200809425 九、發明說明 【發明所屬之技術領域】 本發明有關用於定位一安裝在其上面之物件的工 設備，且雖然非專用的，更特別有關可被用作曝光設 光柵工作台之工作台設備。 【先前技術】 工作台設備被用於曝光設備，以定位一基板或一 (在下文中統稱爲基板）。日本專利特許公開申請 2004-07963 9號討論一工作台設備，其利用永久磁鐵 力加速或減速一固持基板之工作台。 曰本專利特許公開申請案第2004-079639號中所 之工作台設備將參考圖12A及12B敘述。一固持基杨 之工作台104係可沿著一導引件102於該Y方向中運 該工作台104具有線性馬達滑動件105，且係於該Y 中藉由該線性馬達滑動件105及線性馬達定子106之 產生的力量所驅動，該線性馬達定子1 06附接至一基 未示出）。 於該工作台104運動之方向中，該工作台104具 對在其前面及後面中之永久磁鐵109。該導引件102 二對藉由一預定距離所分開之上方及下方永久磁鐵] 該等永久磁鐵1 09及1 1 2係在該Z方向中磁化，以致 向表面具有相同之磁極。當該等永久磁鐵109係在該 台104之衝程的任一端部插入該等永久磁鐵112之間 作台 備用 原件 案第 之斥 討論 103 動。 方向 間所 座（ 有一 具有 12 ° 其相 工作 時， -4- 200809425 在其間產生斥力，以加速或減速該工作台1 〇4。當藉著該 等永久磁鐵1 〇 9及1 1 2之斥力所驅動時，該工作台1 〇4造 成一驅動反作用力。該驅動反作用力震動該整個設備。此 震動干擾該工作台1 04之定位控制，如此促成減少之定位 準確性或延長之定位時間。 【發明內容】 本發明係針對一利用永久磁鐵之斥力及具有用於抑制 工作台反作用力之合適機件的工作台設備。 根據本發明之至少一示範具體實施例的工作台設備包 含一工作台，其可於第一方向中運動；一線性馬達，其組 構成在該第一方向中驅動該工作台·，一磁鐵單元，其具有 設置在該工作台上之第一磁鐵及設置在該工作台的一衝程 之兩端的第二磁鐵，使得該第一及第二磁鐵之相同磁極彼 此相面對；及一支撐構件，其支撐該等第二磁鐵。該支撐 構件被可運動地支撐在該第一方向中。 本發明之進一步特色將參考附圖由示範具體實施例之 以下敘述而變得明顯。 【實施方式】 至少一示範具體實施例之以下敘述本質上係僅只說明 用’且絕無意欲限制本發明、其應用、或使用。 如由普通熟諳該有關技藝者所習知的製程、技術、設 備、及材料可能不會詳細地討論，但是意欲爲該使成爲可 -5- 200809425 能之敘述的一適當部份，譬如該等磁鐵之製造及其材料。 在此所說明及討論之所有範例中’任何特定之値應被 解釋爲僅只說明性及非限制性。如此’該等示範具體實施 例之其他範例能具有不同値。 注意於以下圖面中，類似參考數字及字母意指類似項 目，且如此一旦在一圖面中界定一項目，對於以下之圖面 不能討論之。 注意在此當意指校正或一錯誤之校正（例如一定位錯 誤）、或抵消一力量時，錯誤或力量之減少及/或錯誤之 校正或該力量之抵消係所意欲的。 第一示範具體實施例 圖1 A係根據本發明之第一示範具體實施例的工作台 設備之槪要圖。圖1 B係該工作台設備的一側視圖，如於 圖1 A之箭頭IB方向中所視。 該工作台設備包含一工作台4，該工作台在其上面安 裝有一基板3地運動；一基座1，其引導該工作台4，並 在其間設置有軸承1 4 (例如氣體軸承）；一線性馬達，其 於該Y方向中驅動該工作台4 ;及一排斥磁鐵單元，其於 該Y方向中加速或減速該工作台4。下文所使用之“運動 方向”一詞指示該Y方向。該基座1具有一平行於該XY 平面之導引表面。該軸承14能根據該工作台4所需之準 確性以另一型式之軸承替換。該基板3係譬如藉由一固定 至該工作台4之夾頭（未示出）所固持。所使用之夾頭可 -6 - 200809425 爲譬如一夾子、一真空吸入單元、一靜電吸引單元、或任 何其他緊固裝置，如藉由普通熟諳該有關技藝者所習知。 另一選擇係，該基板3能被安裝在一設在該工作台4 上之額外的精密工作台上。該精密工作台可在短衝程中相 對該工作台4被驅動至以增加之精確度定位該基板3。該 精密工作台之驅動方向不限於任何特別之方向；譬如，該 精密工作台可於該X、Y、或Z方向中驅動，或亦可繞著 此等軸心之任一軸旋轉。 該線性馬達包含滑動件5，其具有固定至該工作台4 之兩側面的永久磁鐵；及定子6，其具有配置在該工作台 4的運動方向中之線圈。這些線圈被固定至該基座1，並 以支撐件7設置在其間。該滑動件5之永久磁鐵能相向該 等線圈設置，而不會接觸。可藉由一勞倫茲力在該Υ方向 中驅動該工作台4，而不會接觸，該勞倫茲力係藉由供給 一電流至該等線圈、而使該永久磁鐵之磁通量通過該等線 圈所產生。此一線性馬達結構係討論在日本專利特許公開 申請案第2004-07963 9號中，其內容係據此全部以引用的 方式倂入本文中，且如此將省略其詳細之敘述。該線性馬 達之結構不限於上面之結構，並可使用另一型式之線性馬 達結構。 可使用一雷射干涉儀3 0測量該工作台4之位置。此 干涉儀3 0以由設置在該工作台4之外側的光源所放射之 測量光線照射一設置在該工作台4上之反射鏡27，以根據 反射光及參考光之干涉測量該工作台4之位置。該位置測 200809425 量係不限於該工作台4於該Y方向中之位置。譬如，於一 繞著該X軸或該Ζ軸之旋轉方向中，複數測量軸心能被用 於測量該工作台4之位置。上述線性馬達可該工作台4之 測量位置作控制。用於測量該工作台4之位置的儀器係不 限於一雷射干涉儀，且另一型式之儀器能被使用，如藉由 普通熟諳該有關技藝者所習知。 其次，將參考圖2敘述加速或減速該工作台4的排斥 磁鐵單元。該排斥磁鐵單元包含可運動磁鐵零件28a及 28b及固定式磁鐵零件l〇a及10b。將參考圖2敘述該可 運動磁鐵零件28a及該固定式磁鐵零件l〇a，雖然該可運 動磁鐵零件2 8 b及該固定式磁鐵零件1 〇b能具有相同之結 構。 該可運動磁鐵零件28a包含一永久磁鐵9及一將該永 久磁鐵9支撐在該工作台4上之支撐件8。該永久磁鐵9 係呈板形及直立地磁化。於此示範具體實施例中，該永久 磁鐵9可爲一單極永久磁鐵，並使其北極位在其頂部表面 上，且使其南極位在其底部表面上。 該固定式磁鐵零件l〇a包含一對彼此分開的上方及下 方之永久磁鐵12a及12b，及磁軛11a、lib、及13，用於 循環一由該處所產生之磁通量。該等永久磁鐵12a及12b 被分別固定至該等磁軛11a及lib。該固定式磁鐵零件 l〇a包含該二磁鐵12a及12b當作成對磁鐵，雖然其亦可 包含二或更多對永久磁鐵。該等永久磁鐵12a及12b可爲 板形及直立地磁化。該等永久磁鐵1 2a及1 2b能被磁化， -8- 200809425 以致該永久磁鐵9及該永久磁鐵1 2 a及1 2 b之相同磁極彼 此相面對。亦即，該上永久磁鐵1 2 a可爲一使其北極位在 其底部表面上之單極永久磁鐵，而該下永久磁鐵1 2b係一 使其南極位在其頂部表面上之單極永久磁鐵。 該等永久磁鐵12a及12b間之距離係大於該永久磁鐵 9之厚度。該等永久磁鐵1 2 a及1 2 b的兩側面上之該對磁 軛1 3間之距離可爲大於該永久磁鐵9之寬度。 該等可運動磁鐵零件28a及28b可於其運動方向中被 設置在該工作台4之前面及後面中。該等固定式磁鐵零件 10a及10b能於其運動方向中、亦即在該工作台4之衝程 的個別端部被設置遠離該工作台4。當該工作台4係於該 Y方向中驅動時，該等永久磁鐵9能接近該工作台4之衝 程的個別端部（藉由圖2之虛線所代表）插入，而於該等 對永久磁鐵12a及12b之間不會接觸。 於此結構中，該永久磁鐵9及該等永久磁鐵12a及 1 2 b之間所產生的一磁性斥力能於其運動方向中加速或減 速該工作台4。當該工作台4係於該Y方向中運動時，該 排斥磁鐵單元能維持該斥力達一延長之時期，因爲該加速 或減速方向（圖2之箭頭方向）係垂直於該永久磁鐵9及 該等永久磁鐵12a及12b之磁化方向。此外，該排斥磁鐵 單元能抵消一引導在該Z方向中之斥力，因爲該永久磁鐵 9係插入於該等永久磁鐵12a及12b之間。該排斥磁鐵單 元之上面配置能被用於一包含往復式工作台之工作台設備 -9- 200809425 當該工作台4係藉由該排斥磁鐵單元所驅動時，該等 固定式磁鐵零件l〇a及10b能遭受一驅動反作用力。如果 該驅動反作用力係傳送至該基座1，其能震動該整個設備 。此震動干擾該工作台4之定位控制，如此促成減少之定 位準確性或延長之定位時間。據此，依據此示範具體實施 例之工作台設備具有一反應抵消機件。 將參考圖1A及1B敘述該反應抵消機件。該對固定式 磁鐵零件l〇a及10b係固定至一可運動地支撐在該基座1 上之支撐構件1 9，並使其他軸承14設置在其間。該等軸 承1 4能根據用於該工作台4所需要之準確性以另一型式 之軸承替換。 當該排斥磁鐵單元施加一加速或減速力量至該工作台 4時，該等固定式磁鐵零件l〇a及l〇b遭受一與該力量相 反之反作用力。該等固定式磁鐵零件10a及10b及該支撐 構件19接著係在該反作用力之方向中運動，因爲，如上 面所述，該支撐構件1 9係可運動的，且該等固定式磁鐵 零件10a及10b被固定至其上。該支撐構件19可因此用 作一配衡質量（counter mass)，以抵消該反作用力。該 支撐構件1 9之質量可輕易地增加，以減少該配衡質量移 至抵消該反作用力之距離。這允許用於該設備的印跡中之 減少。 圖3係一側視圖，其說明該工作台4之重心G!、該 支撐構件19與該等固定式磁鐵零件i〇a及i〇b之重心G2 、及藉由該排斥磁鐵單元所產生之力量F的作用線。如果 -10- 200809425 該等重心Gi及G2係定位在不同高度，於驅動期間發生一 旋轉式力量。此一旋轉式力量能震動該工作台設備。如圖 3所示，該工作台4之重心Gi的高度能與該支撐構件1 9 及該等固定式磁鐵零件l〇a及l〇b之重心G2的高度對齊 。特別地是，該等重心G i及G2之高度亦可與藉由該排斥 磁鐵單元所產生之力量F的作用線對齊。 該反應抵消機件另包含一驅動單元1 5，其組構成驅動 該支撐構件1 9 ; 一耦接構件1 6，其組構成耦接該驅動單 元1 5及該支撐構件1 9 ;及一固持單元1 7，其組構成相對 該基座1固持該支撐構件1 9，並將其保持在適當位置。 圖4 A及4 B係該驅動單兀1 5之詳細圖。該驅動單元 1 5包含固定至於該耦接構件1 6之永久磁鐵2 3及固定至該 基座1之線圈22，該耦接構件耦接至該支撐構件1 9。設 置相向於該等線圈22之永久磁鐵23係於該Y方向中藉由 通電該等線圈22所驅動，且據此耦接至該永久磁鐵23之 支撐構件1 9係於該Y方向中驅動。所使用之驅動單元1 5 係不限於上面之單元，且能使用可驅動該支撐構件1 9之 任何單元。 能使用另一雷射干涉儀3 2測量該支撐構件1 9之位置 。此干涉儀3 2以測量光照射一固定至該支撐構件1 9之反 射鏡3 1，以根據反射光及參考光之干涉測量該支撐構件 1 9之位置。該位置測量不限於該支撐構件1 9於該Y方向 中之位置。譬如，複數測量光束能於一繞著該X軸或該Z 軸之旋轉方向中被用於測量該支撐構件1 9之位置。用於 -11 - 200809425 測量該支撐構件1 9之位置的儀器係不限於一雷射干涉儀 ，且另一型式之儀器能被使用。如此，該驅動單元1 5能 夠與該雷射干涉儀31結合使用，以利於該支撐構件1 9之 定位。 該固持單元1 7包含一接觸部份2 1及一用於作動該接 觸部份2 1之致動器（未示出）。所使用之致動器可爲譬 如一能夠快速反應之單元，諸如氣缸或電磁螺線管或任何 其他型式之致動器，如藉由普通熟諳該有關技藝者所習知 。該固持單元17係固定至該基座1。該致動器運動該接觸 部份21進入與該耦接構件1 6接觸，以致該耦接構件1 6 能相對該基座1藉由摩擦力所固持。亦即，該接觸部份2 1 能相對該基座1固持該支撐構件1 9。所使用之固持單元 1 7係不限於上面之結構，並可使用任何能夠相對該基座1 固持該支撐構件1 9之單元。 圖5 A至5 I係該工作台設備之側視圖，如於該X方向 中所視，在此其結構被局部地省略。將參考圖5 A至5 I敘 述該工作台4之操作，其係依時間順序配置。於依據此示 範具體實施例使用該工作台設備的掃描中，該工作台4係 在定速反覆地移位達一預定距離。該工作台設備之應用的 一範例爲一用於曝光設備之光柵工作台，如將稍後敘述者 〇200809425 IX. Description of the Invention [Technical Field] The present invention relates to a work apparatus for positioning an object mounted thereon, and although not exclusively, more particularly relates to a workbench that can be used as an exposure grating workbench device. [Prior Art] A table device is used for an exposure device to position a substrate or a (hereinafter collectively referred to as a substrate). Japanese Patent Laid-Open Application No. 2004-07963 No. 9 discusses a workbench apparatus which uses a permanent magnet force to accelerate or decelerate a table for holding a substrate. The workbench apparatus of the present patent application No. 2004-079639 will be described with reference to Figs. 12A and 12B. A stationary base station 104 can be transported in the Y direction along a guide member 102. The table 104 has a linear motor slider 105 and is attached to the Y by the linear motor slider 105 and linear. Driven by the force generated by the motor stator 106, the linear motor stator 106 is attached to a base not shown). In the direction in which the table 104 is moved, the table 104 has permanent magnets 109 in its front and rear faces. The guide member 102 has two pairs of upper and lower permanent magnets separated by a predetermined distance. The permanent magnets 109 and 112 are magnetized in the Z direction so that the surface has the same magnetic pole. When the permanent magnets 109 are inserted at either end of the stroke of the stage 104, the permanent magnets 112 are interposed. Position between the directions (when there is a phase with 12 °, -4- 200809425 generates a repulsive force between them to accelerate or decelerate the table 1 〇 4. When using the permanent magnets 1 〇 9 and 1 1 2 repulsive force When driven, the table 1 造成 4 causes a driving reaction force that vibrates the entire device. This vibration interferes with the positioning control of the table 104, thus contributing to reduced positioning accuracy or extended positioning time. SUMMARY OF THE INVENTION The present invention is directed to a table apparatus utilizing a repulsive force of a permanent magnet and having a suitable mechanism for suppressing a table reaction force. The table apparatus according to at least one exemplary embodiment of the present invention includes a table Moving in a first direction; a linear motor, the group of which is configured to drive the table in the first direction, a magnet unit having a first magnet disposed on the table and disposed in the work a second magnet at one end of one stroke of the stage such that the same magnetic poles of the first and second magnets face each other; and a support member supporting the second magnetic The support member is movably supported in the first direction. Further features of the present invention will become apparent from the following description of exemplary embodiments with reference to the accompanying drawings. The description is merely illustrative of the invention, and is not intended to limit the invention, its application, or use. The processes, techniques, equipment, and materials as are known to those skilled in the art may not be discussed in detail, but It is intended to be an appropriate part of the description of the invention, such as the manufacture of such magnets and their materials. In any of the examples described and discussed herein, 'any particulars' should be construed as merely illustrative. And the other examples of the exemplary embodiments can be different. Note that in the following figures, like reference numerals and letters mean similar items, and thus once a item is defined in a drawing For the following drawings, it cannot be discussed. Note that here is meant correction or correction of an error (such as a positioning error), or offsetting one. In the case of a quantity, a reduction in error or power and/or a correction of the error or a cancellation of the force is intended. First Exemplary Embodiment FIG. 1A is a top view of a workbench apparatus according to a first exemplary embodiment of the present invention. Figure 1B is a side view of the table apparatus as viewed in the direction of arrow IB of Figure 1 A. The table apparatus includes a table 4 on which a substrate 3 is mounted Movement; a base 1 guiding the table 4 with a bearing 14 (such as a gas bearing) disposed therebetween; a linear motor driving the table 4 in the Y direction; and a repelling magnet unit, It accelerates or decelerates the table 4 in the Y direction. The term "motion direction" as used hereinafter indicates the Y direction. The susceptor 1 has a guiding surface parallel to the XY plane. The bearing 14 can be replaced with another type of bearing depending on the accuracy required for the table 4. The substrate 3 is held, for example, by a chuck (not shown) fixed to the table 4. The collet used can be -6 - 200809425 as a clip, a vacuum suction unit, an electrostatic attraction unit, or any other fastening means, as is known to those skilled in the art. Alternatively, the substrate 3 can be mounted on an additional precision stage provided on the table 4. The precision table can be driven relative to the table 4 in a short stroke to position the substrate 3 with increased precision. The driving direction of the precision table is not limited to any particular direction; for example, the precision table can be driven in the X, Y, or Z direction, or can be rotated about any of the axes. The linear motor includes a slider 5 having permanent magnets fixed to both sides of the table 4, and a stator 6 having a coil disposed in a moving direction of the table 4. These coils are fixed to the base 1 and are disposed with the support member 7 therebetween. The permanent magnets of the slider 5 can be disposed opposite to the coils without contact. The table 4 can be driven in the Υ direction by a Lorentz force without contact, and the Lorentz force passes the magnetic flux of the permanent magnet through the supply of a current to the coils. The coil is produced. This linear motor structure is discussed in Japanese Patent Application Laid-Open No. 2004-07963, the entire disclosure of which is hereby incorporated by reference in its entirety herein in its entirety herein. The structure of the linear motor is not limited to the above structure, and another type of linear motor structure can be used. The position of the table 4 can be measured using a laser interferometer 30. The interferometer 30 illuminates a mirror 27 disposed on the table 4 with the measurement light emitted by the light source disposed on the outer side of the table 4 to measure the table 4 according to the interference of the reflected light and the reference light. The location. The position measurement 200809425 is not limited to the position of the table 4 in the Y direction. For example, in a direction of rotation about the X-axis or the y-axis, a plurality of measurement axes can be used to measure the position of the table 4. The above linear motor can be controlled by the measurement position of the table 4. The apparatus for measuring the position of the table 4 is not limited to a laser interferometer, and another type of apparatus can be used, as is known to those skilled in the art. Next, the repelling magnet unit for accelerating or decelerating the table 4 will be described with reference to Fig. 2 . The repelling magnet unit includes movable magnet parts 28a and 28b and fixed magnet parts 10a and 10b. The movable magnet part 28a and the fixed magnet part 10a will be described with reference to Fig. 2, although the movable magnet part 28b and the fixed magnet part 1b can have the same structure. The movable magnet member 28a includes a permanent magnet 9 and a support member 8 for supporting the permanent magnet 9 on the table 4. The permanent magnet 9 is magnetized in a plate shape and upright. In this exemplary embodiment, the permanent magnet 9 can be a single pole permanent magnet with its north pole position on its top surface and its south pole on its bottom surface. The fixed magnet component 10a includes a pair of upper and lower permanent magnets 12a and 12b separated from each other, and yokes 11a, lib, and 13 for circulating a magnetic flux generated therefrom. The permanent magnets 12a and 12b are fixed to the yokes 11a and lib, respectively. The stationary magnet component 10a includes the two magnets 12a and 12b as a pair of magnets, although it may also comprise two or more pairs of permanent magnets. The permanent magnets 12a and 12b may be plate-shaped and magnetized upright. The permanent magnets 1 2a and 1 2b can be magnetized, -8-200809425, so that the permanent magnets 9 and the same magnetic poles of the permanent magnets 1 2 a and 1 2 b face each other. That is, the upper permanent magnet 12 a may be a unipolar permanent magnet having its north pole position on its bottom surface, and the lower permanent magnet 12 b is a unipolar permanent such that its south pole is located on the top surface thereof. magnet. The distance between the permanent magnets 12a and 12b is greater than the thickness of the permanent magnet 9. The distance between the pair of yokes 13 on both sides of the permanent magnets 1 2 a and 1 2 b may be greater than the width of the permanent magnet 9. The movable magnet parts 28a and 28b can be disposed in front of and behind the table 4 in the direction of movement thereof. The stationary magnet parts 10a and 10b can be disposed away from the table 4 in their moving direction, i.e., at the individual ends of the stroke of the table 4. When the table 4 is driven in the Y direction, the permanent magnets 9 can be inserted close to the individual end portions of the stroke of the table 4 (represented by the broken line in FIG. 2), and the pair of permanent magnets There will be no contact between 12a and 12b. In this configuration, a magnetic repulsive force generated between the permanent magnet 9 and the permanent magnets 12a and 1 2 b accelerates or decelerates the table 4 in the direction of movement thereof. When the table 4 is moved in the Y direction, the repelling magnet unit can maintain the repulsive force for an extended period because the acceleration or deceleration direction (the direction of the arrow in FIG. 2) is perpendicular to the permanent magnet 9 and the The magnetization directions of the permanent magnets 12a and 12b. Further, the repelling magnet unit can cancel a repulsive force guided in the Z direction because the permanent magnet 9 is inserted between the permanent magnets 12a and 12b. The top surface of the repelling magnet unit can be used for a table device comprising a reciprocating table-9-200809425. When the table 4 is driven by the repelling magnet unit, the stationary magnet parts l〇a And 10b can suffer a driving reaction. If the driving reaction force is transmitted to the base 1, it can vibrate the entire device. This vibration interferes with the positioning control of the table 4, thus contributing to reduced positioning accuracy or extended positioning time. Accordingly, the workbench apparatus according to this exemplary embodiment has a reaction cancellation mechanism. The reaction counteracting mechanism will be described with reference to Figs. 1A and 1B. The pair of fixed magnet parts 10a and 10b are fixed to a support member 179 movably supported on the base 1, and the other bearings 14 are disposed therebetween. The bearings 14 can be replaced with another type of bearing depending on the accuracy required for the table 4. When the repulsive magnet unit applies an acceleration or deceleration force to the table 4, the stationary magnet parts 10a and 10b are subjected to a reaction force with the force. The fixed magnet parts 10a and 10b and the support member 19 are then moved in the direction of the reaction force because, as described above, the support member 19 is movable, and the fixed magnet parts 10a And 10b is fixed to it. The support member 19 can thus be used as a counter mass to counteract the reaction force. The mass of the support member 190 can be easily increased to reduce the weight of the balance to shift to offset the reaction. This allows for a reduction in the footprint for the device. Figure 3 is a side view showing the center of gravity G! of the table 4, the center of gravity G2 of the support member 19 and the fixed magnet parts i〇a and i〇b, and the repulsive magnet unit The line of action of force F. If -10- 200809425, the center of gravity Gi and G2 are positioned at different heights, a rotational force occurs during driving. This rotating force can vibrate the table equipment. As shown in Fig. 3, the height of the center of gravity Gi of the table 4 can be aligned with the height of the support member 19 and the center of gravity G2 of the stationary magnet parts 10a and 10b. In particular, the heights of the centers of gravity G i and G2 may also be aligned with the line of action of the force F generated by the repelling magnet unit. The reaction cancellation mechanism further includes a driving unit 15 , the group of which is configured to drive the supporting member 1 9 ; a coupling member 1 6 is coupled to the driving unit 15 and the supporting member 1 9 ; and a holding The unit 177 is configured to hold the support member 1 9 relative to the base 1 and hold it in place. 4A and 4B are detailed views of the drive unit 15 . The drive unit 15 includes a permanent magnet 23 fixed to the coupling member 16 and a coil 22 fixed to the base 1, the coupling member being coupled to the support member 19. The permanent magnets 23 disposed opposite to the coils 22 are driven in the Y direction by energizing the coils 22, and the support members 191 coupled to the permanent magnets 23 are driven in the Y direction. The drive unit 15 used is not limited to the above unit, and any unit that can drive the support member 19 can be used. The position of the support member 19 can be measured using another laser interferometer 3 2 . The interferometer 3 2 irradiates a reflecting mirror 3 1 fixed to the supporting member 19 with measuring light to measure the position of the supporting member 19 based on the interference of the reflected light and the reference light. The position measurement is not limited to the position of the support member 19 in the Y direction. For example, a plurality of measuring beams can be used to measure the position of the support member 19 in a direction of rotation about the X-axis or the Z-axis. The instrument for measuring the position of the support member 19 is not limited to a laser interferometer, and another type of instrument can be used. As such, the drive unit 15 can be used in conjunction with the laser interferometer 31 to facilitate positioning of the support member 19. The holding unit 17 includes a contact portion 21 and an actuator (not shown) for actuating the contact portion 21. The actuators used may be, for example, a unit capable of rapid response, such as a cylinder or electromagnetic solenoid or any other type of actuator, as is known to those skilled in the art. The holding unit 17 is fixed to the base 1. The actuator moves the contact portion 21 into contact with the coupling member 16 such that the coupling member 16 can be held by friction with respect to the base 1. That is, the contact portion 2 1 can hold the support member 19 relative to the base 1. The holding unit 17 used is not limited to the above structure, and any unit capable of holding the supporting member 19 with respect to the base 1 can be used. Figures 5A through 5I are side views of the table apparatus, as seen in the X direction, where the structure is partially omitted. The operation of the table 4 will be described with reference to Figs. 5A to 5I, which are arranged in time series. In the scanning using the table apparatus in accordance with this exemplary embodiment, the table 4 is repeatedly shifted by a predetermined distance at a constant speed. An example of the application of the workbench device is a raster workbench for an exposure device, as will be described later.
參考圖5A，該工作台設備係開啓電源，使該工作台4 及該支撐構件1 9係靜止的。首先，該驅動單元1 5係用於 由一位置Pi至一最初位置P〇運動該支撐構件19(圖5B -12- 200809425 )。該最初位置P Q係當開始加速供掃描時，該支撐構件 19所坐落之位置。該最初位置PQ可被適當地設定。當該 支撐構件1 9被運動時，該固持單元1 7未固持該支撐構件 1 9。當該支撐構件1 9抵達該最初位置pG時，該固持單元 1 7固持該支撐構件1 9 (圖5 C )。該線性馬達係接著用於 在該-Y方向中運動該工作台4，並固持該支撐構件19。 運動該工作台4，直至該可運動磁鐵零件28b係插入該固 定式磁鐵零件之開口達一預定長度，這譬如視該工作 台4所需之速率而定。另一選擇係，能使用該可運動磁鐵 零件28a及該固定式磁鐵零件l〇a。 當該可運動磁鐵零件28b係插入該固定式磁鐵零件 1 Ob時，一磁性斥力發生在其間。該固持單元1 7能藉由該 斥力防止該支撐構件19運動，因爲該固持單元17正固持 該支撐構件1 9。該線性馬達能產生一與該斥力相反之充分 力量，以於單一衝程中將該可運動磁鐵零件28b插入達一 預定長度。於此示範具體實施例中，該線性馬達造成該工 作台4往復運動，藉此逐漸地加速該工作台4，以將該可 運動磁鐵零件28a插入達一預定長度。該往復式運動能減 少該線性馬達上之負載，以抑制熱產生。 當該可運動磁鐵零件28a被插入達一預定長度、及該 斥力將該工作台4減速至零時，釋放該固持單元17(圖 5D)。當一反作用力於該-γ方向中運動該支撐構件19時 ，該斥力接著於該+Y方向中加速該工作台4。當該工作台 4運動時’該斥力減少，及當該工作台4係由該固定式磁 -13 · 200809425 大 此 作 件 鐵 動 零 件 圖 該 5D 磁 或 耗 等 工 量 其 鐵零件1 〇 b充分離開時變成零。在此時已被加速至該最 速率之工作台4係在定速運動至該衝程末端之附近，在 設置該固定式磁鐵零件l〇a (圖5E)。使用該線性馬達 由於空氣阻力及該軸承1 4，該速率能被維持頂抗減速。 當該工作台4係運動較接近至該衝程末端時’該工 台4係藉由該固定式磁鐵零件1 〇 a及該可運動磁鐵零 28a之間所產生的斥力所減速（圖5F)。當該可運動磁 零件28b在該速率減少至零之即時’因爲該工作台4之 能被保存，該可運動磁鐵零件2 8 a係插入該固定式磁鐵 件l〇a之開口達相同之長度。 再次當一反作用力於該+Y方向中作用在該支撐構 19上時，該斥力接著於該-Y方向中加速該工作台4( 5G)。該工作台4係在定速運動（圖5H) ’且係藉由 斥力所減速（圖51 )。此過程由圖51之狀態返回至圖 之狀態，以致該工作台4往復運動。 依據此示範具體實施例，該工作台4能藉由該永久 鐵9及該等永久磁鐵12a及12b之間所產生的斥力加速 減速，以減少該線性馬達上之負載。這譬如有利於減少 電量、熱產生、及該工作台設備之尺寸。此外，支撐該 固定式磁鐵零件l〇a及10b之支撐構件19係在一與該 作台4的運動方向相反之方向中運動，以用作一配衡質 。該支撐構件1 9可因此抵消驅動反作用力，而不會將 傳送至該基座1，以抑制該整個設備之震動。 -14- 200809425 第二示範具體實施例 圖6A及6B係一根據第二示範具體實施例的工 備之槪要圖。該工作台設備之個別零件係與根據該 範具體實施例之工作台設備的零件相同，除非以別 指定者。 於圖6A中，該工作台設備包含驅動單元20a ，其組構成可於該Y方向中分別驅動該等固定式磁 10a及10b。圖6B係該驅動單元20a的一詳細圖。 敘述將集中在該驅動單元2 0 a，雖然另一驅動單元 有相同之結構。該驅動單元20a包含一固定至該固 鐵零件10a之螺帽26、一進給螺桿25、支撐該進 25之支撐件29、及一用於轉動該進給螺桿25馬達 進給螺桿25係藉由該等支撐件29，與該馬達24之 軸向地支撐在該支撐構件1 9上方。能使用一倂入 24之編碼器偵測該固定式磁鐵零件i 0a之位置。 該等驅動單元20a及20b可分別於該Y方向中 等固定式磁鐵零件1 〇a及1 〇b，以改變開始加速之 藉由改變該長度，該等驅動單元20a及20b可因此 工作台4之最大速率，該等可運動磁鐵零件28a及 此分別在該工作台4之衝程末端插入該等固定式磁 1 0 a 及 1 0 b 〇 如果此示範具體實施例係應用至一曝光設備用 工作台，用於劑量調整能改變該插入長度。此外， 光柵圖案之局部曝光調整開始加速之位置。 作台設 第一示 的方式 及20b 鐵零件 下面之 20b具 定式磁 給螺桿 24。該 轉軸同 該馬達 運動該 位置。 改變該 28b藉 鐵零件 之光柵 可爲一 -15- 200809425 第三示範具體實施例 圖7A係根據第三示範具體實施例的工作台設備之槪 要圖。該工作台設備之個別零件係與根據該第一示範具體 實施例之工作台設備的零件相同，除非以別的方式指定者 〇 該第三示範具體實施例與第一示範具體實施例不同， 其中該線性馬達定子6係可相對該基座1運動。圖7B係 該工作台設備的一側視圖，如於圖7A之箭頭VIIB方向中 所視。該支撐構件19支撐該等固定式磁鐵零件10a及i〇b ，且亦支撐該等線性馬達定子6。 如在該第一不範具體實施例中所敘述，該線性馬達g 生一力量，以致定速運動之工作台4係不藉由譬如空氣阻 力減速。如果該線性馬達定子6係固定至該基座1，一反 作用力能造成輕微震動。依據此示範具體實施例之工作台 設備能抵消該反作用力之效應，因爲該線性馬達定子6係 可相對該基座1運動。 雖然該等線性馬達定子6能被獨自用作一配衡質量， 該支撐構件1 9亦可被用作一配衡質量，如上面所述。該 配衡質量移至抵消該反作用力之距離視該配衡質量對該工 作台4之重量比而定。該距離可因此藉由增加該配衡質量 之重量而減少。這導致該設備的尺寸中之減少。 第四示範具體實施例 -16- 200809425 圖8A至81係槪要圖，其顯示第四示範具體實 之工作台4的操作。於該第一示範具體實施例中， 固持單元1 7係用於固持該支撐構件1 9，依據此示 實施例之工作台設備不包含該固持單元1 7。將敘述 具體實施例中之工作台4的操作。 於圖8A中，該工作台設備係開啓電源，使該 4及該支撐構件19係靜止的。首先，該驅動單元： 於在該-Y方向中由一最初位置P〇至一位置P2運動 構件1 9，且在該工作台4係在該+Y方向中之前將 此處（圖8B)。當該可運動磁鐵零件28a係插入 式磁鐵零件l〇a之開口時，該工作台4係在該-Y方 速，而該支撐構件19係藉由一反作用力於該+ Y方 動。參考圖8C，該可運動磁鐵零件28b係插入該 磁鐵零件l〇b之開口達一預定長度。如果該可運動 件28b不能於單一衝程中插入達該預定長度，該工 可藉由往復式運動逐漸地加速，如在該第一示範具 例中所敘述。該等隨後之步驟係與那些該第一示範 施例者相同，且如此其一詳細之敘述將被省略。 如上面所述，根據該第四示範具體實施例之工 備不包含該固持單元17及具有一加速區域，在此 構件1 9已移至該最初位置P 〇。一延長之加速區域 藉由將該位置P2設定至該支撐構件1 9之衝程的末 定。 根據該第一示範具體實施例之工作台設備能產 施例中 雖然該 範具體 此示範 工作台 ί5係用 該支撐 其停在 該固定 向中加 向中運 固定式 磁鐵零 作台4 體實施 具體實 作台設 該支撐 可譬如 端所界 生一增 -17- 200809425 加之灰塵數量，因爲該接觸部份2 1將與該耦接構件1 6造 成接觸，以藉由摩擦固持之。在另一方面，根據該第四示 範具體實施例之工作台設備不包含該固持單元1 7，且如此 由該處不會產生灰塵。該工作台設備能夠因此抑制灰塵產 生，以維持一清潔之環境，這允許輕易之維護。 曝光設備之應用範例 將敘述一包含根據本發明之工作台設備的曝光設備之 範例。參考圖9，該曝光設備包含一照明單元5 0 1、固持 一光柵之光柵工作台5 02、一投射光學系統5 03、及一固 持晶圓之晶圓工作台5 04。此曝光設備係一步進與掃描型 投射曝光設備，其藉由將該光柵的一電路圖案投射於該晶 圓上曝光該晶圓。根據上面之示範具體實施例的工作台設 備能被用作該光柵工作台5 02。 該照明單元5 0 1包含一光源及一照明光學系統，以照 明具有該電路圖案之光柵。所使用之光源係譬如一雷射， 諸如ArF準分子雷射（波長：大約193奈米）、KrF準分 子雷射（波長：大約248奈米）、或F2準分子雷射（波 長：大約1 5 3奈米）。所使用雷射之型式不限於準分子雷 射，且亦可譬如爲 YAG雷射。所使用雷射之數目亦不受 限制。此一雷射能被用作與一光束整型光學系統及一非相 干光學系統結合之光源，該光束整型光學系統用於整型由 該雷射所放射之準直光束，且該非相干光學系統用於將一 相干雷射光束轉換成非相干光線。所使用之光源係不限於 -18- 200809425 一雷射’並亦可使用一或多個燈泡，諸如水銀燈或氙氣燈 〇 該照明光學系統係用於照明一罩幕，且包含諸如透鏡 、反射鏡、光線積分器、及孔徑闌之零組件。該照明光學 系統以細縫形光線照明該光柵。該細縫形光線之縱向係該 X方向，而其橫側方向係該γ方向。於掃描中，該光柵工 作台5 0 2係在該細縫形光線之橫側方向中運動，亦即，於 該Y方向中。通過該光柵之光線進入該投射光學系統5〇3 〇 所使用之投射光學系統5 03可爲譬如一僅只包含透鏡 元件之光學系統、一包含透鏡元件及至少一凹面鏡（反射 折射式光學系統）之光學系統、一包含透鏡元件及諸如相 位光柵元件（kinoform )的至少一繞射光學元件之光學系 統、或一全反射鏡光學系統。該投射光學系統5 0 3投射該 光柵之圖案至一縮減之尺寸，以曝光被安裝在該晶圓工作 台504上之晶圓。 此曝光設備能被用於製造具有細微圖案之裝置，包含 諸如半導體積體電路之半導體裝置、微機械、及薄膜磁頭 〇 其次，將參考圖10及11敘述使用上面之曝光設備生 產裝置（例如半導體晶片，諸如IC S或L S I、L C D S、或 CCDs )的製程之範例，其係該製程之流程圖。於此範例 中，將敘述一用於生產半導體晶片之製程。 於步驟S 1 (電路設計）中，設計該半導體晶片之電 -19- 200809425 路系統。於步驟S2 (光罩生產）中，根據該設計 案製備一罩幕。於步驟S 3 (晶圓生產）中，使用 之材料製造一晶圓。於步驟S 4 (晶圓處理）中， 一前端製程，實際電路系統係使用該罩幕及該曝光 由微影術形成在該晶圓上。於步驟S 5 (組裝）中 爲一後端製程，遭受步驟S 4之晶圓係處理成半導 。此組裝製程包含譬如一組裝步驟（切丁與接合） 裝步驟（晶片密封）。於步驟S 6 (檢查）中，在g 中所製成之半導體裝置係遭受檢查，諸如一操作測 用性測試。在這些步驟之後，該等半導體裝置被完 運（步驟S 7 )。 圖1 1係步驟S4之晶圓製程的一詳細流程圖。 S 1 1 (氧化）中，氧化該晶圓之表面。在步驟s 1 2 ( 中’在該晶圓之表面上形成一絕緣層。在步驟S13 之形成）中，在該晶圓上藉著沈積形成電極。在步 (離子植入）中，將離子植入該晶圓。在步驟S 1 5 劑處理）中’將一感光材料塗至該晶圓上。在步驟 曝光）中，使用該曝光設備將該罩幕的電路圖案形 晶圓上。在步驟S 1 7 (顯影）中，使該已曝光晶圓 成之影像顯影。在步驟S 1 8 (蝕刻）中，蝕刻異於 影之影像的抗蝕劑部份。在步驟S 1 9 (抗蝕劑移除 在鈾刻之後移除所留下的不需要之抗蝕劑重複這些 以在該晶圓上形成電路圖案。 雖然已參考示範具體實施例敘述本發明，應了 電路圖 諸如矽 亦稱爲 設備藉 ，亦稱 體日日片 及一封 》驟 S5 試及耐 成及裝 於步驟 CVD ) (電極 驟 S 1 4 (抗蝕 S 1 6 ( 成於該 上所形 該已顯 )中， 步驟， 解本發 -20- 200809425 明不限於所揭示之示範具體實施例。以下申請專利之範圍 將被給予最寬闊之解釋，以便涵括所有此等修改及同等結 構與功能。 【圖式簡單說明】 圖1 A及1 B係根據本發明之第一示範具體實施例的工 作台設備之槪要圖。 圖2係一可用在該第一示範具體實施例中之排斥磁鐵 單元的範例之槪要圖。 圖3係圖1A之工作台設備的側視圖，如於該X方向 中所視。 圖4A及4B係驅動一支撐構件的驅動單元之槪要圖。 圖5 A至5 I係說明該第一示範具體實施例中之工作台 的操作之槪要圖。 圖6A及6B係根據本發明之第二示範具體實施例的工 作台設備之槪要圖。 圖7A及7B係根據本發明之第三示範具體實施例的工 作台設備之槪要圖。 圖8A至81係說明本發明之第四示範具體實施例中之 工作台的操作之槪要圖。 圖9係包含根據本發明的至少一示範具體實施例之工 作台設備的曝光設備之槪要圖。 圖1 〇係一使用該曝光設備製成裝置之製程的流程圖 -21 - 200809425 圖1 1係圖1 〇之流程圖的步驟S4中之晶圓製程的詳 細流程圖。 圖1 2 A及1 2 B係一習知包含排斥加速單元的工作台設 備之槪要圖。 【主要元件符號說明】 1 :基座 3 :基板 4 :工作台 5 :滑動件 6 :定子 7、8 :支撐件 9 :永久磁鐵 10a、10b :固定式磁鐵零件 1 1 a、1 1 b :磁軛 12a 、 12b 、 13 :永久磁鐵 1 4 :軸承 1 5 :驅動單元 1 6 :親接構件 1 7 :固持單元 1 9 :支撐構件 20a、20b:驅動單元 2 1 :接觸部份 22 :線圈 -22- 200809425 2 3 :永久磁鐵 24 :馬達 25 :進給螺桿 2 6 :螺帽 27 :反射鏡 2 8 a、2 8 b :可運動磁鐵零件 2 9 :支撐件 3 0 :干涉儀 3 1 :反射鏡 3 2 :干涉儀 102 :導引件 1 0 3 :基板 104 :工作台 105 :滑動件 1 〇 6 :定子 1 0 9、1 1 2 :永久磁鐵 5 0 1 :照明單元 5 02 :光柵工作台 5 0 3 :投射光學系統 5 04 :晶圓工作台 -23Referring to Figure 5A, the table apparatus is powered on such that the table 4 and the support member 9 are stationary. First, the drive unit 15 is used to move the support member 19 from a position Pi to an initial position P (Fig. 5B-12-200809425). The initial position P Q is the position at which the support member 19 is seated when the acceleration for scanning is started. This initial position PQ can be set as appropriate. When the support member 19 is moved, the holding unit 17 does not hold the support member 19. When the support member 19 reaches the initial position pG, the holding unit 17 holds the support member 19 (Fig. 5C). The linear motor is then used to move the table 4 in the -Y direction and hold the support member 19. The table 4 is moved until the movable magnet member 28b is inserted into the opening of the fixed magnet member for a predetermined length, as determined by the rate required for the table 4. Alternatively, the movable magnet member 28a and the stationary magnet member 10a can be used. When the movable magnet part 28b is inserted into the fixed magnet part 1 Ob, a magnetic repulsion occurs therebetween. The holding unit 17 can prevent the support member 19 from moving by the repulsive force because the holding unit 17 is holding the support member 19. The linear motor is capable of generating a sufficient force opposite to the repulsive force to insert the movable magnet member 28b for a predetermined length in a single stroke. In the exemplary embodiment, the linear motor causes the table 4 to reciprocate, thereby gradually accelerating the table 4 to insert the movable magnet part 28a for a predetermined length. This reciprocating motion reduces the load on the linear motor to suppress heat generation. When the movable magnet part 28a is inserted for a predetermined length and the repulsive force decelerates the table 4 to zero, the holding unit 17 is released (Fig. 5D). When a reaction force moves the support member 19 in the -γ direction, the repulsive force then accelerates the table 4 in the +Y direction. When the table 4 is moved, the repulsive force is reduced, and when the table 4 is driven by the fixed magnet-13 - 200809425, the 5D magnetic or the equivalent amount of the iron part 1 〇b It becomes zero when it leaves fully. At this time, the table 4 which has been accelerated to the maximum speed is moved at a constant speed to the vicinity of the end of the stroke, and the fixed magnet part 10a is provided (Fig. 5E). Using this linear motor, this rate can be sustained by the top against the air resistance due to the air resistance and the bearing 14. When the table 4 is moved closer to the end of the stroke, the stage 4 is decelerated by the repulsive force generated between the fixed magnet part 1 〇 a and the movable magnet zero 28a (Fig. 5F). When the movable magnetic part 28b is reduced to zero at the rate 'because the worktable 4 can be saved, the movable magnet part 28 a is inserted into the opening of the fixed magnet piece 10a to the same length . Again, when a reaction force acts on the support structure 19 in the +Y direction, the repulsive force then accelerates the table 4 (5G) in the -Y direction. The table 4 is at a constant speed (Fig. 5H)' and is decelerated by the repulsive force (Fig. 51). This process returns from the state of Fig. 51 to the state of the figure, so that the table 4 reciprocates. According to this exemplary embodiment, the table 4 can be accelerated to decelerate by the repulsive force generated between the permanent iron 9 and the permanent magnets 12a and 12b to reduce the load on the linear motor. This can be beneficial, for example, in reducing power, heat generation, and the size of the workbench equipment. Further, the supporting members 19 supporting the fixed magnet parts 10a and 10b are moved in a direction opposite to the moving direction of the table 4 to serve as a counterweight. The support member 19 can thus cancel the driving reaction force without being transmitted to the base 1 to suppress the vibration of the entire apparatus. -14- 200809425 Second Exemplary Embodiment FIGS. 6A and 6B are schematic views of a work according to a second exemplary embodiment. The individual parts of the table apparatus are the same as those of the table apparatus according to the exemplary embodiment, unless otherwise specified. In Fig. 6A, the table apparatus includes a drive unit 20a, the group of which is configured to drive the fixed magnets 10a and 10b, respectively, in the Y direction. Fig. 6B is a detailed view of the drive unit 20a. The description will focus on the drive unit 20a, although the other drive unit has the same structure. The driving unit 20a includes a nut 26 fixed to the solid iron part 10a, a feeding screw 25, a supporting member 29 supporting the inlet 25, and a motor feeding screw 25 for rotating the feeding screw 25. Supported by the support members 29, the motor 24 is axially supported above the support member 19. The position of the fixed magnet part i 0a can be detected using an encoder of 24 in. The driving units 20a and 20b can respectively change the length of the medium-fixed magnet parts 1 〇a and 1 〇b in the Y direction to change the starting acceleration, and the driving units 20a and 20b can thus work on the table 4 The maximum speed, the movable magnet parts 28a and the respective fixed magnets 10a and 10b are inserted at the end of the stroke of the table 4, respectively. If the exemplary embodiment is applied to an exposure apparatus table For dose adjustment, the insertion length can be changed. In addition, the local exposure adjustment of the grating pattern begins to accelerate. The first method is shown in the table and the 20b iron part below the 20b iron part. The shaft moves to the position with the motor. The grating for changing the 28b borrowing iron part may be a -15-200809425. Third Exemplary Embodiment FIG. 7A is a schematic view of a table apparatus according to a third exemplary embodiment. The individual parts of the table apparatus are the same as those of the table apparatus according to the first exemplary embodiment, unless otherwise specified by the third exemplary embodiment and the first exemplary embodiment, wherein The linear motor stator 6 is movable relative to the base 1. Figure 7B is a side elevational view of the table apparatus as seen in the direction of arrow VIIB of Figure 7A. The support member 19 supports the stationary magnet parts 10a and i〇b and also supports the linear motor stators 6. As described in the first exemplary embodiment, the linear motor g generates a force so that the table 4 for constant speed movement is not decelerated by, for example, air resistance. If the linear motor stator 6 is fixed to the base 1, a reaction force can cause a slight shock. The table apparatus according to this exemplary embodiment can counteract the effect of the reaction force because the linear motor stator 6 is movable relative to the base 1. While the linear motor stator 6 can be used alone as a taring mass, the support member 19 can also be used as a taring mass, as described above. The distance from which the balance mass is shifted to offset the reaction force depends on the weight ratio of the balance mass to the table 4. This distance can thus be reduced by increasing the weight of the taring mass. This results in a reduction in the size of the device. Fourth Exemplary Embodiment - 16 - 200809425 Figs. 8A to 81 are schematic diagrams showing the operation of the fourth exemplary concrete work table 4. In the first exemplary embodiment, the holding unit 17 is for holding the support member 19. The workbench device according to the illustrated embodiment does not include the holding unit 17. The operation of the table 4 in the specific embodiment will be described. In Figure 8A, the table apparatus is powered on such that the 4 and the support member 19 are stationary. First, the drive unit: moves the member 1 9 from the initial position P 到 to the position P2 in the -Y direction and will be here before the table 4 is in the +Y direction (Fig. 8B). When the movable magnet member 28a is inserted into the opening of the magnet member 10a, the table 4 is at the -Y speed, and the support member 19 is urged by the +Y. Referring to Fig. 8C, the movable magnet member 28b is inserted into the opening of the magnet member 10b for a predetermined length. If the movable member 28b cannot be inserted into the predetermined length in a single stroke, the work can be gradually accelerated by the reciprocating motion as described in the first exemplary embodiment. These subsequent steps are the same as those of the first exemplary embodiment, and thus a detailed description thereof will be omitted. As described above, the apparatus according to the fourth exemplary embodiment does not include the holding unit 17 and has an acceleration region where the member 19 has moved to the initial position P 〇. An extended acceleration region is set by the position P2 to the end of the stroke of the support member 19. According to the first exemplary embodiment, the workbench device can be implemented in the embodiment, although the exemplary workbench ί5 is supported by the support in the fixed inward direction and the fixed magnet is fixed in the body. The specific implementation of the support can be increased, for example, by increasing the amount of dust, because the contact portion 21 will come into contact with the coupling member 16 to be held by friction. On the other hand, the table apparatus according to the fourth exemplary embodiment does not include the holding unit 177, and thus no dust is generated therefrom. The table apparatus is thus capable of suppressing the generation of dust to maintain a clean environment, which allows for easy maintenance. Application Example of Exposure Apparatus An example of an exposure apparatus including the stage apparatus according to the present invention will be described. Referring to Fig. 9, the exposure apparatus includes a lighting unit 501, a grating working table 502 holding a grating, a projection optical system 503, and a wafer table 504 for holding the wafer. The exposure apparatus is a step-and-scan type projection exposure apparatus that exposes a wafer by projecting a circuit pattern of the grating onto the wafer. A table device according to the above exemplary embodiment can be used as the raster table 502. The illumination unit 501 includes a light source and an illumination optical system to illuminate the grating having the circuit pattern. The light source used is, for example, a laser such as an ArF excimer laser (wavelength: approximately 193 nm), a KrF excimer laser (wavelength: approximately 248 nm), or an F2 excimer laser (wavelength: approximately 1) 5 3 nm). The type of laser used is not limited to excimer lasers, and may also be, for example, YAG lasers. The number of lasers used is also not limited. The laser can be used as a light source in combination with a beam shaping optical system and an incoherent optical system for shaping a collimated beam radiated by the laser, and the incoherent optics The system is used to convert a coherent laser beam into incoherent light. The light source used is not limited to -18-200809425 A laser' and may also use one or more light bulbs, such as a mercury lamp or a xenon lamp. The illumination optical system is used to illuminate a mask and includes such as a lens, a mirror. , ray integrator, and aperture 阑 components. The illumination optics illuminates the grating with a thin slit of light. The longitudinal direction of the slit-shaped light is in the X direction, and the lateral direction thereof is in the γ direction. In the scanning, the grating stage 502 moves in the lateral direction of the slit-shaped ray, that is, in the Y direction. The projection optical system 503 used for entering the projection optical system 5〇3 by the light of the grating may be, for example, an optical system including only lens elements, a lens element, and at least one concave mirror (reflective optical system). An optical system, an optical system comprising lens elements and at least one diffractive optical element such as a phase grating element, or a total reflection mirror optical system. The projection optical system 503 projects the pattern of the grating to a reduced size to expose the wafer mounted on the wafer stage 504. The exposure apparatus can be used to manufacture a device having a fine pattern, including a semiconductor device such as a semiconductor integrated circuit, a micromechanical, and a thin film magnetic head. Next, an exposure apparatus production apparatus (for example, a semiconductor) using the above will be described with reference to FIGS. An example of a process for a wafer, such as an IC S or LSI, LCDS, or CCDs, is a flow chart of the process. In this example, a process for producing a semiconductor wafer will be described. In the step S1 (circuit design), the semiconductor wafer -19-200809425 road system is designed. In step S2 (photomask production), a mask is prepared in accordance with the design. In step S3 (wafer production), a wafer is fabricated using the material used. In step S4 (wafer processing), a front end process is used by the actual circuitry to form the mask and the exposure is formed by lithography on the wafer. In step S5 (assembly), it is a back-end process, and the wafer system subjected to step S4 is processed into a semi-conductor. This assembly process includes, for example, an assembly step (dicing and bonding) loading step (wafer sealing). In step S6 (check), the semiconductor device fabricated in g is subjected to inspection, such as an operational test. After these steps, the semiconductor devices are completed (step S7). Figure 11 is a detailed flow chart of the wafer process of step S4. In S 1 1 (oxidation), the surface of the wafer is oxidized. In step s 1 2 (wherein an insulating layer is formed on the surface of the wafer. In the formation of step S13), electrodes are formed on the wafer by deposition. In the step (ion implantation), ions are implanted into the wafer. A photosensitive material is applied to the wafer in step S1 5 . In the step exposure, the circuit pattern of the mask is formed on the wafer using the exposure apparatus. In step S17 (development), the image of the exposed wafer is developed. In step S18 (etching), the resist portion of the image of the different image is etched. These are repeated to form a circuit pattern on the wafer in step S19 (resist removal of the unwanted resist left after the uranium engraving). Although the invention has been described with reference to the exemplary embodiments, A circuit diagram such as 矽 is also known as equipment borrowing, also known as body day film and a piece of "S5 test and resistance and installed in step CVD) (electrode step S 1 4 (resistance S 1 6 (on this The present invention is not limited to the specific embodiments disclosed. The scope of the following claims will be accorded the broadest explanation so as to include all such modifications and equivalent structures. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1A and 1B are schematic views of a workbench apparatus according to a first exemplary embodiment of the present invention. Fig. 2 is a repelling usable in the first exemplary embodiment. BRIEF DESCRIPTION OF THE DRAWINGS Figure 3 is a side elevational view of the table apparatus of Figure 1A as viewed in the X direction. Figures 4A and 4B are schematic views of a drive unit for driving a support member. A to 5 I show the first demonstration concrete BRIEF DESCRIPTION OF THE DRAWINGS FIG. 6A and FIG. 6B are schematic diagrams of a workbench apparatus according to a second exemplary embodiment of the present invention. FIGS. 7A and 7B are diagrams showing a third exemplary embodiment of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS Figure 8A to Figure 81 are diagrams showing the operation of a workbench in a fourth exemplary embodiment of the present invention. Figure 9 is a diagram showing at least one exemplary embodiment in accordance with the present invention. A schematic diagram of the exposure apparatus of the workbench apparatus. Fig. 1 is a flow chart of a process for manufacturing a device using the exposure apparatus - 2109409425 Fig. 1 1 is a wafer in step S4 of the flow chart of Fig. 1 Detailed flow chart of the process Figure 1 2 A and 1 2 B is a schematic diagram of a conventional workbench device including a repelling acceleration unit. [Main component symbol description] 1: Base 3: Substrate 4: Table 5: Slide member 6: stator 7, 8: support member 9: permanent magnets 10a, 10b: fixed magnet member 1 1 a, 1 1 b: yoke 12a, 12b, 13: permanent magnet 1 4: bearing 1 5 : drive unit 1 6 : abutting member 1 7 : holding unit 1 9 : supporting members 20a, 20b: driving Unit 2 1 : Contact portion 22 : Coil -22- 200809425 2 3 : Permanent magnet 24 : Motor 25 : Feed screw 2 6 : Nut 27 : Mirror 2 8 a, 2 8 b : Movable magnet part 2 9 : Support 3 0 : Interferometer 3 1 : Mirror 3 2 : Interferometer 102 : Guide 1 0 3 : Substrate 104 : Table 105 : Slide 1 〇 6 : Stator 1 0 9 , 1 1 2 : Permanent Magnet 5 0 1 : illumination unit 5 02 : grating table 5 0 3 : projection optical system 5 04 : wafer table -23