TW200712759A - Device manufacturing method, mask and device - Google Patents
Device manufacturing method, mask and deviceInfo
- Publication number
- TW200712759A TW200712759A TW095130303A TW95130303A TW200712759A TW 200712759 A TW200712759 A TW 200712759A TW 095130303 A TW095130303 A TW 095130303A TW 95130303 A TW95130303 A TW 95130303A TW 200712759 A TW200712759 A TW 200712759A
- Authority
- TW
- Taiwan
- Prior art keywords
- areas
- pattern
- radiation
- patterned beam
- mask
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 230000005855 radiation Effects 0.000 abstract 3
- 239000000463 material Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7073—Alignment marks and their environment
- G03F9/7084—Position of mark on substrate, i.e. position in (x, y, z) of mark, e.g. buried or resist covered mark, mark on rearside, at the substrate edge, in the circuit area, latent image mark, marks in plural levels
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7073—Alignment marks and their environment
- G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7073—Alignment marks and their environment
- G03F9/708—Mark formation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14683—Processes or apparatus peculiar to the manufacture or treatment of these devices or parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/148—Charge coupled imagers
- H01L27/14868—CCD or CID colour imagers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Liquid Crystal (AREA)
- Solid State Image Pick-Up Elements (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/214,058 US20070048626A1 (en) | 2005-08-30 | 2005-08-30 | Device manufacturing method, mask and device |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200712759A true TW200712759A (en) | 2007-04-01 |
TWI338815B TWI338815B (en) | 2011-03-11 |
Family
ID=37189005
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095130303A TWI338815B (en) | 2005-08-30 | 2006-08-17 | Electronic device manufacturing method, electronic device and mask |
Country Status (7)
Country | Link |
---|---|
US (1) | US20070048626A1 (zh) |
EP (1) | EP1760525A1 (zh) |
JP (1) | JP4658004B2 (zh) |
KR (1) | KR100868034B1 (zh) |
CN (1) | CN1932649A (zh) |
SG (1) | SG130173A1 (zh) |
TW (1) | TWI338815B (zh) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW200941322A (en) * | 2008-03-28 | 2009-10-01 | Tpk Touch Solutions Inc | Manufacturing method for conducting films on two surfaces of transparent substrate of touch-control circuit |
CN102183817B (zh) * | 2010-04-29 | 2013-01-30 | 上海圭光科技有限公司 | 多层脊型光波导的制备方法 |
KR102526936B1 (ko) * | 2016-04-26 | 2023-04-28 | 삼성디스플레이 주식회사 | 표시 패널 및 표시 패널용 모기판 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05341499A (ja) * | 1992-06-08 | 1993-12-24 | Matsushita Electron Corp | 縮小投影露光装置用レチクル |
KR960003482B1 (ko) * | 1992-12-14 | 1996-03-14 | 삼성전자주식회사 | 액정 표시 장치의 칼라 필터 제조방법 |
JP3434593B2 (ja) * | 1994-10-20 | 2003-08-11 | 株式会社日立製作所 | 半導体装置の製造方法 |
JP3422923B2 (ja) * | 1998-01-26 | 2003-07-07 | シャープ株式会社 | カラーフィルタの製造方法およびアライメントマーク |
JP2000098126A (ja) * | 1998-09-25 | 2000-04-07 | Toppan Printing Co Ltd | カラーフィルタの製造方法 |
US6342735B1 (en) * | 1999-09-01 | 2002-01-29 | International Business Machines Corporation | Dual use alignment aid |
US20020102812A1 (en) * | 2001-01-31 | 2002-08-01 | Jeenh-Bang Yeh | Method for improving alignment precision in forming color filter array |
KR20040058711A (ko) * | 2002-12-27 | 2004-07-05 | 주식회사 하이닉스반도체 | 이미지센서 제조방법 |
KR100973806B1 (ko) * | 2003-06-26 | 2010-08-03 | 삼성전자주식회사 | 박막 트랜지스터 표시판의 제조 방법 |
-
2005
- 2005-08-30 US US11/214,058 patent/US20070048626A1/en not_active Abandoned
-
2006
- 2006-08-17 TW TW095130303A patent/TWI338815B/zh active
- 2006-08-18 EP EP06254291A patent/EP1760525A1/en not_active Withdrawn
- 2006-08-28 SG SG200605892-9A patent/SG130173A1/en unknown
- 2006-08-29 JP JP2006232146A patent/JP4658004B2/ja not_active Expired - Fee Related
- 2006-08-29 CN CNA2006101257579A patent/CN1932649A/zh active Pending
- 2006-08-30 KR KR1020060083098A patent/KR100868034B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR100868034B1 (ko) | 2008-11-10 |
TWI338815B (en) | 2011-03-11 |
EP1760525A1 (en) | 2007-03-07 |
CN1932649A (zh) | 2007-03-21 |
JP2007065665A (ja) | 2007-03-15 |
SG130173A1 (en) | 2007-03-20 |
JP4658004B2 (ja) | 2011-03-23 |
KR20070026171A (ko) | 2007-03-08 |
US20070048626A1 (en) | 2007-03-01 |
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