TW200903614A - Chemical-mechanical polishing pad, and chemical-mechanical polishing method - Google Patents

Abstract

Provided is a chemical-mechanical polishing pad having a polishing face comprising two groove groups of (1) a first groove group including a plurality of first grooves intersecting with one imaginary straight line extending from the center of the polishing face to the circumferential portion, but not intersecting with each other, and (2) a second groove group including a plurality of second grooves intersecting with one imaginary straight line extending from the center of the polishing face to the circumferential portion, but not intersecting with each other, the second grooves not intersecting with the first grooves but having a second groove width different from the first groove width, and the second grooves existing by one or a plurality in the clearance between the two first grooves adjoining each other on the polishing face.

Description

200903614 IX. Description of the Invention [Technical Field] The present invention relates to a chemical mechanical honing pad and a chemical mechanical honing method. [Prior Art] In the formation of semiconductor devices and the like in recent years, in order to form a honing method having an excellent flat surface, a chemical mechanical polishing method (hereinafter abbreviated as "CMP") is often used. In the chemical mechanical honing method, the properties and characteristics of the chemical mechanical honing pad are known to have a considerable influence on the honing result, and various chemical mechanical honing pads have been proposed in the past. For example, Japanese Laid-Open Patent Publication No. Hei 8-5-100622 and JP-A No. 2000-3 4416 disclose a review of materials constituting a chemical mechanical honing pad. Further, for example, the groove design of the surface of the honing pad (honing surface) has been examined in Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. In the publication of Japanese Laid-Open Patent Publication No. Hei No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. Ditch and serpentine groove technology. Further, the relationship between the groove density of the honing surface and the honing performance is discussed in detail in the special publication No. 2004-507077. In the same publication, the concentric groove can be used to capture the water-based dispersion of the chemical mechanical honing which is introduced into the center of the honing pad and is moved toward the outer periphery of the honing pad by the centrifugal force during honing. However, these communiqués refer to the idea of the design of the above-mentioned mourning trenches, but do not clearly point out the specific guidance useful for the actual trench pattern in actual production conditions. On the one hand, the cost competition for chemical mechanical honing supplied by chemical mechanical honing is considered to be one of the most effective methods for cost reduction. However, when the supply amount of the chemical mechanical honing aqueous dispersion is small, the aqueous dispersion is effectively supplied on the entire surface of the honing pad honing surface, and the high honing speed and the height uniformity of the honed surface are achieved. From a point of view, most of the trench design has not been reviewed. SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and an object thereof is to provide an in-plane uniformity in which a honing speed is excellent and a honing amount of a honing surface is uniform even if a supply amount of a chemical mechanical honing aqueous dispersion is small. Chemical mechanical honing pads and chemical mechanical honing methods. According to the present invention, the above object of the present invention can be attained by the first, a chemical mechanical honing pad (hereinafter referred to as "first honing pad"), which is a honed surface having a honing surface and a back surface. The chemical mechanical honing pad, wherein the honing surface has at least two groups of grooves composed of a plurality of grooves, and the two groups of grooves are composed of the following: (1) from the center of the self-grinding surface An imaginary straight line toward the peripheral portion -6-200903614 a first group of grooves formed by a plurality of first grooves intersecting, the plurality of first grooves do not intersect each other and have a first groove width, and (2) a second groove group formed by a plurality of second grooves intersecting one of the imaginary straight lines from the center of the honing surface toward the peripheral portion, the plurality of second grooves not intersecting each other, and each of the second grooves and the first groove The grooves do not intersect each other and have a second groove width different from the first groove width, so that one or a plurality of the second gaps are present in the gap between the two adjacent first grooves on the honing surface. ditch. The above object of the present invention can be attained by the second, a chemical mechanical honing pad (hereinafter referred to as "second honing pad") which has a honing surface and a chemical mechanical 硏 which is a non-honing surface of the back surface thereof. a sanding pad, the honing surface has at least one first groove and one second groove, and (1) the first groove is spirally enlarged from the center of the honing surface toward the peripheral portion and has a first groove Width, (2) the second groove is spirally enlarged from the center of the honing surface toward the peripheral portion, and the second groove and the first groove do not intersect each other and have a different width from the first groove The second groove width. The above object of the present invention can be achieved by the following "third" chemical mechanical honing method which chemically hones the honed body using any of the above chemical mechanical honing pads. [Embodiment] The first honing pad and the second honing pad -7-200903614 of the chemical mechanical honing pad of the present invention each have a honing surface and a non-honing surface thereof on the back side. The shape of the honing surface and the non-honing surface of the chemical mechanical honing pad of the present invention is not particularly limited, and may be, for example, a circle, a polygon (preferably a convex polygon, more preferably a regular polygon), etc., and the device has the present invention. The honing device used for the chemical mechanical honing pad can be suitably selected. The shape of the honing surface is preferably the same as the shape of the non-honing surface. When both the honing surface and the non-honing surface are circular, the honing pad has a disk-like shape. When both the honing surface and the non-honing surface are polygonal, the honing pad has a polygonal column shape. The shape of the honing pad and the non-honing pad is preferably a circular shape. Accordingly, the shape of the honing pad is preferably such that the size of the disk-shaped honing pad is not particularly limited, for example, if it is a disk-shaped chemical machine. In the case of the honing pad, the diameter is 150~1,200mm, especially 500~8〇〇111111, and the thickness is 〇.5~5.〇111111, especially the thickness is 1.〇~3.〇111111, wherein the thickness is better It is 1.5~3.0mm. The constitution of the first honing pad and the second honing pad of the present invention having the groove will be described below in order. The so-called "groove group" in the first honing pad means a collection of a plurality of grooves having geometrically similar shapes. The first groove shape of the first groove group of the first honing pad is not particularly limited, and may be, for example, two or more spiral grooves which are sequentially enlarged from the center portion of the honing surface toward the peripheral portion or are not intersected and concentric with each other. A polygonal groove of a plurality of annular grooves arranged in an eccentric or eccentric shape. The annular groove may be, for example, a circular or elliptical groove, and the polygonal groove may be, for example, a quadrilateral or a pentagon or more polygonal -8-200903614 shape groove. The first groove is provided on the honing surface so as to intersect the imaginary straight line from the center of the honing surface toward the peripheral portion. For example, when the groove shape is composed of a plurality of annular grooves, there are two intersections of the two annular grooves, and three intersections with three intersections. Similarly, n annular grooves have n intersections. intersection. When it is composed of a plurality of polygonal grooves, it is the same as the case of a plurality of annular grooves. On the one hand, in the case of two spiral grooves, 'when it is regarded as one circle at 3 60°, the number of intersections before entering the second circle becomes two, and the intersection point when entering the second turn becomes three. (2η-2) before entering the η-th turn, and (2η-1) when entering the η-th turn. When the first groove of the first groove group is composed of a plurality of annular grooves or polygonal grooves, the plurality of annular grooves and polygonal grooves are disposed so as not to intersect each other. The arrangement may be concentric or eccentric, but preferably concentric. When the first groove of the first groove group is arranged in a concentric shape, the honing pad is arranged in a non-concentric honing pad, and when the supply amount of the aqueous dispersion is small, the honing speed is more excellent and the squeezing speed is high. The in-plane uniformity of the honing amount of the grinding surface is more excellent. Preferably, the plurality of annular grooves are formed by a plurality of circular grooves, and the circular grooves are preferably arranged concentrically. The plurality of circular-shaped grooves are arranged in a concentric shape, and thus have the advantages of being excellent in such functions, and more easily forming grooves. The cross-sectional shape of the groove in the width direction (the normal direction of the groove) is not particularly limited, and may be, for example, a rectangular shape, a multi-faceted shape of three or more sides formed by a flat side surface and a bottom surface, a U-shape, or the like. As the polygon, for example, -9-200903614 quadrilateral, pentagon, and the like can be exemplified. The first groove of the first groove group has a first groove width. Here, the "groove width" is the shortest distance between the wall surface of the groove and the angle formed by the honing surface. The second groove shape of the second groove group in the first honing pad, the relative position of the second groove, and the cross-sectional shape are the same as the first groove of the first groove group. The shape of the second groove is preferably a shape similar to the shape of the first groove of the first groove group. Furthermore, the second groove does not intersect the first groove of the first groove group. The second groove of the second groove group has a second groove width different from the first groove width. The second groove of the second groove group has one or more strips between the gaps of the two first grooves adjacent to each other on the honing surface. Hereinafter, the detailed gully structure of the first honing pad is divided into a case where a second groove exists in the gap between the adjacent two first grooves and a plurality of second grooves exist in the gap between the adjacent two first grooves. Explain. a second groove exists in the gap between the two first grooves adjacent to each other on the honing surface, the intersection of the imaginary line and the first groove on the imaginary line, and the intersection of the imaginary line and the second groove Interaction appears. The second groove has a second groove width different from the first groove width of the first groove, but for example, the second groove width may be smaller than the first groove width. In this case, the first groove has a first groove width of preferably 0.5 to 2.0 mm, more preferably 0.6 to 1.8 mm, and even more preferably 0.7 to 1.6 mm, which is particularly preferably 〇.8 to 1.4 mm. Among them, it is preferably from 0.8 to 1.2 mm. By making the first groove width within the above range, -10-200903614 can more effectively exert the effects of the present invention. In particular, the first groove width is more than 77 mm, more preferably 0.8 mm or more, and the effect can be remarkably exhibited. The gap between the first groove', that is, the distance between the adjacent two intersections of the aforementioned imaginary straight line and the first groove, is preferably 2.0 to 8 mm, more preferably 3.0 to 7.5 mm. It is 3.5~7.〇mm, especially preferably 4.5~6_5mm 'where 4.5~6.0mm is better', preferably 5.0~6.0mm. The effect of the present invention can be most effectively exerted by causing the distance between the first grooves to fall within the above range. Here, the intersection of the imaginary straight line and the first groove is microscopically the intersection of the imaginary straight line and the center of the first groove in the width direction. The intersection of the imaginary line and the second groove is also understood. The depth of the first groove is preferably 0.1 mm or more, more preferably 〇.丨~2 5 mm, and even more preferably 〇_2 to 2.0 mm. On the one hand, the second groove has a second groove width of preferably 0.2 to 〇5 mm, more preferably 0_25 to 0.45111111, still more preferably 0.27 to 0.4111111, particularly preferably 0_29 to 0.35 mm. By making the second groove width within the above range, the effect of the present invention can be more effectively performed. In particular, the second groove width is 〇.4 mm or less, more preferably 0.35 rnrn or less, and the effect can be remarkably exhibited. The second groove is preferably located at the center of the adjacent two first grooves. That is, the distance between the adjacent intersections on the imaginary straight line is preferably equal. The depth of the second groove is preferably 0.1 mm or more, more preferably 〇丨 2 2 5 mm, and even more preferably 〇 2 to 2.0 mm. Referring to Fig. 1, a preferred relationship between the first groove and the second groove -11 - 200903614 in the case where there is an average second groove between the two first grooves adjacent to each other on the honing surface is specifically described. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a partially enlarged schematic view showing a section of the honing pad which is cut along the surface of the imaginary straight line on the vertical honing surface. The honing pad of Fig. 1 includes a first groove having a first groove width W1 and a second groove having a second groove width W2 smaller than W1, and a second groove is present between each of the adjacent first grooves. According to this aspect, the distance between the first grooves is represented by P1. In the imaginary straight line of FIG. 1, the intersection point (C 1 ) between the imaginary straight line and the first groove, and the intersection point (C2) between the imaginary straight line and the second groove are C 1 , The order of C2, C1, and C2 interacts. In the honing pad of Fig. 1, the second groove is disposed at the center of the adjacent two first grooves (the lengths D1 and D2 in Fig. 1 are equal). Then, a plurality of second grooves are present in the gap between the two first grooves adjacent to each other on the honing surface, and the second groove has a second groove width smaller than the first groove width of the first groove Or it may be wider than the first groove of the first groove. In the case where the second groove has a second groove width smaller than the first groove width of the first groove, the first groove has a first groove width of preferably 〇.6 to 2.2 mm, and the first groove The spacing is preferably 4~12mm', and the second groove width is preferably 0.1 to 0.5 mm. Preferably, the first groove width and the pitch of the first groove and the second groove width of the second groove vary depending on the number of second grooves existing in the gap between the two first grooves adjacent to each other. For example, in the case where there are two second grooves in the gap between the two first grooves adjacent to each other, the first groove has a first groove width of preferably 〇. 8~2.0 mm -12- 200903614 'better 〇_9~1.8mm, and more preferably 1.0~l.6mm. By making the first groove width within the above range, the effects of the present invention can be more effectively exhibited. In particular, the first groove width is 〇.8 mm or more, more preferably 〇.9 mm or more, and the effect can be remarkably exhibited. The distance between the first grooves is preferably 4 to 8 mm, more preferably 5 to 7.5 mm, and still more preferably 6 to 7 mm. The effect of the present invention can be most effectively exerted by setting the distance between the first grooves to the above range. The first groove has a first groove width of preferably 0.1 to 0.45 mm, more preferably 0.15 to 0.40 mm, and even more preferably 〇·2〇 to 〇.35 mm. By making the second groove width within the above range, the effects of the present invention can be exhibited more effectively. In particular, the second groove width is 〇. 4 mm or less ‘more preferably 0.35 mm or less, which can remarkably exhibit the effect. For example, if there are three second grooves in the gap between the two first grooves adjacent to each other, the first groove has a first groove width of preferably 0.8 to 2.2 mm, more preferably 1_0 to 2_0 mm, and even better. It is 1.2~1.8mm. The effect of the present invention can be more effectively exerted by making the first groove width within the above range. In particular, the first groove width is 1.0 mm or more, more preferably 1.2 mm or more, and the effect can be remarkably exhibited. The spacing between the dimples is preferably 6 to 12 m, more preferably 7 to 11 mm' and even more preferably 8 to 9 mm. The effect of the present invention can be most effectively exerted by making the distance between the first grooves fall within the above range. The second groove width is preferably from 0.1 to 0.45 mm, more preferably from 0 to 15 to 0.40 mm, still more preferably from 0.20 to 0.35 mm. By making the second groove width within the above range, the effects of the present invention can be exhibited more effectively. In particular, the second groove width is 0.4 mm or less, more preferably 〇.35 mm or less, and the effect is remarkably exhibited. On the one hand, in the gap between the two first grooves adjacent to each other on the honing surface - 13-200903614 There are a plurality of second grooves, and the stomach in the second groove is the stomach = the first groove When the first groove width is large, the first groove has a first groove width of preferably 0.2 to 0.5 mm, more preferably 0 · 2 5 to 0.4 5 mm, still more preferably 0.27 to 0.4 mm. The effect of the present invention can be more effectively exerted by making the second groove width within the above range. In particular, by making the second groove width 〇.45 mm or less, more preferably 〇.4 mm or less, the effect can be remarkably exhibited. When the second groove has a second groove width larger than the first groove width of the first groove, the distance between the first grooves is preferably 2.0 to 8.0 mm', more preferably 3.0 to 7.5 mm, and even more preferably 3.5~7.0 mm. The effect of the present invention can be most effectively exerted by making the distance between the first grooves described above within the above range. Where the second groove has a second groove width larger than the first groove width of the first groove, the second groove width is preferably 0.6 to 1.8 mm, more preferably 0.7 to 1.6 mm, and more preferably · 8 to 1.4 mm. By making the second groove width within the above range, the effects of the present invention can be effectively exhibited. In particular, by making the second groove width 〇.7 mm or more' more preferably 〇.8 mm or more, the effect can be more prominently exhibited. In the case where there are a plurality of second grooves in the gap between the two first grooves adjacent to each other on the honing surface, the plurality of second grooves existing in the gap between the two adjacent first grooves are preferably equally disposed adjacent to each other. 2 between the first ditch. That is, the distance between adjacent intersections on the above imaginary straight line is preferably equal. The second groove has a second groove width which is preferably smaller than the first groove width of the first groove. The number of second grooves present in the gap between the two adjacent first grooves is preferably 2 to 5, more preferably 2 to 3, and most preferably 2. -14- 200903614 Referring to Figure 2, a detailed description of the preferred relationship between the first groove and the second groove in the case where there are a plurality of second grooves in the gap between the two first grooves adjacent to each other on the honing surface . Fig. 2 is a partially enlarged plan view showing a section of the honing pad which is cut along a plane perpendicular to the honing surface of the imaginary straight line. 2 shows that the second groove has a second groove width smaller than the first groove width of the first groove, but the same applies to the second groove width larger than the first groove width. And get understanding. The honing pad of FIG. 2 includes a first groove having a first groove width W1 and a second groove having a second groove width W2 smaller than W1, and there are two second grooves on average between the two adjacent first grooves. . According to this aspect, the distance between the first grooves is represented by P 1 . In the imaginary straight line of FIG. 2, the intersection point (C 1 ) between the imaginary straight line and the first groove, and the intersection point (C2) between the imaginary straight line and the second groove are C1 and C2 The order of C2, C1, C2, C2, and C1 exists. In the honing pad of Fig. 2, the two second grooves are equally disposed at the center of the adjacent two first grooves (the lengths D1, D2, and D3 in Fig. 2 can be equally understood). Furthermore, even in any of the above cases, in the vicinity of the center of the honing surface or in the vicinity of the outer peripheral end, one or a plurality of second grooves may exist at a position other than the gap between the two first grooves, and the present invention is not impaired. The effect. For example, the first groove and the second groove are respectively an annular groove or a polygonal groove. The inner side of the smallest first groove or the outer side of the largest first groove in the honing surface may also have one or a plurality of grooves. Second ditch. Even in any of the above cases, the surface of the inner surface of the first groove and the second groove -15-200903614 has a roughness (Ra) of preferably 20 μm or less, more preferably 0.05 to 15 μm, and even more preferably 0.05 to 10 μm. By setting the surface roughness to 20 μm or less, it is possible to more effectively prevent the occurrence of scratches on the surface to be honed when the chemical mechanical honing step is performed. The above surface roughness (Ra ) is defined by the following formula (i).

Ra = Σ | Z-Zav I / N ( i ) (wherein, in the above formula (i), N is the number of measured points' Z is the height of the rough surface, and Zav is the average height of the rough surface). The total number of intersections between the imaginary straight line and the first groove and the second groove (when the first groove and the second groove are circular grooves, elliptical grooves or polygonal grooves, the total number of intersections and the first groove and the second groove The sum of the grooves is the same, which is calculated from the distance between the first grooves and the number of second grooves existing in the gap between the two first grooves and the size of the honing surface. For example, when the honing pad having a diameter of 500 mm is honed, the total number of intersections may be 60 to 25, more preferably 80 to 170. Further, for example, when the honing surface has a honing pad having a diameter of 800 mm, the total number of intersections may be 100 to 350, more preferably 130 to 270. The honing surface has the first groove group and the second groove group as described above, and in the case of chemical mechanical honing, even if the supply amount of the chemical honing aqueous dispersion is small, the honing speed can be excellent and the quilt can be obtained. A honing pad for chemical mechanical honing with excellent uniformity in the surface of the honing surface. Secondly, the second honing pad has a first groove which spirally expands one spiral groove from the center portion of the honing surface to the peripheral portion, and replaces the first groove group of the first honing pad-16-200903614, and has A second groove that spirally expands one of the spiral grooves from the center portion of the honing surface to the peripheral portion in place of the second groove group of the first honing pad. The second groove does not intersect the aforementioned first groove. The number of turns of the first groove and the second groove, each of which is a spiral groove, is, for example, 20 to 400, preferably 20 to 300 Å or more preferably 20 to 200. One of the '3 60° turns is equivalent to the number of turns. The first groove width, the spacing and the depth of the first groove of the second honing pad and the second groove width, the spacing and the depth of the second groove are respectively in the honing surface as in the first honing pad In the case where there is a second groove in the gap between the two adjacent first grooves, the first groove has a first groove width, a pitch and a depth, and the second groove has a second groove width, a pitch and a depth. Same as above. Moreover, the preferred range of the surface roughness (Ra) of the first groove and the second groove inner surface of the second honing pad is also the surface roughness of the first groove and the second groove inner surface of the first honing pad The preferred range of (Ra) is the same. What is not specifically described in the second honing pad, the matter recorded in the first honing pad may be changed directly or by a person skilled in the art to understand that it is also applicable to the second honing pad. The chemical mechanical honing pad of the present invention may also have a third groove group different from the first groove group second groove group. The third groove group is composed of a plurality of grooves extending from the center portion of the honing surface toward the peripheral portion. The term "center portion" refers to a region surrounded by a circle having a radius of 50 mm centered on the center of gravity of the chemical mechanical honing pad. Further, the term "peripheral portion" means an area other than the center portion. Each of the third grooves to which the third groove group belongs may be, for example, a linear shape, a broken line shape, an arc shape, or the like, extending from any one of the "central portions" of -17-200903614 toward the peripheral portion. Here, the "dashed-shaped groove" means a groove in which a plurality of line concave portions are arranged in the longitudinal direction on an imaginary line. The recessed portion of the other shape is formed by linearly repeating one of the linear recesses on the extension line of the linear recessed portion. The length of each linear recess of the dotted groove is preferably from 20 to 1 0 m m. Further, the length of the two adjacent linear recesses is preferably 5 to 100 mm, more preferably 15 to 60 mm. The third groove may reach the outer peripheral end, or may not reach the outer circumference, and one of the third grooves may reach the outer peripheral end, preferably all the outer peripheral end. The term "outer circumference" refers to the end of the chemical. For example, the plurality of third trenches are formed by a plurality of linear grooves from the central portion so that at least the side of the gasket or the plurality of linear grooves of the third groove from the central portion are A plurality of linear grooves from the central portion and the peripheral portion of the peripheral portion are formed so as to reach at least the side surface of the gasket. Further, the third groove in which the plurality of third grooves are arranged in parallel is formed in pairs. Preferably, the third group of grooves is formed by the other third grooves in the central portion and the grooves of the other third group in the central portion. In this case, in the central portion region, the shape-like concave portion may be a non-linear shape, and the concave portion may be a concave portion and a non-recessed portion 5 to 200 mm, and more preferably a non-recessed end. , but it is preferable that the third groove reaches the mechanical honing pad surface and starts to face one of the surrounding grooves, and can start from the middle toward the peripheral portion and one groove can be connected to the groove which can be connected by the two third grooves. The third other third ditch phase -18-200903614 is connected to the third ditch between the other ditch and the third ditch in the central portion. The third ditch belonging to the third ditch group does not cross each other even if it is connected to other ditches of the group. As for the number of the third groove group, the total number is preferably from 6 to 96. The number of the third groove that the third groove is connected to is 2 to 32, and the number of the third groove that is not connected is 4-64. . A better range is 6 to 48, and the number of third grooves that are in contact with the other third grooves is 4 and the number of third grooves that are in contact with the other third grooves is 4 to 32. The most, the total number is 6~3 6 , the third ditch connecting with the other third ditch, the third ditch not connected with the other third ditch is 4~3 2 The number of third grooves that are not attached to the central portion is greater than the number of other third grooves in the central portion. Further, it is preferable that the third groove is in contact with the other third groove, and the third groove which is equal to the other third groove and which is not in the third groove group is also a groove extending from any central portion. In the case of the third groove which is not connected to the center portion, it is preferably a groove extending from the center of the honing pad 10 to 5 from the direction toward the peripheral portion, preferably from a distance of 20 to 50 mm. The position starts from the direction toward the peripheral portion, and it is preferable that the center of the honing pad that is in contact with the other third groove in the central portion starts to extend toward the peripheral portion. On the other hand, the third groove group is composed of a plurality of strips from the center of the plurality of strips belonging to the third strip, wherein the other third grooves are, the total number is i~16, and the range is not good; the number is 2-4. The third ditch between the third ditch and the third ditch connected to the third ditch starts to face the periphery of the third ditch phase, and the center of the honing pad extends. The third groove is formed from the center portion toward the -19-200903614. The linear groove of the peripheral portion and the linear groove of the plurality of segments from the center portion and the peripheral portion toward the peripheral portion are formed from the center portion and the peripheral portion. The ditch starting from the middle starts from the point on the imaginary line connecting the center of the honing pad and the outer circumference, preferably from the point of the center of the honing pad toward the outer circumference of 20 to 80%, and is better located The point of its position of 40 to 60% begins. Even in this case, the linear groove from the center portion toward the peripheral portion of the plurality of strips is composed of the number of third grooves that are not in contact with the other third grooves in the central portion region and the other third grooves in the central portion region. In the configuration, the preferred configuration of the third groove from the center portion is the same as the case where the third groove of the third groove group is arbitrarily formed from the center portion toward the peripheral portion. The groove width of the third groove is preferably 0. 1~5. 0mm, better 0. 1~4. 0mm, and better 0. 2~3. 0mm. The depth of the third groove is the same as the depth of the first groove. Further, the preferred range of the surface roughness (Ra) of the inner surface of the third groove is also the same as the preferred range of the surface roughness (Ra) of the inner surface of the first groove. The plurality of third grooves of the third groove group are preferably disposed as uniformly as possible on the chemical mechanical honing pad. Hereinafter, the configuration of the groove group of the above-described chemical mechanical honing pad will be further described with reference to the drawings. In the following figure, the total number of the first groove and the second groove is about 10, but the figure is a schematic diagram. As for the number of the first groove and the second groove, it can be understood that it is preferably from the above first. The number of second grooves existing in the gap between the grooves and the adjacent two first groove gaps and the size of the honing surface are calculated. In addition, the following figure is based on the first 硏-20-200903614 grinding pad in which the first groove and the second groove are circular grooves, but the first groove and the second groove are replaced by elliptical shapes. The first honing pad of the groove or the polygonal groove and the first groove group and the second groove group of the first honing pad are replaced by two spiral grooves t and the second honing pad are also illustrated in FIGS. 3 and 4 It is also revealed and understood. Furthermore, the first honing pad of the first groove width of the first groove of the first honing pad illustrated in FIGS. 5 and 6 and the second groove width of the second groove are also disclosed. understanding. In Fig. 3, the honing surface of the honing pad 1 has a first groove group composed of five concentric grooves 2 having different diameters, and a second groove group composed of four concentric grooves 3 having different diameters. . There is one second groove on each of the two adjacent first grooves. Therefore, the honing pad of FIG. 3 is on the imaginary straight line, the intersection of the imaginary line and the first groove, and the imaginary line and the second The intersection of the grooves interacts. The second groove existing between the two adjacent first grooves is located at the center of the adjacent two first grooves. In the honing pad of FIG. 3, the second groove has a second groove width smaller than the first groove width of the first groove. In FIG. 4, the honing surface of the honing pad 1 has a diameter of 5 A first groove group formed by the concentric grooves 2 and a second groove group composed of four concentric grooves 3 having different diameters. There is one second groove on each of the two adjacent first grooves. Therefore, the honing pad of FIG. 4 is on the imaginary straight line, the intersection of the imaginary line and the first groove, and the imaginary line and the second The intersection of the grooves interacts. The second groove existing between the two adjacent first grooves is located at the center of the adjacent two first grooves. In the honing pad of Fig. 4, the second groove has a second groove width smaller than the first groove width of the first groove - 21 - 200903614. The honing pad of Fig. 4 further has a third groove group composed of 16 straight grooves 4. The four lines that exist at every 90° angle in the 6 straight grooves are connected to the center of the honing surface from the center of the honing surface. In contrast, the other 12 straight grooves are free from the center of the honing surface. A portion of the peripheral portion receding (this portion can be determined as the portion of the smallest groove in the first groove group in the center portion that is in contact with the straight groove) starts without being connected to the other third groove. Each of the six straight grooves of the honing pad of Fig. 4 reaches the outer end of the honing pad. In Fig. 5, the honing surface of the honing pad 1 has a first groove group composed of three concentric grooves 2 having different diameters, and a second groove group composed of six concentric grooves 3 having different diameters. . On average, there are two second grooves between the two adjacent first grooves. The two second grooves existing in the gap between the two adjacent first grooves are equally matched between the adjacent two first grooves. Further, there are two second grooves on the inner side of the smallest first groove in the honing surface. In the honing pad of FIG. 5, the second groove has a second groove width smaller than the first groove width of the first groove. In FIG. 6, the honing surface of the honing pad 1 has a diameter different from each other. A first groove group formed by the concentric grooves 2 and a second groove group composed of seven concentric grooves 3 having different diameters. There are three second grooves between the two adjacent first grooves. The three second grooves existing in the gap between the two adjacent first grooves are equally matched between the adjacent two first grooves. Further, there are three second grooves on the inner side of the smallest first groove in the honing surface. The first groove having the largest one has a second groove on the outer side. In the honing pad of Fig. 6, the second groove has a second groove width which is smaller than the first groove width of the first groove. -22- 200903614 The chemical mechanical honing pad of the present invention has a honing pad of a plurality of groove groups on the honing surface, but may further have a groove or a groove group or other concave portion on the non-honing surface. By having such a groove or a groove, the surface state of the surface to be honed can be further improved. As for the non-defective group shape, for example, a plurality of circular grooves having a plurality of circular grooves, a plurality of polygonal grooves having a common center of gravity, two spiral grooves, or a plurality of portions from the center portion of the sanding pad toward the outer periphery may be exemplified. The plurality of triangular lattices, the square lattices, or the hexagonal lattices may be formed as a groove shape of the non-honing surface, for example, one spiral, and the other concave shape of the non-honing surface may be exemplified by, for example, a circle surrounded by a circle. The shape, the polygonal groove, and the shape formed by the inside surrounded by the groove. The groove or group of grooves or other recesses of the non-honing surface are preferably those having an outer peripheral end. Further, a portion having a circle and an inner shape groove formed by the inside surrounded by the circle and a portion surrounded by the inner portion of the polygonal groove is preferably a central portion of the non-honing surface. The commemoration here is that the center of gravity of the concave portion is strictly the same as the center of gravity of the non-honing surface, and the center of gravity of the non-honing surface is also within the range of the concave portion. . The chemical mechanical honing pad of the present invention may also be a light transmissive region that is optically permeable from a non-honed surface. By means of the honing pad which is permeable, it is installed in a groove having an arbitrary shape group or other grinding surface, a groove above the concentric strip, or a straight groove. Groove. Further rounded or concave in the shape or shape of the polygon, "the central part of the mathematical meaning contains the honing pad to the honing surface area of the -23-200903614 mechanical honing device, The detection of the end point of the optical honing is possible. The planar shape of the light-transmitting region is not particularly limited, and the outer peripheral shape of the region may be, for example, a circular shape, an elliptical shape, a fan shape, a polygonal groove shape (square shape, rectangular shape), or the like. The position of the sexual region may be the position of the optical honing end detector position of the chemical mechanical honing device suitable for mounting and using the chemical mechanical honing pad of the present invention. The number of the light transmissive regions may be one. In the case where a plurality of light-transmitting regions are provided, the arrangement thereof is not particularly limited as long as it conforms to the positional relationship. However, the method of forming the light-transmitting region may be, for example, light transmissive. The honing pad area is formed by a translucent member, or the honing pad is made of a material having a certain degree of light transmissivity, and the non-honing surface of the honing pad is equivalent to The method of forming the concave portion in the region of the honing pad region can also ensure the light transmittance required for the detection of the honing end point by thinning the region. In the case of the latter method, the light transmissive region A character having a concave portion for improving the surface state of the surface to be honed. The chemical mechanical honing pad of the present invention can be used as a chemical mechanical honing pad as long as it has the above-described requirements. It can be composed of any material. In the function as a chemical mechanical honing pad, especially for the chemical mechanical honing aqueous dispersion (slurry) that is supplied during chemical mechanical honing, the squeegee is temporarily retained. The pores are preferably formed before the honing. Therefore, it is preferably a material having a water-insoluble particle containing a water-insoluble portion and dispersed in the water-insoluble portion, or a non-aqueous solvent -24-200903614 portion And a material (for example, a foam) dispersed in the pores in the water-insoluble portion. wherein the former material can be used in the hydrating and chemical mechanical honing aqueous dispersion by honing The aqueous medium contained in contact is dissolved or swelled away to keep the beam material in the hole formed by the detachment. On the other hand, the latter material can hold the hair material in the hole previously formed by the void. The material constituting the water-insoluble portion is not particularly limited, but an organic material is preferably used from the viewpoint of easily forming a desired shape and easily imparting desired properties such as moderate hardness or moderate elasticity. As an organic material, it can be used alone. Alternatively, for example, a thermoplastic resin, an elastomer, a rubber, a cured resin (a resin which is cured by heat, light, or the like) such as a heat-curable resin or a photo-curable resin may be used in combination. Among them, as the thermoplastic resin, for example, 1 and 2 may be mentioned. _ Polybutadiene resin, polyolefin resin, polystyrene resin, polyacrylic resin, vinyl ester resin (except for polyacrylic resin), polyester resin, polyamide resin, fluororesin, polycarbonate resin 'Poly acetal resin and the like. The above-mentioned polyolefin resin may be, for example, polyethylene or the like, and the polyacrylic resin may have, for example, a (meth)propionate-based resin or the like. The above-mentioned fluororesin may be, for example, polyvinylidene fluoride. The elastomer may, for example, be a diene elastomer, a polyolefin elastomer (τρο), a styrene elastomer, a thermoplastic elastomer, a polyoxyalkylene resin elastomer, a fluororesin elastomer or the like. The above-mentioned di-can beomer may, for example, be 1,2-polybutadiene or the like. As the above styrene-based elastomer, for example, -25 to 200903614, for example, a styrene-butadiene-styrene block copolymer (S B S ), a hydrogenated block copolymer (S EB S ) or the like can be given. The thermoplastic elastomer may, for example, be a thermoplastic polyurethane elastomer (TPU), a thermoplastic polyester elastomer (TPEE) or a polyamidamine elastomer (TPAE). As the rubber, for example, a conjugated diene rubber, a nitrile rubber, an acrylic rubber, an ethylene-α-olefin rubber, and other rubbers can be cited. Examples of the conjugated diene rubber include butadiene rubber (high cis-butadiene rubber, low cis-butadiene rubber, etc.), isoprene rubber, styrene-butadiene rubber, and styrene. Suspected-isoprene rubber and the like. The nitrile rubber is exemplified by, for example, acrylonitrile-butadiene rubber. The ethylene-α-olefin rubber may, for example, be an ethylene-propylene rubber or an ethylene-propylene-nonconjugated diene rubber. As the other rubber mentioned above, for example, butyl rubber, polyoxyethylene rubber, fluororubber or the like can be cited. Examples of the hardening resin include, for example, a urethane resin, an epoxy resin, an acrylic resin, an unsaturated polyester resin, a polyurethane-urea resin, a urea resin, a sand resin, an anthraquinone resin, and an ethylene group. Ester resin and the like. These organic materials may also be those which are denatured by an acid anhydride group, a carboxyl group, a hydroxyl group, an epoxy group, an amine group or the like. The affinity with the water-soluble particles or the slurry described later can be adjusted by denaturation. These organic materials may be used alone or in combination of two or more. Further, 'the organic material may be a partially or wholly crosslinked crosslinked polymer' or a non-crosslinked polymer. That is, the water-insoluble portion may be composed only of a cross-linked polymer, or may be a mixture of a cross-linked polymer and a non-cross-linked polymer -26-200903614, or may be composed only of a non-cross-linked polymer. . The preferred water-insoluble portion of these is composed only of a crosslinked polymer or a mixture of a crosslinked polymer and a non-crosslinked polymer. By making the water-insoluble portion constituting the honing pad contain a cross-linked polymer, the elastic restoring force of the water-insoluble portion can be imparted, and the deformation of the chemical honing pad by the stress can be suppressed at the time of honing. Degree. Further, the effect of the water-insoluble portion of the water-insoluble portion being excessively stretched during honing and polishing, or excessively fluffing on the surface of the chemical mechanical honing pad can be suppressed. Therefore, the holes can be efficiently formed during the polishing modification, and the retention of the slurry during honing can be prevented from being lowered, and the excellent honing flatness with less hair growth can be achieved. The method for carrying out the above crosslinking is not particularly limited. For example, it can be carried out by chemical crosslinking using an organic peroxide, sulfur, a sulfur compound or the like, radiation crosslinking by electron beam irradiation or the like. As the crosslinked polymer, a crosslinked rubber, a hardened resin, a crosslinked thermoplastic resin, a crosslinked elastomer, or the like in the above organic materials can be used. Among these, a strong acid or a strong base contained in most of the chemical mechanical honing aqueous dispersions is stable and softened by water absorption, and is preferably a crosslinked thermoplastic resin and/or a crosslinked elastomer. Further, among the crosslinked thermoplastic resin and the crosslinked elastomer, it is preferred to use an organic peroxide crosslinker to further crosslink the 1,2-polybutadiene. The content of the crosslinked polymer is not particularly limited, but is preferably 30% by volume or more, more preferably 50% by volume or more, and still more preferably 70% by volume or more. It is 1 〇〇 vol%. By making the content of the crosslinked polymer in the water-insoluble portion -27-200903614 portion at 30% by volume or more, the effect of containing the crosslinked polymer in the water-insoluble portion can be sufficiently exerted. In order to control the affinity with the water-soluble particles and the dispersibility of the water-soluble particles in the water-insoluble material, the water-insoluble material may contain a compatibilizing agent different from the above-described water-insoluble material. As the compatibilizing agent 'except for example, a polymer, a block copolymer or a random copolymer which is denatured by an acid anhydride group, a carboxyl group, a hydroxyl group, an epoxy group, an oxazoline group or an amine group, etc. Nonionic surfactants, coupling agents, and the like. The water-soluble particles in the former material may be particles which are separated from the non-water-soluble portion by contact with an aqueous medium contained in the aqueous dispersion of the chemical mechanical honing during chemical mechanical honing. The detachment may be caused by dissolution in contact with an aqueous medium, or may be caused by swelling of water or the like in an aqueous medium. The dissolution or swelling may be carried out by contact with an aqueous mixed medium containing an alcohol solvent such as methanol, if it is swellable by water. The material constituting the water-soluble particles is not particularly limited, and examples thereof include organic water-soluble particles and inorganic water-soluble particles. Examples of the material of the organic water-soluble particles include saccharides (polysaccharides such as starch, dextrin, and cyclodextrin; lactose; mannose, etc.), and cellulose (hydroxypropylcellulose, methylcellulose, etc.). , protein, polyvinyl alcohol, polyvinylpyrrolidone, polyacrylic acid, polyethylene oxide, water-soluble photosensitive resin, sulfonated polyisoprene, sulfonated isoprene copolymer, and the like. Further, examples of the material of the inorganic water-soluble particles include calcium acetate, calcium nitrate, calcium carbonate, hydrogen carbonate -28-200903614, calcium chloride, calcium bromide, calcium phosphate, magnesium nitrate and the like. These water-soluble particles may be used singly or in combination of two or more kinds thereof. Further, 'a water-soluble particle composed of a specific material may be used, or two or more kinds of water-soluble particles composed of different materials may be used. From the viewpoint of making the hardness of the honing pad suitable, the water-soluble particles contained in the former material are preferably solid bodies. The average particle size of the water-soluble particles is preferably 0.  1~500μιη, preferably 0. 5 to 100 μιη. The pore size formed by detaching the water-soluble particles is preferably 〇_1 to 500 μmη, more preferably 0. 5~ΙΟΟμιη. By setting the average particle diameter of the water-soluble particles to the above range, it is possible to obtain a chemical mechanical honing pad which exhibits a high honing speed and is excellent in mechanical strength. The content of the water-soluble particles when the total of the water-insoluble portion and the water-soluble particles is 100% by volume is preferably from 1 to 90% by volume, more preferably from 1 to 60% by volume, still more preferably from 1 to 40% by volume. %. By setting the content of the water-soluble particles in this range, it is possible to obtain a chemical mechanical honing pad which exhibits a high honing speed and has appropriate hardness and mechanical strength. Further, the water-soluble particles are preferably dissolved or swollen by water or the like when the surface layer in the honing pad is exposed, and are not hydrated and do not swell when inside the honing pad. To this end, the water soluble particles may be provided with a casing to control at least a portion of the moisture absorption of the outermost portion. The outer shell may be physically adsorbed on the water-soluble particles, or may be chemically bonded to the water-soluble particles, or may be attached to the water-soluble particles by the two methods. As the material for forming the outer casing, for example, an epoxy resin 'polyimine, polyamine, polyphthalate, decane coupling agent -29-200903614 and the like can be cited. In this case, the water-soluble particles may be composed of water-soluble particles having a shell and water-soluble particles having no outer shell, and the water-soluble particles having the outer shell may sufficiently achieve the above effects even if the surface thereof is not completely covered by the outer shell. On the one hand, the water-insoluble material constituting the chemical mechanical honing pad having the latter water-insoluble portion and the material containing the pores dispersed in the water-insoluble portion may be, for example, a polyurethane or a melamine. Resin, polyester, poly maple, polyvinyl acetate, and the like. The pore size dispersed in the water-insoluble portions is, on average, 〇·1~500μηι, more preferably 0. 5~ΙΟΟμιη. The chemical mechanical honing pad of the present invention may optionally contain honing particles, an oxidizing agent, an alkali metal hydroxide, an acid, a pH adjuster, a surfactant, and the like in addition to the above materials. Here, in this case, it is preferred that the honing particles and the oxidizing agent are not contained. The Shore D hardness of the chemical mechanical honing pad of the present invention is preferably 30 or more, more preferably 30 to 100, still more preferably 40 to 90, particularly preferably 40 to 7 5 . By setting the Shore D hardness, the load pressure on the object to be honed can be increased, and the honing speed can be further improved, and in addition, higher honing flatness can be obtained. The method for producing the chemical mechanical honing pad of the present invention is not particularly limited, and the method for forming the groove group on the honing surface of the chemical mechanical honing pad is not particularly limited. For example, a composition for a chemical mechanical honing pad which is prepared as a subsequent chemical mechanical honing pad is prepared in advance, and after the composition is formed into a desired contour, a groove group can be formed by cutting. Alternatively, the chemical mechanical honing pad composition can be formed into a mold by using a mold having a protrusion corresponding to the shape of the groove group formed by the shape of the groove -30-200903614, and the contour and groove of the chemical mechanical honing pad can be simultaneously formed. group. After forming the profile of the pad having one of the desired groups of grooves using a mold having a projection that conforms to a portion of the groove group, the remainder of the groove group can be formed by cutting. In the case of the chemical mechanical honing pad of the present invention, in the case where the non-honed surface has grooves or grooves or other recesses, the grooves or groups of grooves or other recesses may be formed in the same manner as described above. The method of obtaining the chemical mechanical honing pad is not particularly limited. For example, it can be obtained by kneading a necessary material such as a specific organic material by a kneading machine or the like. As a kneading machine, a conventional kneading machine can be used. For example, a kneader such as a roll, a kneader, a Banbury kneader, or an extruder (single-axis, multi-axis) may be mentioned. Further, a chemical mechanical honing pad composition containing water-soluble particles for obtaining a chemical mechanical honing pad containing water-soluble particles, for example, can be obtained by kneading a water-insoluble portion and water-soluble particles and any other additives. . It is better to heat and knead as easily as it is processed during kneading. The water-soluble particles are preferably solid at the temperature at the time of kneading. By using water-soluble particles which have been previously classified into the above-mentioned preferred average particle size range, by mixing the water-soluble particles as a solid, the water-soluble particles can be made water-soluble regardless of the degree of compatibility with the water-insoluble particles. The particles are dispersed in the above preferred average particle diameter. Therefore, it is preferred to select the type of water-soluble particles depending on the processing temperature of the water-insoluble portion to be used. The chemical mechanical honing pad of the present invention may also be a multilayer honing pad provided with a support layer on the non-honing surface of the above-mentioned honing pad -31 - 200903614. The support layer is a layer that supports the chemical mechanical honing pad on the back side of the honing surface. The characteristics of the support layer are not particularly limited, and it is preferably softer than the body of the honing pad. By providing a softer support layer, even if the thickness of the honing pad body is thinned, the honing pad body can be floated during honing to prevent the surface of the honing layer from being bent, etc., and the honing can be performed. The hardness of the support layer is expressed by Shore D hardness, preferably 90% of the Shore D hardness of the lining pad body, more preferably 50 to 90%, particularly preferably 50 to 80%, of which 50 to 70% The % 〇 support layer may be either a porous body (foam) or a non-porous body. Further, the planar shape may be, for example, a circular shape or a polygonal groove, but it is preferably a planar shape having the same planar shape as the honing pad and having the same size. The thickness thereof is not particularly limited, and is preferably 0. 1~5mm, better for 〇.  5 to 2 m m 材料 The material constituting the support layer is not particularly limited, and an organic material is preferably used from the viewpoint of easily forming a specific shape and properties, imparting appropriate elasticity, and the like. As the organic material, an organic material exemplified as a material constituting the water-insoluble portion of the chemical mechanical honing pad of the present invention can be used. The chemical mechanical honing method of the present invention is characterized by chemical mechanical honing of the surface to be honed using the chemical mechanical honing pad of the present invention as described above. The chemical mechanical honing method of the present invention is carried out by a conventional method, except that the chemical mechanical honing pad of the present invention is applied to a commercially available chemical honing device. The material constituting the honed surface may be a material composed of a wiring material of the metal type - 32-200903614, a barrier metal and an insulator, and a combination thereof. The metal of the wiring material may, for example, be tungsten, aluminum, copper or an alloy containing at least one of these. Examples of the barrier metal include titanium, titanium nitride, tantalum, tantalum nitride, and the like. Examples of the insulator include, for example, SiO 2 , a small amount of boron and a borophosphonate (bpsg) added to Si 2 , and a fluorine doped with SiO 2 (referred to as fluorine-doped silicate glass). Insulators, and low-conductivity yttria-based insulators. As for the SiO 2 , for example, a thermal oxide film, PETEOS (plasma enhanced - TEOS), HDP (high density plasma enhanced - TEOS), SiO 2 prepared by thermal CVD, and the like can be cited. As for the chemical mechanical honing method to which the present invention is applied, the honed surface is preferably a honed surface composed of an insulator, a honed surface composed of an insulator and copper or a copper-containing alloy, an insulator and copper or copper. The honed surface of the alloy and the barrier metal. The chemical mechanical honing pad and the chemical mechanical honing method of the present invention will be clarified by the following examples, and even if the flow rate of the aqueous dispersion for chemical mechanical polishing is small, the honing speed is excellent and the surface is honed. The uniformity of the honing amount is also excellent. The mechanism for the development of these excellent properties is unclear 'but it is speculated that by using the specific groove design as described above, when performing chemical mechanical honing, it can simultaneously ensure the effective supply of water to the interface between the honing surface and the surface to be honed. The dispersion and the area of contact between the honing surface and the surface to be honed. Example-33-200903614 Example 1 (Manufacture of η chemical mechanical honing pad (1-1) Manufacture of honing pad profile 70 parts by volume of 1,2-polybutadiene (made of JSR) Name "JSR RB810") and 30 parts by volume of /3-cyclodextrin (manufactured by Saline Port Refined Sugar (trade name), trade name "Dicks Barre no-100" 'average particle size 20μηι), at 160 °C Under the L udar kneading. Subsequently, relative to 1 〇〇 parts by mass of 1,2-polybutadiene added to 0. 32 parts by mass (converted to pure dicumyl peroxide equivalent to 0. 128 parts by mass of PERCUMYL D40 (trade name: manufactured by Nippon Oil & Fats Co., Ltd., containing 40% by mass of dicumyl peroxide), and further kneaded at 1200 ° C to become small particles. The small particles were heated and crosslinked in a mold at 180 ° C for 1 minute to obtain a diameter of 840 mm and a thickness of 3. 0 mm shaped body. Then, by smashing the two sides of the formed body with sandpaper, each side is removed by 0. 1mm and the thickness is adjusted to 2. 8mm, the contour of the honing pad is obtained. (1-2) Formation of groove A profile of the honing pad was attached to a machine of a commercially available cutting machine to form a groove width 1 on one side (honing surface) of the formed body. 5mm, groove spacing 3. 0mm, groove depth 1 .  A concentric circular groove having a cross-sectional shape of 4 mm is used as the first groove group. Next, the groove width is formed such that each of the second groove positions is adjacent to the center of the two first grooves in the first groove of the first groove group. 5 mm, groove depth 1. A chemical mechanical honing pad was fabricated as a second groove group of 4 mm and a concentric circular groove having a rectangular cross section. In the groove of the first groove group formed here, the radius of the smallest circular -34-200903614 groove is, the radius of the largest circular groove is 505 mm, and the radius of the smallest circular groove of the groove of the second groove group is 12 mm. 'The radius of the largest circular groove is 5 0 7 mm ° The surface roughness of the inner surface of the first groove group and the second groove group is measured by "1LM21P" manufactured by Laser Tech Co., Ltd., both of which are about 7. 0μηι. (2) Evaluation of chemical mechanical honing pad (2-1) Patterning Ρ Τ Τ Ε 0 S film chemical mechanical honing test The chemical mechanical honing pad manufactured above was installed in the honing device ^ Mirra/Mesa" On the platen of the product name, manufactured by Applied Material, the wafer with the patterned PETEOS film was polished under the following conditions (a PETEOS film with a film thickness of 100 Å on the 8 吋矽 wafer) Tetraethyl phthalate (TEOS) is used as a raw material, and a plasma is used as a SiO 2 film in which a plasma is grown in a chemical vapor phase. Platen speed: 90 rpm Honing pad speed: 85 rpm Honing pressure: 2 psi Honing mechanical honing water-based dispersion: JSR (stock) "CMS 840 1", "CMS 8452" and ion-exchanged water in mass ratio 1 : 2 : 3 Mixer. Honing mechanical honing water-based dispersion supply speed: 100 ml / min honing time: 1 minute, the chemical mechanical honing aqueous dispersion used in this embodiment -35- 200903614 The flow rate is the honing device used About half of the standard flow. (2-2) Evaluation of the honing speed of the patterned PETE OS film The honed honed material is applied to each of the 8 吋 wafers with the PETEOS film, and is equally divided into 4 9 in the diameter direction except for the outer circumference of 3 mm. The point is determined as a specific point at which the honing speed of each point is calculated from the difference in thickness of the PETEOS film before and after honing and the honing time. The average of the honing speeds of these 49 points was evaluated as the result of the honing speed, which was 47. 3 nm / min. Further, the thickness of the PETEOS film at each point was measured by an optical film thickness meter. (2-3) In-plane uniformity of the honing amount of the patterned PETEOS film. The thickness difference of the PETEOS film before and after honing using the above 49 points (this nickname "honing amount") is calculated by the following formula Calculate the in-plane uniformity of the amount of honing. The in-plane uniformity of the honing amount (%) = (the standard deviation of the honing amount + the average enthalpy of the honing amount) X 1 0 0 The in-plane uniformity of the honing amount is 9. 8 %. -36- 200903614 (2-4) Scratch evaluation of patterned PETEOS film Defect inspection was performed on each chemical mechanically honed PETEOS film using a defect inspection device (manufactured by KLA-TENCOR Corporation, "KLA23 5 1"). First, 'in the full range of the wafer surface after honing' in pixel size 0. The number of defects calculated by the defect inspection device is measured under conditions of 62 μm and threshold 30. Then, randomly extracting 100 such defects are sequentially displayed and observed on the display of the device, and clarifying that the defect is scratched or attached to foreign matter (chemical mechanical honing of the abrasive particles contained in the aqueous dispersion) ), calculate the length of 100 defects in 0. The proportion of scratches above 20 microns is multiplied by the total number of defects calculated by the defect inspection device to calculate the number of scratches on all surfaces of each wafer. As a result, the number of scratches was 24 5 /surface. Examples 2 - 8 The honing pad profile was produced in the same manner as in the above-described Example 1. The honing pad profile is mounted on a machine of a commercially available cutting machine, and the first groove group and the second groove group formed as shown in Table 1 are respectively formed on one side (the honing surface) of the formed body. (The cross-sectional shapes are each rectangular), and each chemical mechanical honing pad is manufactured. Further, in each of the embodiments, the second groove of the second groove group is formed such that each of the second grooves is located in the center of the two adjacent first grooves in the first groove of each of the first groove groups. Further, in the seventh embodiment, in addition to the first groove group and the second groove group, eight radial straight grooves having the groove depth and the groove width described in Table 1 are further formed by a commercially available cutting machine (the cross section) -37- 200903614 The third groove group formed by the rectangular shape. The two grooves of the radial groove are formed at an angle of 45 degrees, and the grooves are connected to each other at the center of the honing surface at an angle of 90 degrees. The remaining four grooves are from the center to the outer circumference and retreat from the position of 1 5 111 111. . Chemical mechanical honing and evaluation of the PETEOS film similar to that of Example 1 was carried out using these chemical mechanical honing pads. In the result. Example 9 (1) Manufacture of chemical mechanical honing pad (1-1) Manufacture of honing pad profile 58 parts by mass of 4,4'-diphenylmethane diisocyanate urethane (manufactured) In the product name "Sumi Joule 44 S reactor, add 5. at 60 °C.  1 part by mass of polybutanediol having an average molecular weight of 650 having two hydroxyl groups (manufactured by the company, product name "PTMG65 0") and 17. 3 parts by mass of a polybutanediol (manufactured by Mitsubishi Chemical Corporation, PTMG25 0) having a mass of 250 was kept at 90 ° C for 2 hours while stirring, and after cooling, a terminal isocyanate-based prepolymer was obtained. The terminal ester-based prepolymer contains 21% by mass of unreacted 4,4'-diphenyl formate, and the remaining 79% by mass of isocyanate-based prepolymer 〇 80. 4 parts by mass of the above-mentioned prepared terminal isocyanate group pre-adjacent to the four honing surfaces are shown in Table 1. Ling Chemical: Average product name "The reaction isocyanate diisocyanate mixture is placed in -38- 200903614 in a stirred vessel to maintain the temperature at 90. (:, while stirring at 200 rpm, add 14. 5 parts by mass of /3-cyclodextrin (trade name "Dicks Barre - 1 0 0" made by brine port (sweet)), dispersed and dispersed after 1 hour, and bubbles are removed by decompression. A terminal isocyanate prepolymer of water soluble particles. Further, '1,4-bis(hydroxyethoxy)benzene (manufactured by Mitsui Chemical Fine Co., Ltd., trade name "BHEB") having 2 hydroxy groups at the end of 12-6 parts by mass in a stirred vessel at 12 °t After heating for 2 hours, 7 parts by mass of trimethylolpropane (manufactured by BASF Japan Co., Ltd., trade name "TMP") having 3 hydroxyl groups was added thereto with stirring, and a mixture of chain extenders was obtained by mixing and dissolving in 10 minutes. . 94. 9 parts by mass of the above-mentioned terminal isocyanate prepolymer having the water-soluble particles dispersed therein was heated and stirred at 90 ° C in an AJITER (AJITER, registered trademark, Shimadzu Corporation) mixer while being added thereto. The above-mentioned chain extender obtained by heating at 120 ° C. 6 parts by mass, mixed for 1 minute, to obtain a raw material mixture. Use with a diameter of 5 08mm and a thickness of 2. The mold of the 8 mm disc-shaped hole was filled with the above-mentioned raw material mixture in an amount sufficient to fill the void, and subjected to a polyurethane hydrolysis reaction at 110 ° C for 30 minutes to release the mold. Then, post-hardening was carried out in a gear oven (g e a r 〇 v e η ) at 110 ° C for 16 hours to obtain a diameter of 5 0 8 mm and a thickness of 2. 8 mm of a polyurethane sheet having water-soluble particles dispersed therein. The volume fraction of the water-soluble particles, that is, the volume fraction of the water-soluble particles relative to the total volume of the polyurethane substrate and the water-soluble particles -39 to 200903614, is 1% by mole relative to the entire sheet. (1 - 2 ) Formation of the groove The profile of the honing pad manufactured as described above is mounted on a machine table of a commercially available cutting machine, on the one side (honored surface) of the formed body, at the center of the honing surface A first groove group and a second groove group (each having a rectangular shape) formed as shown in Table 1 were formed on all the honing surfaces except for 30 mm, and a chemical mechanical honing pad was produced. Further, in the present embodiment, the second groove of the second groove group is formed so that each of the second groove positions is adjacent to the center of the two first grooves in the first groove of the first groove group. (2) Evaluation of chemical mechanical honing pad Chemical mechanical honing of the patterned PETEOS film was carried out in the same manner as in Example 1 using the chemical mechanical honing pad manufactured as described above, and the results are shown in Table 1. Examples 10 to 17 The honing pad profiles were separately produced in the same manner as in the above Example 1. The honing pad profile is mounted on a machine of a commercially available cutting machine, and the first groove group and the second groove group formed as shown in Table 1 are respectively formed on one side (the honing surface) of the formed body. (Each cross-sectional shape is rectangular), and each chemical mechanical honing pad is manufactured. In each of the embodiments, the second groove group is formed by equally arranging each of the two second grooves in the first groove adjacent to the first groove of each first groove group. Second ditch. Further, in the fourth embodiment, in addition to the groove group and the second groove group, the third groove formed by the commercially available cutting machine having the groove depth described in Table 1 and the eight radial cross-sectional shapes of the groove width is rectangular) group. The two grooves of the radiation are formed at an angle of 45°, and the center of the honing surface is connected to each other at an angle of 90°, and the other four grooves are separated from the outer periphery by a distance of 15 m. The chemical mechanical honing of the PETEOS film of the same manner as in Example 1 was carried out using these chemical mechanical honing pads, and evaluated. EMBODIMENT EXAMPLES 1 and 9 9 respectively, the honing pad wheel fan is manufactured in the same manner as in the above-described first embodiment, and the honing pad profile is mounted on a commercially available cutting machine by one side (honing surface) of the formed body. The first groove group and the second groove group of Table 1 are formed (each of the cross-sectional shapes is a rectangular chemical mechanical honing pad. Further, in each of the embodiments, the first grooves are adjacent to each other in the first groove. Each of the three strips forms a second groove of the second groove group. Further, in addition to the group of the first embodiment and the second group of grooves, the groove depth and the groove width described in Table 1 are obtained by a commercially available cutting machine. The third groove group formed by the eight radial straight lines in a rectangular shape. The radial groove group groove is formed at an angle of 45°, and among the four of the 90° angles, the first one is formed by a straight groove (the four grooved honing surfaces in the vicinity of the groove group) The figures in Figure 1 are listed on the machine table of Table 1, and the side of the first and second grooves of each group of grooves are formed, and the groove is formed by the groove (the section adjacent thereto is 2) The groove is connected to the center of the honing surface -41 - 200903614, and the other four grooves are started from the center of the honing surface by 15 mm from the center of the honing surface. Using these chemical mechanical honing pads, the patterns are carried out in the same manner as in the first embodiment. The chemical mechanical honing of the PETEOS film was evaluated and the results are shown in Table 1. Comparative Examples 1 and 2 The honing pad profile was separately produced in the same manner as in the above Example 1. The honing pad profile was mounted on a commercially available cutting. The machine table of the processing machine manufactures each chemical mechanical honing pad by forming a first groove group (the cross-sectional shape of which is rectangular) in Table 1 on one side (honing surface) of the formed body. In the comparative example, the second groove group is not formed. Using these chemical mechanical honing 'The same as in Example 1. The chemical mechanical patterned PETEOS film of mill WH, and the evaluation results are shown in Table 1 billion -42- 200903614 I-left Example 8 billion thousand and strict η Ο 1 * Ο ο 1- < g in Ο ^―« 00 1—Η d 14.41 502.41 〇 1 1 1 1 00 m Ό <N VO m Example 7 < 1 〇ο » _ κ ο ο S iT) ο Ι> rn ο 12.85 507.85 〇ο 00 (N Ό m OL embodiment 〇χ -ί- ΙΟ ο ο ο Τ' « ο inch · Η Ο 1 12.415 1 507.415 〇1 1 1 1 00 »—Η in ν〇OO m oo <N Example 5 inch · ψ 1 ο ο > Η ο ο s ο 寸 · inch · ο 00 oi Η 504.8 1 1 〇 1 1 1 1 in Os υ"ΐ OO Example 4 inch · w 1 ο ο ο ο ί-Η s ο ΠΊ Ο 12.85 507.85 〇1 1 1 1 o oo 00 in s CN Example 3 inch·κη cn ο — < ο ο S ο ... inch · 守 ο 12.05 506.05 « < 〇1 1 1 1 to m vo inch embodiment 2 inch · ο r~! ο ο ο κη ο 卜 · inch · 1 κη Ο 11.75 506.75 1 1 ο 1 I 1 ! inch r4 ur» ON \ό CM (N Example 1 inch · 1 ^ Ο ο ο s ο 寸 · Ο ο CN 1 < οο kn ο 1 1 1 1 OO 〇\ vn groove depth (mm) spacing (mm) groove width (mm) minimum first groove radius (mm) maximum first _ radius (mm) Surface roughness (Am) Ditch depth (mm) Groove width (mm) Minimum second groove radius (mm) Maximum second groove radius (mm) Adjacent to the second groove between the two first grooves Surface roughness (//m) Ditch depth (mm) Groove width (mm) Number of third grooves connected to other third grooves Number of honing speed (nm/min) In-plane uniformity of honing amount ( %) Number of scratches (pieces/wafer) 1Indiscriminately « Third ditch group-43- 200903614 Example 16 t— < 〇 (N ο ο r Η Ο 〆 ·—(N 〇 rn 1 < 507.3 <Ν 〇 1 ! 1 1 1—^ \〇 <N m (N m Example 15 inch · 〇 〇 r—« inch Ο Ο ο ο ιη Ο inch · (N 〇 in rn »- < 503.5 (Ν 〇 1 1 1 1 inch $ cn CM ΠΊ Γ^Ί L Example 14 P' 1 〇 r—l ο ο ιη ο 寸 o (N m 506.7 ΓνΙ 〇 T—^ ID Ο 00 inch 00 <> in 卜 iri m CN Example 13 —t 〇 od 〇 1—H ο ο g κη ο ^t w < d 13.28 505.28 <Ν ο 1 1 1 1 η 00 Os m Example 12 ο 卜 ^ \q ο ο ϊ —1 ο Γ· * rr o <N m w 1 506.7 1 CN ο 1 1 1 1 inch 〇6 m m ^sO CN Example 11 〇 p |. a ρ ο —— s IT) ο 卜: rr I-1 o 12.42 507.42 <Ν ο 1 1 1 1 r- κή κη Bu (N 〇 Ο <N ρ CN ο 寸 · s S ο I 1 1 | Ι> 卜 m 习 (N in d CO 1 H υο Κ <N OS inch ο 〇 ο KD ρ inch ro κη 00 00 ρ 1 l 1 1 卜 cn 00 series U 1 _ ο 1—^ κη ΧΓί 1 — I""·* o <N *—« δ l/Ί 1/Ί 1 -Η 1 1 1 1 Although 11 杂 111 5. City Β ε fe <" ε ε system N a m 靼 m m § 1 m <R |ii| Noisy 1θ 雔赃1 Obstruction e m5 1 1 11 1 1 City 嗽 11] c: 陌 V 濉 ν ' 'g_ V 濉濉 V V V ki Μ Μ Μ ε ε Μ Μ Μ Μ ε _^ε Μ •N (Ν ε , s. 蹯 _ , 3⁄4 ml DU 4 < 胆 I κ 锻 is 赋 Μ 变 » » » » » » » » » » » » » » » » » » » » » » » » 藏 藏 藏 藏 藏 藏 藏 藏 藏 藏 藏 藏 藏 藏 藏 藏 藏 藏 藏 藏 藏 藏 藏 藏 藏 藏 藏 藏 藏 藏 藏 藏 藏 藏

-45-200903614 BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic view showing an example of the relationship between the first groove and the eleventh groove of the chemical mechanical honing pad of the present invention. Fig. 2 is a schematic view showing an example of the relationship between the first groove and the second groove of the chemical mechanical honing pad of the present invention. Fig. 3 is a schematic view showing an example of the embodiment of the chemical mechanical honing pad of the present invention. Fig. 4 is a schematic view showing an example of the embodiment of the chemical mechanical honing pad of the present invention. Fig. 5 is a schematic view showing an example of the embodiment of the chemical mechanical honing pad of the present invention. Fig. 6 is a schematic view showing an example of the embodiment of the chemical mechanical honing pad of the present invention. [Main component symbol description] 1 : 硏 塾 2 : Concentric circular groove 3 : Concentric circular groove 4 : Straight groove -46 -

Claims (1)

200903614 X. Patent Application No. 1 · A chemical mechanical honing pad having a honing surface and a non-honing surface as a back surface thereof, characterized in that the honing surface has at least 2 each composed of a plurality of grooves The group of trenches is composed of the following groups: (1) a first group of grooves formed by a plurality of first grooves intersecting with an imaginary straight line from the center of the honing surface toward the peripheral portion, The plurality of first grooves do not intersect each other and have a first groove width, and (2) a second groove formed by a plurality of second grooves intersecting an imaginary straight line from a center of the honing surface toward a peripheral portion The plurality of second grooves do not intersect each other, the second grooves and the first grooves do not intersect each other, and have a second groove width different from the first groove width, and on the honing surface One or a plurality of the second grooves are respectively present in the gaps of the two first grooves adjacent to each other. 2. The chemical mechanical honing pad of claim 1, wherein the second groove of the second groove group is present in a gap between the two first grooves adjacent to each other on the honing surface. 3. The chemical mechanical honing pad according to claim 2, wherein the first groove width is 55~2.0 mm' and the second groove width is 0.2~0.5 mm 〇4. The chemical mechanical honing pad of the item, wherein the second groove of the second groove group has a plurality of strips in the gap between the two first grooves adjacent to each other on the honing surface. 5. The chemical mechanical honing tool of claim 4, wherein the second groove width of the second groove is less than the first groove width of the first groove. 6. The chemical mechanical honing pad of claim 5, wherein the first groove width is 0.6 to 2. mm, and the second groove width is 0.2 to 0 mm 5 〇 7. If the patent application is the fourth item The chemical mechanical honing pad, wherein the second groove width of the second groove is greater than the first groove width of the first groove. 8. The chemical mechanical honing pad of claim 7, wherein the first groove width is 0.2 to 0.5 mm, and the second groove width is 66 to 2.0 mm. 9. A chemical mechanical honing pad And having a honing surface and a non-honing surface as a back surface thereof, wherein the honing surface has at least one first groove and one second groove, and (1) the first groove is self-grinding surface The center of the spiral is gradually enlarged toward the peripheral portion and has a first groove width, and (2) the second groove is spirally enlarged from the center of the honing surface toward the peripheral portion, and the second groove The groove and the first groove do not intersect each other and have a second groove width different from the first groove width. 1 〇 · The chemical mechanical honing pad of claim 9 wherein the first groove width is 0.5 to 2. mm, and the second groove width is 0 2 to 0.5 mm 〇 1 1 · a chemical machine A honing method characterized by chemical mechanical honing of a honed body using a chemical mechanical honing pad as claimed in any one of claims 1 to 10. -48-