200832448 九、發明說明 【發明所屬之技術領域】 本發明關於電子射線照射裝置。 【先前技術】 電子射線照射裝置爲將放出電子射線之電子槍收容於 容器，通過以薄膜所形成的電子射線射出窗，將電子射線 _ 射出至大氣中之裝置。這種的電子射線照射裝置具有進行 照射對象物的乾燥、殺菌、表面改質之用途。 然而，當使電子射線照射裝置實際作動時，會有被照 射到照射對象物時所產生之飛散物或髒污等附著至射出窗 " 之情況。因此，亦存在有在電子射線射出窗的外側設置其 他的窗（外窗），作成雙重窗構造之電子射線照射裝置 (參照例如專利文獻1 )。 [專利文獻1]日本特開平8- 1 66497號公報 【發明內容】 [發明所欲解決之課題] 在上述這種的雙重窗構造的電子射線照射裝置，電子200832448 IX. Description of the Invention [Technical Field of the Invention] The present invention relates to an electron beam irradiation apparatus. [Prior Art] An electron beam irradiation device is a device that accommodates an electron gun that emits an electron beam in a container and emits an electron beam into the atmosphere through an electron beam emission window formed by a film. Such an electron beam irradiation apparatus has the use of drying, sterilizing, and surface modification of an object to be irradiated. However, when the electron beam irradiation apparatus is actually actuated, there is a case where scattered matter, dirt, or the like which is generated when the object to be irradiated is irradiated to the injection window ". Therefore, there is also an electron beam irradiation apparatus in which another window (outer window) is provided outside the electron beam emitting window to form a double window structure (see, for example, Patent Document 1). [Problem to be Solved by the Invention] In the electron beam irradiation apparatus of the double window structure as described above, the electrons are disclosed in Japanese Laid-Open Patent Publication No. Hei.
V 射線通過外窗時會損失能量，其結果，會產生輸出損失。 這種情況，在電子射線的能量越小之情況，變得越顯著。 因此，爲了對照射對象物，照射充分的量的電子射線，既 可防止髒污附著到電子射線射出窗，亦可極力抑制外窗之 電子射線的輸出損失之技術爲眾人所期望。 -4 - 200832448 本發明是爲了解決上述課題而開發完成之發明，其目 的在於提供，既可防止髒污附著到電子射線射出窗，亦可 充分確保射出至裝置外部之電子射線的量之電子射線照射 裝置。 ， [用以解決課題之手段] 爲了解決上述課題，本發明之電子射線照射裝置，其 特徵爲：具備有：具有放出電子射線的電子放出構件之電 子槍；收容電子放出構件，並且，具有使電子射線通過之 電子射線通過孔的容器；以關閉電子射線通過孔的方式固 定於容器，具有將通過電子射線通過孔之電子射線射出至 容器的外部之電子射線射出窗的第1窗單元；及固定於第 1窗單元，具有使由電子射線射出窗所射出的電子射線射 出至裝置外部之外窗的第2窗單元，外窗之電子射線的射 出軸方向的厚度是較電子射線射出窗之電子射線的射出軸 方向的厚度小。 在此電子射線照射裝置，對具有電子射線射出窗之第 1窗單元，設置具有外窗之第2窗單元。因此，在電子射 線照射到照射對象物時所產生的飛散物等受到外窗所隔 離，防止髒污附著到電子射線射出窗。又，在此電子射線 照射裝置，外窗之電子射線EB的射出軸方向的厚度形成 爲較電子射線射出窗之電子射線EB的射出軸方向的厚度 小。因此，可將由電子射線射出窗所射出之電子射線通過 外窗時的輸出損失抑制成極小，能充分確保射出至裝置外 -5- 200832448 部之電子射線的量。 又，第2窗單元對第1窗單元可自由裝卸爲佳。藉 此，在髒污附著到外窗之情況，可容易進行第2窗單元的 更換作業。又，由/於不需要將第1窗單元由容器取下， 故，亦不需要對容器內洩真空之製程。 又，進一步具備：對第1窗單元與第2窗單元之間的 空間導入鈍氣之導入管；及由空間排出鈍氣之排出管爲 佳。藉由這種的結構，因可使鈍氣流動於第1窗單元與第 2窗單元之間，所以，當電子射線射出時，能抑制臭氧產 生與進行電子射線射出窗的冷卻。 第2窗單元具有電流讀出電極，該電極配置成：當由 電子射線的射出軸方向觀看時，不會與外窗重疊爲佳。在 此情況，能夠測定：在由外窗所射出的電子射線中，因散 亂等返回至外窗側之電子射線所產生的電流，能夠即時精 度良好地測定電子射線的實際輸出。又，也不會有電流読 取電極封住外窗的一部分之情事產生，可充分地確保來自 於外窗之電子射線的量。 [發明效果] 若根據本發明之電子射線射出裝置的話，亦可防止髒 污附著到電子射線射出窗，亦可充分確保射出至裝置外部 之電子射線的量。 【實施方式】 ' -6- 200832448 射線照 照射裝 線斷面 有：用 前端部 :EB由 所射出 此電子 流動於 ，進行 電氣絕 ;及放 屬所形 的壁， 通之開 器8之 有凹凸 以下，參照圖面，詳細說明關於本發明之電子 射裝置的理想實施形態。 [第1實施形態] 圖1是顯示本發明的第1實施形態之電子射線 置的結構之側斷面圖。又，圖2是圖1之II-II 圖。如圖1及圖2所示，電子射線照射裝置1具備 來放出電子射線EB之電子槍2 ;收容電子槍2的 分的細絲（電子放出構件）9之容器3 ;將電子射線 容器3射出至外部之第1窗單元4;及由窗單元4 的電子射線EB射出至裝置外部之第2窗單元5。 射線照射裝置1是在例如氮等的鈍氣的環境下，對 線上的照射對象物（未圖示），照射電子射線EB 照射對象物的乾燥、殺菌、表面改質等之裝置。 電子槍2具有：長方體狀的外殻6;藉由具有 緣性之材料所形成的絕緣塊7 ;高耐壓型連接器8 出電子射線EB之細絲9。外殻6是藉由例如金 成，固定於容器3的基端側。在外殼6之容器3側 設有將外殼6的內部與容器3內的收容空間S1連 口部6a。又，在外殼6的側壁，設有用來安裝連接 開口部6b。在開口部6b周圍的外殼6的內壁，設 部分，可確保與絕緣塊7之結合強度。 絕緣塊7是藉由例如環氧樹脂等的電氣絕緣性的材料 所形成，將由連接器8朝細絲9之電力供給路徑由外部予 200832448 以絕緣。絕緣塊7具有··被收容於外殻6內之基部7a ;由 基部7a通過開口 6a而朝容器3內的收容空間S 1側突出 _ 之切頭圓錐狀的突出部7b。基部7a佔有外殼6的內部空 — 間的大部分，並與外殼6的開口 6a側及開口 6b側的內面 接觸。又，在基部7a未與外殼6的內面接觸之部分’貼 附有由導電性材料所構成的薄膜1 0，藉由薄膜1 〇與作爲 接地電位之外殼6電性連接，能夠將面對外殼6的內面之 φ 絕緣塊7的表面電位作爲接地電位，可使動作時的穩定性 提昇。 連接器8爲用來由電子射線照射裝置1的外部對細絲 9供給電源電壓之連接器。連接器8被插入至外殼6的側 面的開口部6b，在前端位於絕緣塊7的中心附近之狀態 下，埋沒並固定於絕緣塊7中。在連接器8的前端部分， 設有與外殻6的內壁相同的凹凸部分，用以確保與絕緣塊 7之結合強度。 • 在連接器8的基端，設有用來供保持由未圖示的電源 裝置延伸的外部配線的前端之電源用插頭插入的插入口 _ 8a。又，在連接器8的前端，連接有一對內部配線11、 1 1。內部配線1 1、1 1是由連接器8的前端朝絕緣塊7的 基部7 a的中心延伸，並且，由基部7 a的中心朝突出部7 b 折彎，通過突出部7b的中心後延伸至突出部7b的前端。 細絲9爲來放出成爲電子射線E B之電子構件。細絲 9是安裝於絕緣塊7的突出部7b的前端部分，連接於內部 配線1 1、1 1。在細絲9的周圍，設有柵極部12。柵極部 -8- 200832448 1 2是與內部配線11、11中的任一方電性連接，在對細絲 9施加有高電壓之情況，亦對柵極部1 2施加高電壓，可行 成用來由細絲9引出電子之電場。由細絲9所引出之電 子，由形成於柵極部12的中心之孔，作爲電子射線EB射 出。再者，欲更精密地控制由細絲9所進行的電子的放出 的情況，以與例如內部配線11、11同樣地，追加設置另 外的柵極部1 2用之配線，與細絲9的電位不同獨立地控 制柵極部1 2的電位爲佳。 容器3是形成爲沿著電子射線EB的射出軸延伸之圓 筒狀，氣密地封裝於電子槍2的外殻6。在容器3的基端 側的內部，形成有用來收容電子槍2的細絲9、柵極部 1 2、及絕緣塊7的突出部7b之圓筒狀的收容部1 3。收容 部13的徑形成爲較外殼6的開口部6a更大徑，由容器3 的基端延伸至中央附近。又，在容器3的前端側的內部’ 形成有與收容部1 3連通之電子射線通過孔1 4。電子射線 通過孔1 4形成爲較收容部1 3更小徑的圓筒狀，沿著電子 射線EB的射出軸，由容器3的中央附近延伸至容器3的 前端。在容器3的前端，以預定位相角形成有複數個（例 如6個）螺孔（未圖示）。 在電子射線通過孔14的周圍，沿著電子射線EB的射 出軸配置著電磁線圈1 5及電磁線圈1 6。電磁線圈1 5及電 磁線圈1 6的配置中心是與電子射線通過孔1 4的中心軸一 致。藉由這些的電磁線圈1 5及電磁線圏1 6的相互作用’ 通過電子射線通過孔1 4之電子射線EB朝後述的電子射線 -9- 200832448 射出窗2 4集束。 更具體而言，電磁線圈1 5爲用來修正電子槍2或構 成電子射線EB的通過路徑之各構件的機械性中心的偏 移，或各構成構件的殘留磁性及設置場所周邊的磁場等的 影響之電子射線EB對期望的®過I各徑（電子射線通過孔 1 4的中心軸）的偏移之調正線圈。在本實施形態，相對向 的2個電磁線圈1 5成對來發揮功能的方式’ 4個電磁線圈 1 5夾持電子射線通過孔1 4而以9 0度的位相角被配置，因 應必要與以使用。另外’電磁線圈1 6爲用來將由電子槍2 所射出的電子射線EB聚集於電子射線射出窗24之集束線 圏，利用以漆包線等所形成的圓筒狀的線圏部及軟鐵等所 形成的磁性電路來構成的。藉由這些的電磁線圈15、16， 使得由細絲9所射出的電子射線EB可正確地通過電子通 過孔14的中心軸，不會與電子通過孔14的內壁產生衝 突，可正確地導引至電子射線射出窗24的中心。 又，如圖2所示’在容器3的側部，設有排氣管1 7。 排氣管1 7的前端連接於將收容部1 3及電子射線通過孔1 4 進行排氣之真空泵1 8。排氣管1 7及真空泵1 8是設置於： 當由電子射線EB的射出軸方向觀看電子射線照射裝置i 時，不會與連接器8重疊之位置。藉此，可迴避被插入至 連接器8之電源用插頭或外部配線與真空泵18之干涉， 可將電子射線照射裝置1予以小型化 其次’參照圖3及圖4，說明關於第1窗單元4及第 2窗單元5的結構。圖3是由電子射線EB的射出軸方向 -10- 200832448 所觀看之各窗單元的平面圖。又，圖4是各窗單元的放大 側斷面圖。 如同圖所示，窗單元4爲電子射線照射裝置1的一端 側的構造體，用來使通過了電子射線通過孔1 4之電子射 線EB射出至容器3的外部之單元。第1窗單元4之結構 爲具備：台座21 ;窗基板22 ;蓋子23 ;電子射線射出窗 24 ;及外圍構件25。台座2 1是藉由例如不銹鋼所形成， 具有：圓筒狀的主體部21a;及設置於主體部21a的基端 側的緣之突緣部2 1 b。 在主體部2 1 a的中心，形成有與電子射線通過孔1 4 同徑的貫通孔2 1。又，在主體部2 1 a的前端部，形成有用 來安裝窗基板22之圓狀的凹部21d。且，在主體部21a的 外側面，形成有用來安裝蓋子23之公螺紋部2 1 e。另外， 在突緣部21b，設有絕緣環26。絕緣環26是藉由例如聚 四氟乙烯等的具有電氣絕緣性之材料所形成的，以包圍主 體部2 1 a的方式固定於突緣部2 1 b。 又，在突緣部2 1 b，於較絕緣環26更外側的位置，以 大約60°的位相角設置有6個螺栓孔27 (參照圖3)。 又，台座21是藉由將螺栓28插通於各螺栓孔27，使螺栓 28螺合於容器3的螺孔’在貫通孔2 1 c與電子射線通過孔 14成爲同心之狀態下’堅固地固定於容器3的前端。再 者，在容器3的前端’形成有設置〇形環3 8之溝’藉 此，保持台座21與容器3之氣密封裝。又，台座21亦可 與容器3 —體形成。在此情況，則不需要將〇形環3 8設 -11 - 200832448 置於容器3的前端。 窗基板22是藉由例如不銹鋼所形成，具有：圓筒狀 的主體部22a;及設置於主體部22a的基端側的緣之突緣 部22b。在主體部22a的中心，形成有較台座21的貫通孔 21c稍小徑的貫通孔22c。又，在主體部22a的前端部， 形成有用來安裝電子射線射出窗24之矩形狀的凹部22d。 又，窗基板22是在貫通孔22c與電子射線通過孔14成爲 同心的狀態下，配置於台座21的凹部21d。 蓋子23是藉由例如不銹鋼所形成，具有：圓形的天 頂部23a;及形成於天頂部23a的一端側之圓筒狀的螺合 部23b。在天頂部23a的中央，形成有較窗基板22的主體 部22a的外徑更大徑的開口部23c。又，螺合部23b的內 徑形成爲與台座2 1的主體部2 1 a的外徑大致相同徑，在 螺合部23b的內側面，形成有與主體部2 1 a的外側面的公 螺紋部21e對應之母螺紋部23d。 又，蓋子23是藉由使螺合部23b的母螺紋部23d螺 合於台座21的公螺紋部21e，在將窗基板22的主體部 22a及電子射線射出窗24插通於開口部23c之狀態下，嵌 入於台座21。藉此，窗基板22的突緣部22b藉由蓋子23 的天頂部23 a按壓於台座2 1的凹部2 1 d的底面，窗基板 22與台座21與被堅強地固定。且，在台座21之凹部21d 的底面，形成有設置〇形環3 9之溝。藉此，保持窗基板 22與台座21之氣密封裝。再者，〇形環38與〇形環39 是在由電子射線EB的射出方向觀看的情況，配置成重 -12- 200832448 疊，包圍電子射線EB的通過路徑的附近，因此，施加於 各Ο形環38、39之押壓力成爲大致相等，可進行可靠性 高之封裝。 電子射線射出窗24爲用來使通過了容器3的電子射 線通過孔1 4之電子射線EB射出至容器3的外部之箔狀的 構件。電子射線射出窗2 4是藉由例如鈹形成矩形，電子 射線射出窗24之電子射線EB的射出軸方向的厚度爲大約 1 〇 // m左右。電子射線射出窗24是以封住窗基板22的貫 通孔22c的前端之方式配置於窗基板22的凹部22d的底 面上，藉由例如軟焊，氣密地固定於窗基板22。再者，電 子射線射出窗24的材質，若爲電子射線EB的透過率高之 材料即可，除了上述的鈹之外，亦可使用鈦或鋁等。 外圍構件25是藉由例如不銹鋼所形成，呈與設置於 台座2 1的突緣部2 1 b之絕緣環26相同徑的中空圓筒狀。 外圍構件25配置成覆蓋台座21的主體部21a、窗基板 22、蓋子23、及電子射線射出窗24，經由絕緣環26固定 於台座21的突緣部21b。在外圍構件25的前端，以預定 位相角設置著複數個（例如4個）螺孔25a。又，在外圍 構件25的側面，——體地形成有導入管30，在與導入管30 相反的位置，一體地形成有排出管31。導入管30及排出 管31是連接於氮氣循環裝置（未圖示）。再者’在將外 圍構件25固定於台座21的突緣部21b之際，亦可不經由 絕緣環26而直接固定。在此情況，絕緣環26配置於外圍 構件2 5與第2窗單元5之間爲佳。 -13- 200832448 另外，第2窗單元5的結構爲具備有··圓板構件32 ; 外窗安裝環33;及外窗34。圓板構件32是藉由例如不銹 鋼，形成與外圍構件2 5的外徑相同徑。在圓板構件3 2的 中央部分，形成有較窗基板22的主體部22a的外徑稍小 徑的開口部3 2 a。在開口部3 2 a的周圍，形成有例如6個 螺孔32b。 又，在圓板構件32的緣部，形成有與外圍構件25的 各螺孔25a對應之4個螺孔32c。又，圓板構件32藉由將 螺絲35分別螺合於螺孔25a及螺孔32c，在螺孔32b朝向 電子射線射出窗24之狀態下，以開口部32a成爲電子射 線通過孔1 4同心的方式，可自由裝卸地固定於外圍構件 2 5的前端。 且，在圓板構件3 2，安裝有未圖示的導引線。此導引 線連接於設置在電子射線照射裝置1的外部之電流計29 (參照圖1 )。藉由這種的圓板構件3 2的結構，圓板構件 3 2作爲讀出電子射線EB的一部分之電流讀出電極來發揮 功能。即，在圓板構件32，由外窗34所射出之電子射線 EB中，受到散亂等的影響而返回至外窗3 4側之電子射線 EB流入。因流入至圓板構件32之電子射線EB所產生的 電流，通過導引線，被輸送至電流計29。再者，圓板構件 32，亦可與外圍構件25 —體地形成。 外窗安裝環33爲較圓板構件32小徑的扁平構件。在 外窗安裝環3 3的中央部分，形成有較電子射線射出窗24 更大徑的開口部3 3 a。在開口部3 3 a的周圍，形成有與圚 -14- 200832448 板構件3 2的各螺孔3 2 b相對應之6個螺孔3 3 b。外窗安裝 環3 3藉由將螺絲3 6分別螺合於螺孔3 2 b及孔3 3 b，以 開口部3 2a成爲與電子射線通過孔1 4同心的方式，固定 於圓板構件3 2的內側。 外窗3 4爲將由電子射線射出窗24所射出的電子射線 EB射出至裝置1的外部之箔狀的構件。外窗34是藉由例 如鋁形成矩形狀，外窗34之電子射線EB的射出軸方向的 厚度爲數#πι左右。外窗34是以封住外窗安裝環33的開 口部3 3 a之方式，藉由軟焊固定於外窗安裝環3 3的一面 側，配置於圓板構件32的開口部32a內。 在此，由於外窗3 4與外窗安裝環3 3之間不需要進行 氣密封裝，故，亦可藉由夾入外窗34予以固定，來代替 以軟焊進行固定。此的情況，當將外窗安裝環3 3的開口 部3 3 a與圓板構件3 2的開口部3 2 a作成相同尺寸時，則 在進行例如外窗3 4的固定作業之際，可防止接觸到開口 部32a及開口部33a的邊緣部造成外窗34破損。 又，外窗34之電子射線EB的射出軸方向的厚度形成 爲較上述的電子射線射出窗24之電子射線EB的射出軸方 向的厚度小，但’由於不需要嚴密地保持第1窗單元4與 第2窗單元5之間的氣密性’故，由進一步減低電子射線 EB的輸出損失之觀點來看，亦可將外窗34薄膜化至1 //m左右。且’構成外窗34的材料，亦可包含原子序較 電子射線射出窗24之材料大的材料。作爲構成外窗34的 材料，可舉出例例如碳（有機膜）、氧化銘、砂、鈦、 -15« 200832448 鎳、銅、銀、金、及各種合金等。這些的材料，由於具有 優良的耐熱性，故，作爲外窗，具有優良的耐久性。 在具有上述結構之電子射線照射裝置1，當藉由真空 泵1 8，將容器3的內部予以排氣，再經由內部配線Π、 1 1，從外部電源將數十kV〜數百kV左右的電壓供給至細 絲9時，則由細絲9放出電子。由細絲9所放出之電子， 受到柵極部1 2所形成之電場所加速，成爲電子射線E B。 電子射線E B在通過電子射線通過孔1 4之際，於藉由電磁 線圈1 5進行了中心軸之修正後，藉由電磁線圈1 6集束， 通過電子射線射出窗24及外窗34，射出至外部。所射出 之電子射線EB，再例如氮氣這種的鈍氣的環境下，對流 動於線上之印刷物等的照射對象物進行照射。 在使電子射線EB由電子射線射出窗24及外窗34射 出之際，朝向照射對象物之電子射線EB的一部分會受到 散亂等的影響而返回至外窗34側，流入至第2窗單元5 的圓板構件3 2。因電子射線EB的一部分流入所產生之電 流，由圓板構件32被輸送至電流計29，進行電流値之監 視。又，由導入管3 〇，一定量的氮氣被導入至第1窗單元 4與第2窗單元5之間的空間S2，被導入至空間S2之氮 氣會由排出管3 1排出至氮氣循環裝置。 如以上説明，在電子射線照射裝置1，對具有電子射 線射出窗24之第1窗單元4，設置具有外窗34之第2窗 單元5。因此，在電子射線EB被照射至照射對象物之際 所產生的飛散物等被外窗34隔離，可防止髒污附著到電 -16- 34 200832448 子射線射出窗24。又，此在電子射線照射裝置1，外窗 之電子射線EB的射出軸方向的厚度形成爲較電子射線 出窗24之電子射線EB的射出軸方向的厚度小。因此， 將由電子射線射出窗24所射出的電子射線EB通過外 3 4時之輸出損失抑制成極小，可充分地確保射出至裝置 部之電子射線EB的量。 又，在電子射線照射裝置1，第2窗單元5的圓板 件3 2，亦可作爲電流讀出電極來發揮功能。因此，可考 因電子射線射出窗24的厚度不均、或電子射線£8被照 到照射對象物之際所產生的飛散物或髒污等的附著，隨 動作時間的經過產生變化之外窗3 4的表面狀態，可即 且精度良好地測定實際由外窗3 4所射出之電子射線EB 輸出（實際輸出）。又，因圓板構件32，是配置成當由 子射線EB的射出軸方向觀看時，不會與電子射線射出 24及外窗34重疊，所以，可充分地確保來自於電子射 射出窗24之電子射線EB的射出量。 在根據電子射線EB的實際輸出之測定，確認了實 輸出降低的情況時，可聯想到髒污附著到外窗34爲 因，故，需要進行外窗34的更換。在此情況，在電子 線照射裝置1，藉由取下螺絲3 5，可容易將第2窗單元 由第1窗單元4取下。因此，能夠簡單進行外窗34的 換。又，由於不需要將第1窗單元4由容器3取下，故 不需要對容器3內進行真空洩漏之製程。因此，可顯著 縮短進行窗更換時之裝置的停止時間。 射 可 窗 外 構 量 射 著 時 的 電 窗 線 際 原 射 5 更 地 -17- 200832448 且，在電子射線照射裝置1，具備有對第1窗單 與第2窗單元5之間的空間S2導入氮氣之導入管30 由空間S2排出氮氣之排出管3 1。藉由這樣的結構， 制：當由電子射線射出窗24射出電子射線EB時，在 S2內產生臭氧。又，藉由氮氣流動於空間S2內，可 電子射線射出窗24及外窗34的冷卻效果。 [第2實施形態] 接著，詳細說明關於本發明的第2實施形態之電 線照射裝置。 圖5是顯示本發明的第2實施形態之電子射線照 置的結構之側斷面圖。又，圖6是圖5之VI-VI線 圖。如圖5及圖6所示，第2實施形態之電子射線照 置40，利用以偏向線圈52，使通過了容器3的電子 通過孔1 4之電子射線EB朝預定方向以高速偏向，使 第1窗單元41及第2窗單元42，呈線狀射出電子射 的這一點，與由第1窗單元4及第2窗單元5以一點 電子射線EB之第1實施形態不同。 說明關於第1窗單元41及第2窗單元42的結構 7是由電子射線EB的射出軸方向觀看各窗單元時的 圖。又，圖8是各窗單元的放大側斷面圖。 如圖7及圖8所示，窗單元41的結構爲具備有 體51 ;窗基板53 ;電子射線射出窗54 ;及外圍構件 框體51的形狀，呈隨著由基端側朝向前端側，電子 元4 :及 可抑 空間 獲得 子射 射裝 斷面 射裝 射線 得從 I EB 射出 。圖 平面 :框 55 ° 射線 -18- 200832448 EB的偏向方向（圖5之X方向）之寬度放大的形狀。在 ^ 框體5 1的基端側，形成有與電子射線通過孔1 4相同徑的 開口部5 1 a，框體5 1的前端側呈矩形開口。又，在框體 " 5 1的基端側的緣，形成有圓形的突緣部5 1 b。又，框體5 1 定位成開口部5 1 a與電子射線通過孔1 4成爲同心，並氣 密地固定於容器3的前端。 又，在框體51的基端側的突緣部51 b的附近，設有 φ 偏向線圈52。偏向線圈52爲在框體51內，使通過了電子 射線通過孔14之電子射線EB偏向的線圈。在偏向線圈 52的兩端，分別安裝有L字狀的支承構件52a，偏向線圈 52藉由以支承構件52a，52a夾入框體51的基端側的側 壁，使得在框體5 1，接近偏向方向正交的側壁之一方的方 式配置著。又，偏向線圈52，根據由外部電源（未圖示） 所供給之電流値，使通過了電子射線通過孔1 4之電子射 線EB的進行方向沿著X方向呈線狀偏向。 # 窗基板53是藉由例如不銹鋼形成長方形，固定於框 體51的前端。在窗基板53的中央，形成有複數個.（在本 . 實施形態爲5個）矩形的貫通孔53a。各貫通孔53a是沿 著電子射線EB的偏向方向，以預定間隔排列成一列。 又，在貫通孔5 3 a，5 3 a之間，於與電子射線EB的偏向方 向正交的方向，分別形成有區隔溝53b。又，在窗基板53 的緣部，固定有藉由例如聚四氟乙烯等所形成的矩形環狀 的絕緣環56。電子射線射出窗54是與第1實施形態同樣 地，藉由例如鈹形成矩形狀，電子射線射出窗54之電子 -19 - 200832448 射線EB的射出軸方向的厚度成爲大約1 0 // m左右。電子 射線射出窗54是針對各貫通孔53a加以設置，以封住各 貫通孔5 3 a的前端之方式，軟焊於窗基板5 3。再者，在框 體5 1的前端，形成有設置〇形環60之溝。藉此，保持窗 基板53與框體51之氣密封裝。 外圍構件55呈與窗基板53相同尺寸之中空長方體 狀，經由絕緣環5 6固定於窗基板5 3。在外圍構件5 5的前 端側之X方向的兩端部，分別形成有螺孔5 5 a。又，在外 圍構件5 5的X方向的側面，一體地形成有導入管5 7，在 與導入管57相反之位置，一體地形成有排出管58。導入 管57及排出管58連接於氮氣循環裝置（未圖示）。再 者，在將外圍構件5 5固定於窗基板5 3之際，亦可不經由 絕緣環5 6而直接固定。在此情況，絕緣環5 6配置於外圍 構件55與第2窗單元42之間爲佳。 第2窗單元42的結構爲具備有：板構件61 ;外窗安 裝構件62 ;及外窗63。板構件61是藉由例如不銹鋼，形 成爲與外圍構件5 5相同尺寸。在板構件6 1的中央部分， 形成有用來使各電子射線射出窗5 4露出之矩形的開口部 6 1 a，在板構件6 1之X方向的兩端部，分別形成有與外圍 構件5 5的螺孔5 5 a對應之螺孔6 1 b。且，在板構件61的 —面側，於較螺孔6 1 b更靠近內側的位置，以夾持開口部 6 1 a的方式形成有螺孔6 1 c。又，板構件6 1是藉由分別使 螺絲64螺合於螺孔55a及螺孔61b，在使螺孔61c朝向電 子射線射出窗54之狀態下，可自由裝卸地固定於外圍構 -20- 200832448 件5 5的前端。 且，在板構件6 1，安裝有未圖示的導引線。此導引線 連接於設置在電子射線照射裝置40的外部之電流計29 (參照圖5)。藉由這樣的板構件61的結構’板構件61 作爲電子射線EB的一部分流入之電流讀出電極來發揮功 能。即，由外窗63所射出之電子射線EB中，因散亂等的 影響返回至外窗63側之電子射線EB流入至板構件6 1。 因流入至板構件6 1之電子射線EB所產生的電流通過導引 線，被輸送至電流計29。再者，板構件61，亦可與外圍 構件55 —體地形成。 外窗安裝構件62呈寬度尺寸較板構件61小之扁平矩 形狀。在外窗安裝構件62的中央，與板構件6 1同樣地， 形成有使電子射線射出窗54露出之矩形的開口部62a。 又，在外窗安裝構件62之X方向的緣部，分別形成有與 板構件61的各螺孔61c對應之螺孔62b。外窗安裝構件 62藉由使螺絲65分別螺合於螺孔6 1 c及螺孔62b，來固 定於板構件6 1的內側。 外窗63是藉由例如鋁形成矩形狀，外窗63之電子射 線EB的射出軸方向的厚度形成爲大約數μπι左右。外窗 63是以封住外窗安裝構件62的開口部62a的方式，軟焊 固定於外窗安裝構件62的一面側，配置於板構件6 1的開 □部6 1 a內。 與第1實施形態同樣地，由於不需要將外窗63與外 窗安裝構件6 2之間進行氣密封裝，故，亦能以外窗安裝 -21 - 200832448 構件62與板構件61夾持外窗63並進行固定，來代替藉 由軟焊進行固定。在此的情況，當將外窗安裝構件62的 開口部62a與板構件6 1的開口部6 1 a做成相同尺寸時， 在進行例如外窗62的固定作業之際等，可防止接觸到開 口部61a及開口部62a的邊緣部造成外窗63破損。 又，外窗63之電子射線EB的射出軸方向的厚度形成 爲較上述的各電子射線射出窗5 4之電子射線EB的射出軸 方向的厚度小，但，由於不需要嚴密地保持第1窗單元4 1 與第2窗單元42之間的氣密性，故，由進一步減低電子 射線EB的輸出損失之觀點來看，亦可將外窗63薄膜化至 1 // m左右。 在這樣的電子射線照射裝置40，亦可與第1實施形態 同樣地，對具有電子射線射出窗54之第1窗單元41，設 置具有外窗63之第2窗單元42。因此，在電子射線EB 被照射至照射對象物之際所產生的飛散物等受到外窗63 所阻隔，可防止髒污附著到電子射線射出窗54。又，在電 子射線照射裝置40，外窗63之電子射線EB的射出軸方 向的厚度形成爲較電子射線射出窗54之電子射線EB的射 出軸方向的厚度小。因此，可將由電子射線射出窗5 4所 射出之電子射線EB通過外窗63時之輸出損失抑制成極 小，能夠充分地確保射出至裝置外部之電子射線EB的 量。 又，在電子射線照射裝置40，第2窗單元42的板構 件61亦作爲電流讀出電極來發揮功能。因此，可考量因 -22- 200832448 電子射線射出窗54的厚度不均、或電子射線EB被照射 照射對象物之際所產生的飛散物或髒污等的附著，隨著 作時間的經過產生變化之外窗63的表面狀態，可即時 精度良好地測定實際由外窗6 3所射出之電子射線EB的 出（實際輸出）。又，因板構件61被配置成，當由電 射線EB的射出軸方向觀看時，不會與電子射線射出窗 及外窗63重疊，所以，可充分地確保來自於外窗63之 子射線EB的射出量。 在藉由電子射線EB的實際輸出之測定，測定到實 輸出降低的情況時，可聯想到髒污附著到外窗63爲 因，故，需要進行外窗6 3的更換。在此情況，在電子 線照射裝置4 0，藉由取下螺絲64，可容易將第2窗單 42由第1窗單元41取下。因此，能夠簡單進行外窗63 更換。又，由於不需要將第1窗單元41由容器3取下 故，不需要對容器3內進行真空洩漏之製程。因此，可 著地縮短進行窗更換時之裝置的停止時間。 且，在電子射線照射裝置40，具備有：將氮氣導入 第1窗單元41與第2窗單元42之間的空間S2之導入 57 ;及由空間S2排出氮氣之排出管58。藉由這種的 構，可抑制：當由電子射線射出窗54射出電子射線 時，在空間S2內產生臭氧。又，藉由氮氣流動於空間 內，可獲得電子射線射出窗54及外窗63的冷卻效果。 [産業上的利用可能性] 到 動 且 輸 子 54 電 際 原 射 元 的 顯 至 管 結 EB S2 -23- 200832448 若根據本發明之電子射線射出裝置的話，既可防止髒 污附著到電子射線射出窗，亦可充分確保射出至裝置外部 之電子射線的量。 【圖式簡單說明】 圖1是顯示本發明的第1實施形態之電子射線照射裝 置的結構之側斷面圖。 圖2是圖1之II-II線斷面圖。 圖3是由電子射線EB的射出軸方向觀看各窗單元的 平面圖。 圖4是各窗單元的放大側斷面圖。 圖5是顯示本發明的第2實施形態之電子射線照射裝 置的結構之側斷面圖。 圖6是圖5之VI-VI線斷面圖。 圖7是由電子射線EB的射出軸方向觀看各窗單元的 平面圖。 圖8是窗單元的放大側斷面圖。 【主要元件符號說明】 1、40 :電子射線照射裝置 2 :電子槍 3 :容器 4、 41 :第1窗單元 5、 42 :第2窗單元 -24- 200832448 9 :細絲（電子放出構件） 1 4 :電子射線通過孔 24、54 :電子射線射出窗 3 0、5 7 :導入管 3 1、5 8 :排出管 32 :圚板構件（電流讀出電極） 3 4、6 3 :外窗 61:板構件（電流讀出電極） EB :電子射線 S 2 :空間When V rays pass through the outer window, energy is lost, and as a result, output loss occurs. In this case, the smaller the energy of the electron beam, the more remarkable it becomes. Therefore, in order to irradiate a sufficient amount of electron beams to the object to be irradiated, it is possible to prevent the dirt from adhering to the electron beam emitting window, and it is also possible to suppress the output loss of the electron beam of the outer window as much as possible. -4 - 200832448 The present invention has been developed to solve the above problems, and an object of the invention is to provide an electron beam capable of preventing contamination from adhering to an electron beam emitting window and ensuring an amount of electron rays emitted to the outside of the device. Irradiation device. [Means for Solving the Problems] In order to solve the above problems, an electron beam irradiation apparatus according to the present invention includes an electron gun having an electron emission member that emits electron beams, an electron emission member, and an electron a ray through which the electron beam passes through the hole; is fixed to the container by closing the electron ray through the hole, and has a first window unit that emits electron beams passing through the hole through the electron beam to the outside of the container; and fixing The first window unit has a second window unit that emits electron beams emitted from the electron beam emitting window to the outside of the device, and the thickness of the electron beam in the outer axis of the outer window is higher than that of the electron beam emitting window. The thickness of the ray in the direction of the exit axis is small. In the electron beam irradiation apparatus, a second window unit having an outer window is provided to the first window unit having the electron beam emitting window. Therefore, the scattered matter or the like generated when the electron beam is irradiated onto the object to be irradiated is isolated by the outer window, and the dirt is prevented from adhering to the electron beam emitting window. Further, in the electron beam irradiation apparatus, the thickness of the electron beam EB in the outer window in the emission axis direction is formed to be smaller than the thickness of the electron beam EB in the emission axis direction of the electron beam emission window. Therefore, the output loss when the electron beam emitted from the electron beam emitting window passes through the outer window can be suppressed to an extremely small level, and the amount of electron rays emitted to the outside of the device can be sufficiently ensured. Further, it is preferable that the second window unit can be detachably attached to the first window unit. Therefore, the replacement of the second window unit can be easily performed when the dirt adheres to the outer window. Further, since the first window unit is not required to be removed from the container, there is no need to process the vacuum inside the container. Further, it is preferable to provide an introduction pipe for introducing a blunt gas into the space between the first window unit and the second window unit, and a discharge pipe for discharging the blunt gas from the space. According to this configuration, since the blunt gas can flow between the first window unit and the second window unit, when the electron ray is emitted, it is possible to suppress the generation of ozone and the cooling of the electron beam emitting window. The second window unit has a current reading electrode which is disposed so as not to overlap the outer window when viewed from the direction of the emission axis of the electron beam. In this case, it is possible to measure the actual output of the electron beam in an accurate manner by accurately measuring the current generated by the electron beam returned to the outer window side due to scattering or the like in the electron beam emitted from the outer window. Further, there is no case where the current collecting electrode seals a part of the outer window, and the amount of the electron beam from the outer window can be sufficiently ensured. [Effect of the Invention] According to the electron beam emitting apparatus of the present invention, it is possible to prevent the dirt from adhering to the electron beam emitting window, and to sufficiently ensure the amount of the electron beam emitted to the outside of the apparatus. [Embodiment] ' -6- 200832448 ray irradiation installation line section: use the front end part: EB is emitted by the electron flow, for electrical insulation; and the wall is placed, the opener 8 Hereinafter, a preferred embodiment of the electron-emitting device of the present invention will be described in detail with reference to the drawings. [First Embodiment] Fig. 1 is a side sectional view showing the structure of an electron beam according to a first embodiment of the present invention. 2 is a II-II diagram of FIG. 1. As shown in FIGS. 1 and 2, the electron beam irradiation apparatus 1 includes an electron gun 2 that emits electron beams EB, a container 3 that accommodates a filament (electron emitting member) 9 of the electron gun 2, and an electron beam container 3 that is emitted to the outside. The first window unit 4; and the second ray unit EB emitted from the window unit 4 to the second window unit 5 outside the apparatus. The radiation irradiation device 1 is a device that irradiates an object to be irradiated (not shown) on the line, such as drying, sterilization, surface modification, or the like of the object to be irradiated by the electron beam EB, in an environment of an blunt gas such as nitrogen. The electron gun 2 has a rectangular parallelepiped outer casing 6; an insulating block 7 formed of a material having a rim; and a high-pressure-resistant connector 8 which emits a filament 9 of an electron ray EB. The outer casing 6 is fixed to the proximal end side of the container 3 by, for example, gold. On the side of the container 3 of the outer casing 6, a port portion 6a for accommodating the inside of the casing 6 and the accommodating space S1 in the container 3 is provided. Further, a side wall of the outer casing 6 is provided with a connection opening portion 6b. A portion of the inner wall of the outer casing 6 around the opening portion 6b is provided to ensure the bonding strength with the insulating block 7. The insulating block 7 is formed of an electrically insulating material such as an epoxy resin, and the power supply path from the connector 8 to the filament 9 is externally insulated from 200832448. The insulating block 7 has a base portion 7a housed in the casing 6, and a conical projection 7b projecting from the base portion 7a toward the accommodating space S1 side in the container 3 through the opening 6a. The base portion 7a occupies most of the inner space of the outer casing 6, and is in contact with the inner surface of the opening 6a side and the opening 6b side of the outer casing 6. Further, a film 10 made of a conductive material is attached to a portion of the base portion 7a that is not in contact with the inner surface of the outer casing 6, and the film 1 is electrically connected to the outer casing 6 as a ground potential. The surface potential of the inner surface of the outer casing 6 of the insulating block 7 serves as a ground potential, and the stability during operation can be improved. The connector 8 is a connector for supplying a power supply voltage to the filament 9 from the outside of the electron beam irradiation device 1. The connector 8 is inserted into the opening portion 6b on the side of the outer casing 6, and is buried and fixed in the insulating block 7 in a state where the front end is located near the center of the insulating block 7. At the front end portion of the connector 8, the same concavo-convex portion as that of the inner wall of the outer casing 6 is provided to secure the bonding strength with the insulating block 7. • At the base end of the connector 8, an insertion port _ 8a for inserting a power supply plug for holding the front end of the external wiring extending from a power supply device (not shown) is provided. Further, a pair of internal wirings 11, 11 are connected to the front end of the connector 8. The inner wiring 1 1 , 1 1 is extended from the front end of the connector 8 toward the center of the base portion 7 a of the insulating block 7 , and is bent from the center of the base portion 7 a toward the protruding portion 7 b and extends rearward through the center of the protruding portion 7 b To the front end of the protruding portion 7b. The filament 9 is an electronic member that emits an electron beam E B . The filament 9 is attached to the front end portion of the protruding portion 7b of the insulating block 7, and is connected to the internal wiring 1 1 and 11. A grid portion 12 is provided around the filament 9. The gate portion -8-200832448 1 2 is electrically connected to one of the internal wirings 11 and 11. When a high voltage is applied to the filament 9, a high voltage is applied to the gate portion 12, which is feasible. The electric field of the electron is drawn from the filament 9. The electrons drawn by the filaments 9 are emitted as electron rays EB from the holes formed in the center of the gate portion 12. In addition, in order to control the release of electrons by the filaments 9 more precisely, the wiring for the additional gate portion 1 2 is additionally provided in the same manner as the internal wirings 11 and 11, for example, and the filament 9 is provided. It is preferable that the potential of the gate portion 12 is independently controlled independently of the potential. The container 3 is formed in a circular cylindrical shape extending along the emission axis of the electron beam EB, and is hermetically sealed in the outer casing 6 of the electron gun 2. Inside the base end side of the container 3, a cylindrical accommodating portion 13 for accommodating the filament 9 of the electron gun 2, the gate portion 221, and the protruding portion 7b of the insulating block 7 is formed. The diameter of the accommodating portion 13 is formed to be larger than the opening portion 6a of the outer casing 6, and extends from the proximal end of the container 3 to the vicinity of the center. Further, an electron beam passage hole 14 that communicates with the accommodating portion 13 is formed in the inside of the front end side of the container 3. The electron beam is formed in a cylindrical shape having a smaller diameter than the accommodating portion 13 through the hole 14 and extends from the vicinity of the center of the container 3 to the tip end of the container 3 along the emission axis of the electron ray EB. At the front end of the container 3, a plurality of (e.g., six) screw holes (not shown) are formed at a predetermined phase angle. The electromagnetic coil 15 and the electromagnetic coil 16 are disposed along the emission axis of the electron beam EB around the electron beam passage hole 14. The arrangement center of the electromagnetic coil 15 and the electromagnetic coil 16 is identical to the central axis of the electron beam passage hole 14. The electron beam EB passing through the hole 14 by the interaction of the electromagnetic coil 15 and the electromagnetic wire 圏16 is bundled toward the electron beam -9-200832448 emission window 24 to be described later. More specifically, the electromagnetic coil 15 is used to correct the displacement of the mechanical center of each member of the electron gun 2 or the passage constituting the electron beam EB, or the residual magnetic properties of each constituent member and the magnetic field around the installation site. The alignment of the electron ray EB to the desired y-I path (the electron ray passes through the central axis of the hole 14). In the present embodiment, the two electromagnetic coils 15 that face each other function in pairs. The four electromagnetic coils 15 are sandwiched by the electron beam passage holes 14 and are disposed at a phase angle of 90 degrees. To use. In addition, the electromagnetic coil 16 is a bundled wire for collecting the electron beams EB emitted from the electron gun 2 in the electron beam emitting window 24, and is formed by a cylindrical wire portion and soft iron formed by an enamel wire or the like. The magnetic circuit is constructed. With these electromagnetic coils 15, 16, the electron beam EB emitted by the filament 9 can pass through the central axis of the electron through the hole 14 correctly, and does not collide with the inner wall of the electron passage hole 14, and can be correctly guided. Lead to the center of the electron beam exit window 24. Further, as shown in Fig. 2, an exhaust pipe 17 is provided on the side of the container 3. The front end of the exhaust pipe 17 is connected to a vacuum pump 18 that exhausts the housing portion 13 and the electron beam passage hole 14 . The exhaust pipe 17 and the vacuum pump 18 are provided at positions that do not overlap the connector 8 when the electron beam irradiation device i is viewed from the emission axis direction of the electron beam EB. Thereby, the power supply plug or the external wiring inserted into the connector 8 can be prevented from interfering with the vacuum pump 18, and the electron beam irradiation apparatus 1 can be miniaturized. Referring to FIG. 3 and FIG. 4, the first window unit 4 will be described. And the structure of the second window unit 5. Fig. 3 is a plan view of each of the window units as viewed from the direction of the emission axis of the electron beam EB -10- 200832448. Further, Fig. 4 is an enlarged side sectional view of each window unit. As shown in the figure, the window unit 4 is a structure on one end side of the electron beam irradiation device 1, and is used to eject an electron beam EB that has passed through the electron beam through the hole 14 to a unit outside the container 3. The structure of the first window unit 4 includes a pedestal 21, a window substrate 22, a cover 23, an electron beam emitting window 24, and a peripheral member 25. The pedestal 21 is formed of, for example, stainless steel, and has a cylindrical main body portion 21a and a flange portion 2 1 b provided on the proximal end side of the main body portion 21a. A through hole 21 having the same diameter as the electron beam passage hole 14 is formed at the center of the main body portion 2 1 a. Further, a circular recess 21d for mounting the window substrate 22 is formed at the front end portion of the main body portion 2 1 a. Further, on the outer side surface of the main body portion 21a, a male screw portion 2 1 e for mounting the cover 23 is formed. Further, an insulating ring 26 is provided in the flange portion 21b. The insulating ring 26 is formed of an electrically insulating material such as polytetrafluoroethylene, and is fixed to the flange portion 2 1 b so as to surround the main body portion 21a. Further, at the flange portion 2 1 b, six bolt holes 27 are provided at a position outside the insulating ring 26 at a phase angle of about 60 (see Fig. 3). Further, the pedestal 21 is inserted into the bolt holes 27, and the bolts 28 are screwed into the screw holes of the container 3. The through holes 2 1 c are concentric with the electron beam passage holes 14. It is fixed to the front end of the container 3. Further, a groove in which the beak ring 38 is provided is formed at the front end of the container 3, whereby the pedestal 21 and the container 3 are hermetically sealed. Further, the pedestal 21 may be formed integrally with the container 3. In this case, it is not necessary to place the beak ring 38 set -11 - 200832448 at the front end of the container 3. The window substrate 22 is formed of, for example, stainless steel, and has a cylindrical main body portion 22a and a flange portion 22b provided on the proximal end side of the main body portion 22a. In the center of the main body portion 22a, a through hole 22c having a smaller diameter than the through hole 21c of the pedestal 21 is formed. Further, a rectangular recess 22d for mounting the electron beam emitting window 24 is formed at the front end portion of the main body portion 22a. Further, the window substrate 22 is disposed in the recess 21d of the pedestal 21 in a state where the through hole 22c is concentric with the electron beam passage hole 14. The cover 23 is formed of, for example, stainless steel, and has a circular top portion 23a and a cylindrical screw portion 23b formed on one end side of the ceiling portion 23a. In the center of the ceiling portion 23a, an opening portion 23c having a larger diameter than the outer diameter of the main body portion 22a of the window substrate 22 is formed. Further, the inner diameter of the screw portion 23b is formed to have substantially the same diameter as the outer diameter of the main body portion 2 1 a of the pedestal 21, and the inner surface of the screw portion 23b is formed with the outer surface of the main body portion 21a. The threaded portion 21e corresponds to the female thread portion 23d. Further, the cover 23 is screwed to the male screw portion 21e of the pedestal 21 by the female screw portion 23d of the screw portion 23b, and the main body portion 22a of the window substrate 22 and the electron beam emitting window 24 are inserted into the opening portion 23c. In the state, it is embedded in the pedestal 21. Thereby, the flange portion 22b of the window substrate 22 is pressed against the bottom surface of the concave portion 2 1 d of the pedestal 21 by the top portion 23 a of the cover 23, and the window substrate 22 and the pedestal 21 are firmly fixed. Further, a groove in which the beak ring 39 is provided is formed on the bottom surface of the recess 21d of the pedestal 21. Thereby, the window substrate 22 and the pedestal 21 are hermetically sealed. Further, the 〇-shaped ring 38 and the 〇-shaped ring 39 are viewed from the direction in which the electron ray EB is emitted, and are arranged in a stack of -12-200832448, which surrounds the vicinity of the passage path of the electron ray EB, and thus is applied to each Ο The pressing pressures of the rings 38 and 39 are substantially equal, and a highly reliable package can be performed. The electron beam emitting window 24 is a foil-like member for ejecting the electron beam EB passing through the hole 3 through the hole 3 to the outside of the container 3. The electron beam emitting window 24 is formed by, for example, a rectangle, and the thickness of the electron beam EB of the electron beam emitting window 24 in the direction of the emission axis is about 1 〇 // m. The electron beam emitting window 24 is disposed on the bottom surface of the concave portion 22d of the window substrate 22 so as to seal the leading end of the through hole 22c of the window substrate 22, and is hermetically fixed to the window substrate 22 by, for example, soldering. Further, the material of the electron beam emitting window 24 may be a material having a high transmittance of the electron beam EB, and titanium or aluminum may be used in addition to the above-mentioned crucible. The outer member 25 is formed of, for example, stainless steel, and has a hollow cylindrical shape having the same diameter as the insulating ring 26 provided on the flange portion 2 1 b of the pedestal 2 1 . The peripheral member 25 is disposed so as to cover the main body portion 21a of the pedestal 21, the window substrate 22, the cover 23, and the electron beam emitting window 24, and is fixed to the flange portion 21b of the pedestal 21 via the insulating ring 26. At the front end of the peripheral member 25, a plurality of (e.g., four) screw holes 25a are provided at a predetermined phase angle. Further, on the side surface of the peripheral member 25, an introduction pipe 30 is integrally formed, and a discharge pipe 31 is integrally formed at a position opposite to the introduction pipe 30. The introduction pipe 30 and the discharge pipe 31 are connected to a nitrogen circulation device (not shown). Further, when the outer peripheral member 25 is fixed to the flange portion 21b of the pedestal 21, it may be directly fixed without passing through the insulating ring 26. In this case, it is preferable that the insulating ring 26 is disposed between the peripheral member 25 and the second window unit 5. Further, the second window unit 5 is provided with a disk member 32, an outer window mounting ring 33, and an outer window 34. The disk member 32 is formed to have the same diameter as the outer diameter of the peripheral member 25 by, for example, stainless steel. In the central portion of the disc member 32, an opening portion 3 2 a having a smaller outer diameter than the outer diameter of the main body portion 22a of the window substrate 22 is formed. For example, six screw holes 32b are formed around the opening portion 3 2 a. Further, at the edge of the disc member 32, four screw holes 32c corresponding to the respective screw holes 25a of the outer member 25 are formed. Further, the disk member 32 is screwed into the screw hole 25a and the screw hole 32c, respectively, and the screw hole 32b faces the electron beam emitting window 24, and the opening 32a becomes concentric with the electron beam passing hole 14 The method is detachably fixed to the front end of the peripheral member 25. Further, a guide wire (not shown) is attached to the disk member 32. This guide wire is connected to an ammeter 29 (refer to Fig. 1) provided outside the electron beam irradiation apparatus 1. With such a configuration of the disk member 32, the disk member 32 functions as a current reading electrode that reads a part of the electron beam EB. In other words, in the electron beam EB emitted from the outer window 34 in the disk member 32, the electron beam EB which has returned to the outer window 34 side due to the influence of the disorder or the like flows in. The current generated by the electron beam EB flowing into the disk member 32 is sent to the ammeter 29 through the guide wire. Further, the disk member 32 may be integrally formed with the peripheral member 25. The outer window mounting ring 33 is a flat member having a smaller diameter than the circular plate member 32. In the central portion of the outer window mounting ring 33, an opening portion 3 3 a having a larger diameter than the electron beam emitting window 24 is formed. Around the opening portion 3 3 a, six screw holes 3 3 b corresponding to the respective screw holes 3 2 b of the 圚 -14-200832448 plate member 32 are formed. The outer window mounting ring 3 3 is screwed to the screw hole 3 2 b and the hole 3 3 b, respectively, and is fixed to the disk member 3 such that the opening portion 3 2a is concentric with the electron beam passage hole 14 . The inside of 2. The outer window 34 is a foil-shaped member that ejects the electron beam EB emitted from the electron beam emitting window 24 to the outside of the apparatus 1. The outer window 34 is formed in a rectangular shape by, for example, aluminum, and the thickness of the electron beam EB of the outer window 34 in the direction of the emission axis is about #πι. The outer window 34 is fixed to the one side of the outer window mounting ring 33 by soldering so as to seal the opening portion 3 3 a of the outer window mounting ring 33, and is disposed in the opening 32a of the disc member 32. Here, since the outer window 34 and the outer window mounting ring 3 3 do not need to be hermetically sealed, they may be fixed by being sandwiched by the outer window 34 instead of being fixed by soldering. In this case, when the opening portion 3 3 a of the outer window mounting ring 3 3 and the opening portion 3 2 a of the disc member 3 2 are formed to have the same size, for example, when the fixing operation of the outer window 34 is performed, The outer window 34 is prevented from being damaged by the contact with the edge portion of the opening portion 32a and the opening portion 33a. Further, the thickness of the electron beam EB of the outer window 34 in the emission axis direction is smaller than the thickness of the electron beam EB in the emission axis direction of the electron beam emitting window 24, but 'there is no need to closely hold the first window unit 4 The airtightness with the second window unit 5 is such that the outer window 34 can be thinned to about 1 //m from the viewpoint of further reducing the output loss of the electron beam EB. Further, the material constituting the outer window 34 may include a material having a larger atomic order than the material of the electron beam emitting window 24. Examples of the material constituting the outer window 34 include carbon (organic film), oxidized crystal, sand, titanium, -15 «200832448 nickel, copper, silver, gold, and various alloys. These materials have excellent heat resistance as an outer window because of their excellent heat resistance. In the electron beam irradiation apparatus 1 having the above configuration, the inside of the container 3 is exhausted by the vacuum pump 18, and the voltage of several tens of kV to several hundreds kV is supplied from the external power source via the internal wiring Π1,1. When supplied to the filament 9, electrons are emitted from the filament 9. The electrons emitted from the filaments 9 are accelerated by the electric field formed by the gate portion 12, and become electron beams E B . The electron beam EB is corrected by the electromagnetic coil 15 while passing through the hole 14 by the electron beam, and then is bundled by the electromagnetic coil 16 and emitted through the electron beam emitting window 24 and the outer window 34 to be emitted to external. The emitted electron beam EB is irradiated to an object to be irradiated such as a printed matter flowing on the line in an airy atmosphere such as nitrogen. When the electron beam EB is emitted from the electron beam emitting window 24 and the outer window 34, a part of the electron beam EB toward the object to be irradiated is returned to the outer window 34 side due to the influence of disorder or the like, and flows into the second window unit. 5 disc member 3 2 . The current generated by the inflow of a part of the electron beam EB is sent to the ammeter 29 by the disk member 32, and the current enthalpy is monitored. Further, a certain amount of nitrogen gas is introduced into the space S2 between the first window unit 4 and the second window unit 5 by the introduction pipe 3, and the nitrogen gas introduced into the space S2 is discharged from the discharge pipe 31 to the nitrogen circulation device. . As described above, in the electron beam irradiation apparatus 1, the second window unit 5 having the outer window 34 is provided to the first window unit 4 having the electron emission window 24. Therefore, the scattered matter or the like generated when the electron beam EB is irradiated onto the object to be irradiated is isolated by the outer window 34, and the contamination can be prevented from adhering to the sub-beam emission window 24 of the electricity. Further, in the electron beam irradiation apparatus 1, the thickness of the electron beam EB in the outer window in the emission axis direction is formed to be smaller than the thickness of the electron beam EB in the emission axis direction of the electron beam exit window 24. Therefore, the output loss when the electron beam EB emitted from the electron beam emitting window 24 passes through the outer portion 4 is suppressed to be extremely small, and the amount of the electron beam EB emitted to the device portion can be sufficiently ensured. Further, in the electron beam irradiation apparatus 1, the disk member 32 of the second window unit 5 can function as a current reading electrode. Therefore, it is possible to detect the unevenness of the thickness of the electron beam emitting window 24 or the adhesion of scattered matter or dirt generated when the electron beam £8 is irradiated onto the object to be irradiated, and the window changes depending on the passage of the operation time. The surface state of 34 can accurately and accurately measure the output (actual output) of the electron beam EB actually emitted from the outer window 34. Further, since the disk member 32 is disposed so as not to overlap the electron beam emission 24 and the outer window 34 when viewed from the emission axis direction of the sub-ray EB, the electrons from the electron emission window 24 can be sufficiently ensured. The amount of radiation EB emitted. When it is confirmed that the actual output is lowered based on the measurement of the actual output of the electron beam EB, it is considered that the dirt adheres to the outer window 34, so that the replacement of the outer window 34 is required. In this case, in the electron beam irradiation apparatus 1, the second window unit can be easily removed from the first window unit 4 by removing the screw 35. Therefore, the replacement of the outer window 34 can be easily performed. Further, since it is not necessary to remove the first window unit 4 from the container 3, a process of vacuum leaking inside the container 3 is not required. Therefore, the stop time of the device when the window is replaced can be significantly shortened. In the case of the electron beam irradiation device 1, the electron beam irradiation device 1 is provided with a space S2 between the first window frame and the second window unit 5. The nitrogen introduction pipe 30 discharges the nitrogen discharge pipe 31 from the space S2. With such a configuration, when the electron beam EB is emitted from the electron beam emitting window 24, ozone is generated in S2. Further, by flowing nitrogen gas in the space S2, the electron beam can emit the cooling effect of the window 24 and the outer window 34. [Second Embodiment] Next, a wire irradiation device according to a second embodiment of the present invention will be described in detail. Fig. 5 is a side sectional view showing the structure of an electron beam irradiation according to a second embodiment of the present invention. 6 is a line VI-VI of FIG. 5. As shown in FIG. 5 and FIG. 6, in the electron beam irradiation 40 of the second embodiment, the electron beam EB passing through the electron passage hole 14 of the container 3 is deflected at a high speed in a predetermined direction by the deflection coil 52. The first window unit 41 and the second window unit 42 emit electrons in a line shape, and are different from the first embodiment in which the first window unit 4 and the second window unit 5 are a single electron beam EB. The configuration of the first window unit 41 and the second window unit 42 will be described when the respective window units are viewed in the direction of the emission axis of the electron beam EB. 8 is an enlarged side sectional view of each window unit. As shown in FIGS. 7 and 8, the window unit 41 is configured to include a body 51, a window substrate 53, an electron beam emitting window 54, and a shape of the peripheral member frame 51 so as to face from the base end side toward the front end side. The electron element 4: and the suppressable space obtain the sub-shooting section to emit the radiation from the I EB. Fig. Plane: Frame 55 ° Ray -18- 200832448 The shape of the EB's deflection direction (X direction in Figure 5) is enlarged. On the proximal end side of the frame body 51, an opening portion 51a having the same diameter as the electron beam passage hole 14 is formed, and the front end side of the frame body 51 has a rectangular opening. Further, a circular flange portion 5 1 b is formed on the edge of the proximal end side of the frame " 5 1 . Further, the casing 5 1 is positioned such that the opening 5 1 a is concentric with the electron beam passage hole 14 and is hermetically fixed to the front end of the container 3. Further, a φ deflection coil 52 is provided in the vicinity of the flange portion 51 b on the proximal end side of the casing 51. The deflection coil 52 is a coil that is deflected by the electron beam EB passing through the electron beam passage hole 14 in the casing 51. An L-shaped support member 52a is attached to both ends of the deflection coil 52, and the deflection coil 52 is brought into the frame body 51 by the side walls on the proximal end side of the frame 51 by the support members 52a and 52a. The one side of the side wall orthogonal to the direction of the deflection is disposed. Further, the deflection coil 52 causes the direction in which the electron beam EB passing through the electron beam passage hole 14 is linearly deflected in the X direction in accordance with the current 供给 supplied from an external power source (not shown). The window substrate 53 is formed in a rectangular shape by, for example, stainless steel, and is fixed to the front end of the frame 51. In the center of the window substrate 53, a plurality of are formed. (in this. In the embodiment, five rectangular through holes 53a are formed. Each of the through holes 53a is arranged in a line at a predetermined interval along the direction in which the electron beams EB are deflected. Further, between the through holes 5 3 a and 5 3 a , the partition grooves 53b are formed in the direction orthogonal to the direction in which the electron beams EB are directed. Further, a rectangular ring-shaped insulating ring 56 formed of, for example, polytetrafluoroethylene or the like is fixed to the edge of the window substrate 53. In the same manner as in the first embodiment, the electron beam emitting window 54 has a rectangular shape, for example, and the electron -19 - 200832448 of the electron beam emitting window 54 has a thickness in the direction of the emission axis of about 10,000 // m. The electron beam emitting window 54 is provided for each of the through holes 53a, and is soldered to the window substrate 53 so as to seal the leading end of each of the through holes 53a. Further, at the front end of the casing 51, a groove in which the beak ring 60 is provided is formed. Thereby, the window substrate 53 and the frame 51 are kept hermetically sealed. The peripheral member 55 has a hollow rectangular parallelepiped shape of the same size as the window substrate 53, and is fixed to the window substrate 53 via an insulating ring 56. Screw holes 55 5 a are formed at both end portions of the front end side of the outer peripheral member 5 in the X direction. Further, on the side surface in the X direction of the outer peripheral member 55, the introduction pipe 57 is integrally formed, and the discharge pipe 58 is integrally formed at a position opposite to the introduction pipe 57. The introduction tube 57 and the discharge tube 58 are connected to a nitrogen circulation device (not shown). Further, when the peripheral member 55 is fixed to the window substrate 53, it may be directly fixed without passing through the insulating ring 56. In this case, it is preferable that the insulating ring 56 is disposed between the peripheral member 55 and the second window unit 42. The second window unit 42 is configured to include a plate member 61, an outer window mounting member 62, and an outer window 63. The plate member 61 is formed in the same size as the peripheral member 55 by, for example, stainless steel. In the central portion of the plate member 61, a rectangular opening portion 61a for exposing each electron beam emitting window 504 is formed, and at both end portions of the plate member 61 in the X direction, a peripheral member 5 is formed. The screw hole 5 5 a of 5 corresponds to the screw hole 6 1 b. Further, on the surface side of the plate member 61, a screw hole 6 1 c is formed so as to sandwich the opening portion 61 1 at a position closer to the inner side than the screw hole 6 1 b. Further, the plate member 61 is screwed to the screw hole 55a and the screw hole 61b, respectively, and is detachably fixed to the peripheral structure in a state where the screw hole 61c faces the electron beam emitting window 54. 200832448 piece 5 5 front end. Further, a guide wire (not shown) is attached to the plate member 61. This guide wire is connected to an ammeter 29 (refer to Fig. 5) provided outside the electron beam irradiation device 40. The structure 'plate member 61 of the plate member 61 functions as a current reading electrode that flows in a part of the electron beam EB. In other words, in the electron beam EB emitted from the outer window 63, the electron beam EB returned to the outer window 63 side due to the influence of scattering or the like flows into the plate member 61. The current generated by the electron beam EB flowing into the plate member 61 passes through the guide wire and is sent to the ammeter 29. Further, the plate member 61 may be integrally formed with the peripheral member 55. The outer window mounting member 62 has a flattened shape having a smaller width than the plate member 61. In the center of the outer window mounting member 62, a rectangular opening portion 62a through which the electron beam emitting window 54 is exposed is formed in the same manner as the plate member 61. Further, screw holes 62b corresponding to the respective screw holes 61c of the plate member 61 are formed in the edge portions of the outer window attachment member 62 in the X direction. The outer window attachment member 62 is fixed to the inner side of the plate member 61 by screwing the screws 65 to the screw holes 6 1 c and the screw holes 62b, respectively. The outer window 63 is formed in a rectangular shape by, for example, aluminum, and the thickness of the electron beam EB of the outer window 63 in the direction of the emission axis is formed to be about several μπι. The outer window 63 is fixed to the one surface side of the outer window attachment member 62 so as to seal the opening 62a of the outer window attachment member 62, and is disposed in the opening portion 61a of the plate member 61. Similarly to the first embodiment, since it is not necessary to hermetically seal the outer window 63 and the outer window mounting member 62, it is also possible to mount the outer window with the outer window - 21 - 200832448. 63 and fixed instead of being fixed by soldering. In this case, when the opening 62a of the outer window mounting member 62 and the opening portion 61a of the plate member 61 are of the same size, for example, when the fixing operation of the outer window 62 is performed, for example, contact can be prevented. The opening portion 61a and the edge portion of the opening portion 62a cause the outer window 63 to be broken. Further, the thickness of the electron beam EB of the outer window 63 in the emission axis direction is smaller than the thickness of the electron beam EB in the emission axis direction of each of the electron beam emission windows 54 described above, but the first window does not need to be closely held. Since the airtightness between the unit 4 1 and the second window unit 42 is made, the outer window 63 can be thinned to about 1 // m from the viewpoint of further reducing the output loss of the electron beam EB. In the electron beam irradiation device 40 as described above, the second window unit 42 having the outer window 63 can be provided to the first window unit 41 having the electron beam emitting window 54 as in the first embodiment. Therefore, the scattered matter or the like generated when the electron beam EB is irradiated onto the object to be irradiated is blocked by the outer window 63, and the contamination can be prevented from adhering to the electron beam emitting window 54. Further, in the electron beam irradiation device 40, the thickness of the electron beam EB in the outer window 63 in the direction of the emission axis is formed to be smaller than the thickness of the electron beam EB in the emission axis direction of the electron beam emission window 54. Therefore, the output loss when the electron beam EB emitted from the electron beam emitting window 54 passes through the outer window 63 can be minimized, and the amount of the electron beam EB emitted to the outside of the apparatus can be sufficiently ensured. Further, in the electron beam irradiation device 40, the plate member 61 of the second window unit 42 also functions as a current reading electrode. Therefore, it is possible to measure the unevenness of the thickness of the electron beam emitting window 54 of -22-200832448 or the scattering of particles or dirt generated when the electron beam EB is irradiated onto the object, and it changes with the passage of the writing time. The surface state of the outer window 63 can accurately and accurately measure the output (actual output) of the electron beam EB actually emitted from the outer window 63. Further, since the plate member 61 is disposed so as not to overlap the electron beam emitting window and the outer window 63 when viewed from the direction of the emission axis of the electric ray EB, the sub-ray EB from the outer window 63 can be sufficiently ensured. The amount of injection. When the actual output is reduced by the measurement of the actual output of the electron beam EB, it is considered that the dirt adheres to the outer window 63, so that the replacement of the outer window 63 is required. In this case, in the electron beam irradiation device 40, the second window unit 42 can be easily removed from the first window unit 41 by removing the screw 64. Therefore, the replacement of the outer window 63 can be easily performed. Further, since it is not necessary to remove the first window unit 41 from the container 3, a process of vacuum leaking inside the container 3 is not required. Therefore, the stop time of the device when the window is replaced can be shortened. Further, the electron beam irradiation device 40 includes an introduction 57 that introduces nitrogen gas into the space S2 between the first window unit 41 and the second window unit 42, and a discharge pipe 58 that discharges nitrogen gas from the space S2. With this configuration, it is possible to suppress generation of ozone in the space S2 when the electron beam is emitted from the electron beam emitting window 54. Further, the cooling effect of the electron beam emitting window 54 and the outer window 63 can be obtained by flowing nitrogen gas into the space. [Industrial use possibility] To the moving and the transmission 54 The electrical original element of the electric radiation element EB S2 -23- 200832448 According to the electron beam injection device of the present invention, it is possible to prevent dirt from adhering to the electron beam. The emission window can also sufficiently ensure the amount of electron rays emitted to the outside of the device. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a side sectional view showing the structure of an electron beam irradiation apparatus according to a first embodiment of the present invention. Figure 2 is a cross-sectional view taken along line II-II of Figure 1. Fig. 3 is a plan view of each of the window units viewed from the direction of the exit axis of the electron ray EB. Fig. 4 is an enlarged side sectional view of each window unit. Fig. 5 is a side sectional view showing the structure of an electron beam irradiation apparatus according to a second embodiment of the present invention. Figure 6 is a cross-sectional view taken along line VI-VI of Figure 5; Fig. 7 is a plan view showing the respective window units in the direction of the emission axis of the electron ray EB. Figure 8 is an enlarged side sectional view of the window unit. [Description of main component symbols] 1. 40: Electron beam irradiation device 2: Electron gun 3: Container 4, 41: First window unit 5, 42: Second window unit-24 - 200832448 9 : Filament (electronic discharge member) 1 4: electron beam passage holes 24, 54: electron beam emission windows 3 0, 5 7 : introduction tubes 3 1 , 5 8 : discharge tube 32: seesaw member (current readout electrode) 3 4, 6 3 : outer window 61 : plate member (current readout electrode) EB : electron beam S 2 : space
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