TW200640786A - Particulate silica - Google Patents

Particulate silica

Info

Publication number
TW200640786A
TW200640786A TW094116782A TW94116782A TW200640786A TW 200640786 A TW200640786 A TW 200640786A TW 094116782 A TW094116782 A TW 094116782A TW 94116782 A TW94116782 A TW 94116782A TW 200640786 A TW200640786 A TW 200640786A
Authority
TW
Taiwan
Prior art keywords
inorganic powder
shape parameter
particulate inorganic
satisfying formula
fractal shape
Prior art date
Application number
TW094116782A
Other languages
Chinese (zh)
Inventor
Yasuhiro Nagatani
Ryuji Ishimoto
Masao Ariyuki
Original Assignee
Tokuyama Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokuyama Corp filed Critical Tokuyama Corp
Publication of TW200640786A publication Critical patent/TW200640786A/en

Links

Landscapes

  • Pigments, Carbon Blacks, Or Wood Stains (AREA)
  • Ink Jet Recording Methods And Recording Media Thereof (AREA)
  • Silicon Compounds (AREA)
  • Paints Or Removers (AREA)
  • Paper (AREA)

Abstract

To provide particulate inorganic powder having a higher effect than a conventional material used as a viscoelasticity controlling agent such as a thickener to be added to water or a liquid such as a liquid resin and coating material so as to control their viscoelastic characteristics such as viscosity and thixotropy, or used as a reinforcer or a filler for silicone rubber or a sealant, a polisher for CMP (chemical mechanical polishing) or a surface coating agent for an inkjet recording sheet. The particulate inorganic powder comprises silica or the like and has 130 to 380 m2/g BET specific surface area S, with a fractal shape parameter α1 in the analyzing range of 20 to 30 nm satisfying formula (1): α1+ 0.00175S < 2.518 and a fractal shape parameter α2 in the analyzing range of 30 to 50 nm satisfying formula (2): α2 + 0.0014S < 2.210.
TW094116782A 2003-11-27 2005-05-23 Particulate silica TW200640786A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003397856A JP2005154222A (en) 2003-11-27 2003-11-27 Particulate silica

Publications (1)

Publication Number Publication Date
TW200640786A true TW200640786A (en) 2006-12-01

Family

ID=34722897

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094116782A TW200640786A (en) 2003-11-27 2005-05-23 Particulate silica

Country Status (2)

Country Link
JP (1) JP2005154222A (en)
TW (1) TW200640786A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI635106B (en) * 2012-10-29 2018-09-11 德商拜耳材料科學股份有限公司 Formable film

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20120031242A (en) * 2004-05-04 2012-03-30 캐보트 코포레이션 Method of preparing an aggregate metal oxide particle dispersion having a desired aggregate particle diameter
JP4832940B2 (en) * 2005-07-26 2011-12-07 株式会社トクヤマ Method for producing cationic resin-modified dry silica dispersion
DE102006059316A1 (en) * 2006-12-15 2008-06-19 Evonik Degussa Gmbh Dispersion of high surface area silica
DE102008000499A1 (en) * 2008-03-04 2009-09-10 Evonik Degussa Gmbh Silica and epoxy resins
JP4521058B2 (en) * 2008-03-24 2010-08-11 株式会社Ａｄｅｋａ Surface-modified colloidal silica and polishing composition for CMP containing the same
WO2011109302A2 (en) * 2010-03-01 2011-09-09 Cabot Corporation Coating comprising multipopulation fumed silica particles
JP6011361B2 (en) * 2013-01-25 2016-10-19 株式会社ニコン Method for producing silica particle dispersion and polishing method using silica particle dispersion
JP6043992B2 (en) * 2013-04-02 2016-12-14 株式会社トクヤマ Hydrophobized dry silica fine particles
JP7136691B2 (en) * 2015-10-16 2022-09-13 ポリント コンポジッツ ユーエスエイ インコーポレイテッド Multi-layer coating with visual effect
JP7019439B2 (en) * 2018-02-05 2022-02-15 株式会社トクヤマ Silica powder
CN111474084B (en) * 2020-04-07 2023-03-03 河北科技大学 Characterization method for density of silicon dioxide particles in silica sol
WO2024203521A1 (en) * 2023-03-27 2024-10-03 株式会社トクヤマ Method for producing hydrophobic silica powder and hydrophobizing agent

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI635106B (en) * 2012-10-29 2018-09-11 德商拜耳材料科學股份有限公司 Formable film

Also Published As

Publication number Publication date
JP2005154222A (en) 2005-06-16

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