TW200745537A - Contamination monitoring and control techniques for use with an optical metrology instrument - Google Patents

Contamination monitoring and control techniques for use with an optical metrology instrument

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Publication number
TW200745537A
TW200745537A TW096112154A TW96112154A TW200745537A TW 200745537 A TW200745537 A TW 200745537A TW 096112154 A TW096112154 A TW 096112154A TW 96112154 A TW96112154 A TW 96112154A TW 200745537 A TW200745537 A TW 200745537A
Authority
TW
Taiwan
Prior art keywords
metrology instrument
optical metrology
instrument
control techniques
contamination monitoring
Prior art date
Application number
TW096112154A
Other languages
Chinese (zh)
Other versions
TWI437225B (en
Inventor
Dale A Harrison
Matthew Weldon
Original Assignee
Metrosol Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US11/600,477 external-priority patent/US7663747B2/en
Priority claimed from US11/600,414 external-priority patent/US7622310B2/en
Priority claimed from US11/600,413 external-priority patent/US7342235B1/en
Application filed by Metrosol Inc filed Critical Metrosol Inc
Publication of TW200745537A publication Critical patent/TW200745537A/en
Application granted granted Critical
Publication of TWI437225B publication Critical patent/TWI437225B/en

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  • Investigating Or Analysing Materials By Optical Means (AREA)

Abstract

A technique is provided for generating and subsequently monitoring the controlled environment(s) within an optical metrology instrument in such a manner as to minimize absorbing species within the light path of the metrology instrument and to minimize the build-up of contaminants on the surfaces of optical elements that may result in performance degradation. Both evacuation and backfill techniques may be utilized together along with a monitoring technique to determine if the environmental is suitable for measurements or if the environment should be regenerated. The optical metrology instrument may be an instrument which operates at wavelengths that include vacuum ultra-violet (VUV) wavelengths.
TW96112154A 2006-04-27 2007-04-04 Contamination monitoring and control techniques for use with an optical metrology instrument TWI437225B (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US79546706P 2006-04-27 2006-04-27
US11/600,477 US7663747B2 (en) 2006-04-27 2006-11-16 Contamination monitoring and control techniques for use with an optical metrology instrument
US11/600,414 US7622310B2 (en) 2006-04-27 2006-11-16 Contamination monitoring and control techniques for use with an optical metrology instrument
US11/600,413 US7342235B1 (en) 2006-04-27 2006-11-16 Contamination monitoring and control techniques for use with an optical metrology instrument

Publications (2)

Publication Number Publication Date
TW200745537A true TW200745537A (en) 2007-12-16
TWI437225B TWI437225B (en) 2014-05-11

Family

ID=51300994

Family Applications (1)

Application Number Title Priority Date Filing Date
TW96112154A TWI437225B (en) 2006-04-27 2007-04-04 Contamination monitoring and control techniques for use with an optical metrology instrument

Country Status (1)

Country Link
TW (1) TWI437225B (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101981504A (en) * 2008-04-01 2011-02-23 Asml荷兰有限公司 Lithographic apparatus and contamination detection method
TWI482954B (en) * 2010-03-31 2015-05-01 Alcatel Lucent Optical reflectometry monitoring apparatus
CN108614070A (en) * 2016-12-12 2018-10-02 毅泰成科技股份有限公司 Gas concentration analysis system

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101981504A (en) * 2008-04-01 2011-02-23 Asml荷兰有限公司 Lithographic apparatus and contamination detection method
US8547551B2 (en) 2008-04-01 2013-10-01 Asml Netherlands B.V. Lithographic apparatus and contamination detection method
TWI482954B (en) * 2010-03-31 2015-05-01 Alcatel Lucent Optical reflectometry monitoring apparatus
CN108614070A (en) * 2016-12-12 2018-10-02 毅泰成科技股份有限公司 Gas concentration analysis system

Also Published As

Publication number Publication date
TWI437225B (en) 2014-05-11

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