TW200718790A - Low temperature sputtering anti-reflection layer structure on sheet and manufacturing method thereof - Google Patents
Low temperature sputtering anti-reflection layer structure on sheet and manufacturing method thereofInfo
- Publication number
- TW200718790A TW200718790A TW094138864A TW94138864A TW200718790A TW 200718790 A TW200718790 A TW 200718790A TW 094138864 A TW094138864 A TW 094138864A TW 94138864 A TW94138864 A TW 94138864A TW 200718790 A TW200718790 A TW 200718790A
- Authority
- TW
- Taiwan
- Prior art keywords
- reflection layer
- mass production
- reflection
- manufacturing
- low temperature
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title abstract 6
- 238000004544 sputter deposition Methods 0.000 title abstract 2
- 238000000034 method Methods 0.000 abstract 2
- 238000010924 continuous production Methods 0.000 abstract 1
- 238000007747 plating Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Inorganic Chemistry (AREA)
- Laminated Bodies (AREA)
- Physical Vapour Deposition (AREA)
- Surface Treatment Of Optical Elements (AREA)
Abstract
The present invention relates to a low temperature sputtering method which provides with an advantage of easy to install and capable of mass production, and can be applied on multilayer plating sheets with anti-reflection function. The invention of the structure and manufacturing method can be applied on photoelectric industry for anti-reflection layer panel mass production and is better than the prior art in antigiare anti-reflection layer panel mass production. The method of the invention mainly adopts the anti-reflection characteristic of the alternate coordination of high reflection rate layer with low reflection layer plate sheet structure to arrange a continuous production process, uses plasma to clean sheet surface, and imparts and assembles to the traditional sputter machine to reach the convenience for assembly and mass production.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW094138864A TW200718790A (en) | 2005-11-04 | 2005-11-04 | Low temperature sputtering anti-reflection layer structure on sheet and manufacturing method thereof |
GB0618865A GB2431931A (en) | 2005-11-04 | 2006-09-25 | Anti-reflection layer and manufacturing method and apparatus |
JP2006008963U JP3131160U (en) | 2005-11-04 | 2006-11-02 | Low temperature sputtering coating anti-reflective layer board structure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW094138864A TW200718790A (en) | 2005-11-04 | 2005-11-04 | Low temperature sputtering anti-reflection layer structure on sheet and manufacturing method thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200718790A true TW200718790A (en) | 2007-05-16 |
Family
ID=37421581
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094138864A TW200718790A (en) | 2005-11-04 | 2005-11-04 | Low temperature sputtering anti-reflection layer structure on sheet and manufacturing method thereof |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP3131160U (en) |
GB (1) | GB2431931A (en) |
TW (1) | TW200718790A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106086800A (en) * | 2016-08-03 | 2016-11-09 | 光驰科技(上海)有限公司 | The technique preparing high-performance antireflective coating on PMMA or PC material substrate |
TWI617828B (en) * | 2017-06-27 | 2018-03-11 | 吳鳳學校財團法人吳鳳科技大學 | Anti-reflection Composite Film |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101902217B (en) * | 2009-06-01 | 2013-03-27 | 冠华科技股份有限公司 | Structural improvement for digital capacitance touch pad |
JP6746410B2 (en) * | 2016-07-13 | 2020-08-26 | 大日本印刷株式会社 | Optical stack |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA2067765A1 (en) * | 1990-08-30 | 1992-03-01 | Eric R. Dickey | Dc reactively sputtered optical coatings including niobium oxide |
US5450238A (en) * | 1993-12-10 | 1995-09-12 | Viratec Thin Films, Inc. | Four-layer antireflection coating for deposition in in-like DC sputtering apparatus |
JPH0925562A (en) * | 1995-07-10 | 1997-01-28 | Ulvac Japan Ltd | Thin anitireflection multilater coating film, formation of the same coating film and film forming device therefor |
JP3975242B2 (en) * | 1997-05-16 | 2007-09-12 | Hoya株式会社 | Plastic optical component with antireflection film |
JP3952603B2 (en) * | 1998-07-23 | 2007-08-01 | コニカミノルタホールディングス株式会社 | Electromagnetic wave reducing antireflection film and optical member having the antireflection film |
JP3952609B2 (en) * | 1998-09-28 | 2007-08-01 | コニカミノルタホールディングス株式会社 | Electromagnetic wave reduction antireflection coating |
EP1765739B1 (en) * | 2003-09-29 | 2019-08-14 | AGC Glass Europe | Transparent substrate comprising an anti-reflective stack of layers |
-
2005
- 2005-11-04 TW TW094138864A patent/TW200718790A/en unknown
-
2006
- 2006-09-25 GB GB0618865A patent/GB2431931A/en not_active Withdrawn
- 2006-11-02 JP JP2006008963U patent/JP3131160U/en not_active Expired - Fee Related
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106086800A (en) * | 2016-08-03 | 2016-11-09 | 光驰科技(上海)有限公司 | The technique preparing high-performance antireflective coating on PMMA or PC material substrate |
TWI617828B (en) * | 2017-06-27 | 2018-03-11 | 吳鳳學校財團法人吳鳳科技大學 | Anti-reflection Composite Film |
Also Published As
Publication number | Publication date |
---|---|
GB0618865D0 (en) | 2006-11-01 |
JP3131160U (en) | 2007-04-26 |
GB2431931A (en) | 2007-05-09 |
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