TW200735304A - Electronic spare parts of copper series composite substrate, electronic spare parts and the manufacturing method for electronic spare part of copper series composite substrate - Google Patents
Electronic spare parts of copper series composite substrate, electronic spare parts and the manufacturing method for electronic spare part of copper series composite substrateInfo
- Publication number
- TW200735304A TW200735304A TW095143779A TW95143779A TW200735304A TW 200735304 A TW200735304 A TW 200735304A TW 095143779 A TW095143779 A TW 095143779A TW 95143779 A TW95143779 A TW 95143779A TW 200735304 A TW200735304 A TW 200735304A
- Authority
- TW
- Taiwan
- Prior art keywords
- composite substrate
- electronic spare
- series composite
- copper
- copper series
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
- C23C16/402—Silicon dioxide
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
- C23C16/0281—Deposition of sub-layers, e.g. to promote the adhesion of the main coating of metallic sub-layers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/42—Silicides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Chemical Vapour Deposition (AREA)
- Laminated Bodies (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Abstract
The invention provides an electronic spare parts of copper series composite substrate. The characteristic is covering tin or tin series alloy on the surface of copper substrate or copper alloy substrate to construct a covering layer of copper series composite substrate. It includes silicon oxide thin film containing hydrocarbon group and/or hydroxyl group adhering on the surface of the said covering layer. This type electronic spare part of copper series composite substrate is using resin to seal or adhere the copper series composite substrate. The sealing and adhering property between the substrate and the resin components is high.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005361881A JP3984629B2 (en) | 2005-12-15 | 2005-12-15 | Copper-based composite substrate for electronic parts and electronic parts |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200735304A true TW200735304A (en) | 2007-09-16 |
TWI357641B TWI357641B (en) | 2012-02-01 |
Family
ID=38162733
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095143779A TW200735304A (en) | 2005-12-15 | 2006-11-27 | Electronic spare parts of copper series composite substrate, electronic spare parts and the manufacturing method for electronic spare part of copper series composite substrate |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP3984629B2 (en) |
KR (1) | KR20080050518A (en) |
CN (1) | CN101297066B (en) |
TW (1) | TW200735304A (en) |
WO (1) | WO2007069419A1 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5134343B2 (en) * | 2007-11-20 | 2013-01-30 | 株式会社神戸製鋼所 | Thin film forming apparatus and thin film forming method |
CN102544131A (en) * | 2012-03-12 | 2012-07-04 | 谢振华 | Improved electrode structure for solar battery panel |
JP2018204054A (en) * | 2017-05-31 | 2018-12-27 | 住友金属鉱山株式会社 | Method for manufacturing metal member, method for manufacturing printed circuit board, metal member, and printed circuit board |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63207158A (en) * | 1987-02-23 | 1988-08-26 | Mitsubishi Electric Corp | Resin sealed type semiconductor device |
JP4379854B2 (en) * | 2001-10-30 | 2009-12-09 | 日鉱金属株式会社 | Surface treated copper foil |
CN1242092C (en) * | 2001-11-19 | 2006-02-15 | 乐金电子(天津)电器有限公司 | Method for anticorrosion treatment of metal by plasma technique |
JP4453443B2 (en) * | 2004-05-27 | 2010-04-21 | パナソニック株式会社 | Tin plating film and method for producing plating film |
-
2005
- 2005-12-15 JP JP2005361881A patent/JP3984629B2/en not_active Expired - Fee Related
-
2006
- 2006-11-14 KR KR1020087009569A patent/KR20080050518A/en not_active Application Discontinuation
- 2006-11-14 CN CN2006800370267A patent/CN101297066B/en not_active Expired - Fee Related
- 2006-11-14 WO PCT/JP2006/322625 patent/WO2007069419A1/en active Application Filing
- 2006-11-27 TW TW095143779A patent/TW200735304A/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
WO2007069419A1 (en) | 2007-06-21 |
TWI357641B (en) | 2012-02-01 |
CN101297066B (en) | 2010-06-09 |
KR20080050518A (en) | 2008-06-05 |
JP2007162094A (en) | 2007-06-28 |
JP3984629B2 (en) | 2007-10-03 |
CN101297066A (en) | 2008-10-29 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |