TW200703582A - Method of manufacturing a CMOS image sensor - Google Patents
Method of manufacturing a CMOS image sensorInfo
- Publication number
- TW200703582A TW200703582A TW094122710A TW94122710A TW200703582A TW 200703582 A TW200703582 A TW 200703582A TW 094122710 A TW094122710 A TW 094122710A TW 94122710 A TW94122710 A TW 94122710A TW 200703582 A TW200703582 A TW 200703582A
- Authority
- TW
- Taiwan
- Prior art keywords
- pixel array
- manufacturing
- image sensor
- array area
- semiconductor substrate
- Prior art date
Links
Landscapes
- Solid State Image Pick-Up Elements (AREA)
Abstract
The present invention relates to the method of manufacturing an image sensor, the method comprising providing a semiconductor substrate, which comprises a pixel array area and a logic area, a plurality of the photodiodes are formed on the semiconductor substrate of the pixel array area, a multilevel interconnect process is processed on the semiconductor substrate, a passivation is doping on the pixel array area and the logic area, removing the passivation on the pixel array area, and a plurality of the color filter arrays are formed on the pixel array area and correspond to the photodiode individually.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW94122710A TWI253722B (en) | 2005-07-05 | 2005-07-05 | Method of manufacturing a CMOS image sensor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW94122710A TWI253722B (en) | 2005-07-05 | 2005-07-05 | Method of manufacturing a CMOS image sensor |
Publications (2)
Publication Number | Publication Date |
---|---|
TWI253722B TWI253722B (en) | 2006-04-21 |
TW200703582A true TW200703582A (en) | 2007-01-16 |
Family
ID=37586696
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW94122710A TWI253722B (en) | 2005-07-05 | 2005-07-05 | Method of manufacturing a CMOS image sensor |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI253722B (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI637496B (en) * | 2015-03-18 | 2018-10-01 | 聯華電子股份有限公司 | Semiconductor device and method for fabricating the same |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI759757B (en) * | 2020-06-05 | 2022-04-01 | 揚明光學股份有限公司 | Optical characteristic measurement device and fabrication method thereof |
-
2005
- 2005-07-05 TW TW94122710A patent/TWI253722B/en active
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI637496B (en) * | 2015-03-18 | 2018-10-01 | 聯華電子股份有限公司 | Semiconductor device and method for fabricating the same |
Also Published As
Publication number | Publication date |
---|---|
TWI253722B (en) | 2006-04-21 |
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