TW200807544A - Panel etching method and apparatus thereof - Google Patents

Abstract

A panel etching method and apparatus thereof, in which the panel to be etched is vertically immersed into an etching liquid and is made to make reciprocating upward/downward and/or right/left displacement along the panel's parallel direction during proceeding process of etching. Moreover, the bubble current is provided beneath the panel to be etched, by means of which to force and promote the etching liquid to present continuous, relative flowing, such that the etching liquid can be made to uniformly contact the panel surface to realize the uniform etching effect. Furthermore, by means of the relative motion between the panel and the etching liquid, the residual being etched out can be swiftly separated from the surface to achieve the objective of enhancing etching efficiency.

Description

200807544 IX. Description of the invention: [Technical field to which the invention belongs] The present invention relates to the money---------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------- The chemical reaction between the specific solutions is used to remove the _ on the substrate, so that the substrate can be thinned or the substrate can be thinned. This technology is extremely inexpensive and efficient. The team points to the early clothes, the equipment is simple, and the T is as known. _ Department of Fine Chemicals anti-county film removal or thin type ^ engineering, the shoe reaction itself is directional, so this isotropic feature Leading to its _ Qiazao County Bureau to hide _ Congguo; in addition, this side mode is difficult to make the entire surface • self-employed In other areas, there is an undercutting phenomenon that seriously affects the yield of the product. However, as the size of the product is smaller, the processing accuracy is higher and higher, and the uniformity of the side is increased. It is even more important. In addition, in recent years, in the trend that consumer electronic products tend to be light and thin, the basic components of such xm are also required to meet the requirements of thin and light, and the display panel is mainly borrowed. The purpose is to achieve a thin coating on the glass substrate; the most commonly used in many known thinning process technologies is the side mode, which is mainly the thin side of the test side.

5 Ref. 6113PIA 200807544 Low cost and excellent processing efficiency, and the stress in the process is not easy to cause damage to the thin glass plate. However, as mentioned in the previous paragraph, the lack of etching process will also lead to many bad results, such as ··· Uneven etching causes the thickness of each part of the glass plate to be different (especially when applied to a large-area glass substrate), so that the mechanical strength of the glass plate is sharply reduced and easily damaged, and the uneven etching also causes surface roughness. , affecting the image quality of the liquid crystal display element. SUMMARY OF THE INVENTION The present invention mainly provides an improved panel surname method and apparatus thereof, which are used to form a desired pattern on a panel and/or to perform a thinning process of the panel by etching the panel. The immersion is immersed in the etchant in a vertical erected state, and the panel is continuously reciprocally displaced in the parallel direction of the plate surface along the parallel direction of the plate surface in the process of surname, and/or left and right directions, and Providing a bubble flow under the etched panel, thereby forcibly promoting a continuous relative flow state of the etchant on the surface to be etched, so that the surface of the surname can be continuously contacted with the fresh surname and the residual residue can be quickly swept. Separation from the surface to achieve a uniform etching effect and a multiplicative etching process efficiency. The invention further provides a panel etching method and a device thereof which can produce high-precision etching results, which utilize the continuous movement state between the etched surface and the etching liquid during the engraving process to ensure etching of various parts of the etched surface. Uniform processing results in panels with precise pattern and size as well as excellent surface roughness and flat twist. The method for performing the etching process according to the present invention includes: firstly, one or a plurality of panels to be etched are mounted on a holding device; and providing a working tank containing side liquid; I set the panel body

Ref. 6113PIA 6 200807544 The king is stupid and stupid. This is immersed in the side liquid of the working tank for rhyme; in the rhyme process, the panel is continuously traversed in the parallel direction of the board in the money engraving. The ^, down and/or left and right azimuths are moved from the complex displacement and the bubble flow is provided from below the paste panel. Further, it is also possible to perform the photoresist process on the predecessor panel to set the surface __, and the read can form a specific pattern on the panel filament. In accordance with the present invention, Yilu also has at least (4) more than at least - Shengnong has a spare (4) for the trough' - can be installed side panel holding device, - reciprocating motion mechanism, and - bubble unit; The silver engraving liquid of the Shengshang in the middle, ^ if it is the rotating wire of hydrogen __, the domain is in the side of the production of a certain liquid level, and the panel can be completely immersed in the residual liquid; The holding device can hold a fixed-sheet or two or more panels arranged in parallel with each other, and can be lifted and lowered to lower the displacement of the holding device to immerse in the money engraving of the groove or to rise to the side of the groove The liquid reeling mechanism; the reciprocating motion mechanism, for example, a crank_link mechanism, a hydraulic cylinder or a pneumatic pressure-to-face structure, is connected to the holding device, and can drive the secret problem with the panel in the direction of the supplement _ Reciprocating displacement of the lower and/or left and right orientations = the bubble unit is disposed below the holding device to provide a bubble flow to the surnamed panel; the holding device is used to hold the panel and slightly vertical & The state is immersed in the trough (four) shot _, Lai Yuna Fu The type of mechanism causes the panel to reciprocate in the upper and lower directions and/or the left and right directions in the parallel direction of the plate in the surname

Ref. 6113PIA 7 200807544 = On the surface of the object _, and using (4) the sound flow provided by the bubble early, so that the bubble from the front of the panel fixture along the panel facing the loading, by floating The side liquid flow near the surface of the gas decompression, thereby improving the degree of smoke processing of each part of the surface, so as to produce a panel with precise _ and phase and excellent surface roughness and flatness, and can be side (4) The debris can be quickly separated by the filaments, and the purpose of the processing efficiency of the ship. The holding unit of the holding device can vertically hold one or more panels in a vertical direction. In order to carry out the process of multiple panels in the same time, the hybrid device can further comprise a complex array. The holding side of the front and rear parallel sides is 'and the individual's freshman's job is maintained - the appropriate _ distance, the flow of the slick liquid between the surfaces. The bubble unit is mounted on the bottom wall of the etching solution working tank and corresponding to the front of the panel holding device, and has a matrix type bubble nozzle, and the bubble flow can be continuously outputted to the panel on the holding device, the bubble unit It is also possible to control the output of the bubble stream 1 , the bubble particle size and the output gas temperature. Further, by controlling the temperature of the gas output from the bubble unit, the temperature of the etching solution in the working tank can be indirectly adjusted, thereby adjusting the rate of the etching chemical reaction (in accordance with the higher temperature, the rate of the reaction can be accelerated). In addition, the working tank may also optionally include a circulation filter, which can communicate with the etching liquid in the working tank to be filtered and then discharged back into the tank, thereby

Ref. 6113PIA 200807544 200807544 In addition to purification, and using the solution circulation / core miscellaneous in the engraving liquid residue and dust filter effect to promote the uniformity of the engraving liquid. *The handle is not limited to the above-mentioned form. Obviously, it is familiar to the skilled person and δ' after referring to the above-mentioned remuneration, the change and the change are based on the invention in the same creative spirit. Any modifications or alterations should still be included in the scales intended to be protected by the present invention. Will be followed by

- The specific embodiment continues to reward to further clarify the innovative features of the present invention. [Embodiment] - The preferred embodiment listed below is a process for tempering a glass substrate of a liquid crystal display panel; as shown in the first figure, a front reference view of the side device structure of the present invention is shown on the machine The upper setting - the working tank 1 containing the rhyme engraving liquid, and the capacity of the side liquid 9 contained in the tank should be maintained at a specific liquid level in the process of the remaining process, and the height is at least a miscellaneous inspection! The calling panel 5 can be completely immersed in the solution; in addition, the working tank 1 also has a-circulating filter 12, which can be continuously dressed in the remaining process by the discharge of the f 121 provided in the bottom wall of the groove ♦ The engraving liquid in the working tank is filtered into the circulation, H is subjected to a transition treatment, and then the processed residual liquid is discharged into the working tank again by the discharge pipe 122, and thus mixed in the side liquid. The ugly debris and age, and the effect of the ring process to increase the uniformity of the residual liquid. In this embodiment, the substrate of the glass material is subjected to a surname process, and the surname 9 is made of a hydrofluoric acid (HF) concentration of more than 5%. Further, as shown in the attached drawings, a lifting device 2 for lifting and lowering is provided above the working tank 1, so that the clamping device 2 can be lowered and immersed in the groove.

6113PiA 9 200807544

In the liquid 9, or in the squirting liquid 9 of the ascending displacement domain; the holding unit of the clamping device 2 is slightly Wang-momented, and the lower margin is provided with a plurality of surface-fixing chucks 22 The edge 23 is provided with a plurality of movable collets, and the movable end of the female has an adjustable length shaft 241, such as a screw, for adjusting the upper and lower clamping positions of the movable collet=, according to which the panel 5 can be In addition to the solid collet and the H of the rectangular frame body, the end portions of the british Weiding Wei 22 and the movable collet 24 are provided with a V-shaped groove 25, by which the panel 5 is sleeved The edge, so that the held plate can be self-aligned, while increasing the stability of the back. Further, the clamping device 2 is coupled to the peak-multiple motion mechanism 3, so that the clamping is movable by the reciprocating movement of the upper, lower, left and right directions in the parallel direction; the reciprocating motion mechanism 3 A conventional crank mechanism or an oil (air) cylinder reciprocating mechanism can be applied. In addition, 'in the _ red trough 1 miscellaneous and corresponding to the Cheng panel 挟 holding ^ directly below the __ gas element 4, the bubble unit has a matrix type gas ^ mouth 4 ^ ' can be placed in Lai The surface of the Na Na bubble, the bubble ^ 4 can be (four) output Wei touch more than the recruitment, bubble particles and output = body fox ' and _ control the gas temperature of the bubble unit output, can be indirectly adjusted = work slot The temperature of the liquid inside, according to which the rate of reaction in the tank is regulated.

Ref 6113PIA 10 200807544 At the same time, the reciprocating motion mechanism 3 is used to drive the clamp county 2 so that the panel $ is up, down and/or left and right in the parallel direction of the board surface in the last name. Azimuthal reciprocating displacement. It is difficult for the money to be in a continuous relative flow state on the surface of the frequency, and the bubble flow provided by the bubble unit is utilized, so that the bubble is directed upward from the surface of the panel directly below the panel, and the floating phase bubble band The surface of the secret engraving is attached; the near side liquid flows, and the debris that is carved out of the money is quickly taken away, thereby greatly improving the processing efficiency of the remaining engraving and promoting the processing of the parts of the remaining facet, so that Produces panels with precise _ and phase and excellent surface roughness and flatness. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a front view of a structure of a hard-to-stand structure according to the present invention; and FIG. 2 is a schematic view showing the operation of the holding device and the reciprocating motion mechanism in a side process of the first-picture structure; The three figures are side reference views of the side device structure of the present invention; and the fourth figure is an enlarged view of the third portion of the third figure. [Main component symbol description] Working tank 1 Discharge tube 121 Clamping device 2 Fixing chuck 22 Moving chuck 24 V-shaped groove 25 Bubble unit 4 Panel 5 Circulating filter 12 Discharge tube 122 Lower box edge 21 Upper box edge 23 Car by rod 241 Reciprocating motion mechanism 3 Matrix type bubble nozzle 41 Etching liquid 9

Ref 6113ΡΙΛ 11

Claims (1)

200807544, X. Application for Patent Park: The remaining j method can be used to form the desired pattern on the panel and/or the process for the second panel, which is to be removed on the face panel between the shed and the immersion panel. The material, the steps of the decanting process include: or the panel wire to be processed on the side of the Wei piece is fixed on the - Lin Chong; • & a working trough for the enrichment of the engraved liquid; · «Red thief enters the working fluid of the working tank, performs the side; and in the side private, the panel is continuously in the side liquid in the parallel direction along the board surface up, down and/or The reciprocating displacement of the left and right orientations is actuated and a bubble flow is provided from beneath the etched panel. 2 A surface engraving device, which can be used to form a desired pattern on a panel and/or to perform a thinning process for a panel, which utilizes 10 chemical reactions between the side solvent and the panel to remove material on the panel, the rhyme The engraving process comprises at least: a working tank' tank containing the money engraving liquid, and the surname engraving in the trough is continuously maintained at a specific liquid level in the side process, and the height is at least sufficient for the desire The surname engraved panel can be completely immersed in the etching liquid; a holding device, the holding unit can clamp and fix one or two or more panels arranged in parallel with each other, and the lifting device can be moved up and down, so that the holding device is lowered and displaced (5) into the In the residual liquid of the tank, or ascending displacement to leave the side liquid of the tank; - Reciprocating transport structure is mixed with the new device, which can drive the clamp Ref61!3PlA 12 200807544 ^ S (,, The parallel direction of the plate is the reciprocating displacement of the upper, lower and/or left and right directions; and - the bubble is 7G early, and the set is provided below the county to provide a bubble flow to the tilting panel; Using the holding device The panel is fixedly held and immersed into the slot of the slot in a slightly vertical erected state. The reciprocating mechanism causes the panel to be up and down in the etchant in a parallel direction along the plane of the plate. And/or the reciprocating displacement of the left and right azimuth, and the bubble flow provided by the bubble unit can be lifted up along the surface of the surname to promote the continuous relative flow state of the engraving liquid on the surface of the remnant, according to which Promoting the uniformity of the residual engraving and improving the efficiency of the engraving processing. 3. The panel re-engraving device according to claim 2, wherein the bubble unit has a matrix type bubble nozzle. The panel engraving apparatus of the above-mentioned item, wherein the bubble unit can control the output of the bubble flow and the size of the bubble particle. 5. The panel surname device according to claim 2, wherein the bubble device The unit can control the temperature of the output gas. Resistant · 6I13PU 13