TW200726511A - Gas-removal processing device - Google Patents

Gas-removal processing device

Info

Publication number
TW200726511A
TW200726511A TW095138186A TW95138186A TW200726511A TW 200726511 A TW200726511 A TW 200726511A TW 095138186 A TW095138186 A TW 095138186A TW 95138186 A TW95138186 A TW 95138186A TW 200726511 A TW200726511 A TW 200726511A
Authority
TW
Taiwan
Prior art keywords
gas
removal
pesticide
harm
equipment
Prior art date
Application number
TW095138186A
Other languages
English (en)
Inventor
Kaoru Sakoda
Yoshio Ishihara
Original Assignee
Taiyo Nippon Sanso Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiyo Nippon Sanso Corp filed Critical Taiyo Nippon Sanso Corp
Publication of TW200726511A publication Critical patent/TW200726511A/zh

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/68—Halogens or halogen compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/68—Halogens or halogen compounds
    • B01D53/70—Organic halogen compounds
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/3065—Plasma etching; Reactive-ion etching
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/20—Halogens or halogen compounds
    • B01D2257/206—Organic halogen compounds
    • B01D2257/2066—Fluorine
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00—Capture or disposal of greenhouse gases
    • Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Environmental & Geological Engineering (AREA)
  • Biomedical Technology (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Treating Waste Gases (AREA)
  • Drying Of Semiconductors (AREA)
TW095138186A 2006-01-11 2006-10-17 Gas-removal processing device TW200726511A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006003554A JP2007185561A (ja) 2006-01-11 2006-01-11 排ガス処理装置

Publications (1)

Publication Number Publication Date
TW200726511A true TW200726511A (en) 2007-07-16

Family

ID=38256119

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095138186A TW200726511A (en) 2006-01-11 2006-10-17 Gas-removal processing device

Country Status (7)

Country Link
US (1) US20090246089A1 (zh)
EP (1) EP1972370A1 (zh)
JP (1) JP2007185561A (zh)
KR (1) KR20080079268A (zh)
IL (1) IL191811A0 (zh)
TW (1) TW200726511A (zh)
WO (1) WO2007080706A1 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI741480B (zh) * 2019-01-25 2021-10-01 日商東芝股份有限公司 含有矽之物質形成裝置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3703538B2 (ja) * 1995-09-21 2005-10-05 大陽日酸株式会社 有害ガスの除害方法及び除害剤
JP2000107507A (ja) * 1998-09-30 2000-04-18 Toshiba Corp 吸着処理のモニター方法およびその装置
US6721609B1 (en) * 2000-06-14 2004-04-13 Fisher-Rosemount Systems, Inc. Integrated optimal model predictive control in a process control system
JP2003126656A (ja) * 2001-10-22 2003-05-07 Nippon Sanso Corp Ｐｆｃ回収装置
JP2003144840A (ja) * 2001-11-07 2003-05-20 Nippon Sanso Corp 加熱式除害装置
JP2005144359A (ja) * 2003-11-17 2005-06-09 Mitsubishi Electric Corp シロキサン化合物含有ガスの精製装置
US7451004B2 (en) * 2005-09-30 2008-11-11 Fisher-Rosemount Systems, Inc. On-line adaptive model predictive control in a process control system

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI741480B (zh) * 2019-01-25 2021-10-01 日商東芝股份有限公司 含有矽之物質形成裝置

Also Published As

Publication number Publication date
KR20080079268A (ko) 2008-08-29
WO2007080706A1 (ja) 2007-07-19
JP2007185561A (ja) 2007-07-26
US20090246089A1 (en) 2009-10-01
EP1972370A1 (en) 2008-09-24
IL191811A0 (en) 2008-12-29

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