TW200636564A - Data processing method of scan beam apparatus - Google Patents

Data processing method of scan beam apparatus

Info

Publication number
TW200636564A
TW200636564A TW095111138A TW95111138A TW200636564A TW 200636564 A TW200636564 A TW 200636564A TW 095111138 A TW095111138 A TW 095111138A TW 95111138 A TW95111138 A TW 95111138A TW 200636564 A TW200636564 A TW 200636564A
Authority
TW
Taiwan
Prior art keywords
signal intensity
scan image
charged particle
image obtained
particle beam
Prior art date
Application number
TW095111138A
Other languages
Chinese (zh)
Other versions
TWI300534B (en
Inventor
Daisuke Imai
Original Assignee
Shimadzu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp filed Critical Shimadzu Corp
Publication of TW200636564A publication Critical patent/TW200636564A/en
Application granted granted Critical
Publication of TWI300534B publication Critical patent/TWI300534B/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical or photographic arrangements associated with the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical or photographic arrangements associated with the tube
    • H01J37/222—Image processing arrangements associated with the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Measurement Of Radiation (AREA)

Abstract

The uniformity of the signal intensity of a scan image obtained by a plurality of charged particle beam sources is reduced to enhance the accuracy of defect detection without using standard intensity. A scan beam apparatus in which the charged particle beams from a plurality of charged particle beam sources are scanned in two dimensions on the sample to form a scan image includes the following steps: a first step to determine the signal intensity distribution based on each signal intensity of the scan image obtained for each charged particle beam; a second step to match each distributed shape of the signal intensity distribution with the same distributed shape; and a third step to determine the signal intensity of each scan image when each distributed shape in the signal intensity distribution is the same. The attention is paid to the distributed shape of the signal intensity distribution of the scan image obtained from the determined object of the sample, and each distributed shape of the signal intensity distribution is matched with same distribution shape for the scan image obtained by each charged particle beam source. The uniformity of the signal intensity of the scan image obtained by a plurality of charged particle beam sources is reduced to enhance the accuracy of defect detection without using standard intensity.
TW095111138A 2005-04-11 2006-03-30 Data processing method of scan beam apparatus TWI300534B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005113890 2005-04-11

Publications (2)

Publication Number Publication Date
TW200636564A true TW200636564A (en) 2006-10-16
TWI300534B TWI300534B (en) 2008-09-01

Family

ID=37086846

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095111138A TWI300534B (en) 2005-04-11 2006-03-30 Data processing method of scan beam apparatus

Country Status (5)

Country Link
JP (1) JP4835874B2 (en)
KR (1) KR100990220B1 (en)
CN (1) CN101133473B (en)
TW (1) TWI300534B (en)
WO (1) WO2006109564A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102011000090B4 (en) * 2011-01-11 2016-03-24 Leica Microsystems Cms Gmbh Method and device for scanning microscopic imaging of an object
JP5841819B2 (en) * 2011-11-30 2016-01-13 株式会社ニューフレアテクノロジー Charged particle beam drawing apparatus and charged particle beam drawing method
JP5860785B2 (en) * 2012-09-19 2016-02-16 株式会社日立ハイテクノロジーズ Charged particle microscope system and measurement method using the same
EP2879156A1 (en) * 2013-12-02 2015-06-03 Fei Company Charged-particle microscopy with enhanced electron detection

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4002655B2 (en) * 1998-01-06 2007-11-07 株式会社日立製作所 Pattern inspection method and apparatus
JP4235284B2 (en) * 1998-08-25 2009-03-11 株式会社日立製作所 Pattern inspection apparatus and method
JP2001284422A (en) * 2000-03-28 2001-10-12 Toshiba Corp Contact failure defect detection method and computer readable recording medium

Also Published As

Publication number Publication date
KR100990220B1 (en) 2010-10-29
JP4835874B2 (en) 2011-12-14
TWI300534B (en) 2008-09-01
CN101133473A (en) 2008-02-27
KR20070103486A (en) 2007-10-23
WO2006109564A1 (en) 2006-10-19
CN101133473B (en) 2010-10-27
JPWO2006109564A1 (en) 2008-10-30

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees