TW200714140A - Microwave plasma excitation device - Google Patents
Microwave plasma excitation deviceInfo
- Publication number
- TW200714140A TW200714140A TW094132219A TW94132219A TW200714140A TW 200714140 A TW200714140 A TW 200714140A TW 094132219 A TW094132219 A TW 094132219A TW 94132219 A TW94132219 A TW 94132219A TW 200714140 A TW200714140 A TW 200714140A
- Authority
- TW
- Taiwan
- Prior art keywords
- microwave
- reaction chamber
- plasma
- excitation device
- plasma reaction
- Prior art date
Links
Abstract
The present invention relates to a microwave plasma excitation device, which with proper design, serves to transform a single microwave source into multiple microwave sources supplies to a plasma reaction chamber for generating plasma. The microwave plasma excitation device includes a microwave source, a power distribution structure, and a plasma reaction chamber. The power distribution structure is coupled to the microwave source and the plasma reaction chamber to evenly distribute the microwave power supplied by the microwave source to the plasma reaction chamber, thereby achieving uniform microwave energy distribution over a large area.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW094132219A TW200714140A (en) | 2005-09-19 | 2005-09-19 | Microwave plasma excitation device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW094132219A TW200714140A (en) | 2005-09-19 | 2005-09-19 | Microwave plasma excitation device |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200714140A true TW200714140A (en) | 2007-04-01 |
TWI301732B TWI301732B (en) | 2008-10-01 |
Family
ID=45070316
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094132219A TW200714140A (en) | 2005-09-19 | 2005-09-19 | Microwave plasma excitation device |
Country Status (1)
Country | Link |
---|---|
TW (1) | TW200714140A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI730195B (en) * | 2016-11-15 | 2021-06-11 | 美商萊登股份有限公司 | Microwave chemical processing |
CN113088938A (en) * | 2021-04-08 | 2021-07-09 | 四川大学 | Plasma chemical vapor deposition device with multiple microwave sources |
-
2005
- 2005-09-19 TW TW094132219A patent/TW200714140A/en unknown
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI730195B (en) * | 2016-11-15 | 2021-06-11 | 美商萊登股份有限公司 | Microwave chemical processing |
CN113088938A (en) * | 2021-04-08 | 2021-07-09 | 四川大学 | Plasma chemical vapor deposition device with multiple microwave sources |
CN113088938B (en) * | 2021-04-08 | 2022-03-11 | 四川大学 | Plasma chemical vapor deposition device with multiple microwave sources |
Also Published As
Publication number | Publication date |
---|---|
TWI301732B (en) | 2008-10-01 |
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