TW200721823A - Projection system modulator reducing distortion and field curvature effects of projection system lens - Google Patents

Projection system modulator reducing distortion and field curvature effects of projection system lens

Info

Publication number
TW200721823A
TW200721823A TW095127735A TW95127735A TW200721823A TW 200721823 A TW200721823 A TW 200721823A TW 095127735 A TW095127735 A TW 095127735A TW 95127735 A TW95127735 A TW 95127735A TW 200721823 A TW200721823 A TW 200721823A
Authority
TW
Taiwan
Prior art keywords
projection system
lens
field curvature
reducing distortion
curvature effects
Prior art date
Application number
TW095127735A
Other languages
English (en)
Inventor
Anurag Gupta
Scott Lerner
P Guy Howard
Original Assignee
Hewlett Packard Development Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hewlett Packard Development Co filed Critical Hewlett Packard Development Co
Publication of TW200721823A publication Critical patent/TW200721823A/zh

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G02F1/134309—Electrodes characterised by their geometrical arrangement
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N5/00—Details of television systems
    • H04N5/74—Projection arrangements for image reproduction, e.g. using eidophor
    • H04N5/7416—Projection arrangements for image reproduction, e.g. using eidophor involving the use of a spatial light modulator, e.g. a light valve, controlled by a video signal
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N9/00—Details of colour television systems
    • H04N9/12—Picture reproducers
    • H04N9/31—Projection devices for colour picture display, e.g. using electronic spatial light modulators [ESLM]
    • H04N9/3141—Constructional details thereof

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Geometry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Projection Apparatus (AREA)
  • Lenses (AREA)
TW095127735A 2005-07-30 2006-07-28 Projection system modulator reducing distortion and field curvature effects of projection system lens TW200721823A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/193,918 US7283289B2 (en) 2005-07-30 2005-07-30 Projection system modulator reducing distortion and field curvature effects of projection system lens

Publications (1)

Publication Number Publication Date
TW200721823A true TW200721823A (en) 2007-06-01

Family

ID=37312039

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095127735A TW200721823A (en) 2005-07-30 2006-07-28 Projection system modulator reducing distortion and field curvature effects of projection system lens

Country Status (4)

Country Link
US (1) US7283289B2 (zh)
EP (1) EP1911283A1 (zh)
TW (1) TW200721823A (zh)
WO (1) WO2007015998A1 (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5608980B2 (ja) * 2009-01-27 2014-10-22 セイコーエプソン株式会社 書画カメラおよび画像表示システム
US10574954B2 (en) * 2018-10-30 2020-02-25 Silicon Light Machines Corporation Compensation method for a scanning system with spatial light modulator
JP2020098273A (ja) * 2018-12-18 2020-06-25 ソニーセミコンダクタソリューションズ株式会社 画像表示装置

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3955128A (en) * 1974-07-31 1976-05-04 Addressograph Multigraph Corporation Charged particle optical system for curved modulators
US5223971A (en) * 1991-12-31 1993-06-29 Texas Instruments Incorporated Light beam steering with deformable membrane device
US5355188A (en) * 1993-09-09 1994-10-11 In Focus Systems, Inc. Method and apparatus for distortion correction in optical projectors
SE9800665D0 (sv) * 1998-03-02 1998-03-02 Micronic Laser Systems Ab Improved method for projection printing using a micromirror SLM
JP4033416B2 (ja) * 1998-03-24 2008-01-16 フジノン株式会社 照明光学系およびこれを用いたプロジェクタ装置
KR100636090B1 (ko) 1999-06-11 2006-10-19 삼성전자주식회사 액정 프로젝션 시스템
US6416908B1 (en) * 2000-06-29 2002-07-09 Anvik Corporation Projection lithography on curved substrates
DE20109394U1 (de) * 2001-06-06 2001-08-16 Zeiss Carl Jena Gmbh Projektionsanordnung
US6707534B2 (en) * 2002-05-10 2004-03-16 Anvik Corporation Maskless conformable lithography
DE10222331A1 (de) * 2002-05-18 2003-11-27 Zeiss Carl Smt Ag Verfahren zur gezielten Deformation eines optischen Elements
US7110082B2 (en) * 2003-06-24 2006-09-19 Asml Holding N.V. Optical system for maskless lithography

Also Published As

Publication number Publication date
WO2007015998A1 (en) 2007-02-08
US20070024944A1 (en) 2007-02-01
US7283289B2 (en) 2007-10-16
EP1911283A1 (en) 2008-04-16

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