TW200702644A - Ion beam measurement apparatus and method - Google Patents

Ion beam measurement apparatus and method

Info

Publication number
TW200702644A
TW200702644A TW095105186A TW95105186A TW200702644A TW 200702644 A TW200702644 A TW 200702644A TW 095105186 A TW095105186 A TW 095105186A TW 95105186 A TW95105186 A TW 95105186A TW 200702644 A TW200702644 A TW 200702644A
Authority
TW
Taiwan
Prior art keywords
ion beam
selectively
biased electrode
disposed adjacent
measurement apparatus
Prior art date
Application number
TW095105186A
Other languages
English (en)
Other versions
TWI406317B (zh
Inventor
Anthony Renau
Eric Hermanson
Joseph C Olson
Gordon Angel
Original Assignee
Varian Semiconductor Equipment
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Varian Semiconductor Equipment filed Critical Varian Semiconductor Equipment
Publication of TW200702644A publication Critical patent/TW200702644A/zh
Application granted granted Critical
Publication of TWI406317B publication Critical patent/TWI406317B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/004—Charge control of objects or beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/24405—Faraday cages
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31701—Ion implantation
    • H01J2237/31703—Dosimetry
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31701—Ion implantation
    • H01J2237/31705—Impurity or contaminant control
TW095105186A 2005-02-16 2006-02-16 離子束測量裝置與方法 TWI406317B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US65339405P 2005-02-16 2005-02-16
US11/093,930 US7170067B2 (en) 2005-02-16 2005-03-30 Ion beam measurement apparatus and method

Publications (2)

Publication Number Publication Date
TW200702644A true TW200702644A (en) 2007-01-16
TWI406317B TWI406317B (zh) 2013-08-21

Family

ID=36917041

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095105186A TWI406317B (zh) 2005-02-16 2006-02-16 離子束測量裝置與方法

Country Status (6)

Country Link
US (1) US7170067B2 (zh)
JP (1) JP5044418B2 (zh)
KR (1) KR101191941B1 (zh)
CN (1) CN101120427B (zh)
TW (1) TWI406317B (zh)
WO (1) WO2006089021A2 (zh)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7888636B2 (en) * 2007-11-01 2011-02-15 Varian Semiconductor Equipment Associates, Inc. Measuring energy contamination using time-of-flight techniques
US20100019141A1 (en) * 2008-07-25 2010-01-28 Varian Semiconductor Equipment Associates, Inc. Energy contamination monitor with neutral current detection
US8049168B2 (en) * 2008-12-18 2011-11-01 Varian Semiconductor Equipment Associates, Inc. Time-of-flight segmented Faraday
FR2961009A1 (fr) * 2010-06-03 2011-12-09 Ion Beam Services Detecteur d'electrons secondaires energetiques
KR101151057B1 (ko) 2010-12-30 2012-06-01 한국원자력연구원 이온 빔 집단적 특성 분석 장치
US8766207B2 (en) * 2011-09-23 2014-07-01 Taiwan Semiconductor Manufacturing Company, Ltd. Beam monitoring device, method, and system
CN104202894B (zh) * 2014-07-29 2016-08-24 北京航空航天大学 一种用于离子推力器测量的法拉第探针
CN104965217B (zh) * 2015-06-26 2018-05-25 中国工程物理研究院核物理与化学研究所 一种脉冲离子束截面图像的测量装置及方法
US10416199B2 (en) 2017-01-17 2019-09-17 International Business Machines Corporation Measuring flux, current, or integrated charge of low energy particles

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5113074A (en) * 1991-01-29 1992-05-12 Eaton Corporation Ion beam potential detection probe
JPH05273355A (ja) * 1992-01-16 1993-10-22 Ebara Corp イオン・中性粒子計数装置
US5384465A (en) * 1993-09-17 1995-01-24 Applied Materials, Inc. Spectrum analyzer in an ion implanter
GB2314202B (en) * 1996-06-14 2000-08-09 Applied Materials Inc Ion implantation apparatus and a method of monitoring high energy neutral contamination in an ion implantation process
US5814823A (en) * 1997-07-12 1998-09-29 Eaton Corporation System and method for setecing neutral particles in an ion bean
JP4003308B2 (ja) * 1998-08-17 2007-11-07 日新イオン機器株式会社 ビーム量計測装置
JP2000311867A (ja) * 1999-04-27 2000-11-07 Nissin Electric Co Ltd ビーム量測定方法および測定装置
US6489622B1 (en) * 2000-03-01 2002-12-03 Advanced Ion Beam Technology, Inc. Apparatus for decelerating ion beams with minimal energy contamination
EP1272261A4 (en) * 2000-03-20 2007-02-21 Epion Corp DEVICE FOR MEASURING THE CLUSTER SIZE AND METHOD FOR CLUSTER ION RADIATION DIAGNOSTICS
JP3593993B2 (ja) * 2001-05-01 2004-11-24 日新電機株式会社 ファラデー装置
US7250617B2 (en) * 2004-02-12 2007-07-31 Varian Semiconductor Equipment Associates, Inc. Ion beam neutral detection

Also Published As

Publication number Publication date
US7170067B2 (en) 2007-01-30
WO2006089021A2 (en) 2006-08-24
US20060192134A1 (en) 2006-08-31
JP2008530759A (ja) 2008-08-07
KR20070111516A (ko) 2007-11-21
JP5044418B2 (ja) 2012-10-10
WO2006089021A3 (en) 2007-02-15
CN101120427B (zh) 2010-05-19
KR101191941B1 (ko) 2012-10-17
TWI406317B (zh) 2013-08-21
CN101120427A (zh) 2008-02-06

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