TW200745537A - Contamination monitoring and control techniques for use with an optical metrology instrument - Google Patents
Contamination monitoring and control techniques for use with an optical metrology instrumentInfo
- Publication number
- TW200745537A TW200745537A TW096112154A TW96112154A TW200745537A TW 200745537 A TW200745537 A TW 200745537A TW 096112154 A TW096112154 A TW 096112154A TW 96112154 A TW96112154 A TW 96112154A TW 200745537 A TW200745537 A TW 200745537A
- Authority
- TW
- Taiwan
- Prior art keywords
- metrology instrument
- optical metrology
- instrument
- control techniques
- contamination monitoring
- Prior art date
Links
Landscapes
- Investigating Or Analysing Materials By Optical Means (AREA)
Abstract
A technique is provided for generating and subsequently monitoring the controlled environment(s) within an optical metrology instrument in such a manner as to minimize absorbing species within the light path of the metrology instrument and to minimize the build-up of contaminants on the surfaces of optical elements that may result in performance degradation. Both evacuation and backfill techniques may be utilized together along with a monitoring technique to determine if the environmental is suitable for measurements or if the environment should be regenerated. The optical metrology instrument may be an instrument which operates at wavelengths that include vacuum ultra-violet (VUV) wavelengths.
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US79546706P | 2006-04-27 | 2006-04-27 | |
US11/600,477 US7663747B2 (en) | 2006-04-27 | 2006-11-16 | Contamination monitoring and control techniques for use with an optical metrology instrument |
US11/600,414 US7622310B2 (en) | 2006-04-27 | 2006-11-16 | Contamination monitoring and control techniques for use with an optical metrology instrument |
US11/600,413 US7342235B1 (en) | 2006-04-27 | 2006-11-16 | Contamination monitoring and control techniques for use with an optical metrology instrument |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200745537A true TW200745537A (en) | 2007-12-16 |
TWI437225B TWI437225B (en) | 2014-05-11 |
Family
ID=51300994
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW96112154A TWI437225B (en) | 2006-04-27 | 2007-04-04 | Contamination monitoring and control techniques for use with an optical metrology instrument |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI437225B (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101981504A (en) * | 2008-04-01 | 2011-02-23 | Asml荷兰有限公司 | Lithographic apparatus and contamination detection method |
TWI482954B (en) * | 2010-03-31 | 2015-05-01 | Alcatel Lucent | Optical reflectometry monitoring apparatus |
CN108614070A (en) * | 2016-12-12 | 2018-10-02 | 毅泰成科技股份有限公司 | Gas concentration analysis system |
-
2007
- 2007-04-04 TW TW96112154A patent/TWI437225B/en active
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101981504A (en) * | 2008-04-01 | 2011-02-23 | Asml荷兰有限公司 | Lithographic apparatus and contamination detection method |
US8547551B2 (en) | 2008-04-01 | 2013-10-01 | Asml Netherlands B.V. | Lithographic apparatus and contamination detection method |
TWI482954B (en) * | 2010-03-31 | 2015-05-01 | Alcatel Lucent | Optical reflectometry monitoring apparatus |
CN108614070A (en) * | 2016-12-12 | 2018-10-02 | 毅泰成科技股份有限公司 | Gas concentration analysis system |
Also Published As
Publication number | Publication date |
---|---|
TWI437225B (en) | 2014-05-11 |
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