200829708 九、發明說明： 【發明所屬之技術領域】 本發明係關於—種真空熱蒸鍍裝置，更特酬是關於-種 可蒸鑛金屬材料以形成金屬薄膜於基板之真空熱蒸鑛裝置。 【先前技術】 D l年來對於可顯示影像之各種平面顯示n巾之電激發光 顯示器正熱烈地進行研究。其中一種電激發光顯示器-有機電 激發光顯示H，為-種自發絲式之顯科，其不需分開之發 光兀件如月光等。有機電激發光顯示器因為其具有低耗能以及 高效率的特點，喊為受大«目的平面顯示器。 使用於有機電激顯示器的有機發光二極體（0LED)的結 〇 獅為’板上财堆疊職第-雜層紅極電極層、有 機务光部以及對應第二電極層的負極電極層。有機發光部包括 有機發光層’在此電子和電聽合㈣成激子並產生光線。 為了進-步強化有機發光層的發光效率，電子和電洞必須 更活躍地到達有機發光層。因此，可以將電子傳輪層（肌） 設置在負極電極層與有機發光層之間，以及將電洞傳輸層（ 200829708 HTL)设置於正極電極層和有機發光層之間。也可以將電子注 入層（EIL)設置於負極電極層與電子傳輸層間，以及將電洞 注入層（HIL)設置於正極電極層和電洞傳輸層之間。 傳統上係使用熱蒸鍍方法在建構前述有機電激顯示器形 成金屬電極層於各層間。用於熱蒸鍍法之一般真空熱蒸鍍裝置 係包括成真空狀態的腔體，設置於腔體中的晶舟，以及加熱器 以對晶舟加熱。在真空熱蒸鍍裝置中，加熱器產生的熱傳導到 晶舟，熔化並蒸發供應在晶舟中的金屬材料。蒸發的金屬材料 抵達並凝結於置於晶舟上方的基板上，以形成金屬薄膜於基 板0 然而在傳統真空熱蒸鍍裝置中，金屬材料係以金屬球或線 的形式供應至晶舟。金屬材料可能無法均勻地熔化並分布於晶 舟中，使得金屬薄膜無法均勻地沉積於基板上，尤其是大尺寸 的基板。此外，因為不易控制金屬材料的蒸發，也很難調整形 成在基板表面的金屬薄膜厚度。 此外’因為絲加熱及蒸發金屬材料的加熱器為傳導式加 熱器’需要很長的加熱時間，可能對欲形献屬薄膜的有機發 6 200829708 光一極體的有機層造成損壞 【發明内容】 …本毛明提供—種真空熱驗裝置，其係可在大尺寸基板上 形成均勻之薄膜’並可輕易地調整薄膜的厚度。200829708 IX. Description of the Invention: [Technical Field] The present invention relates to a vacuum thermal evaporation device, and more particularly relates to a vacuum thermal distillation device for forming a metal film on a substrate. [Prior Art] In the past years, the display of the electric excitation light for the various surfaces of the displayable image has been actively studied. One type of electroluminescent display-organic electroluminescence display H is a kind of self-hair type, which does not need separate light-emitting elements such as moonlight. The organic electroluminescent display is called the large-scale flat-panel display because of its low energy consumption and high efficiency. The OLED of the organic light-emitting diode (0LED) used in the organic electro-excitation display is an on-board stacking-hybrid red electrode layer, a holster light portion, and a negative electrode layer corresponding to the second electrode layer. The organic light-emitting portion includes an organic light-emitting layer where electrons and electrons are combined to form excitons and generate light. In order to further enhance the luminous efficiency of the organic light-emitting layer, electrons and holes must reach the organic light-emitting layer more actively. Therefore, an electron transport layer (muscle) may be disposed between the negative electrode layer and the organic light-emitting layer, and a hole transport layer (200829708 HTL) may be disposed between the positive electrode layer and the organic light-emitting layer. An electron injection layer (EIL) may be disposed between the negative electrode layer and the electron transport layer, and a hole injection layer (HIL) may be disposed between the positive electrode layer and the hole transport layer. Conventionally, the above-described organic electro-excitation display has been used to form a metal electrode layer between layers by a thermal evaporation method. A general vacuum thermal evaporation apparatus for a thermal evaporation method includes a cavity in a vacuum state, a boat mounted in the cavity, and a heater to heat the boat. In the vacuum thermal evaporation apparatus, heat generated by the heater is conducted to the boat, melting and evaporating the metal material supplied in the boat. The evaporated metal material arrives and condenses on the substrate placed above the boat to form a metal film on the substrate. However, in the conventional vacuum thermal evaporation device, the metal material is supplied to the boat in the form of a metal ball or wire. The metal material may not be uniformly melted and distributed in the boat, so that the metal film cannot be uniformly deposited on the substrate, especially a large-sized substrate. Further, since it is difficult to control the evaporation of the metal material, it is difficult to adjust the thickness of the metal film formed on the surface of the substrate. In addition, because the heater that heats and evaporates the metal material is a conductive heater, it takes a long heating time, which may cause damage to the organic layer of the organic light 6 200829708 light body of the thin film. [Inventive content] ... Ben Maoming provides a vacuum thermal inspection device which can form a uniform film on a large-sized substrate and can easily adjust the thickness of the film.
本發明更提供一種直 從具二熱瘵鍍裝置，可以預定的比例混合 兩種不同的材料，並均勻地沉積薄膜。 月”他的目的將於以下描述中闡明，部分將從描述中 清楚地了解’射從實施本發明而得知。 一*根據本發社—面向，係提供—種真空熱驗裝置，包括 脸體’係於真空狀態；一晶舟’係設置於腔體，並包括具有 一預定長度之-溶化爐於晶舟之—頂端；―供應單元，係用以 供應-金屬薄片至熔化爐；以及—加熱器，係對晶舟加熱，並 、々匕及；务由供應單元所供應之金屬薄片，並沉積蒸發之金屬 薄片於位於腔體中之一基板上。 供應單7L包括第一和第二供應單元，係用以供應金屬薄片 200829708 於晶舟的兩側。 可以理解，以上之概述和以下之詳細描述都是示例性和解 釋性的’且旨在爲所要求保制本發明提供進—步的說明。 【實施方式】 本發明於下文t，參照伴隨展報佳具體實_之圖式， 將作較詳盡的描述。然而，本發明可以許多不同之形式加以具 體實施’且其娜；f應’本文巾所呈現之具體實施例。相反 的，这些紐的具體實關雜供贿本發明紋整揭露，且 能完整地傳達本發明之範斜倾術領域巾具有通常知識者 。圖式中，層無域之尺寸及姆尺寸可能為求清晰而放大。 又圖式中，相同元件符號代表相同元件。 第1圖係根據本發明實施例之真空熱蒸鍍裝置1〇〇的圖式 。第2圖則是第1圖所顯示的真空熱蒸鑛裝置⑽的晶舟U0和加 熱為14G的立體®。帛3®則是辟第2®III_III狀剖面圖。 5月芩考第1、2、3圖，真空熱蒸鍍裝置1⑻包括腔體110、 晶舟】20、供應單元13〇以及加熱器14〇。 200829708 腔體110係呈真空狀態。所要形成薄膜的基板10進入腔體 110。晶舟120係設置於腔體110中。基板10放置在腔體11〇上部 ’而晶舟120係放置在基板1〇之下。基板1〇和晶舟12〇可以相對 移動。當大尺寸基板進入腔體110時，晶舟12〇係較佳地相對於 基板10移動。然而本發明並不限定於此。 〇 晶舟120包括熔化爐121於其上。熔化爐121熔化自供應單 元130供應的金屬薄片20。熔化爐121可如第2圖所示般延伸。 熔化爐121為方便吸收以下所描述之加熱器14〇所產生的熱，係 較佳以具有高熱傳導性的黑陶瓷製成。 溶化爐121係以複數個在熔化爐121長軸方向以預定間隔 設置之阻隔壁分所隔開。這樣的安排是為了避免熔化的金屬材 U 料部分隆起（lumPing)，才可在熔化爐121的長軸方向上均勻 地条餐以及分布溶化之金屬。如此一來，即使薄膜要形成在大 尺寸的基板上，薄膜仍可以均勻地形成在基板1〇上。 供應單元130係用以供應要形成在基板1〇上的金屬材料至 熔化爐121。根據本實施例，供應單元13〇以金屬薄片的形式供 應金屬材料至熔化爐121。也就是說供應單元】3〇供應具有與熔 9 200829708 化爐121長度所對應寬度的金屬薄片2〇至熔化爐121。金屬薄片 20若是以這種方式供應到熔化爐121，金屬薄片可以在熔化爐 121的長軸方向上均勻地熔化且分布。如此一來，就可以在基 板10上均勻地形成金屬薄膜20 ’並可以輕易地調整金屬薄膜2〇 的厚度。更進一步，因為金屬薄片20可以長時間供應，並且具 有很薄的厚度，金屬薄片20在低溫下輕易且快速地熔化。金屬 〇 薄片20可以鎂（Mg)、銀（Ag)、鎂銀-鋰（MgAg_u)、鋁鋰 (LiAl)、鋰氟-鋁（UF-A1)等所製成。 供應單元130如第1圖所示包括第一供應單元131和第二供 應單元132，以分別供應兩片金屬薄片2〇於晶舟12〇的兩侧。第 一和第二供應單元131和132分別包括捲輪133，以捲住每個金 屬薄片20與傳輸滾輪134，以傳輸繞在捲輪133的金屬薄片2〇 U 雜化爐121。傳輸滾輪134係以成對的方式運作以穩定地傳輸 金屬薄片20。第一和第二供應單元131和132分別進一步地包括 導輪135以導引金屬薄片20的傳輸。 當提供第-和第二供應單元131和132的時候，由不同金屬 材料製成的兩種金屬薄片20透過第一和第二供應單元131和 132同日守供應到炫化爐121，因此不同的金屬材料在溶化爐⑵ 10 200829708 中混合，並且在基板上形成薄膜。兩種不同的金屬材料的混合 比例係由適當地控制第一供應單元131的傳輸滾輪134的旋轉 速度以及第二供應單元132的傳輸滾輪134的旋轉速度來決定 ，如此即可調整供應至熔化爐121融化金屬薄片2〇的量。 加熱器140係用來供應熱至晶舟丨2〇以熔化且蒸發自供應 ζ ) 单元130所供應的金屬薄片2〇。如此一來，加熱器140設置於溶 化爐121下。此外，也可以提供複數個加熱器14〇以均勻地供應 熱至熔化爐121。在本實施例中，每個加熱器14〇係設置在阻隔 壁122之間，但本發明非以此為限。 加熱器140可為_素燈。因為在供電至函素燈時，鹵素燈 可以快速釋放熱，這樣就可增加金屬薄片2〇的蒸發速率。加熱 器140並不限於使用鹵素燈，可為任何足以快速放熱的光源。 為集中加熱器140產生的熱至熔化爐121，晶舟12〇更包括 反射單元123，如第3圖所示。反射單元123在此係設置在加熱 器140下，並且將加熱器14〇產生的熱反射到熔化爐121。反射 單元123係由白陶瓷等具有低熱傳導性及高反射性的材料所製 成。反射單元123熱輻射出加熱器14〇所產生的熱，並且穩定地 200829708 傳送熱到熔化爐121，使得炼化在熔化爐121中的金屬薄片2〇 的溫度可以快速地到達蒸發溫度。 以下描述使用真空熱蒸鍍裝置100以在基板1〇上形成金屬 薄膜的方法。 Ο 首先’欲形成薄膜的基板10放置到腔體110的上部，然後 將腔體内部抽真空。又，對應於要形成在基板10上的材料的金 屬薄片20 ’則繞於第一和第二供應單元131和132的各個捲輪 133 ’接著將每個金屬薄片2〇的端部放入晶舟丨2〇的熔化爐121 中。若需要將兩種不同的金屬材料混合以在基板上形成薄膜， 由不同材料所製成的金屬薄片20就分別捲繞在第一和第二供 * 應單元131和U2的捲輪133上，而且每個金屬薄片20的頂端就 (J 放入晶舟120的熔化爐121中。也提供供應電壓至加熱器14〇以 從加熱器140產生熱。 加熱器140所產生的熱以熱輻射等的方式傳送到熔化爐 121 ’並且被反射單元123所反射，使得熔化爐121被加熱。當 熔化爐121被加熱時，金屬薄片20開始溶化。因為熔化爐121 以複數個阻隔壁122所分隔，熔化的金屬薄片20均勻地在熔化 12 200829708 爐121的長轴方向上分佈。如此一來，當金屬薄片2〇開始熔化 ，則驅動弟一和弟^一供應早元131和132使得金屬薄片20可以連 續地供應到熔化爐121中。 此時，當被熔化爐121所熔化的金屬薄片20被加熱到蒸發 的溫度，金屬薄片20開始蒸發。蒸發的金屬薄片20凝結在基板 〇 10的表面，使得金屬薄膜形成在基板10上。形成在基板10上的 金屬薄膜厚度可藉由控制基板10和晶舟丨20之間相對移動的速 率、金屬薄片20供應到熔化爐121的速率、加熱器14〇的溫度、 金屬薄片20的厚度等方法來調整。 如前所述，根據本發明可以得到下列的優點。 ί/ 第一，供應單元供應熔化爐厚度相當薄並對應熔化爐長度 之寬度的金屬薄片，以在熔化爐的長轴方向上均勻熔化及分布 金屬薄片。因此可在基板上，尤其是大尺寸的基板上，形成均 勻的金屬薄膜，且也可輕易調整金屬薄膜的厚度。此外，也可 長日寸間連續供應金屬薄片，並輕易且快速地在低溫融化金屬薄 片0 13 200829708 第二，因為熔化爐以複數個阻隔壁分隔開，被熔化爐熔化 的金屬材料在熔化爐的長軸方向上均勻地分布且蒸發，而不會 形成隆起（lumps)。因此可以在基板上形成均勻的薄膜。 第二，因為由不同的材料所製成的金屬薄膜可同時以不同 的速率，由第一和第二供應單元供應至熔化爐，兩種不同的金 f) 屬材料可以預定比例混合且形成薄膜在基板上。 對於本領域技術人員來說很顯然，可以在不脫離本發明精 神或範圍的前提下對本發明進行各種修改和變型。因此，本發 明曰在涵蓋本發明的這些修改和變型，只要這些修改和變型落 在所附申請專利範圍和其等效的範圍之内。 〇 【圖式簡單說明】 …附圖被包括進來以對本發明提供進—步的理解，且包含在 況明書中並構成本說明書的—部分，說明本發明示範的實施例 ’並且和描述一起解釋本發明的目的。 圖係為根據本發明之—個實施例真空熱級裝置圖； 弟2圖係為第1圖中所示之真空熱蒸鑛裝置中所包含之晶 舟及加熱器立體圖； 14 200829708 第3圖係沿第2圖ΙΙΙ-ΙΙΙ線之剖面圖。 【主要元件符號說明】 10 基板 20 金屬薄片 100真空熱蒸鍍裝置 110腔體 120晶舟 121 熔化爐 122 阻隔壁 123 反射單元 130供應單元 131第一供應單元 132第二供應單元 133 捲輪 134傳輸滚輪 135 導輪 140加熱器The present invention further provides a direct heating apparatus for mixing two different materials in a predetermined ratio and uniformly depositing a film. "The purpose of the month" will be clarified in the following description, and it will be clearly understood from the description that 'the shot is known from the implementation of the present invention. One* according to the present invention-oriented, provides a vacuum thermal inspection device, including the face The body ' is in a vacuum state; a wafer boat is disposed in the cavity and includes a melting furnace having a predetermined length at the top of the wafer boat; a supply unit for supplying the metal foil to the melting furnace; - a heater that heats the wafer boat, and the metal foil supplied by the supply unit, and deposits the evaporated metal foil on one of the substrates in the cavity. The supply list 7L includes the first and the first The two supply units are used to supply the foils 200829708 on both sides of the boat. It is to be understood that the above summary and the following detailed description are exemplary and explanatory and are intended to provide - Description of the steps. [Embodiment] The present invention will be described in more detail below with reference to the accompanying drawings, however, the present invention can be embodied in many different forms. And it should be the specific embodiment of the present invention. Conversely, the specifics of these new types are disclosed, and the invention can fully convey the invention. In the drawings, the size and the size of the layer without the domain may be enlarged for clarity. In the drawings, the same component symbols represent the same components. FIG. 1 is a vacuum thermal evaporation device 1 according to an embodiment of the present invention. The pattern of 〇〇. The second picture is the boat U0 of the vacuum hot-steaming device (10) shown in Figure 1 and the three-dimensional heating of 14G. The 帛3® is the 2®III_III profile. In the first, second, and third drawings, the vacuum thermal evaporation device 1 (8) includes a cavity 110, a boat, a supply unit 13A, and a heater 14A. 200829708 The cavity 110 is in a vacuum state. The substrate 10 enters the cavity 110. The wafer boat 120 is disposed in the cavity 110. The substrate 10 is placed on the upper portion of the cavity 11 and the wafer boat 120 is placed under the substrate 1. The substrate 1 and the wafer boat 12 can be Relative movement. When a large-sized substrate enters the cavity 110, the wafer boat 12 is preferably phased. The substrate 10 is moved. However, the present invention is not limited thereto. The wafer boat 120 includes a melting furnace 121. The melting furnace 121 melts the metal foil 20 supplied from the supply unit 130. The melting furnace 121 can be as shown in Fig. 2. The melting furnace 121 is preferably made of a black ceramic having high thermal conductivity in order to facilitate absorption of heat generated by the heater 14 described below. The melting furnace 121 is plural in the longitudinal direction of the melting furnace 121. The barrier walls are disposed at predetermined intervals. This arrangement is to avoid lumping of the molten metal material U to uniformly distribute the meal and distribute the molten metal in the long axis direction of the melting furnace 121. In this way, even if the film is to be formed on a large-sized substrate, the film can be uniformly formed on the substrate 1 . The supply unit 130 is for supplying a metal material to be formed on the substrate 1 to the melting furnace 121. According to the present embodiment, the supply unit 13 供 supplies the metal material to the melting furnace 121 in the form of a metal foil. That is to say, the supply unit is supplied with a metal foil 2 having a width corresponding to the length of the melting furnace 121, to the melting furnace 121. If the metal foil 20 is supplied to the melting furnace 121 in this manner, the metal foil can be uniformly melted and distributed in the long axis direction of the melting furnace 121. As a result, the metal thin film 20' can be uniformly formed on the substrate 10 and the thickness of the metal thin film 2 can be easily adjusted. Further, since the metal foil 20 can be supplied for a long time and has a very thin thickness, the metal foil 20 is easily and rapidly melted at a low temperature. The metal ruthenium sheet 20 may be made of magnesium (Mg), silver (Ag), magnesium silver-lithium (MgAg_u), aluminum lithium (LiAl), lithium fluoride-aluminum (UF-A1) or the like. The supply unit 130 includes a first supply unit 131 and a second supply unit 132 as shown in Fig. 1 to supply two sheets of metal foil 2 to the sides of the wafer boat 12A, respectively. The first and second supply units 131 and 132 respectively include reels 133 for winding each of the metal sheets 20 and the transport rollers 134 to transport the foil 2 〇 U hybrid furnace 121 wound around the reels 133. The transport rollers 134 operate in a paired manner to stably transport the foil 20. The first and second supply units 131 and 132, respectively, further include a guide wheel 135 to guide the transfer of the foil 20. When the first and second supply units 131 and 132 are provided, the two metal foils 20 made of different metal materials are supplied to the glazing furnace 121 through the first and second supply units 131 and 132, and thus are different. The metal material is mixed in the melting furnace (2) 10 200829708, and a film is formed on the substrate. The mixing ratio of the two different metal materials is determined by appropriately controlling the rotational speed of the transport roller 134 of the first supply unit 131 and the rotational speed of the transport roller 134 of the second supply unit 132, so that the supply to the melting furnace can be adjusted. 121 melts the amount of metal foil 2〇. The heater 140 is used to supply heat to the boat 2 to melt and evaporate the foil 2 supplied from the supply unit 130. In this way, the heater 140 is disposed under the melting furnace 121. Further, a plurality of heaters 14 may be provided to uniformly supply heat to the melting furnace 121. In the present embodiment, each of the heaters 14 is disposed between the barrier walls 122, but the invention is not limited thereto. The heater 140 can be a s-light. Since the halogen lamp can quickly release heat when the power is supplied to the element lamp, the evaporation rate of the foil 2〇 can be increased. The heater 140 is not limited to the use of a halogen lamp and can be any light source that is sufficiently fast to dissipate heat. To concentrate the heat generated by the heater 140 to the melting furnace 121, the boat 12 further includes a reflecting unit 123 as shown in Fig. 3. The reflecting unit 123 is here disposed under the heater 140, and reflects the heat generated by the heater 14 to the melting furnace 121. The reflecting unit 123 is made of a material having low thermal conductivity and high reflectivity such as white ceramic. The reflecting unit 123 thermally radiates heat generated by the heater 14 and stably transfers heat to the melting furnace 121 in 200829708, so that the temperature of the foil 2〇 refining in the melting furnace 121 can quickly reach the evaporation temperature. A method of forming a metal thin film on the substrate 1 by using the vacuum thermal evaporation device 100 will be described below. Ο First, the substrate 10 on which the film is to be formed is placed on the upper portion of the cavity 110, and then the inside of the cavity is evacuated. Further, the metal foil 20' corresponding to the material to be formed on the substrate 10 is wound around the respective reels 133' of the first and second supply units 131 and 132, and then the ends of each of the metal foils 2' are placed in the crystal In the melting furnace 121 of the boat 2 。. If it is necessary to mix two different metal materials to form a film on the substrate, the metal foil 20 made of different materials is wound around the reels 133 of the first and second supply units 131 and U2, respectively. Further, the top end of each of the metal foils 20 is placed in the melting furnace 121 of the wafer boat 120. A supply voltage is also supplied to the heaters 14 to generate heat from the heaters 140. The heat generated by the heaters 140 is radiated by heat or the like. The manner is transmitted to the melting furnace 121' and is reflected by the reflecting unit 123, so that the melting furnace 121 is heated. When the melting furnace 121 is heated, the metal foil 20 starts to melt. Since the melting furnace 121 is separated by a plurality of barrier walls 122, The molten metal foil 20 is evenly distributed in the direction of the long axis of the melting 12 200829708 furnace 121. Thus, when the metal foil 2 starts to melt, the first and second brothers 131 and 132 are driven to make the foil 20 It can be continuously supplied to the melting furnace 121. At this time, when the metal foil 20 melted by the melting furnace 121 is heated to the evaporating temperature, the metal foil 20 starts to evaporate. The evaporated metal foil 20 is condensed on the substrate 〇 The surface of 10 is such that a metal film is formed on the substrate 10. The thickness of the metal film formed on the substrate 10 can be controlled by the rate of relative movement between the substrate 10 and the wafer boat 20, and the rate at which the foil 20 is supplied to the melting furnace 121 The temperature of the heater 14 、, the thickness of the metal foil 20, etc. are adjusted. As described above, the following advantages can be obtained according to the present invention. ί/ First, the supply unit supply melting furnace is relatively thin and corresponds to the length of the melting furnace The width of the metal foil to uniformly melt and distribute the metal foil in the long axis direction of the melting furnace. Therefore, a uniform metal film can be formed on the substrate, especially on a large-sized substrate, and the metal thin film can be easily adjusted. In addition, it is also possible to continuously supply foils between long days and to melt metal foils at low temperatures easily and quickly. 0 13 200829708 Second, because the melting furnace is separated by a plurality of barrier walls, the metal material melted by the melting furnace Uniformly distributed and evaporated in the long axis direction of the melting furnace without forming lumps. Therefore, a uniform thin film can be formed on the substrate. Second, because the metal film made of different materials can be supplied to the melting furnace at the same time by the first and second supply units at different rates, the two different gold f) materials can be mixed and formed in a predetermined ratio. The film is on the substrate. It will be apparent to those skilled in the art that various modifications and <RTIgt; variations</RTI> of the invention may be made without departing from the spirit and scope of the invention. Therefore, the present invention is intended to cover such modifications and variations of the present invention as long as they are within the scope of the appended claims and their equivalents. BRIEF DESCRIPTION OF THE DRAWINGS [The accompanying drawings are included to provide a further understanding of the invention, and are included in the description and constitute a part of the specification, the exemplary embodiments of the invention are described and explained together with the description The purpose of the invention. The figure is a vacuum heat level device according to an embodiment of the present invention; the second drawing is a perspective view of the boat and the heater included in the vacuum heat steaming device shown in Fig. 1; 14 200829708 3 A section along the ΙΙΙ-ΙΙΙ line of Figure 2. [Main component symbol description] 10 substrate 20 metal foil 100 vacuum thermal evaporation device 110 cavity 120 wafer boat 121 melting furnace 122 barrier wall 123 reflection unit 130 supply unit 131 first supply unit 132 second supply unit 133 reel 134 transmission Roller 135 guide wheel 140 heater