TW200718790A - Low temperature sputtering anti-reflection layer structure on sheet and manufacturing method thereof - Google Patents

Low temperature sputtering anti-reflection layer structure on sheet and manufacturing method thereof

Info

Publication number
TW200718790A
TW200718790A TW094138864A TW94138864A TW200718790A TW 200718790 A TW200718790 A TW 200718790A TW 094138864 A TW094138864 A TW 094138864A TW 94138864 A TW94138864 A TW 94138864A TW 200718790 A TW200718790 A TW 200718790A
Authority
TW
Taiwan
Prior art keywords
reflection layer
mass production
reflection
manufacturing
low temperature
Prior art date
Application number
TW094138864A
Other languages
Chinese (zh)
Inventor
zhao-jie Zhu
Xu-Fu Hong
I-Wen Lee
Chien-Min Weng
Zhao-Lan Li
Original Assignee
Applied Vacuum Coating Technologies Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Vacuum Coating Technologies Co Ltd filed Critical Applied Vacuum Coating Technologies Co Ltd
Priority to TW094138864A priority Critical patent/TW200718790A/en
Priority to GB0618865A priority patent/GB2431931A/en
Priority to JP2006008963U priority patent/JP3131160U/en
Publication of TW200718790A publication Critical patent/TW200718790A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/154—Deposition methods from the vapour phase by sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Inorganic Chemistry (AREA)
  • Laminated Bodies (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Optical Elements (AREA)

Abstract

The present invention relates to a low temperature sputtering method which provides with an advantage of easy to install and capable of mass production, and can be applied on multilayer plating sheets with anti-reflection function. The invention of the structure and manufacturing method can be applied on photoelectric industry for anti-reflection layer panel mass production and is better than the prior art in antigiare anti-reflection layer panel mass production. The method of the invention mainly adopts the anti-reflection characteristic of the alternate coordination of high reflection rate layer with low reflection layer plate sheet structure to arrange a continuous production process, uses plasma to clean sheet surface, and imparts and assembles to the traditional sputter machine to reach the convenience for assembly and mass production.
TW094138864A 2005-11-04 2005-11-04 Low temperature sputtering anti-reflection layer structure on sheet and manufacturing method thereof TW200718790A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
TW094138864A TW200718790A (en) 2005-11-04 2005-11-04 Low temperature sputtering anti-reflection layer structure on sheet and manufacturing method thereof
GB0618865A GB2431931A (en) 2005-11-04 2006-09-25 Anti-reflection layer and manufacturing method and apparatus
JP2006008963U JP3131160U (en) 2005-11-04 2006-11-02 Low temperature sputtering coating anti-reflective layer board structure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW094138864A TW200718790A (en) 2005-11-04 2005-11-04 Low temperature sputtering anti-reflection layer structure on sheet and manufacturing method thereof

Publications (1)

Publication Number Publication Date
TW200718790A true TW200718790A (en) 2007-05-16

Family

ID=37421581

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094138864A TW200718790A (en) 2005-11-04 2005-11-04 Low temperature sputtering anti-reflection layer structure on sheet and manufacturing method thereof

Country Status (3)

Country Link
JP (1) JP3131160U (en)
GB (1) GB2431931A (en)
TW (1) TW200718790A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106086800A (en) * 2016-08-03 2016-11-09 光驰科技(上海)有限公司 The technique preparing high-performance antireflective coating on PMMA or PC material substrate
TWI617828B (en) * 2017-06-27 2018-03-11 吳鳳學校財團法人吳鳳科技大學 Anti-reflection Composite Film

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101902217B (en) * 2009-06-01 2013-03-27 冠华科技股份有限公司 Structural improvement for digital capacitance touch pad
JP6746410B2 (en) * 2016-07-13 2020-08-26 大日本印刷株式会社 Optical stack

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2067765A1 (en) * 1990-08-30 1992-03-01 Eric R. Dickey Dc reactively sputtered optical coatings including niobium oxide
US5450238A (en) * 1993-12-10 1995-09-12 Viratec Thin Films, Inc. Four-layer antireflection coating for deposition in in-like DC sputtering apparatus
JPH0925562A (en) * 1995-07-10 1997-01-28 Ulvac Japan Ltd Thin anitireflection multilater coating film, formation of the same coating film and film forming device therefor
JP3975242B2 (en) * 1997-05-16 2007-09-12 Ｈｏｙａ株式会社 Plastic optical component with antireflection film
JP3952603B2 (en) * 1998-07-23 2007-08-01 コニカミノルタホールディングス株式会社 Electromagnetic wave reducing antireflection film and optical member having the antireflection film
JP3952609B2 (en) * 1998-09-28 2007-08-01 コニカミノルタホールディングス株式会社 Electromagnetic wave reduction antireflection coating
EP1765739B1 (en) * 2003-09-29 2019-08-14 AGC Glass Europe Transparent substrate comprising an anti-reflective stack of layers

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106086800A (en) * 2016-08-03 2016-11-09 光驰科技(上海)有限公司 The technique preparing high-performance antireflective coating on PMMA or PC material substrate
TWI617828B (en) * 2017-06-27 2018-03-11 吳鳳學校財團法人吳鳳科技大學 Anti-reflection Composite Film

Also Published As

Publication number Publication date
GB0618865D0 (en) 2006-11-01
JP3131160U (en) 2007-04-26
GB2431931A (en) 2007-05-09

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