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Application filed by Mikuni Denshi KkfiledCriticalMikuni Denshi Kk
Priority to TW095119837ApriorityCriticalpatent/TW200638105A/en
Publication of TW200638105ApublicationCriticalpatent/TW200638105A/en
The invention relates to a forming apparatus for the plasma polymer film. Its characteristic is that the electrode with applying high-frequency voltage is allocated in the bottom of apparatus, and connected with cooling plate. The substrate is mounted above the electrode that is allocated in the top area connected with optical chopper frame to generate the closed plasma reaction casing. The gases from the side of the closed plasma reaction casing and the top plate to be heated to 200 DEG C. Even though via plasma treatment, the process does not generate plasma polymer film for the CH4 gases. The gases of VTMS, DMDES or HMDSO are reacted with the hydrocarbon gases using plasma treatment. The plasma polymer film is generated on the area of effective pixels. Moving the Rf electrode into the bottom region and splitting the optical chopper and Rf electrode. The Rf electrode is cooled down due to the connecting with the cooling plate.
TW095119837A2006-06-052006-06-05A forming apparatus for the plasma polymer film
TW200638105A
(en)
Liquid for water- and oil-repellent and stainproofing treatment, process for production thereof, method for water- and oil -repellent and stainproofing treatment by using the same, and articles treated by the method