TW200827928A - Novel organosilane polymer, hardmask composition for processing resist underlayer film comprising the organosilane polymer, and process for producing semiconductor integrated circuit device using the hardmask composition - Google Patents

Novel organosilane polymer, hardmask composition for processing resist underlayer film comprising the organosilane polymer, and process for producing semiconductor integrated circuit device using the hardmask composition Download PDF

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TW200827928A
TW200827928A TW96135922A TW96135922A TW200827928A TW 200827928 A TW200827928 A TW 200827928A TW 96135922 A TW96135922 A TW 96135922A TW 96135922 A TW96135922 A TW 96135922A TW 200827928 A TW200827928 A TW 200827928A
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parts
ethyl
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TW96135922A
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TWI369582B (en
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Sang-Kyun Kim
Jong-Seob Kim
Dong-Seon Uh
Chang-Il Oh
Sang-Hak Lim
Hui Chan Yun
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Cheil Ind Inc
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/075Silicon-containing compounds
    • G03F7/0752Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Chemical & Material Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Silicon Polymers (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)

Abstract

A hardmask composition for processing a resist underlayer film is provided. The hardmask composition comprises: (a) an organosilane polymer prepared by reacting polycondensation products of hydrolysates of compounds represented by Formulae 1, 2 and 3 with ethyl vinyl ether of Formula 4: [RO]3Si-Ar (1) (wherein R is methyl or ethyl and Ar is an aromatic ring-containing functional group), [RO]3Si-H (2) (wherein R is methyl or ethyl), and [RO]3Si-R' (3) (wherein R is methyl or ethyl and R' is substituted or unsubstituted cyclic or acyclic alkyl) CH2CHOCH2CH3; (4) (b) a solvent; and (c) a crosslinking catalyst.

Description

200827928 九、發明說明: 【發明所屬之技術領域】 【技術領域】 本發明係有關於一種新穎有機矽烷聚合物,一種包含 5該有機矽烷聚合物之用以處理光阻底層膜之硬質光罩組成 物’以及一種使用該硬質光罩組成物製造半導體積體電路 裝置之方法。更特別地,本發明係有關於一種用以處理光 阻底層膜之組成物,其展現改良之貯存安定性、高的圖案 複製性、與光阻劑之良好黏著性、對於在光阻劑曝光後使 1〇用之顯影溶液之優異抗性(即,对溶劑性),及減少電裝钱刻 之膜損失。 t lltr ^ 【背景技藝】 為了於大部份微影方法之較佳解析,抗反射塗覆(arc) 15材料被用以使光阻材料層及基材間之反射達最小。但是, A R C及歧材料層間之基本㈣物之她性造成舰材料 及具圖案之光阻層間之差的姓刻選擇性。因此,光阻層之 數射刀之消耗於形成圖案後於ARC钮刻期間係不可避免, 因此,需要於其後之钮刻步驟使光阻層進一步形成圖案。 20 一 $些微影技術中使用之光阻材料未提供其後敍刻步驟 南光阻性至足以使所欲圖案有效地轉移至光阻材料下之層 =程度。光阻底層膜之硬質光罩已被㈣,例如,當格二 皮使用,欲被餘刻之基材係厚,需要大的钱 X及/或特定姓刻劑之使用依基材型式係必要之情 200827928 況。 光=層膜之硬質_扮演作為具_之光阻劍及欲 5 10 光罩:Γ基材間之中間層之角色。光阻底層膜之硬質 先罩用以使具圖案之光阻劑之圖案轉移至基材。因此,光 :底層膜之硬質光罩層需能耐用以轉移此圖案所需之敍 於此方法,因為光阻劑之蝕刻速率相似於用以處理氧化物 膜之底層膜者,因此需於絲劑及底層㈣形成光罩以處 理此底層膜,或形成具極不同之姓刻速率(即高钱刻選 擇性)之硬質光罩以處理此氧化物膜。特別地,用以處理氧 化物膜之底層膜、用以處理底層膜之光罩(即,光阻底層膜 之硬質光罩),及光阻劑係依序於氧化物膜上形成。此多層 w轉騎縣材⑽如,氧切膜)之光 路小魏已造成緣解纽低,使其光阻劑難以 作為光罩。因此,處理氧化物膜而無任何受損實質上係不 可能。依據-種克服此等問題之方法,光阻圖案被轉移至 用以處理氧化物膜之底層膜,其後使用經圖案轉移之底層 膜作為光罩而乾_此氧化物膜。用以處理氧化物膜之底 層膜係指於抗反射膜下形成之膜,而作為底層抗反射膜。 15 結構係顯示於第1圖。於此情況,用以處理底層膜之光罩之 最重要之要求係耐蝕刻性及關於用於處理氧化物膜之底層 之高蝕刻選擇性。此外,光罩需不溶於用以藉由塗覆於其 上形成抗反射膜之溶劑。即,光罩需具有優異之耐溶劑性。 各種嘗試已被施行以符合上述要求。例如,以 20 200827928 、3或4)表示之石夕院化合物之聚縮合反應產 被作為用於處理底層膜之料材料。但是,切烧化合 物之最大問題係石夕院化合物之聚縮合反應係於溶劑態中: ^。當聚縮合反應產物於貯存—段時間後用以形成塗層 5 I _之所欲厚度未被達成。再者,聚縮合反應產物因 八太而之分子量而係實質上不溶於溶劑,造成 Μ之問題。即,於許多情況,聚縮合反應產細貯2 疋性而言係不利的。聚縮合反應係藉由存在於石夕捷端部之 Τ醇基(Si_OH)賴發。為確保聚縮合反應產物之所欲貯存 10女疋性’需限制石夕烧基之數量或以適當之保護基保護此等200827928 IX. Description of the Invention: [Technical Field] The present invention relates to a novel organodecane polymer, a hard mask comprising 5 organic decane polymers for treating a photoresist underlayer film And a method of manufacturing a semiconductor integrated circuit device using the hard reticle composition. More particularly, the present invention relates to a composition for treating a photoresist underlayer film which exhibits improved storage stability, high pattern reproducibility, good adhesion to a photoresist, and exposure to a photoresist. After that, the developed solution is excellent in resistance (i.e., solvent), and the film loss of the electric charge is reduced. T lltr ^ [Background Art] For better resolution of most lithography methods, anti-reflective coating (arc) 15 materials are used to minimize reflection between the photoresist layer and the substrate. However, the basic (four) material between A R C and the layer of the dissimilar material causes the selectivity of the difference between the ship material and the patterned photoresist layer. Therefore, the consumption of the number of knives of the photoresist layer is unavoidable during the formation of the pattern in the ARC button. Therefore, it is necessary to further pattern the photoresist layer in the subsequent button etching step. 20 A photoresist material used in some lithography techniques does not provide a subsequent characterization step. The south photoresist is sufficient to allow the desired pattern to be effectively transferred to the layer under the photoresist material. The hard mask of the photoresist underlayer film has been used (4). For example, when the grid is used, it is necessary to be thickened by the substrate, and it is necessary to use a large amount of money X and/or a specific surname. The situation 200827928 situation. Light = hard film of the film _ plays the role of the middle layer between the substrate and the light-resisting sword and the 5 10 mask. A hard mask of the photoresist underlayer film is used to transfer the patterned photoresist pattern to the substrate. Therefore, the light: the hard mask layer of the underlying film needs to be durable to transfer the pattern. This method is required because the etching rate of the photoresist is similar to that of the underlying film for processing the oxide film. The agent and the bottom layer (4) form a photomask to process the underlying film, or form a hard mask having a very different surname rate (ie, high selectivity) to process the oxide film. Specifically, an underlayer film for processing the oxide film, a photomask for processing the underlying film (i.e., a hard mask of the photoresist underlayer film), and a photoresist are formed on the oxide film in sequence. This multi-layered w-ride county material (10), such as the oxygen film), the light Wei Wei has caused the edge to be low, making it difficult for the photoresist to act as a mask. Therefore, it is impossible to process the oxide film without any damage. According to the method for overcoming such problems, the photoresist pattern is transferred to the underlying film for processing the oxide film, and thereafter the pattern-transferred underlayer film is used as a photomask to dry the oxide film. The underlayer film for treating the oxide film means a film formed under the anti-reflection film, and serves as a bottom anti-reflection film. The 15 structure is shown in Figure 1. In this case, the most important requirements for the mask for processing the underlying film are etch resistance and high etch selectivity with respect to the underlayer for processing the oxide film. Further, the photomask needs to be insoluble in a solvent for forming an antireflection film by being applied thereon. That is, the photomask needs to have excellent solvent resistance. Various attempts have been made to meet the above requirements. For example, a polycondensation reaction of a Shi Xi Yuan compound represented by 20 200827928, 3 or 4) is used as a material for processing the underlayer film. However, the biggest problem with the cut-off compound is that the polycondensation reaction of the compound of Shi Xiyuan is in the solvent state: ^. When the polycondensation reaction product is used for a period of time after storage, the desired thickness for forming the coating 5 I _ is not achieved. Further, the polycondensation reaction product is substantially insoluble in a solvent due to the molecular weight of octa, which causes a problem of enthalpy. That is, in many cases, the polycondensation reaction is disadvantageous in terms of fine storage. The polycondensation reaction is carried out by a sterol group (Si_OH) which is present at the end of the Shixijie. In order to ensure that the desired product of the polycondensation reaction product is stored, it is necessary to limit the amount of the stagnation base or to protect it with an appropriate protective group.

【發明内容J 【揭露内容】 【技術點題】 本發明係基於習知技藝之問題而為之,且本發明之一 目的係提供一種新穎有機矽烷聚合物,其係用以形成用於 光阻底層膜之硬質光罩。 ^ 本發明之另一目的係提供一種用以處理底層膜之硬質 光罩組成物,此組成物包含用以達成改良之貯存安定丨生貝 兩的蝕刻選擇性,及對多重蝕刻之足夠抗性之有機矽、_ 合物。 烷聚 本發明之另 曰的1尔恍仏一種抗反射之硬質光仝 物,由於其優異之ARC效果而用以於處理光阻劑時平 、 好圖案,且於其後之處理期間使圖案有效地轉移 良 夕I氣化石夕 20 200827928 膜。 本發明之另一目的係提供一種使用此硬質光罩組成物 製造半導體積體電路裝置之方法。 本發明之另一目的係提供一種藉由此方法製造之裝 5 置。 【技術解決方式】 依據本發明之一方面,提供一種藉由使以化學式1、2 及3表示之化合物之水解產物之聚縮合反應產物與化學式4 之乙基乙烯基醚反應而製備之有機矽烷聚合物: 10 [RO]3Si-Ar (1) (其中,R係甲基,或乙基,且AH系含芳香族環之官能 基); [RO]3Si-H (2) (其中,R係甲基,或乙基);及 15 [RO]3Si-R’ (3) (其中,R係甲基,或乙基,且R’係經取代或未經取代 之環狀或非環狀之烷基): CH2CHOCH2CH3 (4) 化學式1、2及3之化合物之水解產物可個別係化學式 20 5、6及7表示:SUMMARY OF THE INVENTION [Technical Problem] The present invention is based on the problems of the prior art, and an object of the present invention is to provide a novel organodecane polymer for forming a photoresist underlayer. Hard mask of film. Another object of the present invention is to provide a hard reticle composition for treating an underlying film comprising etch selectivity for improved storage of stabilized twins and sufficient resistance to multiple etches. Organic hydrazine, _ compound. Alkane-polymerized, an anti-reflective hard photocomplex of the present invention, which is used for the treatment of photoresists in a flat, good pattern due to its excellent ARC effect, and which is patterned during subsequent processing. Effectively transfer Liang Xi I gasification stone eve 20 200827928 membrane. Another object of the present invention is to provide a method of manufacturing a semiconductor integrated circuit device using the hard reticle composition. Another object of the present invention is to provide a device manufactured by this method. [Technical Solution] According to an aspect of the invention, there is provided an organodecane prepared by reacting a polycondensation reaction product of a hydrolyzate of a compound represented by Chemical Formulas 1, 2 and 3 with an ethyl vinyl ether of Chemical Formula 4. Polymer: 10 [RO]3Si-Ar (1) (wherein R is a methyl group or an ethyl group, and AH is a functional group containing an aromatic ring); [RO]3Si-H (2) (where R Methyl, or ethyl); and 15 [RO]3Si-R' (3) (wherein R is methyl, or ethyl, and R' is substituted or unsubstituted, cyclic or acyclic Alkyl): CH2CHOCH2CH3 (4) The hydrolyzate of the compounds of Chemical Formulas 1, 2 and 3 can be represented by the chemical formulas 20, 6 and 7 individually:

ArSi[OH]3 (5) (其中,Ar係含芳香族基之官能基); HSi[OH]3 (6);及 R,Si[OH]3 (7) 8 200827928 基) (其中’R,_取代絲錄代之魏鱗環狀之烧 聚縮合反應產物可以化學式8表 不 A「x -0 -s\-〇-Si -〇- 〇 i -〇一: Η R1, 0- 1 1 Η 11 Η η (8) 其中,Ar係含芳香族環之官能基,R,係經取代或未 取代之環狀或非環狀之烧基,滿足關係式x + y + z 4 ’ 0·04 $ X $ 〇·8〇 ’ 〇 $ y $ i 4〇,及 i 8〇 3 至 500。 經 $ z $ 3.96,且η係 有機石夕烧聚合物可以化學式9表 不ArSi[OH]3 (5) (wherein Ar is a functional group containing an aromatic group); HSi[OH]3 (6); and R,Si[OH]3 (7) 8 200827928 (in which 'R , _ replaces the silk scale of the Wei scale ring of the polycondensation reaction product can be represented by the chemical formula 8 A "x -0 -s\-〇-Si -〇- 〇i -〇一: Η R1, 0- 1 1 Η 11 η η (8) wherein Ar is a functional group containing an aromatic ring, and R is a substituted or unsubstituted cyclic or acyclic group, which satisfies the relationship x + y + z 4 ' 0·04 $ X $ 〇·8〇' 〇$ y $ i 4〇, and i 8〇3 to 500. After $ z $ 3.96, and η-based organic stone sinter polymer can be expressed in chemical formula 9

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Mey MeMey Me

Arx -〇-S\-〇 -0-Arx -〇-S\-〇 -0-

;i—〇- Hy -Si-〇-;i-〇- Hy -Si-〇-

Me Me 10Me Me 10

MeMe

Me (9) 其中,Ar係含芳香族環之官能基,r,係經取代或未經 代之環狀或非環狀找基,每—Me#f基,x、yh滿足 關係式 x + y + z S 3.96,且η係3至500。 15 水解產物係於選㈣’酸、魏、對_甲苯4酸單水人 t、硫酸二以旨、2,4,4,6_四漠_2,5_環己二稀酮,及有機: 酉文之烧基醋所組成之族群之酸催化劑存在中製備。 有機矽烷聚合物可藉由混合丨至加重量份之化學 化合物、0至35重量份之化學式2之化合物,及45至99重量 9 200827928 份之化學式3之化合物(其係關於1〇〇重量份之化學式丨、2及 3之化合物而計),使此混合物於10至100重量份之水及1〇〇 至900重直份之溶劑中,於〇〇〇1至5重量份之酸催化劑存在 中反應獲彳寸聚縮合反應產物,且使聚縮合反應與isaoo 5重里伤之化學式4之乙基乙稀基驗反應而製備。 友溶劑可選自丙明、四氫口夫喃、苯、甲苯、二乙基醚、 氯仿—氣甲烧、乙酸乙酉旨、丙二醇甲基_、丙二醇乙基 ^丙—醇丙細、1^二醇甲基醚乙酸_、丙二醇乙基醚 乙酸酉旨、丙二醇丙基麵乙酸酉旨、乳酸乙酉旨、γ丁内醋,及 〇其等之混合物組成之族群。 依據本發明之另—士 万面,提供一種用以處理光阻底層 膜之硬質光罩喊物,Μ成物包含: — _⑷物’其储由使以化學式丨、认球 15之化合物之水解產物之聚縮合反應產物與化學式4之乙 土乙烯基驗反應而製備: [R〇]3Si-Ar ⑴ 或乙基,且Ar係含芳香族環之官能 [R〇]3Si-H (2) (其中,R係甲基’或乙基),且 [ROLSi-R, (3) U中’ n係曱基’或乙基,且R’係經取代或未經取代 <環狀或非環狀之烷基) ch2choch2ch3 “、 (4) 10 200827928 (b) 溶劑;及 (c) 交聯催化劑。 化學式1、2及3之化合物之水解產物可個別係化學式 5、6及7表示: 5 ArSi[OH]3 (5) (其中,Ar係含芳香族基之官能基); HSi[OH]3 (6);及 R,Si[OH]3 (7) (其中,R’係經取代或未經取代之環狀或非環狀之烧 10 基)。 聚縮合反應產物可以化學式8表示:Me (9) wherein Ar is a functional group containing an aromatic ring, and r is a substituted or unsubstituted ring or acyclic group. Each -Me#f group, x, yh satisfies the relationship x + y + z S 3.96, and η is 3 to 500. 15 Hydrolyzate is selected from (4) 'acid, Wei, p-toluene 4 acid monohydrate human t, sulfuric acid dihydrate, 2,4,4,6_four desert_2,5_cyclohexanedione, and organic : Prepared in the presence of an acid catalyst of the group consisting of sulphur-based vinegar. The organodecane polymer can be prepared by mixing hydrazine to add parts by weight of the chemical compound, 0 to 35 parts by weight of the compound of the formula 2, and 45 to 99 parts by weight of 9 200827928 parts of the compound of the formula 3 (which is about 1 part by weight) a chemical formula of ruthenium, 2 and 3, such that the mixture is present in 10 to 100 parts by weight of water and 1 to 900 parts by weight of the solvent, in the presence of 1 to 5 parts by weight of the acid catalyst The intermediate reaction is obtained by the reaction of the polycondensation reaction, and the polycondensation reaction is prepared by reacting the polycondensation reaction with the ethylene ethyl group of the chemical formula 4 of the isaoo 5 heavy wound. The solvent may be selected from the group consisting of propylamine, tetrahydrofuran, benzene, toluene, diethyl ether, chloroform-gas-fired, ethyl acetate, propylene glycol methyl-, propylene glycol ethyl-propanol-propanol, 1^ A group consisting of a mixture of diol methyl ether acetate _, propylene glycol ethyl ether acetate, propylene glycol propyl acetoacetate, lactic acid ethyl acetate, γ butyl vinegar, and the like. According to another aspect of the present invention, there is provided a hard mask shroud for treating a photoresist underlayer film, the composition comprising: - _(4) substance which is hydrolyzed by a compound which chemically licks the ball 15 The polycondensation reaction product of the product is prepared by reacting with the vinyl group of the chemical formula 4: [R〇]3Si-Ar (1) or ethyl, and the Ar-containing aromatic ring-functional [R〇]3Si-H (2) (wherein R is methyl' or ethyl), and [ROLSi-R, (3) U is 'n-mercapto' or ethyl, and R' is substituted or unsubstituted <cyclic or non- Cyclic alkyl group) ch2choch2ch3 ", (4) 10 200827928 (b) solvent; and (c) crosslinking catalyst. The hydrolysis products of the compounds of the chemical formulas 1, 2 and 3 can be represented by the chemical formulas 5, 6 and 7: 5 ArSi[OH]3 (5) (wherein Ar is a functional group containing an aromatic group); HSi[OH]3 (6); and R, Si[OH]3 (7) (wherein R' is substituted Or unsubstituted cyclic or acyclic calcined 10 base. The polycondensation reaction product can be represented by the chemical formula 8:

其中,Ar係含芳香族環之官能基,R’係經取代或未經 取代之環狀或非環狀之烧基,x、y及z滿足關係式X + y + z = 15 4 5 0.04 < X < 0.80 5 0 < y < 1.40 9 A 1.80 < z < 3.96 5 in#, 3 至 500。 有機矽烷聚合物可以化學式9表示:Wherein, Ar is a functional group containing an aromatic ring, and R' is a substituted or unsubstituted cyclic or acyclic group, and x, y and z satisfy the relationship of X + y + z = 15 4 5 0.04 < X < 0.80 5 0 < y < 1.40 9 A 1.80 < z < 3.96 5 in #, 3 to 500. The organodecane polymer can be represented by the chemical formula 9:

MeMe

Me ) \ Γ) / \ U π / 〕 -0-ii/-0-^SiMe ) \ Γ) / \ U π / 〕 -0-ii/-0-^Si

Arx 0-a\-0-Si-0- ;i-〇-Arx 0-a\-0-Si-0- ;i-〇-

Me Me —\Me Me —\

MeMe

Me (9) 其中,Ar係含芳香族環之官能基,R’係經取代或未經 11 200827928 取代之環狀或非環狀之烷基,每—Me係甲基,x、y及z滿足 關係式x + y + z = 4,0.04 s X $ 0·80,0 s y $ 1.40,及 1.80 $ 2 $ 3.96,且n係3至500。 水解產物係於選自硝酸、硫酸、對_甲苯續酸單水合 物、硫酸二乙酯、2,4,4,6-四溴-2,5-環己二烯酮,及有機磺 酸之烷基酯所組成之族群之酸催化劑存在中製備。 有機石夕燒聚合物可藉由混合1至2〇重量份之化學式1之 化合物、0至35重量份之化學式2之化合物,及45至99重量 伤之化學式3之化合物(其係關於100重量份之化學式1、2及 3之化合物而計),使此混合物於10至100重量份之水及wo 至900重量份之溶劑中,於〇 〇〇1至5重量份之酸催化劑存在 中,反應獲得聚縮合反應產物,且使聚縮合反應與丨至:⑽ 重畺伤之化學式4之乙基乙稀基醚反應而製備。 溶劑可選自丙酮、四氫呋喃、苯、甲笨、二乙基醚、 氣仿、二氣甲烷、乙酸乙酯、丙二醇甲基醚、丙二醇乙基 鱗、丙二醇丙基_、㊅二醇甲基㈣乙酸醋、㊅二醇乙基醚 乙酸酯、丙二醇丙基醚乙酸酯、乳酸乙酯、γ_丁内酯,及 其等之混合物組成之族群。 本發明之硬負光罩組成物可包含丨至5〇重量份之有機 20矽烷聚合物(其係關於組成物之總重量(100重量份)而計), 5〇至99重1份之〉谷劑(其係關於組成物之總重量(⑽重量份) 而叶),及0.0001至〇·〇1重量份之交聯催化劑(其係關於1〇〇 重量份之有機石夕院聚合物而計)。 溶劑可選自丙_、四氫呋喃、笨、甲笨、二乙基醚、 12 200827928 氣仿、二氣甲院、乙酸乙醋、丙二醇甲基鍵、丙二醇乙基 喊、丙二醇丙基醚、兩二醇甲基鍵乙酸醋、丙二醇乙基喊 乙酸醋、丙二醇丙基鍵乙酸醋、乳酸乙酉旨、丫_丁内酯,及 其等之混合物組成之族群。 5 +交聯催化劑可選自^定對-甲苯石夤酸鹽、酿胺基石黃酸甜 菜鹼-16、(-)-樟腦-10-磺酸銨鹽、甲酸銨、曱酸三乙基銨、 甲酸二甲基銨、曱酸四甲基銨、π比唆甲酸鹽、乙酸錢、乙 酸三乙基銨、乙酸三甲基銨、乙酸四甲基銨、吡啶乙酸鹽、 乙酸四丁基銨、四丁基銨疊氮化物、苯甲酸四丁基銨、四 10 丁基銨硫酸氫鹽、四丁基銨溴化物、四丁基銨氣化物、四 丁基銨氰化物、四丁基銨氟化物、四丁基銨蛾化物、四丁 基銨硫酸鹽、四丁基銨硝酸鹽、四丁基銨亞硝酸鹽、四丁 基銨對-甲苯磺酸鹽、四丁基銨磷酸鹽,及其等之混合物所 組成之族群。 15 本發明之硬質光罩組成物可進一步包含至少一選自交 聯劑、安定劑,及表面活性劑之添加劑。 依據本發明之另一方面,提供一種製造半導體積體電 路裝置之方法,此方法包含步驟(a)於一基材上提供一材料 層,(b)於此材料層上形成一由有機材料組成之硬質光罩 20層,使本發明之硬質光罩組成物塗覆於由有機材料組成 之硬質光罩層上形成一抗反射之硬質光罩層,(幻於此抗反 射之硬質光罩層上形成一輻射敏化性之成像層,(e)使此成 像層圖像式曝光於輻射而於此成像層形成經輻射曝光區域 之圖像’(f)選擇性地移除輻射敏化成像層及抗反射硬質光 13 200827928 罩層之部份以曝露出由有機材料組成之硬質光罩層之部 份,(g)選擇性移除具圖案之抗反射硬質光罩層及由有機材 料組成之硬質光罩層之部份以曝露出材料層之部份,及(h) 使材料層之露出部份進行蝕刻而使材料層形成圖案。 依據本發明之另一方面,提供一種藉由此方法製造之 半導體積體電路裝置。 【圖式說明】 第1圖係一包含於製造半導體積體電路裝置之微影方 法中由本發明之硬質光罩組成物形成之抗反射硬質光罩層 10之多層結構之截面圖。 C貧施方式3 【最佳模式】 本發明現將更詳細地說明。 % 本發明提供一種有機矽烷聚合物,其係藉由使以化學 15式1、2及3表示之化合物之水解產物之聚縮合反應產物與化 學式4之乙基乙烯基醚反應而製備·· [R〇]3Si-Ar (1) 基) (其中,R係甲基,或乙基,且Ar係含芳香族環之官能 [ROJsSi-H (2) (其中,R係甲基,或乙基);及 [R0]3Si-R, (3) 且R,係經取代或未經取代 (其中,R係甲基,或乙基, 之王展狀或非環狀之烷基): 14 200827928 CH2CHOCH2CH3 (4) 化學式1之化合物之特別例子包含下列化合物(la): 0Me (9) wherein Ar is a functional group containing an aromatic ring, R' is a cyclic or acyclic alkyl group substituted or not substituted by 11 200827928, each -Me methyl group, x, y and z Satisfy the relationship x + y + z = 4, 0.04 s X $ 0·80, 0 sy $ 1.40, and 1.80 $ 2 $ 3.96, and n is 3 to 500. The hydrolyzate is selected from the group consisting of nitric acid, sulfuric acid, p-toluene acid monohydrate, diethyl sulfate, 2,4,4,6-tetrabromo-2,5-cyclohexadienone, and organic sulfonic acid. Prepared in the presence of an acid catalyst of the group consisting of alkyl esters. The organoceramic polymer can be obtained by mixing 1 to 2 parts by weight of the compound of the formula 1, 0 to 35 parts by weight of the compound of the formula 2, and 45 to 99 parts by weight of the compound of the formula 3 (which relates to 100 parts by weight) a mixture of the chemical formulas 1, 2 and 3, in the presence of from 10 to 100 parts by weight of water and from wo to 900 parts by weight of the solvent, in the presence of from 1 to 5 parts by weight of the acid catalyst, The reaction obtains a polycondensation reaction product, and a polycondensation reaction is prepared by reacting a polycondensation reaction with (10) a heavy-damaged ethylethylene ether of Chemical Formula 4. The solvent may be selected from the group consisting of acetone, tetrahydrofuran, benzene, methyl bromide, diethyl ether, gas imitation, dioxane methane, ethyl acetate, propylene glycol methyl ether, propylene glycol ethyl sulphate, propylene glycol propyl _, hexadiol methyl (iv) a group consisting of acetic acid vinegar, hexadiol ethyl ether acetate, propylene glycol propyl ether acetate, ethyl lactate, γ-butyrolactone, and the like. The hard negative mask composition of the present invention may comprise from 5 to 5 parts by weight of the organic 20 decane polymer (based on the total weight of the composition (100 parts by weight)), from 5 to 99 parts by weight. a granule (which is about the total weight of the composition ((10) parts by weight) and a cross-linking catalyst of 0.0001 to 〇·〇1 parts by weight (for 1 part by weight of the organic stone compound polymer) meter). The solvent may be selected from the group consisting of C-, tetrahydrofuran, stupid, methyl strepto, diethyl ether, 12 200827928 gas imitation, digastric hospital, ethyl acetate, propylene glycol methyl bond, propylene glycol ethyl shunt, propylene glycol propyl ether, two two a group consisting of alcohol methyl acetate, propylene glycol ethyl acetate, propylene glycol propyl acetate, lactic acid ethyl acetate, 丫-butyrolactone, and the like. The 5 + crosslinking catalyst may be selected from the group consisting of p-toluene decanoate, aramidyl phthalate betaine, (-)-camphor-10-sulfonic acid ammonium salt, ammonium formate, and triethylammonium citrate. , dimethylammonium formate, tetramethylammonium citrate, π-pyruvate, acetic acid, triethylammonium acetate, trimethylammonium acetate, tetramethylammonium acetate, pyridine acetate, tetrabutyl acetate Ammonium, tetrabutylammonium azide, tetrabutylammonium benzoate, tetrakis10-butylammonium hydrogensulfate, tetrabutylammonium bromide, tetrabutylammonium vapor, tetrabutylammonium cyanide, tetrabutyl Ammonium fluoride, tetrabutylammonium moth, tetrabutylammonium sulfate, tetrabutylammonium nitrate, tetrabutylammonium nitrite, tetrabutylammonium p-toluenesulfonate, tetrabutylammonium phosphate a group of , and a mixture of such. The hard reticle composition of the present invention may further comprise at least one additive selected from the group consisting of a crosslinking agent, a stabilizer, and a surfactant. According to another aspect of the present invention, there is provided a method of fabricating a semiconductor integrated circuit device, the method comprising the steps of (a) providing a layer of material on a substrate, and (b) forming a layer of organic material on the layer of material The hard mask 20 layer is applied to the hard mask composition of the invention to form an anti-reflective hard mask layer on the hard mask layer composed of organic materials (the anti-reflective hard mask layer) Forming a radiation sensitized imaging layer thereon, (e) imagewise exposing the imaging layer to radiation and forming an image of the radiation exposed region in the imaging layer' (f) selectively removing radiation sensitized imaging Layer and anti-reflective hard light 13 200827928 Part of the cover layer to expose a portion of the hard mask layer composed of organic material, (g) selectively remove the patterned anti-reflective hard mask layer and consist of organic material a portion of the hard mask layer to expose portions of the material layer, and (h) etching the exposed portions of the material layer to pattern the material layer. According to another aspect of the present invention, a Method of manufacturing semiconductor product [Description of the Drawings] Fig. 1 is a cross-sectional view showing a multilayer structure of an anti-reflection hard mask layer 10 formed of the hard mask composition of the present invention, which is included in the lithography method for manufacturing a semiconductor integrated circuit device. C. Mode 3: [Best Mode] The present invention will now be described in more detail. % The present invention provides an organodecane polymer which is obtained by hydrolyzing a compound represented by Chemical Formulas 1, 2 and 3 The polycondensation reaction product is reacted with ethyl vinyl ether of Chemical Formula 4 to prepare [R〇]3Si-Ar (1) group) (wherein R is a methyl group or an ethyl group, and the Ar system contains an aromatic ring) Functionality [ROJsSi-H (2) (wherein R is methyl or ethyl); and [R0]3Si-R, (3) and R, substituted or unsubstituted (wherein R is methyl, Or an ethyl group, a king-stretched or acyclic alkyl group): 14 200827928 CH2CHOCH2CH3 (4) A specific example of the compound of the formula 1 contains the following compound (la): 0

Si(0R)3 ^^^Si(0R)3Si(0R)3 ^^^Si(0R)3

OH ΟOH Ο

Si(〇R)sοόSi(〇R)sοό

(RO^Si-^^O(RO^Si-^^O

Si(〇R)3Si(〇R)3

Si(0f^3Si(0f^3

y,^^Si〇Rhy,^^Si〇Rh

H2CH2C

Si(0R)3Si(0R)3

(la) 其中,每一Me代表甲基,且每一R代表甲基,或乙基。 化學式3之化合物之特別例子包含下列化合物(3a): 15 200827928 ο ο ο 咖*(⑽ fe Me^O^Si(OR)3 働人〇^^^丨闕3 0 H2e<ii^0M^Si(0R)i * j-I^Q^s^SiOR^ HaC^^SKORfe Me^^^iORfe M象 S騎 M4e Ne/\^S_3 _N^s/S_)3 n ^«^^SKORJa C^SKORfe ^C55^4f{OR)3 e^^Si(0%(la) wherein each Me represents a methyl group, and each R represents a methyl group, or an ethyl group. A specific example of the compound of Chemical Formula 3 contains the following compound (3a): 15 200827928 ο ο ο 咖*((10) fe Me^O^Si(OR)3 働人〇^^^丨阙3 0 H2e<ii^0M^Si (0R)i * jI^Q^s^SiOR^ HaC^^SKORfe Me^^^iORfe M like S riding M4e Ne/\^S_3 _N^s/S_)3 n ^«^^SKORJa C^SKORfe ^C55 ^4f{OR)3 e^^Si (0%

smm 、Si(OR)3Smm, Si(OR)3

Me^Si(0R)3 16 200827928 l ^r^Si_)3 Me 彳 Me 彳 \^Si(OR)a 秘e、A 咖N^S^SKpRfe Me 贤…I we^A〇^ 一咖)3 _,_ Μβ〇Me^Si(0R)3 16 200827928 l ^r^Si_)3 Me 彳Me 彳\^Si(OR)a Secret e, A Coffee N^S^SKpRfe Me 贤...I we^A〇^ One coffee)3 _,_ Μβ〇

HH

0 祕5^ 一0 人㈡Ά峰 H^smh /^rS(0R)30 secret 5^ one 0 person (two) peak H^smh /^rS(0R)3

其中,每一Me代表甲基,且每一r代表甲基,或乙基。 17 200827928 本發明之有機矽烷聚合物可藉由混合1至20重量份之 化學式1之化合物、0至35重量份之化學式2之化合物’及45 至99重量份之化學式3之化合物(其係關於100重量份之化 學式1、2及3之化合物而計),使此混合物於10至100重量份 5 之水及100至900重量份之溶劑中,於0.001至5重量份之酸 催化劑存在中,反應獲得個別化合物之水解產物之混合 物,使水解產物於未純化時聚縮合而獲得個別水解產物之 聚縮合反應產物之混合物,及使聚縮合反應產物與1至200 重量份之化學式4之乙基乙烯基醚反應而製備。 10 酸催化劑較佳係選自硝酸、硫酸、對-甲苯績酸單水合 物、硫酸二乙酯、2,4,4,6-四溴_2,5_環己二烯,及有機績 酸之烧基酷所組成之族群。水解反應可藉由改變酸催化劑 之種類、量及添加模式而適合地控制。再者,用於水解反 應而添加之酸催化劑亦可被再作為聚縮合反應之催化劑。 15 於有機矽烷聚合物之形成反應,酸催化劑可以0.001與5重 量份間之量使用。使用小於0.001重量份之量之酸催化劑顯 著地減緩反應速率,而使用大於5重量份之量之酸催化劑造 成反應速率過度增加,使其不能製備具有所欲分子量之聚 縮合反應產物。 20 溶劑可選自丙_、四氫呋喃、苯、甲苯、二乙基醚、 氯仿、二氯甲烷、乙酸乙酯、丙二醇曱基醚、丙二醇乙基 醚、丙二醇丙基醚、丙二醇甲基醚乙酸酯、丙二醇乙基醚 乙酸酯、丙二醇丙基醚乙酸酯、乳酸乙酯、γ_丁内酯,及 其等之混合物所組成之族群。 18 200827928 化學式1、2及3之化合物之水解產物可個別係化學式 5、6及7表示:Wherein each Me represents a methyl group, and each r represents a methyl group, or an ethyl group. 17 200827928 The organodecane polymer of the present invention can be obtained by mixing 1 to 20 parts by weight of the compound of the chemical formula 1, 0 to 35 parts by weight of the compound of the chemical formula 2, and 45 to 99 parts by weight of the compound of the chemical formula 3 100 parts by weight of the compound of the chemical formulas 1, 2 and 3), the mixture is contained in 10 to 100 parts by weight of water and 100 to 900 parts by weight of the solvent in the presence of 0.001 to 5 parts by weight of the acid catalyst, The reaction obtains a mixture of hydrolyzed products of the individual compounds, the polycondensation products of the hydrolyzed products are obtained by unpolymerization to obtain a mixture of the polycondensation reaction products of the individual hydrolyzates, and the polycondensation reaction product and 1 to 200 parts by weight of the ethyl group of the chemical formula 4 It is prepared by reacting vinyl ether. The acid catalyst is preferably selected from the group consisting of nitric acid, sulfuric acid, p-toluene acid monohydrate, diethyl sulfate, 2,4,4,6-tetrabromo-2,5-cyclohexadiene, and organic acid. The group consisting of the base of the burning. The hydrolysis reaction can be suitably controlled by changing the kind, amount and mode of addition of the acid catalyst. Further, the acid catalyst added for the hydrolysis reaction can be reused as a catalyst for the polycondensation reaction. 15 The acid catalyst may be used in an amount between 0.001 and 5 parts by weight in the formation reaction of the organodecane polymer. The use of an acid catalyst in an amount of less than 0.001 part by weight significantly slows down the reaction rate, while the use of an acid catalyst in an amount of more than 5 parts by weight causes an excessive increase in the reaction rate, making it impossible to prepare a polycondensation reaction product having a desired molecular weight. The solvent may be selected from the group consisting of propylene, tetrahydrofuran, benzene, toluene, diethyl ether, chloroform, dichloromethane, ethyl acetate, propylene glycol decyl ether, propylene glycol ethyl ether, propylene glycol propyl ether, propylene glycol methyl ether acetate. a group consisting of esters, propylene glycol ethyl ether acetate, propylene glycol propyl ether acetate, ethyl lactate, γ-butyrolactone, and mixtures thereof. 18 200827928 The hydrolyzed products of the compounds of Chemical Formulas 1, 2 and 3 can be represented by the chemical formulas 5, 6 and 7 respectively:

ArSi[OH]3 (5) (其中,Ar係含芳香族基之官能基); 5 HSi[OH]3 (6);及 R,Si[OH]3 (7) (其中,R’係經取代或未經取代之環狀或非環狀之烷 基)。 作為聚縮合反應產物,其可為以化學式8表示之例示 10 者··ArSi[OH]3 (5) (wherein Ar is a functional group containing an aromatic group); 5 HSi[OH]3 (6); and R, Si[OH]3 (7) (wherein R' is Substituted or unsubstituted cyclic or acyclic alkyl). As a product of the polycondensation reaction, it may be an example represented by Chemical Formula 8

Arx Η Η -0 -Si VO -Si-0 I I 〇 〇 I I -O-Si/Ό -\^i-0 Hy R'z -H Ή (8) 其中,Ar係含芳香族環之官能基,R’係經取代或未經 取代之環狀或非環狀之烧基,x、y及z滿足關係式X + y + z = 4 9 0.04 < X < 0.80 9 0 < y < 1.40 5 ^1.80 < z < 3.96 5 JLn# 15 3至500 。 於化學式8,Ar、Η及R’代表與個別之Si原子鍵結之官 能基。個別官能基之數量係如化學式8中所定義。 有機矽烷聚合物可藉由使化學式8之聚縮合反應產物 與化學式4之乙基乙稀基醚反應而製備。 20 有機矽烷聚合物可以化學式9表示: 19 200827928Arx Η Η -0 -Si VO -Si-0 II 〇〇II -O-Si/Ό -\^i-0 Hy R'z -H Ή (8) wherein Ar is a functional group containing an aromatic ring, R' is a substituted or unsubstituted cyclic or acyclic group, and x, y, and z satisfy the relationship of X + y + z = 4 9 0.04 < X < 0.80 9 0 < y < 1.40 5 ^1.80 < z < 3.96 5 JLn# 15 3 to 500 . In Chemical Formula 8, Ar, fluorene, and R' represent a functional group bonded to an individual Si atom. The number of individual functional groups is as defined in Chemical Formula 8. The organodecane polymer can be produced by reacting the polycondensation reaction product of Chemical Formula 8 with ethyl ethyl ether ether of Chemical Formula 4. 20 organononane polymers can be represented by the chemical formula 9: 19 200827928

Me (9) 、/、中,Ar係含芳香族環之官能基,R,係經取代或未經 取代之%狀或非環狀之烧基,每一則系甲基,滿足 關係式x + y + z = 4,0.049m〇wim8(^ 5 z $ 3·96,且η係3至500。 於化學式9 ’ Ar、Η及R’代表與個別之Si原子鍵結之官 能基。個別官能基之數量係如化學式9中所定義。 本發明亦提供一種用於處理光阻底層膜之硬質光罩組 成物,包含: 10 (a)有機矽烷聚合物,其係藉由使以化學式丨、2及3表 示之化合物之水解產物之聚縮合反應產物與化學式4之乙 基乙烯基醚反應而製備: [R〇]3Si-Ar (1) (其中,R係曱基,或乙基,且Ar係含芳香族環之官能 15基), 匕 [R〇]3Si-H (2) (其中,R係曱基,或乙基),且 [R0]3Si_R, (3) (其中,R係甲基,或乙基,且R’係經取代或未經取代 20 之環狀或非環狀之烷基) CH2CHOCH2CH3. (4) 20 200827928 (b) 溶劑;及 (c) 交聯催化劑。 本發明之有機矽烷聚合物可藉由混合1至20重量份之 化學式1之化合物、〇至35重量份之化學式2之化合物,及45 5 至99重量份之化學式3之化合物(其係關於100重量份之化 學式1、2及3之化合物而計),使此混合物於10至100重量份 之水及100至900重量份之溶劑中,於0.001至5重量份之酸 催化劑存在中,反應獲得個別化合物之水解產物之混合 物,使水解產物於未純化時聚縮合而獲得個別水解產物之 10 聚縮合反應產物之混合物,及使聚縮合反應產物與1至200 重量份之化學式4之乙基乙烯基醚反應而製備。 酸催化劑較佳係選自硝酸、硫酸、對-甲苯磺酸單水合 物、硫酸二乙酯、2,4,4,6-四溴-2,5-環己二烯酮,及有機石黃 酸之烧基自旨所組成之族群。水解反應可藉由改變酸催化劑 15之種類、量及添加模式而適合地控制。再者,用於水解反 應而添加之酸催化劑亦可被再作為聚縮合反應之催化劑。 於有機矽烷聚合物之形成反應,酸催化劑可以〇〇〇1與5重 量份間之量使用。使用小於0.001重量份之量之酸催化劑顯 著地減緩反應速率,而使用大於5重量份之量之酸催化劑造 20成反應速率過度增加,使其不能製備具有所欲分子量之聚 縮合反應產物。 浴劑可選自丙_、四氫呋喃、苯、甲苯、二乙基醚、 氯仿、一氣甲烷、乙酸乙酯、丙二醇甲基醚、丙二醇乙基 醚、丙一醇丙基醚、丙二醇甲基醚乙酸酯、丙二醇乙基醚 21 200827928 乙酸酯、丙二醇丙基醚乙酸酯、乳酸乙酯、γ-丁内酯,及 其等之混合物所組成之族群。 化學式1、2及3之化合物之水解產物可個別係化學式 5、6及7表示: 5 ArSi[OH]3 (5) (其中,Ar係含芳香族基之官能基); HSi[OH]3 (6);及 R,Si[OH]3 (7) (其中,R’係經取代或未經取代之環狀或非環狀之烷 10 基)。 作為聚縮合反應產物,其可為以化學式8表示之例示 者: Η Η. ·〇Me (9), /, medium, Ar is a functional group containing an aromatic ring, and R is a substituted or unsubstituted % or acyclic alkyl group, each of which is a methyl group, which satisfies the relationship x + y + z = 4, 0.049m〇wim8(^ 5 z $ 3·96, and η is 3 to 500. In Chemical Formula 9 'Ar, Η and R' represent a functional group bonded to an individual Si atom. The amount of the base is as defined in Chemical Formula 9. The present invention also provides a hard reticle composition for treating a photoresist underlayer film, comprising: 10 (a) an organic decane polymer by chemical enthalpy, The polycondensation reaction product of the hydrolyzate of the compound represented by 2 and 3 is reacted with ethyl vinyl ether of Chemical Formula 4 to prepare: [R〇]3Si-Ar (1) (wherein R is a mercapto group, or an ethyl group, and Ar is an aromatic ring-containing functional group 15), 匕[R〇]3Si-H (2) (wherein R is a sulfhydryl group, or an ethyl group), and [R0]3Si_R, (3) (wherein the R system Methyl, or ethyl, and R' is a substituted or unsubstituted 20 cyclic or acyclic alkyl group) CH2CHOCH2CH3. (4) 20 200827928 (b) Solvent; and (c) crosslinking catalyst. Organic 矽The polymer may be obtained by mixing 1 to 20 parts by weight of the compound of the chemical formula 1, hydrazine to 35 parts by weight of the compound of the chemical formula 2, and 45 to 99 parts by weight of the compound of the chemical formula 3 (which is related to 100 parts by weight of the chemical formula 1) And the mixture of the compounds of 2, 3, and 10 to 100 parts by weight of water and 100 to 900 parts by weight of the solvent, in the presence of 0.001 to 5 parts by weight of an acid catalyst, to obtain a hydrolyzate of the individual compound a mixture obtained by polycondensing a hydrolyzed product without purification to obtain a mixture of 10 polycondensation reaction products of individual hydrolyzates, and reacting the polycondensation reaction product with 1 to 200 parts by weight of ethyl vinyl ether of Chemical Formula 4 to prepare a mixture Preferably, the acid catalyst is selected from the group consisting of nitric acid, sulfuric acid, p-toluenesulfonic acid monohydrate, diethyl sulfate, 2,4,4,6-tetrabromo-2,5-cyclohexadienone, and organic stone. The group consisting of the group consisting of the acid anhydride can be suitably controlled by changing the kind, amount and mode of addition of the acid catalyst 15. Further, the acid catalyst added for the hydrolysis reaction can be reused. The reminder of polycondensation In the formation reaction of the organodecane polymer, the acid catalyst can be used in an amount of between 1 and 5 parts by weight. The use of an acid catalyst in an amount of less than 0.001 part by weight significantly slows down the reaction rate, and more than 5 parts by weight is used. The amount of the acid catalyst is 20%, and the reaction rate is excessively increased, so that it cannot prepare a polycondensation reaction product having a desired molecular weight. The bathing agent may be selected from the group consisting of propylene, tetrahydrofuran, benzene, toluene, diethyl ether, chloroform, mono-methane, Ethyl acetate, propylene glycol methyl ether, propylene glycol ethyl ether, propanol propyl ether, propylene glycol methyl ether acetate, propylene glycol ethyl ether 21 200827928 acetate, propylene glycol propyl ether acetate, ethyl lactate a group of gamma-butyrolactone, and mixtures thereof. The hydrolyzate of the compounds of Chemical Formulas 1, 2 and 3 can be represented by the chemical formulas 5, 6 and 7: 5 ArSi[OH]3 (5) (wherein the Ar-based aromatic group-containing functional group); HSi[OH]3 (6); and R, Si[OH]3 (7) (wherein R' is a substituted or unsubstituted cyclic or acyclic alkane 10 group). As a product of the polycondensation reaction, it may be an example represented by Chemical Formula 8: Η Η.

Arx -s\-o-sArx -s\-o-s

Si-Ο I I 〇 〇 I I 0-Si/-0-'\Si-0Si-Ο I I 〇 〇 I I 0-Si/-0-'\Si-0

H R'7 -H Ή (8) 其中,Ar係含芳香族環之官能基,R’係經取代或未經 15 取代之環狀或非環狀之烧基,x、y及z滿足關係式X + y + z = 4 5 0.04<x<0.80 9 0<y< 1.40 5 A1.80<z<3.96 5 3 至 500。 於化學式8,Ar、H及R’代表與個別之Si原子鍵結之官 能基。個別官能基之數量係如化學式8中所定義。 20 有機石夕烧聚合物可藉由使化學式8之聚縮合反應產物 與化學式4之乙基乙烯基醚反應而製備。 有機石夕烧聚合物可以化學式9表示: 22 (9) 200827928H R'7 -H Ή (8) wherein Ar is a functional group containing an aromatic ring, and R' is a cyclic or acyclic group which is substituted or not substituted, and x, y and z satisfy the relationship. Formula X + y + z = 4 5 0.04 < x < 0.80 9 0<y< 1.40 5 A1.80<z<3.96 5 3 to 500. In Chemical Formula 8, Ar, H and R' represent a functional group bonded to an individual Si atom. The number of individual functional groups is as defined in Chemical Formula 8. The organic stone sinter polymer can be produced by reacting the polycondensation reaction product of Chemical Formula 8 with ethyl vinyl ether of Chemical Formula 4. The organic stone kiln polymer can be represented by the chemical formula 9: 22 (9) 200827928

MeMe

Me MeMe Me

Arx 0-s\-0-Si-0 i 6 〇 ~ ^/-0 -\^Si —〇 Hv R'zArx 0-s\-0-Si-0 i 6 〇 ~ ^/-0 -\^Si —〇 Hv R'z

MeMe

其中,Ar係含芳香族環之官能基,R,係經取代或未經 取代之環狀或非環狀之烧基,每一Me係甲基,x、y及z滿足 關係式X + y + z = 4,0.04 $x2〇.80,〇2y2 1·4〇,及 1.80 $ 5 ζ $ 3·96,且η係3至500。 於化學式9,Ar、Η及R,代表與個別之Si原子鍵結之官 能基。個別官能基之數量係如化學式9中所定義。 利用包含於化學式1之化合物中之芳香族基吸收uv光 之症力’本發明之硬質光罩組成物由於有機石夕烧聚合物之 UV吸收性而展現優異之抗反射性質。同時,本發明之硬質 光罩組成物精由控制有機碎烧聚合物内之芳香族基之數量 而於特定波長區域具有所欲之吸收率及折射率。 較佳係使用1至20重篁份之量(以化學式1、2及3之化合 物之總重量(100重量份)為基準計)之化學式丨之化合物。使 15用少於1重量份之量之化學式1之化合物造成硬質光罩組成 物之低吸收率。同時,使用多於20重量份之量之化學式 化合物造成足夠之蝕刻選擇性由於低以含量而不能被確保 之問題。適合之抗反射性質可藉由控制化學式丨之化合物之 相對量而達成。例如,當化學式丨之化合物具有苯基作為芳 2〇香族基且係以10重量份之量使用時,硬質光罩組成物具有 約0.2之吸收率(k)。 23 200827928 另方面,使用之化學式2之化合物之相對量增加導致 本發明硬質光罩組成物中之Si含量增加。硬質光罩組成物 之Si含量之此一改變可賦予本發明之硬質光罩組成物及由 有機材料組成之覆於上之光阻層及位於下之硬質光罩層間 5之適合的蝕刻選擇性。較佳係使用不大於35重量份(以化學 式1、2及3之化合物之總重量(1〇〇重量份)為基準計)之量之 化學式2之化合物。當化學式2之化合物以超過35重量份之 量使用時,硬質光罩組成物之貯存安定性會因為不穩定之 Si-H鍵而受損。 10 使用之化學式3之化合物之相對量之增加會導致硬質 光罩組成物之貯存安定性之改良。較佳係使用45至99重量 份之量(以化學式1、2及3之化合物之總重量(100重量份)為 基準計)之化學式3之化合物。使用少於45重量份之量之化 學式3之化合物會造成硬質光罩組成物之差的貯存安定 15性,同時,使用超過99重量份之量之化學式3之化合物會造 成硬質光罩組成物之吸收率降低之問題。 化學式4之乙基乙烯基醚與Si-〇H基反應形成 Si-OCH(CH3)〇CH2CH3基且用以保護Si-OH基,因此,確保 最終組成物之安定性。同時,Si_〇CH(CH3)〇CH2CH3基於 20高溫時於交聯催化劑存在中輕易轉化成Si-OH基,其後將說 明。當硬質光罩組成物於其後處理期間被塗覆及加熱, Si-OH基被回復且彼此交聯。此交聯導致剛性膜之形成。較 佳係使用1至200重量份之量(1〇〇重量份之以化學式i、2及3 之化合物為基準計)之化學式4之化合物。當化學式4之化合 24 200827928 物以少於1重量分之量使用時,硬質光罩組成物之貯存安定 性之改良係不能被預期。同時,所有Si-OH基已與不大於200 重量份之量之化學式4之化合物反應,因此,使其不能預期 於硬質光罩組成物之貯存安定性之進一步改良。 5 有機矽烷聚合物較佳係以1至50重量份且更佳係1至30 重量份之量(其係以硬質光罩組成物之總重量(100重量份) 為基準計)存在。當有機矽烷聚合物之含量於較佳範圍外 時,硬質光罩組成物之塗覆性變差。 用於本發明之硬質光罩組成物之溶劑之例子包含丙 10 酮、四氫呋喃、苯、甲苯、二乙基醚、氯仿、二氯甲烧、 乙酸乙酯、丙二醇甲基醚、丙二醇乙基醚、丙二醇丙基醚、 丙二醇甲基醚乙酸酯、丙二醇乙基醚乙酸酯、丙二醇丙基 醚乙基酯、乳酸乙酯、γ-丁内酯,及其等之混合物。溶劑 可與用於有機矽烷聚合物之形成反應之溶劑相同或相異。 15 溶劑可以50至99重量份之量(以硬質光罩組成物之總重量 (100重量份)為基準計)使用。當使用之溶劑之量於上述範圍 外時,硬質光罩組成物之塗覆性變差。 適合之交聯催化劑之例子包含:有機鹼之磺酸鹽,諸 如,吼啶對-甲苯磺酸鹽、四丁基銨對-甲苯磺酸鹽、醯胺基 20 續酸甜菜驗-16、㈠-樟腦-10-續酸銨鹽;有機驗之甲酸鹽, 諸如,甲酸銨、甲酸三乙基銨、甲酸三甲基銨、甲酸四甲 基銨,及吡啶甲酸鹽;及有機鹼之乙酸鹽,諸如,乙酸銨、 乙酸三乙基銨、乙酸三甲基銨、乙酸四甲基銨,及吡啶乙 酸鹽、乙酸四丁基銨;四丁基銨疊氮化物、苯甲酸四丁基 25 200827928 錢 物 四丁基錢硫酸氫鹽、四丁基銨漠化物、四丁基錢氯化 四丁基銨氰化物;四丁基錢氟化物;四丁基财化物; 四丁基銨硫酸鹽;四丁基銨硝酸鹽;四丁基銨亞確酸鹽; 四丁基銨磷酸鹽;及其等之混合物。 5 _交聯催化劑化合物於促進有機石浅聚合物之交聯 而改良硬質光罩組成物之耐钱刻性及而才溶劑性扮演要角。 交聯催化劑化合物較佳係以0 0001至〇〇1重量份之量使 用,其係以100重量份之有機矽烷聚合物為基準計。低於 0.0001重量份,上述效果不能被預期。高於〇 〇1重量份,硬 10質光罩組成物之貯存安定性不足。 若需要,本發明之硬質光罩組成物可進一步包含至少 一述自父聯劑、基安定劑,及表面活性劑之添加劑。 本發明亦提供一種製備半導體積體電路裝置之方法, 此方法包含步驟:(a)於一基材上提供一材料層,(b)於此材 I5 料層上形成一由有機材料組成之第一硬質光罩層,(c)於第 一硬質光罩層上塗覆本發明之硬質光罩組成物形成一第二 硬質光罩層,(d)於第二硬質光罩層上形成一輻射敏化性成 像層’(e)使成像層圖像式曝光於輻射而於成像層形成經輕 射曝光之區域之圖案,(f)選擇性地移除輻射敏化性成像層 20 及第二硬質光罩層之部份以使第一硬質光罩層之部份露 出,(g)選擇性地移除具圖案之第二硬質光罩層及第一硬質 光罩層之部份以露出材料層之部份,及(h)使材料層之露出 部份進行蝕刻使材料層形成圖案。 本發明亦提供一種藉由此方法製造之半導體積體電路 26 200827928 裝置。 【發明模式】 其後,本發明將參考下列實施例更詳細地闡釋。但是, 此等實施例係僅用以例示說明之目的,且不被作為限制本 5 發明範圍而闡釋。 實施例 [比較例1] 1,750克之曱基三曱氧基矽烷、34〇克之苯基三甲氧基 石夕院,及313克之二甲氧基石夕烧溶於在裝設磁性攪拌器、冷 10凝器、滴液漏斗,及氮氣引入管之1〇公升之四頸燒瓶内之 5,600克之丙二醇甲基醚乙酸醋(pgmea),然後,添加925 克之含水硝酸溶液(1,〇00 ppm)。形成之混合物於6〇QC反應i 小時後’形成之甲醇於減壓下移除。反應持續丨週,同時使 反應溫度維持於50。(:。反應完全後,己烷被添加至此反應 15混合物而使化學式10之聚合物沈澱: Η ΗWherein Ar is a functional group containing an aromatic ring, R is a substituted or unsubstituted cyclic or acyclic group, and each Me methyl group, x, y and z satisfy the relationship X + y + z = 4,0.04 $x2〇.80,〇2y2 1·4〇, and 1.80 $ 5 ζ $ 3·96, and η is 3 to 500. In Chemical Formula 9, Ar, Η and R represent a functional group bonded to an individual Si atom. The number of individual functional groups is as defined in Chemical Formula 9. The hard ray composition of the present invention using the aromatic group contained in the compound of Chemical Formula 1 exhibits excellent antireflection properties due to the UV absorbability of the organic zeocary polymer. At the same time, the hard reticle composition of the present invention has a desired absorption ratio and refractive index in a specific wavelength region by controlling the number of aromatic groups in the organic pulverized polymer. It is preferred to use a compound of the formula 1 in an amount of from 1 to 20 parts by weight based on the total weight (100 parts by weight of the compound of the chemical formulas 1, 2 and 3). The compound of Chemical Formula 1 is used in an amount of less than 1 part by weight to cause a low absorptivity of the hard reticle composition. At the same time, the use of more than 20 parts by weight of the chemical formula results in a problem that sufficient etching selectivity cannot be ensured due to low content. Suitable antireflective properties can be achieved by controlling the relative amounts of the compounds of the formula. For example, when the compound of the formula has a phenyl group as the aryl 2 sulfonyl group and is used in an amount of 10 parts by weight, the hard reticle composition has an absorptance (k) of about 0.2. 23 200827928 On the other hand, an increase in the relative amount of the compound of Chemical Formula 2 used results in an increase in the Si content in the hard reticle composition of the present invention. This change in the Si content of the hard reticle composition imparts suitable etch selectivity to the hard reticle composition of the present invention and the overlying photoresist layer composed of the organic material and the underlying hard mask layer 5 . Preferably, a compound of the formula 2 is used in an amount of not more than 35 parts by weight based on the total weight of the compound of the formulas 1, 2 and 3 (1 part by weight). When the compound of Chemical Formula 2 is used in an amount of more than 35 parts by weight, the storage stability of the hard mask composition is impaired by the unstable Si-H bond. 10 The increase in the relative amount of the compound of Chemical Formula 3 used results in an improvement in the storage stability of the hard mask composition. It is preferred to use a compound of Chemical Formula 3 in an amount of from 45 to 99 parts by weight based on the total weight (100 parts by weight of the compound of Chemical Formulas 1, 2 and 3). The use of a compound of Chemical Formula 3 in an amount of less than 45 parts by weight causes a poor storage stability of the hard reticle composition, and at the same time, the use of a compound of Chemical Formula 3 in an amount exceeding 99 parts by weight causes a hard reticle composition. The problem of reduced absorption rate. The ethyl vinyl ether of Chemical Formula 4 reacts with the Si-〇H group to form a Si-OCH(CH3)〇CH2CH3 group and serves to protect the Si-OH group, thereby ensuring the stability of the final composition. Meanwhile, Si_〇CH(CH3)〇CH2CH3 is easily converted into a Si-OH group in the presence of a crosslinking catalyst based on 20 high temperatures, which will be described later. When the hard reticle composition is coated and heated during its post-treatment, the Si-OH groups are recovered and cross-linked to each other. This crosslinking results in the formation of a rigid film. Preferably, the compound of Chemical Formula 4 is used in an amount of from 1 to 200 parts by weight based on 1 part by weight of the compound of the formulae i, 2 and 3. When the chemical formula 4 2008 20082828 is used in an amount of less than 1 part by weight, the improvement in the storage stability of the hard mask composition cannot be expected. At the same time, all of the Si-OH groups have been reacted with the compound of the chemical formula 4 in an amount of not more than 200 parts by weight, so that it is not expected to further improve the storage stability of the hard mask composition. The organodecane polymer is preferably present in an amount of from 1 to 50 parts by weight, and more preferably from 1 to 30 parts by weight based on the total weight (100 parts by weight) of the hard mask composition. When the content of the organodecane polymer is outside the preferred range, the coatability of the hard mask composition is deteriorated. Examples of the solvent used in the hard reticle composition of the present invention include propylene ketone, tetrahydrofuran, benzene, toluene, diethyl ether, chloroform, methylene chloride, ethyl acetate, propylene glycol methyl ether, propylene glycol ethyl ether. , propylene glycol propyl ether, propylene glycol methyl ether acetate, propylene glycol ethyl ether acetate, propylene glycol propyl ether ethyl ester, ethyl lactate, γ-butyrolactone, and the like. The solvent may be the same as or different from the solvent used for the formation reaction of the organodecane polymer. 15 The solvent may be used in an amount of from 50 to 99 parts by weight based on the total weight (100 parts by weight) of the hard mask composition. When the amount of the solvent used is outside the above range, the coatability of the hard mask composition is deteriorated. Examples of suitable crosslinking catalysts include: sulfonates of organic bases, such as acridine p-toluenesulfonate, tetrabutylammonium p-toluenesulfonate, decylamine 20 acid beet test-16, (a) - camphor-10-supply acid ammonium salt; organic test formate, such as ammonium formate, triethylammonium formate, trimethylammonium formate, tetramethylammonium formate, and picolinate; and organic base Acetate, such as ammonium acetate, triethylammonium acetate, trimethylammonium acetate, tetramethylammonium acetate, and pyridine acetate, tetrabutylammonium acetate; tetrabutylammonium azide, tetrabutyl benzoate 25 200827928 money tetrabutyl hydroxyhydrogen sulfate, tetrabutylammonium desert, tetrabutyl butyl tetrabutylammonium cyanide; tetrabutyl hydroxy fluoride; tetrabutyl hydride; tetrabutyl ammonium sulphate a salt; tetrabutylammonium nitrate; tetrabutylammonium acid hypophosphite; tetrabutylammonium phosphate; and mixtures thereof. 5 _ cross-linking catalyst compound promotes the cross-linking of the organic stone light polymer to improve the durability of the hard reticle composition and the solvent property plays an important role. The crosslinking catalyst compound is preferably used in an amount of from 0,0001 to 1 part by weight based on 100 parts by weight of the organodecane polymer. Below 0.0001 parts by weight, the above effects are not expected. Above 1 part by weight of 〇, the storage stability of the hard reticle composition is insufficient. If desired, the hard reticle composition of the present invention may further comprise at least one additive from the parent, the benzoate, and the surfactant. The present invention also provides a method of fabricating a semiconductor integrated circuit device, the method comprising the steps of: (a) providing a layer of material on a substrate, and (b) forming a layer of organic material on the layer of material I5 a hard mask layer, (c) coating the hard mask layer of the present invention on the first hard mask layer to form a second hard mask layer, and (d) forming a radiation sensitive layer on the second hard mask layer The imaging layer '(e) imagewise exposes the imaging layer to radiation and forms a pattern of light exposed areas in the imaging layer, (f) selectively removes the radiation sensitized imaging layer 20 and the second hard a portion of the mask layer to expose a portion of the first hard mask layer, (g) selectively removing the patterned second hard mask layer and portions of the first hard mask layer to expose the layer of material And (h) etching the exposed portion of the material layer to pattern the material layer. The present invention also provides a semiconductor integrated circuit 26 200827928 device manufactured by this method. [Mode for Invention] Hereinafter, the present invention will be explained in more detail with reference to the following examples. However, the examples are for illustrative purposes only and are not to be construed as limiting the scope of the invention. EXAMPLES [Comparative Example 1] 1,750 g of decyltrimethoxy decane, 34 g of phenyltrimethoxy sylvestre, and 313 g of dimethoxy sulphur were dissolved in a magnetic stirrer, and cooled 10 5,600 g of propylene glycol methyl ether acetate (pgmea) in a 1 liter four-necked flask of a condenser, a dropping funnel, and a nitrogen introduction tube, and then 925 g of an aqueous nitric acid solution (1, 〇 00 ppm) was added. The resulting mixture was removed after 6 hours of reaction at 6 〇 QC. The reaction was continued for a week while maintaining the reaction temperature at 50. (: After the reaction is completed, hexane is added to the reaction mixture 15 to precipitate the polymer of Chemical Formula 10: Η Η

(10) 100克之PGMEA及100克之乳酸乙g旨添加至4.0克之聚 合物而製備聚合物之稀溶液。形成之溶液旋轉塗覆於矽晶 圓上’其後於240〇C烘烤60秒形成500人厚之膜。 20 [實施例1] 1750克之甲基三甲氧基矽烷、34〇克之苯基三甲氧基 27 200827928 矽烷,及313克之三甲氧基矽烷溶於在裝設磁性檀拌器、冷 凝裔、滴液漏斗’及氮氣引入管之10公升之四頸燒瓶内之 5,600克之PGMEA,然後,添加925克之含水硝酸溶液〇,〇〇〇 ppm)。形成之混合物於6〇°C反應1小時。其後,形成之甲醇 5於減塵下移除。反應持續1週’同時使反應溫度維持於 5〇°C。於反應溫度降至25°C後,添加185克之乙基乙烯基 醚。形成之混合物於室溫反應18小時。反應完全後,己烷 被添加至此反應混合物而使化學式11之聚合物沈澱:(10) 100 g of PGMEA and 100 g of lactic acid B were added to 4.0 g of the polymer to prepare a dilute solution of the polymer. The resulting solution was spin coated onto the twin circles. Thereafter, it was baked at 240 ° C for 60 seconds to form a film of 500 person thick. 20 [Example 1] 1750 g of methyltrimethoxydecane, 34 g of phenyltrimethoxy 27 200827928 decane, and 313 g of trimethoxydecane dissolved in a magnetic sandal mixer, condensation concentrating, dropping funnel 'And 5,600 g of PGMEA in a 10 liter four-necked flask of nitrogen gas introduction tube, then, 925 g of aqueous nitric acid solution 〇, 〇〇〇 ppm). The resulting mixture was reacted at 6 ° C for 1 hour. Thereafter, the formed methanol 5 is removed under dust reduction. The reaction was continued for 1 week while maintaining the reaction temperature at 5 °C. After the reaction temperature was lowered to 25 ° C, 185 g of ethyl vinyl ether was added. The resulting mixture was reacted at room temperature for 18 hours. After the reaction is completed, hexane is added to the reaction mixture to precipitate the polymer of Chemical Formula 11:

100克之PGMEA及100克之乳酸乙酯添加至4 0克之聚 a物而製備聚合物之稀溶液。對此稀溶液,添加〇·⑻4克之 比定對-甲笨磺酸鹽。形成之溶液旋轉塗覆於石夕晶圓上,其 後於240。(:烘烤60秒形成500 A_厚之膜。 [實驗例1] 比較例1及實施例丨製備之溶液被測試貯存期間之安定 性。每一溶液於40。〇貯存。於10天之間隔時,溶液之狀態 被觀察’且塗覆溶液後之膜厚度被測量。結果侧示於第! 表0 …大後 樣品 丁 m 止現化之分 子量 正規化之 正規化之广 —旱又分子量厚度 28 200827928 比較 例1 1.1 512 A 1.8 實施 例1 1.0 502 A 1.0A dilute solution of the polymer was prepared by adding 100 g of PGMEA and 100 g of ethyl lactate to 40 g of polya. To this dilute solution, 〇·(8) 4 g of a ratio of cis-methyl sulfonate was added. The resulting solution is spin coated onto the Shi Xi wafer, followed by 240. (: Baking for 60 seconds to form a film of 500 A_thickness. [Experimental Example 1] The solutions prepared in Comparative Example 1 and Example 被 were tested for stability during storage. Each solution was stored at 40 Torr. At intervals, the state of the solution is observed 'and the film thickness after coating the solution is measured. The result side is shown in the table! Table 0 ... Large sample size is normalized by the normalization of molecular weight normalization - drought and molecular weight Thickness 28 200827928 Comparative Example 1 1.1 512 A 1.8 Example 1 1.0 502 A 1.0

532 A觀察到顆粒差的塗覆 物 502 A 1.0 503 A 第1表中所示之正規化分 時間後測得之相對應聚合物之分子量除以製備聚合物後立 即測得之聚合物分子量而獲得之數值。於所㈣存時間間 隔後之比較例1製備之聚合物之分子量增加被觀察到,表 存在於比較例丨製備之溶㈣之靴化合物間發生縮合^ 用。相反地,實施例旧備之聚合物之分子量即使於交聯時 間過後仍被維持,表示此紐之改良的貯存安定性。 [實驗例2] 比較例!及實施m形成之膜之折射率⑻及消光係數㈨ 10係使用橢圓測厚儀(J. A. Woollam)測量。結果係顯示於第2 表。 第2表 用以形成膜之樣品 比較例1 iL學性質Π93 3 率⑻ 171 0.23 實施例 1______ ^JV78_ 0.23 由第2表所見,比較例1及實施例1形成之膜於193 nmi 曝光光源顯示良好光學性質。實施例1製備之聚合物中之以 15化學式4之乙基乙烯基醚保護Si-ΟΗ基可被確認對於光罩之 光學性質不具有壞的影響。 [實驗例3]532 A observed particle difference coating 502 A 1.0 503 A The molecular weight of the corresponding polymer measured after the normalization time shown in Table 1 was divided by the molecular weight of the polymer measured immediately after preparation of the polymer. The value obtained. The increase in molecular weight of the polymer prepared in Comparative Example 1 after the time interval of (4) was observed, and the condensation occurred between the shoe compounds of the solution prepared in Comparative Example (4). Conversely, the molecular weight of the polymer of the examples was maintained even after the crosslinking time was over, indicating improved storage stability of the yarn. [Experimental Example 2] Comparative example! And the refractive index (8) and extinction coefficient (9) of the film formed by m were measured using an elliptical thickness gauge (J. A. Woollam). The results are shown in Table 2. Sample No. 2 for forming a film Comparative Example 1 iL Properties Π93 3 Rate (8) 171 0.23 Example 1______ ^JV78_ 0.23 As seen from the second table, the film formed by Comparative Example 1 and Example 1 showed good exposure at 193 nmi. Optical properties. The protection of the Si-fluorenyl group by the ethyl vinyl ether of Chemical Formula 4 in the polymer prepared in Example 1 was confirmed to have no adverse effect on the optical properties of the reticle. [Experimental Example 3]

ArF光阻劑塗覆於比較例1及實施例1形成之膜之每一 29 200827928 者上,於110°c烘烤60秒,使用ArF曝光系數(ASML1250, FN70 5.0活性,NA 0.82)曝光,且以TMAH水溶液(2.38重量 %)顯影形成80_nm之線與間隙之圖案。圖案係使用場發射 掃瞄電子顯微鏡(FE-SEM)觀察。圖案被測量為曝光能量之 5 函數之曝光寬容度(EL)極限及為距組源之距離之函數之聚 焦深度(DoF)極限 第3表 。結果係記錄於第3表。 用以形成膜之樣品 圖案特性 EL極限(AmJ/曝光能量mJ) DoF 極限(μηι) 比較例1 0.2 0.2 實施例1 0.2 0.2 圖案皆顯示良好之光學輪廓。由此等結果,可確認實 施例1製備之聚合物中之以化學式4之乙基乙烯基醚保護 10 Si-〇H基不會不利地影響光阻劑之光學輪廓。 [實驗例4] 實驗例3獲得之具圖案之樣本使用cfx電堕、〇2電漿及 CFX電漿依序進行乾餘刻。剩餘之有機材料使用〇2完全移 除,且經蝕刻之樣本之截面使用FE_SEM觀察。結果係列示 15於第4表。 第4表 ------------ '^ _______________ 用以形成膜之樣品 蝕刻後之圖案形狀 ______--------—____ 比較例1 垂直 實;列1__垂直 樣本皆顯示良好之姓刻特性。此等結果顯示實施例1 製備之聚合物中之以化學式4之乙基乙烯基醚保護si-〇H基 30 200827928 對於光罩之耐餘刻性、姓刻選擇性及餘刻輪廊無壞影響。 【產業應用性】 本發明提供一種用於處理光阻底層膜之硬質光罩組成 物,其不會不利地影響光罩之耐餘刻性、钮刻選擇性、餘 • 5刻輪廓、光學性質及光學輪廓。此外,本發明之硬質光罩 . 組成物於貯存期間係高度安定。 t圖式簡單說明3 第1圖係一包含於製造半導體積體電路裝置之微影方 法中由本發明之硬質光罩組成物形成之抗反射硬質光罩層 10 之多層結構之截面圖。 【主要元件符號說明】 (無) 31ArF photoresist was applied to each of the films formed in Comparative Example 1 and Example 1 on 2008 2972828, baked at 110 ° C for 60 seconds, and exposed using an ArF exposure coefficient (ASML 1250, FN70 5.0 activity, NA 0.82). The pattern of lines and gaps of 80 nm was developed by developing an aqueous solution of TMAH (2.38 wt%). The pattern was observed using a field emission scanning electron microscope (FE-SEM). The pattern is measured as the exposure latitude (EL) limit of the 5 function of exposure energy and the depth of focus (DoF) limit as a function of distance from the group source. The results are recorded in Table 3. Sample for forming a film Pattern characteristics EL limit (AmJ/exposure energy mJ) DoF limit (μηι) Comparative Example 1 0.2 0.2 Example 1 0.2 0.2 Patterns all showed good optical profiles. From the results, it was confirmed that the protection of the 10 Si-〇H group by the ethyl vinyl ether of Chemical Formula 4 in the polymer prepared in Example 1 did not adversely affect the optical profile of the photoresist. [Experimental Example 4] The patterned samples obtained in Experimental Example 3 were sequentially dried using cfx electric 堕, 〇2 plasma, and CFX plasma. The remaining organic material was completely removed using 〇2, and the cross section of the etched sample was observed using FE_SEM. The result series is shown in Table 4. Table 4 ------------ '^ _______________ Pattern shape after etching of the sample used to form the film ______---------____ Comparative Example 1 Vertical Reality; Column 1__ Vertical samples all show good surname characteristics. These results show that the ethyl vinyl ether of Chemical Formula 4 protects the si-〇H group 30 in the polymer prepared in Example 1. 200827928 Resistant to the mask, the last name selectivity and the residual wheel corridor are not bad. influences. [Industrial Applicability] The present invention provides a hard reticle composition for treating a photoresist underlayer film, which does not adversely affect the reticle resistance, the stencil selectivity, the stencil, and the optical properties. And optical contours. Further, the hard reticle of the present invention. The composition is highly stable during storage. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a cross-sectional view showing a multilayer structure of an antireflection hard mask layer 10 formed of a hard mask composition of the present invention, which is included in a lithography method for fabricating a semiconductor integrated circuit device. [Main component symbol description] (none) 31

Claims (1)

200827928 十、申請專利範圍: 1. 一種有機矽烷聚合物,其係藉由使以化學式卜2及3表示 之化合物之水解產物之聚縮合反應產物與化學式4之乙 基乙烯基醚反應而製備: 5 [RO]3Si-Ar (1) (其中,R係甲基,或乙基,且Ar係含芳香族環之官能基); [RO]3Si-H (2) (其中,R係甲基,或乙基);及 [RO]3Si_R, (3) 10 (其中,R係甲基,或乙基,且R’係經取代或未經取代之 環狀或非環狀之烷基): CH2CHOCH2CH3 (4)。 2. 如申請專利範圍第1項之有機矽烷聚合物,其中,化學式 1、2及3之該化合物之該水解產物係個別以化學式5、6 15 及7表不· ArSi[OH]3 (5) (其中,Ar係含芳香族環之官能基); HSi[OH]3 (6);及 R,Si[OH]3 (7) 20 (其中,R’係經取代或未經取代之環狀或非環狀之烷基)。 3. 如申請專利範圍第1項之有機矽烷聚合物,其中,該聚縮 合反應產物係以化學式8表示者: 32 200827928 Arx )-s\-( -0 —Si VO —Si -〇_ 〇 0 I I ~0—Si/-0 Hy V II Η Η η (8) =中^係含芳香族環之官能基,㈣經取代或未經取 之環狀或非環狀之烷基,x、y及z滿足關係式叉^ °.〇4&lt;x&lt;〇e8〇 , 〇&lt;y &lt; ! 4〇 , ^1.80 &lt;z&lt; 3 9β 係 3至500。 — — y + ζ 且η 4·如申請專利範圍第1項之有機㈣聚合物,其中,該有機 矽烷聚合物係以化學式9表示:200827928 X. Patent Application Range: 1. An organic decane polymer prepared by reacting a polycondensation reaction product of a hydrolyzate of a compound represented by Chemical Formulas 2 and 3 with ethyl vinyl ether of Chemical Formula 4: 5 [RO]3Si-Ar (1) (wherein R is a methyl group or an ethyl group, and Ar is a functional group containing an aromatic ring); [RO]3Si-H (2) (wherein R is a methyl group) , or ethyl); and [RO]3Si_R, (3) 10 (wherein R is a methyl group, or an ethyl group, and R' is a substituted or unsubstituted cyclic or acyclic alkyl group): CH2CHOCH2CH3 (4). 2. The organodecane polymer according to claim 1, wherein the hydrolyzate of the compound of the chemical formulas 1, 2 and 3 is independently represented by the chemical formulas 5, 6 15 and 7 by ArSi[OH]3 (5) (wherein Ar is a functional group containing an aromatic ring); HSi[OH]3 (6); and R,Si[OH]3 (7) 20 (wherein R' is a substituted or unsubstituted ring Amorphous or acyclic alkyl). 3. The organodecane polymer according to claim 1, wherein the polycondensation reaction product is represented by Chemical Formula 8: 32 200827928 Arx )-s\-( -0 -Si VO -Si -〇_ 〇0 II ~0—Si/-0 Hy V II Η η η (8) = a functional group containing an aromatic ring, (iv) a substituted or unsubstituted cyclic or acyclic alkyl group, x, y And z satisfy the relational fork ^ °.〇4&lt;x&lt;〇e8〇, 〇&lt;y &lt; ! 4〇, ^1.80 &lt;z&lt; 3 9β is 3 to 500. — y + ζ and η 4· An organic (four) polymer as claimed in claim 1, wherein the organodecane polymer is represented by the chemical formula 9: Me (9) l〇 15 /、中,Ar係含芳香族環之官能基,R,係經取代或未經取 代之環狀或非環狀之烷基,每一Me係甲基,χ、y及ζ滿 足關係式x + y + ζ = 4,0·04 £ X $ 0.80,0 ^ y $ ι·4〇,及 1·80 S ζ $ 3.96,且n係3至500。 5·如申請專利範圍第1項之有機矽烷聚合物,其中,該水解 產物係於選自硝酸、硫酸、對-甲苯磺酸單水合物、硫酸 二乙醋、2,4,4,6-四溴-2,5-環己二烯酮,及有機磺酸之燒 基醋所組成族群之酸催化劑存在中製備。 6·如申請專利範圍第1項之有機矽烷聚合物,其中,該有機 矽烷聚合物係藉由混合1至2〇重量份之化學式1之該化合 物、〇至35重量份之化學式2之該化合物,及45至99重量 33 200827928 份之化學式3之該化合物(其係關於100重量份之化學式 1、2及3之化合物而計),使該混合物於1〇至1〇〇重量份之 水及100至900重量份之溶劑中,於〇〇〇1至5重量份之酸 催化劑存在中’反應獲得聚縮合反應產物,且使該聚縮 5 合反應產物與1至200重量份之化學式4之乙基乙烯基醚 反應而製備。 7·如申凊專利範圍第1項之有機矽烷聚合物,其中,該溶劑 係選自丙酮、四氫呋喃、苯、甲苯、二乙基醚、氯仿、 二氯甲烷、乙酸乙酯、丙二醇甲基醚、丙二醇乙基醚、 10 丙二醇丙基醚、丙二醇甲基醚乙酸酯、丙二醇乙基醚乙 酸酯、丙二醇丙基醚乙酸酯、乳酸乙酯、丁内酯,及 其等之混合物組成之族群。 8· —種用以處理光阻底層膜之硬質光罩組成物,該組成物 包含: 15 (a)有機矽烷聚合物,其係藉由使以化學式卜2及3表示之 化合物之水解產物之聚縮合反應產物與化學式4之乙基 乙烯基醚反應而製備: [RO]3Si-Ar (1) (其中,R係曱基,或乙基,且Ar係含芳香族環之官能基), 20 [R〇]3Si-H (2) (其中,R係甲基,或乙基),且 [R〇]3Si-R9 (3) (其中,R係甲基,或乙基,且R’係經取代或未經取代之 環狀或非環狀之烷基) 34 200827928 (4) CH2CHOCH2CH3 5 (b) 溶劑;及 (c) 交聯催化劑。 9·如申請專利範圍 第8項之硬質光罩組成物 1、2及3之該化合物之該水解產物係個別 及7表示: ’其中,化學式 以化學式5、6 ArSi[OH]3 (5) (其中,Ar係含芳香族環之官能基); HSi[〇H]3 ⑹;及 10 R,Si[OH]3 (7) (其中,R’係經取代或未經取代之環狀或麵狀之炫基)。 10·如申請專利範圍第8項之硬質光罩組成物,其+,該聚縮 合反應產物係以化學式8表示者: -0 —Si\-〇 —-Si -〇 I IMe (9) l〇15 /, medium, Ar is a functional group containing an aromatic ring, and R is a substituted or unsubstituted cyclic or acyclic alkyl group, each Me methyl group, hydrazine, y and ζ satisfy the relationship x + y + ζ = 4,0·04 £ X $ 0.80,0 ^ y $ ι·4〇, and 1·80 S ζ $ 3.96, and n is 3 to 500. 5. The organodecane polymer according to claim 1, wherein the hydrolyzate is selected from the group consisting of nitric acid, sulfuric acid, p-toluenesulfonic acid monohydrate, sulfuric acid diethyl sulfate, 2, 4, 4, 6- It is prepared in the presence of an acid catalyst of the group consisting of tetrabromo-2,5-cyclohexadienone and an organic sulfonic acid. 6. The organodecane polymer according to claim 1, wherein the organodecane polymer is obtained by mixing 1 to 2 parts by weight of the compound of Chemical Formula 1, and hydrazine to 35 parts by weight of the compound of Chemical Formula 2 And 45 to 99 parts by weight of the compound of the formula 3 (which is based on 100 parts by weight of the compound of the chemical formulas 1, 2 and 3), and the mixture is made up of 1 to 1 part by weight of water and 100 to 900 parts by weight of a solvent, in the presence of 1 to 5 parts by weight of an acid catalyst, to obtain a polycondensation reaction product, and to make the polycondensation reaction product and 1 to 200 parts by weight of the chemical formula 4 It is prepared by reacting ethyl vinyl ether. 7. The organodecane polymer according to claim 1, wherein the solvent is selected from the group consisting of acetone, tetrahydrofuran, benzene, toluene, diethyl ether, chloroform, dichloromethane, ethyl acetate, propylene glycol methyl ether. , propylene glycol ethyl ether, 10 propylene glycol propyl ether, propylene glycol methyl ether acetate, propylene glycol ethyl ether acetate, propylene glycol propyl ether acetate, ethyl lactate, butyrolactone, and the like The ethnic group. 8. A hard reticle composition for treating a photoresist underlayer film, the composition comprising: 15 (a) an organodecane polymer which is obtained by hydrolyzing a compound represented by Chemical Formulas 2 and 3 The polycondensation reaction product is reacted with ethyl vinyl ether of Chemical Formula 4 to prepare: [RO]3Si-Ar (1) (wherein R is a mercapto group, or an ethyl group, and the Ar system contains an aromatic ring-containing functional group), 20 [R〇]3Si-H (2) (wherein R is a methyl group, or an ethyl group), and [R〇]3Si-R9 (3) (wherein R is a methyl group, or an ethyl group, and R' a substituted or unsubstituted cyclic or acyclic alkyl group) 34 200827928 (4) CH2CHOCH2CH3 5 (b) a solvent; and (c) a crosslinking catalyst. 9. The hydrolyzed product of the compound of the hard reticle compositions 1, 2 and 3 of claim 8 of the patent application is individually and 7: 'wherein the chemical formula is the chemical formula 5, 6 ArSi[OH]3 (5) (wherein Ar is a functional group containing an aromatic ring); HSi[〇H]3 (6); and 10 R,Si[OH]3 (7) (wherein R' is a substituted or unsubstituted ring or The sleek base). 10. The hard reticle composition of claim 8 of the patent, wherein +, the polycondensation reaction product is represented by the chemical formula: -0 - Si \ - 〇 - - Si - 〇 I I 15 其中’ Ar係含芳香族環之官能基,R,係經取代或未經取 代之環狀或非環狀之烷基,x、y及z滿足關係式X + y+ z = 4 ’ 0.04$xm 1.40,及 1·80〈ζ$3·96,j^n 係3至500 。 U·如申請專利範圍第8項之硬質光罩組成物,其中,該有機 矽烷聚合物係以化學式9表示: 35 20082792815 wherein 'Ar is a functional group containing an aromatic ring, R is a substituted or unsubstituted cyclic or acyclic alkyl group, and x, y and z satisfy the relationship X + y + z = 4 ' 0.04$ Xm 1.40, and 1·80<ζ$3·96, j^n are 3 to 500. U. The hard reticle composition of claim 8, wherein the organo decane polymer is represented by Chemical Formula 1: 35 200827928 其中’ Αι·係含芳相環之官能基,r,係經取代或未經取 代之環狀或非環狀之燒基,每-Me係曱基,x、yAz滿 足關係式x + y + z = 4, 〇〇4^x^〇 8〇, 4〇 ,及 5 I·80 $ z $ 3·96,且η係3至500。 12.如申請專利範圍第8項之硬質光罩組成物,其中,該水解 產物係於選自硝酸、硫酸、對_甲苯磺酸單水合物、硫酸 二乙S曰、2,4,4,6-四溴-2,5-環己二稀酮,及有機續酸之烧 基酯所組成族群之酸催化劑存在中製備。 10 13·如申請專利範圍第8項之硬質光罩組成物,其中,該有機 矽烷聚合物係藉由混合1至20重量份之化學式1之該化合 物、0至35重量份之化學式2之該化合物,及45至99重量 份之化學式3之該化合物(其係關於100重量份之化學式 1、2及3之化合物而計),使該混合物於1〇至1〇〇重量份之 15 水及1〇〇至900重量份之溶劑中,於0.001至5重量份之酸 催化劑存在中,反應獲得聚縮合反應產物,且使該聚縮 合反應與1至200重量份之化學式4之乙基乙烯基醚反應 而製備。 14.如申請專利範圍第13項之硬質光罩組成物,其中,該溶 2〇 劑係選自丙_、四氫咬喃、苯、甲苯、二乙基、氯仿、 二氯甲烷、乙酸乙酯、丙二醇甲基醚、丙二醇乙基醚、 36 200827928 丙一醇丙基醚、丙二醇甲基_乙酸酯、丙二醇乙基醚乙 酸酿、丙二醇丙基鱗乙酸、乳酸乙_、γ-丁内酿,及 其專之混合物組成之族群。 15·如申请專利|色圍第8項之硬質光罩組成物,其中,該硬質 5 光罩組成物包含1至50重量份之該有機矽烷聚合物,其係 關於該組成物之總重量(1〇〇重量份)而計,5〇至99重量份 之该溶劑,其係關於組成物之總重量(1〇〇重量份)而計, 及0.0001至0.01重量份之該交聯催化劑,其係關於100重 里伤之有機石夕烧聚合物而計。 b·如申請專利範圍第8項之硬質光罩組成物,其中,該溶劑 係選自丙酮、四氫呋喃、苯、甲苯、二乙基醚、氣仿、 —氣甲烷、乙酸乙酯、丙二醇甲基醚、丙二醇乙基醚、 丙二醇丙基鱗、丙二醇甲基醚乙酸酯、丙二醇乙基醚乙 酉文酉曰、丙二醇丙基醚乙酸酯、乳酸乙酯、丁内酯,及 其荨之混合物組成之族群。 17.如申請專利範圍第8項之硬質光罩組成物,其中,該交聯 催化劑係選自吡啶對_甲苯磺酸鹽、醯胺基磺酸甜菜鹼 16、(-)_樟腦_1〇_績酸銨鹽、甲酸銨、甲酸三乙基錄、甲 酸二甲基銨、甲酸四甲基銨、吡啶甲酸鹽、乙酸銨、乙 酸二乙基銨、乙酸三甲基銨、乙酸四甲基銨、吡啶乙酸 鹽、乙酸四丁基銨、四丁基銨疊氮化物、苯甲酸四丁基 銨四丁基銨硫酸氫鹽、四丁基銨溴化物、四丁基銨氯 化物四丁基銨氰化物、四丁基銨氟化物、四丁基銨蛾 化物、四丁基銨硫酸鹽、四丁基銨硝酸鹽、四丁基銨亞 37 200827928 硝酸鹽、四丁基銨對-甲苯磺酸鹽、四丁基銨磷酸鹽,及 其等之混合物所組成之族群。 18·如申請專利範圍第8項之硬質光罩組成物,進一步包含至 少一選自交聯劑、自由基安定劑,及表面活性劑之添加 5 劑。 19. 一種製造半導體積體電路裝置之方法,該方法包含步 驟: (a) 於一基材上提供一材料層; (b) 於該材料層上形成一由有機材料組成之硬質光罩層; 10 (c)使申請專利範圍第8至18項中任一項之硬質光罩組成 物塗覆於由有機材料組成之該硬質光罩層上,以形成一 抗反射之硬質光罩層; (d)於該抗反射之硬質光罩層上形成一輻射敏化性之成像 層; 15 (e)使該成像層圖像式曝光於輻射而於該成像層形成經輻 射曝光區域之圖像; (f)選擇性地移除該輻射敏化成像層及該抗反射硬質光罩 層之部份以曝露出由有機材料組成之該硬質光罩層之部 份; 20 (g)選擇性移除該具圖案之抗反射硬質光罩層及由有機材 料組成之該硬質光罩層之部份以曝露出該材料層之部 份;及 (h)使該材料層之露出部份進行蝕刻而使該材料層形成圖 案。 38 200827928 20. —種半導體積體電路裝置,其係藉由申請專利範圍第19 項之方法製造。 39Wherein 'Αι· is a functional group containing a aryl phase ring, r is a substituted or unsubstituted cyclic or acyclic group, and each of the -Me thiol groups, x, yAz satisfy the relationship x + y + z = 4, 〇〇4^x^〇8〇, 4〇, and 5 I·80 $ z $ 3·96, and η is 3 to 500. 12. The hard reticle composition of claim 8, wherein the hydrolyzate is selected from the group consisting of nitric acid, sulfuric acid, p-toluenesulfonic acid monohydrate, diethyl sulfonate sulfate, 2, 4, 4, It is prepared in the presence of an acid catalyst of a group consisting of 6-tetrabromo-2,5-cyclohexanedione, and an organic acid-based alkyl ester. The hard reticle composition of claim 8, wherein the organodecane polymer is obtained by mixing 1 to 20 parts by weight of the compound of Chemical Formula 1, 0 to 35 parts by weight of Chemical Formula 2 a compound, and 45 to 99 parts by weight of the compound of Chemical Formula 3, which is based on 100 parts by weight of the compound of Chemical Formulas 1, 2 and 3, such that the mixture is in an amount of from 1 to 1 part by weight of 15 water and 1 to 900 parts by weight of a solvent, in the presence of 0.001 to 5 parts by weight of an acid catalyst, the reaction obtains a polycondensation reaction product, and the polycondensation reaction is carried out with 1 to 200 parts by weight of an ethyl vinyl group of Chemical Formula 4 Prepared by ether reaction. 14. The hard reticle composition of claim 13, wherein the bismuth bismuth agent is selected from the group consisting of propylene, tetrahydroethylene, benzene, toluene, diethyl, chloroform, dichloromethane, and acetic acid Ester, propylene glycol methyl ether, propylene glycol ethyl ether, 36 200827928 propanol propyl ether, propylene glycol methyl acetate, propylene glycol ethyl ether acetic acid, propylene glycol propyl squaric acid, lactic acid B, γ-butane Stuffed, and a mixture of its specialties. 15. The hard reticle composition of claim 8, wherein the hard 5 reticle composition comprises from 1 to 50 parts by weight of the organodecane polymer, based on the total weight of the composition ( 5 〇 to 99 parts by weight of the solvent, based on 1 part by weight of the total weight of the composition (1 Å by weight), and 0.0001 to 0.01 parts by weight of the crosslinking catalyst, It is based on the 100% heavy organic stone polymer. b. The hard reticle composition of claim 8, wherein the solvent is selected from the group consisting of acetone, tetrahydrofuran, benzene, toluene, diethyl ether, gas, methane, ethyl acetate, propylene glycol methyl Ether, propylene glycol ethyl ether, propylene glycol propyl scale, propylene glycol methyl ether acetate, propylene glycol ethyl ether acetamidine, propylene glycol propyl ether acetate, ethyl lactate, butyrolactone, and mixtures thereof The group of people. 17. The hard reticle composition of claim 8, wherein the crosslinking catalyst is selected from the group consisting of pyridine p-toluenesulfonate, decyl sulfobetaine 16, (-) _ camphor_1 〇 _ acid ammonium salt, ammonium formate, triethyl sulphate, dimethyl ammonium formate, tetramethylammonium formate, pyridine formate, ammonium acetate, diethylammonium acetate, trimethylammonium acetate, tetramethyl acetate Alkyl ammonium, pyridine acetate, tetrabutylammonium acetate, tetrabutylammonium azide, tetrabutylammonium benzoate tetrabutylammonium hydrogen sulfate, tetrabutylammonium bromide, tetrabutylammonium chloride tetrabutyl Base ammonium cyanide, tetrabutylammonium fluoride, tetrabutylammonium moth, tetrabutylammonium sulfate, tetrabutylammonium nitrate, tetrabutylammonium 37 200827928 nitrate, tetrabutylammonium p-toluene a group of sulfonates, tetrabutylammonium phosphates, and mixtures thereof. 18. The hard reticle composition of claim 8 further comprising at least one agent selected from the group consisting of a crosslinking agent, a free radical stabilizer, and a surfactant. 19. A method of fabricating a semiconductor integrated circuit device, the method comprising the steps of: (a) providing a layer of material on a substrate; (b) forming a hard mask layer of organic material on the layer of material; 10 (c) applying a hard mask composition according to any one of claims 8 to 18 to the hard mask layer composed of an organic material to form an anti-reflective hard mask layer; d) forming a radiation sensitized imaging layer on the anti-reflective hard mask layer; 15 (e) imagewise exposing the imaging layer to radiation to form an image of the radiation exposed region in the imaging layer; (f) selectively removing the portion of the radiation-sensitized imaging layer and the anti-reflective hard mask layer to expose a portion of the hard mask layer composed of an organic material; 20 (g) selectively removing a patterned anti-reflective hard mask layer and a portion of the hard mask layer composed of an organic material to expose a portion of the material layer; and (h) etching the exposed portion of the material layer to cause etching The layer of material forms a pattern. 38 200827928 20. A semiconductor integrated circuit device manufactured by the method of claim 19 of the patent application. 39
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