200811929 (1) 九、發明說明 【發明所屬之技術領域】 本發明是關於密封機構，特別是關於將真空處理室內 保持著被處理構件的保持部利用掃瞄軸驅動成往返移動， 將該掃猫軸貫穿真空處理室牆壁所設置的連絡口導出外部 由配置在真空處理室外的驅動機構對該掃瞄軸進行驅動的 狀況時’ 一種適合於真空處理室外的真空驅動軸使用的真 空密封機構。 【先前技術】 此種真空密封機構，例如是適用在FPD ( Flat Panel Display :平面顯示器）製造用的帶狀射束型摻雜裝置， 於此參照第7圖加以簡單說明。 於第7圖，此種摻雜裝置中，爲了在真空處理室1〇〇 內使大型長方形形狀的玻璃基板100全區域摻雜，有必要 $ 將玻璃基板110其全長整個掃瞄在帶狀射束120中。摻雜 作業中，玻璃基板1 1 〇是由基板保持器1 3 0保持在真空處 理室1〇〇內，朝第7圖箭頭符號200所示的雙方向對其進 行掃瞄。掃瞄動作用的驅動，是透過直動式真空驅動軸即 掃瞄軸140在大氣側即真空處理室1〇〇外進行。掃瞄軸 140是貫穿在真空處理室1〇〇的牆壁101形成可往返移動 (上下動）。於真空處理室100外的掃瞄軸140的周圍， 設有可使真空側和大氣側分離的封裝式真空密封機構1 5 0 。掃瞄軸1 40的大氣側端部’是固定在以掃瞄用馬達1 6 1 -5- 200811929 (2) 爲驅動源的滾珠螺桿機構160的移動部162。 基板保持器130，是由配置在馬達殻170內的驅動馬 達構成的驅動機構使其成爲可水平動作，傾轉動作。馬達 殻170，是由添設在真空處理室1〇〇牆壁1〇1的線性軸承 171引導成爲可往返移動（上下動）。 掃瞄軸140爲中空，透過纜線殻180使其真空側的端 部和馬達殼170形成連接。於掃瞄軸140內，需收容連接 馬達殻1 70內驅動馬達的動力纜線或真空排氣路線等，所 β以其內徑必須形成爲較大。 此外，當加工對象爲非常大型級別的玻璃基板時連掃 瞄長都會超過1 000mm，因此往復於真空側和大氣側的掃 瞄軸140的表面積就會變大。如此一來，於掃瞄中暴露在 大氣時，附著在掃瞄軸1 40表面的水份等會游離在真空處 理室1 〇〇內造成真空度惡化，特別是會導致無法獲得掃瞄 速度快低劑量摻雜的再現性。 ^ 另一方面，對於附著在掃瞄軸表面的水份所造成的真 空處理室內的真空度惡化的改善手段，是提供具備氣體置 換機構的系統。該系統具備有可包圍著掃瞄軸周圍，具1 段以上排氣室的軸承裝置。接著，軸承裝置至少在其真空 處理室相反側的端部和通過該端部的掃瞄軸之間的空隙其 大氣側的入口附近具備有氣體置換機構。該氣體置換機構 ’是從±述軸承機構的外部供應至少比周圍大氣還濕度低 並且正壓的乾燥氣體，以該乾燥氣體置換上述入口部附近 的環境氣（參照專利文獻i :日本專利第3077605號公報 200811929 (3) 利用該氣體置換機構，能夠防止大氣流入軸承裝置的 初段排氣室，進而能夠防止大氣中的水份流入軸承裝置。 然而，專利文獻1所揭示的系統，其處理對象是被處 理構件的基板尺寸至多爲8英吋或1 2英吋程度，掃瞄長 也只不過是300 mm或400mm程度而已，並不適合成爲處 理對象是掃猫長超過1 〇〇〇 mm大型基板的系統。 【發明內容】 本發明的目的是提供一種即使是高速且爲長掃瞄的基 板掃瞄，於封裝式真空密封機構中還是能夠實現真空性能 提昇的真空驅動軸之真空密封機構。 本發明，其適用於下述構成的真空驅動軸之真空密封 機構，即，該真空驅動軸之真空密封機構是構成將真空處 理室內保持著被處理構件的保持部利用真空驅動軸驅動成 往返移動，將該真空驅動軸貫穿該真空處理室牆壁所設置 的連絡口導出外部由配置在真空處理室外的驅動機構對其 進行驅動，在從上述連絡口伸出至該真空處理室外的部位 具備有該真空驅動軸的導出用引導部的同時，於該真空驅 動軸的大氣側周圍具備有密封殼。 於本發明的真空密封機構中，由複數差動排氣部及複 數密封構件構成上述密封殼的同時，在上述真空驅動軸上 ，透過具有彈性部份形成可擺動的連接構件連結上述導出 用引導部和上述密封殼。 200811929 (4) 於本發明的真空密封機構中，上述具有彈性部份的連 接構件是以具有可擺動自如支撐在上述密封殼的中間連接 構件爲佳。 於本發明的真空密封機構中，上述複數密封構件，最 好是由從真空處理室側依序朝大氣側配置的第1、第2、 第3密封構件所形成，上述差動排氣部，最好是由：上述 第1密封構件和上述第2密封構件之間設置在述密封殼的 第1差動排氣部；及上述第2密封構件和上述第3密封構 ® 件之間設置在上述密封殼的第2差動排氣部所構成。 本發明的真空密封機構中，最好是上述第2差動排氣 部的排氣空間，其排氣部的容積是形成比上述第1差動排 氣部的排氣空間還大。 本發明的真空密封機構中，最好是於上述第1差動排 氣部連接著精密真空泵浦，於上述第2差動排氣部連接著 粗真空泵浦。 ^ 本發明的真空密封機構中，上述密封構件，最好是具 有：剖面大致爲U字形狀的環體；及收容在該環體大致U 字形狀內將該大致U字形狀往擴張方向彈推的環狀彈簧 體，大致U字形狀一方的邊最好是緊貼著上述真空驅動 軸收容在上述密封殼。 本發明的真空密封機構中，上述密封殼，最好是在上 述複數密封構件當中軸方向爲最接近大氣側的密封構件其 大氣側附近，設有可將乾燥惰性氣體或乾燥空氣噴吹在上 述驅動軸周圍的吹掃部。 -8 - 200811929 (5) 本發明的真空密封機構中，上述清除部，最好是包括 能以嵌套構造嵌附在上述密封殼大氣側端部的吹掃環，該 吹掃環內的吹掃空間，最好是透過密封空間連通於上述各 差動排氣部的排氣空間。 本發明的真空密封機構中，上述具有彈性部份的連接 構件，最好是包括：組裝在上述密封殼真空處理室側端部 的上述中間連接構件；位於上述真空驅動軸的上述導出用 引導部和上述中間連接構件之間，設置成可使上述真空驅 動軸的周圍空間形成密封的蛇腹管；及設置在上述真空處 理室和上述中間連接構件之間，可和上述中間連接構件合 作形成容許上述密封殼其擺動的同時對軸方向的活動和旋 轉加以限制的複數支承桿。 本發明的真空密封機構中，上述複數支承桿，最好是 ，位於上述蛇腹管的外側，其一端側是固定在上述真空處 理室側，另一方面，其另一端側是固定在上述中間連接構 φ 件，至少在2支支承桿的對應於另一端側的部位，透過球 面或球關節的軸承使上述中間連接構件和上述密封殼形成 結合。 本發明的真空密封機構中，最好是，上述第1密封構 件及上述第1差動排氣部，其有關上述軸承的位置是設置 在靠近真空處理室側，上述第2密封構件其有關上述軸承 的位置是設置在稍微錯開大氣側附近的位置’上述第2差 動排氣部及上述第3密封構件其有關上述軸承的位置是設 置在靠近大氣側。 -9 - 200811929 (6) 根據本發明時，能夠提供具備有上述任一構成的真空 驅動軸之真空密封機構的真空處理室或真空處理裝置。 根據本發明時，當然能夠防止大氣侵入真空處理室內 ，此外還能夠防止大氣中的水份流入真空處理室內，能夠 防止真空處理室內的真空度隨著時間經過而惡化。 【實施方式】 [發明之最佳實施形態] 以下，參照第1A圖、第1B圖及第2圖，針對本發 明應用在做爲真空處理裝置的FPD製造用劑量摻雜裝置 的真空處理室的真空機構實施例進行說明。至於真空處理 機構以外的部份，亦可和第7圖所示的構成相同。 第1 A圖，是表示本發明的真空密封機構設置成和第 7圖說明的真空處理室中相同的部位時其狀態側面，第1 B 圖爲第1圖所示真空密封機構從下方看時的底視圖。第2 圖爲第1 A圖真空密封機構的縱剖面圖。 本實施例的真空密封機構，以槪略性而言，是大致分 成密封殼2、吹掃部4、具有彈性部份的連接構件5。爲 真空驅動軸的掃瞄軸7是以可往返移動作（上下動作）的 狀態貫穿著該等各部及設置在真空處理室1牆壁6的連絡 口 6a。 密封殻2爲環狀或筒狀，於其上端側組裝有可將密封 殼2支撐成擺動自如的凸緣環（中間連接構件）5 3。密封 殻2是在軸方向隔著間隔的3處內壁分別具有環狀溝槽， -10- 200811929 (7) 於該等內壁收容著密封環23-1、23-2、23-3。密封環23-1 、2 3 -2、2 3 - 3是分別從真空處理室1側開始依順序稱爲第 1、第2、第3密封環。於密封殻2的內壁，又於第1密 封環23-1和第2密封環23-2之間，及第2密封環23-2 和第3密封環23 -3之間，分別具有環狀凹部，該等環狀 凹部，從真空處理室1側開始依順序做爲第1、第2差動 排氣部24-1、24-2使用。即，從第1差動排氣部24-1的 排氣空間形成有通往密封殼2外部的通道24_ 1 a，於該通 ® 道24-la透過連接器連接著精密真空泵浦。藉此，使第1 差動排氣部24-1進行高真空度的真空抽引。另一方面， 第2差動排氣部24-2的排氣空間，爲了形成有較大的排 氣導電率將排氣部的容積形成比第1差動排氣部24-1的 排氣空間還大。從第2差動排氣部24-2的排氣空間形成 有通往密封殼2外部的通道24-2a，於該通道24-2a透過 連接器連接著粗真空泵浦。即，第2差動排氣部24-2是 φ 以較第1差動排氣部24-1爲低真空度或短時間進行粗抽 引。凸緣環5 3具有密封殻2上部插入的筒狀部，組裝成 可和密封殼2 —起滑動於掃瞄軸7。於密封殼2的外壁和 凸緣環53的筒狀部內壁之間設有密封環25。 於此，參照第3圖，針對密封環的一例爲密封環23-1時的狀況進行說明。密封環2 3 -1，是由：具剖面大致U 字形狀的樹脂製環體23-11;及收容在該環體23-11大致 U字形狀內部的彈簧體23_ 12所構成。彈簧體23-12是以 金屬製材料製作成剖面大致U字形狀並且環狀，朝擴張 -11 - 200811929 (8) 方向彈推著環體23-11的大致U字形狀部。特別是，環體 23-11是於前端的兩外側部份具有唇部23-1 la。密封環 2 3 -1，是將剖面大致U字形狀的開放側朝向大氣側，使兩 側的唇部23-11a的一方（於第3圖爲左側）緊貼著掃瞄 軸7外圍收容在密封殼2的溝槽。針對密封環23-2、23-3 也是形成爲完全和密封環23-1的構成相同。 不過，各密封環會因掃瞄軸7的滑動作用逐漸磨損唇 0 部的部份，但該磨損高度是和面壓及滑動距離成比例。就 3段的密封環23-1、23-2、23-3而言，最接近大氣側的密 封環23-3，因除了彈簧體的反力以外還要承受大氣壓所 以是承受最大的面壓，因此磨損較快。 此外，已確認出真空特性於3段密封環形成的3層密 封和2段密封環形成的2層密封之間並無差別。然而，根 據試驗結果，形成爲3層密封時，可確認有下述狀況。試 驗開始後，在某一定期間的滑動距離，最接近大氣側的第 φ 3段密封環23 -3就會達到磨損極限。然後，才開始成爲 由密封環23-1、23-2構成的2層密封，使指定的真空特 性又可維持至一段期間的滑動距離，能夠確保又一有段的 滑動期間。即’根據3層密封時，能夠以較長期間維持所 期望的相同真空特性。 其次，回到第1A圖、第1B圖、第2圖針對吹掃部4 進行說明。吹掃部4，具有內壁具吹掃空間形成用凹部的 吹掃環41。於此，吹掃空間是形成比第2差動排氣部24-2的排氣空間還大。於吹掃環41的上端，具有外徑較細 -12- 200811929 (9) 的縮口部42，該縮口部42是可進入密封殻2下端（大氣 側端部）內壁的凹部成爲嵌套構造。從吹掃部4的吹掃空 間形成有通往吹掃環41外部的通道41a。於通道41&透 過連接器連接著氣體吹埽用的泵浦。吹掃環41是由螺栓 等固定在密封殻2。特別是，吹掃部4的吹掃空間是透過 掃瞄軸7外圍和吹掃環4 1的縮口部42內壁之間的密封空 間形成爲和第2差動排氣部24-2的排氣空間連通著。 吹掃部4是吹掃氮等乾燥的惰性氣體或乾燥空氣。所 ® 吹掃的氣體一部份是通過掃瞄軸7外圍和縮口部42內壁 之間的密封空間流入第2差動排氣部24-2的排氣空間。 所吹掃的氣體其餘部份是通過掃瞄軸7外圍和吹掃環41 內壁之間的縫隙空間排出大氣側。 即使在大氣側成爲露出狀態有可能附著大氣中水份的 掃瞄軸7上昇進入吹掃部4內，來自於吹掃部4的氣體吹 掃是能夠充分去除附著在掃瞄軸7外圍的水份。 ^ 接著，是連同參照第4圖對具有彈性部份的連接構件 5進行說明。具有彈性部份的連接構件5是形成爲可擺動 ，其包括做爲彈性部份的蛇腹管5 1和凸緣環53及複數（ 於此爲4支）的支承桿55。蛇腹管51，其上端側（真空 處理室側）是固定在真空處理室1牆壁6連絡口 6a外側 開口周緣所固定的凸緣（導出用引導部）52。於牆壁6和 凸緣52之間，裝設有密封環54。另一方面，蛇腹管51 的下端側（大氣側）是固定在被組裝於密封殼2上部的凸 緣環53上端。藉此，使蛇腹管51密閉著開口 6a和凸緣 13-200811929 (1) EMBODIMENT OF THE INVENTION [Technical Field] The present invention relates to a sealing mechanism, and more particularly to a holding portion for holding a member to be processed in a vacuum processing chamber, which is driven to reciprocate by a scanning axis, and to sweep the cat When the shaft passes through the connection port provided in the wall of the vacuum processing chamber to derive the external driving condition of the scanning shaft by the driving mechanism disposed outside the vacuum processing chamber, a vacuum sealing mechanism suitable for the vacuum driving shaft of the vacuum processing chamber. [Prior Art] Such a vacuum sealing mechanism is, for example, a strip beam type doping device for use in the manufacture of an FPD (Flat Panel Display), which will be briefly described with reference to FIG. In Fig. 7, in the doping apparatus, in order to dope the entire area of the large rectangular glass substrate 100 in the vacuum processing chamber 1 , it is necessary to scan the entire length of the glass substrate 110 in a strip shape. In the bundle 120. In the doping operation, the glass substrate 1 1 保持 is held in the vacuum processing chamber 1 by the substrate holder 130, and is scanned in both directions indicated by arrow symbol 200 in Fig. 7. The driving for the scanning operation is performed by the direct-acting vacuum driving shaft, that is, the scanning axis 140, on the atmospheric side, that is, the vacuum processing chamber. The scanning axis 140 is formed to be reciprocable (up and down) through the wall 101 penetrating the vacuum processing chamber. A package type vacuum sealing mechanism 150 that separates the vacuum side from the atmosphere side is provided around the scanning axis 140 outside the vacuum processing chamber 100. The atmospheric side end portion ' of the scanning axis 140 is a moving portion 162 that is fixed to the ball screw mechanism 160 that uses the scanning motor 1 6 1 -5 to 200811929 (2) as a driving source. The substrate holder 130 is a horizontally movable and tilting operation by a drive mechanism constituted by a drive motor disposed in the motor casing 170. The motor case 170 is guided to be reciprocable (up and down) by a linear bearing 171 added to the wall 1〇1 of the vacuum processing chamber 1 . The scanning shaft 140 is hollow, and the end of the vacuum side is connected to the motor casing 170 through the cable casing 180. In the scanning axis 140, it is necessary to accommodate a power cable or a vacuum exhaust route connecting the motor in the motor casing 170, and the inner diameter of the motor must be formed to be large. Further, when the object to be processed is a very large-sized glass substrate, the scan length exceeds 1 000 mm, so that the surface area of the scanning axis 140 reciprocating on the vacuum side and the atmosphere side becomes large. As a result, when exposed to the atmosphere during scanning, moisture adhering to the surface of the scanning axis 140 may be freed in the vacuum processing chamber 1 to cause a deterioration in the degree of vacuum, particularly resulting in a failure to obtain a scanning speed. Reproducibility of low dose doping. On the other hand, the means for improving the deterioration of the degree of vacuum in the vacuum processing chamber caused by the moisture adhering to the surface of the scanning axis is to provide a system having a gas replacement mechanism. The system is provided with a bearing device that surrounds the scanning axis and has one or more exhaust chambers. Next, the bearing device is provided with a gas replacement mechanism at least in the vicinity of the inlet between the end portion on the opposite side of the vacuum processing chamber and the scanning axis passing through the end portion on the atmospheric side. The gas replacement mechanism ' is a dry gas that supplies at least a lower humidity than the ambient air and a positive pressure from the outside of the bearing mechanism, and replaces the ambient gas in the vicinity of the inlet portion with the dry gas (refer to Patent Document i: Japanese Patent No. 3077605) No. 200811929 (3) The gas replacement mechanism can prevent the atmosphere from flowing into the initial stage exhaust chamber of the bearing device, and can prevent the moisture in the atmosphere from flowing into the bearing device. However, the system disclosed in Patent Document 1 is processed. The substrate size of the member to be processed is at most 8 inches or 12 inches, and the scanning length is only about 300 mm or 400 mm. It is not suitable for processing large-sized substrates with a length of more than 1 mm. SUMMARY OF THE INVENTION [0005] It is an object of the present invention to provide a vacuum sealing mechanism for a vacuum driven shaft capable of achieving improved vacuum performance in a packaged vacuum sealing mechanism even if the substrate is scanned at a high speed and for a long scan. , which is applicable to a vacuum sealing mechanism of a vacuum drive shaft constructed as follows, that is, a vacuum of the vacuum drive shaft The sealing mechanism is configured to drive the holding portion that holds the member to be processed in the vacuum processing chamber to be reciprocated by the vacuum drive shaft, and the vacuum drive shaft is inserted through the connection port provided in the wall of the vacuum processing chamber to be externally disposed outside the vacuum processing chamber. The drive mechanism drives the guide portion for guiding the vacuum drive shaft at a portion extending from the connection port to the outside of the vacuum processing chamber, and a seal case is provided around the atmosphere side of the vacuum drive shaft. In the vacuum sealing mechanism of the present invention, the sealed casing is formed by a plurality of differential exhausting portions and a plurality of sealing members, and the guiding guide for guiding is connected to the vacuum drive shaft through a connecting member having an elastic portion and being swingable. And the above-mentioned sealing case. 200811929 (4) In the vacuum sealing mechanism of the present invention, the connecting member having the elastic portion is preferably an intermediate connecting member which is swingably supported by the sealing case. The vacuum sealing of the present invention. In the mechanism, the plurality of sealing members are preferably arranged from the side of the vacuum processing chamber The first, second, and third sealing members disposed on the gas side are formed, and the differential exhausting portion is preferably provided between the first sealing member and the second sealing member. a differential exhaust portion; and a second differential exhaust portion provided between the second sealing member and the third sealing member in the sealing case. Preferably, in the vacuum sealing mechanism of the present invention The volume of the exhaust portion of the second differential exhaust portion is larger than the exhaust space of the first differential exhaust portion. The vacuum sealing mechanism of the present invention is preferably the above A differential vacuum pump is connected to the differential evacuation unit, and a rough vacuum pump is connected to the second differential exhaust unit. In the vacuum sealing mechanism of the present invention, the sealing member preferably has a U-shaped cross section. a ring-shaped spring body that is housed in a substantially U-shape of the ring body and that pushes the substantially U-shape in a direction of expansion, and the substantially U-shaped side is preferably in close contact with the vacuum drive shaft It is housed in the above sealed case. In the vacuum sealing mechanism of the present invention, it is preferable that the sealing case is provided in the vicinity of the atmosphere side of the sealing member closest to the atmospheric side in the axial direction of the plurality of sealing members, and the dry inert gas or the dry air is sprayed in the above A purge section around the drive shaft. -8 - 200811929 (5) In the vacuum sealing mechanism of the present invention, the cleaning portion preferably includes a purge ring that can be fitted in the nested structure to the atmospheric side end portion of the seal case, and the purge ring is blown. Preferably, the sweeping space is communicated with the exhaust space of each of the differential exhaust portions through the sealed space. In the vacuum sealing mechanism of the present invention, the connecting member having the elastic portion preferably includes: the intermediate connecting member assembled at an end portion of the vacuum chamber of the sealing case; and the guiding guide portion of the vacuum driving shaft And a bellows tube which is formed to seal the space around the vacuum drive shaft; and is disposed between the vacuum processing chamber and the intermediate connecting member, and is cooperative with the intermediate connecting member to allow the above A plurality of support rods that limit the movement and rotation of the axial direction while the seal shell is oscillating. In the vacuum sealing mechanism of the present invention, the plurality of support rods are preferably located outside the bellows tube, and one end side thereof is fixed to the vacuum processing chamber side, and the other end side is fixed to the intermediate connection. The intermediate member and the seal case are joined to each other through a bearing of a spherical surface or a ball joint at least at a portion of the two support rods corresponding to the other end side. In the vacuum sealing mechanism of the present invention, preferably, the first sealing member and the first differential exhausting portion are disposed at a position close to the vacuum processing chamber, and the second sealing member is related to the first sealing member. The position of the bearing is set at a position slightly shifted to the vicinity of the atmosphere side. The position of the second differential exhaust portion and the third sealing member with respect to the bearing is provided on the side close to the atmosphere. -9 - 200811929 (6) According to the present invention, it is possible to provide a vacuum processing chamber or a vacuum processing apparatus including the vacuum sealing mechanism of the vacuum drive shaft of any of the above configurations. According to the present invention, it is of course possible to prevent the atmosphere from entering the vacuum processing chamber, and it is also possible to prevent the moisture in the atmosphere from flowing into the vacuum processing chamber, and it is possible to prevent the degree of vacuum in the vacuum processing chamber from deteriorating with the passage of time. [Embodiment] BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, the present invention is applied to a vacuum processing chamber of a dose doping apparatus for FPD manufacturing as a vacuum processing apparatus, with reference to FIG. 1A, FIG. 1B and FIG. The vacuum mechanism embodiment will be described. The part other than the vacuum processing mechanism may be the same as that shown in Fig. 7. Fig. 1A is a view showing a state in which the vacuum sealing mechanism of the present invention is provided in the same position as in the vacuum processing chamber described in Fig. 7, and Fig. 1B is a view showing the vacuum sealing mechanism shown in Fig. 1 from below. Bottom view. Figure 2 is a longitudinal sectional view of the vacuum sealing mechanism of Figure 1A. The vacuum sealing mechanism of the present embodiment is roughly divided into a sealing case 2, a purging portion 4, and a connecting member 5 having an elastic portion. The scanning axis 7 for the vacuum drive shaft penetrates the respective portions and the communication port 6a provided in the wall 6 of the vacuum processing chamber 1 in a state in which it can be reciprocated (up and down). The seal case 2 has an annular shape or a cylindrical shape, and a flange ring (intermediate connection member) 53 that can support the seal case 2 so as to be swingable is assembled on the upper end side thereof. The seal case 2 has annular grooves on the inner walls at three intervals spaced apart in the axial direction, and -10- 200811929 (7) accommodates the seal rings 23-1, 23-2, and 23-3 on the inner walls. The seal rings 23-1, 2 3 - 2, and 2 3 - 3 are sequentially referred to as first, second, and third seal rings in order from the vacuum processing chamber 1 side. The inner wall of the sealing case 2 has a ring between the first sealing ring 23-1 and the second sealing ring 23-2, and between the second sealing ring 23-2 and the third sealing ring 23-3, respectively. The recessed portions are used as the first and second differential exhaust portions 24-1 and 24-2 in this order from the vacuum processing chamber 1 side. That is, the passage 24_ 1 a leading to the outside of the sealed casing 2 is formed from the exhaust space of the first differential exhaust portion 24-1, and the precision vacuum pump is connected to the through passage 24-la through the connector. Thereby, the first differential exhaust unit 24-1 is vacuum-extracted by a high degree of vacuum. On the other hand, the exhaust space of the second differential exhaust unit 24-2 forms a larger exhaust gas volume than the first differential exhaust unit 24-1. The space is still big. A passage 24-2a leading to the outside of the sealed casing 2 is formed from the exhaust space of the second differential exhaust portion 24-2, and the passage 24-2a is connected to the rough vacuum pump through the connector. In other words, the second differential exhaust unit 24-2 is φ with a lower vacuum than the first differential exhaust unit 24-1 or a short time. The flange ring 53 has a cylindrical portion into which the upper portion of the sealed casing 2 is inserted, and is assembled to slide with the sealing casing 2 to the scanning shaft 7. A seal ring 25 is provided between the outer wall of the seal case 2 and the inner wall of the cylindrical portion of the flange ring 53. Here, referring to Fig. 3, a case where an example of the seal ring is the seal ring 23-1 will be described. The seal ring 2 3 -1 is composed of a resin ring body 23-11 having a substantially U-shaped cross section, and a spring body 23_12 housed inside the ring body 23-11 in a substantially U shape. The spring body 23-12 is a substantially U-shaped portion which is formed of a metal material and has a substantially U-shaped cross section and is annular, and which pushes the ring body 23-11 toward the direction of the expansion -11 - 200811929 (8). In particular, the ring body 23-11 has a lip portion 23-1 la at both outer portions of the front end. The seal ring 2 3 -1 is such that the open side having a substantially U-shaped cross section faces the atmosphere side, and one of the lip portions 23 - 11 a on both sides (left side in FIG. 3 ) is closely attached to the periphery of the scan axis 7 . The groove of the sealing case 2. The seal rings 23-2, 23-3 are also formed to be identical in configuration to the seal ring 23-1. However, each of the seal rings gradually wears the portion of the lip portion due to the sliding action of the scanning shaft 7, but the wear height is proportional to the surface pressure and the sliding distance. For the three-stage seal rings 23-1, 23-2, and 23-3, the seal ring 23-3 closest to the atmosphere side is subjected to the maximum surface pressure because it is subjected to atmospheric pressure in addition to the reaction force of the spring body. Therefore, it wears faster. Further, it has been confirmed that there is no difference in vacuum characteristics between the three-layer seal formed by the three-stage seal ring and the two-layer seal formed by the two-stage seal ring. However, according to the test results, when the three-layer seal was formed, the following conditions were confirmed. After the start of the test, the sliding distance of a certain period of time, the third φ 3 stage seal ring 23 -3 closest to the atmosphere side will reach the wear limit. Then, the two-layer seal composed of the seal rings 23-1 and 23-2 is started, so that the specified vacuum characteristics can be maintained for a certain period of sliding distance, and another period of sliding can be ensured. That is, when the three-layer sealing is performed, the desired same vacuum characteristics can be maintained for a long period of time. Next, returning to FIG. 1A, FIG. 1B, and FIG. 2, the purge unit 4 will be described. The purge unit 4 has a purge ring 41 having an inner wall having a purge space forming recess. Here, the purge space is formed larger than the exhaust space of the second differential exhaust unit 24-2. At the upper end of the purge ring 41, there is a constricted portion 42 having a relatively small outer diameter -12-200811929 (9), and the constricted portion 42 is a recess into which the inner wall of the lower end (atmospheric side end) of the sealed casing 2 can be inserted. Set of construction. A passage 41a leading to the outside of the purge ring 41 is formed from the purge space of the purge portion 4. The pump for gas blowing is connected to the passage 41& through the connector. The purge ring 41 is fixed to the seal case 2 by bolts or the like. In particular, the purge space of the purge portion 4 is formed by the seal space between the periphery of the scan shaft 7 and the inner wall of the neck portion 42 of the purge ring 41, and the row of the second differential exhaust portion 24-2. The gas space is connected. The purge unit 4 is a dry inert gas or dry air that is purged with nitrogen or the like. Part of the purged gas flows into the exhaust space of the second differential exhaust portion 24-2 through the sealed space between the periphery of the scanning shaft 7 and the inner wall of the constricted portion 42. The remaining portion of the purged gas is discharged to the atmosphere side through a gap space between the periphery of the scanning shaft 7 and the inner wall of the purge ring 41. Even when the atmospheric side is exposed, the scanning axis 7 that adheres to the moisture in the atmosphere rises into the purge unit 4, and the gas purge from the purge unit 4 can sufficiently remove the moisture adhering to the periphery of the scanning axis 7. Next, the connecting member 5 having the elastic portion will be described with reference to Fig. 4. The connecting member 5 having an elastic portion is formed to be swingable, and includes a bellows tube 51 and a flange ring 53 as a resilient portion, and a plurality of (here, four) support rods 55. The upper end side (the vacuum processing chamber side) of the bellows tube 51 is a flange (a guide portion for guiding) 52 fixed to the outer peripheral edge of the opening 6a of the wall 6 of the vacuum processing chamber 1. A seal ring 54 is provided between the wall 6 and the flange 52. On the other hand, the lower end side (atmosphere side) of the bellows tube 51 is fixed to the upper end of the flange ring 53 which is assembled to the upper portion of the seal case 2. Thereby, the bellows tube 51 is sealed with the opening 6a and the flange 13-
200811929 (10) 環5 3之間的掃瞄軸7周圍。 支承桿55，即使是在掃瞄軸7傾動時還是 密封殼2及蛇腹管51的擺動，另一方面是可陡 2的軸方向活動和旋轉。因此，支承桿5 5，上頭 在凸緣52，下端側是固定在凸緣環53。另一文 施例中，密封殼2是透過被安裝在凸緣環53聲 關節形成的軸承結合於凸緣環53。凸緣環53, 有圓筒空間’但外側爲了形成爲4支支承桿55 而形成平面形狀大致四角形。於本實施例，爲了 殻2的擺動自如構造是採用球面軸承。因此，於 桿55的下端部，設有螺紋軸55-1可兼爲該2 5 5和凸緣環5 3固定用的螺絲，於螺紋軸5 5 -1 設有緊固球（球狀體）55-2。 如第1B圖所示，所謂4支支承桿當中的2 位於四角形對角線上的2支。其餘的2支支承_ 絲5 5 -3固定在凸緣環5 3。形成爲僅2處由球面 的理由是需視軸承支撐構造其設置空間上的問題 能確保有3支份量以上的設置空間時，也可採3 軸承支撐著。此外，支承桿其本身形成爲5支以 第4圖是表示密封殼2的緊固球55-2的朝 周邊的剖面構造。密封殻2雖是形成爲圓筒狀， 球55-2的軸承支撐部周邊爲確保有該軸承支撐 其平面形狀是具有大致四角形的部份。在該四角 中位於對角線上的2個角部，是形成有緊固球 :能夠容許 :制密封殼 ί側是固定 面，本實 f球面或球 其內側具 的固定部 實現密封 2支支承 支支承桿 的下端部 支，是指 ，是由螺 軸承支撐 :而定。若 支以上由 上。 丨承支撐部 但在緊固 部的空間 形的角部 55-2承接 -14 - 200811929 (11) 用的具有球面2 1 a的底座。如此一來，例如當掃瞄軸7稍 微有些傾斜時，藉由球面軸承的作用可使密封殼2無損密 封功能地也隨著稍微傾斜。於該狀況時’蛇腹管51也會 和密封殼2 —起形成稍微傾斜。 另，具有球面21a的底座，爲要讓緊固球55-2能裝 脫，如第1B圖所示，將緊固部28透過鉸鍊等（未圖示） 形成可從密封殼2分離。緊固部28大約具有1 /2部份的 球面21a。如此一來，將緊固球55-2收容在球面21a時， 就能夠將緊固部28從密封殼2分離。接著，當緊固球 5 5 _2配設在密封殻2側的指定位置上後就將緊固部28放 回原位，用固定鐵件（未圖示）將緊固部28固定在密封 殻2。於球關節軸承的狀況時，在密封殻2側的底座設置 半球形的突部，於緊固球55-2側設有承部，該承部具有 可對該突部加以承接的球面。 密封殻2的中間密封位置，即，第2密封環23-2的 配置位置是比球面軸承的擺動中心位置還稍微靠近大氣側 ，藉此使中間密封位置的擺動盡量成爲較小。如此一來， 第1差動排氣部24-1及第1密封環23-1的配置處就會成 爲比球面軸承的擺動中心位置還稍微靠近真空處理室側， 第2差動排氣部24-2及第3密封環23-3的配置處就會成 爲比球面軸承的擺動中心位置還稍微靠近大氣側。 爲FPD製造用摻雜裝置的真空處理室時，如第7圖 所說明，是利用直動驅動機構使玻璃基板通過射束照射區 加以掃瞄。隨著該掃瞄，掃瞄軸7會上下活動在密封殻2 -15- 200811929 (12) 及蛇腹管5內。在密封殻2內是以3處緊貼著密封環23-1〜2 3 - 3於掃瞄軸7周圍。另一方面，於第1差動排氣部 24-1是以精密真空泵浦的高真空度執行真空抽引，於第2 差動排氣部24-2是以粗真空泵浦執行粗真空抽引。再加 上，密封殼2和真空處理室i的牆壁6之間的掃瞄軸7周 圍是以蛇腹管5密封著。又加上，在密封殼2的附近是於 吹掃部4吹出乾燥氣體對附著在掃瞄軸7周圍的水份加以 去除。 如以上所述’根據本實施例的真空密封機構時，當然 是能夠防止大氣侵入真空處理室內，此外還能夠防止大氣 中的水份流入真空處理室內，能夠防止真空處理室內的真 空度隨著時間經過而惡化。 第5圖，是表示未進行如本實施例的乾燥氣體吹掃就 驅動掃瞄軸時其真空處理室的真空度隨時間經過產生變化 的測定結果圖。從第5圖得知，真空處理室的真空度是有 隨時間經過形成惡化的傾向。 另一方面，第6圖，是表示未導入乾燥氣體的狀況（ 黑色四角），及，以N2爲乾燥氣體從吹掃部4導入的狀 況（白色三角），掃瞄中的真空處理室真空度變化的測定 結果以掃瞄速度爲橫軸所示的測定結果圖。導入有N2氣 體時，掃瞄速度快則愈具有能減少真空度降低的效果，和 未導入乾燥氣體的狀況相比真空處理室的真空度降低是可 抑制成60%程度。 根據以上的構成，特別是可確實保有掃瞄速度快，低 •16- 200811929 (13) 劑量投入的再現性。 以上是針對本發明的最佳實施例進行了說明，但本發 明並不限定於上述實施例。以下，列舉本發明變更例。 I差動排氣部 1-1·桌2差動排氣部24-2是設置在比球面軸承的擺 動中心位置還靠近真空處理室側。 1- 2·於第1差動排氣部24-1設有中間室或排氣璋。 2 ·第1、第2差動排氣部及吹掃部4的關係 2- 1 ·第1差動排氣部和第2差動排氣部的排氣空間 是形成爲相同大小。 2-2·第1差動排氣部的排氣空間是形成比第2差動 排氣部的排氣空間還大。 2-3 ·吹掃部的吹掃空間是形成和第2差動排氣部的 排氣空間相同大小。 2-4·吹掃部的吹掃空間是形成比第2差動排氣部的 排氣空間還小。 2-5·吹掃部的吹掃空間是形成比第1差動排氣部的 排氣空間還大。 2-6·吹掃部的吹掃空間和第1差動排氣部的排氣空 間是形成爲相同大小。 2-7·吹掃部的吹掃空間是形成比第丨差動排氣部的 排氣空間還小。 -17 - 200811929 (14) 3 .第1、第2差動排氣部及吹掃部和排氣路線的關係 3 -1 ·第1、第2差動排氣部的排氣路線是對掃瞄軸連 接成大致垂直。 3-2·第1、第2差動排氣部的排氣路線一方，是對掃 瞄軸連接成大致垂直，另一方，是對掃瞄軸連接成傾斜。 3-3.吹掃部的給氣路線是對掃瞄軸連接成傾斜。 3- 4.吹掃部的給氣路線是對掃瞄軸連接成垂直。 4.真空密封機構的構成 4- 1 .掃瞄軸的真空密封機構，是以密封殼、吹掃部 構成。 4-2.從真空處理室側往大氣側依順序連接著具有彈 性部份的連接構件、密封殼，吹掃部是分離配置成不連接 於密封殼。 $ 本發明的真空密封機構，並不限於FPD製造用摻雜 裝置的真空處理室或真空處理裝置，也可應用在具備有真 空驅動軸的直動機構，以減壓狀態執行任何處理所需的減 壓處理室或減壓處理裝置。 【圖式簡單說明】 第1A圖爲本發明的真空密封機構側面圖，第1 B圖 爲第1A圖所示真空密封機構從下方看時的底視圖。 第2圖爲第1A圖、第1B圖所示真空密封機構的縱 -18 _ 200811929 (15) 剖面圖。 第3圖爲本發明中所使用的密封環一例說明用剖面圖 〇 第4圖爲應用在本發明中的具有彈性部份的連接構件 之支承桿的支撐構造說明用剖面圖。 第5圖爲表示未進行乾燥氣體吹掃就驅動掃瞄軸時其 真空處理室的真空度隨時間經過產生變化的測定結果圖。 第6圖爲表示以N2爲乾燥氣體從吹掃部導入時掃瞄 # 中的真空處理室其真空度變化的測定結果圖。 第7圖爲表示FPD製造用的帶狀射束型摻雜裝置的 /部份，針對玻璃基板的直動驅動機構說明用的圖。 [主要元件符號說明】 1 :真空處理室 2 :密封殼 2 1 a :球面 # 23-1 :第一密封環 23-1 1 :環體 2 3 -1 1 a :唇部 23-12 :彈簧體 23-2 :第2密封環 23- 3 :第3密封環 24- 1 :第1差動排氣部 2 4 -1 a :通往密封殼2外部的通道 -19- 200811929 (16) 24-2 :第2差動排氣部 24-2a :通往密封殼2外部的通道 25 :密封環 2 8 :緊固部 4 :吹掃部 41 :吹掃環 4 1 a :通往吹掃環4 1外部的通道 42 :縮口部 5 =具有彈性部份的連接構件 5 1 :蛇腹管 52 :凸緣（導出用引導部） 53 :凸緣環（中間連接構件） 54 :密封環 5 5 :支承桿 55-1 :螺紋軸 55-2 :緊固球（球狀體） 5 5 - 3 :螺絲 6 :真空處理室1的牆壁 6 a :連絡口 7 :掃瞄軸 100 :真空處理室 1 〇 1 :真空處理室1 〇 〇的牆壁 1 1 0 :玻璃基板 120 :帶狀波束 -20- 200811929 (17) 130 :基板保持器 140 :掃瞄軸 150 :封裝式真空密封機構 1 6 0 :滾珠螺桿機構 1 6 1 :掃瞄用馬達 162 :移動部 170 :馬達殼 1 7 1 :線性軸承 180 :纜線殼 200 :箭頭符號200811929 (10) Around the scanning axis 7 between the rings 5 3. The support rod 55 is oscillated by the seal case 2 and the bellows tube 51 even when the scan shaft 7 is tilted, and is movable and rotated in the axial direction of the steep 2 on the other hand. Therefore, the support rod 5 5 has the upper end on the flange 52 and the lower end side fixed to the flange ring 53. In another embodiment, the seal case 2 is coupled to the flange ring 53 through a bearing formed by the acoustic joint mounted on the flange ring 53. The flange ring 53 has a cylindrical space 'but the outer side is formed into a substantially square shape in plan view in order to form four support rods 55. In the present embodiment, a spherical bearing is used for the swingable construction of the casing 2. Therefore, at the lower end portion of the rod 55, the screw shaft 55-1 is provided as a screw for fixing the 255 and the flange ring 533, and a fastening ball (spherical body) is provided on the thread shaft 5 5 -1. ) 55-2. As shown in Fig. 1B, 2 of the four support rods are located on two diagonal lines of the quadrangle. The remaining two support _ wires 5 5 -3 are fixed to the flange ring 53. The reason for the formation of only two spherical surfaces is that there is a problem in the installation space of the bearing support structure. When it is ensured that there are three or more installation spaces, it is also possible to support the bearings. Further, the support rod itself is formed in five pieces, and Fig. 4 is a cross-sectional structure showing the vicinity of the fastening ball 55-2 of the seal case 2. The sealing case 2 is formed in a cylindrical shape, and the periphery of the bearing support portion of the ball 55-2 is a portion having a substantially square shape in order to ensure that the bearing is supported in a planar shape. The two corners located on the diagonal of the four corners are formed with a fastening ball: the allowable side of the sealed casing ί is a fixed surface, and the fixed portion of the spherical surface or the inner side of the ball is sealed to support the support. The lower end of the support rod means that it is supported by a screw bearing: If the branch is above. The bearing support portion but the space-shaped corner portion 55-2 at the fastening portion receives a base having a spherical surface 2 1 a for -14 - 200811929 (11). In this way, for example, when the scanning shaft 7 is slightly inclined, the sealing case 2 can be slightly tilted by the action of the spherical bearing. In this case, the serpentine tube 51 is also slightly inclined with the sealing case 2. Further, the base having the spherical surface 21a is such that the fastening ball 55-2 can be detached, and as shown in Fig. 1B, the fastening portion 28 is formed to be detachable from the sealing case 2 by a hinge or the like (not shown). The fastening portion 28 has approximately 1 / 2 partial spherical surface 21a. In this way, when the fastening ball 55-2 is housed in the spherical surface 21a, the fastening portion 28 can be separated from the sealed casing 2. Next, when the fastening ball 5 5 _2 is disposed at a predetermined position on the side of the sealing case 2, the fastening portion 28 is returned to the original position, and the fastening portion 28 is fixed to the sealing case by a fixing iron member (not shown). 2. In the case of the ball joint bearing, a hemispherical projection is provided on the base on the side of the seal case 2, and a bearing portion is provided on the side of the fastening ball 55-2, and the socket has a spherical surface that can receive the projection. The intermediate sealing position of the seal case 2, i.e., the arrangement position of the second seal ring 23-2 is slightly closer to the atmosphere side than the swing center position of the spherical bearing, whereby the swing of the intermediate seal position is made as small as possible. As a result, the arrangement of the first differential exhaust portion 24-1 and the first seal ring 23-1 is slightly closer to the vacuum processing chamber side than the swing center position of the spherical bearing, and the second differential exhaust portion The arrangement of the 24-2 and the third seal ring 23-3 becomes slightly closer to the atmosphere side than the swing center position of the spherical bearing. In the case of a vacuum processing chamber for a doping device for FPD, as described in Fig. 7, the glass substrate is scanned by a beam irradiation region by a linear driving mechanism. With this scan, the scanning axis 7 will move up and down in the sealed casing 2 -15- 200811929 (12) and the bellows 5. In the sealed casing 2, the seal rings 23-1 to 2 3 - 3 are placed in close contact with the scanning shaft 7 at three places. On the other hand, the first differential exhaust unit 24-1 performs vacuum extraction with a high vacuum degree of precision vacuum pumping, and the second differential exhaust unit 24-2 performs rough vacuum pumping with a rough vacuum pump. . Further, the scanning shaft 7 between the sealed casing 2 and the wall 6 of the vacuum processing chamber i is sealed by the bellows 5 . Further, in the vicinity of the sealed casing 2, the drying gas is blown from the purge portion 4 to remove the moisture adhering to the periphery of the scanning shaft 7. As described above, according to the vacuum sealing mechanism of the present embodiment, it is of course possible to prevent the atmosphere from entering the vacuum processing chamber, and also to prevent the moisture in the atmosphere from flowing into the vacuum processing chamber, and to prevent the vacuum in the vacuum processing chamber from being with time. After the deterioration. Fig. 5 is a graph showing the measurement results of the change in the degree of vacuum of the vacuum processing chamber as a function of time when the scanning axis is driven without performing the dry gas purge of the present embodiment. As is apparent from Fig. 5, the degree of vacuum of the vacuum processing chamber tends to deteriorate over time. On the other hand, Fig. 6 shows a state in which the dry gas is not introduced (black squares), and a state in which N2 is introduced from the purge unit 4 as a dry gas (white triangle), and the degree of vacuum in the vacuum processing chamber during scanning is changed. The measurement result is a measurement result chart shown by the scanning speed on the horizontal axis. When the N2 gas is introduced, the scanning speed is faster, and the effect of reducing the degree of vacuum is reduced. Compared with the case where the dry gas is not introduced, the degree of vacuum in the vacuum processing chamber can be suppressed to 60%. According to the above configuration, in particular, the scanning speed can be surely kept fast, and the reproducibility of the dose input is low. The above has been described with respect to the preferred embodiment of the present invention, but the present invention is not limited to the above embodiment. Hereinafter, a modified example of the present invention will be listed. I Differential Exhaust Portion 1-1. Table 2 The differential exhaust portion 24-2 is disposed closer to the vacuum processing chamber than the swing center position of the spherical bearing. 1- 2· The intermediate differential exhaust unit 24-1 is provided with an intermediate chamber or an exhaust port. 2. Relationship between the first and second differential exhaust units and the purge unit 4 2- 1 • The exhaust spaces of the first differential exhaust unit and the second differential exhaust unit are formed to have the same size. 2-2. The exhaust space of the first differential exhaust unit is formed larger than the exhaust space of the second differential exhaust unit. 2-3 - The purge space of the purge portion is formed to have the same size as the exhaust space of the second differential exhaust portion. 2-4. The purge space of the purge portion is formed to be smaller than the exhaust space of the second differential exhaust portion. 2-5. The purge space of the purge unit is formed larger than the exhaust space of the first differential exhaust unit. 2-6. The purge space of the purge portion and the exhaust space of the first differential exhaust portion are formed to have the same size. 2-7. The purge space of the purge portion is formed to be smaller than the exhaust space of the second differential differential exhaust portion. -17 - 200811929 (14) 3. Relationship between the first and second differential exhaust units, the purge unit, and the exhaust route. 3 -1 • The exhaust route of the first and second differential exhaust units is the scan The shafts are connected in a substantially vertical direction. 3-2. One of the exhaust paths of the first and second differential exhaust portions is connected to the scanning axis so as to be substantially vertical, and the other is to be inclined to the scanning axis. 3-3. The air supply route of the purge section is connected to the scan axis to be inclined. 3- 4. The air supply route of the purge section is connected to the scan axis to be vertical. 4. Configuration of vacuum sealing mechanism 4- 1 . The vacuum sealing mechanism of the scanning shaft is composed of a sealed casing and a purging portion. 4-2. The connecting member having the elastic portion and the sealing case are connected in this order from the vacuum processing chamber side to the atmosphere side, and the purging portion is disposed apart from being connected to the sealing case. The vacuum sealing mechanism of the present invention is not limited to the vacuum processing chamber or the vacuum processing device of the doping device for FPD manufacturing, and can also be applied to a linear motion mechanism having a vacuum driving shaft to perform any processing in a reduced pressure state. A reduced pressure treatment chamber or a reduced pressure treatment device. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1A is a side view of the vacuum sealing mechanism of the present invention, and Fig. 1B is a bottom view of the vacuum sealing mechanism shown in Fig. 1A as seen from below. Fig. 2 is a longitudinal sectional view of the vacuum sealing mechanism shown in Figs. 1A and 1B, -18 _ 200811929 (15). Fig. 3 is a cross-sectional view showing an example of a seal ring used in the present invention. Fig. 4 is a cross-sectional view for explaining a support structure of a support rod of a connecting member having an elastic portion applied to the present invention. Fig. 5 is a graph showing the measurement results of the change in the degree of vacuum of the vacuum processing chamber over time when the scanning axis is driven without performing the dry gas purge. Fig. 6 is a graph showing the measurement results of the change in the degree of vacuum of the vacuum processing chamber in the scan # when the N2 is a dry gas introduced from the purge portion. Fig. 7 is a view showing a portion of a strip beam type doping apparatus for manufacturing FPD, and a description of a linear motion driving mechanism for a glass substrate. [Main component symbol description] 1 : Vacuum processing chamber 2 : Sealing case 2 1 a : Spherical surface # 23-1 : First sealing ring 23-1 1 : Ring body 2 3 -1 1 a : Lip 23-12 : Spring Body 23-2: second seal ring 23-3: third seal ring 24-1: first differential exhaust portion 2 4 -1 a : passage to the outside of the sealed casing 2 - 200811929 (16) 24 -2 : 2nd differential exhaust portion 24-2a: passage 25 leading to the outside of the sealed casing 2: Sealing ring 2 8 : fastening portion 4 : Purging portion 41 : Purging ring 4 1 a : leading to the purge ring 4 1 External passage 42 : Shrinking portion 5 = Connecting member having elastic portion 5 1 : Snake tube 52 : Flange (guide for export) 53 : Flange ring (intermediate connecting member) 54 : Sealing ring 5 5 : Support rod 55-1 : Threaded shaft 55-2 : Fastening ball (spherical body) 5 5 - 3 : Screw 6 : Wall of vacuum processing chamber 1 6 a : Connection port 7 : Scanning shaft 100 : Vacuum processing chamber 1 〇1 : Vacuum processing chamber 1 〇〇 Wall 1 1 0 : Glass substrate 120 : Strip beam -20- 200811929 (17) 130 : Substrate holder 140 : Scanning axis 150 : Packaged vacuum sealing mechanism 1 6 0 : Ball screw mechanism 1 6 1 : Scanning motor 162 : Moving part 170 : Motor case 1 7 1 : Linear bearing 180 : Cable housing 200 : Arrow symbol