TW200713458A - Method for forming a capping layer on a semiconductor device - Google Patents

Method for forming a capping layer on a semiconductor device

Info

Publication number
TW200713458A
TW200713458A TW095129934A TW95129934A TW200713458A TW 200713458 A TW200713458 A TW 200713458A TW 095129934 A TW095129934 A TW 095129934A TW 95129934 A TW95129934 A TW 95129934A TW 200713458 A TW200713458 A TW 200713458A
Authority
TW
Taiwan
Prior art keywords
cavities
forming
semiconductor device
diffusion barrier
patterned dielectric
Prior art date
Application number
TW095129934A
Other languages
English (en)
Inventor
Gerald A Martin
Sam S Garcia
Varughese Mathew
Original Assignee
Freescale Semiconductor Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Freescale Semiconductor Inc filed Critical Freescale Semiconductor Inc
Publication of TW200713458A publication Critical patent/TW200713458A/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
    • H01L21/76841—Barrier, adhesion or liner layers
    • H01L21/76843—Barrier, adhesion or liner layers formed in openings in a dielectric
    • H01L21/76849—Barrier, adhesion or liner layers formed in openings in a dielectric the layer being positioned on top of the main fill metal
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/34—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies not provided for in groups H01L21/0405, H01L21/0445, H01L21/06, H01L21/16 and H01L21/18 with or without impurities, e.g. doping materials
    • H01L21/46—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/428
    • H01L21/461—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/428 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/4763—Deposition of non-insulating, e.g. conductive -, resistive -, layers on insulating layers; After-treatment of these layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
    • H01L21/7684—Smoothing; Planarisation

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Semiconductor Memories (AREA)
TW095129934A 2005-08-26 2006-08-15 Method for forming a capping layer on a semiconductor device TW200713458A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/215,375 US20070049008A1 (en) 2005-08-26 2005-08-26 Method for forming a capping layer on a semiconductor device

Publications (1)

Publication Number Publication Date
TW200713458A true TW200713458A (en) 2007-04-01

Family

ID=37772126

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095129934A TW200713458A (en) 2005-08-26 2006-08-15 Method for forming a capping layer on a semiconductor device

Country Status (5)

Country Link
US (1) US20070049008A1 (zh)
JP (1) JP2009506536A (zh)
KR (1) KR20080047541A (zh)
TW (1) TW200713458A (zh)
WO (1) WO2007024470A2 (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4755545B2 (ja) * 2006-07-11 2011-08-24 新光電気工業株式会社 基板の製造方法
KR102306796B1 (ko) 2011-11-04 2021-09-30 인텔 코포레이션 자기 정렬 캡의 형성 방법 및 장치
KR102274848B1 (ko) * 2014-10-17 2021-07-12 에이씨엠 리서치 (상하이) 인코포레이티드 배리어층 제거 방법 및 반도체 구조체 형성 방법
US10741748B2 (en) * 2018-06-25 2020-08-11 International Business Machines Corporation Back end of line metallization structures

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW571005B (en) * 2000-06-29 2004-01-11 Ebara Corp Method and apparatus for forming copper interconnects, and polishing liquid and polishing method
US6528409B1 (en) * 2002-04-29 2003-03-04 Advanced Micro Devices, Inc. Interconnect structure formed in porous dielectric material with minimized degradation and electromigration
US20030227091A1 (en) * 2002-06-06 2003-12-11 Nishant Sinha Plating metal caps on conductive interconnect for wirebonding
US7241696B2 (en) * 2002-12-11 2007-07-10 International Business Machines Corporation Method for depositing a metal layer on a semiconductor interconnect structure having a capping layer
US6893959B2 (en) * 2003-05-05 2005-05-17 Infineon Technologies Ag Method to form selective cap layers on metal features with narrow spaces
US20050048768A1 (en) * 2003-08-26 2005-03-03 Hiroaki Inoue Apparatus and method for forming interconnects
US6924232B2 (en) * 2003-08-27 2005-08-02 Freescale Semiconductor, Inc. Semiconductor process and composition for forming a barrier material overlying copper
US20050161338A1 (en) * 2004-01-26 2005-07-28 Applied Materials, Inc. Electroless cobalt alloy deposition process

Also Published As

Publication number Publication date
WO2007024470A3 (en) 2007-09-27
JP2009506536A (ja) 2009-02-12
WO2007024470A2 (en) 2007-03-01
US20070049008A1 (en) 2007-03-01
KR20080047541A (ko) 2008-05-29

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