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Priority claimed from US11/143,506external-prioritypatent/US20060005771A1/en
Priority claimed from US11/173,210external-prioritypatent/US8074599B2/en
Application filed by Applied Materials IncfiledCriticalApplied Materials Inc
Publication of TW200702486ApublicationCriticalpatent/TW200702486A/en
Application grantedgrantedCritical
Publication of TWI374197BpublicationCriticalpatent/TWI374197B/en
Embodiments of a gas distribution plate for distributing gas in a processing chamber are provided. In one embodiment, a gas distribution assembly for a plasma processing chamber comprises a diffuser plate with gas passages passing between its upstream and downstream sides and hollow cathode cavities at the downstream side of the gas passages. The downstream side of the diffuser plate has a curvature to improve the thickness uniformity and film property uniformity of thin films deposited by PECVD, particularly SiN and amorphous silicon films. The curvature is preferably described by an arc of a circle or ellipse, the apex thereof located at the center point of the diffuser plate. In one aspect, the hollow cathode cavity volume density, surface area density, or the cavity density of the diffuser increases from the center of the diffuser to the outer edge. Methods for manufacturing such a diffuser plate are also provided.
TW95119776A2005-06-022006-06-02Plasma uniformity control by gas diffuser curvature
TWI374197B
(en)
Process for shaping a razor blade that comprises the steps of providing a substrate, shaping a sharp edge, placing the substrate in a vacuum chamber, along with a first solid target, and supplying a gas to the vacuum bed that forms upon ionization. a thin film coating on said sharp edge