200842993 九、發明說明： 【發明所屬之技術領域】 本發明係涉及一種 別是指其氣體檢測裝置 曰曰圓密封供氣設備之相 之創新型態設計者。 關裝置，斗寺 【先前技術】 按曰曰圓於製程輸送過程中，必須將其置於晶圓 ，以確保晶圓處於最潔淨的環境中，且進-步再藉由：體 自動充填裝置的組§己n氣或鈍氣輸人晶圓盒空間中， 设猎由抽真空裝置將該輸人晶圓盒巾之氮氣或鈍氣加以抽 出，此抽出過程中，可將對晶圓表面造成傷害之腐蝕性氣 體-併抽出Μ吏晶圓盒空間内達到充滿高純度氮氣或鈍氣 之狀態，藉此以提昇晶圓製程之品質。 有關上述氣體自動充填裝置之結構型態，如臺灣專利 公告第527681號之「將氣體自動充人裝載璋上的晶圓盒之 裝置」所揭露者，其大致上係包括貫穿晶圓盒底座之進、 排氣孔，設置於裝載埠下方之進、排氣閥及管路，以及氣 體提供裝置、抽真空裝置和控制電路，其運作上，係由該 氣體提供裝置輸出氣體，經進氣閥及進氣管路進入晶圓盒 中，復藉由抽真空裝置之運作，將晶圓盒中之氣體經由排 氣管路及排氣閥抽出外部；惟，此種習知結構於實際應用 上仍存在下述之問題點： 该案中雖未揭露說明，但此所述氣體自動充填裝置於 其管路預定位置處通常會進一步組設有氣體偵測器，藉以 5 200842993 檢測管路中及晶圓盒空間中之 氣體充填之品質及運·作正常性 個問題點，即，目前習知結構 设於管路上，然，管路中之氣 故氣體偵測器所檢測到的氣體 大的誤差值，而晶圓盒為可移 器亦不可能組裝於該晶圓盒空 點’如何研發出一種更具理想 相關業界再加以思索突破之目 有鑑於此，發明人本於多 與設計經驗，針對上述之目標 終得一確具實用性之本發明。 氣體濃度狀態，藉此以控管 ’然而，此其間仍舊存在一 中’係將所述氣體偵測器組 體係為流動之不穩定狀態， /展度正確性顯然存在著相當 動拆換之空間，故氣體偵測 間中，是以，針對此一問題 實用性之創新構造，實有待 標及方向者。 年從事相關產品之製造開發 ’詳加設計與審慎評估後， 【發明内容】 本备明之主要目的，係在提供一種晶圓密封供氣設備 之氣體檢測裝置，其所欲解決之問題點，係針對習知晶圓 密封供氣設備之氣體偵測器係組設於管路上而存在無法獲 得正確氣體濃度狀態之問題點加以思索突破；所述晶圓密 封供氣設備係包括一氣體供應裝置、一藉以連結該氣體供 應裝置與晶圓盒之進氣管路、一抽氣裝置、一藉以連結該 抽氣裝置與晶圓盒之排氣管路，其中該進、排氣管路上並 組設有控制閥；而所述氣體檢測裝置係藉以檢測該等管路 與晶圓盒空間中之氣體狀態。 本舍明解決問題之技術特點’在於該氣體檢測裝置係 包括：一氣室，該氣室設有進、出氣部，該進、出氣部係 6 200842993 與晶圓盒之排氣管路相通’猎以可將該排氣管路中之氣體 導入氣室中；至少一氣體感測器，藉以感測前述氣室中之 氣體狀態者。 進一步地，該氣室後置位置之排氣管路上並可再組設 有一旁通閥，藉該旁通閥之設置，以令該氣室及晶圓盒内 之氣壓得與外部環境氣壓保持一致，使晶圓盒不致發生形 變者。 藉此創新獨特設計，使本發明對照先前技術而言，大 致可達到如下優點： 由於本創作係提供一氣室以將晶圓盒排氣管路中之氣 體導入，俾可藉由該氣室形成一穩定之氣體容置空間，再 於該氣室組設氣體感測器，藉此將能夠測得較為穩定精確 之氣體》辰度狀怨’獲得^一精確之檢測值，進以有效提昇晶 圓密封供氣設備之氣體監控品質者。 【實施方式】 請參閱第1 、2圖所示，係本發明晶圓密封供氣設備 之氣體檢測裝置之較佳實施例，惟此等實施例僅供說明之 用在專利申凊上並不受此結'構之限制；所述晶圓密封供 氣設備A係包括一氣體供應裝置1〇、一藉以連結該氣體供 應裝置10與晶圓盒2〇之進氣管路u、一抽氣裝置3〇、一藉 以連結該抽氣裝置3〇與晶圓盒2〇之排氣管路31，其中，該 進氣g路11、排氣管路31上並各別組設有控制閥U、犯·， 而所述氣體檢測裝置4〇，係藉以檢測前述該等管路與晶圓 7 200842993 該氣體檢測 盒20空間中之氣體狀態（如含氮氣之濃度） 裝置40係包括： 一氣至41，該氣室41係設有至少一進氣部Μ〗及一出 氣部412，該進1氣部411、412之相對 晶圓盒20之排氣管路31相連通，藉以可將該排氣管路Μ中 之氣體導入該氣室41中； 至少一氣體感測器42，係可組設於氣室41之_側部， 藉以可感測前述氣室41中之氣體狀態者； 一旁通閥43，係組設於該氣室41後置位置之排氣管路 31上，藉以令該氣室41以及晶圓盒2〇空間内之氣壓與外部 環境氣壓保持一致，亦即，設置該旁通閥43之目的，係當 抽氣裝置30之抽氣動作所造成之負壓大於氣體供應裝置ι〇 之氣體輸出壓力時’可透過該旁通閥43引入外部氣壓，以 達到穩壓、防止晶圓盒20、氣室41因負壓而内凹變形損壞 之防護目的者。 其中，所述氣體感測器42係可藉以感測該氣室中所含 氮氣或鈍氣之濃度；亦或者可藉由該氣體感測器42之設置 ，達到偵測是否有氣體導入錯誤情形之偵錯功能者。 藉由上揭之結構組成設計，茲就本發明之使用狀態說 明如下： 本發明之主要核心設計係在於該氣體檢測裝置4〇係包 括氣室41、氣體感測器42、旁通閥43所構成之構造型態， 至於該晶圓密封供氣設備Α之運作原理及結構部份係為習 8 200842993 者其運作時’請參第1 、2圖所示，氣體供應裝置10 啟動時所輸出之氣體（如氮氣或鈍氣）係經由其進氣管路 11、控制閥12、進入晶圓盒20空間中，另一方面，藉由該 抽氣I置30之運作抽吸’使得晶圓盒2〇内之氣體得再經由 排氣g路31、控制閥32排出外部；此過程中，經過該排氣 吕路31之氣體^如第2圖所示，將可進入所述之氣室41中 形成一穩定容置而流動性趨於緩慢之狀態，此時，即可藉 由忒氣體感測器42進行該氣室41内部氣體ψ之狀態檢測者 〇 【本發明之優點】 由於本創作係提供一氣室以將晶圓盒排氣管路中之氣 體導入，俾可藉由該氣室形成一穩定之氣體容置空間，再 於該氣室組設氣體感測器，故可將晶圓盒排氣管路中之氣 體導入一個空間中令其穩定容置其中，藉此將能夠測得較 為穩疋精確之氣體濃度狀態，獲得更加精確之檢測值，進 以有效提昇晶圓密封供氣設備之氣體監控品質者。 上述實施例所揭示者係藉以具體說明本發明，且文中 雖透過特定的術語進行說明，當不能以此限定本發明之專 利範圍；$悉此項技術領域之人士t可在瞭解本發明之精 神與原則後對其進行變更與修改而達料效之目的，而此 等變更與修改’皆應涵蓋於如后所述之申請專利範圍所界 9 200842993 【圖式簡單說明】 測裝置與晶圓密封供氣設備組 圖。 測裝置之平面圖。 第1圖：本發明所揭氣體 配狀態之平面簡 第2圖：本發明所揭氣體 【主要元件符號說明】200842993 IX. Description of the Invention: [Technical Field] The present invention relates to an innovative type designer who refers to the phase of a gas detecting device that is a round-sealed gas supply device. Off device, Doji [Prior Art] Pressing the circle during the process transfer process must be placed on the wafer to ensure that the wafer is in the cleanest environment, and further by: automatic filling device The group § has been gas or blunt gas into the wafer cassette space, and the hunting device is used to extract the nitrogen or the blunt gas of the input wafer box by the vacuum device, and the wafer surface can be extracted during the extraction process. Corrosive gases that cause damage - and are extracted out of the chamber space to achieve high purity nitrogen or blunt gas, thereby improving the quality of the wafer process. The structural type of the gas automatic filling device described above, such as the device disclosed in Taiwan Patent Publication No. 527681, "Automatically charging a gas cartridge on a wafer cassette", generally includes a substrate extending through the wafer cassette. Inlet and exhaust holes, inlet and exhaust valves and pipes disposed under the loading port, and gas supply means, vacuuming device and control circuit, in operation, the gas supply device outputs gas through the intake valve And the intake pipe enters the wafer cassette, and the gas in the wafer cassette is taken out through the exhaust pipe and the exhaust valve by the operation of the vacuuming device; however, the conventional structure is practically applied. The following problems still exist: Although the description is not disclosed in the case, the gas automatic filling device usually further sets a gas detector at a predetermined position of the pipeline, thereby detecting the pipeline in the pipeline of 5 200842993. The quality of the gas filling in the wafer cassette space and the normality of the operation and the normality of the operation, that is, the conventional structure is disposed on the pipeline, however, the gas detected in the gas detector in the pipeline is large. The difference, and the wafer cassette as a mover can not be assembled in the wafer box. How to develop a more ideal industry and then think about it. In view of this, the inventor has more experience and design experience. For the above-mentioned objectives, the present invention is finally practical. The state of the gas concentration, thereby controlling the tube 'however, there is still one in the middle of the system, the gas detector group system is in an unstable state of flow, and the correctness of the spread is obviously a space for dynamic replacement. Therefore, in the gas detection room, the innovative structure for practical use of this problem is subject to the standard and direction. After the detailed design and careful evaluation of the manufacturing and development of related products, [The content of the invention] The main purpose of the present invention is to provide a gas detecting device for a wafer sealed gas supply device, and the problem to be solved is The gas detector of the conventional wafer sealing gas supply device is set on the pipeline and there is a problem that the correct gas concentration state cannot be obtained; the wafer sealing gas supply device includes a gas supply device, An air intake pipe connecting the gas supply device and the wafer cassette, an air suction device, and an exhaust pipe connecting the air suction device and the wafer cassette, wherein the inlet and exhaust pipes are combined with a control a valve; and the gas detecting device is configured to detect the state of the gas in the pipeline and the pod space. The technical feature of the present invention is that the gas detecting device comprises: a gas chamber having an inlet and outlet portion, and the inlet and outlet portions 6 200842993 are connected to the exhaust pipe of the wafer cassette. The gas in the exhaust line can be introduced into the air chamber; at least one gas sensor is used to sense the state of the gas in the air chamber. Further, a bypass valve may be further disposed on the exhaust line of the rear position of the air chamber, and the bypass valve is disposed to maintain the air pressure in the air chamber and the wafer box and the external ambient air pressure. Consistently, the wafer cassette will not be deformed. With this innovative and unique design, the present invention can achieve the following advantages in comparison with the prior art: Since the present invention provides a gas chamber for introducing gas in the discharge tube of the wafer cassette, the gas chamber can be formed by the gas chamber. A stable gas accommodating space, and then a gas sensor is arranged in the gas chamber, thereby being able to measure a relatively stable and accurate gas, and to obtain an accurate detection value, thereby effectively increasing the crystal The gas monitoring quality of the round sealed gas supply equipment. [Embodiment] Please refer to Figures 1 and 2, which are preferred embodiments of the gas detecting device for the wafer sealing gas supply device of the present invention, but these embodiments are for illustrative purposes only and are not used in patent applications. The wafer sealing gas supply device A includes a gas supply device 1 , an inlet pipe u connecting the gas supply device 10 and the wafer cassette 2 , and a pumping gas. The device 3 is connected to the exhaust pipe 31 of the air pumping device 3 and the wafer cassette 2, wherein the air inlet g1 and the exhaust pipe 31 are respectively provided with a control valve U. The gas detecting device 4 is configured to detect the gas state (such as the concentration of nitrogen) in the space of the gas detecting cartridge 20 in the pipeline and the wafer 7 200842993. The device 40 includes: 41. The air chamber 41 is provided with at least one air inlet portion 及 and an air outlet portion 412. The air inlet portions 411 and 412 are connected to the exhaust line 31 of the wafer cassette 20, so that the air line can be connected. The gas in the gas line is introduced into the gas chamber 41; at least one gas sensor 42 may be disposed on the side of the gas chamber 41. Therefore, the gas state in the gas chamber 41 can be sensed; a bypass valve 43 is disposed on the exhaust line 31 at the rear position of the gas chamber 41, so that the gas chamber 41 and the wafer cassette 2 are disposed. The air pressure in the space is consistent with the external ambient air pressure, that is, the purpose of setting the bypass valve 43 is when the negative pressure caused by the pumping action of the air extracting device 30 is greater than the gas output pressure of the gas supply device ι〇' The external air pressure can be introduced through the bypass valve 43 to achieve voltage regulation and prevent the protection of the wafer cassette 20 and the gas chamber 41 from being damaged by the negative pressure. The gas sensor 42 can sense the concentration of nitrogen or blunt gas contained in the gas chamber; or the gas sensor 42 can be used to detect whether a gas introduction error occurs. The debugger function. By using the structural design of the above, the state of use of the present invention is as follows: The main core design of the present invention is that the gas detecting device 4 includes a gas chamber 41, a gas sensor 42, and a bypass valve 43. The structure and structure of the wafer-sealed gas supply device are as follows: The gas (such as nitrogen or blunt gas) passes through its inlet line 11, the control valve 12, and enters the space of the wafer cassette 20, and on the other hand, the suction is performed by the operation of the pumping I. The gas in the cartridge 2 is again discharged to the outside via the exhaust g path 31 and the control valve 32; in the process, the gas passing through the exhaust gas path 31, as shown in Fig. 2, will enter the gas chamber. In the state of 41, a stable accommodation is formed and the fluidity tends to be slow. At this time, the state of the gas enthalpy inside the gas chamber 41 can be detected by the helium gas sensor 42. [Advantages of the present invention] The creation department provides a gas chamber to guide the gas in the discharge line of the wafer cassette. The gas chamber can form a stable gas accommodating space, and a gas sensor is disposed in the gas chamber, so that the gas in the venting line of the wafer cassette can be introduced into a space to stabilize the volume. In this way, it is possible to measure a relatively stable and accurate gas concentration state, obtain a more accurate detection value, and thereby improve the gas monitoring quality of the wafer sealing gas supply device. The invention disclosed in the above embodiments is specifically described, and the description of the present invention is not limited to the scope of the invention; the person skilled in the art can understand the spirit of the invention. Changes and modifications are made to the effect of the principle, and such changes and modifications shall be covered by the scope of the patent application as described later. 9 200842993 [Simple description of the diagram] Measuring device and wafer Sealed gas supply equipment map. Plan view of the measuring device. Fig. 1 is a plan view showing the state of the gas distribution state of the present invention. Fig. 2: The gas disclosed in the present invention.
晶圓密封供氣設備 A 氣體供應裝置 1 進氣管路 1 控制閥 1 晶圓盒 2 抽氣裝置 3 排氣管路 3 控制閥 3 氣體檢測裝置 4 氣室 4 進氣部 4 出氣部 4 氣體感測器 4 旁通閥 4 10Wafer-sealed gas supply equipment A Gas supply device 1 Intake line 1 Control valve 1 Wafer 2 Exhaust device 3 Exhaust line 3 Control valve 3 Gas detection device 4 Air chamber 4 Inlet 4 Exhaust 4 Gas Sensor 4 bypass valve 4 10