200803607^ 17884twf.doc/e 九、發明說明： 【發明所屬之技術領域】 本發明是有關於一種顯示面板的製造方法，且特別是 有關於一種能夠在製程中避免框膠溢流對顯示區内元件造 成污染的顯示面板製造方法。 【先前技術】 由於多媒體社會的急速進步，半導體元件及顯示裝置 的技術也隨之具有飛躍性的進步。就顯示器而言，由於有 機龟激發光顯示器（〇rganic Electroluminescence Display， 0ELD)具有無視角限制、低製造成本、高應答速度、省電、 可使用於可攜式機器的直流驅動、工作溫度範圍大以及重 量輕且可隨硬體設備小型化及薄型化等等，符合多媒體時 代顯示器的特性要求。因此，有機電激發光顯示器具有極 大的發展潛力，可望成為下一世代的新穎平面顯示器。 圖1為習知一種有機電激發光顯示面板的剖面示意 圖。請參照圖1，有機電激發光顯示面板1〇〇主要是由基 板110、陽極層112、有機官能層（organic functi〇n layer)114、陰極層116以及基板12〇所構成。其中，陽極 層η2、有機官能層114與陰極層116是依序配置於基板 110上。由於有機官能層114 一旦接觸到水氣或氧氣，其 與陽極層112及陰極層116之間將會產生界面剝離的現 象’因此有機電激發光顯示面板100係利用環氧樹脂所構 成的框膠(sealant)104將基板110與基板12〇加壓貼合，再 以紫外線照射框膠104使其固化，以便於將有機官能層 5 200803607v 17884twf.doc/e 封在基板110與基板120之間。除此之外，尚會在基板120 上形成吸水材料塊106，以便於吸收滲入的水氣。 雖然基板120與框膠104能夠隔絕氧氣與水氣滲入有 機電激發光顯示面板1〇〇,但是若為了達到較好的密封效 果而使用過量的框膠104，則當基板120黏合於基板no 上時，將容易因框膠104分佈不均或是壓合的壓力控制不 佳，使框膠104產生溢流現象而接觸到有機官能層114， 因而對有機官能層114的發光特性造成不良的影響。 為解決上述問題，習知尚提出一種有機電激發光顯示 面板。如圖2所示，有機電激發光顯示面板2〇〇是在上基 板210及下基板220上之陽極層222至少其中之一上形成 凹槽202，且凹槽202是位於框膠204與有機官能層224 之間。如此一來，當框膠2〇4在上基板21〇與下基板220 的組立過程中產生溢流現象時，過量的框膠2〇4a會流至凹 槽202内，而不會接觸到有機官能層224。 由上述可知，凹槽202内必須有足夠的空間容納溢流 之框膠204a，以防止框膠204a接觸到有機官能層224。而 且，由於凹槽202之深度受限於上基板21〇與陽極層222 的厚度，因此通常是將凹槽202的面積做大。然而，若凹 槽202的面積過大，則會對有機電激發光顯示面板2〇〇的 開口率造成影響。 【發明内容】 本發明之目的是提供一種顯示面板的製造方法，以在 不額外增加製程成本的前提下，解決框膠溢流而污染到顯 6 200803607w 17884twf.doc/e 示區内部元件的問題。 0於t狀S目的疋提供—種顯示面板，此顯示面板 ==示區周圍形成一阻隔層，以藉由阻隔層之設 置而阻擋框膠之溢流。 制疋其他目的’本發明提出—種顯示面板的 拉1，三、疋先提供具有顯示區與非顯示區的第一基 ^非者在第—基板上的顯示11内形成—晝素陣列，並同 一^_示區_成阻隔層。其中，此阻隔層是圍繞在顯 ^周圍。然後’在非顯示區_成—框膠，而上述阻隔 ^位於轉與畫素_之間。之後，將—第二基板組立 j弟基板上方，並藉由上述框膠來固定第一基板與第二 基板的相對位置。 、 在本發明之一實施例中，軸上述晝素陣列的方法例 如是先在基板上軸錄掃描崎、錄資_線與多數 主2元件。其中。這些掃描配線與資料配線在基板上定義 出夕數1素區域，而各個主動元件是配置於其所對應之書 $區或内，並與對應-之知瞒配線與資料配線電性連接。接 著，在各晝素區域内形成一畫素電極而與主動元件電性連 接丄之後，在這些晝素電極上形成一有機官能層，再於有 機官能層上形成一共用電極。 “在本發明之一實施例中，上述之主動元件例如是薄膜 電晶體。 曰在本發明之一實施例中，形成上述晝素陣列的方法例 如是先在基板上形成多數彼此平行的第一條狀電極，接著 200803607' 17884twf.doc/e 上形成有射騎，其巾有齡能層是覆蓋住這此 ^狀電極。織，在有機官能層上形成錄彼此平行 極其中，這些第-條狀電極與第二條狀電 在本發明之—實施例中，阻隔層例如是在上述形成 素陣列的至少一步驟中一併形成。 一 在本發明之-實施例中，形成上述之有機官能層的方 认列如疋先在畫素電極上形成—電子傳輸層，再於電子傳 輸層上形成發光層。之後，在發光層丄形成電洞傳輸層。 …在本發明之—實施例中，上軸示面板的製造方法在 形成上述框膠之後以及組立第一基板與第二基板之前，更 包括在顯示區_成一液晶層。而且，形成上述晝素陣列 的方去例如疋先在基板上形成多數掃描配線、多數資料配 ，與二數主動70件。其中。這些掃描配線與資料配線在基 反上疋義出多數畫素區域，而各個主動元件是配置於其所 對應之晝素區域内，並與對應之掃瞄配線與資料配線電性 連接。接著，在各晝素區域内形成一晝素電極而與主動元 件電性連接。 在本發明之一實施例中，上述之第二基板為彩色濾光 片（color filter，CF)。 在本發明之一實施例中，上述框膠的厚度例如是介於 4至1〇微米之間。 在本發明之一實施例中，上述之阻隔層的厚度例如是 介於1至6微米之間。 8 200803607^ 17884twf.doc/e 為達上述或是其他目的，本發 板，並包括一篦一莫妃 乃力杈出種顯不面 勝:或U 士 阻隔層、一第二基板以及一框 顯示區與一非顯示區，其中顯示區内 具有-晝素陣列。阻隔層是配置於非顯示 :鱼基板之對侧。框膠是位茲: 土板/、弟-基板之間，其中框膠位於第—基板之非領 内，且阻隔層是位於框膠與畫素陣列之間。 、、°° 在本發明之一實施例中，晝素陣列包括多數掃猫配線 ^及多數純配線、錄主動元件、多數晝素電極、 機官能層以及-制電極。上述之掃描崎與資料配線是 位於基板上，以定義出錄4素區域。各該些主動元件位 於該些晝素區域内，並與對應之掃描配線與資料配線電性 連接。各·晝素電極位於各該些晝素區_，且 之主動元件躲連接。有齡崎是位於晝素電極^。^ 用電極是位於有機官能層上。 在本發明之-實施例中，阻隔層之材料是與上述 瞄配線、資料m動元件、晝素電極、有機官能芦以 及共用電極中其中一元件之材料相同。 胃 在本發明之-實施例中’阻隔層是由上述之掃描配 線、資料配線、主動元件、晝素電極、有機官能層 用電極中任二個或二個以上之元件所使用之材料堆疊ς 成。 在本發明之一實施例中，主動元件為薄膜 在本發明之-實施例中，有機官能層包括^洞傳輸 9 200803607祝 17884twf.doc/e =、一發光層以及一電子傳輸層。電洞傳輸層是位於畫素 電極上。發光層是位於電子傳輸層上。電子傳輸層是=於 發光層上。 ' ^在本發明之一實施例中，晝素陣列包括多數彼此平行 之第-條狀電極、-有機官能層以及多數彼此平行之第二 條狀電極。這些彼此平行的第一條狀電極是位於第一基& 士。有巧官能層是位於第一基板上，且覆蓋上述第一：狀 :本廿這广彼此平行之第—條狀電極是位於有機官能層 ，/、中第二條狀電極與第一條狀電極的延伸方向不同。 在本發明之—實闕巾，阻隔層之材料是與畫素陣列 匕括之任一元件所使用的材料相同。 声、實施财，有射騎包括—電洞傳輸 二ϋ層以及-電子傳輸層。電簡輸層是位於第一 ΐ覆蓋上述第—條狀電極。發光層是位於電洞傳 輸層上。电子傳輸層是位於發光層上。 在本判之-實施财，本發日把黯 =晶層是咖基板與第二一 tr之—實施例中，第二基板為—彩色渡光片。 米之$ 之—實施例中’框膠厚度係介於4至10微 米之Ϊ本發明之—實施财，阻隔層厚度係介於1至6微 本發明係在形成晝素_的_，i於顯示面糾 200803607^ 17884twf.doc/e 非顯示區内形成用以阻擋溢流之框膠的阻隔層。換言之， 本發明毋須額外增加製程，即可避免溢流之框膠對顯示面 板之顯示區内的晝素陣列造成污染。 為讓本發明之上述和其他目的、特徵和優點能更明顯 易懂，下文特舉較佳實施例，並配合所附圖式，作詳細說 明如下。 【實施方式】 圖3A至圖3C為本發明之一較佳實施例中顯示面板的 ^作流程剖面圖。請參照圖3A，首先在第一基板3〇〇上同 時形成畫素陣列310與阻隔層32〇。其中，第一基板3〇〇 具有非顯示區302與顯示區304，且晝素陣列310是形成 於顯示區304内，而阻隔層320則是形成於非顯示區3〇2 内’並圍繞在畫素陣列310之周圍。 值得注意的是’本發明所提供之製程可以用於製造液 晶顯示面板或有機電激發光顯示面板，且熟習此技藝者應 該知道，不同種類的顯示面板，構成其晝素陣列的元件亦 • t相同。町將舉例·分別朗在液晶顯示面板及有機電激 發光顯不面板的製程中，形成晝素陣列31〇的步驟。 圖4A至圖4C為圖3之晝素陣列在本發明之第一實施 例中的製作流程上視圖。圖5A至圖5C則分別為圖4八至 圖4C之結構沿Μ’線的剖面示意圖。請參照圖4A及圖 5A，首先在第一基板300之顯示區3〇4内形成多數第一條 狀，極312，且該些第一條狀電極312是彼此平行地排列 於第一基板300上。此外，第一條狀電極312的材質可以 200803607w 17884twf.doc/e 是金屬材料或是透明導電材質，端視欲製造之有機電激發 光顯示面板係為底部發光型(bottom emission)或頂部發光 型（top emission)。 接著，請參照圖4B及圖5B，在第一基板之顯示區3〇4 内形成一有機官能層314,而覆蓋住第一條狀電極312。其 中’有機官能層314的形成方法例如是蒸鏟(evap0rati〇n)、 旋轉塗佈(spin coating)、喷墨印刷(ink jet printing)、移轉 (transfer)或是印刷(printing)。200803607^17884twf.doc/e IX. Description of the Invention: [Technical Field] The present invention relates to a method of manufacturing a display panel, and more particularly to a method for preventing overflow of a sealant in a display area during a process A display panel manufacturing method in which components are contaminated. [Prior Art] Due to the rapid advancement of the multimedia society, the technology of semiconductor components and display devices has also made great progress. As far as the display is concerned, the organic electroluminescent display (0ELD) has no viewing angle limitation, low manufacturing cost, high response speed, power saving, DC drive for portable machines, and wide operating temperature range. And it is light in weight and can be miniaturized and thinned with hardware devices, etc., and meets the characteristics of the multimedia era display. Therefore, organic electroluminescent display has great potential for development and is expected to be the next generation of novel flat panel displays. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic cross-sectional view showing a conventional organic electroluminescent display panel. Referring to Fig. 1, an organic electroluminescent display panel 1 is mainly composed of a substrate 110, an anode layer 112, an organic functional layer 114, a cathode layer 116, and a substrate 12A. The anode layer η2, the organic functional layer 114 and the cathode layer 116 are sequentially disposed on the substrate 110. Since the organic functional layer 114 is in contact with moisture or oxygen, an interface peeling phenomenon will occur between the anode layer 112 and the cathode layer 116. Therefore, the organic electroluminescent display panel 100 is made of epoxy resin. The sealant 104 is pressed against the substrate 110 and the substrate 12, and is cured by ultraviolet irradiation of the sealant 104 to seal the organic functional layer 5 200803607v 17884twf.doc/e between the substrate 110 and the substrate 120. In addition to this, a block of water absorbing material 106 is formed on the substrate 120 in order to absorb the infiltrated moisture. Although the substrate 120 and the sealant 104 can prevent oxygen and moisture from penetrating into the organic electroluminescent display panel 1 〇〇, if an excessive amount of the sealant 104 is used in order to achieve a better sealing effect, when the substrate 120 is bonded to the substrate no When the pressure of the sealant 104 is unevenly distributed or the pressure of the press-fit is poorly controlled, the sealant 104 is caused to overflow and contact the organic functional layer 114, thereby adversely affecting the luminescence characteristics of the organic functional layer 114. . In order to solve the above problems, an organic electroluminescence display panel has been proposed. As shown in FIG. 2, the organic electroluminescent display panel 2 is formed with a recess 202 on at least one of the anode layer 222 on the upper substrate 210 and the lower substrate 220, and the recess 202 is located in the sealant 204 and organic. Between the functional layers 224. In this way, when the sealant 2〇4 overflows during the assembly process of the upper substrate 21〇 and the lower substrate 220, the excess sealant 2〇4a flows into the groove 202 without contacting the organic Functional layer 224. As can be seen from the above, there must be sufficient space in the recess 202 to accommodate the overflow sealant 204a to prevent the sealant 204a from contacting the organic functional layer 224. Moreover, since the depth of the groove 202 is limited by the thickness of the upper substrate 21 and the anode layer 222, the area of the groove 202 is usually made large. However, if the area of the recess 202 is too large, the aperture ratio of the organic electroluminescence display panel 2A is affected. SUMMARY OF THE INVENTION It is an object of the present invention to provide a method for manufacturing a display panel, which solves the problem of the overflow of the sealant and the contamination of the internal components of the display panel without any additional process cost. . 0 is provided in the t-shaped S-type display panel, and the display panel == forms a barrier layer around the display area to block the overflow of the sealant by the arrangement of the barrier layer. Other purposes are as follows: 'The present invention proposes that the display panel pulls 1, 3, and 提供 first provides the first substrate having the display area and the non-display area to form a halogen array in the display 11 on the first substrate, And the same ^_ display area _ into a barrier layer. Wherein, the barrier layer is surrounded by the display. Then 'in the non-display area _ into the frame glue, and the above blocking ^ is located between the transition and the pixel _. Thereafter, the second substrate is assembled over the substrate, and the relative position of the first substrate and the second substrate is fixed by the sealant. In one embodiment of the present invention, the method of arranging the above-described pixel array is, for example, first recording a scan on a substrate, recording a line, and a majority of the main 2 elements. among them. The scan lines and the data lines define an area of one area on the substrate, and each of the active elements is disposed in the corresponding book area or within the area, and is electrically connected to the corresponding knowledge line and the data line. Then, after a pixel electrode is formed in each of the halogen regions and electrically connected to the active device, an organic functional layer is formed on the halogen electrodes, and a common electrode is formed on the organic functional layer. In an embodiment of the present invention, the active device is, for example, a thin film transistor. In one embodiment of the present invention, the method for forming the above-described pixel array is, for example, first forming a plurality of first parallel to each other on a substrate. The strip electrode is then formed with a mount on the 200803607' 17884twf.doc/e, and the age-energy layer of the towel covers the electrode. The woven fabric is formed on the organic functional layer and parallel to each other. The strip electrode and the second strip of electricity are in the embodiment of the invention, the barrier layer being formed, for example, in at least one step of the above-described formation array. In the embodiment of the invention, the organic The functional layer is identified as follows: an electron transport layer is formed on the pixel electrode, and a light-emitting layer is formed on the electron transport layer. Thereafter, a hole transport layer is formed on the light-emitting layer. In the present invention - an embodiment In the manufacturing method of the upper-axis display panel, after forming the above-mentioned sealant and before assembling the first substrate and the second substrate, the liquid crystal layer is further included in the display region. Moreover, the square pixel array is formed. For example, firstly, a majority of scan lines, a majority of data are arranged on the substrate, and 70 of the two are active. Among them, the scan lines and the data lines are on the basis of the majority of the pixel areas, and the active elements are disposed in the In the corresponding pixel region, the corresponding scan wiring and the data wiring are electrically connected. Then, a halogen electrode is formed in each of the pixel regions to be electrically connected to the active device. The second substrate is a color filter (CF). In one embodiment of the invention, the thickness of the sealant is, for example, between 4 and 1 micron. In the embodiment, the thickness of the barrier layer is, for example, between 1 and 6 micrometers. 8 200803607^ 17884twf.doc/e For the above or other purposes, the hair plate, and including a 篦 妃 妃 妃 杈 杈The display is not contemptuous: or a U barrier layer, a second substrate, and a frame display area and a non-display area, wherein the display area has a halogen matrix. The barrier layer is disposed on the non-display: fish substrate pair Side. Frame glue is the position: earth plate / Between the two substrates, wherein the sealant is located in the non-collar of the first substrate, and the barrier layer is located between the sealant and the pixel array. In one embodiment of the present invention, the halogen array includes a majority Sweep the cat wiring ^ and most of the pure wiring, recording active components, most of the halogen electrodes, the machine functional layer and the - electrode. The above scanning and data wiring is located on the substrate to define the four regions. The component is located in the halogen region and is electrically connected to the corresponding scanning wiring and the data wiring. Each of the halogen electrodes is located in each of the halogen regions _, and the active components are hidden from each other. The electrode is located on the organic functional layer. In the embodiment of the present invention, the material of the barrier layer is one of the above-mentioned sight wiring, data moving component, halogen electrode, organic functional reed, and common electrode. The materials of the components are the same. In the embodiment of the present invention, the barrier layer is a material stack used for any two or more of the above-mentioned scanning wiring, data wiring, active device, halogen electrode, and organic functional layer electrode. to make. In one embodiment of the invention, the active component is a thin film. In an embodiment of the invention, the organic functional layer comprises a hole transport 9 200803607, 17884 twf.doc/e = , a light-emitting layer, and an electron transport layer. The hole transport layer is located on the pixel electrode. The luminescent layer is located on the electron transport layer. The electron transport layer is = on the light-emitting layer. In one embodiment of the invention, the halogen array comprises a plurality of strip-shaped electrodes parallel to each other, an organic functional layer, and a plurality of second strip electrodes parallel to each other. The first strip electrodes parallel to each other are located at the first base & The flexible functional layer is located on the first substrate and covers the first: shape: the first strip-shaped electrode which is parallel to each other is located in the organic functional layer, /, the second strip electrode and the first strip The electrodes extend in different directions. In the actual wipe of the present invention, the material of the barrier layer is the same as that used for any of the elements included in the pixel array. Sound, implementation of wealth, there are shootings including - hole transmission two layers and - electron transport layer. The electrotransmission layer is located at the first ΐ covering the above-mentioned strip-shaped electrode. The luminescent layer is located on the hole transport layer. The electron transport layer is located on the light emitting layer. In this example, the implementation of the fiscal year, the 黯 = crystal layer is the coffee substrate and the second tr - in the embodiment, the second substrate is - color light film. In the embodiment, the thickness of the sealant is between 4 and 10 microns, and the thickness of the barrier layer is between 1 and 6 micrometers. The invention is in the form of 昼, _, i A barrier layer for blocking the overflow of the sealant is formed in the non-display area on the display surface correction 200803607^17884twf.doc/e. In other words, the present invention eliminates the need for additional processing to avoid contamination of the pixel array in the display area of the display panel by overflowing the sealant. The above and other objects, features and advantages of the present invention will become more <RTIgt; [Embodiment] Figs. 3A to 3C are cross-sectional views showing the flow of a display panel in accordance with a preferred embodiment of the present invention. Referring to Fig. 3A, a pixel array 310 and a barrier layer 32 are formed simultaneously on the first substrate 3A. The first substrate 3 has a non-display area 302 and a display area 304, and the pixel array 310 is formed in the display area 304, and the barrier layer 320 is formed in the non-display area 3〇2 and surrounds The periphery of the pixel array 310. It should be noted that the process provided by the present invention can be used to manufacture a liquid crystal display panel or an organic electroluminescent display panel, and those skilled in the art should know that different types of display panels constitute components of their pixel arrays. the same. The town will exemplify the steps of forming a halogen array 31〇 in the process of liquid crystal display panel and organic electroluminescence display panel. 4A to 4C are top views of the fabrication flow of the halogen array of Fig. 3 in the first embodiment of the present invention. 5A to 5C are schematic cross-sectional views of the structure of Figs. 4 to 4C taken along line Μ. Referring to FIG. 4A and FIG. 5A , a plurality of first strips 321 are formed in the display region 3 〇 4 of the first substrate 300 , and the first strip electrodes 312 are arranged in parallel with each other on the first substrate 300 . on. In addition, the material of the first strip electrode 312 can be 200803607w 17884twf.doc/e is a metal material or a transparent conductive material, and the organic electroluminescent display panel to be manufactured is a bottom emission type or a top emission type. (top emission). Next, referring to FIG. 4B and FIG. 5B, an organic functional layer 314 is formed in the display region 3〇4 of the first substrate to cover the first strip electrode 312. The method of forming the 'organic functional layer 314' is, for example, a steaming shovel, a spin coating, an ink jet printing, a transfer, or a printing.
如圖5B所示，有機官能層314例如是依序由電洞注 入層（Hole Injecting Layer，HIL) 314a、電洞傳輸層（Hole Transmission Layer，HTL) 314b、發光層（Emission Layer， EL)314c、電子傳輸層（Electron Transmission Layer，ETL ) 314d 以及電子注入層（Electr〇n Injecting Layer，mL) 3⑷As shown in FIG. 5B, the organic functional layer 314 is, for example, a Hole Injecting Layer (HIL) 314a, a Hole Transport Layer (HTL) 314b, and an Emission Layer (EL) 314c. , Electron Transport Layer (ETL) 314d and Electron Injecting Layer (mL) 3(4)
堆疊而成。然而，在本發明之其他實施例中，有機官能層 314也可以是單層（也就是具有雙極性之發光層）、雙層（電 洞傳輸層314b以及具有電子傳輸性的發光層314c)或三 層（電洞傳輸層314b、發光層314c以及電子傳輸層314d) 的結構。纟習此技藝者應該知道，M成有機官能層314的 堆疊層數係取決於各層材料能階的分佈狀況而定 。因此， 本發明並不限粒成有機官能層314的堆疊層數，端視實 際元件設計之需求而定。 然後’请參照圖4C及圖5C，在有機官能層314上开 多數彼此平行的第二條狀電極316。 ^ 312與第二條狀電極316的延伸方向不同且一般來^ 12 200803607w 17884twf.d〇c/e 第條狀電極312與第二條狀電極316的延伸方向是相互 ，直。當然，第二條狀電極層316也可以是由金屬材料或 是透明導電材料所構成。在形成第二條狀電極316之後， 已大致完成晝素陣列310的製程。由此可知，本實施例所 欲形成^顯示面板為被動式有機電激發光顯示面板。 ^值得庄意的是，圖3A所示之阻隔層320可以在形成 第二條狀電極312、有機官能層314及第二條狀電極316 φ 其中之一的過程中，一併形成於非顯示區302内。換 a之，阻隔層320可以是與第一條狀電極312、有機官能 層314或第二條狀電極316其中之一材質相同的單層膜 層，也可以是由這三種膜層其中兩種以上堆疊而成的複合 層。 當然，在另一實施例中，本發明所提供之方法也可以 用來製造主動式有機電激發光顯示面板。圖6A至圖為 圖3之畫素陣列在本發明之第二實施例中的製作流程上視 圖。圖7A至圖7C則分別為圖6A至圖6C之結構沿Ι-Γ _ 線的剖面示意圖。請參照圖6A與圖7A，在本實施例中， 圖3之晝素陣列310的形成方法例如是先在第一基板3〇〇 上的顯示區304内形成多數掃描配線412、資料配線414 與多數主動元件416。其中，掃描配線412與資料配線414 疋在弟一基板300上定義出多數晝素區域402，而這些主 動元件416即是分別位於該些晝素區域4〇2内，並與對應 之掃描配線412與資料配線414電性連接。在本實施例中， 主動元件416例如是薄膜電晶體。詳細來說，主動元件416 13 200803607w 17884twf.doc/e 可以疋低溫多晶石夕薄膜電晶體（low temperature poly-silicon thin film transistor，LTPS-TFT)或非晶砍薄膜電 晶體(amorphous thin film transistor，a-TFT)，而熟習此技 藝者應該知道這兩種薄膜電晶體的詳細製程，此處不再贅 述。除此之外，雖然圖6A所緣示之主動元件416頂閘極 薄膜電晶體(top gate TFT)，但其並非用以限定本發明。本 發明之主動元件亦可以是底閘極(bottom gate)型態的薄膜 電晶體。 ~ 響請參照圖6B及圖7B，接著在各個晝素區域4〇2内形 成晝素電極418。其中在各晝素區域402内，晝素電極418 是與主動元件416電性連接。之後，請參照圖6C及圖7C， 在這些晝素電極418上形成有機官能層42〇，再於有機官 能層上形成共用電極422。熟習此技藝者應該知道，在形 成有機官能層420之前，會先在基板上形成一畫素定義層 (pixel define layer，PDL)419，用以將在各畫素區域搬内 的有機官能層420隔開。 • 此外，有機官能層420與前一實施例之有機官能層314 (見圖4B)相似，其亦可為單層、雙層、三層或多層之堆 疊結構，此處不再詳述組成有機官能層42〇之膜層。 同樣地，圖Μ所示之阻隔層32〇可以在形成掃描配 線412、資料配線414、主動元件416、晝素電極418、有 機官能層420及共用電極422至少其中之一的過程中，一 併形成於非顯示1 302内。換言之，阻隔層32〇可以是與 掃描配線412、資料配線似、主動元件彻、晝素電極柳 200803607^ 17884tw£doc/e 有機官能層420或共用電極422其中之一材質相同的單層 膜層，也可以是由這些膜層其中兩種以上堆疊而成的複合 / 请，照圖3B，在形成晝素陣列31〇與阻隔層32〇之 後’接著即是在非顯示區3〇2内形成框膠33〇。直中，阻 隔層32〇係位於轉33〇與畫素陣列31〇之間，則更於在 框膠330產生溢流現象時，阻擋溢流之框膠，使其不會接Stacked. However, in other embodiments of the present invention, the organic functional layer 314 may also be a single layer (that is, a light-emitting layer having a bipolar polarity), a double layer (a hole transport layer 314b, and a light-emitting layer 314c having electron transport properties) or The structure of the three layers (the hole transport layer 314b, the light-emitting layer 314c, and the electron transport layer 314d). Those skilled in the art will appreciate that the number of stacked layers of M-forming organic functional layer 314 depends on the distribution of the energy levels of the various layers of material. Therefore, the present invention is not limited to the number of stacked layers of the organic functional layer 314, depending on the needs of the actual component design. Then, referring to Figs. 4C and 5C, a plurality of second strip electrodes 316 which are parallel to each other are formed on the organic functional layer 314. ^ 312 is different from the extending direction of the second strip electrode 316 and generally extends to the direction in which the strip electrodes 312 and the second strip electrodes 316 extend in a straight line. Of course, the second strip electrode layer 316 may also be composed of a metal material or a transparent conductive material. After the formation of the second strip electrode 316, the process of the pixel array 310 has been substantially completed. Therefore, it is understood that the display panel to be formed in this embodiment is a passive organic electroluminescent display panel. It is worth noting that the barrier layer 320 shown in FIG. 3A can be formed in a non-display process in the process of forming one of the second strip electrode 312, the organic functional layer 314 and the second strip electrode 316 φ. Within area 302. Alternatively, the barrier layer 320 may be a single layer of the same material as the first strip electrode 312, the organic functional layer 314 or the second strip electrode 316, or may be composed of two of the three layers. The composite layer stacked above. Of course, in another embodiment, the method provided by the present invention can also be used to fabricate an active organic electroluminescent display panel. Fig. 6A to Fig. 3 are views showing the fabrication flow of the pixel array of Fig. 3 in the second embodiment of the present invention. 7A to 7C are schematic cross-sectional views of the structure of Figs. 6A to 6C taken along the Ι-Γ _ line, respectively. Referring to FIG. 6A and FIG. 7A , in the embodiment, the method for forming the pixel array 310 of FIG. 3 is to form a plurality of scan lines 412 and data lines 414 in the display area 304 on the first substrate 3 . Most active components 416. The scan line 412 and the data line 414 define a plurality of halogen regions 402 on the substrate 300, and the active elements 416 are respectively located in the pixel regions 4〇2 and corresponding to the scan lines 412. It is electrically connected to the data wiring 414. In the present embodiment, the active device 416 is, for example, a thin film transistor. In detail, the active element 416 13 200803607w 17884twf.doc/e can be a low temperature poly-silicon thin film transistor (LTPS-TFT) or an amorphous thin film transistor. , a-TFT), and those skilled in the art should know the detailed process of the two types of thin film transistors, and will not be described here. In addition, although the active device 416 is shown in Fig. 6A as a top gate TFT, it is not intended to limit the present invention. The active device of the present invention may also be a thin film transistor of a bottom gate type. ~ Referring to Fig. 6B and Fig. 7B, a halogen electrode 418 is formed in each of the halogen regions 4A2. The pixel electrodes 418 are electrically connected to the active device 416 in each of the halogen regions 402. Thereafter, referring to Fig. 6C and Fig. 7C, an organic functional layer 42 is formed on these halogen electrodes 418, and a common electrode 422 is formed on the organic functional layer. Those skilled in the art will appreciate that prior to forming the organic functional layer 420, a pixel define layer (PDL) 419 is formed on the substrate to transfer the organic functional layer 420 within each pixel region. Separated. In addition, the organic functional layer 420 is similar to the organic functional layer 314 of the previous embodiment (see FIG. 4B), and may also be a single-layer, double-layer, three-layer or multi-layer stacked structure, which is not detailed herein. The film layer of the functional layer 42〇. Similarly, the barrier layer 32A shown in FIG. 〇 may be in the process of forming at least one of the scan wiring 412, the data wiring 414, the active device 416, the halogen electrode 418, the organic functional layer 420, and the common electrode 422. Formed in non-display 1 302. In other words, the barrier layer 32A may be a single layer of the same material as the scan wiring 412, the data wiring, the active component, the halogen electrode, the 200803607^17884 tw/doc organic organic layer 420, or the common electrode 422. It may also be a composite of two or more of these film layers, as shown in FIG. 3B, after forming the halogen array 31〇 and the barrier layer 32〇, and then forming in the non-display area 3〇2. Frame glue 33 〇. Straight, the barrier layer 32 is located between the turn 33〇 and the pixel array 31〇, and the barrier glue is blocked from being blocked when the sealant 330 overflows.
=，素_ 310。如此—來’即可避免溢流之框朦對有 鼠S月匕層（如目4C之有機官能層^以與圖…之有機官能 層420)造成污染。 …一 由上述可知，本發明並不限定構成阻隔層320的膜層 ^ 要阻隔層320之膜厚足以阻擋溢流之框膠即可。=, prime_310. In this way, the frame of the overflow can be prevented from contaminating the layer of the mouse S-salt layer (such as the organic functional layer of the object 4C and the organic functional layer 420 of the figure). As can be seen from the above, the present invention is not limited to the film layer constituting the barrier layer 320. The film thickness of the barrier layer 320 is sufficient to block the overflow of the sealant.
兄，框膠33G的膜厚例如是介於4至1()微米之間，且 士 =明之第二實施例中’奸在形成主動元件4 =成阻隔層32〇,則阻隔層32G之膜厚例如是切i J 二’、之間。舉例來說，#主動元件4 體，則其膜厚係介於-i至2微米之間，所以血此口：; =同時形成的阻隔層32。當然厚度也是==2 ，、3反之，若主動元件416為低溫多晶矽薄膜雷曰 320，，== 夕，膜電晶體时 ，、膜y予；|於3至6微米之間。 上方請基板配置於第—基板300 並[&弟一基板300與第二基板34〇，以 板340接觸到框膠33Q。接著即是固化框膠⑽，=^ 15 200803607 W 17mtw£doc/e 膠來固定第一基板300與第二基板340的相對位置。此時 即大致完成有機電激發光顯示面板的製程。 ' 特別的是，在壓合第一基板300與第二基板34〇的過 私中，即使因使用過量的框膠330而導致框膠溢流，亦可 利用位於畫素陣列310與框膠330之間的阻隔層320來阻 擋溢流之框膠，以避免其對晝素陣列31〇 (尤其是有機官 月έ層）造成污染。 值得一提的是，在液晶顯示面板的製程中，若尚未固 • 化之框膠接觸到液晶分子，亦會對液晶分子的特性造成不 良的影響。因此，本發明所提供之方法亦適用於製造液晶 顯示面板，下文將舉例稍做說明本發明之液晶顯示面板的 製造方法。 一圖8Α至圖8D繪示為本發明之一較佳實施例中液晶 顯示面板的部分製造流程剖面圖。請參照圖8Α，以主動矩 陣^晶顯示面板(3此”„1紂1^1^1)1)抓6卜人乂_1^1)押助1) 來况’其製程與前述主動式有機電激發光顯示面板相似， ⑩ 均是先在第一基板300之顯示區304内形成晝素陣列，並 同時於非顯示區302内形成阻隔層32〇。在本實施例中， =成晝素陣列的方法例如是先在第—基板3⑽上形成多數 知描配線（未緣示）、資料配線（未緣示）與多數主動元 件516,而其連接關係均如前文所述之掃描配線412、資料 配線414與多數主動元件416相同，此處不再贅述。同樣 地，掃描配線與資料配線是在第一基板300上定義出多數 晝素區域502。而且，主動元件516亦可以是低溫多晶石夕 16 200803607w 17884twf.doc/e 薄膜電晶體或非晶石夕薄膜電晶體。f然，此薄膜電晶體可 以是頂閘極型態或底閘極型態的薄膜電晶體。 请參照圖8B，在各個畫素區域5〇2内形成畫素電極 518。其中，在各晝素區域5〇2内，晝素電極518是與主動 元件516電性連接。同樣地，本實施例之阻隔層32〇可以 在上述形成晝素陣列之至少一步驟中，一併被形成於第一 基板300的非顯示區3〇2内。 請參照圖8C，如同前述實施例所述，在第一基板3〇〇 的非顯示區302内形成框膠33〇，接著再於顯示區3〇4内 形成液晶層520。之後，如圖8D所示，進行壓合基板及固 化框膠等步驟，以組立第一基板3⑻與第二基板54〇，此 即大致完成液晶顯示面板5〇〇的製程。其中，第二基板54〇 例如是一彩色濾光片，其包括一共用電極542。 综上所述，本發明係在形成顯示面板之各個膜層的製 ，中，同時在框膠與晝素陣列之間形成阻隔層，以避免框 膠產生溢流而污染至顯示區内的液晶層或有機官能層。由 此可知，本發明毋須額外增加任何製程，即可在顯示面板 的製程中，避免溢流之框膠對元件造成的不良影響。 雖然本發明已以較佳實施例揭露如上，然其並非用以 限定本發明，任何熟習此技藝者，在不脫離本發明之精神 _、乾圍内’當可作些許之更動與潤飾，因此本發明之保護 範圍當視後附之申請專利範圍所界定者為準。 【圖式簡單說明】 圖1為習知一種有機電激發光顯示面板的剖面示意 17 2 Ο Ο 8 Ο 3 6 Ο 7 w 17884twf doc/e 圖 圖 圖2為習知另-種有機電激發光顯示面板的剖面示意 ，3A至圖3C為本剌之—触實施例中 裂作流程剖面圖。 傲的 句中之4素㈣林發私第-實施 剖面=圖5C分別為圖4A至圖4C之結構沿-線的 例φ=αΛ圖6C為圖3之晝素陣列在本發明之第二實施 例中的製作流程上視圖。 圖7A至圖7C分別為圖6A至圖6c之結構沿w，線的 Μ面示意圖。 圖8Α至圖8D !會示為本發明之一較佳實施例中液晶 .肩示面板的部分製造流程剖面圖。 【主要元件符號說明】 100、200:有機電激發光顯示面板 104、204、330 :框膠 106 ·吸水材料塊 110、120、210、220 :基板 112、222 :陽極層 114、224、314、420 :有機官能層 116 :陰極層 202 :凹槽 18 200803607w 17884twf.doc/e 204a :溢流之框膠 300 ··第一基板 302 :非顯示區 304 :顯示區 310 :畫素陣列 312 :第一條狀電極 314a :電洞注入層 314b :電洞傳輸層 314c ;發光層 314d :電子傳輸層 314e :電子注入層 316 :第二條狀電極 320 :阻隔層 340、540 ··第二基板 402、502 :晝素區域 412 :掃瞄配線 414 :資料配線— 416、516 :主動元件 418、518 :晝素電極 419 :晝素定義層 422 :共用電極 500 ·液晶顯不面板 520 :液晶層 19Brother, the film thickness of the sealant 33G is, for example, between 4 and 1 (micrometers), and in the second embodiment of the second embodiment, the film of the barrier layer 32G is formed in the active element 4 = the barrier layer 32 Thickness is for example cut between i and J'. For example, #active element 4 body, its film thickness is between -i and 2 microns, so blood this port:; = simultaneously formed barrier layer 32. Of course, the thickness is also ==2, and 3 is opposite. If the active element 416 is a low temperature polycrystalline germanium film Thunder 320, == eve, when the film is a transistor, the film y is given; | between 3 and 6 microns. The upper substrate is disposed on the first substrate 300 and the substrate 300 and the second substrate 34 are contacted, and the plate 340 is brought into contact with the sealant 33Q. Then, the sealant (10) is cured, and the relative position of the first substrate 300 and the second substrate 340 is fixed. At this time, the process of the organic electroluminescent display panel is substantially completed. In particular, in the over-pressing of the first substrate 300 and the second substrate 34, even if the frame glue overflows due to the excessive use of the sealant 330, the pixel array 310 and the sealant 330 can be utilized. The barrier layer 320 is interposed to block the overflow of the sealant to avoid contamination of the halogen array 31 (especially the organic moon layer). It is worth mentioning that in the process of the liquid crystal display panel, if the sealant which has not been solidified contacts the liquid crystal molecules, the characteristics of the liquid crystal molecules may be adversely affected. Therefore, the method provided by the present invention is also applicable to the manufacture of a liquid crystal display panel, and a method of manufacturing the liquid crystal display panel of the present invention will be exemplified hereinafter. 8A through 8D are cross-sectional views showing a part of a manufacturing process of a liquid crystal display panel in accordance with a preferred embodiment of the present invention. Please refer to Figure 8Α, the active matrix ^ crystal display panel (3 this "„1纣1^1^1) 1) grasp 6 乂人乂_1^1) 押 1) condition 'the process and the aforementioned active The organic electroluminescent display panel is similar in that 10 is formed into a pixel array in the display area 304 of the first substrate 300, and a barrier layer 32 is formed in the non-display area 302 at the same time. In the present embodiment, the method of forming a pixel array is, for example, first forming a majority of the trace lines (not shown), data lines (not shown), and a plurality of active elements 516 on the first substrate 3 (10), and the connection relationship thereof. The scan wiring 412 and the data wiring 414 are the same as the majority of the active components 416 as described above, and are not described herein again. Similarly, the scan wiring and the data wiring define a plurality of halogen regions 502 on the first substrate 300. Moreover, the active element 516 can also be a low temperature polycrystalline stone phoenix 16 200803607w 17884 twf.doc / e thin film transistor or amorphous slab thin film transistor. However, the thin film transistor may be a thin film transistor of a top gate type or a bottom gate type. Referring to Fig. 8B, a pixel electrode 518 is formed in each pixel region 5〇2. The halogen electrode 518 is electrically connected to the active element 516 in each of the halogen regions 5〇2. Similarly, the barrier layer 32 of the present embodiment may be formed in the non-display area 3〇2 of the first substrate 300 in at least one of the steps of forming the pixel array. Referring to FIG. 8C, as in the foregoing embodiment, the sealant 33 is formed in the non-display area 302 of the first substrate 3, and then the liquid crystal layer 520 is formed in the display area 3〇4. Thereafter, as shown in Fig. 8D, steps of laminating the substrate and curing the frame rubber are performed to assemble the first substrate 3 (8) and the second substrate 54, which substantially completes the process of the liquid crystal display panel 5. The second substrate 54 is, for example, a color filter including a common electrode 542. In summary, the present invention forms a barrier layer between the sealant and the halogen array in the formation of the film layers of the display panel, so as to prevent the sealant from overflowing and contaminating the liquid crystal in the display area. Layer or organic functional layer. It can be seen from the above that the present invention does not require any additional process, and the adverse effect of the overflow of the sealant on the component can be avoided in the process of the display panel. Although the present invention has been disclosed in the above preferred embodiments, it is not intended to limit the present invention, and those skilled in the art can make some modifications and refinements without departing from the spirit of the present invention. The scope of the invention is defined by the scope of the appended claims. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a schematic cross-sectional view of a conventional organic electroluminescent display panel. 17 2 Ο Ο 8 Ο 3 6 Ο 7 w 17884 twf doc/e FIG. 2 is a conventional organic electroluminescence The cross-sectional view of the display panel, 3A to 3C is a cross-sectional view of the cracking process in the embodiment of the present invention. 4 of the proud sentences (4) Linfa private - implementation profile = Figure 5C is the example of the structure of Figure 4A to Figure 4C along the line - φ = α Λ Figure 6C is the 昼 Array of Figure 3 in the second aspect of the present invention The top view of the production process in the embodiment. 7A to 7C are schematic views showing the structure of Figs. 6A to 6c along the line w and the line, respectively. 8A to 8D are cross-sectional views showing a part of a manufacturing process of a liquid crystal display panel according to a preferred embodiment of the present invention. [Main component symbol description] 100, 200: organic electroluminescent display panel 104, 204, 330: sealant 106 · water absorbing material block 110, 120, 210, 220: substrate 112, 222: anode layer 114, 224, 314, 420: organic functional layer 116: cathode layer 202: groove 18 200803607w 17884twf.doc/e 204a: overflow frame glue 300 · first substrate 302: non-display area 304: display area 310: pixel array 312: Strip electrode 314a: hole injection layer 314b: hole transport layer 314c; light emitting layer 314d: electron transport layer 314e: electron injection layer 316: second strip electrode 320: barrier layer 340, 540 · second substrate 402 502: halogen region 412: scan wiring 414: data wiring - 416, 516: active device 418, 518: halogen electrode 419: halogen defining layer 422: common electrode 500 · liquid crystal display panel 520: liquid crystal layer 19