JP2009227304A - Mask transfer container having deposition-conductive effect - Google Patents

Mask transfer container having deposition-conductive effect Download PDF

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JP2009227304A
JP2009227304A JP2008075153A JP2008075153A JP2009227304A JP 2009227304 A JP2009227304 A JP 2009227304A JP 2008075153 A JP2008075153 A JP 2008075153A JP 2008075153 A JP2008075153 A JP 2008075153A JP 2009227304 A JP2009227304 A JP 2009227304A
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conductive
mask
transfer container
base
unit
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Liwen Liao
莉▲ぶん▼ 廖
Liyin Chen
俐慇 陳
Shiwen Lu
詩文 盧
Minggui Cai
銘貴 蔡
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E SUN PREC IND CO Ltd
E-SUN PRECISION INDUSTRIAL CO Ltd
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E SUN PREC IND CO Ltd
E-SUN PRECISION INDUSTRIAL CO Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a mask transfer container having a deposition-conductive effect. <P>SOLUTION: The mask transfer container structure is capable of preventing generation of static electricity when mask transfer containers are deposited, and includes a bottom base 10 and a shell body 2. The shell body 2 selectively places a cover on the bottom base 10 to form a storage space for placing a mask 50. A passage for conducting the static electricity is formed between the bottom base 10, the shell body 2, and the mask 50. A handle 24 to be communicated with the passage is provided on an upper surface of the shell body. The bottom base 10 has at least one conductive structure and a touch-conductive unit 40. The conductive structure has conductive pillars 32 and 35 which are connected to the passage and projected downward. The touch-conductive unit 40 is brought into contact with the handle 24 of the lower transfer container when the transfer containers are deposited adjacent to each other. The static electricity between the adjacent transfer container and the mask 50 can be conducted via the touch-conductive unit 40 and a conductive unit 30 to reduce breakage of the mask pattern. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

本発明は、マスク移載容器の静電除去技術に関し、具体的には、静電の発生、残留を防止する移載容器を指し、移載容器とマスクの静電を効率的に導出することによって、コストを低減するマスク移載容器の静電除去技術に関する。   The present invention relates to an electrostatic removal technique for a mask transfer container, and specifically refers to a transfer container that prevents the generation and residual of static electricity, and efficiently derives the static electricity of the transfer container and the mask. The present invention relates to an electrostatic removal technique for a mask transfer container that reduces costs.

電子製品が絶え間なく軽薄短小、高周波、高性能等の特性に発展する影響によって、そのコアチップは、更に微小化、高性能化を必要としているので、チップ上の集積回路の線径は微細化し、より多くの集積回路とユニットを収容できるようにする必要がある。従って現有の集積回路の線径は早期の0.25μmから90〜45nm等のプロセスへ発展しており、更にウエハー寸法は8インチから12インチに発展しており、不良品の発生時に起こる損害は驚くべきものである。半導体製造プロセス中、環境中に受ける各種の異なる原因の影響は、各種微粒子、水分または溶剤が放出する有害物質等が存在し、製造プロセス中の加熱、堆積、静電または化学変化等の要素がマスクまたはウエハーの表面に付着することによって、製造プロセスの歩留まりに直接影響を及ぼし、この問題を処理するため、メーカーは前記の問題および要素に対して逐一改良を行い、想定外の清掃またはプロセスの繰り返しを減少させ、更には、ウエハーの生産コストを低減することを必要としている。   The core chip needs to be further miniaturized and improved in performance due to the continuous development of electronic products with characteristics such as light and thin, high frequency, high performance, etc. Therefore, the wire diameter of the integrated circuit on the chip has been reduced, There is a need to be able to accommodate more integrated circuits and units. Therefore, the wire diameter of existing integrated circuits has evolved from an early 0.25 μm process to 90-45 nm, and the wafer size has evolved from 8 inches to 12 inches. The damage that occurs when defective products occur is surprising. It should be. During the semiconductor manufacturing process, the effects of various different causes on the environment include various fine particles, harmful substances released by moisture or solvent, etc., and factors such as heating, deposition, electrostatic or chemical changes during the manufacturing process are present. In order to deal directly with the yield of the manufacturing process by adhering to the surface of the mask or wafer, and to deal with this problem, manufacturers have made improvements to the aforementioned problems and factors in order to avoid unexpected cleaning or process failures. There is a need to reduce repetition and further reduce wafer production costs.

但し、前記集積回路の微細化の影響を受け、従来の単純な無塵室で行うプロセスでは徐々に満足されなくなり、更に高清潔度が要求されているので、本業界では米国特許第4,532,970号(特許文献1)および米国特許第4,534,389号(特許文献2)のようなウエハー、マスク密閉移転システムを開発し、それぞれの移載容器を介して製造プロセス中のウエハーまたはマスクを載置し、無塵室の環境中の微粒子、水分または有害物質がマスクまたはウエハー近隣の環境中に進入しないように確保することができる。   However, under the influence of the miniaturization of the integrated circuit, the conventional process performed in a simple dust-free chamber gradually becomes unsatisfactory, and further high cleanliness is required. Therefore, in this industry, US Pat. No. 4,532,970 ( Developed wafer and mask sealed transfer systems such as US Pat. No. 4,534,389 (Patent Document 1) and US Pat. No. 4,534,389 (Patent Document 2). It can be ensured that particulates, moisture or harmful substances in the room environment do not enter the environment near the mask or wafer.

但し、半導体製造プロセス中、マスクサークル製作、スパッタリング、フォトリソグラフィー、エッチングまたはマスク清掃等を問わず、いずれも多くの溶剤と化学品の使用を必要とし、受熱、摩擦または化学変化等によって前記密閉移載システム内部に微粒子等の有害物質が自然発生し、且つマスクの製造プロセス中にレーザー照射または受熱等の異なる原因により静電を発生し、マスクを前記移載容器中においた後、これらの有害物質の微粒子が静電の影響によって迅速且つ大量にマスク表面に吸着し、マスク表面のパターンを破壊し、露光不良の現象を起こし、ウエハーの歩留まりに大きく影響し、従って、マスクパターンが汚染される時、清掃の動作が必要であり、汚れが一定の程度に達した時、マスクパターンの再作成が必要であり、設備、時間および材料のコストが増加し、半導体メーカーの運営コストを上昇させる。   However, regardless of mask circle fabrication, sputtering, photolithography, etching, mask cleaning, etc. during the semiconductor manufacturing process, all of them require the use of many solvents and chemicals. Hazardous substances such as fine particles are naturally generated inside the mounting system, and static electricity is generated due to different causes such as laser irradiation or heat reception during the mask manufacturing process. After the mask is placed in the transfer container, these harmful substances are generated. The fine particles of the substance are adsorbed to the mask surface quickly and in large quantities due to the influence of static electricity, destroying the mask surface pattern, causing a phenomenon of exposure failure, greatly affecting the yield of the wafer, and thus contaminating the mask pattern. Cleaning operation is necessary, and when the dirt reaches a certain level, it is necessary to recreate the mask pattern. , Equipment, an increase in the cost of time and materials, increase the operating costs of semiconductor manufacturers.

従って、マスクを保護および転送する移載容器は静電除去の設計を有する必要があり、現有のプラスチックで製造された移載容器は、射出時に、材料中に抗静電材料を添加して抗静電の目的を達成し、抗静電複合材料は、通常プラスチックベース中に導電性能を有する添加剤を混入することによって、材料に導電、抗静電機能を持たせ、これらの典型的な添加剤は、カーボンブラック、金属繊維、ナノメートル導電金属粉等(ポリウレタン-ポリアニリンおよび導電カーボンブラック等)を有するが、このような方法は、材料のコストが非常に高く、移載容器の製造コストが増加するだけではなく、更に硫黄、アンモニア等の有害物質を絶え間なく放出し、マスク表面結晶を例とし、その化学式が(NH42SO4 であり、この結晶物が前記異なる原因によりアンモニア(NH4 +)および硫酸イオン(SO4 2-)を放出し、高エネルギーの光源と環境の湿気等と化合されるので、マスク清掃後、ある程度の時間保存した後にフォトリソグラフィープロセス中の紫外線照射により露光しようとすれば、結晶の現象が発生する。 Therefore, a transfer container that protects and transfers the mask must have an electrostatic removal design, and a transfer container made of existing plastics has an anti-static material added to the material at the time of injection. Achieving the purpose of electrostatic, anti-static composite materials usually have conductive and anti-electrostatic functions by mixing additives with conductive performance in the plastic base, and these typical additions The agent has carbon black, metal fiber, nanometer conductive metal powder, etc. (polyurethane-polyaniline, conductive carbon black, etc.), but such a method has a very high material cost and a transfer container manufacturing cost. Not only increases, but also continually releases harmful substances such as sulfur and ammonia, and the mask surface crystal is taken as an example, and its chemical formula is (NH 4 ) 2 SO 4 , and this crystal is different from the above Ammonia (NH 4 + ) and sulfate ions (SO 4 2− ) are released due to the cause and combined with a high-energy light source and environmental moisture, etc. After the mask is cleaned and stored for a certain period of time, it is in the photolithography process If the exposure is attempted by irradiating with ultraviolet rays, a crystal phenomenon occurs.

従って、市場において、多種のマスク移載容器に用いる静電導出構造が開発され、例えば、台湾専利公告第M252140号(特許文献3)の「マスク搬送ケースの静電防止装置」は、基台を有し、且つ基台周縁に複数の定位部を有し、各定位部に対応して複数の定位部材を設け、その内部の金属内マスクとフォトマスク上の静電を抗静電材料を含む基台に導き、ラッチ構造を介して移載容器が置かれる金属平台上に導くが、このような構造設計は、複雑であるだけではなく、導電効果が良好ではなく、静電が円滑に導出できない現象がしばしば発生する。更に、マスク用の移載容器が運送される時、台車を運送する空間を節約するため、マスクの載送量を増加し、一般は、移載容器を逐一層に堆積し、移載容器が相互に隣接する移載容器と併せた導電構造を設けていないので、上層の移載容器の静電が導出されることができず、相互に隣接する移載容器間が運送の揺動によって相互に摩擦され、静電を発生し、それを円滑に導出することができず、この時、上層が金属平台と接触していない移載容器がキャパシタ効果を発生し、静電反応を増加させ、内部のマスクに静電によって微粒子が付着し、マスク洗浄またはパターン再形成の時間とコストが増加する。
米国特許第4,532,970号明細書 米国特許第4,534,389号明細書 台湾専利公告第M252140号明細書
Accordingly, electrostatic deriving structures for use in various mask transfer containers have been developed in the market. For example, the “antistatic device for mask carrying case” disclosed in Taiwan Patent No. M252140 (Patent Document 3) is based on And having a plurality of localization parts on the periphery of the base, and providing a plurality of localization members corresponding to each localization part, including an anti-electrostatic material for static electricity on the internal metal mask and the photomask. It leads to the base and leads to the metal flat base where the transfer container is placed through the latch structure, but such a structural design is not only complicated, but also the conductive effect is not good and the static electricity is derived smoothly Unusable phenomena often occur. Further, when the transfer container for the mask is transported, in order to save the space for transporting the carriage, the amount of the mask transported is increased. Generally, the transfer container is deposited one by one. Since the conductive structure combined with the transfer containers adjacent to each other is not provided, the static electricity of the transfer container on the upper layer cannot be derived, and the transfer containers adjacent to each other cannot be connected to each other by the swinging of the transport. The transfer container whose upper layer is not in contact with the metal platform generates a capacitor effect and increases the electrostatic reaction. Fine particles adhere to the internal mask due to static electricity, increasing the time and cost of mask cleaning or pattern re-formation.
U.S. Pat.No. 4,532,970 U.S. Pat.No. 4,534,389 Taiwan Exclusive Notification M252140 Specification

従って、本発明は上述した問題点に鑑みてなされたもので、現有するマスク移載容器が直面する問題に対して、移載容器の堆積時の静電を導出する要求を深く検討し、堆積導電作用を有する移載容器を開発し、移載容器の静電除去時の不便と困難を効率的に解決し、相互に堆積された移載容器が効率的に静電を導出できるようにすることを課題としたものである。
本発明は、上下相互に堆積されたマスク移載容器の静電を導出し、上層の移載容器にキャパシタ効果が発生することを防止する堆積導電作用を有する移載容器を提供することを目的とする。
また、本発明は、導電の確実性を維持し、導電不良の問題を発生することを防止する堆積導電作用を有するマスク積載容器を提供することを目的とする。
Therefore, the present invention has been made in view of the above-described problems, and in consideration of the problems faced by the existing mask transfer container, the demand for deriving the static electricity at the time of deposition of the transfer container is studied in detail. Develop a transfer container with conductive action, efficiently solve the inconvenience and difficulty when removing the electrostatic charge of the transfer container, and allow the transfer containers stacked on each other to efficiently derive the static electricity This is an issue.
SUMMARY OF THE INVENTION An object of the present invention is to provide a transfer container having a conductive conductive action for deriving the static electricity of mask transfer containers stacked on top and bottom and preventing the capacitor effect from occurring in an upper transfer container. And
It is another object of the present invention to provide a mask loading container having a deposited conductive action that maintains the reliability of conduction and prevents the problem of poor conduction.

これに基づき、本発明は下記の技術的手段に基づき、前記の効果および目的を具体的に実現する。
請求項1の発明の堆積導電作用を有するマスク移載容器は、マスクを収容することに用い、マスクを載置させることができる底台であって、該底台上面に金属板を有し、金属板とマスクとの間に導電通路を形成してなる底台と、
前記底台と対応して選択的に覆蓋または分離できる殻体であって、且つ殻体内に前記金属板と接触する金属内部ライニングを設け、殻体上面に金属内部ライニングと導電通路を形成する把手を設ける殻体と、
前記底台上に設けられる導電ユニットであって、該導電ユニットが底台金属板と外部導体との間に導電通路を形成させることができる少なくとも1つの導電ユニットと、
前記底台が対応する下層が隣接する移載容器の把手側辺に設けられる触導ユニットであって、触導ユニットが導電ブロックを有し、該導電ブロックが底台の金属板と下層隣接移載容器の把手側辺との間に導電通路を形成する少なくとも1つの蝕導ユニットとを含む。
Based on this, the present invention specifically realizes the above effects and objects based on the following technical means.
The mask transfer container having a deposited conductive action according to the invention of claim 1 is a base that can be used for housing the mask and on which the mask can be placed, and has a metal plate on the top surface of the base. A base formed by forming a conductive path between the metal plate and the mask;
A shell that can be selectively covered or separated corresponding to the base, and a metal internal lining that contacts the metal plate is provided in the shell, and a metal internal lining and a conductive passage are formed on the upper surface of the shell. A shell for providing
A conductive unit provided on the base, wherein the conductive unit is capable of forming a conductive path between the base metal plate and the external conductor; and
A touching unit provided on a handle side of an adjacent transfer container to which a lower layer corresponding to the bottom is adjacent, the touching unit having a conductive block, and the conductive block is adjacent to the bottom metal plate and the lower layer. And at least one conductive unit that forms a conductive path between the handle side of the loading container.

請求項2の発明は、請求項1記載の堆積導電作用を有するマスク移載容器において、前記底台が金属板状面に2つの相互に対応し、且つ平行に配列される載置台を設け、また、底台上面が2つの載置台の一端に対応してマスクを貼り付ける係止部材を設けることを特徴とする。
請求項3の発明は、請求項1記載の堆積導電作用を有するマスク移載容器において、前記導電ユニットが底台上に収容溝台を形成し、且つ導電ユニットが第1導電柱と第2導電柱を有し、第1導電柱が収容溝台底面を貫通できる接触段を有し、外部導体と接触し、第1導電柱上端が外向きに回復力を発生できる金属弾性部材を設け、第2導電柱は弾性部材の上端に設けられ、第2導電柱が金属片底面に接触を保持できるようにしてなることを特徴とする。
A second aspect of the present invention is the mask transfer container having the deposited conductive action according to the first aspect, wherein the base is provided with a mounting table on the metal plate-like surface that corresponds to each other and is arranged in parallel. Further, the bottom base upper surface is provided with a locking member for attaching a mask corresponding to one end of the two mounting bases.
According to a third aspect of the present invention, in the mask transfer container having the deposited conductive action according to the first aspect, the conductive unit forms a receiving groove base on the bottom base, and the conductive unit includes the first conductive column and the second conductive column. A metal elastic member having a column, having a contact step through which the first conductive column can penetrate the bottom surface of the receiving groove base, contacting with an external conductor, and generating an restoring force outwardly from the upper end of the first conductive column; The two conductive columns are provided at the upper end of the elastic member, and the second conductive columns are configured to be able to keep contact with the bottom surface of the metal piece.

請求項4の発明は、請求項1記載の堆積導電作用を有するマスク移載容器において、前記底台底面に把手に対応する定位溝を形成し、下層移載容器の把手が上層移載容器の定位溝内に嵌合でき、触導ユニットが定位溝の両側に設けられ、且つ導電ブロックが把手両側と接触できることを特徴とする。
請求項5の発明は、請求項1記載の堆積導電作用を有するマスク移載容器において、前記触導ユニットの導電ブロック外縁に1つまたは複数の凸環歯を形成し、固定効果を向上させることを特徴とする。
請求項6の発明は、請求項1記載の堆積導電作用を有するマスク移載容器において、前記触導ユニットが底台の金属板上に導電ブロックに対応した貫通孔を形成し、圧迫螺子栓を利用し、金属板上方から該貫通孔を経た後、導電ブロック上に固定させることを特徴とする。
According to a fourth aspect of the present invention, in the mask transfer container having the deposited conductive action according to the first aspect, a positioning groove corresponding to a handle is formed on the bottom surface of the bottom base, and the handle of the lower transfer container is used as the upper layer transfer container. It can be fitted into the stereotaxic groove, the tactile unit is provided on both sides of the stereotaxic groove, and the conductive block can contact both sides of the handle.
According to a fifth aspect of the present invention, in the mask transfer container having a deposited conductive action according to the first aspect, one or a plurality of convex ring teeth are formed on an outer edge of the conductive block of the touching unit to improve a fixing effect. It is characterized by.
According to a sixth aspect of the present invention, in the mask transfer container having a deposited conductive action according to the first aspect, the contact unit forms a through-hole corresponding to the conductive block on the metal plate of the base, and a compression screw plug is provided. It is used, and after passing through the through hole from above the metal plate, it is fixed on the conductive block.

本発明の堆積導電作用を有するマスク移載容器は、少なくとも以下の効果を有する。
1.本発明のマスク移載容器は、触導ユニットと導電構造の設計を利用し、相互に堆積する移載容器が静電を円滑に順に導出でき、移載容器が、静電が導出されないことによりキャパシタ効果を発生することを回避し、更に、静電除去の効果を増進し、移載容器内部とマスク上の静電を円滑に導出し、移載容器の材質内に抗静電材料を添加する必要がなく、移載容器の製造コストを低減することができる。
2.本発明の堆積導電作用を有するマスク移載容器は、導電ユニットの設計を介して、微粒子または有害物質がマスク表面に付着することを減少させ、微粒子または有害物質等が移載容器内壁またはマスク上に付着することを回避でき、環境の清潔度を増進でき、且つマスク表面の微粒子の付着と霧化、結晶等を現象させ、ウエハー製作の歩留まりを向上させるだけではなく、プロセスの繰り返し及び繰り返し清掃の時間及び費用を減少させ、運営コストを低減させることができる。
3.堆積導電作用を有するマスク移載容器の導電ユニットは、回復力を発生できるので、導電通路の流暢さを確保でき、通路断裂の現象が発生することなく、静電導出の確実性を確保することができる。
The mask transfer container having the deposited conductive action of the present invention has at least the following effects.
1. The mask transfer container of the present invention utilizes the design of the touching unit and the conductive structure so that the transfer containers that are deposited on each other can smoothly derive the static electricity in order, and the transfer container does not derive the static electricity. This prevents the capacitor effect from occurring, further enhances the electrostatic removal effect, smoothly derives the static electricity inside the transfer container and the mask, and the anti-static material within the transfer container material. Therefore, the manufacturing cost of the transfer container can be reduced.
2. The mask transfer container having the deposited conductive action of the present invention reduces the adhesion of fine particles or harmful substances to the mask surface through the design of the conductive unit, and the fine particles or harmful substances are transferred to the inner wall of the transfer container or It is possible to avoid adhesion on the mask, improve the cleanliness of the environment, and cause the adhesion and atomization of fine particles on the mask surface, crystals, etc., and not only improve the yield of wafer fabrication, but also repeat the process and The time and expense of repeated cleaning can be reduced, and the operation cost can be reduced.
3. The conductive unit of the mask transfer container having the deposition conductive action can generate recovery force, so that the fluency of the conductive path can be secured, and the reliability of electrostatic derivation is ensured without causing the phenomenon of the passage rupture. can do.

本発明の好適な堆積導電作用を有するマスク移載容器の実施例を図面を参照して説明する。
本発明の実施例の堆積導電作用を有するマスク移載容器は、図1〜図3に示すように、マスクを収容する移載容器に係り、底台10、殻体2、少なくとも1つの導電ユニット30と少なくとも1つの触導ユニット40を含み、そのうち、殻体2は、底台10に対応して選択的に覆蓋ラッチまたは分離することができ、殻体2は、底台10上に覆蓋する時、両者間にマスク50を放置させる収容空間を形成し、導電ユニット30は移載容器内のマスク50と外部導体を導通させる導電通路機制を形成でき、触導ユニット40まで上下に隣接して堆積される移載容器に導通する導電通路を形成する。
A preferred embodiment of a mask transfer container having a deposited conductive action according to the present invention will be described with reference to the drawings.
As shown in FIGS. 1 to 3, a mask transfer container having a deposited conductive action according to an embodiment of the present invention relates to a transfer container that accommodates a mask, and includes a base 10, a shell 2, and at least one conductive unit. 30 and at least one tactile unit 40, in which the shell 2 can be selectively covered latch or separated corresponding to the base 10, and the shell 2 covers the base 10. In some cases, an accommodation space for allowing the mask 50 to stand between the two is formed, and the conductive unit 30 can form a conductive path mechanism for conducting the mask 50 in the transfer container and the external conductor, and is adjacent to the touching unit 40 vertically. Conductive passages are formed in conduction with the transfer container to be deposited.

詳細な図2、図3、図4から分かるように、底台10周縁に複数の殻体2が覆蓋ラッチする定位溝11を形成し、また、底台10上面に金属板15を設け、且つ底台10は金属板15上方に2つの相互に平行する載置台17を固定し、且つ底台10が金属板15上方の2つの載置台17の一端との間に係止部材18を設け、底台10が2つの載置台17と該係止部材18を利用してマスクを支える“コ”の字型の支持体を形成し、金属片15が載置台17と係止部材18を受け該底台10上面に圧制されるようにし、更に、底台10底面中央に収納領域13を形成し、該収納領域13が上下隣接する移載容器に対応して嵌合できるようにする。   As can be seen from FIGS. 2, 3, and 4 in detail, a positioning groove 11 for covering and latching a plurality of shells 2 is formed on the periphery of the base 10, and a metal plate 15 is provided on the upper surface of the base 10, and The base 10 fixes two mutually parallel mounting bases 17 above the metal plate 15, and a locking member 18 is provided between the base 10 and one end of the two mounting bases 17 above the metal plate 15, The base 10 forms a “U” -shaped support that supports the mask using the two mounting tables 17 and the locking member 18, and the metal piece 15 receives the mounting table 17 and the locking member 18. The storage area 13 is formed in the center of the bottom surface of the bottom base 10 so that the storage area 13 can be fitted to the upper and lower adjacent transfer containers.

1、2または4に
前記殻体2は、プラスチック外殻20と、上翼片22と、金属内部ライニング25から組成され、そのうち、外殻20の内部底縁に前記底台10の定位溝11に対応するラッチ部材21を有し、殻体2の外殻20がラッチ部材21を利用して選択的に底体10に嵌合または分離できるようにし、且つ前記上翼片22は、固定螺子23を利用して外殻20を貫通し金属内部ライニング25に固定され、また、上翼片22は導電材料から形成され、該上翼片22上縁中央に把手24を形成し、使用者に移載容器を保持移動させ、且つ把手24は前記底台10底面の収納領域13に適切に対応する。更に殻体2の金属内部ライニング25は、前記上翼片22に対応して螺子23を固定する金属螺柱27を有し、且つ殻体2が底台10上に覆蓋される時、該金属内部ライニング25底縁が底台10の金属片15と好適に接触し、金属内部ライニング25の内縁にマスク50を圧制および係止できる複数の導電性圧制部材26を設け、圧制部材26を利用しマスク50を押し底台10の載置台17と係止部材18上に定位させる。
1, 2, or 4 The shell 2 is composed of a plastic outer shell 20, an upper wing piece 22, and a metal inner lining 25, and the localization groove 11 of the base 10 is formed on the inner bottom edge of the outer shell 20. The outer shell 20 of the shell 2 can be selectively fitted to or separated from the bottom body 10 using the latch member 21, and the upper wing piece 22 includes a fixing screw. 23 is penetrated through the outer shell 20 and fixed to the metal inner lining 25, and the upper wing piece 22 is formed of a conductive material, and a handle 24 is formed at the center of the upper edge of the upper wing piece 22 to The transfer container is held and moved, and the handle 24 appropriately corresponds to the storage area 13 on the bottom surface of the base 10. Further, the metal inner lining 25 of the shell 2 has a metal screw 27 for fixing the screw 23 corresponding to the upper wing piece 22, and when the shell 2 is covered on the base 10, the metal The inner lining 25 has a bottom edge that suitably contacts the metal piece 15 of the base 10, and a plurality of conductive pressure control members 26 that can press and lock the mask 50 are provided on the inner edge of the metal inner lining 25. The mask 50 is positioned on the mounting table 17 and the locking member 18 of the bottom base 10.

導電ユニット30は、底台10上に設けられ、各導電ユニット30は、底台10上に“コ”形断面を有する収容溝台31を形成し、該収容溝台31内に少なくとも1つの回復力を発生できる導電柱を設け、本発明の実施例は、2つの導電柱を実施例とし、該2つの導電柱は、それぞれ第1導電柱32と第2導電柱35として定義され、そのうち、第1導電柱32は収容溝台31底面を貫通できる接触段33を有し、作業台の導体に触れさせ、第1導電柱32上端に外向きに回復力を発生できる金属弾性部材34を設け、第2導電柱35は、弾性部材34上端に設けられ、第1,第2導電柱32,35は、弾性部材34の作用を受け、相対して離脱し、第2導電柱35を底台10の金属片15の底面と接触させ、移載容器とマスク50が載置台17、係止部材18および金属片15を介し、導電ユニット30の第1、第2導電柱32,35、弾性部材34を経由して外部作業台の導体と導電通路機制を形成することができるようにする。   The conductive unit 30 is provided on the base 10, and each conductive unit 30 forms an accommodation groove base 31 having a “U” -shaped cross section on the base 10, and at least one recovery in the accommodation groove base 31. A conductive column capable of generating a force is provided, and an embodiment of the present invention has two conductive columns as examples, and the two conductive columns are defined as a first conductive column 32 and a second conductive column 35, respectively, The first conductive column 32 has a contact step 33 that can penetrate the bottom surface of the receiving groove base 31, and is provided with a metal elastic member 34 that can contact the conductor of the work table and generate an outward recovery force at the upper end of the first conductive column 32. The second conductive pillar 35 is provided at the upper end of the elastic member 34, and the first and second conductive pillars 32 and 35 are separated from each other by the action of the elastic member 34, and the second conductive pillar 35 is mounted on the bottom. 10 is brought into contact with the bottom surface of the metal piece 15, and the transfer container and the mask 50 are placed on the mounting table 1. 7. The conductor of the external work table and the conductive path mechanism can be formed via the first and second conductive columns 32 and 35 of the conductive unit 30 and the elastic member 34 via the locking member 18 and the metal piece 15. Like that.

触導ユニット40は、底台10の収納領域13両側に設けられ、各触導ユニット40は、底台10の収納領域13に対応する両側に固定柱41を形成し、固定柱41内に導電ブロック42を埋設し、該導電ブロック42外縁に1つまたは複数の凸環歯420を形成し、該凸輪歯420は、螺旋模様歯等を選択することもでき、固定効果を向上させ、更に、各導電ブロック42は、相互に隣接する移載容器の把手24周縁に対応して平接触面421を形成し、導電ブロック42と把手24が接触する面積(図5参照)を増加させ、また、触導ユニット40は底台10の金属板15上に導電ブロック42に対応する貫通孔44を形成し、圧迫螺子栓45を利用し、金属板15上方から該貫通孔44を経て貫通した後、導電ブロック42上に固定され、移載容器の殻体2の把手24、金属内部ライニング25、金属片15、圧迫螺子栓45と導電ブロック42との間に導電通路を形成する。   The tactile unit 40 is provided on both sides of the storage area 13 of the base 10, and each tactile unit 40 forms a fixed column 41 on both sides corresponding to the storage area 13 of the base 10, and conducts in the fixed column 41. The block 42 is embedded, and one or a plurality of convex ring teeth 420 are formed on the outer edge of the conductive block 42. The convex ring teeth 420 can also select a helical pattern tooth or the like, improving the fixing effect, Each conductive block 42 forms a flat contact surface 421 corresponding to the periphery of the handle 24 of the transfer container adjacent to each other, increasing the area (see FIG. 5) where the conductive block 42 and the handle 24 are in contact, The touching unit 40 forms a through hole 44 corresponding to the conductive block 42 on the metal plate 15 of the base 10, and penetrates from above the metal plate 15 through the through hole 44 using the compression screw plug 45. Fixed on the conductive block 42 , It handles 24 of the shell 2 of the transfer vessel, a metal inner lining 25, the metal strip 15, to form a conductive path between the compression screw plug 45 and the conductive block 42.

このようにして、移載容器が上下に隣接して堆積する時、触導ユニット40を介して静電を導出することができ、同時に移載容器とマスク50の上の静電が導電ユニット30から導出されることができ、導電効果が確実な移載容器堆積導電構造を構成する。   In this way, when the transfer container is deposited adjacent to each other in the vertical direction, static electricity can be derived through the touching unit 40, and at the same time, the static electricity on the transfer container and the mask 50 is transferred to the conductive unit 30. The transfer container deposited conductive structure can be derived from the above and has a reliable conductive effect.

前記の設計を介して、本発明は、実際の使用・運用時、図3、図4、図5に示すように、マスク50が移載容器の底台10の載置台17と係止部材18から構成される支持体上に載置され、殻体2が底台10を覆蓋する時、導電性を有する載置台17と金属内部ライニングの圧制部材26がマスク50と接触し、且つ金属内部ライニング25と金属片15が相互に接触する設計を介し、前記の導電ユニット30と連接し、導電ユニット30の第1導電柱32と第2導電柱35が弾性部材34の外向きの回復力の作用を受けることによって、第2導電柱35が金属片15と接触でき、第1導電柱32が、移載容器が作業台に置かれる時に導体と接触でき、完成した導電通路機制を形成し、移載容器とマスク50上の静電を円滑に導出させることができる。   Through the above design, in the present invention, as shown in FIGS. 3, 4, and 5, the mask 50 is placed on the mounting table 17 and the locking member 18 of the bottom 10 of the transfer container during actual use and operation. When the shell 2 covers the bottom base 10, the conductive base 17 and the metal internal lining pressure control member 26 are in contact with the mask 50 and the metal internal lining 25 is connected to the conductive unit 30 through a design in which the metal piece 15 is in contact with each other, and the first conductive column 32 and the second conductive column 35 of the conductive unit 30 act by the outward recovery force of the elastic member 34. By receiving, the second conductive column 35 can come into contact with the metal piece 15 and the first conductive column 32 can come into contact with the conductor when the transfer container is placed on the workbench to form a completed conductive path mechanism. Smooth discharge of static electricity on the loading container and the mask 50 It can be.

また、移載容器が上下に逐一層に堆積しようとする時、更に図5、図6、図7に示すように、上層の移載容器を底台10の収納領域13により下層の移載容器の殻体2の把手24に対応させ、把手24を前記収納領域13内に嵌合できるようにし、上層の移載容を堆積させ、且つ下層の移載容器の殻体2上の翼片22上面に位置限定し、相互に堆積した移載容器が揺動する時、上層の移載容器の触導ユニット40の導電ブロック42が下層の移載容器の殻体2の把手24と接触せず、導電ブロック42、把手24、固定螺子23、金属内部ライニング25、金属片15と圧迫螺子栓45との間の導電通路を介して静電を下層の移載容器上に導き、下層移載容器の導電ユニット30を利用して静電を作業台の導体上に導引し、静電除去を達成し、キャパシタ効果の発生を回避する。   When the transfer containers are to be deposited one layer at a time, as shown in FIGS. 5, 6, and 7, the upper transfer container is transferred to the lower transfer container by the storage area 13 of the base 10. Corresponding to the handle 24 of the shell 2, the handle 24 can be fitted in the storage region 13, the upper layer transfer capacity is deposited, and the blade 22 on the shell 2 of the lower transfer container is deposited. When the transfer containers stacked on each other are limited to the upper surface, the conductive block 42 of the upper transfer container touching unit 40 does not contact the handle 24 of the lower transfer container shell 2. The conductive block 42, the handle 24, the fixing screw 23, the metal inner lining 25, and the conductive path between the metal piece 15 and the compression screw plug 45 guide the static electricity onto the lower transfer container. The electrostatic unit 30 is used to conduct static electricity on the conductor of the workbench to achieve static elimination. To avoid the occurrence of the capacitor effect.

従って、本発明のマスク移載容器は、材料内に抗静電材料を添加する必要がなく、移載容器の製造コストを低減でき、同時に微粒子または有害物質がマスク50等のマスク表面への付着を減少させ、微粒子または有害物質等が移載容器の内壁またはマスクに付着することを回避し、環境の清潔度を増進し、ウエハー製作の歩留まりを向上させ、更にプロセスの繰り返し、および清掃の繰り返しの時間と費用を減少させ、運営コストを効率的に低減する。   Therefore, the mask transfer container of the present invention does not require the addition of an anti-electrostatic material in the material, can reduce the manufacturing cost of the transfer container, and at the same time, fine particles or harmful substances adhere to the mask surface such as the mask 50. , Avoiding the adhesion of fine particles or harmful substances to the inner wall or mask of the transfer container, improving the cleanliness of the environment, improving the yield of wafer fabrication, and repeating the process and cleaning Reduce operating time and expenses, and reduce operating costs efficiently.

更に、導電ユニット30の第1導電柱32と第2導電柱35が受ける弾性部材34の外向きの支持する特性によって、第1、第2導電柱32、35は、金属片15および外部導体との連通を保持することができ、導電通路の流暢さを確保でき、通路断裂の現象が発生せず、静電導出の確実性を確保する。   Furthermore, the first and second conductive columns 32 and 35 are connected to the metal piece 15 and the external conductor by the outwardly supported characteristics of the elastic member 34 received by the first conductive column 32 and the second conductive column 35 of the conductive unit 30. Can be maintained, the fluidity of the conductive passage can be ensured, the phenomenon of passage breakage does not occur, and the reliability of electrostatic discharge is ensured.

以上のように、堆積導電作用を有するマスク移載容器は、触導ユニットと導電構造の設計を利用し、相互に堆積する移載容器が静電を円滑に順に導出でき、移載容器が、静電が導出されないことによりキャパシタ効果を発生することを回避し、更に、静電除去の効果を増進し、移載容器内部とマスク上の静電を円滑に導出し、移載容器の材質内に抗静電材料を添加する必要がなく、移載容器の製造コストを低減することができる。
また、堆積導電作用を有するマスク移載容器は、導電ユニットの設計を介して、微粒子または有害物質がマスク表面に付着することを減少させ、微粒子または有害物質等が移載容器内壁またはマスク上に付着することを回避でき、環境の清潔度を増進でき、且つマスク表面の微粒子の付着と霧化、結晶等を現象させ、ウエハー製作の歩留まりを向上させるだけではなく、プロセスの繰り返し及び繰り返し清掃の時間及び費用を減少させ、運営コストを低減させることができる。
更に、堆積導電作用を有するマスク移載容器の導電ユニットは、回復力を発生できるので、導電通路の流暢さを確保でき、通路断裂の現象が発生することなく、静電導出の確実性を確保することができる。
なお、本発明の特徴を損なうものでなければ、前記実施例に限定されるものでないことは勿論である。
As described above, the mask transfer container having a deposited conductive action utilizes the design of the touching unit and the conductive structure, and the transfer containers that are deposited on each other can smoothly derive the static electricity in order, Avoiding the generation of the capacitor effect due to the fact that static electricity is not derived, further enhancing the effect of removing static electricity, smoothly deriving the static electricity inside the transfer container and the mask, and within the material of the transfer container There is no need to add an anti-electrostatic material to the substrate, and the manufacturing cost of the transfer container can be reduced.
In addition, the mask transfer container having the deposited conductive action reduces the adhesion of fine particles or harmful substances to the mask surface through the design of the conductive unit, and the fine particles or harmful substances are deposited on the inner wall of the transfer container or the mask. Adhesion can be avoided, the cleanliness of the environment can be improved, and the adhesion and atomization of fine particles on the mask surface, crystallization, etc., not only improve the yield of wafer fabrication, but also repeat and repeat the process. Time and expense can be reduced and operating costs can be reduced.
Furthermore, since the conductive unit of the mask transfer container having the deposited conductive action can generate a restoring force, the fluency of the conductive path can be secured, and the reliability of the electrostatic derivation is ensured without causing the phenomenon of the passage rupture. can do.
Needless to say, the present invention is not limited to the above-described embodiment as long as the features of the present invention are not impaired.

本発明の移載容器の立体分解説明図である。It is three-dimensional decomposition explanatory drawing of the transfer container of this invention. 本発明の移載容器の局部立体分解説明図である。It is local three-dimensional decomposition explanatory drawing of the transfer container of this invention. 本発明の移載容器の底台の仰視外観説明図である。It is a top view explanatory drawing of the base of the transfer container of this invention. 本発明の移載容器の局部組成断面説明図である。It is local composition cross-sectional explanatory drawing of the transfer container of this invention. 本発明の移載容器の立体外観説明図であり、上層隣接移載容器と堆積前の状態を説明する。It is a three-dimensional external view explanatory drawing of the transfer container of this invention, The upper layer adjacent transfer container and the state before deposition are demonstrated. 本発明の移載容器の堆積後の外観説明図である。It is an external view explanatory drawing after deposition of the transfer container of this invention. 本発明の移載容器の堆積後の側面断面説明図であり、隣接移載容器が静電流を導引する態様を示す。It is side surface explanatory drawing after deposition of the transfer container of this invention, and the aspect to which an adjacent transfer container guides an electrostatic current is shown.

符号の説明Explanation of symbols

10 底台
11 定位溝
13 収容領域
15 金属片
17 載置台
18 係止部材
2 殻体
20 外殻
21 ラッチ部材
22 上翼片
23 固定螺子
24 把手
25 金属内部ライニング
26 圧制部材
27 金属螺柱
30 導電ユニット
31 収容溝台
32 第1導電柱
33 接触段
34 弾性部材
35 第2導電柱
40 触導ユニット
41 固定柱
42 導電ブロック
420 凸環歯
421 平接触面
44 貫通孔
45 圧迫螺子栓
50 マスク
DESCRIPTION OF SYMBOLS 10 Base 11 Stereotaxic groove 13 Accommodating area 15 Metal piece 17 Mounting base 18 Locking member 2 Shell body 20 Outer shell 21 Latch member 22 Upper wing piece 23 Fixing screw 24 Handle 25 Metal internal lining 26 Pressure control member 27 Metal screw column 30 Conductivity Unit 31 Housing groove base 32 First conductive column 33 Contact stage 34 Elastic member 35 Second conductive column 40 Touching unit 41 Fixed column 42 Conductive block 420 Convex ring tooth 421 Flat contact surface 44 Through hole 45 Compression screw cap 50 Mask

Claims (6)

マスクを収容することに用い、
マスクを載置させることができる底台であって、該底台上面に金属板を有し、金属板とマスクとの間に導電通路を形成してなる底台と、
前記底台と対応して選択的に覆蓋または分離できる殻体であって、且つ殻体内に前記金属板と接触する金属内部ライニングを設け、殻体上面に金属内部ライニングと導電通路を形成する把手を設ける殻体と、
前記底台上に設けられる導電ユニットであって、該導電ユニットが底台金属板と外部導体との間に導電通路を形成させることができる少なくとも1つの導電ユニットと、
前記底台が対応する下層が隣接する移載容器の把手側辺に設けられる触導ユニットであって、触導ユニットが導電ブロックを有し、該導電ブロックが底台の金属板と下層隣接移載容器の把手側辺との間に導電通路を形成する少なくとも1つの蝕導ユニットとを含むことを特徴とする堆積導電作用を有するマスク移載容器。
Used to house the mask,
A base on which a mask can be placed, having a metal plate on the top surface of the base, and forming a conductive path between the metal plate and the mask;
A shell that can be selectively covered or separated corresponding to the base, and a metal internal lining that contacts the metal plate is provided in the shell, and a metal internal lining and a conductive passage are formed on the upper surface of the shell. A shell for providing
A conductive unit provided on the base, wherein the conductive unit is capable of forming a conductive path between the base metal plate and the external conductor; and
A touching unit provided on a handle side of an adjacent transfer container to which a lower layer corresponding to the bottom is adjacent, the touching unit having a conductive block, and the conductive block is adjacent to the bottom metal plate and the lower layer. A mask transfer container having a deposited conductive action, comprising: at least one conductive unit that forms a conductive path between the handle side of the mounting container.
前記底台が金属板状面に2つの相互に対応し、且つ平行に配列される載置台を設け、また、底台上面が2つの載置台の一端に対応してマスクを貼り付ける係止部材を設けることを特徴とする請求項1記載の堆積導電作用を有するマスク移載容器。   The base is provided with two mounting tables corresponding to the metal plate-like surface and arranged parallel to each other, and the top surface of the base corresponds to one end of the two mounting tables, and a locking member for attaching a mask The mask transfer container having a deposited conductive action according to claim 1, wherein: 前記導電ユニットが底台上に収容溝台を形成し、且つ導電ユニットが第1導電柱と第2導電柱を有し、第1導電柱が収容溝台底面を貫通できる接触段を有し、外部導体と接触し、第1導電柱上端が外向きに回復力を発生できる金属弾性部材を設け、第2導電柱は弾性部材の上端に設けられ、第2導電柱が金属片底面に接触を保持できるようにしてなることを特徴とする請求項1記載の堆積導電作用を有するマスク移載容器。   The conductive unit forms a receiving groove base on the base, the conductive unit has a first conductive column and a second conductive column, and the first conductive column has a contact step that can penetrate the bottom surface of the receiving groove base; A metal elastic member that is in contact with the outer conductor and the upper end of the first conductive column can generate an outward recovery force is provided, the second conductive column is provided at the upper end of the elastic member, and the second conductive column is in contact with the bottom surface of the metal piece. 2. The mask transfer container having a deposited conductive action according to claim 1, wherein the mask transfer container is capable of being held. 前記底台底面に把手に対応する定位溝を形成し、下層移載容器の把手が上層移載容器の定位溝内に嵌合でき、触導ユニットが定位溝の両側に設けられ、且つ導電ブロックが把手両側と接触できることを特徴とする請求項1記載の堆積導電作用を有するマスク移載容器。   A positioning groove corresponding to a handle is formed on the bottom surface of the bottom base, the handle of the lower layer transfer container can be fitted into the positioning groove of the upper layer transfer container, the touching unit is provided on both sides of the positioning groove, and the conductive block 2. The mask transfer container having a deposited conductive action according to claim 1, wherein the mask can contact both sides of the handle. 前記触導ユニットの導電ブロック外縁に1つまたは複数の凸環歯を形成し、固定効果を向上させることを特徴とする請求項1記載の堆積導電作用を有するマスク移載容器。   2. The mask transfer container having a deposited conductive action according to claim 1, wherein one or a plurality of convex ring teeth are formed on an outer edge of the conductive block of the touching unit to improve a fixing effect. 前記触導ユニットが底台の金属板上に導電ブロックに対応した貫通孔を形成し、圧迫螺子栓を利用し、金属板上方から該貫通孔を経た後、導電ブロック上に固定させることを特徴とする請求項1記載の堆積導電作用を有するマスク移載容器。   The contact unit is formed with a through hole corresponding to a conductive block on a metal plate on the bottom, and is fixed on the conductive block after passing through the through hole from above the metal plate using a compression screw plug. A mask transfer container having a deposited conductive action according to claim 1.
JP2008075153A 2008-03-24 2008-03-24 Mask transfer container having deposition-conductive effect Ceased JP2009227304A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112670219A (en) * 2019-10-16 2021-04-16 家登精密工业股份有限公司 Photomask holding system

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61190471A (en) * 1985-02-01 1986-08-25 日立東京エレクトロニクス株式会社 Housing case for tabular article
JP2007329439A (en) * 2006-05-12 2007-12-20 Miraial Kk Reticle case
JP2008166799A (en) * 2006-12-29 2008-07-17 Ind Technol Res Inst Clean container having elastic positioning structure

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61190471A (en) * 1985-02-01 1986-08-25 日立東京エレクトロニクス株式会社 Housing case for tabular article
JP2007329439A (en) * 2006-05-12 2007-12-20 Miraial Kk Reticle case
JP2008166799A (en) * 2006-12-29 2008-07-17 Ind Technol Res Inst Clean container having elastic positioning structure

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112670219A (en) * 2019-10-16 2021-04-16 家登精密工业股份有限公司 Photomask holding system
JP2021064776A (en) * 2019-10-16 2021-04-22 家登精密工業股▲ふん▼有限公司 Reticle retaining system and retaining system
JP7059491B2 (en) 2019-10-16 2022-04-26 家登精密工業股▲ふん▼有限公司 Reticle holding system and holding system
US11442370B2 (en) 2019-10-16 2022-09-13 Gudeng Precision Industrial Co., Ltd Reticle retaining system
CN112670219B (en) * 2019-10-16 2024-05-10 家登精密工业股份有限公司 Photomask holding system

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