TW200903184A - Optical correction element and method for the correction of temperature-induced imaging aberrations in optical systems, projection objective and projection exposure apparatus for semiconductor lithography - Google Patents

Abstract

The invention relates to a method for the correction of temperature-induced imaging aberrations of an optical system. In this case, the correction is effected using a liquid layer (24) arranged in the optical system in such a way that the imaging aberrations are compensated for by an inhomogeneous temperature distribution being formed in the liquid layer (24) through absorption of optical useful radiation. Furthermore, the invention relates to an optical correction element (21) for application in said method, and to a projection objective (7) and a projection exposure apparatus (1) having the optical correction element (21) according to the invention.

Description

200903184 IX. INSTRUCTIONS OF THE INVENTION: TECHNICAL FIELD The present invention relates to an optical correction element for an optical system, a method for correcting temperature-induced imaging aberrations in an optical system, and a semiconductor for use in semiconductors A lithographic projection exposure apparatus' and the optical correction element and section method are used in the projection exposure apparatus. x [Prior Art] Fig. 1 illustrates a prior art projection exposure apparatus 1 for semiconductor photolithography. This device is used to expose a structure on a substrate coated with a photosensitive material (which is generally composed mainly of tantalum and is referred to as wafer 2) to fabricate a semiconductor component such as a computer chip with σ. In this case, the projection exposure apparatus i essentially comprises: a illuminating device 3. a device 4 for accommodating and accurately locating a structured mask; a so-called main reticle 5 for determining the structure after the wafer 2; For accurately mounting, moving, and accurately positioning the wafer 2; the imaging device (i.e., the projection objective 7) has a plurality of mountings mounted in the objective lens housing 10 of the projection objective 7 by the bracket 9. Optical element 8. In this case, the basic functional principle will be introduced into the main mask 5 in white, knot, and imaged on the wafer 2; this imaging operation is usually performed in a reduced manner. After the step = light two f has been completed, the wafer 2 will be In the direction of the arrow - the individual fields are exposed to the same wafer 2 by a plurality of strong fields having the structure specified by the main mask 5 from the gate. Since the wafer 2 is gradually moved forward in the projection exposure device 1, # is called a stepper. "4 first device 1 is also often 97112516 200903184 ... month device 3 provides a projection beam 11 (for example, light or similar electromagnetic light), which is required to image the main mask 5 onto the wafer 2. Laser or Eight analogs can be used as a source of light for this purpose. The light system is in the illumination device 3 by means of optical elements such that the projection beam is incident on the main mask 5 with a diameter By means of the beam 11, the image of the main mask 5 is generated and transferred from the objective lens 7 to the wafer 2 in a correspondingly reduced manner. As already explained above, the projection objective 7 has a plurality of individual refractive, diffractive, and/or reflective optical elements such as lenses, mirrors, cymbals, terminating plates, and the like. The optical element 8, which is, for example, a lens and is disposed in the projection exposure apparatus, generates heat during the lithography process, causing image aberrations thereof, which may make imaging of the desired structure more difficult or even impossible. Fever Caused by absorption of useful radiation of a particular wavelength for exposure within the lens material and layer material (eg, within the anti-reflective layer), in order to be able to heat up despite the optical element 8 being used. It is also possible to achieve imaging of the desired structure with the required precision, typically by correction of a manipulator such as a steering lens. The lenses can be displaced, tilted, or otherwise deformed, for example. The change 'causes a correction effect due to the altered position of the lenses within the optical design of the projection objective, or the modified lens geometry. The correction effect is due to the altered refractive index within the lens. The finalizer is also known. ' 97112516 7 200903184 However, only the aberrations of the shirt can be corrected by active correction. The wavefront aberration can be described by a function of the I-direction and the azimuth polynomial. It is usually difficult to correct. It is usually only possible to establish mechanical deformation for lower order aberrations, so that it is impossible to correct the magic of the wave magic. The wavefront aberration is Reference is made to the phase deviation from the spherical surface of the mind, which is ideally concentrated in the desired mode for solving the problem, as described in the International Patent Application No. WO 2006/053751 A2. This document describes various methods, inter alia, for correcting the above-described thermally induced image aberrations. SUMMARY OF THE INVENTION The object of the present invention is to provide a method and apparatus by which optical systems, in particular semiconductors, are used. The thermally induced imaging aberration in the lithographic projection objective can be corrected quickly, simply and effectively. This object is achieved by the method described in claim 1 and also by the patentable scope & The device of the feature U proposed in the items 33 and 37 is achieved. The accessory item is an improved method of the present invention or a method for correcting the temperature imaging aberration of the optical system of the present invention, which is configured by using the optical system The liquid layer in the middle to achieve the above correction. In contrast to the method known from the prior art, the compensation for imaging aberrations is based on the absorption of optically useful light radiation and the non-uniform temperature in the liquid layer. In this case, an optically useful light shot is understood to be an optical light shot through a 7" piece associated with the optical system when the ::: system is used as intended. By way of example, the optically useful radiation of the projection objective of the 97112516 200903184 semiconductor lithography is the ultraviolet radiation used to image the structure of the main reticle onto the wafer. Since the optically useful radiation itself is used for correction, self-compensation of temperature-induced imaging aberrations of the optical system can be achieved in a simple and effective manner. It is assumed that the intensity distribution of the optically useful radiation used in the liquid layer corresponds to the intensity distribution in the remaining optical elements of the majority of the system, and that the temperature distribution produced by the absorption in the liquid layer therefore substantially corresponds The intensity distribution of the optically useful radiation; the following assumptions can be made: in the region where the temperature-induced imaging aberration is the largest, the correction effect of the liquid layer is also the largest. The liquid, layer, and correction effects are essentially based on the fact that the refractive index also varies locally due to the /JDL degree in the liquid layer. This change in refractive index causes local variations in the wave theory of incident light radiation, and can accurately compensate for the ideal wavefront temptation in the case of proper selection of the characteristics of the liquid layer.

Ci In this case, the liquid layer can extend laterally substantially perpendicular to the optical axis of the system, and can in particular be formed as a liquid planar parallel plate. In an alternative embodiment of the invention, the liquid layer can be formed as a liquid lens having at least one curved surface. / The thickness of the plane parallel plate, or the geometrical parameters of the liquid lens, can be guaranteed during the optical operation, because the compensation for the imaging county is not the change of the shape; but as described above, the This is achieved by a change in the refractive index distribution in the liquid. In other words, for example, two plane parallel plates used as delimiting elements are arranged in a fixed manner with respect to each other 97112516 200903184. In particular, water has proven to be of value as a liquid for forming the liquid layer of the present invention. At a wavelength of 193 nm, water has a large refractive index negative temperature coefficient dn/dT of about _(10). This amount is about five times that of quartz, but it shows the opposite sign. The aforementioned difference in material constants can thus be advantageously used to compensate for imaging aberrations in the optical system. Since the absorption of the electromagnetic wave of the aforementioned wavelength in the water is more than an order of magnitude larger than that of the quartz, local heating in the water will also be rapidly achieved. As an alternative to the use of water, other liquids are also suitable, and therefore, for example, the candidate for defects is a so-called high refractive index (four). It is worth mentioning that it includes: cyclohexene (which has a refractive index of 193_ rhyme (close to the refractive index of the British glass)), or decahydronaphthalene (which has a near refractive index). In an advantageous variant of the invention, the optical properties of the liquid layer can be set within a certain range. In this way, absorption fluctuations in the optical element, such as a lens or layer, can be compensated for, which can adversely affect the age of the liquid layer. An advantageous possibility for such a setting is to modify the absorption characteristics of the liquid layer by adding a salt such as sodium carbonate, calcium chloride, or potassium iodide (all of which have very good solubility in water). Generally, the absorption effect will increase with the concentration of the salt, so that it is always advantageous to start from a certain initial concentration and change the absorption of the liquid layer during the calibration step of the system until the self-compensation is optimally set. : A liquid layer that becomes a liquid planar parallel plate, in particular can be arranged between two substantially planar parallel plates, the two plates containing quartz glass or 97112516 200903184 containing the materials mentioned. The two substances mentioned are conventional == well controlled materials which are widely used in optical systems' and their characteristics are well known. For a thousand parallel plates with right I # and two substantially flat =: the condition of the broken glass 'If the thickness of the liquid layer is greater than the thickness of the plate between 0.2 and 1.0 ^ soil " Yu 〇.25 and 〇. This situation is advantageous between 75, particularly preferably between 0.3 and 0.5. ::: The parallel plate contains CaF2, and the ratio of the thickness of the liquid layer to the total thickness of the two substantially flat: parallel plates is between o.m.o, preferably, this condition is advantageous for μ. In the case of .5 illusion, the total thickness of the two substantially parallel plane plates may be particularly between 1. 5 mm disk] 5 mm + 0 day, ... > It is advantageous to reduce or prevent the convection of the VL+.^A/night body in the liquid layer within the range between the job, preferably in order to improve or ensure the functionality of the optical correction element according to the invention. The effect of the convective phenomenon on the temperature difference of the lateral extent of the liquid layer with a thousand A, dreams of == two in order to reduce the adverse effects described, the additional two " is disposed in the liquid layer. In this case, the aforementioned additional elements are particularly a part of the space, and the space is in the form of a 10,000 or (iv) liquid layer. f is closed to each other, and subdivided in an advantageous variant of the invention, the refractive index of the material around the liquid in the cold state: the sheep is tuned to a thousand hunters which is achieved by the additional 97112516 200903184 cold state There is an optical appearance, and in another embodiment of the invention, there is an additional temperature regulating element for modifying the temperature distribution in the liquid layer. In this way, the liquid layer is heated in a targeted and spatially localized manner for the purpose of fine adjustment, f for enhanced flexibility. This can be done in a manner suitable for the respective conditions of use during operation of the optical correction element. In this case, electrical heating is achieved via the electrical resistance of the thin wire as the resistive heating element, especially n and only has a mussel value, and the resistive heating elements are arranged in a grid form or an alternative geometric arrangement. On the inside of the surface of the delimiting element adjacent to the liquid layer. The difference in the number of visible conductors can thus establish different spatial resolutions of the temperature distribution that can be set. One is about the possibility of heating (four) generation for training infrared _. In this case, the following should be considered to be such that 'water is only transparent in the relatively narrow spectral range for optical applications, and water is highly absorptive in the spectral range close to "m". The radiation is optimally coupled into the water and the surrounding material should not be overabsorbed at the wavelengths considered. In this case, a plurality of optical systems (four) can be laterally disposed by the correction element. In addition, it is conceivable to use a direct shank of an optical waveguide such as light or ray. The above method and the optical correction element described similarly can be particularly advantageously applied to semiconductor lithography. In the case of a projection exposure apparatus, in this case, an advantageous choice of the position of the correction element of the present invention in the projection exposure apparatus is to arrange the optical correction element at a distance from the pupil plane phase 97112516 12 200903184, and the distance corresponds to Subaperture ratio greater than 〇7 ° For an optical field on a target field that images the target field with the largest target height at a given aperture The subaperture is 〃 IR-H|/(|RH|+|H|), where 'from the target point of a maximum target height, R is the edge ray height, and H is the main light (., Such as Ύ 琛 , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , The value is 0 in the pupil plane of the mother of the light system and 0 in each field plane of the optical system. The definition is (4) is made in the semiconductor light-receiving projector device, because 2 'view The difference between the projection optics is that these projection optics are corrected for the second and maximum apertures of the second standard. As a result, the maximum target J2 and aperture are naturally assigned to projection optics II such as optical systems. Usually, the projection exposure is promoted, and the cause of the aberration is 'from the so-called ^ which can be most effectively corrected in the pupil area. The area of the hole plane is the funeral氺 and you T:- From the work ugly image aberration correction is particularly advantageous 2 ^ first corrected 70 pieces and executed Aiming at the position of (1) a hundred spears J, because the pupil type plane is replaced by the same type of modification of the image of each position of the pair of image planes. "贞外地, for example, another correction element of the present invention, w Field plane is configured 'or configured in the middle of the 97112516 13 200903184 between the field plane and the pupil plane to achieve additional correction effects. The method and the correcting potential of the optical component of the present invention are particularly useful in: In a projection exposure apparatus for an illumination device that produces dipole illumination, it is assumed that the intensity of the absorbed light in the optical element of the projection exposure apparatus is particularly non-uniformly distributed in the case of, etc. 夕 = optically useful (four) illumination through the present The correction element of the invention is specially made twice, and the aforementioned correction potential can be further increased. Words Referring to the drawings below are the basic considerations of the present invention and some exemplary embodiments. [Embodiment] ^, 2 shows an exemplary optical correction element Μ, which has two delimiting elements Μ and 被 which are shaped "', planar flat 仃. In the present example, the liquid layer 24 which becomes the water layer is disposed between the two delimiting elements /, 23, respectively. It goes without saying that liquids for liquid two rides other than water (for example, 'high refractive index such as cyclohexene or decahydronaphthalene') may also be considered. The garnet elements 22 and 23 may comprise quartz. Glass or CaF2, or other material. In order to adjust the optical properties of the liquid layer 24, the liquid layer σ, δ also has a salt such as vaporized sodium, calcium carbonate, or potassium iodide. 3a: 3 clearly illustrates the invention The basic principle. Figure 3 on the left side of the figure shows the non-uniformly heated lens element 25 $ interference wavefront that is close to the pupil. In this case, the non-uniformity of the lens element 25 can be made: For comparison, Figure 3b on the right side of the figure shows the disturbed wavefront of the optical repair element 21 with the liquid layer 24 and the delimiting elements 22 and 23. Figure 3 clearly shows: except for the positive and negative 97112516 The interference of the wavefronts outside of 200903184 is actually equal. Therefore, the correct effect can be obtained by appropriate selection of the thickness of the liquid layer 24. Figures 4a and 4b of Figure 4 show the corrected wavefront (field center) In this case, Figure 4a shows the first The prior art exclusive active manipulator performs the wavefront after the correction, and FIG. 4b illustrates the wavefront after the compensation by the correction element of the present invention. It can be clearly seen that the correction of the wavefront by the correction element of the present invention is apparent. Preferably, Fig. 5 shows a first exemplary embodiment of a catadioptric projection objective having two folding mirrors, in which two correction elements 2 of the invention are arranged. In this case, the corrections are made. The elements 21 each comprise two planar plates which are not shown in more detail in the drawing, and the space between the planar plates is filled with water. In this way, the pair of surrounding optical elements is achieved (not in Fig. 5 The compensation of the wavefront changed by the heat generation is shown in detail. Without the fact that the correction element 21 of the present invention can be disposed at any desired position within the projection objective lens > the design illustrated in FIG. The parameters will be listed below in tabular form. In this case, in a common manner, consecutive numbers indicate the order of the individual surfaces of the optical elements in the system under consideration. The aspherical formula applies to the "aspheric constant" number: ―" The reference surface indicated by the table towel P(h) = + C^+C2h6+... The surface of the relevant surface r is the curvature of the surface in this case 'P Parallel to the sagitta, h is the radial distance from the optical axis, 97112516 15 200903184 radius, K is the cone constant, and Cl, C2....... are the aspheric surfaces present in the table. Constant. Surface radius Thickness glass 193.3€8 nm 1/2 diameter 0 0.000000 30.000000 Air 1,00000000 63,500 1 o.iooooo -0.006100 Air 1,60000000 74.287 2 153*564030 46.16336? SX02 1.5801&B11 B3.057 3 -330.50100 S Αέ 1.000&51 Air X,00000000 B2.S04 4 252.Π2090 10.1S401T S102 1.56018811 80.Q45 5 10$.950677 20.700583 Air i.00000000 74-724 6 124.315093 35.166224 S202 l.kbiem 79.8-Ϊ9 7 461.7828S9 12.333505 Air 1.00000000 8 1J3i2.6788^"' AS 27.1502U SI02 1.5601Θ811 77.413 9 -17X.23707« 13.0505«! Air l.QOQOOOQO 77.239 10 -3421,712832 18.733Χβ€ SI02 1.5C018&U ~'~ 63.936 11 -199.917519 AS 2, $28&$ S Air 1.00000000 61.822 12 〇.〇〇〇〇〇〇5.000000 SI02 1>S60180X1 54.797 13 〇.〇〇〇〇〇〇3.000000 ui6 1.42610227 53.102 14 O.OODOGO 5.000000 sioi 1.56018611 51,999 15 〇.〇〇〇〇〇〇14.352674 Air 000000000 Γ 50.324 16 -663.001556 14.487511 sr〇2 1.$6013811 46.997 17 -176.872Θ78 17.B49517 Air 1.00000000 4S.819 16 〇.〇〇〇〇〇〇5.000000 sioa 1.56018811 S7.S52 19 〇.〇〇〇〇〇 〇3.000000 H20 1.4361Θ227 58.96^ 20 〇.〇〇〇〇〇〇5.000000 SI 02 1.S60188U 59.€24 21 〇.〇〇〇〇〇〇4d.793011 —air_I X.OOOOOOGO ^0.635 22 -334 .S29326 21.297S20 5102 lr5€0iseu 73.819 23 -152.413035 B.S12980 1,00000000 *76.421 24 -130,412851 9.998456 S102 1,5601B811 7T.007 25 •157.266636 3β.990723 1.00000000 81.222 26 〇.〇〇〇〇〇〇 222.908912 l.QOQOOOOO 93.101 27 -186.564171 AS -222.908912 REFL· 1.00000000 161.077 28 171.41^188 AS 222.903912 RSFL 1,00000000 137.401 29 o.qooooo 66.222340 Air 1,00000000 105.690 30 413,994571 32.308650 SI02 l.seoieeix X11.145 31 -758.622&0Θ 28.63588? Air 1.oooooooo 110.634 32 -S55.998871 21.SeeS3_S SI02 1.56018811 105.180 33 1524.^8709$ AS ¢. 947667 Air 1.00000000 103.924 34 262.039412 18.703407 5102 1,S$018811 SS.421 35 124.828140 41.^0588« 2 gas 1,00000000 84.348 36 -904,702595 AS 12.559987 SI02 1.56018811 ^4.028 37 131.44494? 22.233392 Empty 1.00000000 82.766 38 2BS. 3&2*m AS 11.620577 έι〇2 1.56018811 85.404 33 1424.680258 2$.330510 Air 1.00000000 87.S66 40 -21B.823450 10.143335 SI02 i.&^oiean SO.145 41 -S06.939484 AS 1.481794 Air 1.oooooooo 104.660 42 $03.634623 AS 45.5^924 5102 1.560188U 1X3.183 43 -381.334550 1.007701 Air 1,&〇〇〇〇〇〇〇124.528 44 -3667.499392 AS S2.S29718 SX02 1.560X8811 133.S64 45 Ί86.4Θ5102 0.337179 1,00000000 U9.12€ 46 603.514905 AS 47.213007 SI02 157.657 47 •404.4€5866 1.492986 Air 1 .oooooooo XS8.9^ 4d 463.934249 42.571520 S102 1.56018811 157.557 Λ9 -29604.6^4485 AS 5.695912 1.00000000 156.1« SO 〇.〇〇〇〇〇〇〇.〇〇〇〇〇〇air1.00000000 154.21θ 51 0.000000 -4.75187$ Air 1.00000000 154.218 52 452.363951 57.278451 SI02 x.5 €018dll 152.299 S3 -566.149653 AS 1.149493 Air i.oooooooo ISO.626 Si 114.035594 60.87056^ SI02 1.S6018811 ^9.77^ 55 1030.454633 AS 1.035245 Air 1.00000000 SO.468 S6 61.122059 43.376716 έί〇2 1.560188X1 51.345 57 O.OODOOO 3.100000 Κ20 A.43618227 5Θ 〇.〇〇〇〇〇〇〇.〇〇〇〇〇〇Κ20 〇.〇〇〇〇〇〇〇〇X5.ai6

16 97112516 200903184 Aspheric constant SAF 3 β 11 27 28 K 0 0 0 -2.1B039 Ό.6Θ0703 C1 •3.89722ae-07 -1.0534〇4e-0*? -3.4482299-08 7.〇〇1822«·〇9 C2 3.0304V?e-12 l.9S1656e-n 4.354829e-ll 2,S26417e-13 1.0385·76β-Χ3 C3 ·7.89β842β·16 , 1.^21835e*15 -7.319113C-15 ·8.929830θΊΘ 1.39ieiSe-18 C4 1.082407e-19 -5·413752β·20 2.242273e~lfi l.(27065e-22 1.79H96e-23 C5 •9.811055e-24 -》."634le-23 <4.14£641e>22 -3.600583e-27 3.7X7432e-28 C6 5.807496e-28 4.1X8252e-27 4·236689β·26 4.847008e-32 -2.76344£e-33 C7 >l.$73414e-32 -i.4219l5e>31 •1.93833€e-30 - 4.094157e-37 ^1.134 82 Oe-37 C6 〇.〇〇〇〇〇〇e-fOO O.OOOOOOe-cOO 〇.〇〇〇〇〇〇e+00 〇.〇〇〇〇〇〇e 4-00 0·000000β+00 C9 0.00000Oe-f00 Q.OOOOOOe-fOO 〇.〇〇〇〇〇〇e4-〇0 Q.OOQOOOe^OO 〇.〇〇〇〇〇〇«400 SRF 33 35 38 41 42 K 0 0 0 0 0 CX -2.2X46Q9e-07 2.13$337e-0B 4.8306$4e-05 1.027731e-07 -4.736874e-08 C2 1.31482Se-U 5.437360e-14 •4.4d3860 e-X2 2.857813e-12 4.15X473e*12 C3 3.671489e-17 6.7X7342e-l7 3.907€86e-16 -3.350784e-ie -3.98€368e-lS C4 -7.303224Θ-20 9.3d4699e-20 •1.21S2lSe- 19 •2.0U428e-20 1.648316e*20 C5 6 . l87636e-24 -1.576974e-23 l,511307e-23 $.0353S8e>25 -1.556834e^25 C6 -2.508*753e-2B $.180615e-28 -1.438793 E-27 δ-1〇82》6β·29 -1.958302Θ-29 C7 4.11l335e-33 •3,402825e-32 6.515194e02 · -2.715308e-33 €.361d$7e>34 C8 0 .OOQOQQe-fOO O .OQOOOOe-i-OO 〇.〇〇〇〇〇〇e+00 〇.〇〇〇〇〇〇e^oo 〇.〇〇〇〇〇〇e+00 C9 O.OOOOOOe-t-OO 〇.〇 〇〇〇〇〇e+00 〇.〇〇〇〇〇〇e+oo 〇.〇〇〇〇〇〇e4〇0 〇.〇〇〇〇〇〇e«-00 SRF 44 46 49 53 55 K 0 0 0 0 0 Cl -6.48733Se,ll -S-10dS02e-〇8 2.371342e-08 3.985232e-08 C2 -3.0S1691e-a2 1.615428e-l2 2.β32θ65β-12 -1.830S22e-L2 6-989783e-12 C3 1.412820e-18 1.07S523e-n -l,199B66e-17 -2.74〇022e*LT C4 -1.574059e-21 -7.1003S9e-22 -3.222523e-2l 6.478622e-2l 1.215712Θ-Χ9 C5 -6.2287396-26 -3.197 $7e-26 1.903111e-25 -2.753936e-2S -l,015927e-23 C6 2.2720〇4e-30 1.463389e-30 -5.2S8535e-30 5.4759S4&-30 5.340O97e-28 C7 〇.〇〇〇〇 〇〇e+00 -1.514834e-35 5.663156e>35 -4.4731Xfie-35 -l.l44880e-32 C8 〇.〇〇〇〇〇〇e^oo 〇.〇〇〇〇〇〇e<<O0 〇.〇〇〇〇〇〇e<»00 O.OOOQOOe-fOO 〇.〇〇〇〇〇〇e^oo C9 o.ooooooe-foo 〇.〇〇〇〇〇〇e+oo 0.000000e+00 〇 .〇〇〇〇〇〇et-OO 〇.〇〇〇〇〇〇e+oo

Figure 6 shows an alternative design of the projection objective 7 in which three correction elements 21 of the present invention are used. The design of the projection objective 7 illustrated in Figure 6 is manifested by the fact that the beam path is directed to illuminate the optically useful radiation through the correction element 21' located in the vertical branch of the beam path twice. In this case, during the passage through the projection objective 7, the projection beam is deflected by 90 from the original direction via the reflective elements 31, 32. In other words, the projection beam exhibits a T-shaped path as it passes through the projection objective 7. It goes without saying that it is also conceivable to deviate more or less from the T-shaped route. In order to deflect the projection beam, it is also possible to use an optical element whose deflection effect is not based on a reflection effect but, for example, based on a diffraction effect or other optical effect. The parameters of the design illustrated in Figure 6 will be edited in tabular form in a manner similar to the previous examples: 17 97112516 200903184

Table and radius thickness glass 瑀 1S3.300 nm 1/23⁄4 symbol 0 O.DOOOOO 81.909100 1.0Q00000C 60.033 1 〇.〇〇〇〇〇〇-0.019387 1.00000000 87.121 2 624.406971 21.18433S SI02 1.5^032610 89.234 3 -711.908894 0.90674 Air 1.00000000 90.564 4 6.000000 5.000000 SI02 1.56032610 51.64X 5 〇.〇〇〇〇〇〇3.ύϋόόο6 Η20 1.43681630 92.147 έ 〇.〇〇〇〇〇〇5.000000 S102 1*5€032610 92,476 7 ο,δόΰόύό 0.930386 Air 1.00000000 92.982 d 1 ^3.169520 S2.483115 SI02 1.5€032610 9S.879 9 381^*7^9^3 52.783095 Air X.〇〇〇〇〇〇〇〇33.373 10 118,580075 36.X3S3S4 SI02 1.5€03261〇83.0^3 11 -473.446738 AS 0.828657 Air 1.00000000 79.307 12 90.185633 49.$62〇Sl S202 1.S6032620 65.244 13 94.133983 14.329461 Air 1.00000000 44.293 14 〇.〇〇〇〇〇〇5.000000 SI02 1.56032610 42.036 IS 〇.〇〇〇〇〇〇3.000000 Κ20 1.43631 ^30 40.079 16 〇.〇〇〇〇〇〇S.6&0000 S102 1.5έ〇32$10 3$,570 17 〇.〇〇〇〇 〇10,129876 α,〇〇〇〇〇〇〇〇•40.520 IQ -92.819702 43.908983 SI02 1,56032620 40.799 19 -85.424170 9.674700 Ningqi 1.00000000 S5.255 20 -74.103929 42.^90832 έτ〇2 λ.56Ο32£10 56.250 21 *387*X641〇3 B.455S12 Air 1.00000000 86.706 22 -365.0022S3 50.12(3d7 SI02 ΓΓ5?〇3?6ϊδ 85.674 23 -117.4S3515 9-914517 Air l.OOOOGOOO 95. $76 24 -4X5.027$9S AS 46.185735 SI02 1.56032610 103.640 2S -170.^958β6 10.Θ80007 Air 1.00000000 X0B.S62 26 262.0837&9 27.654229 SI02 1»5€Ο32610 103,448 27^361.289798 0,943659 Helium 1.00000000 101.950 is 220.659610 28.386959 SI02 1.56032610 97.155 29 2300 ^889907 AS 74.3U566 Air 1.00000000 ^ 94.463 30 ο.αοοοοο •22S.404290 R£FL 1.00000000 €6.879 31 106.700S09 AS -12.09336B SIQ2 1.56032610 75.306 32 X029.600488 -50,044033 Air X.OOOOOOOO 90^131 33 111.561912 -12.592875 SI02 1,56032610 92.937 3 names 212*730136 -26.07658^ Wei 1.00000000 118.651 IS 1S5.078710 2€.0?65B€ RSFL 1.D 0O00D00 122.10& 36 212.730136 12.5928*75 SI02 1.560326X0 118.6&5 37 111.-363912 50.044033 Air 1.00000000 93.478 38 1029.600488 SI02 1.56Q32610 91.625 39 X06.700509 AS 223.404290 1.00000000 Tf.lU 40 O.DOOOOO ·73·β35699 REEL 1.00000000 €7.545 41 2344.735704 -22.31S744 SI02 1.56032610 94.161 42 253.638670 -0.9726U 铽1.00000000 95.658 43 -4*50.189390 •24.S7S552 SI02 1.5β032610 102.074 44 ¢89.891250 -2.10SB9$ 空f 1.00000000 102.389 45 -23S.90X080 - 43.892529 έίοί 1.56Q32G10 102.646 46 -4312.807930 -5.654Θ27 S gas X.OCOOOOOO ^.26έ 47 -144.330672 -45.147417 SI02 X.56032610 91.143 48 •480.152998 AS ~*-16.470018^ Air X.OOOOOOOO 81.2S8 49 €77.3&6771 ""-10,210^551 1.&6032610 79.391 50 •95.633899 AS -39.196037 ±k 1.00000000 ^9.026 51 -8735.863231 -12.389064 SI02 1.5603261D 71,393 52 -14?.341293 AS -16.6227S7 Air 1.00000000 75.555 53 -482.080214 -30.20737B S102 1.5^032610 7β.*?56 54 1.131.416760 -76.8 57457 Air 1.00000000 85.023 55 -3376,357$«5 A£ -22.564450 SI02 1.5€032$10 121.13S 56 59B.^91433 •0.983285 Empty 1.00000000 123.862 57 -357,148002 -33.365168 3X02 1.56032610 136.868 58 -32S2.68878$ -1.240420 Air 1.00000000 137.1S4 59 -308.28X049 -48.644248 SI02 1,56032610 139. 60 62S.S1^050 AS >12.324803 Air 1.00000000 13S.290 61 0,000000 〇.〇〇〇〇〇〇Air1.00000000 134.463 62 〇 .〇〇〇〇〇〇3.030879 1.00000000 134.463 63 -781.S36893 -35.234S20 SI02 1.56032610 133,791 64 13^4,52^^ -3.705163 Air 1.00000000 lil.854 65 -321.8B1102 -36.276903 SI02 lS€032€10 123.524 € € 3268.6^145 -2.414G81 空*1.00000000 120.^98 67 -131.15^713 -28.556588 5Ϊ02 α.560326X0 $5.90$ 68 -20D.74.S2S7 AS -0.831S34 Air 1.00000000 89.479 6$ ·$'ζ.Αΐ^ έ -34.227499 SI02 1.56032610 76.703 70 -225.754972 AS *1.247532 Air 1.00000000 67.997 71 >61.493162 -50.01794*7 SI02 1.56032610 4S.906 72 b.000000 -0.9$β40Τ H20V 1.4^68163 0 16.800 73 〇.〇〇〇〇〇〇〇.〇〇〇〇〇〇H20V 〇.〇〇〇〇〇〇〇〇15,009 Aspheric constant 97112516 18 200903184 SRP 11 24 29 31 39 K 0 0 0 0 0 C1 ^.3244β8θ-08 >1.320272β-0β L.26?249e-08 •e.^34840e>08 -β.634840β·Ό8 C2 3.336144e>13 4.8982446*13 2.228304e-X3 -3.319972e-12 -3.319972 E-12 C3 i.899321e-a6 >l.S4534€e-l7 -l.S14143e-X7 >2.014127e>16 -2.014127e<l$ C4 -3.004S14&-20 3.56305€e>23 2.8797S6e&gt ;22 -1.71?334e-2〇-1.717334β·20 C5 X.4^85846-24 8.02X00le-27 1.131170^<26 2.068734e-25 2.06β734β·25 C6 -9.S97193e-30 -5.33B275e- 32 -6.425389e-31 -l,432400e~28 >1.432400e>28 C7 〇.〇〇〇〇〇〇0.OOOOOOe+OO 〇.〇〇〇〇〇〇e-fOO 〇.〇〇〇〇〇 〇00 〇.〇〇〇〇〇〇e+00 ch 6.6oooo〇e<f〇o 〇.〇〇〇〇〇〇e4〇〇〇.〇〇〇〇〇〇e+00 〇.〇〇〇〇 〇〇e-fOO 0.〇00QOOe+00 C9 〇.〇〇〇〇〇〇64-00 0.0000006+00 〇.〇〇〇〇〇〇e+00 〇.〇〇〇〇〇 〇e<f00 〇.〇〇〇〇〇〇e+〇〇SRF 48 50 S2 55 60 K 0 0 0 0 0 Cl -3.04S083 white^08 -X.82S792e-09 3.667191d-08 1.588995e-0B -1 .χ'έ48€5β·08 C2 4.0863206-13 3.80640«e-12 Χ.975333Θ-12 •1.42573U-13 2.231510e>14 C3 9.699911e-17 4.β29ΐ97β-17 6.96θ457β-17 -1.12S9?〇 E-17 -2.476426e-17 c4 >1.029295e>20 4.0142356-20 3.42$30Se-21 -2.7S1803e-22 l.X336€9e-21 C5 1.045245e-24 1.7»〇122e-24 -6.€ 8343Se-25 -X.990926e-28 -2.410429e-2^ C6 - containing, I46e22e-2d -3.387427e-28 2.962190e-2B 2.982407^-31 2 .0S828^e>31 C7 〇.〇〇〇〇〇 〇e*00 〇.〇〇〇〇〇〇e+〇〇o.ooooooe+oo o.ooooooe+oo 〇.〇〇〇〇〇〇e+ao C8 0.000000e+00 o.oooooae«-oo 〇.〇 〇〇〇〇〇Θ4-00 〇.〇〇〇〇〇〇et-00 〇.〇〇〇〇〇〇e<K〇0 09 o.ooooooe+oo O.OOODOOe+OO 〇-〇〇〇〇〇 〇e十〇〇〇.〇〇〇〇〇〇e+〇〇〇.〇〇〇〇〇〇e+00 SRF 68 70 K 0 0 Cl 2.8€5471e-〇9 -1.020006Θ-07 C2 -3.95& 281e -12 -?.6S388?e-12 C3 4.329320e-16 i.074443e*15 C4 •4.469477e>20 -1.131273e-19 C5 1.3744296-24 1.^40084e'23 C6 -4.141746e-29 -4. -7632708-29 07 〇-〇〇〇〇〇〇e+00 O.OOOOOOe+oo C8 〇.〇〇〇〇〇〇£4〇〇〇.〇〇〇〇〇〇«+〇〇C9 〇.〇 〇〇〇〇〇e-fOO 〇.〇〇〇〇〇〇€4〇〇

Fig. 7 shows another example of the projection objective lens 7 to which the correction element 21 of the present invention is applied. In this case, the correcting element 21 is located in the region of the pupil plane of the projection objective 7, which is not shown in the figure. Alternatively or additionally, the optical correction element may be (not only) disposed in the region of the upper pupil plane (ie, in the pupil region near the main mask), and may be disposed in the lower or bottommost pupil plane region. (ie, near the wafer). In Fig. 7, a region directly upstream or downstream of one of the three biconvex lenses 26 is particularly suitable for this case. An advantage of selecting this position in the projection objective for the optical correction element 21 of the present invention is that the beam divergence is small in the region of the lower pupil plane than in the region of the upper pupil plane. That is, the angular scattering of the individual beam bundles of the projected light is smaller in the region of the lower pupil plane than in the region of the upper pupil plane. A small change in the optical path of the projection beam bundle passing through the optical correction element 21 of the present invention is accompanied, and thus, an improved manipulator effect or a compensation effect of 19 97112516 200903184 is achieved. In the region of the lower pupil plane 'although the overall greater thickness of the liquid layer 24 will be required to ensure the compensation effect, but the associated convection problem can be effectively utilized, inter alia, with the measures described below with particular reference to Figures 13 and 14 Reduce it. The parameters of the design illustrated in Figure 7 will be summarized in tabular form below:

Surface half-length thickness glass 瑀193.36B nm 1/2 page diameter a ο.οοοοοα -0.008710 Empty m l.COOOOOOO 74.265 2 152.806541 •JS, 431005 SI02 1.56016311 ai.i2i 3 •330.27503S AS 1.00Q851 Air l.OCOOOOOO 82,575 4 2S7.561794 10.19401? SX02 1.5601S811 80.063 5 107.240602 20.970575 Air 1.OOOOQOOO 74.712 6 124.216381 Θ7Θ498 $Z02 1.56018811 79.668 ? 458.206125 12.581575 Air l.OOOQOOQQ 18.003 β 394.774717 AS 27.324175 SI02 1.5€01βέΐ1 7*7.420 9 *171.322174 IS.056624 ΨΜ ..οόοοοοοο 7*7.242 10 -3632.304551 07753165~ SI〇2 1,560188U 64.020 11 -i9&,567355~ AS 2.828Θ65 • Empty k 1.00000000 61.914 12 〇.〇〇〇〇〇〇S.000000 SX02 1.56018811 54.βδ 〇13 〇.〇〇〇〇〇〇2.000000 K20 1.43618^27 53.206 14 O.OOQOOO 5.000000 SI02 1.5έΰ18811 1 52.108 IS 〇.〇〇〇〇〇〇14.620990 堃气 1.C0Q0000O 50.436 16 -670.72X0^5"&quot ;"1 14.$1θ50β $102 1.56018811 41.020 17 -176.631072 18.497791 Helium 1.00000000 4〇36 18 〇. 〇〇〇〇〇〇10.000000 S102 1.SS018B11 5^.150 15 0.000000 50.1^770? A gas X.OQOQOOOO 60.164 20 -332.25S28€ 21.26Θ478 SX02 1.56018311 73.716 21 Ί51,946062 8.$02276 Shenxu Z.00000000 * 76.312 22 -125.715474 9.992972 SI02 1.5601B811 22 -157.281726 998231 53⁄4 i.OOOOOQQO B1.1SB 24 〇.〇〇〇〇〇〇222.9XS96S Green 1^00000000 53.101 25 -186.S01756 AS *222.916965 RETL 1.00000000 161.210 26 171'573325 A5 2227^6365~ SETL 1.00000000 137.537 2? 〇.〇〇〇〇〇〇6S.919281 Helium 1.00000000 105.927 28 411.904^17 32.629492 SI02 1.56018811 111.394 29 >746.664472 29.263212 Air _ _ _ 1.0Q00QQQ0 110.873 30 >948.543683 21.3257 S1 S102 i.S6〇iean 105.199 31 1499.S2B375 AS 0.9451fi7 Air 1.00000000 X03.S23 32 2δ1,881650 16.698434 SI02 x.seoiedii 95.462 33 124.935816 42.2^0342 Air 1.00000000 84.398 34 -9X5.013583 AS 13 .263169 SI02 l. B6018ail 34.060 35 131.42B201 22.^65151 空Μ η % l.OOQOQOOO S2.775 36 288.836S63 AS 17.S443S4 S102 1.5601 831X S5.432 37 1414.281223 26.3S05S3 Air 1.00000000 87.975 3β 516375 10.102933 ST02 1.56O1B011 50.157 39 -507.940782 AS X .489700 Lucky Slave 1.00000000 104.668 40 604.663227 AS 45.569X70 SI02 1.56018&II 1X3.228 41 -381.SSQ602. 0.942198 1.00000000 124.5T7 42 -3659.679844 AS €2.803391 SI02 1.5έΰ18β1Χ 134.048 43 -185.4894S9 0.947473 苎气Ποόοόοοοό~~:~ 139.144 44 803.608129 AS 47^10*7253 SI02 1.56018911 157.634 45 -404.7308^5 1.543174 + gas 1.00Q000D0 1^8.92» 46 463.662629 42,746.808 SI02 ' 1.56018811 157.507 4? >30094.70B524 AS &.621418 Air 1.00000000 156.ns 48 〇.〇〇〇〇〇〇〇.〇〇〇〇〇〇5«, 1.00000Q09 154.1?S 4 Today 〇.〇〇〇〇〇〇-671083 i.oooooaoo XS4.17B 50 452.542212 S-7.0$^$B0 SI02 X.S6018811 152.261 51 -566.442779 AS l.X2$324 Capture the slave x? «aoooooo *· 150.826 52 114, 05112? 60.904375 Call 02 1.5€018811 99.792 53 X031.Q94018 AS X.0S1630 1.00000000 90.472 54 61.061829 43.38B068 SI02 1.560X6811 51.327 55 〇.〇〇〇〇〇〇 3.100000 H20 1,43618227 24.550 5S 〇.〇〇〇〇〇〇 0.000000 H20 〇.〇〇〇〇〇〇〇〇 IS.875 Aspheric constant 97112516 20 200903184

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Figure 8 of Figure 8 shows the correction potential of the configuration shown in Figure 7; Figure 8b illustrates the modification potential of a configuration in which one correction element 21 is placed near the pupil plane and the other correction element is placed in the projection objective Near the field plane. Here, the correction element 21 comprises two 5 mm thick S i 〇 2 plates in each case, and a water layer having a thickness of 4 mm is arranged between the plates. The relationship between the thickness of the liquid layer and the thickness of the delimiting element for achieving the optimum compensating effect of the correcting element of the present invention will be considered hereinafter by way of example. The basic rule here is that the temperature coefficient of the refractive index of the liquid used (dn/dT) exhibits a sign different from the material of the surrounding material, in particular the optical element used in the projection objective. The relationship between the thickness of the liquid layer and the total thickness of the delimiting element follows the following formula: 21 97112516 200903184

Lens Σ ί=Ι i^element ^ glass water DAT, The value Dwater/Dglass is the relationship between the thickness of the liquid and the thickness of the surrounding glass material. In addition, dnglass/dT and the temperature coefficient of the refractive index of the glass material and the liquid used, respectively. The magnitude Di*ATi is equal to the product of the individual lens thickness and the temperature rise in the lens element i. The sum of all • (except for the L positive components themselves) represents the contribution of all lens components to the overall effect. The maximum temperature change in a planar lens element is approximately recognized by: α·Ρ Απλ ~2tn Η lens This is suitable for planar elements with conventional illumination (ie, 〇 circular illumination centered on the optical axis of the component). In this case, p indicates the irradiation power, π represents the absorption coefficient of the base e, 2 represents the thermal conductivity of the material, and (1) represents the radius of the conventional illumination, and the coffee represents the height of the lens. In the case of a liquid layer, it can be assumed that the temperature in the liquid is approximately equal to the temperature of the delimited glass surface. Under this condition, the temperature of the liquid decreases as the thermal conductivity increases (for example, quartz _CaF2). As a result, the desired thickness of the liquid layer increases as the thermal conductivity increases. A water layer with two delimited glass plates can be approximated as a homogeneous component with effective absorption and thermal conductivity. Applicable to 97112536 22 200903184: Μ. D,. "Mfater^ water +d And ^ Af 〇> :=:——Slass^slass + 乂M/ater water

Dglass +D, wat^r Figure 9 illustrates the extent of the water layer as a function of the thickness of the delimiting element. In this case, glass type quartz and CaFz are assumed to be materials for the = element. The value used in this case is 仏W仏咖=〇2, 1 P:1 W' “...:0-0829/cm, and ~...〇 (comparable to water: not counting). Figure 9 The curve parameter in the middle is to compensate for the two-wavelength aberration (200 nm and 150 nm) in the entire objective lens. This can be calculated by the temperature change and thickness of the optical element in the projection objective lens. The relationship applies to the material system "Quartz / Water / Stone and "CaF " Water Ship". The delimiting element has a flat surface in this condition. The generalization of the relationships represented above can be achieved by delimiting elements. In this case, the 'projection objective can be modeled as an effective flat = transparent. This effective lens can be obtained by the optical effect of the optical path length on the optical axis and along the edge of the light. A lens with a positive refractive index has an equivalent performance. In order to be able to compensate for the thermal effects of this type of lens, a central thick lens having a thickness greater than the edge should be used. This lens is the result of an equivalent consideration for the above expression. Further, Fig. 51 illustrates some examples of optical corrections (4) 21 of the boundary elements 22 and 23, and the delimiting elements 22 and 23 have non-planar surfaces. 97112516 23 200903184 A possible problem in the implementation of the correction element of the present invention may be that the temperature distribution desired by the fact is destroyed by convection in the liquid layer. In this case, the liquid layer is constructed in a bee-like manner that is, for example, substantially orthogonal to the direction of the optically useful radiation (i.e., the ones in the delimited It is advantageous that the liquid is "filled" into individual chambers and constructed as if it were closed by the mth member. In this way, heat exchange via convection is greatly suppressed. Furthermore, it is advantageous to adjust the refractive index of the liquid to the refractive index of the material surrounding the delimiting element. This ensures that the honeycomb structure is in a cold state of appearance' and does not cause any disturbing optical path differences. Figure 2 shows in plan view two possible variations of the configuration of the correction element. In this case, an additional element 33 is provided, which will be the liquid layer (Fig. ι〇==variation (4) bee high 丄二正V:. In the variation, it is configured... /=11 illustrates the projection exposure apparatus, wherein: a primitive: the skin is disposed in the projection objective 7. The illumination device 3 is designed to be mounted in this manner by illumination. The projection exposure apparatus, ', , and the distribution of the structure, the correction element HZ of the present invention, "the image of the extremely uneven sentence" shows the correction of the present invention, and the large correction potential is obtained. As A, Tian, μ - I, n another variant of the cow 21, which exhibits a heating line as a fluidity adjustment, ie, the profile is distributed over the correction element 21,", the wire is meshed dry and in a suitable contact After the splicing, the 97112516 24 200903184 can generate the desired temperature on the modified 7C member 21 to become the infrared source of the laser 41. By means of the second, a delimited, directed infrared beam 42 is pointed; 7; ^^ :壬At the point of hope, this led to the correction of the component's positive = illusion. However (for example, the use of a cooled, directed fluid transfer does not indicate that additional elements 33 may be fabricated as: a guide member (eg, made of a metallic material), or have an optical axis in this manner, if The additional element 33 has a sigma contact connection, and in the case of dual functionality, the convection in the liquid layer 24 can be reduced. Alternatively, the desired area can be set in the case of using a conductive region of the additional element 3 in the manner of a resistive heating system. Temperature Distribution Figure 14 shows another variation for suppressing convection. In this case, the liquid layer 24 is subdivided into two partial layers by the separation element 5 - and (10). In this case, the partial layers 24a and 24b are The light path is arranged one after the other with respect to the optical path passing through the optical correction element 21. In this case, the respective thicknesses of the two partial layers 24a and 24b are reduced compared to the example of the above description; The thickness is in the range of less than 3 mm, and the thickness of 2 or 1 mm is advantageous in this case. Subdividing the liquid layer into a plurality of thinner partial layers, having reduced convection in the partial layers 24a and 24b And the pair in the plane direction of the layer In this case, the correction effect of the correction element 21 is actually completely retained due to the total thickness of the liquid layer 24 which is not worried. In this case, the proposed variation has measures for reducing the convection. The optical effect is kept to a small advantage; therefore, with the example 97112216 25 200903184, it is possible to have a small amount of optics as the separation element 50. The J sarcophagus glass plate is shown in Fig. 15 to reduce the pair of ·, , * μ 鳢 layers 24 The thickness of the layer is reduced; * possible. Under this condition, the liquid and the delimiting elements 22 and 23U: the two-layer layer is made possible by the insulating layer 51; As mentioned above, the minimum thickness required for the liquid a ^ Cong Li 24 is also particularly high in the liquid layer 24! _ From _ 』 兀 疋 疋 i i i i i i i i i i i i i i i i i i i i i i i i i i i i i i i i i 热 热 热 热 热 热 热 热 热 热 热 热 热 热The more preferably, the greater the thickness increase of the liquid layer 24 is due to its thermal insulation effect, the insulating layer 51 reduces the heat transfer between the liquid layer 24 and the disk delimiting elements 22 and 23, respectively, and thus has a thinner liquid layer 24 . In this manner, the liquid layer 24 can be sized to have an order of magnitude equivalent to that proposed in connection with Figure 14, and thus, convection in the layer direction is greatly prevented due to the reduced thickness'. In this case, the insulating layer 51 can be organized in such a manner that bubbles are introduced into the liquid-facing regions of the delimiting members 22 and 23, and the diameters of the bubbles are selected such that the optical influence of the bubbles is greatly The ground is reduced. Depending on the position of the optical correction element in the objective lens, for example, a bubble level of 5 χ〇.25 should be allowed. This corresponds to the total area of 25 mm2. According to ISO 1010-3, this area can be allowed to be distributed among more bubbles of equal total area as long as no accumulation occurs under this condition. Another variation of the effect of the interference caused by convection shown in Fig. 16 is that the liquid forming the liquid layer 24 is periodically replaced, and thus the homogenization of the temperature distribution in the liquid layer 24 is allowed. For this purpose, the amendment 97112216 26 200903184 70 pieces 21 has a population and a σ 55 which ensures that at least a portion of the liquid layer 24 is replaced by 5, in which the temperature knives in the liquid layer are initially formed without exceeding the degree of interference. The convection time period of the correction component of the choice of the township crying ^, d. 仟 刼 刼 刼 effect. In this case, the time window (seven 11116 win 〇 w) (where the compensation temperature distribution has been formed in the liquid layer μ but its convection has not exceeded the degree of interference) can be advantageously used to manipulate the use of crying. The basic parameters of the position and length of the time window are in the form of the viscosity and thermal conductivity of the liquid and the temperature distribution in the liquid layer 24. Further, as already explained with reference to Fig. 13, there is a possibility that the temperature distribution element (i.e., local cooling or heating by a target) affects the temperature distribution and thus convection in the liquid layer. In this aspect, the eyepiece 6 illustrates, by way of example, an infrared source embodied as an IR laser 41, by which the infrared beam 42 directed toward the original boundary can be directed to the correction element 21 or the liquid layer 24. At any desired point above, this results in localized heating of the correction element 21 or liquid layer 24. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 shows a projection objective of a semiconductor lithography which is not prior art (refer to the introduction of the specification). Figure 2 shows an illustrative optical correction element. Figures 3a and 3b show a clear description of the basic principles of the invention. Figures 4a and 4b show an illustration of the modified wavefront (field center). Figure 5 shows a first exemplary embodiment of a projection objective in which two correction elements of the present invention are arranged. Figure 6 shows an alternative design of a projection objective in which two correction elements of the invention of 97112516 27 200903184 are also used. Figure 7 shows the correction elements of the other projection of the projection objective. In addition, "column, in which a plurality of modified potentials of different configurations of the present invention are applied. Figure 9 (4) is the thickness of the delimited element of the sore 66 sharp. Eight "a drink" Figure 8a and 8b show the correction component needs Description of Possible Thickness Figures 10a and 10b are flat and 闰s - your variation. + Surface Extension - Correction of the composition of the two components of the invention. The modified metagraph shows the projection exposure device, where the components are configured In the projection objective lens, the present invention is not shown in the following: "The 'delimiting element' is shown in Fig. 13 showing the optical correction element of the present invention having a temperature regulating element. Fig. 14 shows an additional means for suppressing convection. Fig. 15 shows another possible case for suppressing convection. Fig. 16 shows another variation of the avoidable convection of the present invention. [Main element symbol description] 1 Projection exposure device 2 Wafer 3 Illumination device 4 (accommodation, positioning) device 5 main reticle 6 (installation, movement, positioning) device 97112516 28 200903184 7 imaging device; projection objective lens 8 optical element 9 bracket 10 objective lens housing 11 projection beam; beam 21 (optical) repair Element 21, correction element 22 delimiting element 23 delimiting element 24 liquid layer 24a partial layer 24b partial layer 25 lens element 26 (double convex) lens 31 reflective element 32 reflective element 33 (extra) element; (subdivision) element 34 part space 40 temperature adjustment element 41 IR laser 42 infrared beam 50 separation element; (extra) element 51 insulation; (extra) element 55 inlet, outlet 97112516 29

Claims (1)

200903184 X. Patent application scope: 1. A method for correcting temperature-induced imaging aberrations of an optical system, the repairing method: the second system uses a liquid layer disposed in the optical system=characterized by the imaging aberrations A non-homogeneous temperature profile 2 formed in the liquid layer (24) via an optically useful light-reducing method: the method of claim 2, wherein the liquid layer is formed as a liquid planar parallel plate . 3. The liquid lens wide liquid layer (10) formed as having at least one curved surface as in the first aspect of the patent application 4. The square i layer 1) according to any one of the preceding claims; the operation of the second optical system During the period of keeping = or special advantage? The method of any of the following, wherein the water, the body. A 1^ refractive index liquid such as "a'" is used as the liquid 6' as in the second item of the patent application: the liquid layer (10) of the seesaw is disposed in two sets of the plate formed into a crucible Between the elements (22, 23). Thousands of flats 7. Any one of the aforementioned patent claims (22, 23) contains quartz glass or CaF2. , , medium, definite element 8. As in the scope of patent application, quartz glass, and, the liquid layer (;:): the ratio of the total thickness of the plane parallel to the plane parallel to the shell, X confronts The two rooms are preferably between 0.25 and 0.75, in particular: 2:8 and 1·. 97112516 " preferably between Q.3 and 30 200903184 0. 5. For example, in the method of claim 6, the plate contains CaF", and the liquid layer (24) has a ratio of the total thickness of the plane parallel to the plane parallel to the plane, and 〇 = the two substantial Between 0. 3 and L 5, between 丄 2.0 2.0, compared with the melon as in the scope of the patent application, items 6 to 9; = between items 5 and 1. The two substantially parallel planes The method of the total thickness term is preferably in the range of 2.5 to 15 liters, _main 2+. 11. A soluble substance according to any one of the preceding claims, particularly such as Gasification pin, gas venting: 贞: = added to the liquid layer (10) to modify its optical characteristics: (4) salt body == 申, the method of any one of the ranges, wherein the liquid is modified. The fabric is conditioned by an additional temperature regulating element (40). The method of claim 12, wherein the resistor is used to heat the workpiece or the infrared (four) source (4) is the temperature (four) component (40). The method of any of the patents, in the bean, as long as the convection occurring in the liquid layer (10) corrects the liquid layer (24) The liquid layer (24) should be at least partially replaced by a certain degree. 15. A light for compensating for temperature-induced imaging aberrations in an optical system: a correction element (21), this correction element ( 21) comprising a liquid layer (24) formed as a liquid planar parallel plate and disposed between two delimiting elements (22, 23) having a flat surface, wherein the two delimiting elements (22, 23) are arranged in a fixed manner relative to each other. 97112516 31 200903184 16. The optical correction element (21) of claim 15 of the patent application, the two delimiting elements (2), 23) are formed substantially Planar parallel, as in the scope of the patent application, item 15 "16th optical correction element = 1", wherein 'the two boundary elements (2), 23) contain quartz glass or 18. Optical correction element as claimed in claim 16 ), in which the plane parallel plates contain quartz glass, and the ratio of the thickness of the liquid layer to the total thickness of the two substantially parallel plates is between 〇·2 and 1· Between 〇, preferably between 〇.25 and 〇·75, Preferably, it is between 0.3 and 〇. 5. The optical correction element (Μ) of claim 16, wherein the plane-parallel plates contain CaF, and the liquid layer (24) And the ratio of the thickness to the total thickness of the two substantially planar parallel plates, between 〇.1 and 2.0, preferably between 〇.3 and 15, especially preferably between 0 and 5 In the range of 1. 5 mm to 15 mm, preferably, the total thickness of the two substantially planar parallel plates is preferably in the range of 1. 5 mm to 15 mm. In the range of 2 to 12 mm. The optical correction element (21) of any one of claims 15 to 20 wherein the liquid layer (24) contains water or a high refractive index liquid such as cyclohexane or decalin. . 22. The optical correction element (21) of any one of claims π to 21, wherein the additional 97112516 32 200903184 element (33, 5G, 51) for reducing convection in the liquid layer (24) ) is disposed between the elements (22, 23). 23. The optical correction element (2) of claim 22, and wherein the additional element (33) is formed in particular as a honeycomb or rectangular portion. Space (34), and the partial spaces are relative The liquid layer (24) is closed to each other. 24. The optical correction element (9) of claim 22, wherein the additional element is at least one separating element that subdivides the liquid layer (24) into at least two partial layers (24a'/4b) (5〇 And the at least two partial layers are arranged in the optical path through the optical correction element (2). 25. The optical correction element (2丨) of claim 24, wherein the 4-blade layer (24a, 24b) has an average of less than 3 mm, preferably less than 2 mm, particularly preferably less than 1 mm. thickness. [26] The optical correction element (2) of claim 22, wherein the additional element is for thermally insulating the liquid layer (24) from the at least one delimiting element (22, 23) At least one insulating layer (51). 27. The optical correction element (21) of claim 26, wherein the insulating layer (51) is formed by bubbles in a region of the delimiting element (22, 23) facing the liquid layer (24). An optical correction according to any one of claims 15 to 27, wherein the refractive index of the liquid is adjusted to the refractive index of the surrounding material in a cold state. The optical correction element (21) of any one of claims 15 to 28, wherein the liquid layer (24) contains a soluble substance, particularly 97112516 33 200903184 such as gasification #3 'gasification Salts such as dances or hardened bells are used to modify their optical properties. The optical correction element (21) of any one of claims 15 to 29, wherein an additional temperature regulating element (40) is present for modifying the temperature distribution in the liquid layer (24). 31. The optical correction element (ϋ) of claim 3, wherein the equivalent adjustment element (4〇) is a resistance heating element or an infrared source. 32. The component (21) according to any one of the fifteenth to the item of claim 5, wherein the affliction and the image τ-from, 〇1, " 褒 褒 兀 兀 ( (21) have an inlet and an outlet (55) for at least partially replacing the liquid layer (24). A projection objective (7) for semiconductor lithography, characterized in that the projection objective (7) comprises at least one optical correction element (21) according to any one of claims 15 to 32. ϋ Patent scope 33 item of semiconductor lithography projection objective () where at least one optical correction element (21) is disposed in the region of the pupil plane and is separated from the pupil plane by a distance of more than 0.7. Secondary aperture ratio. & Projection of Semiconductor Lithography of Section 33 or 34 of the Bamboo Correspondence Patent No. ', ': 'Optically useful radiation is irradiated through at least one of the correction elements many times, in particular twice. 36. Projection objective (7)' as claimed in any one of claims 33 to 35, wherein the projection objective (?) is a catadioptric objective of the first two folding mirrors. ''', , has at least 97112516 34 200903184 37. A semiconductor lithographic projection exposure apparatus (1) having an optical correction element (21) provided with a liquid layer (24) for correcting imaging aberrations, The liquid layer (24) is at least partially disposed in the beam path of the projection exposure apparatus 'characterized by: the projection exposure apparatus having an illumination device (3) 'suitable for generating non-uniform illumination, the pair being paired with the beam Dipole illumination of the main mask (5) in the path. 38. The projection exposure apparatus (1) of claim 37, wherein the liquid layer (24) is formed as a delimiting element (22, 23) disposed on two flat surfaces. The liquid planes are parallel to each other, and the delimited π pieces are arranged in a fixed manner relative to each other. 39. A projection exposure apparatus (1) according to claim 38 of the patent application, wherein. The two boundary elements (22, 23) are formed as substantially parallel plates. 40. For the projection exposure apparatus (1) of the 38th or (10) of the scope of the patent application, VIII. The two boundary elements (22, 23) contain quartz glass or CaF2. CJ is the projection exposure apparatus (1) of claim 40, wherein the plane parallel plate of the isosphere contains quartz glass, and the thickness of the liquid layer (24) is equal to two substantially parallel planes of 5 The ratio of the total thickness is between 2 and 1.0, preferably between 〇 25 and 〇 75, particularly preferably between 0.3 and 〇. 42. The projection exposure apparatus (1) of claim 4, wherein the plane parallel plates contain CaF2, and the total thickness of the liquid layer (24) and the two substantially plane parallel plates The ratio of between 'between ' and 0. 0, preferably between 〇3 and 丨.5, especially preferably between 97112516 35 200903184 between 0.5 and 1. 43. The projection exposure apparatus (1) of claim 41, wherein the total thickness of the two substantially planar parallel plates is in the range of 丨.5 to 15 咖, preferably 2 mm to Within the range of 12 mm. The projection exposure apparatus (1) according to any one of claims 37 to 43 wherein the liquid layer (24) contains water or a high refractive index liquid such as cyclohexane or decaquinone. . The projection exposure 4' device (1) of any one of claims 37 to 44, wherein an additional element (33) for reducing convection in the liquid layer (24) is disposed in Between the delimiting elements (22, 23). 46. The projection exposure apparatus (1) of claim 45, wherein the additional elements (33) are formed in particular as a honeycomb or rectangular partial space (34), and the partial spaces are relative to each other The liquid layer (24) is closed and subdivided. 47. The projection exposure apparatus (1) of claim 45, wherein the additional element is at least one separating element that subdivides the liquid layer (24) into at least two partial layers (24a, 24b) (5)至少), and the at least two partial layers are arranged one after the other in the optical path passing through the optical correction element (21). 48. The projection exposure apparatus (i) of claim 47, wherein the partial layers (24a, 24b) have an average thickness of less than 3 Å, preferably less than 2, particularly preferably less than 1 mm. 49. The projection exposure apparatus (i) of claim 37, wherein the additional element is for thermally insulating the liquid layer (24) from the at least one delimiting element 97112516 36 200903184 (22' 23) At least one insulating layer (51). 50. The projection exposure apparatus (1) of claim 49, wherein the insulating layer (51) is formed by bubbles in a region of the delimiting element (22, 23) facing the liquid layer (24) . The projection exposure apparatus (1) of any one of claims 37 to 5, wherein the refractive index of the liquid is adjusted to a refractive index of the surrounding material in a cold state. The projection exposure apparatus (1) of any one of claims 37 to 51, wherein the liquid layer (24) contains a soluble substance, particularly such as sodium carbonate, calcium chloride, or potassium iodide. Class of salts used to modify their optical properties. A projection exposure garment (1) according to any one of claims 37 to 52, wherein an additional temperature regulating element (4〇) is present for modifying the temperature in the liquid layer (24) distributed. 54. The projection exposure apparatus (1) of claim 53, wherein the temperature adjustment element (4Q) is a resistance heating element or an infrared light source. The projection exposure apparatus (1) according to any one of claims 37 to 54, wherein the optical correction element (21) is disposed in a projection objective (7) of the projection exposure apparatus (1) . 56. The projection exposure apparatus (i) of claim 55, wherein 'at least one optical correction element (2) of the projection objective (7) is disposed in a region of the pupil plane and is spaced apart from the pupil plane by a distance , the distance corresponds to a secondary aperture ratio greater than 0 7 . 97112516 37 200903184 57. The projection exposure apparatus (i) of claim 55 or wherein the optically useful radiation is incident through at least one of the correction elements (21,) a plurality of times, in particular twice. 58. The projection exposure salty (1) of any one of claims 55 to 57, wherein the projection objective (7) is a catadioptric objective having at least two folding mirrors. The projection exposure apparatus (1)' of any one of claims 55 to 58 wherein at least one optical correction element (21) is disposed in a region close to a pupil plane of the wafer. The projection exposure apparatus (1) of any one of claims 7 to 59, wherein the optical correction element (21) has an inlet and an outlet (55) for at least partially replacing Liquid layer (24). 97112516 38