TW200732457A - Stripper composition for alignment film - Google Patents

Stripper composition for alignment film

Info

Publication number
TW200732457A
TW200732457A TW095139123A TW95139123A TW200732457A TW 200732457 A TW200732457 A TW 200732457A TW 095139123 A TW095139123 A TW 095139123A TW 95139123 A TW95139123 A TW 95139123A TW 200732457 A TW200732457 A TW 200732457A
Authority
TW
Taiwan
Prior art keywords
composition
stripper composition
compound
alignment film
liquid
Prior art date
Application number
TW095139123A
Other languages
Chinese (zh)
Inventor
Hidekuni Yasue
Yoshitaka Nishijima
Mizuki Takei
Koji Sakate
Takatoshi Ishikawa
Original Assignee
Nagase Chemtex Corp
Yushiro Chem Ind
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nagase Chemtex Corp, Yushiro Chem Ind filed Critical Nagase Chemtex Corp
Publication of TW200732457A publication Critical patent/TW200732457A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D9/00—Chemical paint or ink removers
    • C09D9/005—Chemical paint or ink removers containing organic solvents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1316—Methods for cleaning the liquid crystal cells, or components thereof, during manufacture: Materials therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G03F7/0043—Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Paints Or Removers (AREA)
  • Detergent Compositions (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

A liquid stripper composition for liquid-crystal alignment films which comprises water and, incorporated therein, an inorganic alkali compound [A] such as potassium hydroxide, a C6-12 fatty acid [B], and an amino alcohol [C] having a boiling point of 150 DEG C or higher, such as diethanolamine or triethanolamine, the amounts of the compound [A] and the acid [B] being 5-25 wt.% and 3-30 wt.%, respectively, based on the composition (provided that the total amount of the compound [A], fatty acid [B], and amino alcohol [C] is 9-60 wt.% based on the composition). The composition has a degree of [B]/[A] neutralization of 10-70%. This liquid stripper composition for alignment films has excellent stripping properties.
TW095139123A 2005-12-21 2006-10-24 Stripper composition for alignment film TW200732457A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005367610 2005-12-21

Publications (1)

Publication Number Publication Date
TW200732457A true TW200732457A (en) 2007-09-01

Family

ID=38188412

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095139123A TW200732457A (en) 2005-12-21 2006-10-24 Stripper composition for alignment film

Country Status (3)

Country Link
JP (1) JPWO2007072629A1 (en)
TW (1) TW200732457A (en)
WO (1) WO2007072629A1 (en)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH052167A (en) * 1991-06-04 1993-01-08 Matsushita Electric Ind Co Ltd Production of liquid crystal display element
JPH10195214A (en) * 1997-01-10 1998-07-28 Toray Eng Co Ltd Resin etchant and etching
JP3918300B2 (en) * 1998-05-14 2007-05-23 Ｊｓｒ株式会社 Liquid crystal alignment film remover
JP2000129177A (en) * 1998-10-21 2000-05-09 Dainippon Toryo Co Ltd Peeling agent for polyimide resin-based orientation film
JP2004238533A (en) * 2003-02-06 2004-08-26 Nagase Chemtex Corp Releasing agent composition for polyimide film

Also Published As

Publication number Publication date
WO2007072629A1 (en) 2007-06-28
JPWO2007072629A1 (en) 2009-05-28

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