TW200834257A - Projection optical apparatus, exposure method and apparatus, photomask, and device and photomask manufacturing method - Google Patents

Projection optical apparatus, exposure method and apparatus, photomask, and device and photomask manufacturing method

Info

Publication number
TW200834257A
TW200834257A TW096147451A TW96147451A TW200834257A TW 200834257 A TW200834257 A TW 200834257A TW 096147451 A TW096147451 A TW 096147451A TW 96147451 A TW96147451 A TW 96147451A TW 200834257 A TW200834257 A TW 200834257A
Authority
TW
Taiwan
Prior art keywords
point
projection optical
plate
photomask
mask
Prior art date
Application number
TW096147451A
Other languages
Chinese (zh)
Other versions
TWI430045B (en
Inventor
Masato Kumazawa
Hitoshi Hatada
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of TW200834257A publication Critical patent/TW200834257A/en
Application granted granted Critical
Publication of TWI430045B publication Critical patent/TWI430045B/en

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Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

The present invention provides a projection optical apparatus. When forming a magnified image of a mask pattern on an object with a plurality of projection optical systems, projected images of the projection optical systems are formed to be accurately continuous so as to enable satisfactory pattern transfer. The projection optical apparatus includes: a first projection optical system (PL 1) directing light beam form point a on a mask (MA) to point (A) on a plate (PT); a second projection optical system (PL2) directing light beam from point (b) on the mask (MA) to point (B) on the plate (PT) and forming a magnified image of the mask (MA) on the plate (PT); a first line segment linking point (A) and point (a'), which orthogonally projects point a on the plate (PT); and a second line segment linking point (B) and point (b'), which orthogonally projects point (b) on the plate (PT), overlap each other as viewed in a non-canning direction.
TW096147451A 2007-01-04 2007-12-12 Projection optical apparatus, exposure method and apparatus, photomask, and device and photomask manufacturing method TWI430045B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US87838307P 2007-01-04 2007-01-04

Publications (2)

Publication Number Publication Date
TW200834257A true TW200834257A (en) 2008-08-16
TWI430045B TWI430045B (en) 2014-03-11

Family

ID=44819406

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096147451A TWI430045B (en) 2007-01-04 2007-12-12 Projection optical apparatus, exposure method and apparatus, photomask, and device and photomask manufacturing method

Country Status (1)

Country Link
TW (1) TWI430045B (en)

Also Published As

Publication number Publication date
TWI430045B (en) 2014-03-11

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