generates the force of the suspect machine through the vortex fluid introduction area, and The vortex flow field section is formed by the droplet orifice of the top surface of the nozzle base to form an atomized droplet, and then the droplet orifice 6 of the diverging opening is again set to make the atomized droplet of the swirl nozzle eject. The range is increased to produce a better squirting effect. The specific embodiments of the present invention will be further described by the following examples and the accompanying drawings. [Embodiment] Referring to Figures 1 and 2, a cross-sectional view and a bottom view of a nozzle structure of an atomizer according to the present invention are shown. A nozzle base 1, a droplet orifice 2, at least one vortex fluid introduction zone 3, at least one vortex flow zone section 4, and at least one liquid inlet 5 are included. The droplet orifice 2 is formed adjacent to the top surface 11 of the nozzle base 1, and a diverging opening 21 is formed in the top surface 11 of the nozzle base 1. The bottom surface 12 of the nozzle base 1 forms a scroll fluid introduction region 3 corresponding to the droplet orifice 2, and the swirl flow field segment 4 communicates with the droplet orifice 2 and the nozzle base 1 of the top surface 11 of the nozzle base 1. The bottom surface 12 of the vortex fluid introduction region 3 is disposed between the vortex fluid introduction region 3 and the liquid inlet 5' of the nozzle base body 1 is connected to the vortex fluid introduction region 3 for introducing a liquid source W via the vortex fluid introduction region 200909065. 3. The vortex flow field section 4 forms a vortex fluid W', and the atomized droplets W" are generated by the droplet orifices 2 of the diverging opening 21. Further, the vortex fluid introduction zone 3 is a circle The shape of the area, and the aperture dl of the droplet orifice 2 is smaller than the aperture d2 of the vortex flow field section 4 communicating with the vortex fluid introduction zone 3. The liquid inlet 5 is further connected to the vortex fluid introduction zone 3 by a flow conduit 6 And the flow guiding duct 6 is arranged in a tangential direction of the thirst fluid introduction into the domain 3 to generate the vortex fluid W'. Please also refer to FIGS. 3 and 4 to show the nozzle structure of the atomizer of the present invention. A schematic view of the action and a bottom view of the baffle. The bottom surface 12 of the nozzle base 1 is opposite to the liquid At the mouth 5, a baffle 13' is provided to include a diversion inlet 131 corresponding to the liquid inlet 5. When the liquid inlet 5 is introduced into the liquid source W, the full-circulation fluid introduction region 3 is introduced through the diversion conduit 6, by The swirling action generated by the full-circulation fluid introduction region 3 introduces the swirling flow of the liquid source W into the vortex flow field section 4, and the aperture dl of the droplet orifice 2 is smaller than the aperture d2 of the swirling fluid introduction region 3, The swirling vortex fluid w' is ejected to the droplet orifice 2 to produce atomized droplets W" to achieve a better atomization effect. In a preferred embodiment of the present invention, the bottom surface 12 of the nozzle base 1 is provided with three liquid inlets 5a, 5b, 5c, and a flow conduit 6a, 6b, 6c is disposed corresponding to each of the liquid inlets 5a, 5b, 5c. When each of the liquid inlets 5a, 5b, and 5c is introduced into the liquid source W, the swirling fluid introduction region 3 is introduced through the respective flow guiding conduits 6a, 6b, and 6c, and the respective diverting flows are arranged in the tangential direction of the swirling fluid introduction region 3. The pipes 6a, 6b, 6c, and the vortex flow field section 4 communicating with the vortex fluid introduction zone 3, such that the liquid source introduced into the zone 3 by the vortex flow 200909065 generates a swirling force, the section 4 is Nozzle base! The top surface n, the drop W", 1 & β 1 hole 2 is sprayed to form the atomized liquid 2, the top surface 11 of the body 1 is formed - the divergent opening 21, the droplets w", the ejection is ejected The scope can be added again, resulting in a larger squirt effect.参阅 Refer to the 5th to 9th circles of the brothers, and the transfer of the nozzles of the atomizers of the invention is not shown in Fig. 1 and the flow of the structure of the nozzles (4). As shown in FIG. 5, the present invention (four)-substrate body 7 (step 1〇1), a photoresist pattern 8 having an m-shape is formed on the surface of the substrate body 7 by a lithography process, such as As shown in the figure, the predetermined pattern of the photoresist pattern 8 includes a projection platform 81, a central projection 82, and a plurality of liquid inlet 5 projections 83 communicating with the projection platform 81 (step 102). An electroforming process is performed using the photoresist pattern 8 as an electro-pray template, and an electrically binding layer 9 is formed on the surface of the substrate body 7 (step 1〇3), and the surface of the protruding platform 81 of the photoresist pattern 8 is covered with the electroformed layer 9. However, the top surface of the central convex portion is opened to form the droplet orifice 2 of the diverging opening 21 (step 104), and the pore diameter dl of the droplet shell 2 is smaller than the pore diameter of the central pillar 82, and is formed with - After the electric binding layer 9 of the pattern is predetermined, the process of demolding separates the electrorotation layer 9 from the substrate body 7 (step 1〇5), and the bottom surface of the electroformed layer 9 after demolding is convex corresponding to the photoresist pattern 8. A vortex fluid introduction region 3 is formed at the exit platform 81. A liquid inlet 5' corresponding to the liquid inlet 5 of the photoresist pattern 8 forms a liquid inlet 5' and a liquid inlet 5 and a vortex fluid introduction region 3 are guided. The flow of the official traffic 6a, 6b, 6c is connected, and a vortex flow field section 4 is formed corresponding to the central stud 82 of the photoresist pattern 8 (step 1〇6), and the shape is cut after the most 200909065, and a The nozzle structure of the photoresist pattern 8 (step 107). As shown in Fig. 11, a plan view showing a second embodiment of the atomizer nozzle structure of the present invention is shown. The structure of the present embodiment is constituted by the foregoing embodiment. The difference is that a plurality of droplet orifices 2a, 2b, 2c, 2d are arranged equidistantly disposed on the top surface of the nozzle base la, and at the same time include corresponding A plurality of liquid inlets 5 and a vortex fluid introduction zone 3 are formed. A swirl fluid introduction region 3 is disposed between each of the droplet discharge holes 2a, 2b, 2c, 2d and the corresponding liquid inlets 5, and the liquid inlet 5 is connected to the swirl fluid introduction region 3 by a flow guiding conduit 6. And the flow guiding duct 6 is arranged in the tangential direction of the swirling fluid introduction region 3 to generate the swirling flow W'. Each of the droplet orifices 2a, 2b, 2c, 2d and the corresponding swirling fluid introduction region 3 is connected to a vortex flow field section 4, and corresponding flow of the respective droplet orifices 2a, 2b, 2c, 2d When the pipe 6 is introduced into the liquid source w, the liquid source W forms a vortex fluid W' via the vortex fluid introduction zone 3, the vortex flow field section 4, and the mist is generated by the respective droplet orifices 2a, 2b, 2c, 2d. The liquid, the droplet, and the divergent opening 21 formed by the top surface u of the nozzle base la, so that the spray range of the atomized droplets "sprayed out by the swirling flow" can be further increased, resulting in a larger scooping effect. The above embodiments show that the atomizer nozzle structure provided by the present invention has industrial value, and the present invention has been met with the requirements of the patent. However, the above description is only for the preferred embodiment of the present invention. Those skilled in the art can make other improvements according to the above description, but the patents defined in 200909065 are still subject to the inventive spirit and encirclement of the invention. [Simplified illustration] The figure shows a sectional view of the nozzle structure of the atomizer of the present invention. Fig. 2 is a bottom view showing the structure of the nozzle of the atomizer of the present invention. Fig. 4 is a view showing the operation of the nozzle structure of the atomizer of the present invention. Fig. 4 is a view showing the flow of the nozzle structure of the atomizer of the present invention. The bottom view of the plate. Fig. 5 is a schematic view showing the structure of the atomizer nozzle structure of the present invention. Fig. 10 is a flow chart showing the structure of the atomizer nozzle of the present invention; Fig. 11 is a view showing the atomizer of the present invention. No. Fig. 1 shows the nozzle element base la nozzle base 11 top surface 12 bottom surface 13 deflector 131 flow inlet 2 droplet discharge holes 2a Droplet orifice 21 divergent opening 11 200909065 3 vortex fluid introduction zone 4 vortex flow zone section 5 liquid inlet 5a, 5b, 5c liquid inlet 6 flow conduit 6a, 6b, 6c flow conduit 7 substrate body 8 Photoresist pattern 81 Projection platform 82 Central stud 83 Liquid inlet protrusion 9 Electroformed layer dl Aperture d2 Aperture W Liquid source W, vortex fluid w” Atomized droplet 12