200827943 九、發明說明： 【發明所屬之技術領域】 種具巨觀檢測之顯影裝置。 本發明係有關於一種顯影裝置，尤指一 【先前技術】 按，傳統基板經光阻塗佈至顯影之製作過程，如第八圖所示，先執行 倾S10，由-載體承載-基板，接著進行步驟su，清洗該紐，再執 仃步驟S12 ’塗佈光陳清洗後之該基板，進人步驟S13，將經光阻塗佈後 之該基板進行曝光，接著進入步驟S14，顯影經曝光之絲板，再執行步驟 S15，將經顯影之該基板進行光學檢查，最後執行步驟則，將經光學檢查 之該基板魏體承載，因此該紐必彡驗顯影後，侧—人工搬運車 將完成歸彡餘之縣板送至—巨驗職置，續職紐是否產生缺 陷，若發現該基板產生缺陷時，該基板必需回收報廢，如此已浪費大量製 程時間，亦耗費材料及機台運轉之成本。 上述之巨觀檢測裝置係如日本專利公告號第細3371〇6號，此篇專利 内容係為-種巨觀檢測裝置，該巨觀檢測裝置係提供—第—遮罩及一第二 遮罩’分職蔽-第-投射光源L1及―第二投射光源u，並包含一第一^ \ 透鏡及-第二脑騎·分顺該第—魏光源及第二 二射^源呈平行光，更包含―固定錢元件，顧定支撐元件係為了支揮 可放置物件之平自，鋼㈣平台之麟肖度，且提供—續元件，該 小撐張及縮小’使置有物件之該平台上之可自由低擴張及縮 制該該控制器係可調整该固定支撐元件及支擇元件，控 5 200827943 【發明内容】 本發明之主要目的，在於提供_種具E觀檢測之顯影裝置，可於顯影 前檢測已塗佈光阻之-基板，㈣檢測該基板是否產生缺陷，減少製程時 間浪費及提前發現基板異常時間，進而有效降低成本，並提高生產量。 本發明之次要目的，在於提供—種具E觀檢測之顯影裝置，不需花費 人力將已塗佈光阻之該基板搬運至另_巨觀檢測裝置進行檢測，因而節省 時間而提高生產量。 為了達到上述目的，本發明係為一種具巨觀檢測之顯影裝置，該顯影 t㈣包含-E觀檢繼置及-㈣裝置，該巨觀檢職置聽顯影前檢 測已塗佈絲之該基板是紐生㈣，若魏絲板產生缺瞒，則將該 基板回收報廢；或者树光前檢測已塗佈光阻之該基板，若發現該基板產 生缺時，係可將該基板回收重新塗佈光阻。 上述之巨觀檢測裝置係包含一燈箱及一檢測平台，該燈箱係包含至少 -光源組，該光馳聽含複數個統，該些光藝可融統及納光源， 而該光源組前係、具有-活動遮罩，該活動遮罩係、選擇遮蔽該光源組中之一 光源，該光源組係光源至置於該檢測平台之該基板上。 該檢測平台係進-步連接-支撐座，該支撐座係具有至少一螺桿，並 調整該螺桿以調整該檢測平台之傾斜角度，該支撐座上係進一步設有一罩 體，該罩體係使該檢測平台被罩設於其内，該罩體内頂部係設置該燈、箱， 並於該燈箱與檢測平台間，於該罩體上開設一觀測窗，使檢測員於該觀測 窗前檢測該基板是否產生缺陷。 【實施方式】 茲為使貴審查委員對本發明之結構特徵及所達成之功效有更進一步 之瞭解與§忍識，謹佐以較佳之實施例及配合詳細之說明，說明如後： 請參閱第一圖，係為本發明之裝置示意圖。如圖所示：本發明係為一 , 種具巨觀檢測之顯影裝置，該具巨觀檢測之顯影裝置1係包含一巨觀檢測 6 200827943 10及|員衫裝置12，該巨觀檢測裝置1〇係與該顯影裝置12連接，該 =觀檢測裝置10係於顯影前檢測已塗佈光阻之透明基板，檢測該基板是否 生缺陷，如·光阻塗佈不均或已塗佈光阻之絲板上產生複數條痕跡 、mira)等缺陷，右發現該基板產生缺陷時，則將該基板報廢，如此減少 ^新=及新絲時間之浪費，並且可以提前在顯影前觀制基板品質 疋否異#降低產品報廢率；或者讓已塗佈光阻之該基板不曝光而直接利用 以巨觀制裝置1〇進行巨觀檢測，若發現該基板產生缺陷時，則回收該基 板’重新塗佈光阻，不會導致浪賴糾間，有效降低製造成本及提高生 產量。 一請參閱第二圖，係為本發明之—較佳實施例之裝置側面示意圖。如圖 所示：該巨觀檢測裝置1〇係包含一罩體1〇〇、一燈箱1〇3、一檢測平台1〇7 及支撐座108，違支撐座⑽係支樓該檢測平台1〇7，並設有複數個螺桿 109 ’調整該些螺桿⑽以調整該檢測平台1()7之傾斜角度，而該罩體刚 内之頂部設置-燈箱103，該罩體⑽係罩設於該支撐座1〇8上，使該檢測 平。107係被罩设於该罩體1〇〇 0，該檢測平台1〇7上係置放一基板2，並 透過该燈箱103内之投射光源檢測該基板2是否產生缺陷。 請-併參閱第三圖，係為本發明之—較佳實施例之裝置剖面示意圖。 如圖所示··該燈箱103係、包含至少一光源組刚，本實施例之燈箱⑽係包 含六組光源組104，每-組光源組刚係包含複數個光源1{)5，此實施例每 一組光源組104係包含兩個光源1〇5，一光源1〇5為白光源，另一光源1〇5 為鈉光源，而每一組光源組104前係具有一活動遮罩1〇6，該活動遮罩1〇6 係可用以遮蔽一光源105，檢測員係可調整活動遮罩1〇6，以遮蔽另一光源 105。該燈箱103内之該些光源組1〇4係投射光源至放置該基板2之檢測平 台107，以便觀測該基板2是否產生缺陷。 請一併參閱第四圖，係為本發明之一較佳實施例之裝置前視示意圖。 如圖所示··該罩體100係開設一觀測窗101，該觀測窗1〇1係開設於該燈箱 103與檢測平台107之間，以方便檢測員於該觀測窗ι〇1前檢測該基板2是 7 200827943 否產生缺陷，而該觀測窗101中間係設有一支撐柱102支撐該觀測窗1〇l， 並將該觀測窗101分為一第一觀測窗1010及一第二觀測窗1〇12，該第一觀 測窗1010及第二觀測窗1012係分別設置一安全拉門1011、1013，該些安 全拉門1011、1013係於該巨觀檢測裝置10未使用時，可關閉使外界灰塵 及粉塵不容易落於該巨觀檢測裝置1〇内。 請參閱第五圖，係為本發明之另一較佳實施例之裝置剖面示意圖。如 圖所示：本實施例係改善上述實施例之燈箱⑽内之該些光源組⑽之該 些投射光源105投射至該基板2上時，該些統產生散射並不會均句 投射於該絲2上，因此本實施例係於該燈箱⑽前加設—基座麵於該 罩體10G N，該基座麵係用以架設—遮罩臟，而該遮罩騰之材質 係為-透光材質，如此使該些統1G5聽至絲板2時，透過該遮罩係 可使該些光源105均勻投射於該基板2上。 請參閱第六圖’係為本發明之另一較佳實施例之裝置前視示意圖。如圖 所示：本實施例係改善上述實施例之觀測窗101中間之支樓柱1〇2，該支樓 柱1〇2係使該觀測窗101分為該第一觀測窗i⑽及該第二觀測窗臟，如 此使檢測員視線產生死角不便檢測，因此本實施例係於魏測f m上方 兩端分別設置-支撐柱102，並於該觀測f 1Q1加設—安全拉門聰，如200827943 IX. Description of the invention: [Technical field to which the invention pertains] A developing device having a giant inspection. The present invention relates to a developing device, and more particularly to a prior art process for producing a conventional substrate through photoresist coating to development. As shown in the eighth figure, the tilting is performed first, and the carrier is carried by the carrier. Then, the step su is performed to clean the button, and then the substrate after the coating is cleaned in step S12', the step S13 is performed, the substrate after the photoresist coating is exposed, and then the process proceeds to step S14, and the developing process is performed. After exposing the silk plate, step S15 is performed to perform optical inspection on the developed substrate, and finally, the step is performed to carry the optically inspected substrate of the substrate, so that the button must be tested and developed, the side-manual truck After the completion of the tribute to the Yuzhi County board to the - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - The cost of operation. The above-mentioned macroscopic detecting device is, for example, Japanese Patent Publication No. 3371〇6, which is a giant sight detecting device which provides a first mask and a second mask. 'Separate job-first-projection light source L1 and second projection light source u, and include a first ^ \ lens and - second brain ride · split the first - Wei light source and the second two shot source are parallel light It also includes a “fixed money component”, which is used to support the flatness of the object that can be placed, the steel (four) platform, and the provision of the continuous component, the small stretch and the reduction to make the object Freely expandable and contractible on the platform, the controller can adjust the fixed supporting member and the supporting member, and control 5 200827943 [Invention] The main object of the present invention is to provide a developing device with E-viewing The substrate can be coated with the photoresist before the development, (4) detecting whether the substrate is defective, reducing the waste of the process time and detecting the abnormal time of the substrate in advance, thereby effectively reducing the cost and increasing the throughput. A secondary object of the present invention is to provide a developing device with an E-view, which can save time and increase throughput without laboring the substrate to which the photoresist has been applied to the other inspection device. . In order to achieve the above object, the present invention is a developing device having a giant inspection, the development t(4) comprising an -E inspection relay and a - (4) device for detecting the coated wire before development. It is Newson (4). If the Weisi board is defective, the substrate is recycled and discarded; or the substrate coated with the photoresist is detected before the tree light. If the substrate is found to be defective, the substrate can be recycled and recoated. Light resistance. The above-mentioned macroscopic detecting device comprises a light box and a detecting platform, wherein the light box comprises at least a light source group, the light absorbing device comprises a plurality of systems, the light art can be combined with a nano light source, and the light source group is front And having a movable mask, the movable mask is selected to shield one of the light sources in the light source group, and the light source is connected to the substrate disposed on the detecting platform. The detection platform is an advance connection-supporting seat, the support base has at least one screw, and the screw is adjusted to adjust the inclination angle of the detection platform, and the support base is further provided with a cover body, the cover system enables the The detection platform is disposed in the cover body, and the lamp and the box are disposed on the top of the cover body, and an observation window is opened on the cover body between the light box and the detection platform, so that the inspector detects the substrate in front of the observation window. Whether there is a defect. [Embodiment] In order to give the reviewer a better understanding of the structural features and efficacies of the present invention, please refer to the preferred embodiment and the detailed description, as explained below: A drawing is a schematic view of the apparatus of the present invention. As shown in the figure, the present invention is a developing device with a giant inspection. The developing device 1 with a giant inspection includes a giant inspection 6 200827943 10 and a shirt device 12, which is a giant inspection device. The 〇 is connected to the developing device 12, and the detecting device 10 detects a transparent substrate coated with a photoresist before development, and detects whether the substrate is defective, such as uneven coating of the photoresist or coated light. A plurality of defects such as traces and miras are generated on the wire plate, and when the substrate is found to have a defect, the substrate is scrapped, thereby reducing the waste of new and new wire time, and the substrate can be observed before development in advance. Quality 疋 No difference #Reduced product rejection rate; or the substrate coated with photoresist is not exposed, and the macroscopic inspection is performed directly by the giant device 1 , and if the substrate is found to be defective, the substrate is recovered. Recoating the photoresist will not lead to stagnation, effectively reducing manufacturing costs and increasing production. Please refer to the second drawing, which is a side view of the device of the preferred embodiment of the present invention. As shown in the figure: the macroscopic detecting device 1 includes a cover 1〇〇, a light box 1〇3, a detection platform 1〇7 and a support base 108, and the support base (10) is a branch building. 7, and a plurality of screws 109 are provided to adjust the screws (10) to adjust the inclination angle of the detection platform 1 () 7, and the top of the cover is disposed at the top of the cover - the light box 103, and the cover (10) is covered by the cover The support is 1 〇 8 to make the test flat. The 107 is placed on the cover 1〇〇0, and a substrate 2 is placed on the detection platform 1〇7, and the substrate 2 is detected by the projection light source in the light box 103 to detect whether the substrate 2 is defective. Please refer to the third drawing, which is a schematic cross-sectional view of the apparatus of the preferred embodiment of the present invention. As shown in the figure, the light box 103 includes at least one light source group. The light box (10) of the embodiment includes six sets of light source groups 104, and each set of light source groups includes a plurality of light sources 1{)5. For example, each group of light source groups 104 includes two light sources 1〇5, one light source 1〇5 is a white light source, and the other light source 1〇5 is a sodium light source, and each group of light source groups 104 has a moving mask 1 in front.活动6, the movable mask 1〇6 can be used to shield a light source 105, and the inspector can adjust the movable mask 1〇6 to shield another light source 105. The light source groups 1〇4 in the light box 103 project a light source to the detecting platform 107 on which the substrate 2 is placed to observe whether the substrate 2 is defective. Please refer to the fourth figure, which is a front view of a device according to a preferred embodiment of the present invention. As shown in the figure, the cover 100 is provided with an observation window 101. The observation window 1-1 is disposed between the light box 103 and the detection platform 107 to facilitate the detection of the detector before the observation window ι〇1. The substrate 2 is 7 200827943, and a defect is generated, and a support column 102 is disposed in the middle of the observation window 101 to support the observation window 101, and the observation window 101 is divided into a first observation window 1010 and a second observation window 1 〇12, the first observation window 1010 and the second observation window 1012 are respectively provided with a safety sliding door 1011, 1013, and the safety sliding doors 1011, 1013 are closed to the outside when the giant detecting device 10 is not in use. Dust and dust do not easily fall within the giant inspection device 1〇. Please refer to the fifth drawing, which is a cross-sectional view of a device according to another preferred embodiment of the present invention. As shown in the figure, in the embodiment, when the projection light sources 105 of the light source groups (10) in the light box (10) of the above embodiment are projected onto the substrate 2, the systems generate scattering and are not uniformly projected on the substrate. On the wire 2, the present embodiment is provided in front of the light box (10) with a base surface on the cover 10G N, the base surface is used for erecting - the cover is dirty, and the material of the cover is - The light-transmitting material is such that when the wires 1G5 are heard to the wire 2, the light sources 105 can be uniformly projected onto the substrate 2 through the mask. Please refer to the sixth figure' for a front view of a device according to another preferred embodiment of the present invention. As shown in the figure, this embodiment improves the branch column 1〇2 in the middle of the observation window 101 of the above embodiment, and the branch column 1〇2 divides the observation window 101 into the first observation window i(10) and the first The observation window is dirty, so that the inspector's line of sight produces a dead angle inconvenience detection. Therefore, in this embodiment, the support column 102 is respectively disposed at the upper ends of the Wei measurement fm, and is added to the observation f 1Q1 - safety pull the door, such as
此不會遮住檢測員檢測視線。 請參閱第七A圖，係為本發明之_較佳實施例之娜流程示意圖。如圖 所示：傳統的顯影過程將已塗佈光阻之基板歧行顯影，再送至另外之巨 觀檢測裝置進行檢測，往往檢_缺陷之基板，只能回收報廢，並往往已 經浪費大’幻肖耗機妓狀成本，碎合贿酬，*本發明之 顯影裝置脑S觀檢職置，並_基_棚獅，先糊能觀檢測 裝置檢測已塗佈^之錄板，當魏纽雜之基板時 ，就先將該基板 ^Γ 2試崎程及新光阻_之浪費，並且可以提前在顯影前 觀察到基板u口貝疋否異常降低產品報廢率。 本發明之顯影流程係先由執行步驟S2Q，一載體載運該基板，接著 200827943 執行步驟S21，清洗該基板，進入步驟S22，塗佈光阻於經清洗之該基板上， 接著執行步驟S23，曝光已塗佈光阻之該基板，進入步驟划，利用該巨觀 檢測裝置檢測已曝光之絲板是否產生雜，當發職基板產生缺陷時， 則進入步驟S25，將該基板報廢；另當發現該基板未產生缺陷時，再執行步 驟S26 ,顯影已曝光之該基板，最後執行步驟微，將已顯影之該基板進行 光學檢查，再利用該載體將已顯影之該基板運輸出去。 請參閱第七B圖，係為本發明之另—較佳實施例之顯影流程示意圖。 如圖所示：上述實關之已塗佈絲之絲板科光直接先鮮觀檢測 後，發現該基板產生缺瞒，係可將該基板·，重新塗佈光阻，如此不 會浪費時間可有效降低成本。本發明之顯影流程係先由執行步驟咖，利用 i體載運該基板，接著執行步驟S3卜清洗該基板，進入步驟微，塗佈 光阻於經清洗種紐上，接魏碌㈣3，_魅碰_置檢測已 塗佈光阻之該基板是否產生缺陷，#發_基板產生缺陷時，進入步驟 S34，回收產生缺陷之該基板，經由清洗並重新塗佈光阻於該基板上。 、由上述可知，本發明係提供一種具巨觀檢測之顯影裝置，可於檢測已塗 佈光阻之基板於曝光前，發現縣板是料生缺陷，若發現產生缺陷之基 板’即將該基板回收重工，如此減少測試難程及縣_間之浪費，= 且可以提前在顯影前觀察到基板品質是否異f降低產品報廢率；或者於 影前檢測已塗佈修之該基板，發現職板產生缺陷時，㈣停止生產， 可以有效降低品質不良造成的產品報廢成本。 ，綜上所述’本發明係實為—具有新麵、進步性及可供產業利用者， =合_專概所規定之專财請要件缺，練法提时明專利申 "月’祈鈞局早日賜准專利，至感為禱。 明管Γΐ 僅 之一較佳實施例而已，並非用來限定本發 :貫蚊_，舉凡依本發明中請專利範圍所述之形狀、構造、特徵 神所為之均等變化與修飾，均應包括於本發明之申請專利範圍内。^ 200827943 【圖式簡單說明】 第1圖：本發明之裝置示意圖； 第2圖：本發明之一較佳實施例之裝置側面示意圖； 第3圖：本發明之一較佳實施例之燈箱剖面示意圖； 第4圖：本發明之一較佳實施例之裝置前視示意圖； 第5圖：本發明之另一較佳實施例之燈箱剖面示意圖； 第6圖：本發明之另一較佳實施例之裝置前視示意圖； 第7A圖：本發明之一較佳實施例之顯影流程示意圖； 第7B圖：本發明之另一較佳實施例之顯影流程示意圖；及 第8圖：習知之流程示意圖。 【主要元件符號說明】 1 具巨觀檢測之顯影裝置 10 巨觀檢測裝置 100 罩體 101 觀測窗 1010 第一觀測窗 1011 安全拉門 1012 第二觀測窗 1013 安全拉門 102 支撐柱 103 燈箱 1030 基座 1032 遮罩 104 光源組 105 光源 106 活動遮罩 200827943 107 檢測平台 108 支撐座 109 螺桿 12 顯影裝置 2 基板This does not obscure the inspector's inspection line of sight. Please refer to FIG. 7A, which is a schematic diagram of the Na process flow of the preferred embodiment of the present invention. As shown in the figure: the traditional development process discriminates the coated photoresist substrate and sends it to another giant inspection device for inspection. The substrate of the defective _ defect can only be recycled and often wasted. The phantom consumes the cost of the machine, breaks the bribe, and the development device of the present invention has a brain S inspection position, and _ base _ shed lion, the first paste can detect the detection device has been coated ^ record board, when Wei When the substrate of the nucleus is used, the substrate is first tested and the new photoresist is wasted, and it can be observed in advance whether the substrate u mouth is abnormally lowered before the development. The developing process of the present invention first performs the step S2Q, a carrier carries the substrate, and then proceeds to step S21 in 200827943 to clean the substrate, proceeds to step S22, applies a photoresist to the cleaned substrate, and then performs step S23 to expose The substrate on which the photoresist has been applied enters a step, and the macroscopic detecting device detects whether the exposed wire plate is miscellaneous. When the substrate is defective, the process proceeds to step S25, and the substrate is scrapped; When the substrate is not defective, step S26 is performed to develop the exposed substrate, and finally the step is performed to optically inspect the developed substrate, and the developed substrate is transported by the carrier. Please refer to FIG. 7B, which is a schematic diagram of a development process of another preferred embodiment of the present invention. As shown in the figure: after the above-mentioned actual application of the coated silk wire, it is found that the substrate is defective, and the substrate can be recoated with photoresist, so that no time is wasted. Can effectively reduce costs. The developing process of the present invention firstly carries out the step by using the i body to carry the substrate, and then performs step S3 to clean the substrate, enters the step micro, applies the photoresist to the cleaning seed, and picks up the Wei (4) 3, _ charm If the substrate is defective, and the substrate is defective, the process proceeds to step S34, and the substrate on which the defect is generated is recovered, and the photoresist is recoated on the substrate. As can be seen from the above, the present invention provides a developing device with a giant inspection, which can detect a substrate which is coated with a photoresist before exposure, and find that the county plate is a defect in the material, and if the substrate is found to be defective, the substrate is about to be formed. Recycling heavy work, so as to reduce the test difficulty and the waste of the county, and can observe whether the quality of the substrate is different before the development, and reduce the product scrap rate; or detect the coated substrate after the filming, and find the job board When the defect occurs, (4) stop production, which can effectively reduce the scrapping cost of the product caused by poor quality. In summary, the 'invention of the present invention is true--has a new face, progressive and available to the industry, = _ _ special provisions for the special wealth required, the practice of law and time patent application " month' The Prayer Council granted patents as soon as possible, and felt prayed. The present invention is only one preferred embodiment, and is not intended to limit the present invention: the mosquitoes, and the equivalent variations and modifications of the shapes, structures, and features described in the scope of the patent application of the present invention should include Within the scope of the patent application of the present invention. ^ 200827943 BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a schematic view of a device according to a preferred embodiment of the present invention; FIG. 3 is a side view of a device according to a preferred embodiment of the present invention; 4 is a front view of a preferred embodiment of the present invention; FIG. 5 is a cross-sectional view of a light box according to another preferred embodiment of the present invention; FIG. 6 is another preferred embodiment of the present invention. Example of a front view of a device; FIG. 7A is a schematic view of a development process of a preferred embodiment of the present invention; FIG. 7B is a schematic view of a development process of another preferred embodiment of the present invention; and FIG. 8: a conventional process schematic diagram. [Main component symbol description] 1 Development device with giant inspection 10 Giant observation device 100 Cover 101 Observation window 1010 First observation window 1011 Safety sliding door 1012 Second observation window 1013 Safety sliding door 102 Support column 103 Light box 1030 base Seat 1032 Mask 104 Light source group 105 Light source 106 Moving mask 200827943 107 Detection platform 108 Support base 109 Screw 12 Developing device 2 Substrate