TW200724253A - Process and equipment for charging ethylene carbonate containing material - Google Patents

Process and equipment for charging ethylene carbonate containing material

Info

Publication number
TW200724253A
TW200724253A TW095141696A TW95141696A TW200724253A TW 200724253 A TW200724253 A TW 200724253A TW 095141696 A TW095141696 A TW 095141696A TW 95141696 A TW95141696 A TW 95141696A TW 200724253 A TW200724253 A TW 200724253A
Authority
TW
Taiwan
Prior art keywords
charging
pipe
particles
ethylene carbonate
carbonate containing
Prior art date
Application number
TW095141696A
Other languages
Chinese (zh)
Inventor
Hiroshi Niizuma
Tomohisa Iinuma
Original Assignee
Toagosei Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toagosei Co Ltd filed Critical Toagosei Co Ltd
Publication of TW200724253A publication Critical patent/TW200724253A/en

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/42Stripping or agents therefor
    • G03F7/422Stripping or agents therefor using liquids only

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Basic Packing Technique (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)

Abstract

The invention aims at providing a process for stably charging a high-quality ethylene carbonate containing material by determining the number of particles contained in the material which particles are solid at atmospheric temperature in handling (e.g., at ordinary temperatures) with high reproducibility easily and accurately; and equipment for charging the material. The process comprises passing an ethylene carbonate containing material from a material storage vessel through a charging pipe and then through a pipe for measuring particles, which pipe is a branch separated from the charging pipe at a midway point and is heated, continuously in line, determining the number of particles contained in the material with a particle measuring instrument connected to the pipe for measuring particles, and charging the material into a storage vessel through an outlet of the charging pipe when the number of particles of 0.2[mu]m or larger has reached a level below the reference value.
TW095141696A 2005-11-11 2006-11-10 Process and equipment for charging ethylene carbonate containing material TW200724253A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005326873 2005-11-11

Publications (1)

Publication Number Publication Date
TW200724253A true TW200724253A (en) 2007-07-01

Family

ID=38023210

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095141696A TW200724253A (en) 2005-11-11 2006-11-10 Process and equipment for charging ethylene carbonate containing material

Country Status (4)

Country Link
JP (1) JPWO2007055207A1 (en)
CN (1) CN101304921A (en)
TW (1) TW200724253A (en)
WO (1) WO2007055207A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201012796A (en) * 2008-09-02 2010-04-01 Solvay Fluor Gmbh Method for removal of contaminants
CN102934207B (en) * 2010-06-07 2016-04-06 中央硝子株式会社 Diaphragm formation chemical solution
US9228120B2 (en) 2010-06-07 2016-01-05 Central Glass Company, Limited Liquid chemical for forming protecting film
CN106733949B (en) * 2016-12-08 2019-11-12 宁波科尼管洁净科技有限公司 Pipe cleaning process

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001326199A (en) * 2000-05-17 2001-11-22 Hitachi Ltd Manufacturing method of semiconductor integrated circuit device

Also Published As

Publication number Publication date
CN101304921A (en) 2008-11-12
WO2007055207A1 (en) 2007-05-18
JPWO2007055207A1 (en) 2009-04-30

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