TW200819915A - Photosensitive composition, image recording material including the composition, and method for producing lithographic printing plate - Google Patents

Photosensitive composition, image recording material including the composition, and method for producing lithographic printing plate Download PDF

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TW200819915A
TW200819915A TW096132681A TW96132681A TW200819915A TW 200819915 A TW200819915 A TW 200819915A TW 096132681 A TW096132681 A TW 096132681A TW 96132681 A TW96132681 A TW 96132681A TW 200819915 A TW200819915 A TW 200819915A
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Taiwan
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group
substituent
acid
compound
photosensitive layer
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TW096132681A
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Chinese (zh)
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Yohei Ishiji
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Fujifilm Corp
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03GELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/02Charge-receiving layers
    • G03G5/04Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
    • G03G5/06Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being organic
    • G03G5/0622Heterocyclic compounds
    • G03G5/0644Heterocyclic compounds containing two or more hetero rings
    • G03G5/0646Heterocyclic compounds containing two or more hetero rings in the same ring system
    • G03G5/0648Heterocyclic compounds containing two or more hetero rings in the same ring system containing two relevant rings
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03GELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/02Charge-receiving layers
    • G03G5/04Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
    • G03G5/05Organic bonding materials; Methods for coating a substrate with a photoconductive layer; Inert supplements for use in photoconductive layers
    • G03G5/0525Coating methods

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

This invention provides a photosensitive composition, an image recording material thereof, and a method for manufacturing a planographic printing plate, wherein the photosensitive composition has high sensitivity to oscillation wavelength of the shorter wavelength semiconductor laser and has excellent stability for storage. The photosensitive composition comprises (A) a diimidazole compound, (B) a photosensitive dye having absorption for λ max at wavelength of 350 nm - 850 nm, and (C) polymeric compounds.

Description

200819915 九、發明說明: 【發明所屬之技術領域】 本發明係有關於一種平版印刷版之製法。特別是有關 於一種使用顯像液處理平版印刷版原版之平版印刷版的感 光性組成物、及使用其之影像記錄材料、影像記錄方法、 平版印刷版及其製法,該感光性組成物對短波長半導體雷 射具有高敏感度、保存安定性亦優良且安全光適合性亦優 良。 【先前技術】 先前,平版印刷版原版係廣泛地被使用於p s版,該p S 版具有在親水性支撐體上設置親油性的感光性樹脂層而成 之結構,其製版方法通常係透過高反差感光片(lith film) 進行光罩曝光(面曝光)後,藉由溶解除去非影像部而得到 需要的印刷版。 近年來,使用電腦來電子式處理、積蓄、輸出影像資訊 之數位化技術廣泛地普及,各種對應的新影像輸出方式已 實用化。結果期待一種能夠藉由將如雷射光之指向性高的 光線依照數位化而成的影像資訊進行掃描,不必透過高反 差感光片而能夠直接製造印刷版之電腦直接製版 (Computer To Plate ; CTP)技術,而且如何得到適應該技術 之印刷版原版成爲重要的課題。 得到此種能夠掃描曝光的平版印刷版之方式之一,能 夠採用在具有親水性表面之支撐體上,形成印墨接受性的 樹脂層區域之方式。有提案揭示一種結構,且亦有已經實 200819915 用化之物,係一種在支撐體上設置負型感光層用以 描曝光產生硬化而形成印墨接受性區域而成之材料 使用感光速度優良的光聚合性組成物。此種結構的 刷版原版之顯像處理簡便,而且具有解像度、著肉 刷性、及耐污染性優良之良好的刷版、及印刷性能 前述光聚合性組成物係基本上含有具有乙烯性 鍵之聚合性化合物、光聚合引發劑、及按照需要之 樹脂,藉由掃描曝光,光引發系吸收光線,生成活 基等活性種而產生聚合性化合物的聚合反應,,來使 域硬化而形成影像。 在此種能夠掃描曝光之光聚合性組成物,有揭 感光性優良的光引發系(例如參照專利文獻1、2)。 記載之光引發系,應用於曝光光源係使用如 Ar雷 奈米)或FD-YAG雷射(5 3 2奈米)之長波長的可見光 前的CTP系統時,現狀係光源的輸出不充分而無法 分的敏感度,希望有能夠適合更高速曝光之高敏感 發係。 另一方面,近年來,例如使用InGaN系的材料, 奈米至450奈米區域能夠連續振蕩之半導體雷射已 用階段。使用此等短波光之掃描曝光系統因爲半導 在結構上能夠價廉地製造,所以具有可構築充分的 具經濟性的系統之優點。而且與使用先前FD-YAG 雷射之系統比較時,能夠使用可在更明亮的安全 業、且在短波長具有感光性之平版印刷版原版。但 藉由掃 ,其中 平版印 性、耐 〇 不飽和 黏合劑 性自由 曝光區 示各種 此等所 射(488 源之先 得到充 度的引 在3 50 達到實 體雷射 輸出但 、或Ar 光下作 是在此 200819915 如3 5 0奈米至4 5 0奈米的短波長區域對掃描曝光具有充分 的敏感度之光引發系現狀並不知道。 鑒於上述情形,雖然本案申請人前已提案(例如參照專 利文獻1)揭示在該短波長區域之含有敏化色料的感光性組 成物,但希望此等包含敏化色料之光引發系能夠更加高敏 感度化。 而且,例如,如非專利文獻3及4所記載,得到敏感 度高的光引發系在廣闊的影像領域仍然是被渴望的技術。 由敏化色料及引發劑所構成的光引發系,藉由選擇引發劑 除了能夠產生上述活性自由基以外,亦能夠產生酸、鹼, 例如能夠利用在光造形、全息照像術、彩色硬複製等影像 形成、或光阻等電子材料製造領域、印墨或塗料、黏著劑 等光固化樹脂材料用途。在此等產業領域,爲了有效率地 使引發劑產生分解,渴望能夠發現一種光吸收性、敏化性 能優良之敏化色料。 具有由此等光聚合性組成物所構成的感光層之平版印 刷版原版’具有高敏感度、及時保存性優良係重要的。而 且’近年來,使感光層中的成分在顯像處理步驟不會析出 (無顯像氣體)變爲重要,除了先前的鹼顯像(pH爲10〜14) 以外,亦有提案揭示使用pH爲2至1 0的顯像液處理之製 版方法。亦即,不只是平版印刷版原版的高敏感度及保存 安定性、亦有良好顯像性之課題,而要求新的技術。 [專利文獻1]特開平2004-3 09977號公報 [非專利文獻 1 ] B r u e e Μ · Μ ο n r 〇 e等人著,化學硏討 200819915 (Chemical Reviews)、93、43 5 ( 1 9 9 3 年) [非專利文獻2] R· S. Davidson著,光化學及生物學A期 刊:化學(J 〇 u r n a 1 〇 f P h 〇 t 〇 c h e m i s t r y a n d B i ο 1 〇 g y A : Chemistry)、73、81(1993 年) [非專利文獻3] P. Faussier著,光引發聚合物原理及應 用(Photoinitiated Polymerization-Theory and Applica tions )、Rapra Review vol.9、Report P a p r a Technology (1 9 9 8 年) [非專利文獻 4] Μ. Tsunooka 等人著’ Prog. Polym. Sci.、_ 21 、 1(1996 年) 【發明内容】 [發明所欲解決之課題] 本發明的目的係提供一種平版印刷用感光性組成物、 使用該組成物之影像記錄材料、影像記錄方法、平版印刷 版、及平版印刷版之製法,該平版印刷用感光性組成物特 別是對價廉的短波長半導體雷射之3 5 0奈米〜45 0奈米的振 蕩波長具有高敏感度,例如使用於適合CPT系統之掃描曝 光用的平版印刷版原版,具有優良的作業性、顯像性(無顯 像氣體)。 [解決課題之手段] 本案發明者爲了達成上述目的,經重複專心硏討的結 果,發現含有具有通式(I)所示之特定結構的二咪唑型化合 物之新穎光引發系能夠賦予高敏感度,特別是在3 5 0奈米 至4 5 0奈米附近具有高敏感度、且顯像性亦優良,而完成 200819915 了本發明。 亦即,本發明係如下述。 Π] —種感光性組成物,含有(A)具有下述式(I)所示結構之 二咪唑型化合物、(B)在350奈米〜850奈米具有吸收極大波 長λ m a X之敏化色料、及(C )聚合性化合物,200819915 IX. DESCRIPTION OF THE INVENTION: TECHNICAL FIELD OF THE INVENTION The present invention relates to a method of making a lithographic printing plate. In particular, there is a photosensitive composition for treating a lithographic printing plate of a lithographic printing plate precursor using a developing solution, an image recording material using the same, an image recording method, a lithographic printing plate, and a method for producing the same, which are short for the photosensitive composition The wavelength semiconductor laser has high sensitivity, excellent storage stability, and excellent safety light suitability. [Prior Art] Previously, lithographic printing plate precursors have been widely used in the ps plate, which has a structure in which a lipophilic photosensitive resin layer is provided on a hydrophilic support, and the plate making method is usually high in transmission. Contrast lith film After reticle exposure (surface exposure), a desired printing plate is obtained by dissolving and removing the non-image portion. In recent years, digital technology that uses computers to electronically process, accumulate, and output image information has been widely used, and various corresponding new image output methods have been put into practical use. As a result, it is expected that a computer-to-plate (CTP) technology capable of directly producing a printing plate by scanning digital information such as laser light with high directivity can be directly scanned without using a high-contrast photosensitive film. And how to get the original version of the printing plate adapted to this technology has become an important issue. One of the ways of obtaining such a lithographic printing plate capable of scanning exposure can be a method of forming an ink receptive resin layer region on a support having a hydrophilic surface. There is a proposal to reveal a structure, and there is also a material that has been used in 200819915. It is a material in which a negative photosensitive layer is provided on a support to describe the hardening to form an ink receiving region, and the photosensitive speed is excellent. Photopolymerizable composition. The brush-type original plate of such a structure is easy to develop, and has excellent resolution, good brushing property, and good stain resistance. The photopolymerizable composition basically contains an ethylenic bond. The polymerizable compound, the photopolymerization initiator, and the resin as needed are subjected to scanning exposure, and the photoinitiator absorbs light, generates an active species such as a living group, and generates a polymerization reaction of the polymerizable compound, thereby hardening the domain to form an image. . In such a photopolymerizable composition capable of scanning and exposing, a photoinitiator having excellent photosensitivity is disclosed (see, for example, Patent Documents 1 and 2). The light-inducing system described is applied to a CTP system before long-wavelength visible light using an extended light source such as Ar Reynolds or FD-YAG laser (53 2 nm), and the output of the current light source is insufficient. Unsensible sensitivity, I hope to have a highly sensitive hairline that can be adapted for higher speed exposure. On the other hand, in recent years, for example, an InGaN-based material has been used, and a semiconductor laser which can continuously oscillate in a region of nanometer to 450 nm has been used. A scanning exposure system using such short-wave light has the advantage of being able to construct a sufficiently economical system because the semiconductor structure can be manufactured inexpensively. Moreover, when compared with a system using the previous FD-YAG laser, it is possible to use a lithographic printing plate precursor which is photosensitive in a brighter safety industry and which is photosensitive at a short wavelength. However, by sweeping, the lithographic and anti-saturated adhesive free exposure areas show various such shots (the 488 source is first obtained with a charge at 3 50 to reach the solid laser output, or under Ar light. It is not known at this time that the light-inducing system with sufficient sensitivity to scanning exposure in the short-wavelength region of 305 nm to 450 nm is not known in this case. In view of the above situation, although the applicant of the case has previously proposed (for example Referring to Patent Document 1), a photosensitive composition containing a sensitizing colorant in the short-wavelength region is disclosed, but it is desirable that such a photoinitiator containing a sensitizing colorant can be more highly sensitive. Moreover, for example, a non-patent As described in documents 3 and 4, it is still a desirable technique to obtain a highly sensitive photoinitiator in a wide field of imaging. A photoinitiator consisting of a sensitizing colorant and an initiator can be produced by selecting an initiator. In addition to active radicals, acids and bases can also be produced. For example, it can be used in the field of electronic materials such as image formation, holographic imaging, color hard copying, or optical resistance. Use of photocurable resin materials such as inks, paints, and adhesives. In these industrial fields, in order to efficiently decompose the initiator, it is desired to find a sensitizing colorant having excellent light absorption and sensitization properties. The lithographic printing plate precursor of the photosensitive layer composed of the photopolymerizable composition is excellent in high sensitivity and excellent in preservability, and in recent years, the components in the photosensitive layer are not subjected to the development processing step. Precipitation (no imaging gas) becomes important. In addition to the previous alkali imaging (pH 10 to 14), there are also proposals to disclose a plate making method using a developing solution having a pH of 2 to 10. That is, no It is only a subject of high sensitivity, preservation stability, and good development of the lithographic printing plate, and a new technology is required. [Patent Document 1] JP-A-2004-3 09977 [Non-Patent Document 1] B ruee Μ · Μ ο nr 〇e et al., Chemical Begging 200819915 (Chemical Reviews), 93, 43 5 (19 9 3) [Non-Patent Document 2] R. S. Davidson, Photochemistry and Biology A Journal: Chemistry (J 〇urna 1 〇f P h 〇t 〇 chemistry and B i ο 1 〇 gy A : Chemistry), 73, 81 (1993) [Non-Patent Document 3] P. Faussier, Principle and Application of Photoinitiated Polymers (Photoinitiated Polymerization-Theory And Applica tions), Rapra Review vol.9, Report P apra Technology (19 9 8) [Non-Patent Document 4] Μ. Tsunooka et al. 'Prog. Polym. Sci., _ 21, 1 (1996) [Problem to be Solved by the Invention] An object of the present invention is to provide a photosensitive composition for lithography, an image recording material using the composition, an image recording method, a lithographic printing plate, and a lithographic printing plate. The photosensitive composition for lithography has high sensitivity especially for an oscillation wavelength of 350 nm to 45 nm of an inexpensive short-wavelength semiconductor laser, for example, for scanning exposure suitable for a CPT system. The original version of the lithographic printing plate has excellent workability and development (no imaging gas). [Means for Solving the Problem] In order to achieve the above object, the inventors of the present invention have found that a novel photoinitiator containing a diimidazole type compound having a specific structure represented by the general formula (I) can impart high sensitivity by repeating the results of intensive discussion. In particular, it has high sensitivity and excellent imaging properties in the vicinity of 305 nm to 450 nm, and the present invention was completed in 200819915. That is, the present invention is as follows.感光] a photosensitive composition comprising (A) a diimidazole-type compound having a structure represented by the following formula (I), and (B) having a sensitization of an absorption maximum wavelength λ ma X at 350 nm to 850 nm Colorant, and (C) polymerizable compound,

(通式(I)中,Ri〜R6係表示可具有取代基之芳_、可具有取 代基之雜芳基中之任一者,R!〜R6中至少2個係具有選自 COOR7 基、SO3R8 基、PO3R9 基、OH 基、及 OCORio 基之 取代基之芳基或雜芳基,R7〜R1G係各自獨立地表示非氫原 子之一價的原子團)。 [2]如[1]之感光性組成物,其中該敏化色料(B)係選自香豆 素色料、苯乙烯基色料、花青苷色料、及部花青色料。 [3 ] —種影像記錄材料,係在支撐體上,具有含有如[1 ]或 [2]之感光性組成物之感光層。 [4 ] 一種影像記錄方法,係使用比4 5 0奈米更短波長的雷 射光源,對在支撐體上具有含有如[1 ]至[3 ]中任一項感光性 組成物之感光層之影像記錄材料進行掃描曝光。 [5 ] —種平版印刷版’係在支撐體上,具有含有如[1 ]或[2 ] 之感光性組成物之感光層。 [6] —種平版印刷版之製法,其特徵係包含以下步驟:將 200819915 依照以下順序具有支撐體、感光層、及保護層之平版印刷 版原版,在波長爲3 5 0〜4 5 0奈米的雷射曝光後,在pH爲 10〜14的顯像液之存在下,除去保護層及非曝光部的感光 層;其中該感光層含有(A)具有下述式⑴所示結構之二咪唑 型化合物、(B)在350奈米〜850奈米具有吸收極大波長λ max 之敏化色料、(C)聚合性化合物、及(D-1)鹼可溶性黏合劑 聚合物,(In the formula (I), Ri to R6 represent any one of a aryl group which may have a substituent, and a heteroaryl group which may have a substituent, and at least two of R! to R6 have a group selected from a COOR7 group, An aryl or heteroaryl group of a substituent of a SO3R8 group, a PO3R9 group, an OH group, and an OCORio group, and R7 to R1G each independently represent a valence group of a non-hydrogen atom). [2] The photosensitive composition according to [1], wherein the sensitizing colorant (B) is selected from the group consisting of a coumarin coloring material, a styrene-based coloring material, an anthocyanin coloring material, and a merocyanine coloring material. [3] An image recording material which is provided on a support and which has a photosensitive layer containing a photosensitive composition such as [1] or [2]. [4] An image recording method using a laser light source having a wavelength shorter than 405 nm to have a photosensitive layer containing a photosensitive composition such as any one of [1] to [3] on a support The image recording material is scanned and exposed. [5] A lithographic printing plate is attached to a support and has a photosensitive layer containing a photosensitive composition such as [1] or [2]. [6] A method for producing a lithographic printing plate, characterized in that the method comprises the following steps: the lithographic printing plate precursor having a support, a photosensitive layer and a protective layer in the following order according to the following sequence, at a wavelength of 3 5 0 to 4 50 After the laser exposure of the meter, the photosensitive layer of the protective layer and the non-exposed portion is removed in the presence of a developing solution having a pH of 10 to 14; wherein the photosensitive layer contains (A) a structure having the structure represented by the following formula (1) An imidazole-type compound, (B) a sensitized colorant having a maximum absorption wavelength λ max of from 350 nm to 850 nm, (C) a polymerizable compound, and (D-1) an alkali-soluble binder polymer,

(通式(I)中,Ri〜R6係表示可具有取代基之芳基、可具有取 代基之雜芳基中之任一者,R^〜R6中至少2個係具有選自 COOR7 基、S03R8 基、PO3R9 基、OH 基、及 OCOR10 基之 取代基之芳基或雜芳基,R7〜Rio係各自獨立地表示非氫原 子之一價的原子團)。 v [7] 一種平版印刷版之製法,其特徵係包含以下步驟:將 依照以下順序具有支撐體、感光層、及保護層之平版印刷 版原版,在波長爲3 5 0〜450奈米的雷射曝光後,在pH爲 2〜10的顯像液之存在下,除去保護層及非曝光部的感光 層;其中該感光層含有(A)具有下述式(I)所示結構之二咪唑 型化合物、(B)在3 50奈米〜8 50奈米具有吸收極大波長λ max 之敏化色料、(C)聚合性化合物、及(D-2)酸價爲0.3meq/g 以下之疏水性黏合劑聚合物, -10- 200819915(In the formula (I), Ri to R6 represent any one of an aryl group which may have a substituent and a heteroaryl group which may have a substituent, and at least two of R^ to R6 have a group selected from a COOR7 group. An aryl or heteroaryl group of a substituent of a S03R8 group, a PO3R9 group, an OH group, and an OCOR10 group, and R7 to Rio each independently represent a valence group of a non-hydrogen atom). v [7] A method for producing a lithographic printing plate, characterized in that it comprises the following steps: a lithographic printing plate precursor having a support, a photosensitive layer, and a protective layer in the following order, at a wavelength of 3,500 to 450 nm After exposure, the photosensitive layer of the protective layer and the non-exposed portion is removed in the presence of a developing solution having a pH of 2 to 10; wherein the photosensitive layer contains (A) a diimidazole having a structure represented by the following formula (I) a compound of the type (B) having a sensitizing colorant having an absorption maximum wavelength λ max of from 3 50 nm to 8 50 nm, (C) a polymerizable compound, and (D-2) an acid value of 0.3 meq/g or less Hydrophobic Adhesive Polymer, -10- 200819915

(通式(I)中,係表示可具有取代基之芳基、可具有取 代基之雜芳基中之任一者,中至少2個係具有選自 COOR7 基、S03R8 基、P03R9 基、〇H 基、及 OCOR10 基之 取代基之芳基或雜芳基,R7〜R!o係各自獨立地表示非氫原 子之一價的原子團)。 本發明之作用機構並不明確,前述通式(1)所示之二咪 唑型化合物對於與在3 5 〇奈米〜8 5 0奈米具有吸收極大波長 λ max、特別是在3 5 0奈米〜450奈米具有吸收極大波長λ max 之敏化色料組合時具有高敏感度。這是因爲該敏化色料對 價廉的短波長半導體雷射之振蕩波長的照射(曝光)具高敏 感度而呈電子激發狀態,藉由該光吸收,與電子激發狀態 有關的電子移動、能量移動、發熱等對通式⑴所示之二咪 唑型化合物產生作用,而使其發生化學變化而生成自由 基、酸或鹼。而且,在此所生成的自由基、酸或鹼中之至 少1種能夠使反應之聚合性化合物產生發色、消色、聚合 等不可逆的變化。此種化合物之中,較佳是使用具有乙烯 性不飽和雙鍵之加成聚合性化合物,來引發硬化反應、進 行、並使曝光區域硬化。因此,藉由使用本發明的感光性 組成物,具有對短波長半導體雷射之掃描曝光具有充分的 敏感度、且在黃燈下的安全性優良、以及亦能夠在明亮的 -11- 200819915 安全光下處理之優點。因此,認爲使用在該感光性組成物 含有加成聚合性化合物之物作爲感光層而成之平版印刷版 原版,停能夠高敏感度地記錄、且顯示安全光安定性優良 之印刷性能之物。 又,得知本發明之感光性組成物(含有具有特定結構之 二咪唑型化合物),其顯像性優良。認爲其重要因素係因爲 在敏化色料結構附近具有親水性取代基(OH、OCOR、COOR 等),鹼顯像液當然不用說,因爲在弱酸性區域之水溶液中 亦能夠保持高溶解量,所以能夠抑制色料析出、氣體的生 成,並帶來提升顯像性之影響。 [發明之效果] 依照本發明之平版印刷版,對價廉的短波長之3 5 0奈 米至45 0奈米的振蕩波長,.特別具有高敏感度、且保存安 定性亦優良,例如能夠提供適合CPT系統之掃描曝光用之 作-業性^^顯像^度·優良-之_平叛_印_刷版原__版^---------------------- 【實施方式】 以下,詳細地說明本發明。 本發明之感光性組成物其特徵係含有下述(A)〜(C)成 分, (A) 具有通式(I)所示結構之二咪唑型化合物, (B) 在350奈米〜850奈米具有吸收極大波長λ max之敏化色 料,及 (C) 聚合性化合物。 又,本發明之較佳平版印刷版原版依照以下順序具有 -12- 200819915 支撐體、感光層(含有(A)具有下述式(I)所示結構之二咪唑 型化合物、(B)在3 5 0奈米〜850奈米具有吸收極大波長λ ma> 之敏化色料、(C)聚合性化合物、及(D)鹼可溶性黏合劑聚 合物、或酸價爲0.3 meq/g以下之疏水性黏合劑聚合物)、 及保護層。 以下詳細地說明本發明的感光性組成物所含有的各成 分。 (A)具有下述式(I)所示結構之二咪唑型化合物,(In the formula (I), it represents any one of an aryl group which may have a substituent and a heteroaryl group which may have a substituent, and at least two of them have a group selected from a COOR7 group, a S03R8 group, a P03R9 group, and a fluorene group. The H group and the aryl or heteroaryl group of the substituent of the OCOR10 group, and R7 to R!o each independently represent a valence group of a non-hydrogen atom). The mechanism of action of the present invention is not clear, and the diimidazole-type compound represented by the above formula (1) has an absorption maximum wavelength λ max with respect to 3 5 〇 nm to 850 nm, particularly at 3 50 Meters ~450 nm have high sensitivity when combined with sensitized colorants that absorb the maximum wavelength λ max . This is because the sensitized colorant has an electron-excited state with high sensitivity to the irradiation (exposure) of the oscillation wavelength of the inexpensive short-wavelength semiconductor laser, and the electron absorption related to the electronic excitation state by the light absorption, Energy transfer, heat generation, and the like act on a diimidazole type compound represented by the formula (1) to cause a chemical change to generate a radical, an acid or a base. Further, at least one of the radicals, acids or bases produced herein can cause irreversible changes such as coloration, color reduction, and polymerization of the polymerizable compound to be reacted. Among such compounds, an addition polymerizable compound having an ethylenically unsaturated double bond is preferably used to initiate a curing reaction, and to cure the exposed region. Therefore, by using the photosensitive composition of the present invention, it has sufficient sensitivity to scanning exposure of a short-wavelength semiconductor laser, and is excellent in safety under a yellow light, and can also be safe in a bright -11-200819915. The advantages of light processing. Therefore, it is considered that the lithographic printing plate precursor which is obtained by using the additive composition containing the addition polymerizable compound as the photosensitive layer is capable of recording with high sensitivity and exhibiting printing performance excellent in safety light stability. . Further, the photosensitive composition of the present invention (containing a diimidazole type compound having a specific structure) is excellent in developability. It is considered that the important factor is that there are hydrophilic substituents (OH, OCOR, COOR, etc.) in the vicinity of the sensitized colorant structure, and it is needless to say that the alkali developing solution is also possible because the high solubility can be maintained in the aqueous solution in the weakly acidic region. Therefore, it is possible to suppress the deposition of coloring materials and the generation of gas, and to bring about an effect of improving the developing property. [Effects of the Invention] According to the lithographic printing plate of the present invention, the oscillation wavelength of the inexpensive short wavelength of from 350 nm to 45 nm is particularly high in sensitivity and excellent in storage stability, for example, Provide scanning exposure for CPT system - industry ^ ^ imaging ^ degree · excellent - _ _ _ _ print _ original version __ version ^-------------- [Embodiment] Hereinafter, the present invention will be described in detail. The photosensitive composition of the present invention is characterized in that it contains the following components (A) to (C), (A) a diimidazole-type compound having a structure represented by the formula (I), and (B) at 350 nm to 850 nm. The rice has a sensitizing color absorbing the maximum wavelength λ max , and (C) a polymerizable compound. Further, the preferred lithographic printing plate precursor of the present invention has a support of -12-200819915 in the following order, a photosensitive layer (containing a (II) diimidazole type compound having a structure represented by the following formula (I), (B) at 3 50 nm to 850 nm having a sensitizing color absorbing material having a maximum wavelength λ ma>, (C) a polymerizable compound, and (D) an alkali-soluble binder polymer, or a hydrophobic acid having an acid value of 0.3 meq/g or less Adhesive polymer), and protective layer. Each component contained in the photosensitive composition of the present invention will be described in detail below. (A) a diimidazole type compound having a structure represented by the following formula (I),

(通式(I)中,Ri〜R6係表示可具有取代基之芳基、可具 有取代基之雜芳基中之任一者,Ri〜R6中至少2個係具有 選自 COOR7 基、S03R8 基、P03R9 基、OH 基、及 OCORio 基之取代基之芳基或雜芳基,R7〜R1()係各自獨立地表示非 氫原子之一價的原子團)。 具有通式(I)所示結構之二咪唑型化合物(以下有稱爲 本發明的二咪唑型化合物或特定引發劑之情形),具有藉由 其親水性而兼具在鹼顯像液中的可溶性/弱酸性水溶液中 的可溶性、在顯像步驟不會產生顯像氣體之重大特徵。 本發明的二咪唑型化合物型在25 °C的顯像液(調整爲 pH = 4.5或11.95而成之水溶液)中之溶解量,以1〇〇(毫克/ 升)以上爲佳。該溶解量以2 0 0 (毫克/升)以上爲較佳,以 -13- 200819915 3 00(毫克/升)以上爲更佳。 使在25°C的顯像液(調整爲ρΗ = 4·5而成之水溶液)中 之溶解量,以1〇〇(毫克/升)以上時,取代基以加水分解性 之乙醯基、酯基等、及羥基爲佳。 在25°C的顯像液(調整爲ρΗ= 1 1.95而成之水溶液)中 之溶解量,以1〇〇(毫克/升)以上時,取代基以非加水分解 性基爲佳,以羥基爲佳。 本發明之二咪唑型化合物在鹼水溶液(ΡΗ= 1 1 .95)中之 溶解量及在.弱酸水溶液(ρΗ= 4.5)中之溶解量,能夠如下進 行來求得。 規定pH之鹼水溶液係使用25 °C的顯像液(調整爲ρΗ = 11.95而成之水溶液)。所使用的添加劑可舉出 ΚΟΗ、 NaOH、K2C03、KHC03,本發明之鹼未限定於此等,係包 含全部能夠將水溶液的p Η調整爲1 0.0〜1 4.0之物。 規定pH之弱酸性水溶液係使用2 5 °C的顯像液(調整爲 pH= 4 · 5而成之水溶液)。所使用的添加劑可舉出磷酸、檸 檬酸、EDTA4Na鹽、磺酸鹽等,本發明之弱酸性未限定於 此等,係包含全部能夠將水溶液的pH調整爲2.0〜10.0之 物。 在本發明,組合(A)特定引發劑及(B)在3 5 0奈米〜850 奈米具有吸收極大波長λ max之敏化色料而成之光引發系 顯示具有高的光分解效率、及非常高的感光性。通常,已 知由敏化色料/引發劑所構成的光引發系之敏化機構係經 由以下路徑,(a)基於電子從敏化色料的電子激發狀態往引 -14- 200819915 發劑移動反應,引發劑產生還原分解;(b)基於電子從引發 劑往敏化色料的電子激發狀態移動,引發劑產生氧化分 解;及(C)基於能量從敏化色料的電子激發狀態往引發劑移 動’引發劑從電子激發狀態產生分解;已知本發明的特定 引發劑’能夠以優良的效率引起此等任一種型式之敏化反 應。 又’本發明的特定引發劑係高敏感度之重要因素係顯 示高效率的色料螢光消光(螢光及/或磷光),認爲一種可能 係具有上述部分結構之本發明的特定引發劑,其敏化色料 的反應色效率可能較高。其他的可能性係通式(I)所示之部 分結構在敏化反應初期過程(電子移動等)的效率化、而且 亦可能是達成引發劑分解會有助於後續反應的效率化。 在本發明所使用的特定引發劑,認爲係因爲Ri〜R6之 芳基或雜芳基係具有COOR2基、S03R3基、PO3R4基、0η 基、及OCOR5基等親水性取代基,所以對主成分爲水之pH 爲2〜7、或10〜14之弱酸性/鹼水溶液之親和性高,有助於 抑制色料析出 '產生氣體,並提升顯像性。 而且,通式(I)所示之特定引發劑,以下述通式(11)所 示結構爲佳。(In the formula (I), Ri to R6 represent any one of an aryl group which may have a substituent and a heteroaryl group which may have a substituent, and at least two of Ri to R6 have a selected from the group consisting of COOR7 group and S03R8. An aryl or heteroaryl group of a substituent of a P03R9 group, an OH group, and an OCORio group, and R7 to R1() each independently represent a valence group of a non-hydrogen atom). A diimidazole type compound having a structure represented by the general formula (I) (hereinafter referred to as a diimidazole type compound or a specific initiator of the present invention) having a hydrophilicity and a combination in an alkali developing solution The solubility in the soluble/weakly acidic aqueous solution does not produce a significant feature of the imaging gas in the development step. The amount of the diimidazole-type compound of the present invention dissolved in a developing solution at 25 ° C (adjusted to an aqueous solution of pH = 4.5 or 11.95) is preferably 1 〇〇 (mg / liter) or more. The amount of dissolution is preferably 200 or more (mg/L) or more, more preferably -13 to 200819915 3 00 (mg/L) or more. When the amount of dissolution in a developing solution at 25 ° C (adjusted to an aqueous solution of ρ Η = 4.5) is 1 〇〇 (mg / liter) or more, the substituent is hydrolyzable, An ester group or the like and a hydroxyl group are preferred. When the amount of dissolution in a developing solution at 25 ° C (adjusted to an aqueous solution of ρ Η = 1. 1.95) is 1 〇〇 (mg / liter) or more, the substituent is preferably a non-hydrolyzable group, and a hydroxy group is used. It is better. The amount of the diimidazole-type compound of the present invention dissolved in an aqueous alkali solution (ΡΗ = 1 1.95) and the amount dissolved in a weak acid aqueous solution (ρ Η = 4.5) can be determined as follows. The aqueous solution of the predetermined pH is a developing solution at 25 ° C (adjusted to an aqueous solution of ρ Η = 11.95). The additives to be used include hydrazine, NaOH, K2C03, and KHC03. The base of the present invention is not limited thereto, and all of them can adjust the p Η of the aqueous solution to 1.0 to 1 4.0. A weakly acidic aqueous solution having a predetermined pH is a developing solution at 25 ° C (an aqueous solution adjusted to pH = 4.5). Examples of the additive to be used include phosphoric acid, citric acid, EDTA4Na salt, and sulfonate. The weak acidity of the present invention is not limited thereto, and all of them can adjust the pH of the aqueous solution to 2.0 to 10.0. In the present invention, the combination of (A) a specific initiator and (B) a sensitized colorant having a maximum absorption wavelength λ max at 350 to 850 nm exhibits high photodegradation efficiency, And very high sensitivity. In general, it is known that a sensitization mechanism of a photoinitiator composed of a sensitizing colorant/initiator is via the following path, (a) based on electrons from the electronically excited state of the sensitized toner to the source - 14-200819915 Reacting, the initiator produces reductive decomposition; (b) based on the movement of electrons from the initiator to the electronically excited state of the sensitizing toner, the initiator is oxidatively decomposed; and (C) based on the energy from the electronically excited state of the sensitizing toner The agent shifts the initiator to decompose from the electronically excited state; it is known that the specific initiator of the present invention can cause the sensitization reaction of any of these types with excellent efficiency. Further, the important factor of the specific initiator of the present invention is that high-efficiency colorant fluorescent extinction (fluorescence and/or phosphorescence) is considered to be a specific initiator of the present invention which may have the above partial structure. The color reaction efficiency of the sensitized colorant may be high. Other possibilities are that the partial structure represented by the general formula (I) is efficient in the initial stage of the sensitization reaction (electron movement, etc.), and it is also possible that the decomposition of the initiator is achieved to contribute to the efficiency of the subsequent reaction. The specific initiator used in the present invention is considered to be because the aryl or heteroaryl group of Ri to R6 has a hydrophilic substituent such as a COOR2 group, a S03R3 group, a PO3R4 group, a 0η group, and an OCOR5 group. The weak acid/alkaline aqueous solution having a water pH of 2 to 7, or 10 to 14 has a high affinity, which contributes to suppressing the coloring of the coloring material to generate a gas and improve the developability. Further, the specific initiator represented by the formula (I) is preferably a structure represented by the following formula (11).

•15- 200819915 通式(II)中,m、η係選自〇〜4之整數,Rll〜Rl6係表示 氫原子或一價的非金屬原子團。 其中,Rh〜R16中至少2個係選自C00r2基、S〇3R3 基、P03R4基、OH基及〇COR5基之取代基(在此,r2、、 R4及R5係各自獨地表不一價的非金屬原子團)。亦即, 在通式(II)所示之結構,至少存在2個苯環(具有選自 COOR2基、SO3R3基、PO3R4基、OH基及〇c〇R5基之耳又代 基)。 .而且,特定引發劑以下述式(III)所示之結構爲更佳。• 15-200819915 In the formula (II), m and η are selected from an integer of 〇~4, and R11 to R16 represent a hydrogen atom or a monovalent non-metal atomic group. Wherein at least two of Rh to R16 are selected from the group consisting of a C00r2 group, an S〇3R3 group, a P03R4 group, an OH group, and a ruthenium COR5 group (here, r2, R4 and R5 are each independently monovalent) Non-metal atomic group). Namely, in the structure represented by the formula (II), at least two benzene rings (having an auricular group selected from the group consisting of a COOR2 group, a SO3R3 group, a PO3R4 group, an OH group, and a 〇c〇R5 group) are present. Further, the specific initiator is preferably a structure represented by the following formula (III).

通式(III)中,Ru-Rb係表示各自獨立地表示氫原子或 • 一價的非金屬原子團,X係表示鹵素原子(例如,氯原子、 氟原子、碘原子、溴原子)。其中,至少存在2個選自C〇〇R2 基、S03R3基、P〇3r4基、〇H基及〇c〇R5基之取代基(在 此’ R2、R3、R4、及rs係各自獨立地表示一價的非金屬原 子團)作爲Rl7〜R19及X。 以下’更詳細地說明上述通式。 通式(I)中,R^R6係表示可具有取代基之芳基或雜芳 方基之具體例可舉出苯基、聯苯基、萘基、甲苯基、 -16 - 200819915 二甲苯基、莱基、芡基、氯苯基、溴苯基、氯甲基苯基、 經基苯基、甲氧基苯基、乙氧基苯基、苯氧基苯基、乙酸 氧基苯基、苯甲醯氧基苯基、甲硫基苯基、苯硫基苯基、 甲胺基苯基、二甲胺基苯基、乙醯胺基苯基、羧基苯基、 甲氧基鐵基苯基、乙氧基苯基幾基、苯氧基鑛基苯基、N-苯基胺基甲醯基苯基、苯基、氰基苯基、磺酸基苯基、磺 酸根基苯基、鱗酸基苯基、鱗酸根基苯基等。 $ 雜芳基可使甩從含有氮、氧、硫原子中之至少一者之 單環或多環芳香族環所衍生之基。.在雜芳基之雜芳基環.的 特佳例子,可舉出例如噻吩、噻蒽、呋喃、吡喃、異苯并 呋喃、色烯、咕噸、啡噚阱、吡咯、吡唑、異噻唑、異噚 唑、吡阱、嘧啶、嗒畊、吲哚畊、異吲哚阱、吲哚基、吲 唑、嘌呤、喹阱、異喹啉、酞畊、萘啶、喹唑啉、啐啉、 _卩定、味卩坐、味啉、菲(p h e n a n t h r e n e )、η丫 D定、卩回口定 (perimidine)、啡啉、酿哄、啡胂阱(phenarsazine)、啡噚哄、 φ 呋咕等,此等可以更進行苯環縮,又,亦可以具有取代基。In the formula (III), Ru-Rb means that each independently represents a hydrogen atom or a monovalent non-metal atomic group, and X represents a halogen atom (for example, a chlorine atom, a fluorine atom, an iodine atom or a bromine atom). Wherein at least two substituents selected from the group consisting of a C〇〇R2 group, a S03R3 group, a P〇3r4 group, a 〇H group, and a 〇c〇R5 group are present (wherein the 'R2, R3, R4, and rs systems are each independently A monovalent non-metal atom group is represented as Rl7 to R19 and X. The above formula is described in more detail below. In the general formula (I), R^R6 represents a aryl group or a heteroaryl group which may have a substituent, and examples thereof include a phenyl group, a biphenyl group, a naphthyl group, a tolyl group, and -16 - 200819915 xylyl group. , lysyl, fluorenyl, chlorophenyl, bromophenyl, chloromethylphenyl, phenyl, methoxyphenyl, ethoxyphenyl, phenoxyphenyl, phenyl acetate Benzyloxyphenyl, methylthiophenyl, phenylthiophenyl, methylaminophenyl, dimethylaminophenyl, ethylaminophenyl, carboxyphenyl, methoxythiobenzene , ethoxyphenyl group, phenoxy orthylphenyl, N-phenylaminoformamidophenyl, phenyl, cyanophenyl, sulfonylphenyl, sulfonylphenyl, A phosylphenyl group, a phosylphenyl group or the like. The heteroaryl group may be a group derived from a monocyclic or polycyclic aromatic ring containing at least one of nitrogen, oxygen and sulfur atoms. Specific examples of the heteroaryl ring of the heteroaryl group include, for example, thiophene, thiazide, furan, pyran, isobenzofuran, chromene, xanthene, morphine, pyrrole, pyrazole, Isothiazole, isoxazole, pyrimidine, pyrimidine, sorghum, tillage, isoindole, sulfhydryl, carbazole, anthracene, quinolin, isoquinoline, sorghum, naphthyridine, quinazoline, Porphyrin, 卩卩定, miso sitting, porphyrin, phenanthrene, η丫D定, perimidine, morphine, brewing, phenarsazine, morphine, φ Furoxan, etc., may further carry out benzene ring condensation, and may also have a substituent.

Ri〜R6之芳基或雜芳基可具有的取代基,以烷基、烷 氧基、硫烷基或是具有胺基或烷氧基之芳基、鹵素原子等, 以烷氧基、鹵素原子爲更佳。特佳之烷氧基可舉出甲氧基、 乙氧基,較佳是鹵素原子可舉出氟及氯。 R7〜R1G之一價的原子團以烷基爲佳,以碳數1〜1〇之烷 基爲更佳,可舉出例如甲基、乙基、丙基等。 從加水分解的觀點,以碳數較少爲佳,以甲基、乙基 爲佳,以甲基爲更佳。 -17- 200819915 在通式(π) ’ R"~R16係表示〜㈣非金麗子團時, 較佳係表示取代或未取代的烷基、烯基或炔基、硫烷基、 硫烷氧基、鹵素原子、取代或未取代的芳其。 而且,敘述Rm〜R16之較佳具體例。較佳烷基之例可 舉出碳數1〜20之直鏈狀、分枝狀或環狀的烷基,其具體例 可舉出甲基、乙基、丙基、丁基、戊基、己基、庚基、辛 基、壬基、癸基、十一基、十二基、十三基、十六基、十 八基、二十基、異丙基、異丁基、第二丁基、第三丁基、 異戊基、新戊基、1-甲基丁基、異己基、2_乙基己基、2_ 甲基己基、環己基、環戊基、2 -降萡基等。此等之中,以 碳原子數1至12之直鏈狀、碳原子數3至12之分枝狀、 和碳原子數5至10之環狀的烷基爲更佳。 取代烷基之取代基可使用1價的非金屬原子團之基, 較佳的例子可舉出鹵素原子(-F、-Br、-C1、-1)、羥基、烷 氧基、芳氧基、氫硫基、烷硫基、芳硫基、烷二硫基、芳 二硫基、胺基、N-烷胺基、Ν,Ν·二烷胺基、N-芳胺基、N,N-二芳胺基、N-烷基-N-芳胺基、醯氧基、胺基甲醯氧基、N-烷基胺基甲醯氧基、N-芳基胺基甲醯氧基、N,N-二院基胺 基甲醯氧基、N,N-二芳基胺基甲醯氧基、N-院基-N-芳基胺 基甲醯氧基、烷基亞磺醯(alkyl sulfoxy)基、芳基亞磺醯 (aryl sulfoxy)基、醯氧基、醯硫(acylthio)基、醯胺基、N- 烷基醯胺基、N-芳基醯胺基、脲基、Ν’-烷脲基、N’,N’-二 烷脲基、N,-芳脲基、N,,N,-二芳脲基、N,-烷基-Ν’-芳脲基、 Ν-烷脲基、Ν-芳脲基、Ν,-烷基-Ν-烷脲基、Ν’-院基-Ν-芳 -18- 200819915 脲基、N’,N’-二烷基-N-烷脲基、N’,N’-二烷基-N-芳脲基、 Ν’-芳基-N-烷脲基、Ν’-芳基-N-芳脲基、N’,N’-二芳基-N-烷脲基、N’,N’-二芳基-N-芳脲基、Ν’-烷基-Ν’-芳基-N-烷 脲基、Ν’-烷基-Ν’-芳基-Ν-芳脲基、烷氧基碳醯胺基、芳氧 基碳醯胺基、Ν -院基-Ν -院氧基碳醯胺基、Ν -院基-Ν -芳氧 基碳醯胺基、Ν -芳基-Ν -院氧基碳釀胺基、Ν -芳基-Ν -芳氧 基碳醯胺基、甲醯基、醯基、羰基、烷氧基羰基、芳氧基 羰基、胺基甲醯基、Ν-烷基胺基甲醯基、Ν,Ν-二烷基胺基 甲醯基、Ν-芳基胺基甲醯基、Ν,Ν-二芳基胺基甲醯基、Ν-烷基-Ν-芳基胺基甲醯基、烷基亞磺醯基、芳基亞磺醯基、 烷基磺醯基、芳基磺醯基、磺酸基(-so3h)及其共軛鹼基(以 下稱爲磺酸根基)、烷氧基磺醯基、芳氧基磺醯基、胺亞磺 醯基、N-烷基胺亞磺醯基、N,N-二烷基胺亞磺醯基、N-芳 基胺亞磺醯基、N,N-二芳基胺亞磺醯基、N-烷基-N-芳基胺 亞磺醯基、胺磺醯基、N-烷基胺磺醯基、N,N-二烷基胺磺 醯基、N-芳基胺磺醯基、Ν,Ν·二芳基胺磺醯基、N-烷基-N-芳基胺磺醯基、膦酸基(-ΡΟ3 Η2)及其共軛鹼基(以下稱爲膦 酸根基)、二烷基膦酸基(_Ρ〇3(烷基)2)、二芳基膦酸基 (-Ρ〇3(芳基)2)、烷基芳基膦酸基(-Ρ〇3(烷基)(芳基))、一烷 基膦酸基(-Ρ 〇 3 Η (烷基))及其共軛鹼基(以下稱爲烷基膦酸 根基)、一芳基膦酸基(-ΡΟ3Η(芳基))及其共軛鹼基(以下稱 爲芳基膦酸根基)、膦醯氧基(-〇Ρ〇3Η2)及其共軛鹼基(以下 稱爲膦酸根氧基)、二烷基膦醯氧基(-〇Ρ〇3(烷基)2)、二芳 基膦醯氧基(-〇Ρ〇3(芳基)2)、烷基芳基膦醯氧基(_0Ρ03(烷 -19- 200819915 基)(芳基))、一烷基膦醯氧基(-〇Ρ〇3 Η(烷基))及共軛鹼基 (以下稱爲院基膦酸根氧基基)、一芳基膦醯氧基 (-0Ρ03Η(芳基))及共軛鹼基(以下稱爲芳基膦酸根氧基)、氰 基、硝基、芳基、雜芳基、烯基、炔基、及矽烷基。 在此等取代基,烷基的具體例可舉出前述烷基,此等 亦可更具有取代基。 又,芳基的具體例可舉出苯基、聯苯基、萘基、甲苯 基、二甲苯基、莱基、芡基、氯苯基、溴苯基、氯甲基苯 基、羥基苯基、甲氧基苯基、乙氧基苯基、苯氧基苯基、 乙醯氧基苯基、苯甲醯氧基苯基、甲硫基苯基、苯硫基苯 基、甲胺基苯基、二甲胺基苯基、乙醯胺基苯基、羧基苯 基、甲氧基羰基苯基、乙氧基苯基羰基、苯氧基羰基苯基、 N-苯基胺基甲醯基苯基、苯基、氰基苯基、磺酸基苯基、 磺酸根基苯基、膦酸基苯基、膦酸根基苯基等。 雜芳基可使用從含有氮原子、氧原子、硫原子中之至 少一者之單環或多環芳香族環所衍生之基。在雜芳基之雜 芳基環的特佳例子,可舉出例如噻吩、噻蒽、呋喃、吡喃、 異苯并呋喃、色烯、咕噸、啡噚畊、吡咯、吡唑、異噻唑、 異噚唑、吡阱、嘧啶、嗒阱、吲哚阱、異吲哚阱、吲哚基、 吲唑、嘌呤、喹阱、異喹啉、酞畊、萘啶、喹唑啉、啐啉、 喋啶、咔唑、咔啉、菲(phenanthrene)、吖啶、咂啶 (perimidine)、啡啉、酞阱、啡胂阱(?^1^“32111々)、啡11号畊、 呋咕等,此等可以更進行苯環縮,又,亦可以具有取代基。 又,烯基可舉出例如乙烯基、卜丙烯基、1 - 丁烯基、 -20- 200819915 肉桂基、2-氯-1-乙烯基等。炔基可舉出例如乙炔基、1·丙 炔基、1 -丁炔基、三甲基矽烷基乙炔基等。 此等取代烷基之取代基中,更佳之物可舉出鹵素原子 (-F、-Br、-Cl、-I)、烷氧基、芳氧基、烷·硫基、芳硫基、 N-烷胺基、N,N-二烷胺基、醯氧基、N =烷基胺基甲醯氧基、 N-芳基胺基甲醯氧基、醯胺基、甲醯基、醯基、羧基、烷 氧基羰基、芳氧基羰基、胺基甲醯基、N-烷基胺基甲醯基、 N,N-二烷基胺基甲醯基、N-芳基胺基甲醯基、N-烷基-N-芳基胺基甲醯基、磺酸基、磺酸根基、胺磺醯基、N-烷基 胺磺醯基、N,N-二烷基胺磺醯基、N-芳基胺磺醯基、N-烷 基-N-芳基胺磺醯基、膦酸基、膦酸根基、二烷基膦酸基、 二芳基膦酸基、一烷基膦酸基、烷基膦酸根基、一芳基膦 酸基、芳基膦酸根基、膦醯氧基、膦酸根氧基、芳基、烯 基、亞烷基(亞甲基等)。 另一方面,在取代烷基之伸烷基可舉出例如從前述碳 數1〜2 0之烷基上脫除氫原子中之任一個,而成爲2價的有 機殘基之物,較佳之物可舉出碳原子數1至1 2之直鏈狀、 碳數3〜12之分枝狀及碳數5〜10之環狀的伸烷基。 藉由組合上述取代基與伸烷基而得到之R μ〜R 1 6,較佳 取代烷基之具體例可舉出氯甲基、溴甲基、2-氯乙基、三 氟甲基、甲氧基甲基、甲氧基乙氧基乙基、芳氧基甲基、 苯氧基甲基、甲硫基甲基、甲苯硫基甲基、乙胺基乙基、 二乙胺基丙基、味啉丙基、乙醯氧基甲基、苯甲醯氧基甲 基、Ν-環己基胺基甲醯氧基乙基、Ν_苯基胺基甲醯氧基乙 -21- 200819915 基、乙醯胺基乙基、N-甲基苯甲醯胺基丙基、2-側氧乙基、 2-側氧丙基、羧丙基、甲氧基羰基乙基、芳氧基羰基丁基、 氯苯氧基羰基甲基、胺基甲醯基甲基、N-甲基胺基甲醯基 乙基、N,N-二丙基胺基甲醯基甲基、N-(甲氧基:苯基)胺基 甲醯基乙基、N-甲基-N-(磺酸基苯基)胺基甲醯基甲基、磺 酸基丁基、磺酸根基丙基、磺酸根基丁基、胺亞磺醯基丁 基、N-乙基胺磺醯基甲基、N,N-二丙基胺磺醯基丙基、N-三胺磺醯基丙基、N-甲基-N-(膦酸基苯基)胺磺醯基辛基、 膦酸基丁基、膦酸根基己基、二乙基膦酸基丁基、二苯基 膦酸基丙基、甲基膦酸基丁基、甲基膦酸根基丁基、甲苯 基膦酸基己基、甲苯基膦酸根己基、膦醯氧基丙基、膦酸 根氧基丁基、苄基、苯乙基、α-甲基苄基、卜甲基-1-苯基 乙基、對甲基苄基、肉桂基、烯丙基、1-丙烯基甲基、2-丁烯基、2-甲基烯丙基、2-甲基丙烯基甲基、2-丙炔基、2-丁炔基、3-丁炔基等。 φ 在Rn-Rb之較佳的烷氧基可舉出碳原子數1〜20之直 鏈狀、分枝狀及環狀的烷氧基。在烷氧基上存在之取代基 可舉出前述烷基上的取代基之相同之物。又,其具體例可 舉出甲氧基、乙氧基,以甲氧基爲特佳。 在Rn〜R16之較佳的芳基的具體例,可舉出1個至3 個苯環形成稠環而成之物、苯環與5員不飽和環形成稠環 而成之物,具體例可舉出苯基、萘基、蒽基、菲基、茚基、 苊基、莽基,此等之中,以苯基、萘基爲更佳。a substituent which the aryl or heteroaryl group of Ri~R6 may have, an alkyl group, an alkoxy group, a thioalkyl group or an aryl group having an amine group or an alkoxy group, a halogen atom, etc., an alkoxy group, a halogen The atom is better. The alkoxy group is particularly preferably a methoxy group or an ethoxy group, and preferably a halogen atom is fluorine or chlorine. The atomic group of one of R7 to R1G is preferably an alkyl group, and more preferably an alkyl group having 1 to 1 carbon atom, and examples thereof include a methyl group, an ethyl group, and a propyl group. From the viewpoint of hydrolysis, the carbon number is preferably small, preferably methyl or ethyl, and more preferably methyl. -17- 200819915 When the formula (π) ' R"~R16 represents a ~(iv) non-gold group, it preferably represents a substituted or unsubstituted alkyl, alkenyl or alkynyl group, a sulfanyl group, a sulfadienyl group. a group, a halogen atom, a substituted or unsubstituted aryl group thereof. Further, a preferred specific example of Rm to R16 will be described. Examples of the preferred alkyl group include a linear, branched or cyclic alkyl group having 1 to 20 carbon atoms, and specific examples thereof include a methyl group, an ethyl group, a propyl group, a butyl group, and a pentyl group. Hexyl, heptyl, octyl, decyl, decyl, undecyl, dodecyl, thirteen, hexadecyl, octadecyl, hexyl, isopropyl, isobutyl, second butyl , tert-butyl, isopentyl, neopentyl, 1-methylbutyl, isohexyl, 2-ethylhexyl, 2-methylhexyl, cyclohexyl, cyclopentyl, 2-norbornyl and the like. Among these, an alkyl group having a linear chain of 1 to 12 carbon atoms, a branched chain of 3 to 12 carbon atoms, and a cyclic alkyl group having 5 to 10 carbon atoms is more preferable. The substituent of the substituted alkyl group may be a group of a monovalent non-metal atomic group, and preferred examples thereof include a halogen atom (-F, -Br, -C1, -1), a hydroxyl group, an alkoxy group, an aryloxy group, Hydrogenthio, alkylthio, arylthio, alkyldithio, aryldithio, amine, N-alkylamino, hydrazine, hydrazine dialkylamino, N-arylamino, N,N- Diarylamine, N-alkyl-N-arylamino, decyloxy, aminomethyl methoxy, N-alkylaminomethyl methoxy, N-arylaminomethyl methoxy, N , N-二院基aminomethyl methoxy, N,N-diarylaminomethyl methoxy, N-homo-N-arylaminomethyl methoxy, alkyl sulfinium (alkyl Sulfoxy), aryl sulfoxy group, decyloxy group, acylthio group, amide group, N-alkyl guanylamino group, N-aryl decylamino group, ureido group, hydrazine '-Alkylureido, N', N'-dialkylureido, N,-arylureido, N,,N,-diarylureido, N,-alkyl-Ν'-arylureido, Ν- Alkyl urea, Ν-arylureido, hydrazine, -alkyl-hydrazine-alkylurea, Ν'-homo-anthracene-aryl-18- 200819915 Urea, N', N'-dialkyl-N- Alkylurea, N', N'-dialkyl-N-arylurea , Ν'-aryl-N-alkylureido, Ν'-aryl-N-arylureido, N',N'-diaryl-N-alkylureido, N',N'-diaryl --N-arylureido, Ν'-alkyl-Ν'-aryl-N-alkylureido, Ν'-alkyl-Ν'-aryl-oxime-arylureido, alkoxycarbenamine , aryloxycarbenyl, fluorene-homo-anthracene-homolyl carbamoyl, fluorene-homo-anthracene-aryloxycarbenyl, fluorene-aryl-hydrazine Carbocyclic amine, fluorene-aryl-hydrazine-aryloxycarbenyl, methionyl, fluorenyl, carbonyl, alkoxycarbonyl, aryloxycarbonyl, aminomethyl decyl, hydrazine-alkylamine Mercapto, fluorene, fluorenyl-dialkylaminomethyl fluorenyl, fluorenyl-arylaminomethyl fluorenyl, fluorene, fluorenyl-diarylaminomethyl fluorenyl, fluorenyl-alkyl-fluorene-aryl Aminomethyl sulfhydryl, alkylsulfinyl, arylsulfinyl, alkylsulfonyl, arylsulfonyl, sulfonate (-so3h) and their conjugated bases (hereinafter referred to as sulfonate) Acid group), alkoxysulfonyl group, aryloxysulfonyl group, amine sulfinyl group, N-alkylamine sulfinyl group, N,N-dialkylamine sulfinyl group, N-aryl Amidoxime, N,N-diarylamine sulfinyl, N- Alkyl-N-arylamine sulfinyl, sulfonyl, N-alkylamine sulfonyl, N,N-dialkylamine sulfonyl, N-arylsulfonyl, anthracene, Ν·Diarylamine sulfonyl, N-alkyl-N-arylamine sulfonyl, phosphonic acid (-ΡΟ3 Η2) and its conjugated base (hereinafter referred to as phosphonate), dialkyl Phosphonic acid group (_Ρ〇3(alkyl) 2), diarylphosphonic acid group (-Ρ〇3(aryl) 2), alkylarylphosphonic acid group (-Ρ〇3(alkyl)(aryl) Base)), monoalkylphosphonic acid group (-Ρ 〇 3 Η (alkyl)) and its conjugated base (hereinafter referred to as alkylphosphonate), monoarylphosphonic acid group (-ΡΟ3Η (aryl) )) and its conjugated base (hereinafter referred to as arylphosphonate), phosphinomethoxy (-〇Ρ〇3Η2) and its conjugated base (hereinafter referred to as phosphonateoxy), dialkylphosphine醯oxy (-〇Ρ〇3(alkyl) 2), diarylphosphonium oxy (-〇Ρ〇3(aryl) 2), alkylarylphosphonium oxy (_0Ρ03 (alkane-19) - 200819915 yl)(aryl)), monoalkylphosphonium oxy (-〇Ρ〇3 Η(alkyl)) and conjugated base (hereinafter referred to as an anthracylphosphonicoxy group), an aryl group Phosphine Oxyl (-0Ρ03Η(aryl)) and a conjugated base (hereinafter referred to as an arylphosphonateoxy group), a cyano group, a nitro group, an aryl group, a heteroaryl group, an alkenyl group, an alkynyl group, and a decyl group. Specific examples of the alkyl group in the above substituents include the above alkyl group, and these may further have a substituent. Further, specific examples of the aryl group include a phenyl group, a biphenyl group, a naphthyl group, a tolyl group, a xylyl group, a benzyl group, a decyl group, a chlorophenyl group, a bromophenyl group, a chloromethylphenyl group, and a hydroxyphenyl group. , methoxyphenyl, ethoxyphenyl, phenoxyphenyl, ethoxylated phenyl, benzamidine phenyl, methylthiophenyl, phenylthiophenyl, methylaminobenzene , dimethylaminophenyl, acetaminophen phenyl, carboxyphenyl, methoxycarbonylphenyl, ethoxyphenylcarbonyl, phenoxycarbonylphenyl, N-phenylaminocarbamyl Phenyl, phenyl, cyanophenyl, sulfonylphenyl, sulfonylphenyl, phosphonic phenyl, phosphonate phenyl, and the like. The heteroaryl group may be a group derived from a monocyclic or polycyclic aromatic ring containing at least one of a nitrogen atom, an oxygen atom and a sulfur atom. Specific examples of the heteroaryl ring of the heteroaryl group include, for example, thiophene, thiazide, furan, pyran, isobenzofuran, chromene, xanthene, porphyrin, pyrrole, pyrazole, isothiazole. , isoxazole, pyrimide, pyrimidine, hydrazine trap, hydrazine trap, isoindole, sulfhydryl, carbazole, anthracene, quinolin, isoquinoline, hydrazine, naphthyridine, quinazoline, porphyrin , acridine, oxazole, porphyrin, phenanthrene, acridine, perimidine, morphine, sputum trap, morphine trap (?^1^"32111々), morphine 11 tillage, furosemide And the like, and the benzene ring may be further substituted, and may have a substituent. Further, the alkenyl group may, for example, be a vinyl group, a propylene group, a 1-butenyl group, a -20-200819915 cinnamyl group or a 2-chloro group. 1-vinyl group, etc. The alkynyl group may, for example, be an ethynyl group, a propynyl group, a 1-butynyl group, a trimethyldecyl ethynyl group, etc. Among the substituents of the substituted alkyl group, a more preferable one is preferable. There may be mentioned a halogen atom (-F, -Br, -Cl, -I), an alkoxy group, an aryloxy group, an alkylthio group, an arylthio group, an N-alkylamino group, an N,N-dialkylamino group. , 醯oxy, N = alkylaminomethyl methoxy , N-arylaminomethyl methoxy, decyl, decyl, decyl, carboxy, alkoxycarbonyl, aryloxycarbonyl, aminomethyl fluorenyl, N-alkylaminocarbamyl , N,N-dialkylaminomethyl fluorenyl, N-arylaminomethyl fluorenyl, N-alkyl-N-arylaminomethyl fluorenyl, sulfonic acid, sulfonate, amine sulfonium , N-alkylamine sulfonyl, N,N-dialkylamine sulfonyl, N-arylamine sulfonyl, N-alkyl-N-arylamine sulfonyl, phosphonic acid, Phosphonate group, dialkylphosphonic acid group, diarylphosphonic acid group, monoalkylphosphonic acid group, alkylphosphonic acid group, monoarylphosphonic acid group, arylphosphonic acid group, phosphinomethoxy group, phosphine An acid group, an aryl group, an alkenyl group, an alkylene group (methylene group, etc.). On the other hand, the alkyl group of the substituted alkyl group may be, for example, removed from the above alkyl group having 1 to 20 carbon atoms. Any one of the hydrogen atoms and a divalent organic residue, preferably a linear one having a carbon number of 1 to 12, a branched carbon number of 3 to 12, and a carbon number of 5 to a cyclic alkyl group of 10; R μ~R 1 6 obtained by combining the above substituent with an alkyl group; Specific examples of the alkyl group include a chloromethyl group, a bromomethyl group, a 2-chloroethyl group, a trifluoromethyl group, a methoxymethyl group, a methoxyethoxyethyl group, an aryloxymethyl group, and a benzene group. Oxymethyl, methylthiomethyl, tolylthiomethyl, ethylaminoethyl, diethylaminopropyl, morpholinylpropyl, ethoxymethyloxy, benzhydryloxymethyl, Ν-cyclohexylaminomethyl methoxyethyl, Ν-phenylaminomethyl methoxy-ethyl-21- 200819915 base, acetamidoethyl, N-methylbenzimidyl propyl, 2 - side oxyethyl, 2-oxopropyl, carboxypropyl, methoxycarbonylethyl, aryloxycarbonylbutyl, chlorophenoxycarbonylmethyl, aminomethylmethylmethyl, N-A Aminomethylmercaptoethyl, N,N-dipropylaminomethylmethylmethyl, N-(methoxy:phenyl)aminocarbamidoethyl, N-methyl-N-( Sulfophenyl)aminomercaptomethyl, sulfonylbutyl, sulfonylpropyl, sulfonylbutyl, amine sulfinyl butyl, N-ethylamine sulfonylmethyl , N,N-dipropylaminesulfonylpropyl, N-triaminesulfonylpropyl, N-methyl-N-(phosphonophenyl)aminesulfonyloctyl, Acid butyl, phosphonic hexyl, diethylphosphonic butyl, diphenylphosphonic propyl, methylphosphonic butyl, methylphosphonic butyl, tolylphosphonic hexyl , tolylphosphonate hexyl, phosphinyloxypropyl, phosphonateoxybutyl, benzyl, phenethyl, α-methylbenzyl, methyl-1-phenylethyl, p-methylbenzyl, Cinnamyl, allyl, 1-propenylmethyl, 2-butenyl, 2-methylallyl, 2-methylpropenylmethyl, 2-propynyl, 2-butynyl, 3 - butynyl and the like. Preferred alkoxy groups of φ in Rn-Rb include a linear, branched or cyclic alkoxy group having 1 to 20 carbon atoms. The substituent which is present on the alkoxy group may be the same as the substituent on the above alkyl group. Further, specific examples thereof include a methoxy group and an ethoxy group, and a methoxy group is particularly preferred. Specific examples of the preferred aryl group of Rn to R16 include those in which one to three benzene rings form a fused ring, and a benzene ring and a 5-membered unsaturated ring form a fused ring. A phenyl group, a naphthyl group, an anthracenyl group, a phenanthryl group, a fluorenyl group, a fluorenyl group, and a fluorenyl group are mentioned, and among these, a phenyl group and a naphthyl group are more preferable.

Rn〜Ri6之較佳取代芳基的具體例,能夠使用在上述芳 -22- 200819915 基的環形成碳原子上具有一價的非金屬原子團作爲取代 基。較佳取代基之例子可舉出前述的烷基及取代院基、及 在前述取代烷基作爲取代基所示之物。此種取代芳基之較 佳具體例,可舉出聯苯基、甲苯基、二甲苯基、茱基、艾 基、氯苯基、溴苯基、氟苯基、氯甲基苯基、三氟甲基苯 基、羥基苯基、甲氧基苯基、甲氧基乙氧基苯基、烯丙氧 基苯基、苯氧基苯基、甲硫基苯基、甲苯硫基苯基、乙胺 基苯基、二乙胺基苯基、味啉苯基、乙醯氧基苯基、苯甲 醯氧基苯基、N-環己基胺基甲醯氧基苯基、N_苯基胺基甲 醯氧基苯基、乙醯胺基苯基、N -甲基苯甲醯胺基苯基、羧 基苯基、甲氧基羰基苯基、芳氧基羰基苯基、氯苯氧基羰 基苯基、胺基甲醯基苯基、N-甲基胺基甲醯基苯基、N,N-二丙基胺基甲醯基苯基、N-(甲氧基苯基)胺基甲醯基苯 基、N-甲基(磺酸基苯基)胺基甲醯基苯基、磺酸基苯 基、磺酸根基苯基、胺磺醯基苯基、N-乙基胺磺醯基苯基、 N,N-二丙基胺磺醯基苯基、N-甲苯基胺磺醯基苯基、N-甲 基(膦酸基苯基)胺磺醯基苯基、膦酸基苯基、膦酸根基 苯基、二乙基膦酸基苯基、二苯基膦酸基苯基、甲基膦酸 基苯基、甲基膦酸根基苯基、甲苯基膦酸基苯基、甲苯基 滕酸根基苯基、烯丙基苯基、1-丙烯基甲基苯基、2-丁烯 基本基、甲基烯丙基苯基、2 -甲基丙烯基苯基、2-丙炔基 苯基、丁炔基苯基、3-丁炔基苯基等。 又,及R12之較佳例子,可舉出鹵素原子,較佳例 子爲鄰位取代,更佳例子可舉出氯原子。已知具有該結構 -23- 200819915 之特定引發劑,藉由氯原子的立體障礙能夠使電子接受面 積結構性地變大,而具有特別的高敏感度。該高敏感度化 效果係當在該芳基的鄰位有氯原子取代時特別顯著,係化 合物選定之重要條件。 在本發明,在其骨架上具有親水性基之特定引發劑, 能夠保持在顯像液中不會析出之溶解狀態。親水性基以羥 基、羥基碳酸酯基、羧酸酯、磺酸酯基、磷酸酯基,在弱 0 酸性水溶液以羥基爲更佳,在鹼水溶液,以羥基碳酸酯基、 羧酸酯基爲更佳。雖然羥基在鹼水溶液中亦能夠充分溶 解’但是因爲其親水性,使平版印刷版的耐水性有些許降 低的傾向。因此’在鹼系,其本身被加水分解性基保護之 經基碳酸酯基、及藉由加水分解而成爲水溶性之羧酸酯等 可說是比羥基更佳。 使用前述親水性基時,在本發明的平版印刷版之製 法’即便在顯像液中溶入大量的感光層成分,亦不會產生 Φ 引發劑成分從顯像液析出、污染顯像機或是產生顯像氣體 而造成版面劣化之情形。亦即,能夠將機器的維修負荷控 制在最小限度’能夠降低成本且使作業性效率化,乃是非 常有用的。 以下’顯示本發明的二咪唑型化合物之較佳具體例(例 示化合物1-1〜例示化合物1-24),但是未限定於此等。Specific examples of the preferred substituted aryl group of Rn to Ri6 can be a substituent having a monovalent non-metal atomic group on the ring-forming carbon atom of the above-mentioned aryl-22-200819915 group. Examples of preferred substituents include the above-mentioned alkyl group and substituted group, and the substituted alkyl group as a substituent. Preferred examples of such a substituted aryl group include a biphenyl group, a tolyl group, a xylyl group, a decyl group, an yl group, a chlorophenyl group, a bromophenyl group, a fluorophenyl group, a chloromethylphenyl group, and the like. Fluoromethylphenyl, hydroxyphenyl, methoxyphenyl, methoxyethoxyphenyl, allyloxyphenyl, phenoxyphenyl, methylthiophenyl, tolylthiophenyl, Ethylaminophenyl, diethylaminophenyl, morpholinylphenyl, ethoxylated phenyl, benzamidine phenyl, N-cyclohexylaminomethyloxyphenyl, N-phenyl Aminomethyl methoxy phenyl, acetaminophen phenyl, N-methylbenzimidyl phenyl, carboxyphenyl, methoxycarbonylphenyl, aryloxycarbonylphenyl, chlorophenoxy Carbonylphenyl, aminomethylphenylphenyl, N-methylaminoformamidophenyl, N,N-dipropylaminocarbamiphenyl, N-(methoxyphenyl)amine Methyl phenyl, N-methyl (sulfonyl phenyl) aminomethyl decyl phenyl, sulfonyl phenyl, sulfonyl phenyl, sulfonyl phenyl, N-ethyl sulfonate Nonylphenyl, N,N-dipropylaminesulfonylphenyl, N-methylphenylsulfonylphenyl, N-A (phosphonophenyl)amine sulfonylphenyl, phosphonic phenyl, phosphonate phenyl, diethylphosphonic phenyl, diphenylphosphonic phenyl, methylphosphonic acid Phenyl, methylphosphonate phenyl, tolylphosphonic phenyl, tolyl phenyl phenyl, allyl phenyl, 1-propenylmethylphenyl, 2-butene basic, A Allyl phenyl, 2-methylpropenyl phenyl, 2-propynyl phenyl, butynyl phenyl, 3-butynyl phenyl, and the like. Further, preferred examples of R12 include a halogen atom, and a preferred example is an ortho substitution. More preferably, a chlorine atom is mentioned. The specific initiator having the structure of -23-200819915 is known to have a structurally large electron accepting area by a steric hindrance of a chlorine atom, and has a particularly high sensitivity. This high sensitivity effect is particularly remarkable when a chlorine atom is substituted in the ortho position of the aryl group, and is an important condition for selecting a compound. In the present invention, a specific initiator having a hydrophilic group on its skeleton can maintain a dissolved state which does not precipitate in the developing solution. The hydrophilic group is a hydroxyl group, a hydroxycarbonate group, a carboxylate, a sulfonate group or a phosphate group, and a hydroxyl group is more preferably used in a weakly acidic aqueous solution, and a hydroxycarbonate group or a carboxylate group is used in an aqueous alkali solution. Better. Although the hydroxyl group is sufficiently soluble in the aqueous alkali solution, the water resistance of the lithographic printing plate tends to be somewhat lowered because of its hydrophilicity. Therefore, it can be said that it is more preferable than the hydroxyl group in the base system, the perfluorocarbon group which is itself protected by the hydrolyzable group, and the carboxylic acid ester which is water-soluble by hydrolysis. When the hydrophilic group is used, in the method for producing a lithographic printing plate of the present invention, even if a large amount of the photosensitive layer component is dissolved in the developing liquid, no Φ initiator component is precipitated from the developing liquid, and the developing machine is contaminated or It is a situation in which a developing gas is generated and the layout is deteriorated. In other words, it is very useful to control the maintenance load of the machine to a minimum, which can reduce the cost and improve the workability. Hereinafter, preferred examples of the diimidazole-type compound of the present invention (exemplified compound 1-1 to exemplified compound 1-24) are shown, but are not limited thereto.

-24- 200819915-24- 200819915

CKo mVCKo mV

1-5 Ρ〇2Μβ1-5 Ρ〇2Μβ

:»Q COjMe COjM© t/yiLn n^-jLn -rk、 puO" Μβ〇2〇 Me〇sC 1-6 1-7 1-8:»Q COjMe COjM© t/yiLn n^-jLn -rk, puO" Μβ〇2〇 Me〇sC 1-6 1-7 1-8

敘述通式(I )所示之化合物的合成方法。 [例示化合物(1-1)的合成] 將3.7克六氰鐵酸鉀、3.1克氫氧化鉀、70毫升水、40 毫升甲苯混合後,在室溫攪拌直到固體消失爲止。·隨後, 添加3.8克下述化合物(Γ -1),將油浴加熱至80°C,並在 回流下攪拌4小時。 將在回流下攪拌4小時之反應液放冷後,將添加100 毫升水並使用甲苯萃取而得到之在甲苯中形成的有機層, -25- 200819915 使用氯化鈉水溶液、隨後使用水洗淨。洗淨後,將該有機 相濃縮後得到紅燈色油狀物。使用甲醇使所得到的液體再 結晶,得到2 · 9克目標之例示化合物(I- 1 )。A method for synthesizing the compound represented by the formula (I) will be described. [Synthesis of exemplified compound (1-1)] After mixing 3.7 g of potassium hexacyanoferrate, 3.1 g of potassium hydroxide, 70 ml of water and 40 ml of toluene, the mixture was stirred at room temperature until the solid disappeared. - Subsequently, 3.8 g of the following compound (Γ-1) was added, the oil bath was heated to 80 ° C, and stirred under reflux for 4 hours. After the reaction liquid which was stirred under reflux for 4 hours was allowed to cool, 100 ml of water was added and extracted with toluene to obtain an organic layer formed in toluene, -25-200819915, using an aqueous solution of sodium chloride, followed by washing with water. After washing, the organic phase was concentrated to give a red oil. The obtained liquid was recrystallized using methanol to obtain 2·9 g of the objective compound (I-1).

其他的二咪唑型化合物,亦能夠藉由適當地選擇起始 物質、添加之化合物等,同樣地進行能夠進行合成。 相對於感光性組成物的總固體成分,本發明的感光性 組成物之二咪唑型化合物以含有0.5〜20質量%爲佳,以 1〜10質量%爲更佳。 在本發明,除了前述特定的二咪唑型化合物以外,只 要不損害本發明效果,可選擇倂用其他眾所周知的的光聚 合引發劑、熱聚合引發劑等。此等能夠倂用之聚合引發劑, 可舉出例如在雙陽離子(bication)部未具有竣酸結構之眾 所周知的鍚鹽、具有三鹵甲基之三阱化合物、過氧化物、 偶氮系聚合引發劑、疊氮化合物、醌二疊氮等。 能夠倂用之較佳的聚合引發劑之鐵鹽的具體例,可舉 出特開200 1 _ 1 3 3 969號公報之段落號碼[003 0]〜[0 0 3 3 ]所記 載之物。 倂用其他的聚合引發劑時,此等的含量以前述特定的 二咪唑型化合物的5 0質量%以下爲佳。 在本發明能夠使用的自由基產生劑(前述特定的二咪 -26- 200819915 唑型化合物及按照必要倂用之引發劑),以極大吸收波長爲 5 00奈米以下爲佳,以400奈米以下爲更佳。 (B)敏化色料 本發明的感光性組成物所使用的敏化色料以在 3 5 0〜8 5 0奈米具有吸收尖峰(極大吸收波長)爲佳。此種敏化 色料可舉出分光敏化色料、及吸收光源的光而與光聚合引 發劑互相作用之以下所示之染料或顏料。 較佳之分光敏化色料或染料可舉出多核芳香族類(例 如,芘、茈、三鄰亞苯)、咕噸類(例如,螢光素、曙紅、 紅黴素、若丹明B、玫瑰紅)、花青苷類(例如噻碳花青苷、 曙碳花青苷)、部花青類(如部花青、碳部花青)、噻畊類(例 如,噻嚀、亞甲藍、甲苯胺藍)、吖啶類(例如,吖啶橙、 氯黃素、吖啶黃)、酞青類(例如,酞青、金屬酞青)、卟啉 類(例如,四苯基卟啉、中心金屬取代卟啉)、葉綠素類(例 如,葉綠素、葉綠酸、中心金屬取代葉綠素)、金屬錯合物、 蒽醌類(例如蔥醌)、角鯊鑰類(例如角鯊鑰)等。 更佳之分光敏化色料或染料可舉出例如特公平 37-13034號公報所記載之苯乙嫌色料、特開昭62-143044 號公報所記載之陽離子染料、特公昭5 9 - 2 4 1 4 7號公報所記 載之喹噚啉鑰鹽、特開昭64-33104號公報所記載之新亞甲 藍化口物、特開昭64-56767號公報所記載之蒽醌、特開平 2-1714號公報所記載之苯并咕噸染料、特開平2-226148號 公報及特開平2 - 2 2 6 1 4 9號各公報所記載之吖啶類、特公昭 40-28499號公報所記載之吡啶鍚鹽類、特公昭46-423 63號 -27- 200819915 公¥g所記載之化青苷類、特開平2-63〇53號公報所記載之 本并呋喃色料、特開平2-85858號公報、特開平2-216154 號各公報所載之共軛酮色料、特開昭5 7 1 〇 6 〇 5號各公報 所記載之色料。特公平2-3 03 2 1號公報所記載之偶氮肉桂 叉衍生物、特開平1 -287 1 05號公報所記載之花青苷色料、 特開昭6 2 _ 3 1 8 4 4號公報、特開昭6 2 - 3 1 8 4 8號公報、特開 昭62- 1 43 043號各公報所記載之咕噸系色料、特公昭 5 9 - 2 8 3 2 5號公邊所記載之胺基苯乙嫌基酮、特公昭6 1 - 9 6 2 1 號公報所記載之部花青色料、特開平2 _ i 7 9 6 4 3號公報所記 載之色料。特開平2-244050號公報所記載之部花青色料、 特公昭5 9-28 326號公報所記載之部花青色料、特公昭 59-89303號公報所記載之部花青色料、特開平8-129257號 公報所記載之部花青色料、特開平8 _ 3 3 4 8 9 7號公報所記載 之苯并吡喃系色料等。 此外,特別是以下的紅外線吸收劑(染料或顏料)亦可 適合使用作爲敏化色料。 較佳之前述染料可舉出例如特開昭5 8- 1 25246號、特 開昭59-84356號、特開昭59-202829號、特開昭60-78787 號各公報等所記載之花青苷染料、英國專利4 3 4,8 7 5號說 明書所記載之花青苷染料等。 又,美國專利第5,1 5 6,93 8號說明書所記載之紅外線吸 收敏化劑亦可適用,而且美國專利公開第3,8 8 1,9 2 4號說 明書所記載之取代芳基苯并(噻)吡啶鐵鹽、特開昭 57-142645號公報(美國專利第4,327,169號說明書)所記載 -28- 200819915 之三次甲基噻吡啶鑰鹽、特開昭5 8- 1 8 1 0 5 1號、同5 8-220 1 43 號、同 59-41363號、同 59-84248號、同 59-84249號、同 5 9- 1 46 063號、同5 9- 1 4606 1號公報所記載之吡啶鑰系化合 物、特開昭59-2 1 6 1 46號公報所記載之花青苷色料、美國 專利第4,283,475號說明書所記載之五次甲基噻吡啶鑰鹽 等、或特公平5-13514號、同5- 1 9702號公報所記載之吡 啶鑰化合物亦可適合使用。 又,較佳染料亦可舉出在美國專利第4,756,993號說明 書之式(I)、(II)所記載之紅外線吸收染料、歐洲專利 9 165 1 3 A2號說明書所記載之酞青系染料。 而且,特願平1 0-799 1 2號說明書所記載之陰離子性紅 外線吸收劑亦可適合使甩。 在此,陰離子性紅外線吸收劑係指在實質上吸收紅外 線之色料的母核未具有陽離子結構而是具有陰離子性結構 之物。可舉出例如(b 1)陰離子性金屬錯合物、(b 2)陰離子性 碳黑、(b3)陰離子性酞青、及(b4)下述通式A所示之化合 物。此等陰離子性紅外線吸收劑的雙陰離子係含有質子之 一價的陽離子、或是多價的陽離子。 通式 A [Ga· -M-Gb]m Xm + 在此,(b 1)陰離子性金屬錯合物係指在實質上吸收光 之錯合物部的中心金屬及在配位子整體爲陰離子之物。 (b2)陰離子性碳黑可舉出鍵結有磺酸、羧酸、膦酸基 等陰離子基作爲取代基之碳黑。將此等基導入碳黑,能夠 採用碳黑便覽第三版(碳黑協會編、1 995年4月5日、碳黑 -29- 200819915 協會發行)第1 2頁所記載之藉由規定的酸將碳黑氧化等之 手段。 (b3)陰離子性酞青係指在酞青骨架上鍵結有前述(b2) 的說明所舉出之陰離子基,而整體作爲陰離子之物。 接著,詳細地說明在前述(b4)通式A所示之化合物。 在前述通式A中,Ga·係表示陰離子性取代基,Gb係表示 中性的取代基。Xm +係表示含有質子之1〜m價的陽離子,m 0 係表示1至6的整數。Μ係表示共軛鍵,該共軛鍵Μ亦可 具有取代基或環結構。共軛鍵Μ可以由下述式表示, ^(C(^Kl) = C(-R2))n^C^(^R3) = 前述式中,R^R2、!^係各自獨立地表示氫原子、鹵 素原子、氰基、烷基、芳基、烯基、炔基、羰基、硫基、 磺醯基、亞磺醯基、氧基、胺基,此等亦可互相連結而形 成環結構。η係表示1〜8的整數。 又,陽離子性紅外線吸收劑、非離子性紅外線吸收劑 φ 亦可適合使用。 其他的染料可利用市售之染料及例如「染料便覽」(有 機合成化學協會編集、昭和45年刊)等文獻所記載之眾所 周知之物。具體上可舉出偶氮染料、金屬錯鹽偶氮染料' 吡唑啉酮偶氮染料、萘醌染料、蒽醌染料、酞青染料、碳 _翁染料、醌亞胺染料、次甲基染料、二亞鏡染料、胺鐵染 料、角鯊鑰色料、金屬硫醇鹽錯合物等的染料。 又’能夠使用作爲敏化色料之顏料,能夠利用市售的 顏料及色fe數(C · I ·)便覽、「最新顏料便覽」(日本顏料技術 30· 200819915 協會編、1 977年刊)、「最新顏料應用技術」(CMC出版、 1 9 86年刊)、「印刷印墨技術」(CMC出版、1 984年刊)所記 載之顏料。例如顏料的種類可舉出黑色顏料、黃色顏料、 撥色顏料、褐色顏料、紅色顏料、紫色顏料、藍色顏料、 綠色顏料、螢光顏料、金屬粉顏料、及聚合物結合色料。 具體上可使用不溶性偶氮顏料、偶氮深紅顏料、縮合偶氮 威料、鉗合偶氮顏料、酞青系顏料、蒽醌系顏料,茈及紫 φ 環酮顏料、硫靛系顏料、喹吖酮系顏料、二噚阱系顏料、 異吲哚滿酮系顏料、喹啉黃系顏料、染色色澱顏料、吖畊 顏料、亞硝基顏料、硝基顏料、天然顏料、螢光顏料、無 機顏料、碳黑等。此等顏料之中以碳黑爲佳。 此等顏料可未經表面處理而使用,亦可施加表面處理 而使用。 表面處理之方法可考慮表面塗布樹脂或蠟之方法;使 其黏附界面活性劑之方法;及使反應性物質(例如,矽烷偶 φ 合劑、環氧化合物、聚異氰酸酯等)鍵結於顏料表面之方法 等。前述的表面處理方法,係記載於「金屬鈉的性質與應 用」(幸書房)、「印刷印墨技術」(C M C出版、1 9 8 4年刊) 及「最新顏料應用技術」(CMC出版、1 986年刊)。 顏料的粒徑以0.01微米〜10微米爲佳,以0.05微米〜1 微米爲更佳,特別是以0.1微米〜1微米爲特佳。 分散顏之方法,能夠使用製造印墨及製造調色劑等時 所使用之眾所周知的技術。分散機可舉出超音波分散器、 砂磨機、立式球磨機、微粒碾磨機、超速硏磨機、球磨機、 -31- 200819915 葉輪機、分散機、KD磨機、膠體磨機、負阻管機、三輥磨 機、加壓揑合機等。在「最新顏料應用技術」(CMC出版、 1 9 8 6年刊)有詳細的記載。 本發明之敏化色料之更佳例子,可舉出上述特公昭 6 1 - 9 6 2 1號公報所記載之部花青色料、特開平2 - 1 7 9 6 4 3號 公報所記載之部花青色料、特開平2 - 2 4 4 0 5 0號公報所記載 之部花青色料、特公昭59-2 8 3 26號公報所記載之部花青色 φ 料、特開昭5 9 - 8 9 3 0 3號公報所記載之部花青色料、特願平 6 - 2 6 9 0 4 7號公報所記載之部花青色料、特開平8 _ 3 3 4 8 9 7號 公報所記載之苯并吡喃系色料。及上述特開平U-209001 號記載之紅外線吸收劑。 本發明之敏化色料適合單獨或倂用2種以上而使用。 而且,本發明的光聚合性組成物亦可添加眾所周知之具有 更提升敏感度、或是抑制氧引起的聚合阻礙等作用之化合 物作爲共敏化劑。 • 此等敏化色料係使用何種結構、單獨使用或倂用2種 以上、及添加量如何等使用方法,可配合最終感材的性能 設計而適當地設定。 例如,藉由倂用2種以上的敏化色料,能夠提高對感 光性組成物層的相溶性。選擇敏化色料時,除了感光性以 外,在使用光源之發光波長之莫耳吸光係數係重要因素。 因爲藉由使用莫耳吸光係數大色料,因爲色料的添加量能 變得比較少,較爲經濟、且使用於平版印刷版原版時,從 其感光層的膜物性而言,亦較有利。因爲該感光層的感光 -32- 200819915 性、解像度、或曝光膜的物性受到在光源波長的吸光度之 重大影響,宜考慮此等而適當地設定敏化色料的添加量。 以比較薄的膜厚度使用之平版印刷版,在使用時敏化 色料的添加量係設定在感光層的吸光度爲0 . 1〜1.5的範 圍’以設定在0.25〜1的範圍爲佳。利用作爲平版印刷版時, 通常,相對於感光層成分爲1 00質量份,敏化色料的添加 量爲0.05〜30質量份,以〇.1〜20質量份爲佳,以0.2〜10 質量份的範圍爲更佳。 關於本發明之敏化色料,使用作爲平版印刷版原版 時,爲了改良其感光層的特性,亦可進而進行各,種化學改 性。例如,藉由共價鍵、離子鍵、氫鍵等方法使敏化色料 與加成聚合物化合物結構(例如,丙烯醯基或甲基丙烯醯基) 進行鍵結,能夠使曝光膜高強度、或進行抑制曝光後色料 從膜之不需要的析出。 而且,使用本發明的感光性組成物作爲平版印刷版用 原版時,爲了提高該感光層對較佳態樣之(鹼)水系顯像液 之處理適合性,導入親水性部位(羧基及其酯、磺酸基及其 酯、環氧乙烷基等的酸基或極性基)係有效的。特別是酯型 的親水性基,其特徵係因爲具有比較疏水性的結構所以在 該感光層中之相溶性優良,且因爲在顯像液中藉由加水分 解生成酸基,親水性增大。此外,例如,爲了提高在該感 光層中的相溶性、抑制結晶析出,能夠導入適當的取代基。 例如’爲了提局方基、或矯丙基等不飽和鍵之相溶性,會 有某種感光系係非常有效之情形,又,藉由導入分枝烷基 -33- 200819915 結構等方法,來導入色料π平面間立體障礙,能夠顯著地 抑制結晶析出。又,藉由導入膦酸基或環氧基、三烷氧基 砂院基等’能夠提高對金屬或金屬氧化物等無機物之黏附 性。此外,亦能夠按照目的,利用聚合物化等方法。 上述敏化色料中,能夠與具有上述通式(I)所示結構之 咪哩型化合物形成高敏感度引發系之敏化色料,以選自香 豆素色料、苯乙烯系色料、花青苷色料、部花青色料之敏 0 化色料爲更佳。 此等敏化色料係使用何種結構、單獨使用或倂用2種 以上、及添加量如何等使用方法,可配合最終感材的性能 • 設計而適當地設定。 例如,藉由倂用2種以上的敏化色料,能夠提高對感 光性組成物層的相溶性。選擇敏化色料時,除了感光性以 外,在使用光源之發光波長之莫耳吸光係數係重要因素。 因爲藉由使用莫耳吸光係數大色料,因爲色料的添加量能 φ 變得比較少,較爲經濟、且使用於平版印刷版原版時,從 其感光層的膜物性而言,亦較有利。因爲該感光層的感光 性、解像度、或曝光膜的物性受到在光源波長的吸光度之 重大影響,宜考慮此等而適當地設定敏化色料的添加量。 其中,對於使5微米以上之厚膜硬化之目的,會有低 吸光度反而能夠提高硬化度之情形。以比較薄的膜厚度使 用之平版印刷版,在使用時敏化色料的添加量係設定在感 光層的吸光度爲0·1〜1·5的範圍,以設定在0.25〜1的範圍 爲佳。利用作爲平版印刷版時,通常,相對於感光層成分 -34- 200819915 爲100質量份,敏化色料的添加量爲0.05〜30質量份,以 0 · 1〜2 0質量份爲佳,以〇 · 2〜1 〇質量份的範圍爲更佳。 (C)聚合物化合物 使用在本發明感光層之聚合性化合物,係具有至少一 個乙烯性不飽和雙鍵之加成聚合性化合物,係選自具有至 少1個、較佳是2個以上之化合物,通常,係能夠藉由自 由基或酸之至少一者來產生加成聚合反應之化合物。 此種化合物群組在該產業領域係廣被知悉之物,在本 發明,能夠未限定地使用此等。此等係具有例如單體、預 聚物、亦即二聚物、三聚物及低聚物、或是此等的共聚物 和此等的混合物等之化學形態。單體的例子,能夠使用不 飽和羧酸(例如,丙烯酸、甲基丙烯酸、伊康酸、巴豆酸、 異巴豆酸、順丁烯二酸等)、或其酯類、醯胺類,較佳是使 用不飽和羧酸與脂肪族多元醇化合物之酯、不飽和羧酸與 脂肪族多元胺化合物之醯胺。又,具有羥基或胺基、氫硫 基等親核性取代基之不飽和羧酸酯或醯胺類與單官能或多 官能異氰酸酯類或環氧類之加成反應物、及與單官能或多 官能的羧酸之脫水縮合反應物等亦可適合使用。又,具有 異氰酸酯基、或環氧基等的親電子性取代基之不飽和羧酸 酯或醯胺類與單官能或多官能的醇類、胺類、硫醇類之加 成反應物、而且具有鹵素基、或對甲苯磺醯氧基的脫離性 取代基之不飽和羧酸酯或是醯胺類與單官能或多官能的醇 類、胺類、硫醇類之取代反應物亦適合。又,另外的例子, 亦能夠使用將上述不飽和羧酸以不飽和膦酸、苯乙烯、乙 -35- 200819915 烯醚等取代而成的化合物群組。 脂肪族多元醇化合物與不飽和羧酸之酯之單體的具體 例’丙烯酸酯有乙二醇二丙烯酸酯、三甘醇二丙烯酸酯、 】,3_ 丁二醇二丙烯酸酯、伸丁二醇二丙烯酸酯、丙二醇二 丙烯酸酯、新戊二醇二丙烯酸酯、三羧甲基三丙烯酸酯、 二羧甲基丙院三(丙烯醯氧基丙基)醚、三竣甲基乙院三丙 烯酸酯、己二醇二丙烯酸酯、1,4 -環己二醇二丙烯酸酯、 四甘醇二丙烯酸酯、新戊四醇二丙烯酸酯、新戊四醇三丙 烯酸酯、新戊四醇四丙烯酸酯、二新戊四醇二丙烯酸酯、 二新戊四醇六丙烯酸酯、山梨糖醇三丙烯酸酯、山梨糖醇 四丙烯酸酯、山梨糖醇五丙烯酸酯、山梨糖醇六丙烯酸酯、 參(丙烯醯氧基乙基)三聚異氰酸酯、三聚異氰酸E〇改性三 丙烯酸酯、聚酯型丙烯酸酯低聚物等。 甲基丙烯酸酯有四甘醇二甲基丙烯酸酯、三甘醇二甲 基丙烯酸酯、新戊二醇二甲基丙烯酸酯、三羥甲基丙烷三 甲基丙烯酸酯、三羥甲基乙烷三甲基丙烯酸酯、乙二醇二 甲基丙烯酸酯、1,3-丁二醇二甲基丙烯酸酯、己二醇二甲 基丙烯酸酯、新戊四醇二甲基丙烯酸酯、新戊四醇三甲基 丙烯酸酯、新戊四醇四甲基丙烯酸酯、二新戊四醇二甲基 丙烯酸酯、二新戊四醇六甲基丙烯酸酯、山梨糖醇三甲基 丙烯酸酯、山梨糖醇四甲基丙烯酸酯、雙[對_(3-甲基丙嫌 醯氧基-2-羥基丙氧基)苯]甲基甲烷、雙_[對(甲基丙烯醯氧 基乙氧基)苯基]二甲基甲烷等。 伊康酸酯有乙二醇二伊康酸酯、丙二醇二伊康酸酯、 -36- 200819915 1,3-丁二醇二伊康酸酯、1,4-丁二醇二伊康酸酯、四甘醇二 伊康酸酯、新戊四醇二伊康酸酯、山梨糖醇四伊康酸酯等。 巴豆酸酯有乙二醇二巴豆酸酯、四甘醇二巴豆酸酯、新戊 四醇二巴豆酸酯、山梨糖醇四巴豆酸酯等。異巴豆酸酯有 乙二醇二異巴豆酸酯、新戊四醇二異巴豆酸酯、山梨糖醇 四異巴豆酸酯等。順丁烯二酸酯有乙二醇二順丁燒二酸 酯、三甘醇二順丁烯二酸酯、新戊四醇二順丁烯二酸酯、 山梨糖醇四順丁烯二酸酯等。 其他的酯之例子,例如有特公昭5 1 - 4 7 3 3 4、特開昭 5 7- 1 9623 1所記載之脂肪族醇系酯類、或特開昭5 9- 5240、 特開昭5 9-524 1、特開平2-226 1 49所記載之具有芳香族系 骨架之物、特開平1 - 1 6 5 6 1 3所記載之含有胺基之物等。而 且,前述酯單體亦能夠以混合物的形式使用。 又,脂肪族多元胺化合物與不飽和羧酸之醯胺的單體 之具體例有亞甲基雙丙烯醯胺、亞甲基雙甲基丙烯醯胺、 1,6-六亞甲基雙丙烯醯胺、1,6-六亞甲基雙甲基丙烯醯胺、 二伸乙三胺三丙烯醯胺、苯二甲基雙丙烯醯胺、苯二甲基 雙甲基丙烯酸酯等。其他的較佳醯胺系單體可舉出例如特 公昭54-2 1 726號公報所記載之具有環己烯結構之物。 又,使用異氰酸酯與羥基的加成反應而製成的胺基甲 酸酯系加成聚合性化合物亦佳,此種具體例可舉出例如特 公昭48-41708號公報中所記載之對在1分子具有2個以上 異氰酸酯基之聚異氰酸酯化合物,加添下述通式(A)所示之 含有羥基之乙烯單體而成之在1分子中具有2個以上聚合 -37- 200819915 物乙烯基之乙烯基胺基甲酸酯化合物等。 CH2 = C(R4)COOCH2CH(R5)OH (a) (其中,通式(a)中,R4及R5係表示Η或CH3) 又,特開昭5卜37193號、特公平2-32293號、及特公 平2- 1 6765號所記載之丙烯酸胺基甲酸酯類、特公昭 5 8-498 60號、特公昭56- 1 7654號、特公昭62-3 94 1 7號、 及特公昭62-39418號所記載之具有環氧乙烷系骨架之胺基 甲酸酯化合物類亦佳。而且藉由使用特開昭6 3 -277 65 3號、 特開昭63-260909號、及特開平1-105238號所記載之在分 子內具有胺基結構或硫絡(sulfide)結構之加成聚合性化合 物,能夠得到感光速度非常優良之光聚合性組成物。 其他的例子,可舉出例如特開昭4 8-64 1 8 3號、特公昭 49-431 9 1號、及特公昭52-30490號各公報所記載之聚酯型 丙烯酸酯類、及環氧樹脂與(甲基)丙烯酸而成之環氧丙烯 酸酯類等多官能丙烯酸酯或甲基丙烯酸酯。又,亦可舉出 例如特公昭4 6-43 946號、特公平1 -403 3 7號、及特公平 1 -403 36號各公報所記載之特定不飽和化合物、或特開平 2-25493號所記載之乙烯基磺酸系化合物。又,某種情況 下,特開昭6 1 -22048號所記載之含有全氟烷基結構係適合 使用的。而且,亦可使用日本黏著協會刊物第2 0卷、第7 期、第3 00〜3 0 8頁( 1 984年)介紹作爲光硬化性單體及低聚 物之物。 此等加成聚合性化合物之結構、單獨使用或倂用、添 加量使用方法之詳細能夠配合硬化性組成物最後性能設計 -38· 200819915 而任意設定。例如,能夠從以下觀點選擇。從敏感度而言, 以每1分子之不飽和基含量多的結構爲佳,多半情況係以 2官能基以上爲佳。又,爲了提高硬化膜的強度’以3官 能以上之物爲更佳,而且,藉由倂用不同官能數、不同聚 合性基(例如丙烯酸酯、甲基丙烯酸酯、苯乙烯系化合物、 乙烯基醚系化合物),來調節敏感度及強‘度雙方的方法亦是 有效的。 又,對於與在感光層中的其他成分(例如,黏合劑聚合 物、聚合引發劑、著色劑等)之相溶性、分散性,聚合性化 合物的選擇、使用方法係重要因素,例如藉由使用低純度 化合物或倂用2種以上,能夠提升相溶性。又,爲了提高 與基板等的黏附性之目的,亦能夠選擇特定結構。 相對於感光層的總固體成分,上述之聚合性化合物以 在5〜80質量%的範圍使用爲佳,以在25〜75質量%的範圍 爲更佳。又,此等可單獨使用亦可倂用2種以上。此外, 聚合性化合物的使用法,能夠從對氧之聚合阻礙大小、解 像度、泛白性、折射係數變化、表面黏附性等觀點而任意 地選擇適合的結構、調配、及添加量,而且亦可依照情況, 考慮底塗、上塗之層結構及塗布方法。. <(D)黏合劑聚合物> 將本發明的感光性組成物應用在較佳實施形態之平版 印刷版用原版的感光層時,除了前述的光聚合引發系及加 成聚合性化合物以外,以更使用黏合劑聚合物爲佳。在本 發明之感光性組成物所含有的黏合劑聚合物係具有作爲感 -39- 200819915 光劑的皮膜形成劑功能之聚合物,以含有線狀有機高分子 聚合物爲佳。此種「線狀有機高分子聚合物」可以使用任 何一種。 此種黏合劑聚合物之例子,以選自丙烯酸樹脂、聚乙 烯基縮醛樹脂、聚胺基甲酸酯、聚醯胺樹脂、環氧樹脂、 甲基丙烯酸樹脂、苯乙烯系樹脂、及聚酯樹脂之高分子爲 佳。其中,以丙烯酸樹脂、聚胺基甲酸酯樹脂爲佳。 而且,爲了提高影像部的皮膜強度,亦可使黏合劑聚 合物具有交聯性。 爲了使黏合劑聚合物具有交聯性,可在高分子的主鏈 中或側鏈中導入乙烯性不飽和鍵等交聯性官能基。交聯劑 官能基可以藉由共聚合導入、亦可藉由高分子反應來導入。 在此,交聯性基係指在使平版印刷版原版曝光時在感 光層中引起自由基聚合反應之過程,能夠使高分子黏合劑 交聯之基。若是此種基時沒有特別限定,可舉出例如能夠 進行加成聚合反應之官能基可舉出乙烯性不飽和鍵基、胺 基、環氧基等。又,能夠藉由光照射而得到自由基之官能 基亦可,此種交聯性基可舉出例如硫醇基、鹵素基、鑰鹽 結構等。其中,以乙烯性不飽和鍵基爲佳,以下述通式(1)〜(3) 所示官能基爲特佳。 在上述通式(l),:^1〜R3係各自獨立地表示氫原子或1 價的有機基,R1可舉出氫原子或是可具有取代基之烷基爲 -40- 200819915 佳’其中因爲氫原子、甲基之自由基反應性較高,乃是較 佳。又,R2、R3係各自獨立地表示氫原子、鹵素原子、胺 基、羧基、烷氧基羰基、磺酸基、硝基、氰基、可具有取 代基之烷基、可具有取代基之芳基、可具有取代基之烷氧 基、可具有取代基之芳氧基、可具有取代基之烷胺基、可 具有取代基之芳胺基、可具有取代基之烷基磺醯基、可具 有取代基之芳基磺醯基,其中,因爲自由基反應性較高, 以氫原子、羧基、院氧基羰基、可具有取代基之院基、可 ® 具有取代基之芳基爲佳。 X係表示氧原子、硫原子、或N(R12)·,R12係表示氫 原子、或1價的有機基。在此,R12可舉出可具有取代基之 烷基,其中,因爲自由基反應性較高,以氫原子、甲基、 乙基、異丙基爲佳。 在此,能夠導入的取代基,可舉出烷基、烯基、炔基、 芳基、烷氧基、芳氧基、鹵素原子、胺基、烷胺基、芳胺 基、殘基、院氧基簾基、擴酸基、硝基、氨基、釀胺基、 烷基磺醯基、芳基磺醯基等。 f f R5 B6 R7 一般式(2) 在上述通式(2),R4〜R8係各自獨立地表示氫原子或1 價的有機基,R4〜R8可舉出氫原子、鹵素原子、胺基、二 烷胺基、羧基、烷氧基羰基、磺酸基、硝基、氰基、可具 有取代基之烷基、可具有取代基之芳基、可具有取代基之 院氧基、可具有取代基之芳氧基、可具有取代基之烷胺基、 -41- 200819915 可具有取代基之芳胺基、可具有取代基之烷基磺醯基、可 具有取代基之芳基磺醯基,其中,以氫原子、羧基、烷氧 基鑛基、可具有取代基之烷基、可具有取代基之芳基爲佳。 能夠導入之取代基,可例示與通式(1)同樣之物。又, Y係表示氧原子、硫原子、或N(Ri2)。Ri2係與通式(1)之 R12的情形同義,較佳之例子亦同樣。 —z-o^? 一般式(3)Other diimidazole-type compounds can also be synthesized in the same manner by appropriately selecting a starting material, a compound to be added, and the like. The diimidazole-type compound of the photosensitive composition of the present invention is preferably contained in an amount of from 0.5 to 20% by mass, more preferably from 1 to 10% by mass, based on the total solid content of the photosensitive composition. In the present invention, in addition to the specific diimidazole type compound described above, other well-known photopolymerization initiators, thermal polymerization initiators and the like may be selected without damaging the effects of the present invention. Examples of the polymerization initiator which can be used include, for example, a well-known sulfonium salt having a decanoic acid structure in a bication portion, a tri-trap compound having a trihalomethyl group, a peroxide, and an azo polymerization. Initiator, azide compound, quinonediazide, and the like. Specific examples of the iron salt of a preferred polymerization initiator which can be used include those described in paragraphs [003 0] to [0 0 3 3 ] of JP-A-200 1 _ 1 3 3 969. When another polymerization initiator is used, the content is preferably 50% by mass or less based on the specific diimidazole type compound. The radical generating agent (the specific diim- 26-200819915 azole type compound and the initiator used as necessary) which can be used in the present invention preferably has a maximum absorption wavelength of 500 nm or less, and 400 nm. The following is better. (B) Sensitized colorant The sensitizing coloring matter used in the photosensitive composition of the present invention preferably has an absorption peak (maximum absorption wavelength) at 305 to 850 nm. Such a sensitizing coloring material may be a dye or a pigment shown below which is a photosensitive coloring material and a light absorbing light source and interacting with a photopolymerization initiator. Preferred photosensitive photosensens or dyes include polynuclear aromatics (for example, anthraquinone, anthracene, tri-ortylene), xanthene (for example, luciferin, eosin, erythromycin, rhodamine B). , rose red), anthocyanins (such as thiablycine, anthocyanin), merocyanines (such as merocyanine, carbon, cyanine), tiofia (for example, thiazide, sub Blue, toluidine blue), acridine (eg, acridine orange, chloroflavon, acridine yellow), indigo (eg, indigo, metal indigo), porphyrins (eg, tetraphenyl) Porphyrins, central metal-substituted porphyrins, chlorophylls (eg, chlorophyll, chlorophyllin, central metal-substituted chlorophyll), metal complexes, terpenoids (eg, onion), horn shark keys (eg, snail key) )Wait. For example, the styrene dyes described in JP-A-37-13034, and the cationic dyes described in JP-A-62-143044, and JP-A-59-234噚 特 特 特 特 蒽醌 蒽醌 蒽醌 蒽醌 蒽醌 蒽醌 蒽醌 蒽醌 蒽醌 蒽醌 蒽醌 蒽醌 蒽醌 蒽醌 蒽醌 蒽醌 蒽醌 蒽醌 蒽醌 蒽醌 蒽醌 蒽醌 蒽醌 蒽醌 蒽醌 蒽醌 蒽醌 蒽醌 蒽醌 蒽醌 蒽醌 蒽醌 蒽醌 蒽醌 蒽醌 蒽醌 蒽醌 蒽醌 蒽醌 蒽醌 蒽醌 蒽醌 蒽醌 蒽醌 蒽醌 蒽醌 特Benzene xanthene dyes, which are described in the Unexamined-Japanese Patent Publication No. Hei. No. Hei. No. Hei. In the case of the pyridinium salt, the sulphuric acid coloring matter described in the publication of the Japanese Patent Publication No. Sho 46-423 No. -27-200819915 The conjugated ketone coloring matter disclosed in each of the publications of Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. Anthocyanin derivative described in Japanese Unexamined Patent Publication No. Hei No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. In the bulletin, JP-A-6- 3 1 8 4 8 and JP-A-62-1-443, each of the bullets, and the public body of the public, No. 5 9 - 2 8 3 2 5 The amino acid described in the publication of the Japanese Patent Publication No. JP-A No. 61-96, and the color material described in Japanese Patent Publication No. Hei. A part of the cyanine color material described in the Unexamined-Japanese-Patent No. 2-244050, and the part of the cyanine color material described in the Japanese Patent Publication No. Sho 59-89303 The phthalocyanine coloring material described in the publication No. 129257, and the benzopyran coloring material described in JP-A-8-3839897. Further, in particular, the following infrared absorbing agents (dyes or pigments) can also be suitably used as the sensitizing colorant. The anthocyanins described in, for example, Japanese Laid-Open Patent Publication No. Hei 59- No. Hei. Dye, anthocyanin dyes and the like described in the specification of British Patent No. 4 3 4,87.5. Further, the infrared absorbing sensitizer described in the specification of U.S. Patent No. 5,155,93,8 is also applicable, and the substituted arylbenzene described in the specification of U.S. Patent No. 3,8 8 1,9 2 4 And the three-methylthiopyridine salt of -28-200819915, which is described in the specification of U.S. Patent No. 4,327,169, which is described in the specification of U.S. Patent No. 4,327,169, and the Japanese Patent Publication No. 5-8-108 1 0 5 No. 1, No. 5, No. 8-220, No. 1, No. 59-41363, No. 59-84248, No. 59-84249, No. 5 9- 1 46 063, and No. 5 9- 1 4606 The pyridyl key compound, the anthocyanin color material described in JP-A-59-2 1 6 1 46, the pentamethylthiopyridine salt described in the specification of U.S. Patent No. 4,283,475, or the like. The pyridyl compound described in the publication No. -13514 and the publication No. 5-197702 can also be suitably used. Further, preferred dyes include the infrared absorbing dyes described in the formulas (I) and (II) of the specification of U.S. Patent No. 4,756,993, and the indigo dyes described in the specification of European Patent No. 9 165 1 3 A2. Further, the anionic infrared absorbing agent described in the specification of Japanese Patent Application No. Hei No. 0-799 No. 1 is also suitable for the ruthenium. Here, the anionic infrared absorbing agent means a substance having an anionic structure in which a mother nucleus which substantially absorbs infrared rays has no cationic structure. For example, (b 1) an anionic metal complex, (b 2) an anionic carbon black, (b3) an anionic indigo, and (b4) a compound represented by the following formula A may be mentioned. The dianion of these anionic infrared absorbing agents contains a monovalent cation of a proton or a polyvalent cation. Formula A [Ga·-M-Gb]m Xm + Here, (b 1) an anionic metal complex refers to a central metal which substantially absorbs light in a complex portion and an anion in the entire ligand. Things. (b2) The anionic carbon black may be a carbon black in which an anion group such as a sulfonic acid, a carboxylic acid or a phosphonic acid group is bonded as a substituent. The introduction of these groups into carbon black can be specified by the third edition of Carbon Black Handbook (edited by the Carbon Black Association, issued on April 5, 995, issued by the Society of Carbon Black-29-200819915). Acid means to oxidize carbon black. (b3) Anionic indigo refers to an anion group exemplified in the above description of (b2) bonded to the indigo skeleton, and the whole is an anion. Next, the compound represented by the above formula (b4) Formula A will be described in detail. In the above formula A, Ga· represents an anionic substituent, and Gb represents a neutral substituent. Xm + represents a cation having a valence of 1 to m of a proton, and m 0 represents an integer of 1 to 6. The lanthanide represents a conjugated bond, and the conjugated ruthenium may have a substituent or a ring structure. The conjugated bond Μ can be expressed by the following formula: ^(C(^Kl) = C(-R2))n^C^(^R3) = In the above formula, R^R2, ! ^ each independently represents a hydrogen atom, a halogen atom, a cyano group, an alkyl group, an aryl group, an alkenyl group, an alkynyl group, a carbonyl group, a thio group, a sulfonyl group, a sulfinyl group, an oxy group, an amine group, and the like. They can be joined to each other to form a ring structure. The η system represents an integer of 1 to 8. Further, a cationic infrared ray absorbing agent or a nonionic infrared absorbing agent φ can also be suitably used. For other dyes, commercially available dyes and those known in the literature such as "Dyestuffs" (edited by the Organic Synthetic Chemistry Association, Showa 45) are well known. Specific examples thereof include an azo dye, a metal salt azo dye, a pyrazolone azo dye, a naphthoquinone dye, an anthraquinone dye, an indigo dye, a carbon dye, a quinone imine dye, and a methine dye. , dyes such as dihroscopic dyes, amine iron dyes, shark key pigments, metal thiolate complexes, and the like. In addition, it is possible to use a pigment which is a sensitizing coloring material, and it is possible to use a commercially available pigment and color number (C · I ·), a "newest pigments" (Japanese pigment technology 30 · 200819915 association, 1 977), Pigments described in "The Latest Pigment Application Technology" (CMC Publishing, 1986), "Printing Ink Technology" (CMC Publishing, 1 984). For example, examples of the type of the pigment include a black pigment, a yellow pigment, a dial pigment, a brown pigment, a red pigment, a violet pigment, a blue pigment, a green pigment, a fluorescent pigment, a metallic powder pigment, and a polymer-bonded colorant. Specifically, an insoluble azo pigment, an azo magenta pigment, a condensed azodicarb, a azo pigment, an indigo pigment, an anthraquinone pigment, an anthracene and a violet φ cyclic ketone pigment, a thioindigo pigment, and a quinine can be used. Anthrone-based pigments, diterpene trap pigments, isoindolinone pigments, quinoline yellow pigments, dyed lake pigments, sputum pigments, nitroso pigments, nitro pigments, natural pigments, fluorescent pigments, Inorganic pigments, carbon black, etc. Among these pigments, carbon black is preferred. These pigments may be used without surface treatment or may be applied by surface treatment. The surface treatment method may consider a method of coating a resin or a wax on the surface; a method of adhering the surfactant; and bonding a reactive substance (for example, a decane coupling agent, an epoxy compound, a polyisocyanate, etc.) to the surface of the pigment. Method, etc. The above surface treatment methods are described in "The Properties and Applications of Metallic Sodium" (Lucky House), "Printing Ink Technology" (CMC Publishing, 1984) and "Latest Pigment Application Technology" (CMC Publishing, 1 986 issue). The particle diameter of the pigment is preferably from 0.01 μm to 10 μm, more preferably from 0.05 μm to 1 μm, particularly preferably from 0.1 μm to 1 μm. The method of dispersing the pigment can use a well-known technique used in the production of inks and toners. The dispersing machine can be exemplified by ultrasonic disperser, sand mill, vertical ball mill, particle mill, super speed honing machine, ball mill, -31- 200819915 blade turbine, disperser, KD mill, colloid mill, negative resistance Pipe machine, three-roll mill, pressure kneader, etc. The "Latest Pigment Application Technology" (CMC Publishing, 1986) is described in detail. More preferred examples of the sensitizing coloring material of the present invention include those described in Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. 6-1-96. The part of the cyanine color material, the part of the cyanine color material described in the Unexamined-Japanese-Patent No. 2 - 2 4 4 0 0 0, and the part of the flower cyan φ material described in the Gaza 59-2 8 3 26 In the section of the squid, the squid, and the shoji, the shoji, the shoji, the shoji, the shoji, the shoji, the shoji, the shoji, the sho. Benzopyran coloring material. And the infrared absorbing agent described in JP-A-U-209001. The sensitizing colorant of the present invention is preferably used alone or in combination of two or more. Further, the photopolymerizable composition of the present invention may be added as a co-sensitizer with a compound known to have an effect of improving sensitivity or inhibiting polymerization by oxygen. • The structure in which these sensitizing pigments are used, whether they are used alone or in combination, and how to use them, can be appropriately set in accordance with the performance design of the final material. For example, by using two or more kinds of sensitizing pigments, the compatibility with the photosensitive composition layer can be improved. When the sensitizing colorant is selected, in addition to the photosensitivity, the Mohr absorption coefficient at the light-emitting wavelength of the light source is an important factor. Since the coloring material can be used in a large amount by using a molar absorption coefficient, since the amount of the coloring material can be relatively small, it is economical, and when used in a lithographic printing plate precursor, it is advantageous from the film properties of the photosensitive layer. . Since the sensitivity of the photosensitive layer, the resolution, or the physical properties of the exposed film are greatly affected by the absorbance at the wavelength of the light source, it is preferable to appropriately set the addition amount of the sensitized colorant. In the lithographic printing plate used for a relatively thin film thickness, the amount of the sensitizing colorant added in the photosensitive layer is set to be in the range of 0.25 to 1 in the range of 0.25 to 1 in which the absorbance of the photosensitive layer is 0.1 to 1.5. When it is used as a lithographic printing plate, the amount of the sensitizing colorant is usually 0.05 to 30 parts by mass, preferably 0.1 to 20 parts by mass, and preferably 0.2 to 10 parts by mass, based on 100 parts by mass of the photosensitive layer component. The range of parts is better. When the sensitizing colorant of the present invention is used as a lithographic printing plate precursor, various chemical modifications can be carried out in order to improve the characteristics of the photosensitive layer. For example, by bonding a sensitizing colorant to an addition polymer compound structure (for example, an acrylonitrile group or a methacrylic acid group) by a covalent bond, an ionic bond, a hydrogen bond, or the like, the exposed film can be made high in strength. Or performing unnecessary precipitation of the colorant from the film after the exposure is suppressed. Further, when the photosensitive composition of the present invention is used as a master for a lithographic printing plate, a hydrophilic portion (carboxyl group and ester thereof) is introduced in order to improve the handling suitability of the photosensitive layer for a preferred (alkali) aqueous developing solution. An acid group or a polar group such as a sulfonic acid group or an ester thereof or an oxiranyl group is effective. In particular, the hydrophilic group of the ester type is characterized in that it has a relatively hydrophobic structure and is excellent in compatibility in the photosensitive layer, and the hydrophilicity is increased by the hydrolysis to form an acid group in the developing solution. Further, for example, in order to improve the compatibility in the photosensitive layer and suppress crystallization, an appropriate substituent can be introduced. For example, in order to extract the square base or the compatibility of unsaturated bonds such as propyl groups, a certain photosensitive system is very effective, and by introducing a branched alkyl-33-200819915 structure or the like, By introducing a steric barrier between the π planes of the coloring matter, crystallization can be remarkably suppressed. Further, by introducing a phosphonic acid group, an epoxy group, a trialkoxy sand compound, or the like, adhesion to an inorganic substance such as a metal or a metal oxide can be improved. Further, it is also possible to use a method such as polymerization according to the purpose. In the above sensitizing coloring matter, a sensitizing coloring agent capable of forming a high sensitivity initiating line with a bismuth-type compound having a structure represented by the above formula (I), which is selected from a coumarin coloring material and a styrene coloring material It is better to use an anthocyanin coloring agent or a sage coloring material. These sensitizing pigments are used in such a structure, used alone or in combination of two or more, and the amount of addition, and can be appropriately set in accordance with the performance of the final material. For example, by using two or more kinds of sensitizing pigments, the compatibility with the photosensitive composition layer can be improved. When the sensitizing colorant is selected, in addition to the photosensitivity, the Mohr absorption coefficient at the light-emitting wavelength of the light source is an important factor. Because by using the More absorption coefficient large color material, since the additive amount φ of the color material becomes relatively small, it is economical, and when used in the lithographic printing plate precursor, the film properties of the photosensitive layer are also compared. advantageous. Since the photosensitivity of the photosensitive layer, the resolution, or the physical properties of the exposed film are greatly affected by the absorbance at the wavelength of the light source, it is preferable to appropriately set the amount of addition of the sensitized toner. Among them, for the purpose of hardening a thick film of 5 μm or more, there is a case where the low absorbance is low and the degree of hardening can be improved. In the lithographic printing plate used for a relatively thin film thickness, the amount of the sensitizing colorant added during use is set in the range of 0. 1 to 1.5 in the photosensitive layer, preferably in the range of 0.25 to 1. . When it is used as a lithographic printing plate, the amount of the sensitizing colorant is usually 0.05 to 30 parts by mass, preferably 0 to 1 part by mass to 0 parts by mass, based on 100 parts by mass of the photosensitive layer component -34 to 200819915. 〇· 2~1 〇 The range of parts by mass is better. (C) Polymer compound The polymerizable compound used in the photosensitive layer of the present invention is an addition polymerizable compound having at least one ethylenically unsaturated double bond, and is selected from compounds having at least one, preferably two or more compounds. Usually, it is a compound capable of generating an addition polymerization reaction by at least one of a radical or an acid. Such a group of compounds is widely known in the industrial field, and the present invention can be used without limitation. These have chemical forms such as monomers, prepolymers, i.e., dimers, trimers, and oligomers, or copolymers of these, and mixtures thereof. As an example of the monomer, an unsaturated carboxylic acid (for example, acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, etc.), or an ester thereof or a guanamine can be used, preferably. It is an ester of an unsaturated carboxylic acid and an aliphatic polyol compound, and an amide of an unsaturated carboxylic acid and an aliphatic polyamine compound. Further, an unsaturated carboxylic acid ester having a nucleophilic substituent such as a hydroxyl group, an amine group or a thiol group, or an addition reaction product of a monofunctional or polyfunctional isocyanate or epoxy group, and a monofunctional or A dehydration condensation reaction product of a polyfunctional carboxylic acid or the like can also be suitably used. Further, an addition reaction product of an unsaturated carboxylic acid ester or an oxime amine having an isocyanate group or an electrophilic substituent such as an epoxy group, and a monofunctional or polyfunctional alcohol, an amine or a thiol, The unsaturated carboxylic acid ester having a halogen-based or p-toluenesulfonyloxy group-releasing substituent or a substituted reactant of a guanamine and a monofunctional or polyfunctional alcohol, an amine or a thiol is also suitable. Further, as another example, a group of compounds obtained by substituting the above unsaturated carboxylic acid with an unsaturated phosphonic acid, styrene, ethyl-35-200819915 alkenyl ether or the like can also be used. Specific examples of the monomer of the aliphatic polyol compound and the ester of the unsaturated carboxylic acid, such as ethylene glycol diacrylate, triethylene glycol diacrylate, 1,3-butanediol diacrylate, butylene glycol Diacrylate, propylene glycol diacrylate, neopentyl glycol diacrylate, tricarboxymethyl triacrylate, dicarboxymethyl propyl tris(propylene oxypropyl) ether, triterpene methyl ketone triacrylate Ester, hexanediol diacrylate, 1,4-cyclohexanediol diacrylate, tetraethylene glycol diacrylate, neopentyl alcohol diacrylate, neopentyl alcohol triacrylate, neopentyl alcohol tetraacrylate Ester, dipentaerythritol diacrylate, dipentaerythritol hexaacrylate, sorbitol triacrylate, sorbitol tetraacrylate, sorbitol pentaacrylate, sorbitol hexaacrylate, ginseng Acryloxyethyl)trimeric isocyanate, trimeric isocyanate E oxime modified triacrylate, polyester acrylate oligomer, and the like. Methacrylates are tetraethylene glycol dimethacrylate, triethylene glycol dimethacrylate, neopentyl glycol dimethacrylate, trimethylolpropane trimethacrylate, trimethylolethane Trimethacrylate, ethylene glycol dimethacrylate, 1,3-butylene glycol dimethacrylate, hexanediol dimethacrylate, pentaerythritol dimethacrylate, neopentyl Alcohol trimethacrylate, neopentyl alcohol tetramethacrylate, dipentaerythritol dimethacrylate, dipentaerythritol hexamethacrylate, sorbitol trimethacrylate, sorbose Alcohol tetramethacrylate, bis[p-(3-methylpropenyloxy-2-hydroxypropoxy)benzene]methylmethane, bis-[p-(methacryloxyethoxyethoxy) Phenyl] dimethylmethane and the like. Ikonic acid esters are ethylene glycol dicone ester, propylene glycol diconcanate, -36- 200819915 1,3-butanediol diconconate, 1,4-butanediol diconconate , tetraethylene glycol diconconate, neopentyl alcohol diconconate, sorbitol tetraconcanate, and the like. The crotonate is ethylene glycol dicrotonate, tetraethylene glycol dicrotonate, neopentyl dicrotonate, sorbitol tetracrotonate, and the like. The isocrotonate includes ethylene glycol diisocrotonate, pentaerythritol diisocrotonate, sorbitol tetraisocrotonate, and the like. Maleic acid esters include ethylene glycol di-n-butyl succinate, triethylene glycol di maleate, neopentyl alcohol di maleate, sorbitol tetramaleic acid Ester and the like. Examples of the other esters include, for example, the aliphatic alcohol esters described in Japanese Patent Publication No. 5 1 - 4 7 3 3 4, and JP-A-59-196236, or JP-A-5-9-5240 5 9-524 1. The product having an aromatic skeleton described in JP-A No. 2-2261-4, and the amine group-containing product described in JP-A No. 1 -1 6 5 6 1 3 . Further, the aforementioned ester monomers can also be used in the form of a mixture. Further, specific examples of the monomer of the aliphatic polyamine compound and the decylamine of the unsaturated carboxylic acid are methylene bis acrylamide, methylene bis methacrylamide, 1,6-hexamethylene bis propylene. Indoleamine, 1,6-hexamethylenebismethacrylamide, diethylenetriaminetripropenylamine, benzodimethylbisacrylamide, benzodimethyldimethacrylate, and the like. Other preferred guanamine-based monomers include those having a cyclohexene structure as described in JP-A-54-2 1726. In addition, a urethane-based addition polymerizable compound prepared by an addition reaction of an isocyanate and a hydroxyl group is also preferable, and a specific example thereof is described in JP-A-48-41708. a polyisocyanate compound having two or more isocyanate groups, and a vinyl group containing a hydroxyl group represented by the following formula (A), which has two or more polymerizations in one molecule - 37-200819915 vinyl group A vinyl urethane compound or the like. CH2 = C(R4)COOCH2CH(R5)OH (a) (wherein, in the formula (a), R4 and R5 are Η or CH3), and the special opening 5b, 37,193, special fair, 2-32293, And the urethane urethanes described in JP-A-February 2, No. 6,765, No. 5, No. 8 8-498, No. 5, No. 5, No. 5, No. 5, 654, No. A urethane compound having an ethylene oxide skeleton as described in No. 39418 is also preferred. Further, an addition having an amine structure or a sulfide structure in the molecule described in JP-A-63-27765, JP-A-63-260909, and JP-A-1-10538 As the polymerizable compound, a photopolymerizable composition having a very excellent photospeed can be obtained. Other examples include polyester acrylates and rings described in each of the publications of Japanese Patent Publication No. Sho 4-8-64, No. 4, No. 4, No. 4, No. A multifunctional acrylate or methacrylate such as an epoxy resin or an epoxy acrylate such as (meth)acrylic acid. Further, for example, a specific unsaturated compound described in each of the publications of Japanese Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. The vinyl sulfonic acid compound described. Further, in some cases, the perfluoroalkyl group-containing structure described in JP-A-61-22048 is suitably used. Further, it is also possible to introduce a photocurable monomer and an oligomer by using the Japanese Adhesive Society Publication No. 20, No. 7, and No. 3 00 to 308 (1 984). The structure of the addition polymerizable compound, the use alone or in an amount, and the method of using the additive amount can be arbitrarily set in accordance with the final performance design of the curable composition -38·200819915. For example, it can be selected from the following points of view. From the viewpoint of sensitivity, a structure having a large content of unsaturated groups per molecule is preferred, and most of the cases are preferably a bifunctional group or more. Further, in order to increase the strength of the cured film, it is more preferable to use a trifunctional or higher functional group, and further, different functional groups and different polymerizable groups (for example, acrylate, methacrylate, styrene compound, vinyl) The ether compound) is also effective in adjusting the sensitivity and the strength of both sides. Moreover, the compatibility and dispersibility of other components (for example, a binder polymer, a polymerization initiator, a coloring agent, etc.) in a photosensitive layer, and the selection and use of a polymeric compound are important factors, for example by using Two or more kinds of low-purity compounds or hydrazines can improve compatibility. Further, in order to improve adhesion to a substrate or the like, a specific structure can be selected. The above polymerizable compound is preferably used in the range of 5 to 80% by mass, more preferably in the range of 25 to 75% by mass, based on the total solid content of the photosensitive layer. Further, these may be used alone or in combination of two or more. Further, the method of using the polymerizable compound can arbitrarily select an appropriate structure, blending, and addition amount from the viewpoints of inhibition of oxygen polymerization, size, resolution, whitening property, refractive index change, surface adhesion, and the like. According to the situation, the undercoating, the top layer structure and the coating method are considered. <(D) Binder Polymer> When the photosensitive composition of the present invention is applied to the photosensitive layer of the original plate for a lithographic printing plate of the preferred embodiment, the photopolymerization initiating system and the addition polymerizable compound are not mentioned above. In addition, it is preferred to use a binder polymer. The binder polymer contained in the photosensitive composition of the present invention has a function as a film forming agent of a light-sensitive agent of 39-200819915, and preferably contains a linear organic polymer. Any of these "linear organic high molecular polymers" can be used. Examples of such a binder polymer are selected from the group consisting of acrylic resins, polyvinyl acetal resins, polyurethanes, polyamide resins, epoxy resins, methacrylic resins, styrene resins, and poly The polymer of the ester resin is preferred. Among them, an acrylic resin or a polyurethane resin is preferred. Further, in order to increase the film strength of the image portion, the binder polymer may have crosslinkability. In order to impart crosslinkability to the binder polymer, a crosslinkable functional group such as an ethylenically unsaturated bond may be introduced into the main chain of the polymer or into the side chain. Crosslinking agent The functional group can be introduced by copolymerization or by a polymer reaction. Here, the crosslinkable group means a process of causing a radical polymerization reaction in the photosensitive layer when the lithographic printing plate precursor is exposed, and a polymer binder can be crosslinked. In the case of such a group, the functional group capable of undergoing the addition polymerization reaction may, for example, be an ethylenically unsaturated bond group, an amine group or an epoxy group. Further, a functional group of a radical may be obtained by light irradiation, and examples of such a crosslinkable group include a thiol group, a halogen group, and a key salt structure. Among them, an ethylenically unsaturated bond group is preferred, and a functional group represented by the following general formulae (1) to (3) is particularly preferred. In the above formula (1), :1 to R3 each independently represent a hydrogen atom or a monovalent organic group, and R1 may be a hydrogen atom or an alkyl group which may have a substituent is -40-200819915 Since the hydrogen atom and the methyl group have high radical reactivity, it is preferred. Further, R2 and R3 each independently represent a hydrogen atom, a halogen atom, an amine group, a carboxyl group, an alkoxycarbonyl group, a sulfonic acid group, a nitro group, a cyano group, an alkyl group which may have a substituent, and an aromatic group which may have a substituent. Alkoxy group which may have a substituent, an aryloxy group which may have a substituent, an alkylamino group which may have a substituent, an arylamine group which may have a substituent, an alkylsulfonyl group which may have a substituent, The arylsulfonyl group having a substituent, wherein the radical has high reactivity, it is preferably a hydrogen atom, a carboxyl group, an alkoxycarbonyl group, a substituent group which may have a substituent, and an aryl group which may have a substituent. X represents an oxygen atom, a sulfur atom or N(R12)·, and R12 represents a hydrogen atom or a monovalent organic group. Here, R12 may, for example, be an alkyl group which may have a substituent. Among them, a hydrogen atom, a methyl group, an ethyl group or an isopropyl group is preferred because of high radical reactivity. Here, examples of the substituent which can be introduced include an alkyl group, an alkenyl group, an alkynyl group, an aryl group, an alkoxy group, an aryloxy group, a halogen atom, an amine group, an alkylamino group, an arylamine group, a residue, and a substituent. Oxyl group, acid extension group, nitro group, amino group, aramidyl group, alkylsulfonyl group, arylsulfonyl group and the like. Ff R5 B6 R7 General formula (2) In the above formula (2), R4 to R8 each independently represent a hydrogen atom or a monovalent organic group, and R4 to R8 include a hydrogen atom, a halogen atom, an amine group, and the like. An alkylamino group, a carboxyl group, an alkoxycarbonyl group, a sulfonic acid group, a nitro group, a cyano group, an alkyl group which may have a substituent, an aryl group which may have a substituent, an anthracene group which may have a substituent, may have a substituent An aryloxy group, an alkylamino group which may have a substituent, an arylamine group which may have a substituent, an alkylsulfonyl group which may have a substituent, an arylsulfonyl group which may have a substituent, wherein Further, a hydrogen atom, a carboxyl group, an alkoxy ore group, an alkyl group which may have a substituent, and an aryl group which may have a substituent are preferred. The substituent which can be introduced can be exemplified by the same formula as (1). Further, Y represents an oxygen atom, a sulfur atom, or N(Ri2). The Ri2 system is synonymous with the case of R12 of the general formula (1), and preferred examples are also the same. —z-o^? General (3)

r9r10 在上述通式(3),R9可舉出氫原子或可具有取代基之院 基等爲較佳,其中,因爲自由基反應性較高,以氫原子、 甲基爲佳。R^'R11各自獨立地可舉出氫原子、鹵素原子、 胺基、二烷胺基、羧基、烷氧基羰基、磺酸基、硝基、氰 基、可具有取代荸之烷基、可具有取代基之芳基、可具有 取代基之烷氧基、可具有取代基之芳氧基、可具有取代基 之烷胺基、可具有取代基之芳胺基、可具有取代基之垸基 磺醯基、可具有取代基之芳基磺醯基,其中,因爲自由基 反應性較商,以氫原子、竣基、院氧基鐵基、可具有取代 基之烷基、可具有取代基之芳基爲佳。 在此’能夠導入之取代基’可例不與通式(1 )同樣之 物。又,Z係表示氧原子、硫原子、或-N(R13)-、或可亘有 取代基之伸苯基。R13可舉出可具有取代基之院基等,其 中,因爲自由基反應性較高,以甲基、乙基、異丙基爲佳。 上述之中,以在側鏈具有交聯性基之(甲基)丙嫌酸共 聚物及聚胺基甲酸酯爲更佳。 -42· 200819915 具有交聯性之黏合劑聚合物係例如自由基(聚合引發 自由基或聚合性化合物在聚合過程的生長自由基)加添在 其交聯性官能基上,在聚合物間直接或透過聚合性化合物 的聚合鏈來進行加成聚合’在聚合物分子間形成交聯而硬 化。或是,聚合物中的原子(例如,鄰接交聯基之碳原子上 的氫原子)被自由基抽出而形成聚合物自由基,該等藉由互 相鍵結而在聚合物分子間形成交聯並硬化。 在黏合劑聚合物中之交聯性基的含量(藉由碘滴定之 能夠自由基聚合之不飽和雙鍵的含量),每1克黏合劑聚合 物以〇· 1〜1 〇·〇毫莫耳爲佳,以1 _0〜7.0毫莫耳爲更佳,以 2.0〜5.5毫莫耳爲最佳。 又,在平版印刷版原版的製版步驟,爲了良好地除去 感光層之非影像部,可適應顯像處理之態樣而適當地選擇 所使用的黏合劑聚合物。以下詳細記載。 (D-1)鹼可溶性黏合劑聚合物 在顯像處理係使用鹼顯像液來進行之態樣,因爲黏合 劑聚合物必須溶解於鹼顯像液中,以使用在驗水具可溶性 或潤脹性之有機高分子聚合物爲佳。特別是使用pH爲1 〇 以上的鹼顯像液時,以使用鹼可溶性黏合劑爲佳。 爲了在鹼水中具有可溶性,以具有鹼可溶性基爲佳。 鹼可溶性基可舉出羧基、酚性羥基、磺醯胺基、亞胺 基、磺酸基、磷酸基。從鹼溶解性及耐刷性的觀點,在聚 合物中之鹼可溶性基以〇.2meq/g以上6.0meq/g以下爲佳。 以0.5meq/g以上4.0meq/g以下爲更佳,以l.Orneq/g以上 -43- 200819915 3.5meq/g以下爲最佳。 以下,詳細地說明鹼可溶性基。 在黏合劑聚合物導入羧基之方法,能夠藉由使甲基丙 烯酸、丙烯酸、伊康酸、巴豆酸、順丁烯二酸、反丁烯二 酸等具有不飽和雙鍵之酸酐半酯化而成的單體、使具有不 飽和雙鍵之酸酐半醯胺化而成之單體、羧基苯基甲基丙烯 醯、羧基苯基丙烯醯、羧基苯乙烯、丙烯酸-2-羧基乙酯、 甲基丙烯酸-2-羧基乙酯、特開2000-3 3 0265號公報所記載 之通式(b)等進行聚合而得到。在通式(b),R1及R2係表示 氫原子、鹵素原子、烷基、芳基、羧基、或此等的鹽。R3 係表示氫原子、鹵素原子、烷基或芳基。X係表示2價的 連結基,可適合舉出例如可具有取代基之伸烷基或伸苯基 等。Y係可具有取代基之2價的芳香族基,可適合舉出例 如可具有取代基之伸苯基或伸萘基。 導入酚性羥基之方法,能夠藉由使羥基苯基甲基丙烯 醯胺、羥基苯基丙烯醯胺、羥基苯乙烯、羥基苯基順丁烯 二醯亞胺、特開2000-3 30265號公報所記載之通式(a)的單 體共聚合而得到。在通式(a),R1及R2係表示氫原子、鹵 素原子、烷基、芳基、羧基及此等的鹽。R3係表示氫原子、 鹵素原子、烷基或芳基。X係表示2價的連結基,可舉出 例如可具有取代基之伸烷基或伸苯基。Y係表示可具有取 代基之2價的芳香族基,可適合舉出例如可具有取代基之 伸苯基或伸萘基等。 導入磺醯胺基的方法,可舉出特開200〇-33〇265號公 -44- 200819915 報所記載之通式(C)的單體、特開平n-2 189 14號公報所記 載之結構式(I)〜(v)的單體,具體上可舉出甲基丙烯酸間胺 基磺醯基苯酯、N-(對胺基磺醯基苯基)甲基丙烯醯胺、 N-(對胺基磺醯基苯基)丙烯醯胺等。在通式(c) ’ Rl及R2 係表示氫原子、鹵素原子、烷基、芳基、羧基、或其等的 鹽。R3係表示氫原子、鹵素原子、烷基或芳基。x係表示 2價的連結基,可適合舉出例如可具有取代基之伸烷基或 伸芳基。Y係表示可具有取代基之2價的芳香族基’可適 合舉出例如可具有取代基之伸苯基或伸萘基。 導入亞胺基之方法能夠藉由使N-(對甲苯磺醯基)甲基 丙烯醯胺、N -(對甲苯磺醯基)丙烯醯胺等共聚合而得到。 磺酸基能夠藉由使具有苯乙烯磺酸及其鹽、2-丙烯醯胺_2-甲基丙磺酸及其鹽、磷酸基能夠藉由使 PHOSMER-M、 PHOSMER-PE等(UN I - C Η Ε ΜI C A L (股)製)的磷酸或其鹽之 單體共聚合而得到。 在以上的鹼可溶性基,以羧基、磺酸基、磷酸基、亞 胺基爲佳,以羧基爲特佳。以上的鹼可溶性基可藉由高分 子反應來導入。 而且,爲了提高影像部的皮膜強度,可使鹼可溶性黏 合劑聚合物如上述地具有交聯性。爲了使黏合劑聚合物具 有交聯性,可在高分子的主鏈中或側鏈中導入乙烯性不飽 和鍵等交聯性官能基。交聯性官能基可藉由共聚合來導 入,亦可藉由高分子反應來導入。 鹼可溶性黏合劑聚合物之質量平均分子量以5000以 -45- 200819915 上爲佳’以1萬〜3 〇萬爲更佳,又,數量平均分子量以1000 以上爲佳,以2000〜2 5萬爲更佳,又,多分散度(質量平均 分子量/數量平均分子量)以l.idO爲佳。 鹼可溶性黏合劑聚合物可以是無規聚合物、嵌段聚合 物、及接技聚合物中任一種,以無規聚合物爲佳。 驗可溶性黏合劑聚合物可單獨使用或混合2種以上而 使用。 相對於感光層的總固體成分,鹼可溶性黏合劑聚合物 的含量通常爲5〜90質量%,以10〜70質量%爲佳,以10〜60 質量°/〇爲更佳。在此範圍內能夠得到良好的影像部強度及 影像形成性。 (D-2)酸價爲〇.3meq/g以下的疏水性黏合劑聚合物 在製版步驟之顯像處理,於使用PH2〜10的顯像液進 行之態樣,以使用酸價爲0.3 me q/g以下的疏水性黏合劑聚 合物爲佳。 酸價爲0.3meq/g以下的疏水性黏合劑聚合物以使用非 水溶性聚合物爲佳。而且以實質上未含有羧基、磺酸基、 磷酸基等酸基爲佳。疏水性黏合劑聚合物的酸價係以化學 當量數表示聚合物每1克之酸含率。疏水性黏合劑聚合物 的酸價以〇.lmeq/g以下爲佳。 亦即,疏水性黏合劑聚合物以不溶於pH2〜10的水溶 液中爲佳。疏水性黏合劑聚合物在pH2〜1 0的水溶液中的溶 解量以0.5質量%以下爲佳,以0 . 1質量%以下爲更佳。藉 由使用此種疏水性黏合劑聚合物,能夠提高感光層的膜強 -46- 200819915 度、耐水性、及著肉性,而提升耐刷性。 疏水性黏合劑聚合物只要不損害本發明之平版印刷版 的性能,較佳是在上述範圍時,可沒有限制地使用先前眾 所周知之物,以具有皮膜性之線狀有機聚合物爲佳。 此種疏水性黏合劑聚合物之例子,以選自丙烯酸樹 脂、聚乙烯基縮醛樹脂、聚胺基甲酸酯樹脂、聚醯胺樹脂、 環氧樹脂、甲基丙烯酸樹脂、苯乙烯系樹脂、聚酯樹脂之 Φ 高分子爲佳。其中,以丙烯酸樹脂爲佳,以(甲基)丙烯酸 酯共聚物爲佳。更具體地,以(甲基)丙烯酸烷酯或芳烷酯、 與在(甲基)丙烯酸酯之酯殘基(-COOR)的R含有- CH2CH20 -單位或-CH2CH2NH-單位之(甲基)丙烯酸酯之共聚物爲特 佳。上述(甲基)丙烯酸烷酯之較佳烷基係碳數1〜5的烷基, 以甲基爲更佳。較佳之(甲基)丙烯酸芳烷酯可舉出(甲基) 丙烯酸苄酯。 而且,爲了提高影像部的皮膜強度,亦可疏水性黏合 φ 劑聚合物具有如前述的交聯性。 爲了使疏水性黏合劑聚合物具有交聯性,可在側鏈中 導入乙烯性不飽和鍵等交聯性官能基。交聯性官能基可藉 由共聚合來導入,亦可藉由高分子反應來導入。 又,從提高對水溶液之顯像性的觀點,黏合劑聚合物 以親水性爲佳,而且從提高耐刷性的觀點,黏合劑聚合物 與含有在感光層中之聚合性化合物具有良好的相溶性係重 要的,亦即,以親油性爲佳。由此種觀點,本發明爲了提 升顯像性及耐刷性,使疏水性黏合劑聚合物中之親水性基 -47- 200819915 與親油性基共聚合亦有效的。親水性基可舉出例如羥基、 羧酸酯基、羥乙基、乙烯氧基、羥基丙基、聚氧乙基、聚 氧丙基、胺基、胺基乙基、胺基丙基、銨基、醯胺基、羧 基甲基等具有親水性基之物爲佳。 疏水性黏合劑聚合物以質量平均分子量爲5 000以上 爲佳,以1萬〜3 0萬爲更佳,數量平均分子量以1 000以上 爲佳,以20 0 0〜25萬爲更佳。多分散度(質量平均分子量/ 數量平均分子量)以1.1〜10爲佳。 疏水性黏合劑聚合物可以是無規聚合物、嵌段聚合 物、接枝聚合物等之任一種,以無規聚合物爲佳。 疏水性黏合劑聚合物可單獨使用或混合2種以上而使 用。 相對於感光層之總固體成分,疏水性黏合劑聚合物的 含量通常爲5〜90質量%,以10〜70質量%爲佳,以10〜60 質量%爲更佳。在該範圍內,能夠得到良好的影像部強度 及影像形成性。 (共敏化劑) 藉由使用某種添加劑,能夠更提高感光層的敏感度。 在本發明將此種化合物稱爲共敏化劑。該等的作用機構並 未明確,可認爲多半係基於以下的化學步驟。亦即,推定 藉由前述之光聚合引發系的光吸收而產生光反應,且隨後 在加成聚合反應所產生之各種中間活性種(自由基、過氧化 物、氧化物、還原劑等)與共敏化劑進行反應而產生新的活 性自由基。多半能夠分類成(a)被還原而能夠產生活性自由 -48- 200819915 基之物;(b)被氧化而能夠產生活性自由基之物 性較低的自由基反應,而變換成活性高的自由 爲鏈轉移劑作用之物,關於各自化合物係屬 者,多半沒有共同的說法。 (a) 被還原而能夠產生活性自由基之物 具有碳-齒素鍵之化合物·可認爲碳-齒素 產生斷裂,而產生活性自由基。具體上例如三 阱類、或三鹵甲基噚二唑類等能夠適合使用。 具有氮-氮鍵之化合物:可認爲氮-氮鍵還 斷裂,而產生活性自由基。具體上例如六芳基 能夠適合使用。 具有氧-氧鍵之化合物V :可認爲氮-氮鍵還 斷裂,而產生活性自由基。具體上例如有機過 夠適合使用。 鑰化合物:可認爲碳-雜鍵、或氧-氮鍵還 斷裂,而產生活性自由基。具體上例如二芳基 三芳基锍鹽類、N-烷氧基吡啶鑰鹽(吖阱鑰)鹽 合使用。 二(環戊二烯)亞鐵、鐵芳烴鐵錯合物類: 地生成活性自由基。 (b) 被氧化而能夠產生活性自由基之物 烷基化物錯合物:可認爲碳-雜鍵氧化性却 生成活性自由基。具體上例如硼酸三芳基烷酯 合使用。 :及(c)與活 基、或是作 於此等之何 鍵還原性地 鹵甲基-S-三 原性地產生 二咪唑類等 原性地產生 氧化類等能 原性地產生 碘鑰鹽類、 類等能.夠適 能夠還原性 產生斷裂, 類等能夠適 -49 - 200819915 烷基胺化合物:可認爲藉由氧化’鄰接於氮之碳上的 c-χ鍵斷裂,而產生活性自由基。χ以氫原子、羧基、三 甲基矽烷基、苄基等爲佳。具體上例如乙醇胺類、Ν-苯基 甘胺酸類、Ν-三甲基矽烷基甲基苯胺類等° 含硫 '含錫化合物:將使用硫、錫原子取代上述之胺 類的氮原子而成之物,藉由同樣的作用’能夠生成活性自 由基。又,已知具有S - S鍵之化合物亦能夠藉由S - S斷裂 來敏化。 α -取代甲基羰基化合物:藉由氧化、因羰-α碳間的鍵 斷裂,能夠生成活性自由基。又,將羰基轉變成肟醚而成 之物顯τρ:具有同樣的作用。具體上,可舉出2 -院基-1 - [ 4 -(院 硫基)苯基]-2-味啉丙酮-1類,而且可舉出使此等與羥基胺 類反應後,將Ν-ΟΗ醚化而成之肟醚類。 亞磺酸鹽類:能夠還原性地生成活性自由基。具體上, 可舉出芳基亞磺酸鈉等。 (c)與自由基反應而變換成活性高的自由基、或是作爲鏈轉 移劑作用之物 與自由基反應而變換成活性高的自由基、或是作爲鏈 轉移劑作用之物能夠使用例如在分子內具有SH、PH、SiH、 GeH之化合物群。此等,係對低活性的自由基種供給氫, 來生成自由基,或是被氧化後,藉由脫質子能夠產生自由 基。具體上可舉出例如2 -氫硫基苯并咪唑類等。 此等共敏化劑之更多具體例子,係例如在特開平 9-23 69 1 3號公報所記載爲了提高敏感度的目的之許多添加 •50- 200819915 劑。以下例示一部分,但是本發明未限定於此等。R9r10 In the above formula (3), R9 is preferably a hydrogen atom or a substituent group which may have a substituent, and among them, a hydrogen atom or a methyl group is preferred because of high radical reactivity. R^'R11 each independently includes a hydrogen atom, a halogen atom, an amine group, a dialkylamino group, a carboxyl group, an alkoxycarbonyl group, a sulfonic acid group, a nitro group, a cyano group, an alkyl group which may have a substituted fluorene group, and An aryl group having a substituent, an alkoxy group which may have a substituent, an aryloxy group which may have a substituent, an alkylamino group which may have a substituent, an arylamine group which may have a substituent, and a fluorenyl group which may have a substituent a sulfonyl group, an arylsulfonyl group which may have a substituent, wherein, since the radical reactivity is relatively preferable, a hydrogen atom, a fluorenyl group, an aristocratic iron group, an alkyl group which may have a substituent, may have a substituent The aryl group is preferred. Here, the substituent which can be introduced can be exemplified by the same formula (1). Further, Z represents an oxygen atom, a sulfur atom, or -N(R13)-, or a phenyl group which may have a substituent. R13 may, for example, be a hospital base or the like which may have a substituent. Among them, a methyl group, an ethyl group and an isopropyl group are preferred because of high radical reactivity. Among the above, a (meth)acrylic acid copolymer and a polyurethane having a crosslinkable group in a side chain are more preferable. -42· 200819915 A crosslinkable binder polymer such as a radical (a polymerization-initiating radical or a growth radical of a polymerizable compound in a polymerization process) is added to its crosslinkable functional group, directly between the polymers Alternatively, the addition polymerization is carried out through a polymerization chain of a polymerizable compound, and crosslinking is formed between the polymer molecules to be hardened. Or, an atom in the polymer (for example, a hydrogen atom on a carbon atom adjacent to the crosslinking group) is extracted by a radical to form a polymer radical, which forms a crosslink between the polymer molecules by bonding each other. And hardened. The content of the crosslinkable group in the binder polymer (the content of the unsaturated double bond capable of radical polymerization by iodine titration), 〇·1~1 〇·〇 mmol per 1 gram of the binder polymer The ear is better, preferably 1 _0 to 7.0 millimolar, and most preferably 2.0 to 5.5 millimolar. Further, in the plate making step of the lithographic printing plate precursor, in order to remove the non-image portion of the photosensitive layer well, the binder polymer to be used can be appropriately selected in accordance with the state of development processing. The details are described below. (D-1) The alkali-soluble binder polymer is used in the development process using an alkali imaging solution because the binder polymer must be dissolved in the alkali imaging solution to be used in the water test device to be soluble or moist. A bulging organic high molecular polymer is preferred. In particular, when an alkali developing solution having a pH of 1 Torr or more is used, an alkali-soluble binder is preferably used. In order to have solubility in alkaline water, it is preferred to have an alkali-soluble group. The alkali-soluble group may, for example, be a carboxyl group, a phenolic hydroxyl group, a sulfonylamino group, an imine group, a sulfonic acid group or a phosphoric acid group. The alkali-soluble group in the polymer is preferably me.2 meq/g or more and 6.0 meq/g or less from the viewpoint of alkali solubility and printing durability. It is more preferably 0.5 meq/g or more and 4.0 meq/g or less, and more preferably l.Orneq/g or more -43 to 200819915 3.5 meq/g or less. Hereinafter, the alkali-soluble group will be described in detail. The method of introducing a carboxyl group into a binder polymer can be carried out by half-esterifying an anhydride having an unsaturated double bond such as methacrylic acid, acrylic acid, itaconic acid, crotonic acid, maleic acid or fumaric acid. a monomer, a monomer obtained by semi-aminating an anhydride having an unsaturated double bond, a carboxyphenylmethacryl oxime, a carboxyphenyl propylene oxime, a carboxy styrene, a 2-carboxyethyl acrylate, a The 2-carboxyethyl acrylate and the general formula (b) described in JP-A-2000-3 3265 are obtained by polymerization. In the formula (b), R1 and R2 represent a hydrogen atom, a halogen atom, an alkyl group, an aryl group, a carboxyl group, or the like. R3 represents a hydrogen atom, a halogen atom, an alkyl group or an aryl group. X is a divalent linking group, and, for example, an alkylene group or a phenyl group which may have a substituent may be suitably used. The Y-based aromatic group having a substituent may be, for example, a stretching phenyl group or a stretching naphthyl group which may have a substituent. The method of introducing a phenolic hydroxyl group can be carried out by using hydroxyphenylmethacrylamide, hydroxyphenyl acrylamide, hydroxystyrene, hydroxyphenyl maleimide, JP-A-2000-3 30265 The monomer of the above formula (a) is obtained by copolymerization. In the formula (a), R1 and R2 represent a hydrogen atom, a halogen atom, an alkyl group, an aryl group, a carboxyl group, and the like. R3 represents a hydrogen atom, a halogen atom, an alkyl group or an aryl group. X is a divalent linking group, and examples thereof include an alkyl group which may have a substituent or a phenyl group. Y is a divalent aromatic group which may have a substituent, and may, for example, be a phenyl group or a naphthyl group which may have a substituent. The method of introducing a sulfonamide group is exemplified by the monomer of the formula (C) described in JP-A-200-200819915, and the disclosure of JP-A-H09-18914. Specific examples of the monomer of the formulae (I) to (v) include m-amino-m-sulfonyl phenyl methacrylate, N-(p-aminosulfonylphenyl)methacrylamide, and N- (Aminosulfonylphenyl) acrylamide and the like. In the formula (c)', R1 and R2 represent a hydrogen atom, a halogen atom, an alkyl group, an aryl group, a carboxyl group, or the like. R3 represents a hydrogen atom, a halogen atom, an alkyl group or an aryl group. The x-form represents a divalent linking group, and may, for example, be an alkylene group or an extended aryl group which may have a substituent. The Y group represents a divalent aromatic group which may have a substituent, and may, for example, be a phenyl or anthracene group which may have a substituent. The method of introducing an imine group can be obtained by copolymerizing N-(p-toluenesulfonyl)methacrylamide, N-(p-toluenesulfonyl)propeneamine or the like. The sulfonic acid group can be made by having styrenesulfonic acid and its salt, 2-propenylamine 2 -methylpropanesulfonic acid and its salt, and a phosphate group by making PHOSMER-M, PHOSMER-PE, etc. (UN I - C Η Μ Μ I CAL (manufactured by CAL) is a copolymer of phosphoric acid or a salt thereof. In the above alkali-soluble group, a carboxyl group, a sulfonic acid group, a phosphoric acid group or an imide group is preferred, and a carboxyl group is particularly preferred. The above alkali-soluble group can be introduced by a high molecular reaction. Further, in order to increase the film strength of the image portion, the alkali-soluble binder polymer can be crosslinked as described above. In order to impart crosslinkability to the binder polymer, a crosslinkable functional group such as an ethylenically unsaturated bond may be introduced into the main chain or in the side chain of the polymer. The crosslinkable functional group can be introduced by copolymerization or by a polymer reaction. The mass average molecular weight of the alkali-soluble binder polymer is preferably 5,000 to -45-200819915, preferably 10,000 to 30,000, and the number average molecular weight is preferably 1000 or more, and 2000 to 250,000. More preferably, the polydispersity (mass average molecular weight / number average molecular weight) is preferably 1. idO. The alkali-soluble binder polymer may be any of a random polymer, a block polymer, and a graft polymer, and a random polymer is preferred. The soluble binder polymer may be used singly or in combination of two or more. The content of the alkali-soluble binder polymer is usually from 5 to 90% by mass based on the total solid content of the photosensitive layer, preferably from 10 to 70% by mass, more preferably from 10 to 60% by mass. In this range, good image portion strength and image formation properties can be obtained. (D-2) Hydrophobic binder polymer having an acid value of 〇.3 meq/g or less is subjected to development processing in a plate making step, and is carried out using a developing solution of pH 2 to 10 to have an acid value of 0.3 me. A hydrophobic binder polymer of q/g or less is preferred. The hydrophobic binder polymer having an acid value of 0.3 meq/g or less is preferably a water-insoluble polymer. Further, it is preferred that the acid group such as a carboxyl group, a sulfonic acid group or a phosphoric acid group is not substantially contained. The acid value of the hydrophobic binder polymer is the chemical equivalent number of the polymer per gram of acid. The acid value of the hydrophobic binder polymer is preferably 〇.lmeq/g or less. That is, the hydrophobic binder polymer is preferably insoluble in an aqueous solution of pH 2 to 10. The amount of the hydrophobic binder polymer dissolved in an aqueous solution of pH 2 to 10 is preferably 0.5% by mass or less, more preferably 0.1% by mass or less. By using such a hydrophobic binder polymer, the photosensitive layer can be improved in film strength from -46 to 20081991, water resistance, and meatiness, thereby improving the printing durability. The hydrophobic adhesive polymer is preferably a linear organic polymer having a film property, as long as it does not impair the performance of the lithographic printing plate of the present invention, and it is preferably in the above range, and a conventionally known one can be used without limitation. Examples of such a hydrophobic binder polymer are selected from the group consisting of acrylic resins, polyvinyl acetal resins, polyurethane resins, polyamide resins, epoxy resins, methacrylic resins, and styrene resins. The Φ polymer of the polyester resin is preferred. Among them, an acrylic resin is preferred, and a (meth) acrylate copolymer is preferred. More specifically, the alkyl (meth) acrylate or aralkyl ester, and the ester residue (-COOR) of the (meth) acrylate contain -CH2CH20-unit or -CH2CH2NH-unit (methyl) Acrylate copolymers are particularly preferred. The alkyl group of the above (meth)acrylic acid ester is preferably an alkyl group having 1 to 5 carbon atoms, more preferably a methyl group. The aryl (meth)acrylate is preferably benzyl (meth)acrylate. Further, in order to increase the film strength of the image portion, the hydrophobic adhesive φ agent polymer may have crosslinkability as described above. In order to impart crosslinkability to the hydrophobic binder polymer, a crosslinkable functional group such as an ethylenically unsaturated bond may be introduced into the side chain. The crosslinkable functional group can be introduced by copolymerization or can be introduced by a polymer reaction. Further, from the viewpoint of improving the developability of the aqueous solution, the binder polymer is preferably hydrophilic, and the binder polymer has a good phase with the polymerizable compound contained in the photosensitive layer from the viewpoint of improving the printing durability. The solubility is important, that is, it is preferably lipophilic. From such a viewpoint, in order to improve the developability and the printing durability, the present invention is also effective in copolymerizing a hydrophilic group -47-200819915 in a hydrophobic binder polymer with a lipophilic group. Examples of the hydrophilic group include a hydroxyl group, a carboxylate group, a hydroxyethyl group, a vinyloxy group, a hydroxypropyl group, a polyoxyethyl group, a polyoxypropyl group, an amine group, an aminoethyl group, an aminopropyl group, and an ammonium group. A substance having a hydrophilic group such as a thiol group or a carboxymethyl group is preferred. The hydrophobic binder polymer preferably has a mass average molecular weight of 5,000 or more, more preferably 10,000 to 30,000, and a number average molecular weight of preferably 1,000 or more, more preferably 20,000 to 250,000. The polydispersity (mass average molecular weight / number average molecular weight) is preferably from 1.1 to 10. The hydrophobic binder polymer may be any of a random polymer, a block polymer, a graft polymer, etc., preferably a random polymer. The hydrophobic binder polymer may be used singly or in combination of two or more. The content of the hydrophobic binder polymer is usually from 5 to 90% by mass, more preferably from 10 to 70% by mass, even more preferably from 10 to 60% by mass, based on the total solid content of the photosensitive layer. Within this range, good image portion strength and image formation properties can be obtained. (Common sensitizer) By using an additive, the sensitivity of the photosensitive layer can be further improved. Such a compound is referred to as a co-sensitizer in the present invention. These mechanisms of action are not clear, and it is believed that most of them are based on the following chemical steps. That is, it is presumed that a photoreaction is generated by the light absorption of the photopolymerization initiator described above, and then various intermediate active species (free radicals, peroxides, oxides, reducing agents, etc.) generated by the addition polymerization reaction are The co-sensitizer reacts to produce new active free radicals. Mostly, it can be classified into (a) a substance which is reduced to produce an activity-free radical -48-200819915; (b) a free radical reaction which is oxidized to generate an active radical and has a low physical activity, and the freedom to be converted into a high activity is The role of the chain transfer agent, with regard to the respective compound system, most of them do not have a common statement. (a) A substance which is reduced to produce an active radical. A compound having a carbon-dentate bond. It is considered that carbon-dentate is broken to generate an active radical. Specifically, for example, a triad or a trihalomethyloxadiazole can be suitably used. A compound having a nitrogen-nitrogen bond: It is considered that the nitrogen-nitrogen bond is also broken to generate an active radical. Specifically, for example, a hexaaryl group can be suitably used. Compound V having an oxygen-oxygen bond: It is considered that the nitrogen-nitrogen bond is also broken to generate an active radical. Specifically, for example, organic is suitable for use. Key compound: It is considered that a carbon-hetero bond or an oxygen-nitrogen bond is also broken to generate an active radical. Specifically, for example, a diaryltriarylsulfonium salt or an N-alkoxypyridylium salt (吖 钥 key) is used in combination. Di(cyclopentadienyl) ferrous iron, iron aromatic iron complex: to form active free radicals. (b) A substance which is oxidized to generate an active radical. The alkylate complex: It is considered that the carbon-hetero bond is oxidized to form an active radical. Specifically, for example, a triarylalkyl borate is used. And (c) an iodine-producing iodine-producing salt such as a divalent imidazole, such as a diimidazole, which is produced by a reactive group or a reactive group, or a halogenated methyl-S-trimer Class, class, etc. capable of reducing reductive cleavage, class, etc. -49 - 200819915 Alkylamine compound: It can be considered to be active by oxidizing the c-χ bond on the carbon adjacent to nitrogen. Free radicals. The hydrazine is preferably a hydrogen atom, a carboxyl group, a trimethyldecyl group, a benzyl group or the like. Specifically, for example, an ethanolamine, a fluorenyl-phenylglycine, a ruthenium-trimethyldecylmethylaniline, etc., a sulfur-containing tin-containing compound: a sulfur atom or a tin atom is substituted for the nitrogen atom of the above amine. The object, by the same action, can generate active free radicals. Further, it is known that a compound having an S - S bond can also be sensitized by S - S cleavage. The α-substituted methylcarbonyl compound: an active radical can be formed by oxidation and cleavage by a bond between carbonyl and α carbon. Further, the product obtained by converting a carbonyl group into an oxime ether has the same effect. Specific examples thereof include 2-benzine-1 - [ 4 -(indolylthio)phenyl]-2-sodium phenylacetone-1, and examples thereof include the reaction of hydroxyamines with hydroxyamines. - Ether ethers obtained by etherification. Sulfinated salts: capable of reductively generating active radicals. Specifically, sodium arylsulfinate or the like can be given. (c) a radical which reacts with a radical to be converted into a highly active radical, or which acts as a chain transfer agent, reacts with a radical, converts into a radical having a high activity, or acts as a chain transfer agent, for example, can be used, for example. A group of compounds having SH, PH, SiH, and GeH in the molecule. In this case, hydrogen is supplied to a low-activity radical species to generate a radical, or after being oxidized, a free radical can be generated by deprotonation. Specific examples thereof include 2-hydroxythiobenzimidazoles and the like. More specific examples of such co-sensitizers are, for example, those disclosed in Japanese Laid-Open Patent Publication No. Hei 9-23 69 1 3 for the purpose of improving sensitivity, and the addition of 50-200819915. Some examples are given below, but the present invention is not limited thereto.

此等共敏化劑係與先前的共敏化劑同樣,爲了 版印刷版原版之感光層的特性,亦能進而進行各種 性。例如能夠利用與敏化色料、引發劑、聚合性化 其他之自由基產生部分鍵結,來導入親水性部、導 提升相溶性、抑制結晶析出之取代基,導入用以提 性之取代基、及聚合物化等方法。此等共敏化劑可 倂用2種以上。相對於具有乙烯性不飽和雙鍵之聚 合物100質量份,使用量爲〇.〇 5〜100質量份,以 量份爲佳,更佳是3〜50質量份的範圍爲適當。 (微膠囊) 在本發明,在感光層含有上述感光層結構成分及 其他的結構成分之方法,例如,能夠如特開200 1· 號公報、特開200 1 -277742號公報之記載,使微膠 有該結構成分的一部分並添加在感光層。此時,各 分能夠以任意比率含有在微膠囊內及微膠囊外。 改良平 化學改 合物及 入用以 升黏附 單獨或 合性化 1〜80質 後述之 277740 囊內含 結構成 -51- 200819915 將感光層結構成分微膠囊化之方法,能夠使用眾所周 知的方法。例如,微膠囊之製法能夠利用美國專利第 280045 7號、同第280045 8號說明書所記載之凝聚方法; 美國專利第3287 1 54號之各說明書、特公昭3 8- 1 95 74號、 同42-446號各公報所記載之界面聚合方法;依照美國專利 第34 1 8250號之各說明書、同第3 6603 04號說明書所記載 之藉由聚合物的析出之方法;依照美國專利第3 7 9 6 6 6 9號 之異氰酸酯多元醇壁材料之方法;美國專利第3 9 1 4 5 1 1號 之異氰酸酯多元醇壁材料之方法;美國專利第4 0 0 1 1 4 0號 之各說明書、同第4 0 8 7 3 7 6號、同第4 0 8 9 8 0 2號之各說明 書所記載之尿素-甲醛系或尿素甲醛-間苯二酚系壁形成材 料之方法;美國專利第4025445號之使用三聚氰胺-甲醛樹 脂、羥基纖維素等的壁材之方法;特公昭3 6-9 1 63號、同· 51-9079號各公報所記載之藉由單體聚合之原位(in situ) 法;及英國專利第9 3 0 4 2 2號、美國專利第3 1 1 1 4 0 7號說明 書所記載之噴霧乾燥法;及英國專利第9 5 2 8 0 7號、同第 9 67 074號之各說明書所記載之電解分散冷卻法等;但是未 限定於此等。 本發明所使用較佳微膠囊壁係具有三維交聯,具藉由 溶劑潤脹的性質。由此觀點,微膠囊的壁材以聚脲、聚胺 基甲酸酯、聚酯、聚碳酸酯、聚醯胺及該等之混合物爲佳, 以聚脲及聚胺基甲酸酯爲特佳。又,亦可以在微膠囊壁, 導入能夠導入上述的非水溶性高分子之具有乙烯性不飽和 鍵等交聯性官能基之化合物。 -52- 200819915 上述微膠囊之平均粒徑以0.01〜3.0微米爲佳。以 0.05〜2.0微米爲更佳,以〇.1〇〜1.〇微米爲特佳。在該範圍 內時能夠到良好的解像度及經時安定性。 (其他的感光層成分) 在本發明的感光層,能夠按照必要含有各種添加劑。 以下,說明該等。 (界面活性劑) 在本發明,爲了促進顯像性及提升塗布面狀,以在感 光層使用界面活性劑爲佳。界面活性劑可舉出非離子界面 活性劑、陰離子界面活性劑、陽離子界面活性劑、兩性界 面活性劑、及氟系界面活性劑等。界面活性劑可單獨使用 •或組合使用2種以上。 在本發明所使用的非離子界面活性劑沒有特別限定, 可使用先前眾所周知之物。可舉出例如聚氧乙烯烷基醚 類、聚氧乙烯烷基苯基醚類、聚氧乙烯聚苯乙烯基苯基醚 類、聚氧乙烯聚氧丙烯烷基醚類、甘油脂肪酸部分酯類、 山梨糖醇酐脂肪酸部分酯類、新戊四醇脂肪酸部分酯類、 丙二醇一脂肪酸部分酯類、蔗糖脂肪酸部分酯類、聚氧乙 烯山梨糖醇酐脂肪酸部分酯類、聚氧乙烯山梨糖醇脂肪酸 部分酯類、聚乙二醇脂肪酸部分酯類、聚甘油脂肪酸部分 酯類、聚氧乙烯化蓖麻油類、聚氧乙烯甘油脂肪酸部分酯 類、脂肪酸二乙醇醯胺類、Ν,Ν-雙-2-羥基烷基胺類、聚氧 乙烯烷基胺、三乙醇胺脂肪酸部分酯類、氧化三烷基胺、 聚乙二醇、聚乙二醇與聚丙二醇之共聚物。 -53- 200819915 本發明所使用的陰離子界面活性劑沒有特別限定’可 使用先前眾所周知之物。可舉出例如脂肪酸鹽類、松香酸 鹽類、羥基鏈烷磺酸鹽類、鏈烷磺酸鹽類、二院基磺酸基 琥珀酸酯鹽類、直鏈烷基苯磺酸鹽類、分枝鏈院基苯磺酸 鹽類、烷基萘磺酸鹽類、烷基苯氧基聚氧乙烯丙基磺酸鹽 類、聚氧乙烯烷基磺酸基苯基醚鹽類、N-甲基油醯基牛 磺酸鈉鹽、N -烷基磺酸基琥珀酸一醯胺二鈉鹽、石油磺酸 0 鹽類、硫酸化牛脂油、脂肪酸烷基酯的硫酸酯鹽類、烷基 硫酸酯鹽類、聚氧乙烯烷基醚硫酸酯鹽類、脂肪酸一甘油 酯硫酸酯鹽類、聚氧乙烯烷基苯基醚硫酸酯鹽類、聚氧乙 烯苯乙烯基苯基醚硫酸酯鹽類、烷基磷酸酯鹽類、聚氧乙 烯烷基醚磷酸酯鹽類、聚氧乙烯烷基苯基醚磷酸酯鹽類、 苯乙烯/順丁烯二酸酐共聚物的部分皂化物類、烯烴/順丁 烯二酸酐共聚物的部分皂化物類、萘磺酸鹽福馬林縮合物 φ 本發明所使用的陰離子界面活性劑沒有特別限定,可 使用先前眾所周知之物。可舉出例如烷基胺鹽類、第四級 銨鹽類、聚氧乙烯烷基胺鹽類、聚乙烯聚胺衍生物。 本發明所使兩性界面活性劑沒有特別限定,可使用先 前眾所周知之物。可舉出例如羧基甜菜鹼類、胺基羧酸類、 磺酸基甜菜鹼類、胺基硫酸酯類、咪唑類。 又,在上述界面活性劑之中,具有「聚氧乙烯」之物 亦可使用聚氧亞甲基、聚氧丙烯、聚氧丁烯等「聚氧伸院 基」代替,在本發明,亦能夠使用此等界面活性劑。 -54- 200819915 更佳之界面活性劑可舉出在分子內含有全氟烷基之氟 系界面活性劑。此種氟系界面活性劑可舉出例如全氟烷基 羧酸鹽、全氟烷基磺酸鹽、全氟烷基磷酸酯等陰離子型; 全氟烷基甜菜鹼等兩性型;全氟烷基三甲銨鹽等陽離子 型;氧化全氟烷基胺、全氟烷基環氧乙烷加成物、含有全 氟烷基及親水性基之低聚物、全氟烷基及親油性基之低聚 物、含有全氟烷基、親水性及親油性基之低聚物、含有全 ^ 氟烷基及_油性基之胺基甲酸酯等非離子型。又,亦可適 合舉出特開昭 62- 1 70950 號、同 62-226 1 43 號及同 60-168 144號公報所記載之氟系界面活性劑。 界面活性劑可單獨或組合使用2種以上。 相對於感光層的總固體成分,界面活性劑的含量以 0· 00 1〜10質量%爲佳,以0.0^7質量%爲更佳。 (著色劑) 在本發明,能夠使用在可見光區域具有大的吸收之染 φ 料作爲影像著色劑。具體上可舉出油溶性黃# 1 0 1、油溶性 黃# 1 0 3、油溶性粉紅# 3 1 2、油溶性綠B G、油溶性藍Β Ο S、 油溶性藍# 6 0 3、油溶性黑Β γ、油溶性黑b S、油溶性黑 T-5 05 (以下ORIENT化學工業(股)製)、維多利亞純藍 (victoria blue)、結晶紫(C142555)、甲基紫(CI42535)、乙 基紫、若丹明B(CI145170B)、孔雀石綠(C142 000)、亞甲藍 (C152015)等、及特開昭62_293247號公報所記載之染料。 又’酞青系顏料、偶氮系顏料、碳黑、氧化鈦等顏料亦適 合使用。 -55- 200819915 因爲此等著色劑在影像形成後,能夠容易區域影像部 及非影像部,以添加爲佳。又’相對感光層的總固體成分, 添加量以〇. 〇 1〜1 〇質量%的比率爲佳。 (印像劑) 爲了生成印像影像’在本發明的感光層可添加因酸或 自由基而產生變色之化合物。此種化合物例如二苯基甲烷 系、三苯基甲烷系、噻畊系、噚哄系、咕噸系、蒽醌系、 ^ 亞胺基醌系、偶氮系、甲亞胺系等各種色料能夠有效地使 用。 具體例可舉出艷綠、乙基紫、甲基綠、結晶紫、鹼性 品紅、甲基紫2B、喹哪啶紅、玫瑰紅、米塔尼爾黃、瑞香 草酚磺酞、二甲苯酚藍、甲基橙、對甲基紅、剛果紅、本 佐紅紫4B、α -萘基紅、尼羅藍2B、尼羅藍A、甲基紫、 孔雀石綠、副品紅、維多利亞純藍· BOH[HODOGAYA(股) 製]、油溶性藍#603 [ORIENT化學工業(股)製]、油溶性粉紅 • . #3 12 [ORIENT化學工業(股)製]、油溶性紅5B [ORIENT化學 工業(股)製]、油溶性紅#308 [ORIENT化學工業(股)製]、油 溶性紅 〇G[ORIENT化學工業(股)製]、油溶性紅 RR[ ORIENT化學工業(股)製]、油溶性綠#5 02 [ORIENT化學 工業(股)製]、SPIRON RED BEH SPECIAL [HODOGAYA(股) 製]、對甲酚紫、甲酚紅、若丹明B、若丹明6G、磺酸基若 丹明B、阿拉明、4-對二乙基胺基苯基亞胺基萘醌、2-羧基 苯胺基-4-對二乙基胺基苯基亞胺基萘醌、2-羧基硬脂醯基 胺基-4-對-N,N-雙(羥乙基)胺基-苯基亞胺基萘醌、1-苯基 -56- 200819915 -3-甲基-4-對二乙胺基苯基亞胺基-5-吡唑酮、1-β·萘基 對二乙胺基苯基亞胺基-5-吡唑酮等的染料、或Ρ,Ρ’,ρ'$ 甲基三胺基三苯基甲烷(無色結晶紫)、Pergascript BUe SRB(CIBAGEIGY公司製)等的無色染料。 除了上述以外,亦可適合舉出已知作爲感熱紙或感_ 紙用的原料之無色染料。具體例可舉出結晶紫內酯、孔雀 石綠內酯、苯甲醯基無色亞甲基藍、2-(N-苯基-N_甲胺 基)-6-(N-對甲苯基-N-乙基)胺基-螢光黃母體、2_苯胺基_3_ 甲基- 6-(N-乙基-對甲苯胺基)螢光黃母體、3,6-二甲氧基螢 光黃母體、3-(Ν,Ν·二乙胺基)-5-甲基-7-(N,N-二苄胺基)· 螢光黃母體、3-(N-環己基-N-甲胺基)-6-甲基-7-苯胺基螢光 黃母體、3-(N,N-二乙胺基)-6-甲基-7-苯胺基螢光黃母體、 3-(N,N-二乙胺基)-6 -甲基-7-二甲代苯胺基螢光黃母體、 3-(N,N-二乙胺基)-6-甲基-7-氯螢光黃母體、3-(N,N-二乙胺 基)-6-甲氧基-7-胺基螢光黃母體、3-(N,N-二乙胺基)-7-(4-氯苯胺基)螢光黃母體、3-(N,N-二乙胺基)-7-氯螢光黃母 體、3-(N,N-二乙胺基)-7-苄基胺基螢光黃母體、3-(N,N-二 乙胺基)-7,8-苯幷螢光黃母體、3-(N,N-二丁胺基)-6-甲基 -7-苯胺基螢光黃母體、3-(N,N-二丁胺基)-6-甲基-7-二甲代 苯胺基螢光黃母體、3-哌啶基-6-甲基-7-苯·胺基螢光黃母 體、3-吡咯啶基-6-甲基-7-苯胺基螢光黃母體、3,3-雙(1-乙基-2-甲基吲哚-3-基)酞內酯、3,3-雙(1-正丁基-2·甲基吲 哚-3-基)酞內酯、3,3-雙(對二甲基胺基苯基)-6-二甲胺基酞 內酯、3-(4-二乙胺基-2-乙氧基苯基)-3-(1-乙基-2-甲基吲哚 -57- 200819915 -3-基)-4-酞內酯、3-(4-二乙胺基苯基)-3-(1-乙基-2-甲基吲 哚-3-基)酞內酯等。 相對於感光層固體成分,因酸或自由基而產生變色之 染料的添加量以0.0 1〜1 5質量%爲佳。 (聚合抑制劑) 爲了在感光層的製造中或保存中防止聚合性化合物之 不需要的熱聚合,以在本發明的感光層添加少量的防熱聚 合劑爲佳。 防熱聚合劑可舉出例如氫醌、對甲氧基·苯酚、二-第三 丁基·對甲酚、五倍子酚、第三丁基兒苯酚、對苯醌、4,4-硫代雙(3-甲基-6-第三丁基苯酚)、2,2’-亞甲基雙(4-甲基-6· 第三丁基苯酚)、N-亞硝基-N-苯基羥基胺鋁鹽爲佳。 對於感光層固體成分,防熱聚合劑的添加量以約〇.〇1〜 約5質量%爲佳。 (高級脂肪酸衍生物等) 爲了防止因氧引起聚合阻礙,亦可在本發明的感光層 添加如蘿酸或蘿醯胺之高級脂肪酸衍生物等,並使塗布後 的乾燥步驟使其偏存在於感光層的表面。對於感光層固體 成分,高級脂肪酸衍生物的添加量以約〇· 1〜約1 0質量%爲 佳。 (可塑劑) 本發明的感光層亦可含有可塑劑。可塑劑可適合舉出 例如酞酸二甲酯、酞酸二乙酯、酞酸二丁酯、酞酸二異丁 酯、酞酸二辛酯、酞酸辛基辛酯、酞酸二環己酯、酞酸二- -58- 200819915 十三烷酯、酞酸丁基苄酯、酞酸二異癸酯、酞酸二烯丙酯 等酞酸酯類;二甲基二醇酞酸酯、乙醇酸乙基酞醯基乙酯、 乙醇酸甲基酞醯基乙酯、乙醇酸丁基酞醯基丁酯、三甘醇 二辛酸酯等二醇酯類;磷酸三甲苯酯、磷酸三苯酯等磷酸 酯類;己二酸二異丁酯、己二酸二辛酯、癸二酸二甲酯、 癸二酸二丁酯、壬二酸二辛酯、順丁烯二酸二丁酯等脂肪 族二元酸酯類Γ聚甲基丙烯酸環氧丙酯、檸檬酸三乙酯、 甘油三乙醯酯、月桂酸丁酯等。相對於感光層固體成分, 可塑劑的含量以3 0質量%以下爲佳。 (無機微粒子) 爲了提高影像部的硬化皮膜強度,本發明的感光層亦 可含有無機微粒子。無機微粒子可適合舉出例如二氧化 矽、氧化鋁、氧化鎂、氧化鈦、碳酸鎂、海藻酸銘或其等 的混合物。此等雖未具有光熱變換性,但亦能夠藉由皮膜 的強化、表面粗面化來強化界面黏著性等。無機微粒子之 平均粒徑以5奈米〜10微米爲佳,以0.5〜3微米爲更佳。 若在上述範圍時,在感光層中能夠安定地分散而充分地保 持感光層的膜強度,且能夠形成印刷時不容易產生污染之 親水性優良的非影像部。 如上述之無機微粒子能夠容易地購自膠體二氧化矽分 散物的市售品。 相對於感光層固體成分,無機微粒子的含量以20質量 %以下爲佳,以1 〇質量%以下爲更佳。 (低分子親水性化合物) -59- 200819915 爲了提高顯像性,能夠在本發明的感光層含有親水性 低分子化合物。親水性低分子化合物例如水溶性有機化合 物可舉出乙二醇、二甘醇、三甘醇、丙二醇、二伸丙甘醇、 三伸丙甘醇等甘醇類及其醚或酯衍生物類、甘油、新戊四 醇等多羥類、三乙醇胺、二乙醇胺一乙醇胺等有機胺類及 其鹽、甲苯磺酸、苯磺酸等有磺酸類及其鹽、苯基磺酸等 有機磺酸類及其鹽、酒石酸、草酸、檸檬酸、蘋果酸、乳 酸、葡糖酸、胺基酸等有機羧酸類及其鹽、或四乙胺鹽酸 鹽等有機4級銨鹽等。 本發明的感光層除了上述以外,例如可以含有共敏化 劑。 (感光層的形成) 、 本發明的感光層係將必要的上述各成分分散或溶解在 溶劑中來調製塗布液,並塗布而形成。在此所使用的溶劑 可舉出二氯化乙烯、環己酮、甲基乙基酮、甲醇、乙醇、 丙醇、乙二醇單甲基醚、1 -甲氧基-2 _丙醇、2_甲氧基乙基 乙酸酯、卜甲氧基-2 -丙基乙酸酯、二甲氧基乙烷、乳酸甲 酯、乳酸乙酯、N,N-二甲基乙醯胺、N,N-二甲基甲醯胺、 V四甲基脲、N-甲基舭略陡酮 '二甲基亞颯、環丁颯、r-丁內酯、甲苯、水等’但是未限定於此等。此等溶劑可單 獨或混合使用。塗布液的固體成分濃度以1〜5 0質量%爲佳。 本發明的感光層亦能夠藉由複數次調製將相同或不同 的上述各成分分散或溶解在相同或不同的溶劑中而成的塗 布液,然後重複進行複數次的塗布' 乾燥來形成。 -60- 200819915 又,在塗布、乾燥後所得到的支撐體上之感光層塗布 量(固體成分)係按照用途而異,通常以〇.3〜3.0克/平方公 尺爲佳。在此範圍內能夠得到良好的敏感度及感光層之良 好的皮膜特性。 塗布方法能夠使用各種方法。可舉出例如棒塗布、旋 轉塗布、噴霧塗布、簾流塗布、浸漬塗布、氣動刮刀塗布、 刮板塗布、輥塗布等。 [保護層] 本發明的平版印刷版原版爲了隔離會妨礙曝光時的聚 合反應之氧的擴散侵入,可在感光層上設置保護層(氧隔離 層)。在本發明所使用的保護層以在25 °C、1氣壓下之氧透 過性A爲1.0 € Ag 20 (毫升/平方公尺•天)爲佳。氧透過性 A小於1 . 0 (毫升/平方公尺•天)之極低情況,在製造時、使 用前保持時會有產生不需要的聚合反應、且在影像曝光時 會有產生不需要的泛白、影像線條變粗之問題。相反地, 氧透過性A大於20(毫升/平方公尺•天)之過高的情況,會 導致敏感度低落。氧透過性A以1 .5 ‘ A S 12(毫升/平方公 尺•天)的範圍爲較佳,以2.0 S AS 10.0(毫升/平方公尺· 天)的範圍爲更佳。又,保護層被要求的特性,除了上述氧 透過性以外,而且,以實質上不會妨礙曝光所使用光線的 透過、與感光層之黏附性優良、且在曝光後的顯像步驟能 夠容易地除去爲佳。先前對於此種保護層之設想,在美國 專利第3,4 5 8,3 11號說明書、特公昭5 5 -49279號公報有詳 細地記載。 -61- 200819915 保護層能夠使用的材料係例如使用結晶性較優良的水 溶性高分子化合物爲佳,具體上可舉出聚乙烯醇、乙烯醇/ 酞酸乙烯‘共聚物、乙酸乙烯/乙烯醇酞酸乙烯共聚物、乙酸 乙烯/巴豆酸共聚物、聚乙烯吡咯啶酮、酸性纖維素類、明 膠、阿拉伯樹膠、聚丙烯酸、聚丙烯醯胺等水溶性聚合物, 此等可單獨或混合使用。此等之中,使用聚乙烯醇作爲主 成分’能夠賦予氧隔離性、顯像除去性之基本特性更良好 的結果。 保護層所使用的聚乙烯醇,只要含有具有必要的氧隔 離性及水溶性之未取代乙烯醇單位時,一部分亦可被酯、 醚、及縮醛取代。又,同樣地,一部分亦可具有其他的共 聚成分。聚乙烯的具體例可舉出加水分解度爲71〜100莫耳 %、聚合重複單位爲300至2400範圍之物。具體上可舉出 可樂麗股份公司製之 PVA-105、PVA-110、PVA-117、 PVA-117H、PVA-120、PVA-124、PVA-124H、PVA-CS、 PVA-CST、PVA-HC、PVA-2 0 3、PVA-204、P VA-2 0 5、 PVA-210、PVA-217、PVA-220、PVA-224、PVA-217EE、 PVA-217E、PVA-220E、PVA-224E、PVA-405、PVA-420、 PVA-613、L-8等,此等可單獨使用或混合使用。較佳之態 樣係聚乙烯醇之保護層中的含有率爲20〜95質量%,以 30〜9G質量%爲更佳。 又’眾所周知的改性聚乙烯醇亦可適合使用。可舉出 例如無規則地具有由羧基、磺酸基等陰離子改性而成的陰 離子改性部位,由胺基、銨基等陽離子改性而成的陽離子 -62- 200819915 改性部位,矽烷醇改性部位、及硫醇改性部位等各種親水 性改性部位之各種聚合度的聚乙烯醇;及在聚合物鏈末端 具有前述陰離子改性部位、前述陽離子改性部位、矽烷醇 改性部位、硫醇改性部位、進而烷氧基改性部位、硫醚改 性部位、乙烯醇與各種有機酸之酯改性部位、前述陰離子 改性部位與醇類等之酯改性部位、環氧改性部位等各種改 性部位之各種聚合度的聚乙烯醇等。 從氧隔離性、顯像除去性之觀點,作爲與聚乙烯醇混 合而使用的成分之聚乙烯吡咯啶酮或其改性物,在保護層 中的含有率爲3.5〜80質量%,以10〜60質量%爲佳,以15〜30 質量%爲更佳。 保護層的成分(PVA的選擇、添加劑的使用)、塗布量 除了氧隔離性、顯像除去性以外,可考慮泛白性或黏附性、 耐傷性而選擇。通常,所使用PVA的加水分解率越高(保護 層中之未取代乙烯醇單位含有率越高)、膜厚度越厚時氧隔 離性變高,就敏感度而言係有利的。能夠使用上述聚乙烯 醇(PVA)等的(共)聚合物的分子量在2000〜1000萬的範圍之 物,較佳是2萬〜3 00萬範圍之物爲適當。 作爲保護層之其他組成物,能夠對(共)聚合物添加數 質量%相當量之甘油、二伸丙甘醇等,用以賦予撓性,又, 能夠對高分子化合物黏合劑添加數質量%之烷基硫酸鈉' 烷基磺鈉等陰離子界面活性劑;烷胺基羧酸鹽、烷胺基二 羧酸鹽等兩性界面活性劑;及聚氧乙烯烷基苯基醚等非離 子界面活性劑。 -63- 200819915 又,與影像部之黏附性、或耐傷性在印刷版的處理上 係極重要的。亦即,由水溶性聚合物所構成的親水性層層 積在親油性的感光層時’因黏著力不足而容易產生膜剝 離,且剝離部分因氧的聚合阻礙會引起膜硬化不良等缺 點。對此種情形,有各種提案用以改良此等2層間的黏著 性。例如美國專利申請號碼第2 9 2,5 0 1號、美國專利申請 號碼第44,5 63號記載,係在主要由聚乙烯醇所構成的親水 性聚合物中,混合20〜60質量%丙烯酸系乳液或水不溶性 乙烯吡咯啶酮-乙烯基乙酸酯共聚物等,並藉由在感光層上 層積,能夠得到充分的黏著性。對本發明之保護層,亦能 夠應用此等眾所周知的技術之任一者。關於此種保護層的 塗布方法例如詳細地記載在美國專利第3,458,311號說明 書、特公昭55-49729號公報。 而且,爲了提升氧隔離性或感光層表面保護性之目 的,在本發明的平版印刷版原版之保護層,含有無機質的 層狀化合物亦佳。 在此,無機質的層狀化合物係具有薄平板狀的形狀之 粒子,可舉出例如下述通式 A(B,C)2-5D4〇10(〇H,F,O)2 (其中,A 係 K、Na、Ca 之任一者,B 及 C 係 Fe(II)、Fe(III)、 Μη、Al、Mg、V之任一者,D係Si或Al)所示之天然雲母、 合成雲母等雲母群、式3Mg0*Si0*H20所示之滑石、帶雲 母、蒙脫石、皂石、鈉雲母、磷酸鉻等。 在上述雲母群,天然雲母可舉出白雲母、鈉雲母、金 -64- 200819915 雲母、黑雲母及鱗雲母。又,合成雲母可舉出氟金雲母 KMg3(AlSi301G)F2、鉀四矽雲母 KMg2.5(Si401G)F2 等非潤脹 性雲母、及Na四矽雲母NaMg2.5(Si401())F2、Na或Li帶雲 母(Na、Li)Mg2Li(Si4〇i〇)F2、蒙脫石(montimorillonite)系 之 Na 或 Li 針鈣鈉石(Na、Li)1/8Mg2/5Li1/8(Si4〇i())F2 等潤 脹性雲母等。而且合成蒙脫石(sumectite)亦是有用的。 在本發明,上述之無機質的層狀化合物之中,以合成 的無機質層狀化合物之氟系潤脹性雲母特別有用。亦即, 該潤脹性雲母、或蒙脫石、皂石、針鈉鈣石、膨土等潤脹 性黏土.礦物類等具有由10〜15 A左右厚度的單位結晶格子 層所構成的積層結構,格子內金屬原子取代係明顯地大於 其他的黏土礦物。結果,格子層產生正電荷不足,爲了補 償而吸附在層間之Na+、Ca2+、Mg2 +等陽離子。此等介於 層間之陽離子係稱爲交換性陽離子,能夠與各種陽離子交 換。特別是層間的陽離子係Li+、Na+的情況,因爲離子半 徑較小,層間結晶格子間的鍵較弱,會因水而潤脹變大。 在此種狀態,若施加剪切時容易裂開而在水中形成安定的 溶膠。膨土及潤脹性合成雲母之此種傾向較強,在本發明 係有用的,以使用潤脹性合成雲母爲特佳。 在本發明所使用無機質的層狀化合物之形狀,從擴散 控制的觀點,厚度以越薄越佳,平面尺寸只要不會阻礙塗 布面的平滑性或活性光線的透射性,以越大越佳。因此, 縱橫比爲20以上,以100以上爲佳,以200以上爲特佳。 又,縱橫比係對粒子的長徑之厚度的比,例如,能夠從粒 -65- 200819915 子的顯微鏡照片之投影圖來測定。縱橫比越大時所得到的 效果越大。 在本發明所使用無機質層狀化合物的粒徑,其平均長 徑爲0.3〜2 0微米,以0.5〜10微米爲佳,以1〜5微米爲特 佳。又,該粒子的平均厚度爲0.1微米以下,以0.05微米 以下爲佳,以〇. 〇 1微米以下爲特佳。例如,無機質的層狀 化合物之中,代表性化合物之潤脹性合成雲母的尺寸係厚 度爲1〜50奈米,面尺寸爲1〜2 0微米左右。 使此種縱橫比大的無機質層狀化合物含有在保護層 時,因爲能夠提高塗膜強度,又,能夠有效地防止氧及水 分的透過,所以能夠防止因變形等所引起的保護層劣化, 且即便在高濕條件下亦能夠長期保存,不會有因濕度變化 致使平版印刷版原版之影像形成性變差,而具有優良的保 存安定性。 相對於在保護層所使用黏合劑的量,在保護層中的無 機質層狀化合物的含量,質量比以5/1〜1/1 00爲佳。倂用 複數種的無機質層狀化合物時,此等無機質層狀化合物的 合計量,以上述質量比爲佳。 接著,敘述保護層所使用無機質層狀化合物之通常的 分散方法之例子。首先,在100質量份水中,添加5〜10質 量份潤脹性的層狀化合物(在前述所舉出無機質層狀化合 物之較佳化合物),然後充分地以水溶化並使其潤脹後,藉 由分散機來進行分散。在此所使用的分散機可舉出機械式 直接施力來進行分散之各種硏磨機、具有強剪切力之高速 -66· 200819915 攪拌型分散機、能夠賦予高強度的超音波能量之分散機 等。具體上可舉出球磨機、砂磨機、均化硏磨機、膠體磨 機、均化器、溶解器、均質機(p〇1ytr〇n)、均質混合機、均 化攪拌器、均化摻混器、卡迪式硏磨機、噴射攪拌機、毛 細管式乳化裝置、液體汽笛、電磁應變式超音波產生機、 具有帕爾曼(Pohlmann)笛之乳化裝置等。使用上述方法分 散而成之5〜1 0質量%無機質層狀化合物的分散物係高黏度 或凝膠狀,保存安定性極爲良好。使用該分散物來調製保 護層塗布液時,係以水稀釋’並充分攪拌後,與黏合劑溶 液調配來調製爲佳。 在該保護層塗布液,除了上述無機質層狀化合物以 外,可添加用以提高塗布性之界面活性劑、或爲了改良性 之水溶性可塑劑等眾所周知的添加劑。水溶性可塑膠可舉 出例如丙醯胺、環己烷二醇、甘油、及山梨糖醇等。又, 亦可添加水溶性的(甲基)丙烯酸系聚合物。而且,爲了提 高與感光層的黏附性、及塗布液的經時安定性,亦可添加 眾所周知的添加劑。 將如此調製而成的保護層塗布液塗布在形成在支撐體 上之感光層上,並乾燥而形成保護層。塗布溶劑可適當地 選自與黏合劑有關聯之物,使用水溶性聚合物時,以使用 蒸餾水、精製水爲佳。保護層的塗布方法沒有特別限制, 能夠應用美國專利第 3,4 5 8,311號說明書或特公昭 5 5-4 9729號公報所記載之方法等眾所周知的方法。具體 上,可舉出例如刮板塗布法、氣動刮刀塗布法、凹版塗布 -67- 200819915 法、輥塗布法、噴霧塗布法、浸漬塗布法、棒塗布法等。 保護層的塗布量係乾燥後的塗布量以〇·05〜10克/平方 公尺的範圍爲佳,含有無機質的層狀化合物時’以0·1〜0·5 克/平方公尺的範圍爲更佳,未含有無機質的無機質層狀化 合物時,以0.5〜5克/平方公尺的範圍爲更佳。 [支撐體] 本發明的平版印刷版原版所使用的支撐體沒有特別限 定,若是尺寸安定之板狀的親水性支撐體時即可。可舉出 例如紙、塑膠(例如,聚乙烯、聚丙烯、聚苯乙烯等)所層 壓而成的紙、金屬板(例如,鋁、鋅、銅等)、塑膠薄膜(例 如,二乙酸纖維素、三乙酸纖維素、丙酸纖維素、丁酸纖 維素、乙酸丁酸纖維素、硝酸纖維素、聚對酞酸乙二酯、 聚乙烯、聚苯乙烯、聚丙烯、聚碳酸酯、聚乙烯縮醛等)、 將上述金屬層壓或蒸著而成的紙或塑膠薄膜等。較佳之支 撐體可舉出聚酯薄膜及鋁板。其中,因爲尺寸安定性良好、 且較爲價廉,以鋁板爲佳。 鋁板有純鋁板、以鋁爲主成分並含有微量的異元素之 合金板 '或是在鋁或鋁合金薄膜上層壓塑膠而成之物。在 鋁合金所有的異元素有矽素、鐵、錳、銅、鎂、鉻、鋅、 鉍、鎳、欽等。合金中之異元素的含量以1 〇質量%以下爲 佳。在本發明,以純鋁板爲佳,因爲製造完全純的銘在精 煉技術上係困難的,所以亦可含有少量的異元素。銘板沒 有特定的組成,可適當地利用眾所周知的材料。 支撐體的厚度以0·1〜0.6毫米爲佳,以0.15〜0.4毫米 -68- 200819915 爲較佳,以0.2〜0.3毫米爲更佳。 在使用鋁板之前,以實施粗面化處理、及陽極氧化處 理等表面處理爲佳。藉由表面處理能夠提高親水性並容易 確保感光層與支撐體的黏附性。在將銘板粗面化處理之 前’較佳係按照需要,使用界面活性劑、有機溶劑、鹼性 水溶液進行脫脂處理,用以除去表的壓延油。 鋁板表面的粗面化處理能夠藉由各種方法進行,可舉 出例如機械性粗面化處理、電化學粗面化處理(電化學性地 使表面溶解之粗面化處理)、化學性粗面化處理(化學性地 選擇溶解表面之粗面化處理)。 機械性粗面化處理的方法能夠使用球硏磨法、刷硏磨 法、噴砂硏磨法、拋光硏磨法等眾所周知的的方法。 電化學性粗面化處理之方法可舉出例如在含有鹽酸、 硝酸等酸之電解液中藉由交流或直流來進行之方法。又, 亦可舉出特開昭54-6 5 3 902號公報所記載之使用混合酸的 方法。 被粗面化處理過的鋁板,可按照必要施行使用氫氧化 鉀、氫氧化鈉等水溶液之驗蝕刻處理,而且,亦可在中和 處理後,按照需要施行用以提高耐摩耗性之陽極氧化處理。 在鋁板的陽極氧化處理所使用的電解質’能夠使用可 形成多孔質氧化皮膜之各種電解質。通常可使用硫酸、鹽 酸、草酸、鉻酸或其等的混酸。此等之電解質的濃度能夠 按照電解質的種類來適當地決定。 因爲陽極氧化處理條件係按照所使用的電解質而有各 -69- 200819915 種改變,無法一槪地加以特定,通常以電解質濃度爲1〜8 ο 質量%溶液、液溫度5〜70°C、電流密度5〜60A/dm2、電壓 1〜100V、電解時間1〇秒〜5分鐘爲佳。所形成陽極氧化皮 膜的量以1 ·0〜5 .0克/平方公尺爲佳,以1 .5〜4.0克/平方公 尺爲更佳。在此範圍內,能夠得到良好的耐刷性及在平版 印刷版的非影像部之良好的耐傷性。 本發明所使用的支撐體可以是經上述表面處理過而具 有陽極氧化皮膜之基板原樣,爲了改良與上層的黏著性、 親水性、不容易污染性、隔熱性等,可按照必要適當地選 擇進行特開平2001-253181號、或特開2001-322365號公 報所記載之陽極氧化皮膜的微細孔擴大處理、微細孔封孔 處理、及浸漬於含有親水性化合物之表面親水處理等。當 然封孔處理不只是上述記載,亦可使用先前眾所周知之任 何方法。 封孔處理除了蒸氣封孔以外,亦能夠進行氟化鉻酸的 單獨處理,使用氟化鈉處理等藉由含有無機氟化合物之水 溶液進行封孔處理,添加氯化鉀之蒸氣封孔、及藉由熱水 之封孔處理。 其中,以藉由含有無機氟化合物之水溶液進行封孔處 理,藉由水蒸氣封孔處理及藉由熱水之封孔處理爲佳。 親水化處理有美國專利第2,7 14,066號、同第3,181,461 號、同第3,28〇,734號及同第3,902,734號說明書所記載之 鹼金屬矽酸鹽法。在該方法,係使用矽酸鈉等水溶液浸漬 處理或電解處理支撐體。此外有特公昭36-22063號所記載 -70- 200819915 之氟化鉻酸鉀處理之方法、如美國專利第3,276,868號、同 第4,15 3,461號及同4,689,272號說明書所記載之使用聚乙 烯基膦酸處理之方法。 本發明之支撐體係使用聚酯薄膜等表面親水性不充分 的支撐體時,以進行塗布親水層來使表面具有親水性爲 佳。親水層係以塗布含有選自特開2 0 0 1 - 1 9 9 1 7 5號公報所 記載之鈹、鎂、鋁、矽、鈦、硼、鍺、錫、鉻、鐵、釩、 銻及過渡金屬之至少一種元素的氧化物或氫氧化物的膠體 之塗布液而構成的親水層;或特開2002-79772號公報所記 載之具有使有機親水性聚合物交聯或模擬交聯所得到的有 機親水基質之親水層;或具有藉由聚烷氧基矽烷、鈦酸酯、 鉻酸酯或鋁酸酯的加水分解、縮合反應所構成的溶膠-凝膠 變換而得到的無機親水性基質之親水層;或是由具有含金 屬氧化物表面之無機薄膜所構成的親水層爲佳。其中,以 塗布含有矽的氧化物或、氫氧化物的膠體之塗布液而構成的 親水層爲佳。 又,本發明的支撐體係使用聚酯薄膜等時,在支撐體 的親水性層側或反對側、或兩側,以設置有防靜電層爲佳。 將防靜電層設置在支撐體與親水性層之間時,能夠有助於 提升與親水性層之黏附性。防靜電層可使用特開 2002-7 97 72號公報所記載之將金屬氧化物微粒子或無光劑 分散成的聚合物層等。 支撐體例如鋁板時,其表面中心線平均粗糙度以 0.10〜1·2微米爲佳。在此範圍內,能夠得到與感光層之良 -71- 200819915 好的黏附性、良好的耐刷性、及良好的不容易污染性。 又’支撐體的色濃度係反射濃度以〇\1 5〜〇· 65爲佳。 在該範圍內,藉由防止影像曝光時之光暈,能夠得到良好 的影像形成性及顯像後的良好校版正確性。 [底塗層] 在本發明的平版印刷版原版,以在支撐體上設置含聚 合性基化合物的底塗層爲佳。使用底塗層時,感光層係設 置在底塗層的上面。因爲底塗層在曝光部能強化支撐體與 感光層的黏附性,且在未曝光部能夠使感光層容易地從支 撐體產生剝離,所以能夠提升顯像性。 底塗層具體上可舉出特開平1 0-282679號公報所記載 之具有能夠加成聚合的乙烯性雙鍵反應基之矽烷偶合劑、 特開平2-3 0444 1號公報所記載之具有能夠加成聚合的乙烯 性雙鍵反應基之磷化合物等。特佳之化合物可舉出甲基丙 烯酸、丙烯酸基等的聚合性基、及磺酸基、磷酸基、磷酸 酯基等具有支撐體黏附性之化合物。除了聚合性基及支撐 體黏附性基以外,亦可舉出之適合的化合物係具有環氧乙 烷基等親水性賦予基之化合物。 底塗層的塗布量(固體成分)以0.1〜100毫克/平方公尺 爲佳,以1〜30毫克/平方公尺爲佳。 [硬塗層] 在支撐體上實施表面處理後或形成底塗層後,亦可按 照必要在支撐體的背面設置硬塗層。 硬塗層可適合舉出观如特開平5 -4 5 8 8 5號公報所記載 -72- 200819915 之有機高分子化合物、特開平6- 3 5 1 74號公報所記載之由 將有機金屬化合物或無機金屬化合物加水分解及縮聚而得 到的金屬氧化物所構成之被覆層。其中,使用Si(OCH3)4、 Si(〇C2H5)4、Si(OC3H7)4、Si(OC4H9)4 等矽的烷氧基化合 物,從原料價廉且容易取得而言,乃是較佳。 <製版方法> 在本發明之平版印刷版原版的製版步驟,亦可按照必 要在曝光前、曝光中、及從曝光至顯像之間對全面進行加 熱。藉由如此的加熱能夠促進感光層中的影像形成反應, 能夠得到提高敏感度或耐刷性、及敏感度的穩定化之優 點。而且,以提升影像強度、耐刷性作爲目的,對顯像後 的影像進行全面後加熱、或全面曝光亦是有效的。通常顯 像前的加熱係以1 50°C以下的溫和條件進行爲佳。溫度太 高時,在非影像部區域會有產生不需要的硬化反應等問題 之可能性。一方面,在顯像後的加熱可利用非常強的條件。 通常係以200〜5 00°C的範圍進行加熱處理。溫度低時無法 到充分的影像強化作用,太高時,會產生支撐體劣化、影 像部熱分解之問題。 本發明之平版印刷版原版的曝光方法能夠沒有限制地 使用眾所周知的方法。光源的波沒有特別限定’以利用3 〇〇 奈米〜850奈米之物爲佳。而且,以利用350奈米至450奈 米之物爲更佳,具體上以InGaN系半導體雷射爲佳。曝光 機構可以是內滾筒方式、外滾筒方式、及平台方式中任一 種都可以。又,本發明的感光層成分藉由使用高水溶性之 -73- 200819915 物,在中性水或弱鹼水中可溶,亦可將此種構成之平版印 刷版裝塡在印刷機上後,在機上進行曝光-顯像之方式。 3 5 0〜45 0奈米之能夠取得雷射光源,能夠利用以下之 物。 能夠利用氣體雷射之Αι:離子雷射(3 64奈米、351奈 米、10mW〜1W)、Kr離子雷射(3 6 5奈米、351奈米、 10mW 〜1W); He-Cd 雷射(441 奈米、325 奈米、ImW 〜100W)、 固體雷射之Nd : YAG(YV〇4)與SHG結晶χ2次的組合(355 奈米、5mW〜1 W)、Cr : LiSAF與SHG結晶的組合(43 0奈米、 l〇mW);半導體雷射系之KNb03環共振器(43 0奈米、30 mW)、波導型波長變換元件與AlGaAs、InGaAs半導體的組 合(380奈米〜450奈米、5 mW〜100 mW)、波導型波長變換 元件與AlGalnP、AlGaAs半導體的組合(300奈米〜3 5 0奈 米、5 mW 〜lOOmW)、AlGaInN(350 奈米〜450 奈米、5 mW 〜100 mW)、及脈衝雷射之 N2雷射(3 3 7奈米、脈衝 〇·1 〜10mJ)、XeF(351 奈米、脈衝 10〜250 mJ)等。 此等之中,從波長特性、成本面而言,以AlGalnN半 導體雷射(例如InGaN系半導體雷射400〜410奈米、5〜30 mW)爲特佳。 又,掃描曝光方式之平版印刷版曝光裝置,曝光機構 有內滾筒方式、外滾筒方式、及平台方式,可利用上述光 源中除了脈衝雷射以外的全部光源作爲光源。因現實上之 感材敏感度與製版時間之關係,以下的曝光裝置爲佳。 •內滾筒方式且使用1個氣體雷射或固體雷射光源之 -74-These co-sensitizers can be further modified in accordance with the characteristics of the photosensitive layer of the original plate of the printing plate as in the case of the conventional co-sensitizer. For example, it is possible to introduce a hydrophilic component, a hydrophilicity-promoting moiety, a substituent which inhibits crystallization, and a substituent which is used for extracting, by introducing a partial bond with a sensitizing coloring matter, an initiator, and a polymerization radical. And methods such as polymerization. These co-sensitizers may be used in combination of two or more kinds. The amount of use is 〇 with respect to 100 parts by mass of the polymer having an ethylenically unsaturated double bond. 〇 5 to 100 parts by mass, preferably in parts by volume, more preferably in the range of 3 to 50 parts by mass. (Microcapsule) In the present invention, a method of containing the photosensitive layer structural component and other structural components in the photosensitive layer, for example, can be described in JP-A-2001, JP-A-200-277742 The glue has a portion of the structural component and is added to the photosensitive layer. At this time, each component can be contained in the microcapsules and outside the microcapsules at an arbitrary ratio. Improved flat chemical modification and incorporation for adhesion or adhesion alone or in combination 1 to 80. 277740 capsular inclusion structure described later -51- 200819915 The method of microencapsulation of the photosensitive layer structural component can be carried out by a well-known method. For example, the method for producing a microcapsule can utilize the coagulation method described in the specification of U.S. Patent No. 2,080, 045, and the specification of U.S. Patent No. 2,048, 854; the specification of U.S. Patent No. 3,287,54, the disclosure of which is incorporated herein by reference. An interfacial polymerization method described in each of the '446 publications; a method for precipitating a polymer according to the specification of U.S. Patent No. 3,418,250, and the specification of No. 3,606,04; according to U.S. Patent No. 3 7 9 Method for the isocyanate polyol wall material of 6 6 6 9; method for isocyanate polyol wall material of US Pat. No. 3 9 1 4 5 1 1; each specification of the US Patent No. 4 0 0 1 1 0 0 Method for forming a urea-formaldehyde or urea-formaldehyde-resorcin-based wall forming material according to the specification of No. 4 0 8 7 3 7 6 and the same as No. 4 0 8 9 8 2; US Patent No. 4025445 a method of using a wall material such as melamine-formaldehyde resin or hydroxycellulose; in situ in the polymerization of a monomer described in each of the publications of Japanese Patent Publication No. Sho 3-6-9 1 63 Law; and British Patent No. 9 3 0 4 2 2, US Patent No. 3 1 The spray drying method described in the specification of 1 1 4 0 7; and the electrolytic dispersion cooling method described in each of the specifications of the British Patent No. 9 5 2 8 7 and the same as 9 067 074; however, the present invention is not limited thereto. . The preferred microcapsule wall system used in the present invention has three-dimensional cross-linking properties which are swelled by a solvent. From this point of view, the wall material of the microcapsules is preferably polyurea, polyurethane, polyester, polycarbonate, polyamine and mixtures thereof, and is characterized by polyurea and polyurethane. good. Further, a compound having a crosslinkable functional group such as an ethylenically unsaturated bond capable of introducing the above-mentioned water-insoluble polymer may be introduced into the microcapsule wall. -52- 200819915 The average particle size of the above microcapsules is 0. 01~3. 0 micron is preferred. With 0. 05~2. 0 micron is better, to 〇. 1〇~1. 〇Micron is especially good. Within this range, good resolution and stability over time can be obtained. (Other photosensitive layer components) The photosensitive layer of this invention can contain various additives as needed. Hereinafter, the description will be made. (Surfactant) In the present invention, in order to promote the developability and to enhance the coating surface, it is preferred to use a surfactant in the photosensitive layer. Examples of the surfactant include a nonionic surfactant, an anionic surfactant, a cationic surfactant, an amphoteric surfactant, and a fluorine-based surfactant. The surfactants may be used singly or in combination of two or more. The nonionic surfactant to be used in the present invention is not particularly limited, and those previously known can be used. Examples thereof include polyoxyethylene alkyl ethers, polyoxyethylene alkylphenyl ethers, polyoxyethylene polystyrene phenyl ethers, polyoxyethylene polyoxypropylene alkyl ethers, and glycerin fatty acid partial esters. , sorbitan fatty acid partial esters, neopentyl alcohol fatty acid partial esters, propylene glycol mono- fatty acid partial esters, sucrose fatty acid partial esters, polyoxyethylene sorbitan fatty acid partial esters, polyoxyethylene sorbitol Fatty acid partial esters, polyethylene glycol fatty acid partial esters, polyglycerol fatty acid partial esters, polyoxyethylated castor oils, polyoxyethylene glycerol fatty acid partial esters, fatty acid diethanolamines, hydrazine, hydrazine-double a copolymer of a -2-hydroxyalkylamine, a polyoxyethylene alkylamine, a triethanolamine fatty acid partial ester, a trialkylamine oxide, a polyethylene glycol, a polyethylene glycol, and a polypropylene glycol. -53- 200819915 The anionic surfactant used in the present invention is not particularly limited. It is possible to use a previously known one. For example, a fatty acid salt, a rosin acid salt, a hydroxy alkane sulfonate, an alkane sulfonate, a two-yard sulfonic acid succinate salt, a linear alkylbenzene sulfonate, etc. are mentioned. Branch chain-based besylate, alkylnaphthalene sulfonate, alkylphenoxy polyoxyethylene propyl sulfonate, polyoxyethylene alkyl sulfonate phenyl ether salt, N- Methyl sulfonium sulfonate sodium salt, N-alkyl sulfosuccinate monoamine sulphate disodium salt, petroleum sulfonic acid 0 salt, sulfated tallow oil, fatty acid alkyl ester sulfate salt, alkane Sulfate salts, polyoxyethylene alkyl ether sulfate salts, fatty acid monoglyceride sulfate salts, polyoxyethylene alkylphenyl ether sulfate salts, polyoxyethylene styryl phenyl ether sulfate a salt, an alkyl phosphate salt, a polyoxyethylene alkyl ether phosphate salt, a polyoxyethylene alkylphenyl ether phosphate salt, a partial saponified product of a styrene/maleic anhydride copolymer, Partial saponification of olefin/maleic anhydride copolymer, naphthalene sulfonate fumarin condensate φ anionic surfactant used in the present invention It is not particularly limited, and previously known things can be used. For example, alkylamine salts, fourth-order ammonium salts, polyoxyethylene alkylamine salts, and polyethylene polyamine derivatives can be mentioned. The amphoteric surfactant is not particularly limited as long as it is known in the art. For example, a carboxybetaine, an aminocarboxylic acid, a sulfobetaine, an amine sulfate, and an imidazole are mentioned. Further, among the above-mentioned surfactants, those having "polyoxyethylene" may be replaced by "polyoxymethylene", such as polyoxymethylene, polyoxypropylene or polyoxybutylene. These surfactants can be used. -54- 200819915 A more preferred surfactant is a fluorine-based surfactant containing a perfluoroalkyl group in the molecule. Examples of such a fluorine-based surfactant include anionic forms such as perfluoroalkyl carboxylate, perfluoroalkylsulfonate, and perfluoroalkyl phosphate; and amphoteric types such as perfluoroalkylbetaine; perfluoroalkane; a cationic type such as a trimethylammonium salt; an oxidized perfluoroalkylamine, a perfluoroalkyl ethylene oxide adduct, an oligomer containing a perfluoroalkyl group and a hydrophilic group, a perfluoroalkyl group, and a lipophilic group An oligomer, a perfluoroalkyl group, a hydrophilic and lipophilic group-containing oligomer, and a non-ionic type such as a fluoroalkyl group and an oleyl group-containing urethane. Further, a fluorine-based surfactant described in JP-A-62-17050, JP-A-62-226 1 43 and JP-A-60-168144 can also be used. The surfactant may be used alone or in combination of two or more. The content of the surfactant is preferably 0.0000 to 10% by mass, based on the total solid content of the photosensitive layer. 0^7% by mass is more preferable. (Colorant) In the present invention, a dyeing material having a large absorption in the visible light region can be used as the image coloring agent. Specifically, oil-soluble yellow #1 0 1 , oil-soluble yellow #1 0 3, oil-soluble pink # 3 1 2, oil-soluble green BG, oil-soluble blue Β 、 S, oil-soluble blue # 6 0 3, oil Soluble black Β γ, oil-soluble black b S, oil-soluble black T-5 05 (made by ORIENT Chemical Industry Co., Ltd.), Victoria blue, crystal violet (C142555), methyl violet (CI42535), A dye described in JP-A-62-293247, such as ethyl violet, rhodamine B (CI 145170B), malachite green (C142 000), methylene blue (C152015), and the like. Further, pigments such as indigo pigments, azo pigments, carbon black, and titanium oxide are also suitably used. -55- 200819915 Since these colorants can be easily added to the area image portion and the non-image portion after image formation, it is preferable to add them. In addition, the total solid content of the photosensitive layer is added in an amount of 〇.  〇 1 to 1 〇 mass% ratio is better. (Printing agent) In order to produce a print image, a compound which is discolored by an acid or a radical can be added to the photosensitive layer of the present invention. Such compounds are various colors such as diphenylmethane, triphenylmethane, thioline, lanthanum, xanthene, anthraquinone, imine lanthanide, azo, and carbamide. The material can be used effectively. Specific examples thereof include brilliant green, ethyl violet, methyl green, crystal violet, basic magenta, methyl violet 2B, quinaldine red, rose red, mitane yellow, rivastyl sulfonate, and Cresol blue, methyl orange, p-methyl red, Congo red, Benzo red purple 4B, α-naphthyl red, Nile blue 2B, Nile blue A, methyl violet, malachite green, vice magenta, Victoria Pure blue · BOH [HODOGAYA (share) system], oil soluble blue #603 [ORIENT chemical industry (share) system], oil soluble pink.  #3 12 [ORIENT Chemical Industry Co., Ltd.], oil-soluble red 5B [ORIENT Chemical Industry Co., Ltd.], oil-soluble red #308 [ORIENT Chemical Industry Co., Ltd.], oil-soluble red 〇G[ORIENT chemistry Industrial (stock) system], oil-soluble red RR [ORIENT Chemical Industry Co., Ltd.], oil-soluble green #5 02 [ORIENT Chemical Industry Co., Ltd.], SPIRON RED BEH SPECIAL [HODOGAYA (share) system], Cresol purple, cresol red, rhodamine B, rhodamine 6G, sulfonyl rhodamine B, alamin, 4-p-diethylaminophenylimino naphthoquinone, 2-carboxyanilinyl 4-p-diethylaminophenyliminonaphthylquinone, 2-carboxystearylamino-4-p-N,N-bis(hydroxyethyl)amino-phenylimidonaphthalene醌, 1-phenyl-56- 200819915 -3-methyl-4-p-diethylaminophenylimido-5-pyrazolone, 1-β·naphthyl p-diethylaminophenylimine A dye such as keto-5-pyrazolone or a leuco dye such as hydrazine, Ρ', ρ'$ methyltriaminetriphenylmethane (colorless crystal violet) or Pergascript BUe SRB (manufactured by CIBAGEIGY Co., Ltd.). In addition to the above, a leuco dye which is known as a raw material for thermal paper or sensation paper can be suitably used. Specific examples thereof include crystal violet lactone, malachite green lactone, benzamidine leuco methylene blue, and 2-(N-phenyl-N-methylamino)-6-(N-p-tolyl-N-B Amino-fluorescein yellow mother, 2-anilino_3_methyl-6-(N-ethyl-p-toluidine) fluorescent yellow mother, 3,6-dimethoxy fluorescent yellow mother, 3-(Ν,Ν·diethylamino)-5-methyl-7-(N,N-dibenzylamino)·fluorescent yellow mother, 3-(N-cyclohexyl-N-methylamino) -6-methyl-7-anilinyl fluorescent yellow mother, 3-(N,N-diethylamino)-6-methyl-7-anilinyl fluorescent yellow mother, 3-(N,N-di Ethylamino)-6-methyl-7-dimethylanilinyl fluorescent yellow mother, 3-(N,N-diethylamino)-6-methyl-7-chlorofluorescent yellow mother, 3- (N,N-diethylamino)-6-methoxy-7-aminofluorescent yellow precursor, 3-(N,N-diethylamino)-7-(4-chloroanilino)fluorescence Yellow mother, 3-(N,N-diethylamino)-7-chlorofluorescent yellow mother, 3-(N,N-diethylamino)-7-benzylamine fluorescent yellow mother, 3- (N,N-diethylamino)-7,8-benzoquinone fluorescent yellow mother, 3-(N,N-dibutylamino)-6-methyl-7-anilinyl fluorescent yellow mother, 3 -(N,N-dibutylamino -6-methyl-7-dimethylanilinyl fluorescent yellow mother, 3-piperidinyl-6-methyl-7-phenyl-amine-fluorescent yellow mother, 3-pyrrolidinyl-6-methyl -7-anilinofluorescent yellow mother, 3,3-bis(1-ethyl-2-methylindol-3-yl)decanolactone, 3,3-bis(1-n-butyl-2· Methyl indol-3-yl) azlactone, 3,3-bis(p-dimethylaminophenyl)-6-dimethylaminodecanolide, 3-(4-diethylamino-2 -ethoxyphenyl)-3-(1-ethyl-2-methylindole-57- 200819915 -3-yl)-4-decalactone, 3-(4-diethylaminophenyl) -3-(1-ethyl-2-methylindol-3-yl)decanolactone and the like. The amount of the dye which is discolored by acid or radical is added to the solid content of the photosensitive layer by 0. 0 1 to 1 5 mass% is preferred. (Polymerization inhibitor) In order to prevent unnecessary thermal polymerization of the polymerizable compound during the production or storage of the photosensitive layer, it is preferred to add a small amount of the heat-resistant polymer to the photosensitive layer of the present invention. The heat-resistant polymerization agent may, for example, be hydroquinone, p-methoxy-phenol, di-tert-butyl-p-cresol, gallic phenol, tert-butyl phenol, p-benzoquinone or 4,4-thiobis ( 3-methyl-6-tert-butylphenol), 2,2'-methylenebis(4-methyl-6.t-butylphenol), N-nitroso-N-phenylhydroxylamine Aluminum salt is preferred. For the solid content of the photosensitive layer, the amount of the anti-heating polymerization agent is about 〇. 〇1~ About 5 mass% is preferred. (higher fatty acid derivative or the like) In order to prevent polymerization inhibition by oxygen, a higher fatty acid derivative such as rosin or rosin may be added to the photosensitive layer of the present invention, and the drying step after coating may be partially biased. The surface of the photosensitive layer. The amount of the higher fatty acid derivative to be added is preferably from about 1 to about 10% by mass based on the solid content of the photosensitive layer. (Plasticizer) The photosensitive layer of the present invention may also contain a plasticizer. The plasticizer may suitably be exemplified by dimethyl phthalate, diethyl phthalate, dibutyl phthalate, diisobutyl phthalate, dioctyl phthalate, octyl octyl phthalate, dicyclohexyl phthalate. , tannic acid di--58- 200819915 tridecyl ester, butyl benzyl phthalate, diisononyl phthalate, diallyl phthalate, etc.; dimethyl glycol phthalate, ethanol Glycol esters such as ethyl ethyl decyl ethyl ester, methyl decyl ethyl glycol glycolate, butyl decyl butyl glycolate, and triethylene glycol dicaprylate; tricresyl phosphate, triphenyl phosphate Phosphates such as esters; diisobutyl adipate, dioctyl adipate, dimethyl sebacate, dibutyl sebacate, dioctyl sebacate, dibutyl maleate The aliphatic dibasic acid esters are poly(butyl methacrylate), triethyl citrate, triacetin, butyl laurate and the like. The content of the plasticizer is preferably 30% by mass or less based on the solid content of the photosensitive layer. (Inorganic Fine Particles) The photosensitive layer of the present invention may contain inorganic fine particles in order to increase the strength of the cured film of the image portion. The inorganic fine particles may suitably be a mixture of, for example, cerium oxide, aluminum oxide, magnesium oxide, titanium oxide, magnesium carbonate, alginic acid or the like. Although these have no photothermal conversion property, it is also possible to enhance the interfacial adhesion by strengthening the film and roughening the surface. The average particle diameter of the inorganic fine particles is preferably from 5 nm to 10 μm, and is 0. 5 to 3 microns is better. When it is in the above range, it can be stably dispersed in the photosensitive layer, and the film strength of the photosensitive layer can be sufficiently maintained, and a non-image portion excellent in hydrophilicity which is less likely to cause contamination during printing can be formed. The above inorganic fine particles can be easily obtained from a commercially available product of a colloidal ceria dispersion. The content of the inorganic fine particles is preferably 20% by mass or less, more preferably 1% by mass or less, based on the solid content of the photosensitive layer. (Low-Molecular Hydrophilic Compound) -59- 200819915 In order to improve developability, a hydrophilic low molecular compound can be contained in the photosensitive layer of the present invention. Examples of the hydrophilic low molecular compound such as a water-soluble organic compound include glycols such as ethylene glycol, diethylene glycol, triethylene glycol, propylene glycol, dipropylene glycol, and triethylene glycol, and ethers or ester derivatives thereof. , such as polyhydric acids such as glycerin and neopentyl alcohol, organic amines such as triethanolamine and diethanolamine monoethanolamine, and salts thereof, sulfonic acids and salts thereof such as toluenesulfonic acid and benzenesulfonic acid, and organic sulfonic acids such as phenylsulfonic acid. And an organic carboxylic acid such as a salt, tartaric acid, oxalic acid, citric acid, malic acid, lactic acid, gluconic acid or amino acid, or a salt thereof, or an organic quaternary ammonium salt such as tetraethylamine hydrochloride. The photosensitive layer of the present invention may contain, for example, a co-sensitizer in addition to the above. (Formation of Photosensitive Layer) The photosensitive layer of the present invention is obtained by dispersing or dissolving the above-mentioned respective components in a solvent to prepare a coating liquid, and applying it. The solvent to be used herein may, for example, be ethylene dichloride, cyclohexanone, methyl ethyl ketone, methanol, ethanol, propanol, ethylene glycol monomethyl ether or 1-methoxy-2-propanol. 2-methoxyethyl acetate, methoxycarbonyl-2-propyl acetate, dimethoxyethane, methyl lactate, ethyl lactate, N,N-dimethylacetamide, N,N-dimethylformamide, V tetramethylurea, N-methyl fluorenone dimethyl hydrazine, butyl sulfonium, r-butyrolactone, toluene, water, etc. 'but not limited This is the case. These solvents may be used singly or in combination. The solid content concentration of the coating liquid is preferably from 1 to 50% by mass. The photosensitive layer of the present invention can also be formed by a plurality of times of preparing a coating liquid obtained by dispersing or dissolving the same or different components described above in the same or different solvents, followed by repeated application of a plurality of coatings. -60- 200819915 Further, the coating amount (solid content) of the photosensitive layer on the support obtained after coating and drying varies depending on the use, and is usually 〇. 3~3. 0 g / m ^ 2 is preferred. In this range, good sensitivity and good film properties of the photosensitive layer can be obtained. Various methods can be used for the coating method. For example, bar coating, spin coating, spray coating, curtain coating, dip coating, pneumatic blade coating, blade coating, roll coating, and the like can be given. [Protective layer] The lithographic printing plate precursor of the present invention can provide a protective layer (oxygen barrier layer) on the photosensitive layer in order to isolate the diffusion of oxygen which hinders the polymerization reaction at the time of exposure. The protective layer used in the present invention has an oxygen permeability A of 1. at 25 ° C and 1 atm. 0 € Ag 20 (ml/m2 • day) is preferred. Oxygen permeability A is less than 1.  The extremely low case of 0 (ml/m2 • day) will cause unwanted polymerization during manufacturing and before use, and will produce unwanted whitening and thicker image lines when the image is exposed. The problem. Conversely, an oxygen permeability A greater than 20 (ml/m2 • day) is too high, resulting in low sensitivity. Oxygen permeability A is 1 . 5 ‘ A S 12 (ml / square metric • day) range is better, to 2. 0 S AS 10. The range of 0 (ml / m ^ 2 · day) is better. Further, the required properties of the protective layer are not only the above-described oxygen permeability, but also excellent in the adhesion of the light used for the exposure and the adhesion to the photosensitive layer, and the development step after the exposure can be easily performed. Removal is better. The prior art of the present invention is described in detail in the specification of U.S. Patent No. 3,4,8,8,11, and Japanese Patent Publication No. 5-5-49279. -61- 200819915 The material which can be used for the protective layer is preferably a water-soluble polymer compound having excellent crystallinity, and specific examples thereof include polyvinyl alcohol, vinyl alcohol/ethylene phthalate copolymer, and vinyl acetate/vinyl alcohol. Water-soluble polymers such as vinyl phthalate copolymer, vinyl acetate/crotonic acid copolymer, polyvinylpyrrolidone, acid cellulose, gelatin, gum arabic, polyacrylic acid, polypropylene decylamine, etc., which may be used singly or in combination. . Among these, the use of polyvinyl alcohol as a main component' can provide more excellent basic characteristics of oxygen barrier properties and developmental removability. The polyvinyl alcohol used in the protective layer may be partially substituted with an ester, an ether or an acetal as long as it contains an unsubstituted vinyl alcohol unit having a necessary oxygen barrier property and water solubility. Further, similarly, a part may have other copolymerization components. Specific examples of the polyethylene include those having a degree of hydrolysis of 71 to 100 mol% and a polymerization repeating unit of 300 to 2400. Specifically, PVA-105, PVA-110, PVA-117, PVA-117H, PVA-120, PVA-124, PVA-124H, PVA-CS, PVA-CST, PVA-HC manufactured by Kuraray Co., Ltd. , PVA-2 0 3, PVA-204, P VA-2 0 5, PVA-210, PVA-217, PVA-220, PVA-224, PVA-217EE, PVA-217E, PVA-220E, PVA-224E, PVA-405, PVA-420, PVA-613, L-8, etc., these may be used alone or in combination. Preferably, the content in the protective layer of polyvinyl alcohol is 20 to 95% by mass, more preferably 30 to 9% by mass. Further, a well-known modified polyvinyl alcohol can also be suitably used. For example, an anion-modified portion which is modified by an anion such as a carboxyl group or a sulfonic acid group, and a cation which is modified by a cation such as an amine group or an ammonium group, and a cation-62-200819915 modified portion, a stanol a polyvinyl alcohol having various degrees of polymerization of various hydrophilic modified portions such as a modified portion and a thiol-modified portion; and the anion-modified portion, the cation-modified portion, and the stanol-modified portion at the terminal of the polymer chain , a mercaptan-modified portion, alkoxy-modified portion, a thioether-modified portion, an ester-modified portion of vinyl alcohol and various organic acids, an ester-modified portion of the anion-modified portion and an alcohol, and an epoxy Polyvinyl alcohol or the like having various degrees of polymerization of various modified sites such as a modified portion. The content of the polyvinylpyrrolidone or a modified product thereof as a component to be mixed with polyvinyl alcohol from the viewpoint of oxygen barrier property and developmental removability is 3. 5 to 80% by mass, preferably 10 to 60% by mass, more preferably 15 to 30% by mass. The composition of the protective layer (the selection of the PVA, the use of the additive), and the coating amount are selected in consideration of the whitening property, the adhesion property, and the abrasion resistance in addition to the oxygen barrier property and the image removal property. In general, the higher the hydrolysis rate of the PVA used (the higher the unsubstituted vinyl alcohol unit content in the protective layer) and the higher the film thickness, the higher the oxygen barrier property, which is advantageous in terms of sensitivity. The (co)polymer of the above polyvinyl alcohol (PVA) or the like may have a molecular weight of from 2,000 to 10,000,000, preferably from 20,000 to 30,000. As a other component of the protective layer, it is possible to add a certain amount of glycerin, dipropylene glycol, or the like to the (co)polymer to impart flexibility, and to add a mass% to the polymer compound binder. Anionic surfactant such as sodium alkyl sulfate as alkylsulfonate; amphoteric surfactant such as alkylaminocarboxylate or alkylaminodicarboxylate; and nonionic interfacial activity such as polyoxyethylene alkylphenyl ether Agent. -63- 200819915 Moreover, the adhesion to the image portion or the scratch resistance is extremely important in the processing of the printing plate. In other words, when the hydrophilic layer composed of the water-soluble polymer is laminated on the lipophilic photosensitive layer, film peeling is likely to occur due to insufficient adhesion, and the peeling portion may cause defects such as poor film hardening due to polymerization inhibition of oxygen. In this case, various proposals have been made to improve the adhesion between these two layers. For example, in the hydrophilic polymer mainly composed of polyvinyl alcohol, 20 to 60% by mass of acrylic acid is mixed in the hydrophilic polymer mainly composed of polyvinyl alcohol, as described in U.S. Patent Application No. 2,902, 510, and U.S. Patent Application Serial No. An emulsion or a water-insoluble vinylpyrrolidone-vinyl acetate copolymer or the like can be sufficiently laminated by laminating on a photosensitive layer. Any of these well-known techniques can also be applied to the protective layer of the present invention. The coating method of such a protective layer is described, for example, in the specification of U.S. Patent No. 3,458,311 and Japanese Patent Publication No. 55-49729. Further, in order to enhance the oxygen barrier property or the surface protective property of the photosensitive layer, the protective layer of the lithographic printing plate precursor of the present invention preferably contains an inorganic layered compound. Here, the inorganic layered compound has particles having a thin plate shape, and examples thereof include the following general formula A (B, C) 2-5D4 〇 10 (〇H, F, O) 2 (where A Any of K, Na, and Ca, natural mica represented by either B or C, Fe(II), Fe(III), Μη, Al, Mg, or V, D-based Si or Al) Mica group such as mica, talc represented by formula 3Mg0*Si0*H20, mica, montmorillonite, saponite, sodium mica, and chromium phosphate. In the above mica group, natural mica can be cited as muscovite, sodium mica, gold-64-200819915 mica, biotite and scale mica. Further, synthetic mica may be exemplified by fluorophlogopite KMg3 (AlSi301G) F2, potassium tetramica KMg2. 5 (Si401G)F2 and other non-swelling mica, and Na four mica NaMg2. 5(Si401())F2, Na or Li with mica (Na, Li) Mg2Li(Si4〇i〇)F2, montmorilloniteite system Na or Li needle sodastone (Na, Li) 1/8Mg2 Sweeping mica such as /5Li1/8 (Si4〇i())F2. Also, the synthesis of smectite (sumectite) is also useful. In the above-mentioned inorganic layered compound, the fluorine-based swellable mica which is a synthetic inorganic layered compound is particularly useful. That is, the swellable mica, or swellable clay such as montmorillonite, saponite, cannafeite, bentonite, etc. Minerals and the like have a laminated structure composed of a unit crystal lattice layer having a thickness of about 10 to 15 A, and the metal atom substitution system in the lattice is remarkably larger than other clay minerals. As a result, the lattice layer is deficient in positive charges, and cations such as Na+, Ca2+, and Mg2+ adsorbed between the layers in order to compensate. These inter-layer cations are called exchange cations and can be exchanged with various cations. In particular, in the case of the cations Li+ and Na+ between the layers, since the ionic radius is small, the bond between the intergranular crystal lattices is weak, and the swelling is increased by water. In this state, if shearing is applied, it is easy to crack and form a stable sol in water. The tendency of bentonite and swellable synthetic mica is strong, and it is useful in the present invention to use swellable synthetic mica. The shape of the inorganic layered compound used in the present invention is preferably as thin as possible from the viewpoint of diffusion control, and the planar size is preferably as long as it does not impede the smoothness of the coated surface or the transmittance of the active light. Therefore, the aspect ratio is 20 or more, preferably 100 or more, and particularly preferably 200 or more. Further, the ratio of the aspect ratio to the thickness of the long diameter of the particles can be measured, for example, from a projection of a micrograph of the particle -65-200819915. The greater the aspect ratio, the greater the effect. The particle size of the inorganic layered compound used in the present invention has an average length of 0. 3 to 2 0 micron, to 0. 5 to 10 μm is preferred, and 1 to 5 μm is preferred. Moreover, the average thickness of the particles is 0. Below 1 micron, to 0. Below 05 microns is better, to 〇.  〇 1 micron or less is especially good. For example, among the inorganic layered compounds, the swellable synthetic mica of the representative compound has a size of 1 to 50 nm and a face size of about 1 to 20 μm. When such an inorganic layered compound having a large aspect ratio is contained in the protective layer, since the coating film strength can be improved, oxygen and moisture can be effectively prevented from being transmitted, so that deterioration of the protective layer due to deformation or the like can be prevented, and It can be stored for a long period of time even under high-humidity conditions, and there is no deterioration in image formation property of the lithographic printing plate precursor due to humidity change, and it has excellent preservation stability. The mass ratio of the organic layer-like compound in the protective layer is preferably from 5/1 to 1/100, based on the amount of the binder used in the protective layer. When a plurality of inorganic layered compounds are used, the total amount of these inorganic layered compounds is preferably the above-mentioned mass ratio. Next, an example of a usual dispersion method of the inorganic layered compound used for the protective layer will be described. First, 5 to 10 parts by mass of a swellable layered compound (a preferred compound of the inorganic layered compound mentioned above) is added to 100 parts by mass of water, and then fully melted with water and swelled, Dispersion is carried out by a disperser. The dispersing machine used here can be exemplified by various types of honing machines which are mechanically directly applied to disperse, and high-strength shearing power. -66·200819915 Stirring type dispersing machine, which can impart high-intensity ultrasonic energy dispersion. Machine and so on. Specifically, a ball mill, a sand mill, a homogenizing honing machine, a colloid mill, a homogenizer, a dissolver, a homogenizer (p〇1ytr〇n), a homomixer, a homogenizer, and a homomixing can be mentioned. Mixer, Caddy honing machine, jet mixer, capillary emulsifier, liquid whistle, electromagnetic strain ultrasonic generator, emulsifying device with Pohlmann flute. The dispersion of the inorganic layered compound of 5 to 10% by mass which was dispersed by the above method was high in viscosity or gel, and the storage stability was extremely excellent. When the protective layer coating liquid is prepared by using the dispersion, it is preferably diluted with water and thoroughly stirred, and then blended with a binder solution. In the protective layer coating liquid, in addition to the inorganic layered compound, a well-known additive such as a surfactant for improving coatability or a water-soluble plasticizer for improvement may be added. Examples of the water-soluble plasticity include acrylamide, cyclohexanediol, glycerin, and sorbitol. Further, a water-soluble (meth)acrylic polymer may also be added. Further, in order to improve the adhesion to the photosensitive layer and the stability of the coating liquid over time, a well-known additive may be added. The protective layer coating liquid thus prepared is applied onto a photosensitive layer formed on a support, and dried to form a protective layer. The coating solvent may be appropriately selected from those related to the binder, and when a water-soluble polymer is used, it is preferred to use distilled water or purified water. The coating method of the protective layer is not particularly limited, and a well-known method such as the method described in the specification of the U.S. Patent No. 3,45, 311 or the Japanese Patent Publication No. 5-5-4 9729 can be applied. Specifically, for example, a doctor blade coating method, a pneumatic blade coating method, a gravure coating method-67-200819915 method, a roll coating method, a spray coating method, a dip coating method, a bar coating method, and the like can be given. The coating amount of the protective layer is preferably in the range of 〇·05 to 10 g/m 2 , and the range of 0·1 to 0·5 g/m 2 when the inorganic layered compound is contained. More preferably, when it does not contain an inorganic inorganic layered compound, it is 0. A range of 5 to 5 g/m 2 is more preferred. [Support] The support used in the lithographic printing plate precursor of the present invention is not particularly limited, and may be a plate-shaped hydrophilic support having a stable size. Examples thereof include paper, plastic (for example, polyethylene, polypropylene, polystyrene, etc.) laminated paper, metal sheets (for example, aluminum, zinc, copper, etc.), and plastic films (for example, diacetate fibers). , cellulose triacetate, cellulose propionate, cellulose butyrate, cellulose acetate butyrate, nitrocellulose, polyethylene terephthalate, polyethylene, polystyrene, polypropylene, polycarbonate, poly A vinyl acetal or the like, a paper or a plastic film obtained by laminating or vaporizing the above metal. Preferred support members are polyester film and aluminum plate. Among them, aluminum sheets are preferred because of their good dimensional stability and relatively low cost. The aluminum plate has a pure aluminum plate, an alloy plate containing aluminum as a main component and containing a small amount of different elements, or a laminate of plastic on an aluminum or aluminum alloy film. All the different elements in the aluminum alloy are alizarin, iron, manganese, copper, magnesium, chromium, zinc, antimony, nickel, and chin. The content of the different element in the alloy is preferably 1% by mass or less. In the present invention, a pure aluminum plate is preferred, since the manufacture of completely pure is difficult in terms of refining technology, and therefore it may contain a small amount of different elements. The nameplate does not have a specific composition, and the well-known materials can be suitably used. The thickness of the support is from 0·1 to 0. 6 mm is better, with 0. 15~0. 4mm -68- 200819915 is better, with 0. 2~0. 3 mm is better. It is preferred to carry out surface treatment such as roughening treatment and anodizing treatment before using the aluminum plate. The surface treatment can improve the hydrophilicity and easily ensure the adhesion of the photosensitive layer to the support. Before the roughening of the nameplate, it is preferable to carry out degreasing treatment using a surfactant, an organic solvent, or an alkaline aqueous solution as needed to remove the calendered oil of the watch. The roughening treatment of the surface of the aluminum plate can be carried out by various methods, and examples thereof include mechanical roughening treatment and electrochemical graining treatment (chemical surface roughening treatment), chemical rough surface Treatment (chemically selecting the roughening treatment of the dissolved surface). As a method of mechanical graining treatment, a well-known method such as a ball honing method, a brush honing method, a sandblasting honing method, or a polishing honing method can be used. The method of electrochemical graining treatment can be carried out, for example, by alternating current or direct current in an electrolytic solution containing an acid such as hydrochloric acid or nitric acid. Further, a method of using a mixed acid described in JP-A-54-6 5 3 902 is also possible. The aluminum plate which has been roughened may be subjected to an etching treatment using an aqueous solution such as potassium hydroxide or sodium hydroxide as necessary, and may be anodized to improve wear resistance after the neutralization treatment as needed. deal with. The electrolyte used in the anodizing treatment of the aluminum plate can use various electrolytes which can form a porous oxide film. A mixed acid of sulfuric acid, hydrochloric acid, oxalic acid, chromic acid or the like can be usually used. The concentration of these electrolytes can be appropriately determined depending on the type of the electrolyte. Since the anodizing treatment conditions vary from -69 to 20081991 depending on the electrolyte used, it cannot be specified at a glance, usually at an electrolyte concentration of 1 to 8 ο mass % solution, liquid temperature 5 to 70 ° C, current The density is 5 to 60 A/dm 2 , the voltage is 1 to 100 V, and the electrolysis time is 1 sec. to 5 minutes. The amount of the anodized film formed is from 1 to 0 to 5. 0 g / m ^ 2 is better, to 1 . 5~4. 0 g/cm 2 is more preferred. Within this range, good printing durability and good scratch resistance in the non-image portion of the lithographic printing plate can be obtained. The support used in the present invention may be a substrate having an anodic oxide film which has been subjected to the above surface treatment, and may be appropriately selected as necessary in order to improve adhesion to the upper layer, hydrophilicity, contamination resistance, heat insulation, and the like. The micropore enlargement treatment, the micropore sealing treatment, and the surface immersion treatment on the surface containing a hydrophilic compound, etc., are described in JP-A-2001-253181, JP-A-2001-322365. Of course, the sealing treatment is not limited to the above description, and any method previously known can be used. In addition to vapor sealing, the sealing treatment can also perform a separate treatment of fluoric acid chromic acid, a sealing treatment by an aqueous solution containing an inorganic fluorine compound, a sodium fluoride treatment, a vapor sealing with potassium chloride, and a borrowing process. It is sealed by hot water. Among them, the sealing treatment by the aqueous solution containing the inorganic fluorine compound is preferably carried out by a water vapor sealing treatment and a sealing treatment by hot water. The hydrophilization treatment is an alkali metal citrate method described in the specification of U.S. Patent No. 2,7, 066, the disclosure of which is incorporated herein by reference. In this method, the support is immersed or electrolytically treated with an aqueous solution such as sodium citrate. In addition, there is a method of treating potassium fluorochromate treated by -70-200819915, which is described in Japanese Patent No. 3,276,868, the disclosure of which is incorporated herein by reference. The method of phosphonic acid treatment. When the support system of the present invention uses a support having insufficient surface hydrophilicity such as a polyester film, it is preferred to apply a hydrophilic layer to make the surface hydrophilic. The hydrophilic layer is coated with cerium, magnesium, aluminum, lanthanum, titanium, boron, lanthanum, tin, chromium, iron, vanadium, niobium, and the like, which are described in JP-A-2000-119. a hydrophilic layer composed of a coating liquid of an oxide of an at least one element of a transition metal or a colloidal solution of a hydroxide; or a method of crosslinking or simulating cross-linking of an organic hydrophilic polymer as described in JP-A-2002-79772 a hydrophilic layer of an organic hydrophilic matrix; or an inorganic hydrophilic matrix obtained by a sol-gel transformation consisting of hydrolysis, condensation reaction of polyalkoxydecane, titanate, chromate or aluminate The hydrophilic layer; or a hydrophilic layer composed of an inorganic thin film having a metal oxide-containing surface is preferred. Among them, a hydrophilic layer formed by coating a coating liquid containing a cerium oxide or a hydroxide colloid is preferred. Further, when a polyester film or the like is used as the support system of the present invention, it is preferred to provide an antistatic layer on the hydrophilic layer side or the opposite side or both sides of the support. When the antistatic layer is disposed between the support and the hydrophilic layer, it can contribute to the adhesion of the hydrophilic layer. As the antistatic layer, a polymer layer obtained by dispersing metal oxide fine particles or a matting agent described in JP-A-2002-7 97 72 can be used. When the support is, for example, an aluminum plate, the average center line roughness of the surface is 0. 10 to 1. 2 microns is preferred. Within this range, good adhesion to the photosensitive layer - 71 - 200819915, good brush resistance, and good non-contamination property can be obtained. Further, the color density of the support is a reflection concentration of 〇\1 5~〇·65. Within this range, good image formation properties and good plate correctness after development can be obtained by preventing halation during image exposure. [Undercoat layer] In the lithographic printing plate precursor of the invention, it is preferred to provide a primer layer containing a polymerizable group compound on the support. When the undercoat layer is used, the photosensitive layer is disposed on the undercoat layer. Since the undercoat layer can strengthen the adhesion between the support and the photosensitive layer in the exposed portion, and the photosensitive layer can be easily peeled off from the support in the unexposed portion, the developability can be improved. Specific examples of the undercoat layer include a decane coupling agent having an ethylenic double bond reactive group capable of addition polymerization described in JP-A-H08-282679, and JP-A-2-3 0444 1 An addition of a polymerized ethylene double bond reactive group of a phosphorus compound or the like. The compound which is particularly preferable is a polymerizable group such as methacrylic acid or an acrylic group, and a compound having a support adhesion such as a sulfonic acid group, a phosphoric acid group or a phosphate group. In addition to the polymerizable group and the support-adhesive group, a suitable compound may be a compound having a hydrophilicity-imparting group such as an epoxy group. The coating amount (solid content) of the undercoat layer is 0. It is preferably 1 to 100 mg/m 2 , preferably 1 to 30 mg/m 2 . [Hard Coating Layer] After the surface treatment is performed on the support or after the undercoat layer is formed, a hard coat layer may be provided on the back surface of the support as necessary. The organic polymer compound described in Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. Or a coating layer composed of a metal oxide obtained by hydrolyzing and polycondensing an inorganic metal compound. Among them, the use of an alkoxy compound such as Si(OCH3)4, Si(〇C2H5)4, Si(OC3H7)4 or Si(OC4H9)4 is preferred because it is inexpensive and easily available. <Plate making method> In the plate making step of the lithographic printing plate precursor of the present invention, it is also possible to comprehensively heat the film before, during, and from exposure to development. By such heating, the image formation reaction in the photosensitive layer can be promoted, and the advantage of improving the sensitivity, the printing durability, and the sensitivity can be obtained. Further, for the purpose of improving image strength and brush resistance, it is also effective to perform overall post-heating or full-exposure of the image after development. It is preferred that the heating before the development is carried out under mild conditions of 150 ° C or lower. When the temperature is too high, there is a possibility that an unnecessary hardening reaction or the like may occur in the non-image area. On the one hand, the heating after development can take advantage of very strong conditions. The heat treatment is usually carried out in the range of 200 to 500 °C. When the temperature is low, sufficient image enhancement cannot be achieved. When it is too high, there is a problem that the support is deteriorated and the image portion is thermally decomposed. The exposure method of the lithographic printing plate precursor of the present invention can be carried out without any limitation using a well-known method. The wave of the light source is not particularly limited, and it is preferable to use a material of 3 奈 nm to 850 nm. Further, it is preferable to use a material of 350 nm to 450 nm, and specifically, an InGaN-based semiconductor laser is preferred. The exposure mechanism may be any of an inner roller mode, an outer roller mode, and a platform mode. Further, the photosensitive layer component of the present invention can be dissolved in neutral water or weakly alkaline water by using the highly water-soluble -73-200819915, and the lithographic printing plate of such a constitution can be mounted on a printing machine. The exposure-development method is performed on the machine. 3 5 0 to 45 0 nanometers can obtain laser light sources, and can use the following. Capable of using gas lasers: ion laser (3 64 nm, 351 nm, 10 mW to 1 W), Kr ion laser (3 6 5 nm, 351 nm, 10 mW ~ 1 W); He-Cd Ray Shot (441 nm, 325 nm, ImW ~ 100 W), solid laser Nd : YAG (YV 〇 4) and SHG crystallization χ 2 times combination (355 nm, 5 mW ~ 1 W), Cr : LiSAF and SHG Combination of crystals (43 0 nm, l〇mW); KNb03 ring resonator of semiconductor laser system (43 0 nm, 30 mW), combination of waveguide type wavelength conversion element and AlGaAs, InGaAs semiconductor (380 nm ~ 450 nm, 5 mW to 100 mW), combination of waveguide type wavelength conversion element and AlGalnP, AlGaAs semiconductor (300 nm to 350 nm, 5 mW to 100 mW), AlGaInN (350 nm to 450 nm, 5 mW ~ 100 mW), and pulsed laser N2 laser (3 3 7 nm, pulse 〇 · 1 ~ 10 mJ), XeF (351 nm, pulse 10 ~ 250 mJ). Among these, from the wavelength characteristics and the cost surface, AlGalnN semiconductor lasers (for example, InGaN-based semiconductor lasers of 400 to 410 nm and 5 to 30 mW) are particularly preferable. Further, in the lithographic printing plate exposure apparatus of the scanning exposure method, the exposure mechanism has an inner roller method, an outer roller method, and a platform method, and all of the light sources other than the pulse laser light source can be used as the light source. Due to the relationship between sensory sensitivity and plate making time in reality, the following exposure devices are preferred. • Internal drum mode and use 1 gas laser or solid laser light source -74-

(eq3 ) 200819915 單射束曝光裝置 •平台方式且使用多數個(10個以上)半導 射束曝光裝置 •外滾筒方式且使用多數個(10個以上)半 多射束曝光裝置 在如上述之雷射直描型的平版印刷版,通 感度X(J/平方公分)、感材的曝光面s(平方公 射光源的功率q(W)、雷射支數η、總曝光時間 (e q 1)成立。 X*S = n*q*t (eql) i)內滾筒式(單射束)方式時 在雷射旋轉數f(弧度/秒)、感材的副掃描 分)、解像度Z(點/公分)、總曝光時間t(秒) 成立。 f#Z#t =Lx (eq2) 11)外滾筒式(多射束)方式時 在雷射旋轉數F(弧度/秒)、感材的副掃描 分)、解像度Z(點/公分)、總曝光時間t(秒)、 之間係式(e q 3 )成立。 F*Z*n*t = Lx(eq3) 200819915 Single beam exposure apparatus • Platform mode and using a plurality of (10 or more) semi-guide beam exposure devices • External roller method and using a plurality of (10 or more) half-multibeam exposure devices as described above Laser direct-printing lithographic printing plate, sensitivity X (J/cm 2 ), exposure surface s of the sensing material (power q (W) of the square illuminating source, laser η, total exposure time (eq 1) ) is established. X*S = n*q*t (eql) i) In the inner drum type (single beam) mode, the number of revolutions of the laser f (radian/second), the sub-scan of the sense material, and the resolution Z ( Point / cm), total exposure time t (seconds) is established. f#Z#t =Lx (eq2) 11) In the outer drum type (multi-beam) mode, the number of laser rotations F (radians/second), the sub-scanning points of the materials, and the resolution Z (points/cm), The total exposure time t (seconds) and the relationship (eq 3 ) are established. F*Z*n*t = Lx

Hi)平台筒式(多射束)方式時 在多角鏡旋轉數H(弧度/秒)、感材的副掃 分)、解像度Z(點/公分)、總曝光時間t(秒)、 之間係式(e q 4 )成立。 體雷射之多 導體雷射之 常在感材敏 分)、1個雷 t(秒)之間式 長度Lx(公 之間式(e q 2 ) 長度Lx(公 射束數目(η) g長度Lx(公 射束數目(η) -75 - 200819915 (eq4)Hi) In the platform type (multi-beam) mode, the number of rotations of the polygon mirror H (radians/second), the sub-sweep of the sense material), the resolution Z (points/cm), and the total exposure time t (seconds). The formula (eq 4 ) is established. The multi-conductor laser of the body laser is often in the sense of sensitive material), the length of one ray t (seconds), the length Lx (the equation between the public (eq 2 ), the length Lx (the number of the beam (η) g length Lx (number of beamlets (η) -75 - 200819915 (eq4)

H*Z*n*t = L 將實際印刷版被要求的解像度(25 6〇dpi)、版尺寸 (Al/B 1、副掃描長度42英吋)、2〇片/小時左右的曝光條件 之本發明的平版印刷版原版的感光特性(感光波長敏感度 度:約0.1 mJ/平方公分)代入上述式時,能夠理解本發明 的平版印刷版原版以與半導體雷射之多射束曝光裝置合時 爲更佳。而且,從與操作性、成本等之相乘作用而言,以 與外滾筒方式之半導體雷射多射束曝光裝置組合爲最佳。 又’對本發明的平版印刷版原版之其他曝光光線,亦 可使用超高壓、高壓、中壓、低壓的各水銀燈、化學燈、 碳弧燈、氙氣燈、金屬鹵化物燈、可見及紫外光之各種雷 射燈、螢光燈、鎢絲燈、太陽光等。 [顯像] 將本發明之平版印刷版原版影像曝光後,使用顯像液 除去保護層及非曝光部的感光層,能夠在親水性支撐體表 面形成影像。 在本發明適合使用之顯像液能夠分成(1)ρΗ爲10以上 之物、及(2)pΗ爲2〜10的水溶液。 如上述,使用(1)的顯像液時,在感光層所使用的黏合 劑聚合物以使用鹼可溶性黏合劑爲佳,使用(2)的顯像液 時,以使用酸價爲〇.3meq/g以下之疏水性黏合劑聚合物爲 佳。 說明在本發明適合使用之PH爲1 0以上的顯像液。 pH爲1 0以上的顯像液係以如矽-酸鈉、矽酸鉀、氫氧 -76- 200819915 化鈉、氫氧化鉀、氫氧化鋰、三代磷鈉、二代磷酸鈉、三 代磷銨、二代磷酸銨、偏矽酸鈉、碳酸氫鈉、氨水等無機 鹼劑、或是如一乙醇胺或二乙醇胺等有機鹼劑的水溶液爲 佳。能夠以此種鹼溶液的濃度成爲0 · 1〜1 0質量%、較佳是 0·5〜5質量%的方式添力口。 又,在此種鹼性水溶液,可按照必要少量含有界面活 性劑或如苄醇、2-苯氧基乙醇、2 丁氧基乙醇之有機溶劑。 可舉出例如美國專利3 3 7 5 1 7 1號說明書及同第3 6 1 5 4 8 0號 說明書所記載之物。 從兼具處理性及顯像液之觀點,pH爲1 0以上的顯像 液係以pH爲10〜14的範圍之物爲佳,以pH爲11〜13的範 圍之物爲更佳。 在本發明之適合使用的另一種顯像液係pH爲2〜10的 水溶液。例如以水單獨或以水作爲主成分(含水6 0質量% 以上)之水溶液爲佳,以與通常眾所周知的潤濕水 (dampening water)同樣組成的水溶液、含有界面活性劑(陰 離子系、非離子系、陽離子系等)之水溶液、或含有水溶性 高分子化合物之水溶液爲佳。特別是含有界面活性劑及水 溶性高分子化合物的雙方之水溶液爲佳。顯像液的p Η以 3〜8較佳,以4〜7爲更佳。 在上述(1)及(2)的顯像液各自能夠含有的成分如下詳 述。 在本發明的顯像液所使用的陰離子系界面活性劑,可 舉出脂肪酸鹽類、松香酸鹽類、羥基鏈烷磺酸鹽類、鏈烷 -77- 200819915 磺酸鹽類、二烷基磺酸基琥珀酸鹽類、直鏈烷基苯 類、分枝鏈烷基苯磺酸鹽類、烷基萘磺酸鹽類、烷 基聚氧乙烯丙基磺酸鹽類、聚氧乙烯烷基磺酸基苯 類、N-甲基-N-油醯基牛磺酸鈉類、N-烷基磺酸基琥 醯胺二鈉鹽類、石油磺酸鹽類、硫酸化蓖麻油、硫 脂油、脂肪酸烷基酯的硫酸酯鹽類、烷基硫酸酯鹽 氧乙烯烷基醚硫酸酯鹽類、脂肪酸一甘油脂硫酸酯 聚氧乙烯烷基苯基醚硫酸酯鹽類、聚氧乙烯苯乙烯 醚硫酸酯鹽類、烷基磷酸酯鹽類、聚氧乙烯烷基醚 鹽類、聚氧乙烯烷基苯基醚磷酸酯鹽類、苯乙烯-順 酸酐共聚物的部分皂化物類、烯烴-順丁烯二酸酐共 部分皂化物類、萘磺酸鹽福馬林縮合物類等。其中 二烷基磺酸基琥珀酸鹽類、烷基硫酸酯鹽類、及烷 酸鹽類爲特佳。 在本發明的顯像液所使用的陽離子系界面活性 特別限定,可使用先前眾所周知之物。可舉出例如 鹽類、第四級銨鹽類、聚氧乙烯烷基胺鹽類、聚乙 衍生物。 在本發明之顯像液所使用的非離子系界面活性 出聚乙二醇型之高級醇環氧乙烷加成物、烷基醇環 加成物、脂肪酸環氧乙烷加成物、多元醇脂肪酸酯 烷加成物、高級烷基胺環氧乙烷加成物、脂肪醯胺 烷加成物、油脂的環氧乙烷加成物、聚丙二醇環氧 成物、二甲基矽氧烷-環氧乙烷嵌段共聚物、二甲基 磺酸鹽 基苯氧 基醚鹽 珀酸一 酸化牛 類、聚 鹽類、 基苯基 磷酸酯 丁烯二 聚物的 使用 基萘磺 劑沒有 院基胺 烯聚胺 劑可舉 氧乙烷 環氧乙 環氧乙 乙烷加 矽氧烷 -78- 200819915 -(環氧丙烷-環氧乙烷)嵌段共聚物等;或多元醇型之甘油的 脂肪酸酯、新戊四醇的脂肪酸酯、山梨糖醇及山梨糖醇酐 的脂肪酸酯、蔗糖的脂肪酸酯、多元醇的烷基醚、烷醇胺 類的脂肪醯胺等。 此等非離子性界面活性劑可單獨或組合使用2種以 上。在本發明,以山梨糖醇及/或山梨糖醇酐脂肪酸酯的環 氧乙烷加成物、聚丙二醇環氧乙烷加成物、二甲基矽氧院 環氧乙烷嵌段共聚物、二甲基矽氧烷(環氧丙烷-環氧乙烷) 嵌段共聚物、多元醇的脂肪酸酯爲更佳。 又,從對水之穩定的溶解性或混濁性的觀點,在本發 明之顯像液所使用的非離子系界面活性劑之H L B (親水性-親脂性平衡;Hydrophile-Lipophile Balance)値以6以上爲 佳,以8以上爲更佳。而且,在顯像液中所含有非離子性 界面活性劑的比率以0 · 0 1〜1 0質量%爲佳,以0 . 〇 1〜5質量% 爲更佳。 又’亦同樣地能夠使用乙炔二醇系及乙炔醇系氧伸乙 基(oxyethylene)加成物、氟系、砂系等界面活性劑。 從抑制泡沬性的觀點,在本發明的顯像液所使用的界 面活性劑以非離子性界面活性劑爲特佳。 又,在本發明的顯像液所使用的水溶性高分子化合物 可舉出大豆多糖類、改性澱粉、阿拉伯樹膠、糊精、纖維 素衍生物(例如羧甲基纖維素、羧乙基纖維素、甲基纖維素 等)及其改性體、普魯蘭多糖體、聚乙烯醇及其衍生物、聚 乙烯吡咯啶酮、聚丙烯醯胺及丙烯醯胺共聚物、乙烯基甲 -79 - 200819915 基醚/順丁烯二酸酐共聚物、乙酸乙烯/順丁烯二酸酐共聚 物、苯乙烯/順丁烯二酸酐共聚物等。 上述大豆多糖類可使用眾所周知之物,例如可使用市 售品之SO YAFAIB (不二製油(股)製)的各種規格品。較佳之 物以使用1 0質量%水溶液的黏度爲1 0〜1 0 0 m P a/ s e C的範圍 之物。 上述改性澱粉可使用眾所周知之物,例如可藉由將玉 米、馬玲薯、木薯澱粉、米、小麥等的澱粉藉由酸或酵素 等在平均1分子葡萄糖殘基數爲5〜30的範圍進行分解,並 且在鹼中加添羥基丙烯之方法等來製造。 亦能夠倂用2種以上水溶性高分子化合物。水溶性高 分子化合物在顯像液中的含量,以0.1〜2 0質量%爲佳,以 0.5〜10質量%爲更佳。 又,在本發明的顯像液,亦可含有有機溶劑。能夠含 有的有機溶劑,可舉出例如脂肪族烴類(己烷、庚烷、 “ ISOPAR-E、Η、G”(Exxon化學(股)製)、或是汽油、燈 油等)、芳香族烴類(甲苯、二甲苯等)、或鹵化烴(二氯甲烷、 二氯乙烷、三氯乙烯、一氯苯等)、或極性溶劑。 極性溶劑可舉出醇類(甲醇、乙醇、丙醇、異丙醇、苄 醇、乙二醇一甲基醚、2_乙氧基乙醇、二甘醇一乙基醚、 二甘醇一己基醚、三甘醇一甲基醚、丙二醇一乙基醚、丙 二醇一甲基醚、聚乙二醇一甲基醚、聚丙二醇、四甘醇、 乙二醇一 丁基醚、乙二醇一苄基醚、乙二醇一苯基醚、甲 基苯基甲醇、正戊醇、甲基戊醇等);酮類(丙酮、甲基乙 -80· 200819915 基酮、乙基丁基酮、甲基異丁基酮、環己酮等);酯類(乙 酸乙酯、乙酸丙酯、乙酸丁酯、乙酸戊酯、乙酸己酯、乳 酸甲酉曰、乳酸丁酯、乙一醇一丁基乙酸酯、丙二醇一甲基 醚乙酸酯、二甘醇乙酸酯、酞酸二乙酯、4 _戊酮酸丁酯等); 及其他(磷酸二乙酯、磷酸三甲苯酯、N _苯基乙醇胺、N _ 苯基二乙醇胺等)等。 又’上述有機溶劑係不溶解於水時,亦有可能使用界 Φ 面活性劑等使其可溶於水而使用,在顯像液含有有機溶劑 時’從安全性、引火的觀點,溶劑的濃度以小於40質量% 爲佳。 在本發明的顯像液除上述以外,亦可含有防腐劑、鉗 合化合物、消泡劑、有機酸、無機酸、無機鹽等。 防腐劑以使用苯醇或其衍生物、福馬林、味哇衍生物、 脫氫乙酸鈉、4 _異噻唑啉-3 -酮衍生物、苯并異噻唑啉-3 -酮、苯并三唑衍生物、脒胍衍生物、四級銨鹽類、吡啶、 φ 喹啉、胍等的衍生物、二阱、三唑衍生物、噚唑、曙阱衍 生物、硝基溴醇系的2-溴-2-硝基丙烷-1,3二醇、1,1-二溴 -1-硝基-2-乙醇、1,1-二溴-1-硝基-2-丙醇等爲佳。 鉗合化合物可舉出例如伸乙二胺四乙酸、其鉀鹽、其 鈉鹽;二伸乙三胺五乙酸、其鉀鹽、其鈉鹽;三伸乙四胺 六乙酸、其鉀鹽、其鈉鹽;羥乙基伸乙二胺三乙酸、其鉀 鹽、其鈉鹽;氮基三乙酸、其鈉鹽;1-羥基乙烷-1,1-二膦 酸、其鉀鹽、其鈉鹽;胺基三(亞甲基膦酸)、其鉀鹽、其 鈉鹽等之有機膦酸類、或膦酸基鏈烷三羧酸類。使用有機 -81 - 200819915 胺的鹽代替上述鉗合劑的鈉鹽、鉀鹽亦是有效的。 消泡劑可使用通常之矽系的自乳化型、乳化型、非離 子係界面活性劑的H L B爲5以下等的化合物。以矽消泡劑 爲佳。其中,乳化分散型及可溶化型等之任一種都可使用。 有機酸可舉出檸檬酸、乙酸、草酸、丙二酸、柳酸、 辛酸、酒石酸、蘋果酸、乳酸、4 -戊酮酸、對甲苯磺酸、 二甲苯磺酸、植酸、有機膦酸等。有機酸亦能夠以其鹼金 屬鹽或銨鹽的形式使用。 無機酸及無機鹽可舉出磷酸、偏磷酸、一代磷酸銨、 二代磷酸銨、一代磷酸鈉、二代磷酸鈉、一代磷酸鉀、二 代磷酸鉀、三聚磷酸鈉、焦磷酸鉀、六偏磷酸鈉、硝酸鎂、 硝酸鈉、硝酸鉀、硝酸銨、硫酸鈉、硫酸鉀、硫酸銨、亞 硫酸鈉、亞硫酸銨、硫酸氫鈉、硫酸鎳等。 上述顯像液能夠使用作爲曝光過之平版印刷版原版的 顯像液顯像補充液,以應用於後述的自動處理機爲佳。使 用自動處理機顯像時,因爲依照處理量,顯像液會逐漸疲 勞化,亦可使用補充液或新鮮的顯像液來使處理性能恢 復。在本發明的平版印刷版的製版方法,該補充方式係可 以適用。 在本發明,藉由ρΗ2〜10的水溶液之顯像處理,具備 有顯像液供給手段及擦拭構件之自動處理機能夠適當地實 施。自動處理機可舉出例如特開平2-22006 1號、特開昭 60- 5 93 5 1各公報所記載之自動處理機,係邊搬運影像記錄 後的平版印刷版原版,邊進行擦拭處理;或美國專利 -82- 200819915 5 1 48746號、同5 5 6876 8號、英國.專利22977 1 9號所記載 之自動處理機,係對固定在圓筒上之影像記錄後的平版印 刷版原版,邊使圓筒旋轉邊進行擦拭處理。其中,以使用 旋轉刷輥作爲擦拭構件之自動處理機爲特佳。 在本發明能夠用之較佳旋轉刷輥,能夠考慮像素部不 容易受傷、及平版印刷版原版之支撐體的強韌性等而適當 地選擇。上述旋轉輥刷能夠使用將刷子原料植於塑膠或金 屬輥而形成之眾所周知之物。例如能夠使用特開昭 5 8- 1 59 5 3 3號公報、或特開平3 - 1 00554號公報所記載之物、 或實公昭62- 1 67253號公報所記載之將刷子原料列狀地植 入而成的金屬或塑膠槽型材料,以無間隙、放射狀的方式 纏繞於作爲芯之塑膠或金屬輥上而成的刷輥。 又,刷子原料能夠使用塑膠纖維(例如聚對酞酸乙二 酯、聚對酞酸丁二酯等聚酯系、耐綸6 · 6、耐綸6.1 0等聚 醯系、聚丙烯腈.、聚(甲基)丙烯酸烷酯等聚丙烯酸系、及 聚丙烯、聚苯乙烯等聚烯烴系合成纖維),例如,纖維的毛 直徑爲20〜4 00微米、毛長度爲5〜30毫米之物可適合使用。 而且,旋轉刷輥的外徑以30〜2 00毫米爲佳,擦拭版面 之刷子前端的周速以0 · 1〜5公尺/秒爲佳。 又·,旋轉刷輥以使用2支以上之複數支爲佳。 又,相對於本發明的平版印刷版原版的搬運方向,本 發明所使用的旋轉刷輥的旋轉方向可以同一方向、亦可以 是相反方向,如第12圖所示之自動處理機,使用2支以上 的旋轉刷輥時’以至少1支旋轉刷輥係同方向旋轉,至少 -83- 200819915 1支旋轉刷輥係相反方向旋轉爲佳。藉此’非影像部之感 光層的除去更爲確實。而且,將旋轉刷輥往刷輥的旋轉軸 方向搖動亦是有效的。 上述顯像液的溫度能夠使用任意的溫度,以〜50 °C爲佳。 又,在本發明,能夠任意地將擦拭處理後的平版印刷 版,接著使用水洗、乾燥處理、不敏感脂化處理。不敏感 脂化處理能使用眾所周知的不敏感脂化處理液。 此外,由本發明的平版印刷版原版至平版印刷版之製 版步驟,亦可按照必要在曝光前、曝光中、從曝光至顯像 爲止之間,對全面進行加熱。藉由如此的加熱,能夠促進 在該感光層中之影像形成反應,而能夠產生提升敏感度或 耐刷性或使敏感度安定化之優點。而且爲了提高影像強 度、耐刷性的目的,對顯像後的影像進行全面後加熱或全 面曝光亦是有效的。通常,顯像前的加熱以在1 5 0 °C以下 之溫和條件進行爲佳。溫度太高時,會有連非影像部都產 生泛白掉等的問題。顯像後的加熱係利用非常強的條件, 通常係在200〜5 0 0 °C的範圍。溫度太低時無法得到充分的 影像強化作用,太高時會有產生支撐體劣化、影像部熱分 解之問題。 將藉由以上處理所得到的平版印刷版裝於膠版印刷機 上,能夠使用於印刷多數張。 印刷時,爲了除去版上的污染所使用的印刷版清潔 器,能夠使用先前所使用的P S版用印刷版清潔器,可舉出 -84- 200819915 例如 CL-1、CL-2、CP、CN-4、CN、CG-1、PC-1、SR、1C(富 士照相軟片股份公司製)等。 [實施例] 以下藉由實施例說明本發明,但是本發明未限定於此 等。 [支撐體的製造] 爲了除去厚度爲0.3毫米的鋁板(材質1 05 0)之表面的 壓延油,使用1 〇質量%鋁酸鈉水溶液,在5 0°C施行脫脂處 理3 0秒鐘後,使用3支毛徑爲〇. 3毫米的束植耐綸刷、及 中値直徑爲25微米輕石-水懸浮液(比較1.1克/立方公 分),將鋁表面刷成粗糙表面,並使用水充分洗滌。將該板 在45 °C的25質量%硝酸水溶液浸漬9秒鐘來進行蝕刻,水 洗後,進而在65 °C的20質量%硝酸水溶液浸漬20秒鐘並 水洗。此時粗糙表面的蝕刻量約爲3克/平方公尺。 接著’使用60Hz的交流電壓連續地進行電化學性粗面 化處理。此時的電解液係硝酸1質量%水溶、液(含0.5質量。/〇 鋁離子)、液溫爲50°C。交流電源波形係使用電流値從零至 尖峰的時間TP爲0.8msec、負載比爲1 : 1、梯形的矩形波 交流,使用碳電極作爲相對極,來進行電化學性粗面化處 理。輔助陽極係使用肥粒鐵。電流密度係在電流的尖峰値 爲30 A/dm2、輔助陽極係使電源流動的電流的5%分流。在 硝酸電解時之電量係鋁板爲陽極時之電量爲175 C/dm2。隨 後,藉由噴灑進行水洗。 接著,使用鹽酸〇·5質量°/〇水溶液(含0.5質量%鋁離 -85- 200819915 子)、液溫爲5 0 °C的電解液,以銘板爲陽極時之電量爲 5 OC/dm2的條件,藉由與硝酸電解同樣的方法,進行電化 學性粗面化處理,隨後,藉由噴灑進水洗。對該板使用1 5 質量%硫酸水溶液(含0.5質量%鋁離子)作爲電解液,以電 流密度1 5 A / d m 2設置2.5克/平方公尺的直流陽極氧化皮膜 後,水洗並乾燥。 使用直徑2微米的針測定此如進行所得到支撐體的中 心線平均粗糙度(Ra)時,爲0.51微米。 並且,棒塗布下述底塗液後,以烘箱在8 0 °C乾燥1 〇秒, 以乾燥塗布量爲10毫克/平方公尺的方式塗布,來製造具 有底塗層之支撐體。 <底塗液> •下述底塗化合物(1) 0.017克H*Z*n*t = L The required resolution (25 6〇dpi), plate size (Al/B 1, sub-scan length 42 inches), and exposure conditions of 2 / / hour for the actual printing plate. When the lithographic characteristics of the lithographic printing plate precursor of the present invention (photosensitive wavelength sensitivity: about 0.1 mJ/cm 2 ) are substituted into the above formula, it can be understood that the lithographic printing plate precursor of the present invention is combined with a semiconductor laser multiple beam exposure device. Time is better. Further, from the viewpoint of multiplication by operability, cost, and the like, it is preferable to combine with a semiconductor laser multi-beam exposure apparatus of an outer drum type. Further, for other exposure light of the lithographic printing plate precursor of the present invention, mercury lamps, chemical lamps, carbon arc lamps, xenon lamps, metal halide lamps, visible and ultraviolet light of ultra high pressure, high pressure, medium pressure and low pressure may also be used. Various laser lights, fluorescent lights, tungsten lights, sunlight, etc. [Development] After the lithographic printing plate precursor image of the present invention is exposed, the protective layer and the photosensitive layer of the non-exposed portion are removed by using a developing solution, whereby an image can be formed on the surface of the hydrophilic support. The developing solution suitable for use in the present invention can be classified into (1) a substance having a ρ Η of 10 or more and (2) an aqueous solution having a p Η of 2 to 10. As described above, when the developing solution of (1) is used, the binder polymer used in the photosensitive layer is preferably an alkali-soluble binder, and when the developing solution (2) is used, the acid value is 〇.3meq. A hydrophobic binder polymer of /g or less is preferred. A developing solution having a pH of 10 or more suitable for use in the present invention will be described. The imaging liquid having a pH of 10 or more is, for example, sodium strontium-sodium, potassium citrate, hydrogen-oxygen-76-200819915, sodium hydride, potassium hydroxide, lithium hydroxide, sodium trisphosphate, sodium diphosphate, and ammonium phosphate. An aqueous alkaline agent such as a second-generation ammonium phosphate, a sodium metasilicate, a sodium hydrogencarbonate or an aqueous ammonia, or an aqueous solution of an organic alkaline agent such as monoethanolamine or diethanolamine is preferred. The pressure can be increased so that the concentration of the alkali solution is from 0. 1 to 10% by mass, preferably from 0.5 to 5% by mass. Further, in such an alkaline aqueous solution, an interface active agent or an organic solvent such as benzyl alcohol, 2-phenoxyethanol or 2-butoxyethanol may be contained in a small amount as necessary. For example, the contents described in the specification of U.S. Patent No. 3,357,591, and the specification of the Japanese Patent No. 3,615,040. From the viewpoint of having both the handleability and the developing liquid, the developing liquid having a pH of 10 or more is preferably in the range of pH 10 to 14, and more preferably in the range of pH 11 to 13. Another developing solution suitable for use in the present invention is an aqueous solution having a pH of 2 to 10. For example, an aqueous solution containing water alone or with water as a main component (water content of 60% by mass or more) is preferred, and an aqueous solution having the same composition as commonly known dampening water, containing a surfactant (anionic, nonionic) An aqueous solution of a system or a cationic system or an aqueous solution containing a water-soluble polymer compound is preferred. In particular, an aqueous solution containing both a surfactant and a water-soluble polymer compound is preferred. The p Η of the developing solution is preferably 3 to 8 and more preferably 4 to 7. The components which can be contained in each of the developing liquids of the above (1) and (2) are as follows. Examples of the anionic surfactant used in the developing solution of the present invention include fatty acid salts, rosin acid salts, hydroxyalkanesulfonates, alkane-77-200819915 sulfonates, and dialkyl groups. Sulfonic succinates, linear alkyl benzenes, branched alkyl benzene sulfonates, alkylnaphthalene sulfonates, alkyl polyoxyethylene propyl sulfonates, polyoxyethylene hydrides Base sulfonate benzenes, N-methyl-N-oil sulfonyl taurine sodium, N-alkyl sulfosuccinate disodium salt, petroleum sulfonates, sulfated castor oil, sulfur Fatty oil, sulfate ester of fatty acid alkyl ester, alkyl sulfate ester oxyethylene alkyl ether sulfate salt, fatty acid monoglyceride sulfate polyoxyethylene alkyl phenyl ether sulfate salt, polyoxyethylene benzene Vinyl ether sulfates, alkyl phosphates, polyoxyethylene alkyl ether salts, polyoxyethylene alkylphenyl ether phosphates, partial saponates of styrene-cis anhydride copolymers, olefins - Maleic anhydride co-partial saponified compounds, naphthalene sulfonate fumarin condensates, and the like. Among them, dialkylsulfosuccinates, alkylsulfate salts, and alkanoates are particularly preferred. The cationic interfacial activity used in the developing liquid of the present invention is particularly limited, and a conventionally known one can be used. For example, a salt, a fourth-order ammonium salt, a polyoxyethylene alkylamine salt, or a polyethylene derivative can be given. The nonionic interface used in the developing solution of the present invention is a polyethylene glycol adduct of a polyethylene glycol type, an alkyl alcohol cycloaddate, a fatty acid ethylene oxide adduct, and a poly Alcohol fatty acid ester alkane adduct, higher alkylamine ethylene oxide adduct, fatty decylamine adduct, ethylene oxide adduct of fats and oils, polypropylene glycol epoxy, dimethyl hydrazine Oxyalkylene-ethylene oxide block copolymer, dimethyl sulfonate phenoxy ether salt per acid-acidified bovine, poly-salt, phenyl phosphate phosphate butene dimer The agent has no urethramine polyamine agent, oxyethylene epoxide, ethylene ethoxide, oxirane-78- 200819915 - (propylene oxide-ethylene oxide) block copolymer, etc.; or polyol Types of fatty acid esters of glycerin, fatty acid esters of neopentyl alcohol, fatty acid esters of sorbitol and sorbitan, fatty acid esters of sucrose, alkyl ethers of polyhydric alcohols, fat oximes of alkanolamines Amines, etc. These nonionic surfactants may be used alone or in combination of two or more. In the present invention, an ethylene oxide adduct of sorbitol and/or sorbitan fatty acid ester, a polypropylene glycol ethylene oxide adduct, and a dimethyloxyxy oxide ethylene oxide block copolymer Further, a dimethyl methoxy alkane (propylene oxide-ethylene oxide) block copolymer or a fatty acid ester of a polyhydric alcohol is more preferable. Further, from the viewpoint of stable solubility to water or turbidity, the HLB (Hydrophile-Lipophile Balance) of the nonionic surfactant used in the developing liquid of the present invention is 6 The above is better, preferably 8 or more. Further, the ratio of the nonionic surfactant contained in the developing solution is preferably from 0. 01 to 10% by mass, more preferably from 0 to 5% by mass. Further, similarly, an acetylene glycol-based or acetylene-based oxyethylene adduct, a fluorine-based or a sand-based surfactant can be used. From the viewpoint of suppressing the foaming property, the surfactant used in the developing solution of the present invention is particularly preferably a nonionic surfactant. Moreover, the water-soluble polymer compound used in the developing liquid of the present invention may, for example, be a soybean polysaccharide, a modified starch, a gum arabic, a dextrin, or a cellulose derivative (for example, carboxymethylcellulose or carboxyethylcellulose). , methyl cellulose, etc.) and its modified body, pullulan, polyvinyl alcohol and its derivatives, polyvinylpyrrolidone, polypropylene decylamine and acrylamide copolymer, vinyl A-79 - 200819915 Alkyl ether/maleic anhydride copolymer, vinyl acetate/maleic anhydride copolymer, styrene/maleic anhydride copolymer, and the like. As the above-mentioned soybean polysaccharide, a well-known product can be used, and for example, various specifications of SO YAFAIB (manufactured by Fuji Oil Co., Ltd.) of a commercial product can be used. Preferably, the viscosity of the aqueous solution of 10% by mass is used in the range of 10 to 100 m P a / s e C . As the modified starch, a well-known one can be used. For example, the starch of corn, horse potato, tapioca starch, rice, wheat, or the like can be used in the range of 5 to 30 in an average of 1 molecule of glucose residues by acid or enzyme. It is produced by decomposing and adding a hydroxypropene to a base. It is also possible to use two or more kinds of water-soluble polymer compounds. The content of the water-soluble high molecular compound in the developing solution is preferably 0.1 to 20% by mass, more preferably 0.5 to 10% by mass. Further, the developing solution of the present invention may contain an organic solvent. Examples of the organic solvent that can be contained include aliphatic hydrocarbons (hexane, heptane, "ISOPAR-E, hydrazine, G" (made by Exxon Chemical Co., Ltd.), or gasoline, kerosene, etc.), aromatic hydrocarbons. a class (toluene, xylene, etc.), or a halogenated hydrocarbon (dichloromethane, dichloroethane, trichloroethylene, monochlorobenzene, etc.), or a polar solvent. Examples of the polar solvent include alcohols (methanol, ethanol, propanol, isopropanol, benzyl alcohol, ethylene glycol monomethyl ether, 2-ethoxyethanol, diethylene glycol monoethyl ether, diethylene glycol monohexyl). Ether, triethylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monomethyl ether, polyethylene glycol monomethyl ether, polypropylene glycol, tetraethylene glycol, ethylene glycol monobutyl ether, ethylene glycol Benzyl ether, ethylene glycol monophenyl ether, methylphenylmethanol, n-pentanol, methylpentanol, etc.; ketones (acetone, methyl ethyl-80· 200819915 ketone, ethyl butyl ketone, Methyl isobutyl ketone, cyclohexanone, etc.; esters (ethyl acetate, propyl acetate, butyl acetate, amyl acetate, hexyl acetate, guanidine lactate, butyl lactate, butyl alcohol monobutyl) Acetate, propylene glycol monomethyl ether acetate, diethylene glycol acetate, diethyl decanoate, butyl 4-pentanone, etc.; and others (diethyl phosphate, tricresyl phosphate, N _Phenylethanolamine, N_phenyldiethanolamine, etc.). Further, when the organic solvent is not dissolved in water, it may be used in a water-soluble environment by using a boundary Φ surfactant or the like, and when the developing solution contains an organic solvent, 'from the viewpoint of safety and ignition, the solvent The concentration is preferably less than 40% by mass. The developing solution of the present invention may contain a preservative, a chelating compound, an antifoaming agent, an organic acid, an inorganic acid, an inorganic salt or the like in addition to the above. Preservatives to use phenyl alcohol or its derivatives, formalin, sulphate derivatives, sodium dehydroacetate, 4-isothiazolin-3-one derivatives, benzisothiazolin-3-one, benzotriazole Derivatives, anthracene derivatives, quaternary ammonium salts, derivatives of pyridine, φ quinoline, hydrazine, etc., di-trap, triazole derivatives, carbazole, hydrazine derivative, nitrobromo alcohol 2- Bromo-2-nitropropane-1,3 diol, 1,1-dibromo-1-nitro-2-ethanol, 1,1-dibromo-1-nitro-2-propanol or the like is preferred. The compounding compound may, for example, be ethylenediaminetetraacetic acid, a potassium salt thereof, a sodium salt thereof, diethylenetriaminepentaacetic acid, a potassium salt thereof, a sodium salt thereof, a triamethylenetetraamine hexaacetic acid, a potassium salt thereof, Its sodium salt; hydroxyethyl ethylenediamine triacetic acid, its potassium salt, its sodium salt; nitrogen triacetic acid, its sodium salt; 1-hydroxyethane-1,1-diphosphonic acid, its potassium salt, its sodium a salt; an organophosphonic acid such as an amine tris(methylenephosphonic acid), a potassium salt thereof or a sodium salt thereof, or a phosphonic acid alkane tricarboxylic acid. It is also effective to use the salt of the amine in the organic-81 - 200819915 amine instead of the sodium salt or potassium salt of the above-mentioned chelating agent. As the antifoaming agent, a compound of a conventional lanthanide-based self-emulsifying type, emulsified type, or nonionic surfactant may have a H L B of 5 or less. It is preferred to use a defoamer. Among them, any of an emulsified dispersion type and a solubilized type can be used. Examples of the organic acid include citric acid, acetic acid, oxalic acid, malonic acid, salicylic acid, octanoic acid, tartaric acid, malic acid, lactic acid, 4-pentanoic acid, p-toluenesulfonic acid, xylenesulfonic acid, phytic acid, and organic phosphonic acid. Wait. The organic acid can also be used in the form of its alkali metal or ammonium salt. Examples of the inorganic acid and inorganic salt include phosphoric acid, metaphosphoric acid, primary ammonium phosphate, ammonium diphosphate, sodium phosphate, sodium dicarbonate, potassium phosphate, potassium dimerate, sodium tripolyphosphate, potassium pyrophosphate, and six. Sodium metaphosphate, magnesium nitrate, sodium nitrate, potassium nitrate, ammonium nitrate, sodium sulfate, potassium sulfate, ammonium sulfate, sodium sulfite, ammonium sulfite, sodium hydrogen sulfate, nickel sulfate, and the like. As the developing liquid, it is possible to use a developing liquid developing solution as an exposed lithographic printing plate precursor, and it is preferably applied to an automatic processor to be described later. When using an automatic processor for development, the developer will gradually become weak depending on the amount of processing, and a replenishing solution or a fresh developing solution can be used to restore the processing performance. In the plate making method of the lithographic printing plate of the present invention, the supplementary mode is applicable. In the present invention, the automatic processing machine including the developing liquid supply means and the wiping member can be suitably carried out by the development processing of the aqueous solution of ρ Η 2 to 10. The automatic processing machine described in each of the publications of Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. Or the automatic processing machine described in U.S. Patent No. 82-200819915 5 1 48746, the same as 5 5 6876 8 and the British Patent No. 22,977,9, which is the lithographic printing plate precursor after the image recording on the cylinder is fixed. The wiping process is performed while rotating the cylinder. Among them, an automatic processor using a rotating brush roller as a wiping member is particularly preferable. The preferred rotating brush roller which can be used in the present invention can be appropriately selected in consideration of the fact that the pixel portion is not easily injured and the toughness of the support of the lithographic printing plate precursor. The above-mentioned rotating roller brush can use a well-known thing formed by planting a brush material on a plastic or metal roller. For example, it is possible to use the material described in the Japanese Patent Publication No. 5-8-59 5 3 3 or the Japanese Patent Publication No. Hei. A metal or plastic channel material that is inserted into a brush roll that is wound on a plastic or metal roll as a core without gaps or radial. Further, the brush material can be made of a plastic fiber (for example, polyester such as polyethylene terephthalate or polybutylene terephthalate, nylon 6.6, nylon 6.1 0, polyacrylonitrile, or polyacrylonitrile. a polyacrylic acid type such as a polyalkyl (meth) acrylate or a polyolefin synthetic fiber such as a polypropylene or a polystyrene), for example, a fiber having a hair diameter of 20 to 400 μm and a hair length of 5 to 30 mm. Can be used. Further, the outer diameter of the rotating brush roller is preferably 30 to 200 mm, and the peripheral speed of the tip end of the wiping surface is preferably 0. 1 to 5 m/sec. Further, it is preferable to use a plurality of two or more rotating brush rolls. Further, with respect to the conveyance direction of the lithographic printing plate precursor of the present invention, the rotation direction of the rotary brush roller used in the present invention may be the same direction or the opposite direction, and the automatic processor shown in Fig. 12 uses two In the above rotating brush roll, 'rotate in the same direction with at least one rotating brush roller, and at least -83-200819915 1 rotating brush roller rotates in the opposite direction. Therefore, the removal of the photosensitive layer in the non-image portion is more reliable. Further, it is also effective to oscillate the rotating brush roller in the direction of the rotation axis of the brush roller. The temperature of the above developing solution can be any temperature, preferably ~50 °C. Further, in the present invention, the lithographic printing plate after the wiping treatment can be arbitrarily used, followed by water washing, drying treatment, and insensitive grease treatment. Insensitive The lipidation treatment can use well-known insensitive lipid treatment fluids. Further, the step of making the lithographic printing plate precursor to the lithographic printing plate of the present invention may be carried out by heating as necessary before exposure, during exposure, and from exposure to development. By such heating, the image formation reaction in the photosensitive layer can be promoted, and the advantage of improving the sensitivity or the printing durability or making the sensitivity stable can be produced. Further, in order to improve the image strength and the printing durability, it is also effective to perform post-heating or full-surface exposure on the image after development. Usually, the heating before development is preferably carried out under mild conditions of 150 ° C or lower. When the temperature is too high, there is a problem that even the non-image portion is whitened. The heating after development uses very strong conditions, usually in the range of 200 to 500 °C. When the temperature is too low, sufficient image enhancement cannot be obtained. When it is too high, there is a problem that the support is deteriorated and the image portion is thermally decomposed. The lithographic printing plate obtained by the above treatment is mounted on an offset printing machine, and can be used for printing a plurality of sheets. At the time of printing, in order to remove the printing plate cleaner used for the contamination on the plate, the previously used printing plate cleaner for the PS plate can be used, and -84-200819915, for example, CL-1, CL-2, CP, CN can be used. -4, CN, CG-1, PC-1, SR, 1C (made by Fuji Photo Film Co., Ltd.). [Examples] Hereinafter, the present invention will be described by way of Examples, but the present invention is not limited thereto. [Manufacturing of Support] In order to remove the rolling oil on the surface of an aluminum plate (material 1 0.05) having a thickness of 0.3 mm, a 1% by mass aqueous solution of sodium aluminate was used, and after degreasing treatment at 50 ° C for 30 seconds, Use 3 bundles of nylon brushes with a diameter of 3 mm, and a pumice-water suspension with a diameter of 25 μm (compared to 1.1 g/cm 3 ), brush the aluminum surface to a rough surface, and use water. Wash thoroughly. The plate was immersed in a 25 mass% nitric acid aqueous solution at 45 °C for 9 seconds, and after rinsing, it was further immersed in a 20 mass% nitric acid aqueous solution at 65 °C for 20 seconds and washed with water. At this time, the etching amount of the rough surface was about 3 g/m 2 . Then, electrochemical roughening treatment was continuously performed using an alternating voltage of 60 Hz. The electrolytic solution at this time was 1% by mass of nitric acid, water-soluble, liquid (containing 0.5 mass%/〇 aluminum ion), and the liquid temperature was 50 °C. The AC power waveform was subjected to electrochemical graining treatment using a current 値 from zero to a peak TP of 0.8 msec, a duty ratio of 1:1, a trapezoidal rectangular wave, and a carbon electrode as a counter electrode. The auxiliary anode is made of ferrite iron. The current density is 30 A/dm2 at the peak of the current, and the auxiliary anode is shunted by 5% of the current flowing through the power supply. In the case of nitric acid electrolysis, the amount of electricity is 175 C/dm2 when the aluminum plate is an anode. Thereafter, it was washed with water by spraying. Next, using an aqueous solution of 〇5·5 °/〇 (containing 0.5% by mass of aluminum-85-200819915) and an electrolyte having a liquid temperature of 50 °C, the amount of electricity when the nameplate is the anode is 5 OC/dm2. Under the conditions, electrochemical roughening treatment was carried out by the same method as nitric acid electrolysis, followed by washing with water. To the plate, a 15 mass% aqueous sulfuric acid solution (containing 0.5 mass% of aluminum ion) was used as an electrolytic solution, and a DC anodic oxide film of 2.5 g/m 2 was placed at a current density of 15 A / d m 2 , and then washed with water and dried. The center line average roughness (Ra) of the obtained support was measured using a needle having a diameter of 2 μm to be 0.51 μm. Further, after the bar was applied with the following primer liquid, it was dried in an oven at 80 ° C for 1 〇 second, and dried at a coating amount of 10 mg / m 2 to prepare a support having an undercoat layer. <Bottom coating liquid> • The following primer compound (1) 0.017 g

•水 1 · 〇 0克 [實施例1〜15及比較例1〜4] [製造平版印刷版原版(1)〜(15)及比較平版印刷版原版 (1)-(4)] 在已賦予上述底塗層之支撐體上,棒塗布下述組成的感 光層塗布液(1)後,在7 0 °C烘箱乾燥6 0秒,來形成乾燥塗 -86- 200819915 布量爲1 .1克/平方公尺的感光層,在其上面,以乾燥塗布 量爲0.75克/平方公尺的方式,棒塗布下述組成所構成的保 護層塗布液(1)後,在125°C乾燥70秒,來製造實施例1的 平版印刷版原版(1)。 同樣地,製造實施例2〜1 5及比較例1〜4的平版印刷版 原版(2)〜(15)及比較平版印刷版原版(1)〜(4)。 <感光層塗布液(1 ):鹼可溶性黏合劑系> (引發系·記載於表-1)• Water 1 · 〇 0 g [Examples 1 to 15 and Comparative Examples 1 to 4] [Production of lithographic printing plates (1) to (15) and comparative lithographic printing plates (1) to (4)] On the support of the undercoat layer, the bar is coated with the photosensitive layer coating liquid (1) of the following composition, and then dried in an oven at 70 ° C for 60 seconds to form a dry coating -86-200819915. The amount of cloth is 1.1 gram. a photosensitive layer of a square meter of a photosensitive layer coating liquid (1) composed of the following composition was applied to the photosensitive layer having a dry coating amount of 0.75 g/m 2 , and dried at 125 ° C for 70 seconds. The lithographic printing plate precursor (1) of Example 1 was produced. Similarly, the lithographic printing plates (2) to (15) of Comparative Examples 2 to 15 and Comparative Examples 1 to 4 and the comparative lithographic printing plates (1) to (4) were produced. <Photosensitive layer coating liquid (1): alkali-soluble binder system> (Initiation system is described in Table-1)

•引發劑 〇 . 2克 •敏化色料 〇 . 1克 •共敏化劑 〇 . 3克 (聚合系) •黏合劑聚合物(記載於表-1 ) 3 · 0克 •聚合性化合物 6.2克 三聚異氰酸Ε Ο改性二丙烯酸酯 (東亞合成(股)製ARONIX M-215) •無色結晶紫 0.2克 •下述氟系界面活性劑(1) 〇 · 1克 000〇2"4。6户13 C一一(〇。3〜)22 - -〇H 0 氟系界面活性劑(1) •下述微膠囊分散液 25.0克 •甲基乙基酮 3 5 · 0克 • 1-甲氧基-2-丙醇 35·0克 -87- 200819915 (微膠囊分散液的調製) 將油相成分之1〇克三羥甲基丙烷與二甲苯二異氰酸 酯加成體(三井武田化學(股)製、TAKENATE D· 11 0N)、4.15 克三聚異氰酸 EO改性二丙烯酸酯(東亞合成(股)製 ARONIX M-215)、及 0.1 克 PAIONIN A-41C(竹本油月旨(股) 製),溶解於1 7克乙酸乙酯中。調製4 〇克水相成分之 PVA-205的4質量%7jc溶液。混合油相成分及水相成分,然 後使用均化器以1 200 〇rpm乳化10分鐘。將所得到的乳化 物添加在2 5克蒸餾水中,然後在室溫攪拌3 0分鐘後,在 4 0°C攪拌3小時。將如此進行所得到的微膠囊液使用蒸餾 水稀釋使固體成分濃度成爲20質量%,而得到微膠囊分散 液。平均粒徑爲0.25微米。 <保護層塗布液(1)> •下述雲母分散液 1 3.0克 •聚乙烯醇(皂化度98莫耳%、聚合度5 00) 1·3克 • 2-乙基己基磺酸基琥珀酸鈉 0.2克 •聚(乙烯基吡咯啶酮/乙酸乙烯(1/1)) 分子量7萬 0.05克 •界面活性劑(E m a 1 e X 7 1 0、 日本(EMULSION (股)製) 0·05 克 •水 1 3 3克 (雲母分散液的調製) 在 3 68克水中,添加 32克合成雲母(「SOMASIF ME-1 00」:CO-OP CHEMICAL 公司製、縱橫比:10〇〇 以上), -88- 200819915 然後使用均化器分散至平均粒徑(雷射散射法)爲〇 . 5微 米,來得到雲母分散液。 [實施例16〜30及比較例5〜8] [製造平版印刷版原版(16)〜(30)及比較平版印刷版原版 (5)-(8)]• Initiator 〇. 2g • Sensitized pigment 〇. 1g • Total sensitizer 〇. 3g (polymerization) • Adhesive polymer (described in Table-1) 3 · 0g • Polymeric compound 6.2克-trimer isocyanate Ο modified diacrylate (ARONIX M-215 made by East Asia Synthetic Co., Ltd.) • Colorless crystal violet 0.2 g • The following fluorine-based surfactant (1) 〇·1 g 000〇2" 4. 6 households 13 C one one (〇. 3~) 22 - -〇H 0 Fluoride surfactant (1) • The following microcapsule dispersion 25.0 g • Methyl ethyl ketone 3 5 · 0 g • 1 -Methoxy-2-propanol 35·0 g-87- 200819915 (Preparation of microcapsule dispersion) 1 g of trimethylolpropane and xylene diisocyanate adduct of oil phase component (Mitsui Takeda Chemical Co., Ltd. (Stock), TAKENATE D·11 0N), 4.15 g of trimeric isocyanate EO modified diacrylate (ARONIX M-215 made by East Asia Synthetic Co., Ltd.), and 0.1 g of PAIONIN A-41C (Bamboo Oil (manufactured by the company), dissolved in 17 g of ethyl acetate. A 4% by mass 7jc solution of PVA-205 having a water content of 4 grams was prepared. The oil phase component and the water phase component were mixed, and then emulsified at 1 200 rpm for 10 minutes using a homogenizer. The obtained emulsion was added to 25 g of distilled water, and then stirred at room temperature for 30 minutes, and then stirred at 40 ° C for 3 hours. The microcapsule liquid thus obtained was diluted with distilled water to have a solid content concentration of 20% by mass to obtain a microcapsule dispersion. The average particle size is 0.25 microns. <Protective layer coating liquid (1)> • The following mica dispersion 1 3.0 g • Polyvinyl alcohol (saponification degree 98 mol%, polymerization degree 500) 1·3 g• 2-ethylhexylsulfonate Sodium succinate 0.2 g • Poly(vinylpyrrolidone/vinyl acetate (1/1)) Molecular weight 70,000 g • Surfactant (E ma 1 e X 7 1 0, Japan (made by EMULSION) 0 ·05 g • Water 1 3 3 g (Preparation of mica dispersion) Add 32 g of synthetic mica in 3 68 g of water (“SOMASIF ME-1 00”: CO-OP CHEMICAL company, aspect ratio: 10〇〇 or more ), -88- 200819915 Then, using a homogenizer to disperse to an average particle diameter (laser scattering method) of 0.5 μm, a mica dispersion was obtained. [Examples 16 to 30 and Comparative Examples 5 to 8] [Production of lithography] Printed version of the original (16) ~ (30) and comparative lithographic printing original (5) - (8)]

除了將上述感光層塗布液(1)變更爲下述組成的感光 層塗布液(2)以外,與平版印刷版原版(1)同樣地製造,來製 造版印刷版原版(16)〜(30)及比較平版印刷版原版(5)〜(8)。 <感光層塗布液(2):疏水性黏合劑系> (引發系:記載於表-2) •引發劑 0.2克 •敏化色料 〇 . 1克 •共敏化劑 〇 . 3克 (聚合系) •黏合劑聚合物(記載於表-2) 3.0克 •聚合性化合物 6.2克 三聚異氰酸E 0改性二丙烯酸酯 (東亞合成(股)製ARONIX M-215) •無色結晶紫 〇 · 2克 •下述氟系界面活性劑(1) 〇 · 1克A printing plate precursor (16) to (30) is produced in the same manner as the lithographic printing plate precursor (1) except that the photosensitive layer coating liquid (1) is changed to the photosensitive layer coating liquid (2) having the following composition. And compare lithographic printing original (5) ~ (8). <Photosensitive layer coating liquid (2): Hydrophobic binder system> (Initiation system: described in Table-2) • Initiator 0.2 g • Sensitized colorant 1. 1 g • Total sensitizer 〇. 3 g (Polymerization) • Adhesive polymer (described in Table-2) 3.0 g • Polymeric compound 6.2 g of trimeric isocyanate E 0 modified diacrylate (ARONIX M-215 manufactured by Toagosei Co., Ltd.) • Colorless Crystal Violet · 2 g • The following fluorine-based surfactant (1) 〇·1 g

一 OH 25.0 克 氟系界面活性劑(1) •下述微膠囊分散液 -89- 200819915 •甲基乙基酮 35.0克 • 1-甲氧基-2-丙醇 35.0克 [平版印刷版原版的評價] 使用平版印刷版原版(1)〜(30)及比較平版印刷版原版 (1)〜(8 ),如下述進行曝光、顯像,並評價敏感度、顯像性、 保存安定性。 (敏感度評價) 使富士照相軟片(股)製之富士 STEP GUIDE (△ D = 0· 1 5 且透射光濃度不連續地變化.之灰階)黏附在平版印刷版原 版,以氙燈作爲光源,以估算對短波半導體雷射之曝光適 合性爲目的,使用 KENKO-BP-40作爲濾光片,使用 400 奈米之單色光以規定曝光能量進行曝光。 將曝光後的平版印刷版原版,使用下述組成的顯像 液,藉由自動顯像處理機進行顯像處理。自動顯像處理機 具有2支旋轉刷輥,平版印刷版原版最初接觸之第1支旋 轉刷輥,係植入有聚對酞酸丁二酯製的纖維(毛直徑爲200 微米、毛長度爲17毫米)之外徑90毫米的刷輥,在與搬運 方向同一方向,使其每分鐘爲200轉(刷子之前端周速爲 0.94公尺/秒),第2支旋轉刷輥,係植入有聚對酞酸丁二 酯製的纖維(毛直徑爲200微米、毛長度爲17毫米)之外徑 6 0毫米的刷輥,在與搬運方向相反方向,使其每分鐘爲200 轉(刷子之前端周速爲0.63公尺/秒)。平版印刷版原版的搬 運速度爲100公分/分鐘。 顯像液係藉由循環泵,從噴灑管進行沖淋而供給至版 -90- 200819915 面。顯像液的槽容量爲10公升。 (在實施例1〜1 5及比較例1〜4所使用之顯像液) 由下述組成所構成之ρ Η 1 1 . 9 5的水溶 '液 •氫氧化鈉 〇 · 2克 • 1 Κ矽酸鉀 2 · 4克 (Si02/K20=l ,9) •下述化合物(1) 5 ·0克 •伸乙二胺四乙酸· 4N a鹽 〇·1克 •水 91.3克 (在實施例16〜30及比較例5〜8所使用之顯像液(pH :約 •水 1 0 0克 •苄醇 1克 •聚氧乙烯萘基醚 1克 (氧伸.乙基平均數n=l3) •二辛基磺酸基琥珀酸酯鈉鹽 0.5克 •阿拉伯樹膠 1克 •乙二醇 0.5克 •一代磷酸銨 0.05 克 •檸檬酸 0、05 克 •伸乙二胺四乙酸酯4鈉鹽 0 · 0 5 克 在所得到的平版印刷版,讀取已完全除去影像之灰階的 -91- 200819915 最筒段數,求取其曝光能量,來自算出透明敏感度(mj/平方 公分)。曝光量小時,評價爲高敏感度。結果如表1所示。 (顯像性評價) 對平版印刷版原版,曝光裝置係使用 FUJIFILM Electronic Imaging Ltd製 Violet半導體雷射調節器 Vx9600(InGaN系半導體雷射405奈米±1〇奈米發光/輸出功 率30mW),以曝光量90// J/平方公分、解像度2438dpi, φ 藉由富士照相軟片FM SCREEN TAFFETA20,來描繪35% 的平網。隨後,與上述敏感度評價之顯像步驟同樣地進行, 將平版印刷版原版顯像處理1 00平方公尺程度後,目視引 發劑成分往自動顯像處理機析出情況而評價。明顯析出爲 X、難以判斷爲△、無析出爲〇,結果如表1所示。 (保存安定性的評價) 對平版印刷版原版,剛製造後(條件i)、及在60°C、1〇 天的強制條件下保存後(條件ii),與上述敏感度評價同樣 φ 地進行曝光、顯像,來求取各自的透明敏感度。將條件i 的透明敏感度與條件ii的透明敏感度的差異定義爲透明敏 感度比(條件ii/條件i)。該値越接近1時,表示未經時之平 版印刷版原版與強制經時後之平版印刷版原版在影像形成 敏感度的變化小,可以說是保存安定性高。 又,引發劑在pH 1 1 .95的水溶液中之溶解量,係如下 述進行測定。 使特定量的引發劑溶解在2毫升甲基乙基酮中,對其添 加9 8毫升已調製成ρ Η 1 1 . 9 5之2 5。(:的水溶液。攪拌1小時 -92- 200819915 後,使用微過濾器過濾。將該過濾液進而稀釋5倍後,藉由 常用方法進行UV測定。從其吸收強度算出溶解量,換算成 pH 11.95的水溶液每1升之溶解量。結果如表1所示。 又,引發劑在PH4.5的水溶液中之溶解量,係如下述 進行測定。 使特定量的引發劑溶解在2毫升甲基乙基酮中’對其 添加98毫升已調製成PH 4.5之25 °C的水溶液。攪拌1小 時後,使用微過濾器過濾。將該過濾液進而稀釋5倍後’ 藉由常用方法進行UV測定。從其吸收強度算出溶解量, 換算成p Η 4.5的水溶液每1升之溶解量。結果如表2所示。One OH 25.0 g of fluorine-based surfactant (1) • The following microcapsule dispersion-89-200819915 • Methyl ethyl ketone 35.0 g • 1-methoxy-2-propanol 35.0 g [lithographic original version of Evaluation] Using lithographic printing plates (1) to (30) and comparative lithographic printing plates (1) to (8), exposure, development, and evaluation of sensitivity, development, and storage stability were carried out as follows. (Sensitivity evaluation) The Fuji STEP GUIDE (△ D = 0·15 5 and the transmitted light density discontinuously changed. The gray scale) of Fuji Photo Film Co., Ltd. is adhered to the original of the lithographic printing plate, and the xenon lamp is used as the light source. For the purpose of estimating the exposure suitability for short-wave semiconductor lasers, KENKO-BP-40 was used as a filter, and exposure light was applied at a prescribed exposure energy using a monochromatic light of 400 nm. The exposed lithographic printing plate precursor was subjected to development processing by an automatic developing processor using a developing liquid having the following composition. The automatic developing processor has two rotating brush rollers, and the first rotating brush roller that the lithographic printing plate original first contacts is a fiber made of polybutylene terephthalate (the hair diameter is 200 μm, and the hair length is 17 mm) outer diameter 90 mm brush roller, in the same direction as the conveying direction, so that it is 200 rpm (the front end speed of the brush is 0.94 m / s), the second rotating brush roller is implanted A brush roller having an outer diameter of 60 mm (fiber diameter of 200 μm and hair length of 17 mm) having a diameter of 200 μm and a hair length of 17 mm is 200 rpm per minute in the opposite direction to the conveying direction (brush) The previous peripheral speed is 0.63 meters / sec). The original speed of the lithographic printing plate is 100 cm/min. The developing liquid is supplied to the plate by the circulation pump by a circulation pump and is supplied to the plate -90-200819915. The tank capacity of the developing solution is 10 liters. (Photographic liquids used in Examples 1 to 15 and Comparative Examples 1 to 4) ρ Η 1 1 . 9 5 composed of the following composition: water-soluble liquid · sodium hydroxide 〇 · 2 g • 1 Κ Potassium citrate 2 · 4 g (SiO 2 / K 20 = l , 9) • The following compounds (1) 5 · 0 g • Ethylenediaminetetraacetic acid · 4N a salt 〇 · 1 g • Water 91.3 g (in the examples The imaging solution used in 16~30 and Comparative Examples 5~8 (pH: about • water 100 g • benzyl alcohol 1 g • polyoxyethylene naphthyl ether 1 g (oxygen extension. ethyl average n=l3) • Dioctyl sulfosuccinate sodium salt 0.5 g • Gum arabic 1 g • Ethylene glycol 0.5 g • First generation ammonium phosphate 0.05 g • Citric acid 0,05 g • Ethylene diamine tetraacetate 4 sodium Salt 0 · 0 5 g In the obtained lithographic printing plate, read the maximum number of segments of -91-200819915 of the gray scale that has completely removed the image, and obtain the exposure energy from the calculated transparency sensitivity (mj/cm 2 ) When the exposure amount was small, it was evaluated as high sensitivity. The results are shown in Table 1. (Development evaluation) For the lithographic printing plate precursor, the exposure apparatus used Violet manufactured by FUJIFILM Electronic Imaging Ltd. Conductor laser regulator Vx9600 (InGaN semiconductor laser 405 nm ± 1 〇 nanometer light / output power 30 mW), with an exposure of 90 / / J / cm ^ 2, resolution 2438dpi, φ by Fuji Photo Film FM SCREEN TAFFETA20 To draw a 35% flat net. Then, in the same manner as the above-mentioned sensitivity evaluation imaging step, after the lithographic printing plate original image is processed to a degree of about 100 square meters, the visual initiator component is directed to the automatic developing processor. The evaluation was carried out, and it was judged that it was X, it was difficult to judge △, and no precipitation was 〇. The results are shown in Table 1. (Evaluation of preservation stability) For the lithographic printing plate original, immediately after manufacture (condition i), and After storage at 60 ° C for 1 day under forced conditions (condition ii), exposure and development were performed in the same manner as the sensitivity evaluation described above to obtain the respective transparency sensitivity. The transparency sensitivity and condition of condition i were obtained. The difference in transparency sensitivity of ii is defined as the transparency sensitivity ratio (condition ii/condition i). The closer the 値 is to 1, the lithographic printing plate original and the forced lithographic original plate are formed in the image. Min The change in degree is small, and it can be said that the storage stability is high. Further, the amount of the initiator dissolved in an aqueous solution of pH 1 1.95 is determined as follows. A specific amount of the initiator is dissolved in 2 ml of methyl ethyl group. In the ketone, 98 ml of an aqueous solution of ρ Η 1 1 . 9 5 was added thereto. After stirring for 1 hour - 92 - 200819915, it was filtered using a microfilter. After further diluting the filtrate by a factor of 5, UV measurement was carried out by a usual method. The amount of dissolution was calculated from the absorption intensity, and converted into an amount of dissolution per 1 liter of the aqueous solution of pH 11.95. The results are shown in Table 1. Further, the amount of the initiator dissolved in an aqueous solution of pH 4.5 was measured as follows. A specific amount of the initiator was dissolved in 2 ml of methyl ethyl ketone, and 98 ml of an aqueous solution which had been prepared to have a pH of 4.5 at 25 ° C was added thereto. After stirring for 1 hour, it was filtered using a microfilter. The filtrate was further diluted 5 times, and UV measurement was carried out by a usual method. The amount of dissolution was calculated from the absorption intensity, and converted into an amount of dissolution per 1 liter of the aqueous solution of p Η 4.5. The results are shown in Table 2.

•93- 200819915 表-1 引發系 評價結果 敏化色料 (克) 引發劑 (克) 共敏化劑 (克) 黏合劑 聚合物 (克) 化合物 溶解性 (毫克/升) 在顯像 機之氣 體析出 透明敏感度 (mJ/平方公分) 透明敏 感度比 實施例1 H-l(l.O) 1-3(0.90) R-K0.20) Ρ-6(3,5 克) 450 〇 0.32 1.04 實施例2 H-l(l.O) 1-4(1.2) R-K0.20) Ρ·6(3.5 克) 470 〇 0.28 1.04 實施例3 H-l(l.O) 1-12(1.3) R-K0.20) Ρ-6(3·5 克》 490 〇 0.29 1.02 實施例4 H-l(l.O) 1-16(1.25) R-K0.20) Ρ-6(3·5 克) 1200 〇 0.45 1.02 實施例5 H-l(l.O) 1-17(0.9) R-l(0.20) Ρ-6(3.5 克) 450 〇 0.41 1.2 實施例6 H-l(l.O) 1-18(1.2) R-K0.20) Ρ-6(3·5 克) 850 〇 0.35 1.25 實施例7 H-l(l.O) 1-24(1.1) R-K0.20) Ρ-6(3·5 克) 660 〇 0.46 1.09 實施例8 H-l(l.O) 14(0.91) R-K0.20) Ρ-6(3.5 克) 420 〇 0.28 1.02 實施例9 H-l(l.O) 1-6(0.90) R-K0.20) Ρ-6(3·5 克) 390 〇 0.27 1 實施例10 H-l(l.O) 1-21(0.90) R-l(0.20) Ρ-6(3.5 克) 450 〇 0.35 1.06 實施例11 H-l(l.O) 1-22(0.90) R-K0.20) Ρ-6(3.5 克) 430 〇 0.38 1.02 實施例12 H-l(l.O) 1-7(0.85) R-K0.20) Ρ-6(3.5 克) 300 〇 0.29 1.01 實施例13 H-l(l.O) 1-8(0.95) R-K0.20) Ρ·6(3·5 克) 350 〇 0.32 1.05 實施例14 H-l(l.O) 1-5(0.91) R-K0.20) Ρ-6(3.5 克) 320 〇 042 1.15 實施例15 —比較例1 H-l(l.O) H-l(l.O) 1-9(1.02) R-l(0.20) Ρ-6(3.5 %) 300 〇 0.44 1.36 T-K0.90) R-l(0.20) Ρ·6(3·5 克) 10 X 0.28 1.05 比較例2 H-l(l.O) T-2(0.90) R-K0.20) Ρ-6(3.5 克) 30 X 0.29 1,05 比較例3 H-l(l.O) T-3(0.90) R-l(0.20) Ρ-6(3·5 克) 20 X 0.32 1.09 比較例4 H-l(l.O) Τ-4(0·91) R-l(0.20) Ρ-6(3·5 克) 5 X 0.35 1.15•93- 200819915 Table-1 Initiation Evaluation Results Sensitized Colorant (g) Initiator (g) Co-sensitizer (g) Adhesive Polymer (g) Compound Solubility (mg/L) in the Developer Gas precipitation transparency sensitivity (mJ/cm 2 ) Transparent sensitivity ratio Example 1 Hl (10) 1-3 (0.90) R-K0.20) Ρ-6 (3,5 g) 450 〇0.32 1.04 Example 2 Hl(lO) 1-4(1.2) R-K0.20) Ρ·6 (3.5 g) 470 〇0.28 1.04 Example 3 Hl(lO) 1-12(1.3) R-K0.20) Ρ-6( 3·5 克 490 〇0.29 1.02 Example 4 Hl(lO) 1-16(1.25) R-K0.20) Ρ-6(3·5 g) 1200 〇0.45 1.02 Example 5 Hl(lO) 1- 17(0.9) Rl(0.20) Ρ-6(3.5 g) 450 〇0.41 1.2 Example 6 Hl(lO) 1-18(1.2) R-K0.20) Ρ-6(3·5 g) 850 〇0.35 1.25 Example 7 Hl(lO) 1-24(1.1) R-K0.20) Ρ-6(3·5 g) 660 〇0.46 1.09 Example 8 Hl(lO) 14(0.91) R-K0.20) Ρ-6 (3.5 g) 420 〇0.28 1.02 Example 9 Hl(lO) 1-6(0.90) R-K0.20) Ρ-6(3·5 g) 390 〇0.27 1 Example 10 Hl(lO) 1-21 (0.90) Rl (0.20) Ρ-6 (3.5 g) 450 〇0.35 1.06 Example 11 H -l(lO) 1-22(0.90) R-K0.20) Ρ-6(3.5 g) 430 〇0.38 1.02 Example 12 Hl(lO) 1-7(0.85) R-K0.20) Ρ-6 (3.5 g) 300 〇0.29 1.01 Example 13 Hl(lO) 1-8(0.95) R-K0.20) Ρ·6(3·5 g) 350 〇0.32 1.05 Example 14 Hl(lO) 1-5 (0.91) R-K0.20) Ρ-6 (3.5 g) 320 〇042 1.15 Example 15 - Comparative Example 1 Hl(lO) Hl(lO) 1-9(1.02) Rl(0.20) Ρ-6(3.5 %) 300 〇0.44 1.36 T-K0.90) Rl(0.20) Ρ·6(3·5 克) 10 X 0.28 1.05 Comparative Example 2 Hl(lO) T-2(0.90) R-K0.20) Ρ- 6 (3.5 g) 30 X 0.29 1,05 Comparative Example 3 Hl(lO) T-3(0.90) Rl(0.20) Ρ-6(3·5 g) 20 X 0.32 1.09 Comparative Example 4 Hl(lO) Τ- 4(0·91) Rl(0.20) Ρ-6(3·5 grams) 5 X 0.35 1.15

• 從表1,得知本發明所使用的引發劑,與比較例的化 合物比較時,顯示壓倒性的高鹼溶解性,且未產生顯像氣 體成分。又,從實施例1、2,得知在鹼顯像液藉由保護羥 基之取代基,能夠具有高敏感度。而且,將實施例8與實 施例12〜15比較時,得知連結碳原子(存在於N-N間)而成 之苯基的取代基,以氯原子爲佳,且取代位置以鄰位爲佳。 -94- 200819915 表-2 引發系 評價結果 黏合劑 化合物 在顯像 诱明敏 敏化色料 引發劑 共敏化劑 聚合物 溶解性 機之氣體 透明敏感度 感度比 (克) (克) (克) (克) (毫克/升) 析出 (mJ/平方公分) 實施例16 H-K1.0) 1-3(0.90) R4(0.20) Ρ-1(3·5 克) 450 〇 0.31 1.02 實施例17 H-l(l.O) 1-4(1.2) R-K0.20) Ρ-3(3·5 克) 190 △ 0.3 1.03 實施例18 H-l(l.O) 1-12(1.3) R-K0.20) Ρ-2(3.5 克) 180 △ 0.3 u 實施例19 H-K1.0) 146(1.25) R-K0.20) Ρ_5(3.5 克) 1000 〇 0.42 1.06 實施例20 H-K1.0) 147(0.9) R-l(0.20) Ρ·2(3·5 克) 420 〇 0.41 1.2 實施例21 H-l(l.O) 1-18(1.2) R-K0.20) Ρ-4(3·5 克) 750 〇 0.33 1.3 實施例22 H-l(l.O) 1-24(1.1) R-K0.20) Ρ-4(3.5 克) 200 Δ 0.45 1.15 實施例23 H-K1.0) 1-1(0.91) R-K0.20) Ρ-Κ3.5 克 Γ 190 Δ 0.3 1.02 實施例24 H-K1.0) 1-6(0.90 R-1(0,20) Ρ4(3.5 克) 180 △ 0.31 1 實施例25 H-l(l.O) 1-21(0.90) R-K0.20) Ρ-3(3.5 克) 210 △ 0.45 1.08 實施例26 H-l(l.O) 1-22(0.90) R-K0.20) Ρ-3(3.5 克) 220 Δ 0.46 1.06 實施例27 H-l(l.O) 1-7(0.85) R-K0.20) Ρ-Κ3.5 克) 190 △ 0.34 1.02 實施例28 H-l(l.O) 1-8(0.95) R-K0.20) Ρ-Κ3.5 克) 180 △ 0.36 10.7 實施例29 H-l(l.O) 1-5(0.91) R-l(0.20) Ρ-Κ3.5 克) 200 Δ 0.42 1.2 實施例30 H-l(l.O) 1-9(1.02) R-K0.20) P-K3.5 克) 220 △ 0.45 1.4 比較例5 H-l(l.O) T-K0.90) R-K0.20) Ρ-3(3·5 克) 10 X 0.30 1.2 比較例6 H-l(l.O) Τ·2(0.90) R-K0.20) Ρ-3(3·5 克) 30 X 0.31 1.4 比較例7 H-l(l.O) T-3(0.90) R-K0.20) Ρ-3(3.5 克) 20 X 0.33 1.3 比較例8 H-l(l.O) Τ-4(0.91) R-l(0.20) Ρ-3(3.5 克) 5 X 0.38 1.3• From Table 1, it is found that the initiator used in the present invention exhibits an overwhelming high alkali solubility when compared with the compound of the comparative example, and does not generate a developing gas component. Further, from Examples 1 and 2, it was found that the alkali developing solution can have high sensitivity by protecting the substituent of the hydroxyl group. Further, when Example 8 is compared with Examples 12 to 15, it is found that a substituent of a phenyl group which is bonded to a carbon atom (present between N-N) is preferably a chlorine atom, and a substitution position is preferably an ortho position. -94- 200819915 Table-2 Initiation evaluation results of binder compounds in the imaging-sensitized sensitized coloring agent initiator sensitizer polymer solubility machine gas transparency sensitivity ratio (g) (g) (g) (g) (mg/L) Precipitation (mJ/cm 2 ) Example 16 H-K1.0) 1-3 (0.90) R4 (0.20) Ρ-1 (3·5 g) 450 〇0.31 1.02 Example 17 Hl(lO) 1-4(1.2) R-K0.20) Ρ-3 (3·5 g) 190 △ 0.3 1.03 Example 18 Hl(lO) 1-12(1.3) R-K0.20) Ρ- 2 (3.5 g) 180 △ 0.3 u Example 19 H-K1.0) 146 (1.25) R-K0.20) Ρ_5 (3.5 g) 1000 〇0.42 1.06 Example 20 H-K1.0) 147 (0.9) Rl (0.20) Ρ·2 (3·5 g) 420 〇0.41 1.2 Example 21 Hl(lO) 1-18(1.2) R-K0.20) Ρ-4(3·5 g) 750 〇0.33 1.3 Implementation Example 22 Hl(lO) 1-24(1.1) R-K0.20) Ρ-4 (3.5 g) 200 Δ 0.45 1.15 Example 23 H-K1.0) 1-1 (0.91) R-K0.20) Ρ-Κ3.5 克Γ 190 Δ0.3 1.02 Example 24 H-K1.0) 1-6 (0.90 R-1 (0,20) Ρ4 (3.5 g) 180 △ 0.31 1 Example 25 Hl(lO) 1 -21(0.90) R-K0.20) Ρ-3 (3.5 grams) 210 △ 0.45 1.08 Example 26 Hl(lO) 1-22(0.90) R-K0.20) Ρ-3 (3.5 g) 220 Δ 0.46 1.06 Example 27 Hl(lO) 1-7(0.85) R-K0.20) Ρ- Κ3.5 g) 190 Δ 0.34 1.02 Example 28 Hl(lO) 1-8(0.95) R-K0.20) Ρ-Κ3.5 g) 180 △ 0.36 10.7 Example 29 Hl(lO) 1-5( 0.91) Rl (0.20) Ρ-Κ3.5 g) 200 Δ 0.42 1.2 Example 30 Hl(lO) 1-9(1.02) R-K0.20) P-K3.5 g) 220 △ 0.45 1.4 Comparative Example 5 Hl(lO) T-K0.90) R-K0.20) Ρ-3(3·5 g) 10 X 0.30 1.2 Comparative Example 6 Hl(lO) Τ·2(0.90) R-K0.20) Ρ- 3 (3·5 g) 30 X 0.31 1.4 Comparative Example 7 Hl(lO) T-3(0.90) R-K0.20) Ρ-3 (3.5 g) 20 X 0.33 1.3 Comparative Example 8 Hl(lO) Τ- 4(0.91) Rl(0.20) Ρ-3(3.5 g) 5 X 0.38 1.3

從表2,得知本發明所使用的引發劑,與比較例的化 合物比較時,顯示在弱酸水液中具有高溶解性,且不容易 產生顯像氣體成分。 又’與鹼顯像之最大差異點,因爲水溶液係弱酸性, 無法將竣系官能基加水分解,使用乙醯基保護羥基而成之 物(實施例1 6、1 7等),與鹼顯像時完全未產生氣體比較, 能夠確認、會產生若干氣體。這在羧酸酯系化合物亦是同樣 (推定S爲無法加水分解,會成爲氣體成分),即便如此, -95- 200819915 溶解性與比較例比較時亦得到改善’能夠賦予整體良好的 結果。 由此,得知進行弱酸性顯像時,賦予化合物的取代基 以羥基爲隹。 在表1及表2之引發劑所使用之本發明的引發劑,任 一者都是前述例示化合物所示之物。又,敏化色料Η-1、 引發劑T-1〜T-4、共敏化劑R-1及黏合劑聚合物P]〜P-5的 結構係如以下所示。又,比較例所使用之下述的引發劑 T-1〜T-4係本發明所使用之引發劑的範圍外的化合物。From Table 2, it was found that the initiator used in the present invention showed high solubility in a weak acid aqueous solution and was less likely to generate a developing gas component when compared with the compound of the comparative example. In addition, the biggest difference from the alkali image development, because the aqueous solution is weakly acidic, it is impossible to hydrolyze the lanthanide functional group, and the hydroxy group is used to protect the hydroxy group (Examples 16.6, 17 and so on) When the image is not produced at all, it is possible to confirm that a certain amount of gas will be generated. This is also the same in the carboxylic acid ester-based compound (it is estimated that S is not hydrolyzable and becomes a gas component). Even in this case, the solubility of -95-200819915 is improved as compared with the comparative example, and it is possible to give a good overall result. From this, it was found that when weak acid development is performed, the substituent imparted to the compound has a hydroxyl group as a hydrazine. The initiator of the present invention used in the initiators of Tables 1 and 2 is any of the compounds exemplified above. Further, the structures of the sensitizing toner Η-1, the initiators T-1 to T-4, the co-sensitizer R-1, and the binder polymers P] to P-5 are as follows. Further, the following initiators T-1 to T-4 used in the comparative examples are compounds outside the range of the initiator used in the present invention.

<疏水性黏合劑聚合物> 下述?-1、?-2、?-3、?-4的重量平均分子量係各自爲8萬、 7萬、1〇萬、9萬。 -96- 200819915<Hydrophobic binder polymer> -1,? -2,? -3,? The weight average molecular weight of -4 is 80,000, 70,000, 1,000,000, and 90,000, respectively. -96- 200819915

又,Ρ-1〜ρ·4的酸價係0.3meq/g以下。Further, the acid value of Ρ-1 to ρ·4 is 0.3 meq/g or less.

酸價 2.0 6 m e g / g <鹼可溶性黏合劑聚合物> P-6:甲基丙烯酸烯丙酯/甲基丙烯酸/N-異丙基丙烯醯胺共 聚物(共聚合莫耳比67/ 1 3 /20) 【圖式簡單說明】 〇 y\、、 【主要元件符號說明】 Μ 。 \\ -97-Acid value 2.0 6 meg / g <alkali-soluble binder polymer> P-6: allyl methacrylate/methacrylic acid/N-isopropylacrylamide copolymer (copolymerized molar ratio 67/ 1 3 /20) [Simple description of the diagram] 〇y\,, [Description of main component symbols] Μ . \\ -97-

Claims (1)

200819915 十、申請專利範圍: 1. 一種感光性組成物,含有: (A) 具有下述式(I)所示結構之二咪哩型化合物、 (B) 在350奈米〜850奈米具有吸收極大波長又⑺“之敏化 色料、及 (C) 聚合性化合物,200819915 X. Patent application scope: 1. A photosensitive composition comprising: (A) a dimethicone compound having the structure represented by the following formula (I), (B) having an absorption at 350 nm to 850 nm The maximum wavelength is (7) "the sensitizing colorant, and (C) the polymerizable compound, (通式(I)中,Ri〜R6係表示可具有取代基之芳基、可具有 取代基之雜芳基中之任一者,Ri〜R6中至少2個係具有进 自 COOR7 基、S03R8 基、P03R9 基、OH 基、及 〇C〇Rl° 基之取代基之芳基或雜芳基,R7〜Ri〇係各自獨立地表示 非氫原子之一價的原子團)。 2 ·如申請專利範圍第1項之感光性組成物,其中該敏化色 料(B)係選自香豆素色料、苯乙烯基色料、花青苷色料、 及部花青色料。 3 . —種影像記錄材料,係在支撐體上,具有含有如申請專 利範圍第1或2項之感光性組成物之感光層。 4 · 一種影像記錄方法,係使用比4 5 〇奈米更短波長的雷射 光源’對在支撐體上具有含有如申請專利範圍第丨或2 項感光性組成物之感光層之影像記錄材料進行掃描曝 -98- 200819915 光。 5 . —種平版印刷版,係在支撐體上’具有含有如申請專利 範圍第1或2項之感光性組成物之感光層。 6. —種平版印刷版之製法,其特徵係包含以下步驟:將依 照以下順序具有支撐體、感光層、及保護層之平版印刷 版原版,在波長爲350〜4 50奈米的雷射曝光後’在pH爲 10〜14的顯像液之存在下,除去保護層及非曝光部的感光 層;其中該感光層含有(A)具有下述式(I)所示結構之二咪 口坐型化合物、(B )在3 5 0奈米〜8 5 0奈米具有吸收極大波長 λ max之敏化色料、(C)聚合性化合物、及(D-ι)鹼可溶性 黏合劑聚合物,(In the formula (I), Ri to R6 represent any one of an aryl group which may have a substituent and a heteroaryl group which may have a substituent, and at least two of Ri to R6 have a COOR7 group, a S03R8 group. The aryl or heteroaryl group of the substituent of the group, the P03R9 group, the OH group, and the 〇C〇Rl° group, and the R7~Ri〇 each independently represents a valence group of a non-hydrogen atom). 2. The photosensitive composition of claim 1, wherein the sensitizing colorant (B) is selected from the group consisting of a coumarin coloring material, a styrene based coloring material, an anthocyanin coloring material, and a merocyanine coloring material. An image recording material which is provided on a support and which has a photosensitive layer containing a photosensitive composition according to claim 1 or 2. 4 · An image recording method using a laser light source having a wavelength shorter than 45 〇 nanometers for an image recording material having a photosensitive layer containing a photosensitive composition of the first or second photosensitive composition of the patent application scope on the support Scanned to expose -98- 200819915 light. A lithographic printing plate on a support having a photosensitive layer containing the photosensitive composition of the first or second aspect of the patent application. 6. A method for producing a lithographic printing plate, comprising the steps of: exposing a lithographic printing plate precursor having a support, a photosensitive layer, and a protective layer in the following order at a laser wavelength of 350 to 4 50 nm; Thereafter, the photosensitive layer of the protective layer and the non-exposed portion is removed in the presence of a developing solution having a pH of 10 to 14; wherein the photosensitive layer contains (A) a second microphone having a structure represented by the following formula (I) a compound of the type (B) having a sensitizing color absorbing maximum wavelength λ max at 350 nm to 850 nm, (C) a polymerizable compound, and a (D-I) alkali-soluble binder polymer, (通式(I)中,Ri〜R6係表示可具有取代基之芳基、可具有 取代基之雜芳基中之任一者,Ri〜R6中至少2個係具有選 自 COOR7 基、S03R8 基、P03R9 基、OH 基、及 OCORio 基之取代基之芳基或雜芳基,R7〜Rm係各自獨立地表示 非氫原子之一價的原子團)。 7 · —種平版印刷版之製法,其特徵係包含以下步驟:將依 照以下順序具有支撐體、感光層、及保護層之平版印刷 版原版,在波長爲350〜450奈米的雷射曝光後,在pH爲 2〜10的顯像液之存在下,除去保護層及非曝光部的感光 -99- 200819915 層;其中該感光層含有(A)具有下述式⑴所不結構之一味 唑型化合物、(B)在3 5 0奈米〜8 5 0奈米具有吸收極大波長 λ max之敏化色料、(。)聚合性化合物、及(D-2)酸價爲 0.3 m e q / g以下之疏水性黏合劑聚合物(In the formula (I), Ri to R6 represent any one of an aryl group which may have a substituent and a heteroaryl group which may have a substituent, and at least two of Ri to R6 have a selected from the group consisting of COOR7 group and S03R8. An aryl or heteroaryl group of a substituent of a P03R9 group, an OH group, and an OCORio group, and R7 to Rm each independently represent a valence group of a non-hydrogen atom). 7 - A method for producing a lithographic printing plate, comprising the steps of: lithographic printing plate precursor having a support, a photosensitive layer, and a protective layer in the following order, after exposure to a laser having a wavelength of 350 to 450 nm The photosensitive layer -99-200819915 layer of the protective layer and the non-exposed portion is removed in the presence of a developing solution having a pH of 2 to 10; wherein the photosensitive layer contains (A) one of the structures of the following formula (1): The compound and (B) have a sensitizing colorant having a maximum absorption wavelength λ max of from 350 nm to 850 nm, a polymerizable compound, and an acid value of (D-2) of 0.3 meq / g or less. Hydrophobic binder polymer (通式(I)中,Ri〜L係表示可具有取代基之芳基、可具有 取代基之雜芳基中之任一者,中至少2個係具有进 自 COOR7 基、S03R8 基、P03R9 基、0H 基、及0CORl( 基之取代基之芳基或雜芳基,R7〜RlG係各自獨立地表不 非氫原子之一價的原子團)。(In the formula (I), Ri to L are each one of an aryl group which may have a substituent and a heteroaryl group which may have a substituent, and at least two of them have a group derived from a COOR7 group, a S03R8 group, and a P03R9 group. The group, the 0H group, and the 0COR1 (the aryl or heteroaryl group of the substituent, the R7 to RlG each independently represent an atomic group of one of the hydrogen atoms). -100- 200819915 七、指定代表圖: (一) 本案指定代表圖為:無。 (二) 本代表圖之元件符號簡單說明: Μ 〇 j\\\ 八、本案若有化學式時,請揭示最能顯示發明特徵的化學式:-100- 200819915 VII. Designation of the representative representative: (1) The representative representative of the case is: None. (2) A brief description of the symbol of the representative figure: Μ 〇 j\\\ 8. If there is a chemical formula in this case, please disclose the chemical formula that best shows the characteristics of the invention:
TW096132681A 2006-09-04 2007-09-03 Photosensitive composition, image recording material including the composition, and method for producing lithographic printing plate TW200819915A (en)

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