200827766 九、發明說明： 【相關申請案交互參考】 本申請案申請2006年12月29日提出申請之美國許時 申請案第60/877,743號的優先權。2〇〇6年12月29日提出 申請之美_時中請㈣_77,743號的揭示，係被視為 本申請案的部分及併入其揭示做參考。本申請案進一步申 請2006年12月28日提出申請之德國專利申請案第1〇鳩 062 480.7號的優先權，其全部内容在此併入參考。 【先前技術】 本發明係有關浸入微影光學裝置，包含··施加防水塗 層的至少-組件，該防水塗層係於投影刻操作期間^ 至紫外線，該至少一組件係於投影鏡片操作期間至少部分 被浸入流體浸濕。本發明進一步有關包含該光學裝置的: 投影曝光裝置。 通常，以流體，特別是以水浸濕光學組件會對其光學 特性有負面影響。例如，浸濕會形成如其表面上之鹽的〉ζ 染物。為了防止水浸濕光學元件，或為了從該光學元件快 速移除水，已知提供防水塗層給光學元件。本申請案脈絡 中，例如防水塗層”項係涉及表面包覆與水呈度或更大 角度的一塗層。 JP 2003_161806 Α說明防水層於玻璃基板之非塗佈區 域中形成，具有一抗反射塗層的一光學元件。此裝置中， 該防水塗層可鄰接該抗反射塗層或該玻璃基板側緣形成。 6 200827766 以此法，可避免該光學元件及相關固定結構之間空隙存在 濕氣。 US 5,494,712說明施加聚合物層至基板以降低其被水 浸濕的方法。該層較佳包含一個或若干有機矽化合物，如 矽烧或矽氧烷，且藉由電漿強化化學汽相沉積(PECVD)施 加0 浸濕議題於微影，特別是浸入微影中亦很明顯。微影 中，為了製造半導體組件，係以縮減尺寸藉由投影透鏡將 遮罩結構映射至光敏感基板。為了達成該申請案所需之高 解析度，係使用通常低於250奈米之紫外線波長範圍的照 明輪射。為了增加浸入微影之解析度及場深度，通常為蒸 餾水的浸入流體，係安置於該投影透鏡最後光學元件及該 光破感基板之間以增加折射率。此安置中，該投影透鏡之 最後光學元件係至少被水部分浸濕，而可以增加頻率來使 用防水浸入微影及防水塗層。 JP2005-268759A已知-光學元件，其係安置於用於浸 入微影之投影曝光裝置巾’而至少—表面暴露至該照明輕 射。該表面包含由施加包含非晶氟聚合物之防水層的二氧 化石夕(Si02)，氟傾(MgF2)錢簡(CaF2)製成的結合層。 JP11 -149812說明較佳包含施加氟碳聚合物之防水保護 層至反射增加或反㈣低多I㈣，以提供防止周圍濕氣 浸入的光學系統。該賴層厚度係介於丨奈米及⑴奈米， 以避免小於25G奈米波長之氟碳聚合物的超額輻射吸收。 EP _5113 A2係說明包含一固定裝置及藉由黏著劑 7 200827766 黏上之一元件的一組件，其中該組件可以紫外線光譜範圍 傳送輪射。該黏著劑係藉由紫外線加工而介於透通組件及 該黏著劑之間，可以適用於加工該黏著劑之一光譜範圍傳 送光線，且可在該透通組件傳送之光譜範圍内，從有用光 X»醤範圍反射或吸收南度紫外光線的一薄層施加於該黏著劑 區域中，結果可以此波長範圍保護該黏著劑不受到紫外線 輻射。 水敏感透鏡元件保護方法可從印刷出版us 2006/0240365得知。此法中，可吸收紫外線輻射且包含一 金屬氧化物之一薄抗紫外線層，係於該透鏡表面的一邊緣 區域處產生。另一保護層可被施加至該金屬氧化物層，例 如该另一層可為聚氨酯層。該兩層係被期待可保護如包含 水敏感氟化鈣的該透鏡元件不受浸入流體的溶解。 然而，如上述，防水塗層不僅可用來防止光學表面浸 濕。此外，亦可將防水塗層施加至一組件上，如為了製造 本質為半脉柱而不可避倾水麵的—位置。針對用於 ，影之投影透鏡之光學映射雛及任何_誤差的干涉測 星例中係可有利地於使用該透鏡之前施加該塗層。針對 該測量、，，影透鏡係安置於對應測量裝置上，而浸入流體 置於賴讀置及該投影透鏡之間，得於實際應財所經 歷的！況下測量。大多數例中，超純水係當作浸入流體， Ί衣1防止純純水流失之制量裝置之光學組件的 '此％必頊具有—防水表面，以製造—凸面及向上彎 曲水半月。重要是，係可永遠可靠地確保與面對該測量裝 8 200827766 置之該透鏡最後光學組件的完美接頭。 使用浸入系統中之防水塗層的常見問題，係包含緊密 接觸該塗層之投影透鏡操作綱，該塗層被料_射損二 或破壞的機率。再者，因紫外線輻射的結果，該塗層^ 水特性可麟級，使得極端例巾，該塗層可發展防水特性。 特別疋，考量其表面特性，實際應用顯示在此建構具防水 表面之該環所使用的物質在短期之後已改變，因輻射持續 期間增加崎低其防水特性的效應。此制有關使用如^ 奈米且更短波長之逐漸更短波長的雷射輻射。此意指短暫 操作期間之後，不再可提供穩定凸面水半月，而導致透鏡 及測里I置之間的浸入柱破裂，而必須中斷測量。 【發明目的】 本發明目的係於介紹中提及的該類型光學裝置中，提 供具有甚至可於密集及持久紫外線輻射下，仍可維持其防 水特性之防水塗層的一組件。 【發明内容】 此目的可藉由該防水塗層包含吸收及/或反射小於260 奈米波長之紫外線輻射的至少一抗紫外線層而得到滿足。 例如，此裝置中，該防水塗層僅包含額外包含防水特性的 一單抗紫外線，吸收及/或反射層，或該抗紫外線吸收及/ 或反射層可保護該塗層之另一防水層，不受到該投影透鏡 的紫外線輻射。 9 200827766 具優勢實施例中，該組件係為由紫外線波長範圍之透 通物質製成，該光學元件較佳可形成該投影透鏡的一端元 件。此例中，該光學元件係被浸入流體浸溼至少部分區域， 此裝置中之防水塗層通常被施加至此部分區域外側之該光 學元件表面’以保護該光學元件另一部分不致浸濕，該部 分通常直接鄰接至該浸濕部分區域，且該部分不浸入該浸 入流體。 較佳改良中，該防水塗層係於該光學元件光學清晰直 徑外側形成。光學元件之，，光學清晰直徑，，係涉及以訂定目 標方式傳送輻射通過之區域，也就是如透鏡例中對映射有 貢獻的區域。該光學清晰直徑特別可由該透鏡表面光亮的 该表面區域來決定，而此直徑以外的區域具有不亮，褪光 及粗糙表面。通常，該光學清晰直徑内的區域本質上係對 應才又影透鏡之一端元件浸入該浸入流體的區域。 發明人明瞭甚至該光學清晰直徑外側的任何光學元件 浸濕，均可能對其光學特性有負面影響，亦即因該浸濕形 成之蒸發所產生的冷。因此，例如光學元件的透鏡例中， 對該光學7L件溫度均衡有負面影響之散熱片所產生的浸濕 區域中’係可能產生非預期映射誤差。因為液體亦不如從 光焭表面流失般地從粗糙表面流失，所以此問題特別發生 於褪光表面上，也就是特別於該光學清晰直徑外側。 再者’發明人明瞭紫外線甚至會對該清晰光學直徑外 侧的防水塗層造成損害，亦即當產生投影透鏡時於該光學 元件中產生散射光的結果；其係為該防水塗層包含至少一 200827766 抗紫外線層的原因。此安置中，該防水塗層可僅包含一單 抗紫外線防水層，或較佳藉由吸收紫外線之一抗紫外線 層’可保護另一防水層不受來自該光學元件内部的紫外線 輻射。 具優勢改良中，降低反射塗層係施加於該光學元件， 其中該防水塗層係安置於該光學元件之非塗佈區域中，較 佳鄰接该降低反射塗層。通常，抗反射塗層係至少施加於 一透鏡之清晰光學直徑的區域中；該抗反射塗層通常包含 咼級低舌射率物質交替的若干層。申請者的 PCT/EP2〇〇_563〇係說明該抗反射塗層的較佳例，參考其 結果之該出版係由本申請案部分内容構成。 特定較佳改良中，一防水層係施加於該抗紫外層頂 邓如上述，彳几紫外線且吸收紫外線輻射之層，係可保護 。亥防水層不X到紫外線|讀。此法巾，可避免該防水層降 級(有關與水之接觸肖度，塗層附著及過濾行為）。 •具優勢改良中，該防水層物質係由包含以下之群組選 出：二氧化鉻(Cr02)，石夕燒，石夕氧烧，氟化物，DLC，防水 漆及膠K合物，較佳城碳聚合物 件，及鐵彻。光導發光‘ 的一類型塗層；鐵孕龍AF係由Cyt〇p經銷。魏烧可= =線加工’或其可熱加工(如有機修飾醇鹽），或其可藉由化 子汽相沉積方法施加。當上述物質暴露於微影中常見輻射 2的紫外線，至少當該防水於包含氧的大氣中時， 長』下其均不穩定。此脈絡中，，，長期下穩定”名詞係涉及 200827766 通常七年或更少的服務壽命。此外，杆上述物質中，暴 露於紫外線下會阻礙基板黏著及防水特性。然而，'可藉由 提供如氮(n2)，稀有氣體或其混合之惰性氣體，以增加^些 物質的長期穩定性。適用於該防水層之另外物質，係包含 氫化4光素’如聚四氟乙烯’壓克力纖維樹脂物質，或石夕 基樹脂物質的氟基樹脂物質。CYT0P(ASAHI GLASS有限 公司製造)亦可當作防水層。 較佳改良中，透通物質係由包含以下之群組選出··氟 ，鈣(CaF2)，石英玻璃(Si〇2)，紅氧化鍺(GeG2)。特別是， 氟化4弓及石英玻璃細微微影中使用的典型透鏡物質。 -改良中奈米或更大波長的輻㈣可穿透該抗紫 外線層處ί里鏈中必須發出，也就是如用於雷射焊接之卿 奈米，或驗高溫計之丨微米以上的波長因此可穿透 該抗紫外線層。 “較佳改良中，該光學元件係被設計為平凸透鏡，其中 該平面係包含-圓錐料鏡部件。以此方式成形的一光學 元件係較佳當作浸人微影投i提鏡的—端元件。 較佳實施例中，係提供防水塗層於該圓錐形透鏡部件 之圓錐側向表面及/或平面上。特別是圓錐侧向表面例中， 因為該圓錐形透鏡部件係至少部分與該浸入流體接觸，所 以=有該浸入流體浸濕該圓錐側向表面的危險，其中浸濕 可從雜置延伸至該平面。藉由防水塗層，係可避免此區 域中的该光學元件浸濕及溫度下降。此外或可替代，亦可 知加防水塗層於該透鏡之—邊緣區域，如—側向表面上， 12 200827766 垓透鏡可於該邊緣區域上與一支架連接；以此法可以防止 水對該透鏡及承座間之間隙的任何浸入。 另一具優勢改良中，該光學元件之圓錐形透鏡部件的 至沙一正面浸入該浸入流體，結果可有高解析度及大深度 場的投影透鏡數值孔徑及最小結構映射。 本發明高度較佳實施例中，光學裝置係包含可決定投 影透鏡之光學特性的一光學測量裝置，其中一浸入流體係 女置於該投影透鏡及該光學測量裝置之間，而其中用於形 成一本質上為半月水柱，包含防水塗層之一組件，係安置 於该浸入流體的區域中。如介紹中說明，此例中之該防水 塗層並不用來防止水浸濕該組件，而用來產生向上突出彎 曲的水半月。包含該測錄置_光學裝置並不需形成部 刀才又衫曝光I置，而可當作用於不同投影曝光裝置製程期 間，特徵化投影透鏡光學效能的一單獨測量裝置。 本貝施例具優勢改良中，包含防水塗層之組件係可形 成測量裝置的部分外殼，或為制量裝置的―組件，該組 件係被連接至該測量裝置，浸人流體放置該組件上面。 另具仏勢改良中，包含防水塗層的組件係包含一外 殼環，其可限繼浸人流體防止該浸人流體流失。 、另:具優勢改良巾，包含防水塗層的組件係由貴金屬 製成。當然，其他物質亦可用於此。 ^如’若將被測量之透鏡為使用巾的透鏡，其中一晶 圓係安置於該透鏡之下，則將被塗佈之該組件亦可由陶瓷 玻璃(zer〇dur) ’石英或用於投影曝光裝置中的類似物質製 13 200827766 成。 較佳實施例中，水，特別是超純水係被提供為一浸入 飢體除了使用水之外，亦可使用如油的其他浸入流體。 即使在該透鏡操作，偶而能量測量期間，均必須執行 傳輸測量及類似者，使得各種測量裝置因此安置於晶圓周 圍此女置中’透鏡之最後光學元件及測量裝置之間必須 呈現封閉流體接觸。因此於此安置中，亦需提供在實際應 用中經歷之情況下加強輻射期間，可確保凸面水半月形成 的一組件。 另一較佳實施例中，低於260奈米，較佳低於2〇〇奈 米波長的紫外線輻射無法穿透抗紫外線層。通常，由於可 用光源，用於浸入曝光設備的紫外線輻射波長係為248奈 米或193奈米。該抗紫外線層的吸收緣係在該曝光設備的 操作波長之上，結果可保護施加於此層頂部且不完全抗紫 外線且防水的一層不受到此輻射。再者，當施加於一光學 元件時，該無法穿透層亦可於所謂對向透鏡表面，，紫外線燃 燒’’期間提供抗紫外線輻射的保護，該透鏡表面係於此清潔 方法期間受到加強紫外線輻射以移除任何被吸收雜質。可 提供该光學元件的處理鏈中，係於各種塗佈，測量及裝設 步驟中提供紫外線燃燒。由於提供該防水層，係可於該處 理鍵中非常早時點處施加該吸收層。 抗紫外線層較佳包含從以下的群組選出：二氧化鈦 (Tl〇2) ’五氧化鈕(Ta2〇5)，二氧化銓(Hf〇2)，二氧化锆 (Zr〇2)，及鈦_锆混合氧化物，其可特別有利用於塗佈包含 14 200827766 石英玻璃’氟化#5或二氧化鍺的—組件。特別是， 鈦及五軋化㈣合當作用於抗紫外線層的物 下具有高度吸收性，且甚至= 石，=的防水特性，使施加於其頂部之防水層的部 刀知σ ’對叙件元件之光學特性不致 若需要，則該防水塗層亦可單獨包含上述物質之=一。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 The disclosure of the application _ _ _ _ _ 77, 743 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 The priority of the German Patent Application No. 1 062 480.7, filed on Dec. 28, 2006, which is hereby incorporated by reference in its entirety, is hereby incorporated by reference. [Prior Art] The present invention relates to an immersion lithography optical device comprising: at least an assembly for applying a water-repellent coating during exposure to ultraviolet light, the at least one component being attached to the projection lens during operation At least partially immersed in the fluid to soak. The invention further relates to a projection exposure apparatus comprising the optical device. In general, wetting an optical component with a fluid, especially water, can have a negative impact on its optical properties. For example, wetting will form a dye such as a salt on its surface. In order to prevent water from wetting the optical element, or to quickly remove water from the optical element, it is known to provide a water repellent coating to the optical element. In the context of the present application, for example, a waterproof coating" relates to a coating having a surface coating with water or a greater angle. JP 2003_161806 Α Description The waterproof layer is formed in a non-coated region of a glass substrate, having a primary antibody An optical component of the reflective coating. In the device, the waterproof coating can be formed adjacent to the anti-reflective coating or the side edge of the glass substrate. 6 200827766 In this way, the gap between the optical component and the associated fixed structure can be avoided. US 5,494,712 describes a method of applying a polymer layer to a substrate to reduce its wetting by water. The layer preferably comprises one or several organic cerium compounds, such as lanthanum or lanthanum, and the chemical vapor is enhanced by plasma. Phase deposition (PECVD) application of 0 wetness issues is also evident in lithography, especially in immersion lithography. In lithography, in order to fabricate semiconductor components, the mask structure is mapped to the light-sensitive substrate by a projection lens in a reduced size. In order to achieve the high resolution required for this application, an illumination shot with an ultraviolet wavelength range of typically less than 250 nm is used. To increase the resolution and depth of the immersion lithography An immersion fluid, usually distilled water, is disposed between the final optical element of the projection lens and the light-breaking substrate to increase the refractive index. In this arrangement, the last optical component of the projection lens is at least partially wetted by water, and The frequency is increased to use a waterproof immersion lithography and a water-repellent coating. JP2005-268759A is known - an optical element that is disposed on a projection exposure device for immersing lithography, and at least - a surface exposed to the illumination light. A bonding layer comprising a cerium oxide (SiO 2 ) and a fluorine-converted (MgF 2 ) hydride (CaF 2 ) coated with a water-repellent layer containing an amorphous fluoropolymer. JP 11 - 149 812 preferably comprises a fluorocarbon polymer. Waterproof protective layer to reflection increase or reverse (four) low poly I (four) to provide an optical system to prevent ambient moisture immersion. The thickness of the layer is between 丨 nanometer and (1) nanometer to avoid fluorocarbon polymerization of less than 25G nanometer wavelength Excess radiation absorption of the material. EP _5113 A2 is a component comprising a fixing device and a component adhered by adhesive 7 200827766, wherein the component can transmit a laser in the ultraviolet spectral range The adhesive is interposed between the transparent component and the adhesive by ultraviolet processing, and can be adapted to process a spectral range of the adhesive to transmit light, and can be in the spectral range transmitted by the transparent component. A thin layer of useful light X»醤 reflection or absorption of southern ultraviolet light is applied to the adhesive region, and as a result, the adhesive can be protected from ultraviolet radiation in this wavelength range. Water sensitive lens element protection methods can be printed from us. According to 2006/0240365, in this method, a thin UV-resistant layer which absorbs ultraviolet radiation and comprises a metal oxide is produced at an edge region of the surface of the lens. Another protective layer can be applied to the metal oxide. The layer, for example the other layer, may be a polyurethane layer. The two layers are expected to protect the lens element, such as comprising water sensitive calcium fluoride, from dissolution by immersion in the fluid. However, as described above, the waterproof coating can be used not only to prevent the optical surface from being wetted. In addition, a water-repellent coating can be applied to a component, such as to create a position that is essentially a half-pulse and is not evasive. It is advantageous to apply the coating prior to the use of the lens for optical mapping of the projection lens for use, and for any interferometric star. For this measurement, the shadow lens system is placed on the corresponding measuring device, and the immersion fluid is placed between the Lai reading and the projection lens, which is actually experienced by the financial institution! Under the condition of measurement. In most cases, ultrapure water is used as the immersion fluid, and the optical component of the coating device that prevents the loss of pure water is required to have a water-repellent surface to create a convex surface and bend the water upward for half a month. It is important that the perfect joint with the final optical component of the lens facing the measuring device 8 200827766 can be reliably and permanently ensured. A common problem with the use of a water-repellent coating immersed in a system is the projection lens operation that closely contacts the coating, which is expected to be damaged or destroyed. Furthermore, as a result of the ultraviolet radiation, the coating has a water-like property which makes it extremely durable, and the coating can develop waterproof properties. In particular, considering its surface characteristics, the practical application shows that the material used in the construction of the ring with a waterproof surface has changed in the short term, because the effect of increasing its waterproof property is increased during the continuous period of radiation. This system relates to the use of laser radiation of progressively shorter wavelengths such as nanometers and shorter wavelengths. This means that after a brief period of operation, the stable convex water is no longer available for half a month, causing the immersion column between the lens and the meter to break, and the measurement must be interrupted. OBJECT OF THE INVENTION The object of the present invention is to provide an assembly of the type of optical device of the type mentioned in the introduction which provides a water-repellent coating which can maintain its water-repellent properties even under dense and long-lasting ultraviolet radiation. SUMMARY OF THE INVENTION This object can be met by the water-repellent coating comprising at least one UV-resistant layer that absorbs and/or reflects ultraviolet radiation having a wavelength of less than 260 nm. For example, in the device, the waterproof coating comprises only a single UV-resistant, absorbing and/or reflecting layer additionally comprising a water-repellent property, or the UV-resistant absorbing and/or reflecting layer protects another waterproof layer of the coating. Not subject to ultraviolet radiation from the projection lens. 9 200827766 In a preferred embodiment, the component is made of a transparent material in the ultraviolet wavelength range, and the optical component preferably forms an end element of the projection lens. In this case, the optical element is immersed in a fluid to wet at least a portion of the area, and a water-repellent coating in the device is typically applied to the surface of the optical element outside the portion to protect the other portion of the optical element from wetting. It is usually directly adjacent to the wetted portion and the portion is not immersed in the immersion fluid. In a preferred refinement, the water repellent coating is formed on the outer side of the optically clear diameter of the optical element. The optical component, the optically clear diameter, relates to the region through which the radiation is transmitted in a defined manner, that is, the region contributing to the mapping as in the lens example. The optically clear diameter is particularly dictated by the surface area of the lens surface that is bright, while the area other than the diameter has a non-bright, matte and rough surface. Typically, the area within the optically clear diameter is essentially corresponding to the area where the end element of the lens is immersed in the immersed fluid. The inventors have made it clear that even any optical component outside the optically clear diameter may have a negative effect on its optical properties, i.e., the cold resulting from evaporation of the wetting formation. Therefore, in the lens example of the optical element, the wetted region generated by the heat sink which adversely affects the temperature balance of the optical 7L may cause an unintended mapping error. Since the liquid is not lost from the rough surface as it is lost from the surface of the diaphragm, this problem particularly occurs on the matte surface, that is, outside the optically clear diameter. Furthermore, the inventors have made it clear that the ultraviolet light may even cause damage to the waterproof coating on the outside of the clear optical diameter, that is, the result of generating scattered light in the optical element when the projection lens is produced; 200827766 The reason for the anti-UV layer. In this arrangement, the water-repellent coating may comprise only a single anti-ultraviolet water-repellent layer, or preferably one of the ultraviolet-resistant layers by absorbing ultraviolet rays to protect the other waterproof layer from ultraviolet radiation from the inside of the optical element. In a preferred refinement, a reduced reflective coating is applied to the optical component, wherein the water repellent coating is disposed in a non-coated region of the optical component, preferably adjacent to the reduced reflective coating. Typically, the anti-reflective coating is applied to at least the region of the clear optical diameter of a lens; the anti-reflective coating typically comprises alternating layers of alternating low-profile material. The applicant's PCT/EP2〇〇_563〇 describes a preferred embodiment of the anti-reflective coating, and the publication of the results is made up of part of the present application. In a particularly preferred refinement, a water repellent layer is applied to the anti-ultraviolet layer as described above, and a layer of ultraviolet light and absorbing ultraviolet radiation is protected. Hai waterproof layer does not X to UV | read. This method can avoid the degradation of the waterproof layer (related to the contact with water, coating adhesion and filtration behavior). • In the advantageous improvement, the water-repellent layer material is selected from the group consisting of: chromium dioxide (Cr02), Shixi burning, Shixi oxygen burning, fluoride, DLC, waterproof paint and gel K compound, preferably City carbon polymer parts, and iron. One type of coating for light-guided light ray; the iron fertiliser AF is distributed by Cyt〇p. Wei can be = = line processed 'or it can be hot processed (e.g., organically modified alkoxide), or it can be applied by a chemical vapor deposition method. When the above substances are exposed to the ultraviolet rays of the radiation 2 which are common in the lithography, at least when the water is kept in the atmosphere containing oxygen, it is unstable under the length. In this context, the term "long-term stability" refers to the service life of 200827766, usually seven years or less. In addition, exposure to ultraviolet light in the above substances may hinder the adhesion and waterproof properties of the substrate. However, 'provided by Such as nitrogen (n2), a rare gas or a mixture of inert gases to increase the long-term stability of some substances. Another substance suitable for the waterproof layer, including hydrogenated 4-photon 'such as Teflon' acrylic A fiber-resin material, or a fluorine-based resin material of a Shih-ki resin material. CYT0P (manufactured by ASAHI GLASS Co., Ltd.) can also be used as a water-repellent layer. In a preferred improvement, the permeable substance is selected from the group consisting of fluorine. , Calcium (CaF2), Quartz Glass (Si〇2), Red Antimony Oxide (GeG2), in particular, typical lens materials used in fluorinated 4 bow and quartz glass fine lithography - Improved medium nanometer or larger wavelength The radiation (4) can penetrate the UV-resistant layer and must be emitted in the ML chain, that is, the wavelength of the yttrium or the like as used for laser welding, or the wavelength above the micrometer of the pyrometer can thus penetrate the UV-resistant layer. "Better improvement The optical element is designed as a planoconvex lens system, wherein the system comprises a planar - conical mirror feeding member. An optical component formed in this manner is preferably used as an end member for immersing the lithography. In a preferred embodiment, a water repellent coating is provided on the conical lateral surface and/or plane of the conical lens member. In particular, in the case of a conical lateral surface, since the conical lens member is at least partially in contact with the immersion fluid, there is a risk that the immersed fluid will wet the lateral surface of the cone, wherein the wetting may extend from the miscellaneous to the flat. By means of a water-repellent coating, it is possible to avoid wetting and temperature drop of the optical component in this area. In addition or alternatively, it is also known that a waterproof coating is applied to the edge-edge region of the lens, such as a lateral surface, and a 200827766 垓 lens can be attached to a bracket on the edge region; And any immersion in the gap between the sockets. In another advantageous refinement, the front side of the conical lens member of the optical element is immersed in the immersion fluid, resulting in a high resolution and large depth field projection lens numerical aperture and minimum structure mapping. In a highly preferred embodiment of the invention, the optical device comprises an optical measuring device that determines the optical properties of the projection lens, wherein an immersion flow system is placed between the projection lens and the optical measuring device, wherein An essentially semi-monthly water column comprising one of the components of the water repellent coating disposed in the region of the immersed fluid. As explained in the introduction, the water-repellent coating in this example is not intended to prevent water from wetting the component, but is used to produce water that protrudes upwardly for half a month. Including the recording device _optical device does not need to form a knife to be exposed, but can be used as a separate measuring device for characterizing the optical performance of the projection lens during the process of different projection exposure devices. In the advantageous improvement of the present embodiment, the component comprising the water-repellent coating can form part of the outer casing of the measuring device, or a component of the measuring device, the component being connected to the measuring device, the submerged fluid being placed on the component . In another significant improvement, the component comprising the water repellent coating comprises an outer casing ring that is limited to dip the human fluid to prevent the immersion fluid from escaping. Another: Advantageous modified towel, the component containing the waterproof coating is made of precious metal. Of course, other substances can also be used for this. ^If 'the lens to be measured is the lens of the towel, one of which is placed under the lens, the component to be coated can also be made of ceramic glass (zurtz) or used for projection A similar substance in the exposure apparatus was made in 2008. In a preferred embodiment, water, particularly ultrapure water, is provided as an immersion hunger. In addition to water, other immersion fluids such as oil may be used. Even during the operation of the lens, occasional energy measurements must be performed to transmit measurements and the like, such that various measuring devices are therefore placed around the wafer. This female device must present a closed fluid contact between the final optical element of the lens and the measuring device. . Therefore, in this installation, it is also necessary to provide a component that ensures the formation of convex water for half a month during the period of enhanced radiation in the case of actual application. In another preferred embodiment, ultraviolet radiation having a wavelength of less than 260 nm, preferably less than 2 nm, does not penetrate the UV resistant layer. Generally, the ultraviolet radiation wavelength used for immersion in the exposure apparatus is 248 nm or 193 nm due to the available light source. The absorption edge of the UV resistant layer is above the operating wavelength of the exposure apparatus, with the result that a layer applied to the top of the layer and not completely resistant to UV rays and which is water resistant is protected from this radiation. Furthermore, when applied to an optical component, the impermeable layer can also provide protection against ultraviolet radiation during the so-called opposing lens surface, which is subjected to enhanced ultraviolet light during the cleaning process. Radiation to remove any absorbed impurities. In the processing chain in which the optical element is provided, ultraviolet light combustion is provided in various coating, measuring and mounting steps. Since the waterproof layer is provided, the absorbing layer can be applied at a very early point in the processing key. The UV resistant layer preferably comprises from the group consisting of: titanium dioxide (Tl〇2) 'pentaoxide (Ta2〇5), cerium oxide (Hf〇2), zirconium dioxide (Zr〇2), and titanium _ A zirconium mixed oxide which is particularly advantageous for coating a component comprising 14 200827766 quartz glass 'fluorinated #5 or cerium oxide. In particular, titanium and five-rolled (four) joints are highly absorbent under the material used for the anti-ultraviolet layer, and even = stone, = waterproof characteristics, so that the part of the waterproof layer applied to the top of the layer is known If the optical characteristics of the component are not required, the waterproof coating may separately contain the above substances = one
U 層:再者’該上述物質可當作該防水塗層的接合媒介，也 就疋傭水輕著至這些物㈣較其黏著至該組件基板為 佳。具有不小於1之光學密度，_於抗料線層的另外 金屬軋化物係為如氧切或三氧化二鉻。應了解上述物質 混合物亦可用於形成抗紫外線層。 另-較佳實施例中’該抗紫外、_則出厚度至少為· 奈米。有了該厚度，大多數該吸收物f，係可確保紫外線 輻射不會穿透該魏層。細，為了防止該層分離，該吸 收層厚度不應太厚。五氧倾及二氧化鈦當作層物質的例 子中，不應超過1微米的最大層厚度。 另-具優勢實施例中，該抗紫外線層係為—貴金屬層。 廣泛嘗試係顯示如包含金，銥，#，m鍊， 姥，釕，銀，钻，銅或其合金的責金屬塗層，甚至於擴展 及加強輻射之後仍可維持其防水表面特性。 亦有非常抵抗性之防水塗層的第二解，係包含使用化 學元素週期系統中之第三至第七族的金屬層，如絡，钥， 鎢’飢’銳’鈕’鈦’錯’給，銃，紀，鐘，銘及其合金。 應了解，亦可使用如砍(Si)，具有不小於1之光學密度的其 15 200827766 他金屬。 當使用如本發明的貴金屬或金屬層時，係顯示短波長 雷射輪射為基礎的所述嚴峻情況下，從該塗層發出之物質 形成該浸入流體無污染的現象。 、實際應用時，係顯示包含亦已知為黑鉻之氧化絡的一 塗層特別適合。黑鉻係為包含二氧化鉻及金屬鉻的一化合 物，且足以用於微影應用，特別是#該塗層安置於浸入流 體中時，呈縣露於紫外線輻射下的持續能力。 二再者，係顯示10及勘奈米，較佳15及觸奈米間 之抗紫外線貴金屬或金屬層的層厚度特別有利。 、較佳是，該抗料線層及/或雜水層係#由選自包含 以下之群組來施加··濺射，物理汽相沉積(PVD)，化學汽相 /儿積(CVD) ’電聚加強化學汽相沉積(pECVD)，冷喷塗，旋 轉塗佈，電漿喷塗，浸沾式塗佈及人工塗佈，特別是使用 刷子或海、纟帛的施加。亦已知為陰極濺射的濺射，係為層的 f殿方法，可財常_層厚度達成將被施加之該層的高 ⑽質U連續提及的方法係有關藉由汽相沉積於將被 塗佈基板上來塗佈基板的技術。冷喷塗例中，係以非常高 速施加塗佈物質至粉狀基本物質。旋轉塗佈射，係施加 或方疋轉薄及同貝層於一旋轉基板上。電漿喷塗例中，係添 加粉末至噴射式電漿，該粉末係因高電漿溫度而融化，且 以该喷射式電漿投入將被塗佈的工作件。浸沾式塗佈可均 勻地施力4塗佈。隶後’使用刷子或海綿的施力口係提供人 工塗佈的選擇。 16 200827766 ,進一步以包含：一照明系統，一投影透鏡及上述一光 學裝置之浸人郷的投影曝光裝置來實施本㈣。該光學 裝置可包含當作具有—防水塗層之該投影透鏡—端元件的 一光學元件，及/或其可包含為了製造本質上半月水柱，包 含一防水塗層的一組件。 本發明以下說明實施例係說明本發明進一步特性及優 ”、、占圖式顯示本發明及申請專利範圍脈絡中很明顯的細 節。可以本發明變異中㈣可組合本質上侧或若干一起實 施個別特性。 、 【實施方式】 第la，b圖顯示包含石英玻璃(Si〇2)，被設計為平凸透 鏡的-光學元件1，而於—平面2上，係包含—截斷圓錐形 狀的一圓錐透鏡部件3。圓錐透鏡部件3包含具不同孔徑角 度之兩子區域，且包含一面4，其上可施加包含如石英玻璃 或鐵孚龍(無圖式)製成，已知為覆蓋層之一最上層，以提供 不被水降級之保護的一抗反射塗層9。再者，若需要，係可 於該抗反射塗層上形成—防水塗層，其中此财，必須選 擇同時可以操倾長之紫外雜射穿透的抗料線塗層。 操作期間’僅部分料線輻射_來貢獻映射，該部分進 入面4，使該面4之紐大約可決定清晰光學直徑。應了解 特別由於使用浸人微影中的光學元件丨，係可不需抗 層9 〇 一防水塗層ό，7(第lb圖式)係施加於鄰接該抗反射塗 17 200827766 層之圓錐透鏡部件3的圓錐侧面5上，其進一步延伸於平 面透鏡表面2上，且其包含由可抗紫外線且可以吸收小於 280奈米波長之紫外線之二氧化鈦製成的一第一層6。可替 代是，第一層6亦可包含其他物質，例如五氧化组(Ta2〇5)， 二氧化铪(HfCb)，二氧化錘(Zr〇2)，或包含鈦_鍅混合氧化 物。除了所示區域外，該透鏡亦可包含一透鏡邊緣，如圓 柱侧面上的一防水塗層。以此法，係可防止任何水浸入透 鏡及承座之間的間隙，該間隙係於光學元件丨裝設時產生。 本光導發光元件例中，一防水第二層7係施加於第一 層6上，该第二層7係包含氟碳聚合物。第二層7並不抗 紫外線輕射，因此可能被進人圓錐透鏡部件3之側面5或 通過，面4的散射光損害。為了倾第二層7不受到散射 光，第-層6係包含大於200奈米，足使紫外線無法穿透 的:厚度。第二層7亦可由若干其他防水及非抗紫外線物 質製成，例如二氧化鉻(Cr〇2)，石夕烧，石夕氧烧，聚合物，如 WR1或鐵孚龍AF，DLC，氟化物或防水漆及膠的氟化聚 合物。第-層6額外可當作第二層7的接合媒介，而針對 此與第二層7相較下具有一晶格結構。 準備光學元件1以裝設於光學裝置中的處理鍵中，係 以早期階段施加防水塗層6，7。第二層7係由第—層6保 護抵抗紫外_射穿透該透鏡，該紫外線輻㈣使用於紫 外線燃燒凸透鏡8 _，如處理鏈中的接續塗佈步驟期間。 二氧化鈦之第―層6係於_絲社透通，使得亦可執 打該處理鏈中，如雷射焊接期間必須以娜透照光學元件！ 18 200827766 的步驟。 用於第二及第一層7，6之層物質的其他適當組合係包 含(括唬中為層厚度）··氳化熒光素(1.0微米)/石夕(200奈米）， 氳化熒光素(1·〇微米)/组(200奈米），氫化熒光素(〇·5微米 二氧化二鉻(50奈米)/鉻(150奈米），氫化熒光素(0.5微米)/ 鶴(100示米)/絡(1〇〇奈米）等。任何這些組合中，係可提供 不小於1的光學密度。 使用化學汽相沉積技術將防水塗層6，7塗佈於光學元 件1。應了解作為此替代，亦可使用如物理汽相沉積(PVD)， 電漿加強化學汽相沉積(PECVD)，冷喷塗，旋轉塗佈，電 漿噴塗’浸沾式塗佈及人:l塗佈，制是使關子或海綿 之施加的其他塗佈技術。 再者，除了使用包含第一層6及第二層7的塗層0，7， 亦可使用具有更多或更少層的塗層。若需要，可施加兩層 以上，且可於第一及第二層6，7之間及/或表面5，2及第 層6之間分別提供另外功能層。該功能層可為一保護層， 改良第一層6及第二層7之間緊密接觸效能的一層，或強 ，機械強度的一層。然而，因為與石英玻璃相較下，如二 氧化鈦或五氧化鈕之一單抗紫外線物質層，係具有較佳防 水特性而可提供若干抗浸濕保護，所以僅施加這些物質亦 足夠。 特別是’該塗層亦可為由貴金屬，如金，銥，鈀，鉑， 汞，鐵’銖，姥，釕，銀，銘，銅或其合金，或化學元素 週期系統中之第三至第七麵金屬，如鉻，.鶴，飢， 19 200827766 ，’组，鈦’錯’給’銳，紀’猛，蛇及其合金製成的抗 紫外線層。已辭這些物質制抗紫外_射，且該塗層 發出的物質不會污染該浸人越。此安置中，可使用僅二 單該層的—塗層，防水層可藉由金屬層或貴金屬層^ 遵紫外線輻射的一塗層。應了解如上述，為了改善黏著， 該塗層亦可包含若干貴金屬或第三至第七絲的金°屬声。U layer: In addition, the above substances can be used as a bonding medium for the waterproof coating, and it is preferable that the water is lightly applied to the substrate (4). There is an optical density of not less than 1, and another metal rolling of the anti-stripping layer is, for example, oxygen cutting or chromium oxide. It should be understood that the above mixture of materials can also be used to form an ultraviolet resistant layer. In another preferred embodiment, the UV resistance is at least nanometer. With this thickness, most of the absorbent f ensures that ultraviolet radiation does not penetrate the weir layer. Fine, in order to prevent separation of the layer, the thickness of the absorbing layer should not be too thick. In the case of penta-oxide and titanium dioxide as a layer material, the maximum layer thickness of 1 μm should not be exceeded. In another advantageous embodiment, the UV resistant layer is a precious metal layer. Extensive attempts have been made to display metal coatings such as gold, tantalum, #, m chain, tantalum, niobium, silver, diamond, copper or alloys thereof, and to maintain their water-repellent surface characteristics even after expansion and enhanced radiation. There is also a second solution to the highly resistant waterproof coating, which consists of metal layers from the third to seventh groups of the chemical elemental periodic system, such as the complex, the key, the tungsten 'hunger' sharp 'button' titanium 'wrong' Give, 铳, 纪, 钟, Ming and its alloys. It should be understood that it is also possible to use a metal such as chopped (Si) having an optical density of not less than one. When the noble metal or metal layer as in the present invention is used, in the severe case based on the display of a short-wavelength laser wheel, the substance emitted from the coating forms a phenomenon in which the immersed fluid is free from contamination. In practical applications, it is particularly suitable to display a coating comprising an oxidized network also known as black chrome. The black chrome is a compound comprising chromium dioxide and metallic chromium and is sufficient for lithographic applications, in particular # this coating is placed in the immersion fluid to provide the continuous ability of the county to be exposed to ultraviolet radiation. Further, it is shown that the layer thickness of the anti-ultraviolet precious metal or metal layer between 10 and Kanai, preferably 15 and between nanometers is particularly advantageous. Preferably, the anti-feed layer and/or the hydrophobic layer # is applied by a group selected from the group consisting of: sputtering, physical vapor deposition (PVD), chemical vapor phase/child (CVD). 'Electrical polymerization enhanced chemical vapor deposition (pECVD), cold spray, spin coating, plasma spray, dip coating and manual coating, especially with the application of a brush or sea or enamel. It is also known as sputtering of cathode sputtering, which is a layered method of the layer, which can be used to achieve the high (10) quality of the layer to be applied. A technique of coating a substrate onto a substrate to be coated. In the case of cold spraying, the coating material is applied to the powdery basic substance at a very high speed. The spin coating is applied or rolled onto a rotating substrate. In the plasma spray application, powder is added to the jet type plasma, which is melted by the high plasma temperature, and the sprayed plasma is put into the workpiece to be coated. The dip coating can be applied uniformly with a force of 4. The use of a brush or sponge to provide a manual coating option. 16 200827766 further implements (4) with a projection exposure apparatus comprising: an illumination system, a projection lens and an impregnation of the above-mentioned optical device. The optical device can comprise an optical component that acts as the projection lens having an -water resistant coating, and/or it can comprise an assembly comprising a water repellent coating for the manufacture of a substantially half moon water column. The following description of the embodiments of the present invention is intended to illustrate further features and advantages of the invention, and the details of the present invention and the scope of the claims. [Embodiment] The first and second figures show an optical element 1 comprising quartz glass (Si〇2) designed as a plano-convex lens, and a cone lens comprising a truncated conical shape on the plane 2 Component 3. The conical lens member 3 comprises two sub-regions having different aperture angles and comprises a side 4 on which a coating such as quartz glass or Teflon (not shown) can be applied, which is known as one of the most cover layers. The upper layer is provided with an anti-reflective coating 9 which is not protected by water degradation. Further, if necessary, a waterproof coating can be formed on the anti-reflective coating, wherein the money must be selected and simultaneously The UV-spray penetrating anti-feed line coating. During operation, only part of the line radiation _ contributes to the mapping, which enters face 4, so that the surface of the face 4 can determine the clear optical diameter. For the use of the optical element in the immersion lithography, the layer 9 (the lb pattern) is applied to the cone of the conical lens component 3 adjacent to the anti-reflective coating 17 200827766 layer. On the side 5, which further extends over the planar lens surface 2, and which comprises a first layer 6 made of titanium dioxide which is resistant to ultraviolet light and which absorbs ultraviolet light having a wavelength of less than 280 nm. Alternatively, the first layer 6 Other substances may also be included, such as a pentoxide group (Ta2〇5), cerium oxide (HfCb), a cerium oxide (Zr〇2), or a titanium-cerium mixed oxide. In addition to the regions shown, the lens is also It may comprise a lens edge, such as a water-repellent coating on the side of the cylinder. In this way, any water is prevented from immersing into the gap between the lens and the socket, which is generated when the optical element is mounted. In the component example, a waterproof second layer 7 is applied to the first layer 6, which comprises a fluorocarbon polymer. The second layer 7 is not resistant to ultraviolet light and may be incorporated into a conical lens component. The side 5 of 3 or the passage of the scattered light of the face 4 is damaged. The second layer 7 is not subjected to scattered light, and the first layer 6 comprises a thickness greater than 200 nm which is insufficient for ultraviolet rays to penetrate. The second layer 7 can also be made of several other waterproof and non-UV resistant materials, for example Chromium dioxide (Cr〇2), Shixi burning, Shixi oxygen burning, polymer, such as WR1 or Teflon AF, DLC, fluoride or waterproof paint and glue fluorinated polymer. As the bonding medium of the second layer 7, there is a lattice structure for the second layer 7. The optical element 1 is prepared to be disposed in the processing key in the optical device, and the waterproof coating is applied at an early stage. Layers 6, 7. The second layer 7 is protected by the first layer 6 against ultraviolet rays, which are used in the ultraviolet burning convex lens 8_, as in the subsequent coating step in the processing chain. The first layer 6 of titanium dioxide is permeable to the wire, so that it can also be used in the processing chain. For example, during the laser welding, it is necessary to use the optical components! 18 Steps for 200827766. Other suitable combinations for the layers of the second and first layers 7, 6 include (layer thickness in the middle of the crucible) · deuterated fluorescein (1.0 micron) / stone eve (200 nm), deuterated fluorescence Prime (1·〇micron)/group (200 nm), hydrogenated fluorescein (〇·5 μm chromium dioxide (50 nm)/chromium (150 nm), hydrogenated fluorescein (0.5 μm) / crane ( 100 meters) / network (1 nanometer), etc. In any of these combinations, an optical density of not less than 1 can be provided. The water-repellent coating 6, 7 is applied to the optical element 1 using a chemical vapor deposition technique. It should be understood that as an alternative, it is also possible to use, for example, physical vapor deposition (PVD), plasma enhanced chemical vapor deposition (PECVD), cold spray, spin coating, plasma spray coating, and dip coating. Coating, is another coating technique for applying the sponge or sponge. Furthermore, in addition to using the coatings 0, 7 comprising the first layer 6 and the second layer 7, more or fewer layers may be used. a coating layer, if desired, two or more layers may be applied, and an additional functional layer may be provided between the first and second layers 6, 7 and/or between the surfaces 5, 2 and the first layer 6. a protective layer, a layer that improves the intimate contact between the first layer 6 and the second layer 7, or a layer of strong, mechanical strength. However, because it is compared with quartz glass, such as titanium dioxide or a single button of a pentoxide button The ultraviolet material layer has better waterproof properties and provides several anti-wetting protection, so it is sufficient to apply only these substances. In particular, the coating may also be made of a noble metal such as gold, rhodium, palladium, platinum, or mercury. Iron '铢, 姥, 钌, silver, Ming, copper or its alloys, or the third to seventh metal in the periodic system of chemical elements, such as chromium, crane, hunger, 19 200827766 , 'group, titanium 'wrong' The anti-ultraviolet layer made of 'Rui, Ji' fierce, snake and its alloy. These materials have been made to resist UV-ray, and the substance emitted by the coating will not pollute the infusion. In this placement, it can be used. Only two layers of the layer-coating, the water-repellent layer may be a coating of the metal layer or the noble metal layer according to ultraviolet radiation. It should be understood that, as described above, in order to improve adhesion, the coating may also contain some precious metals or third to The seventh gold is the sound of the sound.
ϋ 、如第2圖以製造高度積體半導體組件之晶圓掃描器型 式顯不，驗微影之投影曝絲置1G的曝 係臨時說明光學元件丨的功能。 洛中 投影曝光裝置ίο包含當作光源，具有193奈米操作波 ^的準分子雷射u，其中亦可用如撕奈米的其他操作波 長。下游安置之-照明系統12 ’係可於其既存平面中製造 :匹配下游安置之投影透鏡13遠心要求的-大，銳利定 義’非常均勻照明影像場。 可固定及操縱光罩(無圖式)之裝置14係安置於昭明系 統12後面，使該光罩可置於投影透鏡13的物鏡15中、，且 用於掃描操作時’可以箭頭16標示之運行方向於此平面移 、又衫透鏡13跟隨亦稱為光罩面的平面15之後，係可 : 1或5 : 1或1G : 1度量之縮減度量，將該光罩的 二像映射至施加光阻劑層的晶圓n。可當作光敏感基板 、阳圓17’係被安置使具有該光阻劑層的平面基板平面 ^8 ’本質上可符合投影透鏡13的影像平面19。晶圓η係 猎由包含-掃描驅觸，可與該光罩同步且與該光罩反平 20 200827766 1動晶® π的-裝置2㈣定。裝置料包含機械手， 不4可於平仃投影透鏡13之一光軸2丨平行的z方向，亦 可於垂直該軸的xAy方向移動晶圓17。 々投影透鏡13係包含可當作鄰接影像平面19之端元件 的匕la b的光學π件卜也就是面4可形成投影透鏡u 之最後光干表面’且其以基板表面18以上之—玉作距離安 置’具有-圓錐透鏡部件3的一透通平凸透鏡。水係安置 於面4及基板表面18之間當作浸入流體22，其可增加投影 透鏡13之輸入端上的數值孔徑。因此，當以如水之較小折 射率的媒介來填充光學元件丨及晶圓17之間空隙時，係可 以較大解析度及景深映射該光罩上的結構。 應了解，不僅光學元件被給予可保護該元件不浸濕該 清晰光學直徑的一防水塗層，組件亦被給予該塗層，其中 策劃該防水塗層及該浸人流體之間具有永久接觸，也就是 如第3圖所示之一光學裝置中，必須測量投影透鏡1〇2且 用於浸入系統之半導體微影的投影透鏡丨〇2，係可藉由測量 裝置101安置於小間隙處。最後以穿透投影透鏡102之輻 射傳遞方向安置的光學元件1〇3,係安置於測量裝置1〇1之 上的短間隙處。 提供用於干擾測量，當作一光學組件的一格栅1〇4係 位於測量裝置101中或上。環形之組件1〇5係安置於格栅 104周圍。該環至少於面對格栅1〇4之内部處包含一防水塗 層108。該防水塗層係為一貴金屬層，或藉由濺射施加於該 環表面的金屬層。實施例中，氧化鉻係當作防水金屬塗層。 21 200827766 、· e月u五貝1 〇6方h 非常有抵抗性，而可維持其防水特性。實==卜線輕射 可完全填充最後光學元件103及測量裝置===有 如超純水107之-浸入流體污染的證據。 Η隙’ 例如，透鏡測量可被執行為間斷測量， 月柱形成之後，後者係^、 As shown in Fig. 2, the wafer scanner type for manufacturing highly integrated semiconductor components is not shown, and the exposure of the lithography projection 1G is temporarily explained as the function of the optical component. The Luozhong projection exposure device ίο contains a quasi-molecular laser u as a light source with an operating wavelength of 193 nm, which can also be used for other operating wavelengths such as tear nano. The downstream placement-illumination system 12' can be fabricated in its existing plane: a large, sharply defined 'very uniform illumination image field' that matches the telecentric requirements of the downstream placement projection lens 13. A device 14 that can fix and manipulate the reticle (not shown) is disposed behind the Zhaoming system 12 such that the reticle can be placed in the objective lens 15 of the projection lens 13 and used for scanning operations as indicated by arrow 16. After the direction of travel is shifted in this plane, and after the lens 13 follows the plane 15 also known as the mask surface, it can be: 1 or 5: 1 or 1G: 1 measure reduction metric, mapping the two images of the mask to the application Wafer n of the photoresist layer. It can be placed as a light-sensitive substrate, and the dome 17' is placed so that the planar substrate plane ^8' having the photoresist layer can substantially conform to the image plane 19 of the projection lens 13. The wafer η system is controlled by the inclusion-scanning drive, which can be synchronized with the reticle and is anti-flat with the reticle 20 200827766 1 kinetic® π - device 2 (four). The device material includes a robot, and the wafer 17 can be moved in the z-direction parallel to the optical axis 2丨 of one of the projection lenses 13 or in the xAy direction of the axis. The 々 projection lens 13 comprises an optical π piece which can be regarded as an end element adjacent to the image plane 19, that is, the face 4 can form the last light dry surface of the projection lens u and it is above the substrate surface 18 - jade A through-concave plano-convex lens having a conical lens member 3 is disposed at a distance. The water system is disposed between the face 4 and the substrate surface 18 as an immersion fluid 22 which increases the numerical aperture at the input end of the projection lens 13. Therefore, when the gap between the optical element 丨 and the wafer 17 is filled with a medium having a small refractive index such as water, the structure on the reticle can be mapped with a large resolution and depth of field. It will be appreciated that not only is the optical element imparted with a water repellent coating that protects the element from wetting the clear optical diameter, but the component is also given a coating wherein the waterproof coating and the infiltrating fluid are planned to have permanent contact, That is, in an optical device as shown in Fig. 3, the projection lens 丨〇2, which must measure the projection lens 1 〇 2 and is used to immerse the semiconductor lithography of the system, can be placed at a small gap by the measuring device 101. Finally, the optical element 1〇3 disposed in the radiation transmission direction penetrating the projection lens 102 is disposed at a short gap above the measuring device 1〇1. A grid 1 〇 4 is provided for interference measurement, as an optical component, in or on the measuring device 101. The annular assembly 1〇5 is placed around the grille 104. The ring includes a waterproof coating 108 at least at the interior facing the grid 1〇4. The water repellent coating is a noble metal layer or a metal layer applied to the surface of the ring by sputtering. In the examples, chromium oxide is used as a waterproof metal coating. 21 200827766 , · e月 u five shells 1 〇 6 square h is very resistant, and can maintain its waterproof properties. Real == Line light shot The final optical element 103 and measuring device can be completely filled === There is evidence of immersion in fluid contamination such as ultrapure water 107. Η gap' For example, lens measurement can be performed as an intermittent measurement, after the formation of the moon column, the latter is ^
於2〇度：駿。錢峡财，聰財 然而，除了間斷方法，亦可以如每分 連續汲取水通過該間隙。此例中，係形成一= 大致而曰，測1期間係具有與測量裝置⑽約2至4 公厘，較佳3公厘的工作距離。 、、除了當作組件105之該環内部的防水塗層，或除了上 述之外’亦可提供該防水塗層於面對投影透鏡嫩的測量 破置101外”又頂部，或格栅ι〇4周圍，放置於測量裝置 頂部的一板件。 一再者，亦可將第3圖所示之測量裝置用於如第2圖所 不之投影曝光裝置巾。此射，第2圖之投影曝絲置1〇 中之投影透鏡13的最後光學元件〗及測量裝置1〇1之間間 隙係填充水，且與包含該防水塗層之上述組件1〇5 一起用 來形成一半月水柱。此例中，係形成一光學裝置，其中光 學兀件1及組件105均分別包含抗紫外線防水塗層6，7及 108 〇 22 200827766 —已舉例做上述較佳實施例的說明。熟練技術人士從給 僅了解本發明及其附帶優點，亦可發現揭示結構 種顯著改變及修改。因此，中請人尋求涵蓋附 的所圍及其同等物軟義，本發明精神及範圍内 亇有"亥改變及修改。At 2 degrees: Jun. Qian Xiacai, Congcai However, in addition to the intermittent method, it is also possible to continuously draw water through the gap as every minute. In this example, a = roughly 曰 is formed, and the measurement period has a working distance of about 2 to 4 mm, preferably 3 mm, to the measuring device (10). In addition to the waterproof coating on the inside of the ring as the component 105, or in addition to the above, the waterproof coating may be provided on the top of the measuring lens facing the projection lens 101, and the top, or the grid 〇 4, a plate placed on the top of the measuring device. Again, the measuring device shown in Fig. 3 can also be used for the projection exposure device as shown in Fig. 2. This shot, the projection exposure of Fig. 2 The gap between the last optical element of the projection lens 13 and the measuring device 1〇1 in the wire is filled with water, and is used together with the above-described assembly 1〇5 containing the waterproof coating to form a half moon water column. In the middle, an optical device is formed, wherein the optical element 1 and the assembly 105 respectively comprise an anti-ultraviolet waterproof coating 6, 7 and 108 〇 22 200827766 - the description of the preferred embodiment has been exemplified. In order to understand the present invention and its attendant advantages, it is also obvious that the disclosed structure is significantly changed and modified. Therefore, the applicant seeks to cover the surrounding and its equivalents, and the spirit and scope of the present invention are modify.
23 200827766 【圖式簡單說明】 實施例係於圖式中顯示且於以下說明中解釋。顯示下列： 第la，b圖’具有一防水塗層之一光學元件圖式⑻透視 圖，及(b)橫斷面圖； 第2圖，用於微影的投影曝光裝置實施例圖式，包含如 第la，b圖當23 200827766 [Simple Description of the Drawings] The embodiments are shown in the drawings and are explained in the following description. The following are shown: Figure la, b, 'a perspective view of an optical component having a waterproof coating (8), and (b) a cross-sectional view; FIG. 2, an embodiment of a projection exposure apparatus for lithography, Contains diagrams such as the first la, b
作一投影透鏡之一端元件的—光學元件；及 第3圖’可用於測量-投影透鏡之光學裝置實施例圖式。 ϋ 【主要元件符號說明】 卜103 光學元件 2 平面 3 圓錐透鏡部件 4 面 5 圓錐側面 6、7、108 防水塗層 8 凸透鏡 9 抗反射塗層 10 投影曝光裝置 II 準分子雷射 12 照明系統 13、102 投影透鏡 15 物鏡 16、106 箭頭 17 晶圓 18 平面基板平面 19 衫像平面 20 裝置 21 光軸 22 浸入流體 ΙΟΙ 测量裝置 104 格柵 105 組件 107 超純水 14 可固定及操縱光罩之裝置 24An optical element that serves as an end element of a projection lens; and Fig. 3' can be used to measure the optical device embodiment of the projection lens. ϋ [Description of main component symbols] Bu 103 Optical components 2 Planar 3 Conical lens parts 4 Face 5 Conical side 6, 7, 108 Waterproof coating 8 Convex lens 9 Anti-reflective coating 10 Projection exposure device II Excimer laser 12 Lighting system 13 102 Projection lens 15 Objective lens 16, 106 Arrow 17 Wafer 18 Planar substrate plane 19 Shirt image plane 20 Device 21 Optical axis 22 Immersed in fluid ΙΟΙ Measuring device 104 Grille 105 Component 107 Ultrapure water 14 Device for fixing and manipulating the reticle twenty four