TW200901833A - Apparatus for generating plasma - Google Patents

Abstract

The invention discloses a plasma generating device, for mixing source air and active air at the expected position, comprising: a plasma generating unit; a sprayer, arranged at the lower part of the plasma generating unit, wherein the sprayer and the plasma generating unit are formed into a plasma chamber, including an upper plate structure combined up and down and a lower plate including a plurality of source air injection opens, and a source air flowing space for supplying source air is composed of the upper plate structure and the lower plates structure, and one of which has a plurality of ducts perforated up and down; an active air supply unit, for supplying active air to the plasma generating unit; and a source air supply unit, for supplying source air to the source air flowing space inside the sprayer. Accordingly, the source air and the active air are mixed successfully on the expected position to advance deposition efficiency of plasma.

Description

200901833 IX. Description of the Invention: [Technical Field] The present invention provides a plasma generating apparatus, and more particularly, a method for mixing a raw gas at a surface of a king and a film formed at a planned position. And • Plasma generating devices that activate gases to increase plasma evaporation rates. [Prior Art] Fig. 1 is a schematic view showing a conventional plasma generating apparatus, and Fig. 2 is a cross section showing an enlarged portion of the relationship between the structure of the duct and the lower plate shown in Fig. 1 (refer to Figs. 1 and 2). The conventional plasma generating device includes a plasma generating unit 10, a living gas supply unit 3, a raw gas supply unit 4, and a shower head 5, wherein the unit is white on the support unit. The slurry chamber is provided between the plasma generating unit 10 and the spray head 5〇, and the plasma generated in the plasma chamber is movable to the lower portion of the spray head 5 by a plurality of active gas spray ports 63 formed in the spray head. Active gas The plasma is converted into an ion or radical state when passing through the nozzle 5 ,, and the ion or freely based on the lower portion I of the nozzle 5 可 can be sprayed to the outside. There is a processing space under the nozzle 50, and the treatment is performed. The plasma is processed in the processing space, such as film formation, cleanse, etc. The plasma generating device and its processing space are generally kept in a vacuum state, and the processed material can be mounted on the heater. ^ The plasma generating unit 10 is composed of Plasma 12 and the lower plasma plate 14 are formed, and the upper plasma plate 12 and the lower plasma plate 14 can form a flow tube of the active gas supply unit and a flow tube of the raw gas supply unit 40. The active gas supply unit core 130887. Doc 200901833 The active gas supplied from the flow tube is converted into a plasma when passing through the electrode 13 of the lower portion of the plasma generating unit 10, wherein the electricity generating electrode 18 includes a plurality of holes, so that the active gas can pass efficiently. In the conventional plasma generating apparatus, the head 50 includes an upper plate structure 6 〇 and a lower plate, wherein the upper plate structure 6G is formed with a guide g 62 for providing an active gas nozzle mist 63, and the lower plate structure 7G is formed. The raw gas spray port 74. The active ions or radicals passing through the active gas slit 63 can react with the raw gas passing through the raw gas spray port μ, and the reaction film can be formed on the treated material because the raw gas supply unit according to the structure of the device The flow tube of the 4th tube is connected to the periphery or the outside of the nozzle 5, and the room and the gas are not from the center of the nozzle 50 but flow from the periphery of the nozzle 5'. Therefore, the original gas is sprayed around the surface. More original gas: the result is The center of the conventional plasma generating device is supplied with a small amount of raw gas and is easy to form a thin film in the center of the processing body. Although it can form a thin raft, the thickness of the thin enamel is too small. The 5G raw gas spray head 74 is installed at a position slightly higher than the active gas spray port 63. Because the raw gas supplied by the raw gas spray port is smaller than the active gas supplied by the conduit 62, Therefore, the supply of the raw gas can be disturbed by the active gas, and as a result, the raw gas cannot reach the treated material. As described above, if the right raw gas cannot reach the treated material, the film formed on the treated material is too thin' or the quality is Further, the problem of the prior art is shown in Fig. 2. There is a micro gap G between the duct 62 and the lower plate structure 70 in the nozzle 50, and the original gas will flow out through the micro-gap G. In contrast, active 130887.doc 200901833 gas will flow into the nozzle 5 流 abortion right qi out through the micro-void G, then the raw milk will begin to react with the active gas coming out of the 5 导管 catheter, upon arrival

The reaction will be before the treatment.廿D.匕, left, and bundle, the active gas flows in through the micro-voids G, causing a reaction in the shower head 50. In the meantime, the raw gas or the active gas is wasted. Therefore, the conventional plasma generates the device body and causes deterioration of the film quality. [Summary of the Invention]

The present invention has therefore been proposed to solve the problem and it is an object of the present invention to provide a device for dispensing raw air as planned. The above-mentioned problems existing in the prior art, the plasma which can be uniformly adjusted by the nozzle to supply the raw gas, can be provided. The present invention can provide a kind of material which can be effectively transported to the treatment without being related to the live mist. Plasma generating device. The present invention can include a plasma generating device that can adjust a nozzle between a live gas and a raw gas, and a mixed gas and a raw gas.

The present invention provides an effective barrier between the raw gas and the active gas. Long . In order to achieve the above object, according to one aspect of the present invention, a plasma generating apparatus is provided, which includes a plasma generating unit, a showerhead, an active gas supply unit, and a raw gas supply unit, and the raw gas and the active gas are Mix the location of the plan. a nozzle disposed at a lower portion of the plasma generating unit, the nozzle and the plasma generating unit provide a plasma chamber, and includes an upper plate structure and a lower plate structure, and the upper plate structure and the lower plate structure are combined to provide the original gas movement space. One of the upper and lower plate structures, in particular, includes a catheter, and further includes a blocking wall for blocking the gap between the catheter and one of the two plates. The conduit is generally formed on the upper plate structure. The barrier wall is formed integrally or separately with the lower plate structure to block the gap between the through hole of the lower plate structure and the conduit. In another embodiment, the guide f is formed on In the lower plate structure, the j_block 2 is formed integrally with the upper plate structure "either integrally or separately to block the gap between the through hole of the lower plate structure and the duct.

The present month may include a blocking plate sandwiched between the upper plate structure and the lower plate structure, wherein the upper and lower divided original gas moving spaces are blocked, and the guide holes formed corresponding to the expected original gas distribution are included. The barrier wall may be formed integrally with the upper plate structure or the lower plate structure, or may be formed separately on the (4), and (4) the first reaction of the raw gas and the active gas at a place other than the treatment. The lower end of the guide is mounted above the upper portion of the original gas spray port. In order to achieve the above object, according to another aspect of the present invention, a plasma generating apparatus includes: an electropolymer generating unit; a nozzle disposed at a lower portion of the plasma product, a nozzle and a plasma generating unit Providing an electropolymer chamber' and including a plurality of duct upper plate structures formed downward and a plurality of raw gas spray port lower plate structures formed at a lower portion of the lower end than the duct, the upper plate structure and the lower plate The structure provides the original gas moving space, 1 the lower plate structure includes a nozzle for providing the lower plate blocking wall, and the lower plate blocking wall partially surrounds the official part: the part 'except the original_mouth blocking the original gas moving space; the active gas supply unit is active Gas - ' 々 % 仏 仏 仏 供应 供应 供应 电 电 电 电 电 电 电 电 电 电 电 电 电 电 电 电 电 电 电 电 电 电 电 电 电 电 电 电 电 电 电 电 电 电 电 电 电 电 电 电 电 电 电 电The plasma generating device further includes a blocking plate, wherein the resistance is between the upper plate structure and the lower plate structure, thereby dividing the original gas moving space up and down, and including a guide formed corresponding to the expected original gas distribution. In order to achieve the above object, according to another aspect of the present invention, an electropolymer generating device is provided, which includes: an electric feeding __ 冤 产生 产生 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 ' ' ' ' ' ' ' ' ' ' ' ' The nozzle and the plasma generating unit provide a plurality of conduit upper plate structures and include a plurality of original: buckles; lower plate, "structure, provided by the upper plate structure and the lower plate structure The original gas shifting room's lower plate structure includes a nozzle for providing a lower plate blocking wall, a soil blocking fence, and an outer portion of the 尧v officer; a resistance sandwiched between the upper plate structure and the lower plate structure The brake gas moves the space and includes a guide hole formed corresponding to the expected original gas! cloth; an active gas supply unit, an active gas supply: a plurality of active gas supplies to the electricity supply; and a raw gas supply unit, the original gas: The unit should supply the raw gas to the raw gas moving space located in the nozzle. The lower end of the guide is installed at a position slightly higher than the original gas spray port. [Embodiment] The present invention is described in detail with reference to the accompanying drawings. It will be understood by those skilled in the art that the exemplary embodiments of the present invention are merely illustrative of the fact that they can be converted or modified into different forms. Fig. 3 is a view showing a plasma generating apparatus which is not according to an exemplary embodiment of the present invention. The view is shown in Fig. 3, and Fig. 4 is a view showing a partial cut of the head according to Fig. 3. 130887.doc -10- 200901833 Referring to Figures 3 and 4', the plasma generating apparatus 丨00 includes a plasma generating unit 110, a showerhead 150, a barrier wall 178' active gas supply unit 13A, and a raw gas supply unit 140. The nozzle 150 and the plasma generating unit 11 are mounted on the supporting unit 120, and the supporting unit 12 is provided with a hole in the middle, so that the plasma generated by the plasma generating unit 110 can be transported to the workpiece through the hole. The electric power generation unit 110 includes an upper plasma plate 112, a lower plasma plate (UYlower plasma plate), and a space plate 116 (spaCe plate). The upper plasma plate 112 and the lower plasma plate 114 are disposed on the upper and lower portions, and the holes or grooves are formed in the upper plasma plate 112 and the lower plasma plate 114 to become the active gas supply unit 30 and the raw gas supply unit 14 The gas flow path. The plasma generating unit 110 includes a plasma generating electrode 118, and the plasma generating electrode 118 is disposed under the lower plasma plate 114. The active gas is supplied from the active gas supply unit 130 to the upper portion of the plasma generating electrode 118, and a plurality of holes are formed in the plasma generating electrode 118 to pass the active gas through the plasma removing chamber. The plasma generating unit 110 can generate electric music in accordance with an ICP (Inductive c〇upled piasma) or CCP (Capacitive Coupling Plasma) method, such as an RF power source, which can be supplied to the plasma generating electrode 8 . A space plate 116 may be provided at a lower portion of the lower plasma plate 114. The space plate 116 maintains the distance between the lower plasma plate 114 and the shower head 15 at a fixed distance to provide electric water to the two plates 116 as an insulating material. Electrically isolated from the plasma generating unit 丨丨〇 and the shower head 150. For this reason, the insulating material forms the space plate (1) or the insulating plate is used to make the space plate 116 have an insulating property. The gas flow path for the eyebrow and gas supply unit 14兀 can be formed on the lower space plate 116, and the raw gas supply unit 130887.doc -11 - 200901833 140 can be sprayed with the lower space plate ΐ6 The head 150 is connected around.

The nozzle (10) includes an upper plate structure 16 〇 and a lower plate structure 1 〇. The upper plate structure 16A is formed in a disc shape or other disc shape, and includes a duct 162 that protrudes downward. The conduit _ 彡 is a shape that penetrates up and down to provide an active gas spray port 163. The plasma can be delivered to the lower part of the spray head by the active gas spray σ ί63, which can be converted to ions or free radicals during transport. The lower plate structure is mounted on the lower portion of the upper plate structure (10) and includes a J plate through hole m and an original nozzle mist σ 174 which are opposite to the pipe (6). The lower end of the lower plate through hole 172 is formed by the lower end of the nozzle 162 exposing the raw gas spray port (7), and the lower plate is penetrated around the hole 172, that is, around the pipe 162, and the spray can be sprayed. The blocking wall H is formed upwardly around the lower plate through hole m. The blocking wall 178 and the shape of the duct 162 are formed in a cylindrical shape, and the inner bore of the blocking wall 78 is formed to have the same size or ratio as the outer contact of the duct 162. The outside of the guide f 162 is slightly larger. The original moving space is blocked by the wall (7)

Completely isolated from the outside, it is possible to prevent the inflow and outflow of the air in the gap between the duct 162 and the lower plate through hole 17. As shown in the figure, if the raw gas is supplied to the nozzle 丨5〇+Bei by the raw gas supply unit 140, the raw gas can be blown by the spray port 174 formed at the base of the lower plate structure 17〇. Ion-& forms a ruthenium film on the treated material. The raw gas spray port 174 is formed between the lower plate through hole 172 or the resistor 178, and it is known that θ is strong /, the number 1 and the size can be formed into various types according to the intention of the designer. Referring to Fig. 4, the raw gas supply unit 14 is supplied with the same atmosphere from the outside along the outside of the shower head 150 by the same 130887.doc • 12· 200901833. The raw gas supplied from the raw gas supply unit 140 is supplied to the nozzle through the outside of the t-plate structure 16G, and the original gas from the surroundings: ... is temporarily left in the original gas moving space, and is descended by the raw gas spray port 1 The lower portion of the plate structure 170 is sprayed. Figure 5 is a cross-sectional view showing a plasma generating apparatus in accordance with another exemplary embodiment of the present invention. In the following embodiments, the components other than the head are the same as those in Figs. 3 and 4, and the same reference numerals are used for the same components, and the repetitive description thereof will be omitted. Referring to FIG. 5'f, the destruction occurs, including the electro-polymerization unit ιι, the nozzle 250, the barrier ring 278, the active gas supply unit 13 and the raw gas supply unit 140, and the plasma generating unit u〇. Mounted on the support unit 丨2〇, the branch unit 120 provides an intermediate hole, and the plasma formed by the electropolymerization unit n〇 can be transported to the processing object through the intermediate hole. The electro-polymerization unit 11 includes an upper plasma plate 112, a lower plasma plate ι 4, and a space plate 116, wherein the upper plasma plate 112 and the lower plasma plate 114 are disposed above and below. Holes or grooves of the gas flow path of the poetic active gas supply unit 130 and the raw gas supply unit 14 are formed on the upper plasma plate 112 and the lower plasma plate 114. The plasma generating unit no includes a plasma generating electrode 218, and the ion generating electrode 218 is supplied with an active gas to form a plasma. An upper barrier ring 278 is provided around the conduit 162 adjacent the lower plate through hole 272. The barrier ring 278' is preferably made of a material that does not react with the active gas and the raw gas. The barrier ring 278 is attached to the outside of the conduit 162 to prevent active gas ions or radicals from flowing into the showerhead 250 and prevents the original airflow from flowing out. 130887.doc -13- 200901833 The gap between the conduit 162 and the through hole 272. Step-by-step, blocking the top of the ring prevents active gases and raw gases from reacting unplanned. In addition, the barrier ring is not limited to the ring shape, but may be formed in other shapes, and functions as a barrier wall as a convex barrier ring formed with the catheter body. FIG. 6 is a view showing another aspect of the present invention. Fig. 7 is a plan view showing a portion of the head of the nozzle of Fig. 6 in accordance with Fig. 6 in a sectional view of Fig. 7;

The constituent elements other than the head in the following embodiments are the same as those in Figs. 3 and 4, and the same reference numerals are used for the same constituent elements, and the repeated description thereof will be omitted. Referring to FIGS. 6 and 7, the plasma generating apparatus 1 includes a plasma generating unit 11 and a second nozzle 350, a blocking plate 380, an active gas supply unit 130, and a raw gas supply unit 140. The showerhead 350 includes an upper plate structure 16A, a lower plate structure 37A, and a blocking plate 380. - If the raw gas is supplied to the head 35 () by the raw gas supply unit 14 (), the raw gas can be sprayed toward the spray port 374 by the blocking plate 380. The blocking plate 380 is sandwiched between the upper plate structure 丨6〇 and the lower plate structure 37〇. The blocking plate 380 divides the original gas moving space formed between the upper plate structure 16 〇 and the lower plate structure up and down, and adjusts the original gas only through the designated passage, that is, the guide hole 386 ° and the position of the guide hole 386 can be selected. In order to evenly distribute the raw gas or meet other conditions, or to supply the raw gas in a concentrated manner, the position and number of the guide holes 3 86 can be adjusted. In the embodiment of the present invention, the via hole is mainly formed in the head 0~' so the original gas moves to the center in the moving space, and the main 130887.doc -14-200901833 is to be supplied to the center to prevent the center film from being thinner. phenomenon. Referring to Fig. 7, the raw gas from the raw gas supply unit 14 is supplied to the head 35 through the outside of the upper plate structure 160, and the raw gas supplied from the periphery is accumulated toward the center through the guide hole 386 formed at the center of the blocking plate 380. The raw gas supplied by the guide hole 6 is uniformly supplied under the baffle plate 38, and the raw gas is evenly distributed by the raw gas spray port 374 of the lower plate structure 370. The intermediate through hole M2 for penetrating the duct 162 is formed in the blocking plate 380, and the duct 162 is exposed to the lower portion of the head 350 through the intermediate through hole 382 and the lower plate through hole 372. The south of the exposed conduit 362 can be adjusted as intended by the designer. Figure 8 is a cross-sectional view showing a plasma generating apparatus according to another exemplary embodiment of the present invention, and Figure 9 is a plan view showing a partially cutaway portion of the head according to Figure 8. In the following embodiments, the components other than the head are the same as those in FIGS. 3 and 4, and the same reference numerals are used for the same components, and the description thereof will not be repeated. Referring to Figs. 8 and 9, the plasma generating apparatus 1A includes a plasma generating unit 410, a shower head 450, a blocking plate 480, an active gas supply unit 13A, and a raw gas supply unit 140. The nozzle 450 and the plasma generating unit 11 are mounted on the supporting unit 120, and the supporting unit i 2 is provided with an intermediate hole through which the plasma generated by the plasma generating unit 110 is transported to the processed object. The showerhead 450 includes an upper plate structure 460, a lower plate structure 47〇, and a blocking plate 48〇. As shown in the figure, if the raw gas is supplied to the nozzle 45 by the raw gas supply unit 14〇, the raw gas can be sprayed through the barrier 480 and then sprayed through the raw gas spray port 474. 130887.doc -15-200901833 upper plate structure 160 The tube 486 with the lower plate structure 47 is moved to the lower plate structure 47, and the mist can be first. Since the blocking plate 480 is lost, the raw gas can only be supplied to the center through the guide. The raw gas supplied through the guide hole 486 is in the lower part of the obstruction plate 480, and the raw gas spray port 474 of the lower plate structure 470 is uniformly formed on the treated object so that the film can be formed into a uniform sentence on the treated object. The thickness. ', the ground supply air, forming a through hole in the middle of the blocking plate 480 for penetrating the conduit 162

482, an intermediate resistive wall 488 surrounding the conduit ία may be formed around the intermediate through-hole 482. The conduit (6) can be exposed to the lower portion of the showerhead 450 by the intermediate barrier wall and the lower panel barrier wall 478. The intermediate barrier wall may prevent the phenomenon that the raw gas is transferred to the lower plate structure 470 by the gap between the blocking plate _ and the guide f 462. Figure 10 is a cross-sectional view showing another apparatus in accordance with the present invention. Plasma generation of an exemplary embodiment In the following embodiments, constituent elements other than the shower head are shown in Figs. 3 and 4

The constituent elements (4) are the same as those of the same constituent elements, and the repeated description thereof will be omitted. The reference 10' electric power generating device (10) includes a plasma generating unit 11A, a head 550 active gas supply unit 13A, and a raw gas supply unit. The head 550 includes a guide 162, a raw gas moving space, and a raw gas spray port guide 162 formed in a shape that is vertically penetrated to provide an active gas spray port (6). The electropolymer is transferred to the lower part of the nozzle by the active gas spray port (6), and the plasma can be converted into ions or radicals during the transfer. A nozzle space 164 is provided below the conduit 162, the interior of the conduit (6) and the nozzle 130887.doc • 16 · 200901833 The space 164 provides an active gas spray port l63. The lower end of the guide 162 is located slightly above the original gas spray port (7). Therefore, the raw gas starts to be sprayed at a position slightly lower than the active gas, and although the shortage of the raw gas supply is small, it is not hindered by the active gas and is affected, so that the processed material is efficiently reached. If the raw gas is supplied to the nozzle 5 by the raw gas supply unit 14A, the raw gas is sprayed by the raw gas spray port 574 formed at the base of the lower plate structure 570. The raw gas of the spray together with the active gas forms a film on the treated material. Figure η is a cross-sectional view showing a plasma generating apparatus according to another embodiment of the present invention, and Figure 12 is a plan view showing a partial cut of the head according to Figure u. In the following embodiments, the components other than the head are the same as those in FIGS. 3 and 4, and the same reference numerals are used for the same components, and the description thereof will not be repeated. Referring to FIG. 11 and FIG. 12, the plasma generating apparatus 100 includes a plasma generating unit 110, a head 650, an active gas supply unit 13A, and a raw gas supply unit 140. The shower head 650 and the plasma generating unit 11 are mounted on the support unit 12A. The nozzle 650 includes an upper plate structure 16 0 and a lower plate structure 6 7 〇. In the lower plate structure 670, the raw gas spray port 674 is installed at a lower portion than the conduit 162. Therefore, the raw gas sprayed from the raw gas spray port 674 is sprayed on the lower portion than the active gas. Although the raw gas supply is small, it is not hindered by the active gas, so it can be effectively processed. Things. And the inner diameter of the lower plate blocking wall 678 is larger than the inner diameter of the pipe ι 62, so that a larger nozzle space 164 can be formed around the lower plate through hole, that is, the lower portion of the pipe 162. The lower plate blocking wall 678 is formed in a cylindrical shape corresponding to the shape of the duct 162, and the inside of the lower plate blocking wall 678 is formed to have the same size as or slightly larger than the outer contact of the duct 162. In particular, the lower plate blocking wall 678 surrounds the conduit 162 and the lower outer portion so that the raw gas moving space 652 inside the shower head 65A can be blocked. The barrier wall 678 prevents active gas ions and the original clusters sprayed by the active gas spray port 163 from flowing into the shower head 65 and prevents the active gas and the raw gas from reacting in an unplanned place. The barrier wall 678 is not limited to the use for separating the original moving space from the outside, and the raw air spray port 674 is located at a lower portion than the lower end of the duct 62. In order that the raw gas spray port 674 is located at a lower portion than the lower end of the guide g 62, the lower plate barrier wall 678 is formed such that the guide g 162 is longer and is mounted while the upper plate structure i 6 〇 and the lower plate structure 67〇 is formed to be isolated at a certain distance. It is formed in the upper plate structure i in the implementation of the present invention, and is sometimes guided on the lower plate structure, and a through hole is provided in the upper plate structure. At this time, a certain height can be formed between the lower end of the conduit and the raw gas spray port to provide a nozzle space at the lower portion of the conduit. Fig. 13 is a view showing a plasma generating apparatus according to another exemplary embodiment of the present invention. Fig. 14 is a plan view showing a portion of the head according to Fig. 13 cut away. In the following, the components other than the heads are the same as those in FIGS. 3 and 4, and the same reference numerals are used for the same components, and the description thereof will not be repeated. 130887.dc 200901833 Referring to Figures 13 and 14, the f-generation device! (10) A plasma generating unit 11A, a head 750, a blocking plate, an active gas supply unit 13 (), and a raw gas supply unit 140 are included. The showerhead 750 includes an upper plate structure 丨6〇 and a lower plate structure 77〇. In the lower plate structure 770, the raw gas spray port 774 is installed at a lower portion than the conduit 162. Therefore, the raw gas starts to be sprayed on the lower portion than the active gas. However, the raw gas supply is small, but it is not hindered by the active gas, so that the treatment can be efficiently reached. As a result, there is no waste of the original gas, a good film can be obtained, and the deterioration of the film due to the exhaustion of the original gas can be prevented. The inner diameter of the lower plate baffle wall 778 is larger than the inner diameter of the conduit 162, so that a larger nozzle space 164 can be formed in the lower portion of the lower plate through hole, i.e., below the conduit 162. The nozzle space is formed downwardly. Specifically, it is formed into a heart shape or a cylindrical shape similar to that of a staircase. The gas is sprayed from the duct 162, and the nozzle space 764 can be widened, so that it can be effectively mixed with the original gas. The barrier wall 778 is formed in a cylindrical shape corresponding to the shape of the duct 162, and the inside of the lower panel barrier wall 778 is formed to have the same size or slightly larger than the outer contact of the duct 162. In particular, the lower plate resists the wall Μ around the 162 and the lower outer portion, so that the original space 752 of the nozzle 75_ can be blocked. The barrier wall 778 prevents the dioxoderm ions and the original cluster sprayed by the active gas spray port (6) from flowing into the mouth 75 , and prevents the active gas and the raw gas from reacting in an unplanned place. ', 丄 所 所 被 被 被 被 被 被 被 被 被 被 被 被 750 750 750 750 750 750 750 750 750 , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , . Since the original air mist port 774 is sandwiched between the upper plate structure 160 and the lower plate structure 77, the m moves through the guide f 786 to the lower plate structure 77g, and can be supplied to the center first. The original gas supplied from the guide hole 786 uniformly supplies the original gas spray port 774 of the lower plate structure 770 evenly under the baffle plate 78, so that the film is formed to have a uniform thickness on the treated object. . An intermediate through hole for penetrating the conduit 162 is formed on the blocking plate 780, and a periphery of the intermediate through hole is formed to surround the conduit 162 around the conduit 162. The conduit 162 is passed through the intermediate barrier wall (10) and the lower portion. The plate blocking wall 768 can be exposed to the lower portion of the showerhead 750. The intermediate barrier wall prevents the original air from being transmitted to the lower plate structure by the gap between the P-board 78G and the guide 162. Invented plasma generating apparatus 'the original gas can be uniformly distributed by supplying the raw gas to the nozzle, and the original gas distribution can be adjusted as planned. The electropolymerization device of the present invention allows the raw gas and the active gas to react only in the treated material to prevent the reaction from being carried out in an unplanned place, i.e., at the outlet of the conduit or in the spray head. Therefore, the wave of original gas can be prevented to improve the quality of the place. The electric power generating device of the present invention can adjust the distance between the raw gas and the active gas nozzle mist σ by adjusting the height of the barrier wall to obtain optimum conditions for gas utilization and reaction. And the present invention has been shown and described with respect to the specific exemplary embodiments thereof, and it is understood by those skilled in the art that the invention may be made without departing from the spirit and scope of the invention as defined by the scope of the invention. Forms and details on 130887.doc -20- 200901833 Various changes. Therefore, various changes and modifications can be made by those skilled in the art based on the principles of the invention within the scope of the invention. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic view showing a conventional plasma generating apparatus; Fig. 2 is a view showing a majority of the relationship between the guide and the lower plate structure of the η from the top of the mouth shown in Fig. 1. FIG. 3 is a cross-sectional view showing a mounting according to the present invention; a top view of a cut-away; 'exemplary embodiment plasma generation

Figure 4 is a cross-sectional view showing another embodiment of the present invention according to Figure 3; Figure 6 is a cross-sectional view showing another embodiment according to the present invention; Figure 7 is a view showing the head according to Figure 6 - Figure 8 is FIG. 9 is a cross-sectional view showing another portion according to the present invention; a partially cut top view; an exemplary embodiment plasma generation - an exemplary implementation; FIG. A top view of a portion of a plasma-generating portion; an exemplary embodiment of plasma generation

1 is a cross-sectional view showing another embodiment according to the present invention; FIG. 12 is a cross-sectional view showing another embodiment according to the present invention; An exemplary embodiment of a plasma generating device 130887.doc 21 200901833 Figure 14 is a plan view showing a portion of the head according to Figure 13 cut away [Major component symbol description] 10 Plasma generating unit 12 Upper plasma plate 14 Lower plasma plate 18 Plasma generating electrode 30 Supply unit 40 Raw gas supply unit 50 Head 60 Upper plate structure 62 Pipe 63 Active gas spray port 70 Lower plate structure 74 Raw gas spray port 100 Plasma generating device 110 Plasma generating unit 112 Power-on Pulp board 114 Lower plasma board 116 Space board 118 Plasma generating electrode 120 Support unit 130 Active gas supply unit 140 Raw gas supply unit 150 Nozzle 130887.doc -22· 200901833 160 Upper plate structure 162 Pipe 163 Active gas spray port 170 lower plate structure 172 lower plate through hole 174 original gas spray port 178 barrier wall 272 through hole 278 upper blocking ring 250 nozzle 350 Head 380 Barrier plate 370 Lower plate structure 372 Lower plate through hole 382 Intermediate through hole 386 Guide hole 374 Raw gas spray port 410 Plasma generating unit 450 Nozzle 470 Lower plate structure 474 Raw gas spray port 478 Lower plate blocking wall 480 Block Plate 482 intermediate through hole 130887.doc -23 - 200901833 486 conduit 488 intermediate barrier wall 550 nozzle 552 original gas moving space 574 raw gas spray port 650 nozzle 652 original gas moving space 670 lower plate structure 674 raw gas spray port 678 lower plate blocking wall 750 nozzle 752 original gas moving space 770 lower plate structure 774 raw gas spray port 778 lower plate blocking wall 780 blocking plate 786 pipe 788 intermediate blocking wall G micro-void 130887.doc -24-

Claims (1)

200901833 X. Patent application scope: 1. A plasma generating device, comprising: an electric crack generating unit; a nozzle and the upper plate structure of the electric junction and an active gas spray plate structure and an original to the plasma gas a nozzle on the lower portion of the electropolymerization unit, the slurry is provided to provide a plasma chamber, and includes a top and bottom structure and a lower plate structure including a plurality of raw gas spray ports, the original plate structure providing the original The air moving space, i includes a guide for providing a mist, which is formed by the upper and lower sides of the lower plate structure; the active gas supply IA 'the active gas supply unit unit is actively supplied And a raw gas supply unit that supplies the raw gas to the moving space of the nozzle; the raw gas and the active gas are mixed at a planned position. 2. The request device 产生 产生 产生 产生 产生 包括 包括 包括 包括 包括 包括 包括 包括 包括 包括 包括 包括 包括 包括 包括 包括 包括 包括 包括 包括 包括 包括 包括 包括 包括 包括 包括 包括 包括 包括 包括 包括 包括 包括 包括 包括 包括 包括 包括 包括The plasma generating device of claim 2, wherein the upper plate structure and the lower plate structure comprise through holes, the through holes exposing the conduits, the barrier walls being disposed on the conduits to block the #catheters and the like a gap between the through holes. 3 4. The plasma generating device of claim 2, wherein the blocking wall includes an intermediate blocking wall formed by an upper portion of the blocking wall, wherein the intermediate blocking wall has a corresponding portion in the middle through hole Formed on the outside for covering the outside of the conduits. 130887.doc 200901833 5. The electrical generation device of the request item, further comprising a resisting plate, wherein the plate is clamped to the upper plate structure and the lower plate structure Between the plate structures, thereby cutting the raw gas moving space up and down, and including a guide hole formed corresponding to the expected original gas distribution. 6. The plasma generating device of claim 5, wherein the lower plate structure of the nozzle comprises 4th pipe is exposed downward to the lower plate through hole, etc. The plate through hole is formed to have a size in contact with the outer portion of the pipes. 7. The electrocoagulation device of claim 5, wherein the block plate includes an intermediate through hole of the intermediate through hole It has the size of the external contact with the 5 Xuan special conduit. 8. As requested by the generators, the lower end of the conduits is mounted above the upper portion of the original gas spray port. 9. As requested in item 8 An electropolymerization device, the step further comprising a nozzle space adjacent to the gas under the conduit, wherein the nozzle space is formed below the active body haze. 10. The electromagnet generating device of the request, wherein the plasma generating unit The utility model comprises a lower-mounted electric generating electrode, wherein the plasma generating electrode comprises a plurality of holes: the active gas supply unit generates an electrode active gas to the electric enthalpy. 丨和 u. A plasma generating device, comprising: a slurry generating unit; a nozzle of the lower portion of the generating unit; the nozzle: generating an early element together to provide an electropolymer chamber, and including a plurality of guide upper plate structures formed downward and including forming The lower end of the conduit is slightly lower;: 130887.doc 200901833 The plate structure under the sigma gas spray port of the σρ position, the original gas moving space is provided by the upper plate structure and the lower plate and the σ structure, wherein the lower plate structure includes the lower The block barrier J partially surrounds the ducts except for the raw gas spray ports, and blocks the raw gas moving space; an active gas supply unit that supplies the active gas to the electricity generating unit And a raw gas supply unit that supplies the raw gas to the raw gas moving space in the nozzle. 12. The apparatus of claim 1, further comprising a blocking plate, wherein the damping plate is sandwiched between the upper plate structure and the lower plate structure, thereby dividing the original moving space 'up and down' and including and expected The original gas is distributed correspondingly to the guide holes. 13. A plasma generating apparatus, comprising: a plasma generating unit; a showerhead disposed at a lower portion of the power generating unit, the showerhead and the electro-convergence generating unit providing an electric paddle chamber to include a plurality of conduit upper plate structures formed downward and including a plurality of raw gas spray ports a plate structure, the raw gas (four) space is provided by the upper=ji configuration, and the under-plate structure comprises a barrier wall surrounding the outer portion of the pipes, sandwiching the upper plate structure and the lower plate to divide the original gas a guide hole formed correspondingly in the moving space; a blocking plate between the barrier gas distribution structure, and including an expected active gas supply unit, the unit supplies the active gas; and the active gas supply unit generates the plasma to the plasma I30887.doc 200901833 a gas supply unit that supplies the raw gas to the raw gas moving space located in the shower head. 14. The plasma generating apparatus of claim 13, wherein the τ忒寺 guide is slightly above the upper portion of the raw gas spray port. Zhiwen installed ί 130887.doc