TW200742717A - Reticle case - Google Patents

Reticle case

Info

Publication number
TW200742717A
TW200742717A TW096116310A TW96116310A TW200742717A TW 200742717 A TW200742717 A TW 200742717A TW 096116310 A TW096116310 A TW 096116310A TW 96116310 A TW96116310 A TW 96116310A TW 200742717 A TW200742717 A TW 200742717A
Authority
TW
Taiwan
Prior art keywords
reticle
reticle case
case
respiratory valve
cover body
Prior art date
Application number
TW096116310A
Other languages
Chinese (zh)
Inventor
Chiaki Matsutori
Koichi Yanagihara
Original Assignee
Miraial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Miraial Co Ltd filed Critical Miraial Co Ltd
Publication of TW200742717A publication Critical patent/TW200742717A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67353—Closed carriers specially adapted for a single substrate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67359—Closed carriers specially adapted for containing masks, reticles or pellicles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67389—Closed carriers characterised by atmosphere control
    • H01L21/67393—Closed carriers characterised by atmosphere control characterised by the presence of atmosphere modifying elements inside or attached to the closed carrierl
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67396—Closed carriers characterised by the presence of antistatic elements

Abstract

It is possible to provide means for preventing electrification of a reticle case and electrostatic adhesion of foreign matters to a reticle and the reticle case, and surely acquiring reticle information. Firstly, a transparent window is arranged on the upper and the lower surface of the reticle case. Thus, it is possible to observe the reticle state and reticle information in the reticle case. Secondly, the reticle case excluding the transparent windows is formed by a non-electrifiable and continuous material. This prevents electrification of the reticle case. Thirdly, a respiratory valve and a chemical absorber are arranged on the reticle case. This can always maintain a clean environment inside the reticle case. The respiratory valve has a structure not protruding from the external surface of the reticle case. Accordingly, it is possible to connect and fix a cover body to a reticle case body by a fixed slider by using V-shaped grooves formed on the side surfaces of the reticle case body and the cover body. Moreover, it is possible to prevent damage of the respiratory valve and easily handle the reticle case.
TW096116310A 2006-05-12 2007-05-08 Reticle case TW200742717A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006133211 2006-05-12
JP2006173631A JP2007329439A (en) 2006-05-12 2006-06-23 Reticle case

Publications (1)

Publication Number Publication Date
TW200742717A true TW200742717A (en) 2007-11-16

Family

ID=38693795

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096116310A TW200742717A (en) 2006-05-12 2007-05-08 Reticle case

Country Status (3)

Country Link
JP (1) JP2007329439A (en)
TW (1) TW200742717A (en)
WO (1) WO2007132698A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104071464A (en) * 2013-03-26 2014-10-01 家登精密工业股份有限公司 Light shield box with gas guiding device

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009229639A (en) * 2008-03-21 2009-10-08 E-Sun Precision Industrial Co Ltd Photomask case
JP2009227304A (en) * 2008-03-24 2009-10-08 E-Sun Precision Industrial Co Ltd Mask transfer container having deposition-conductive effect
JP4965510B2 (en) * 2008-05-28 2012-07-04 信越化学工業株式会社 Transport device
JP2019149435A (en) * 2018-02-27 2019-09-05 株式会社協同 Probe card storage case
JP2019197010A (en) * 2018-05-11 2019-11-14 株式会社協同 Probe card storage case
CN109116677A (en) * 2018-09-07 2019-01-01 无锡中微掩模电子有限公司 A kind of general mask box
JP7291684B2 (en) * 2018-10-29 2023-06-21 家登精密工業股▲ふん▼有限公司 Reticle holding system
CN111290215A (en) * 2018-12-06 2020-06-16 家登精密工业股份有限公司 Light shield container
KR102172722B1 (en) * 2018-12-26 2020-11-02 주식회사 에프에스티 Sealing capsule for inspecting extreme ultra violet lithography pellicle
US11104496B2 (en) * 2019-08-16 2021-08-31 Gudeng Precision Industrial Co., Ltd. Non-sealed reticle storage device
TWI769547B (en) 2019-10-10 2022-07-01 美商恩特葛瑞斯股份有限公司 Reticle pod with window

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63178974A (en) * 1987-01-07 1988-07-23 日本電気株式会社 Reticle protective case
JP2005086092A (en) * 2003-09-10 2005-03-31 Tokyo Seimitsu Co Ltd Exposure mask container

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104071464A (en) * 2013-03-26 2014-10-01 家登精密工业股份有限公司 Light shield box with gas guiding device

Also Published As

Publication number Publication date
WO2007132698A1 (en) 2007-11-22
JP2007329439A (en) 2007-12-20

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